TWI473121B - The method of alloy resistor - Google Patents

The method of alloy resistor Download PDF

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Publication number
TWI473121B
TWI473121B TW99121785A TW99121785A TWI473121B TW I473121 B TWI473121 B TW I473121B TW 99121785 A TW99121785 A TW 99121785A TW 99121785 A TW99121785 A TW 99121785A TW I473121 B TWI473121 B TW I473121B
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Prior art keywords
alloy
manufacturing
alloy resistor
resistor
forming
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TW99121785A
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TW201203291A (en
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Shih Long Wei
Shen Li Hsiao
Chien Min Shao
Chien Hung Ho
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Viking Tech Corp
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Priority to US12/873,827 priority patent/US8590140B2/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C17/00Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/07Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by resistor foil bonding, e.g. cladding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C17/00Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/006Apparatus or processes specially adapted for manufacturing resistors adapted for manufacturing resistor chips
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C17/00Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/065Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C7/00Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/003Thick film resistors
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49082Resistor making
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49082Resistor making
    • Y10T29/49101Applying terminal
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49204Contact or terminal manufacturing
    • Y10T29/49208Contact or terminal manufacturing by assembling plural parts
    • Y10T29/4921Contact or terminal manufacturing by assembling plural parts with bonding
    • Y10T29/49211Contact or terminal manufacturing by assembling plural parts with bonding of fused material
    • Y10T29/49213Metal
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49204Contact or terminal manufacturing
    • Y10T29/49224Contact or terminal manufacturing with coating
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49789Obtaining plural product pieces from unitary workpiece

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Details Of Resistors (AREA)

Description

合金電阻器之製法
本發明係有關一種被動元件之製法,尤指一種合金電阻器之製法。
一般傳統電阻器係如兩端設有銲接引線之陶瓷電阻器,其後,不同型式之表面黏著型晶片電阻器則以厚膜印刷製程予以製造,其主要係在選定之陶瓷基板上經過一序列之印刷、雷射修整、銅端極、電鍍製程在該陶瓷基板上形成所需之電阻器。
此外,尚有目前廣泛使用之合金電阻器。然而,如第3圖所示,以傳統厚膜印刷製程技術製造合金電阻器時,因印刷製程技術有方向性的限制,若不注意,很容易在印刷絕緣層36時無法形成環形包覆合金電阻單元32之絕緣覆膜區323的絕緣層36,而使產品良率下降。
為解決前述問題,則有提出以噴塗方式形成絕緣層的方法,然而噴塗法所形成的絕緣層表面若不均勻或工件構造上有死角時,將會影響表面接著之進行,此外,噴塗法因塗料的閃火點較低,在周圍環境的溫度控制上必須特別留意,製程上有風險的考量,加上粉末的乾躁程度及粉塵量的控制也是影響產品品質的主要變因。其次,亦有以壓模成型的方式形成如環氧樹脂的絕緣層,但欲符合各種外型之合金電阻器需求時,則需另外製作模具,而模具流道殘留的多餘環氧樹脂常因此附著於工件上,必須另外剔 除,因此在加工的工時及治具設備支出,亦造成製程上的不便及成本優勢的降低。
因此,在現有之製程下,如何提供一種簡便、快速且能得到具有平整絕緣層表面之合金電阻器的製法,乃成業界一亟待解決之課題。
有鑑於此,本發明即在提供一種具有平整絕緣層表面之合金電阻器。
本發明提供一種合金電阻器之製法,係包括:準備一合金材料,該合金片材包括複數個彼此間隔且貫穿該合金片材之開口、以及複數個位於該相鄰開口間之合金電阻單元,各該合金電阻單元具有一絕緣覆膜區及位於該絕緣覆膜區兩側之電極端;藉由電著塗裝(electrodeposition)於該合金電阻單元之絕緣覆膜區表面形成絕緣層;切割該合金片材,以得到經分離的合金電阻單元;以及於該合金電阻單元之電極端上形成導電接著材料。
於前述之製法中,係以沖壓方式形成該開口,且該絕緣層之製法係包括在該合金片材表面形成一外露該合金電阻單元之絕緣覆膜區之鍍覆阻層;藉由電著塗裝形成該絕緣層;以及移除該鍍覆阻層。
此外,前述合金電阻器之製法復可包括在形成該絕緣層後,於該電極端形成如銅之導電層;或者以滾鍍方式形成導電層。又,前揭製法中,該導電接著材料係選自包含鎳或錫之材質。
本發明藉由在合金片材上形成複數個彼此間隔且貫穿該合金片材之開口,且該開口側邊之合金片材係藉由電著塗裝技術包覆一環形絕緣層,所得之絕緣層係由帶正或負離子的塗料所形成,因此可得到表面平坦的絕緣層。
以下藉由特定之具體實施例詳細說明本發明之技術內容及實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明的優點及功效。本發明亦可藉由其它不同的具體實施例加以施行或應用,本說明書中的各項細節亦可基於不同觀點與應用,在不悖離本發明之精神下進行各種修飾與變更。
須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如“上、下”、“內、外”、“一”及“底部”等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。
第一具體實施例
請參閱第1A至1E圖,係為本發明合金電阻器製法之 一項實施例的剖視圖。
如第1A圖所示,準備一合金片材1,係可為例如鎳、鉻、錳、鋁或銅等合金材質之扁平狀片體或帶狀材料,該合金片材1係包括:複數個彼此間隔且貫穿該合金片材1之開口10;以及複數個位於該相鄰開口10間之合金電阻單元12,各該合金電阻單元12具有一絕緣覆膜區121及位於該絕緣覆膜區121兩側之電極端123。通常,前述合金片材1之開口10係由沖壓方式形成。
如第1B圖所示,於該合金電阻單元12之絕緣覆膜區121表面藉由電著塗裝形成絕緣層16。具體而言,該絕緣層16之製法係包括:在該合金片材1表面形成一外露該合金電阻單元12之絕緣覆膜區121之鍍覆阻層18;將該合金片材1置於一容納有帶正離子或負離子之塗料的槽體(未圖示)中並予以通電,接著藉由槽體中之帶正離子或負離子之塗料附著於絕緣覆膜區121表面以形成該絕緣層16;以及移除該鍍覆阻層18,如第1C圖所示。由於電著塗裝技術係使帶正離子或負離子之塗料形成於待附著表面,因此,沒有印刷法具有方向性的缺點,亦無噴塗法膜層不均勻的問題。另外,根據不同需求,可變化鍍覆阻層18的圖案,例如,亦外露合金電阻單元12之兩電極端123的部份,使得塗料得以覆蓋部分電極端123。亦即所形成的絕緣層16可自絕緣覆膜區121延伸至部分電極端123。
復參閱第1C及1D圖,沿著分離線15切割該合金片材1,以得到經分離的合金電阻單元12。
最後,於該合金電阻單元12之電極端123上形成導電接著材料19,即可得到本發明之合金電阻器,其中,該導電接著材料19係選自包含鎳或錫之材質,且該導電接著材料19係如第1E圖完全包覆該電極端123表面,亦可僅形成於單一側面上,以供該合金電阻器接置於其他電性裝置上,例如電路板上。
此外,前述合金電阻器之製法復可包括在形成該絕緣層後,於該電極端形成如銅之導電層。
此外,前述於電極端銅導電層之形成,亦可在合金電阻單元分離後,以滾鍍方式形成。
第二具體實施例
如第2A至2C圖所示,係顯示本發明合金電阻器製法之第二實施例的示意圖,在本實施例中,該合金片材1’之合金電阻單元12係陣列式交錯地排列,且復包括連接部14,係一體連接相鄰兩合金電阻單元12之電極端123,詳言之,該連接部14係連接於一合金電阻單元12之後電極端123及另一合金電阻單元12之前電極端123。此外,於分離合金電阻單元12,只要切割該連接部14即可得到分離的合金電阻單元12。
本發明藉由在合金片材上形成複數個彼此間隔且貫穿該合金片材之開口,且該開口側邊之合金片材係藉由電著塗裝技術包覆一環形絕緣層,所得之絕緣層係由帶正或負離子的塗料所形成,因此可得到表面平坦的絕緣層。該電著塗裝機制係將電著塗料分散於水中,通電時塗料將沉 積於絕緣覆膜區表面上,而形成均勻非水溶性之絕緣層。電著塗裝的優勢在於藉由通電電壓的調整將能獲得均勻的塗膜,加上塗膜含水量及溶劑量較少,所以能形成良好的塗面而不會產生氣泡或空洞,並且由於液態塗料的高滲透力,採用電著塗裝能將絕緣層塗佈至一般噴塗方式達不到的部位,可提昇工件整體的耐蝕性。再者,電著塗裝的塗料與水稀釋後所含的溶劑量極低,所以不易著火。再者,採用電著塗裝加工工件時塗料損失小,粉塵量因此稀少,對環境的污染程度相對地也大為降低。
上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。
1、1’‧‧‧合金片材
10‧‧‧開口
12‧‧‧合金電阻單元
121‧‧‧絕緣覆膜區
123‧‧‧電極端
14‧‧‧連接部
15‧‧‧分離線
16‧‧‧絕緣層
18‧‧‧鍍覆阻層
19‧‧‧導電接著材料
32‧‧‧合金電阻單元
36‧‧‧絕緣層
323‧‧‧絕緣覆膜區
第1A至1E圖係顯示本發明合金電阻器之製法的示意圖;第2A至2C圖係顯示本發明合金電阻器之製法之第二實施例的示意圖;以及第3圖係顯示習知技術形成絕緣層的方法示意圖。
1‧‧‧合金片材
12‧‧‧合金電阻單元
121‧‧‧絕緣覆膜區
123‧‧‧電極端
16‧‧‧絕緣層
18‧‧‧阻層

Claims (9)

  1. 一種合金電阻器之製法,係包括:準備一合金片材,該合金片材包括複數個彼此間隔且貫穿該合金片材之開口、以及複數個位於該相鄰開口間之合金電阻單元,各該合金電阻單元具有一絕緣覆膜區及位於該絕緣覆膜區兩側之電極端;於該合金電阻單元之絕緣覆膜區表面藉由電著塗裝形成絕緣層;切割該合金片材,以得到經分離的合金電阻單元;以及於該合金電阻單元之電極端上形成導電接著材料。
  2. 如申請專利範圍第1項所述之合金電阻器之製法,其中,該開口係以沖壓方式形成。
  3. 如申請專利範圍第1項所述之合金電阻器之製法,其中,該絕緣層之製法係包括:在該合金片材表面形成一外露該合金電阻單元之絕緣覆膜區之鍍覆阻層;藉由電著塗裝形成該絕緣層;以及移除該鍍覆阻層。
  4. 如申請專利範圍第1項所述之合金電阻器之製法,其中,該導電接著材料係選自包含鎳或錫之材質。
  5. 如申請專利範圍第1項所述之合金電阻器之製法,其中,在形成該絕緣層後,復於該電極端形成導電層。
  6. 如申請專利範圍第5項所述之合金電阻器之製法,其中,該導電層為銅。
  7. 如申請專利範圍第1項所述之合金電阻器之製法,復包括在分離該合金電阻單元後,復以滾鍍方式於該電極端形成導電層。
  8. 如申請專利範圍第7項所述之合金電阻器之製法,其中,該導電層為銅。
  9. 如申請專利範圍第1項所述之合金電阻器之製法,該合金片材復包括連接部,係一體連接相鄰兩合金電阻單元之電極端。
TW99121785A 2010-07-02 2010-07-02 The method of alloy resistor TWI473121B (zh)

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TW99121785A TWI473121B (zh) 2010-07-02 2010-07-02 The method of alloy resistor
US12/873,827 US8590140B2 (en) 2010-07-02 2010-09-01 Method for manufacturing alloy resistor

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TWI473121B true TWI473121B (zh) 2015-02-11

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TWI490889B (zh) * 2013-08-26 2015-07-01 Hung Ju Cheng 合金晶片電阻器製造方法
CN109166680B (zh) * 2018-09-29 2024-01-30 江苏聚永昶电子科技有限公司 用于合金电阻的生产加工系统
CN117226098B (zh) * 2023-11-10 2024-03-01 国邦电子科技(江苏)有限公司 一种基于合金电阻的切粒顶出装置及其操作工艺

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US4792781A (en) * 1986-02-21 1988-12-20 Tdk Corporation Chip-type resistor
US20100039211A1 (en) * 2008-08-13 2010-02-18 Chung-Hsiung Wang Resistive component and method of manufacturing the same
US7667568B2 (en) * 2004-03-24 2010-02-23 Rohm Co., Ltd. Chip resistor and manufacturing method thereof

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US4792781A (en) * 1986-02-21 1988-12-20 Tdk Corporation Chip-type resistor
US7667568B2 (en) * 2004-03-24 2010-02-23 Rohm Co., Ltd. Chip resistor and manufacturing method thereof
US20100039211A1 (en) * 2008-08-13 2010-02-18 Chung-Hsiung Wang Resistive component and method of manufacturing the same

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