TWI469177B - 用於帶電粒子束的鏡片系統、裝置及方法 - Google Patents

用於帶電粒子束的鏡片系統、裝置及方法 Download PDF

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Publication number
TWI469177B
TWI469177B TW100128385A TW100128385A TWI469177B TW I469177 B TWI469177 B TW I469177B TW 100128385 A TW100128385 A TW 100128385A TW 100128385 A TW100128385 A TW 100128385A TW I469177 B TWI469177 B TW I469177B
Authority
TW
Taiwan
Prior art keywords
lens
openings
lens system
charged particle
coil
Prior art date
Application number
TW100128385A
Other languages
English (en)
Chinese (zh)
Other versions
TW201214499A (en
Inventor
藍奕歐史戴分
Original Assignee
Ｉｃｔ積體電路測試股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ｉｃｔ積體電路測試股份有限公司 filed Critical Ｉｃｔ積體電路測試股份有限公司
Publication of TW201214499A publication Critical patent/TW201214499A/zh
Application granted granted Critical
Publication of TWI469177B publication Critical patent/TWI469177B/zh

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0451—Diaphragms with fixed aperture
    • H01J2237/0453—Diaphragms with fixed aperture multiple apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H01J2237/04922—Lens systems electromagnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/14—Lenses magnetic
    • H01J2237/1405—Constructional details
    • H01J2237/141—Coils

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
TW100128385A 2010-08-11 2011-08-09 用於帶電粒子束的鏡片系統、裝置及方法 TWI469177B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP10172528A EP2418672B1 (en) 2010-08-11 2010-08-11 Multi-axis lens, beam system making use of the compound lens, and method of manufacturing the compound lens

Publications (2)

Publication Number Publication Date
TW201214499A TW201214499A (en) 2012-04-01
TWI469177B true TWI469177B (zh) 2015-01-11

Family

ID=43648718

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100128385A TWI469177B (zh) 2010-08-11 2011-08-09 用於帶電粒子束的鏡片系統、裝置及方法

Country Status (5)

Country Link
US (1) US8481958B2 (https=)
EP (1) EP2418672B1 (https=)
JP (1) JP5685503B2 (https=)
KR (1) KR101854813B1 (https=)
TW (1) TWI469177B (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9341936B2 (en) 2008-09-01 2016-05-17 D2S, Inc. Method and system for forming a pattern on a reticle using charged particle beam lithography
JP2015511069A (ja) 2012-03-19 2015-04-13 ケーエルエー−テンカー コーポレイション 柱で支持されたマイクロ電子レンズアレイ
US9343267B2 (en) 2012-04-18 2016-05-17 D2S, Inc. Method and system for dimensional uniformity using charged particle beam lithography
KR102154105B1 (ko) 2012-04-18 2020-09-09 디2에스, 인코포레이티드 하전 입자 빔 리소그라피를 이용하여 패턴들을 형성하기 위한 방법 및 시스템
JP5667618B2 (ja) * 2012-12-14 2015-02-12 株式会社アドバンテスト 電磁レンズ及び電子ビーム露光装置
US9824851B2 (en) * 2013-01-20 2017-11-21 William M. Tong Charge drain coating for electron-optical MEMS
US10347460B2 (en) 2017-03-01 2019-07-09 Dongfang Jingyuan Electron Limited Patterned substrate imaging using multiple electron beams
DE102017205231B3 (de) * 2017-03-28 2018-08-09 Carl Zeiss Microscopy Gmbh Teilchenoptische Vorrichtung und Teilchenstrahlsystem
KR20240055162A (ko) * 2018-11-16 2024-04-26 에이에스엠엘 네델란즈 비.브이. 전자기 복합 렌즈 및 이러한 렌즈를 갖는 하전 입자 광학 시스템
DE102019004124B4 (de) * 2019-06-13 2024-03-21 Carl Zeiss Multisem Gmbh Teilchenstrahl-System zur azimutalen Ablenkung von Einzel-Teilchenstrahlen sowie seine Verwendung und Verfahren zur Azimut-Korrektur bei einem Teilchenstrahl-System

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4209702A (en) * 1977-07-25 1980-06-24 Kabushiki Kaisha Akashi Seisakusho Multiple electron lens
TW439095B (en) * 1998-03-31 2001-06-07 Applied Materials Inc Use of variable impedance having rotating core to control coil sputter distribution
US20030001095A1 (en) * 2001-07-02 2003-01-02 Schlumberger Technologies, Inc. Method and apparatus for multiple charged particle beams
CN1672233A (zh) * 2002-05-22 2005-09-21 应用材料股份有限公司 一种带电粒子束柱体部及其导引方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5116754B1 (https=) 1970-03-04 1976-05-27
JPS4929089B1 (https=) * 1970-05-13 1974-08-01
EP1956631B1 (en) 2002-12-17 2012-06-20 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Lens system for a plurality of charged particle beams
DE602004026463D1 (de) * 2004-12-30 2010-05-20 Integrated Circuit Testing Mehrfach-Linsenanordnung und Teilchenstrahlgerät mit selbiger

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4209702A (en) * 1977-07-25 1980-06-24 Kabushiki Kaisha Akashi Seisakusho Multiple electron lens
TW439095B (en) * 1998-03-31 2001-06-07 Applied Materials Inc Use of variable impedance having rotating core to control coil sputter distribution
US20030001095A1 (en) * 2001-07-02 2003-01-02 Schlumberger Technologies, Inc. Method and apparatus for multiple charged particle beams
CN1672233A (zh) * 2002-05-22 2005-09-21 应用材料股份有限公司 一种带电粒子束柱体部及其导引方法

Also Published As

Publication number Publication date
JP5685503B2 (ja) 2015-03-18
KR20120022620A (ko) 2012-03-12
EP2418672A1 (en) 2012-02-15
TW201214499A (en) 2012-04-01
KR101854813B1 (ko) 2018-05-08
EP2418672B1 (en) 2013-03-20
US8481958B2 (en) 2013-07-09
US20120037813A1 (en) 2012-02-16
JP2012038732A (ja) 2012-02-23

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