TWI461504B - Adhesive sheet for mold fixing, adhesive tape for mold fixing, and manufacturing method of fine structure - Google Patents
Adhesive sheet for mold fixing, adhesive tape for mold fixing, and manufacturing method of fine structure Download PDFInfo
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- TWI461504B TWI461504B TW098138020A TW98138020A TWI461504B TW I461504 B TWI461504 B TW I461504B TW 098138020 A TW098138020 A TW 098138020A TW 98138020 A TW98138020 A TW 98138020A TW I461504 B TWI461504 B TW I461504B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/30—Mounting, exchanging or centering
- B29C33/305—Mounting of moulds or mould support plates
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
- B29C2059/023—Microembossing
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/10—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet
- C09J2301/12—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers
- C09J2301/124—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers the adhesive layer being present on both sides of the carrier, e.g. double-sided adhesive tape
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2433/00—Presence of (meth)acrylic polymer
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Description
本發明係有關一種將壓印微影術(imprint lithography)中所使用之模具予以固定之黏著片及黏著帶、以及微細構造之製造方法。The present invention relates to an adhesive sheet and an adhesive tape for fixing a mold used in imprint lithography, and a method for producing a fine structure.
最近,可有效率地於基板表面形成微細圖案而提高生產量(throughput)之壓印微影術係受到注目。壓印微影術係於基板表面形成由硬化性樹脂組成物所構成之被膜,並以模具將此被膜表面加壓,而將模具之微細圖案轉印,並使經轉印微細圖案之被膜硬化,而於基板表面形成微細圖案之方法(例如:參照非專利文獻1)。Recently, an imprint lithography system which can efficiently form a fine pattern on the surface of a substrate to increase throughput has been attracting attention. The lithography method forms a film composed of a curable resin composition on the surface of the substrate, presses the surface of the film with a mold, transfers the fine pattern of the mold, and hardens the film of the transferred fine pattern. A method of forming a fine pattern on the surface of the substrate (for example, see Non-Patent Document 1).
由於由壓印微影術所形成之微細圖案係對應於所使用之模具之微細圖案,故在壓印微影術中模具之重要性相當高。模具通常係在經真空夾吸盤(vacuum chuck)或機械式夾頭(mechanical chuck)等夾具(jig)固定在台座之狀態下使用。Since the fine pattern formed by the lithography corresponds to the fine pattern of the mold used, the importance of the mold in the imprint lithography is quite high. The mold is usually used in a state where it is fixed to the pedestal by a jig such as a vacuum chuck or a mechanical chuck.
然而,為了將真空夾吸盤機構設置於台座,必須對該台座實施微細加工,而有成本會增加之問題。此外,若以機械式夾頭固定模具外周部,則會因其本身重量而在模具中央部發生撓曲,而有無法確保模具之表面平滑性之問題。以表面不平滑之模具進行壓印微影術,也無法得到充分的轉印精度。此問題係在面積大的模具中相當顯著。However, in order to set the vacuum chucking mechanism to the pedestal, it is necessary to perform microfabrication on the pedestal, which has a problem of an increase in cost. Further, when the outer peripheral portion of the mold is fixed by a mechanical chuck, the center portion of the mold is deflected by its own weight, and there is a problem that the surface smoothness of the mold cannot be ensured. Imprint lithography with a mold with a smooth surface does not provide sufficient transfer accuracy. This problem is quite significant in large molds.
另一方面,考慮若採用黏著片或黏著帶取代真空夾吸盤或機械式夾頭等夾具來做為模具之固定手段,則應可解決前述夾具所造成之問題。On the other hand, it is considered that if an adhesive sheet or an adhesive tape is used instead of a vacuum chuck or a mechanical chuck as a fixing means for the mold, the problem caused by the above clamp should be solved.
然而,由一般的丙烯酸系黏著劑所構成之黏著片或黏著帶係有下述問題。換言之,當採用例如UV硬化性樹脂組成物做為前述硬化性樹脂組成物時,通常是在照射UV使被膜硬化後,從該硬化被膜將模具垂直剝離。然而,由於若使被膜硬化,則難以將模具剝離,故在進行前述垂直剝離時會對前述黏著片或黏著帶施加較大的負載。一般的黏著片及黏著帶係對於模具之固定力不足,若受到前述負載,則模具會從黏著片或黏著帶脫落。此外,由於一般的黏著片及黏著帶係無法重複使用,故經濟性低。However, an adhesive sheet or an adhesive tape composed of a general acrylic adhesive has the following problems. In other words, when a UV curable resin composition is used as the curable resin composition, for example, after the film is cured by UV irradiation, the mold is vertically peeled off from the cured film. However, if the film is hardened, it is difficult to peel the mold, so that a large load is applied to the above-mentioned adhesive sheet or the adhesive tape during the vertical peeling. Generally, the adhesive sheet and the adhesive tape have insufficient fixing force to the mold, and if the load is applied, the mold will fall off from the adhesive sheet or the adhesive tape. In addition, since the general adhesive sheet and the adhesive tape system cannot be reused, the economy is low.
[非專利文獻1]松井真二,「奈米壓印微影技術」,表面科學,Vol25,No.10,pp628-634,2004[Non-Patent Document 1] Matsui Shinji, "Nano Imprinting Micro-Film Technology", Surface Science, Vol25, No. 10, pp628-634, 2004
本發明之課題係提供一種可將模具在確保其表面平滑性之狀態下以高固定力固定之模具固定用黏著片及模具固定用黏著帶、以及微細構造之製造方法。An object of the present invention is to provide an adhesive sheet for mold fixing, an adhesive tape for mold fixing, and a method for producing a fine structure in which a mold can be fixed with a high fixing force while ensuring smoothness of the surface.
本發明之模具固定用黏著片係含有側鏈結晶性聚合物做為主成分。前述側鏈結晶性聚合物係在未達融點之溫度結晶化,且在前述融點以上之溫度顯示流動性,並且在前述融點+10℃之儲存彈性模數G’為1×102 至1×105 Pa。The adhesive sheet for mold fixing of the present invention contains a side chain crystalline polymer as a main component. The side chain crystalline polymer is crystallized at a temperature at which the melting point is not reached, and exhibits fluidity at a temperature above the melting point, and the storage elastic modulus G' at the melting point + 10 ° C is 1 × 10 2 Up to 1 × 10 5 Pa.
本發明之模具固定用黏著帶係於基材薄膜之兩面設置黏著劑層而成,且至少模具側之黏著劑層係由前述模具固定用黏著片所構成。The adhesive tape for mold fixing of the present invention is formed by providing an adhesive layer on both surfaces of a base film, and at least the adhesive layer on the side of the mold is composed of the above-mentioned adhesive sheet for mold fixing.
本發明之微細構造之製造方法係使用前述模具固定用黏著片,並且包括下述(i)至(iv)之步驟:The manufacturing method of the fine structure of the present invention uses the aforementioned adhesive sheet for mold fixing, and includes the following steps (i) to (iv):
(i) 使前述黏著片介置於模具與台座之間之步驟;(i) the step of interposing the aforementioned adhesive sheet between the mold and the pedestal;
(ii)在令前述黏著片之溫度成為前述側鏈結晶性聚合物之融點以上之溫度後,令溫度成為未達前述融點之溫度,經由該黏著片而將前述模具固定在台座之步驟;(ii) a step of fixing the mold to the pedestal via the adhesive sheet after the temperature of the adhesive sheet is equal to or higher than the melting point of the side chain crystalline polymer, and the temperature is not at the temperature of the melting point ;
(iii)以經固定之模具將由硬化性樹脂組成物所構成之被膜之表面加壓,而將模具之微細圖案轉印之步驟;以及(iii) a step of pressurizing the surface of the film composed of the curable resin composition by a fixed mold to transfer the fine pattern of the mold;
(iv)使經轉印微細圖案之被膜硬化而得到微細構造之步驟。(iv) a step of curing the film of the transferred fine pattern to obtain a fine structure.
再者,本發明中之前述「片」,並非僅限於片狀,只要不損及本發明之效果,即包含片(sheet)狀或膜(film)狀之概念。Further, the "sheet" in the present invention is not limited to a sheet shape, and the concept of a sheet shape or a film shape is not included as long as the effect of the present invention is not impaired.
根據本發明,由於以黏著片或黏著帶將模具固定在台座上,故無須如以往般將台座加工,因此可降低成本,並可將模具在確保其表面平滑性之狀態下固定在台座上。According to the present invention, since the mold is fixed to the pedestal by the adhesive sheet or the adhesive tape, the pedestal does not need to be processed as in the prior art, so that the cost can be reduced, and the mold can be fixed to the pedestal while ensuring the smoothness of the surface.
而且,本發明之黏著片或黏著帶之黏著劑層係會對應於溫度變化而可逆性地成為結晶狀態與流動狀態,且含有流動狀態下之儲存彈性模數G’具有特定值之側鏈結晶性聚合物做為主成分。由於此側鏈結晶性聚合物係在流動狀態下顯示高流動性,故以該側鏈結晶性聚合物做為主成分之前述黏著片或黏著帶會良好地滲入存在於模具或台座之表面之微細的凹凸或空隙內,而可在從流動狀態變成結晶狀態之過程中顯現所謂定錨效應(anchor effect),得到高固定力。因此,若藉由前述黏著片或黏著帶,則即使在從硬化被膜將模具垂直剝離之過程中受到較大的負載,也可抑制模具脫落。並且,前述黏著片或黏著帶由於為利用側鏈結晶性聚合物之相變化者,故可重複使用。Further, the adhesive layer of the adhesive sheet or the adhesive tape of the present invention reversibly becomes a crystalline state and a flowing state corresponding to a temperature change, and contains a side chain crystal having a specific value in a storage elastic modulus G' in a flowing state. The polymer is the main component. Since the side chain crystalline polymer exhibits high fluidity in a flowing state, the aforementioned adhesive sheet or adhesive tape containing the side chain crystalline polymer as a main component penetrates well on the surface of the mold or the pedestal. The fine concavities and convexities or voids can exhibit a so-called anchor effect in the process of changing from a flowing state to a crystalline state, resulting in a high fixing force. Therefore, if the adhesive sheet or the adhesive tape is used, even if a large load is applied during the process of vertically peeling the mold from the hardened film, the mold can be prevented from falling off. Further, since the adhesive sheet or the adhesive tape is a phase changer using a side chain crystalline polymer, it can be reused.
本發明之模具固定用黏著片(以下有時稱為「黏著片」)係含有側鏈結晶性聚合物做為主成分。前述側鏈結晶性聚合物係在未達融點之溫度結晶化,且在融點以上之溫度進行相轉移而顯示流動性。換言之,前述側鏈結晶性聚合物係會對應於溫度變化而可逆性地成為結晶狀態與流動狀態。The adhesive sheet for mold fixing of the present invention (hereinafter sometimes referred to as "adhesive sheet") contains a side chain crystalline polymer as a main component. The side chain crystalline polymer is crystallized at a temperature not at the melting point, and undergoes phase transfer at a temperature equal to or higher than the melting point to exhibit fluidity. In other words, the side chain crystalline polymer is reversibly in a crystalline state and a flowing state in response to a change in temperature.
前述側鏈結晶性聚合物係在前述融點+10℃之儲存彈性模數G’為1×102 至1×105 Pa,且以2×102 至9×104 Pa為佳。藉此,流動狀態下之側鏈結晶性聚合物會顯示高流動性,而含有該側鏈結晶性聚合物做為主成分之前述黏著片也會顯示高流動性。結果,前述黏著片會無縫隙地滲入存在於模具或台座之表面之微細的凹凸或空隙內。由於若將此狀態之黏著片冷卻至未達前述融點之溫度,則前述側鏈結晶性聚合物會因結晶化而顯現定錨效應,故可得到高固定力。The side chain crystalline polymer has a storage elastic modulus G' of from 1 × 10 2 to 1 × 10 5 Pa at a melting point of +10 ° C, and preferably 2 × 10 2 to 9 × 10 4 Pa. Thereby, the side chain crystalline polymer in a flowing state exhibits high fluidity, and the aforementioned adhesive sheet containing the side chain crystalline polymer as a main component also exhibits high fluidity. As a result, the above-mentioned adhesive sheet penetrates seamlessly into fine irregularities or voids existing on the surface of the mold or the pedestal. When the adhesive sheet in this state is cooled to a temperature that does not reach the melting point, the side chain crystalline polymer exhibits a anchoring effect due to crystallization, so that a high fixing force can be obtained.
另一方面,若在前述融點+10℃之儲存彈性模數G’小於1×102 Pa,則黏著片之凝聚力會降低,而固定力也隨之降低。此外,由於若前述儲存彈性模數G’大於1×105 Pa,則側鏈結晶性聚合物之流動性會降低,故難以得到前述定錨效應,而使固定力降低。On the other hand, if the storage elastic modulus G' at the melting point + 10 ° C is less than 1 × 10 2 Pa, the cohesive force of the adhesive sheet is lowered, and the fixing force is also lowered. Further, when the storage elastic modulus G' is more than 1 × 10 5 Pa, the fluidity of the side chain crystalline polymer is lowered, so that it is difficult to obtain the anchoring effect and the fixing force is lowered.
前述側鏈結晶性聚合物以在前述融點-10℃之儲存彈性模數G’為1×105 至1×109 Pa為佳、以1×106 至1×108 Pa較佳。藉此,可確保用以使前述定錨效應顯現所需的彈性。此外,由於結晶狀態下之側鏈結晶性聚合物會具有適度的彈性,故前述黏著片可發揮做為緩衝材之機能。因此,可追隨基板之彎曲或微小凸起等,而可防止轉印不良。The side chain crystalline polymer preferably has a storage elastic modulus G' at the melting point of -10 ° C of from 1 × 10 5 to 1 × 10 9 Pa, preferably from 1 × 10 6 to 1 × 10 8 Pa. Thereby, the elasticity required to visualize the aforementioned anchoring effect can be ensured. Further, since the side chain crystalline polymer in the crystalline state has moderate elasticity, the above-mentioned adhesive sheet can function as a cushioning material. Therefore, it is possible to follow the bending or the micro bumps of the substrate, and the transfer failure can be prevented.
另一方面,若在前述融點-10℃之儲存彈性模數G’過小,則結晶狀態下之側鏈結晶性聚合物之彈性會不足,而有難以得到前述定錨效應之虞。此外,若前述儲存彈性模數G’過大,則黏著片難以發揮做為緩衝材之機能,故不佳。前述儲存彈性模數G’係如後述之合成例中所記載,係以動態黏彈性測定裝置測定而得之值。On the other hand, if the storage elastic modulus G' at the melting point of -10 ° C is too small, the elasticity of the side chain crystalline polymer in the crystal state may be insufficient, and it may be difficult to obtain the anchoring effect. Further, if the storage elastic modulus G' is too large, it is difficult for the adhesive sheet to function as a cushioning material, which is not preferable. The storage elastic modulus G' is a value measured by a dynamic viscoelasticity measuring device as described in the synthesis example described later.
在此,側鏈結晶性聚合物之前述融點,係意指藉由某種平衡程序而使最初整合成有秩序之某種排列的聚合物的特定部分成為無秩序狀態之溫度,係藉由示差掃描熱量計(DSC)在10℃/分鐘之測定條件下測得之值。Here, the aforementioned melting point of the side chain crystalline polymer means a temperature at which a specific portion of the polymer which is initially integrated into an orderly arrangement is disordered by a certain balancing procedure, by means of the difference The value measured by a scanning calorimeter (DSC) under the measurement conditions of 10 ° C / min.
前述融點以30至70℃為佳、以30至60℃較佳。若前述融點過低,則在進行模具固定時之環境溫度變化而使溫度上升時,環境溫度容易超過前述融點,使側鏈結晶性聚合物顯示流動性,因此固定力降低,而有模具會從黏著片脫落之虞。此外,若前述融點過高,則為了使側鏈結晶性聚合物成為流動狀態而需要大量的熱能,因而在經濟性上為不利。The above melting point is preferably 30 to 70 ° C and preferably 30 to 60 ° C. When the melting point is too low, when the temperature changes when the mold is fixed and the temperature rises, the ambient temperature easily exceeds the melting point, and the side chain crystalline polymer exhibits fluidity, so that the fixing force is lowered and the mold is lowered. Will fall off the adhesive sheet. Further, when the melting point is too high, a large amount of thermal energy is required in order to bring the side chain crystalline polymer into a flowing state, which is disadvantageous in terms of economy.
若欲令前述儲存彈性模數G’及融點成為特定值,係可經由改變側鏈結晶性聚合物之組成或分子量等來任意進行。前述側鏈結晶性聚合物之組成可舉例如:使具有碳數16以上之直鏈狀烷基之(甲基)丙烯酸酯20至100重量份、具有碳數1至6之烷基之(甲基)丙烯酸酯0至70重量份、以及極性單體0至10重量份聚合而得之聚合物等。When the storage elastic modulus G' and the melting point are to be specific values, the composition or molecular weight of the side chain crystalline polymer can be arbitrarily changed. The composition of the above-mentioned side chain crystalline polymer may be, for example, 20 to 100 parts by weight of a (meth) acrylate having a linear alkyl group having 16 or more carbon atoms, and an alkyl group having 1 to 6 carbon atoms. a polymer obtained by polymerizing 0 to 70 parts by weight of an acrylate and 0 to 10 parts by weight of a polar monomer.
前述具有碳數16以上之直鏈狀烷基之(甲基)丙烯酸酯可舉例如:(甲基)丙烯酸鯨蠟酯、(甲基)丙烯酸硬脂酯、(甲基)丙烯酸二十烷酯、(甲基)丙烯酸二十二烷酯等具有碳數16至22之線狀烷基之(甲基)丙烯酸酯,前述具有碳數1至6之烷基之(甲基)丙烯酸酯可舉例如:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸己酯等,前述極性單體可舉例如:丙烯酸、甲基丙烯酸、巴豆酸、伊康酸、馬來酸、富馬酸等含有羧基之乙烯不飽和單體;(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸2-羥基己酯等具有羥基之乙烯不飽和單體,此等可使用1種或混合2種以上使用。The (meth) acrylate having a linear alkyl group having 16 or more carbon atoms may, for example, be cetyl (meth) acrylate, stearyl (meth) acrylate or eicosyl (meth) acrylate. (meth) acrylate having a linear alkyl group having 16 to 22 carbon atoms such as behenyl (meth) acrylate, and the (meth) acrylate having an alkyl group having 1 to 6 carbon atoms can be exemplified For example, methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, hexyl (meth)acrylate, etc., and the polar monomer may, for example, be acrylic acid, methacrylic acid or croton. Ethylene-unsaturated monomer containing carboxyl group such as acid, itaconic acid, maleic acid or fumaric acid; 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, (meth)acrylic acid Ethylene-unsaturated monomers having a hydroxyl group such as 2-hydroxyhexyl ester may be used alone or in combination of two or more.
上述所例示之單體中,具有碳數16以上之直鏈狀烷基之(甲基)丙烯酸酯係對前述儲存彈性模數G’及融點造成之影響相當大。若大量使用該(甲基)丙烯酸酯中之具有碳數低之直鏈狀烷基之(甲基)丙烯酸酯,則有前述儲存彈性模數G’及融點容易成為前述之特定值之傾向。具體而言,宜以30重量份以上、較佳為30至40重量份之比例使用具有碳數16至18之直鏈狀烷基之(甲基)丙烯酸酯。具體例可舉例如:使丙烯酸二十二烷酯5至15重量份、丙烯酸硬脂酯30至40重量份、丙烯酸甲酯45至55重量份、以及丙烯酸0至10重量份聚合而得之共聚物等。Among the monomers exemplified above, the (meth) acrylate having a linear alkyl group having 16 or more carbon atoms has a considerable influence on the storage elastic modulus G' and the melting point. When a (meth) acrylate having a linear carbon group having a low carbon number among the (meth) acrylate is used in a large amount, the storage elastic modulus G′ and the melting point tend to be the specific values described above. . Specifically, it is preferred to use a (meth) acrylate having a linear alkyl group having 16 to 18 carbon atoms in a proportion of 30 parts by weight or more, preferably 30 to 40 parts by weight. Specific examples include copolymerization of 5 to 15 parts by weight of behenyl acrylate, 30 to 40 parts by weight of stearyl acrylate, 45 to 55 parts by weight of methyl acrylate, and 0 to 10 parts by weight of acrylic acid. Things and so on.
此外,在具有碳數1至6之烷基之(甲基)丙烯酸酯中,若使用丙烯酸丁酯,則有前述儲存彈性模數G’及融點容易成為前述之特定值之傾向。具體例可舉例如:使丙烯酸二十二烷酯40至50重量份、丙烯酸丁酯45至55重量份、以及丙烯酸0至10重量份聚合而得之共聚物等。Further, in the (meth) acrylate having an alkyl group having 1 to 6 carbon atoms, when butyl acrylate is used, the storage elastic modulus G' and the melting point tend to be the specific values described above. Specific examples thereof include a copolymer obtained by polymerizing 40 to 50 parts by weight of behenyl acrylate, 45 to 55 parts by weight of butyl acrylate, and 0 to 10 parts by weight of acrylic acid.
聚合方法並無特別限定,可採用例如:溶液聚合法、塊狀聚合法、懸浮聚合法、乳化聚合法等。例如當採用溶液聚合法時,可經由依需要將前述所例示之單體與溶劑混合,並在40至90℃左右攪拌2至10小時左右,而使前述單體聚合。The polymerization method is not particularly limited, and examples thereof include a solution polymerization method, a bulk polymerization method, a suspension polymerization method, and an emulsion polymerization method. For example, when the solution polymerization method is employed, the monomer exemplified above may be mixed with a solvent and stirred at about 40 to 90 ° C for about 2 to 10 hours to polymerize the monomer.
前述側鏈結晶性聚合物之重量平均分子量以5,000以上為佳、以5,000至900,000較佳。若前述重量平均分子量過小或過大,則有前述儲存彈性模數G’及融點會脫離前述之特定值之範圍之虞。此外,若前述重量平均分子量過小,則有凝聚力降低且固定力降低之虞,若前述重量平均分子量過大,則有即使令黏著片成為前述融點以上之溫度,側鏈結晶性聚合物也難以顯示流動性之虞。前述重量平均分子量係以凝膠滲透層析法(GPC)測定側鏈結晶性聚合物後,將所得之測定值換算成聚苯乙烯而得之值。The weight average molecular weight of the side chain crystalline polymer is preferably 5,000 or more, more preferably 5,000 to 900,000. If the weight average molecular weight is too small or too large, the storage elastic modulus G' and the melting point may deviate from the above-mentioned specific values. In addition, when the weight average molecular weight is too small, the cohesive force is lowered and the fixing power is lowered. If the weight average molecular weight is too large, the side chain crystalline polymer is hard to be displayed even if the pressure-sensitive adhesive sheet has a temperature equal to or higher than the melting point. The shackles of liquidity. The weight average molecular weight is a value obtained by measuring a side chain crystalline polymer by gel permeation chromatography (GPC) and converting the obtained measured value into polystyrene.
前述黏著片之厚度以15至400μm為佳、以120至150μm較佳。若前述黏著片之厚度過薄,則有固定力降低之虞,並且也難以發揮做為緩衝材之機能,故不佳。此外,若前述黏著片之厚度過厚,則難以調製厚度均勻的黏著片,故不佳。The thickness of the aforementioned adhesive sheet is preferably 15 to 400 μm, more preferably 120 to 150 μm. If the thickness of the above-mentioned adhesive sheet is too thin, the fixing force is lowered, and it is also difficult to function as a cushioning material, which is not preferable. Further, if the thickness of the adhesive sheet is too thick, it is difficult to prepare an adhesive sheet having a uniform thickness, which is not preferable.
於前述黏著片之兩面,以設置經實施離型處理之薄膜、亦即離型薄膜為佳。前述離型薄膜可舉例如:於由聚對酞酸乙二酯等所構成之薄膜表面塗佈聚矽氧(silicone)等離型劑而成者。在黏著片之兩面設置離型薄膜時,只要例如將溶劑中添加有側鏈結晶性聚合物之塗佈液塗佈於離型薄膜上並使其乾燥而得到黏著片,並於此黏著片之表面配置離型薄膜即可。It is preferable to provide a film which is subjected to release treatment, that is, a release film, on both sides of the adhesive sheet. The release film may be, for example, a release coating agent such as a silicone on the surface of a film made of polyethylene terephthalate or the like. When a release film is provided on both surfaces of the adhesive sheet, for example, a coating liquid in which a side chain crystalline polymer is added to a solvent is applied onto the release film and dried to obtain an adhesive sheet, and the adhesive sheet is obtained thereon. The surface is provided with a release film.
在前述塗佈液中,可添加例如:交聯劑、增黏劑(tackifer)、可塑劑、抗老化劑、紫外線吸收劑等各種添加劑。前述塗佈一般可藉由刮刀塗佈器(knife coater)、輥塗佈器、壓延塗佈器(carlendar coater)、逗點式塗佈器(comma coater)等來進行。此外,依塗佈厚度和塗佈液之黏度,也可藉由凹版塗佈器、桿式塗佈器(rod coater)等來進行。再者,前述黏著片除了前述塗佈以外,也可經由例如擠壓成形、壓延加工而成形為片狀。Various additives such as a crosslinking agent, a tackifier, a plasticizer, an anti-aging agent, and an ultraviolet absorber may be added to the coating liquid. The above coating can be generally carried out by a knife coater, a roll coater, a carriage coater, a comma coater or the like. Further, depending on the coating thickness and the viscosity of the coating liquid, it may be carried out by a gravure coater, a rod coater or the like. Further, the pressure-sensitive adhesive sheet may be formed into a sheet shape by, for example, extrusion molding or calendering, in addition to the above coating.
本發明之模具固定用黏著帶(以下有時稱為「黏著帶」)係於基材薄膜之兩面設置黏著劑層而成,且至少模具側之黏著劑層係由前述之本發明之模具固定用黏著片所構成。藉此,可得到與前述之黏著片同樣的效果,並且因含有基材薄膜,故可得到剛性較黏著片更高且處理性也更優良之效果。The adhesive tape for mold fixing of the present invention (hereinafter sometimes referred to as "adhesive tape") is formed by providing an adhesive layer on both surfaces of a base film, and at least the adhesive layer on the mold side is fixed by the mold of the present invention described above. Made of adhesive sheets. Thereby, the same effect as the above-mentioned adhesive sheet can be obtained, and since the base film is contained, the effect of being higher in rigidity than the adhesive sheet and more excellent in handleability can be obtained.
前述基材薄膜可舉例如:聚乙烯、聚對酞酸乙二酯、聚丙烯、聚酯、聚醯胺、聚醯亞胺、聚碳酸酯、乙烯-乙酸乙烯酯共聚物、乙烯-丙烯酸乙酯共聚物、乙烯-聚丙烯共聚物、聚氯乙烯等合成樹脂薄膜。The foregoing substrate film may, for example, be polyethylene, polyethylene terephthalate, polypropylene, polyester, polyamine, polyimine, polycarbonate, ethylene-vinyl acetate copolymer, ethylene-acrylic acid B. A synthetic resin film such as an ester copolymer, an ethylene-polypropylene copolymer, or a polyvinyl chloride.
前述基材薄膜可為由單層體或複層體所構成者,厚度通常為25至250μm左右。為了提高相對於黏著劑層之密著性,可對基材薄膜之表面實施例如:電暈處理、電漿處理、噴砂處理、化學蝕刻處理、底漆處理等表面處理。The base film may be composed of a single layer or a laminate, and has a thickness of usually about 25 to 250 μm. In order to improve the adhesion to the adhesive layer, the surface of the base film may be subjected to surface treatment such as corona treatment, plasma treatment, sand blasting, chemical etching treatment, primer treatment or the like.
在位於模具側之基材薄膜之單面設置黏著劑層時,只要將於溶劑中添加有前述側鏈結晶性聚合物之塗佈液塗佈於基材薄膜之單面並使其乾燥即可。黏著劑層之厚度以5至60μm為佳、以10至60μm較佳、以10至40μm更佳。When an adhesive layer is provided on one surface of the base film on the mold side, a coating liquid in which the side chain crystalline polymer is added to a solvent is applied to one side of the base film and dried. . The thickness of the adhesive layer is preferably 5 to 60 μm, more preferably 10 to 60 μm, still more preferably 10 to 40 μm.
另一面之黏著劑層並無特別限定,例如也可與單面之黏著劑層同樣地由前述之本發明之模具固定用黏著片所構成。此時,單面之黏著劑層之側鏈結晶性聚合物與另一面之黏著劑層之側鏈結晶性聚合物可為相同組成,也可分別為不同組成。The adhesive layer on the other side is not particularly limited, and for example, it may be composed of the above-described adhesive sheet for mold fixing of the present invention, similarly to the adhesive layer of one side. In this case, the side chain crystalline polymer of the one-sided adhesive layer and the side chain crystalline polymer of the other adhesive layer may have the same composition or different compositions.
此外,另一面之黏著劑層也可使用含有感壓性接著劑之黏著劑層。前述感壓性接著劑係具有黏著性之聚合物,例如:天然橡膠接著劑、合成橡膠接著劑、苯乙烯/丁二烯乳膠接著劑、丙烯酸系接著劑等。單面之黏著劑層之厚度與另一面之黏著劑層之厚度可為相同厚度,也可分別為不同厚度。Further, an adhesive layer containing a pressure-sensitive adhesive may be used as the adhesive layer on the other side. The pressure-sensitive adhesive is an adhesive polymer such as a natural rubber adhesive, a synthetic rubber adhesive, a styrene/butadiene latex adhesive, an acrylic adhesive, or the like. The thickness of the adhesive layer on one side and the thickness of the adhesive layer on the other side may be the same thickness or different thicknesses.
其次,關於本發明之微細構造之製造方法之一實施型態,列舉使用前述之本發明之模具固定用黏著片進行模具之固定並使用UV硬化性樹脂組成物做為硬化性樹脂組成物的情形做為例子,參照第1圖而詳細說明。In the first embodiment of the method for producing a fine structure of the present invention, the use of the mold fixing adhesive sheet of the present invention for fixing the mold and using the UV curable resin composition as the curable resin composition is exemplified. As an example, it will be described in detail with reference to FIG.
如第1圖(a)所示,首先,使前述之本發明之模具固定用黏著片1介置於模具10與台座15之間。構成模具10之材料可舉例如:矽、聚矽氧、二氧化矽(SiO2 )玻璃、鎳、聚對酞酸乙二酯等。於模具10之表面10a係形成有預定之微細圖案11。該微細圖案11以奈米(nm)至微米(μm)級為佳。模具10之厚度宜為10至2,000μm左右。所謂模具10之厚度,係意指其表面10a與背面10b之間之距離成為最大之厚度。As shown in Fig. 1(a), first, the above-described mold fixing adhesive sheet 1 of the present invention is placed between the mold 10 and the pedestal 15. Examples of the material constituting the mold 10 include ruthenium, polyfluorene oxide, ruthenium dioxide (SiO 2 ) glass, nickel, and polyethylene terephthalate. A predetermined fine pattern 11 is formed on the surface 10a of the mold 10. The fine pattern 11 is preferably in the order of nanometer (nm) to micrometer (μm). The thickness of the mold 10 is preferably about 10 to 2,000 μm. The thickness of the mold 10 means the thickness at which the distance between the surface 10a and the back surface 10b becomes maximum.
構成台座15之材料可舉例如:二氧化矽玻璃等。台座15係安定地支撐模具10者,其厚度以例如1至2mm為佳。The material constituting the pedestal 15 may, for example, be cerium oxide glass or the like. The pedestal 15 is a system that stably supports the mold 10, and its thickness is preferably, for example, 1 to 2 mm.
使黏著片1介置於模具10與台座15之間後,經由黏著片1將模具10固定在台座15。此固定係經由先令黏著片1之溫度成為前述側鏈結晶性聚合物之融點以上之溫度、較佳為融點+10℃以上之溫度後,再令溫度成為未達前述融點之溫度、較佳為融點-10℃以下之溫度而進行。After the adhesive sheet 1 is placed between the mold 10 and the pedestal 15, the mold 10 is fixed to the pedestal 15 via the adhesive sheet 1. The fixing is performed by setting the temperature of the sinter-adhesive sheet 1 to a temperature higher than a melting point of the side chain crystalline polymer, preferably a temperature of +10° C. or more, and then making the temperature not reach the melting point. Preferably, it is carried out at a temperature of -10 ° C or lower.
由於若經過如此之特定之溫度變化,則側鏈結晶性聚合物會從流動狀態進行相變化成為結晶狀態,藉此,因前述之理由而顯現定錨效應,故可在確保表面平滑性之狀態下以高固定力將模具10固定在台座15。黏著片1之溫度調整可經由使用例如氣體、風扇、加熱器等溫度調整手段調整環境溫度和台座15之溫度來進行。When such a specific temperature change occurs, the side chain crystalline polymer changes from a flowing state to a crystalline state, whereby the anchoring effect is exhibited for the reason described above, so that the surface smoothness can be ensured. The mold 10 is fixed to the pedestal 15 with a high fixing force. The temperature adjustment of the adhesive sheet 1 can be performed by adjusting the ambient temperature and the temperature of the pedestal 15 by using temperature adjustment means such as a gas, a fan, or a heater.
另一方面,如第1圖(b)所示,於基板20之表面形成被膜21。構成基板20之材料可舉例如矽、二氧化矽玻璃等,除此以外,還可舉例如聚乙烯、聚對酞酸乙二酯、聚丙烯、聚酯、聚醯胺、聚醯亞胺、聚碳酸酯、乙烯-乙酸乙烯酯共聚物、乙烯-丙烯酸乙酯共聚物、乙烯-聚丙烯共聚物、聚氯乙烯等合成樹脂。基板20之厚度以50至300μm為佳、以100至150μm較佳。基板20以具有可撓性為佳。On the other hand, as shown in FIG. 1(b), the film 21 is formed on the surface of the substrate 20. Examples of the material constituting the substrate 20 include ruthenium and ruthenium dioxide glasses, and examples thereof include polyethylene, polyethylene terephthalate, polypropylene, polyester, polyamide, and polyimide. A synthetic resin such as polycarbonate, ethylene-vinyl acetate copolymer, ethylene-ethyl acrylate copolymer, ethylene-polypropylene copolymer, or polyvinyl chloride. The thickness of the substrate 20 is preferably 50 to 300 μm, more preferably 100 to 150 μm. The substrate 20 is preferably made flexible.
被膜21係由UV硬化性樹脂組成物所構成。該UV硬化性樹脂組成物係經由照射UV(紫外線)而硬化者,可採用各種習知物。被膜21之形成只要例如將UV硬化性樹脂組成物加入預定溶劑中而得到塗佈液,並將此塗佈液塗佈於基板20表面且使其乾燥即可。前述塗佈可藉由例如旋轉塗佈法、狹縫塗佈法、噴霧塗佈法、輥塗佈法等來進行。未硬化之被膜21之厚度以0.01至1000μm為佳、以0.01至500μm較佳。The film 21 is composed of a UV curable resin composition. The UV curable resin composition is cured by irradiation with UV (ultraviolet rays), and various conventional materials can be used. The film 21 is formed by, for example, adding a UV curable resin composition to a predetermined solvent to obtain a coating liquid, and applying the coating liquid onto the surface of the substrate 20 and drying it. The coating can be carried out, for example, by a spin coating method, a slit coating method, a spray coating method, a roll coating method, or the like. The thickness of the uncured film 21 is preferably 0.01 to 1000 μm, more preferably 0.01 to 500 μm.
於基板20表面形成被膜21後,於該被膜21上方配置模具10。此配置係以使模具10之微細圖案11與被膜21呈相對向之方式進行。接著,使此模具10與台座15一起朝箭頭A方向移動,如第1圖(c)所示,以模具10將被膜21表面加壓。藉此,將模具10之微細圖案轉印至被膜21。After the film 21 is formed on the surface of the substrate 20, the mold 10 is placed above the film 21. This arrangement is performed such that the fine pattern 11 of the mold 10 and the film 21 face each other. Next, the mold 10 is moved together with the pedestal 15 in the direction of the arrow A, and as shown in Fig. 1(c), the surface of the film 21 is pressed by the mold 10. Thereby, the fine pattern of the mold 10 is transferred to the film 21.
前述加壓條件係壓力為0.1至100MPa左右,加壓時間為5至300秒左右。經轉印微細圖案11之被膜21之硬化係經由對於在以模具10將被膜21表面加壓之狀態、亦即在第1圖(c)所示之狀態下之被膜21照射UV來進行。The pressurization conditions are about 0.1 to 100 MPa and the pressurization time is about 5 to 300 seconds. The curing of the film 21 by the transfer of the fine pattern 11 is performed by irradiating the film 21 with UV in a state where the surface of the film 21 is pressed by the mold 10, that is, in the state shown in Fig. 1(c).
UV照射方向係只要可對被膜21照射UV,即並無特別限定。換言之,當基板20具有UV穿透性時,只要從基板20之背面側對被膜21照射UV即可。此外,黏著片1通常係具有UV穿透性。因此,若以具有UV穿透性之材料構成台座15及模具10,則可從台座15之背面側隔著該台座15、黏著片1及模具10而對被膜21照射UV。The UV irradiation direction is not particularly limited as long as it can illuminate the film 21 with UV. In other words, when the substrate 20 has UV transparency, the film 21 may be irradiated with UV from the back side of the substrate 20. Further, the adhesive sheet 1 is usually UV-permeable. Therefore, when the pedestal 15 and the mold 10 are made of a material having UV permeability, the film 21 can be irradiated with UV from the back side of the pedestal 15 via the pedestal 15, the adhesive sheet 1, and the mold 10.
其次,如第1圖(d)所示,使模具10與台座15一起朝箭頭B方向移動,從硬化被膜22將模具10剝離。此剝離係為了抑制硬化被膜22之損傷,通常以垂直剝離之方式進行。在進行此垂直剝離時,對黏著片1施加較大的負載。黏著片1由於因前述理由而以高固定力將模具10固定,故即使受到前述負載,也可抑制模具10之脫落。Next, as shown in FIG. 1(d), the mold 10 is moved together with the pedestal 15 in the direction of the arrow B, and the mold 10 is peeled off from the cured film 22. This peeling is usually performed by vertical peeling in order to suppress damage of the hardened film 22. When this vertical peeling is performed, a large load is applied to the adhesive sheet 1. Since the adhesive sheet 1 fixes the mold 10 with a high fixing force for the above reasons, even if the load is applied, the falling of the mold 10 can be suppressed.
若從硬化被膜22將模具10剝離,則可得到由經轉印微細圖案11之硬化被膜22與基板20所構成的微細構造25。硬化被膜22之厚度以0.01至1000μm為佳、以0.01至500μm較佳。When the mold 10 is peeled off from the cured film 22, the fine structure 25 composed of the cured film 22 of the transferred fine pattern 11 and the substrate 20 can be obtained. The thickness of the hardened film 22 is preferably 0.01 to 1000 μm, more preferably 0.01 to 500 μm.
所得之微細構造25可藉由例如氧氣反應性離子蝕刻法(reactive ion etching)等將殘膜26去除,使基板20表面從鄰接之硬化被膜22、22間露出後,以硬化被膜22做為遮罩進行蝕刻處理、或將鋁等進行掀去(lift off)加工後而利用於線路等。此外,當持續製造新穎的微細構造25時,只要重複進行前述之步驟即可。The obtained fine structure 25 can be removed by, for example, oxygen reactive ion etching, and the surface of the substrate 20 is exposed from the adjacent hardened films 22 and 22, and then the cured film 22 is used as a mask. The cover is subjected to etching treatment, or aluminum or the like is lifted and used for use in wiring or the like. Further, when the novel fine structure 25 is continuously manufactured, the above steps may be repeated.
另一方面,當模具10破損時、或當製造微細圖案不同之其他微細構造時,必須將模具10從台座15卸下,換成其他模具。此時,只要使用前述溫度調整手段將黏著片1加熱至前述側鏈結晶性聚合物之融點以上之溫度即可。藉此,由於前述側鏈結晶性聚合物顯示流動性而使黏著片1之固定力降低,故可較簡單地將模具10卸下。黏著片1係藉由進行與前述同樣之操作而可重複使用許多次。On the other hand, when the mold 10 is broken or when other fine structures having different fine patterns are produced, it is necessary to remove the mold 10 from the pedestal 15 and replace it with another mold. In this case, the pressure-sensitive adhesive sheet 1 may be heated to a temperature equal to or higher than the melting point of the side chain crystalline polymer by the temperature adjustment means. Thereby, since the side chain crystalline polymer exhibits fluidity, the fixing force of the adhesive sheet 1 is lowered, so that the mold 10 can be easily removed. The adhesive sheet 1 can be reused many times by performing the same operation as described above.
以上,顯示本發明之較佳的實施形態,但本發明並不限定於以上之實施形態,在申請專利範圍中所記載之範圍內,可進行各種改良和變更。例如:在前述之微細構造之製造方法之一實施形態中,雖說明使用本發明之模具固定用黏著片製造微細構造的情形,但前述微細構造也可藉由使用本發明之模具固定用黏著帶取代前述黏著片,來進行製造。此時,以使含有側鏈結晶性聚合物之單面之黏著劑層朝向模具側之方式,經由另一面之黏著劑層而將黏著帶貼著於台座。The preferred embodiment of the present invention has been described above, but the present invention is not limited to the above embodiments, and various modifications and changes can be made within the scope of the invention. For example, in the embodiment of the manufacturing method of the fine structure described above, the case of using the mold fixing adhesive sheet of the present invention to produce a fine structure is described. However, the fine structure may be used by using the mold fixing adhesive tape of the present invention. It is manufactured by replacing the aforementioned adhesive sheet. At this time, the adhesive tape is attached to the pedestal via the adhesive layer on the other side so that the adhesive layer containing the one side of the side chain crystalline polymer faces the mold side.
此外,在前述實施形態中雖列舉以UV硬化性樹脂組成物做為硬化性樹脂組成物之例子進行說明,但也可使用做為其他硬化性樹脂組成物之例如聚甲基丙烯酸甲酯(PMMA)等熱塑性樹脂組成物。在前述實施形態中雖說明在以模具加壓之狀態下進行經轉印微細圖案之被膜之硬化的情形,但前述被膜之硬化也可在將模具剝離後進行。In the above-described embodiment, a UV curable resin composition is used as the curable resin composition. However, as the other curable resin composition, for example, polymethyl methacrylate (PMMA) may be used. ) a thermoplastic resin composition. In the above-described embodiment, the case where the film of the transferred fine pattern is cured while being pressed by the mold is described. However, the curing of the film may be performed after the mold is peeled off.
以下,列舉合成例及實施例詳細說明本發明,但本發明並不僅限定於以下之合成例及實施例。再者,在以下之說明中,「份」係意指重量份。Hereinafter, the present invention will be described in detail by way of Synthesis Examples and Examples, but the present invention is not limited to the following Synthesis Examples and Examples. In the following description, "parts" means parts by weight.
首先,以丙烯酸二十二烷酯45份、丙烯酸丁酯50份、丙烯酸5份、做為聚合起始劑之PERBUTYL ND(日油公司製)0.5份、及做為鏈轉移劑之正十二烷硫醇(n-dodecylmercaptan)(日本油脂)6份之比例混合,並在80℃攪拌4小時,使此等單體聚合。所得之共聚物之重量平均分子量為7,000,融點為37℃。此外,在前述融點+10℃之儲存彈性模數G’為3×102 Pa,在融點-10℃之儲存彈性模數G’為5×106 Pa。First, 45 parts of behenyl acrylate, 50 parts of butyl acrylate, and 5 parts of acrylic acid, PERBUTYL ND (manufactured by NOF Corporation) as a polymerization initiator, and as a chain transfer agent A mixture of 6 parts of an alkyl mercaptan (n-dodecylmercaptan) (Japanese fat) was stirred at 80 ° C for 4 hours to polymerize the monomers. The resulting copolymer had a weight average molecular weight of 7,000 and a melting point of 37 °C. Further, the storage elastic modulus G' at the above melting point + 10 ° C was 3 × 10 2 Pa, and the storage elastic modulus G' at the melting point - 10 ° C was 5 × 10 6 Pa.
首先,以丙烯酸二十二烷酯45份、丙烯酸丁酯50份、丙烯酸5份、及做為聚合起始劑之PERBUTYL ND(日油公司製)0.5份之比例混合,並在55℃攪拌4小時。其次,升溫至80℃後,添加做為聚合起始劑之PERHEXYL PV(日油公司製)0.5份並攪拌2小時,使此等單體聚合。所得之共聚物之重量平均分子量為67萬,融點為46℃。此外,在前述融點+10℃之儲存彈性模數G’為7×103 Pa,在融點-10℃之儲存彈性模數G’為1×106 Pa。First, 45 parts of behenyl acrylate, 50 parts of butyl acrylate, 5 parts of acrylic acid, and PERBUTYL ND (manufactured by NOF Corporation) as a polymerization initiator were mixed at a ratio of 0.5 parts at 55 ° C. hour. Next, after raising the temperature to 80 ° C, 0.5 part of PERHEXYL PV (manufactured by Nippon Oil Co., Ltd.) as a polymerization initiator was added and stirred for 2 hours to polymerize the monomers. The obtained copolymer had a weight average molecular weight of 670,000 and a melting point of 46 °C. Further, the storage elastic modulus G' at the above melting point + 10 ° C was 7 × 10 3 Pa, and the storage elastic modulus G' at the melting point - 10 ° C was 1 × 10 6 Pa.
首先,以丙烯酸二十二烷酯15份、丙烯酸硬脂酯30 份、丙烯酸甲酯50份、丙烯酸5份、及做為聚合起始劑之PERBUTYL ND(日油公司製)0.5份之比例混合,並在55℃攪拌4小時。其次,升溫至80℃後,添加做為聚合起始劑之PERHEXYL PV(日油公司製)0.5份並攪拌2小時,使此等單體聚合。所得之共聚物之重量平均分子量為65萬,融點為41℃。此外,在前述融點+10℃之儲存彈性模數G’為8×104 Pa,在融點-10℃之儲存彈性模數G’為2×107 Pa。First, it is mixed with 15 parts of icosyl acrylate, 30 parts of stearyl acrylate, 50 parts of methyl acrylate, 5 parts of acrylic acid, and PERBUTYL ND (manufactured by Nippon Oil Co., Ltd.) as a polymerization initiator. And stirred at 55 ° C for 4 hours. Next, after raising the temperature to 80 ° C, 0.5 part of PERHEXYL PV (manufactured by Nippon Oil Co., Ltd.) as a polymerization initiator was added and stirred for 2 hours to polymerize the monomers. The obtained copolymer had a weight average molecular weight of 650,000 and a melting point of 41 °C. Further, the storage elastic modulus G' at the above melting point + 10 ° C was 8 × 10 4 Pa, and the storage elastic modulus G' at the melting point - 10 ° C was 2 × 10 7 Pa.
首先,以丙烯酸二十二烷酯20份、丙烯酸硬脂酯25份、丙烯酸甲酯50份、丙烯酸5份、做為聚合起始劑之PERBUTYL ND(日油公司製)0.5份、及做為鏈轉移劑之正十二烷硫醇(日本油脂)6份之比例混合,並在80℃攪拌4小時,使此等單體聚合。所得之共聚物之重量平均分子量為7,000,融點為40℃。此外,在前述融點+10℃之儲存彈性模數G’為5×101 Pa,在融點-10℃之儲存彈性模數G’為5×107 Pa。First, PERBUTYL ND (manufactured by NOF Corporation) of 0.5 parts of 20 parts of behenyl acrylate, 25 parts of stearyl acrylate, 50 parts of methyl acrylate, and 5 parts of acrylic acid as a polymerization initiator, and as The chain transfer agent was mixed in a ratio of 6 parts of n-dodecyl mercaptan (Japanese fat) and stirred at 80 ° C for 4 hours to polymerize the monomers. The resulting copolymer had a weight average molecular weight of 7,000 and a melting point of 40 °C. Further, the storage elastic modulus G' at the above melting point + 10 ° C was 5 × 10 1 Pa, and the storage elastic modulus G' at the melting point - 10 ° C was 5 × 10 7 Pa.
首先,以甲基丙烯酸二十二烷酯65份、甲基丙烯酸丁酯30份、甲基丙烯酸5份、及做為聚合起始劑之PERBUTYL ND(日油公司製)0.5份之比例混合,並在55℃攪拌4小時。其次,升溫至80℃後,添加做為聚合起始劑之PERHEXYL PV(日油公司製)0.5份並攪拌2小時,使此等單體聚合。所得之共聚物之重量平均分子量為25萬,融點為35℃。此外,在前述融點+10℃之儲存彈性模數G’為5×105 Pa,在融點-10℃之儲存彈性模數G’為9×105 Pa。First, it is mixed with 65 parts of behenyl methacrylate, 30 parts of butyl methacrylate, 5 parts of methacrylic acid, and 0.5 parts of PERBUTYL ND (manufactured by NOF Corporation) as a polymerization initiator. It was stirred at 55 ° C for 4 hours. Next, after raising the temperature to 80 ° C, 0.5 part of PERHEXYL PV (manufactured by Nippon Oil Co., Ltd.) as a polymerization initiator was added and stirred for 2 hours to polymerize the monomers. The resulting copolymer had a weight average molecular weight of 250,000 and a melting point of 35 °C. Further, the storage elastic modulus G' at the above melting point + 10 ° C was 5 × 10 5 Pa, and the storage elastic modulus G' at the melting point - 10 ° C was 9 × 10 5 Pa.
前述合成例1至3及比較合成例1、2之各共聚物如表1所示。再者,前述重量平均分子量係以GPC測定共聚物後,將所得之測定值換算成聚苯乙烯而得之值。前述融點係使用DSC在10℃/分鐘之測定條件下測得之值。前述儲存彈性模數G’係使用Seiko Instruments Inc.製之動態黏彈性測定裝置「DMS 6100」,在10Hz、5℃/分鐘、-100至400℃之升溫過程中,測定在融點±10℃之儲存彈性模數G’而得之值。The copolymers of the above Synthesis Examples 1 to 3 and Comparative Synthesis Examples 1 and 2 are shown in Table 1. In addition, the weight average molecular weight is a value obtained by measuring a copolymer by GPC and converting the obtained measured value into polystyrene. The above melting point was measured using DSC under the measurement conditions of 10 ° C / min. The storage elastic modulus G' was measured using a dynamic viscoelasticity measuring device "DMS 6100" manufactured by Seiko Instruments Inc. at a temperature of 10 Hz, 5 ° C / min, and -100 to 400 ° C at a melting point of ± 10 ° C. The value obtained by storing the elastic modulus G'.
由表1得知,在合成例1、2中,因以丙烯酸丁酯做為主成分,而將儲存彈性模數G’及融點控制在前述之特定值。此外得知,在合成例3中,因以30重量份之比例調配具有碳數16以上之直鏈狀烷基之(甲基)丙烯酸酯中碳數較低之丙烯酸硬脂酯,而將儲存彈性模數G’及融點控制在前述之特定值。As is apparent from Table 1, in the synthesis examples 1 and 2, the storage elastic modulus G' and the melting point were controlled to the specific values described above by using butyl acrylate as a main component. Further, in Synthesis Example 3, the stearyl acrylate having a lower carbon number among the (meth) acrylate having a linear alkyl group having 16 or more carbon atoms was prepared in a ratio of 30 parts by weight, and was stored. The elastic modulus G' and the melting point are controlled at the aforementioned specific values.
首先,使用乙酸乙酯將前述合成例1至3及比較合成例1、2中所得之各共聚物調整成固形份為30%,而得到各共聚物溶液。接著,相對於前述各共聚物溶液100份,添加換算成固形份為0.5份之異氰酸酯系交聯劑而得黏著劑溶液,將該黏著劑溶液塗佈於厚度為100μm之聚對酞酸乙二酯薄膜(PET薄膜)之單面並使其乾燥,而分別製作形成有厚度40μm之黏著劑層的黏著帶。First, each of the copolymers obtained in the above Synthesis Examples 1 to 3 and Comparative Synthesis Examples 1 and 2 was adjusted to a solid content of 30% using ethyl acetate to obtain each copolymer solution. Next, an adhesive solution was prepared by adding an isocyanate crosslinking agent in an amount of 0.5 part by weight to 100 parts of each of the copolymer solutions, and the adhesive solution was applied to a polyethylene terephthalate having a thickness of 100 μm. One side of the ester film (PET film) was dried and an adhesive tape having an adhesive layer having a thickness of 40 μm was formed.
對於上述中所得之各黏著帶,評估垂直剝離強度。評估方法如下述所示,結果如表2所示。For each of the adhesive tapes obtained above, the vertical peel strength was evaluated. The evaluation method is as follows, and the results are shown in Table 2.
首先,將前述黏著帶固定在丙烯酸系樹脂製之台板上。此固定係經由使用丙烯酸系接著劑(一方社油脂工業股份有限公司製之「AS5020」)將PET薄膜之與形成有前述黏著劑層之單面相反側之另一面予以接著固定在前述台板上來進行。藉此,成為前述黏著劑層相對於前述台板係朝向上方之狀態。First, the above adhesive tape was fixed to a plate made of an acrylic resin. In this fixing, the other side of the PET film opposite to the one surface on which the adhesive layer is formed is attached to the platen by using an acrylic adhesive ("AS5020" manufactured by Yoshiko Oils Co., Ltd.). get on. Thereby, the adhesive layer is placed upward with respect to the platen.
然後,以下述條件使一邊長10mm之不鏽鋼(SUS)製之正立方體與前述黏著劑層密著並以2kg加壓5秒後,以300mm/分鐘之速度從前述黏著劑層將前述正立方體垂直剝離。藉由荷重元(load cell)測定此時之垂直剝離強度。Then, a positive cube made of stainless steel (SUS) having a length of 10 mm was adhered to the above-mentioned adhesive layer under the following conditions and pressed at 2 kg for 5 seconds, and then the positive cube was perpendicularly formed from the aforementioned adhesive layer at a speed of 300 mm/min. Stripped. The vertical peel strength at this time was measured by a load cell.
在60℃之環境溫度下將前述正立方體與前述黏著劑層密著並加壓後,垂直剝離。The positive cube was adhered to the pressure-sensitive adhesive layer at an ambient temperature of 60 ° C and pressurized, and then peeled off vertically.
在60℃之環境溫度下將前述正立方體與前述黏著劑層密著並加壓後,使環境溫度降低至23℃,並在此環境溫度下靜置20分鐘後,垂直剝離。After the positive cube and the aforementioned adhesive layer were adhered and pressurized at an ambient temperature of 60 ° C, the ambient temperature was lowered to 23 ° C, and after standing at this ambient temperature for 20 minutes, it was peeled off vertically.
由表2得知,在60→23℃之垂直剝離強度方面,相較於比較例1、2,實施例1至3顯現非常高的固定力。此外,由60℃之垂直剝離強度之結果得知,實施例1至3係只要加熱至融點以上之溫度,則可較簡單地將模具卸下。As is apparent from Table 2, in terms of the vertical peel strength at 60 → 23 ° C, Examples 1 to 3 exhibited very high fixing forces as compared with Comparative Examples 1 and 2. Further, as a result of the vertical peel strength of 60 ° C, it was found that the examples 1 to 3 can be easily removed by heating to a temperature higher than the melting point.
1...模具固定用黏著片1. . . Mold fixing adhesive sheet
10...模具10. . . Mold
10a...模具之表面10a. . . Mold surface
10b...模具之背面10b. . . The back of the mold
11...微細圖案11. . . Fine pattern
15...台座15. . . Pedestal
20...基板20. . . Substrate
21...被膜twenty one. . . Film
22...硬化被膜twenty two. . . Hardened film
25...微細構造25. . . Microstructure
26...殘膜26. . . Residual film
第1圖(a)至(d)係表示使用本發明之模具固定用黏著片製造微細構造之一實施形態之步驟圖。Fig. 1 (a) to (d) are process diagrams showing an embodiment in which a fine structure is produced by using the adhesive sheet for mold fixing of the present invention.
1...模具固定用黏著片1. . . Mold fixing adhesive sheet
10...模具10. . . Mold
10a...模具之表面10a. . . Mold surface
10b...模具之背面10b. . . The back of the mold
11...微細圖案11. . . Fine pattern
15...台座15. . . Pedestal
20...基板20. . . Substrate
21...被膜twenty one. . . Film
22...硬化被膜twenty two. . . Hardened film
25...微細構造25. . . Microstructure
26...殘膜26. . . Residual film
Claims (8)
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JP (1) | JP5329666B2 (en) |
KR (1) | KR101341883B1 (en) |
CN (1) | CN102470603B (en) |
TW (1) | TWI461504B (en) |
WO (1) | WO2011016148A1 (en) |
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WO2013031710A1 (en) * | 2011-08-31 | 2013-03-07 | 綜研化学株式会社 | Adhesive sheet for immobilizing imprint mold, imprint device, and imprint method |
JP6067405B2 (en) | 2012-07-31 | 2017-01-25 | 日東電工株式会社 | Radiation curable adhesive, radiation curable adhesive layer, radiation curable adhesive sheet and laminate |
KR101374740B1 (en) * | 2012-10-30 | 2014-03-18 | 김현수 | Manufucturing method of the mobile phone case |
CN103788900B (en) * | 2012-11-02 | 2016-09-28 | 蔡正仁 | The glue-line of fixing electronic component adhesive tape and structure |
JP6569189B2 (en) * | 2014-04-01 | 2019-09-04 | 大日本印刷株式会社 | Imprint mold substrate and method for producing the same, imprint method, imprint mold and method for regenerating the same |
WO2015152006A1 (en) * | 2014-04-04 | 2015-10-08 | ニッタ株式会社 | Side chain crystalline polymer, thermosensitive adhesive agent, thermosensitive adhesive sheet, and thermosensitive adhesive tape |
JP6318840B2 (en) * | 2014-05-19 | 2018-05-09 | 大日本印刷株式会社 | Manufacturing method of substrate for imprint mold |
JP6009013B2 (en) * | 2015-02-19 | 2016-10-19 | 住友化学株式会社 | Method for producing laminate and method for producing acrylic resin film |
JP6489309B2 (en) * | 2015-05-14 | 2019-03-27 | パナソニックIpマネジメント株式会社 | Imprint method and imprint apparatus |
CN110655883B (en) * | 2019-09-24 | 2021-07-13 | 南京清尚新材料科技有限公司 | Cold-shut adhesive, preparation method thereof and preparation method of adhesive tape |
TWI837607B (en) * | 2022-03-10 | 2024-04-01 | 永嘉光電股份有限公司 | Method for large scale imprinting |
US11926113B2 (en) * | 2022-08-03 | 2024-03-12 | Himax Technologies Limited | Optical element and method for manufacturing optical element |
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TWI228533B (en) * | 1999-06-15 | 2005-03-01 | Nitta Corp | Adhesive tape for temporary-attachment of devices |
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JP2000234079A (en) * | 1999-02-15 | 2000-08-29 | Nitta Ind Corp | Sheet for processing semiconductor wafer |
JP2003110226A (en) * | 2001-10-01 | 2003-04-11 | Sekisui Chem Co Ltd | Method of manufacturing transfer material for forming circuit and circuit board |
JP2005509544A (en) * | 2001-11-23 | 2005-04-14 | グルズ・アンド・マーストラン・アクティーゼルスカブ | Device for 3D structure processing on substrates |
DE10158347A1 (en) * | 2001-11-28 | 2003-06-12 | Tesa Ag | Process for the production of nano- and micro-structured polymer films |
JP2007254590A (en) * | 2006-03-23 | 2007-10-04 | Nippon Steel Chem Co Ltd | Die bond dicing film |
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TW471135B (en) * | 1999-06-10 | 2002-01-01 | Nitta Corp | Adhesive tape for temporary-attachment of green sheets for ceramic electronic devices and method for producing ceramic electronic devices |
TWI228533B (en) * | 1999-06-15 | 2005-03-01 | Nitta Corp | Adhesive tape for temporary-attachment of devices |
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JP5329666B2 (en) | 2013-10-30 |
TW201105762A (en) | 2011-02-16 |
WO2011016148A1 (en) | 2011-02-10 |
KR101341883B1 (en) | 2013-12-16 |
JPWO2011016148A1 (en) | 2013-01-10 |
CN102470603A (en) | 2012-05-23 |
CN102470603B (en) | 2015-03-25 |
KR20120016128A (en) | 2012-02-22 |
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