TWI837607B - Method for large scale imprinting - Google Patents

Method for large scale imprinting Download PDF

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TWI837607B
TWI837607B TW111108882A TW111108882A TWI837607B TW I837607 B TWI837607 B TW I837607B TW 111108882 A TW111108882 A TW 111108882A TW 111108882 A TW111108882 A TW 111108882A TW I837607 B TWI837607 B TW I837607B
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mold core
soluble mold
soluble
polymer material
material layer
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TW111108882A
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Chinese (zh)
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TW202335824A (en
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蔡嵩玟
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永嘉光電股份有限公司
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Priority to CN202310190745.8A priority patent/CN116736630A/en
Publication of TW202335824A publication Critical patent/TW202335824A/en
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Abstract

The present invention relates to a method for large scale imprinting comprising: an adding step at which a soluble material is added to a master mold to form a soluble mold, wherein the soluble mold has a concave-convex pattern; a forming step at which an adhesive layer is formed on a side of the soluble mold opposite to the master mold; a picking step at which a picking device contacts with the adhesive layer, wherein the picking device comprises a frame and a support plate positioned on the frame, and the support plate is contacted with the adhesive layer; a separating step at which the taking device is removed along with the soluble mold from the master mold; a contacting step at which the soluble mold contacts with a polymer layer; an imprinting step at which a high temperature and a pressure are applied to the soluble mold so as to create an imprint pattern corresponding the concave-convex pattern on the polymer layer and to solidify the polymer layer; a dissolving step at which a solvent is provided to dissolve the soluble mold so as to obtain the imprint pattern.

Description

大規模壓印之方法 Methods for large-scale embossing

本發明關於一種壓印方法,特別係指一種可連續進行壓印,並於壓印完成後利用溶劑去除模仁的壓印方法。 The present invention relates to an embossing method, in particular to an embossing method that can perform embossing continuously and use a solvent to remove the mold after the embossing is completed.

以模具在基板上形成印刷圖案之方法係為「壓印」,其中壓印之方法可依照其加工之方式分為「熱壓印法」、與「光壓印法」,具體而言,熱壓印法包含:將膜具壓印於溫度達到玻璃轉移溫度以上之高分子樹脂上;以及於高分子樹脂冷卻至玻璃轉移溫度下之後,將模具相對於高分子樹脂分離,使高分子樹脂上形成有與模具上之微結構相對應之轉印結構。具體而言,熱壓印法可參照S.Chou et al.,Appl.Phys.Lett.67,3114(1995)中所述之內容,其係使用熱塑性樹脂作為加工材料;以及光壓印法可參照J.Haisma et al.,J.Vac.Sci.Technol.B 14(6),4124(1996)中所述之內容,其係使用硬化組成物作為加工物件。 The method of forming a printed pattern on a substrate using a mold is called "embossing", and the embossing method can be divided into "hot embossing" and "photoembossing" according to the processing method. Specifically, the hot embossing method includes: embossing a film on a polymer resin whose temperature reaches above the glass transition temperature; and after the polymer resin is cooled to the glass transition temperature, separating the mold from the polymer resin, so that a transfer structure corresponding to the microstructure on the mold is formed on the polymer resin. Specifically, the hot embossing method can refer to the content described in S.Chou et al., Appl.Phys.Lett.67,3114(1995), which uses a thermoplastic resin as a processing material; and the photoembossing method can refer to the content described in J.Haisma et al., J.Vac.Sci.Technol.B 14(6),4124(1996), which uses a hardened composition as a processing object.

所謂「脫模(mold release)」係將模具與轉印物件分離之過程。其中於壓印之過程中,會將膜具與高分子材料間進行分離,因此模具之脫模性能對於脫膜過程、與壓印品質之影響重大,對於後續模具之維護、或轉印結構之完整度有著重大影響。具體而言,美國專利公告號US6,849,558B2與美國專利公開號US2006/0249886A1均提出一種可被一溶劑溶解之模具。此種可溶解性模具為透過灌注可溶解性材料至樣模內固化取得,之後利用預製件(preform)自樣模 取出模具。依Journal of Vacuum Science & Technology B 21,2961(2003)所述,預製件與可溶解性材料為相同材料,並於可溶解性材料完全固化前附著至可溶解性材料。一般而言,可溶解性材料的濃度與厚度均會影響固化時間,因此預製件於可溶解性材料固化至何種程度下始能附著考驗著操作人員的專業與經驗。依M.W.Lin et al.,J.Micro/Nanolith.MEMS MOEMS 7(3),033005(2008)所述,其使硬化性組成物中含有含氟單體分子或非反應性的含氟化合物,以改良其脫模性。 The so-called "mold release" is the process of separating the mold from the transfer object. During the embossing process, the mold and the polymer material will be separated. Therefore, the mold release performance has a significant impact on the mold release process and the embossing quality, and has a significant impact on the subsequent mold maintenance or the integrity of the transfer structure. Specifically, U.S. Patent Publication No. US6,849,558B2 and U.S. Patent Publication No. US2006/0249886A1 both propose a mold that can be dissolved by a solvent. This soluble mold is obtained by pouring a soluble material into the sample mold and solidifying it, and then using a preform to remove the mold from the sample mold. According to Journal of Vacuum Science & Technology B 21,2961(2003), the preform and the soluble material are made of the same material and are attached to the soluble material before the soluble material is completely cured. Generally speaking, the concentration and thickness of the soluble material will affect the curing time, so the degree to which the preform can be attached after the soluble material is cured tests the expertise and experience of the operator. According to M.W.Lin et al.,J.Micro/Nanolith.MEMS MOEMS 7(3),033005(2008), the curing composition contains fluorine-containing monomer molecules or non-reactive fluorine-containing compounds to improve its demolding properties.

所謂「分子轉移光刻」係利用曝光和顯影在光阻層上刻畫幾何圖形結構,然後通過蝕刻製程將光罩上的圖形轉移到所在基板上,其可以精確地控制形成圖形的形狀、大小,為半導體領域中之重要製程。依Nanotechnology 24(2013)085302(6pp)所述,模具雖同樣為可溶解性模具,但由於採用滾輪方式使模具均勻地置於物件上,因而造成後續所得之微細結構間距擴張而變形。 The so-called "molecular transfer lithography" is to use exposure and development to depict geometric structures on the photoresist layer, and then transfer the pattern on the mask to the substrate through the etching process. It can accurately control the shape and size of the formed pattern and is an important process in the semiconductor field. According to Nanotechnology 24 (2013) 085302 (6pp), although the mold is also a soluble mold, the mold is evenly placed on the object by using a roller method, which causes the subsequent microstructure spacing to expand and deform.

本發明所欲解決之問題在於:提供一種壓印方法,可以一模仁連續進行壓印,以取得大規模之轉印物件。 The problem that this invention aims to solve is to provide a stamping method that can perform stamping continuously with one mold to obtain large-scale transfer objects.

為解決上述之問題,本發明提供一種大規模壓印之方法,係包括:一添加步驟,係添加一可溶解性材料於一第一樣模以及一第二樣模內,並固化該可溶解性材料,以於該第一樣模中形成一第一可溶解性模仁,其中該第一可溶解性模仁具有一第一凹凸結構;以及於該第二樣模中形成一第二可溶解性模仁,其中該第二可溶解性模仁具有一第二凹凸結構;一形成步驟,於該第一可溶解性模仁相對於該第一樣模之一側形成一第一黏著層;以及於該第二可溶解性模仁相對於該第二樣模之一側形成一第二黏著層;一取模步驟,係包含:附著一第一取模裝置於該第一黏著層相對於該第一樣模之一側,其中該第一取模裝置包含:一 第一架體結構;一第一膠帶,其係設置於該第一架體結構;以及一第一支撐背板,其係設置於該第一膠帶,其中該第一取模裝置係以該第一支撐背板與該第一黏著層接觸;以及附著一第二取模裝置於該第二黏著層相對於該第二樣模之一側,其中該第二取模裝置包含:一第二架體結構;一第二膠帶,其係設置於該第二架體結構;以及一第二支撐背板,其係設置於該第二膠帶,其中該第二取模裝置係以該第二支撐背板與該第二黏著層接觸;一分離步驟,係包含:將該第一取模裝置相對於該第一樣模分離,其中該第一可溶解性模仁係隨著該第一取模裝置相對於該第一樣模分離;以及將該第二取模裝置相對於該第二樣模分離,其中該第二可溶解性模仁係隨著該第二取模裝置相對於該第二樣模分離;一接觸步驟,係包含:將該第一可溶解性模仁與該第二可溶解性模仁相互間隔地與一高分子材料層接觸;一壓印步驟,係包含:施予一第一高溫至該高分子材料層;以及施予一壓力至該第一可溶解性模仁、與該第二可溶解性模仁,使該高分子材料層具有一對應該第一凹凸結構的第一轉印結構;以及一對應該第二凹凸結構的第二轉印結構;以及將該第一支撐背板與該第一膠帶分離;以及將該第二支撐背板與該第二膠帶分離,並施予一第二高溫至該高分子材料層,使該高分子材料層固化,其中該第一高溫與該第二高溫不同;以及一溶解步驟,係提供一溶劑溶解該第一可溶解性模仁、與該第二可溶解性模仁,使該固化後之高分子材料層與該第一支撐背板分離、以及該第二支撐背板分離,以取得一轉印物件。 To solve the above-mentioned problem, the present invention provides a method for large-scale stamping, which includes: an adding step, adding a soluble material into a first sample mold and a second sample mold, and curing the soluble material to form a first soluble mold core in the first sample mold, wherein the first soluble mold core has a first concave-convex structure; and forming a second soluble mold core in the second sample mold, wherein the second soluble mold core has a second concave-convex structure; a forming step, forming a first adhesive layer on one side of the first soluble mold core relative to the first sample mold; and forming a second adhesive layer on one side of the second soluble mold core relative to the second sample mold; The molding step comprises: attaching a first molding device to a side of the first adhesive layer opposite to the first sample mold, wherein the first molding device comprises: a first frame structure; a first adhesive tape, which is arranged on the first frame structure; and a first supporting back plate, which is arranged on the first adhesive tape, wherein the first molding device is in contact with the first adhesive layer with the first supporting back plate; and attaching a second molding device to a side of the second adhesive layer opposite to the second sample mold, wherein the second molding device comprises: a second frame structure; a second adhesive tape, which is arranged on the second frame structure; and a second supporting back plate, which is arranged on the second adhesive tape, wherein the second molding device The second supporting back plate is in contact with the second adhesive layer; a separation step includes: separating the first mold device relative to the first sample mold, wherein the first soluble mold core is separated from the first sample mold along with the first mold device; and separating the second mold device relative to the second sample mold, wherein the second soluble mold core is separated from the second sample mold along with the second mold device; a contact step includes: contacting the first soluble mold core and the second soluble mold core with a polymer material layer at intervals; an embossing step includes: applying a first high temperature to the polymer material layer; and applying a pressure to the first soluble mold core. , and the second soluble mold, so that the polymer material layer has a first transfer structure corresponding to the first concave-convex structure; and a second transfer structure corresponding to the second concave-convex structure; and the first supporting back plate is separated from the first tape; and the second supporting back plate is separated from the second tape, and a second high temperature is applied to the polymer material layer to solidify the polymer material layer, wherein the first high temperature is different from the second high temperature; and a dissolving step is provided, which is to provide a solvent to dissolve the first soluble mold and the second soluble mold, so that the solidified polymer material layer is separated from the first supporting back plate and the second supporting back plate to obtain a transfer object.

本發明另提供一種大規模壓印之方法,係包括:一添加步驟,係添加一可溶解性材料於一第一樣模以及一第二樣模內,並固化該可溶解性材料,以於該第一樣模中形成一第一可溶解性模仁,其中該第一可溶解性模仁具有一第一凹凸結構;以及於該第二樣模中形成一第二可溶解性模仁,其中該第二可溶 解性模仁具有一第二凹凸結構;一形成步驟,於該第一可溶解性模仁相對於該第一樣模之一側形成一第一黏著層;以及於該第二可溶解性模仁相對於該第二樣模之一側形成一第二黏著層;一取模步驟,係包含:附著一第一取模裝置於該第一黏著層相對於該第一樣模之一側,其中該第一取模裝置包含:一第一架體結構;一第一膠帶,其係設置於該第一架體結構;以及一第一支撐背板,其係設置於該第一膠帶,其中該第一取模裝置係以該第一支撐背板與該第一黏著層接觸;以及附著一第二取模裝置於該第二黏著層相對於該第二樣模之一側,其中該第二取模裝置包含:一第二架體結構;一第二膠帶,其係設置於該第二架體結構;以及一第二支撐背板,其係設置於該第二膠帶,其中該第二取模裝置係以該第二支撐背板與該第二黏著層接觸;一分離步驟,係包含:將該第一取模裝置相對於該第一樣模分離,其中該第一可溶解性模仁係隨著該第一取模裝置相對於該第一樣模分離;以及將該第二取模裝置相對於該第二樣模分離,其中該第二可溶解性模仁係隨著該第二取模裝置相對於該第二樣模分離;一接觸步驟,係包含:將該第一可溶解性模仁與該第二可溶解性模仁相互間隔地與一高分子材料層接觸;一壓印步驟,係包含:施予一第一高溫至該高分子材料層;以及施予一壓力至該第一可溶解性模仁、與該第二可溶解性模仁,使該高分子材料層具有一對應該第一凹凸結構的第一轉印結構;以及一對應該第二凹凸結構的第二轉印結構;以及將該第一支撐背板與該第一黏著層分離;以及將該第二支撐背板與該第二黏著層分離,並施予一第二高溫至該高分子材料層,使該高分子材料層固化,其中該第一高溫與該第二高溫不同;以及一溶解步驟,係提供一溶劑溶解該第一可溶解性模仁、與該第二可溶解性模仁,使該固化後之高分子材料層與該第一黏著層、以及該第二黏著層分離,以取得一轉印物件。 The present invention also provides a method for large-scale stamping, which includes: an adding step, adding a soluble material into a first sample mold and a second sample mold, and curing the soluble material to form a first soluble mold core in the first sample mold, wherein the first soluble mold core has a first concave-convex structure; and forming a second soluble mold core in the second sample mold, wherein the second soluble mold core has a second concave-convex structure; a forming step, forming a first adhesive layer on a side of the first soluble mold core relative to the first sample mold; and forming a second adhesive layer on a side of the second soluble mold core relative to the second sample mold; a demolding step, The invention comprises: attaching a first molding device to a side of the first adhesive layer opposite to the first sample mold, wherein the first molding device comprises: a first frame structure; a first adhesive tape, which is arranged on the first frame structure; and a first supporting back plate, which is arranged on the first adhesive tape, wherein the first molding device is in contact with the first adhesive layer with the first supporting back plate; and attaching a second molding device to a side of the second adhesive layer opposite to the second sample mold, wherein the second molding device comprises: a second frame structure; a second adhesive tape, which is arranged on the second frame structure; and a second supporting back plate, which is arranged on the second adhesive tape, wherein the second molding device is in contact with the first adhesive layer with the first supporting back plate. The second supporting back plate is in contact with the second adhesive layer; a separation step includes: separating the first mold taking device from the first sample mold, wherein the first soluble mold core is separated from the first sample mold along with the first mold taking device; and separating the second mold taking device from the second sample mold, wherein the second soluble mold core is separated from the second sample mold along with the second mold taking device; a contact step includes: contacting the first soluble mold core and the second soluble mold core with a polymer material layer at intervals; an embossing step includes: applying a first high temperature to the polymer material layer; and applying a pressure to the first soluble mold core, and the second soluble mold, so that the polymer material layer has a first transfer structure corresponding to the first concavo-convex structure; and a second transfer structure corresponding to the second concavo-convex structure; and the first supporting back plate is separated from the first adhesive layer; and the second supporting back plate is separated from the second adhesive layer, and a second high temperature is applied to the polymer material layer to solidify the polymer material layer, wherein the first high temperature is different from the second high temperature; and a dissolving step is provided, which is to provide a solvent to dissolve the first soluble mold and the second soluble mold, so that the solidified polymer material layer is separated from the first adhesive layer and the second adhesive layer to obtain a transfer object.

本發明另提供一種大規模壓印之方法,係包括:一添加步驟,係添加一可溶解性材料於一第一樣模以及一第二樣模內,並固化該可溶解性材料,以於該第一樣模中形成一第一可溶解性模仁,其中該第一可溶解性模仁具有一第一凹凸結構;以及於該第二樣模中形成一第二可溶解性模仁,其中該第二可溶解性模仁具有一第二凹凸結構;一形成步驟,於該第一可溶解性模仁相對於該第一樣模之一側形成一第一黏著層;以及於該第二可溶解性模仁相對於該第二樣模之一側形成一第二黏著層;一取模步驟,係包含:附著一第一取模裝置於該第一黏著層相對於該第一樣模之一側,其中該第一取模裝置包含:一第一架體結構;一第一膠帶,其係設置於該第一架體結構;以及一第一支撐背板,其係設置於該第一膠帶,其中該第一取模裝置係以該第一膠帶相對於該第一支撐背板之一側與該第一黏著層接觸;以及附著一第二取模裝置於該第二黏著層相對於該第二樣模之一側,其中該第二取模裝置包含:一第二架體結構;一第二膠帶,其係設置於該第二架體結構;以及一第二支撐背板,其係設置於該第二膠帶,其中該第二取模裝置係以該第二膠帶相對於該第二支撐背板之一側與該第二黏著層接觸;一分離步驟,係包含:將該第一取模裝置相對於該第一樣模分離,其中該第一可溶解性模仁係隨著該第一取模裝置相對於該第一樣模分離;以及將該第二取模裝置相對於該第二樣模分離,其中該第二可溶解性模仁係隨著該第二取模裝置相對於該第二樣模分離;一接觸步驟,係包含:將該第一可溶解性模仁與該第二可溶解性模仁相互間隔地與一高分子材料層接觸;一壓印步驟,係包含:施予一第一高溫至該高分子材料層;以及施予一壓力至該第一可溶解性模仁、與該第二可溶解性模仁,使該高分子材料層具有一對應該第一凹凸結構的第一轉印結構;以及一對應該第二凹凸結構的第二轉印結構;以及將該第一膠帶與該第 一黏著層分離;以及將該第二膠帶與該第二黏著層分離,並施予一第二高溫至該高分子材料層,使該高分子材料層固化,其中該第一高溫與該第二高溫不同;以及一溶解步驟,係提供一溶劑溶解該第一可溶解性模仁、與該第二可溶解性模仁,使該固化後之高分子材料層與該第一黏著層、以及該第二黏著層分離,以取得一轉印物件。 The present invention further provides a method for large-scale stamping, which includes: an adding step, which is to add a soluble material into a first sample mold and a second sample mold, and solidify the soluble material to form a first soluble mold core in the first sample mold, wherein the first soluble mold core has a first concave-convex structure; and to form a second soluble mold core in the second sample mold, wherein the second soluble mold core has a second concave-convex structure; a forming step, which is to form a first adhesive layer on one side of the first soluble mold core relative to the first sample mold; and a second adhesive layer on one side of the second soluble mold core relative to the second sample mold; a mold removal step, which includes: attaching A first molding device is attached to a side of the first adhesive layer opposite to the first sample mold, wherein the first molding device includes: a first frame structure; a first tape, which is arranged on the first frame structure; and a first supporting back plate, which is arranged on the first tape, wherein the first molding device is in contact with the first adhesive layer with a side of the first tape opposite to the first supporting back plate; and a second molding device is attached to a side of the second adhesive layer opposite to the second sample mold, wherein the second molding device includes: a second frame structure; a second tape, which is arranged on the second frame structure; and a second supporting back plate, which is arranged on the second tape, wherein the second molding device is The second adhesive layer is contacted with one side of the second adhesive tape relative to the second supporting back plate; a separation step includes: separating the first mold device relative to the first sample mold, wherein the first soluble mold core is separated from the first sample mold along with the first mold device; and separating the second mold device relative to the second sample mold, wherein the second soluble mold core is separated from the second sample mold along with the second mold device; a contact step includes: contacting the first soluble mold core and the second soluble mold core with a polymer material layer at intervals; an embossing step includes: applying a first high temperature to the polymer material layer; and applying a pressure to the first high temperature layer. A soluble mold and a second soluble mold are provided to make the polymer material layer have a first transfer structure corresponding to the first concave-convex structure; and a second transfer structure corresponding to the second concave-convex structure; and the first tape is separated from the first adhesive layer; and the second tape is separated from the second adhesive layer, and a second high temperature is applied to the polymer material layer to solidify the polymer material layer, wherein the first high temperature is different from the second high temperature; and a dissolving step is provided to dissolve the first soluble mold and the second soluble mold, so that the solidified polymer material layer is separated from the first adhesive layer and the second adhesive layer to obtain a transfer object.

更佳者,其中更包含:一剝離步驟,係於該壓印步驟後、與該溶解步驟前,將該第一黏著層自該第一可溶解性模仁之表層剝離;以及將該第二黏著層自該第二可溶解性模仁之表層剝離。 More preferably, it further comprises: a peeling step, which is to peel the first adhesive layer from the surface of the first soluble mold after the embossing step and before the dissolving step; and peel the second adhesive layer from the surface of the second soluble mold.

本發明另提供一種大規模壓印之方法,係包括:一添加步驟,係添加一可溶解性材料於一第一樣模以及一第二樣模內,並固化該可溶解性材料,以於該第一樣模中形成一第一可溶解性模仁,其中該第一可溶解性模仁具有一第一凹凸結構;以及於該第二樣模中形成一第二可溶解性模仁,其中該第二可溶解性模仁具有一第二凹凸結構;一形成步驟,於該第一可溶解性模仁相對於該第一樣模之一側形成一第一黏著層;以及於該第二可溶解性模仁相對於該第二樣模之一側形成一第二黏著層;一取模步驟,係包含:附著一第一取模裝置於該第一黏著層相對於該第一樣模之一側,其中該第一取模裝置包含:一第一架體結構;一第一膠帶,其係設置於該第一架體結構;以及一第一支撐背板,其係設置於該第一膠帶,其中該第一取模裝置係以該第一支撐背板與該第一黏著層接觸;以及附著一第二取模裝置於該第二黏著層相對於該第二樣模之一側,其中該第二取模裝置包含:一第二架體結構;一第二膠帶,其係設置於該第二架體結構;以及一第二支撐背板,其係設置於該第二膠帶,其中該第二取模裝置係以該第二支撐背板與該第二黏著層接觸;一分離步驟,係包含:將該第一取模裝置相對於 該第一樣模分離,其中該第一可溶解性模仁係隨著該第一取模裝置相對於該第一樣模分離;以及將該第二取模裝置相對於該第二樣模分離,其中該第二可溶解性模仁係隨著該第二取模裝置相對於該第二樣模分離;一接觸步驟,係包含:將該第一可溶解性模仁與該第二可溶解性模仁相互間隔地與一高分子材料層接觸;一壓印步驟,係包含:施予一壓力至該第一可溶解性模仁,使該高分子材料層具有一對應該第一凹凸結構的第一轉印結構;以及該第二可溶解性模仁,使該高分子材料層具有一對應該第二凹凸結構的第二轉印結構;以及以一UV光照射該高分子材料層,使該高分子材料層固化,並使該第一支撐背板與該第一膠帶分離;以及使該第二支撐背板與該第二膠帶分離;以及一溶解步驟,係提供一溶劑溶解該第一可溶解性模仁、與該第二可溶解性模仁,使該固化後之高分子材料層與該第一支撐背板分離、以及該第二支撐背板分離,以取得一轉印物件。 The present invention further provides a method for large-scale stamping, which includes: an adding step, adding a soluble material into a first sample mold and a second sample mold, and curing the soluble material to form a first soluble mold core in the first sample mold, wherein the first soluble mold core has a first concave-convex structure; and forming a second soluble mold core in the second sample mold, wherein the second soluble mold core has a second concave-convex structure; a forming step, forming a first adhesive layer on one side of the first soluble mold core relative to the first sample mold; and forming a second adhesive layer on one side of the second soluble mold core relative to the second sample mold; The molding step includes: attaching a first molding device to a side of the first adhesive layer opposite to the first sample mold, wherein the first molding device includes: a first frame structure; a first adhesive tape, which is arranged on the first frame structure; and a first supporting back plate, which is arranged on the first adhesive tape, wherein the first molding device is in contact with the first adhesive layer with the first supporting back plate; and attaching a second molding device to a side of the second adhesive layer opposite to the second sample mold, wherein the second molding device includes: a second frame structure; a second adhesive tape, which is arranged on the second frame structure; and a second supporting back plate, which is arranged on the second adhesive tape. The second mold taking device is in contact with the second adhesive layer with the second supporting back plate; a separation step includes: separating the first mold taking device from the first sample mold, wherein the first soluble mold core is separated from the first sample mold along with the first mold taking device; and separating the second mold taking device from the second sample mold, wherein the second soluble mold core is separated from the second sample mold along with the second mold taking device; a contact step includes: contacting the first soluble mold core and the second soluble mold core with a polymer material layer at intervals; an embossing step includes: applying a pressure to the first soluble mold core, The polymer material layer is provided with a first transfer structure corresponding to the first concavo-convex structure; and the second soluble mold is provided with a second transfer structure corresponding to the second concavo-convex structure; and the polymer material layer is irradiated with UV light to solidify the polymer material layer, and the first supporting back plate is separated from the first adhesive tape; and the second supporting back plate is separated from the second adhesive tape; and a dissolving step is provided, which is to provide a solvent to dissolve the first soluble mold and the second soluble mold, so that the cured polymer material layer is separated from the first supporting back plate and the second supporting back plate to obtain a transfer object.

更佳者,其中該高分子材料層係形成於一基材層上,並且該接觸步驟係包含:首先:係將該第一可溶解性模仁加熱至一溫度T,其中0<T<Tg,並使該第一可溶解性模仁與該高分子材料層接觸;再來:將該第二可溶解性模仁加熱至該溫度T,並使該第二可溶解性模仁與該高分子材料層接觸;該接觸步驟或包含:首先:係將該基材層加熱至一溫度T,其中0<T<Tg,並使該第一可溶解性模仁與該高分子材料層接觸;再來:將該第二可溶解性模仁與該高分子材料層接觸;以及該接觸步驟或包含:首先:係將該基材層與該第一可溶解性模仁相對應之部分加熱至一溫度T,其中0<T<Tg,並使該第一可溶解性模仁與該高分子材料層接觸;再來:將該基材層與該第二可溶解性模仁相對應之部分加熱至該溫度T,並使該第二可溶解性模仁與該高分子材料層接觸。 More preferably, the polymer material layer is formed on a substrate layer, and the contacting step comprises: firstly, heating the first soluble mold core to a temperature T, wherein 0<T<Tg, and bringing the first soluble mold core into contact with the polymer material layer; secondly, heating the second soluble mold core to the temperature T, and bringing the second soluble mold core into contact with the polymer material layer; the contacting step may comprise: firstly, heating the substrate layer to a temperature T, wherein 0<T<Tg, and bringing the first soluble mold core into contact with the polymer material layer; The soluble mold core contacts the polymer material layer; then: the second soluble mold core contacts the polymer material layer; and the contacting step may include: first: heating the portion of the substrate layer corresponding to the first soluble mold core to a temperature T, where 0<T<Tg, and contacting the first soluble mold core to the polymer material layer; then: heating the portion of the substrate layer corresponding to the second soluble mold core to the temperature T, and contacting the second soluble mold core to the polymer material layer.

更佳者,其中該高分子材料層係形成於一基材層上,並且該壓印 步驟係包含:施予該第一高溫與該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;於形成該第一轉印結構後,施予該第一高溫與該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;於形成該第二轉印結構後,將該第一支撐背板與該第一膠帶分離;以及將該第二支撐背板與該第二膠帶分離;以及施予該第二高溫至該第一可溶解性模仁與該第二可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置、以及該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層固化;該壓印步驟或包含:施予該第一高溫至該基材層;施予該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;於形成完該第一轉印結構後,施予該壓力至將該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;將該第一支撐背板與該第一膠帶分離;以及將該第二支撐背板與該第二膠帶分離;以及施予該第二高溫至該第一可溶解性模仁與該第二可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置、以及該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層固化;該壓印步驟或包含:施予該第一高溫至該基材層與該第一可溶解性模仁相對應之位置;以及該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;於形成完該第一轉印結構後,施予該第一高溫至該基材層與該第二可溶解性模仁相對應之位置;以及該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;將該第一支撐背板與該第一膠帶分離;以及將該第二支撐背板與該第二膠帶分離;以及施予該第二高溫至該第一可溶解性模仁與該第二可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置、以及該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層固化;該壓印步驟或包含:施予該 第一高溫與該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構,並使該第一支撐背板與該第一膠帶分離;以及施予該第二高溫至該第一可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第一可溶解性模仁相對應之部分固化;以及施予該第一高溫與該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構,並使該第二支撐背板與該第二膠帶分離;以及施予該第二高溫至該第二可溶解性模仁;至該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第二可溶解性模仁相對應之部分固化;該壓印步驟或包含:首先:施予該第一高溫至該基材層與該第一可溶解性模仁相對應之部分;以及該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構,並使該第一支撐背板與該第一膠帶分離;再來:施予該第二高溫至該第一可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第一可溶解性模仁相對應之部分固化;以及首先:施予該第一高溫至該基材層與該第二可溶解性模仁相對應之部分;以及該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構,並使該第二支撐背板與該第二膠帶分離;再來:施予該第二高溫至該第二可溶解性模仁;至該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第二可溶解性模仁相對應之部分固化;以及該壓印步驟或包含:施予該第一高溫至該基材層;施予該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構,並使該第一支撐背板與該第一膠帶分離;以及施予該第二高溫至該第一可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第一可溶解性模仁相對應之部分固化;以及施予該第一 高溫至該基材層;施予該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構,並使該第二支撐背板與該第二膠帶分離;以及施予該第二高溫至該第二可溶解性模仁;至該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第二可溶解性模仁相對應之部分固化。 Preferably, the polymer material layer is formed on a substrate layer, and the embossing step includes: applying the first high temperature and the pressure to the first soluble mold so that the polymer material layer has the first transfer structure; after forming the first transfer structure, applying the first high temperature and the pressure to the second soluble mold so that the polymer material layer has the second transfer structure; after forming the second transfer structure, separating the first supporting back plate from the first tape; and separating the second supporting back plate from the second tape; and applying the second high temperature to the first soluble mold and the second soluble mold; to the substrate layer and the The first soluble mold core is applied to the substrate layer to cure the polymer material layer; the embossing step may include: applying the first high temperature to the substrate layer; applying the pressure to the first soluble mold core to make the polymer material layer have the first transfer structure; after the first transfer structure is formed, applying the pressure to the second soluble mold core to make the polymer material layer have the second transfer structure; separating the first supporting back plate from the first tape; and separating the second supporting back plate from the second tape; and applying the second high temperature to the first soluble mold core; The embossing step may include: applying the first high temperature to the position of the substrate layer corresponding to the first soluble mold core and the second soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core and the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the polymer material layer is solidified; the embossing step may include: applying the first high temperature to the position of the substrate layer corresponding to the first soluble mold core; and applying the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure; after the first transfer structure is formed, applying the first high temperature to the position of the substrate layer corresponding to the second soluble mold core; and applying the pressure to the second soluble mold core, so that the high The polymer material layer has the second transfer structure; the first supporting back plate is separated from the first tape; and the second supporting back plate is separated from the second tape; and the second high temperature is applied to the first soluble mold and the second soluble mold; to the position of the substrate layer corresponding to the first soluble mold, and the position of the substrate layer corresponding to the second soluble mold; or to the substrate layer, so that the polymer material layer is cured; the embossing step may include: applying the first high temperature and the pressure to the first soluble mold so that the polymer material layer has the first transfer structure, and separating the first supporting back plate from the first tape ; and applying the second high temperature to the first soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the first soluble mold core is solidified; and applying the first high temperature and the pressure to the second soluble mold core, so that the polymer material layer has the second transfer structure, and the second supporting back plate is separated from the second tape; and applying the second high temperature to the second soluble mold core; to the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the second soluble mold core is solidified. The embossing step may include: first: applying the first high temperature to the portion of the substrate layer corresponding to the first soluble mold core; and applying the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure, and the first supporting back plate is separated from the first tape; then: applying the second high temperature to the first soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the first soluble mold core is cured; and first: applying the first high temperature to the portion of the substrate layer corresponding to the second soluble mold core; and applying the pressure The method comprises: applying the first high temperature to the substrate layer; applying the pressure to the first soluble mold core so that the polymer material layer has the second transfer structure and the second supporting back plate is separated from the second tape; applying the second high temperature to the second soluble mold core; to the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer so that the portion of the polymer material layer corresponding to the second soluble mold core is solidified; and the embossing step may include: applying the first high temperature to the substrate layer; applying the pressure to the first soluble mold core so that the polymer material layer has the first transfer structure and the first supporting back plate is separated from the first tape; and applying the second high temperature to the substrate layer; The first soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the first soluble mold core is solidified; and the first high temperature is applied to the substrate layer; the pressure is applied to the second soluble mold core, so that the polymer material layer has the second transfer structure, and the second supporting back plate is separated from the second adhesive tape; and the second high temperature is applied to the second soluble mold core; to the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the second soluble mold core is solidified.

更佳者,其中該高分子材料層係形成於一基材層上,並且該壓印步驟係包含:施予該第一高溫與該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;於形成該第一轉印結構後,施予該第一高溫與該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;於形成該第二轉印結構後,將該第一支撐背板與該第一黏著層分離;以及將該第二支撐背板與該第二黏著層分離;以及施予該第二高溫至該第一可溶解性模仁與該第二可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置、以及該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層固化;該壓印步驟或包含:施予該第一高溫至該基材層;施予該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;於形成完該第一轉印結構後,施予該壓力至將該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;將該第一支撐背板與該第一黏著層分離;以及將該第二支撐背板與該第二黏著層分離;以及施予該第二高溫至該第一可溶解性模仁與該第二可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置、以及該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層固化;該壓印步驟或包含:施予該第一高溫至該基材層與該第一可溶解性模仁相對應之位置;以及該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;於形成完該第一轉印結構後,施予該第一高溫至該基材層與該第二可溶解性模仁相對應之位 置;以及該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;將該第一支撐背板與該第一黏著層分離;以及將該第二支撐背板與該第二黏著層分離;以及施予該第二高溫至該第一可溶解性模仁與該第二可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置、以及該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層固化;該壓印步驟或包含:施予該第一高溫與該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構,並使該第一支撐背板與該第一黏著層分離;以及施予該第二高溫至該第一可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第一可溶解性模仁相對應之部分固化;以及施予該第一高溫與該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構,並使該第二支撐背板與該第二黏著層分離;以及施予該第二高溫至該第二可溶解性模仁;至該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第二可溶解性模仁相對應之部分固化;該壓印步驟或包含:首先:施予該第一高溫至該基材層與該第一可溶解性模仁相對應之部分;以及該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構,並使該第一支撐背板與該第一黏著層分離;再來:施予該第二高溫至該第一可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第一可溶解性模仁相對應之部分固化;以及首先:施予該第一高溫至該基材層與該第二可溶解性模仁相對應之部分;以及該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構,並使該第二支撐背板與該第二黏著層分離;再來:施予該第二高溫至該第二可溶解性模仁;至該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子 材料層與該第二可溶解性模仁相對應之部分固化;以及該壓印步驟或包含:施予該第一高溫至該基材層;施予該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構,並使該第一支撐背板與該第一黏著層分離;以及施予該第二高溫至該第一可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第一可溶解性模仁相對應之部分固化;以及施予該第一高溫至該基材層;施予該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構,並使該第二支撐背板與該第二黏著層分離;以及施予該第二高溫至該第二可溶解性模仁;至該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第二可溶解性模仁相對應之部分固化。 More preferably, the polymer material layer is formed on a substrate layer, and the embossing step includes: applying the first high temperature and the pressure to the first soluble mold so that the polymer material layer has the first transfer structure; after forming the first transfer structure, applying the first high temperature and the pressure to the second soluble mold so that the polymer material layer has the second transfer structure; after forming the second transfer structure, separating the first supporting back plate from the first adhesive layer; and separating the second supporting back plate from the second adhesive layer; and applying the second high temperature to the first soluble mold and the second soluble mold; to the substrate layer and the second transfer structure; The first soluble mold core is applied to the substrate layer to cure the polymer material layer; the embossing step may include: applying the first high temperature to the substrate layer; applying the pressure to the first soluble mold core to make the polymer material layer have the first transfer structure; after the first transfer structure is formed, applying the pressure to the second soluble mold core to make the polymer material layer have the second transfer structure; separating the first supporting back plate from the first adhesive layer; and separating the second supporting back plate from the second adhesive layer; and applying the second high temperature to the first soluble mold core; The first soluble mold core and the second soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core and the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the polymer material layer is solidified; the embossing step may include: applying the first high temperature to the position of the substrate layer corresponding to the first soluble mold core; and applying the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure; after the first transfer structure is formed, applying the first high temperature to the position of the substrate layer corresponding to the second soluble mold core; and applying the pressure to the second soluble mold core, so that the high The polymer material layer has the second transfer structure; the first supporting back plate is separated from the first adhesive layer; and the second supporting back plate is separated from the second adhesive layer; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core, and the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so as to solidify the polymer material layer; the embossing step may include: applying the first high temperature and the pressure to the first soluble mold core so that the polymer material layer has the first transfer structure, and separating the first supporting back plate from the first adhesive layer ; and applying the second high temperature to the first soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the first soluble mold core is solidified; and applying the first high temperature and the pressure to the second soluble mold core, so that the polymer material layer has the second transfer structure, and the second supporting back plate is separated from the second adhesive layer; and applying the second high temperature to the second soluble mold core; to the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the second soluble mold core is solidified. Curing; the embossing step may include: first: applying the first high temperature to the portion of the substrate layer corresponding to the first soluble mold core; and the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure, and the first supporting back plate is separated from the first adhesive layer; then: applying the second high temperature to the first soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the first soluble mold core is cured; and first: applying the first high temperature to the portion of the substrate layer corresponding to the second soluble mold core; and the pressure to the second soluble mold, so that the polymer material layer has the second transfer structure, and the second supporting back plate is separated from the second adhesive layer; then: applying the second high temperature to the second soluble mold; to the position of the substrate layer corresponding to the second soluble mold; or to the substrate layer, so that the portion of the polymer material layer corresponding to the second soluble mold is solidified; and the embossing step may include: applying the first high temperature to the substrate layer; applying the pressure to the first soluble mold, so that the polymer material layer has the first transfer structure, and the first supporting back plate is separated from the first adhesive layer; and applying the second high temperature to the first soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the first soluble mold core is solidified; and the first high temperature is applied to the substrate layer; the pressure is applied to the second soluble mold core, so that the polymer material layer has the second transfer structure, and the second supporting back plate is separated from the second adhesive layer; and the second high temperature is applied to the second soluble mold core; to the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the second soluble mold core is solidified.

更佳者,其中該高分子材料層係形成於一基材層上,並且該壓印步驟係包含:施予該第一高溫與該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;於形成該第一轉印結構後,施予該第一高溫與該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;於形成該第二轉印結構後,將該第一膠帶與該第一黏著層分離;以及將該第二膠帶與該第二黏著層分離;以及施予該第二高溫至該第一可溶解性模仁與該第二可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置、以及該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層固化;該壓印步驟或包含:施予該第一高溫至該基材層;施予該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;於形成完該第一轉印結構後,施予該壓力至將該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;將該第一膠帶與該第一黏著層分離;以及將該第二膠帶與該第二黏著層分離;以及施予該第二高 溫至該第一可溶解性模仁與該第二可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置、以及該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層固化;該壓印步驟或包含:施予該第一高溫至該基材層與該第一可溶解性模仁相對應之位置;以及該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;於形成完該第一轉印結構後,施予該第一高溫至該基材層與該第二可溶解性模仁相對應之位置;以及該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;將該第一膠帶與該第一黏著層分離;以及將該第二膠帶與該第二黏著層分離;以及施予該第二高溫至該第一可溶解性模仁與該第二可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置、以及該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層固化;該壓印步驟或包含:施予該第一高溫與該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構,並使該第一膠帶與該第一黏著層分離;以及施予該第二高溫至該第一可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第一可溶解性模仁相對應之部分固化;以及施予該第一高溫與該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構,並使該第二膠帶與該第二黏著層分離;以及施予該第二高溫至該第二可溶解性模仁;至該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第二可溶解性模仁相對應之部分固化;該壓印步驟或包含:首先:施予該第一高溫至該基材層與該第一可溶解性模仁相對應之部分;以及該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構,並使該第一膠帶與該第一黏著層分離;再來:施予該第二高溫至該第一可溶解性模仁;至該基材層與該第一可 溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第一可溶解性模仁相對應之部分固化;以及首先:施予該第一高溫至該基材層與該第二可溶解性模仁相對應之部分;以及該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構,並使該第二膠帶與該第二黏著層分離;再來:施予該第二高溫至該第二可溶解性模仁;至該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第二可溶解性模仁相對應之部分固化;以及該壓印步驟或包含:施予該第一高溫至該基材層;施予該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構,並使該第一膠帶與該第一黏著層分離;以及施予該第二高溫至該第一可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第一可溶解性模仁相對應之部分固化;以及施予該第一高溫至該基材層;施予該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構,並使該第二膠帶與該第二黏著層分離;以及施予該第二高溫至該第二可溶解性模仁;至該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第二可溶解性模仁相對應之部分固化。 More preferably, the polymer material layer is formed on a substrate layer, and the embossing step includes: applying the first high temperature and the pressure to the first soluble mold so that the polymer material layer has the first transfer structure; after forming the first transfer structure, applying the first high temperature and the pressure to the second soluble mold so that the polymer material layer has the second transfer structure; after forming the second transfer structure, separating the first tape from the first adhesive layer; and separating the second tape from the second adhesive layer; and applying the second high temperature to the first soluble mold and the second soluble mold; to the substrate layer and the second transfer structure; The method comprises: applying the first high temperature to the substrate layer; applying the pressure to the first soluble mold core so that the polymer material layer has the first transfer structure; after the first transfer structure is formed, applying the pressure to the second soluble mold core so that the polymer material layer has the second transfer structure; separating the first tape from the first adhesive layer; and separating the second tape from the second adhesive layer; and applying the second high temperature to the first soluble mold core. The embossing step may include: applying the first high temperature to the position of the substrate layer corresponding to the first soluble mold core and the second soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core and the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the polymer material layer is solidified; the embossing step may include: applying the first high temperature to the position of the substrate layer corresponding to the first soluble mold core; and applying the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure; after the first transfer structure is formed, applying the first high temperature to the position of the substrate layer corresponding to the second soluble mold core; and applying the pressure to the second soluble mold core, so that the polymer material layer has the first transfer structure. The polymer material layer has the second transfer structure; the first tape is separated from the first adhesive layer; and the second tape is separated from the second adhesive layer; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core, and the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the polymer material layer is cured; the embossing step may include: applying the first high temperature and the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure, and separating the first tape from the first adhesive layer; and applying the second high temperature to the first soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the first soluble mold core is solidified; and applying the first high temperature and the pressure to the second soluble mold core, so that the polymer material layer has the second transfer structure and the second tape is separated from the second adhesive layer; and applying the second high temperature to the second soluble mold core; to the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the second soluble mold core is solidified. The embossing step may include: first: applying the first high temperature to the portion of the substrate layer corresponding to the first soluble mold core; and applying the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure and the first tape is separated from the first adhesive layer; then: applying the second high temperature to the first soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the first soluble mold core is solidified; and first: applying the first high temperature to the portion of the substrate layer corresponding to the second soluble mold core; and applying the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure and the first tape is separated from the first adhesive layer; then: applying the second high temperature to the first soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the first soluble mold core is solidified; and first: applying the first high temperature to the portion of the substrate layer corresponding to the second soluble mold core; and applying the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure and the first tape is separated from the first adhesive layer; The method comprises: applying the first high temperature to the substrate layer; applying the pressure to the first soluble mold core so that the polymer material layer has the second transfer structure and the second tape is separated from the second adhesive layer; applying the second high temperature to the second soluble mold core; to the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer so that the portion of the polymer material layer corresponding to the second soluble mold core is solidified; and the embossing step may include: applying the first high temperature to the substrate layer; applying the pressure to the first soluble mold core so that the polymer material layer has the first transfer structure and the first tape is separated from the first adhesive layer; and applying the second high temperature to the substrate layer; The first soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the first soluble mold core is solidified; and the first high temperature is applied to the substrate layer; the pressure is applied to the second soluble mold core, so that the polymer material layer has the second transfer structure and the second tape is separated from the second adhesive layer; and the second high temperature is applied to the second soluble mold core; to the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the second soluble mold core is solidified.

更佳者,其中該高分子材料層係形成於一基材層上,並且該壓印步驟係包含:首先:施予該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;以該UV光照射該高分子材料層與該第一可溶解性模仁相對應之部分,以使該高分子材料層與該第一可溶解性模仁相對應之部分固化;以及使該第一支撐背板與該第一膠帶分離;以及再來:施予該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;以該UV光照射該高分子材料層與該第二可溶解性模仁相對應之部分,以使該高分子材料層與該第二可溶解性模 仁相對應之部分固化;以及使該第二支撐背板與該第二膠帶分離;該壓印步驟或包含:施予該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;施予該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;以該UV光照射該高分子材料層,使該高分子材料層固化;以及使該第一支撐背板與該第一膠帶分離、與使該第二支撐背板與該第二膠帶分離;以及該壓印步驟或包含:施予該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;施予該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;以該UV光照射該高分子材料層與該第一可溶解性模仁相對應之部分,使該高分子材料層與該第一可溶解性模仁相對應之部分固化,並使該第一支撐背板與該第一膠帶分離;以及以該UV光照射該高分子材料層與該第二可溶解性模仁相對應之部分,使該高分子材料層與該第二可溶解性模仁相對應之部分固化,並使該第二支撐背板與該第二膠帶分離。 More preferably, the polymer material layer is formed on a substrate layer, and the embossing step comprises: first: applying the pressure to the first soluble mold so that the polymer material layer has the first transfer structure; irradiating the portion of the polymer material layer corresponding to the first soluble mold with the UV light so that the portion of the polymer material layer corresponding to the first soluble mold is cured; and separating the first supporting back plate from the first adhesive tape; and then: applying the pressure to the first soluble mold. The second soluble mold is applied to the polymer material layer so that the polymer material layer has the second transfer structure; the UV light is irradiated on the portion of the polymer material layer corresponding to the second soluble mold so that the portion of the polymer material layer corresponding to the second soluble mold is cured; and the second supporting back plate is separated from the second adhesive tape; the embossing step may include: applying the pressure to the first soluble mold so that the polymer material layer has the first transfer structure; applying the pressure to the second soluble mold The soluble mold is used to make the polymer material layer have the second transfer structure; the polymer material layer is irradiated with the UV light to cure the polymer material layer; and the first supporting back plate is separated from the first tape, and the second supporting back plate is separated from the second tape; and the embossing step may include: applying the pressure to the first soluble mold so that the polymer material layer has the first transfer structure; applying the pressure to the second soluble mold so that the polymer material layer has the second transfer structure; Second transfer structure; irradiating the portion of the polymer material layer corresponding to the first soluble mold core with the UV light to solidify the portion of the polymer material layer corresponding to the first soluble mold core, and separating the first supporting back plate from the first adhesive tape; and irradiating the portion of the polymer material layer corresponding to the second soluble mold core with the UV light to solidify the portion of the polymer material layer corresponding to the second soluble mold core, and separating the second supporting back plate from the second adhesive tape.

本發明相較於先前技術之功效在於:本發明可精準、穩定、持續地以模仁對高分子材料進行壓印,以高效取得大規模範圍之轉印物件,並且,最終所獲得之轉印物件同時兼具高良率與高品質,於實際應用面上可實現較高之穩定性、耐久性、與安全性。具體而言,於本發明中:第一支撐背板係藉由第一黏著層與第一可溶解性模仁黏接,因此,於第一可溶解性模仁與第一樣模分離時;第一可溶解性模仁與高分子材料層接觸或對位時;施予第一高溫或壓力於第一可溶解性模仁時;使第一架體結構相對於第一支撐背板分離時;第一架體結構以及設置於第一架體結構之第一膠帶相對於第一支撐背板分離時;以及溶解第一可溶解性模仁時,第一支撐背板皆可維持第一可溶解性模仁之結構,使第一可溶解性模仁不產生偏移或形變,因此可使最終壓印出的轉印物件不產生缺陷。此 外,由於在進行溶解步驟前,第二支撐背板係藉由第二黏著層與第二可溶解性模仁黏接,因此,於第二可溶解性模仁與第二樣模分離時;第二可溶解性模仁與高分子材料層接觸或對位時;施予第一高溫或壓力於第二可溶解性模仁時;使第二架體結構相對於第二支撐背板分離時;第二架體結構以及設置於第二架體結構之第二膠帶相對於第二支撐背板分離時;以及溶解第二可溶解性模仁時,第二支撐背板皆可維持第二可溶解性模仁之結構,使第二可溶解性模仁不產生偏移或形變,因此可使最終壓印出的轉印物件不產生缺陷。 Compared with the prior art, the present invention is effective in that the present invention can accurately, stably and continuously emboss the polymer material with the mold core to efficiently obtain a large-scale transfer object, and the transfer object finally obtained has both high yield and high quality, and can achieve higher stability, durability and safety in practical applications. Specifically, in the present invention: the first supporting back plate is bonded to the first soluble mold core by the first adhesive layer, therefore, when the first soluble mold core is separated from the first sample mold; when the first soluble mold core is in contact with or aligned with the polymer material layer; when the first high temperature or pressure is applied to the first soluble mold core; when the first frame structure is separated from the first supporting back plate; when the first frame structure and the first tape arranged on the first frame structure are separated from the first supporting back plate; and when the first soluble mold core is dissolved, the first supporting back plate can maintain the structure of the first soluble mold core, so that the first soluble mold core does not deviate or deform, and thus the final printed transfer object can be free of defects. In addition, since the second supporting back plate is bonded to the second soluble mold core by the second adhesive layer before the dissolving step, when the second soluble mold core is separated from the second sample mold; when the second soluble mold core is in contact with or aligned with the polymer material layer; when the first high temperature or pressure is applied to the second soluble mold core; when the second frame structure is separated from the second supporting back plate; when the second frame structure and the second tape disposed on the second frame structure are separated from the second supporting back plate; and when the second soluble mold core is dissolved, the second supporting back plate can maintain the structure of the second soluble mold core, so that the second soluble mold core does not deviate or deform, and thus the final printed transfer object can be free of defects.

S1:添加步驟 S1: Add step

S2:形成步驟 S2: Formation step

S3:取模步驟 S3: Moulding step

S4:分離步驟 S4: Separation step

S5:接觸步驟 S5: Contact step

S6:壓印步驟 S6: Imprinting step

S7:溶解步驟 S7: Dissolution step

S8:剝離步驟 S8: Peeling step

1:可溶解性材料 1: Soluble materials

2:第一樣模 2: First sample

201:第一樣模結構 201: First sample structure

202:第一記號結構 202: First sign structure

3:第一可溶解性模仁 3: The first soluble mold core

4:第一凹凸結構 4: The first concave-convex structure

5:第一黏著層 5: First adhesive layer

6:第一架體結構 6: The first frame structure

7:第一膠帶 7: First tape

8:第一支撐背板 8: The first back support

9:第一轉印結構 9: First transfer structure

10:第二樣模 10: Second sample

1001:第二樣模結構 1001: Second sample structure

1002:第二記號結構 1002: Second symbol structure

11:第二可溶解性模仁 11: Second soluble mold core

12:第二凹凸結構 12: Second concave-convex structure

13:第二黏著層 13: Second adhesive layer

14:第二架體結構 14: Second frame structure

15:第二膠帶 15: Second tape

16:第二支撐背板 16: The second back support

17:第二轉印結構 17: Second transfer structure

18:高分子材料層 18: Polymer material layer

19:溶劑 19:Solvent

20:轉印物件 20: Transfer objects

21:第一對位記號 21: First alignment mark

22:第二對位記號 22: Second alignment mark

23:第三對位記號 23: Third counterpoint mark

24:第四對位記號 24: Fourth counterpoint mark

25:第五對位記號 25: Fifth counterpoint mark

26:第六對位記號 26: Sixth counterpoint mark

27:第七對位記號 27: Seventh counterpoint mark

28:待轉印物件 28: Objects to be transferred

29:基材層 29: Base material layer

30:機台平台 30: Machine platform

31:第一攝像元件 31: First imaging element

32:第一紅外線發射元件 32: First infrared emitting element

33:第二攝像元件 33: Second imaging element

34:第二紅外線發射元件 34: Second infrared emitting element

35:位置調整元件 35: Position adjustment element

36:穿孔 36:Piercing

37:轉印元件 37: Transfer element

38:升溫元件 38: Heating element

39:吹氣元件 39: Blowing element

40:UV發射源 40: UV emitter

100:第一取模裝置 100: First mold taking device

200:第二取模裝置 200: Second mold taking device

圖1A至1B用為一系列之方塊圖,用以說明本發明之壓印流程;圖2A至2B用以說明本發明之添加步驟;圖3用以說明本發明之形成步驟;圖4A至4D用以說明本發明之取模步驟;圖5A至5B用以說明本發明之分離步驟;圖6A至6D用以說明本發明之接觸步驟;圖7A至7G用以說明本發明之對位步驟;圖8A至8G用以說明本發明壓印步驟之第一實施態樣;圖9A至9G用以說明本發明壓印步驟之第二實施態樣;圖10A至10H用以說明本發明壓印步驟之第三實施態樣;圖11A至11G用以說明本發明壓印步驟之第四實施態樣;圖12用以說明本發明之剝離步驟;圖13A至13C用以說明本發明之溶解步驟; 圖14A至14D用以說明本發明之壓印方式。 Figures 1A to 1B are a series of block diagrams for illustrating the embossing process of the present invention; Figures 2A to 2B are used to illustrate the adding step of the present invention; Figure 3 is used to illustrate the forming step of the present invention; Figures 4A to 4D are used to illustrate the mold taking step of the present invention; Figures 5A to 5B are used to illustrate the separation step of the present invention; Figures 6A to 6D are used to illustrate the contacting step of the present invention; Figures 7A to 7G are used to illustrate the alignment step of the present invention; Figures 8A to 8G are used to illustrate the Figures 9A to 9G are used to illustrate the first implementation of the embossing step of the present invention; Figures 10A to 10H are used to illustrate the third implementation of the embossing step of the present invention; Figures 11A to 11G are used to illustrate the fourth implementation of the embossing step of the present invention; Figure 12 is used to illustrate the stripping step of the present invention; Figures 13A to 13C are used to illustrate the dissolving step of the present invention; Figures 14A to 14D are used to illustrate the embossing method of the present invention.

為讓本發明上述及/或其他目的、功效、特徵更明顯易懂,下文特舉較佳實施方式,作詳細說明於下:如圖1A所示,本發明提供一種大規模壓印之方法,係依序包含:一添加步驟(S1)、一形成步驟(S2)、一取模步驟(S3)、一分離步驟(S4)、一接觸步驟(S5)、一壓印步驟(S6)、以及一溶解步驟(S7)。於一較佳實施例中,如圖1B所示,其中大規模壓印之方法更包含一剝離步驟(S8),係於壓印步驟(S6)完成後、以及溶解步驟(S7)進行前執行。 In order to make the above and/or other purposes, effects, and features of the present invention more clearly understandable, the following is a preferred implementation method for detailed description: As shown in FIG1A, the present invention provides a method for large-scale imprinting, which sequentially includes: an adding step (S1), a forming step (S2), a mold taking step (S3), a separation step (S4), a contacting step (S5), an imprinting step (S6), and a dissolving step (S7). In a preferred embodiment, as shown in FIG1B, the method for large-scale imprinting further includes a stripping step (S8), which is performed after the imprinting step (S6) is completed and before the dissolving step (S7) is performed.

以下圖2A與圖2B用以說明本發明之添加步驟(S1):「於一第一樣模上形成一第一可溶解性模仁(3);以及於一第二樣模(10)上形成一第二可溶解性模仁(11)。」 The following Figures 2A and 2B are used to illustrate the adding step (S1) of the present invention: "Forming a first soluble mold core (3) on a first sample mold; and forming a second soluble mold core (11) on a second sample mold (10)."

如圖2A所示,首先:先添加一可溶解性材料(1)至一第一樣模(2)、與一第二樣模(10)內,其中該第一樣模(2)具有一第一樣模結構(201)與一第一記號結構(202);該第二樣模(10)具有一第二樣模結構(1001)與一第二記號結構(1002);接著:如圖2B所示,固化該可溶解性材料(1)以形成一第一可溶解性模仁(3),其中該第一可溶解性模仁(3)具有一對應該第一樣模結構(201)的第一凹凸結構(4)、與一對應該第一記號結構(202)的第一對位記號(21);以及固化該可溶解性材料(1)以形成一第二可溶解性模仁(11),其中該第二可溶解性模仁(11)具有一對應該第二樣模結構(1001)的第二凹凸結構(12)、與一對應該第二記號結構(1002)的第二對位記號(22)。較佳地,該可溶解性材料(1)係選自以下所組成之群組:水溶性聚丙烯醯胺(Polyacrylamide;PAM)、聚氨酯、聚脲、聚醯胺、聚酯、聚 胺甲酸酯、聚乙烯基吡咯烷酮、乙烯-乙烯醇、聚丙烯醯胺-乙二醛聚合物、聚丙烯酸、或其結合,但不以此為限。其中該可溶解性材料(1)於該第一樣模(2)的厚度為10至1,000μm,故後續所得之第一可溶解性模仁(3)除了具有可溶解特性外,更具有可撓特性;以及該可溶解性材料(1)於該第二樣模(10)的厚度為10至1,000μm,故後續所得之第二可溶解性模仁(11)除了具有可溶解特性外,更具有可撓特性。較佳地,該可溶解性材料(1)可採用溶液形式添加至該第一樣模(2)、或該第二樣模(10)內,其濃度可為溶液的5至50wt%,但不以此為限。其中可以理解地,若濃度低於此下限值,則會提高該第一凹凸結構(4)、或該第二凹凸結構(12)的不完整性,造成結構缺陷,以致影響壓印品質。此外,該可溶解性材料(1)可採用旋轉塗佈(spin coating)或狹縫塗佈(slot die coating)方式添加;於採用旋轉塗佈下,旋轉塗佈的轉速可為100至5,000rpm,但不以此為限。較佳地,該第一樣模(2)、或該第二樣模(10)之材料為矽。 As shown in FIG. 2A , first, a soluble material (1) is added to a first sample mold (2) and a second sample mold (10), wherein the first sample mold (2) has a first sample mold structure (201) and a first marking structure (202); the second sample mold (10) has a second sample mold structure (1001) and a second marking structure (1002); then, as shown in FIG. 2B , the soluble material (1) is cured to form a first soluble mold core (3), wherein the first soluble The dissolvable mold (3) has a first concave-convex structure (4) corresponding to the first sample structure (201) and a first alignment mark (21) corresponding to the first mark structure (202); and the dissolvable material (1) is cured to form a second dissolvable mold (11), wherein the second dissolvable mold (11) has a second concave-convex structure (12) corresponding to the second sample structure (1001) and a second alignment mark (22) corresponding to the second mark structure (1002). Preferably, the dissolvable material (1) is selected from the group consisting of: water-soluble polyacrylamide (PAM), polyurethane, polyurea, polyamide, polyester, polyurethane, polyvinyl pyrrolidone, ethylene-vinyl alcohol, polyacrylamide-glyoxal polymer, polyacrylic acid, or a combination thereof, but not limited thereto. The thickness of the soluble material (1) in the first mold (2) is 10 to 1,000 μm, so the first soluble mold core (3) obtained later has not only soluble properties but also flexible properties; and the thickness of the soluble material (1) in the second mold (10) is 10 to 1,000 μm, so the second soluble mold core (11) obtained later has not only soluble properties but also flexible properties. Preferably, the soluble material (1) can be added to the first mold (2) or the second mold (10) in the form of a solution, and its concentration can be 5 to 50 wt% of the solution, but not limited thereto. It can be understood that if the concentration is lower than this lower limit, the incompleteness of the first concave-convex structure (4) or the second concave-convex structure (12) will be increased, resulting in structural defects, thereby affecting the quality of embossing. In addition, the soluble material (1) can be added by spin coating or slot die coating; when spin coating is used, the rotation speed of the spin coating can be 100 to 5,000 rpm, but not limited thereto. Preferably, the material of the first sample mold (2) or the second sample mold (10) is silicon.

以下圖3用以說明本發明之形成步驟(S2):「於該第一可溶解性模仁(3)上形成一第一黏著層(5);以及於該第二可溶解性模仁(11)上形成一第二黏著層(13)。」 The following Figure 3 is used to illustrate the forming step (S2) of the present invention: "Forming a first adhesive layer (5) on the first soluble mold (3); and forming a second adhesive layer (13) on the second soluble mold (11)."

如圖3所示,於該可溶解性材料(1)固化,並於該第一樣模(2)中形成一第一可溶解性模仁(3);以及於該第二樣模(10)中形成一第二可溶解性模仁(11)後,於該第一可溶解性模仁(3)相對於該第一樣模(2)之一側形成一第一黏著層(5);以及於該第二可溶解性模仁(11)相對於該第二樣模(10)之一側形成一第二黏著層(13)。其中可以理解地,該第一黏著層(5)、或該第二黏著層(13)之形成之方式可為噴霧、塗佈、貼合、或傾倒,但不以此為限。較佳地,該第一黏著層(5)係均勻地形成於該第一可溶解性模仁(3)相對於該第一樣模(2)之一側;該第二黏 著層(13)係均勻地形成於該第二可溶解性模仁(11)相對於該第二樣模(10)之一側。較佳地,該第一黏著層(5)、或該第二黏著層(13)係一種膠體或液體,其種類包含:光固化接著劑、紫外線硬化膠、光熱轉換(Light-to-Heat Conversion,LTHC)膠、熱固膠或可水解型樹酯,但不以此為限。其中所謂「固化」可為熱固化或光固化(如:紫外光固化);於採用熱固化下,熱固化溫度可為室溫至160℃,熱固化時間可為5至60分鐘,但不以此為限。若時間超過此上限值,則會提高第一可溶解性模仁(3)之剝離難度而使第一凹凸結構(4)形成缺陷;或提高第二可溶解性模仁(11)之剝離難度而使第二凹凸結構(12)形成缺陷。較佳地,該第一黏著層(5)、或該第二黏著層(13)係可為具有雙面黏性之膠帶,其中該膠帶係可藉由加熱、或照射UV光線進行解離,而使其自該第一可溶解性模仁(3)、或該第二可溶解性模仁(11)之表面剝離。較佳地,可以上述之方式於更多之樣模中形成更多之可溶解性模仁,在此不多做贅述。 As shown in FIG3 , after the soluble material (1) is solidified and a first soluble mold core (3) is formed in the first mold (2); and a second soluble mold core (11) is formed in the second mold (10), a first adhesive layer (5) is formed on one side of the first soluble mold core (3) opposite to the first mold (2); and a second adhesive layer (13) is formed on one side of the second soluble mold core (11) opposite to the second mold (10). It can be understood that the first adhesive layer (5) or the second adhesive layer (13) can be formed by spraying, coating, laminating, or pouring, but is not limited thereto. Preferably, the first adhesive layer (5) is uniformly formed on one side of the first soluble mold core (3) opposite to the first sample mold (2); the second adhesive layer (13) is uniformly formed on one side of the second soluble mold core (11) opposite to the second sample mold (10). Preferably, the first adhesive layer (5) or the second adhesive layer (13) is a kind of glue or liquid, and its types include: light curing adhesive, ultraviolet curing glue, light-to-heat conversion (LTHC) glue, thermosetting glue or hydrolyzable resin, but not limited thereto. The so-called "curing" can be heat curing or light curing (such as ultraviolet light curing); when heat curing is adopted, the heat curing temperature can be room temperature to 160°C, and the heat curing time can be 5 to 60 minutes, but not limited thereto. If the time exceeds this upper limit, it will increase the difficulty of peeling off the first soluble mold (3) and cause the first concave-convex structure (4) to form defects; or increase the difficulty of peeling off the second soluble mold (11) and cause the second concave-convex structure (12) to form defects. Preferably, the first adhesive layer (5) or the second adhesive layer (13) can be a double-sided adhesive tape, wherein the adhesive tape can be debonded by heating or irradiating UV light, so that it can be peeled off from the surface of the first soluble mold (3) or the second soluble mold (11). Preferably, more soluble mold cores can be formed in more sample molds in the above-mentioned manner, which will not be elaborated here.

以下圖4A至4D用以說明本發明之取模步驟(S3):「附著一第一取模裝置(100)於該第一黏著層(5);以及附著一第二取模裝置(200)於該第二黏著層(13)。」 The following Figures 4A to 4D are used to illustrate the molding step (S3) of the present invention: "Attaching a first molding device (100) to the first adhesive layer (5); and attaching a second molding device (200) to the second adhesive layer (13)."

如圖4A與4B所示,為本發明取模步驟(S3)之第一實施態樣,首先:附著一第一取模裝置(100)於該第一黏著層(5)相對於該第一樣模(2)之一側,其中該第一取模裝置(100)包含:一第一架體結構(6);一第一膠帶(7),其係設置於該第一架體結構(6);以及一第一支撐背板(8),其係設置於該第一膠帶(7),其中該第一取模裝置(100)係以該第一支撐背板(8)與該第一黏著層(5)接觸;以及附著一第二取模裝置(200)於該第二黏著層(13)相對於該第二樣模(10)之一側,其中該第二取模裝置(200)包含:一第二架體結構(14);一第二膠帶(15),其係設置於該第 二架體結構(14);以及一第二支撐背板(16),其係設置於該第二膠帶(15),其中該第二取模裝置(200)係以該第二支撐背板(16)與該第二黏著層(13)接觸。具體而言,該第一取模裝置(100)係以該第一支撐背板(8)附著於該第一黏著層(5),使該第一支撐背板(8)與該第一可溶解性模仁(3)透過該第一黏著層(5)黏接;該第二取模裝置(200)係以該第二支撐背板(16)附著於該第二黏著層(13),使該第二支撐背板(16)與該第二可溶解性模仁(11)透過該第二黏著層(13)黏接。較佳地,該第一架體結構(6)係一環形框,其中該環形框具有一第一支撐部及一連接該第一支撐部的第一操作部。具體而言,該第一支撐背板(8)或該第一膠帶(7)係設置於該第一操作部。較佳地,該第一支撐背板(8)之面積可以完全覆蓋該第一黏著層(5)之面積,使該第一可溶解性模仁(3)可緊密黏接於該第一支撐背板(8),防止該第一可溶解性模仁(3)於相對於該第一樣模(2)移動時因晃動而產生偏移或誤差。較佳地,該第一膠帶(7)、或該第二膠帶(15)之材料可為熱解離性發泡膠或UV解離性發泡膠,但不以此為限。較佳地,熱解離性發泡膠為聚苯乙烯膠、聚氨酯膠(polyurethane,PU)、或聚苯乙烯膠(polystyrene,PS),其厚度為100至1,000μm。較佳地,當第一黏著層(5)、或第二黏著層(13)係使用膠帶時,該膠帶可與第一膠帶(7)、或第二膠帶(15)相同。較佳地,該第一膠帶(7)具有一第一突出部,其中該第一膠帶(7)係以該第一突出部設置於該第一架體結構(6)之第一操作部。較佳地,該第一支撐背板(8)具有一第二突出部,其中該第一支撐背板(8)係以該第二突出部設置於該第一架體結構(6)之第一操作部。其中可以理解地,該第二架體結構(14)與該第一架體結構(6)之結構相同,因此在此不多做贅述。 As shown in FIGS. 4A and 4B , this is a first implementation of the molding step (S3) of the present invention. First, a first molding device (100) is attached to a side of the first adhesive layer (5) opposite to the first sample mold (2), wherein the first molding device (100) comprises: a first frame structure (6); a first adhesive tape (7) disposed on the first frame structure (6); and a first supporting back plate (8) disposed on the first adhesive tape (7), wherein the first molding device (100) is formed by connecting the first supporting back plate (8) with the first adhesive tape (7). The invention relates to a method for manufacturing a mold taking device (200) for molding a mold of a second sample mold (10) and a method for manufacturing a mold taking device (200) for molding a mold of a second sample mold (10). The method comprises: a first adhesive layer (5) in contact with the first adhesive layer (13); and a second molding device (200) is attached to a side of the second adhesive layer (13) opposite to the second sample mold (10), wherein the second molding device (200) comprises: a second frame structure (14); a second adhesive tape (15) disposed on the second frame structure (14); and a second supporting back plate (16) disposed on the second adhesive tape (15), wherein the second molding device (200) is in contact with the second adhesive layer (13) by the second supporting back plate (16). Specifically, the first mold taking device (100) is attached to the first adhesive layer (5) with the first supporting back plate (8), so that the first supporting back plate (8) and the first soluble mold core (3) are bonded through the first adhesive layer (5); the second mold taking device (200) is attached to the second adhesive layer (13) with the second supporting back plate (16), so that the second supporting back plate (16) and the second soluble mold core (11) are bonded through the second adhesive layer (13). Preferably, the first frame structure (6) is an annular frame, wherein the annular frame has a first supporting portion and a first operating portion connected to the first supporting portion. Specifically, the first supporting back plate (8) or the first adhesive tape (7) is arranged on the first operating portion. Preferably, the area of the first supporting back plate (8) can completely cover the area of the first adhesive layer (5), so that the first soluble mold core (3) can be tightly bonded to the first supporting back plate (8) to prevent the first soluble mold core (3) from being offset or erroneously moved relative to the first sample mold (2) due to shaking. Preferably, the material of the first tape (7) or the second tape (15) can be a thermally degradable foam or a UV-degradable foam, but not limited thereto. Preferably, the thermally degradable foam is polystyrene, polyurethane (PU), or polystyrene (PS), and has a thickness of 100 to 1,000 μm. Preferably, when the first adhesive layer (5) or the second adhesive layer (13) is a tape, the tape may be the same as the first tape (7) or the second tape (15). Preferably, the first tape (7) has a first protrusion, wherein the first tape (7) is disposed on the first operating portion of the first frame structure (6) with the first protrusion. Preferably, the first supporting back plate (8) has a second protrusion, wherein the first supporting back plate (8) is disposed on the first operating portion of the first frame structure (6) with the second protrusion. It can be understood that the second frame structure (14) has the same structure as the first frame structure (6), so no further description is given here.

如圖4C與4D所示,為本發明取模步驟(S3)之第二實施態樣,其中,本實施態樣與第一實施態樣之差異係為:取模裝置之結構不同。於取模步驟(S3) 之第二實施態樣中,係包含:附著一第一取模裝置(100)於該第一黏著層(5)相對於該第一樣模(2)之一側,其中該第一取模裝置(100)包含:一第一架體結構(6);一第一膠帶(7),其係設置於該第一架體結構(6);以及一第一支撐背板(8),其係設置於該第一膠帶(7),其中該第一取模裝置(100)係以該第一膠帶(7)相對於該第一支撐背板(8)之一側與該第一黏著層(5)接觸;以及附著一第二取模裝置(200)於該第二黏著層(13)相對於該第二樣模(10)之一側,其中該第二取模裝置(200)包含:一第二架體結構(14);一第二膠帶(15),其係設置於該第二架體結構(14);以及一第二支撐背板(16),其係設置於該第二膠帶(15),其中該第二取模裝置(200)係以該第二膠帶(15)相對於該第二支撐背板(16)之一側與該第二黏著層(13)接觸。具體而言,於上述兩實施態樣中,皆於取模裝置上設置有支撐背板,其目的係在於,可於後續之壓印步驟(S6)中平整、穩定地將該第一可溶解性模仁(3)、或該第二可溶解性模仁(11)壓入高分子材料層(18)中;以及避免第一可溶解性模仁(3)、或第二可溶解性模仁(11)於壓印過程中產生晃動、或誤差,而影響最終生產產品之良率與品質。 As shown in Figures 4C and 4D, this is the second implementation of the molding step (S3) of the present invention, wherein the difference between this implementation and the first implementation is that the structure of the molding device is different. In the second implementation of the molding step (S3), it includes: attaching a first molding device (100) to one side of the first adhesive layer (5) opposite to the first sample mold (2), wherein the first molding device (100) includes: a first frame structure (6); a first adhesive tape (7), which is arranged on the first frame structure (6); and a first supporting back plate (8), which is arranged on the first adhesive tape (7), wherein the first molding device (100) is connected to the first adhesive layer with one side of the first adhesive tape (7) opposite to the first supporting back plate (8). (5); and attaching a second molding device (200) to one side of the second adhesive layer (13) opposite to the second sample mold (10), wherein the second molding device (200) comprises: a second frame structure (14); a second adhesive tape (15), which is arranged on the second frame structure (14); and a second supporting back plate (16), which is arranged on the second adhesive tape (15), wherein the second molding device (200) is in contact with the second adhesive layer (13) with one side of the second adhesive tape (15) opposite to the second supporting back plate (16). Specifically, in the above two embodiments, a supporting back plate is provided on the mold removal device, the purpose of which is to smoothly and stably press the first soluble mold core (3) or the second soluble mold core (11) into the polymer material layer (18) in the subsequent embossing step (S6); and to prevent the first soluble mold core (3) or the second soluble mold core (11) from shaking or error during the embossing process, thereby affecting the yield and quality of the final product.

以下圖5A與5B用以說明本發明之分離步驟(S4):「使該第一可溶解性模仁(3)與該第一樣模(2)分離;以及使該第二可溶解性模仁(11)與該第二樣模(10)分離。」 The following Figures 5A and 5B are used to illustrate the separation step (S4) of the present invention: "Separating the first soluble mold core (3) from the first sample mold (2); and separating the second soluble mold core (11) from the second sample mold (10)."

如圖5A所示,為本發明分離步驟(S4)之第一實施態樣:於該第一支撐背板(8)與該第一黏著層(5)接觸後,移動該第一取模裝置(100),使該第一可溶解性模仁(3)隨著該第一取模裝置(100)相對於該第一樣模(2)移動,以使該第一可溶解性模仁(3)與該第一樣模(2)分離;以及於該第二支撐背板(16)與該第二黏著層(13)接觸後,移動該第二取模裝置(200),使該第二可溶解性模仁(11)隨著該 第二取模裝置(200)相對於該第二樣模(10)移動,以使該第二可溶解性模仁(11)與該第二樣模(10)分離。較佳地,該第一可溶解性模仁(3)自該第一樣模(2)離開時;或該第二可溶解性模仁(11)自該第二樣模(10)離開時可採用正向剝離或側向剝離方式操作環形框的操作部。 As shown in FIG. 5A , this is a first implementation of the separation step (S4) of the present invention: after the first supporting back plate (8) contacts the first adhesive layer (5), the first mold removal device (100) is moved so that the first soluble mold core (3) moves relative to the first sample mold (2) along with the first mold removal device (100), so that the first soluble mold core (3) is separated from the first sample mold (2); and after the second supporting back plate (16) contacts the second adhesive layer (13), the second mold removal device (200) is moved so that the second soluble mold core (11) moves relative to the second sample mold (10) along with the second mold removal device (200), so that the second soluble mold core (11) is separated from the second sample mold (10). Preferably, when the first soluble mold core (3) leaves the first sample mold (2); or when the second soluble mold core (11) leaves the second sample mold (10), the operating part of the annular frame can be operated by a forward peeling or a side peeling method.

如圖5B所示,為本發明分離步驟(S4)之第二實施態樣,其與第一實施態樣之差異僅在於支撐背板之設置位置有所不同,具體而言為:於該第一膠帶(7)與該第一黏著層(5)接觸後,移動該第一取模裝置(100),使該第一可溶解性模仁(3)隨著該第一取模裝置(100)相對於該第一樣模(2)移動,以使該第一可溶解性模仁(3)與該第一樣模(2)分離;以及於該第二膠帶(15)與該第二黏著層(13)接觸後,移動該第二取模裝置(200),使該第二可溶解性模仁(11)隨著該第二取模裝置(200)相對於該第二樣模(10)移動,以使該第二可溶解性模仁(11)與該第二樣模(10)分離。其中可以理解地,為了使上述步驟之進行過程中,所使用之取模裝置為相同,其中:取模步驟(S3)之第一實施態樣與分離步驟(S4)之第一實施態樣為相配對地設置;以及取模步驟(S3)之第二實施態樣與分離步驟(S4)之第二實施態樣為相配對地設置。 As shown in FIG. 5B , this is a second implementation of the separation step (S4) of the present invention. The difference between the second implementation and the first implementation is that the position of the supporting back plate is different. Specifically, after the first tape (7) contacts the first adhesive layer (5), the first mold removal device (100) is moved so that the first soluble mold core (3) moves relative to the first sample mold (2) along with the first mold removal device (100). to separate the first soluble mold core (3) from the first sample mold (2); and after the second tape (15) contacts the second adhesive layer (13), the second mold removal device (200) is moved to move the second soluble mold core (11) relative to the second sample mold (10) along with the second mold removal device (200), so that the second soluble mold core (11) is separated from the second sample mold (10). It can be understood that in order to make the mold taking device used in the above steps the same, the first implementation of the mold taking step (S3) and the first implementation of the separation step (S4) are set in a matching manner; and the second implementation of the mold taking step (S3) and the second implementation of the separation step (S4) are set in a matching manner.

以下圖6A至6D用以說明本發明之接觸步驟(S5):「將該第一可溶解性模仁(3)與該第二可溶解性模仁(11)放置於一高分子材料層(18)上。」 The following Figures 6A to 6D are used to illustrate the contacting step (S5) of the present invention: "Place the first soluble mold core (3) and the second soluble mold core (11) on a polymer material layer (18)."

如圖6A至6D所示,其中將一高分子材料層(18)形成於一基材層(29)上,並且該接觸步驟(S5)係包含:首先:係將該第一可溶解性模仁(3)加熱至一溫度T,其中0<T<Tg,並使該第一可溶解性模仁(3)與該高分子材料層(18)接觸;再來:將該第二可溶解性模仁(11)加熱至該溫度T,並使該第二可溶解性模仁(11)與該高分子材料層(18)接觸。較佳者,該接觸步驟(S5)包含:首先:係將該基材 層(29)加熱至一溫度T,其中0<T<Tg,並使該第一可溶解性模仁(3)與該高分子材料層(18)接觸;再來:將該第二可溶解性模仁(11)與該高分子材料層(18)接觸。更佳者,該接觸步驟(S5)包含:首先:係將該基材層(29)與該第一可溶解性模仁(3)相對應之部分加熱至一溫度T,其中0<T<Tg,並使該第一可溶解性模仁(3)與該高分子材料層(18)接觸;再來:將該基材層(29)與該第二可溶解性模仁(11)相對應之部分加熱至該溫度T,並使該第二可溶解性模仁(11)與該高分子材料層(18)接觸。較佳者,Tg係指玻璃轉化之溫度,其中將溫度加熱至T的目的為:使該高分子材料層(18)之表面具有黏性、或些微軟化,以便於此步驟中進行對位或預壓合之動作。較佳者,為了避免第一可溶解性模仁(3)與第二可溶解性模仁(11)壓印於高分子材料上之相同位置,而影響壓印之結果,於接觸步驟(S5)中,第一可溶解性模仁(3)與第二可溶解性模仁(11)係相互間隔地與高分子材料層(18)進行接觸。 As shown in Figures 6A to 6D, a polymer material layer (18) is formed on a substrate layer (29), and the contact step (S5) includes: first: heating the first soluble mold core (3) to a temperature T, where 0<T<Tg, and making the first soluble mold core (3) contact the polymer material layer (18); then: heating the second soluble mold core (11) to the temperature T, and making the second soluble mold core (11) contact the polymer material layer (18). Preferably, the contacting step (S5) comprises: firstly, heating the substrate layer (29) to a temperature T, wherein 0<T<Tg, and bringing the first soluble mold core (3) into contact with the polymer material layer (18); and secondly bringing the second soluble mold core (11) into contact with the polymer material layer (18). More preferably, the contacting step (S5) comprises: firstly, heating the portion of the substrate layer (29) corresponding to the first soluble mold core (3) to a temperature T, wherein 0<T<Tg, and bringing the first soluble mold core (3) into contact with the polymer material layer (18); and then, heating the portion of the substrate layer (29) corresponding to the second soluble mold core (11) to the temperature T, and bringing the second soluble mold core (11) into contact with the polymer material layer (18). Preferably, Tg refers to the glass transition temperature, wherein the purpose of heating the temperature to T is to make the surface of the polymer material layer (18) sticky or slightly softened, so as to facilitate the alignment or pre-pressing action in this step. Preferably, in order to avoid the first soluble mold core (3) and the second soluble mold core (11) being embossed at the same position on the polymer material, thereby affecting the result of embossing, in the contacting step (S5), the first soluble mold core (3) and the second soluble mold core (11) are contacted with the polymer material layer (18) at intervals.

更佳者,為了提升後續壓印步驟(S6)之精準度,使最後所獲得之產物的良率提升,可以於本步驟中先將該第一可溶解性模仁(3)以及該第二可溶解性模仁(11)與該高分子材料層(18)進行對位。 Preferably, in order to improve the accuracy of the subsequent embossing step (S6) and improve the yield of the final product, the first soluble mold core (3) and the second soluble mold core (11) can be aligned with the polymer material layer (18) in this step.

如圖7A至7G所示,為本發明之對位步驟,具體而言,有關對位之各種實施態樣列舉如下。 As shown in Figures 7A to 7G, this is the alignment step of the present invention. Specifically, various implementations of the alignment are listed below.

請參照圖7A與7B,於一實施樣態中,該接觸步驟(S5)包含:首先,放置一待轉印物件(28)於一機台平台(30)上,該待轉印物件(28)具有一基材層(29)於該高分子材料層(18)與該機台平台(30)之間,該基材層(29)具有一第三對位記號(23)、以及一第四對位記號(24);再來,以一設置於該第一取模裝置(100)相反於該第一可溶解性模仁(3)之一側的第一攝像元件(31)或一設置於該機台平台(30)相反於該待轉印物件(28)之一側的第一攝像元件(31)確認該第一對位記號 (21)與該第三對位記號(23)是否對齊,其中:若對齊,則該第一可溶解性模仁(3)與該高分子材料層(18)接觸;若未對齊,則利用一位置調整元件(35),以該機台平台(30)為X-Y平面調整該第一可溶解性模仁(3)的X軸與Y軸及其於X-Y平面的θ角,直到該第一對位記號(21)與該第三對位記號(23)對齊;以及以一設置於該第二取模裝置(200)相反於該第二可溶解性模仁(11)之一側的第二攝像元件(33)或一設置於該機台平台(30)相反於該待轉印物件(28)之一側的第二攝像元件(33)確認該第二對位記號(22)與該第四對位記號(24)是否對齊,其中:若對齊,則該第二可溶解性模仁(11)與該高分子材料層(18)接觸;若未對齊,則利用一位置調整元件(35),以該機台平台(30)為X-Y平面調整該第二可溶解性模仁(11)的X軸與Y軸及其於X-Y平面的θ角,直到該第二對位記號(22)與該第四對位記號(24)對齊。 7A and 7B, in one embodiment, the contacting step (S5) includes: first, placing an object to be transferred (28) on a machine platform (30), wherein the object to be transferred (28) has a substrate layer (29) between the polymer material layer (18) and the machine platform (30), and the substrate layer (29) has a third alignment mark (23) and a fourth alignment mark (24); second, using a device disposed on the first molding device (100) opposite to the first molding device (100) to contact the object (28) with a substrate layer (29) between the polymer material layer (18) and the machine platform (30); A first imaging element (31) on one side of the first soluble mold (3) or a first imaging element (31) disposed on one side of the machine platform (30) opposite to the object to be transferred (28) confirms whether the first alignment mark (21) and the third alignment mark (23) are aligned, wherein: if aligned, the first soluble mold (3) is in contact with the polymer material layer (18); if not aligned, a position adjustment element (35) is used to adjust the position of the machine platform (3 0) adjusting the X-axis and Y-axis of the first soluble mold (3) and the angle θ thereof in the X-Y plane until the first alignment mark (21) is aligned with the third alignment mark (23); and confirming the second soluble mold (11) with a second imaging element (33) disposed on a side of the second molding device (200) opposite to the second soluble mold (11) or a second imaging element (33) disposed on a side of the machine platform (30) opposite to the object to be transferred (28). Whether the second alignment mark (22) and the fourth alignment mark (24) are aligned, wherein: if aligned, the second soluble mold core (11) is in contact with the polymer material layer (18); if not aligned, a position adjustment element (35) is used to adjust the X axis and Y axis of the second soluble mold core (11) and the angle θ on the X-Y plane with the machine platform (30) as the X-Y plane until the second alignment mark (22) and the fourth alignment mark (24) are aligned.

於另一實施樣態中,如圖7C與7D所示,該接觸步驟(S5)包含:放置一待轉印物件(28)於一機台平台(30)上,該待轉印物件(28)具有一基材層(29)於該高分子材料層(18)與該機台平台(30)之間,該基材層(29)具有一第三對位記號(23)、以及一第四對位記號(24);使該第一可溶解性模仁(3)與該高分子材料層(18)接觸,並以一設置於該第一取模裝置(100)相反於該第一可溶解性模仁(3)之一側的第一攝像元件(31)或一設置於該機台平台(30)相反於該待轉印物件(28)之一側的第一攝像元件(31)確認該第一對位記號(21)與該第三對位記號(23)是否對齊;若未對齊,則利用一位置調整元件(35),以該機台平台(30)為X-Y平面調整該第一可溶解性模仁(3)的X軸與Y軸及其於X-Y平面的θ角,直到該第一對位記號(21)與該第三對位記號(23)對齊;以及使該第二可溶解性模仁(11)與該高分子材料層(18)接觸,並以一設置於該第二取模裝置(200)相反於該第二可溶解性模仁 (11)之一側的第二攝像元件(33)或一設置於該機台平台(30)相反於該待轉印物件(28)之一側的第二攝像元件(33)確認該第二對位記號(22)與該第四對位記號(24)是否對齊;若未對齊,則利用一位置調整元件(35),以該機台平台(30)為X-Y平面調整該第二可溶解性模仁(11)的X軸與Y軸及其於X-Y平面的θ角,直到該第二對位記號(22)與該第四對位記號(24)對齊。較佳者,係將高分子材料層(18)加熱至溫度T後,再使第一可溶解性模仁(3)、或第二可溶解性模仁(11)與高分子材料層(18)接觸,以避免第一可溶解性模仁(3)、或第二可溶解性模仁(11)產生破損、或刮痕,而影響最終之壓印成果。 In another embodiment, as shown in FIGS. 7C and 7D , the contacting step (S5) includes: placing an object to be transferred (28) on a machine platform (30), wherein the object to be transferred (28) has a substrate layer (29) between the polymer material layer (18) and the machine platform (30), and the substrate layer (29) has a third alignment mark (23) and a fourth alignment mark (24); aligning the first soluble mold core (3) with the polymer material layer (18); The first molding device (100) is in contact with the first soluble mold core (3), and a first imaging element (31) arranged on a side of the first molding device (100) opposite to the first soluble mold core (3) or a first imaging element (31) arranged on a side of the machine platform (30) opposite to the object to be transferred (28) is used to confirm whether the first alignment mark (21) and the third alignment mark (23) are aligned; if they are not aligned, a position adjustment element (35) is used to adjust the alignment mark with the machine platform (30) as the first imaging element. The X-axis and Y-axis of the first soluble mold (3) and the angle θ thereof in the X-Y plane are adjusted until the first alignment mark (21) is aligned with the third alignment mark (23); and the second soluble mold (11) is brought into contact with the polymer material layer (18), and a second imaging element (33) disposed on one side of the second molding device (200) opposite to the second soluble mold (11) or a second imaging element (33) disposed on the machine platform ( 30) A second imaging element (33) on one side of the object to be transferred (28) is used to confirm whether the second alignment mark (22) is aligned with the fourth alignment mark (24); if not, a position adjustment element (35) is used to adjust the X-axis and Y-axis of the second soluble mold core (11) and the angle θ thereof in the X-Y plane with the machine platform (30) as the X-Y plane until the second alignment mark (22) is aligned with the fourth alignment mark (24). Preferably, the polymer material layer (18) is heated to a temperature T before the first soluble mold core (3) or the second soluble mold core (11) is brought into contact with the polymer material layer (18) to avoid damage or scratches on the first soluble mold core (3) or the second soluble mold core (11), which would affect the final embossing result.

於又一實施樣態中,如圖7E所示,該接觸步驟(S5)包含:放置一待轉印物件(28)於一機台平台(30)上,該待轉印物件(28)具有一基材層(29)於該高分子材料層(18)與該機台平台(30)之間,該基材層(29)具有一第三對位記號(23)、以及一第四對位記號(24);移動一第一攝像元件(31)至該第一可溶解性模仁(3)與該待轉印物件(28)之間以確認該第一對位記號(21)與該第三對位記號(23)是否對齊,其中:若對齊,則復位該第一攝像元件(31),並且使該第一可溶解性模仁(3)與該高分子材料層(18)接觸;若未對齊,則利用一位置調整元件(35),以該機台平台(30)為X-Y平面調整該第一可溶解性模仁(3)的X軸與Y軸及其於X-Y平面的θ角,直到該第一對位記號(21)與該第三對位記號(23)對齊;以及移動一第二攝像元件(33)至該第二可溶解性模仁(11)與該待轉印物件(28)之間以確認該第二對位記號(22)與該第四對位記號(24)是否對齊,其中:若對齊,則復位該第二攝像元件(33),並且使該第二可溶解性模仁(11)與該高分子材料層(18)接觸;若未對齊,則利用一位置調整元件(35),以該機台平台(30)為X-Y平面調整該第二可溶解性模仁(11)的X軸與Y軸及其於X-Y平面的θ角,直到該第二對位記號(22)與該 第四對位記號(24)對齊。 In another embodiment, as shown in FIG. 7E , the contacting step (S5) includes: placing an object to be transferred (28) on a machine platform (30), wherein the object to be transferred (28) has a substrate layer (29) between the polymer material layer (18) and the machine platform (30), and the substrate layer (29) has a third alignment mark (23) and a fourth alignment mark (24); moving a first imaging element (3 1) between the first soluble mold core (3) and the object to be transferred (28) to confirm whether the first alignment mark (21) and the third alignment mark (23) are aligned, wherein: if aligned, the first imaging element (31) is reset, and the first soluble mold core (3) is brought into contact with the polymer material layer (18); if not aligned, a position adjustment element (35) is used to adjust the position of the machine platform (30) by X- The first soluble mold (3) is adjusted along the X-axis and the Y-axis and the angle θ thereof in the X-Y plane until the first alignment mark (21) is aligned with the third alignment mark (23); and a second imaging element (33) is moved between the second soluble mold (11) and the object to be transferred (28) to confirm whether the second alignment mark (22) is aligned with the fourth alignment mark (24), wherein: if aligned, then The second imaging element (33) is reset, and the second soluble mold (11) is brought into contact with the polymer material layer (18); if they are not aligned, a position adjustment element (35) is used to adjust the X-axis and Y-axis of the second soluble mold (11) and the angle θ on the X-Y plane with the machine platform (30) as the X-Y plane until the second alignment mark (22) is aligned with the fourth alignment mark (24).

於又一實施樣態中,如圖7F所示,該接觸步驟(S5)包含:放置一待轉印物件(28)於一機台平台(30)上,該待轉印物件(28)具有一基材層(29)於該高分子材料層(18)與該機台平台(30)之間,該機台平台(30)具有一第五對位記號(25)以及一第六對位記號(26);以一設置於該第一取模裝置(100)相反於該第一可溶解性模仁(3)之一側的第一攝像元件(31)或一設置於該機台平台(30)相反於該待轉印物件(28)之一側的第一攝像元件(31)確認該第一對位記號(21)與該第五對位記號(25)是否對齊,其中:若對齊,則該第一可溶解性模仁(3)與該高分子材料層(18)接觸;若未對齊,則利用一位置調整元件(35),以該機台平台(30)為X-Y平面調整該第一可溶解性模仁(3)的X軸與Y軸及其於X-Y平面的θ角,直到該第一對位記號(21)與該第五對位記號(25)對齊;以及以一設置於該第二取模裝置(200)相反於該第二可溶解性模仁(11)之一側的第二攝像元件(33)或一設置於該機台平台(30)相反於該待轉印物件(28)之一側的第二攝像元件(33)確認該第二對位記號(22)與該第六對位記號(26)是否對齊,其中:若對齊,則該第二可溶解性模仁(11)與該高分子材料層(18)接觸;若未對齊,則利用一位置調整元件(35),以該機台平台(30)為X-Y平面調整該第二可溶解性模仁(11)的X軸與Y軸及其於X-Y平面的θ角,直到該第二對位記號(22)與該第六對位記號(26)對齊。 In another embodiment, as shown in FIG. 7F , the contacting step (S5) includes: placing an object to be transferred (28) on a machine platform (30), wherein the object to be transferred (28) has a substrate layer (29) between the polymer material layer (18) and the machine platform (30), and the machine platform (30) has a fifth alignment mark (25) and a sixth alignment mark (26); using a device disposed on the first molding device (100) opposite to the first soluble A first imaging element (31) on one side of the dissolvable mold (3) or a first imaging element (31) disposed on one side of the machine platform (30) opposite to the object to be transferred (28) confirms whether the first alignment mark (21) and the fifth alignment mark (25) are aligned, wherein: if aligned, the first dissolvable mold (3) is in contact with the polymer material layer (18); if not aligned, a position adjustment element (35) is used to adjust the alignment mark with the machine platform (30) as X. -Y plane to adjust the X-axis and Y-axis of the first soluble mold (3) and the angle θ in the X-Y plane until the first alignment mark (21) is aligned with the fifth alignment mark (25); and a second imaging element (33) arranged on a side of the second molding device (200) opposite to the second soluble mold (11) or a second imaging element (33) arranged on a side of the machine platform (30) opposite to the object to be transferred (28) is used to confirm the second Whether the alignment mark (22) and the sixth alignment mark (26) are aligned, wherein: if aligned, the second soluble mold core (11) is in contact with the polymer material layer (18); if not aligned, a position adjustment element (35) is used to adjust the X-axis and Y-axis of the second soluble mold core (11) and the angle θ on the X-Y plane with the machine platform (30) as the X-Y plane until the second alignment mark (22) and the sixth alignment mark (26) are aligned.

於又一實施樣態中,該接觸步驟(S5)包含:放置一待轉印物件(28)於一機台平台(30)上,該待轉印物件(28)具有一基材層(29)於該高分子材料層(18)與該機台平台(30)之間,該機台平台(30)具有一第五對位記號(25)以及一第六對位記號(26);使該第一可溶解性模仁(3)與該高分子材料層(18)接觸,並以一設置於該第一取模裝置(100)相反於該第一可溶解性模仁(3)之一側的第一攝像元件 (31)或一設置於該機台平台(30)相反於該待轉印物件(28)之一側的第一攝像元件(31)確認該第一對位記號(21)與該第五對位記號(25)是否對齊;若未對齊,則利用一位置調整元件(35),以該機台平台(30)為X-Y平面調整該第一可溶解性模仁(3)的X軸與Y軸及其於X-Y平面的θ角,直到該第一對位記號(21)與該第五對位記號(25)對齊;以及使該第二可溶解性模仁(11)與該高分子材料層(18)接觸,並以一設置於該第二取模裝置(200)相反於該第二可溶解性模仁(11)之一側的第二攝像元件(33)或一設置於該機台平台(30)相反於該待轉印物件(28)之一側的第二攝像元件(33)確認該第二對位記號(22)與該第六對位記號(26)是否對齊;若未對齊,則利用一位置調整元件(35),以該機台平台(30)為X-Y平面調整該第二可溶解性模仁(11)的X軸與Y軸及其於X-Y平面的θ角,直到該第二對位記號(22)與該第六對位記號(26)對齊。較佳者,係將高分子材料層(18)加熱至溫度T後,再使第一可溶解性模仁(3)、或第二可溶解性模仁(11)與高分子材料層(18)接觸,以避免第一可溶解性模仁(3)、或第二可溶解性模仁(11)產生破損、或刮痕,而影響最終之壓印成果。 In another embodiment, the contacting step (S5) includes: placing an object to be transferred (28) on a machine platform (30), wherein the object to be transferred (28) has a substrate layer (29) between the polymer material layer (18) and the machine platform (30), and the machine platform (30) has a fifth alignment mark (25) and a sixth alignment mark (26); bringing the first soluble mold core (3) into contact with the polymer material layer (18), A first imaging element (31) disposed on a side of the first molding device (100) opposite to the first soluble mold core (3) or a first imaging element (31) disposed on a side of the machine platform (30) opposite to the object to be transferred (28) is used to confirm whether the first alignment mark (21) and the fifth alignment mark (25) are aligned; if they are not aligned, a position adjustment element (35) is used to adjust the alignment mark with the machine platform (30) as the X-Y plane. The X-axis and Y-axis of the first soluble mold core (3) and the angle θ thereof in the X-Y plane are adjusted until the first alignment mark (21) is aligned with the fifth alignment mark (25); and the second soluble mold core (11) is brought into contact with the polymer material layer (18), and a second imaging element (33) disposed on a side of the second molding device (200) opposite to the second soluble mold core (11) or a second imaging element (33) disposed on the machine platform (30) is used to capture the second soluble mold core (11). A second imaging element (33) on one side of the object to be transferred (28) confirms whether the second alignment mark (22) is aligned with the sixth alignment mark (26); if not, a position adjustment element (35) is used to adjust the X-axis and Y-axis of the second soluble mold core (11) and the angle θ on the X-Y plane with the machine platform (30) as the X-Y plane until the second alignment mark (22) is aligned with the sixth alignment mark (26). Preferably, the polymer material layer (18) is heated to a temperature T before the first soluble mold core (3) or the second soluble mold core (11) is brought into contact with the polymer material layer (18) to avoid damage or scratches on the first soluble mold core (3) or the second soluble mold core (11), which would affect the final embossing result.

於又一實施樣態中,該接觸步驟(S5)包含:放置一待轉印物件(28)於一機台平台(30)上,該待轉印物件(28)具有一基材層(29)於該高分子材料層(18)與該機台平台(30)之間,該機台平台(30)具有一第五對位記號(25)以及一第六對位記號(26);移動一第一攝像元件(31)至該第一可溶解性模仁(3)與該待轉印物件(28)之間以確認該第一對位記號(21)與該第五對位記號(25)是否對齊,其中:若對齊,則復位該第一攝像元件(31),並且使該第一可溶解性模仁(3)與該高分子材料層(18)接觸;若未對齊,則利用一位置調整元件(35),以該機台平台(30)為X-Y平面調整該第一可溶解性模仁(3)的X軸與Y軸及其於X-Y平面的θ角,直到該第一 對位記號(21)與該第五對位記號(25)對齊;以及移動一第二攝像元件(33)至該第二可溶解性模仁(11)與該待轉印物件(28)之間以確認該第二對位記號(22)與該第六對位記號(26)是否對齊,其中:若對齊,則復位該第二攝像元件(33),並且使該第二可溶解性模仁(11)與該高分子材料層(18)接觸;若未對齊,則利用一位置調整元件(35),以該機台平台(30)為X-Y平面調整該第二可溶解性模仁(11)的X軸與Y軸及其於X-Y平面的θ角,直到該第二對位記號(22)與該第六對位記號(26)對齊。 In another embodiment, the contacting step (S5) includes: placing an object to be transferred (28) on a machine platform (30), wherein the object to be transferred (28) has a substrate layer (29) between the polymer material layer (18) and the machine platform (30), and the machine platform (30) has a fifth alignment mark (25) and a sixth alignment mark (26); moving a first imaging element (31) to the first imaging element (31); A dissolvable mold core (3) and the object to be transferred (28) are used to confirm whether the first alignment mark (21) and the fifth alignment mark (25) are aligned, wherein: if aligned, the first imaging element (31) is reset, and the first dissolvable mold core (3) is brought into contact with the polymer material layer (18); if not aligned, a position adjustment element (35) is used to adjust the position of the machine platform (30) as the X-Y plane. Adjust the X-axis and Y-axis of the first soluble mold (3) and their angle θ in the X-Y plane until the first alignment mark (21) is aligned with the fifth alignment mark (25); and move a second camera element (33) between the second soluble mold (11) and the object to be transferred (28) to confirm whether the second alignment mark (22) is aligned with the sixth alignment mark (26), wherein: if aligned, then The second imaging element (33) is reset, and the second soluble mold (11) is brought into contact with the polymer material layer (18); if they are not aligned, a position adjustment element (35) is used to adjust the X-axis and Y-axis of the second soluble mold (11) and the angle θ on the X-Y plane with the machine platform (30) as the X-Y plane until the second alignment mark (22) is aligned with the sixth alignment mark (26).

於又一實施樣態中,如圖7G所示,該接觸步驟(S5)包含:放置一待轉印物件(28)於一機台平台(30)上,該待轉印物件(28)具有一基材層(29)於該高分子材料層(18)與該機台平台(30)之間,該高分子材料層(18)具有一第七對位記號(27)以及一第八對位記號;以一設置於該第一取模裝置(100)相反於該第一可溶解性模仁(3)之一側的第一攝像元件(31)或一設置於該機台平台(30)相反於該待轉印物件(28)之一側的第一攝像元件(31)確認該第一對位記號(21)與該第七對位記號(27)是否對齊,其中:若對齊,則該第一可溶解性模仁(3)與該高分子材料層(18)接觸;若未對齊,則利用一位置調整元件(35),以該機台平台(30)為X-Y平面調整該第一可溶解性模仁(3)的X軸與Y軸及其於X-Y平面的θ角,直到該第一對位記號(21)與該第七對位記號(27)對齊;以及以一設置於該第二取模裝置(200)相反於該第二可溶解性模仁(11)之一側的第二攝像元件(33)或一設置於該機台平台(30)相反於該待轉印物件(28)之一側的第二攝像元件(33)確認該第二對位記號(22)與該第八對位記號是否對齊,其中:若對齊,則該第二可溶解性模仁(11)與該高分子材料層(18)接觸;若未對齊,則利用一位置調整元件(35),以該機台平台(30)為X-Y平面調整該第二可溶解性模仁(11)的X軸與Y軸及其於X-Y平面的θ 角,直到該第二對位記號(22)與該第八對位記號對齊。 In another embodiment, as shown in FIG. 7G , the contacting step (S5) includes: placing an object to be transferred (28) on a machine platform (30), wherein the object to be transferred (28) has a substrate layer (29) between the polymer material layer (18) and the machine platform (30), and the polymer material layer (18) has a seventh alignment mark (27) and an eighth alignment mark; and using a first molding device (100) disposed opposite to the first soluble A first imaging element (31) on one side of the dissolvable mold (3) or a first imaging element (31) disposed on a side of the machine platform (30) opposite to the object to be transferred (28) confirms whether the first alignment mark (21) and the seventh alignment mark (27) are aligned, wherein: if aligned, the first dissolvable mold (3) is in contact with the polymer material layer (18); if not aligned, a position adjustment element (35) is used to adjust the alignment of the first alignment mark (21) and the seventh alignment mark (27) with the machine platform (30). The X-axis and Y-axis of the first soluble mold (3) and the angle θ thereof in the X-Y plane are adjusted until the first alignment mark (21) is aligned with the seventh alignment mark (27); and a second imaging element (33) disposed on a side of the second molding device (200) opposite to the second soluble mold (11) or a second imaging element (33) disposed on a side of the machine platform (30) opposite to the object to be transferred (28) is used. Confirm whether the second alignment mark (22) is aligned with the eighth alignment mark, wherein: if aligned, the second soluble mold core (11) is in contact with the polymer material layer (18); if not aligned, a position adjustment element (35) is used to adjust the X-axis and Y-axis of the second soluble mold core (11) and the θ angle on the X-Y plane with the machine platform (30) as the X-Y plane until the second alignment mark (22) is aligned with the eighth alignment mark.

於又一實施樣態中,該接觸步驟(S5)包含:放置一待轉印物件(28)於一機台平台(30)上,該待轉印物件(28)具有一基材層(29)於該高分子材料層(18)與該機台平台(30)之間,該高分子材料層(18)具有一第七對位記號(27)以及一第八對位記號;該第一可溶解性模仁(3)與該高分子材料層(18)接觸,並以一設置於該第一取模裝置(100)相反於該第一可溶解性模仁(3)之一側的第一攝像元件(31)或一設置於該機台平台(30)相反於該待轉印物件(28)之一側的第一攝像元件(31)確認該第一對位記號(21)與該第七對位記號(27)是否對齊;若未對齊,則利用一位置調整元件(35),以該機台平台(30)為X-Y平面調整該第一可溶解性模仁(3)的X軸與Y軸及其於X-Y平面的θ角,直到該第一對位記號(21)與該第七對位記號(27)對齊;以及該第二可溶解性模仁(11)與該高分子材料層(18)接觸,並以一設置於該第二取模裝置(200)相反於該第二可溶解性模仁(11)之一側的第二攝像元件(33)或一設置於該機台平台(30)相反於該待轉印物件(28)之一側的第二攝像元件(33)確認該第二對位記號(22)與該第八對位記號是否對齊;若未對齊,則利用一位置調整元件(35),以該機台平台(30)為X-Y平面調整該第二可溶解性模仁(11)的X軸與Y軸及其於X-Y平面的θ角,直到該第二對位記號(22)與該第八對位記號對齊。較佳者,係將高分子材料層(18)加熱至溫度T後,再使第一可溶解性模仁(3)、或第二可溶解性模仁(11)與高分子材料層(18)接觸,以避免第一可溶解性模仁(3)、或第二可溶解性模仁(11)產生破損、或刮痕,而影響最終之壓印成果。 In another embodiment, the contacting step (S5) includes: placing an object to be transferred (28) on a machine platform (30), wherein the object to be transferred (28) has a substrate layer (29) between the polymer material layer (18) and the machine platform (30), and the polymer material layer (18) has a seventh alignment mark (27) and an eighth alignment mark; the first soluble mold core (3) is in contact with the polymer material layer (18); A first imaging element (31) disposed on a side of the first molding device (100) opposite to the first soluble mold core (3) or a first imaging element (31) disposed on a side of the machine platform (30) opposite to the object to be transferred (28) is used to confirm whether the first alignment mark (21) and the seventh alignment mark (27) are aligned; if they are not aligned, a position adjustment element (35) is used to adjust the alignment mark with the machine platform (30) as X. -Y plane to adjust the X-axis and Y-axis of the first soluble mold (3) and the angle θ in the X-Y plane until the first alignment mark (21) is aligned with the seventh alignment mark (27); and the second soluble mold (11) is in contact with the polymer material layer (18), and a second camera element (33) disposed on one side of the second molding device (200) opposite to the second soluble mold (11) or a second camera element (33) disposed on the machine plane A second imaging element (33) on the platform (30) opposite to one side of the object to be transferred (28) confirms whether the second alignment mark (22) is aligned with the eighth alignment mark; if not, a position adjustment element (35) is used to adjust the X-axis and Y-axis of the second soluble mold core (11) and the angle θ on the X-Y plane with the machine platform (30) as the X-Y plane until the second alignment mark (22) is aligned with the eighth alignment mark. Preferably, the polymer material layer (18) is heated to a temperature T before the first soluble mold core (3) or the second soluble mold core (11) is brought into contact with the polymer material layer (18) to avoid damage or scratches on the first soluble mold core (3) or the second soluble mold core (11), which would affect the final embossing result.

於又一實施樣態中,該接觸步驟(S5)包含:放置一待轉印物件(28)於一機台平台(30)上,該待轉印物件(28)具有一基材層(29)於該高分子材料層(18)與該機台平台(30)之間,該高分子材料層(18)具有一第七對位記號(27)以及一第 八對位記號;移動一第一攝像元件(31)至該第一可溶解性模仁(3)與該待轉印物件(28)之間以確認該第一對位記號(21)與該第七對位記號(27)是否對齊,其中:若對齊,則復位該第一攝像元件(31),並且使該第一可溶解性模仁(3)與該高分子材料層(18)接觸;若未對齊,則利用一位置調整元件(35),以該機台平台(30)為X-Y平面調整該第一可溶解性模仁(3)的X軸與Y軸及其於X-Y平面的θ角,直到該第一對位記號(21)與該第七對位記號(27)對齊;以及移動一第二攝像元件(33)至該第二可溶解性模仁(11)與該待轉印物件(28)之間以確認該第二對位記號(22)與該第八對位記號是否對齊,其中:若對齊,則復位該第二攝像元件(33),並且使該第二可溶解性模仁(11)與該高分子材料層(18)接觸;若未對齊,則利用一位置調整元件(35),以該機台平台(30)為X-Y平面調整該第二可溶解性模仁(11)的X軸與Y軸及其於X-Y平面的θ角,直到該第二對位記號(22)與該第八對位記號對齊。 In another embodiment, the contacting step (S5) includes: placing an object to be transferred (28) on a machine platform (30), the object to be transferred (28) having a substrate layer (29) between the polymer material layer (18) and the machine platform (30), the polymer material layer (18) having a seventh alignment mark (27) and an eighth alignment mark; moving a first imaging element (31) to The first soluble mold core (3) and the object to be transferred (28) are positioned to confirm whether the first alignment mark (21) and the seventh alignment mark (27) are aligned, wherein: if aligned, the first imaging element (31) is reset, and the first soluble mold core (3) is brought into contact with the polymer material layer (18); if not aligned, a position adjustment element (35) is used to adjust the position of the machine platform (30) with the machine platform (30) as the X axis. -Y plane to adjust the X-axis and Y-axis of the first soluble mold (3) and the angle θ in the X-Y plane until the first alignment mark (21) is aligned with the seventh alignment mark (27); and move a second camera element (33) between the second soluble mold (11) and the object to be transferred (28) to confirm whether the second alignment mark (22) is aligned with the eighth alignment mark, wherein: if aligned, The second imaging element (33) is reset, and the second soluble mold (11) is brought into contact with the polymer material layer (18); if they are not aligned, a position adjustment element (35) is used to adjust the X-axis and Y-axis of the second soluble mold (11) and the angle θ on the X-Y plane with the machine platform (30) as the X-Y plane until the second alignment mark (22) is aligned with the eighth alignment mark.

更佳者,高分子材料層(18)可採旋轉塗佈方式形成一玻璃轉移溫度低於模仁的高分子材料於基材層(29)上取得;或者亦可先採旋轉塗佈方式形成一玻璃溫度低於模仁的高分子材料於基材層(29)上,再軟烤取得。較佳地,高分子材料的玻璃轉移溫度(Tg)為20至150℃,旋轉塗佈轉速為1,000至5,000rpm,塗佈厚度為0.05至1,000μm。須說明的是,高分子材料是否進行軟烤依材料特性決定;較佳地,軟烤溫度為80至150℃,軟烤時間為3至5分鐘。除了旋轉塗佈方式外,亦可利用一貼膜元件(圖未示)採用壓模貼片方式形成高分子材料層(18)於基材層(29)上。其中,該第三對位記號(23)、或該第四對位記號(24)可設置於基材層(29)相反於可溶解性模仁的一表面;或設置於相反於機台平台(30)的一表面。當基材層(29)的第三對位記號(23)設置於基材層(29)相反於可溶解性模仁的一表面時,基材層(29)可能會干擾第一攝像元件(31)擷取第一對位記號(21)與第三對 位記號(23)的影像,故基材層(29)更可開設有一第一穿孔(36)以露出第三對位記號(23)。其中可以解地,為了便於第二對位記號(22)與第四對位記號(24)間之對位,於基材層(29)更可開設有一第二穿孔(36),以露出第四對位記號(24),在此不多做贅述。 Preferably, the polymer material layer (18) can be obtained by forming a polymer material with a glass transition temperature lower than that of the mold core on the substrate layer (29) by a rotary coating method; or it can be first formed by a rotary coating method on the substrate layer (29) with a polymer material with a glass temperature lower than that of the mold core, and then soft baking. Preferably, the glass transition temperature (Tg) of the polymer material is 20 to 150°C, the rotary coating speed is 1,000 to 5,000 rpm, and the coating thickness is 0.05 to 1,000 μm. It should be noted that whether the polymer material is soft baked depends on the material properties; preferably, the soft baking temperature is 80 to 150°C, and the soft baking time is 3 to 5 minutes. In addition to the rotational coating method, a film element (not shown) can also be used to form a polymer material layer (18) on the substrate layer (29) by a die-stamping method. The third alignment mark (23) or the fourth alignment mark (24) can be set on a surface of the substrate layer (29) opposite to the soluble mold core; or set on a surface opposite to the machine platform (30). When the third alignment mark (23) of the substrate layer (29) is set on a surface of the substrate layer (29) opposite to the soluble mold core, the substrate layer (29) may interfere with the first camera element (31) capturing the images of the first alignment mark (21) and the third alignment mark (23). Therefore, the substrate layer (29) can be further provided with a first through hole (36) to expose the third alignment mark (23). It can be understood that in order to facilitate the alignment between the second alignment mark (22) and the fourth alignment mark (24), a second through hole (36) can be opened in the substrate layer (29) to expose the fourth alignment mark (24), which will not be elaborated here.

再者,該第五對位記號(25)、與該第六對位記號(26)係設置於機台平台(30),為便於第一攝像元件(31)擷取第一對位記號(21)與第五對位記號(25)的影像;以及第二攝像元件(33)擷取第二對位記號(22)與第六對位記號(26)的影像,基材層(29)較佳地為一透明基材層(29)。其中,為了避免基材層(29)可能會干擾第一攝像元件(31)擷取第一對位記號(21)與第五對位記號(25)的影像,故基材層(29)更可開設有一穿孔(36)以露出第五對位記號(25);以及為了避免基材層(29)可能會干擾第二攝像元件(33)擷取第二對位記號(22)與第六對位記號(26)的影像,故基材層(29)更可開設有一穿孔(36)以露出第六對位記號(26)。 Furthermore, the fifth alignment mark (25) and the sixth alignment mark (26) are arranged on the machine platform (30) to facilitate the first imaging element (31) to capture the images of the first alignment mark (21) and the fifth alignment mark (25); and the second imaging element (33) to capture the images of the second alignment mark (22) and the sixth alignment mark (26). The substrate layer (29) is preferably a transparent substrate layer (29). In order to prevent the substrate layer (29) from interfering with the first imaging element (31) capturing the images of the first alignment mark (21) and the fifth alignment mark (25), the substrate layer (29) may be provided with a through hole (36) to expose the fifth alignment mark (25); and in order to prevent the substrate layer (29) from interfering with the second imaging element (33) capturing the images of the second alignment mark (22) and the sixth alignment mark (26), the substrate layer (29) may be provided with a through hole (36) to expose the sixth alignment mark (26).

此外,為避免第一攝像元件(31)擷取第一對位記號(21)與第三對位記號(23)的影像時受光線反射雜訊造成的清晰度不足,更可利用一第一紅外線發射元件(32)照射第一對位記號(21)與第三對位記號(23);為避免第一攝像元件(31)擷取第一對位記號(21)與第五對位記號(25)的影像時受光線反射雜訊造成的清晰度不足,更可利用一第一紅外線發射元件(32)照射第一對位記號(21)與第五對位記號(25);為避免第一攝像元件(31)擷取第一對位記號(21)與第七對位記號(27)的影像時受光線反射雜訊造成的清晰度不足,更可利用一第一紅外線發射元件(32)照射第一對位記號(21)與第七對位記號(27)。而第一紅外線發射元件(32)可設置於第一取模裝置(100)相反於第一可溶解性模仁(3)的一側或設置於機台平台(30)相反於待轉印物件(28)的一側,但不以此為限。 In addition, in order to avoid the lack of clarity caused by light reflection noise when the first imaging element (31) captures the images of the first alignment mark (21) and the third alignment mark (23), a first infrared emitting element (32) can be used to illuminate the first alignment mark (21) and the third alignment mark (23); in order to avoid the lack of clarity caused by light reflection noise when the first imaging element (31) captures the images of the first alignment mark (21) and the fifth alignment mark (25), a first infrared emitting element (32) can be used to illuminate the first alignment mark (21) and the third alignment mark (23); In order to avoid the lack of clarity caused by the light reflection noise when the first imaging element (31) captures the images of the first alignment mark (21) and the seventh alignment mark (27), a first infrared emitting element (32) can be used to illuminate the first alignment mark (21) and the seventh alignment mark (27). The first infrared emitting element (32) can be arranged on the side of the first molding device (100) opposite to the first soluble mold core (3) or on the side of the machine platform (30) opposite to the object to be transferred (28), but is not limited thereto.

此外,為避免第二攝像元件(33)擷取第二對位記號(22)與第四對位記號(24)的影像時受光線反射雜訊造成的清晰度不足,更可利用一第二紅外線發射元件(34)照射第二對位記號(22)與第四對位記號(24);為避免第二攝像元件(33)擷取第二對位記號(22)與第六對位記號(26)的影像時受光線反射雜訊造成的清晰度不足,更可利用一第二紅外線發射元件(34)照射第二對位記號(22)與第六對位記號(26);為避免第二攝像元件(33)擷取第二對位記號(22)與第八對位記號的影像時受光線反射雜訊造成的清晰度不足,更可利用一第二紅外線發射元件(34)照射第二對位記號(22)與第八對位記號。而第二紅外線發射元件(34)可設置於第二取模裝置(200)相反於第二可溶解性模仁(11)的一側或設置於機台平台(30)相反於待轉印物件(28)的一側,但不以此為限。 In addition, in order to avoid the second imaging element (33) capturing the images of the second alignment mark (22) and the fourth alignment mark (24) from being insufficiently clear due to light reflection noise, a second infrared emitting element (34) can be used to illuminate the second alignment mark (22) and the fourth alignment mark (24); in order to avoid the second imaging element (33) capturing the images of the second alignment mark (22) and the sixth alignment mark (26) from being insufficiently clear due to light reflection noise, a second infrared emitting element (34) can be used to illuminate the second alignment mark (22) and the fourth alignment mark (24); In order to prevent the lack of clarity caused by reflection noise, a second infrared emitting element (34) can be used to illuminate the second alignment mark (22) and the sixth alignment mark (26); in order to prevent the second imaging element (33) from capturing the images of the second alignment mark (22) and the eighth alignment mark and causing the lack of clarity caused by light reflection noise, a second infrared emitting element (34) can be used to illuminate the second alignment mark (22) and the eighth alignment mark. The second infrared emitting element (34) can be disposed on the side of the second molding device (200) opposite to the second soluble mold core (11) or on the side of the machine platform (30) opposite to the object to be transferred (28), but is not limited thereto.

如圖7F所示,為對位記號設置於機台平台(30)時之使用態樣;以及如7G所示,為對位記號設置於高分子材料層(18)時之使用態樣,具體而言,圖7F、圖7G、與圖7A至7E之差異僅在於:其對位記號位置不同,除此之外,其他操作細節與功效大致上相同,於此不再贅述。 As shown in FIG. 7F, the alignment mark is set on the machine platform (30) for use; and as shown in FIG. 7G, the alignment mark is set on the polymer material layer (18) for use. Specifically, the difference between FIG. 7F, FIG. 7G, and FIG. 7A to 7E is that the positions of the alignment marks are different. Other than that, the other operation details and effects are roughly the same and will not be elaborated here.

以下圖8A至8G用以說明本發明之壓印步驟(S6):「施予一第一高溫至該高分子材料層(18),以及一壓力至該第一可溶解性模仁(3)、與該第二可溶解性模仁(11);使該第一取模裝置(100)相對於該第一可溶解性模仁(3)分離、以及使該第二取模裝置(200)相對於該第二可溶解性模仁(11)分離;以及施予一第二高溫至該高分子材料層(18),使該高分子材料層(18)固化。」 The following Figures 8A to 8G are used to illustrate the embossing step (S6) of the present invention: "Apply a first high temperature to the polymer material layer (18), and a pressure to the first soluble mold core (3) and the second soluble mold core (11); separate the first mold removal device (100) from the first soluble mold core (3), and separate the second mold removal device (200) from the second soluble mold core (11); and apply a second high temperature to the polymer material layer (18) to solidify the polymer material layer (18)."

以下用以說明壓印步驟(S6)之第一實施態樣。 The following is used to illustrate the first implementation of the embossing step (S6).

如圖8A至8C所示,其中壓印步驟(S6)包含:施予一第一高溫至該高分子材料層(18);以及施予一壓力至該第一可溶解性模仁(3)、與該第二可溶解 性模仁(11),使該高分子材料層(18)具有一對應該第一凹凸結構(4)的第一轉印結構(9);以及一對應該第二凹凸結構(12)的第二轉印結構(17);以及將該第一支撐背板(8)與該第一膠帶(7)分離;以及將該第二支撐背板(16)與該第二膠帶(15)分離,並施予一第二高溫至該高分子材料層(18),使該高分子材料層(18)固化,其中該第一高溫與該第二高溫不同。 As shown in Figures 8A to 8C, the embossing step (S6) includes: applying a first high temperature to the polymer material layer (18); applying a pressure to the first soluble mold (3) and the second soluble mold (11), so that the polymer material layer (18) has a first transfer structure (9) corresponding to the first concave-convex structure (4); and a second transfer structure (17) corresponding to the second concave-convex structure (12); and separating the first supporting back plate (8) from the first tape (7); and separating the second supporting back plate (16) from the second tape (15), and applying a second high temperature to the polymer material layer (18) to cure the polymer material layer (18), wherein the first high temperature is different from the second high temperature.

更佳者,供給第一高溫、與第二高溫之加熱源可為相同或不同,其中加熱源係可對可溶解性模仁加熱;對基材層(29)與可溶解性模仁相對應之區域加熱;或對整體基材層(29)加熱,以使溫度傳導至高分子材料層(18),而使高分子材料層(18)軟化、或固化。 More preferably, the heat sources for supplying the first high temperature and the second high temperature may be the same or different, wherein the heat source may heat the soluble mold core; heat the area of the substrate layer (29) corresponding to the soluble mold core; or heat the entire substrate layer (29) so that the temperature is transferred to the polymer material layer (18), thereby softening or curing the polymer material layer (18).

具體而言,如圖8A至8C所示,於壓印步驟(S6)中,第一實施態樣之第一實施例包含:施予該第一高溫與該壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有該第一轉印結構(9);於形成該第一轉印結構(9)後,施予該第一高溫與該壓力至該第二可溶解性模仁(11),使該高分子材料層(18)具有該第二轉印結構(17);於形成該第二轉印結構(17)後,將該第一支撐背板(8)與該第一膠帶(7)分離;以及將該第二支撐背板(16)與該第二膠帶(15)分離;以及施予該第二高溫至該第一可溶解性模仁(3)與該第二可溶解性模仁(11);至該基材層(29)與該第一可溶解性模仁(3)相對應之位置、以及該基材層(29)與該第二可溶解性模仁(11)相對應之位置;或至該基材層(29),以使該高分子材料層(18)固化。 Specifically, as shown in FIGS. 8A to 8C , in the embossing step (S6), the first embodiment of the first embodiment includes: applying the first high temperature and the pressure to the first soluble mold (3) so that the polymer material layer (18) has the first transfer structure (9); after forming the first transfer structure (9), applying the first high temperature and the pressure to the second soluble mold (11) so that the polymer material layer (18) has the second transfer structure (17); after forming the second transfer structure (17), The first supporting back plate (8) is separated from the first adhesive tape (7); and the second supporting back plate (16) is separated from the second adhesive tape (15); and the second high temperature is applied to the first soluble mold core (3) and the second soluble mold core (11); to the position of the substrate layer (29) corresponding to the first soluble mold core (3), and the position of the substrate layer (29) corresponding to the second soluble mold core (11); or to the substrate layer (29), so as to solidify the polymer material layer (18).

更佳者,如圖8A至8C所示,於壓印步驟(S6)中,第一實施態樣之第二實施例包含:施予該第一高溫至該基材層(29);施予該壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有該第一轉印結構(9);於形成完該第一轉印結構(9)後,施予該壓力至將該第二可溶解性模仁(11),使該高分子材料層(18)具 有該第二轉印結構(17);將該第一支撐背板(8)與該第一膠帶(7)分離;以及將該第二支撐背板(16)與該第二膠帶(15)分離;以及施予該第二高溫至該第一可溶解性模仁(3)與該第二可溶解性模仁(11);至該基材層(29)與該第一可溶解性模仁(3)相對應之位置、以及該基材層(29)與該第二可溶解性模仁(11)相對應之位置;或至該基材層(29),以使該高分子材料層(18)固化。 More preferably, as shown in FIGS. 8A to 8C , in the embossing step (S6), the second embodiment of the first embodiment comprises: applying the first high temperature to the substrate layer (29); applying the pressure to the first soluble mold (3) so that the polymer material layer (18) has the first transfer structure (9); after the first transfer structure (9) is formed, applying the pressure to the second soluble mold (11) so that the polymer material layer (18) has the second transfer structure (17); The supporting back plate (8) is separated from the first adhesive tape (7); and the second supporting back plate (16) is separated from the second adhesive tape (15); and the second high temperature is applied to the first soluble mold core (3) and the second soluble mold core (11); to the position of the substrate layer (29) corresponding to the first soluble mold core (3), and the position of the substrate layer (29) corresponding to the second soluble mold core (11); or to the substrate layer (29), so as to solidify the polymer material layer (18).

更佳者,如圖8A至8C所示,於壓印步驟(S6)中,第一實施態樣之第三實施例包含:施予該第一高溫至該基材層(29)與該第一可溶解性模仁(3)相對應之位置;以及該壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有該第一轉印結構(9);於形成完該第一轉印結構(9)後,施予該第一高溫至該基材層(29)與該第二可溶解性模仁(11)相對應之位置;以及該壓力至該第二可溶解性模仁(11),使該高分子材料層(18)具有該第二轉印結構(17);將該第一支撐背板(8)與該第一膠帶(7)分離;以及將該第二支撐背板(16)與該第二膠帶(15)分離;以及施予該第二高溫至該第一可溶解性模仁(3)與該第二可溶解性模仁(11);至該基材層(29)與該第一可溶解性模仁(3)相對應之位置、以及該基材層(29)與該第二可溶解性模仁(11)相對應之位置;或至該基材層(29),以使該高分子材料層(18)固化。 More preferably, as shown in FIGS. 8A to 8C , in the embossing step (S6), the third embodiment of the first embodiment includes: applying the first high temperature to the position of the substrate layer (29) corresponding to the first soluble mold core (3); and applying the pressure to the first soluble mold core (3) so that the polymer material layer (18) has the first transfer structure (9); after the first transfer structure (9) is formed, applying the first high temperature to the position of the substrate layer (29) corresponding to the second soluble mold core (11); and applying the pressure to the second soluble mold core (11) so that the polymer material layer (18) has the first transfer structure (9); The sub-material layer (18) has the second transfer structure (17); the first supporting back plate (8) is separated from the first adhesive tape (7); and the second supporting back plate (16) is separated from the second adhesive tape (15); and the second high temperature is applied to the first soluble mold core (3) and the second soluble mold core (11); to the position of the substrate layer (29) corresponding to the first soluble mold core (3), and the position of the substrate layer (29) corresponding to the second soluble mold core (11); or to the substrate layer (29), so as to solidify the polymer material layer (18).

更佳者,如圖8D至8G所示,於壓印步驟(S6)中,第一實施態樣之第四實施例包含:施予該第一高溫與該壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有該第一轉印結構(9),並使該第一支撐背板(8)與該第一膠帶(7)分離;以及施予該第二高溫至該第一可溶解性模仁(3);至該基材層(29)與該第一可溶解性模仁(3)相對應之位置;或至該基材層(29),以使該高分子材料層(18)與該第一可溶解性模仁(3)相對應之部分固化;以及施予該第一高溫與該壓力至該第二可溶解性模仁(11),使該高分子材料層(18)具有該第二轉印結構(17),並使該 第二支撐背板(16)與該第二膠帶(15)分離;以及施予該第二高溫至該第二可溶解性模仁(11);至該基材層(29)與該第二可溶解性模仁(11)相對應之位置;或至該基材層(29),以使該高分子材料層(18)與該第二可溶解性模仁(11)相對應之部分固化。 More preferably, as shown in FIGS. 8D to 8G , in the embossing step (S6), the fourth embodiment of the first embodiment includes: applying the first high temperature and the pressure to the first soluble mold (3) so that the polymer material layer (18) has the first transfer structure (9) and the first supporting back plate (8) is separated from the first tape (7); and applying the second high temperature to the first soluble mold (3); to the position of the substrate layer (29) corresponding to the first soluble mold (3); or to the substrate layer (29) so that the polymer material layer (18) and the first soluble mold (3) are connected. The first high temperature and the pressure are applied to the second soluble mold (11) so that the polymer material layer (18) has the second transfer structure (17) and the second supporting back plate (16) is separated from the second adhesive tape (15); and the second high temperature is applied to the second soluble mold (11); to the position of the substrate layer (29) corresponding to the second soluble mold (11); or to the substrate layer (29) so that the polymer material layer (18) and the second soluble mold (11) The corresponding part is cured.

更佳者,如圖8D至8G所示,於壓印步驟(S6)中,第一實施態樣之第五實施例包含:首先:施予該第一高溫至該基材層(29)與該第一可溶解性模仁(3)相對應之部分;以及該壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有該第一轉印結構(9),並使該第一支撐背板(8)與該第一膠帶(7)分離;再來:施予該第二高溫至該第一可溶解性模仁(3);至該基材層(29)與該第一可溶解性模仁(3)相對應之位置;或至該基材層(29),以使該高分子材料層(18)與該第一可溶解性模仁(3)相對應之部分固化;以及首先:施予該第一高溫至該基材層(29)與該第二可溶解性模仁(11)相對應之部分;以及該壓力至該第二可溶解性模仁(11),使該高分子材料層(18)具有該第二轉印結構(17),並使該第二支撐背板(16)與該第二膠帶(15)分離;再來:施予該第二高溫至該第二可溶解性模仁(11);至該基材層(29)與該第二可溶解性模仁(11)相對應之位置;或至該基材層(29),以使該高分子材料層(18)與該第二可溶解性模仁(11)相對應之部分固化。 More preferably, as shown in FIGS. 8D to 8G , in the embossing step (S6), the fifth embodiment of the first embodiment comprises: first: applying the first high temperature to the portion of the substrate layer (29) corresponding to the first soluble mold core (3); and applying the pressure to the first soluble mold core (3) so that the polymer material layer (18) has the first transfer structure (9) and the first supporting back plate (8) is separated from the first tape (7); then: applying the second high temperature to the first soluble mold core (3); to the position of the substrate layer (29) corresponding to the first soluble mold core (3); or to the substrate layer (29) so that the polymer material layer (18) and the first soluble mold core (3) are in contact with each other. The first step is to apply the first high temperature to the portion of the substrate layer (29) corresponding to the second soluble mold core (11); and the pressure to the second soluble mold core (11), so that the polymer material layer (18) has the second transfer structure (17), and the second supporting back plate (16) is separated from the second tape (15); and then: apply the second high temperature to the second soluble mold core (11); to the position of the substrate layer (29) corresponding to the second soluble mold core (11); or to the substrate layer (29), so that the portion of the polymer material layer (18) corresponding to the second soluble mold core (11) is cured.

更佳者,如圖8D至8G所示,於壓印步驟(S6)中,第一實施態樣之第六實施例包含:施予該第一高溫至該基材層(29);施予該壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有該第一轉印結構(9),並使該第一支撐背板(8)與該第一膠帶(7)分離;以及施予該第二高溫至該第一可溶解性模仁(3);至該基材層(29)與該第一可溶解性模仁(3)相對應之位置;或至該基材層(29),以使該高分子材料層(18)與該第一可溶解性模仁(3)相對應之部分固化;以及施予該壓力 至該第二可溶解性模仁(11),使該高分子材料層(18)具有該第二轉印結構(17),並使該第二支撐背板(16)與該第二膠帶(15)分離;以及施予該第二高溫至該第二可溶解性模仁(11);至該基材層(29)與該第二可溶解性模仁(11)相對應之位置;或至該基材層(29),以使該高分子材料層(18)與該第二可溶解性模仁(11)相對應之部分固化。 More preferably, as shown in FIGS. 8D to 8G , in the embossing step (S6), the sixth embodiment of the first embodiment includes: applying the first high temperature to the substrate layer (29); applying the pressure to the first soluble mold core (3) so that the polymer material layer (18) has the first transfer structure (9) and the first supporting back plate (8) is separated from the first tape (7); and applying the second high temperature to the first soluble mold core (3); to the position of the substrate layer (29) corresponding to the first soluble mold core (3); or to the substrate layer (29) so that the polymer material layer (18) has the first transfer structure (9). ) and the portion corresponding to the first soluble mold (3) are solidified; and the pressure is applied to the second soluble mold (11) so that the polymer material layer (18) has the second transfer structure (17) and the second supporting back plate (16) is separated from the second tape (15); and the second high temperature is applied to the second soluble mold (11); to the position corresponding to the substrate layer (29) and the second soluble mold (11); or to the substrate layer (29) so that the portion corresponding to the polymer material layer (18) and the second soluble mold (11) are solidified.

以下用以說明壓印步驟(S6)之第二實施態樣。 The following is used to illustrate the second implementation of the embossing step (S6).

如圖9A至9C所示,其中壓印步驟(S6)包含:施予一第一高溫至該高分子材料層(18);以及施予一壓力至該第一可溶解性模仁(3)、與該第二可溶解性模仁(11),使該高分子材料層(18)具有一對應該第一凹凸結構(4)的第一轉印結構(9);以及一對應該第二凹凸結構(12)的第二轉印結構(17);以及將該第一支撐背板(8)與該第一黏著層(5)分離;以及將該第二支撐背板(16)與該第二黏著層(13)分離,並施予一第二高溫至該高分子材料層(18),使該高分子材料層(18)固化,其中該第一高溫與該第二高溫不同。 As shown in Figures 9A to 9C, the embossing step (S6) includes: applying a first high temperature to the polymer material layer (18); applying a pressure to the first soluble mold (3) and the second soluble mold (11), so that the polymer material layer (18) has a first transfer structure (9) corresponding to the first concave-convex structure (4); and a second transfer structure (17) corresponding to the second concave-convex structure (12); and separating the first supporting back plate (8) from the first adhesive layer (5); and separating the second supporting back plate (16) from the second adhesive layer (13), and applying a second high temperature to the polymer material layer (18) to cure the polymer material layer (18), wherein the first high temperature is different from the second high temperature.

更佳者,供給第一高溫、與第二高溫之加熱源可為相同或不同,其中加熱源係可對可溶解性模仁加熱;對基材層(29)與可溶解性模仁相對應之區域加熱;或對整體基材層(29)加熱,以使溫度傳導至高分子材料層(18),而使高分子材料層(18)軟化、或固化。 More preferably, the heat sources for supplying the first high temperature and the second high temperature may be the same or different, wherein the heat source may heat the soluble mold core; heat the area of the substrate layer (29) corresponding to the soluble mold core; or heat the entire substrate layer (29) so that the temperature is transferred to the polymer material layer (18), thereby softening or curing the polymer material layer (18).

更佳者,如圖9A至9C所示,於壓印步驟(S6)中,第二實施態樣之第一實施例包含:施予該第一高溫與該壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有該第一轉印結構(9);於形成該第一轉印結構(9)後,施予該第一高溫與該壓力至該第二可溶解性模仁(11),使該高分子材料層(18)具有該第二轉印結構(17);於形成該第二轉印結構(17)後,將該第一支撐背板(8)與該第一黏 著層(5)分離;以及將該第二支撐背板(16)與該第二黏著層(13)分離;以及施予該第二高溫至該第一可溶解性模仁(3)與該第二可溶解性模仁(11);至該基材層(29)與該第一可溶解性模仁(3)相對應之位置、以及該基材層(29)與該第二可溶解性模仁(11)相對應之位置;或至該基材層(29),以使該高分子材料層(18)固化。 More preferably, as shown in FIGS. 9A to 9C , in the embossing step (S6), the first embodiment of the second embodiment includes: applying the first high temperature and the pressure to the first soluble mold (3) so that the polymer material layer (18) has the first transfer structure (9); after forming the first transfer structure (9), applying the first high temperature and the pressure to the second soluble mold (11) so that the polymer material layer (18) has the second transfer structure (17); after forming the second transfer structure (17), The first supporting back plate (8) is separated from the first adhesive layer (5); and the second supporting back plate (16) is separated from the second adhesive layer (13); and the second high temperature is applied to the first soluble mold core (3) and the second soluble mold core (11); to the position of the substrate layer (29) corresponding to the first soluble mold core (3), and the position of the substrate layer (29) corresponding to the second soluble mold core (11); or to the substrate layer (29), so as to solidify the polymer material layer (18).

更佳者,如圖9A至9C所示,於壓印步驟(S6)中,第二實施態樣之第二實施例包含:施予該第一高溫至該基材層(29);施予該壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有該第一轉印結構(9);於形成完該第一轉印結構(9)後,施予該壓力至將該第二可溶解性模仁(11),使該高分子材料層(18)具有該第二轉印結構(17);將該第一支撐背板(8)與該第一黏著層(5)分離;以及將該第二支撐背板(16)與該第二黏著層(13)分離;以及施予該第二高溫至該第一可溶解性模仁(3)與該第二可溶解性模仁(11);至該基材層(29)與該第一可溶解性模仁(3)相對應之位置、以及該基材層(29)與該第二可溶解性模仁(11)相對應之位置;或至該基材層(29),以使該高分子材料層(18)固化。 More preferably, as shown in FIGS. 9A to 9C , in the embossing step (S6), the second embodiment of the second embodiment includes: applying the first high temperature to the substrate layer (29); applying the pressure to the first soluble mold (3) so that the polymer material layer (18) has the first transfer structure (9); after the first transfer structure (9) is formed, applying the pressure to the second soluble mold (11) so that the polymer material layer (18) has the second transfer structure (17); applying the first support The back plate (8) is separated from the first adhesive layer (5); and the second supporting back plate (16) is separated from the second adhesive layer (13); and the second high temperature is applied to the first soluble mold core (3) and the second soluble mold core (11); to the position of the substrate layer (29) corresponding to the first soluble mold core (3), and the position of the substrate layer (29) corresponding to the second soluble mold core (11); or to the substrate layer (29), so as to solidify the polymer material layer (18).

更佳者,如圖9A至9C所示,於壓印步驟(S6)中,第二實施態樣之第三實施例包含:施予該第一高溫至該基材層(29)與該第一可溶解性模仁(3)相對應之位置;以及該壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有該第一轉印結構(9);於形成完該第一轉印結構(9)後,施予該第一高溫至該基材層(29)與該第二可溶解性模仁(11)相對應之位置;以及該壓力至該第二可溶解性模仁(11),使該高分子材料層(18)具有該第二轉印結構(17);將該第一支撐背板(8)與該第一黏著層(5)分離;以及將該第二支撐背板(16)與該第二黏著層(13)分離;以及施予該第二高溫至該第一可溶解性模仁(3)與該第二可溶解性模仁(11);至該基材層(29)與該第一可溶解性模仁(3)相對應之位置、以及該基材層(29)與該第二 可溶解性模仁(11)相對應之位置;或至該基材層(29),以使該高分子材料層(18)固化。 More preferably, as shown in FIGS. 9A to 9C , in the embossing step (S6), the third embodiment of the second embodiment includes: applying the first high temperature to the position of the substrate layer (29) corresponding to the first soluble mold core (3); and applying the pressure to the first soluble mold core (3) so that the polymer material layer (18) has the first transfer structure (9); after the first transfer structure (9) is formed, applying the first high temperature to the position of the substrate layer (29) corresponding to the second soluble mold core (11); and applying the pressure to the second soluble mold core (11) so that the polymer material layer (18) has the first transfer structure (9); after the first transfer structure (9) is formed, applying the first high temperature to the position of the substrate layer (29) corresponding to the second soluble mold core (11); and applying the pressure to the second soluble mold core (11) so that the polymer material layer (18) has the first transfer structure (9); The material layer (18) has the second transfer structure (17); the first supporting back plate (8) is separated from the first adhesive layer (5); and the second supporting back plate (16) is separated from the second adhesive layer (13); and the second high temperature is applied to the first soluble mold core (3) and the second soluble mold core (11); to the position of the substrate layer (29) corresponding to the first soluble mold core (3), and the position of the substrate layer (29) corresponding to the second soluble mold core (11); or to the substrate layer (29), so as to solidify the polymer material layer (18).

更佳者,如圖9D至9G所示,於壓印步驟(S6)中,第二實施態樣之第四實施例包含:施予該第一高溫與該壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有該第一轉印結構(9),並使該第一支撐背板(8)與該第一黏著層(5)分離;以及施予該第二高溫至該第一可溶解性模仁(3);至該基材層(29)與該第一可溶解性模仁(3)相對應之位置;或至該基材層(29),以使該高分子材料層(18)與該第一可溶解性模仁(3)相對應之部分固化;以及施予該第一高溫與該壓力至該第二可溶解性模仁(11),使該高分子材料層(18)具有該第二轉印結構(17),並使該第二支撐背板(16)與該第二黏著層(13)分離;以及施予該第二高溫至該第二可溶解性模仁(11);至該基材層(29)與該第二可溶解性模仁(11)相對應之位置;或至該基材層(29),以使該高分子材料層(18)與該第二可溶解性模仁(11)相對應之部分固化。 More preferably, as shown in FIGS. 9D to 9G , in the embossing step (S6), the fourth embodiment of the second embodiment includes: applying the first high temperature and the pressure to the first soluble mold core (3) so that the polymer material layer (18) has the first transfer structure (9) and the first supporting back plate (8) is separated from the first adhesive layer (5); and applying the second high temperature to the first soluble mold core (3); to the position of the substrate layer (29) corresponding to the first soluble mold core (3); or to the substrate layer (29) so that the polymer material layer (18) and the first soluble mold core (3) are bonded. The first high temperature and the pressure are applied to the second soluble mold core (11) so that the polymer material layer (18) has the second transfer structure (17) and the second supporting back plate (16) is separated from the second adhesive layer (13); and the second high temperature is applied to the second soluble mold core (11); to the position of the substrate layer (29) corresponding to the second soluble mold core (11); or to the substrate layer (29) so that the polymer material layer (18) and the second soluble mold core (11) The corresponding part is cured.

更佳者,如圖9D至9G所示,於壓印步驟(S6)中,第二實施態樣之第五實施例包含:首先:施予該第一高溫至該基材層(29)與該第一可溶解性模仁(3)相對應之部分;以及該壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有該第一轉印結構(9),並使該第一支撐背板(8)與該第一黏著層(5)分離;再來:施予該第二高溫至該第一可溶解性模仁(3);至該基材層(29)與該第一可溶解性模仁(3)相對應之位置;或至該基材層(29),以使該高分子材料層(18)與該第一可溶解性模仁(3)相對應之部分固化;以及首先:施予該第一高溫至該基材層(29)與該第二可溶解性模仁(11)相對應之部分;以及該壓力至該第二可溶解性模仁(11),使該高分子材料層(18)具有該第二轉印結構(17),並使該第二支撐背板(16)與該第 二黏著層(13)分離;再來:施予該第二高溫至該第二可溶解性模仁(11);至該基材層(29)與該第二可溶解性模仁(11)相對應之位置;或至該基材層(29),以使該高分子材料層(18)與該第二可溶解性模仁(11)相對應之部分固化。 More preferably, as shown in FIGS. 9D to 9G , in the embossing step (S6), the fifth embodiment of the second embodiment comprises: first: applying the first high temperature to the portion of the substrate layer (29) corresponding to the first soluble mold core (3); and applying the pressure to the first soluble mold core (3) so that the polymer material layer (18) has the first transfer structure (9) and the first supporting back plate (8) is separated from the first adhesive layer (5); and then: applying the second high temperature to the first soluble mold core (3); to the position of the substrate layer (29) corresponding to the first soluble mold core (3); or to the substrate layer (29) so that the polymer material layer (18) and the first soluble mold core (3) are separated. The first step is to apply the first high temperature to the portion of the substrate layer (29) corresponding to the second soluble mold core (11); and the pressure to the second soluble mold core (11), so that the polymer material layer (18) has the second transfer structure (17), and the second supporting back plate (16) is separated from the second adhesive layer (13); and then: apply the second high temperature to the second soluble mold core (11); to the position of the substrate layer (29) corresponding to the second soluble mold core (11); or to the substrate layer (29), so that the portion of the polymer material layer (18) corresponding to the second soluble mold core (11) is cured.

更佳者,如圖9D至9G所示,於壓印步驟(S6)中,第二實施態樣之第六實施例包含:施予該第一高溫至該基材層(29);施予該壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有該第一轉印結構(9),並使該第一支撐背板(8)與該第一黏著層(5)分離;以及施予該第二高溫至該第一可溶解性模仁(3);至該基材層(29)與該第一可溶解性模仁(3)相對應之位置;或至該基材層(29),以使該高分子材料層(18)與該第一可溶解性模仁(3)相對應之部分固化;以及施予該壓力至該第二可溶解性模仁(11),使該高分子材料層(18)具有該第二轉印結構(17),並使該第二支撐背板(16)與該第二黏著層(13)分離;以及施予該第二高溫至該第二可溶解性模仁(11);至該基材層(29)與該第二可溶解性模仁(11)相對應之位置;或至該基材層(29),以使該高分子材料層(18)與該第二可溶解性模仁(11)相對應之部分固化。 More preferably, as shown in FIGS. 9D to 9G , in the embossing step (S6), the sixth embodiment of the second embodiment includes: applying the first high temperature to the substrate layer (29); applying the pressure to the first soluble mold core (3) so that the polymer material layer (18) has the first transfer structure (9) and the first supporting back plate (8) is separated from the first adhesive layer (5); and applying the second high temperature to the first soluble mold core (3); to the position of the substrate layer (29) corresponding to the first soluble mold core (3); or to the substrate layer (29) so that the polymer material layer (18) has the first transfer structure (9). 8) the portion corresponding to the first soluble mold core (3) is solidified; and the pressure is applied to the second soluble mold core (11) so that the polymer material layer (18) has the second transfer structure (17) and the second supporting back plate (16) is separated from the second adhesive layer (13); and the second high temperature is applied to the second soluble mold core (11); to the position of the substrate layer (29) corresponding to the second soluble mold core (11); or to the substrate layer (29) so that the portion corresponding to the polymer material layer (18) and the second soluble mold core (11) is solidified.

以下用以說明壓印步驟(S6)之第三實施態樣。 The following is used to illustrate the third implementation of the embossing step (S6).

如圖10A至10C所示,其中壓印步驟(S6)包含:施予一第一高溫至該高分子材料層(18);以及施予一壓力至該第一可溶解性模仁(3)、與該第二可溶解性模仁(11),使該高分子材料層(18)具有一對應該第一凹凸結構(4)的第一轉印結構(9);以及一對應該第二凹凸結構(12)的第二轉印結構(17);以及將該第一膠帶(7)與該第一黏著層(5)分離;以及將該第二膠帶(15)與該第二黏著層(13)分離,並施予一第二高溫至該高分子材料層(18),使該高分子材料層(18)固化,其中該第一高溫與該第二高溫不同。較佳者,如圖10D所示,其中更包含:一剝離步驟 (S8),係於該壓印步驟(S6)後、與該溶解步驟(S7)前,將該第一黏著層(5)與該第一可溶解性模仁(3)分離;以及將該第二黏著層(13)與該第二可溶解性模仁(11)分離。具體而言,該第一黏著層(5)與該第二黏著層(13)係為一熱解離膠帶,當其受第一高溫烘烤時,即會產生解離,因此當於剝離步驟(S8)中,使該第一黏著層(5)相對於第一可溶解性模仁(3)分離時;或使該第二黏著層(13)相對於第二可溶解性模仁(11)分離時,皆不會使高分子材料層(18)受拉力影響而晃動、變形、或產生缺陷。 As shown in Figures 10A to 10C, the embossing step (S6) includes: applying a first high temperature to the polymer material layer (18); and applying a pressure to the first soluble mold (3) and the second soluble mold (11), so that the polymer material layer (18) has a first transfer structure (9) corresponding to the first concave-convex structure (4); and a second transfer structure (17) corresponding to the second concave-convex structure (12); and separating the first tape (7) from the first adhesive layer (5); and separating the second tape (15) from the second adhesive layer (13), and applying a second high temperature to the polymer material layer (18) to cure the polymer material layer (18), wherein the first high temperature is different from the second high temperature. Preferably, as shown in FIG. 10D , the method further comprises: a peeling step (S8) of separating the first adhesive layer (5) from the first soluble mold core (3) after the embossing step (S6) and before the dissolving step (S7); and separating the second adhesive layer (13) from the second soluble mold core (11). Specifically, the first adhesive layer (5) and the second adhesive layer (13) are a thermally detachable tape, which will be detached when subjected to the first high-temperature baking. Therefore, when the first adhesive layer (5) is separated from the first soluble mold core (3) in the peeling step (S8); or when the second adhesive layer (13) is separated from the second soluble mold core (11), the polymer material layer (18) will not be affected by the tensile force and will not shake, deform, or produce defects.

更佳者,供給第一高溫、與第二高溫之加熱源可為相同或不同,其中加熱源係可對可溶解性模仁加熱;對基材層(29)與可溶解性模仁相對應之區域加熱;或對整體基材層(29)加熱,以使溫度傳導至高分子材料層(18),而使高分子材料層(18)軟化、或固化。 More preferably, the heat sources for supplying the first high temperature and the second high temperature may be the same or different, wherein the heat source may heat the soluble mold core; heat the area of the substrate layer (29) corresponding to the soluble mold core; or heat the entire substrate layer (29) so that the temperature is transferred to the polymer material layer (18), thereby softening or curing the polymer material layer (18).

更佳者,如圖10A至10C所示,於壓印步驟(S6)中,第三實施態樣之第一實施例包含:施予該第一高溫與該壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有該第一轉印結構(9);於形成該第一轉印結構(9)後,施予該第一高溫與該壓力至該第二可溶解性模仁(11),使該高分子材料層(18)具有該第二轉印結構(17);於形成該第二轉印結構(17)後,將該第一膠帶(7)與該第一黏著層(5)分離;以及將該第二膠帶(15)與該第二黏著層(13)分離;以及施予該第二高溫至該第一可溶解性模仁(3)與該第二可溶解性模仁(11);至該基材層(29)與該第一可溶解性模仁(3)相對應之位置、以及該基材層(29)與該第二可溶解性模仁(11)相對應之位置;或至該基材層(29),以使該高分子材料層(18)固化。 More preferably, as shown in FIGS. 10A to 10C , in the embossing step (S6), the first embodiment of the third embodiment comprises: applying the first high temperature and the pressure to the first soluble mold (3) so that the polymer material layer (18) has the first transfer structure (9); after forming the first transfer structure (9), applying the first high temperature and the pressure to the second soluble mold (11) so that the polymer material layer (18) has the second transfer structure (17); after forming the second transfer structure (17), , separating the first tape (7) from the first adhesive layer (5); and separating the second tape (15) from the second adhesive layer (13); and applying the second high temperature to the first soluble mold core (3) and the second soluble mold core (11); to the position of the substrate layer (29) corresponding to the first soluble mold core (3), and the position of the substrate layer (29) corresponding to the second soluble mold core (11); or to the substrate layer (29), so as to solidify the polymer material layer (18).

更佳者,如圖10A至10C所示,於壓印步驟(S6)中,第三實施態樣之第二實施例包含:施予該第一高溫至該基材層(29);施予該壓力至該第一可 溶解性模仁(3),使該高分子材料層(18)具有該第一轉印結構(9);於形成完該第一轉印結構(9)後,施予該壓力至將該第二可溶解性模仁(11),使該高分子材料層(18)具有該第二轉印結構(17);將該第一膠帶(7)與該第一黏著層(5)分離;以及將該第二膠帶(15)與該第二黏著層(13)分離;以及施予該第二高溫至該第一可溶解性模仁(3)與該第二可溶解性模仁(11);至該基材層(29)與該第一可溶解性模仁(3)相對應之位置、以及該基材層(29)與該第二可溶解性模仁(11)相對應之位置;或至該基材層(29),以使該高分子材料層(18)固化。 More preferably, as shown in FIGS. 10A to 10C , in the embossing step (S6), the second embodiment of the third embodiment comprises: applying the first high temperature to the substrate layer (29); applying the pressure to the first soluble mold (3) so that the polymer material layer (18) has the first transfer structure (9); after the first transfer structure (9) is formed, applying the pressure to the second soluble mold (11) so that the polymer material layer (18) has the second transfer structure (17); A tape (7) is separated from the first adhesive layer (5); and the second tape (15) is separated from the second adhesive layer (13); and the second high temperature is applied to the first soluble mold core (3) and the second soluble mold core (11); to the position of the substrate layer (29) corresponding to the first soluble mold core (3), and the position of the substrate layer (29) corresponding to the second soluble mold core (11); or to the substrate layer (29), so as to solidify the polymer material layer (18).

更佳者,如圖10A至10C所示,於壓印步驟(S6)中,第三實施態樣之第三實施例包含:施予該第一高溫至該基材層(29)與該第一可溶解性模仁(3)相對應之位置;以及該壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有該第一轉印結構(9);於形成完該第一轉印結構(9)後,施予該第一高溫至該基材層(29)與該第二可溶解性模仁(11)相對應之位置;以及該壓力至該第二可溶解性模仁(11),使該高分子材料層(18)具有該第二轉印結構(17);將該第一膠帶(7)與該第一黏著層(5)分離;以及將該第二膠帶(15)與該第二黏著層(13)分離;以及施予該第二高溫至該第一可溶解性模仁(3)與該第二可溶解性模仁(11);至該基材層(29)與該第一可溶解性模仁(3)相對應之位置、以及該基材層(29)與該第二可溶解性模仁(11)相對應之位置;或至該基材層(29),以使該高分子材料層(18)固化。 More preferably, as shown in FIGS. 10A to 10C , in the embossing step (S6), the third embodiment of the third embodiment includes: applying the first high temperature to the position of the substrate layer (29) corresponding to the first soluble mold core (3); and applying the pressure to the first soluble mold core (3) so that the polymer material layer (18) has the first transfer structure (9); after the first transfer structure (9) is formed, applying the first high temperature to the position of the substrate layer (29) corresponding to the second soluble mold core (11); and applying the pressure to the second soluble mold core (11) so that the The polymer material layer (18) has the second transfer structure (17); the first tape (7) is separated from the first adhesive layer (5); and the second tape (15) is separated from the second adhesive layer (13); and the second high temperature is applied to the first soluble mold core (3) and the second soluble mold core (11); to the position of the substrate layer (29) corresponding to the first soluble mold core (3), and the position of the substrate layer (29) corresponding to the second soluble mold core (11); or to the substrate layer (29), so as to solidify the polymer material layer (18).

更佳者,如圖10E至10H所示,於壓印步驟(S6)中,第三實施態樣之第四實施例包含:施予該第一高溫與該壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有該第一轉印結構(9),並使該第一膠帶(7)與該第一黏著層(5)分離;以及施予該第二高溫至該第一可溶解性模仁(3);至該基材層(29)與該第一可溶解性模仁(3)相對應之位置;或至該基材層(29),以使該高分子材料層(18)與 該第一可溶解性模仁(3)相對應之部分固化;以及施予該第一高溫與該壓力至該第二可溶解性模仁(11),使該高分子材料層(18)具有該第二轉印結構(17),並使該第二膠帶(15)與該第二黏著層(13)分離;以及施予該第二高溫至該第二可溶解性模仁(11);至該基材層(29)與該第二可溶解性模仁(11)相對應之位置;或至該基材層(29),以使該高分子材料層(18)與該第二可溶解性模仁(11)相對應之部分固化。 More preferably, as shown in FIGS. 10E to 10H, in the embossing step (S6), the fourth embodiment of the third embodiment includes: applying the first high temperature and the pressure to the first soluble mold (3) so that the polymer material layer (18) has the first transfer structure (9) and the first tape (7) is separated from the first adhesive layer (5); and applying the second high temperature to the first soluble mold (3); to the position of the substrate layer (29) corresponding to the first soluble mold (3); or to the substrate layer (29) so that the polymer material layer (18) and the first soluble mold (3) are connected. The first high temperature and the pressure are applied to the second soluble mold (11) so that the polymer material layer (18) has the second transfer structure (17) and the second tape (15) is separated from the second adhesive layer (13); and the second high temperature is applied to the second soluble mold (11); to the position of the substrate layer (29) corresponding to the second soluble mold (11); or to the substrate layer (29) so that the polymer material layer (18) and the second soluble mold (11) The corresponding part is cured.

更佳者,如圖10E至10H所示,於壓印步驟(S6)中,第三實施態樣之第五實施例包含:首先:施予該第一高溫至該基材層(29)與該第一可溶解性模仁(3)相對應之部分;以及該壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有該第一轉印結構(9),並使該第一膠帶(7)與該第一黏著層(5)分離;再來:施予該第二高溫至該第一可溶解性模仁(3);至該基材層(29)與該第一可溶解性模仁(3)相對應之位置;或至該基材層(29),以使該高分子材料層(18)與該第一可溶解性模仁(3)相對應之部分固化;以及首先:施予該第一高溫至該基材層(29)與該第二可溶解性模仁(11)相對應之部分;以及該壓力至該第二可溶解性模仁(11),使該高分子材料層(18)具有該第二轉印結構(17),並使該第二膠帶(15)與該第二黏著層(13)分離;再來:施予該第二高溫至該第二可溶解性模仁(11);至該基材層(29)與該第二可溶解性模仁(11)相對應之位置;或至該基材層(29),以使該高分子材料層(18)與該第二可溶解性模仁(11)相對應之部分固化。 More preferably, as shown in FIGS. 10E to 10H, in the embossing step (S6), the fifth embodiment of the third embodiment comprises: first: applying the first high temperature to the portion of the substrate layer (29) corresponding to the first soluble mold core (3); and applying the pressure to the first soluble mold core (3) so that the polymer material layer (18) has the first transfer structure (9) and the first tape (7) is separated from the first adhesive layer (5); and then: applying the second high temperature to the first soluble mold core (3); to the position of the substrate layer (29) corresponding to the first soluble mold core (3); or to the substrate layer (29) so that the polymer material layer (18) is in contact with the first soluble mold core (3). The first step is to apply the first high temperature to the portion of the substrate layer (29) corresponding to the second soluble mold core (11); and the pressure to the second soluble mold core (11), so that the polymer material layer (18) has the second transfer structure (17), and the second tape (15) is separated from the second adhesive layer (13); and then: apply the second high temperature to the second soluble mold core (11); to the position of the substrate layer (29) corresponding to the second soluble mold core (11); or to the substrate layer (29), so that the portion of the polymer material layer (18) corresponding to the second soluble mold core (11) is cured.

更佳者,如圖10E至10H所示,於壓印步驟(S6)中,第三實施態樣之第六實施例包含:施予該第一高溫至該基材層(29);施予該壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有該第一轉印結構(9),並使該第一膠帶(7)與該第一黏著層(5)分離;以及施予該第二高溫至該第一可溶解性模仁(3);至該基材層(29)與該第一可溶解性模仁(3)相對應之位置;或至該基材層(29),以使該 高分子材料層(18)與該第一可溶解性模仁(3)相對應之部分固化;以及施予該壓力至該第二可溶解性模仁(11),使該高分子材料層(18)具有該第二轉印結構(17),並使該第二膠帶(15)與該第二黏著層(13)分離;以及施予該第二高溫至該第二可溶解性模仁(11);至該基材層(29)與該第二可溶解性模仁(11)相對應之位置;或至該基材層(29),以使該高分子材料層(18)與該第二可溶解性模仁(11)相對應之部分固化。 More preferably, as shown in FIGS. 10E to 10H, in the embossing step (S6), the sixth embodiment of the third embodiment includes: applying the first high temperature to the substrate layer (29); applying the pressure to the first soluble mold core (3) so that the polymer material layer (18) has the first transfer structure (9) and the first tape (7) is separated from the first adhesive layer (5); and applying the second high temperature to the first soluble mold core (3); to the position of the substrate layer (29) corresponding to the first soluble mold core (3); or to the substrate layer (29) so that the polymer material layer ( 18) and the portion corresponding to the first soluble mold (3) are solidified; and the pressure is applied to the second soluble mold (11) so that the polymer material layer (18) has the second transfer structure (17) and the second tape (15) is separated from the second adhesive layer (13); and the second high temperature is applied to the second soluble mold (11); to the position of the substrate layer (29) corresponding to the second soluble mold (11); or to the substrate layer (29) so that the portion corresponding to the polymer material layer (18) and the second soluble mold (11) are solidified.

以下用以說明壓印步驟(S6)之第四實施態樣。 The following is used to illustrate the fourth implementation of the embossing step (S6).

如圖11A至11C所示,其中壓印步驟(S6)包含:施予一壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有一對應該第一凹凸結構(4)的第一轉印結構(9);以及該第二可溶解性模仁(11),使該高分子材料層(18)具有一對應該第二凹凸結構(12)的第二轉印結構(17);以及以一UV光照射該高分子材料層(18),使該高分子材料層(18)固化,並使該第一支撐背板(8)與該第一膠帶(7)分離;以及使該第二支撐背板(16)與該第二膠帶(15)分離。較佳者,該UV光係由一UV發射源(40)所提供;以及該壓力係由一吹氣元件(39)所提供。 As shown in Figures 11A to 11C, the embossing step (S6) includes: applying a pressure to the first soluble mold (3) so that the polymer material layer (18) has a first transfer structure (9) corresponding to the first concave-convex structure (4); and the second soluble mold (11) so that the polymer material layer (18) has a second transfer structure (17) corresponding to the second concave-convex structure (12); and irradiating the polymer material layer (18) with a UV light to cure the polymer material layer (18) and separate the first supporting backboard (8) from the first adhesive tape (7); and separating the second supporting backboard (16) from the second adhesive tape (15). Preferably, the UV light is provided by a UV emitting source (40); and the pressure is provided by a blowing element (39).

更佳者,如圖11A至11C所示,於壓印步驟(S6)中,第四實施態樣之第一實施例包含:施予一壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有一對應該第一凹凸結構(4)的第一轉印結構(9);施予該壓力至該第二可溶解性模仁(11),使該高分子材料層(18)具有一對應該第二凹凸結構(12)的第二轉印結構(17);以一UV光照射該高分子材料層(18),使該高分子材料層(18)固化;以及使該第一支撐背板(8)與該第一膠帶(7)分離、和使該第二支撐背板(16)與該第二膠帶(15)分離。 More preferably, as shown in FIGS. 11A to 11C , in the embossing step (S6), the first embodiment of the fourth embodiment includes: applying a pressure to the first soluble mold (3) so that the polymer material layer (18) has a first transfer structure (9) corresponding to the first concave-convex structure (4); applying the pressure to the second soluble mold (11) so that the polymer material layer (18) has a second transfer structure (17) corresponding to the second concave-convex structure (12); irradiating the polymer material layer (18) with a UV light so that the polymer material layer (18) is cured; and separating the first supporting back plate (8) from the first adhesive tape (7), and separating the second supporting back plate (16) from the second adhesive tape (15).

更佳者,如圖11D至11G所示,於壓印步驟(S6)中,第四實施態樣 之第二實施例包含:首先:施予一壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有一對應該第一凹凸結構(4)的第一轉印結構(9);以一UV光照射該高分子材料層(18)與該第一可溶解性模仁(3)相對應之部分,以使該高分子材料層(18)與該第一可溶解性模仁(3)相對應之部分固化;以及使該第一支撐背板(8)與該第一膠帶(7)分離;以及再來:施予一壓力至該第二可溶解性模仁(11),使該高分子材料層(18)具有一對應該第二凹凸結構(12)的第二轉印結構(17);以該UV光照射該高分子材料層(18)與該第二可溶解性模仁(11)相對應之部分,以使該高分子材料層(18)與該第二可溶解性模仁(11)相對應之部分固化;以及使該第二支撐背板(16)與該第二膠帶(15)分離。 More preferably, as shown in FIGS. 11D to 11G , in the embossing step (S6), the second embodiment of the fourth embodiment includes: first: applying a pressure to the first soluble mold (3) so that the polymer material layer (18) has a first transfer structure (9) corresponding to the first concave-convex structure (4); irradiating the portion of the polymer material layer (18) corresponding to the first soluble mold (3) with a UV light so that the portion of the polymer material layer (18) corresponding to the first soluble mold (3) is cured; and The back plate (8) is separated from the first adhesive tape (7); and then: a pressure is applied to the second soluble mold (11) so that the polymer material layer (18) has a second transfer structure (17) corresponding to the second concave-convex structure (12); the UV light is irradiated on the portion of the polymer material layer (18) corresponding to the second soluble mold (11) so that the portion of the polymer material layer (18) corresponding to the second soluble mold (11) is cured; and the second supporting back plate (16) is separated from the second adhesive tape (15).

更佳者,如圖11D至11G所示,於壓印步驟(S6)中,第四實施態樣之第三實施例包含:施予一壓力至該第一可溶解性模仁(3),使該高分子材料層(18)具有一對應該第一凹凸結構(4)的第一轉印結構(9);施予該壓力至該第二可溶解性模仁(11),使該高分子材料層(18)具有一對應該第二凹凸結構(12)的第二轉印結構(17);以一UV光照射該高分子材料層(18)與該第一可溶解性模仁(3)相對應之部分,使該高分子材料層(18)與該第一可溶解性模仁(3)相對應之部分固化,並使該第一支撐背板(8)與該第一膠帶(7)分離;以及以一UV光照射該高分子材料層(18)與該第二可溶解性模仁(11)相對應之部分,使該高分子材料層(18)與該第二可溶解性模仁(11)相對應之部分固化,並使該第二支撐背板(16)與該第二膠帶(15)分離。 More preferably, as shown in FIGS. 11D to 11G , in the embossing step (S6), the third embodiment of the fourth embodiment comprises: applying a pressure to the first soluble mold (3) so that the polymer material layer (18) has a first transfer structure (9) corresponding to the first concave-convex structure (4); applying the pressure to the second soluble mold (11) so that the polymer material layer (18) has a second transfer structure (17) corresponding to the second concave-convex structure (12); irradiating the polymer material layer (18) and the second soluble mold (11) with a UV light; The first soluble mold core (3) is irradiated with a UV light to cure the portion of the polymer material layer (18) corresponding to the first soluble mold core (3), and the first supporting back plate (8) is separated from the first adhesive tape (7); and the portion of the polymer material layer (18) corresponding to the second soluble mold core (11) is irradiated with a UV light to cure the portion of the polymer material layer (18) corresponding to the second soluble mold core (11), and the second supporting back plate (16) is separated from the second adhesive tape (15).

更佳者,其中可利用一轉印元件(37)施予第一高溫、第二高溫、與壓力至第一可溶解性模仁(3),使高分子材料層(18)具有一對應第一凹凸結構(4)的第一轉印結構(9);或第二可溶解性模仁(11),使高分子材料層(18)具有一對應 第二凹凸結構(12)的第二轉印結構(17)。較佳地,該第一高溫能使高分子材料層(18)的溫度先達到其玻璃轉移溫度而壓力能使高分子材料層(18)的材料充分地流動至第一凹凸結構(4)內,之後第二高溫再使高分子材料層(18)的材料固化以讓高分子材料層(18)的第一轉印結構(9)完整地對應第一凹凸結構(4)。較佳地,該第一高溫能使高分子材料層(18)的溫度先達到其玻璃轉移溫度而壓力能使高分子材料層(18)的材料充分地流動至第二凹凸結構(12)內,之後第二高溫再使高分子材料層(18)的材料固化以讓高分子材料層(18)的第二轉印結構(17)完整地對應第二凹凸結構(12)。較佳地,施予第一高溫與壓力的時間為1至20分鐘,但不以此為限。較佳地,第一高溫之溫度為50至160℃,但不以此為限。須說明的是,施予第一高溫與壓力的時間範圍以及第一高溫溫度範圍可依高分子材料層(18)的材料決定;整體上,以高分子材料層(18)頂部不溶解而不使第一轉印結構(9)、或第二轉印結構(17)產生結構缺陷為原則。另外,施予壓力可對第一可溶解性模仁(3)、或第二可溶解性模仁(11)相反於高分子材料層(18)的一側施予正向壓力;或對第一可溶解性模仁(3)、或第二可溶解性模仁(11)鄰近於高分子材料層(18)的一側施予負向壓力;或可同時施予正向壓力與負向壓力。較佳地,正向壓力為+20至+600kPa,負向壓力為-10至-101.3kPa,但不以此為限。須說明的是,透過負向壓力可使高分子材料層(18)中受熱逸散的揮發性溶劑(19)抽離以避免殘留於高分子材料層(18)而造成第一轉印結構(9)、或第二轉印結構(17)產生結構缺陷。更佳者,轉印元件(37)包含一提供高溫的升溫元件(38)以及一提供壓力的吹氣元件(39),但不以此為限。更佳者,當第一膠帶(7)之材料為熱解離性發泡膠的條件下,透過第一膠帶(7)的解離溫度(較佳地為80至150℃)低於第一高溫溫度可使第一膠帶(7)於第一高溫溫度下解離裂解。更佳者,第一膠帶(7)、第二膠帶(15)、第一黏著 層(5)、與第二黏著層(13)為相同之熱解離性發泡膠,因此皆會受第一高溫影響而產生解離裂解,而可輕鬆地與黏附物、或被黏附物分離。 More preferably, a transfer element (37) can be used to apply a first high temperature, a second high temperature, and a pressure to the first soluble mold (3), so that the polymer material layer (18) has a first transfer structure (9) corresponding to the first concave-convex structure (4); or the second soluble mold (11) can be used to make the polymer material layer (18) have a second transfer structure (17) corresponding to the second concave-convex structure (12). Preferably, the first high temperature can make the temperature of the polymer material layer (18) reach its glass transition temperature first and the pressure can make the material of the polymer material layer (18) fully flow into the first concave-convex structure (4), and then the second high temperature can solidify the material of the polymer material layer (18) so that the first transfer structure (9) of the polymer material layer (18) completely corresponds to the first concave-convex structure (4). Preferably, the first high temperature can make the temperature of the polymer material layer (18) reach its glass transition temperature first, and the pressure can make the material of the polymer material layer (18) fully flow into the second concave-convex structure (12), and then the second high temperature can solidify the material of the polymer material layer (18) so that the second transfer structure (17) of the polymer material layer (18) completely corresponds to the second concave-convex structure (12). Preferably, the time of applying the first high temperature and pressure is 1 to 20 minutes, but not limited thereto. Preferably, the temperature of the first high temperature is 50 to 160°C, but not limited thereto. It should be noted that the time range and the temperature range of the first high temperature applied can be determined according to the material of the polymer material layer (18); generally, the principle is that the top of the polymer material layer (18) is not dissolved and the first transfer structure (9) or the second transfer structure (17) does not produce structural defects. In addition, the pressure applied can be applied by applying positive pressure to the side of the first soluble mold core (3) or the second soluble mold core (11) opposite to the polymer material layer (18); or by applying negative pressure to the side of the first soluble mold core (3) or the second soluble mold core (11) adjacent to the polymer material layer (18); or by applying positive pressure and negative pressure at the same time. Preferably, the positive pressure is +20 to +600 kPa, and the negative pressure is -10 to -101.3 kPa, but not limited thereto. It should be noted that the negative pressure can be used to extract the volatile solvent (19) that escapes from the polymer material layer (18) due to heat, so as to avoid the solvent remaining in the polymer material layer (18) and causing structural defects in the first transfer structure (9) or the second transfer structure (17). More preferably, the transfer element (37) includes a heating element (38) that provides a high temperature and a blowing element (39) that provides pressure, but not limited thereto. More preferably, when the material of the first tape (7) is a thermally decomposable foam, the first tape (7) can be decomposed and cracked at the first high temperature by making the decomposition temperature of the first tape (7) (preferably 80 to 150°C) lower than the first high temperature. More preferably, the first tape (7), the second tape (15), the first adhesive layer (5), and the second adhesive layer (13) are made of the same thermally decomposable foam, so they are all affected by the first high temperature and decomposed, and can be easily separated from the adherend or the adherend.

更佳者,可利用轉印元件(37)施予第二高溫至第一可溶解性模仁(3)、或該第二可溶解性模仁(11),其中:第二高溫大於第一高溫,以使高分子材料層(18)固化。具體而言,第二高溫能使高分子材料層(18)的溫度達到其固化溫度進而使其材料交聯固化。如此一來,可降低高分子材料層(18)的彈性以讓高分子材料層(18)的第一轉印結構(9)完整地對應第一凹凸結構(4);或第二轉印結構(17)完整地對應第二凹凸結構(12)。較佳地,第二高溫溫度為120至180℃,但不以此為限。此步驟特別於高分子材料層(18)的材料為熱固性樹脂(如:環氧樹脂(epoxy resin))下進行。詳言之,此步驟可確保置於低於第二高溫的溫度環境下時高分子材料層(18)不會變形。更佳者,第二高溫可由轉印元件(37)的升溫元件(38)提供。 More preferably, a transfer element (37) can be used to apply a second high temperature to the first soluble mold (3) or the second soluble mold (11), wherein: the second high temperature is greater than the first high temperature, so as to solidify the polymer material layer (18). Specifically, the second high temperature can make the temperature of the polymer material layer (18) reach its solidification temperature so as to crosslink and solidify the material. In this way, the elasticity of the polymer material layer (18) can be reduced so that the first transfer structure (9) of the polymer material layer (18) completely corresponds to the first concave-convex structure (4); or the second transfer structure (17) completely corresponds to the second concave-convex structure (12). Preferably, the second high temperature is 120 to 180°C, but is not limited thereto. This step is particularly performed when the material of the polymer material layer (18) is a thermosetting resin (such as epoxy resin). In detail, this step can ensure that the polymer material layer (18) will not deform when placed in a temperature environment lower than the second highest temperature. Preferably, the second highest temperature can be provided by the heating element (38) of the transfer element (37).

以下圖12用以說明本發明之剝離步驟(S8):「將該第一黏著層(5)與該第一可溶解性模仁(3)分離;以及將該第二黏著層(13)與該第二可溶解性模仁(11)分離。」,具體而言,本步驟係於該壓印步驟(S6)後、以及該溶解步驟(S7)前進行。較佳者,於本步驟中,該第一黏著層(5)、與該第二黏著層(13)係為熱解離膠帶,當其受第一高溫烘烤時,會使該第一黏著層(5)解離,而可輕易地自第一可溶解性模仁(3)之表面剝離;以及使該第二黏著層(13)解離,而可輕易地自該第二可溶解性模仁(11)之表面剝離。 The following FIG. 12 is used to illustrate the peeling step (S8) of the present invention: "Separating the first adhesive layer (5) from the first soluble mold core (3); and separating the second adhesive layer (13) from the second soluble mold core (11)." Specifically, this step is performed after the embossing step (S6) and before the dissolving step (S7). Preferably, in this step, the first adhesive layer (5) and the second adhesive layer (13) are thermally releasable tapes. When they are subjected to the first high-temperature baking, the first adhesive layer (5) is released and can be easily peeled off from the surface of the first soluble mold core (3); and the second adhesive layer (13) is released and can be easily peeled off from the surface of the second soluble mold core (11).

以下圖13A至13C用以說明本發明之溶解步驟(S7):「以一溶劑(19)溶解該第一可溶解性模仁(3)、與該第二可從解性模仁,以取得一具第一轉印結構(9)、與第二轉印結構(17)的轉印物件(20)。」 The following Figures 13A to 13C are used to illustrate the dissolution step (S7) of the present invention: "Use a solvent (19) to dissolve the first soluble mold (3) and the second soluble mold to obtain a transfer object (20) having a first transfer structure (9) and a second transfer structure (17)."

如圖13A至13C所示,可利用一溶解元件提供一溶劑(19)溶解該第一可溶解性模仁(3)與該第二可溶解性模仁(11),使該固化後之高分子材料層(18)與該第一支撐背板(8)、以及該第二支撐背板(16)分離,以取得一具有第一轉印結構(9)、以及第二轉印結構(17)的轉印物件(20)。較佳者,可利用一溶解元件提供一溶劑(19)溶解該第一可溶解性模仁(3)與該第二可溶解性模仁(11),使該固化後之高分子材料層(18)與該第一黏著層(5)、以及該第二黏著層(13)分離,以取得一具有第一轉印結構(9)、以及第二轉印結構(17)的轉印物件(20)。 As shown in Figures 13A to 13C, a dissolving element can be used to provide a solvent (19) to dissolve the first soluble mold (3) and the second soluble mold (11), so that the cured polymer material layer (18) is separated from the first supporting back plate (8) and the second supporting back plate (16) to obtain a transfer object (20) having a first transfer structure (9) and a second transfer structure (17). Preferably, a dissolving element can be used to provide a solvent (19) to dissolve the first soluble mold (3) and the second soluble mold (11), so that the cured polymer material layer (18) is separated from the first adhesive layer (5) and the second adhesive layer (13) to obtain a transfer object (20) having a first transfer structure (9) and a second transfer structure (17).

須說明的是,所使用之溶劑(19)種類可依該第一可溶解性模仁(3)、與該第二可溶解性模仁(11)的材料而定。較佳地,於該第一可溶解性模仁(3)、與該第二可溶解性模仁(11)之材料為水溶性聚丙烯醯胺(Polyacrylamide;PAM)、聚氨酯、聚脲、聚醯胺、聚酯、聚胺甲酸酯、聚乙烯基吡咯烷酮、乙烯-乙烯醇、聚丙烯醯胺-乙二醛聚合物、或聚丙烯酸之情況下,所使用之該溶劑(19)為水,但不以此為限。 It should be noted that the type of solvent (19) used may depend on the materials of the first soluble mold (3) and the second soluble mold (11). Preferably, when the materials of the first soluble mold (3) and the second soluble mold (11) are water-soluble polyacrylamide (PAM), polyurethane, polyurea, polyamide, polyester, polyurethane, polyvinyl pyrrolidone, ethylene-vinyl alcohol, polyacrylamide-glyoxal polymer, or polyacrylic acid, the solvent (19) used is water, but is not limited thereto.

更佳者,可於機台平台(30)上以該溶劑(19)溶解該第一可溶解性模仁(3)、與該第二可溶解性模仁(11)。較佳地,可於該溶解步驟(S7)前,將該第一架體結構(6)相對於該第一支撐背板(8)分離;以及將該第二架體結構(14)相對於該第二支撐背板(16)分離。較佳地,可於該溶解步驟(S7)前,將該第一膠帶(7)相對於該第一支撐背板(8)分離;以及將該第二膠帶(15)相對於該第二支撐背板(16)分離。較佳地,可於該溶解步驟(S7)前,將該第一支撐背板(8)相對於該第一黏著層(5)分離;以及將該第二支撐背板(16)相對於該第二黏著層(13)分離。較佳地,可於該溶解步驟(S7)前,將該第一膠帶(7)相對於該第一黏著層(5)分離;以及將該第二膠帶(15)相對於該第二黏著層(13)分離。較佳地,以該溶劑(19)溶解該第一可 溶解性模仁(3)、與該第二可溶解性模仁(11)時,可於機台平台(30)進行,但亦可於機台平台(30)以外的區域進行。具體而言,可將基材層(29)以及設置於該基材層(29)上之固化後之高分子材料層(18)、第一可溶解性模仁(3)、第二可溶解性模仁(11)、第一支撐背板(8)、與第二支撐背板(16)一同放入一盛裝有溶劑(19)之容器中,以溶劑溶解該第一可溶解性模仁(3)、與該第二可溶解性模仁(11),使固化後之高分子材料層(18)與第一支撐背板(8)、與第二支撐背板(16)分離,以取得一具該第一轉印結構(9)、與第二轉印結構(17)的轉印物件(20)。 More preferably, the first soluble mold core (3) and the second soluble mold core (11) can be dissolved by the solvent (19) on the machine platform (30). Preferably, before the dissolving step (S7), the first frame structure (6) can be separated from the first supporting back plate (8); and the second frame structure (14) can be separated from the second supporting back plate (16). Preferably, before the dissolving step (S7), the first adhesive tape (7) can be separated from the first supporting back plate (8); and the second adhesive tape (15) can be separated from the second supporting back plate (16). Preferably, before the dissolving step (S7), the first supporting back plate (8) can be separated from the first adhesive layer (5); and the second supporting back plate (16) can be separated from the second adhesive layer (13). Preferably, before the dissolving step (S7), the first adhesive tape (7) can be separated from the first adhesive layer (5); and the second adhesive tape (15) can be separated from the second adhesive layer (13). Preferably, when the first soluble mold core (3) and the second soluble mold core (11) are dissolved by the solvent (19), it can be carried out on the machine platform (30), but it can also be carried out in an area outside the machine platform (30). Specifically, the substrate layer (29) and the cured polymer material layer (18) disposed on the substrate layer (29), the first soluble mold (3), the second soluble mold (11), the first supporting back plate (8), and the second supporting back plate (16) are placed together in a container containing a solvent (19), and the first soluble mold (3) and the second soluble mold (11) are dissolved by the solvent to separate the cured polymer material layer (18) from the first supporting back plate (8) and the second supporting back plate (16), so as to obtain a transfer object (20) having the first transfer structure (9) and the second transfer structure (17).

更佳者,如圖14A至14D所示,為本發明一系列之壓印流程,具體而言,係以接續之方式連續將可溶解性模仁壓入高分子材料層(18)中,直到高分子材料層(18)上可用之空間被壓印完畢為止。其中可以理解地,可溶解性模仁可依照數字進行編排,並依照數字之大小來決定壓印之順序,但不以此為限。較佳者,當把高分子材料層(18)上之可用空間壓印完畢後,再進行溶解步驟(S7)即可獲得大規模之轉印物件(20)。 More preferably, as shown in Figures 14A to 14D, a series of embossing processes of the present invention are described. Specifically, the soluble mold is continuously pressed into the polymer material layer (18) in a continuous manner until the available space on the polymer material layer (18) is completely embossed. It can be understood that the soluble mold can be arranged according to numbers, and the order of embossing is determined according to the size of the numbers, but it is not limited to this. Preferably, after the available space on the polymer material layer (18) is embossed, a dissolution step (S7) is performed to obtain a large-scale transfer object (20).

更佳者,綜上所述,本發明可精準、穩定、持續地以模仁對高分子材料進行壓印,以高效取得大規模範圍之轉印物件(20),並且,最終所獲得之轉印物件(20)同時兼具高良率與高品質,於實際應用面上可實現較高之穩定性、耐久性、與安全性。具體而言,於本發明中:第一支撐背板(8)係藉由第一黏著層(5)與第一可溶解性模仁(3)黏接,因此,於第一可溶解性模仁(3)與第一樣模(2)分離時;第一可溶解性模仁(3)與高分子材料層(18)接觸或對位時;施予第一高溫或壓力於第一可溶解性模仁(3)時;使第一架體結構(6)相對於第一支撐背板(8)分離時;第一架體結構(6)以及設置於第一架體結構(6)之第一膠帶(7)相對於第一支撐背板(8)分離時;以及溶解第一可溶解性模仁(3)時,第一支撐背板(8)皆可維持第 一可溶解性模仁(3)之結構,使第一可溶解性模仁(3)不產生偏移或形變,因此可使最終壓印出的轉印物件(20)不產生缺陷。此外,由於在進行溶解步驟(S7)前,第二支撐背板(16)係藉由第二黏著層(13)與第二可溶解性模仁(11)黏接,因此,於第二可溶解性模仁(11)與第二樣模(10)分離時;第二可溶解性模仁(11)與高分子材料層(18)接觸或對位時;施予第一高溫或壓力於第二可溶解性模仁(11)時;使第二架體結構(14)相對於第二支撐背板(16)分離時;第二架體結構(14)以及設置於第二架體結構(14)之第二膠帶(15)相對於第二支撐背板(16)分離時;以及溶解第二可溶解性模仁(11)時,第二支撐背板(16)皆可維持第二可溶解性模仁(11)之結構,使第二可溶解性模仁(11)不產生偏移或形變,因此可使最終壓印出的轉印物件(20)不產生缺陷。 More preferably, in summary, the present invention can accurately, stably and continuously emboss the polymer material with the mold, so as to efficiently obtain a large-scale range of transfer objects (20), and the transfer objects (20) finally obtained have both high yield and high quality, and can achieve higher stability, durability and safety in practical applications. Specifically, in the present invention, the first supporting back plate (8) is bonded to the first soluble mold core (3) by means of the first adhesive layer (5). Therefore, when the first soluble mold core (3) is separated from the first sample mold (2), when the first soluble mold core (3) is in contact with or aligned with the polymer material layer (18), when the first high temperature or pressure is applied to the first soluble mold core (3), the first frame structure (6) is relatively close to the first supporting back plate. When the first frame structure (6) and the first adhesive tape (7) disposed on the first frame structure (6) are separated from the first supporting back plate (8); and when the first soluble mold core (3) is dissolved, the first supporting back plate (8) can maintain the structure of the first soluble mold core (3) so that the first soluble mold core (3) does not deviate or deform, thereby preventing the final embossed transfer object (20) from having defects. In addition, since the second supporting back plate (16) is bonded to the second soluble mold core (11) by the second adhesive layer (13) before the dissolving step (S7) is performed, when the second soluble mold core (11) and the second sample mold (10) are separated; when the second soluble mold core (11) and the polymer material layer (18) are in contact or aligned; when the first high temperature or pressure is applied to the second soluble mold core (11); when the second frame structure (14) is relatively close to the second supporting back plate (16), the second supporting back plate (16) is bonded to the second soluble mold core (11) by the second adhesive layer (13). When the supporting back plate (16) is separated; when the second frame structure (14) and the second adhesive tape (15) disposed on the second frame structure (14) are separated relative to the second supporting back plate (16); and when the second soluble mold (11) is dissolved, the second supporting back plate (16) can maintain the structure of the second soluble mold (11) so that the second soluble mold (11) does not deviate or deform, thereby preventing the final printed transfer object (20) from having defects.

惟以上所述者,僅為本發明之較佳實施例而已,當不能以此限定本發明實施之範圍,即大凡依本發明申請專利範圍及發明說明內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。另外本發明的任一實施例或申請專利範圍不須達成本發明所揭露之全部目的或優點或特點。此外,摘要部分和標題僅是用來輔助專利文件搜尋之用,並非用來限制本發明之權利範圍。另外,說明書中提及的第一、第二等用語,僅用以表示元件的名稱,並非用來限制組件數量上的上限或下限。 However, the above is only the preferred embodiment of the present invention, and it cannot be used to limit the scope of the implementation of the present invention. That is, all simple equivalent changes and modifications made according to the scope of the patent application and the content of the invention description are still within the scope of the present invention. In addition, any embodiment or patent application scope of the present invention does not need to achieve all the purposes, advantages or features disclosed by the present invention. In addition, the abstract and title are only used to assist in searching patent documents, and are not used to limit the scope of the rights of the present invention. In addition, the first, second, etc. mentioned in the specification are only used to indicate the name of the component, and are not used to limit the upper or lower limit of the number of components.

S1:添加步驟 S1: Add step

S2:形成步驟 S2: Formation step

S3:取模步驟 S3: Moulding step

S4:分離步驟 S4: Separation step

S5:接觸步驟 S5: Contact step

S6:壓印步驟 S6: Imprinting step

S7:溶解步驟 S7: Dissolution step

Claims (10)

一種大規模壓印之方法,係包括:一添加步驟,係添加一可溶解性材料於一第一樣模以及一第二樣模內,並固化該可溶解性材料,以於該第一樣模中形成一第一可溶解性模仁,其中該第一可溶解性模仁具有一第一凹凸結構;以及於該第二樣模中形成一第二可溶解性模仁,其中該第二可溶解性模仁具有一第二凹凸結構;一形成步驟,於該第一可溶解性模仁相對於該第一樣模之一側形成一第一黏著層;以及於該第二可溶解性模仁相對於該第二樣模之一側形成一第二黏著層;一取模步驟,係包含:附著一第一取模裝置於該第一黏著層相對於該第一樣模之一側,其中該第一取模裝置包含:一第一架體結構;一第一膠帶,其係設置於該第一架體結構;以及一第一支撐背板,其係設置於該第一膠帶,其中該第一取模裝置係以該第一支撐背板與該第一黏著層接觸;以及附著一第二取模裝置於該第二黏著層相對於該第二樣模之一側,其中該第二取模裝置包含:一第二架體結構;一第二膠帶,其係設置於該第二架體結構;以及一第二支撐背板,其係設置於該第二膠帶,其中該第二取模裝置係以該第二支撐背板與該第二黏著層接觸;一分離步驟,係包含:將該第一取模裝置相對於該第一樣模分離,其中該第一可溶解性模仁係隨著該第一取模裝置相對於該第一樣模分離;以及 將該第二取模裝置相對於該第二樣模分離,其中該第二可溶解性模仁係隨著該第二取模裝置相對於該第二樣模分離;一接觸步驟,係包含:將該第一可溶解性模仁與該第二可溶解性模仁相互間隔地與一高分子材料層接觸;一壓印步驟,係包含:施予一第一高溫至該高分子材料層;以及施予一壓力至該第一可溶解性模仁、與該第二可溶解性模仁,使該高分子材料層具有一對應該第一凹凸結構的第一轉印結構;以及一對應該第二凹凸結構的第二轉印結構;以及將該第一支撐背板與該第一膠帶分離;以及將該第二支撐背板與該第二膠帶分離,並施予一第二高溫至該高分子材料層,使該高分子材料層固化,其中該第一高溫與該第二高溫不同;以及一溶解步驟,係提供一溶劑溶解該第一可溶解性模仁、與該第二可溶解性模仁,使該固化後之高分子材料層與該第一支撐背板分離、以及該第二支撐背板分離,以取得一轉印物件。 A method for large-scale stamping includes: an adding step, adding a soluble material into a first sample mold and a second sample mold, and curing the soluble material to form a first soluble mold core in the first sample mold, wherein the first soluble mold core has a first concave-convex structure; and forming a second soluble mold core in the second sample mold, wherein the second soluble mold core has a second concave-convex structure; a forming step, forming a first adhesive layer on one side of the first soluble mold core relative to the first sample mold; and forming a second adhesive layer on one side of the second soluble mold core relative to the second sample mold; a mold removal step, including: attaching A first molding device is disposed on a side of the first adhesive layer opposite to the first sample mold, wherein the first molding device comprises: a first frame structure; a first tape, which is disposed on the first frame structure; and a first supporting back plate, which is disposed on the first tape, wherein the first molding device is in contact with the first adhesive layer with the first supporting back plate; and a second molding device is attached to a side of the second adhesive layer opposite to the second sample mold, wherein the second molding device comprises: a second frame structure; a second tape, which is disposed on the second frame structure; and a second supporting back plate, which is disposed on the second tape, wherein the second molding device is in contact with the first adhesive layer with the second supporting back plate. The back plate is in contact with the second adhesive layer; a separation step, comprising: separating the first mold taking device from the first sample mold, wherein the first soluble mold core is separated from the first sample mold along with the first mold taking device; and separating the second mold taking device from the second sample mold, wherein the second soluble mold core is separated from the second sample mold along with the second mold taking device; a contact step, comprising: contacting the first soluble mold core and the second soluble mold core with a polymer material layer at intervals; an embossing step, comprising: applying a first high temperature to the polymer material layer; and applying a pressure to the first soluble mold core and the second soluble mold core. Two soluble molds are provided to make the polymer material layer have a first transfer structure corresponding to the first concavo-convex structure; and a second transfer structure corresponding to the second concavo-convex structure; and the first supporting back plate is separated from the first adhesive tape; and the second supporting back plate is separated from the second adhesive tape, and a second high temperature is applied to the polymer material layer to solidify the polymer material layer, wherein the first high temperature is different from the second high temperature; and a dissolving step is provided to dissolve the first soluble mold and the second soluble mold, so that the solidified polymer material layer is separated from the first supporting back plate and the second supporting back plate to obtain a transfer object. 一種大規模壓印之方法,係包括:一添加步驟,係添加一可溶解性材料於一第一樣模以及一第二樣模內,並固化該可溶解性材料,以於該第一樣模中形成一第一可溶解性模仁,其中該第一可溶解性模仁具有一第一凹凸結構;以及於該第二樣模中形成一第二可溶解性模仁,其中該第二可溶解性模仁具有一第二凹凸結構;一形成步驟,於該第一可溶解性模仁相對於該第一樣模之一側形成一第一黏著層;以及於該第二可溶解性模仁相對於該第二樣模之一側形成一第二黏著層; 一取模步驟,係包含:附著一第一取模裝置於該第一黏著層相對於該第一樣模之一側,其中該第一取模裝置包含:一第一架體結構;一第一膠帶,其係設置於該第一架體結構;以及一第一支撐背板,其係設置於該第一膠帶,其中該第一取模裝置係以該第一支撐背板與該第一黏著層接觸;以及附著一第二取模裝置於該第二黏著層相對於該第二樣模之一側,其中該第二取模裝置包含:一第二架體結構;一第二膠帶,其係設置於該第二架體結構;以及一第二支撐背板,其係設置於該第二膠帶,其中該第二取模裝置係以該第二支撐背板與該第二黏著層接觸;一分離步驟,係包含:將該第一取模裝置相對於該第一樣模分離,其中該第一可溶解性模仁係隨著該第一取模裝置相對於該第一樣模分離;以及將該第二取模裝置相對於該第二樣模分離,其中該第二可溶解性模仁係隨著該第二取模裝置相對於該第二樣模分離;一接觸步驟,係包含:將該第一可溶解性模仁與該第二可溶解性模仁相互間隔地與一高分子材料層接觸;一壓印步驟,係包含:施予一第一高溫至該高分子材料層;以及施予一壓力至該第一可溶解性模仁、與該第二可溶解性模仁,使該高分子材料層具有一對應該第一凹凸結構的第一轉印結構;以及一對應該第二凹凸結構的第二轉印結構;以及將該第一支撐背板與該第一黏著層分離;以及將該第二支撐背板與該第二黏著層分離,並施予一第二高溫至該高分子材料層,使該高分子材料層固 化,其中該第一高溫與該第二高溫不同;以及一溶解步驟,係提供一溶劑溶解該第一可溶解性模仁、與該第二可溶解性模仁,使該固化後之高分子材料層與該第一黏著層、以及該第二黏著層分離,以取得一轉印物件。 A method for large-scale stamping includes: an adding step, adding a soluble material into a first sample mold and a second sample mold, and curing the soluble material to form a first soluble mold core in the first sample mold, wherein the first soluble mold core has a first concave-convex structure; and forming a second soluble mold core in the second sample mold, wherein the second soluble mold core has a second concave-convex structure; a forming step, forming a first adhesive layer on one side of the first soluble mold core relative to the first sample mold; and forming a second adhesive layer on one side of the second soluble mold core relative to the second sample mold; A mold removal step, including: A first molding device is attached to a side of the first adhesive layer opposite to the first sample mold, wherein the first molding device includes: a first frame structure; a first tape, which is arranged on the first frame structure; and a first supporting back plate, which is arranged on the first tape, wherein the first molding device is in contact with the first adhesive layer with the first supporting back plate; and a second molding device is attached to a side of the second adhesive layer opposite to the second sample mold, wherein the second molding device includes: a second frame structure; a second tape, which is arranged on the second frame structure; and a second supporting back plate, which is arranged on the second tape, wherein the second molding device is in contact with the second adhesive layer with the second supporting back plate. The supporting back plate is in contact with the second adhesive layer; a separation step includes: separating the first mold device relative to the first sample mold, wherein the first soluble mold core is separated from the first sample mold along with the first mold device; and separating the second mold device relative to the second sample mold, wherein the second soluble mold core is separated from the second sample mold along with the second mold device; a contact step includes: contacting the first soluble mold core and the second soluble mold core with a polymer material layer at intervals; an embossing step includes: applying a first high temperature to the polymer material layer; and applying a pressure to the first soluble mold core and the polymer material layer. The second soluble mold core is provided to make the polymer material layer have a first transfer structure corresponding to the first concavo-convex structure; and a second transfer structure corresponding to the second concavo-convex structure; and the first supporting back plate is separated from the first adhesive layer; and the second supporting back plate is separated from the second adhesive layer, and a second high temperature is applied to the polymer material layer to solidify the polymer material layer, wherein the first high temperature is different from the second high temperature; and a dissolving step is provided to dissolve the first soluble mold core and the second soluble mold core, so that the solidified polymer material layer is separated from the first adhesive layer and the second adhesive layer to obtain a transfer object. 一種大規模壓印之方法,係包括:一添加步驟,係添加一可溶解性材料於一第一樣模以及一第二樣模內,並固化該可溶解性材料,以於該第一樣模中形成一第一可溶解性模仁,其中該第一可溶解性模仁具有一第一凹凸結構;以及於該第二樣模中形成一第二可溶解性模仁,其中該第二可溶解性模仁具有一第二凹凸結構;一形成步驟,於該第一可溶解性模仁相對於該第一樣模之一側形成一第一黏著層;以及於該第二可溶解性模仁相對於該第二樣模之一側形成一第二黏著層;一取模步驟,係包含:附著一第一取模裝置於該第一黏著層相對於該第一樣模之一側,其中該第一取模裝置包含:一第一架體結構;一第一膠帶,其係設置於該第一架體結構;以及一第一支撐背板,其係設置於該第一膠帶,其中該第一取模裝置係以該第一膠帶相對於該第一支撐背板之一側與該第一黏著層接觸;以及附著一第二取模裝置於該第二黏著層相對於該第二樣模之一側,其中該第二取模裝置包含:一第二架體結構;一第二膠帶,其係設置於該第二架體結構;以及一第二支撐背板,其係設置於該第二膠帶,其中該第二取模裝置係以該第二膠帶相對於該第二支撐背板之一側與該第二黏著層接觸;一分離步驟,係包含: 將該第一取模裝置相對於該第一樣模分離,其中該第一可溶解性模仁係隨著該第一取模裝置相對於該第一樣模分離;以及將該第二取模裝置相對於該第二樣模分離,其中該第二可溶解性模仁係隨著該第二取模裝置相對於該第二樣模分離;一接觸步驟,係包含:將該第一可溶解性模仁與該第二可溶解性模仁相互間隔地與一高分子材料層接觸;一壓印步驟,係包含:施予一第一高溫至該高分子材料層;以及施予一壓力至該第一可溶解性模仁、與該第二可溶解性模仁,使該高分子材料層具有一對應該第一凹凸結構的第一轉印結構;以及一對應該第二凹凸結構的第二轉印結構;以及將該第一膠帶與該第一黏著層分離;以及將該第二膠帶與該第二黏著層分離,並施予一第二高溫至該高分子材料層,使該高分子材料層固化,其中該第一高溫與該第二高溫不同;以及一溶解步驟,係提供一溶劑溶解該第一可溶解性模仁、與該第二可溶解性模仁,使該固化後之高分子材料層與該第一黏著層、以及該第二黏著層分離,以取得一轉印物件。 A method for large-scale stamping includes: an adding step, adding a soluble material into a first sample mold and a second sample mold, and curing the soluble material to form a first soluble mold core in the first sample mold, wherein the first soluble mold core has a first concave-convex structure; and forming a second soluble mold core in the second sample mold, wherein the second soluble mold core has a second concave-convex structure; a forming step, forming a first adhesive layer on one side of the first soluble mold core relative to the first sample mold; and forming a second adhesive layer on one side of the second soluble mold core relative to the second sample mold; a demolding step, including: attaching a first demolding layer to the first sample mold; The mold device is arranged on a side of the first adhesive layer relative to the first sample mold, wherein the first mold device includes: a first frame structure; a first tape, which is arranged on the first frame structure; and a first supporting back plate, which is arranged on the first tape, wherein the first mold device is in contact with the first adhesive layer with a side of the first tape relative to the first supporting back plate; and a second mold device is attached to a side of the second adhesive layer relative to the second sample mold, wherein the second mold device includes: a second frame structure; a second tape, which is arranged on the second frame structure; and a second supporting back plate, which is arranged on the second tape, wherein the second mold device is in contact with the first adhesive layer with a side of the first tape relative to the first supporting back plate. The second adhesive layer is contacted with one side of the second supporting back plate relative to the second adhesive layer; a separation step includes: separating the first mold taking device relative to the first sample mold, wherein the first soluble mold core is separated from the first sample mold along with the first mold taking device; and separating the second mold taking device relative to the second sample mold, wherein the second soluble mold core is separated from the second sample mold along with the second mold taking device; a contact step includes: contacting the first soluble mold core and the second soluble mold core with a polymer material layer at intervals; an embossing step includes: applying a first high temperature to the polymer material layer; and applying a pressure to the first The soluble mold and the second soluble mold are used to make the polymer material layer have a first transfer structure corresponding to the first concave-convex structure; and a second transfer structure corresponding to the second concave-convex structure; and the first tape is separated from the first adhesive layer; and the second tape is separated from the second adhesive layer, and a second high temperature is applied to the polymer material layer to solidify the polymer material layer, wherein the first high temperature is different from the second high temperature; and a dissolving step is provided, which is to provide a solvent to dissolve the first soluble mold and the second soluble mold, so that the solidified polymer material layer is separated from the first adhesive layer and the second adhesive layer to obtain a transfer object. 如請求項3所述之方法,其中更包含:一剝離步驟,係於該壓印步驟後、與該溶解步驟前,將該第一黏著層自該第一可溶解性模仁之表層剝離;以及將該第二黏著層自該第二可溶解性模仁之表層剝離。 The method as described in claim 3 further comprises: a peeling step, which is to peel the first adhesive layer from the surface of the first soluble mold after the embossing step and before the dissolving step; and peel the second adhesive layer from the surface of the second soluble mold. 一種大規模壓印之方法,係包括:一添加步驟,係添加一可溶解性材料於一第一樣模以及一第二樣模內,並固化該可溶解性材料,以於該第一樣模中形成一第一可溶解性模仁,其中該第一可 溶解性模仁具有一第一凹凸結構;以及於該第二樣模中形成一第二可溶解性模仁,其中該第二可溶解性模仁具有一第二凹凸結構;一形成步驟,於該第一可溶解性模仁相對於該第一樣模之一側形成一第一黏著層;以及於該第二可溶解性模仁相對於該第二樣模之一側形成一第二黏著層;一取模步驟,係包含:附著一第一取模裝置於該第一黏著層相對於該第一樣模之一側,其中該第一取模裝置包含:一第一架體結構;一第一膠帶,其係設置於該第一架體結構;以及一第一支撐背板,其係設置於該第一膠帶,其中該第一取模裝置係以該第一支撐背板與該第一黏著層接觸;以及附著一第二取模裝置於該第二黏著層相對於該第二樣模之一側,其中該第二取模裝置包含:一第二架體結構;一第二膠帶,其係設置於該第二架體結構;以及一第二支撐背板,其係設置於該第二膠帶,其中該第二取模裝置係以該第二支撐背板與該第二黏著層接觸;一分離步驟,係包含:將該第一取模裝置相對於該第一樣模分離,其中該第一可溶解性模仁係隨著該第一取模裝置相對於該第一樣模分離;以及將該第二取模裝置相對於該第二樣模分離,其中該第二可溶解性模仁係隨著該第二取模裝置相對於該第二樣模分離;一接觸步驟,係包含:將該第一可溶解性模仁與該第二可溶解性模仁相互間隔地與一高分子材料層接觸;一壓印步驟,係包含: 施予一壓力至該第一可溶解性模仁,使該高分子材料層具有一對應該第一凹凸結構的第一轉印結構;以及該第二可溶解性模仁,使該高分子材料層具有一對應該第二凹凸結構的第二轉印結構;以及以一UV光照射該高分子材料層,使該高分子材料層固化,並使該第一支撐背板與該第一膠帶分離;以及使該第二支撐背板與該第二膠帶分離;以及一溶解步驟,係提供一溶劑溶解該第一可溶解性模仁、與該第二可溶解性模仁,使該固化後之高分子材料層與該第一支撐背板分離、以及該第二支撐背板分離,以取得一轉印物件。 A method for large-scale stamping includes: an adding step, adding a soluble material into a first sample mold and a second sample mold, and curing the soluble material to form a first soluble mold core in the first sample mold, wherein the first soluble mold core has a first concave-convex structure; and forming a second soluble mold core in the second sample mold, wherein the second soluble mold core has a second concave-convex structure; a forming step, forming a first adhesive layer on a side of the first soluble mold core relative to the first sample mold; and forming a second adhesive layer on a side of the second soluble mold core relative to the second sample mold; a demolding step The method comprises: attaching a first molding device to a side of the first adhesive layer opposite to the first sample mold, wherein the first molding device comprises: a first frame structure; a first adhesive tape, which is arranged on the first frame structure; and a first supporting back plate, which is arranged on the first adhesive tape, wherein the first molding device is in contact with the first adhesive layer with the first supporting back plate; and attaching a second molding device to a side of the second adhesive layer opposite to the second sample mold, wherein the second molding device comprises: a second frame structure; a second adhesive tape, which is arranged on the second frame structure; and a second supporting back plate, which is arranged on the second adhesive tape, wherein The second mold taking device is in contact with the second adhesive layer with the second supporting back plate; a separation step includes: separating the first mold taking device from the first sample mold, wherein the first soluble mold core is separated from the first sample mold along with the first mold taking device; and separating the second mold taking device from the second sample mold, wherein the second soluble mold core is separated from the second sample mold along with the second mold taking device; a contact step includes: contacting the first soluble mold core and the second soluble mold core with a polymer material layer at intervals; an embossing step includes: applying a pressure to the first soluble mold core to make The polymer material layer has a first transfer structure corresponding to the first concavo-convex structure; and the second soluble mold core makes the polymer material layer have a second transfer structure corresponding to the second concavo-convex structure; and the polymer material layer is irradiated with a UV light to solidify the polymer material layer, and the first supporting back plate is separated from the first adhesive tape; and the second supporting back plate is separated from the second adhesive tape; and a dissolving step is provided, which is to provide a solvent to dissolve the first soluble mold core and the second soluble mold core, so that the cured polymer material layer is separated from the first supporting back plate and the second supporting back plate to obtain a transfer object. 如請求項1至4中任一項所述之方法,其中該高分子材料層係形成於一基材層上,並且該接觸步驟係包含:首先:係將該第一可溶解性模仁加熱至一溫度T,其中0<T<Tg,並使該第一可溶解性模仁與該高分子材料層接觸;再來:將該第二可溶解性模仁加熱至該溫度T,並使該第二可溶解性模仁與該高分子材料層接觸;該接觸步驟或包含:首先:係將該基材層加熱至一溫度T,其中0<T<Tg,並使該第一可溶解性模仁與該高分子材料層接觸;再來:將該第二可溶解性模仁與該高分子材料層接觸;以及該接觸步驟或包含:首先:係將該基材層與該第一可溶解性模仁相對應之部分加熱至一溫度T,其中0<T<Tg,並使該第一可溶解性模仁與該高分子材料層接觸;再來:將該基材層與該第二可溶解性模仁相對應之部分加熱至該溫度T,並使該第二可溶解性模仁與該高分子材料層接觸。 The method as described in any one of claims 1 to 4, wherein the polymer material layer is formed on a substrate layer, and the contacting step comprises: firstly, heating the first soluble mold core to a temperature T, wherein 0<T<T g , and bringing the first soluble mold core into contact with the polymer material layer; and then, heating the second soluble mold core to the temperature T, and bringing the second soluble mold core into contact with the polymer material layer; the contacting step may comprise: firstly, heating the substrate layer to a temperature T, wherein 0<T<T g , and the first soluble mold core is in contact with the polymer material layer; next: the second soluble mold core is in contact with the polymer material layer; and the contacting step may include: first: the portion of the substrate layer corresponding to the first soluble mold core is heated to a temperature T, wherein 0<T<T g , and the first soluble mold core is in contact with the polymer material layer; next: the portion of the substrate layer corresponding to the second soluble mold core is heated to the temperature T, and the second soluble mold core is in contact with the polymer material layer. 如請求項1所述之方法,其中該高分子材料層係形成於一基材層上,並且該壓印步驟係包含:施予該第一高溫與該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;於形成該第一轉印結構後,施予該第一高溫與該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;於形成該第二轉印結構後,將該第一支撐背板與該第一膠帶分離;以及將該第二支撐背板與該第二膠帶分離;以及施予該第二高溫至該第一可溶解性模仁與該第二可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置、以及該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層固化;該壓印步驟或包含:施予該第一高溫至該基材層;施予該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;於形成完該第一轉印結構後,施予該壓力至將該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;將該第一支撐背板與該第一膠帶分離;以及將該第二支撐背板與該第二膠帶分離;以及施予該第二高溫至該第一可溶解性模仁與該第二可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置、以及該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層固化; 該壓印步驟或包含:施予該第一高溫至該基材層與該第一可溶解性模仁相對應之位置;以及該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;於形成完該第一轉印結構後,施予該第一高溫至該基材層與該第二可溶解性模仁相對應之位置;以及該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;將該第一支撐背板與該第一膠帶分離;以及將該第二支撐背板與該第二膠帶分離;以及施予該第二高溫至該第一可溶解性模仁與該第二可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置、以及該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層固化;該壓印步驟或包含:施予該第一高溫與該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構,並使該第一支撐背板與該第一膠帶分離;以及施予該第二高溫至該第一可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第一可溶解性模仁相對應之部分固化;以及施予該第一高溫與該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構,並使該第二支撐背板與該第二膠帶分離;以及施予該第二高溫至該第二可溶解性模仁;至該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第二可溶解性模仁相對應之部分固化;該壓印步驟或包含:首先:施予該第一高溫至該基材層與該第一可溶解性模仁相對應之部分;以 及該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構,並使該第一支撐背板與該第一膠帶分離;再來:施予該第二高溫至該第一可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第一可溶解性模仁相對應之部分固化;以及首先:施予該第一高溫至該基材層與該第二可溶解性模仁相對應之部分;以及該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構,並使該第二支撐背板與該第二膠帶分離;再來:施予該第二高溫至該第二可溶解性模仁;至該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第二可溶解性模仁相對應之部分固化;以及該壓印步驟或包含:施予該第一高溫至該基材層;施予該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構,並使該第一支撐背板與該第一膠帶分離;以及施予該第二高溫至該第一可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第一可溶解性模仁相對應之部分固化;以及施予該第一高溫至該基材層;施予該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構,並使該第二支撐背板與該第二膠帶分離;以及施予該第二高溫至該第二可溶解性模仁;至該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第二可溶解性模仁相對應之部分固化。 The method as described in claim 1, wherein the polymer material layer is formed on a substrate layer, and the embossing step includes: applying the first high temperature and the pressure to the first soluble mold so that the polymer material layer has the first transfer structure; after forming the first transfer structure, applying the first high temperature and the pressure to the second soluble mold so that the polymer material layer has the second transfer structure; after forming the second transfer structure, separating the first supporting back plate from the first tape; and separating the second supporting back plate from the second tape; and applying the second high temperature to the first soluble mold and the second soluble mold; The substrate layer is placed at a position corresponding to the first soluble mold core, and at a position corresponding to the second soluble mold core; or to the substrate layer, so that the polymer material layer is solidified; the embossing step may include: applying the first high temperature to the substrate layer; applying the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure; after the first transfer structure is formed, applying the pressure to the second soluble mold core, so that the polymer material layer has the second transfer structure; separating the first supporting back plate from the first tape; and separating the second supporting back plate from the second tape; and applying the second high temperature to The first soluble mold core and the second soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core, and the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the polymer material layer is solidified; The embossing step may include: applying the first high temperature to the position of the substrate layer corresponding to the first soluble mold core; and the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure; after the first transfer structure is formed, applying the first high temperature to the position of the substrate layer corresponding to the second soluble mold core; and the pressure to the second soluble mold core. The first support back plate is separated from the first adhesive tape; and the second support back plate is separated from the second adhesive tape; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core, and the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the polymer material layer is cured; the embossing step may include: applying the first high temperature and the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure, and the first support back plate is separated from the first ... and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; The second high temperature is applied to the first soluble mold core, to the position of the substrate layer corresponding to the first soluble mold core, or to the substrate layer, so that the portion of the polymer material layer corresponding to the first soluble mold core is solidified; and the first high temperature and the pressure are applied to the second soluble mold core, so that the polymer material layer has the second transfer structure, and the second supporting back plate is separated from the second adhesive tape; and the second high temperature is applied to the second soluble mold core, to the position of the substrate layer corresponding to the second soluble mold core, or to the substrate layer, so that the portion of the polymer material layer corresponding to the second soluble mold core is solidified. Partially solidified; the embossing step may include: first: applying the first high temperature to the portion of the substrate layer corresponding to the first soluble mold core; and the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure and the first supporting back plate is separated from the first tape; then: applying the second high temperature to the first soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the first soluble mold core is solidified; and first: applying the first high temperature to the portion of the substrate layer corresponding to the second soluble mold core; and The pressure is applied to the second soluble mold core, so that the polymer material layer has the second transfer structure, and the second supporting back plate is separated from the second tape; then: the second high temperature is applied to the second soluble mold core; to the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the second soluble mold core is solidified; and the embossing step may include: applying the first high temperature to the substrate layer; applying the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure, and the first supporting back plate is separated from the first tape; and applying the second high temperature to the first soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the first soluble mold core is solidified; and the first high temperature is applied to the substrate layer; the pressure is applied to the second soluble mold core, so that the polymer material layer has the second transfer structure, and the second supporting back plate is separated from the second adhesive tape; and the second high temperature is applied to the second soluble mold core; to the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the second soluble mold core is solidified. 如請求項2所述之方法,其中該高分子材料層係形成於一基材層上,並且該壓印步驟係包含: 施予該第一高溫與該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;於形成該第一轉印結構後,施予該第一高溫與該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;於形成該第二轉印結構後,將該第一支撐背板與該第一黏著層分離;以及將該第二支撐背板與該第二黏著層分離;以及施予該第二高溫至該第一可溶解性模仁與該第二可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置、以及該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層固化;該壓印步驟或包含:施予該第一高溫至該基材層;施予該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;於形成完該第一轉印結構後,施予該壓力至將該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;將該第一支撐背板與該第一黏著層分離;以及將該第二支撐背板與該第二黏著層分離;以及施予該第二高溫至該第一可溶解性模仁與該第二可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置、以及該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層固化;該壓印步驟或包含:施予該第一高溫至該基材層與該第一可溶解性模仁相對應之位置;以及該 壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;於形成完該第一轉印結構後,施予該第一高溫至該基材層與該第二可溶解性模仁相對應之位置;以及該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;將該第一支撐背板與該第一黏著層分離;以及將該第二支撐背板與該第二黏著層分離;以及施予該第二高溫至該第一可溶解性模仁與該第二可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置、以及該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層固化;該壓印步驟或包含:施予該第一高溫與該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構,並使該第一支撐背板與該第一黏著層分離;以及施予該第二高溫至該第一可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第一可溶解性模仁相對應之部分固化;以及施予該第一高溫與該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構,並使該第二支撐背板與該第二黏著層分離;以及施予該第二高溫至該第二可溶解性模仁;至該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第二可溶解性模仁相對應之部分固化;該壓印步驟或包含:首先:施予該第一高溫至該基材層與該第一可溶解性模仁相對應之部分;以及該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構,並使 該第一支撐背板與該第一黏著層分離;再來:施予該第二高溫至該第一可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第一可溶解性模仁相對應之部分固化;以及首先:施予該第一高溫至該基材層與該第二可溶解性模仁相對應之部分;以及該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構,並使該第二支撐背板與該第二黏著層分離;再來:施予該第二高溫至該第二可溶解性模仁;至該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第二可溶解性模仁相對應之部分固化;以及該壓印步驟或包含:施予該第一高溫至該基材層;施予該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構,並使該第一支撐背板與該第一黏著層分離;以及施予該第二高溫至該第一可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第一可溶解性模仁相對應之部分固化;以及施予該第一高溫至該基材層;施予該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構,並使該第二支撐背板與該第二黏著層分離;以及施予該第二高溫至該第二可溶解性模仁;至該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第二可溶解性模仁相對應之部分固化。 The method as described in claim 2, wherein the polymer material layer is formed on a substrate layer, and the embossing step comprises: applying the first high temperature and the pressure to the first soluble mold so that the polymer material layer has the first transfer structure; after forming the first transfer structure, applying the first high temperature and the pressure to the second soluble mold so that the polymer material layer has the second transfer structure; after forming the second transfer structure, separating the first supporting back plate from the first adhesive layer; and separating the second supporting back plate from the second adhesive layer; and applying the second high temperature to the first soluble mold and the second soluble mold; to the position of the substrate layer corresponding to the first soluble mold core and the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the polymer material layer is cured; the embossing step may include: applying the first high temperature to the substrate layer; applying the pressure to the first soluble mold core so that the polymer material layer has the first transfer structure; after the first transfer structure is formed, applying the pressure to the second soluble mold core so that the polymer material layer has the second transfer structure; separating the first supporting back plate from the first adhesive layer; and separating the second supporting back plate from the second adhesive layer; and applying the second high temperature to the first soluble mold core and the second soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core and the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer to solidify the polymer material layer; the embossing step may include: applying the first high temperature to the position of the substrate layer corresponding to the first soluble mold core; and applying the pressure to the first soluble mold core so that the polymer material layer has the first transfer structure; after the first transfer structure is formed, applying the first high temperature to the position of the substrate layer corresponding to the second soluble mold core; and applying the pressure to the second soluble mold core. The first support back plate is separated from the first adhesive layer; and the second support back plate is separated from the second adhesive layer; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core and the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the polymer material layer is cured; the embossing step may include: applying the first high temperature and the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure, and the first support back plate is separated from the first ... and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the The second high temperature is applied to the first soluble mold core, to the position of the substrate layer corresponding to the first soluble mold core, or to the substrate layer, so that the polymer material layer and the first soluble mold core The corresponding portion is solidified; and the first high temperature and the pressure are applied to the second soluble mold core, so that the polymer material layer has the second transfer structure, and the second supporting back plate is separated from the second adhesive layer; and the second high temperature is applied to the second soluble mold core, to the position of the substrate layer corresponding to the second soluble mold core, or to the substrate layer, so that the polymer material layer and the second soluble mold core The corresponding portion is solidified. The embossing step may include: first: applying the first high temperature to the portion of the substrate layer corresponding to the first soluble mold core; and applying the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure and the first supporting back plate is separated from the first adhesive layer; then: applying the second high temperature to the first soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the first soluble mold core is cured; and first: applying the first high temperature to the portion of the substrate layer corresponding to the second soluble mold core; and The pressure is applied to the second soluble mold core, so that the polymer material layer has the second transfer structure, and the second supporting back plate is separated from the second adhesive layer; then: the second high temperature is applied to the second soluble mold core; to the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the second soluble mold core is solidified; and the embossing step may include: applying the first high temperature to the substrate layer; applying the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure, and the first supporting back plate is separated from the first adhesive layer; and applying the second high temperature Applying the first high temperature to the first soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the first soluble mold core is solidified; and applying the first high temperature to the substrate layer; applying the pressure to the second soluble mold core, so that the polymer material layer has the second transfer structure, and the second supporting back plate is separated from the second adhesive layer; and applying the second high temperature to the second soluble mold core; to the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the second soluble mold core is solidified. 如請求項3、或4所述之方法,其中該高分子材料層係形成於一基材層上,並且該壓印步驟係包含:施予該第一高溫與該壓力至該第一可溶解性模仁,使該高分子材料層具有 該第一轉印結構;於形成該第一轉印結構後,施予該第一高溫與該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;於形成該第二轉印結構後,將該第一膠帶與該第一黏著層分離;以及將該第二膠帶與該第二黏著層分離;以及施予該第二高溫至該第一可溶解性模仁與該第二可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置、以及該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層固化;該壓印步驟或包含:施予該第一高溫至該基材層;施予該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;於形成完該第一轉印結構後,施予該壓力至將該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;將該第一膠帶與該第一黏著層分離;以及將該第二膠帶與該第二黏著層分離;以及施予該第二高溫至該第一可溶解性模仁與該第二可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置、以及該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層固化;該壓印步驟或包含:施予該第一高溫至該基材層與該第一可溶解性模仁相對應之位置;以及該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構; 於形成完該第一轉印結構後,施予該第一高溫至該基材層與該第二可溶解性模仁相對應之位置;以及該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;將該第一膠帶與該第一黏著層分離;以及將該第二膠帶與該第二黏著層分離;以及施予該第二高溫至該第一可溶解性模仁與該第二可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置、以及該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層固化;該壓印步驟或包含:施予該第一高溫與該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構,並使該第一膠帶與該第一黏著層分離;以及施予該第二高溫至該第一可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第一可溶解性模仁相對應之部分固化;以及施予該第一高溫與該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構,並使該第二膠帶與該第二黏著層分離;以及施予該第二高溫至該第二可溶解性模仁;至該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第二可溶解性模仁相對應之部分固化;該壓印步驟或包含:首先:施予該第一高溫至該基材層與該第一可溶解性模仁相對應之部分;以及該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構,並使該第一膠帶與該第一黏著層分離;再來:施予該第二高溫至該第一可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置;或至該基材層,以使該高 分子材料層與該第一可溶解性模仁相對應之部分固化;以及首先:施予該第一高溫至該基材層與該第二可溶解性模仁相對應之部分;以及該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構,並使該第二膠帶與該第二黏著層分離;再來:施予該第二高溫至該第二可溶解性模仁;至該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第二可溶解性模仁相對應之部分固化;以及該壓印步驟或包含:施予該第一高溫至該基材層;施予該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構,並使該第一膠帶與該第一黏著層分離;以及施予該第二高溫至該第一可溶解性模仁;至該基材層與該第一可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第一可溶解性模仁相對應之部分固化;以及施予該第一高溫至該基材層;施予該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構,並使該第二膠帶與該第二黏著層分離;以及施予該第二高溫至該第二可溶解性模仁;至該基材層與該第二可溶解性模仁相對應之位置;或至該基材層,以使該高分子材料層與該第二可溶解性模仁相對應之部分固化。 The method as described in claim 3 or 4, wherein the polymer material layer is formed on a substrate layer, and the embossing step comprises: applying the first high temperature and the pressure to the first soluble mold so that the polymer material layer has the first transfer structure; after forming the first transfer structure, applying the first high temperature and the pressure to the second soluble mold so that the polymer material layer has the second transfer structure; after forming the second transfer structure, separating the first tape from the first adhesive layer; and separating the second tape from the second adhesive layer; and applying the second high temperature to the first soluble mold and the second soluble mold. The embossing step may include: applying the first high temperature to the substrate layer; applying the pressure to the first soluble mold core so that the polymer material layer has the first transfer structure; after the first transfer structure is formed, applying the pressure to the second soluble mold core so that the polymer material layer has the second transfer structure; separating the first tape from the first adhesive layer; and separating the second tape from the second adhesive layer; and applying the second high temperature to the substrate layer; The first soluble mold core and the second soluble mold core are heated to the first high temperature; the substrate layer corresponds to the first soluble mold core, and the substrate layer corresponds to the second soluble mold core; or the substrate layer is heated to the substrate layer to solidify the polymer material layer; the embossing step may include: applying the first high temperature to the substrate layer and the first soluble mold core corresponding position; and applying the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure; after the first transfer structure is formed, applying the first high temperature to the substrate layer and the second soluble mold core corresponding position; and applying the pressure to the second soluble mold core. The first adhesive tape is separated from the first adhesive layer; and the second adhesive tape is separated from the second adhesive layer; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core and the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer to solidify the polymer material layer; the embossing step may include: applying the first high temperature and the pressure to the first soluble mold core so that the polymer material layer has the first transfer structure, and the first ... and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble mold core and the second soluble mold core; and the second high temperature is applied to the first soluble The second high temperature is applied to the first soluble mold core, to the position of the substrate layer corresponding to the first soluble mold core, or to the substrate layer, so that the polymer material layer and the first soluble mold core The corresponding portion is solidified; and the first high temperature and the pressure are applied to the second soluble mold core so that the polymer material layer has the second transfer structure and the second tape is separated from the second adhesive layer; and the second high temperature is applied to the second soluble mold core, to the position of the substrate layer corresponding to the second soluble mold core, or to the substrate layer so that the polymer material layer and the second soluble mold core The corresponding portion is solidified. The embossing step may include: first: applying the first high temperature to the portion of the substrate layer corresponding to the first soluble mold core; and applying the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure and the first tape is separated from the first adhesive layer; then: applying the second high temperature to the first soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the first soluble mold core is cured; and first: applying the first high temperature to the portion of the substrate layer corresponding to the second soluble mold core; and and the pressure to the second soluble mold core, so that the polymer material layer has the second transfer structure, and the second tape is separated from the second adhesive layer; then: applying the second high temperature to the second soluble mold core; to the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the polymer material layer and the second soluble mold core The corresponding portion is solidified; and the embossing step may include: applying the first high temperature to the substrate layer; applying the pressure to the first soluble mold core, so that the polymer material layer has the first transfer structure, and the first tape is separated from the first adhesive layer; and applying the second high temperature to the first soluble mold core; to the position of the substrate layer corresponding to the first soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the first soluble mold core is solidified; and the first high temperature is applied to the substrate layer; the pressure is applied to the second soluble mold core, so that the polymer material layer has the second transfer structure and the second tape is separated from the second adhesive layer; and the second high temperature is applied to the second soluble mold core; to the position of the substrate layer corresponding to the second soluble mold core; or to the substrate layer, so that the portion of the polymer material layer corresponding to the second soluble mold core is solidified. 如請求項5所述之方法,其中該高分子材料層係形成於一基材層上,並且該壓印步驟係包含:首先:施予該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;以該UV光照射該高分子材料層與該第一可溶解性模仁相對應之部分,以使該高分子材料層與該第一可溶解性模仁相對應之部分固化;以及使該第一 支撐背板與該第一膠帶分離;以及再來:施予該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;以該UV光照射該高分子材料層與該第二可溶解性模仁相對應之部分,以使該高分子材料層與該第二可溶解性模仁相對應之部分固化;以及使該第二支撐背板與該第二膠帶分離;該壓印步驟或包含:施予該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;施予該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;以該UV光照射該高分子材料層,使該高分子材料層固化;以及使該第一支撐背板與該第一膠帶分離、與使該第二支撐背板與該第二膠帶分離;以及該壓印步驟或包含:施予該壓力至該第一可溶解性模仁,使該高分子材料層具有該第一轉印結構;施予該壓力至該第二可溶解性模仁,使該高分子材料層具有該第二轉印結構;以該UV光照射該高分子材料層與該第一可溶解性模仁相對應之部分,使該高分子材料層與該第一可溶解性模仁相對應之部分固化,並使該第一支撐背板與該第一膠帶分離;以及以該UV光照射該高分子材料層與該第二可溶解性模仁相對應之部分,使該高分子材料層與該第二可溶解性模仁相對應之部分固化,並使該第二支撐背板與該第二膠帶分離。 The method as described in claim 5, wherein the polymer material layer is formed on a substrate layer, and the embossing step comprises: first: applying the pressure to the first soluble mold core so that the polymer material layer has the first transfer structure; irradiating the portion of the polymer material layer corresponding to the first soluble mold core with the UV light so that the portion of the polymer material layer corresponding to the first soluble mold core is cured; and separating the first supporting back plate from the first adhesive tape; and then: Applying the pressure to the second soluble mold so that the polymer material layer has the second transfer structure; irradiating the portion of the polymer material layer corresponding to the second soluble mold with the UV light so that the portion of the polymer material layer corresponding to the second soluble mold is cured; and separating the second supporting back plate from the second adhesive tape; the embossing step may include: applying the pressure to the first soluble mold so that the polymer material layer has the first transfer structure; applying the pressure to the The second soluble mold is used to make the polymer material layer have the second transfer structure; the polymer material layer is irradiated with the UV light to cure the polymer material layer; and the first supporting back plate is separated from the first tape, and the second supporting back plate is separated from the second tape; and the embossing step may include: applying the pressure to the first soluble mold so that the polymer material layer has the first transfer structure; applying the pressure to the second soluble mold so that the polymer material layer has the The second transfer structure; irradiating the portion of the polymer material layer corresponding to the first soluble mold core with the UV light to solidify the portion of the polymer material layer corresponding to the first soluble mold core, and separating the first supporting back plate from the first adhesive tape; and irradiating the portion of the polymer material layer corresponding to the second soluble mold core with the UV light to solidify the portion of the polymer material layer corresponding to the second soluble mold core, and separating the second supporting back plate from the second adhesive tape.
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