TWI460813B - - Google Patents

Info

Publication number
TWI460813B
TWI460813B TW100148568A TW100148568A TWI460813B TW I460813 B TWI460813 B TW I460813B TW 100148568 A TW100148568 A TW 100148568A TW 100148568 A TW100148568 A TW 100148568A TW I460813 B TWI460813 B TW I460813B
Authority
TW
Taiwan
Application number
TW100148568A
Other versions
TW201236103A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of TW201236103A publication Critical patent/TW201236103A/zh
Application granted granted Critical
Publication of TWI460813B publication Critical patent/TWI460813B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Multimedia (AREA)
  • Engineering & Computer Science (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW100148568A 2010-12-28 2011-12-26 Backside registration apparatus and method TW201236103A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201010619055.2A CN102540781B (zh) 2010-12-28 2010-12-28 一种背面对准装置及方法

Publications (2)

Publication Number Publication Date
TW201236103A TW201236103A (en) 2012-09-01
TWI460813B true TWI460813B (zh) 2014-11-11

Family

ID=46347945

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100148568A TW201236103A (en) 2010-12-28 2011-12-26 Backside registration apparatus and method

Country Status (5)

Country Link
US (1) US9188434B2 (zh)
EP (1) EP2660656B1 (zh)
CN (1) CN102540781B (zh)
TW (1) TW201236103A (zh)
WO (1) WO2012089043A1 (zh)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9041919B2 (en) * 2013-02-18 2015-05-26 Globalfoundries Inc. Infrared-based metrology for detection of stress and defects around through silicon vias
CN104022060A (zh) * 2013-03-01 2014-09-03 中芯国际集成电路制造(上海)有限公司 晶圆背面对准的方法
CN104155850B (zh) * 2013-05-13 2017-06-27 上海微电子装备有限公司 用于光刻设备的正面与背面对准测量装置
TWI544567B (zh) * 2013-06-27 2016-08-01 Asm Tech Singapore Pte Ltd 使用成像設備以調整半導體元件的處理設備的裝置和方法
CN104749158B (zh) 2013-12-27 2020-12-11 同方威视技术股份有限公司 珠宝玉石鉴定方法及装置
CN105277131B (zh) * 2014-05-26 2020-11-20 上海微电子装备（集团）股份有限公司 三维孔结构的测量装置与测量方法
JP6465591B2 (ja) * 2014-08-27 2019-02-06 株式会社オーク製作所 描画装置
CN105807578A (zh) * 2014-12-29 2016-07-27 上海微电子装备有限公司 一种背面对准测量装置及方法
US20170138820A1 (en) * 2015-11-16 2017-05-18 General Electric Company Systems and methods for monitoring components
US20180019139A1 (en) * 2016-07-12 2018-01-18 Ayar Labs, Inc. Wafer-Level Etching Methods for Planar Photonics Circuits and Devices
JP6742272B2 (ja) * 2017-05-16 2020-08-19 三菱電機株式会社 ウェハ異常箇所検出用装置およびウェハ異常箇所特定方法
US10381404B2 (en) 2017-08-07 2019-08-13 Globalfoundries Singapore Pte. Ltd. Integrated circuits with memory cells and methods for producing the same
JP6980562B2 (ja) * 2018-02-28 2021-12-15 キヤノン株式会社 パターン形成装置、アライメントマークの検出方法及びパターン形成方法
CN110504203A (zh) * 2018-05-18 2019-11-26 上海微电子装备（集团）股份有限公司 一种工作台及背面对准装置
CN110246771B (zh) * 2019-06-18 2021-06-15 武汉新芯集成电路制造有限公司 一种晶圆键合的设备及方法
CN110600414A (zh) * 2019-08-01 2019-12-20 中国科学院微电子研究所 晶圆异构对准方法及装置
CN112018002A (zh) * 2020-08-25 2020-12-01 武汉新芯集成电路制造有限公司 晶圆键合设备及晶圆键合的方法
TWI794734B (zh) * 2021-01-29 2023-03-01 川寶科技股份有限公司 決定基板之轉向的方法與曝光機台
CN113791524A (zh) * 2021-09-30 2021-12-14 深圳迈塔兰斯科技有限公司 用于超表面加工的光刻系统及方法
WO2023073232A1 (en) * 2021-11-01 2023-05-04 Esko-Graphics Imaging Gmbh Systems and processes for persistent marking of flexo plates with isolated microstructures and plates marked therewith
DE102022119035A1 (de) * 2022-07-28 2024-02-08 4Jet Microtech Gmbh Detektionsaufbau

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6525805B2 (en) * 2001-05-14 2003-02-25 Ultratech Stepper, Inc. Backside alignment system and method
CN101436006A (zh) * 2008-12-17 2009-05-20 上海微电子装备有限公司 双面位置对准装置与方法
TW201040669A (en) * 2008-12-30 2010-11-16 Asml Netherlands Bv A method of determining a characteristic

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4452526A (en) * 1980-02-29 1984-06-05 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit
US4475122A (en) * 1981-11-09 1984-10-02 Tre Semiconductor Equipment Corporation Automatic wafer alignment technique
US5843831A (en) * 1997-01-13 1998-12-01 Taiwan Semiconductor Manufacturing Company, Ltd. Process independent alignment system
TW406323B (en) 1998-08-20 2000-09-21 United Microelectronics Corp Method for wafer alignment and the apparatus of the same
JP2000299276A (ja) 1999-04-15 2000-10-24 Nikon Corp 露光装置
US6676878B2 (en) * 2001-01-31 2004-01-13 Electro Scientific Industries, Inc. Laser segmented cutting
KR100579603B1 (ko) * 2001-01-15 2006-05-12 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치
US7365848B2 (en) 2004-12-01 2008-04-29 Asml Holding N.V. System and method using visible and infrared light to align and measure alignment patterns on multiple layers
US7751067B1 (en) * 2007-05-24 2010-07-06 Ultratech, Inc. Substrate-alignment using detector of substrate material
CN101685275A (zh) * 2008-09-25 2010-03-31 上海华虹Nec电子有限公司 对准标记及制作方法以及其探测装置
CN101382743B (zh) 2008-10-27 2011-12-21 上海微电子装备有限公司 同轴双面位置对准系统及位置对准方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6525805B2 (en) * 2001-05-14 2003-02-25 Ultratech Stepper, Inc. Backside alignment system and method
CN101436006A (zh) * 2008-12-17 2009-05-20 上海微电子装备有限公司 双面位置对准装置与方法
TW201040669A (en) * 2008-12-30 2010-11-16 Asml Netherlands Bv A method of determining a characteristic

Also Published As

Publication number Publication date
CN102540781B (zh) 2015-09-30
US20130271750A1 (en) 2013-10-17
CN102540781A (zh) 2012-07-04
EP2660656B1 (en) 2016-03-09
EP2660656A1 (en) 2013-11-06
US9188434B2 (en) 2015-11-17
WO2012089043A1 (zh) 2012-07-05
TW201236103A (en) 2012-09-01
EP2660656A4 (en) 2015-01-07

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