TWI458142B - Wire bonding structure - Google Patents

Wire bonding structure Download PDF

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TWI458142B
TWI458142B TW100117112A TW100117112A TWI458142B TW I458142 B TWI458142 B TW I458142B TW 100117112 A TW100117112 A TW 100117112A TW 100117112 A TW100117112 A TW 100117112A TW I458142 B TWI458142 B TW I458142B
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wire
bonding structure
transparent
wire bonding
electrode
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TW100117112A
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TW201248943A (en
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Chia Ming Sung
Wen Wan Tai
Yi Jyun Chen
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Lextar Electronics Corp
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打線接合結構Wire bonding structure

本發明是有關於一種打線接合結構,且特別是有關於一種具有導電性及透光性之透明導線的打線接合結構。The present invention relates to a wire bonding structure, and more particularly to a wire bonding structure for a conductive and light transmissive transparent wire.

發光二極體(Light-Emitting Diode,LED)具有壽命長、體積小、發熱度小以及耗電量低等優點,以往發光二極體被應用於指示燈或小型發光源上。近年來,由於發光二極體朝向多色彩以及高亮度化發展,發光二極體的應用範圍已拓展至大型戶外顯示看板及交通號誌燈等,傳統光源已逐漸被發光二極體所取代,成為兼具省電和環保功能的照明燈源。Light-Emitting Diode (LED) has the advantages of long life, small size, low heat generation and low power consumption. In the past, the light-emitting diode was applied to an indicator light or a small light source. In recent years, due to the development of multi-color and high-brightness of light-emitting diodes, the application range of light-emitting diodes has been extended to large-scale outdoor display billboards and traffic lights, and traditional light sources have been gradually replaced by light-emitting diodes. It is a source of lighting that has both power saving and environmental protection functions.

請參照第1圖,其繪示傳統一種表面黏著型發光二極體封裝結構的示意圖。發光二極體封裝結構100包括一發光元件101、一承載器102、一封裝膠體130、一透明膠體140以及二金線110、120。發光元件101配置於封裝膠體130的一凹槽132中,並位於承載器102上。承載器102包括一晶片座103以及二引腳104、105。發光元件101配置於晶片座103上並透過二金線110、120與二引腳104、105電性連接。此外,二引腳104、105分別穿過封裝膠體130並延伸出凹槽132之外,並透過焊料152與基板150電性連接,以接收一電流。因此,發光元件101可透過二引腳104、105所接收之電流而電致發光。此外,透明膠體140填入於凹槽132中並覆蓋顯露於凹槽132中的發光元件101、二金線110、120、晶片座103以及二引腳104、105。Please refer to FIG. 1 , which illustrates a schematic diagram of a conventional surface mount type LED package structure. The LED package structure 100 includes a light-emitting element 101, a carrier 102, an encapsulant 130, a transparent colloid 140, and two gold wires 110 and 120. The light emitting element 101 is disposed in a recess 132 of the encapsulant 130 and is located on the carrier 102. The carrier 102 includes a wafer holder 103 and two pins 104, 105. The light-emitting element 101 is disposed on the wafer holder 103 and electrically connected to the two pins 104 and 105 through the two gold wires 110 and 120. In addition, the two pins 104 and 105 respectively pass through the encapsulant 130 and extend out of the recess 132 and are electrically connected to the substrate 150 through the solder 152 to receive a current. Therefore, the light-emitting element 101 can be electroluminescent by the current received by the two pins 104, 105. In addition, the transparent colloid 140 is filled in the recess 132 and covers the light emitting element 101, the two gold wires 110, 120, the wafer holder 103, and the two pins 104, 105 exposed in the recess 132.

然而,利用金線來傳導輸入之電流,因成本及吸光性的考量,使用的金線的線徑不會太大,常造成許多應用上的困擾及限制。例如:若使用二元透明膠體(固態及液態)時,其界面之間熱膨脹係數(CTE)的差異,導致金線受拉扯而斷裂。若使用防水性效果較好的透明膠體,通常也伴隨較高的熱膨脹係數,因此在進行冷熱循環測試時常導致產品失效。However, the use of gold wire to conduct the input current, due to cost and absorbance considerations, the wire diameter of the gold wire used is not too large, often causing many application problems and limitations. For example, if a binary transparent colloid (solid and liquid) is used, the difference in thermal expansion coefficient (CTE) between the interfaces causes the gold wire to be broken and broken. If a transparent colloid with good water repellency is used, it is usually accompanied by a high coefficient of thermal expansion, so the product failure is often caused by the hot and cold cycle test.

本發明係有關於一種打線接合結構,係利用具導電特性及透光性之透明導線取代傳統所使用的金線。The present invention relates to a wire bonding structure in which a transparent wire having a conductive property and a light transmissive property is used in place of a conventionally used gold wire.

根據本發明之一方面,提出一種打線接合結構,用以電性連接一電子元件以及一承載器。電子元件具有一第一電極,承載器具有一第一導電支架。其特徵在於,打線接合結構包括第一透明導線。第一透明導線電性連接於第一電極與第一導電支架之間。According to an aspect of the invention, a wire bonding structure is proposed for electrically connecting an electronic component and a carrier. The electronic component has a first electrode and the carrier has a first conductive support. Characterized in that the wire bonding structure comprises a first transparent wire. The first transparent wire is electrically connected between the first electrode and the first conductive support.

根據本發明之一實施例,電子元件還具有一第二電極,承載器還具有一第二導電支架。其特徵在於,打線接合結構更包括一第二透明導線,電性連接於第二電極與第二導電支架之間。According to an embodiment of the invention, the electronic component further has a second electrode, and the carrier further has a second conductive support. The wire bonding structure further includes a second transparent wire electrically connected between the second electrode and the second conductive support.

為了對本發明之上述及其他方面有更佳的瞭解,下文特舉較佳實施例,並配合所附圖式,作詳細說明如下:In order to better understand the above and other aspects of the present invention, the preferred embodiments are described below, and in conjunction with the drawings, the detailed description is as follows:

本實施例之打線接合結構,係利用具導電特性之透明導線取代傳統所使用的金線,可提高線材的抗張強度(Tensile strength)。抗張強度增加可減少製程過程中斷線的機率,避免因線材受拉扯而斷裂。此外,由於透明導線本身材質具有透光性,可以改善金線吸光而導致出光量降低的現象。The wire bonding structure of this embodiment replaces the conventionally used gold wire with a transparent wire having a conductive property, and can improve the tensile strength of the wire. The increase in tensile strength reduces the probability of interruption of the process and avoids breakage of the wire due to pulling. In addition, since the material of the transparent wire itself is translucent, it is possible to improve the phenomenon that the amount of light emitted by the gold wire is reduced.

以下係提出各種實施例進行詳細說明,實施例僅用以作為範例說明,並非用以限縮本發明欲保護之範圍。The following is a detailed description of various embodiments, which are intended to be illustrative only and not to limit the scope of the invention.

第一實施例First embodiment

請參照第2圖,其繪示依照本發明一實施例之打線接合結構的示意圖。以表面黏著型之晶片封裝結構200為例,打線接合結構包括第一透明導線210以及第二透明導線220,用以電性連接一電子元件201以及一承載器203。電子元件201例如為發光二極體或其他積體電路晶片,其具有第一電極202以及第二電極208。承載器203例如為金屬基板,其具有第一導電支架204以及第二導電支架205。電子元件201之第一電極202透過第一透明導線210與第一導電支架204電性連接。第二電極208透過第二透明導線220與第二導電支架205電性連接。Please refer to FIG. 2, which is a schematic diagram of a wire bonding structure according to an embodiment of the invention. For example, the surface-bonding structure includes a first transparent conductive line 210 and a second transparent conductive line 220 for electrically connecting an electronic component 201 and a carrier 203. The electronic component 201 is, for example, a light emitting diode or other integrated circuit wafer having a first electrode 202 and a second electrode 208. The carrier 203 is, for example, a metal substrate having a first conductive support 204 and a second conductive support 205. The first electrode 202 of the electronic component 201 is electrically connected to the first conductive bracket 204 through the first transparent wire 210. The second electrode 208 is electrically connected to the second conductive bracket 205 through the second transparent wire 220.

在一實施例中,電子元件201配置於封裝膠體230的凹槽232中,並位於承載器203上。此外,透明膠體240填入於凹槽232中並覆蓋顯露於凹槽232中的電子元件201、第一及第二透明導線210、220以及第一及第二導電支架204、205。In an embodiment, the electronic component 201 is disposed in the recess 232 of the encapsulant 230 and is located on the carrier 203. In addition, the transparent colloid 240 is filled in the recess 232 and covers the electronic component 201, the first and second transparent wires 210, 220, and the first and second conductive supports 204, 205 exposed in the recess 232.

請參照第3圖,其繪示依照本發明一實施例之透明導線的局部放大示意圖。以位於第2圖之區域A中的透明導線為例,透明導線210為表面形成一透明導電層212之導線芯材214。導線芯材214可為有機導線芯材、無機導線芯材或有機無機混合導線芯材。透明導電層212例如以磁控濺鍍法(Magnetron sputtering)、脈衝雷射鍍法(Pulsed laser deposition)、電弧放電離子鍍法(Arc discharge ion plating)或反應性蒸鍍法(Reactive Evaporation)形成。利用上述的真空鍍膜技術,以及製程參數的調整,可得到電阻率極低且高透光率之透明導電層212,例如銦錫氧化物(ITO)、銻錫氧化物(ATO)、鋅銦氧化物(IZO)、氧化鋅(ZnO)、奈米碳管(CNT)或導電性高分子等。Please refer to FIG. 3, which is a partially enlarged schematic view showing a transparent wire according to an embodiment of the invention. Taking the transparent wire in the area A of FIG. 2 as an example, the transparent wire 210 is a wire core 214 having a transparent conductive layer 212 formed on the surface. The wire core material 214 may be an organic wire core material, an inorganic wire core material, or an organic-inorganic hybrid wire core material. The transparent conductive layer 212 is formed, for example, by magnetron sputtering, pulsed laser deposition, arc discharge ion plating, or reactive evaporation. By using the vacuum coating technology described above and the adjustment of the process parameters, a transparent conductive layer 212 having extremely low resistivity and high light transmittance, such as indium tin oxide (ITO), antimony tin oxide (ATO), and zinc indium oxide, can be obtained. (IZO), zinc oxide (ZnO), carbon nanotubes (CNT) or conductive polymers.

導電性高分子可包括Polyaniline(聚苯胺,PANI)、Poly(3,4-ethylenedioxythiophene)(聚3,4-乙烯二氧噻吩,PEDOT)、Polypyrrole(聚吡咯,PPY)或其衍生物等。The conductive polymer may include Polyaniline (polyaniline, PANI), Poly (3,4-ethylenedioxythiophene) (poly 3,4-ethylenedioxythiophene, PEDOT), Polypyrrole (polypyrrole, PPY) or a derivative thereof.

此外,有機導線芯材214可包括環氧樹酯、矽膠、壓克力(PMMA)樹酯或聚對苯二甲酸乙二醇酯(Polyethylene terephthalate,PET)等材質。無機導線芯材214可包括氮化矽或氮氧化矽等材質。由於這些導線芯材214具有透光性,因此導線芯材214的線徑可加大,且不影響透光率。再者,線徑越粗,抗拉強度越強,因此可藉由加大導線芯材214的線徑,來提高其抗拉強度。In addition, the organic wire core material 214 may include epoxy resin, silicone rubber, acrylic (PMMA) resin or polyethylene terephthalate (PET). The inorganic wire core material 214 may include a material such as tantalum nitride or hafnium oxynitride. Since these wire core members 214 are light transmissive, the wire diameter of the wire core member 214 can be increased without affecting the light transmittance. Further, the thicker the wire diameter, the stronger the tensile strength, so that the tensile strength of the wire core member 214 can be increased by increasing the wire diameter of the wire core member 214.

無論是有機導線芯材、無機導線芯材或有機無機混合導線芯材之表面,均可藉由上述之真空鍍膜技術形成透明導電層212,以使透明導線210具有導電性。此外,透明導線210亦可加入奈米導電材料來提高其導電性,例如在高分子材料中加入奈米碳管之類的導電材料,以降低表面電阻並增加導電性。Regardless of the surface of the organic wire core material, the inorganic wire core material or the organic-inorganic hybrid wire core material, the transparent conductive layer 212 can be formed by the vacuum coating technique described above to make the transparent wire 210 conductive. In addition, the transparent conductive wire 210 may also be added with a nano conductive material to improve its conductivity, for example, a conductive material such as a carbon nanotube is added to the high molecular material to reduce surface resistance and increase electrical conductivity.

第二實施例Second embodiment

請參照第4圖,其繪示依照本發明一實施例之打線接合結構的示意圖。以砷化鎵發光二極體301為例,其包括一上電極302、半導體材料層306、一發光磊晶層307以及一下電極308。上電極302配置於發光磊晶層307上方的半導體材料層306上,以形成歐姆接觸。此外,上電極302透過一透明導線310與第一導電支架304電性連接,以接收一電流。下電極308與第二導電支架305電性連接。因此,由上電極302注入之電流可藉由均勻的電流擴散而流經發光磊晶層307,以使發光磊晶層307產生光電效應而發光。Please refer to FIG. 4, which is a schematic diagram of a wire bonding structure according to an embodiment of the invention. Taking the gallium arsenide LED 301 as an example, it includes an upper electrode 302, a semiconductor material layer 306, an illuminating epitaxial layer 307, and a lower electrode 308. The upper electrode 302 is disposed on the semiconductor material layer 306 over the luminescent epitaxial layer 307 to form an ohmic contact. In addition, the upper electrode 302 is electrically connected to the first conductive bracket 304 through a transparent wire 310 to receive a current. The lower electrode 308 is electrically connected to the second conductive bracket 305. Therefore, the current injected by the upper electrode 302 can flow through the luminescent epitaxial layer 307 by uniform current diffusion, so that the luminescent epitaxial layer 307 generates a photoelectric effect to emit light.

在本實施例中,上電極302及下電極308可為透明導電電極,其材質包括銦錫氧化物(ITO)、銻錫氧化物(ATO)、鋅銦氧化物(IZO)、氧化鋅(ZnO)或鎳金合金。此外,如第3圖所示,透明導線310可為表面形成一透明導電層212之導線芯材214。由於上電極302、下電極308以及透明導線310具有高透光性,因此可改善出光量降低的現象。In this embodiment, the upper electrode 302 and the lower electrode 308 may be transparent conductive electrodes, and the material thereof includes indium tin oxide (ITO), antimony tin oxide (ATO), zinc indium oxide (IZO), and zinc oxide (ZnO). ) or nickel gold alloy. In addition, as shown in FIG. 3, the transparent wire 310 may be a wire core 214 having a transparent conductive layer 212 formed on its surface. Since the upper electrode 302, the lower electrode 308, and the transparent wiring 310 have high light transmittance, the phenomenon that the amount of light emission is lowered can be improved.

有關透明導電層212的製作方法以及材質的選用,已具體描述於第一實施例中,在此不再贅述。值得說明的是,本實施例雖未繪示封裝膠體以及透明膠體,但是將本實施例之發光二極體301配置於第2圖之封裝膠體230的凹槽232中,並位於承載器203上,再以透明膠體240填入於凹槽232中並覆蓋顯露於凹槽232中的發光二極體301及透明導線310,是可想而知的。The method for fabricating the transparent conductive layer 212 and the selection of materials have been specifically described in the first embodiment, and are not described herein again. It should be noted that, although the encapsulant and the transparent colloid are not shown in this embodiment, the LED 301 of the present embodiment is disposed in the recess 232 of the encapsulant 230 of FIG. 2 and is located on the carrier 203. It is conceivable to fill the recess 232 with the transparent colloid 240 and cover the light-emitting diode 301 and the transparent lead 310 exposed in the recess 232.

第三實施例Third embodiment

請參照第5圖,其繪示依照本發明一實施例之打線接合結構的示意圖。以氮化鎵發光二極體401為例,其包括一第一電極402、一第一半導體材料層406、一發光磊晶層407、一第二半導體材料層409以及一第二電極408。第一電極402配置於發光磊晶層407上方之第一半導體材料層406上,以形成歐姆接觸。第一電極402可透過第一透明導線410與第一導電支架404電性連接,以接收一電流。此外,第二電極408配置於發光磊晶層407下方之第二半導體材料層409上,以形成歐姆接觸。第二電極408可透過第二透明導線420與第二導電支架405電性連接。因此,由第一電極402注入之電流可藉由均勻的電流擴散而流經發光磊晶層407,以使發光磊晶層407產生光電效應而發光。Please refer to FIG. 5, which is a schematic diagram of a wire bonding structure according to an embodiment of the invention. For example, the GaN LED 401 includes a first electrode 402, a first semiconductor material layer 406, a luminescent epitaxial layer 407, a second semiconductor material layer 409, and a second electrode 408. The first electrode 402 is disposed on the first semiconductor material layer 406 above the luminescent epitaxial layer 407 to form an ohmic contact. The first electrode 402 is electrically connected to the first conductive bracket 404 through the first transparent conductive line 410 to receive a current. In addition, the second electrode 408 is disposed on the second semiconductor material layer 409 under the luminescent epitaxial layer 407 to form an ohmic contact. The second electrode 408 is electrically connected to the second conductive bracket 405 through the second transparent wire 420. Therefore, the current injected by the first electrode 402 can flow through the luminescent epitaxial layer 407 by uniform current diffusion, so that the luminescent epitaxial layer 407 generates a photoelectric effect to emit light.

在本實施例中,第一電極402及第二電極408可為透明導電電極,其材質包括銦錫氧化物(ITO)、銻錫氧化物(ATO)、鋅銦氧化物(IZO)、氧化鋅(ZnO)或鎳金合金。此外,如第3圖所示,第一及第二透明導線410、420可為表面形成一透明導電層212之導線芯材214。由於第一電極402、第二電極408以及第一及第二透明導線410、420具有高透光性,因此可改善出光量降低的現象。In this embodiment, the first electrode 402 and the second electrode 408 may be transparent conductive electrodes, and the material thereof includes indium tin oxide (ITO), antimony tin oxide (ATO), zinc indium oxide (IZO), and zinc oxide. (ZnO) or nickel gold alloy. In addition, as shown in FIG. 3, the first and second transparent wires 410, 420 may be wire cores 214 having a transparent conductive layer 212 formed on the surface. Since the first electrode 402, the second electrode 408, and the first and second transparent wires 410 and 420 have high light transmittance, the phenomenon that the amount of light emission is lowered can be improved.

有關透明導電層212的製作方法以及材質的選用,已具體描述於第一實施例中,在此不再贅述。值得說明的是,本實施例雖未繪示封裝膠體以及透明膠體,但是將本實施例之發光二極體401配置於第2圖之封裝膠體230的凹槽232中,並位於承載器203上,再以透明膠體240填入於凹槽232中並覆蓋顯露於凹槽232中的發光二極體401及第一、第二透明導線410、420,是可想而知的。The method for fabricating the transparent conductive layer 212 and the selection of materials have been specifically described in the first embodiment, and are not described herein again. It should be noted that, although the encapsulant and the transparent colloid are not shown in the embodiment, the LED 401 of the embodiment is disposed in the recess 232 of the encapsulant 230 of FIG. 2 and is located on the carrier 203. It is conceivable that the transparent colloid 240 is filled in the recess 232 and covers the light-emitting diode 401 and the first and second transparent wires 410 and 420 which are exposed in the recess 232.

本發明上述實施例所揭露之打線接合結構,係利用具導電特性之透明導線取代傳統所使用的金線,可提高線材的抗張強度(Tensile strength)。抗張強度增加可減少製程過程中斷線的機率,避免因線材受拉扯而斷裂。此外,由於透明導線本身材質具有透光性,可以改善金線吸光而導致出光量降低的現象。也由於透明導線的芯材可為有機或無機材料,其熱膨脹係數較低,與透明膠體的熱膨脹係數能相匹配,因此可自由選擇不同的透明膠體,進而提高透明膠體的使用自由性。The wire bonding structure disclosed in the above embodiments of the present invention replaces the conventionally used gold wire with a transparent wire having a conductive property, and can improve the tensile strength of the wire. The increase in tensile strength reduces the probability of interruption of the process and avoids breakage of the wire due to pulling. In addition, since the material of the transparent wire itself is translucent, it is possible to improve the phenomenon that the amount of light emitted by the gold wire is reduced. Also, since the core material of the transparent wire can be an organic or inorganic material, the coefficient of thermal expansion is low, and the coefficient of thermal expansion of the transparent colloid can be matched, so that different transparent colloids can be freely selected, thereby improving the freedom of use of the transparent colloid.

綜上所述,雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明。本發明所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾。因此,本發明之保護範圍當視後附之申請專利範圍所界定者為準。In conclusion, the present invention has been disclosed in the above preferred embodiments, and is not intended to limit the present invention. A person skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.

100...發光二極體封裝結構100. . . Light emitting diode package structure

101...發光元件101. . . Light-emitting element

102...承載器102. . . Carrier

103...晶片座103. . . Wafer holder

104、105...引腳104, 105. . . Pin

110、120...金線110, 120. . . Gold Line

130...封裝膠體130. . . Encapsulant

132...凹槽132. . . Groove

140...透明膠體140. . . Transparent colloid

150...基板150. . . Substrate

152...焊料152. . . solder

200...晶片封裝結構200. . . Chip package structure

201...電子元件201. . . Electronic component

202、402...第一電極202, 402. . . First electrode

203...承載器203. . . Carrier

204、304、404...第一導電支架204, 304, 404. . . First conductive bracket

205、305、405...第二導電支架205, 305, 405. . . Second conductive bracket

208、408...第二電極208, 408. . . Second electrode

210、410...第一透明導線210, 410. . . First transparent wire

212...透明導電層212. . . Transparent conductive layer

214...導線芯材214. . . Wire core material

220、420...第二透明導線220, 420. . . Second transparent wire

230...封裝膠體230. . . Encapsulant

232...凹槽232. . . Groove

240...透明膠體240. . . Transparent colloid

301...砷化鎵發光二極體301. . . GaAs light-emitting diode

302...上電極302. . . Upper electrode

306...半導體材料層306. . . Semiconductor material layer

307...發光磊晶層307. . . Luminescent epitaxial layer

308...下電極308. . . Lower electrode

310...透明導線310. . . Transparent wire

401...氮化鎵發光二極體401. . . Gallium nitride light-emitting diode

406...第一半導體材料層406. . . First semiconductor material layer

407...發光磊晶層407. . . Luminescent epitaxial layer

409...第二半導體材料層409. . . Second semiconductor material layer

A...區域A. . . region

第1圖繪示傳統一種表面黏著型發光二極體封裝結構的示意圖。FIG. 1 is a schematic view showing a conventional surface-adhesive LED package structure.

第2圖繪示依照本發明一實施例之打線接合結構的示意圖。FIG. 2 is a schematic view showing a wire bonding structure according to an embodiment of the invention.

第3圖繪示依照本發明一實施例之透明導線的局部放大示意圖。FIG. 3 is a partially enlarged schematic view showing a transparent wire according to an embodiment of the invention.

第4圖繪示依照本發明一實施例之打線接合結構的示意圖。4 is a schematic view showing a wire bonding structure according to an embodiment of the present invention.

第5圖繪示依照本發明一實施例之打線接合結構的示意圖。FIG. 5 is a schematic view showing a wire bonding structure according to an embodiment of the present invention.

200...晶片封裝結構200. . . Chip package structure

201...電子元件201. . . Electronic component

202...第一電極202. . . First electrode

203...承載器203. . . Carrier

204...第一導電支架204. . . First conductive bracket

205...第二導電支架205. . . Second conductive bracket

208...第二電極208. . . Second electrode

210...第一透明導線210. . . First transparent wire

220...第二透明導線220. . . Second transparent wire

230...封裝膠體230. . . Encapsulant

232...凹槽232. . . Groove

240...透明膠體240. . . Transparent colloid

A...區域A. . . region

Claims (10)

一種打線接合結構,用以電性連接一電子元件以及一承載器,該電子元件具有一第一電極,該承載器具有一第一導電支架,其特徵在於,該打線接合結構包括:第一透明導線,電性連接於該第一電極與該第一導電支架之間,其中該第一透明導線為表面形成一透明導電層之有機導線芯材、無機導線芯材或有機無機混合導線芯材。 A wire bonding structure for electrically connecting an electronic component and a carrier, the electronic component having a first electrode, the carrier having a first conductive support, wherein the wire bonding structure comprises: a first transparent wire And electrically connected between the first electrode and the first conductive support, wherein the first transparent conductive wire is an organic wire core material, an inorganic wire core material or an organic-inorganic hybrid wire core material having a transparent conductive layer formed on the surface. 如申請專利範圍第1項所述之打線接合結構,其中該電子元件為鉮化鎵發光二極體。 The wire bonding structure according to claim 1, wherein the electronic component is a gallium antimonide light emitting diode. 如申請專利範圍第1項所述之打線接合結構,其中該電子元件還具有一第二電極,該承載器還具有一第二導電支架,其特徵在於,該打線接合結構更包括:第二透明導線,電性連接於該第二電極與該第二導電支架之間。 The wire bonding structure of claim 1, wherein the electronic component further has a second electrode, the carrier further comprising a second conductive support, wherein the wire bonding structure further comprises: a second transparent The wire is electrically connected between the second electrode and the second conductive support. 如申請專利範圍第3項所述之打線接合結構,其中該電子元件為氮化鎵發光二極體。 The wire bonding structure according to claim 3, wherein the electronic component is a gallium nitride light emitting diode. 如申請專利範圍第1或3項所述之打線接合結構,其中該第一電極及該第二電極為透明導電電極,其材質包括銦錫氧化物(ITO)、銻錫氧化物(ATO)、鋅銦氧化物(IZO)、氧化鋅(ZnO)或鎳金合金。 The wire bonding structure according to claim 1 or 3, wherein the first electrode and the second electrode are transparent conductive electrodes, and the material thereof comprises indium tin oxide (ITO), antimony tin oxide (ATO), Zinc indium oxide (IZO), zinc oxide (ZnO) or nickel gold alloy. 如申請專利範圍第3項所述之打線接合結構,其中該第二透明導線為表面形成一透明導電層之有機導線芯材、無機導線芯材或有機無機混合導線芯材。 The wire bonding structure according to claim 3, wherein the second transparent wire is an organic wire core material, an inorganic wire core material or an organic-inorganic hybrid wire core material having a transparent conductive layer formed on the surface. 如申請專利範圍第6項所述之打線接合結構,其 中該有機導線芯材之材質包括環氧樹酯、矽膠、壓克力(PMMA)樹酯或聚對苯二甲酸乙二醇酯(PET)。 a wire bonding structure as described in claim 6 of the patent application, The material of the organic wire core material includes epoxy resin, silicone rubber, acrylic (PMMA) resin or polyethylene terephthalate (PET). 如申請專利範圍第6項所述之打線接合結構,其中該無機導線芯材之材質包括氮化矽或氮氧化矽。 The wire bonding structure according to claim 6, wherein the material of the inorganic wire core material comprises tantalum nitride or hafnium oxynitride. 如申請專利範圍第6項所述之打線接合結構,其中該透明導電層之材質包括銦錫氧化物(ITO)、銻錫氧化物(ATO)、鋅銦氧化物(IZO)、氧化鋅(ZnO)、奈米碳管或導電性高分子。 The wire bonding structure according to claim 6, wherein the transparent conductive layer comprises indium tin oxide (ITO), antimony tin oxide (ATO), zinc indium oxide (IZO), and zinc oxide (ZnO). ), carbon nanotubes or conductive polymers. 如申請專利範圍第9項所述之打線接合結構,其中該導電性高分子包括Polyaniline、Poly(3,4-ethylenedioxythiophene)或Polypyrrole。 The wire bonding structure according to claim 9, wherein the conductive polymer comprises Polyaniline, Poly (3,4-ethylenedioxythiophene) or Polypyrrole.
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