TWI455756B - 複合式多孔性材料、製備方法以及於能量儲存設備之應用 - Google Patents

複合式多孔性材料、製備方法以及於能量儲存設備之應用 Download PDF

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TWI455756B
TWI455756B TW100144311A TW100144311A TWI455756B TW I455756 B TWI455756 B TW I455756B TW 100144311 A TW100144311 A TW 100144311A TW 100144311 A TW100144311 A TW 100144311A TW I455756 B TWI455756 B TW I455756B
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Taiwan
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material according
composite porous
porous material
plating layer
preparing
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TW100144311A
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TW201323072A (zh
Inventor
Hsiao Feng Huang
Chia Chen Fang
Ping Chen Chen
Li Duan Tsai
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Ind Tech Res Inst
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Priority to TW100144311A priority Critical patent/TWI455756B/zh
Priority to CN201210005797.5A priority patent/CN103129041B/zh
Priority to US13/545,579 priority patent/US20130143146A1/en
Publication of TW201323072A publication Critical patent/TW201323072A/zh
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Publication of TWI455756B publication Critical patent/TWI455756B/zh

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
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    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
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    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/32—Layered products comprising a layer of synthetic resin comprising polyolefins
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • D—TEXTILES; PAPER
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    • D06M11/46—Oxides or hydroxides of elements of Groups 4 or 14 of the Periodic System; Titanates; Zirconates; Stannates; Plumbates
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    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
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    • D06M11/77—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with silicon or compounds thereof
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    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
    • Y10T442/20—Coated or impregnated woven, knit, or nonwoven fabric which is not [a] associated with another preformed layer or fiber layer or, [b] with respect to woven and knit, characterized, respectively, by a particular or differential weave or knit, wherein the coating or impregnation is neither a foamed material nor a free metal or alloy layer
    • Y10T442/2762—Coated or impregnated natural fiber fabric [e.g., cotton, wool, silk, linen, etc.]

Claims (18)

  1. 一種複合式多孔性材料，包括：一多孔性膜材，該多孔性膜材包括一微孔洞(microporous)高分子膜材或一不織布，且該多孔性膜材具有一上表面及一下表面，其中該上、下表面以及該多孔性膜材內的複數個孔洞表面包括一連續相無機鍍層，其中該多孔性膜材包括：聚乙烯、聚丙烯、聚乙烯對苯二甲酸酯(PET)、聚偏氟乙稀(Polyvinylidene Fluoride,PVDF)、聚四氟乙烯、聚丙烯腈(polyacrylonitrile)、聚醯亞胺(Polyimide)、聚酯(polyester)、天然纖維、或上述之組合。
  2. 如申請專利範圍第1項所述之複合式多孔性材料，其中該無機鍍層為含碳元素之類無機鍍層。
  3. 如申請專利範圍第1項所述之複合式多孔性材料，其中該多孔性膜材厚度介於約5~80μm。
  4. 如申請專利範圍第1項所述之複合式多孔性材料，其中該多孔性膜材之孔隙度介於約40~75%。
  5. 如申請專利範圍第1項所述之複合式多孔性材料，其中該連續相無機鍍層完全覆蓋於該孔洞表面。
  6. 如申請專利範圍第1項所述之複合式多孔性材料，其中該連續相無機鍍層部分覆蓋於該孔洞表面。
  7. 如申請專利範圍第1項所述之複合式多孔性材料，其中該無機鍍層包括含有Si、Zn、Zr、Sn、Ti、Ba、或Al之氧化物、或上述之組合。
  8. 如申請專利範圍第1項所述之複合式多孔性材料， 其中該無機鍍層厚度介於約1~500nm。
  9. 如申請專利範圍第1項所述之複合式多孔性材料，其中孔洞表面之該連續相無機鍍層達到的孔洞深度介於約0.01至20μm。
  10. 一種能量儲存設備，包括一隔離膜材，其係由申請專利範圍第1~9項中任一項所述之複合式多孔性材料所組成。
  11. 如申請專利範圍第10項所述之能量儲存設備，其中該能量儲存設備包括鋰電池、燃料電池、或超級電容。
  12. 一種複合式多孔性材料的製備方法，包括：提供一多孔性膜材，該多孔性膜材包括一微孔洞(microporous)高分子膜材或一不織布，且該多孔性膜材具有一上表面及一下表面，且該多孔性膜材包括：聚乙烯、聚丙烯、聚乙烯對苯二甲酸酯(PET)、聚偏氟乙稀(Polyvinylidene Fluoride,PVDF)、聚四氟乙烯、聚丙烯腈(polyacrylonitrile)、聚醯亞胺(Polyimide)、聚酯(polyester)、天然纖維、或上述之組合；對該多孔性膜材進行一乾式鍍膜製程，使該多孔性膜材的上、下表面及內部的複數個孔洞表面上形成一連續相無機鍍層。
  13. 如申請專利範圍第12項所述之複合式多孔性材料的製備方法，其中該乾式鍍膜製程為一電漿鍍膜製程。
  14. 如申請專利範圍第12項所述之複合式多孔性材料的製備方法，其中該乾式鍍膜製程使用的氣體包括一載氣及一鍍膜氣體。
  15. 如申請專利範圍第14項所述之複合式多孔性材料的製備方法，其中該載氣包括氮氣、氬氣、氦氣、氧氣、空氣、氫氣或上述之組合。
  16. 如申請專利範圍第14項所述之複合式多孔性材料的製備方法，其中該鍍膜氣體包括Si、Zn、Zr、Sn、Ti、Ba、或Al之金屬元素的液體之蒸氣或霧狀物、或上述之組合。
  17. 如申請專利範圍第14項所述之複合式多孔性材料的製備方法，其中該鍍膜氣體包括四乙氧基矽烷(tetraethoxysilane,TEOS)、四甲氧基矽烷(tetramethoxysilane)、六甲基二矽氧烷(hexamethyldisiloxane,HMDSO)、六甲基二矽氮烷(HMDS)、丁氧化鋁(Aluminum butoxide)、二乙基鋅(Diethylzinc)、三乙基鋁(triethylaluminum)、三甲基鋁(trimethylaluminum)、金屬烷基化合物(metal alkyls)、四異丙烷氧化鈦(titanium tetraisopropoxide)、四丙烷氧化鈦(titanium tetrapropoxide)、金屬烷氧化物(metal alkoxides)、硝酸鋅(Zinc nitrate)、硝酸鋁(Aluminum nitrate)、金屬硝酸物、醋酸鋅、醋酸鋁、醋酸錫、金屬醋酸物、硫酸鋅、硫酸鋁、硫酸亞錫、金屬硫酸物、氯化鋅、氯化鋯、氯化鋁、氯化鈦、金屬氯化物的液體之蒸氣或霧狀物、或上述之組合。
  18. 如申請專利範圍第12項所述之複合式多孔性材料的製備方法，其中該無機鍍層為含碳元素之類無機鍍層。
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