TWI449576B - Method for controlling dispenser apparatus - Google Patents

Method for controlling dispenser apparatus Download PDF

Info

Publication number
TWI449576B
TWI449576B TW099135454A TW99135454A TWI449576B TW I449576 B TWI449576 B TW I449576B TW 099135454 A TW099135454 A TW 099135454A TW 99135454 A TW99135454 A TW 99135454A TW I449576 B TWI449576 B TW I449576B
Authority
TW
Taiwan
Prior art keywords
dispenser
substrate
raw material
pattern
syringe
Prior art date
Application number
TW099135454A
Other languages
Chinese (zh)
Other versions
TW201114503A (en
Inventor
Geun Deok Lee
Jung Du Kim
Jae Nam Jang
Jae Man Choi
Original Assignee
Ap Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ap Systems Inc filed Critical Ap Systems Inc
Publication of TW201114503A publication Critical patent/TW201114503A/en
Application granted granted Critical
Publication of TWI449576B publication Critical patent/TWI449576B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1015Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target
    • B05C11/1018Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target responsive to distance of target
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0225Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)

Description

用於控制分配器設備的方法 Method for controlling a dispenser device

本發明是有關於一種用於控制分配器設備的方法,且更確切地說,涉及一種用於控制如下分配器的方法,所述分配器能夠減少在基板上形成多個圖案的處理時間。 The present invention relates to a method for controlling a dispenser device, and more particularly to a method for controlling a dispenser capable of reducing processing time for forming a plurality of patterns on a substrate.

陰極射線管(CRT)已用作現有技術顯示裝置。然而,CRT具有體積大且重量重的限制。近年來,例如液晶顯示裝置(LCD)、電漿顯示面板(PDP)和有機發光裝置(OLED)的平板顯示器(FPD)廣泛用作顯示裝置。FPD具有重量輕、構形纖細和功率消耗低的優點。 Cathode ray tubes (CRT) have been used as prior art display devices. However, CRTs are limited in size and weight. In recent years, flat panel displays (FPDs) such as liquid crystal display devices (LCDs), plasma display panels (PDPs), and organic light-emitting devices (OLEDs) have been widely used as display devices. FPD has the advantages of light weight, slim configuration and low power consumption.

為了製造此種類型的FPD,將一對平坦基板彼此接合。舉例來說,在LCD的情況下,製造包括多個薄膜晶體管和像素電極的下部基板與包括彩色濾光片和共用電極的上部基板。接著,沿著上部基板和下部基板中的一者或兩者的邊緣區域而設置多個金屬圖案,以將上部基板電連接到下部基板。所述多個圖案可沿著邊緣的圓周彼此間隔開。 To manufacture this type of FPD, a pair of flat substrates are joined to each other. For example, in the case of an LCD, a lower substrate including a plurality of thin film transistors and pixel electrodes and an upper substrate including a color filter and a common electrode are fabricated. Next, a plurality of metal patterns are disposed along an edge region of one or both of the upper substrate and the lower substrate to electrically connect the upper substrate to the lower substrate. The plurality of patterns may be spaced apart from one another along the circumference of the edge.

一種用於將金屬膏(paste)塗覆到上部基板和下部基板中的一者或兩者上以形成所述多個圖案的分配器設備包括安裝有所述基板的平臺、包括用於排放原材料(例如,塗覆到安裝於所述平臺上的基板上的金屬膏)的噴嘴的分配器、用於測量基板與噴嘴之間的間隙的感測器、用於提升分配器的驅動部分、用於水平地移動分配器的傳送(transfer)部分,和用於控制分配器的操作的控制部分。 A dispenser apparatus for applying a metal paste onto one or both of an upper substrate and a lower substrate to form the plurality of patterns includes a platform on which the substrate is mounted, including for discharging a raw material a dispenser of a nozzle (for example, a metal paste applied to a substrate mounted on the stage), a sensor for measuring a gap between the substrate and the nozzle, a driving portion for lifting the dispenser, The transfer portion of the dispenser is moved horizontally, and the control portion for controlling the operation of the dispenser.

首先,使用感測器來測量基板與噴嘴之間的間隙,以使用現有技術分配器設備在基板上形成所述多個圖案。接著,分配器上升或下降以調整基板與噴嘴之間的間隙。即,調整基板與噴嘴之間的間隙以從噴嘴將原材料排放到基板上。此後,在從噴嘴排放原材料的同時移動分配器,以形成具有所要長度的圖案。當形成具有所要長度的圖案時,停止從噴嘴排放原材料且將分配器提升約2cm到約5cm。接著,將分配器移動到將形成下一個圖案的位置。當分配器到達將形成下一個圖案的位置時,使用感測器來測量基板與噴嘴之間的間隙,且降低分配器,藉此調整基板與噴嘴之間的間隙。此後,在從噴嘴排放原材料的同時移動分配器,以形成具有所要長度的圖案。接著,將上文所描述的過程重複若干次,以在基板上形成所述多個圖案。 First, a sensor is used to measure the gap between the substrate and the nozzle to form the plurality of patterns on the substrate using prior art dispenser devices. Next, the dispenser is raised or lowered to adjust the gap between the substrate and the nozzle. That is, the gap between the substrate and the nozzle is adjusted to discharge the raw material onto the substrate from the nozzle. Thereafter, the dispenser is moved while discharging the raw material from the nozzle to form a pattern having a desired length. When forming a pattern having a desired length, the discharge of the raw material from the nozzle is stopped and the dispenser is lifted by about 2 cm to about 5 cm. Next, the dispenser is moved to a position where the next pattern will be formed. When the dispenser reaches a position where the next pattern will be formed, a sensor is used to measure the gap between the substrate and the nozzle, and the dispenser is lowered, thereby adjusting the gap between the substrate and the nozzle. Thereafter, the dispenser is moved while discharging the raw material from the nozzle to form a pattern having a desired length. Next, the process described above is repeated several times to form the plurality of patterns on the substrate.

參考如上文所描述的現有技術分配器設備的配置,為了形成所述多個圖案,分配器需要在每次形成圖案時上升或下降以調整基板與噴嘴之間的間隙。因為當在基板上形成所述多個圖案的同時將基板與噴嘴之間的間隙調整了若干次,所以增加處理時間。因此,此類方法可能很難避免低生產率的缺點。 Referring to the configuration of the prior art dispenser apparatus as described above, in order to form the plurality of patterns, the dispenser needs to be raised or lowered each time a pattern is formed to adjust the gap between the substrate and the nozzle. Since the gap between the substrate and the nozzle is adjusted several times while the plurality of patterns are formed on the substrate, the processing time is increased. Therefore, such methods may be difficult to avoid the disadvantage of low productivity.

本發明提供一種用於控制分配器設備的方法,其中水平地移動所述分配器以將原材料排放到基板上,藉此減少形成多個圖案的處理時間。 The present invention provides a method for controlling a dispenser apparatus in which the dispenser is horizontally moved to discharge a raw material onto a substrate, thereby reducing processing time for forming a plurality of patterns.

根據示範性實施例,提供一種用於控制分配器設備的 方法,所述分配器設備包括存儲原材料的注射器(syringe)、將原材料排放到基板上的噴嘴、控制注射器與噴嘴之間的連通的閥門(valve),和經調適以在所述基板上形成彼此間隔開的多個圖案的分配器,所述方法包括:水平地移動分配器以將原材料排放到基板上,藉此形成所述多個圖案,其中在將原材料排放到基板上時的基板與噴嘴之間的間隙等於未將原材料排放到基板上時的基板與噴嘴之間的間隙。 According to an exemplary embodiment, a method for controlling a dispenser device is provided The method, the dispenser apparatus includes a syringe storing a raw material, a nozzle discharging the raw material onto the substrate, a valve controlling communication between the injector and the nozzle, and adapted to form each other on the substrate a plurality of spaced apart pattern dispensers, the method comprising: moving the dispenser horizontally to discharge the raw material onto the substrate, thereby forming the plurality of patterns, wherein the substrate and the nozzle are when the raw material is discharged onto the substrate The gap between them is equal to the gap between the substrate and the nozzle when the raw material is not discharged onto the substrate.

所述分配器的水平移動可包括在將原材料排放到基板上時維持基板與噴嘴之間的間隙,而無需重複地執行以下過程:其中,當在基板上形成彼此間隔開的多個圖案時,分配器上升或下降若干次以調整基板與噴嘴之間的間隙。 The horizontal movement of the dispenser may include maintaining a gap between the substrate and the nozzle when discharging the raw material onto the substrate without repeatedly performing a process in which, when a plurality of patterns spaced apart from each other are formed on the substrate, The dispenser is raised or lowered several times to adjust the gap between the substrate and the nozzle.

所述方法可進一步包括將原材料排放到基板上以形成圖案之前,向分配器施加原材料的排放開始信號。 The method may further include applying a discharge start signal of the raw material to the dispenser before discharging the raw material onto the substrate to form a pattern.

所述方法可進一步包括在基板上形成圖案結束之前,向分配器施加原材料的排放結束信號。 The method may further include applying a discharge end signal of the raw material to the dispenser before the end of the patterning on the substrate.

在開始形成圖案的實際位置被稱作圖案形成開始點的情況下,可在分配器位於所述圖案形成開始點之前的位置處時,向分配器施加原材料的排放開始信號。 In the case where the actual position at which the patterning is started is referred to as a pattern formation start point, the discharge start signal of the raw material may be applied to the dispenser when the dispenser is located at a position before the pattern formation start point.

所述排放開始信號施加點可通過分配器的移動速度、注射器內的壓力加添時間和閥門的操作時間來調整。 The discharge start signal application point can be adjusted by the moving speed of the dispenser, the pressure addition time in the syringe, and the operating time of the valve.

所述排放開始信號施加點可通過以下等式而計算為距離值:“排放開始信號施加點=分配器的移動速度×注射器內的壓力加添時間×閥門的操作時間”。 The discharge start signal application point can be calculated as a distance value by the following equation: "discharge start signal application point = moving speed of the dispenser x pressure addition time in the syringe x operation time of the valve".

所述排放開始信號施加點可位於圖案形成點之前的相距所計算的值的位置處。 The discharge start signal application point may be located at a position apart from the calculated value before the pattern formation point.

當從圖案形成開始點起將基板上的圖案劃分成第一區、第二區和第三區時,可將加添到注射器中以形成所述圖案的第一區的壓力調整為加添到注射器中以形成所述第二區的壓力的約30%到約80%。 When the pattern on the substrate is divided into the first region, the second region, and the third region from the start of pattern formation, the pressure added to the first region of the syringe to form the pattern may be adjusted to be added to The syringe is formed to form from about 30% to about 80% of the pressure of the second zone.

所述圖案的第一區可屬於覆蓋距圖案形成開始點約0.5mm的範圍。 The first region of the pattern may belong to a range of about 0.5 mm from the beginning of the pattern formation.

在基板上形成所述圖案結束的實際位置被稱作圖案形成結束點的情況下,可在分配器位於所述圖案形成結束點之前的位置處時,向分配器施加原材料的排放結束信號。 In the case where the actual position at which the end of the pattern is formed on the substrate is referred to as a pattern formation end point, the discharge end signal of the raw material may be applied to the dispenser when the dispenser is located at a position before the pattern formation end point.

所述排放結束信號施加點可通過以下等式而計算為距離值:“排放結束信號施加點S2=加添到注射器中的壓力×每壓力的長度改變”。 The discharge end signal application point can be calculated as a distance value by the following equation: "Emission end signal application point S2 = pressure added to the syringe x length change per pressure".

所述排放結束信號施加點可位於所述圖案形成結束點之前的相距所計算的值的位置處。 The discharge end signal application point may be located at a position apart from the calculated value before the pattern formation end point.

為讓本發明之上述和其他目的、特徵和優點能更明顯易懂,下文特舉較佳實施例,並配合所附圖式,作詳細說明如下。 The above and other objects, features and advantages of the present invention will become more <RTIgt;

在下文中,將參看附圖詳細地描述特定實施例。然而,本發明可以不同形式來體現且不應被解釋為限於本文中所闡述的實施例。而是,提供這些實施例以使得本發明將為透徹且完整的,且將本發明的範圍完全傳達給所屬領域的 技術人員。在諸圖中,相似參考數字貫穿全文指代相似元件。 Hereinafter, specific embodiments will be described in detail with reference to the accompanying drawings. However, the invention may be embodied in different forms and should not be construed as being limited to the embodiments set forth herein. Rather, the embodiments are provided so that this disclosure will be thorough and complete, and the scope of the invention Technical staff. In the figures, like reference numerals refer to like elements throughout.

圖1為根據示範性實施例的分配器設備的示意圖。圖2為根據示範性實施例的分配器的截面圖。圖3為用於解釋排放開始信號施加點的截面圖,其中在通過根據示範性實施例的方法水平地移動分配器時,向所述排放開始信號施加點施加用於從分配器排放原材料的排放開始信號。圖4為用於解釋排放結束信號施加點的截面圖,其中在通過根據示範性實施例的方法水平地移動分配器時,向所述排放結束信號施加點施加用於從分配器排放原材料的排放結束信號。圖5為用於解釋根據示範性實施例的分配器的水平移動的截面圖。 FIG. 1 is a schematic diagram of a dispenser device, in accordance with an exemplary embodiment. 2 is a cross-sectional view of a dispenser in accordance with an exemplary embodiment. 3 is a cross-sectional view for explaining a discharge start signal application point, in which discharge for discharging raw materials from a dispenser is applied to the discharge start signal application point when the dispenser is horizontally moved by a method according to an exemplary embodiment Start signal. 4 is a cross-sectional view for explaining a discharge end signal application point, in which emission of a raw material discharged from a dispenser is applied to the discharge end signal application point when the dispenser is horizontally moved by a method according to an exemplary embodiment End signal. FIG. 5 is a cross-sectional view for explaining horizontal movement of a dispenser according to an exemplary embodiment.

參看圖1和圖2,根據示範性實施例的分配器設備包括:安裝有基板10的平臺100;分配器200,其包括用於將原材料排放到安裝於平臺100上的基板10上的噴嘴210;用於測量基板10與噴嘴210之間的間隙的感測器240;用於提升分配器200的驅動部分250;用於水平地移動分配器200的傳送部分300;和用於控制分配器200的操作的控制部分400。 Referring to FIGS. 1 and 2, a dispenser apparatus according to an exemplary embodiment includes: a platform 100 on which a substrate 10 is mounted; a dispenser 200 including a nozzle 210 for discharging a raw material onto a substrate 10 mounted on the platform 100 a sensor 240 for measuring a gap between the substrate 10 and the nozzle 210; a driving portion 250 for lifting the dispenser 200; a conveying portion 300 for horizontally moving the dispenser 200; and for controlling the dispenser 200 The control portion 400 of the operation.

根據示範性實施例的基板10可為用於液晶顯示裝置(LCD)的上部基板和下部基板中的一者。雖然未展示,但(例如)彩色濾光片(filter)和共用電極可設置在上部基板上,且多個薄膜晶體管和一個像素電極可設置在下部基板上。當將上部基板與下部基板彼此接合以製造LCD時, 可在上部基板和下部基板中的一者上設置由金屬膏形成的多個圖案,以將上部基板電連接到下部基板。根據示範性實施例,銀(Ag)膏用作原材料,Ag膏是存儲於注射器內且塗覆到基板10上。 The substrate 10 according to an exemplary embodiment may be one of an upper substrate and a lower substrate for a liquid crystal display device (LCD). Although not shown, for example, a color filter and a common electrode may be disposed on the upper substrate, and a plurality of thin film transistors and one pixel electrode may be disposed on the lower substrate. When the upper substrate and the lower substrate are bonded to each other to manufacture an LCD, A plurality of patterns formed of a metal paste may be disposed on one of the upper substrate and the lower substrate to electrically connect the upper substrate to the lower substrate. According to an exemplary embodiment, a silver (Ag) paste is used as a raw material, and an Ag paste is stored in a syringe and coated on the substrate 10.

用傳送部分300在X-軸或Y-軸方向上移動分配器200,以沿著基板10的邊緣區的圓周塗覆原材料,藉此形成所述多個圖案11。傳送部分300使用馬達和軌道來移動平臺100和分配器200。或者,可使用其他多種單元來移動平臺100和分配器200。雖然在本示範性實施例中是在X-軸或Y-軸方向上水平地移動分配器200,但本發明不限於此。舉例來說,可在X-軸或Y-軸方向上移動平臺100以將原材料塗覆到基板10上。或者,可在X-軸或Y-軸方向上移動平臺100與分配器200兩者以塗覆原材料。否則,可在一個側向上移動平臺且可在另一側向上移動分配器200以塗覆原材料。 The dispenser 200 is moved in the X-axis or Y-axis direction by the transfer portion 300 to apply a raw material along the circumference of the edge region of the substrate 10, thereby forming the plurality of patterns 11. The transfer portion 300 uses a motor and a track to move the platform 100 and the dispenser 200. Alternatively, various other units may be used to move platform 100 and dispenser 200. Although the dispenser 200 is horizontally moved in the X-axis or Y-axis direction in the present exemplary embodiment, the present invention is not limited thereto. For example, the platform 100 can be moved in the X-axis or Y-axis direction to apply the raw material onto the substrate 10. Alternatively, both the platform 100 and the dispenser 200 can be moved in the X-axis or Y-axis direction to coat the raw materials. Otherwise, the platform can be moved in one side and the dispenser 200 can be moved up on the other side to coat the raw materials.

分配器200包括:存儲著原材料(例如,Ag膏)的注射器220;固定地裝設有注射器220的主體部分230;將存儲於注射器220中的原材料排放到基板10上的噴嘴;和測量該分配器200的噴嘴210與基板10之間的間隙的感測器240。雖然未展示,但用於控制注射器220與噴嘴210之間的連通的閥門(例如,電磁閥)可設置於注射器220與噴嘴210之間。因此,當將壓力加添到存儲著原材料的注射器220中且使用閥門使注射器220與噴嘴210連通時,將原材料供應到注射器220中。接著,從噴嘴210排放原材 料。 The dispenser 200 includes: a syringe 220 storing a raw material (for example, an Ag paste); a main body portion 230 to which the syringe 220 is fixedly mounted; a nozzle for discharging a raw material stored in the syringe 220 onto the substrate 10; and measuring the distribution A sensor 240 of the gap between the nozzle 210 of the device 200 and the substrate 10. Although not shown, a valve (eg, a solenoid valve) for controlling communication between the syringe 220 and the nozzle 210 may be disposed between the syringe 220 and the nozzle 210. Therefore, when pressure is added to the syringe 220 storing the raw material and the syringe 220 is communicated with the nozzle 210 using a valve, the raw material is supplied into the syringe 220. Then, the raw material is discharged from the nozzle 210 material.

根據示範性實施例,在形成所述多個圖案11的同時,分配器200並不上升和下降若干次以調整基板10與噴嘴210之間的間隙,此做法不同于現有技術。即,如圖5中所展示,在形成所述多個圖案11期間,水平地移動分配器200而並不是將分配器200提升和下降若干次,同時基板10與分配器200保持預定間隙。即,水平地移動分配器200,以使得排放原材料時的基板10與噴嘴210之間的間隙等於未排放原材料時的基板10與噴嘴之間的間隙。下文將詳細描述分配器200的水平移動。 According to an exemplary embodiment, while the plurality of patterns 11 are formed, the dispenser 200 does not rise and fall several times to adjust the gap between the substrate 10 and the nozzles 210, which is different from the prior art. That is, as shown in FIG. 5, during formation of the plurality of patterns 11, the dispenser 200 is moved horizontally without lifting and lowering the dispenser 200 several times while the substrate 10 maintains a predetermined gap with the dispenser 200. That is, the dispenser 200 is horizontally moved so that the gap between the substrate 10 and the nozzle 210 when discharging the raw material is equal to the gap between the substrate 10 and the nozzle when the raw material is not discharged. The horizontal movement of the dispenser 200 will be described in detail below.

感測器240測量基板10與噴嘴210之間的間隙。雖然未展示,但感測器240包括向基板10上發射光以用於測量距離的發光部分(未展示)和接收自所述發光部分發射的光的光接收部分(未展示)。發光部分與光接收部分可一體地形成於一個主體中且彼此以預定距離間隔開。驅動部分250經配置以基於來自感測器240的測量值來提升分配器200,以將基板與噴嘴210之間的間隙調整到約40μm。 The sensor 240 measures the gap between the substrate 10 and the nozzle 210. Although not shown, the sensor 240 includes a light emitting portion (not shown) that emits light onto the substrate 10 for measuring a distance and a light receiving portion (not shown) that receives light emitted from the light emitting portion. The light emitting portion and the light receiving portion may be integrally formed in one body and spaced apart from each other by a predetermined distance. The drive portion 250 is configured to lift the dispenser 200 based on measurements from the sensor 240 to adjust the gap between the substrate and the nozzle 210 to about 40 [mu]m.

根據示範性實施例,可僅提升分配器200一次,以調整基板10與噴嘴210之間的間隙。可在基板10上形成圖案11之前調整基板10與噴嘴210之間的間隙。此後,可連續地且水平地移動分配器200以形成所述多個圖案11,而並不提升或下降分配器200。另外,感測器240可在水平地移動分配器200以在基板10上形成所述多個圖案11的同時連續地測量基板10與噴嘴210之間的間隙。 According to an exemplary embodiment, the dispenser 200 may only be lifted once to adjust the gap between the substrate 10 and the nozzle 210. The gap between the substrate 10 and the nozzle 210 can be adjusted before the pattern 11 is formed on the substrate 10. Thereafter, the dispenser 200 can be moved continuously and horizontally to form the plurality of patterns 11 without lifting or lowering the dispenser 200. In addition, the sensor 240 may continuously measure the gap between the substrate 10 and the nozzle 210 while moving the dispenser 200 horizontally to form the plurality of patterns 11 on the substrate 10.

控制部分400控制分配器200的操作以避免產生有缺陷的圖案。為此目的,控制部分400存儲基板10的將開始形成圖案11的點(圖案形成開始點P1)和圖案11的形成將結束的點(圖案形成結束點P2)。而且,控制部分400計算排放開始信號施加點S1和排放結束信號施加點S2。當移動中之分配器200定位於排放開始信號施加點S1處時,向分配器200施加用於排放原材料的排放開始信號。而且,當移動中之分配器200定位於排放結束信號施加點S2處時,向分配器200施加用於結束排放原材料的排放結束信號。下文將詳細描述圖案形成開始點P1、圖案形成結束點P2、排放開始信號施加點S1和排放結束信號施加點S2。 The control portion 400 controls the operation of the dispenser 200 to avoid generating a defective pattern. For this purpose, the control portion 400 stores a point (pattern formation start point P1) of the substrate 10 where the formation of the pattern 11 is to start and a point at which the formation of the pattern 11 is to end (pattern formation end point P2). Moreover, the control portion 400 calculates the discharge start signal application point S1 and the discharge end signal application point S2. When the moving dispenser 200 is positioned at the discharge start signal application point S1, a discharge start signal for discharging the raw material is applied to the dispenser 200. Moreover, when the moving dispenser 200 is positioned at the discharge end signal application point S2, the discharge end signal for ending the discharge of the raw material is applied to the dispenser 200. The pattern formation start point P1, the pattern formation end point P2, the discharge start signal application point S1, and the discharge end signal application point S2 will be described in detail below.

在下文中,將參看圖1到圖5描述用於在連續地且水平地移動分配器200的同時在基板10上形成所述多個圖案11的方法。 Hereinafter, a method for forming the plurality of patterns 11 on the substrate 10 while continuously and horizontally moving the dispenser 200 will be described with reference to FIGS. 1 through 5.

首先,將基板10安置於分配器設備的平臺100上,且使用感測器240來測量基板10與噴嘴210之間的間隙。基板10可為LED面板的上部基板和下部基板中的一者。感測器240測量基板10與噴嘴210之間的間隙,且驅動部分250基於感測器240的測量值來提升分配器200以將基板10與噴嘴210之間的間隙調整到約40μm。可僅提升分配器200一次,以調整基板10與噴嘴210之間的間隙。此外,可在基板10上形成圖案11之前調整基板10與噴嘴210之間的間隙。 First, the substrate 10 is placed on the platform 100 of the dispenser device, and the sensor 240 is used to measure the gap between the substrate 10 and the nozzle 210. The substrate 10 can be one of an upper substrate and a lower substrate of the LED panel. The sensor 240 measures the gap between the substrate 10 and the nozzle 210, and the driving portion 250 raises the dispenser 200 based on the measured value of the sensor 240 to adjust the gap between the substrate 10 and the nozzle 210 to about 40 μm. The dispenser 200 can be lifted only once to adjust the gap between the substrate 10 and the nozzle 210. Further, the gap between the substrate 10 and the nozzle 210 can be adjusted before the pattern 11 is formed on the substrate 10.

接著,使用傳送部分300水平地移動分配器200。可朝向在基板10上開始形成圖案11的位置(即,圖案形成開始點P1)水平地移動分配器200。在朝向圖案形成開始點P1水平地移動分配器200的同時,控制部分400計算排放開始信號施加點S1。此後,如圖3中所展示,當分配器200位於高於排放開始信號施加點S1的位置處時,控制部分400向分配器200施加用於排放原材料的排放開始信號。因此,可在連續地且水平地移動分配器200的同時,在所要位置處形成圖案11。此處,如圖3中所展示,排放開始信號施加點S1可設置于圖案形成開始點P1之前的相距預定距離的位置處。排放開始信號施加點S1是根據分配器200的移動速度、用於在注射器220內加添足夠壓力的時間和閥門的操作時間而改變。通常,在控制部分400向分配器200施加排放開始信號之後直到從分配器200的噴嘴210排放原材料為止,需要一段預定時間。即,需要預定時間以便在存儲著原材料的注射器220內加添足夠壓力,以使得可將原材料供應到噴嘴210。亦需要預定時間以操作閥門,以使得注射器220可與噴嘴210連通。因此,即使控制部分400向分配器200供應用於排放原材料的命令信號,也並不立即從分配器200排放原材料。另外,排放開始信號施加點S1可視分配器200的移動速度而定,此是因為圖案11是在水平地移動分配器200的同時形成於基板10上。可將上述關係表達為以下等式:“排放開始信號施加點S1=分配器200的移動速度×閥門的操作時間× 注射器220內的壓力加添時間”。根據示範性實施例,使用以下等式計算排放開始信號施加點S1:(排放開始信號施加點S1=分配器的移動速度×閥門的操作時間×注射器內的壓力加添時間)。將排放開始信號施加點S1計算為距離單位。將排放開始信號施加點S1設定為在圖案形成開始點P1之前的相距計算的值的位置。舉例來說,當計算的值為約1mm時,在圖案形成開始點P1之前的相距約1mm的位置處施加排放開始信號。因此,當移動中之分配器200定位於排放開始信號施加點S1處時,控制部分400向分配器200施加用於排放原材料的排放開始信號,如圖3中所展示。 Next, the dispenser 200 is horizontally moved using the transfer portion 300. The dispenser 200 can be horizontally moved toward a position at which the pattern 11 is initially formed on the substrate 10 (i.e., the pattern forming start point P1). While the dispenser 200 is horizontally moved toward the pattern forming start point P1, the control portion 400 calculates the discharge start signal application point S1. Thereafter, as shown in FIG. 3, when the dispenser 200 is located at a position higher than the discharge start signal application point S1, the control portion 400 applies a discharge start signal for discharging the raw material to the dispenser 200. Therefore, the pattern 11 can be formed at a desired position while the dispenser 200 is continuously and horizontally moved. Here, as shown in FIG. 3, the discharge start signal application point S1 may be disposed at a position apart from the pattern formation start point P1 by a predetermined distance. The discharge start signal application point S1 is changed in accordance with the moving speed of the dispenser 200, the time for adding sufficient pressure in the syringe 220, and the operating time of the valve. Generally, it takes a predetermined period of time after the control portion 400 applies the discharge start signal to the dispenser 200 until the raw material is discharged from the nozzle 210 of the dispenser 200. That is, a predetermined time is required to add sufficient pressure to the syringe 220 storing the raw material so that the raw material can be supplied to the nozzle 210. A predetermined time is also required to operate the valve such that the syringe 220 can communicate with the nozzle 210. Therefore, even if the control portion 400 supplies the dispenser 200 with a command signal for discharging the raw material, the raw material is not immediately discharged from the dispenser 200. In addition, the discharge start signal application point S1 may depend on the moving speed of the dispenser 200 because the pattern 11 is formed on the substrate 10 while moving the dispenser 200 horizontally. The above relationship can be expressed as the following equation: "discharge start signal application point S1 = moving speed of the dispenser 200 × operating time of the valve × The pressure in the syringe 220 adds time. According to an exemplary embodiment, the discharge start signal application point S1 is calculated using the following equation: (discharge start signal application point S1 = moving speed of the dispenser × operating time of the valve × inside the syringe The pressure addition signal application point S1 is calculated as a distance unit. The discharge start signal application point S1 is set to a position of the calculated value before the pattern formation start point P1. For example, when the calculated value When it is about 1 mm, a discharge start signal is applied at a position of about 1 mm before the pattern formation start point P1. Therefore, when the moving dispenser 200 is positioned at the discharge start signal application point S1, the control portion 400 is directed to the dispenser. 200 applies an emission start signal for discharging raw materials, as shown in FIG.

當向分配器200施加用於排放原材料的排放開始信號時,開始向注射器220中加添壓力。接著,設置於注射器220與噴嘴210之間的閥門開始操作以使注射器220與噴嘴210彼此連通。在上文所描述的過程的執行期間,分配器200到達圖案形成開始點P1。當分配器200位於高於圖案形成開始點P1的位置處時,從噴嘴210排放注射器220內的原材料。即,在所要點(即,圖案形成開始點P1)處開始塗覆原材料以形成圖案11。隨著在過程前進方向上連續地且水平地移動分配器200,將從噴嘴210排放的原材料塗覆到基板10上以形成圖案11。 When a discharge start signal for discharging the raw material is applied to the dispenser 200, pressure is initially applied to the syringe 220. Next, the valve disposed between the syringe 220 and the nozzle 210 starts operating to connect the syringe 220 and the nozzle 210 to each other. During execution of the process described above, the dispenser 200 reaches the patterning start point P1. When the dispenser 200 is located at a position higher than the pattern forming start point P1, the raw material in the syringe 220 is discharged from the nozzle 210. That is, the raw material is started to be applied to form the pattern 11 at the point (ie, the pattern formation start point P1). As the dispenser 200 is continuously and horizontally moved in the process advancing direction, the raw material discharged from the nozzle 210 is applied onto the substrate 10 to form the pattern 11.

在於基板10上形成第一圖案11(即,初始圖案11)的情況下,可在分配器200位於圖案形成開始點P1處之後向分配器200施加排放開始信號。即,當開始從噴嘴210 排放原材料以形成第一圖案11時,分配器200尚未移動。因此,可在使分配器200位於圖案形成開始點P處、向分配器200施加排放開始信號且從噴嘴210排放原材料之後,水平地移動分配器200。因此,可優選在分配器200到達排放開始信號施加點S1時施加排放開始信號以用於形成下一個圖案11,此是因為在基板10上形成初始圖案11之後,分配器200水平地移動以形成下一個圖案11。 In the case where the first pattern 11 (ie, the initial pattern 11) is formed on the substrate 10, the discharge start signal may be applied to the dispenser 200 after the dispenser 200 is located at the pattern formation start point P1. That is, when starting from the nozzle 210 When the raw material is discharged to form the first pattern 11, the dispenser 200 has not moved. Therefore, the dispenser 200 can be horizontally moved after the dispenser 200 is positioned at the pattern formation start point P, the discharge start signal is applied to the dispenser 200, and the raw material is discharged from the nozzle 210. Therefore, it is preferable to apply the discharge start signal for forming the next pattern 11 when the dispenser 200 reaches the discharge start signal application point S1 because the dispenser 200 is horizontally moved to form after the initial pattern 11 is formed on the substrate 10. The next pattern 11.

而且,如果將待形成於基板10上的圖案11劃分成第一區、第二區和第三區(如圖3和圖4中所展示),那麼可將加添到注射器220中以形成圖案11的第一區的壓力調整為加添到注射器中以形成第二區的壓力的約30%到約80%。因此,可調整第一區的厚度,以使得其並不因在圖案11的第一區中產生原材料塊而致使厚于第二區和第三區的厚度。舉例來說,當加添到注射器220中以形成第一區的壓力等於加添到注射器中以形成第二區的壓力時,原材料可成塊地(lumped)集中于第一區中。此是因為:保留在噴嘴210中的原材料與新近從注射器220供應到噴嘴210中的原材料是同時一起被排放的。因此,可將加添到注射器220中以形成圖案11的第一區的壓力調整為加添到注射器中以形成第二區的壓力的約30%到約80%。因此,可防止第一區的厚度歸因於在圖案11的第一區中的原材料塊而導致厚于第二區的厚度。根據示範性實施例,第一區可屬於覆蓋距圖案形成開始點P1約0.5mm的範圍。 Moreover, if the pattern 11 to be formed on the substrate 10 is divided into a first region, a second region, and a third region (as shown in FIGS. 3 and 4), it may be added to the syringe 220 to form a pattern. The pressure in the first zone of 11 is adjusted to be from about 30% to about 80% of the pressure added to the syringe to form the second zone. Therefore, the thickness of the first zone can be adjusted such that it does not cause thicknesses thicker than the second zone and the third zone by creating a block of raw material in the first zone of the pattern 11. For example, when the pressure added to the syringe 220 to form the first zone is equal to the pressure added to the syringe to form the second zone, the raw material may be lumped concentrated in the first zone. This is because the raw material remaining in the nozzle 210 is discharged together with the raw material newly supplied from the syringe 220 to the nozzle 210 at the same time. Accordingly, the pressure added to the first region of the pattern 220 to form the pattern 11 can be adjusted to be about 30% to about 80% of the pressure applied to the syringe to form the second zone. Therefore, the thickness of the first region can be prevented from being thicker than the thickness of the second region due to the raw material block in the first region of the pattern 11. According to an exemplary embodiment, the first zone may belong to a range covering the starting point P1 of the pattern formation by about 0.5 mm.

按順序,在朝向圖案形成結束點P2的方向連續地且 水平地移動分配器200的同時,形成圖案11的第二區和第三區。控制部分400計算排放結束信號施加點S2。此後,如圖4中所展示,當分配器200位於高於排放結束信號施加點S2的位置處時,控制部分400向分配器200施加原材料的排放結束信號。此情況防止:當在水平地移動分配器200的同時在基板10上形成所述多個圖案11(如在示範性實施例中所描述)時,在穿過圖案形成結束點P2之後塗覆原材料。通常,在向分配器200施加排放結束信號之後直到從注射器220到噴嘴210的原材料供應實際上停止為止,需要一段預定時間。即,雖然向分配器200施加排放結束信號,但並不立即停止從噴嘴排放原材料(歸因於保留在噴嘴210中的原材料)。因此,排放結束信號施加點S2可視在向分配器200施加排放結束信號之後仍從噴嘴210排放原材料的長度而定。而且,排放結束信號施加點S2可根據在向分配器200施加排放結束信號之前加添到分配器200的注射器220中的壓力而改變。此可表達為以下等式:“排放結束信號施加點S2=加添到注射器中的壓力×每壓力的長度改變”。此處,每壓力的長度改變表示在向分配器200施加原材料的排放結束信號之後將原材料從噴嘴210塗覆到基板10上的長度。而且,每壓力的長度改變可視分配器200的移動速度和原材料的黏度而定。因此,根據示範性實施例,基於分配器200的移動速度和用於實際過程中的原材料來計算每壓力的長度改變。接著,將計算的數據應用於以下等式以獲得排放結束信號 施加點S2:(排放結束信號施加點S2=加添到注射器中的壓力×每壓力的長度改變)。 In order, continuously in the direction toward the pattern forming end point P2 and While moving the dispenser 200 horizontally, the second and third regions of the pattern 11 are formed. The control section 400 calculates the discharge end signal application point S2. Thereafter, as shown in FIG. 4, when the dispenser 200 is located at a position higher than the discharge end signal application point S2, the control portion 400 applies the discharge end signal of the raw material to the dispenser 200. This case prevents the coating of the raw material after passing through the pattern forming end point P2 when the plurality of patterns 11 are formed on the substrate 10 while moving the dispenser 200 horizontally (as described in the exemplary embodiment) . Generally, it takes a predetermined period of time after the discharge end signal is applied to the dispenser 200 until the supply of raw material from the syringe 220 to the nozzle 210 is actually stopped. That is, although the discharge end signal is applied to the dispenser 200, the discharge of the raw material from the nozzle (due to the raw material remaining in the nozzle 210) is not immediately stopped. Therefore, the discharge end signal application point S2 may be determined depending on the length of the raw material discharged from the nozzle 210 after the discharge end signal is applied to the dispenser 200. Moreover, the discharge end signal application point S2 may be changed according to the pressure added to the syringe 220 of the dispenser 200 before the discharge end signal is applied to the dispenser 200. This can be expressed as the following equation: "Emission end signal application point S2 = pressure added to the syringe x length change per pressure". Here, the change in length per pressure indicates the length of the raw material applied from the nozzle 210 onto the substrate 10 after the discharge end signal of the raw material is applied to the dispenser 200. Moreover, the length of each pressure changes depending on the moving speed of the visual dispenser 200 and the viscosity of the raw material. Therefore, according to an exemplary embodiment, the change in length per pressure is calculated based on the moving speed of the dispenser 200 and the raw materials used in the actual process. Next, the calculated data is applied to the following equation to obtain an emission end signal. Application point S2: (discharge end signal application point S2 = pressure added to the syringe x length change per pressure).

表1說明在施加排放結束信號之後根據壓力改變而將原材料從噴嘴塗覆到基板上的長度。 Table 1 illustrates the length of the raw material applied from the nozzle to the substrate according to the pressure change after the discharge end signal is applied.

參看表1,隨著注射器220內的壓力增加,在施加排放結束信號之後將原材料塗覆到基板10上的長度增加。舉例來說,在將約100Kpa的壓力加添到注射器220中的狀態下,在將原材料塗覆到基板10上之後,停止加添壓力。甚至在停止將壓力加添到注射器220中之後,也保持從噴嘴210排放原材料,以將原材料塗覆到基板10上達約1mm的長度。隨著注射器220內的壓力增加,在施加排放結束信號之後將原材料塗覆到基板10上的長度增加。 Referring to Table 1, as the pressure within the syringe 220 increases, the length of the raw material applied to the substrate 10 after the application of the discharge end signal is increased. For example, in a state where a pressure of about 100 kPa is added to the syringe 220, the pressure is stopped after the raw material is applied onto the substrate 10. Even after the pressure is stopped from being added to the syringe 220, the raw material is kept discharged from the nozzle 210 to apply the raw material to the substrate 10 for a length of about 1 mm. As the pressure within the syringe 220 increases, the length of the raw material applied to the substrate 10 increases after the discharge end signal is applied.

如上文所描述,可將數據應用於以下等式以計算排放結束信號施加點S2:(排放結束信號施加點S2=加添到 注射器中的壓力×每壓力的長度改變)。將排放結束信號施加點S2計算為距離單位。舉例來說,當加添到注射器220中的壓力為約100Kpa時,每壓力的長度改變為約1mm,如表1中所展示。將此情況應用於所述等式,那麼將排放結束信號施加點S2表達為以下等式:S2=100Kpa×(1mm/100Kpa)。因此,計算值為約1mm。當水平移動中之分配器200位於圖案形成結束點P2之前的相距約1mm的位置處時,向分配器200施加原材料的排放結束信號,如圖3中所展示。 As described above, the data can be applied to the following equation to calculate the discharge end signal application point S2: (the discharge end signal application point S2 = added to The pressure in the syringe x the length of each pressure changes). The discharge end signal application point S2 is calculated as a distance unit. For example, when the pressure applied to the syringe 220 is about 100 Kpa, the length of each pressure changes to about 1 mm, as shown in Table 1. Applying this case to the equation, the discharge end signal application point S2 is expressed as the following equation: S2 = 100 Kpa × (1 mm / 100 Kpa). Therefore, the calculated value is about 1 mm. When the horizontally moving dispenser 200 is located at a position of about 1 mm before the pattern formation end point P2, the discharge end signal of the raw material is applied to the dispenser 200, as shown in FIG.

當向分配器200施加原材料的排放結束信號時,停止將壓力加添到注射器220中。而且,設置於注射器220與噴嘴210之間的閥門開始操作以阻斷注射器220與噴嘴210之間的連通。因此,在穿過排放結束信號施加點S2之後,將保留在噴嘴210中的原材料塗覆到基板10上。在上文所描述的過程進展期間,分配器200到達圖案形成結束點P2。如上文所描述,通過在分配器200到達圖案形成結束點P2之前施加該排放結束信號,以有效地防止在穿過圖案形成結束點P2之後排放原材料。因此,可防止在穿過圖案形成結束點P2之後將原材料塗覆到基板10上。 When the discharge end signal of the raw material is applied to the dispenser 200, the addition of pressure to the syringe 220 is stopped. Moreover, the valve disposed between the syringe 220 and the nozzle 210 begins to operate to block communication between the syringe 220 and the nozzle 210. Therefore, the raw material remaining in the nozzle 210 is applied onto the substrate 10 after passing through the discharge end signal application point S2. During the progress of the process described above, the dispenser 200 reaches the patterning end point P2. As described above, the discharge end signal is applied before the dispenser 200 reaches the pattern formation end point P2 to effectively prevent the discharge of the raw material after passing through the pattern formation end point P2. Therefore, it is possible to prevent the raw material from being applied onto the substrate 10 after passing through the pattern forming end point P2.

此後,分配器200可連續地且水平地移動以形成下一個圖案11,而無需停止。通過重複地執行上文所描述的過程,在基板10上形成所述多個圖案11。 Thereafter, the dispenser 200 can be continuously and horizontally moved to form the next pattern 11 without stopping. The plurality of patterns 11 are formed on the substrate 10 by repeatedly performing the processes described above.

雖然在本示範性實施例中形成所述多個圖案以將LCD的上部基板與下部基板彼此電連接,但本發明不限於 此。舉例來說,形成於基板上的所述多個圖案可適用於各種領域。而且,雖然在本實施例中將金屬膏用作用以將上部基板與下部基板彼此電連接的原材料,但本發明不限於此。舉例來說,可將各種材料用作原材料。 Although the plurality of patterns are formed in the present exemplary embodiment to electrically connect the upper substrate and the lower substrate of the LCD to each other, the present invention is not limited to this. For example, the plurality of patterns formed on a substrate can be applied to various fields. Moreover, although the metal paste is used as a raw material for electrically connecting the upper substrate and the lower substrate to each other in the present embodiment, the present invention is not limited thereto. For example, various materials can be used as raw materials.

如上文所描述,在示範性實施例中,水平地移動分配器以將原材料排放到基板上,藉此在基板上形成所述多個圖案。另外,使原材料排放到基板上時的基板與噴嘴之間的間隙等於未將原材料排放到基板上時的基板與噴嘴之間的間隙。因為可在基板上形成所述多個圖案而無需重複地使分配器上升或下降以調整基板與噴嘴之間的間隙,所以可減少整個處理時間。 As described above, in an exemplary embodiment, the dispenser is moved horizontally to discharge the raw material onto the substrate, thereby forming the plurality of patterns on the substrate. In addition, the gap between the substrate and the nozzle when the raw material is discharged onto the substrate is equal to the gap between the substrate and the nozzle when the raw material is not discharged onto the substrate. Since the plurality of patterns can be formed on the substrate without repeatedly raising or lowering the dispenser to adjust the gap between the substrate and the nozzle, the entire processing time can be reduced.

當分配器位於圖案形成開始點之前的位置處時,向分配器施加原材料的排放開始信號。因此,可在所要位置處開始形成圖案。而且,可將加添到注射器中以形成圖案的第一區的壓力調整為加添到注射器中以形成第二區的壓力的約30%到約80%。因此,可防止原材料成塊地集中于第一區中。 When the dispenser is located at a position before the start of pattern formation, a discharge start signal of the raw material is applied to the dispenser. Therefore, the pattern can be formed at the desired position. Moreover, the pressure of the first zone added to the syringe to form the pattern can be adjusted to be from about 30% to about 80% of the pressure added to the syringe to form the second zone. Therefore, it is possible to prevent the raw materials from being concentrated in the first region in a block.

另外,當分配器位於圖案形成結束點之前的位置處時,向分配器施加原材料的排放結束信號。因此,可防止在穿過圖案形成結束點之後將原材料塗覆到基板上。 In addition, when the dispenser is located at a position before the end of the pattern formation, the discharge end signal of the raw material is applied to the dispenser. Therefore, it is possible to prevent the raw material from being applied onto the substrate after passing through the pattern forming end point.

雖然已參考特定實施例來描述有機發光裝置和其製造方法,但其並不限於此。因此,所屬領域技術人員將容易理解,在不偏離由所附申請專利範圍界定的本發明的精神和範圍的情況下,可對本發明作出各種修改和改變。 Although the organic light-emitting device and the method of manufacturing the same have been described with reference to specific embodiments, it is not limited thereto. Accordingly, it will be apparent to those skilled in the art that various modifications and changes of the invention may be made without departing from the spirit and scope of the invention.

雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 While the present invention has been described in its preferred embodiments, the present invention is not intended to limit the invention, and the present invention may be modified and modified without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application.

10‧‧‧基板 10‧‧‧Substrate

11‧‧‧圖案 11‧‧‧ pattern

100‧‧‧平台 100‧‧‧ platform

200‧‧‧分配器 200‧‧‧Distributor

210‧‧‧噴嘴 210‧‧‧Nozzles

220‧‧‧注射器 220‧‧‧Syringe

230‧‧‧主體部份 230‧‧‧ body part

240‧‧‧感測器 240‧‧‧ sensor

250‧‧‧驅動部分 250‧‧‧ Drive section

300‧‧‧傳送部分 300‧‧‧Transfer section

400‧‧‧控制部份 400‧‧‧Control section

圖1為根據示範性實施例的分配器設備的示意圖。 FIG. 1 is a schematic diagram of a dispenser device, in accordance with an exemplary embodiment.

圖2為根據示範性實施例的分配器的截面圖。 2 is a cross-sectional view of a dispenser in accordance with an exemplary embodiment.

圖3為用於解釋排放開始信號施加點的截面圖,其中在通過根據示範性實施例的方法水平地移動分配器時,向所述排放開始信號施加點施加用於從分配器排放原材料的排放開始信號。 3 is a cross-sectional view for explaining a discharge start signal application point, in which discharge for discharging raw materials from a dispenser is applied to the discharge start signal application point when the dispenser is horizontally moved by a method according to an exemplary embodiment Start signal.

圖4為用於解釋排放結束信號施加點的截面圖,其中在通過根據示範性實施例的方法水平地移動分配器時,向所述排放結束信號施加點施加用於從分配器排放原材料的排放結束信號。 4 is a cross-sectional view for explaining a discharge end signal application point, in which emission of a raw material discharged from a dispenser is applied to the discharge end signal application point when the dispenser is horizontally moved by a method according to an exemplary embodiment End signal.

圖5為用於解釋根據示範性實施例的分配器的水平移動的截面圖。 FIG. 5 is a cross-sectional view for explaining horizontal movement of a dispenser according to an exemplary embodiment.

10‧‧‧基板 10‧‧‧Substrate

11‧‧‧圖案 11‧‧‧ pattern

200‧‧‧分配器 200‧‧‧Distributor

Claims (12)

一種用於控制分配器設備的方法,所述分配器設備包含存儲原材料的注射器、將所述原材料排放到基板上的噴嘴、控制所述注射器與所述噴嘴之間的連通的閥門,和經調適以在所述基板上形成彼此間隔開的多個圖案的分配器,所述方法包含:水平地移動所述分配器以將所述原材料排放到所述基板上,藉此形成所述多個圖案,其中所述原材料排放到所述基板上時的所述基板與所述噴嘴之間的間隙等於未將所述原材料排放到所述基板上時的所述基板與所述噴嘴之間的間隙,其中,在所述襯底上開始形成每一個圖案的圖案形成開始點以及結束形成所述圖案的圖案形成結束點之間的區域,被沿著從所述圖案形成開始點到所述圖案形成結束點的方向劃分成第一區、第二區和第三區,並且,加添到所述注射器中以在所述第一區形成圖案的壓力被調整為加添到所述注射器中以在所述第二區形成圖案的壓力的30%到80%。 A method for controlling a dispenser device, the dispenser device comprising a syringe storing a raw material, a nozzle for discharging the raw material onto a substrate, a valve for controlling communication between the syringe and the nozzle, and adapted A dispenser for forming a plurality of patterns spaced apart from each other on the substrate, the method comprising: horizontally moving the dispenser to discharge the raw material onto the substrate, thereby forming the plurality of patterns a gap between the substrate and the nozzle when the raw material is discharged onto the substrate is equal to a gap between the substrate and the nozzle when the raw material is not discharged onto the substrate, Wherein, a region between the pattern formation start point at which the formation of each pattern is started on the substrate and the pattern formation end point at which the pattern is formed is formed, from the start of the pattern formation to the end of the pattern formation The direction of the dots is divided into a first zone, a second zone, and a third zone, and a pressure added to the syringe to form a pattern in the first zone is adjusted to be added to the Syringe to form a pattern of pressure in said second region is 30% to 80%. 如申請專利範圍第1項所述的方法,其中在水平地移動所述分配器期間,在所述過程期間將所述原材料排放到所述基板上時的所述基板與所述噴嘴之間的所述間隙保持著,而並不重複地通過使所述分配器上升或下降而調整所述間隙。 The method of claim 1, wherein during the horizontal movement of the dispenser, between the substrate and the nozzle when the raw material is discharged onto the substrate during the process The gap is maintained without repeatedly adjusting the gap by raising or lowering the dispenser. 如申請專利範圍第1項所述的方法,其進一步包含 將所述原材料排放到所述基板上以形成所述圖案之前,向所述分配器施加所述原材料的排放開始信號。 The method of claim 1, further comprising A discharge start signal of the raw material is applied to the dispenser before discharging the raw material onto the substrate to form the pattern. 如申請專利範圍第1項所述的方法,其進一步包含在所述分配器位於每一個圖案的所述圖案形成結束點之前的位置處時,向所述分配器施加所述原材料的排放結束信號。 The method of claim 1, further comprising applying a discharge end signal of the raw material to the dispenser when the dispenser is located at a position before the pattern formation end point of each pattern . 如申請專利範圍第1項所述的方法,其中在所述分配器位於所述圖案形成開始點之前的位置處時,向所述分配器施加所述原材料的排放開始信號。 The method of claim 1, wherein the discharge start signal of the raw material is applied to the dispenser when the dispenser is located at a position before the pattern formation start point. 如申請專利範圍第5項所述的方法,其中所述排放開始信號施加點是通過所述分配器的移動速度、所述注射器內的壓力加添時間和所述閥門的操作時間來調整。 The method of claim 5, wherein the discharge start signal application point is adjusted by a moving speed of the dispenser, a pressure addition time in the syringe, and an operation time of the valve. 如申請專利範圍第6項所述的方法,其中所述排放開始信號施加點是通過以下等式而計算:“排放開始信號施加點=分配器的移動速度×注射器內的壓力加添時間×閥門的操作時間”。 The method of claim 6, wherein the discharge start signal application point is calculated by the following equation: "discharge start signal application point = moving speed of the dispenser x pressure in the syringe plus time x valve Operating time". 如申請專利範圍第7項所述的方法,其中所述排放開始信號施加點位於所述圖案形成開始點之前的相距所計算的值的位置處,且與所述圖案形成開始點相距由所述等式的“排放開始信號施加點=分配器的移動速度×注射器內的壓力加添時間×閥門的操作時間”計算得到的值。 The method of claim 7, wherein the emission start signal application point is located at a position apart from the calculated value before the pattern formation start point, and is spaced apart from the pattern formation start point by the The value calculated by the "emission start signal application point = moving speed of the dispenser x pressure addition time in the syringe x operating time of the valve" of the equation. 如申請專利範圍第1項所述的方法,其中所述圖案的所述第一區屬於覆蓋距所述圖案形成開始點約0.5mm的範圍。 The method of claim 1, wherein the first region of the pattern belongs to a range covering about 0.5 mm from the beginning of the pattern formation. 如申請專利範圍第1項所述的方法,其中在所述分配器位於所述圖案形成結束點之前的位置處時,向所述分配器施加所述原材料的排放結束信號。 The method of claim 1, wherein the discharge end signal of the raw material is applied to the dispenser when the dispenser is located at a position before the end of the pattern formation. 如申請專利範圍第10項所述的方法,其中所述排放結束信號施加點是通過以下等式而計算為距離值:“排放結束信號施加點S2=加添到注射器中的壓力×每壓力的長度改變”。 The method of claim 10, wherein the discharge end signal application point is calculated as a distance value by the following equation: "discharge end signal application point S2 = pressure added to the syringe x per pressure The length changes." 如申請專利範圍第11項所述的方法,其中所述排放結束信號施加點位於所述圖案形成結束點之前的相距所計算的值的位置處。 The method of claim 11, wherein the discharge end signal application point is located at a position apart from the calculated value before the pattern formation end point.
TW099135454A 2009-10-19 2010-10-18 Method for controlling dispenser apparatus TWI449576B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020090099315A KR101089748B1 (en) 2009-10-19 2009-10-19 Method for controlling despenser appratus

Publications (2)

Publication Number Publication Date
TW201114503A TW201114503A (en) 2011-05-01
TWI449576B true TWI449576B (en) 2014-08-21

Family

ID=44047969

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099135454A TWI449576B (en) 2009-10-19 2010-10-18 Method for controlling dispenser apparatus

Country Status (4)

Country Link
JP (1) JP5349443B2 (en)
KR (1) KR101089748B1 (en)
CN (1) CN102101094B (en)
TW (1) TWI449576B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI782912B (en) * 2016-05-12 2022-11-11 美商伊利諾工具工程公司 System of dispensing material on a substrate with a solenoid valve of a pneumatically-driven dispensing unit

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015153721A (en) * 2014-02-19 2015-08-24 住友電装株式会社 Method of manufacturing electrical wire with terminal

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0163170U (en) * 1987-10-16 1989-04-24
JP2000301042A (en) * 1999-04-19 2000-10-31 Nec Corp Resin coating device
JP2002033340A (en) * 2000-07-18 2002-01-31 Matsushita Electric Ind Co Ltd Device and method for applying bonding paste
TW200914149A (en) * 2007-05-18 2009-04-01 Musashi Engineering Inc Method and apparatus for discharging liquid material
TW200932378A (en) * 2008-01-28 2009-08-01 Top Eng Co Ltd Method of dispensing paste using paste dispenser and pneumatic supply apparatus used therefor

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000288452A (en) * 1999-04-02 2000-10-17 Matsushita Electric Ind Co Ltd Paste applying device and paste applying method
US6605315B1 (en) * 1999-11-05 2003-08-12 Matsushita Electric Industrial Co., Ltd. Bonding paste applicator and method of using it
KR101146437B1 (en) * 2005-06-30 2012-05-21 엘지디스플레이 주식회사 Coater and operating method thereof
KR100649962B1 (en) 2006-06-28 2006-11-29 주식회사 탑 엔지니어링 Head unit of paste dispenser
KR100752237B1 (en) 2006-09-20 2007-08-28 주식회사 탑 엔지니어링 Method for measuring distance between nozzle and gap sensor of paste dispenser
JP4389953B2 (en) * 2007-03-22 2009-12-24 セイコーエプソン株式会社 Pattern formation method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0163170U (en) * 1987-10-16 1989-04-24
JP2000301042A (en) * 1999-04-19 2000-10-31 Nec Corp Resin coating device
JP2002033340A (en) * 2000-07-18 2002-01-31 Matsushita Electric Ind Co Ltd Device and method for applying bonding paste
TW200914149A (en) * 2007-05-18 2009-04-01 Musashi Engineering Inc Method and apparatus for discharging liquid material
TW200932378A (en) * 2008-01-28 2009-08-01 Top Eng Co Ltd Method of dispensing paste using paste dispenser and pneumatic supply apparatus used therefor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI782912B (en) * 2016-05-12 2022-11-11 美商伊利諾工具工程公司 System of dispensing material on a substrate with a solenoid valve of a pneumatically-driven dispensing unit

Also Published As

Publication number Publication date
CN102101094A (en) 2011-06-22
CN102101094B (en) 2014-09-03
JP5349443B2 (en) 2013-11-20
TW201114503A (en) 2011-05-01
JP2011083771A (en) 2011-04-28
KR101089748B1 (en) 2011-12-07
KR20110042582A (en) 2011-04-27

Similar Documents

Publication Publication Date Title
US8888548B2 (en) Apparatus of dispensing liquid crystal using the ultrasonic wave
KR100778147B1 (en) Dispensing apparatus for manufacturing liquid display panel
TWI617361B (en) Method for dispensing paste and substrate having paste pattern formed thereon by the method
JPH0992134A (en) Nozzle application method and device
CN103995397B (en) Spray equipment and orientation liquid painting method
JPWO2017115486A1 (en) Resin film peeling method and apparatus, electronic device manufacturing method and organic EL display device manufacturing method
KR100807824B1 (en) Paste dispenser
WO2018072545A1 (en) Coating method, coating apparatus and light-emitting device
TWI449576B (en) Method for controlling dispenser apparatus
KR102158033B1 (en) Coating layer forming method using slit nozzle and coating apparatus
TWI462780B (en) Dispenser apparatus and method for controlling the same
KR20070074269A (en) Dispensing head for paste dispenser
KR101288990B1 (en) Apparatus for protecting dispenser condensation and method for operating the same
KR20110042733A (en) Apparatus and method for positioning substrate
JPH11262714A (en) Coating method and apparatus for applying coating liquid to uneven substrate and method and apparatus for manufacturing member for plasma display
JP5269130B2 (en) Substrate processing apparatus and processing liquid supply method
JP2003178677A (en) Phosphor filling device for plasma display panel
TWI660792B (en) Method and apparatus for preventing liquid condensation in dispenser
JP2000153199A (en) Method and apparatus for coating, and method and apparatus for producing plasma display
KR20150145874A (en) An application apparatus for panels with adhesive material and application method of using the same apparatus.
KR101576325B1 (en) Apparatus for forming flatness of glass substrate using the same
KR101631527B1 (en) Method for repairing paste pattern and substrate having paste pattern repaired by using the method
KR20120132401A (en) Application device
KR20160080452A (en) Substrate coater apparatus and the method of coating substrate using thereof
JP2000354810A (en) Coating apparatus and method and plasma display and apparatus and method for producing member for display

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees