TWI437939B - Printed circuit board and manufacturing method thereof - Google Patents
Printed circuit board and manufacturing method thereof Download PDFInfo
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- TWI437939B TWI437939B TW099146316A TW99146316A TWI437939B TW I437939 B TWI437939 B TW I437939B TW 099146316 A TW099146316 A TW 099146316A TW 99146316 A TW99146316 A TW 99146316A TW I437939 B TWI437939 B TW I437939B
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1283—After-treatment of the printed patterns, e.g. sintering or curing methods
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- Manufacturing Of Printed Wiring (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Description
本案發明係關於印刷電路板及其製造方法。The invention of the present invention relates to a printed circuit board and a method of manufacturing the same.
多層印刷電路板之製造通常係在印刷電路基板(第3圖B,1)上,直接疊層(因應所需附銅箔之)預浸體(第3圖B,3),之後進行熱壓(第3圖B,4)而被執行。藉由熱壓,預浸體係與印刷電路基板壓接之同時,完全硬化(第3圖C,7)。Multilayer printed circuit boards are usually fabricated on a printed circuit board (Fig. 3, B, 1), directly laminated (in response to the required copper foil) prepreg (Fig. 3, B, 3), followed by hot pressing. (Fig. 3, B, 4) is executed. By the hot pressing, the prepreg system is completely cured while being pressed against the printed circuit board (Fig. 3, C, 7).
但是,如此所製造出之以往之預浸體覆蓋多層印刷電路板係在電路(第3圖C,2)上僅預浸體表面以電路厚度量隆起(第3圖C,5),缺少平坦性。並且,預浸體無法充分被填充在電路之接根部之每一個角落,在該部分產生空隙或空洞(第3圖C,6)。其結果,所取得之多層印刷電路板有電性熱性信賴性差之問題。However, the conventional prepreg-covered multilayer printed circuit board thus manufactured is only embossed in the circuit thickness (Fig. 3, C, 5) on the circuit (Fig. 3, C, 2), and lacks flatness. Sex. Further, the prepreg cannot be sufficiently filled in every corner of the root of the circuit, and voids or voids are generated in this portion (Fig. 3, C). As a result, the obtained multilayer printed circuit board has a problem of poor electrical reliability.
在此,為了解決如此之問題,進行以下之製造方法。即是,首先在印刷電路基板(第4圖B,1)表面上全面塗佈底塗油墨(第4圖B,8)。接著,完全硬化塗佈油墨(第4圖C,9)。此時,電路上中之完全硬化層部分因僅有電路厚度量隆起(第4圖C,5),故至電路露出為止,全面研磨完全硬化層,並使印刷電路基板平坦化(第4圖D)(專利文獻1之第4圖等)。之後,在事先平坦化之印刷電路基板表面上疊層預浸體(第4圖E,3),並施予熱壓(第4圖E,4)。藉由熱壓,預浸體係與完全硬化層(第4圖F,9)壓接之同時,完全硬化(第4圖F,7)。如此一來,製造出被平坦化之預浸體覆蓋多層印刷電路板(第4圖F)。Here, in order to solve such a problem, the following manufacturing method is performed. That is, first, the undercoat ink is completely applied to the surface of the printed circuit board (Fig. 4, B, 1) (Fig. 4, B, 8). Next, the coating ink is completely cured (Fig. 4, C, 9). At this time, the portion of the fully hardened layer on the circuit is raised only by the thickness of the circuit (Fig. 4, C, 5), so that the entire hardened layer is completely polished and the printed circuit board is flattened until the circuit is exposed (Fig. 4) D) (Fig. 4 of Patent Document 1, etc.). Thereafter, the prepreg (Fig. 4, 3) is laminated on the surface of the printed circuit board which has been previously flattened, and hot pressing is applied (Fig. 4, 4). By hot pressing, the prepreg system is completely cured while being pressed against the fully hardened layer (Fig. 4, F, 9) (Fig. 4, F, 7). In this way, the flattened prepreg is coated to cover the multilayer printed circuit board (Fig. 4F).
但是,在如此之製造方法中,因進行表面研磨,故產生以下之問題。即是,有於表面之研磨時,研磨至電路表面為止之電路受損、磨壞,印刷電路基板之尺寸變化變大,並且生產率下降之問題。However, in such a manufacturing method, the following problems occur due to surface polishing. In other words, when the surface is polished, the circuit polished to the surface of the circuit is damaged or worn, and the dimensional change of the printed circuit board is increased, and the productivity is lowered.
[專利文獻][Patent Literature]
[專利文獻1]日本特開2006-108163號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2006-108163
鑒於上述情形,本案發明係以不進行表面研磨,製造出平坦化之預浸體覆蓋印刷電路板為目的。In view of the above circumstances, the present invention has an object of producing a flattened prepreg covering a printed circuit board without surface grinding.
為了達成上述目的,本案發明者精心研究結果,完成以下之本案發明。In order to achieve the above object, the inventors of the present invention carefully studied the results and completed the following invention.
即是,本案第1發明係提供一種印刷電路板之製造方法,至少由下述工程構成(I)將熱硬化型樹脂油墨或光、熱兩段化硬化型樹脂油墨塗佈在印刷電路基板表面上之至少凸部及/或凹部之後,使塗佈油墨半硬化之工程;(II)以構件之平坦面來到半硬化樹脂上之方式,使構件載置在半硬化樹脂上的工程;和(III)將構件和印刷電路基板在半硬化樹脂之軟化溫度以上之加熱下壓接至半硬化樹脂完全硬化為止之工程。That is, the first invention of the present invention provides a method of manufacturing a printed circuit board, comprising at least the following engineering composition (I) coating a thermosetting resin ink or a light-and-thermal two-stage hardening type resin ink on a surface of a printed circuit board. a process of semi-hardening the coating ink after at least the convex portion and/or the concave portion; (II) a process of placing the member on the semi-hardened resin in such a manner that the flat surface of the member comes onto the semi-hardened resin; (III) A process in which the member and the printed circuit board are pressure-bonded under heating by a softening temperature of the semi-hardened resin until the semi-hardened resin is completely cured.
本案第2發明係提供本案第1發明之印刷電路板之製造方法,其中熱硬化型樹脂油墨含有:環氧樹脂、酸酐及熱硬化劑,光、熱兩段硬化型樹脂油墨含有:含乙烯性不飽和雙鍵鍵結化合物、光反應起始劑、環氧樹脂及熱硬化劑。According to a second aspect of the invention, there is provided a method of producing a printed circuit board according to the first aspect of the invention, wherein the thermosetting resin ink comprises: an epoxy resin, an acid anhydride, and a thermal hardener; and the optical and thermal two-stage hardening resin ink contains: ethylene-containing Unsaturated double bond bonding compound, photoreaction initiator, epoxy resin and thermal hardener.
本案第3發明係提供本案第1發明或第2發明之印刷電路板之製造方法,其中凸部為電路,凹部為電路間。According to a third aspect of the invention, there is provided a method of manufacturing a printed circuit board according to the first aspect or the second aspect of the invention, wherein the convex portion is a circuit and the concave portion is an inter-circuit.
本案第4發明係提供本案第3發明之印刷電路板之製造方法,其中電路為電路厚度35μm以上之銅電路。According to a fourth aspect of the invention, there is provided a method of manufacturing a printed circuit board according to the third aspect of the invention, wherein the circuit is a copper circuit having a circuit thickness of 35 μm or more.
本案第5發明係提供本案第1發明~第4發明中之任一的印刷電路板之製造方法,其中構件為預浸體、銅箔、附有銅箔預浸體及疊層該些兩個以上者中之任一者。According to a fifth aspect of the invention, there is provided a method of manufacturing a printed circuit board according to any one of the first invention to the fourth aspect, wherein the member is a prepreg, a copper foil, a copper foil prepreg, and a laminate of the two Any of the above.
本案第6發明係提供一種印刷電路板,係藉由本案第1發明~第5發明中之任一的印刷電路板之製造方法而製造出。According to a sixth aspect of the invention, there is provided a printed circuit board produced by the method of manufacturing a printed circuit board according to any one of the first to fifth aspects of the invention.
藉由本案發明可以不用進行表面研磨,製造出被平坦化之預浸體覆蓋印刷電路板。其結果,可以防止電路之損傷、磨壞、印刷電路基板之尺寸變化、生產率下降等。According to the present invention, it is possible to produce a flattened prepreg covering the printed circuit board without performing surface grinding. As a result, it is possible to prevent damage or abrasion of the circuit, dimensional change of the printed circuit board, and deterioration in productivity.
以下,使用圖面詳細敘述本案發明。Hereinafter, the present invention will be described in detail using the drawings.
本案發明之製造方法中,首先,工程(I)係將熱硬化樹脂油墨或光、熱兩段硬化(第一段光硬化+第二段熱硬化)型樹脂油墨(第1圖B,10)塗佈(第1圖B)在印刷電路基板(第1圖B,1)表面上之至少凸部(第1圖B,2)及/或凹部(第1圖B,13)之後,使塗佈油墨半硬化(第1圖C,11)。In the manufacturing method of the invention of the present invention, first, the engineering (I) is a thermosetting resin ink or a two-stage hardening (first-stage photo-curing + second-stage thermosetting) type resin ink (Fig. 1B, 10). Coating (Fig. 1B) is applied to at least the convex portions (Fig. 1B, 2) and/or the concave portions (Fig. 1 and B, 13) on the surface of the printed circuit board (Fig. 1B, 1). The cloth ink is semi-hardened (Fig. 1 C, 11).
在工程(I)中,熱硬化型樹脂油墨可舉出含有環氧樹脂、酸酐及熱硬化劑者。In the item (I), the thermosetting resin ink may include an epoxy resin, an acid anhydride, and a heat curing agent.
在熱硬化型樹脂油墨中,作為環氧樹脂,具體而言可舉出酚醛型環氧樹脂化合物[酚酚醛樹脂型環氧樹脂、甲酚酚醛型環氧樹脂等]、雙酚型環氧樹脂化合物[雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂等]、三苯甲烷型環氧樹脂、N-環氧丙基型環氧樹脂、脂環式環氧樹脂等之一個以上。In the thermosetting resin ink, specific examples of the epoxy resin include a novolac type epoxy resin compound [phenol phenol resin type epoxy resin, cresol novolac type epoxy resin, etc.], and a bisphenol type epoxy resin. Compound [bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol S epoxy resin, etc.], triphenylmethane epoxy resin, N-epoxypropyl epoxy resin, alicyclic One or more of epoxy resins.
在熱硬化型樹脂油墨中,作為酸酐,具體而言可舉出二元酸酐[順丁烯二酸酐、琥珀酸酐、伊康酸酐、酞酸酐、四氫化鄰苯二甲酸酐、六氫鄰苯二甲酸酐、甲基鄰苯二甲酸酐、內亞甲基四氫化鄰苯二甲酸酐、甲基內亞甲基四氫化鄰苯二甲酸酐、氯橋酸酐、甲基四氫苯酐等]、芳香族多元羧酸酐[偏苯三酸酐、苯均四酸酐、二苯酮四羧酸二酐等]、多元羧酸酐衍生物[5-(2,5-二氧四氫呋喃)-3-甲基-3-環己烯-1,2-二碳酸酑等]等之一個以上。In the thermosetting resin ink, specific examples of the acid anhydride include a dibasic acid anhydride [maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, and hexahydroortylene). Formic anhydride, methyl phthalic anhydride, endomethylene tetrahydrophthalic anhydride, methyl endethylene tetrahydrophthalic anhydride, chloro-bromic anhydride, methyl tetrahydrophthalic anhydride, etc., aromatic Group polycarboxylic acid anhydride [trimellitic anhydride, pyromellitic anhydride, benzophenone tetracarboxylic dianhydride, etc.], polycarboxylic anhydride derivative [5-(2,5-dioxotetrahydrofuran)-3-methyl-3-cyclohexane One or more of ene-1,2-dicarbonate, etc.
在熱硬化型樹脂油墨中,作為熱硬化劑具體而言可舉出胺化合物類、咪唑化合物類、羧酸類、酚類、第四級銨鹽類、含羥甲基化合物類、二氰二胺、二氨基三嗪化合等之一個以上。In the thermosetting resin ink, specific examples of the thermosetting agent include amine compounds, imidazole compounds, carboxylic acids, phenols, fourth-order ammonium salts, methylol-containing compounds, and dicyandiamide. And one or more of diaminotriazine compounds.
熱硬化樹脂油墨中,作為其他添加劑,含有填充劑、著色用顏料、密接性賦予劑、消泡劑、均勻劑、溶劑、防垂流劑等之一個以上。In the thermosetting resin ink, one or more of a filler, a pigment for coloring, an adhesion imparting agent, an antifoaming agent, a homogenizing agent, a solvent, and an anti-sagging agent are contained as other additives.
在熱硬化型樹脂之組成中,當環氧樹脂100重量份時,各以酸酐1~10(尤其2~5)重量份,及熱硬化劑1~30(尤其4~10)重量份為佳。In the composition of the thermosetting resin, when the epoxy resin is 100 parts by weight, each of the acid anhydride is preferably 1 to 10 (especially 2 to 5) parts by weight, and the thermosetting agent is preferably 1 to 30 (especially 4 to 10 parts by weight). .
在工程(I)中,光、熱裡兩段硬化型樹脂油墨可舉出含有含乙烯性不飽和雙鍵鍵結化合物、光反應起始劑、環氧樹脂及熱硬化劑者。In the work (I), the two-stage hardening type resin ink in the light and heat may be a compound containing an ethylenically unsaturated double bond bond, a photoreaction initiator, an epoxy resin, and a heat hardener.
光、熱兩段應化型樹脂油墨中,含有乙烯性不飽和雙鍵化合物可舉出含(甲基)丙烯基樹脂。作為(甲基)丙烯基樹脂,可舉出由(甲基)丙烯酸類及/或(甲基)丙烯酸酯類[也指(甲基)丙烯酸(酯)類]所構成之聚合物,以及由(甲基)丙烯酸(酯)類和「其他單體」所構成之聚合物。In the light-and-hot two-stage resin ink, the (meth) propylene-based resin may be mentioned as the ethylenically unsaturated double bond compound. Examples of the (meth)acryl-based resin include polymers composed of (meth)acrylic acid and/or (meth)acrylic acid esters (also referred to as (meth)acrylic acid esters), and A polymer composed of (meth)acrylic acid (ester) and "other monomer".
在含(甲基)丙烯基樹脂中,就以(甲基)丙烯酸(酯)類而言,具體地可舉出(甲基)丙烯酸、(甲基)丙烯酸甲酯或丙烯酸乙酯、(甲基)丙烯酸月桂酯、(甲基)丙烯酸十八酯、(甲基)丙烯酸二茂基酯、(甲基)丙烯酸異酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸乙二醇一甲酯或丙烯酸乙二醇一乙酯、乙二醇二甲基丙烯酸、乙二醇二乙氧甲基丙烯酸、(甲基)丙烯酸三甘油酯、(甲基)丙烯酸三羥甲基丙烷酯、(甲基)丙烯酸聚二季戊四醇六丙酯、(甲基)烯丙酸乙氧乙酯、(甲基)丙烯酸羥乙酯、(甲基)丙烯酸四氫糠酯、ε-(甲基)丙烯酸己內酯變性丙烯酸四氫糠酯、(甲基)丙烯酸二甲胺乙酯、(甲基)丙烯酸醯胺、(甲基)丙烯醯胺、雙丙酮丙烯醯胺、N-羥甲基丙烯酰胺、N-丁氧基甲基丙烯醯胺、(甲基)丙烯酸卡必醇、甲基丙烯酸2-羧乙基或丙基、(甲基)丙烯酸甘油酯等之一個以上。Among the (meth)acryl-based resins, specific examples of (meth)acrylic acid (meth)acrylic acid, methyl (meth)acrylate or ethyl acrylate, (A) Base) lauryl acrylate, octadecyl (meth) acrylate, dimethoxy (meth) acrylate, iso (meth) acrylate, benzyl (meth) acrylate, ethylene glycol (meth) acrylate Ester or ethylene glycol monoethyl acrylate, ethylene glycol dimethacrylate, ethylene glycol diethoxy methacrylic acid, triglyceride (meth) acrylate, trimethylolpropane (meth) acrylate, ( Methyl)acrylic acid dipentaerythritol hexapropyl ester, (meth) allylate ethoxyethyl ester, hydroxyethyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, ε-(meth) acrylate Lactone denatured tetrahydrofurfuryl acrylate, dimethylamine ethyl (meth)acrylate, decyl (meth)acrylate, (meth) acrylamide, diacetone acrylamide, N-methylol acrylamide, One or more of N-butoxymethyl acrylamide, carbitol (meth) acrylate, 2-carboxyethyl methacrylate or propyl group, and glyceryl (meth) acrylate.
含(甲基)丙烯基樹脂中,作為「其他單體」,具體地可舉出二乙烯基苯、α-甲基苯乙烯、乙烯基甲苯、p-氯苯乙烯、丁二烯、異戊二烯、氯丁二烯、甲異丙烯甲酮、醋酸乙烯、VeoVa(殼牌化學製品)、丙酸乙烯酯、三甲基乙酸乙烯酯、(甲基)丙烯腈等之一個以上。Among the (meth) propylene-based resins, specific examples of the "other monomer" include divinylbenzene, α-methylstyrene, vinyltoluene, p-chlorostyrene, butadiene, and isoprene. One or more of diene, chloroprene, methacryl ketone, vinyl acetate, VeoVa (shell chemical), vinyl propionate, trimethyl vinyl acetate, (meth) acrylonitrile, and the like.
含(甲基)丙烯基樹脂之重量平均分子量以例如500~10000(尤其1000~3000)為佳。The weight average molecular weight of the (meth)acryl-containing resin is preferably, for example, 500 to 10,000 (especially 1,000 to 3,000).
作為其他之含乙烯性不飽和雙鍵鍵結化合物可舉出含(甲基)丙烯基單體。就以含(甲基)丙烯基單體而言,具體地可舉出上述(甲基)丙烯酸(酯)類等。Examples of the other ethylenically unsaturated double bond-bonding compound include a (meth)acryl-containing monomer. The (meth)acryl-based monomer may specifically be the above-mentioned (meth)acrylic acid or the like.
在光、熱兩段硬化型樹脂油墨中,就以光反應起始劑而言,具體地可舉出醇酮類、聯苯醯縮二甲醇類、醯基膦氧化物類、胺酮類、安息香醚類、苯甲醯基化合物類、二苯甲酮類、噻噸酮類、雙咪唑類、二甲胺基安息香酸酯類、三芳基硫鹽、蒽醌類、吖啶酮類、吖啶類、咔唑類、鈦錯合物等之一個以上。In the light-and-thermal two-stage curable resin ink, examples of the photoreactive initiator include alcohol ketones, biphenyl dimethyl dimethyl ketones, mercapto phosphine oxides, and amine ketones. Benzoin ethers, benzamidine compounds, benzophenones, thioxanthones, biimidazoles, dimethylaminobenzoate, triarylsulfonates, terpenes, acridones, anthraquinones One or more of a pyridine, a carbazole, a titanium complex, and the like.
在光、熱兩段硬化型樹脂油墨中,就以環氧樹脂及熱硬化劑而言,具體可舉出在上述熱硬化型樹脂油墨中各例示者等。In the case of the heat-curable resin ink, the epoxy resin and the heat-curing agent are specifically exemplified in the above-mentioned thermosetting resin ink.
在光、熱兩段硬化型樹脂油墨中,就以其他添加劑而言,可舉出增感劑、重合禁止劑及上述熱硬化型樹脂油墨中所例示者等。Examples of the other additives include a sensitizer, a superposition inhibiting agent, and the above-mentioned thermosetting resin ink.
在光、熱兩段硬化型樹脂油墨之組成中,當含乙烯性不飽和雙鍵鍵結化合物100之重量份時,則以光反應起始劑0.1~10(尤其1~5)重量份、環氧樹脂10~100(尤其20~50)重量份以及熱硬化劑1~20(尤其2~10)重量份為佳。In the composition of the light-and-hot two-stage hardening type resin ink, when the weight ratio of the ethylenically unsaturated double bond-bonding compound 100 is 100, the photoreactive initiator is 0.1 to 10 (especially 1 to 5) parts by weight. The epoxy resin is preferably used in an amount of 10 to 100 (especially 20 to 50) parts by weight and 1 to 20 parts by weight (particularly 2 to 10 parts by weight).
在工程(I)中,就以凸部而言,具體地可舉出電路、晶片零件、被表面安裝之裸晶等。本案發明效果(尤其,印刷電路板之平坦化)係凸部之厚度(自基板表面的高度)越大,越顯著發揮。就以如此之凸部,可舉出例如厚壁(具體而言,電路厚度35μm以上,典型為50~600μm)之電路(銅電路等)。In the case of the project (I), the convex portion may specifically include a circuit, a wafer component, a surface-mounted bare crystal, or the like. The effect of the present invention (especially, the flatness of the printed circuit board) is such that the thickness of the convex portion (the height from the surface of the substrate) is larger and more prominent. Examples of such a convex portion include a circuit (a copper circuit or the like) having a thick wall (specifically, a circuit thickness of 35 μm or more, typically 50 to 600 μm).
在工程(I)中,就以凹部而言,可舉出凸部和凸部之間隙(電路間等)、電洞(引孔、通孔等)。In the case of the project (I), the recessed portion may be a gap between the convex portion and the convex portion (such as between circuits) or a hole (a via hole, a through hole, or the like).
在工程(I)中,至少在凸部(全部或一部分)及/或凹部(全部或一部分)塗佈。具體而言,塗佈係對例如凸部之全部及凹部之全部(包含印刷電路基板之全面塗佈)(第1圖)、凸部之一部分及凹部之全部(第2圖A)、凸部(僅)之全部(第2圖B)或凹部(僅)之全部(第2圖C)進行。塗佈量於例如塗佈凸部之全部及凹部之全部之時,當凸部為電路時,電路上以5~50(尤其10~30)μm、電路間為電路厚度之0.7~1.0(尤其0.8~0.9倍)之厚度為佳。當塗佈量過多時於壓接構件之時從周邊部露出之露出量增多,當過少時則無法取得充分之平坦性。塗佈可以藉由例如網版印刷、金屬遮罩印刷、輥筒塗佈印刷、棒塗佈印刷等來執行。In the engineering (I), at least the convex portion (all or part of) and/or the concave portion (all or part of) are coated. Specifically, the coating is applied to all of the convex portions and all the concave portions (including the entire coating of the printed circuit board) (first drawing), one of the convex portions and the concave portion (second FIG. A), and the convex portion. All of (only) (Fig. 2B) or recesses (only) (Fig. 2C) are performed. When the coating amount is applied to all of the convex portions and the entire concave portion, for example, when the convex portion is a circuit, the circuit is 5 to 50 (especially 10 to 30) μm, and the circuit is 0.7 to 1.0 of the circuit thickness (especially The thickness is preferably 0.8 to 0.9 times. When the coating amount is too large, the amount of exposure from the peripheral portion at the time of the pressure-bonding member increases, and when it is too small, sufficient flatness cannot be obtained. Coating can be performed by, for example, screen printing, metal mask printing, roll coating printing, bar coating printing, and the like.
在工程(I)中,使塗佈油墨半硬化。「半硬化」也包含單段硬化型樹脂之不完全硬化,以及多段硬化型樹脂之中途階段硬化。上述熱硬化型樹脂油墨之半硬化係藉由例如80~130(尤其100~120)℃,10~60(尤其20~30)分鐘之加熱而進行。上述光、熱兩段硬化型樹脂油墨之半硬化(第一段光硬化)係藉由波長300~500(尤其350~450)nm,照射量0.1~5(尤其0.5~2)J/cm2 之光照射而進行。In the work (I), the coating ink is semi-hardened. "Semi-hardening" also includes incomplete hardening of a single-stage hardening type resin, and hardening of a multi-stage hardening type resin in the middle. The semi-hardening of the thermosetting resin ink is carried out by, for example, heating at 80 to 130 (especially 100 to 120) ° C for 10 to 60 (especially 20 to 30) minutes. The semi-hardening (first-stage photocuring) of the above-mentioned light- and heat-stage hardening type resin ink is performed by a wavelength of 300 to 500 (especially 350 to 450) nm, and an irradiation amount of 0.1 to 5 (especially 0.5 to 2) J/cm 2 The light is irradiated.
接著,在工程(II)中,以構件之平坦面來到半硬化樹脂面上之方式,使構件(第1圖D、3)載置在半硬化樹脂(第1圖D,11)上。Next, in the item (II), the members (Figs. D and 3) are placed on the semi-cured resin (Figs. D and 11) so that the flat surface of the member comes to the semi-hardened resin surface.
在工程(II)中,構件至少係單面為平坦面,例如薄膜、薄片或平板狀。就以構件而言,具體地可舉出預浸體、銅箔、附銅箔預浸體以及疊層該些兩個以上者等。In the engineering (II), the member is at least one side flat, such as a film, a sheet or a flat plate. Specific examples of the member include a prepreg, a copper foil, a copper foil prepreg, and a laminate of two or more of them.
在工程(II)中,使構件載置在半硬化樹脂上。此時,以構件之平坦面來到半硬化樹脂面上之方式,即是構件之平坦面和半硬化樹脂之表面對向之方式,使構件載置在半硬化樹脂上。In the work (II), the member is placed on the semi-hardened resin. At this time, the member is placed on the semi-hardened resin in such a manner that the flat surface of the member comes to the semi-hardened resin surface, that is, the flat surface of the member and the surface of the semi-hardened resin face each other.
接著,在工程(III)中,在半硬化樹脂之軟化溫度以上之加熱下,將構件(第1圖D,3)和印刷電路基板(第1圖D,1)壓接(第1圖D,4)至半硬化樹脂(第1圖D,11)完全硬化(第1圖E,12)為止。Next, in the item (III), the member (Fig. 1 and D) is pressed against the printed circuit board (Fig. 1, D, 1) under heating of the softening temperature of the semi-hardened resin (Fig. 1D). 4) The semi-hardened resin (Fig. 1 and D, 11) is completely cured (Fig. 1 and E).
在工程(III)中,具體地進行以下之步驟。即是,首先半硬化樹脂藉由加熱軟化。依此,半硬化樹脂藉由構件之平坦面之壓迫使其表面均勻,變成平坦化。然後在該狀態下,半硬化樹脂係與構件壓接,而完全硬化。如此一來,因在被平坦化之完全硬化樹脂上疊層構件(預浸體等),故製造出高度被平坦化之印刷電路板。In the work (III), the following steps are specifically carried out. That is, first, the semi-hardened resin is softened by heating. Accordingly, the semi-hardened resin is forced to be uniform in surface by the pressure of the flat surface of the member, and becomes flat. Then, in this state, the semi-hardened resin is crimped to the member and completely cured. As a result, a member (prepreg or the like) is laminated on the flattened fully cured resin, so that a printed circuit board having a high degree of flatness is produced.
在工程(III)中,加熱係以半硬化樹脂之軟化溫度以上進行。就以半硬化樹脂之軟化溫度而言,以80~160(尤其120~150)℃為佳。當軟化溫度過低時,半硬化樹脂從端面露出,印刷電路基板或沖壓機則被汙染,當軟化溫度過高時,平坦化則不充分。半硬化樹脂之軟化時中之黏度,在藉由電流計測量(即是,一面施予正弦波之微細振動一面予以加熱,自此時之阻力算出黏度)之情況下,以1Hz之頻率施加10000mPa‧s之應力時,係以1~1000(尤其10~100)Pa‧s為佳。當黏度值過小時則有流動性過高 而從基板露出之情形,過大時則有流動性不足無法取得充分平坦化之情形。In the work (III), the heating is performed at a temperature higher than the softening temperature of the semi-hardened resin. The softening temperature of the semi-hardened resin is preferably from 80 to 160 (especially from 120 to 150) °C. When the softening temperature is too low, the semi-hardened resin is exposed from the end surface, and the printed circuit board or the press is contaminated. When the softening temperature is too high, the flattening is insufficient. The viscosity at the time of softening of the semi-hardened resin is 10000 mPa applied at a frequency of 1 Hz when measured by an ammeter (that is, heated while applying a fine vibration of a sine wave, and the viscosity is calculated from the resistance at this time). When the stress is ‧ s, it is better to use 1~1000 (especially 10~100) Pa‧s. When the viscosity value is too small, the fluidity is too high. However, when it is exposed from the substrate, when it is too large, there is a case where the fluidity is insufficient and sufficient flattening cannot be obtained.
在工程(III)中,加熱最佳係以半硬化樹脂之完全硬化溫度以上進行。就以半硬化樹脂之完全軟化溫度而言,以150~200(尤其160~180)℃為佳。In the work (III), the heating is preferably carried out at a temperature higher than the complete hardening temperature of the semi-hardened resin. In terms of the complete softening temperature of the semi-hardened resin, it is preferably 150 to 200 (especially 160 to 180) °C.
在工程(III)中,壓接係進行至藉由上述加熱使半硬化樹脂完全硬化為止。構件為B工作台之預浸體之時,至預浸體完全硬化(第1圖E,7)為止,更予以壓接為佳。壓接具體上可以以真空沖壓等進行。就以壓接條件而言,藉由例如在100~250(尤其130~190)℃,10~200(尤其90~120)分鐘之加熱下,壓力0.1~5(尤其2~3)MPa來進行。In the work (III), the crimping is performed until the semi-hardened resin is completely cured by the above heating. When the member is a prepreg of the B table, it is preferable to press the prepreg until it is completely cured (Fig. 1 and Fig. 1). The crimping can be carried out in particular by vacuum stamping or the like. In terms of crimping conditions, the pressure is 0.1 to 5 (especially 2 to 3) MPa by heating, for example, at 100 to 250 (especially 130 to 190) ° C, 10 to 200 (especially 90 to 120) minutes. .
如上述般,將熱硬化型樹脂油墨或光、熱兩段硬化型樹脂油墨塗佈在印刷電路基板表面上之凸部之全部及凹部之全部時,則製造出第1圖E所示之平坦化預浸體覆蓋印刷電路板。As described above, when the thermosetting resin ink or the optical or thermal two-stage curable resin ink is applied to all of the convex portions on the surface of the printed circuit board and all the concave portions, the flat surface shown in FIG. The prepreg covers the printed circuit board.
同樣,於塗佈於凸部之一部分及凹部之全部之時,在第2圖A’、塗佈於凸部(僅)之全部時,在第2圖B’、以及塗佈於凹部(僅)之全部時,則製造出各如第2圖C’所示之平坦化預浸體印刷電路板。Similarly, when applied to one of the convex portions and the concave portion, when applied to all of the convex portions (only) in FIG. 2A, the second FIG. B' and the concave portion (only In all cases, a flattened prepreg printed circuit board as shown in Fig. 2C' is produced.
藉由本案發明之製造方法,可以製造出表面凹凸差5μm以下之預浸體覆蓋印刷電路板。According to the manufacturing method of the present invention, a prepreg having a surface unevenness of 5 μm or less can be produced to cover a printed circuit board.
以下,以實施例具體說明本案發明。Hereinafter, the invention will be specifically described by way of examples.
‧實施例1‧Example 1
熱硬化型樹脂油墨組成(重量份):雙酚A型環氧樹脂(100)、四氫化鄰苯二甲酸酐(20)、硫酸鋇粉末(120)、「Ajicure PN-23」(日本Ajinomoto Fine Techno公司製造,熱硬化劑)(6)、矽油(1)。Thermosetting resin ink composition (parts by weight): bisphenol A type epoxy resin (100), tetrahydrophthalic anhydride (20), barium sulfate powder (120), "Ajicure PN-23" (Japan Ajinomoto Fine) Manufactured by Techno, a heat hardener) (6), eucalyptus oil (1).
以網版印刷將上述熱硬化型樹脂油墨全面塗佈在形成有銅電路(電路厚度70μm,L/S100μm)之印刷電路基板。塗佈厚度為電路上25μm,電路間60μm。塗佈後,將印刷電路基板放入乾燥機,以110℃加熱60分鐘,使塗佈油墨半硬化。The above-mentioned thermosetting resin ink was entirely applied by screen printing to a printed circuit board on which a copper circuit (circuit thickness: 70 μm, L/S 100 μm) was formed. The coating thickness was 25 μm on the circuit and 60 μm between the circuits. After coating, the printed circuit board was placed in a dryer and heated at 110 ° C for 60 minutes to semi-harden the coating ink.
接著,將預浸體(「R-1551」)Panasonic電工製,厚度0.1mm)覆蓋在上述半硬化樹脂層上。Next, a prepreg ("R-1551") manufactured by Panasonic Electric Co., Ltd., having a thickness of 0.1 mm) was placed on the semi-cured resin layer.
接著,以真空沖壓使預浸體和印刷電路基板壓接一體化。沖壓條件為180℃,120分鐘之加熱下,壓力3MPa。Next, the prepreg and the printed circuit board are pressure-bonded and integrated by vacuum pressing. The stamping conditions were 180 ° C, and the pressure was 3 MPa under heating for 120 minutes.
針對如此製造之預浸體覆蓋印刷電路板,以表面粗度計(「Surfcom130R」東京精密製造)調查結果,表面凹凸差為5μm以下,以實體顯微鏡(50倍)觀察剖面時在電路之接根部完全無空隙。The prepreg-covered printed circuit board thus manufactured was subjected to a surface roughness meter ("Surfcom 130R" manufactured by Tokyo Precision Manufacturing Co., Ltd.), and the surface unevenness was 5 μm or less. When the cross section was observed with a stereoscopic microscope (50 times), the root portion of the circuit was observed. No gaps at all.
‧實施例2‧Example 2
光、熱兩段硬化樹脂油墨組成(重量份):酚酚醛樹脂型環氧樹脂和丙烯酸之反應物(100)、三羥甲基丙烷三丙烯酸酯(100)、「IIRGACURE-907」(Cibageigy公司製造)、雙酚A型環氧樹脂(60)、Ajicure PN-23」(日本Ajinomoto Fine Techno公司製造)(6)、矽油(1)、氧化矽粉(200)。Light and heat two-stage hardening resin ink composition (parts by weight): phenolic phenolic resin type epoxy resin and acrylic acid reactant (100), trimethylolpropane triacrylate (100), "IIRGACURE-907" (Cibageigy Manufactured, bisphenol A type epoxy resin (60), Ajicure PN-23" (manufactured by Ajinomoto Fine Techno Co., Ltd.) (6), eucalyptus oil (1), cerium oxide powder (200).
使上述光、熱兩段硬化型樹脂油墨與上述相同,在形成有銅電路之印刷電路基板全面塗佈。塗佈後,對印刷電路基板,以波長365nm,照射量0.6J/cm2 進行光照射,並使塗佈油墨半硬化。The above-mentioned optical and thermal two-stage curable resin ink is applied in the same manner as described above, and is printed on the printed circuit board on which the copper circuit is formed. After the application, the printed circuit board was irradiated with light at a wavelength of 365 nm and an irradiation amount of 0.6 J/cm 2 to semi-harden the coating ink.
接著,與上述相同,使預浸體覆蓋在上述半硬化樹脂層,並且在加熱下以真空沖壓壓接預浸體和印刷電路基板。Next, in the same manner as described above, the prepreg was covered with the semi-hardened resin layer, and the prepreg and the printed circuit board were pressure-bonded by vacuum pressing under heating.
針對如此所製造出之預浸體覆蓋印刷電路板,以上述表面粗度計調查之結果表面凹凸差為5μm,以上述實體顯微鏡觀察剖面時,則完全無空隙。With respect to the prepreg-covered printed circuit board thus produced, the surface unevenness was 5 μm as a result of investigation of the surface roughness meter, and when the cross section was observed by the stereoscopic microscope, there was no void at all.
‧比較例1‧Comparative example 1
將重疊兩片樹脂薄膜(「ABF-GX3」),Ajinomoto fine techno公司製造,薄膜厚度50μm,軟化溫度130℃)覆蓋在上述形成有銅電路之印刷電路基板。Two resin films ("ABF-GX3"), manufactured by Ajinomoto Fine techno Co., Ltd., having a film thickness of 50 μm and a softening temperature of 130 ° C, were placed over the printed circuit board on which the copper circuit was formed.
接著,以真空沖壓壓接一體化製造上述樹脂預浸體和印刷電路基板。沖壓條件為180℃,120分鐘之加熱下,壓力3MPa。Next, the resin prepreg and the printed circuit board were integrally formed by vacuum press bonding. The stamping conditions were 180 ° C, and the pressure was 3 MPa under heating for 120 minutes.
針對如此所製造出之樹脂覆蓋印刷電路板,以上述實體顯微鏡調查之結果,無空隙。但是,於沖壓時,樹脂薄膜藉由熱壓,軟化、液狀化,從印刷電路基板之側面流出。其結果,不僅電路上之樹脂薄膜之厚度不安定,印刷電路基板或沖壓機也受汙染。With respect to the resin-covered printed circuit board thus produced, there was no void as a result of the above-described physical microscope investigation. However, at the time of press, the resin film is softened and softened by hot pressing, and flows out from the side surface of the printed circuit board. As a result, not only the thickness of the resin film on the circuit is unstable, but also the printed circuit board or the press machine is contaminated.
‧比較例2‧Comparative example 2
除將沖壓溫度從180℃改成150℃之外,除他與比較例1相同,製造樹脂覆蓋印刷電路板。A resin-coated printed circuit board was produced except that the stamping temperature was changed from 180 ° C to 150 ° C except that it was the same as in Comparative Example 1.
於沖壓時,樹脂薄膜並無液狀化。但是,針對製造出之樹脂覆蓋印刷電路板,以上述表面粗度調查之結果,表面凹凸差為20μm以上,以上述實體顯微鏡調查結果,預浸體無法充分填充至電路之接跟部分之各個角落,在該部分產生空隙。At the time of pressing, the resin film did not become liquid. However, with respect to the manufactured resin-covered printed circuit board, the surface unevenness was 20 μm or more as a result of the above-described surface roughness investigation. As a result of the above-described physical microscope investigation, the prepreg could not be sufficiently filled to the corners of the connecting portion of the circuit. , a gap is created in this portion.
‧比較例3‧Comparative example 3
除使用預浸體(「R-1551」,厚度0.1mm)取代樹脂薄膜(「ABF-GX3」)之外,其他與比較例1相同,製造出預浸體覆蓋印刷電路板。A prepreg-covered printed circuit board was produced in the same manner as in Comparative Example 1, except that a prepreg ("R-1551", thickness: 0.1 mm) was used instead of the resin film ("ABF-GX3").
針對如此所製造之預浸體覆蓋印刷電路板,以上述表面粗度計調查結果,表面凹凸差為40μm以上。With respect to the printed circuit board covered with the prepreg thus produced, the difference in surface unevenness was 40 μm or more as a result of the above-described surface roughness measurement.
1...印刷電路基板1. . . Printed circuit board
2...凸部(電路)2. . . Convex (circuit)
3...構件(B工作台預浸體)3. . . Component (B table prepreg)
4...壓接(熱壓)4. . . Crimp (hot press)
5...隆起部5. . . Uplift
6...空隙6. . . Void
7...構件(完全硬化預浸體)7. . . Component (completely hardened prepreg)
8、10...未硬化塗佈樹脂8, 10. . . Unhardened coating resin
9、12...完全硬化塗佈樹脂9,12. . . Completely hardened coating resin
11...半硬化塗佈樹脂11. . . Semi-hardened coating resin
13...凹部(電路間)13. . . Concave (inter-circuit)
第1圖為用以說明與本案發明有關之印刷電路板之製造方法的工程剖面圖。Fig. 1 is a cross-sectional view showing the construction of a printed circuit board according to the present invention.
第2圖為用以說明與本案發明有關之印刷電路板之製造方法的另外態樣之剖面圖。Fig. 2 is a cross-sectional view showing another aspect of a method of manufacturing a printed circuit board relating to the present invention.
A~C各表示在印刷電路基板表面上塗佈樹脂油墨之狀態。A’~C’各表示被製造出之平坦化的印刷電路板。A to C each indicate a state in which a resin ink is applied onto the surface of a printed circuit board. Each of A' to C' represents a printed circuit board which is flattened.
第3圖為用以說明以往之印刷電路板之製造方法的工程剖面圖。Fig. 3 is a cross-sectional view showing the construction of a conventional printed circuit board.
第4圖為用以說明以往之印刷電路板之製造方法的另外態樣之工程剖面圖。Fig. 4 is a cross-sectional view showing another aspect of the conventional method for manufacturing a printed circuit board.
1...印刷電路基板1. . . Printed circuit board
2...凸部(電路)2. . . Convex (circuit)
3...構件(B工作台預浸體)3. . . Component (B table prepreg)
4...壓接(熱壓)4. . . Crimp (hot press)
7...構件(完全硬化預浸體)7. . . Component (completely hardened prepreg)
10...未硬化塗佈樹脂10. . . Unhardened coating resin
12...完全硬化塗佈樹脂12. . . Completely hardened coating resin
11...半硬化塗佈樹脂11. . . Semi-hardened coating resin
13...凹部(電路間)13. . . Concave (inter-circuit)
Claims (6)
Applications Claiming Priority (1)
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JP2010087313A JP2011199232A (en) | 2010-03-17 | 2010-03-17 | Printed wiring board and manufacturing method thereof |
Publications (2)
Publication Number | Publication Date |
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TW201146115A TW201146115A (en) | 2011-12-16 |
TWI437939B true TWI437939B (en) | 2014-05-11 |
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TW099146316A TWI437939B (en) | 2010-03-17 | 2010-12-28 | Printed circuit board and manufacturing method thereof |
Country Status (4)
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JP (1) | JP2011199232A (en) |
KR (1) | KR101154381B1 (en) |
CN (1) | CN102196669B (en) |
TW (1) | TWI437939B (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5810225B2 (en) | 2011-10-13 | 2015-11-11 | エルジー・ケム・リミテッド | Cable type secondary battery |
CN103458621B (en) * | 2012-05-28 | 2017-08-08 | 深南电路有限公司 | The spraying method of thick copper circuit board |
CN103607837A (en) * | 2013-10-21 | 2014-02-26 | 溧阳市东大技术转移中心有限公司 | Printed circuit board structure |
CN105517346B (en) * | 2014-09-23 | 2019-03-01 | 深南电路有限公司 | A kind of production method and circuit board of circuit board |
JP2018182003A (en) * | 2017-04-10 | 2018-11-15 | 日立化成株式会社 | Multilayer printed wiring board and semiconductor package |
JP7299685B2 (en) * | 2018-10-11 | 2023-06-28 | キヤノン株式会社 | Film forming apparatus, film forming method, and article manufacturing method |
CN116031010A (en) * | 2023-02-17 | 2023-04-28 | 北京梦之墨科技有限公司 | Conductive structure, printing planarization method and equipment for low-temperature conductive paste |
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US5600103A (en) | 1993-04-16 | 1997-02-04 | Kabushiki Kaisha Toshiba | Circuit devices and fabrication method of the same |
JP4784082B2 (en) | 2004-12-03 | 2011-09-28 | 日立化成工業株式会社 | Printed wiring board and manufacturing method thereof |
KR100791353B1 (en) * | 2005-05-20 | 2008-01-07 | 삼성전기주식회사 | Method of Forming Permanent Protective Film and Printed Circuit Board thereof |
KR20090053198A (en) * | 2007-11-22 | 2009-05-27 | 삼성전기주식회사 | Printed circuit board and manufacturing method of the same |
-
2010
- 2010-03-17 JP JP2010087313A patent/JP2011199232A/en active Pending
- 2010-12-28 TW TW099146316A patent/TWI437939B/en active
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2011
- 2011-01-18 KR KR1020110004889A patent/KR101154381B1/en active IP Right Grant
- 2011-01-20 CN CN201110023096XA patent/CN102196669B/en active Active
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CN102196669B (en) | 2013-07-31 |
JP2011199232A (en) | 2011-10-06 |
TW201146115A (en) | 2011-12-16 |
KR20110104872A (en) | 2011-09-23 |
KR101154381B1 (en) | 2012-06-15 |
CN102196669A (en) | 2011-09-21 |
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