TWI425591B - Substrate assembling apparatus - Google Patents

Substrate assembling apparatus Download PDF

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TWI425591B
TWI425591B TW98111064A TW98111064A TWI425591B TW I425591 B TWI425591 B TW I425591B TW 98111064 A TW98111064 A TW 98111064A TW 98111064 A TW98111064 A TW 98111064A TW I425591 B TWI425591 B TW I425591B
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Taiwan
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electrostatic chuck
substrate assembly
substrate
component
assembly device
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TW98111064A
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Chinese (zh)
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TW201001616A (en
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Joung-Pil You
Sung-Chul Moon
Ik-Seong Cho
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Ap Systems Inc
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Priority claimed from KR20080030788A external-priority patent/KR100963439B1/en
Priority claimed from KR1020080030787A external-priority patent/KR100961871B1/en
Application filed by Ap Systems Inc filed Critical Ap Systems Inc
Publication of TW201001616A publication Critical patent/TW201001616A/en
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Publication of TWI425591B publication Critical patent/TWI425591B/en

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Description

基板組合裝置Substrate assembly device

本發明是有關於一種基板組合裝置(substrate assembling apparatus),且特別是有關於一種能將一對基板組合在一起的基板組合裝置,其中這對基板是平面顯示面板(flat display panel)的組成元件。The present invention relates to a substrate assembly apparatus, and more particularly to a substrate assembly apparatus capable of combining a pair of substrates, wherein the pair of substrates are constituent elements of a flat display panel. .

陰極射線管(cathode ray tubes,CRTs)一直被用作顯示裝置。然而,陰極射線管的缺點在於它們的重量與體積很大。因此,近年來,諸如液晶顯示器(liquid crystal display,LCD)裝置、電漿顯示面板(plasma display panels,PDPs)以及有機發光元件(organic light emitting devices,OLEDs)等的平面顯示面板得以廣泛應用。平面顯示面板的優點在於它們又輕又薄,而且電力消耗低。Cathode ray tubes (CRTs) have been used as display devices. However, cathode ray tubes have the disadvantage that they are heavy and bulky. Therefore, in recent years, flat display panels such as liquid crystal display (LCD) devices, plasma display panels (PDPs), and organic light emitting devices (OLEDs) have been widely used. The advantage of flat display panels is that they are light and thin and have low power consumption.

平面顯示面板一般是藉由將一對扁平基板組合在一起來製造而成。例如,要製造液晶顯示器裝置,就要製造下基板與上基板,其中,在下基板上形成有多個薄膜電晶體與畫素電極,而在上基板上形成有濾色器(color filter)與共用電極。然後,將液晶滴在下基板上,且在下基板的周邊區域塗上密封劑(sealant)。接著,將下基板與上基板按照下基板(畫素電極形成在其上面)的表面與上基板(共用電極形成在其上面)的表面彼此相對的方式來進行定位。然後,將下基板與上基板附著並密封在一起,從而形成液晶顯示器裝置。A flat display panel is generally manufactured by combining a pair of flat substrates. For example, in order to manufacture a liquid crystal display device, a lower substrate and an upper substrate are formed, wherein a plurality of thin film transistors and a pixel electrode are formed on the lower substrate, and a color filter and a common layer are formed on the upper substrate. electrode. Then, the liquid crystal is dropped on the lower substrate, and a sealant is applied to the peripheral region of the lower substrate. Next, the lower substrate and the upper substrate are positioned such that the surface of the lower substrate (on which the pixel electrode is formed) and the surface of the upper substrate (on which the common electrode is formed) face each other. Then, the lower substrate and the upper substrate are attached and sealed together to form a liquid crystal display device.

此處,基板組合裝置被用來使上基板與下基板彼此對向,且將上基板與下基板附著並密封在一起。為了使上基板與下基板彼此對向,基板組合裝置經設計以將上基板提升到預定高度。此時,真空吸附力或靜電力被用作提升上基板的力。另外,此基板組合裝置使用靜電卡盤(electrostatic chuck)來施加靜電力。Here, the substrate assembly device is used to face the upper substrate and the lower substrate, and the upper substrate and the lower substrate are attached and sealed together. In order to align the upper substrate and the lower substrate with each other, the substrate assembly device is designed to lift the upper substrate to a predetermined height. At this time, a vacuum suction force or an electrostatic force is used as a force for lifting the upper substrate. In addition, the substrate assembly device uses an electrostatic chuck to apply an electrostatic force.

用來夾持上基板的先前技術的靜電卡盤是形成單板狀。也就是說,先前技術的靜電卡盤的電極圖案是形成在單一基板之表面上,且藉由施加電力到電極圖案上來夾持著基板。The prior art electrostatic chuck for holding the upper substrate is formed into a single plate shape. That is, the electrode pattern of the prior art electrostatic chuck is formed on the surface of a single substrate, and the substrate is held by applying electric power to the electrode pattern.

此靜電卡盤的問題在於,當單板上的電極圖案的一部分損壞時,此靜電卡盤就無法有效工作。也就是說,由於靜電卡盤上的電極圖案是根據極性來互連,所以電極圖案的損壞部分會妨礙電力被施加在整個電極圖案上,因此在靜電卡盤上的靜電圖案就無法正常工作。此外,當靜電卡盤的一部分損壞時,必須更換整個靜電卡盤,所以維護成本提高。The problem with this electrostatic chuck is that the electrostatic chuck does not work effectively when a portion of the electrode pattern on the board is damaged. That is, since the electrode patterns on the electrostatic chuck are interconnected according to the polarity, the damaged portion of the electrode pattern hinders the application of electric power to the entire electrode pattern, and thus the electrostatic pattern on the electrostatic chuck does not work properly. In addition, when a part of the electrostatic chuck is damaged, the entire electrostatic chuck must be replaced, so maintenance cost is increased.

再者,近幾年隨著平面顯示面板的增大(第六代及以後),上基板的重量迅速增加。因此,在先前技術的單板組態靜電卡盤中,上基板大多被製造成較大的尺寸與重量,所以上基板的支撐與固定是比較難的。也就是說,要製造與大尺寸基板相符的靜電卡盤比較難,且靜電力無法有效地施加在靜電卡盤的中心部分。此外,基板與靜電卡盤的表面之間要達到平坦度一致也很難。如果做不到這 些,就會破壞夾持力,造成基板從靜電卡盤掉出來。Furthermore, in recent years, as the flat display panel has increased (sixth generation and later), the weight of the upper substrate has rapidly increased. Therefore, in the prior art single-board configuration electrostatic chuck, the upper substrate is mostly manufactured to a large size and weight, so the support and fixing of the upper substrate is relatively difficult. That is to say, it is difficult to manufacture an electrostatic chuck conforming to a large-sized substrate, and an electrostatic force cannot be effectively applied to a central portion of the electrostatic chuck. In addition, it is difficult to achieve uniformity between the substrate and the surface of the electrostatic chuck. If you can't do this These will destroy the clamping force and cause the substrate to fall out of the electrostatic chuck.

本發明提供一種基板組合裝置,此基板組合裝置能夠提高基板之表面與靜電卡盤之表面之間的平坦度,在整個基板上施加均勻的靜電力,即使當靜電卡盤局部損壞時也能平穩地夾持基板,故而能夠提高耐久性,降低維護成本。此基板組合裝置還能夠夾持各種尺寸的基板。The invention provides a substrate assembly device capable of improving the flatness between the surface of the substrate and the surface of the electrostatic chuck, and applying a uniform electrostatic force on the entire substrate, even when the electrostatic chuck is partially damaged. Since the substrate is sandwiched, the durability can be improved and the maintenance cost can be reduced. The substrate assembly device is also capable of holding substrates of various sizes.

依照一實施例,基板組合裝置包括:腔室部件(chamber portion);上工作臺(upper table)與下工作臺(lower table),面對面地配置在腔室部件中;多個上靜電卡盤部件,安裝在上工作臺的底面上;平坦度調整單元,用來調整上靜電卡盤部件之間的平坦度;以及至少一個下靜電卡盤部件,安裝在下工作臺的頂面上。According to an embodiment, a substrate assembly apparatus includes: a chamber portion; an upper table and a lower table disposed face to face in the chamber member; and a plurality of upper electrostatic chuck members Installed on the bottom surface of the upper workbench; a flatness adjustment unit for adjusting the flatness between the upper electrostatic chuck members; and at least one lower electrostatic chuck member mounted on the top surface of the lower workbench.

平坦度調整單元可包括:多個第一調整螺釘孔,穿透各別靜電卡盤部件而形成;多個第二調整螺釘孔,形成在上工作臺中,且與第一調整螺釘孔對應;以及間隙調整螺釘,插入第一調整螺釘孔與第二調整螺釘孔,用來調整每個上靜電卡盤部件與上工作臺之間的間隙。The flatness adjustment unit may include: a plurality of first adjustment screw holes formed through the respective electrostatic chuck members; and a plurality of second adjustment screw holes formed in the upper table and corresponding to the first adjustment screw holes; The gap adjusting screw is inserted into the first adjusting screw hole and the second adjusting screw hole to adjust the gap between each upper electrostatic chuck component and the upper working table.

平坦度調整單元可包括:多個第一調整螺釘孔,形成在各別靜電卡盤部件上;多個第二調整螺釘孔,穿透上工作臺而形成,且與第一調整螺釘孔對應;以及間隙調整螺釘,插入第一調整螺釘孔與第二調整螺釘孔,用來調整每個上靜電卡盤部件與上工作臺之間的間隙。The flatness adjusting unit may include: a plurality of first adjusting screw holes formed on the respective electrostatic chuck members; a plurality of second adjusting screw holes formed through the upper working table and corresponding to the first adjusting screw holes; And a gap adjusting screw, inserted into the first adjusting screw hole and the second adjusting screw hole, for adjusting a gap between each of the upper electrostatic chuck components and the upper working table.

平坦度調整單元可包括:多個驅動馬達部件,配置在 上工作臺的頂面上,且與各別的上靜電卡盤部件對應;以及至少一個驅動軸部件,從驅動馬達部件穿過上工作臺而延伸至上靜電卡盤部件。The flatness adjustment unit may include: a plurality of drive motor components, configured in On the top surface of the upper table, corresponding to the respective upper electrostatic chuck members; and at least one drive shaft member extending from the drive motor member through the upper table to the upper electrostatic chuck member.

氣動式(pneumatic)、液壓式(hydraulic)或電動式(electric power)氣缸(cylinder)可用作平坦度調整單元。A pneumatic, hydraulic or electric power cylinder can be used as the flatness adjustment unit.

上工作臺的底面上形成與上靜電卡盤部件對應的凹槽(grooves),且氣動式、液壓式或電動式氣缸就配置在這些凹槽內。Grooves corresponding to the upper electrostatic chuck member are formed on the bottom surface of the upper table, and pneumatic, hydraulic or electric cylinders are disposed in the grooves.

靜電卡盤部件在上工作臺的底面上可排列成矩陣圖案。The electrostatic chuck members may be arranged in a matrix pattern on the bottom surface of the upper table.

每個上靜電卡盤部件可包括:基底板;緩衝層,位於基底板上;第一薄膜層,位於緩衝層上;電極層,形成在第一薄膜層上;以及第二薄膜層,覆蓋著電極層。Each of the upper electrostatic chuck members may include: a base plate; a buffer layer on the base plate; a first film layer on the buffer layer; an electrode layer formed on the first film layer; and a second film layer covered Electrode layer.

電極層可包括正電極圖案與負電極圖案,這些電極圖案形成板狀或直線形,且交替地排列。The electrode layer may include a positive electrode pattern and a negative electrode pattern, and the electrode patterns are formed in a plate shape or a linear shape and alternately arranged.

此基板組合裝置可更包括:下載物台部件,用來移動下工作臺;以及上載物台部件,用來移動上工作臺。The substrate assembly apparatus may further include: a download stage member for moving the lower stage; and a loading stage unit for moving the upper stage.

下載物台部件可包括X、Y及θ位置調整部件,用來調整下工作臺的X、Y及θ位置。The download stage component can include X, Y, and θ position adjustment components for adjusting the X, Y, and θ positions of the lower table.

依照另一實施例,一種基板組合裝置包括:腔室部件;上工作臺與下工作臺,面對面地配置在腔室部件中;多個上靜電卡盤部件,安裝在上工作臺的底面上;多個電力控制部分,提供電力給各別的靜電卡盤部件;以及至少一個下靜電卡盤部件,安裝在下工作臺的頂面上。According to another embodiment, a substrate assembly apparatus includes: a chamber member; an upper table and a lower table disposed face to face in the chamber member; and a plurality of upper electrostatic chuck members mounted on a bottom surface of the upper table; A plurality of power control sections provide power to the respective electrostatic chuck components; and at least one lower electrostatic chuck component mounted on a top surface of the lower workbench.

多個電力控制部件可經配置以進行獨立驅動。Multiple power control components can be configured for independent drive.

每個上靜電卡盤部件可包括:多個電性相連的正電極圖案與多個電性相連的負電極圖案,且多個電力控制部件中的每個電力控制部件可包括:連接端子部件,以電性方式耦接至正電極圖案與負電極圖案;控制器,用來控制電力供應;以及連接線部件,用來將控制器以電性方式連接至連接端子部件。Each of the upper electrostatic chuck components may include: a plurality of electrically connected positive electrode patterns and a plurality of electrically connected negative electrode patterns, and each of the plurality of power control components may include: a connection terminal component, Electrically coupled to the positive electrode pattern and the negative electrode pattern; a controller for controlling the power supply; and a connection line member for electrically connecting the controller to the connection terminal member.

插座或連接件可用作連接端子部件,且連接端子部件可位於上工作臺的底面上。The socket or the connector can be used as a connection terminal member, and the connection terminal member can be located on the bottom surface of the upper table.

連接端子部件可埋入底面中,且局部暴露著。連接端子部件可安裝在形成於上工作臺之底面的凹槽中。The connection terminal member can be buried in the bottom surface and partially exposed. The connection terminal member can be mounted in a recess formed in the bottom surface of the upper table.

控制器可配置在上工作臺的頂面上或腔室部件的外部區域。The controller can be disposed on a top surface of the upper table or an outer region of the chamber component.

每個上靜電卡盤部件可包括:基底板;緩衝層,位於基底板上;第一薄膜層,位於緩衝層上;電極層,形成在第一薄膜層上,且具有多個正、負圖案;以及第二薄膜層,覆蓋著電極層。且電極層可包括:正電極連接線,用來互連正電極圖案;以及負電極連接線,用來互連負電極圖案。Each of the upper electrostatic chuck members may include: a base plate; a buffer layer on the base plate; a first film layer on the buffer layer; and an electrode layer formed on the first film layer and having a plurality of positive and negative patterns And a second film layer covering the electrode layer. And the electrode layer may include: a positive electrode connection line for interconnecting the positive electrode pattern; and a negative electrode connection line for interconnecting the negative electrode pattern.

正電極圖案與負電極圖案可形成板狀,且交替地排列。The positive electrode pattern and the negative electrode pattern may be formed in a plate shape and alternately arranged.

每個上靜電卡盤部件可包括:正端子,耦接至正電極圖案之一;負端子,耦接至負電極圖案之一;以及電力連接部件,以電性方式連接至各別的正、負端子,且耦接至電力控制部件的連接端子部件。Each of the upper electrostatic chuck members may include: a positive terminal coupled to one of the positive electrode patterns; a negative terminal coupled to one of the negative electrode patterns; and a power connection member electrically connected to the respective positive, a negative terminal and coupled to the connection terminal component of the power control component.

此基板組合裝置可更包括電力供應部件,用來提供電力給電力控制部件。The substrate assembly device may further include a power supply component for supplying power to the power control component.

靜電卡盤部件在上工作臺的底面上排列成矩陣圖案。The electrostatic chuck members are arranged in a matrix pattern on the bottom surface of the upper table.

此基板組合裝置可更包括:下載物台部件,用來移動下工作臺;以及上載物台部件,用來移動上工作臺。The substrate assembly apparatus may further include: a download stage member for moving the lower stage; and a loading stage unit for moving the upper stage.

下載物台部件可包括X、Y及θ位置調整部件,用來調整下工作臺的X、Y及θ位置。The download stage component can include X, Y, and θ position adjustment components for adjusting the X, Y, and θ positions of the lower table.

此基板組合裝置可更包括:至少一個下電力控制部件,用來提供電力給下靜電卡盤部件。The substrate assembly apparatus may further include: at least one lower power control component for supplying power to the lower electrostatic chuck component.

依照這些實施例,使用多個上靜電卡盤部件來支撐並固定大尺寸基板成為可能。According to these embodiments, it is possible to support and fix a large-sized substrate using a plurality of upper electrostatic chuck members.

另外,因為提供了單獨的平坦度調整單元來調整上靜電卡盤部件的表面平坦度,所以由上工作臺的表面不均勻或上靜電卡盤部件之間的高度差而造成的表面平坦度不均勻問題可得以解決,從而可改良上靜電卡盤部件與基板之間的夾持力與緊密黏合。In addition, since a flatness adjustment unit is provided to adjust the surface flatness of the upper electrostatic chuck member, the surface flatness caused by the unevenness of the surface of the upper table or the difference in height between the upper electrostatic chuck members is not The uniform problem can be solved, thereby improving the clamping force and tight adhesion between the upper electrostatic chuck member and the substrate.

另外,上靜電卡盤部件可使用多個電力控制單元來獨立驅動。Additionally, the upper electrostatic chuck component can be independently driven using a plurality of power control units.

此外,藉由個別地或獨立地驅動上靜電卡盤部件,可夾持各種尺寸的基板。In addition, substrates of various sizes can be held by driving the upper electrostatic chuck member individually or independently.

再者,因為即使當有些靜電卡盤部件損壞時,也能個別地或獨立地驅動上靜電卡盤部件,所以鄰近的靜電卡盤部件可保持夾持力。此外,因為只需更換損壞的靜電卡盤部件,所以可降低維護成本。Furthermore, since the upper electrostatic chuck member can be individually or independently driven even when some of the electrostatic chuck members are damaged, the adjacent electrostatic chuck members can maintain the clamping force. In addition, maintenance costs can be reduced because only damaged electrostatic chuck components need to be replaced.

為讓本發明之上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。The above described features and advantages of the present invention will be more apparent from the following description.

下面將參照所附圖式來詳細描述特定的實施例。然而,本發明也可體現為不同的形態,而不應侷限於本說明書所列舉的實施例。確切地說,提供這些實施例是為了使揭露的內容更透徹更完整,且將本發明的範圍充分地傳遞給本領域中具有通常技藝者。在這些圖中,相同的元件符號是代表相同的元件。Specific embodiments will be described in detail below with reference to the drawings. However, the invention may also be embodied in different forms and should not be limited to the embodiments enumerated herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and the scope of the invention will be fully conveyed by those skilled in the art. In the figures, the same element symbols are the same elements.

圖1是依照一實施例的一種基板組合裝置的橫剖面圖。圖2是上工作臺的俯視平面圖,用來繪示圖1所示之基板組合裝置的多個靜電卡盤部件的排列。圖3是圖1所示之基板組合裝置的靜電卡盤部件的橫剖面圖。圖4是圖1所示之基板組合裝置的靜電卡盤部件的俯視平面圖。圖5是圖1所示之基板組合裝置的靜電卡盤部件之改良示例的俯視平面圖。圖6是靜電卡盤部件耦接至圖1所示之基板組合裝置之上工作臺的橫剖面圖。圖7之(a)~(b)與圖8繪示為依照第一實施例,利用平坦化調整單元來使靜電卡盤部件平坦化的方法的示意圖。圖9是靜電卡盤部件耦接至圖1所示之基板組合裝置之上工作臺的改良示例的橫剖面圖。1 is a cross-sectional view of a substrate assembly apparatus in accordance with an embodiment. 2 is a top plan view of the upper table for illustrating the arrangement of the plurality of electrostatic chuck components of the substrate assembly of FIG. 1. Figure 3 is a cross-sectional view of the electrostatic chuck member of the substrate assembly apparatus shown in Figure 1. 4 is a top plan view of the electrostatic chuck member of the substrate assembly apparatus shown in FIG. 1. Fig. 5 is a top plan view showing a modified example of the electrostatic chuck member of the substrate assembly apparatus shown in Fig. 1. Figure 6 is a cross-sectional view of the electrostatic chuck component coupled to the table above the substrate assembly of Figure 1. 7(a) to (b) and FIG. 8 are schematic views showing a method of planarizing an electrostatic chuck member by using a flattening adjustment unit according to the first embodiment. Figure 9 is a cross-sectional view showing a modified example in which an electrostatic chuck member is coupled to a table above the substrate assembly shown in Figure 1.

請參照圖1至圖9,在一實施例中,基板組合裝置包括:腔室部件100,其界定一內部空間;上工作臺200與下工作臺300,面對面地配置在腔室部件100中;多個上 靜電卡盤部件400,安裝在上工作臺200的底面上;平坦度調整單元500,用來調整上靜電卡盤部件400之間的平坦度;至少一個下靜電卡盤部件600,安裝在下工作臺300的頂面上;下載物台部件700,用來移動下工作臺300;以及上載物台部件800,用來移動上工作臺200。此處,雖然圖中未繪示,但此基板組合裝置可更包括一框架(frame),腔室部件100被裝入此框架,且下載物台部件700與上載物台部件800配置在此框架上。Referring to FIG. 1 to FIG. 9, in an embodiment, the substrate assembly device includes: a chamber component 100 defining an internal space; an upper table 200 and a lower table 300 disposed face to face in the chamber component 100; Multiple on The electrostatic chuck member 400 is mounted on the bottom surface of the upper table 200; the flatness adjusting unit 500 is configured to adjust the flatness between the upper electrostatic chuck members 400; at least one lower electrostatic chuck member 600 is mounted on the lower table The top surface of the 300; the download stage component 700 for moving the lower stage 300; and the loading stage component 800 for moving the upper stage 200. Here, although not shown in the drawings, the substrate assembly device may further include a frame into which the chamber member 100 is loaded, and the download stage member 700 and the upload stage member 800 are disposed in the frame. on.

腔室部件100包括:上腔室110與下腔室120,其界定了基板組合空間。此處,上腔室110與下腔室120以可分離方式來相互耦接是有效的。另外,儘管圖中未繪示,但是腔室部件100可更包括壓力調整單元,用來調節腔室部件100之內部空間的壓力。此外,腔室部件100可更包括一淨化單元(purge unit),用來將雜質排出到腔室部件100的內部空間之外。圖1所呈現的是上腔室110與下腔室120相互耦接的狀態,但本發明並不侷限於此。例如,腔室部件110可包括:上面部分、側牆部分與下面部分。另外,儘管圖中未繪示,但是腔室部件100在一側提供一入口/出口,透過此入口/出口可載入或卸載基板。此外,可更提供一閘閥(gate valve),用來打開與關閉入口/出口。不用說,也可藉由上腔室110或下腔室120的升降來將基板載入到腔室部件100或從腔室部件100卸載。此處,可更提供升降構件,用來升高與降低各別的上腔室110與下腔室120。The chamber component 100 includes an upper chamber 110 and a lower chamber 120 that define a substrate assembly space. Here, it is effective that the upper chamber 110 and the lower chamber 120 are coupled to each other in a detachable manner. Additionally, although not shown in the drawings, the chamber component 100 may further include a pressure adjustment unit for adjusting the pressure of the interior space of the chamber component 100. Further, the chamber component 100 may further include a purge unit for discharging impurities out of the internal space of the chamber component 100. 1 shows a state in which the upper chamber 110 and the lower chamber 120 are coupled to each other, but the present invention is not limited thereto. For example, the chamber component 110 can include an upper portion, a side wall portion, and a lower portion. Additionally, although not shown in the drawings, the chamber component 100 provides an inlet/outlet on one side through which the substrate can be loaded or unloaded. In addition, a gate valve may be provided for opening and closing the inlet/outlet. Needless to say, the substrate can also be loaded into or unloaded from the chamber member 100 by the lifting of the upper chamber 110 or the lower chamber 120. Here, a lifting member may be further provided for raising and lowering the respective upper chamber 110 and lower chamber 120.

上工作臺200提供為板狀,且鄰近上腔室110之內表面而配置。板的形狀可隨著配置在上工作臺200之底面上的基板的形狀而變化多端。在本實施例中,上工作臺200形成為矩形板狀。另外,下工作臺300也是形成板狀,且鄰近下腔室120之內表面而配置。此外,下工作臺形成與上工作臺相似或相同的形狀是有效的。因此,上工作臺與下工作臺經配置以使得上工作臺200的底面正對著下工作臺的頂面。The upper stage 200 is provided in a plate shape and disposed adjacent to the inner surface of the upper chamber 110. The shape of the plate may vary abruptly with the shape of the substrate disposed on the bottom surface of the upper table 200. In the present embodiment, the upper table 200 is formed in a rectangular plate shape. In addition, the lower table 300 is also formed in a plate shape and disposed adjacent to the inner surface of the lower chamber 120. In addition, it is effective that the lower table forms a shape similar or identical to the upper table. Therefore, the upper table and the lower table are configured such that the bottom surface of the upper table 200 faces the top surface of the lower table.

上靜電卡盤部件400按照矩陣圖案的方式而安裝並固定在上工作臺200的底面上。也就是說,如圖2所示,二十個靜電卡盤部件400配置在上工作臺200的整個底面上。不用說,靜電卡盤部件的數量並不侷限於二十個。也就是說,靜電卡盤部件的數量可大於或小於二十個。The upper electrostatic chuck member 400 is mounted and fixed to the bottom surface of the upper table 200 in a matrix pattern. That is, as shown in FIG. 2, twenty electrostatic chuck members 400 are disposed on the entire bottom surface of the upper table 200. Needless to say, the number of electrostatic chuck components is not limited to twenty. That is, the number of electrostatic chuck components can be greater or less than twenty.

如圖3所示,每個上靜電卡盤部件400包括:基底板410;緩衝層420,位於基底板410上;第一薄膜層430,位於緩衝層420上;電極層440,形成於第一薄膜層430上;以及第二薄膜層450,覆蓋著電極層440。此處,緩衝層420是透過第一黏合構件411來黏附在基底板410上,且第一薄膜層430是透過第二黏合層420來黏附在緩衝層420上。此外,電極層440包括多個電極圖案,這些電極圖案是透過第三黏合層431來黏附在第一薄膜層420上。此外,第二薄膜層450是透過第四黏合構件441來黏附到電極層440所在的第一薄膜層430上以及電極層440上。As shown in FIG. 3, each of the upper electrostatic chuck members 400 includes: a base plate 410; a buffer layer 420 on the base plate 410; a first film layer 430 on the buffer layer 420; and an electrode layer 440 formed in the first The film layer 430; and the second film layer 450 cover the electrode layer 440. Here, the buffer layer 420 is adhered to the base plate 410 through the first adhesive member 411, and the first film layer 430 is adhered to the buffer layer 420 through the second adhesive layer 420. In addition, the electrode layer 440 includes a plurality of electrode patterns that are adhered to the first film layer 420 through the third adhesive layer 431. In addition, the second film layer 450 is adhered to the first film layer 430 where the electrode layer 440 is located and the electrode layer 440 through the fourth bonding member 441.

如上所述,在本實施例的上靜電卡盤部件400中,由 於緩衝層420是配置在基底板410與電極層440之間,所以靜電卡盤部件400的表面具可撓性,故而能夠緊密地接觸基板11。也就是說,當基板11的表面不平坦且電極層440下面無緩衝層420時,基板11的表面不平坦就會造成基板11無法緊密接觸電極層440,且基板11與電極層440之間會形成預定空間,這將造成夾持力被破壞。然而,若像本實施例那樣電極層440下面有緩衝層420的話,基板11的表面不平坦就會被緩衝層420吸收,所以基板11能夠緊密接觸電極層440,而不會形成任何空間。另外,當外力施加在上靜電卡盤部件400的頂面區域上時,緩衝層420吸收此外力,從而保護電極層440免受外力破壞。此處,緩衝層420用橡膠或矽橡膠來形成是有效的。不用說,本發明並不侷限於此。也就是說,緩衝層420也可用多種其他材料來形成。As described above, in the upper electrostatic chuck member 400 of the present embodiment, Since the buffer layer 420 is disposed between the base plate 410 and the electrode layer 440, the surface of the electrostatic chuck member 400 is flexible, so that the substrate 11 can be closely contacted. That is, when the surface of the substrate 11 is not flat and the buffer layer 420 is not under the electrode layer 440, the unevenness of the surface of the substrate 11 causes the substrate 11 to be in intimate contact with the electrode layer 440, and the substrate 11 and the electrode layer 440 are A predetermined space is formed, which causes the clamping force to be broken. However, if the buffer layer 420 is provided under the electrode layer 440 as in the present embodiment, the surface of the substrate 11 is not flat and is absorbed by the buffer layer 420, so that the substrate 11 can closely contact the electrode layer 440 without forming any space. In addition, when an external force is applied to the top surface area of the upper electrostatic chuck member 400, the buffer layer 420 absorbs the additional force, thereby protecting the electrode layer 440 from external force. Here, it is effective that the buffer layer 420 is formed of rubber or ruthenium rubber. Needless to say, the present invention is not limited to this. That is, the buffer layer 420 can also be formed using a variety of other materials.

此處,本實施例之基底板410用金屬材料來形成是有效的。另外,第一至第四黏合構件411、421、431及441是用黏合劑來形成的。再者,第一薄膜層430可用聚醯亞胺(polyimide)或聚醯亞胺膜(Kapton)來形成。此外,第二薄膜層450可用聚酯(polyester)來形成。不用說,第一薄膜層430與第二薄膜層450並不侷限於上述材料。也就是說,第一薄膜層430與第二薄膜層450可用能夠保護電極層440的絕緣薄膜來形成。Here, it is effective that the base plate 410 of the present embodiment is formed of a metal material. Further, the first to fourth bonding members 411, 421, 431, and 441 are formed using an adhesive. Further, the first film layer 430 may be formed using a polyimide or a polyimide film (Kapton). Further, the second film layer 450 may be formed of polyester. Needless to say, the first film layer 430 and the second film layer 450 are not limited to the above materials. That is, the first film layer 430 and the second film layer 450 may be formed using an insulating film capable of protecting the electrode layer 440.

如圖4所示,本實施例之電極層440包括:多個正電極圖案442與多個負電極圖案443。此處,正電極圖案442 與負電極圖案443是形成矩形板狀。正電極圖案442與負電極圖案443交替地排列成矩陣圖案。在圖4中,五個正電極圖案442與四個負電極圖案443排列成3×3矩陣圖案。然而,正電極圖案442與負電極圖案443的數量並不侷限於以上數字,而是可大於或小於以上數字。另外,也可採用多種不同的圖案。再者,位於上面部分之一側的靜電卡盤部件400之所有正電極圖案442彼此電性連接,且所有負電極圖案443也彼此電性連接。也就是說,正電極圖案442透過第一連接線來彼此電性連接,且負電極圖案443透過第二連接線來彼此電性連接。As shown in FIG. 4, the electrode layer 440 of the present embodiment includes a plurality of positive electrode patterns 442 and a plurality of negative electrode patterns 443. Here, the positive electrode pattern 442 The negative electrode pattern 443 is formed in a rectangular plate shape. The positive electrode pattern 442 and the negative electrode pattern 443 are alternately arranged in a matrix pattern. In FIG. 4, five positive electrode patterns 442 and four negative electrode patterns 443 are arranged in a 3 x 3 matrix pattern. However, the number of the positive electrode patterns 442 and the negative electrode patterns 443 is not limited to the above numbers, but may be larger or smaller than the above numbers. In addition, a variety of different patterns can also be employed. Furthermore, all of the positive electrode patterns 442 of the electrostatic chuck member 400 on one side of the upper portion are electrically connected to each other, and all of the negative electrode patterns 443 are also electrically connected to each other. That is, the positive electrode patterns 442 are electrically connected to each other through the first connection lines, and the negative electrode patterns 443 are electrically connected to each other through the second connection lines.

不用說,正電極圖案442與負電極圖案443並不侷限於上述形狀。也就是說,如圖5之改良示例所示,正電極圖案442與負電極圖案443形成指狀,且交替地排列。不用說,本發明並不侷限於此。也就是說,正電極圖案442與負電極圖案443可形成多種形狀,且交替地排列。Needless to say, the positive electrode pattern 442 and the negative electrode pattern 443 are not limited to the above shapes. That is, as shown in the modified example of FIG. 5, the positive electrode pattern 442 and the negative electrode pattern 443 are formed in a finger shape and alternately arranged. Needless to say, the present invention is not limited to this. That is, the positive electrode pattern 442 and the negative electrode pattern 443 may be formed in various shapes and alternately arranged.

具有上述結構的上靜電卡盤部件400配置在上工作臺200上,用來舉起大尺寸的基板11。The upper electrostatic chuck member 400 having the above structure is disposed on the upper table 200 for lifting the substrate 11 of a large size.

也就是說,當基板11與12的尺寸增大時,用來支撐並固定基板11與12的靜電卡盤部件的尺寸也增大。然而,當靜電卡盤部件的尺寸增大時,靜電卡盤部件中的電極圖案所造成的電阻就會增大,因此靜電卡盤部件的周邊區域與中心區域之間產生電磁力差,故而靜電卡盤部件不能有效地夾持基板。因此,在本實施例中,具有小尺寸的上靜電卡盤部件400(這種小尺寸的上靜電卡盤部件400不會 在中心與周邊之間產生電磁力差)被均勻地安裝在上工作臺200上,從而增強靜電卡盤部件400的夾持力。因此,即使當基板的尺寸增大到(例如)1500×1800mm(第六代基板)或更大時,卡盤部件也能夠穩定地固定住基板。That is, as the sizes of the substrates 11 and 12 increase, the size of the electrostatic chuck member for supporting and fixing the substrates 11 and 12 also increases. However, when the size of the electrostatic chuck member is increased, the electric resistance caused by the electrode pattern in the electrostatic chuck member is increased, so that an electromagnetic force difference is generated between the peripheral region of the electrostatic chuck member and the central portion, so that static electricity is generated. The chuck member cannot effectively hold the substrate. Therefore, in the present embodiment, the upper electrostatic chuck member 400 having a small size (this small-sized upper electrostatic chuck member 400 does not A difference in electromagnetic force is generated between the center and the periphery) is uniformly mounted on the upper table 200, thereby enhancing the clamping force of the electrostatic chuck member 400. Therefore, even when the size of the substrate is increased to, for example, 1500 × 1800 mm (sixth generation substrate) or more, the chuck member can stably hold the substrate.

此處,上靜電卡盤部件400是排列在上工作臺200的底面上。如此一來,因為上工作臺200的表面不均勻,且上靜電卡盤部件400之間存在著厚度差,所以上靜電卡盤部件400是不均勻排列的。Here, the upper electrostatic chuck member 400 is arranged on the bottom surface of the upper table 200. As a result, since the surface of the upper stage 200 is uneven and there is a thickness difference between the upper electrostatic chuck members 400, the upper electrostatic chuck members 400 are unevenly arranged.

因此,本實施例中提供平坦度調整單元500,用來調整黏附在上工作臺200上的上靜電卡盤部件400之間的平坦度。在本實施例中,平坦度調整單元500是利用螺紋(threads)來調整每個上靜電卡盤部件400與上工作臺200之間的間隙。Therefore, in the present embodiment, the flatness adjusting unit 500 is provided for adjusting the flatness between the upper electrostatic chuck members 400 adhered to the upper table 200. In the present embodiment, the flatness adjustment unit 500 adjusts the gap between each of the upper electrostatic chuck member 400 and the upper stage 200 by using threads.

因此,如圖1與圖6所示,平坦度調整單元500包括:多個第一調整螺釘孔510,穿過各別靜電卡盤部件400而形成;多個第二調整螺釘孔520,穿過上工作臺200而形成、且與第一調整螺釘孔510對應;以及間隙調整螺釘530,插入到第一調整螺釘孔510與第二調整螺釘孔520。此處,第一調整螺釘孔510是穿過上靜電卡盤部件400而形成的通孔(through holes)。此處,如圖2與圖4所示,較佳的是,每個上靜電卡盤部件400中形成四個第一調整螺釘孔510。也就是說,第一調整螺釘孔510是配置在矩形的上靜電卡盤部件400的四個角落處。Therefore, as shown in FIG. 1 and FIG. 6, the flatness adjusting unit 500 includes: a plurality of first adjusting screw holes 510 formed through the respective electrostatic chuck members 400; and a plurality of second adjusting screw holes 520 passing through The upper table 200 is formed and corresponding to the first adjustment screw hole 510; and the gap adjustment screw 530 is inserted into the first adjustment screw hole 510 and the second adjustment screw hole 520. Here, the first adjustment screw hole 510 is a through hole formed through the upper electrostatic chuck member 400. Here, as shown in FIGS. 2 and 4, it is preferable that four first adjustment screw holes 510 are formed in each of the upper electrostatic chuck members 400. That is, the first adjustment screw holes 510 are disposed at four corners of the rectangular upper electrostatic chuck member 400.

此處,如圖6所示,每個第一調整螺釘孔510上方的 區域(即,電極層440的區域)具有與螺釘頭相對應的形狀,而每個第一調整螺釘孔510下方的區域則具有螺紋形狀。另外,每個第二調整螺釘孔520上方的區域(即,上工作臺200的底面區域)形成螺紋形狀,而每個第二調整螺釘孔520下方的區域(即,上工作臺200的中心區域)則形成直線形。此外,間隙調整螺釘530包括:螺釘頭與螺釘體。在間隙調整螺釘530之螺釘體之中心區域、形成與第一調整螺釘孔510、第二調整螺釘孔520之螺紋相對應的螺紋。Here, as shown in FIG. 6, above each of the first adjustment screw holes 510 The area (i.e., the area of the electrode layer 440) has a shape corresponding to the screw head, and the area under each of the first adjustment screw holes 510 has a thread shape. In addition, an area above each of the second adjustment screw holes 520 (ie, a bottom surface area of the upper table 200) forms a thread shape, and an area under each of the second adjustment screw holes 520 (ie, a central area of the upper table 200) ) forms a straight line. Further, the gap adjusting screw 530 includes a screw head and a screw body. In the central region of the screw body of the gap adjusting screw 530, a thread corresponding to the threads of the first adjusting screw hole 510 and the second adjusting screw hole 520 is formed.

在本實施例中,黏附在上工作臺200上的上靜電卡盤部件400之間的平坦度,可用平坦度調整單元500來調整。In the present embodiment, the flatness between the upper electrostatic chuck members 400 adhered to the upper table 200 can be adjusted by the flatness adjusting unit 500.

也就是說,如圖7所示,當由於(例如)組合過程誤差或製造過程誤差而導致上工作臺200之表面與參考面不在同一水平線上時,會發生以下問題。也就是說,當靜電卡盤部件400黏附在傾斜的上工作臺200的底面上時,如圖7之(a)所示,上靜電卡盤部件400也是傾斜的。然而,如圖7之(b)所示,藉由操縱位於上工作臺200之傾斜區域中的間隙調整螺釘530,而使得靜電卡盤部件400之表面與上工作臺200之間隔開之後,上靜電卡盤部件400相對於參考面就變水平了。That is, as shown in FIG. 7, when the surface of the upper stage 200 is not on the same horizontal line as the reference plane due to, for example, a combination process error or a manufacturing process error, the following problem occurs. That is, when the electrostatic chuck member 400 is adhered to the bottom surface of the inclined upper table 200, as shown in (a) of Fig. 7, the upper electrostatic chuck member 400 is also inclined. However, as shown in (b) of FIG. 7, after the gap adjusting screw 530 located in the inclined region of the upper table 200 is manipulated to separate the surface of the electrostatic chuck member 400 from the upper table 200, The electrostatic chuck component 400 becomes level relative to the reference surface.

此外,如圖8所示,當由於(例如)製程誤差或緩衝層所導致的高度減小而造成上靜電卡盤部件400之高度不一致時,會發生以下問題。圖8中位於中心的上靜電卡盤部件400相對較低。因此,當上靜電卡盤部件400緊密接 觸上工作臺200時(見虛線),上靜電卡盤部件400的高度不一致。然而,藉由操縱間隙調整螺釘530來調整靜電卡盤部件400與上工作臺200之間的間隙之後,上靜電卡盤部件400可變水平。Further, as shown in FIG. 8, when the heights of the upper electrostatic chuck members 400 are inconsistent due to, for example, process errors or height reduction caused by the buffer layer, the following problems occur. The upper central electrostatic chuck component 400 in Figure 8 is relatively low. Therefore, when the upper electrostatic chuck member 400 is closely connected When the table 200 is touched (see dotted line), the height of the upper electrostatic chuck member 400 does not match. However, after the gap adjustment screw 530 is manipulated to adjust the gap between the electrostatic chuck member 400 and the upper table 200, the upper electrostatic chuck member 400 is variable in level.

如上所述,在本實施例中,藉由操縱平坦度調整單元500可使上靜電卡盤部件400的表面變水平。As described above, in the present embodiment, the surface of the upper electrostatic chuck member 400 can be leveled by manipulating the flatness adjusting unit 500.

此處,如圖9之改良示例所示,上述之平坦度調整單元500可經設計以使得間隙調整螺釘530從上工作臺200穿透至上靜電卡盤部件400。也就是說,第二調整螺釘孔520可形成在穿過上工作臺200而形成的通孔中。另外,第一調整螺釘孔510可只在上靜電卡盤部件400之基底板410之區域上形成。因此,靜電卡盤部件400之底面(與表面相接觸)上不用形成凹槽。Here, as shown in the modified example of FIG. 9, the above-described flatness adjustment unit 500 may be designed such that the gap adjustment screw 530 penetrates from the upper table 200 to the upper electrostatic chuck member 400. That is, the second adjustment screw hole 520 may be formed in the through hole formed through the upper table 200. In addition, the first adjustment screw hole 510 may be formed only on the area of the base plate 410 of the upper electrostatic chuck member 400. Therefore, no groove is formed on the bottom surface (in contact with the surface) of the electrostatic chuck member 400.

如上所述,在本實施例中,利用靜電力來夾持基板的上靜電卡盤部件400是安裝在上工作臺200之底面上。此處,上靜電卡盤部件400可以分離單元的方式來形成,並組合在一起。此處,上靜電卡盤部件400可利用間隙調整螺釘530來固定在上工作臺200上。不用說,也可使用其他緊固件(螺栓或黏合劑)來固定上靜電卡盤部件400。除了上述原因之外,直到腔室部件100的內部空間被抽真空之前,上靜電卡盤部件400還會因自身重力而下垂。然而,在本實施例中,由於基板11緊密地接觸上靜電卡盤部件400之表面,所以基板11不會下垂且保持預定高度。As described above, in the present embodiment, the upper electrostatic chuck member 400 that sandwiches the substrate by electrostatic force is mounted on the bottom surface of the upper table 200. Here, the upper electrostatic chuck member 400 may be formed in a manner of separating units and combined. Here, the upper electrostatic chuck member 400 can be fixed to the upper table 200 by using the gap adjusting screw 530. Needless to say, other fasteners (bolts or adhesives) may be used to secure the upper electrostatic chuck member 400. In addition to the above reasons, the upper electrostatic chuck member 400 may sag due to its own gravity until the internal space of the chamber member 100 is evacuated. However, in the present embodiment, since the substrate 11 closely contacts the surface of the upper electrostatic chuck member 400, the substrate 11 does not sag and maintain a predetermined height.

此外,至少一個下靜電卡盤部件600面朝著上靜電卡 盤部件400而配置在下工作臺300上。此處,下靜電卡盤部件600之形狀與上靜電卡盤部件400之形狀相似或相同。另外,下靜電卡盤部件600可分隔成多個分區來支撐並固定大尺寸的基板12。In addition, at least one lower electrostatic chuck component 600 faces the upper electrostatic card The disk member 400 is disposed on the lower table 300. Here, the shape of the lower electrostatic chuck member 600 is similar or identical to the shape of the upper electrostatic chuck member 400. In addition, the lower electrostatic chuck member 600 can be divided into a plurality of sections to support and fix the large-sized substrate 12.

此處,上基板11被上靜電卡盤部件400支撐並固定在上工作臺200上,且下基板12被下靜電卡盤部件600支撐並固定在下工作臺300上。此處,要想將上基板11與下基板12附著並密封在一起,必須先將上基板11與下基板12移入腔室部件100,且放置在各別的上靜電卡盤部件400與下靜電卡盤部件600上。另外,將上基板11與下基板12對準並按壓在一起。Here, the upper substrate 11 is supported by the upper electrostatic chuck member 400 and fixed on the upper table 200, and the lower substrate 12 is supported by the lower electrostatic chuck member 600 and fixed to the lower table 300. Here, in order to attach and seal the upper substrate 11 and the lower substrate 12, the upper substrate 11 and the lower substrate 12 must first be moved into the chamber member 100, and placed on the respective upper electrostatic chuck member 400 and static electricity. On the chuck member 600. In addition, the upper substrate 11 and the lower substrate 12 are aligned and pressed together.

因此,本實施例中,提供下載物台部件700與上載物台部件800。Therefore, in the present embodiment, the download stage component 700 and the upload stage component 800 are provided.

下載物台部件700藉由移動下工作臺300來移動下基板12,且上載物台部件800藉由移動上工作臺200來移動上基板11。The download stage unit 700 moves the lower substrate 12 by moving the lower stage 300, and the upload stage unit 800 moves the upper substrate 11 by moving the upper stage 200.

下載物台部件700包括:至少一個下驅動軸710,其耦接至下工作臺300;以及下驅動單元720,對下驅動軸710施加驅動力。此處,下驅動軸710部分地穿透腔室部件100的一部分。因此,要安裝下伸縮囊(lower bellows)730來包圍著下驅動軸710,以防止驅動軸710破壞腔室部件100之密封。儘管圖中未繪示,但是可更提供多個透過下工作臺300來升降的升降銷(lift pins)。另外,下載物台部件700可調整下工作臺300的X、Y及θ位置。也就 是說,下載物台部件700包括X、Y及θ位置調整單元,用來調整下工作臺300的各別X、Y及θ位置。因此,下基板12與上基板11可利用X、Y及θ位置調整單元來進行對準。此處,本實施例之基板組合裝置可更包括:諸如照相機或感測器的對準單元,用來對準下基板12與上基板11。The download stage component 700 includes at least one lower drive shaft 710 coupled to the lower stage 300, and a lower drive unit 720 that applies a driving force to the lower drive shaft 710. Here, the lower drive shaft 710 partially penetrates a portion of the chamber component 100. Therefore, a lower bellows 730 is installed to surround the lower drive shaft 710 to prevent the drive shaft 710 from breaking the seal of the chamber component 100. Although not shown in the drawings, a plurality of lift pins that are lifted and lowered through the lower table 300 may be further provided. In addition, the download stage component 700 can adjust the X, Y, and θ positions of the lower stage 300. Also That is, the download stage component 700 includes X, Y, and θ position adjustment units for adjusting the respective X, Y, and θ positions of the lower stage 300. Therefore, the lower substrate 12 and the upper substrate 11 can be aligned by the X, Y, and θ position adjusting units. Here, the substrate assembly apparatus of the present embodiment may further include an alignment unit such as a camera or a sensor for aligning the lower substrate 12 and the upper substrate 11.

上載物台部件800包括:至少一個上驅動軸810,其耦接至上工作臺200;以及上驅動單元820,對上驅動軸810施加驅動力。上載物台部件800更包括上伸縮囊830,其配置在上驅動軸820的外牆上。此處,上載物台部件800是藉由降低上工作臺200,來將上基板11與下基板12按壓在一起。The upload stage component 800 includes at least one upper drive shaft 810 coupled to the upper table 200, and an upper drive unit 820 that applies a driving force to the upper drive shaft 810. The upload stage component 800 further includes an upper bellows 830 disposed on an outer wall of the upper drive shaft 820. Here, the upload stage member 800 presses the upper substrate 11 and the lower substrate 12 together by lowering the upper stage 200.

此外,基板組合裝置可更包括一真空吸附單元,其利用真空吸附力以及靜電力來固定基板11與12。此處,真空吸附單元包括:噴嘴部件,緊密接觸基板11與12;伸長管,連接至噴嘴部件;以及真空幫浦(vacuum pump),配置在伸長管的一端。此處,噴嘴部件可形成在上靜電卡盤部件400與/或下靜電卡盤部件600的表面上。Further, the substrate assembly apparatus may further include a vacuum adsorption unit that fixes the substrates 11 and 12 by vacuum suction force and electrostatic force. Here, the vacuum adsorption unit includes a nozzle member that closely contacts the substrates 11 and 12, an elongated tube that is connected to the nozzle member, and a vacuum pump that is disposed at one end of the elongated tube. Here, the nozzle member may be formed on the surface of the upper electrostatic chuck member 400 and/or the lower electrostatic chuck member 600.

因此,本實施例之基板組合裝置將透明的玻璃基板12配置在腔室部件100中的下工作臺300上,此玻璃基板12上形成有薄膜電晶體與畫素電極。首先,此基板組合裝置使基板12能夠緊密接觸下靜電卡盤部件600,然後利用下靜電卡盤部件600的靜電力來支撐並固定著基板12。此處,可將液晶滴在玻璃基板12上。不用說,玻璃基板12 的周邊部分可塗上諸如密封劑的密封構件。另外,將透明的玻璃基板11配置在上工作臺200上,此玻璃基板11上形成有共用電極與彩色濾光圖案。基板11是用真空吸附力來支撐著、且利用上靜電卡盤部件400的靜電力來固定住。此處,玻璃基板11的周邊部分可塗上諸如密封劑的密封構件。Therefore, the substrate assembly apparatus of the present embodiment has the transparent glass substrate 12 disposed on the lower stage 300 in the chamber member 100, on which the thin film transistor and the pixel electrode are formed. First, the substrate assembly apparatus enables the substrate 12 to closely contact the lower electrostatic chuck member 600, and then supports and fixes the substrate 12 by the electrostatic force of the lower electrostatic chuck member 600. Here, the liquid crystal may be dropped on the glass substrate 12. Needless to say, the glass substrate 12 The peripheral portion may be coated with a sealing member such as a sealant. Further, a transparent glass substrate 11 is placed on the upper stage 200, and a common electrode and a color filter pattern are formed on the glass substrate 11. The substrate 11 is supported by a vacuum suction force and is fixed by the electrostatic force of the upper electrostatic chuck member 400. Here, the peripheral portion of the glass substrate 11 may be coated with a sealing member such as a sealant.

然後,腔室部件100被抽真空,且基板11與12相互對準。接著,降低上工作臺200,使基板11與12附著並密封在一起。接著,釋放真空之後,將附著在一起的兩個基板11與12轉移至硬化裝置,對密封構件區域施加光或熱以使密封構件硬化,從而使基板11與12徹底地附著在一起。Then, the chamber member 100 is evacuated, and the substrates 11 and 12 are aligned with each other. Next, the upper stage 200 is lowered, and the substrates 11 and 12 are attached and sealed together. Next, after the vacuum is released, the two substrates 11 and 12 adhered together are transferred to the hardening device, and light or heat is applied to the sealing member region to harden the sealing member, thereby completely adhering the substrates 11 and 12.

雖然以上是參照特定實施例來描述基板組合裝置,但是基板組合裝置並不侷限於該特定實施例。下面將描述的是依照另一實施例的一種基板組合裝置。與前述之實施例相同的部件將不再重述。本實施例的技術概念也適用於前述之實施例。Although the substrate assembly device has been described above with reference to a specific embodiment, the substrate assembly device is not limited to this particular embodiment. Described below is a substrate assembly apparatus in accordance with another embodiment. The same components as those of the foregoing embodiments will not be repeated. The technical concept of the present embodiment is also applicable to the foregoing embodiments.

圖10是依照另一實施例的一種基板組合裝置的橫剖面圖。Figure 10 is a cross-sectional view of a substrate assembly apparatus in accordance with another embodiment.

請參照圖10,依照本實施例的基板組合裝置包括:腔室部件100、上工作臺200與下工作臺300、多個上靜電卡盤部件400與下靜電卡盤部件600以及下載物台部件700與上載物台部件800。此基板組合裝置更包括:平坦度調整單元500,使上靜電卡盤部件400的表面變水平;以及 感測器部件900,用來偵測上靜電卡盤部件400的表面高度。在本實施例中,平坦度調整單元500包括:多個驅動馬達部件550,配置在上工作臺200的頂面上、且與各別的上靜電卡盤部件400對應;以及至少一個驅動軸部件540,從驅動馬達部件550穿過上工作臺200而延伸至上靜電卡盤部件400。在本實施例中,上靜電卡盤部件400的高度可利用各別的驅動馬達部件550來自動控制。在本實施例中,感測器部件900是配置在腔室部件100之內牆區域中,用來偵測靜電卡盤部件400之高度是否一致。若靜電卡盤部件400之高度不一致,則利用對應之驅動馬達部件550來控制具有不同高度的上靜電卡盤部件400的高度。不用說,用來自動偵測高度的感測器部件900也可省略。取而代之的是,可使用肉眼或平坦度測量裝置來對上靜電卡盤部件400之水平面進行均勻控制。Referring to FIG. 10, a substrate assembly apparatus according to the present embodiment includes a chamber member 100, an upper table 200 and a lower table 300, a plurality of upper electrostatic chuck members 400 and a lower electrostatic chuck member 600, and a download stage member. 700 and upload stage component 800. The substrate assembly device further includes: a flatness adjustment unit 500 to level the surface of the upper electrostatic chuck member 400; The sensor component 900 is configured to detect the surface height of the upper electrostatic chuck component 400. In the present embodiment, the flatness adjustment unit 500 includes a plurality of drive motor components 550 disposed on a top surface of the upper work table 200 and corresponding to the respective upper electrostatic chuck members 400; and at least one drive shaft member 540 extends from the drive motor component 550 through the upper table 200 to the upper electrostatic chuck component 400. In the present embodiment, the height of the upper electrostatic chuck member 400 can be automatically controlled by the respective drive motor components 550. In the present embodiment, the sensor component 900 is disposed in the inner wall region of the chamber component 100 for detecting whether the height of the electrostatic chuck component 400 is uniform. If the heights of the electrostatic chuck members 400 are not uniform, the heights of the upper electrostatic chuck members 400 having different heights are controlled by the corresponding driving motor members 550. Needless to say, the sensor component 900 for automatically detecting the height can also be omitted. Instead, the horizontal plane of the upper electrostatic chuck component 400 can be uniformly controlled using a naked eye or flatness measuring device.

雖然本實施例所呈現與描述的是驅動馬達部件550配置在上工作臺200之頂面上,但是本發明並不侷限於此。也就是說,驅動馬達部件550也可配置在腔室部件100之外側。此處,驅動軸部件540可穿過腔室部件100與上工作臺200來耦接至上靜電卡盤部件400。Although the present embodiment shows and describes that the drive motor unit 550 is disposed on the top surface of the upper table 200, the present invention is not limited thereto. That is, the drive motor component 550 can also be disposed on the outer side of the chamber component 100. Here, the drive shaft member 540 can be coupled to the upper electrostatic chuck member 400 through the chamber member 100 and the upper table 200.

儘管以上是參照特定實施例來描述基板組合裝置,但基板組合裝置並不侷限於該特定實施例。下面將依照又一實施例來描述一種基板組合裝置。與前述之實施例相同的部件將不再重述。本實施例之技術概念可應用於前述之實施例。Although the substrate assembly device has been described above with reference to a specific embodiment, the substrate assembly device is not limited to this particular embodiment. A substrate assembly apparatus will be described below in accordance with still another embodiment. The same components as those of the foregoing embodiments will not be repeated. The technical concept of the embodiment can be applied to the foregoing embodiments.

圖11是依照又一實施例的一種基板組合裝置的橫剖面圖。Figure 11 is a cross-sectional view of a substrate assembly apparatus in accordance with still another embodiment.

請參照圖11,依照本實施例之基板組合裝置包括:腔室部件100、上工作臺200與下工作臺300、多個上靜電卡盤部件400與下靜電卡盤部件600以及下載物台部件700與上載物台部件800。此基板組合裝置更包括平坦度調整單元500,用來使上靜電卡盤部件400的表面變水平。Referring to FIG. 11, the substrate assembly apparatus according to the embodiment includes: a chamber member 100, an upper table 200 and a lower table 300, a plurality of upper electrostatic chuck members 400 and a lower electrostatic chuck member 600, and a download stage member. 700 and upload stage component 800. The substrate assembly apparatus further includes a flatness adjustment unit 500 for leveling the surface of the upper electrostatic chuck member 400.

此處,上工作臺200在其底面提供多個凹槽210,這些凹槽210與上靜電卡盤部件400對應。也就是說,上靜電卡盤部件400是位於各別凹槽210下方。此處,本實施例之平坦度調整單元500可以是氣動式、液壓式、電動式氣缸。此處,靜電卡盤部件400之高度經均勻調節,以改良上靜電卡盤部件400之間的表面平坦度。Here, the upper table 200 is provided with a plurality of grooves 210 on its bottom surface, which correspond to the upper electrostatic chuck member 400. That is, the upper electrostatic chuck member 400 is located below the respective recess 210. Here, the flatness adjustment unit 500 of the present embodiment may be a pneumatic, hydraulic, or electric cylinder. Here, the height of the electrostatic chuck member 400 is uniformly adjusted to improve the surface flatness between the upper electrostatic chuck members 400.

儘管以上是參照特定實施例來描述基板組合裝置,但基板組合裝置並不侷限於該特定實施例。下面將依照再一實施例來描述一種基板組合裝置。與前述之實施例相同的部件將不再贅述。本實施例之技術概念可應用於前述之實施例。Although the substrate assembly device has been described above with reference to a specific embodiment, the substrate assembly device is not limited to this particular embodiment. A substrate assembly apparatus will be described below in accordance with still another embodiment. The same components as those of the foregoing embodiments will not be described again. The technical concept of the embodiment can be applied to the foregoing embodiments.

圖12是依照再一實施例的一種基板組合裝置的橫剖面圖。圖13是上工作臺的俯視平面圖,用來繪示圖12所示之基板組合裝置的多個靜電卡盤部件的排列。圖14是靜電卡盤部件的俯視平面圖,用來繪示圖12所示之基板組合裝置的靜電卡盤部件的電極圖案。圖15與圖16是圖12所示之基板組合裝置的靜電卡盤部件的改良示例的俯視平 面圖。圖17是靜電卡盤耦接至圖12所示之基板組合裝置之上工作臺的橫剖面圖。圖18與圖19是靜電卡盤部件耦接至圖12所示之基板組合裝置之上工作臺的改良示例的橫剖面圖。圖20之(a)~(c)繪示為圖12所示之基板組合裝置之靜電卡盤部件之操作的示意圖。Figure 12 is a cross-sectional view of a substrate assembly apparatus in accordance with still another embodiment. Figure 13 is a top plan view of the upper table for illustrating the arrangement of the plurality of electrostatic chuck components of the substrate assembly shown in Figure 12. Figure 14 is a top plan view of the electrostatic chuck member for illustrating the electrode pattern of the electrostatic chuck member of the substrate assembly shown in Figure 12 . 15 and FIG. 16 are plan views of a modified example of the electrostatic chuck member of the substrate assembly apparatus shown in FIG. Surface map. Figure 17 is a cross-sectional view of the electrostatic chuck coupled to the table above the substrate assembly shown in Figure 12. 18 and 19 are cross-sectional views showing a modified example in which an electrostatic chuck member is coupled to a table above the substrate assembly shown in FIG. 20(a) to (c) are schematic views showing the operation of the electrostatic chuck member of the substrate assembly shown in Fig. 12.

請參照圖12至圖20,本實施例之基板組合裝置包括:腔室部件1100,其界定一內部空間;上工作臺1200與下工作臺1300,面對面地配置在腔室部件1100中;多個上靜電卡盤部件1400,安裝在上工作臺1200之底面上;多個電力控制單元1500,施加電力給各別的上靜電卡盤部件1400;至少一個下靜電卡盤部件1600,安裝在下工作臺1300之頂面上;下載物台部件1700,用來移動下工作臺1300;以及上載物台部件1800,用來移動上工作臺1200。Referring to FIG. 12 to FIG. 20, the substrate assembly apparatus of the present embodiment includes: a chamber member 1100 defining an internal space; an upper table 1200 and a lower table 1300 disposed face to face in the chamber member 1100; The upper electrostatic chuck component 1400 is mounted on the bottom surface of the upper workbench 1200; the plurality of power control units 1500 apply power to the respective upper electrostatic chuck components 1400; at least one lower electrostatic chuck component 1600 is mounted on the lower workbench A top surface of the 1300; a download stage component 1700 for moving the lower stage 1300; and an upload stage component 1800 for moving the upper stage 1200.

此處,儘管圖中未繪示,但是此基板組合裝置可更包括一框架,腔室部件1100被裝入此框架,且下載物台部件1700與上載物台部件1800配置在此框架上。另外,可更提供多個下電力控制單元(未繪示),用來施加電力給下靜電卡盤部件1600。Here, although not shown in the drawings, the substrate assembly apparatus may further include a frame into which the chamber member 1100 is fitted, and the download stage member 1700 and the upload stage member 1800 are disposed on the frame. In addition, a plurality of lower power control units (not shown) may be further provided for applying power to the lower electrostatic chuck unit 1600.

腔室部件1100包括:上腔室1110與下腔室1120,其界定了基板組合空間。此處,上腔室1110與下腔室1120以可分離方式相互耦接是有效的。另外,雖然圖中未繪示,但是腔室部件1100可更包括壓力調整單元,用來調節腔室部件1100之內部空間的壓力。另外,腔室部件1100可更包括淨化單元,用來將雜質排出到腔室部件1100的內部空 間之外。圖12所呈現的是上腔室1110與下腔室1120相互耦接的狀態,然而本發明並不侷限於此。例如,腔室部件1100可包括:上面部分、側牆部分以及下面部分。此外,雖然圖中未繪示,但是腔室部件1100可在一側提供入口/出口,藉由此入口/出口來載入或卸載基板。此外,可更提供一閘閥,用來打開與關閉入口/出口。不用說,也可藉由上腔室1110或下腔室1120的升降來將基板載入到腔室部件1100或從腔室部件1100卸載。此處,可更提供升降構件,用來升高與降低各別的上腔室1110與下腔室1120。The chamber component 1100 includes an upper chamber 1110 and a lower chamber 1120 that define a substrate assembly space. Here, it is effective that the upper chamber 1110 and the lower chamber 1120 are coupled to each other in a detachable manner. Additionally, although not shown in the drawings, the chamber component 1100 may further include a pressure adjustment unit for adjusting the pressure of the interior space of the chamber component 1100. Additionally, the chamber component 1100 can further include a purification unit for discharging impurities into the interior of the chamber component 1100. Outside. 12 shows a state in which the upper chamber 1110 and the lower chamber 1120 are coupled to each other, but the present invention is not limited thereto. For example, the chamber component 1100 can include an upper portion, a side wall portion, and a lower portion. Further, although not shown in the drawings, the chamber member 1100 may provide an inlet/outlet on one side by which the substrate is loaded or unloaded. In addition, a gate valve can be provided for opening and closing the inlet/outlet. Needless to say, the substrate can also be loaded into or unloaded from the chamber member 1100 by the lifting of the upper chamber 1110 or the lower chamber 1120. Here, a lifting member may be further provided for raising and lowering the respective upper chamber 1110 and lower chamber 1120.

上工作臺1200提供為板狀,且鄰近上腔室1110之內表面而配置。板的形狀可隨著配置在上工作臺1200之底面上的基板的形狀而變化多端。在本實施例中,上工作臺1200形成矩形板狀。另外,下工作臺1300也是形成板狀,且鄰近下腔室1120之內表面而配置。此外,下工作臺形成與上工作臺相似或相同的形狀是有效的。因此,上工作臺與下工作臺經配置以使得上工作臺1200之底面正對著下工作臺之頂面。The upper table 1200 is provided in a plate shape and disposed adjacent to the inner surface of the upper chamber 1110. The shape of the plate may vary abundance with the shape of the substrate disposed on the bottom surface of the upper table 1200. In the present embodiment, the upper table 1200 is formed in a rectangular plate shape. In addition, the lower table 1300 is also formed in a plate shape and disposed adjacent to the inner surface of the lower chamber 1120. In addition, it is effective that the lower table forms a shape similar or identical to the upper table. Thus, the upper and lower tables are configured such that the bottom surface of the upper table 1200 is directly opposite the top surface of the lower table.

上靜電卡盤部件1400是按照矩陣圖案的方式而安裝並固定在上工作臺1200之底面上。也就是說,如圖13所示,二十個靜電卡盤部件1400(例如,4×5矩陣圖案)配置在上工作臺1200的整個底面上。不用說,靜電卡盤部件的數量並不侷限於二十個。也就是說,靜電卡盤部件的數量可大於或小於二十個。The upper electrostatic chuck member 1400 is mounted and fixed to the bottom surface of the upper table 1200 in a matrix pattern. That is, as shown in FIG. 13, twenty electrostatic chuck members 1400 (for example, a 4 x 5 matrix pattern) are disposed on the entire bottom surface of the upper table 1200. Needless to say, the number of electrostatic chuck components is not limited to twenty. That is, the number of electrostatic chuck components can be greater or less than twenty.

每個上靜電卡盤部件1400包括:基底板1410;緩衝 層1420,位於基底板1410上;第一薄膜層1430,位於緩衝層1420上;電極層1440,形成在第一薄膜層1430上;以及第二薄膜層1450,覆蓋著電極層1440。此處,緩衝層1420是用第一黏合構件1411來黏附在基底板1410上,且第一薄膜層1430是用第二黏合層1421來黏附在緩衝層1420上。另外,電極層1440包括多個電極圖案,這些電極圖案是用第三黏合層1431來黏附在第一薄膜層1420上。另外,第二薄膜層1450是用第四黏合構件1441來黏附在電極層1440所在的第一薄膜層1430上以及電極層1440上。Each upper electrostatic chuck component 1400 includes: a base plate 1410; a buffer A layer 1420 is disposed on the base plate 1410; a first film layer 1430 is disposed on the buffer layer 1420; an electrode layer 1440 is formed on the first film layer 1430; and a second film layer 1450 is disposed over the electrode layer 1440. Here, the buffer layer 1420 is adhered to the base plate 1410 by the first adhesive member 1411, and the first film layer 1430 is adhered to the buffer layer 1420 by the second adhesive layer 1421. In addition, the electrode layer 1440 includes a plurality of electrode patterns which are adhered to the first film layer 1420 by the third adhesive layer 1431. In addition, the second film layer 1450 is adhered to the first film layer 1430 where the electrode layer 1440 is located and the electrode layer 1440 by the fourth bonding member 1441.

如圖14所示,本實施例之電極層1440包括:多個正電極圖案1442;多個負電極圖案1443;正端子1444,電性耦接至要施加正電力的正電極圖案1442;以及負端子1445,電性耦接至要施加負電力的負電極圖案1443。As shown in FIG. 14, the electrode layer 1440 of the present embodiment includes: a plurality of positive electrode patterns 1442; a plurality of negative electrode patterns 1443; a positive terminal 1444 electrically coupled to a positive electrode pattern 1442 to which positive power is to be applied; and a negative The terminal 1445 is electrically coupled to the negative electrode pattern 1443 to which negative power is to be applied.

另外,如圖17所示,電極層1440更包括:電力連接部件1460,此電力連接部件1460連接至各別的正端子1444與負端子1445,且從外部電力輸入端施加電力。此處,電力連接部件1460包括:第一線部件與第二線部件,連接至各別的正端子1444與負端子1445;以及正連接端子與負連接端子,位於各別的第一線部件與第二線部件上。此處,使用包線(covered wires)來作為線部件。另外,正端子與負端子可以連接件或插座以及電線的形式來提供。In addition, as shown in FIG. 17, the electrode layer 1440 further includes a power connection member 1460 that is connected to the respective positive terminal 1444 and the negative terminal 1445, and applies power from the external power input terminal. Here, the power connection component 1460 includes: a first wire component and a second wire component connected to the respective positive terminal 1444 and the negative terminal 1445; and a positive connection terminal and a negative connection terminal located at the respective first wire component and On the second line component. Here, covered wires are used as the wire members. In addition, the positive terminal and the negative terminal may be provided in the form of a connector or a socket and a wire.

此外,電極層1440更包括:多個正電極連接線1446,將正電極圖案1442以電性方式互連;以及多個負電極連接 線1447,將負電極圖案1443以電性方式互連。因此,從正端子1444施加的電力透過正電極連接線1446而施加在正電極圖案1442上。從負端子1445施加的電力透過負電極連接線1447而施加在負電極圖案1443上。In addition, the electrode layer 1440 further includes: a plurality of positive electrode connection lines 1446 electrically interconnecting the positive electrode patterns 1442; and a plurality of negative electrode connections Line 1447 electrically interconnects the negative electrode patterns 1443. Therefore, the electric power applied from the positive terminal 1444 is applied to the positive electrode pattern 1442 through the positive electrode connection line 1446. The electric power applied from the negative terminal 1445 is applied to the negative electrode pattern 1443 through the negative electrode connection line 1447.

此處,正電極圖案1442與負電極圖案1443是形成矩形板狀。正電極圖案1442與負電極圖案1443交替地排列成矩陣圖案。也就是說,負電極圖案1443鄰接著正電極圖案1442而配置,且正電極圖案1442鄰接著負電極圖案1443而配置。不用說,在圖14中,五個正電極圖案1442與四個負電極圖案1443排列成3×3矩陣圖案。此處,第一行與第二行的負電極圖案1443是藉由第一行與第二行之間的空間裡延伸的負電極連接線1447來互連,且第三行的負電極圖案1443連接至第二行的負電極圖案1443。第三行的有些負電極圖案1443是藉由沿著正電極圖案1442之周邊而延伸的負電極連接線1447來互連。另外,第二行與第三行的正電極圖案1442是藉由沿著第二行與第三行之間的空間而延伸的正電極連接線1446來互連。第一行的兩個正電極圖案1442是藉由沿著負電極圖案1443之周邊而延伸的正電極連接線1447來互連。正電極圖案1442之一連接至第三行的正電極圖案1442,且有些正電極圖案是藉由沿著負電極圖案1443之周邊而延伸的正電極連接線1446來互連。Here, the positive electrode pattern 1442 and the negative electrode pattern 1443 are formed in a rectangular plate shape. The positive electrode pattern 1442 and the negative electrode pattern 1443 are alternately arranged in a matrix pattern. That is, the negative electrode pattern 1443 is disposed adjacent to the positive electrode pattern 1442, and the positive electrode pattern 1442 is disposed adjacent to the negative electrode pattern 1443. Needless to say, in FIG. 14, the five positive electrode patterns 1442 and the four negative electrode patterns 1443 are arranged in a 3 × 3 matrix pattern. Here, the negative electrode patterns 1443 of the first row and the second row are interconnected by the negative electrode connection line 1447 extending in the space between the first row and the second row, and the negative electrode pattern 1443 of the third row Connected to the negative electrode pattern 1443 of the second row. Some of the negative electrode patterns 1443 of the third row are interconnected by a negative electrode connection line 1447 extending along the periphery of the positive electrode pattern 1442. In addition, the positive electrode patterns 1442 of the second and third rows are interconnected by the positive electrode connection lines 1446 extending along the space between the second and third rows. The two positive electrode patterns 1442 of the first row are interconnected by a positive electrode connection line 1447 extending along the periphery of the negative electrode pattern 1443. One of the positive electrode patterns 1442 is connected to the positive electrode patterns 1442 of the third row, and some of the positive electrode patterns are interconnected by the positive electrode connection lines 1446 extending along the periphery of the negative electrode patterns 1443.

此外,如圖15之改良示例所示,八個正電極圖案1442與八個負電極圖案1443可排列成4×4矩陣圖案。此處, 第一行、第二行、第三行及第四行的負電極圖案1443是藉由沿著第一行、第二行、第三行及第四行之間的空間而延伸的負電極連接線1447來互連。第一行與第三行的負電極圖案1443是藉由沿著正電極圖案1442之周邊而延伸的負電極連接線1447來局部互連。另外,第二行與第三行的正電極圖案1442是藉由沿著第二行與第三行之間的空間而延伸的正電極連接線1446來互連。各別第一行與第四行的兩個正電極圖案1442是藉由沿著負電極圖案1443之周邊而延伸的正電極連接線1447來局部互連。第一行的正電極圖案1442是藉由沿著負電極圖案1443之周邊而延伸的正電極連接線1447來局部互連。第四行的正電極圖案1442是藉由沿著負電極圖案1443之周邊而延伸的正電極連接線1447來局部互連。Further, as shown in the modified example of FIG. 15, the eight positive electrode patterns 1442 and the eight negative electrode patterns 1443 may be arranged in a 4×4 matrix pattern. Here, The negative electrode patterns 1443 of the first row, the second row, the third row, and the fourth row are connected by a negative electrode extending along a space between the first row, the second row, the third row, and the fourth row Line 1447 is interconnected. The negative electrode patterns 1443 of the first and third rows are partially interconnected by a negative electrode connection line 1447 extending along the periphery of the positive electrode pattern 1442. In addition, the positive electrode patterns 1442 of the second and third rows are interconnected by the positive electrode connection lines 1446 extending along the space between the second and third rows. The two positive electrode patterns 1442 of the respective first and fourth rows are partially interconnected by a positive electrode connection line 1447 extending along the periphery of the negative electrode pattern 1443. The positive electrode patterns 1442 of the first row are partially interconnected by the positive electrode connection lines 1447 extending along the periphery of the negative electrode patterns 1443. The positive electrode patterns 1442 of the fourth row are partially interconnected by the positive electrode connection lines 1447 extending along the periphery of the negative electrode patterns 1443.

不用說,正電極圖案1442與負電極圖案1443的數量與矩陣圖案並不侷限於以上的數量與矩陣圖案,而是數量可大於或小於以上數量。Needless to say, the number and matrix pattern of the positive electrode pattern 1442 and the negative electrode pattern 1443 are not limited to the above number and matrix pattern, but the number may be larger or smaller than the above number.

此外,正電極圖案1442與負電極圖案1443的形狀也不侷限於以上的形狀。也就是說,如圖16之改良示例所示,正電極圖案1442與負電極圖案1443可形成指狀,且交替地排列。此處,一個正電極圖案1442的一端耦接至正端子1444。一個負電極圖案1443的一端耦接至負端子1445。不用說,本發明並不侷限於此。也就是說,正電極圖案1442與負電極圖案1443可形成多種形狀,且交替地排列。Further, the shapes of the positive electrode pattern 1442 and the negative electrode pattern 1443 are not limited to the above shapes. That is, as shown in the modified example of FIG. 16, the positive electrode pattern 1442 and the negative electrode pattern 1443 may be formed in a finger shape and alternately arranged. Here, one end of one positive electrode pattern 1442 is coupled to the positive terminal 1444. One end of one negative electrode pattern 1443 is coupled to the negative terminal 1445. Needless to say, the present invention is not limited to this. That is, the positive electrode pattern 1442 and the negative electrode pattern 1443 can be formed in various shapes and alternately arranged.

具有上述結構的上靜電卡盤部件1400是配置在上工作臺1200上,用來舉起大尺寸的基板1011。The upper electrostatic chuck member 1400 having the above structure is disposed on the upper table 1200 for lifting the large-sized substrate 1011.

也就是說,當基板1011與1012的尺寸增大時,用來支撐並固定基板1011與1012的靜電卡盤部件的尺寸也增大。然而,當靜電卡盤部件的尺寸增大時,靜電卡盤中的電極圖案所造成的電阻就增大,因此靜電卡盤部件的周邊區域與中心區域之間產生電磁力差,故而靜電卡盤部件無法有效地夾持基板。因此,在本實施例中,具有小尺寸(550×650mm(第三代),這種小尺寸不會在中心與周邊之間產生電磁力差)的上靜電卡盤部件1400被均勻地安裝在上工作臺1200上,從而提高靜電卡盤部件1400的夾持力。也就是說,靜電卡盤部件的尺寸可從50×50mm~550×650mm的範圍內選擇。當靜電卡盤部件的尺寸小於50×50mm時,要安裝的靜電卡盤部件1400的數量就會增加,因此安裝靜電卡盤部件1400所需的製程時間就會增加。當靜電卡盤部件的尺寸大於550×650mm時,靜電卡盤部件的夾持力就會不均勻。總而言之,即使當基板的尺寸增大至(例如)1500×1800mm(第六代基板)或更大時,卡盤部件也能牢固地固定住基板。That is, as the sizes of the substrates 1011 and 1012 increase, the size of the electrostatic chuck member for supporting and fixing the substrates 1011 and 1012 also increases. However, when the size of the electrostatic chuck member is increased, the electric resistance caused by the electrode pattern in the electrostatic chuck is increased, so that an electromagnetic force difference is generated between the peripheral region of the electrostatic chuck member and the central portion, and thus the electrostatic chuck The component cannot effectively hold the substrate. Therefore, in the present embodiment, the upper electrostatic chuck member 1400 having a small size (550 × 650 mm (third generation) which does not cause an electromagnetic force difference between the center and the periphery) is uniformly mounted on The upper table 1200 is placed on the table 1200 to increase the clamping force of the electrostatic chuck member 1400. That is, the size of the electrostatic chuck member can be selected from the range of 50 x 50 mm to 550 x 650 mm. When the size of the electrostatic chuck member is less than 50 x 50 mm, the number of electrostatic chuck members 1400 to be mounted is increased, so that the processing time required to mount the electrostatic chuck member 1400 is increased. When the size of the electrostatic chuck member is larger than 550 x 650 mm, the clamping force of the electrostatic chuck member is not uniform. In summary, even when the size of the substrate is increased to, for example, 1500 x 1800 mm (sixth generation substrate) or more, the chuck member can firmly hold the substrate.

在本實施例中,配置在上工作臺1200上的靜電卡盤部件1400是獨立地被驅動。In the present embodiment, the electrostatic chuck member 1400 disposed on the upper table 1200 is independently driven.

如圖12與圖17所示,在本實施例中,電力控制部件1500是用來提供電力給各別的靜電卡盤部件1400,從而獨立地驅動靜電卡盤部件1400。As shown in FIGS. 12 and 17, in the present embodiment, the power control unit 1500 is for supplying power to the respective electrostatic chuck members 1400 to independently drive the electrostatic chuck members 1400.

每個電力控制部件1500包括:控制器1510,用來控制電力應用;連接線部件1520,連接至控制器1510;以及連接端子部件1530,位於連接線部件1520的一端、且電性耦接至正端子1444與負端子1445。此處,如圖12所示,更提供一種電力供應部件1900,用來提供電力給電力控制部件1500。Each power control component 1500 includes a controller 1510 for controlling a power application, a connection line component 1520 connected to the controller 1510, and a connection terminal component 1530 located at one end of the connection line component 1520 and electrically coupled to the positive Terminal 1444 and negative terminal 1445. Here, as shown in FIG. 12, a power supply part 1900 is further provided for supplying power to the power control part 1500.

在本實施例中,如圖12與圖17所示,控制器1510是配置在上工作臺1200之頂面上。電力供應部件1900提供電力給控制器1510。因此,即使上工作臺1200在移動時,也能提供電力給靜電卡盤部件1400。In the present embodiment, as shown in FIGS. 12 and 17, the controller 1510 is disposed on the top surface of the upper table 1200. Power supply component 1900 provides power to controller 1510. Therefore, even when the upper table 1200 is moving, power can be supplied to the electrostatic chuck member 1400.

如圖17所示,連接端子部件1530是配置在上工作臺1200之底面上。此處,連接端子部件1530是配置在靜電卡盤部件1400周邊的底面區域上,使得靜電卡盤部件1400的電力連接部件1460連接至連接端子部件1530。也就是說,本實施例之連接端子部件1530的數量與靜電卡盤部件1400的數量相等。透過連接線部件1520而耦接至連接端子部件1530的控制器1510的數量也可與靜電卡盤部件1400的數量相等。As shown in FIG. 17, the connection terminal member 1530 is disposed on the bottom surface of the upper table 1200. Here, the connection terminal member 1530 is disposed on the bottom surface area around the electrostatic chuck member 1400 such that the power connection member 1460 of the electrostatic chuck member 1400 is connected to the connection terminal member 1530. That is, the number of the connection terminal members 1530 of the present embodiment is equal to the number of the electrostatic chuck members 1400. The number of controllers 1510 coupled to the connection terminal members 1530 through the connecting wire members 1520 may also be equal to the number of the electrostatic chuck members 1400.

此處,因為連接端子部件1530是配置在上工作臺120之底面上,所以容易實現靜電卡盤部件1400與電力控制部件1500之間的電性連接。另外,連接端子部件1530可形成插座式或連接器式,且與正連接端子或負連接端子對應。插座式或連接器式連接端子部件1530被埋入上工作臺1200,且從上工作臺1200的底面局部暴露出來,從而使靜 電卡盤部件1400能夠無任何干擾地安裝在上工作臺1200上。此外,如圖13所示,由於連接端子部件1530從靜電卡盤部件1400的底面區域中局部暴露出來,所以靜電卡盤部件1400的電力連接部件1460可沿著靜電卡盤部件1400之側面而延伸。另外,本發明並不侷限於上述情形,如圖18之改良示例所示,上工作臺1200中形成一凹槽,與靜電卡盤部件1400相接觸,且連接端子部件1530可配置在此凹槽中。如此一來,連接端子部件1530就不會暴露在外了。另外,如圖19之改良示例所示,耦接至靜電卡盤部件1400之電極層1440的電力連接部件1460可穿過靜電卡盤部件1400而伸出到底面區域。此處,靜電卡盤部件1400可提供一孔,電力連接部件1460可從此孔中穿過。另外,連接端子部件1530形成在上工作臺1200之底面上,緊密接觸靜電卡盤部件1400之基底板1410之底面。如此一來,電力連接部件1460與連接端子部件1530可在靜電卡盤部件1400之底面區域處互連。Here, since the connection terminal member 1530 is disposed on the bottom surface of the upper table 120, electrical connection between the electrostatic chuck member 1400 and the power control member 1500 is easily achieved. In addition, the connection terminal member 1530 may be formed in a socket type or a connector type, and corresponds to a positive connection terminal or a negative connection terminal. The socket type or connector type connection terminal member 1530 is buried in the upper table 1200 and partially exposed from the bottom surface of the upper table 1200, thereby allowing the static The electric chuck member 1400 can be mounted on the upper table 1200 without any interference. Further, as shown in FIG. 13, since the connection terminal member 1530 is partially exposed from the bottom surface area of the electrostatic chuck member 1400, the power connection member 1460 of the electrostatic chuck member 1400 can extend along the side of the electrostatic chuck member 1400. . In addition, the present invention is not limited to the above, as shown in the modified example of FIG. 18, a groove is formed in the upper table 1200, in contact with the electrostatic chuck member 1400, and the connection terminal member 1530 can be disposed in the groove. in. As a result, the connection terminal member 1530 is not exposed. Additionally, as shown in the modified example of FIG. 19, the power connection component 1460 coupled to the electrode layer 1440 of the electrostatic chuck component 1400 can extend through the electrostatic chuck component 1400 to the bottom surface region. Here, the electrostatic chuck component 1400 can provide a hole through which the power connection component 1460 can pass. Further, the connection terminal member 1530 is formed on the bottom surface of the upper table 1200 to closely contact the bottom surface of the base plate 1410 of the electrostatic chuck member 1400. As such, the power connection component 1460 and the connection terminal component 1530 can be interconnected at the bottom surface area of the electrostatic chuck component 1400.

如上所述,本實施例之靜電卡盤部件1400是利用耦接至靜電卡盤部件1400的各別控制器1510來進行獨立驅動。也就是說,藉由控制電力控制部件1500之操作,可驅動所有的靜電卡盤部件1400或選擇性地驅動一部分靜電卡盤部件1400。如此一來,能夠夾持多種不同的基板。也就是說,如圖20之(a)所示,要想支撐並固定大尺寸的基板1011,可驅動所有的靜電卡盤部件1400來產生支撐並固定基板1011的靜電力。另外,如圖20之(b)所示,對於 相對較小的基板,可驅動與基板之尺寸相對應的一部分靜電卡盤部件1400,以支撐著基板1011。當支撐圖20之(b)所示之小基板時,只要驅動位於中心區域的六個靜電卡盤部件1400即可,而不必驅動所有的(二十個)靜電卡盤部件1400。此外,如圖20之(c)所示,藉由選擇性地驅動一部分靜電卡盤部件,可固定多個小尺寸的基板1011。在圖20中,藉由驅動第三行與第四行的靜電卡盤部件1400,可支撐並固定兩個基板1011。然而,本發明並不侷限於此。也就是說,可採用多種方法來支撐基板。例如,一個靜電卡盤部件1400可支撐並固定一個基板1011。As described above, the electrostatic chuck member 1400 of the present embodiment is independently driven by the respective controllers 1510 coupled to the electrostatic chuck member 1400. That is, by controlling the operation of the power control unit 1500, all of the electrostatic chuck members 1400 can be driven or a portion of the electrostatic chuck members 1400 can be selectively driven. In this way, a plurality of different substrates can be held. That is, as shown in (a) of FIG. 20, in order to support and fix the large-sized substrate 1011, all of the electrostatic chuck members 1400 can be driven to generate an electrostatic force for supporting and fixing the substrate 1011. In addition, as shown in (b) of FIG. 20, for A relatively small substrate can drive a portion of the electrostatic chuck member 1400 corresponding to the size of the substrate to support the substrate 1011. When supporting the small substrate shown in (b) of FIG. 20, it is only necessary to drive the six electrostatic chuck members 1400 located in the center region without driving all (twenty) electrostatic chuck members 1400. Further, as shown in (c) of FIG. 20, a plurality of small-sized substrates 1011 can be fixed by selectively driving a part of the electrostatic chuck member. In FIG. 20, two substrates 1011 can be supported and fixed by driving the third and fourth rows of the electrostatic chuck members 1400. However, the invention is not limited thereto. That is, a variety of methods can be employed to support the substrate. For example, an electrostatic chuck component 1400 can support and secure a substrate 1011.

靜電卡盤部件1400的電力供應可用電力控制部件1500來達成。也就是說,根據施加在外部控制單元上的訊號,電力控制部件1500可控制提供給靜電卡盤部件1400上的電力。如此一來,可選擇性地或獨立地驅動靜電卡盤部件1400。The power supply to the electrostatic chuck component 1400 can be achieved with the power control component 1500. That is, the power control unit 1500 can control the power supplied to the electrostatic chuck unit 1400 in accordance with the signal applied to the external control unit. As such, the electrostatic chuck component 1400 can be selectively or independently driven.

因為靜電卡盤部件1400能夠獨立地或選擇性地進行驅動,所以即使當至少一個靜電卡盤部件1400損壞時,基板也能夠保持支撐與固定狀態。也就是說,如圖20之(a)所示,即使當位於中心區域的一個靜電卡盤部件1400損壞時,周邊的靜電卡盤部件1400也能使基板1011保持夾持狀態,直到此過程結束為止。也就是說,即使當50%的靜電卡盤部件1400無法工作時,剩餘的靜電卡盤部件1400也能夠支撐並固定住基板1011。此外,因為只需更換損壞的靜電卡盤部件,所以維護成本可降低。Since the electrostatic chuck member 1400 can be driven independently or selectively, the substrate can maintain the support and the fixed state even when the at least one electrostatic chuck member 1400 is damaged. That is, as shown in (a) of FIG. 20, even when one of the electrostatic chuck members 1400 located in the center region is damaged, the peripheral electrostatic chuck member 1400 can hold the substrate 1011 in the nip state until the end of the process. until. That is, even when 50% of the electrostatic chuck members 1400 are inoperable, the remaining electrostatic chuck members 1400 can support and hold the substrate 1011. In addition, maintenance costs can be reduced because only damaged electrostatic chuck components need to be replaced.

在本實施例中,一個靜電卡盤部件是用一個電力控制部件1500來控制,但本發明並不侷限於此。也就是說,靜電卡盤部件可分為多個群組,使得每個群組可用一個電力控制部件1500來控制。例如,兩個相鄰的靜電卡盤部件1400可用一個電力控制部件1500來控制,或者一行的靜電卡盤部件1400可用一個電力控制部件1500來控制。In the present embodiment, an electrostatic chuck member is controlled by a power control unit 1500, but the present invention is not limited thereto. That is, the electrostatic chuck components can be divided into a plurality of groups such that each group can be controlled by one power control component 1500. For example, two adjacent electrostatic chuck components 1400 can be controlled with one power control component 1500, or one row of electrostatic chuck components 1400 can be controlled with one power control component 1500.

儘管圖中未繪示,但是電力控制部件1500的控制器1510可不配置在上工作臺1200上,而是配置在腔室部件1100的外側。此處,電力控制部件1500的連接線部件1520穿過腔室部件1100與上工作臺1200。另外,連接線部件1520可一定程度地伸長或縮短。雖然本實施例中只提供了一個電力供應部件1900,但是本發明並不侷限於此。也就是說,可提供多個電力供應部件1900以對應於各別的電力控制部件1500。Although not shown in the drawings, the controller 1510 of the power control unit 1500 may not be disposed on the upper table 1200, but disposed outside the chamber member 1100. Here, the wire component 1520 of the power control component 1500 passes through the chamber component 1100 and the upper table 1200. In addition, the connecting wire member 1520 can be elongated or shortened to some extent. Although only one power supply part 1900 is provided in the present embodiment, the present invention is not limited thereto. That is, a plurality of power supply components 1900 may be provided to correspond to the respective power control components 1500.

如上所述,在本實施例中,用來夾持基板1011的靜電卡盤部件1400是安裝在上工作臺1200之底面上,且上工作臺1200的頂部區域上提供電力控制部件1500,用來獨立地提供電力給各別的上靜電卡盤部件1400。此處,上靜電卡盤部件1400可以分離單元(separate unit)的方式來提供,這些分離單元將會組合在一起。此外,每個上靜電卡盤部件1400電性連接至電力控制部件1500。As described above, in the present embodiment, the electrostatic chuck member 1400 for holding the substrate 1011 is mounted on the bottom surface of the upper table 1200, and the power control unit 1500 is provided on the top region of the upper table 1200 for Power is supplied independently to the respective upper electrostatic chuck component 1400. Here, the upper electrostatic chuck component 1400 can be provided in the form of a separate unit that will be combined. Further, each of the upper electrostatic chuck members 1400 is electrically connected to the power control unit 1500.

另外,至少一個下靜電卡盤部件1600配置在下工作臺1300上,正對著上靜電卡盤部件1400。此處,下靜電卡盤部件1600的形狀與上靜電卡盤部件1400的形狀相似 或相同。另外,下靜電卡盤部件1600可分成多個分區,以支撐並固定大尺寸的基板1012。不用說,雖然圖中未繪示,但是下靜電卡盤部件1600的這些分區也可用各別的電力控制部件1500來獨立地驅動。In addition, at least one lower electrostatic chuck member 1600 is disposed on the lower table 1300 opposite the upper electrostatic chuck member 1400. Here, the shape of the lower electrostatic chuck member 1600 is similar to the shape of the upper electrostatic chuck member 1400. Or the same. Additionally, the lower electrostatic chuck component 1600 can be divided into a plurality of sections to support and secure the large size substrate 1012. Needless to say, although not shown in the drawings, these partitions of the lower electrostatic chuck member 1600 can also be independently driven by the respective power control components 1500.

此處,上基板1011被上靜電卡盤部件1400支撐並固定在上工作臺1200上,且下基板1012被下靜電卡盤部件1600支撐並固定在下工作臺1300上。此處,為了將上基板1011與下基板1012附著並密封在一起,必須先將上基板1011與下基板1012移入腔室部件1100,且放置在各別的上靜電卡盤部件1400與下靜電卡盤部件1600上。另外,將上基板1011與下基板1012對準,且相互按壓在一起。Here, the upper substrate 1011 is supported by the upper electrostatic chuck member 1400 and fixed on the upper table 1200, and the lower substrate 1012 is supported by the lower electrostatic chuck member 1600 and fixed on the lower table 1300. Here, in order to attach and seal the upper substrate 1011 and the lower substrate 1012 together, the upper substrate 1011 and the lower substrate 1012 must first be moved into the chamber member 1100, and placed on the respective upper electrostatic chuck member 1400 and the lower electrostatic card. On the disk member 1600. In addition, the upper substrate 1011 and the lower substrate 1012 are aligned and pressed together.

因此,在本實施例中,要提供下載物台部件1700與上載物台部件1800。Therefore, in the present embodiment, the download stage component 1700 and the upload stage component 1800 are to be provided.

下載物台部件1700藉由移動下工作臺1300來移動下基板1012,且上載物台部件1800藉由移動上工作臺1200來移動上基板1011。The download stage unit 1700 moves the lower substrate 1012 by moving the lower stage 1300, and the upload stage unit 1800 moves the upper substrate 1011 by moving the upper stage 1200.

下載物台部件1700包括:至少一個下驅動軸1710,耦接至下工作臺1300;以及下驅動單元1720,施加驅動力到下驅動軸1710。此處,下驅動軸1710部分穿透腔室部件1100的一部分。因此,要安裝下伸縮囊1730來包圍著下驅動軸1710,以防止驅動軸1710破壞腔室部件1100之密封。雖然圖中未繪示,但是可更提供多個穿過下工作臺1300來升降的升降銷。另外,下載物台部件1700可調整下工作臺1300的X、Y及θ位置。也就是說,下載物台部 件1700包括X、Y及θ位置調整單元,用來調整下工作臺1300的各別X、Y及θ位置。因此,下基板1012與上基板1011可用X、Y及θ位置調整單元來進行對準。此處,本實施例之基板組合裝置可更包括諸如照相機或感測器的對準單元,用來對準下基板1012與上基板1011。The download stage component 1700 includes at least one lower drive shaft 1710 coupled to the lower table 1300, and a lower drive unit 1720 that applies a driving force to the lower drive shaft 1710. Here, the lower drive shaft 1710 partially penetrates a portion of the chamber component 1100. Therefore, the lower bellows 1730 is to be installed to surround the lower drive shaft 1710 to prevent the drive shaft 1710 from breaking the seal of the chamber member 1100. Although not shown in the drawings, a plurality of lift pins that are lifted up and down through the lower table 1300 may be provided. In addition, the download stage component 1700 can adjust the X, Y, and θ positions of the lower stage 1300. In other words, download the platform department The piece 1700 includes X, Y, and θ position adjustment units for adjusting the respective X, Y, and θ positions of the lower table 1300. Therefore, the lower substrate 1012 and the upper substrate 1011 can be aligned by the X, Y, and θ position adjusting units. Here, the substrate assembly apparatus of the present embodiment may further include an alignment unit such as a camera or a sensor for aligning the lower substrate 1012 with the upper substrate 1011.

上載物台部件1800包括:至少一個上驅動軸1810,耦接至上工作臺1200;以及上驅動單元1820,施加驅動力到上驅動軸1810。上載物台部件1800更包括:上伸縮囊1830,配置在上驅動軸1810之外牆上。此處,上載物台部件1800是藉由降低上工作臺1200來將上基板1011與下基板1012按壓在一起。The upload stage component 1800 includes at least one upper drive shaft 1810 coupled to the upper table 1200 and an upper drive unit 1820 that applies a driving force to the upper drive shaft 1810. The loading stage component 1800 further includes an upper bellows 1830 disposed on a wall of the upper drive shaft 1810. Here, the upload stage member 1800 presses the upper substrate 1011 and the lower substrate 1012 together by lowering the upper stage 1200.

此外,此基板組合裝置可更包括:真空吸附單元,利用真空吸附力以及靜電力來固定基板1011與1012。此處,真空吸附單元包括:噴嘴部件,緊密接觸基板1011、1012;伸長管,連接至噴嘴部件;以及真空幫浦,位於伸長管的一端。此處,噴嘴部件可形成在上靜電卡盤部件1400與/或下靜電卡盤部件1600之表面上。另外,噴嘴部件可配置在上靜電卡盤部件1400之間的空間處。Further, the substrate assembly apparatus may further include: a vacuum adsorption unit that fixes the substrates 1011 and 1012 by vacuum adsorption force and electrostatic force. Here, the vacuum adsorption unit includes a nozzle member that closely contacts the substrates 1011, 1012, an elongated tube that is connected to the nozzle member, and a vacuum pump that is located at one end of the elongated tube. Here, the nozzle member may be formed on the surface of the upper electrostatic chuck member 1400 and/or the lower electrostatic chuck member 1600. In addition, the nozzle member may be disposed at a space between the upper electrostatic chuck members 1400.

因此,本實施例之基板組合裝置將透明的玻璃基板1012配置在腔室部件1100中的下工作臺1300上,其中玻璃基板1012上形成有薄膜電晶體與畫素電極。首先,此基板組合裝置使基板1012能夠緊密接觸下靜電卡盤部件1600,然後利用下靜電卡盤部件1600之靜電力來支撐並固定住基板1012。此時,將液晶一滴一滴地塗在玻璃基板 1012上。不用說,玻璃基板1012的周邊部分可塗上諸如密封劑的密封構件。另外,透明的玻璃基板1011被放置在上工作臺1200上,其中玻璃基板1011上形成有共用電極與彩色濾光圖案。基板1011被真空吸附力支撐著,且被上靜電卡盤部件1400的靜電力固定住。此處,玻璃基板1011的周邊部分可塗上諸如密封劑的密封構件。Therefore, the substrate assembly apparatus of the present embodiment disposes the transparent glass substrate 1012 on the lower stage 1300 in the chamber member 1100, in which the thin film transistor and the pixel electrode are formed on the glass substrate 1012. First, the substrate assembly apparatus enables the substrate 1012 to closely contact the lower electrostatic chuck member 1600, and then supports and fixes the substrate 1012 by the electrostatic force of the lower electrostatic chuck member 1600. At this time, the liquid crystal is applied to the glass substrate one drop at a time. On 1012. Needless to say, the peripheral portion of the glass substrate 1012 may be coated with a sealing member such as a sealant. In addition, a transparent glass substrate 1011 is placed on the upper stage 1200, wherein a common electrode and a color filter pattern are formed on the glass substrate 1011. The substrate 1011 is supported by a vacuum suction force and is fixed by the electrostatic force of the upper electrostatic chuck member 1400. Here, the peripheral portion of the glass substrate 1011 may be coated with a sealing member such as a sealant.

然後,腔室部件1100被抽空,且基板1011與1012相互對準。接著,上工作臺1200被降低,以將基板1011、1012附著並密封在一起。接著,釋放真空之後,附著在一起的兩個基板1011、1012被轉移到硬化裝置中,且對密封構件區域施加光或熱,以使密封構件硬化,從而使基板1011、1012徹底地附著在一起。The chamber component 1100 is then evacuated and the substrates 1011 and 1012 are aligned with each other. Next, the upper stage 1200 is lowered to attach and seal the substrates 1011, 1012 together. Then, after the vacuum is released, the two substrates 1011, 1012 attached together are transferred to the hardening device, and light or heat is applied to the sealing member region to harden the sealing member, thereby completely adhering the substrates 1011, 1012 together. .

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,故本發明之保護範圍當視後附之申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the invention, and any one of ordinary skill in the art can make some modifications and refinements without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims.

11、12、1011、1012‧‧‧基板11, 12, 1011, 1012‧‧‧ substrates

100、1100‧‧‧腔室部件100, 1100‧‧‧ chamber components

110、120、1110、1120‧‧‧腔室110, 120, 1110, 1120‧‧ ‧ chamber

200、300、1200、1300‧‧‧工作臺200, 300, 1200, 1300 ‧ ‧ workbench

210、1210‧‧‧凹槽210, 1210‧‧‧ grooves

400、600、1400、1600‧‧‧靜電卡盤部件400, 600, 1400, 1600‧‧‧ Electrostatic chuck parts

410、1410‧‧‧基底板410, 1410‧‧‧ base plate

411、421、431、441、1411、1421、1431、1441‧‧‧黏合層411, 421, 431, 441, 1411, 1421, 1431, 1441‧‧ ‧ adhesive layer

420、1420‧‧‧緩衝層420, 1420‧‧‧ buffer layer

430、450、1430、1450‧‧‧薄膜層430, 450, 1430, 1450‧‧ ‧ film layer

440、1440‧‧‧電極層440, 1440‧‧‧ electrode layer

442、443、1442、1443‧‧‧電極圖案442, 443, 1442, 1443 ‧ ‧ electrode pattern

500‧‧‧平坦度調整單元500‧‧‧flatness adjustment unit

510、520‧‧‧調整螺釘孔510, 520‧‧‧Adjust screw holes

530‧‧‧間隙調整螺釘530‧‧‧Gap adjustment screw

540‧‧‧驅動軸部件540‧‧‧Drive shaft components

550‧‧‧驅動馬達部件550‧‧‧Drive motor parts

700、800、1700、1800‧‧‧載物台部件700, 800, 1700, 1800‧‧‧ stage components

710、810、1710、1810‧‧‧驅動軸710, 810, 1710, 1810‧‧‧ drive shaft

720、820、1720、1820‧‧‧驅動單元720, 820, 1720, 1820‧‧‧ drive units

730、830、1730、1830‧‧‧伸縮囊730, 830, 1730, 1830‧‧‧ telescopic bladder

900‧‧‧感測器部件900‧‧‧Sensor components

1444、1445‧‧‧端子1444, 1445‧‧‧ terminals

1446、1447‧‧‧電極連接線1446, 1447‧‧‧ electrode connection line

1460‧‧‧電力連接部件1460‧‧‧Power connection parts

1500‧‧‧電力控制單元1500‧‧‧Power Control Unit

1510‧‧‧控制器1510‧‧‧ Controller

1520‧‧‧連接線部件1520‧‧‧Connector components

1530‧‧‧連接端子部件1530‧‧‧Connecting terminal parts

1900‧‧‧電力供應部件1900‧‧‧Power supply components

圖1是依照一實施例的一種基板組合裝置的橫剖面圖。1 is a cross-sectional view of a substrate assembly apparatus in accordance with an embodiment.

圖2是上工作臺的俯視平面圖,用來繪示圖1所示之基板組合裝置的多個靜電卡盤部件的排列。2 is a top plan view of the upper table for illustrating the arrangement of the plurality of electrostatic chuck components of the substrate assembly of FIG. 1.

圖3是圖1所示之基板組合裝置的靜電卡盤部件的橫剖面圖。Figure 3 is a cross-sectional view of the electrostatic chuck member of the substrate assembly apparatus shown in Figure 1.

圖4是圖1所示之基板組合裝置的靜電卡盤部件的俯 視平面圖。Figure 4 is a view showing the electrostatic chuck member of the substrate assembly shown in Figure 1 View the floor plan.

圖5是圖1所示之基板組合裝置的靜電卡盤部件的改良示範的俯視平面圖。Figure 5 is a top plan view showing an improved exemplary electrostatic chuck component of the substrate assembly of Figure 1.

圖6是靜電卡盤部件耦接至圖1所示之基板組合裝置之上工作臺的橫剖面圖。Figure 6 is a cross-sectional view of the electrostatic chuck component coupled to the table above the substrate assembly of Figure 1.

圖7之(a)~(b)與圖8繪示為依照第一實施例,利用平坦化調整單元來使靜電卡盤部件平坦化的方法的示意圖。7(a) to (b) and FIG. 8 are schematic views showing a method of planarizing an electrostatic chuck member by using a flattening adjustment unit according to the first embodiment.

圖9是靜電卡盤部件耦接至圖1所示之基板組合裝置之上工作臺的改良示範的橫剖面圖。Figure 9 is a cross-sectional view showing a modified example of an electrostatic chuck component coupled to a table above the substrate assembly shown in Figure 1.

圖10是依照另一實施例的一種基板組合裝置的橫剖面圖。Figure 10 is a cross-sectional view of a substrate assembly apparatus in accordance with another embodiment.

圖11是依照又一實施例的一種基板組合裝置的橫剖面圖。Figure 11 is a cross-sectional view of a substrate assembly apparatus in accordance with still another embodiment.

圖12是依照再一實施例的一種基板組合裝置的橫剖面圖。Figure 12 is a cross-sectional view of a substrate assembly apparatus in accordance with still another embodiment.

圖13是上工作臺的俯視平面圖,用來繪示圖12所示之基板組合裝置的多個靜電卡盤部件的排列。Figure 13 is a top plan view of the upper table for illustrating the arrangement of the plurality of electrostatic chuck components of the substrate assembly shown in Figure 12.

圖14是靜電卡盤部件的俯視平面圖,用來繪示圖12所示之基板組合裝置的靜電卡盤部件的電極圖案。Figure 14 is a top plan view of the electrostatic chuck member for illustrating the electrode pattern of the electrostatic chuck member of the substrate assembly shown in Figure 12 .

圖15與圖16是圖12所示之基板組合裝置的靜電卡盤部件的改良示範的俯視平面圖。15 and FIG. 16 are top plan views showing a modified example of the electrostatic chuck member of the substrate assembly apparatus shown in FIG.

圖17是靜電卡盤耦接至圖12所示之基板組合裝置之上工作臺的橫剖面圖。Figure 17 is a cross-sectional view of the electrostatic chuck coupled to the table above the substrate assembly shown in Figure 12.

圖18與圖19是靜電卡盤部件耦接至圖12所示之基 板組合裝置之上工作臺的改良示範的橫剖面圖。18 and FIG. 19 are the electrostatic chuck components coupled to the base shown in FIG. An improved cross-sectional view of a table above the plate assembly.

圖20之(a)~(c)繪示為圖12所示之基板組合裝置之靜電卡盤部件之操作的示意圖。20(a) to (c) are schematic views showing the operation of the electrostatic chuck member of the substrate assembly shown in Fig. 12.

11、12‧‧‧基板11, 12‧‧‧ substrate

100‧‧‧腔室部件100‧‧‧ chamber components

110、120‧‧‧腔室110, 120‧‧‧ chamber

200、300‧‧‧工作臺200, 300‧‧‧ workbench

400、600‧‧‧靜電卡盤部件400, 600‧‧‧ Electrostatic chuck parts

500‧‧‧平坦度調整單元500‧‧‧flatness adjustment unit

510、520‧‧‧調整螺釘孔510, 520‧‧‧Adjust screw holes

530‧‧‧間隙調整螺釘530‧‧‧Gap adjustment screw

700、800‧‧‧載物台部件700, 800‧‧‧stage components

710、810‧‧‧驅動軸710, 810‧‧‧ drive shaft

720、820‧‧‧驅動單元720, 820‧‧‧ drive unit

730、830‧‧‧伸縮囊730, 830‧‧ ‧ telescopic sac

Claims (18)

一種基板組合裝置,包括:腔室部件;上工作臺與下工作臺,面對面地配置在所述腔室部件中;多個上靜電卡盤部件,安裝在所述上工作臺之底面上;多個電力控制部件,經配置以提供電力給各別所述靜電卡盤部件;以及至少一個下靜電卡盤部件,安裝在所述下工作臺的頂面上。 A substrate assembly device comprising: a chamber member; an upper table and a lower table disposed face to face in the chamber member; a plurality of upper electrostatic chuck members mounted on a bottom surface of the upper table; And a power control component configured to provide power to each of the electrostatic chuck components; and at least one lower electrostatic chuck component mounted on a top surface of the lower table. 如申請專利範圍第1項所述之基板組合裝置,更包括:平坦度調整單元,用來調整所述上靜電卡盤部件之間的平坦度。 The substrate assembly device of claim 1, further comprising: a flatness adjustment unit for adjusting a flatness between the upper electrostatic chuck members. 如申請專利範圍第2項所述之基板組合裝置,其中,所述平坦度調整單元包括:多個第一調整螺釘孔,穿過各別所述靜電卡盤部件而形成;多個第二調整螺釘孔,形成在所述上工作臺中,且與所述第一調整螺釘孔對應;以及間隙調整螺釘,插入所述第一調整螺釘孔與所述第二調整螺釘孔,且用來調整每個所述上靜電卡盤部件與所述上工作臺之間的間隙。 The substrate assembly device of claim 2, wherein the flatness adjustment unit comprises: a plurality of first adjustment screw holes formed through the respective electrostatic chuck members; and a plurality of second adjustments a screw hole formed in the upper table and corresponding to the first adjusting screw hole; and a gap adjusting screw inserted into the first adjusting screw hole and the second adjusting screw hole, and used to adjust each a gap between the upper electrostatic chuck member and the upper table. 如申請專利範圍第2項所述之基板組合裝置,其中,所述平坦度調整單元包括:多個第一調整螺釘孔,形成在各別所述靜電卡盤部件上;多個第二調整螺釘孔,穿 過所述上工作臺而形成,且與所述第一調整螺釘孔對應;以及間隙調整螺釘,插入所述第一調整螺釘孔與所述第二調整螺釘孔,且用來調整每個所述上靜電卡盤部件與所述上工作臺之間的間隙。 The substrate assembly device of claim 2, wherein the flatness adjustment unit comprises: a plurality of first adjustment screw holes formed on the respective electrostatic chuck members; and a plurality of second adjustment screws Hole, wear Formed by the upper workbench and corresponding to the first adjustment screw hole; and a gap adjustment screw inserted into the first adjustment screw hole and the second adjustment screw hole, and used to adjust each of the a gap between the upper electrostatic chuck member and the upper table. 如申請專利範圍第2項所述之基板組合裝置,其中,所述平坦度調整單元包括:多個驅動馬達部件,配置在所述上工作臺之頂面上,且與各別所述上靜電卡盤部件對應;以及至少一個驅動軸部件,從所述驅動馬達部件穿過所述上工作臺而延伸至所述上靜電卡盤部件。 The substrate assembly device of claim 2, wherein the flatness adjustment unit comprises: a plurality of driving motor components disposed on a top surface of the upper table, and electrostatically separated from each other a chuck member corresponding; and at least one drive shaft member extending from the drive motor member through the upper table to the upper electrostatic chuck member. 如申請專利範圍第1項所述之基板組合裝置,其中,所述電力控制部件經配置以獨立進行驅動。 The substrate assembly device of claim 1, wherein the power control component is configured to be independently driven. 如申請專利範圍第6項所述之基板組合裝置,其中,每個所述上靜電卡盤部件包括:多個彼此電性相連的正電極圖案、與多個彼此電性相連的負電極圖案;以及每個所述電力控制部件包括:連接端子部件,電性耦接至所述正電極圖案與所述負電極圖案;控制器,用來控制電力供應;以及連接線部件,用來將所述控制器電性連接至所述連接端子部件。 The substrate assembly device of claim 6, wherein each of the upper electrostatic chuck members comprises: a plurality of positive electrode patterns electrically connected to each other, and a plurality of negative electrode patterns electrically connected to each other; And each of the power control components includes: a connection terminal component electrically coupled to the positive electrode pattern and the negative electrode pattern; a controller for controlling a power supply; and a connection line component for using the A controller is electrically connected to the connection terminal component. 如申請專利範圍第7項所述之基板組合裝置,其中,插座或連接件被用作所述連接端子部件;以及所述連接端子部件是配置在所述上工作臺的底面上。 The substrate assembly device of claim 7, wherein a socket or a connector is used as the connection terminal member; and the connection terminal member is disposed on a bottom surface of the upper table. 如申請專利範圍第7項所述之基板組合裝置,其中,所述控制器是配置在所述上工作臺之頂面上、或所述腔室部件的外部區域。 The substrate assembly device of claim 7, wherein the controller is disposed on a top surface of the upper table or an outer region of the chamber member. 如申請專利範圍第1項至第9項中之任一項所述之基板組合裝置,其中,每個所述上靜電卡盤部件包括:基底板;緩衝層,位於所述基底板上;第一薄膜層,位於所述緩衝層上;電極層,形成在所述第一薄膜層上、且具有多個正圖案與負圖案;以及第二薄膜層,覆蓋所述電極層。 The substrate assembly device according to any one of claims 1 to 9, wherein each of the upper electrostatic chuck members comprises: a base plate; a buffer layer on the base plate; a thin film layer on the buffer layer; an electrode layer formed on the first thin film layer and having a plurality of positive and negative patterns; and a second thin film layer covering the electrode layer. 如申請專利範圍第10項所述之基板組合裝置,其中,所述電極層包括:正電極連接線,將所述正電極圖案互連;以及負電極連接線,將所述負電極圖案互連。 The substrate assembly device of claim 10, wherein the electrode layer comprises: a positive electrode connection line interconnecting the positive electrode patterns; and a negative electrode connection line interconnecting the negative electrode patterns . 如申請專利範圍第10項所述之基板組合裝置,其中,所述正電極圖案與所述負電極圖案是形成板狀,且交替地排列。 The substrate assembly device of claim 10, wherein the positive electrode pattern and the negative electrode pattern are formed in a plate shape and alternately arranged. 如申請專利範圍第10項所述之基板組合裝置,其中,每個所述上靜電卡盤部件包括:正端子,耦接至所述正電極圖案之一;負端子,耦接至所述負電極圖案之一;以及電力連接部件,電性連接至各別的所述正端子與所述負端子,且耦接至所述電力控制部件的所述連接端子部件。 The substrate assembly device of claim 10, wherein each of the upper electrostatic chuck members comprises: a positive terminal coupled to one of the positive electrode patterns; and a negative terminal coupled to the negative One of the electrode patterns; and a power connection component electrically connected to the respective positive terminal and the negative terminal and coupled to the connection terminal component of the power control component. 如申請專利範圍第10項所述之基板組合裝置,其中,所述電極層包括:正電極圖案與負電極圖案,所述正電極圖案與負電極圖案形成板狀且交替地排列,或者形成直線形且交替地排列。 The substrate assembly device of claim 10, wherein the electrode layer comprises: a positive electrode pattern and a negative electrode pattern, the positive electrode pattern and the negative electrode pattern are formed in a plate shape and alternately arranged, or form a straight line Shaped and alternately arranged. 如申請專利範圍第10項所述之基板組合裝置,其中,所述上靜電卡盤部件在所述上工作臺之所述底面上排列成矩陣圖案。 The substrate assembly device of claim 10, wherein the upper electrostatic chuck member is arranged in a matrix pattern on the bottom surface of the upper table. 如申請專利範圍第1項所述之基板組合裝置,更包括:下載物台部件,用來移動所述下工作臺;以及上載物台部件,用來移動所述上工作臺。 The substrate assembly device of claim 1, further comprising: a download stage member for moving the lower table; and a loading stage member for moving the upper table. 如申請專利範圍第16項所述之基板組合裝置,其中,所述下載物台部件包括:X、Y及θ位置調整部件,用來調整所述下工作臺的X、Y及θ位置。 The substrate assembly device of claim 16, wherein the download stage member includes: X, Y, and θ position adjustment members for adjusting X, Y, and θ positions of the lower table. 如申請專利範圍第1項所述之基板組合裝置,更包括:至少一個下電力控制部件,提供電力給所述下靜電卡盤部件。 The substrate assembly device of claim 1, further comprising: at least one lower power control component that supplies power to the lower electrostatic chuck component.
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