TWI413872B - Marking system of printed circuit board and method for using the same - Google Patents

Marking system of printed circuit board and method for using the same Download PDF

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TWI413872B
TWI413872B TW99129002A TW99129002A TWI413872B TW I413872 B TWI413872 B TW I413872B TW 99129002 A TW99129002 A TW 99129002A TW 99129002 A TW99129002 A TW 99129002A TW I413872 B TWI413872 B TW I413872B
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circuit board
dimensional code
liquid crystal
crystal display
display unit
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TW99129002A
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TW201209522A (en
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Yao-Wen Bai
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Zhen Ding Technology Co Ltd
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Abstract

A marking system includes an exposing device, a developing device, and an etching device. The exposing device includes a two-dimensional code generating unit, a liquid crystal display unit, an exposing light source and a cover. The two-dimensional code generating unit is used for generating a two-dimensional code. The liquid crystal display unit is used for displaying the two-dimensional code. The exposing light source is used to developing a printed circuit board by using the two-dimensional code as exposing pattern. The cover is used for making the light emitted by the exposing light source projecting to the liquid crystal display unit. The developing device is used for developing the printed circuit board to form a developing pattern corresponding to the exposing pattern. The etching device is used for etching the printed circuit board to form a two-dimensional code mark corresponding to the developing pattern. A method for using the marking system to form a mark in a printed circuit board is also provided.

Description

電路板標記系統及其使用方法 Circuit board marking system and method of use thereof

本發明涉及電路板技術,特別涉及一種電路板標記系統及其使用方法。 The present invention relates to circuit board technology, and more particularly to a circuit board marking system and method of use thereof.

隨著電子產業之飛速發展,作為電子產品基本構件之電路板製作技術顯得愈來愈重要。電路板一般由覆銅基板經裁切、鑽孔、曝光、顯影、蝕刻、壓合、成型等一系列製程製作而成。具體可參閱C.H.Steer等人在Proceedings of the IEEE,Vol.39,No.2(2002年8月)中發表之“Dielectric characterization of printed circuit board substrates”一文。 With the rapid development of the electronics industry, circuit board manufacturing technology, which is the basic component of electronic products, is becoming more and more important. The circuit board is generally fabricated by a series of processes such as cutting, drilling, exposing, developing, etching, pressing, and molding of a copper-clad substrate. For details, see "Dielectric characterization of printed circuit board substrates" by C. H. Steer et al., Proceedings of the IEEE, Vol. 39, No. 2 (August 2002).

一般地,電路板會藉由形成各種不同之標記以記錄電路板在生產過程中之相關資訊。例如,第一種,在電路板之邊緣鑽設不同孔徑之孔或者蓋印不同圖案之印章以將不同之電路板進行區分,並利用這些孔或印章追蹤電路板在後續制程中出現之不良問題並可記錄這些不良問題出現之階段,從而分析不良產生之原因並尋求解決方法。然而,在利用影像轉移製程製作內層線路時,電路板在塗佈光阻後,便不能進行鑽孔或蓋章,從而無法追蹤電路板在影像轉移製程中出現之不良問題。第二種,在影像轉移中使用之 光罩上寫字(例如生產日期及生產機台號),並利用該光罩通過曝光、顯影以及蝕刻後得到之字作為標記。然而,若要使每一片電路板之標記都不相同,需要每曝光一片電路板後便更換一次光罩,非常浪費曝光之時間以及成本。如果只是一天更換一次光罩,則在同一天同一生產機臺上製作之電路板之標記相同,無法將每一片電路板藉由標記進行區分,從而無法對電路板之不良問題進行有效之追蹤記錄。並且,上述兩種標記較為單一,其所能承載之信息量較少,當需要生產大批次之電路板時,無法利用大量不同之標記將該批次之電路板一一進行標記區分。 In general, the board will record information about the board's production process by forming a variety of different markings. For example, in the first type, holes with different apertures are drilled at the edge of the board or stamps of different patterns are stamped to distinguish different boards, and the holes or seals are used to track the problems of the board in subsequent processes. The stages of these undesirable problems can be documented to analyze the causes of the failures and to find solutions. However, when the inner layer circuit is fabricated by the image transfer process, the board cannot be drilled or stamped after the photoresist is applied, so that the problem of the board in the image transfer process cannot be tracked. Second, use in image transfer The mask is written (for example, the date of manufacture and the machine number), and the mask is used as a mark by exposure, development, and etching. However, if the marking of each board is different, it is necessary to replace the mask once after each board is exposed, which is a waste of time and cost. If the mask is replaced only once a day, the boards made on the same production machine will be marked the same on the same day, and each board cannot be distinguished by the mark, so that the problem of the board cannot be effectively tracked. . Moreover, the above two types of marks are relatively single, and the amount of information that can be carried is small. When a large number of circuit boards need to be produced, it is not possible to mark the boards of the batch one by one with a large number of different marks.

有鑑於此,針對上述問題,提供一種可在影像轉移製程中有效地對電路板進行一一標記區分之電路板標記系統及其使用方法實屬必要。 In view of the above, in view of the above problems, it is necessary to provide a circuit board marking system capable of effectively marking a circuit board in a picture transfer process and using the same.

下面將以具體實施例說明一種電路板標記系統及其使用方法。 A circuit board marking system and method of use thereof will now be described in the context of a specific embodiment.

一種電路板標記系統,用於在電路板中形成二維碼標記。該電路板表面形成有光阻。該電路板標記系統包括依次設置之曝光裝置、顯影裝置以及蝕刻裝置。該曝光裝置包括二維碼產生單元、液晶顯示單元、曝光光源以及外罩。該二維碼產生單元用於生成二維碼。該液晶顯示單元與二維碼產生單元相連接,用於獲取並顯示該二維碼產生單元生成之二維碼。該曝光光源與該液晶顯示單元相對,用於以液晶顯示單元顯示之二維碼作為曝光圖案對電路板表面之光阻進行曝光。該外罩圍合在該曝光光源與該液晶顯示單元之間,用於使曝光光源發出之光投射至該液晶顯示單元。該 顯影裝置設置在曝光裝置與蝕刻裝置之間,用於對曝光後之電路板進行顯影,以在光阻中形成與曝光圖案對應之顯影圖案。該蝕刻裝置用於蝕刻顯影後之電路板,以在電路板中形成與顯影圖案相對應之二維碼標記。 A circuit board marking system for forming a two-dimensional code mark in a circuit board. A photoresist is formed on the surface of the board. The board marking system includes an exposure device, a developing device, and an etching device that are sequentially disposed. The exposure apparatus includes a two-dimensional code generating unit, a liquid crystal display unit, an exposure light source, and a cover. The two-dimensional code generating unit is configured to generate a two-dimensional code. The liquid crystal display unit is connected to the two-dimensional code generating unit for acquiring and displaying the two-dimensional code generated by the two-dimensional code generating unit. The exposure light source is opposite to the liquid crystal display unit for exposing the photoresist on the surface of the circuit board by using the two-dimensional code displayed by the liquid crystal display unit as an exposure pattern. The cover is enclosed between the exposure light source and the liquid crystal display unit for projecting light emitted by the exposure light source to the liquid crystal display unit. The The developing device is disposed between the exposure device and the etching device for developing the exposed circuit board to form a developing pattern corresponding to the exposure pattern in the photoresist. The etching apparatus is for etching the developed circuit board to form a two-dimensional code mark corresponding to the developing pattern in the circuit board.

一種如上所述之電路板標記系統之使用方法,包括步驟:提供一個電路板,該電路板之至少一個表面形成有光阻;利用二維碼產生單元生成二維碼;利用液晶顯示單元獲取並顯示該二維碼;開啟曝光光源以該液晶顯示單元顯示之二維碼作為曝光圖案對電路板之光阻進行曝光;利用顯影裝置對光阻進行顯影,以使得光阻中形成與曝光圖案對應之顯影圖案;利用蝕刻裝置對電路板進行蝕刻,以在電路板中形成與顯影圖案對應之二維碼標記。 A method of using a circuit board marking system as described above, comprising the steps of: providing a circuit board having at least one surface formed with a photoresist; generating a two-dimensional code by using a two-dimensional code generating unit; and acquiring and using a liquid crystal display unit Displaying the two-dimensional code; turning on the exposure light source to expose the photoresist of the circuit board by using the two-dimensional code displayed by the liquid crystal display unit as an exposure pattern; developing the photoresist by the developing device, so that the photoresist is formed in the photoresist corresponding to the exposure pattern a developing pattern; etching the circuit board with an etching device to form a two-dimensional code mark corresponding to the developing pattern in the circuit board.

相較於先前技術,本技術方案之電路板標記系統及其使用方法,先利用二維碼產生單元生成二維碼,接著利用液晶顯示單元獲取並顯示該二維碼,然後開啟曝光光源以該液晶顯示單元顯示之二維碼作為曝光圖案對電路板進行曝光,最後藉由顯影裝置與蝕刻裝置依次進行顯影、蝕刻以形成二維碼標記。由於該二維碼產生單元可生成大量不同之二維碼,從而可在影像轉移製程中對大批量之電路板進行一一標記區分;並且,由於該液晶顯示單元可顯示不同之二維碼,並不需要頻繁更換光罩,從而節省曝光之時間與成本。 Compared with the prior art, the circuit board marking system of the present technical solution and the method for using the same, first generate a two-dimensional code by using a two-dimensional code generating unit, and then acquire and display the two-dimensional code by using a liquid crystal display unit, and then turn on the exposure light source to The two-dimensional code displayed on the liquid crystal display unit exposes the circuit board as an exposure pattern, and finally develops and etches by a developing device and an etching device to form a two-dimensional code mark. Since the two-dimensional code generating unit can generate a large number of different two-dimensional codes, a large number of circuit boards can be marked one by one in the image transfer process; and, since the liquid crystal display unit can display different two-dimensional codes, It does not require frequent replacement of the reticle, saving time and cost of exposure.

100‧‧‧電路板標記系統 100‧‧‧Board marking system

10‧‧‧曝光裝置 10‧‧‧Exposure device

20‧‧‧顯影裝置 20‧‧‧Developing device

30‧‧‧蝕刻裝置 30‧‧‧ etching device

11‧‧‧二維碼產生單元 11‧‧‧ QR code generation unit

12‧‧‧液晶顯示單元 12‧‧‧LCD unit

13‧‧‧曝光光源 13‧‧‧Exposure source

14‧‧‧外罩 14‧‧‧ Cover

200‧‧‧電路板 200‧‧‧ boards

210‧‧‧絕緣層 210‧‧‧Insulation

220‧‧‧銅箔層 220‧‧‧copper layer

230‧‧‧光阻 230‧‧‧Light resistance

211‧‧‧第一表面 211‧‧‧ first surface

212‧‧‧第二表面 212‧‧‧ second surface

201‧‧‧成型區域 201‧‧‧Molding area

202‧‧‧邊緣區域 202‧‧‧Edge area

205‧‧‧標記區域 205‧‧‧marked area

206‧‧‧曝光標記 206‧‧‧Exposure Mark

207‧‧‧顯影圖案 207‧‧‧Development pattern

208‧‧‧二維碼標記 208‧‧‧ QR code mark

圖1係本技術方案實施例提供之電路板標記系統之示意圖。 FIG. 1 is a schematic diagram of a circuit board marking system provided by an embodiment of the present technical solution.

圖2係本技術方案實施例提供之電路板標記系統之使用方法流程 圖。 2 is a flow chart of a method for using a circuit board marking system provided by an embodiment of the present technical solution. Figure.

圖3係圖2之電路板標記系統之使用方法中提供之電路板之示意圖。 3 is a schematic diagram of a circuit board provided in the method of using the circuit board marking system of FIG.

圖4係圖2之電路板標記系統之使用方法中在液晶顯示單元中顯示二維碼之示意圖。 4 is a schematic diagram showing the display of a two-dimensional code in a liquid crystal display unit in the method of using the circuit board marking system of FIG.

圖5係圖2之電路板標記系統之使用方法中將電路板與液晶顯示單元對準之示意圖。 Figure 5 is a schematic illustration of the alignment of the circuit board with the liquid crystal display unit in the method of using the circuit board marking system of Figure 2.

圖6係圖2之電路板標記系統之使用方法中在電路板之光阻形成曝光標記之示意圖。 6 is a schematic diagram showing the formation of an exposure mark on the photoresist of the circuit board in the method of using the circuit board marking system of FIG.

圖7係圖2之電路板標記系統之使用方法中對曝光標記顯影後之示意圖。 Figure 7 is a schematic illustration of the development of the exposure mark in the method of using the circuit board marking system of Figure 2.

圖8係圖2之電路板標記系統之使用方法中對電路板蝕刻形成二維碼標記之示意圖。 FIG. 8 is a schematic diagram showing the etching of a circuit board to form a two-dimensional code mark in the method of using the circuit board marking system of FIG. 2. FIG.

圖9係圖2之電路板標記系統之使用方法中將電路板之光阻剝離後之示意圖。 FIG. 9 is a schematic diagram showing the method of using the circuit board marking system of FIG. 2 to peel off the photoresist of the circuit board.

下面將結合附圖與實施例對本技術方案之電路板標記系統及其使用方法作進一步詳細說明。 The circuit board marking system of the present technical solution and the method of using the same will be further described in detail below with reference to the accompanying drawings and embodiments.

請參閱圖1,本技術方案實施例提供一種電路板標記系統100,用於在電路板中形成二維碼標記,該電路板表面形成有光阻。該電路板標記系統100包括依次設置之曝光裝置10、顯影裝置20以及 蝕刻裝置30。該曝光裝置10、顯影裝置20以及蝕刻裝置30用於依次對電路板進行曝光、顯影、蝕刻以形成電路板標記。 Referring to FIG. 1 , an embodiment of the present invention provides a circuit board marking system 100 for forming a two-dimensional code mark in a circuit board, and a surface of the circuit board is formed with a photoresist. The circuit board marking system 100 includes an exposure device 10, a developing device 20, and a display device 20, which are sequentially disposed, Etching device 30. The exposure device 10, the developing device 20, and the etching device 30 are used to sequentially expose, develop, and etch a circuit board to form a circuit board mark.

該曝光裝置10包括二維碼產生單元11、液晶顯示單元12、曝光光源13以及外罩14。 The exposure device 10 includes a two-dimensional code generating unit 11, a liquid crystal display unit 12, an exposure light source 13, and a cover 14.

該二維碼產生單元11用於生成二維碼。本實施例中,該二維碼產生單元11可以為電腦,藉由在電腦中安裝不同之二維碼軟體可生成不同種類之二維碼。該二維碼產生單元11可生成各種隨機二維碼,例如堆疊式/行排式二維碼、或矩陣式二維碼等等。其中,堆疊式/行排式二維碼之編碼原理係建立在一維條碼基礎上,按需要堆積成二行或多行。例如,Code 16K、Code 49、PDF417等均為具有代表性之堆疊式/行排式二維碼。矩陣式二維碼係在一個矩形空間通過黑、白畫素在矩陣中之不同分佈進行編碼。在矩陣相應元素位置上,用黑色之點(方點、圓點)、方塊或其他圖形之出現表示二進位“1”,黑色之點、方塊或其他圖形之不出現表示二進位之“0”,點、方塊或其他圖形之排列組合確定了矩陣式二維碼所代表之意義。例如,Code One、Maxi Code、QR Code、Data Matrix等均為具有代表性之矩陣式二維碼。 The two-dimensional code generating unit 11 is for generating a two-dimensional code. In this embodiment, the two-dimensional code generating unit 11 can be a computer, and different types of two-dimensional codes can be generated by installing different two-dimensional code software in the computer. The two-dimensional code generating unit 11 can generate various random two-dimensional codes, such as a stacked/row row two-dimensional code, or a matrix two-dimensional code, and the like. The coding principle of the stacked/row row two-dimensional code is based on a one-dimensional barcode, and is stacked into two or more rows as needed. For example, Code 16K, Code 49, PDF417, etc. are representative stacked/row type two-dimensional codes. The matrix two-dimensional code is encoded in a rectangular space by different distributions of black and white pixels in the matrix. In the position of the corresponding element of the matrix, the occurrence of the binary point "1" is represented by the appearance of black dots (square dots, dots), squares or other graphics, and the black dots, squares or other graphics do not appear to represent the binary "0". The arrangement of points, squares or other figures determines the meaning of the matrix two-dimensional code. For example, Code One, Maxi Code, QR Code, Data Matrix, etc. are representative matrix type two-dimensional codes.

該液晶顯示單元12與二維碼產生單元11相連接,用於獲取並顯示二維碼產生單元11生成之二維碼。二維碼產生單元11生成一個二維碼並傳送至液晶顯示單元12後,液晶顯示單元12便可獲取並顯示該二維碼。本實施例中,該液晶顯示單元12之形狀為矩形。該二維碼產生單元11生成之二維碼為矩陣式二維碼,該液晶顯示單元12顯示之二維碼為由黑、白畫素排列構成之矩陣陣列。當然, 該液晶顯示單元12之形狀可以根據待形成之電路板標記之形狀而具體設定。此外,該液晶顯示單元12之類型亦無限定,例如,其可為扭曲向列型、超扭曲向列型、雙層超扭曲向列型或者薄膜電晶體型等等。 The liquid crystal display unit 12 is connected to the two-dimensional code generating unit 11 for acquiring and displaying the two-dimensional code generated by the two-dimensional code generating unit 11. After the two-dimensional code generating unit 11 generates a two-dimensional code and transmits it to the liquid crystal display unit 12, the liquid crystal display unit 12 can acquire and display the two-dimensional code. In this embodiment, the shape of the liquid crystal display unit 12 is a rectangle. The two-dimensional code generated by the two-dimensional code generating unit 11 is a matrix two-dimensional code, and the two-dimensional code displayed by the liquid crystal display unit 12 is a matrix array composed of black and white pixel arrangements. of course, The shape of the liquid crystal display unit 12 can be specifically set according to the shape of the circuit board mark to be formed. Further, the type of the liquid crystal display unit 12 is not limited, and for example, it may be a twisted nematic type, a super twisted nematic type, a double layer super twisted nematic type or a thin film transistor type or the like.

該曝光光源13與該液晶顯示單元12相對,用於以液晶顯示單元12顯示之二維碼作為曝光圖案對電路板表面之光阻進行曝光。該曝光光源13發出之光之波長較短,從而使得液晶顯示單元12之工作溫度不會過高,避免液晶顯示單元12發熱量過高而損壞或失效。一般地,該液晶顯示單元12之工作溫度應低於50攝氏度。本實施例中,該曝光光源13選用紫外光光源,且該曝光光源13為點光源。當然,該曝光光源13亦可選用波長略大於紫外光或小於紫外光之光源,其可根據待曝光之介質材料進行選擇。此外,該曝光光源13亦可採用線光源或者面光源。 The exposure light source 13 is opposite to the liquid crystal display unit 12 for exposing the photoresist of the surface of the circuit board by using the two-dimensional code displayed by the liquid crystal display unit 12 as an exposure pattern. The wavelength of the light emitted by the exposure light source 13 is short, so that the operating temperature of the liquid crystal display unit 12 is not excessively high, and the liquid crystal display unit 12 is prevented from being excessively heated to be damaged or failed. Generally, the operating temperature of the liquid crystal display unit 12 should be less than 50 degrees Celsius. In this embodiment, the exposure light source 13 is an ultraviolet light source, and the exposure light source 13 is a point light source. Of course, the exposure light source 13 may also select a light source having a wavelength slightly larger than ultraviolet light or less than ultraviolet light, which may be selected according to the dielectric material to be exposed. In addition, the exposure light source 13 can also adopt a line light source or a surface light source.

該外罩14圍合在該曝光光源13與該液晶顯示單元12之間,用於使曝光光源13發出之光投射至液晶顯示單元12。本實施例中,由於該液晶顯示單元12之形狀為矩形,該外罩14之形狀為四棱錐形,該曝光光源13位於該四棱錐形外罩14之頂點,該液晶顯示單元12位於該四棱錐形外罩14之底面。此外,當該液晶顯示單元12為三角形或者圓形等形狀時,該外罩14之形狀對應地可為三棱錐形、圓錐形等錐形結構。該外罩14之形狀為錐形時,該曝光光源13靠近該錐形外罩14之頂點,該液晶顯示單元12靠近該錐形外罩14之底面。 The cover 14 is enclosed between the exposure light source 13 and the liquid crystal display unit 12 for projecting light emitted from the exposure light source 13 to the liquid crystal display unit 12. In this embodiment, since the shape of the liquid crystal display unit 12 is rectangular, the shape of the outer cover 14 is a quadrangular pyramid, the exposure light source 13 is located at the apex of the quadrangular pyramid cover 14, and the liquid crystal display unit 12 is located at the quadrangular pyramid. The bottom surface of the outer cover 14. In addition, when the liquid crystal display unit 12 has a shape such as a triangle or a circle, the shape of the outer cover 14 may correspondingly be a triangular pyramid, a conical shape or the like. When the shape of the outer cover 14 is tapered, the exposure light source 13 is close to the apex of the tapered outer cover 14, and the liquid crystal display unit 12 is adjacent to the bottom surface of the tapered outer cover 14.

當然,該外罩14之形狀可根據液晶顯示單元12之形狀、曝光光源 13之形狀以及曝光光源13與液晶顯示單元12之間之相對位置關係而具體設定。該外罩14只需使得曝光光源13發出之光投射在液晶顯示單元12所在之區域內即可,從而防止曝光光源13對電路板其他區域進行錯誤曝光。優選地,該外罩14之內表面為反射面或者不透光面,從而避免曝光光源13發出之光穿透過外罩14。 Of course, the shape of the cover 14 can be according to the shape of the liquid crystal display unit 12, and the exposure light source. The shape of 13 and the relative positional relationship between the exposure light source 13 and the liquid crystal display unit 12 are specifically set. The cover 14 only needs to project the light emitted by the exposure light source 13 in the area where the liquid crystal display unit 12 is located, thereby preventing the exposure light source 13 from erroneously exposing other areas of the circuit board. Preferably, the inner surface of the outer cover 14 is a reflective surface or an opaque surface, so that the light emitted by the exposure light source 13 is prevented from penetrating through the outer cover 14.

該顯影裝置20設置在曝光裝置10與蝕刻裝置30之間,用於對曝光後之電路板進行顯影,以在光阻中形成與曝光圖案對應之顯影圖案。該顯影裝置20裝載有用於對該電路板進行顯影處理之顯影液。 The developing device 20 is disposed between the exposure device 10 and the etching device 30 for developing the exposed circuit board to form a developing pattern corresponding to the exposure pattern in the photoresist. The developing device 20 is loaded with a developing solution for developing the circuit board.

該蝕刻裝置30用於蝕刻顯影後之電路板,以在電路板中形成與顯影圖案相對應之二維碼標記。該蝕刻裝置30裝載有用於對該電路板進行蝕刻處理之蝕刻液。 The etching device 30 is for etching the developed circuit board to form a two-dimensional code mark corresponding to the developing pattern in the circuit board. The etching device 30 is loaded with an etching liquid for etching the circuit board.

請參閱圖2,本技術方案實施例還提供一種上述電路板標記系統100之使用方法,其包括以下步驟: Referring to FIG. 2, the embodiment of the present invention further provides a method for using the circuit board marking system 100, which includes the following steps:

步驟110,請參閱圖3,提供一個電路板200,該電路板200之至少一個表面形成有光阻230。 Step 110, referring to FIG. 3, a circuit board 200 is provided, at least one surface of which is formed with a photoresist 230.

本實施例中,該電路板200包括絕緣層210、銅箔層220與光阻230。該絕緣層210具有相對之第一表面211與第二表面212。該第一表面211與第二表面212平行。該第一表面211與第二表面212上各設置一層銅箔層220,即該電路板200為雙層電路板。該光阻230位於該絕緣層210之第一表面211之銅箔層220之表面上。該電路板200亦可為僅具有一層銅箔層220之單層電路板,或者為具有兩 層銅箔層220以上之多層電路板。該電路板200具有成型區域201以及包圍該成型區域201之邊緣區域202。亦即,該邊緣區域202位於該成型區域201之外側。該成型區域201為最終形成電路板成品之區域,該邊緣區域202為形成電路板成品時需切割去除之區域。 In this embodiment, the circuit board 200 includes an insulating layer 210, a copper foil layer 220, and a photoresist 230. The insulating layer 210 has opposite first and second surfaces 211, 212. The first surface 211 is parallel to the second surface 212. A first copper foil layer 220 is disposed on each of the first surface 211 and the second surface 212, that is, the circuit board 200 is a two-layer circuit board. The photoresist 230 is located on the surface of the copper foil layer 220 of the first surface 211 of the insulating layer 210. The circuit board 200 can also be a single-layer circuit board having only one copper foil layer 220, or have two A multilayer circuit board having a layer of copper foil 220 or more. The circuit board 200 has a molding area 201 and an edge area 202 surrounding the molding area 201. That is, the edge region 202 is located on the outer side of the molding region 201. The molding area 201 is the area where the finished circuit board is finally formed, and the edge area 202 is an area to be cut and removed when forming a finished circuit board.

步驟120,利用二維碼產生單元11生成二維碼。 In step 120, the two-dimensional code is generated by the two-dimensional code generating unit 11.

本實施例中,該二維碼產生單元11生成之二維碼為矩陣式二維碼。該矩陣式二維碼由黑、白畫素之方塊呈矩陣排列形成。該二維碼產生單元11可隨機產生不同之矩陣式二維碼。 In this embodiment, the two-dimensional code generated by the two-dimensional code generating unit 11 is a matrix two-dimensional code. The matrix type two-dimensional code is formed by matrixing the squares of black and white pixels. The two-dimensional code generating unit 11 can randomly generate different matrix two-dimensional codes.

步驟130,請參閱圖4,利用液晶顯示單元12獲取並顯示該二維碼。 Step 130, referring to FIG. 4, the two-dimensional code is acquired and displayed by the liquid crystal display unit 12.

該液晶顯示單元12與二維碼產生單元11相連接。二維碼產生單元11生成之二維碼傳送到液晶顯示單元12,液晶顯示單元12便可獲取並顯示該二維碼。 The liquid crystal display unit 12 is connected to the two-dimensional code generating unit 11. The two-dimensional code generated by the two-dimensional code generating unit 11 is transmitted to the liquid crystal display unit 12, and the liquid crystal display unit 12 can acquire and display the two-dimensional code.

步驟140,請參閱圖5,將該電路板200需形成標記之標記區域205與液晶顯示單元12對準。 Step 140, referring to FIG. 5, the marking area 205 of the circuit board 200 to be marked is aligned with the liquid crystal display unit 12.

將該電路板200放置在該液晶顯示單元12遠離該曝光光源13之一側,然後利用對位裝置(圖未示)將電路板200與液晶顯示單元12進行對位,使電路板200需形成標記之標記區域205與液晶顯示單元12對準。本實施例中,該電路板200需形成標記之標記區域205位於電路板200之邊緣區域202。 The circuit board 200 is placed on one side of the liquid crystal display unit 12 away from the exposure light source 13 , and then the circuit board 200 is aligned with the liquid crystal display unit 12 by using a matching device (not shown), so that the circuit board 200 needs to be formed. The marked mark area 205 is aligned with the liquid crystal display unit 12. In this embodiment, the marking area 205 of the circuit board 200 to be marked is located at the edge region 202 of the circuit board 200.

步驟150,請參閱圖6,開啟曝光光源13對電路板200之光阻230進行曝光。 Step 150, referring to FIG. 6, the exposure light source 13 is turned on to expose the photoresist 230 of the circuit board 200.

將曝光光源13打開,以該液晶顯示單元12顯示之二維碼作為曝光圖案對電路板200之光阻230進行曝光,以在電路板200需形成標記之區域形成曝光標記206。該曝光標記206位於光阻230。該曝光光源13優先選用紫外光光源。 The exposure light source 13 is turned on, and the photoresist 230 of the circuit board 200 is exposed by using the two-dimensional code displayed by the liquid crystal display unit 12 as an exposure pattern to form an exposure mark 206 in a region where the circuit board 200 needs to form a mark. The exposure mark 206 is located on the photoresist 230. The exposure light source 13 preferably uses an ultraviolet light source.

步驟160,請參閱圖7,利用顯影裝置20對光阻230進行顯影。 Step 160, referring to FIG. 7, the photoresist 230 is developed by the developing device 20.

該顯影裝置20中具有顯影液,利用該顯影液對光阻230之曝光標記206所在位置進行顯影,從而去掉曝光標記206中不需要之部分光阻230,以使得光阻230中形成與曝光圖案對應之顯影圖案207。該顯影圖案207中被顯影去掉之光阻區域與該二維碼曝光圖案中之白畫素區域相對應。 The developing device 20 has a developing solution for developing the position of the exposure mark 206 of the photoresist 230 by using the developing solution, thereby removing unnecessary portions of the photoresist 230 in the exposure mark 206, so that the exposure pattern is formed in the photoresist 230. Corresponding development pattern 207. The photoresist region that is developed and removed in the developed pattern 207 corresponds to the white pixel region in the two-dimensional code exposure pattern.

步驟170,請參閱圖8及圖9,利用蝕刻裝置30蝕刻形成二維碼標記208。 Step 170, referring to FIG. 8 and FIG. 9, etching is performed by the etching device 30 to form the two-dimensional code mark 208.

該蝕刻裝置30中具有蝕刻液,利用蝕刻裝置30中之蝕刻液對電路板200進行蝕刻,以在電路板200中形成與該顯影圖案207對應之二維碼標記208。蝕刻液可蝕刻掉沒有被顯影圖案207中之光阻230遮蓋之位於絕緣層210之第一表面211之銅箔層220中之部分銅箔,從而形成與該曝光圖案對應之二維碼標記208。其中,該二維碼標記208中被蝕刻掉之區域與該二維碼曝光圖案中之白畫素區域相對應。 The etching device 30 has an etching liquid, and the circuit board 200 is etched by the etching liquid in the etching device 30 to form a two-dimensional code mark 208 corresponding to the developing pattern 207 in the circuit board 200. The etching solution can etch away a portion of the copper foil in the copper foil layer 220 of the first surface 211 of the insulating layer 210 that is not covered by the photoresist 230 in the developing pattern 207, thereby forming a two-dimensional code mark 208 corresponding to the exposure pattern. . The area of the two-dimensional code mark 208 that is etched away corresponds to the white pixel area in the two-dimensional code exposure pattern.

最後,如果不需要該光阻230,還可將該光阻230剝離去除,如圖 8所示。當然,亦可保留該光阻230以保護該電路板200。 Finally, if the photoresist 230 is not needed, the photoresist 230 can also be peeled off, as shown in the figure. 8 is shown. Of course, the photoresist 230 can also be retained to protect the circuit board 200.

相較於先前技術,本技術方案之電路板標記系統及其使用方法,先利用二維碼產生單元生成二維碼,接著利用液晶顯示單元獲取並顯示該二維碼,然後開啟曝光光源以該液晶顯示單元顯示之二維碼作為曝光圖案對電路板進行曝光,最後藉由顯影裝置與蝕刻裝置依次進行顯影、蝕刻以形成二維碼標記。由於該二維碼產生單元可生成大量不同之二維碼,從而可在影像轉移製程中對大批量之電路板進行一一標記區分;並且,由於該液晶顯示單元可顯示不同之二維碼,並不需要頻繁更換光罩,從而節省曝光之時間與成本。 Compared with the prior art, the circuit board marking system of the present technical solution and the method for using the same, first generate a two-dimensional code by using a two-dimensional code generating unit, and then acquire and display the two-dimensional code by using a liquid crystal display unit, and then turn on the exposure light source to The two-dimensional code displayed on the liquid crystal display unit exposes the circuit board as an exposure pattern, and finally develops and etches by a developing device and an etching device to form a two-dimensional code mark. Since the two-dimensional code generating unit can generate a large number of different two-dimensional codes, a large number of circuit boards can be marked one by one in the image transfer process; and, since the liquid crystal display unit can display different two-dimensional codes, It does not require frequent replacement of the reticle, saving time and cost of exposure.

綜上所述,本發明確已符合發明專利之要件,遂依法提出專利申請。先前技術,以上所述者僅為本發明之較佳實施方式,自不能以此限制本案之申請專利範圍。舉凡熟悉本案技藝之人士爰依本發明之精神所作之等效修飾或變化,皆應涵蓋於以下申請專利範圍內。 In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. In the prior art, the above description is only a preferred embodiment of the present invention, and the scope of the patent application of the present invention cannot be limited thereby. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.

100‧‧‧電路板標記系統 100‧‧‧Board marking system

10‧‧‧曝光裝置 10‧‧‧Exposure device

20‧‧‧顯影裝置 20‧‧‧Developing device

30‧‧‧蝕刻裝置 30‧‧‧ etching device

11‧‧‧二維碼產生單元 11‧‧‧ QR code generation unit

12‧‧‧液晶顯示單元 12‧‧‧LCD unit

13‧‧‧曝光光源 13‧‧‧Exposure source

14‧‧‧外罩 14‧‧‧ Cover

Claims (10)

一種電路板標記系統,用於在多個電路板中形成對每個電路板一一標記區分之二維碼標記,該電路板表面形成有光阻,該電路板標記系統包括依次設置之曝光裝置、顯影裝置以及蝕刻裝置,該曝光裝置包括二維碼產生單元、液晶顯示單元、曝光光源以及外罩,該二維碼產生單元用於生成隨機二維碼,該液晶顯示單元與二維碼產生單元相連接,用於獲取並顯示該二維碼產生單元生成之二維碼,該曝光光源與該液晶顯示單元相對,用於以液晶顯示單元顯示之二維碼作為曝光圖案對電路板表面之光阻進行曝光,該外罩圍合在該曝光光源與該液晶顯示單元之間,用於使曝光光源發出之光投射至該液晶顯示單元,該顯影裝置設置在曝光裝置與蝕刻裝置之間,用於對曝光後之電路板進行顯影,以在光阻中形成與曝光圖案對應之顯影圖案,該蝕刻裝置用於蝕刻顯影後之電路板,以在電路板中形成與顯影圖案相對應之二維碼標記。 A circuit board marking system for forming a two-dimensional code mark for each circuit board to be marked one by one in a plurality of circuit boards, the circuit board surface is formed with a photoresist, and the circuit board marking system includes an exposure device sequentially disposed a developing device and a etching device, the exposure device comprising a two-dimensional code generating unit, a liquid crystal display unit, an exposure light source, and a cover, the two-dimensional code generating unit configured to generate a random two-dimensional code, the liquid crystal display unit and the two-dimensional code generating unit Connected to obtain and display a two-dimensional code generated by the two-dimensional code generating unit, the exposure light source is opposite to the liquid crystal display unit, and is configured to use the two-dimensional code displayed by the liquid crystal display unit as an exposure pattern to the surface of the circuit board. Exposing an exposure between the exposure light source and the liquid crystal display unit for projecting light emitted by the exposure light source to the liquid crystal display unit, the developing device being disposed between the exposure device and the etching device for Developing the exposed circuit board to form a developing pattern corresponding to the exposure pattern in the photoresist, the etching device is used for etching After the circuit board, to form a two-dimensional code corresponding to the mark and developing the pattern in the circuit board. 如申請專利範圍第1項所述之電路板標記系統,其中,該二維碼為堆疊式/行排式二維碼。 The circuit board marking system of claim 1, wherein the two-dimensional code is a stacked/row type two-dimensional code. 如申請專利範圍第1項所述之電路板標記系統,其中,該二維碼為矩陣式二維碼,該液晶顯示單元之形狀為矩形,該液晶顯示單元顯示之二維碼為由黑、白畫素排列構成之矩陣陣列。 The circuit board marking system of claim 1, wherein the two-dimensional code is a matrix two-dimensional code, the shape of the liquid crystal display unit is a rectangle, and the two-dimensional code displayed by the liquid crystal display unit is black, A matrix array of white pixels arranged. 如申請專利範圍第1項所述之電路板標記系統,其中,該外罩之形狀為錐形,該曝光光源靠近該錐形外罩之頂點,該液晶顯示單元靠近該錐形外罩之底面。 The circuit board marking system of claim 1, wherein the outer cover is tapered, the exposure light source is adjacent to an apex of the tapered outer cover, and the liquid crystal display unit is adjacent to a bottom surface of the tapered outer cover. 如申請專利範圍第1項所述之電路板標記系統,其中,該液晶顯示單元之類型為扭曲向列型、超扭曲向列型、雙層超扭曲向列型或者薄膜電晶體型。 The circuit board marking system of claim 1, wherein the liquid crystal display unit is of a twisted nematic type, a super twisted nematic type, a double layer super twisted nematic type or a thin film transistor type. 如申請專利範圍第1項所述之電路板標記系統,其中,該曝光光源為紫外光光源,該液晶顯示單元之工作溫度低於50攝氏度。 The circuit board marking system of claim 1, wherein the exposure light source is an ultraviolet light source, and the liquid crystal display unit has an operating temperature of less than 50 degrees Celsius. 一種如申請專利範圍第1項所述之電路板標記系統之使用方法,包括步驟:提供一個電路板,該電路板之至少一個表面形成有光阻;利用二維碼產生單元生成一隨機二維碼;利用液晶顯示單元獲取並顯示該二維碼;開啟曝光光源,以該液晶顯示單元顯示之二維碼作為曝光圖案對電路板之光阻進行曝光;利用顯影裝置對光阻進行顯影,以使得光阻中形成與曝光圖案對應之顯影圖案;利用蝕刻裝置對電路板進行蝕刻,以在電路板中形成與顯影圖案對應之二維碼標記。 A method of using a circuit board marking system as described in claim 1, comprising the steps of: providing a circuit board having at least one surface formed with a photoresist; generating a random two-dimensional using the two-dimensional code generating unit Obtaining and displaying the two-dimensional code by using a liquid crystal display unit; turning on the exposure light source, exposing the photoresist of the circuit board by using the two-dimensional code displayed by the liquid crystal display unit as an exposure pattern; developing the photoresist by using a developing device to A developing pattern corresponding to the exposure pattern is formed in the photoresist; the circuit board is etched by the etching device to form a two-dimensional code mark corresponding to the developing pattern in the circuit board. 如申請專利範圍第7項所述之電路板標記系統之使用方法,其中,在對電路板之光阻進行曝光之前,還包括將該電路板放置在該液晶顯示單元遠離該曝光光源之一側並使該電路板需形成標記之區域與該液晶顯示單元對準之步驟。 The method of using the circuit board marking system of claim 7, wherein before the exposing the photoresist of the circuit board, the circuit board is further disposed on the side of the liquid crystal display unit away from the exposure light source. And the step of aligning the printed circuit board with the marked area with the liquid crystal display unit. 如申請專利範圍第7項所述之電路板標記系統之使用方法,其中,該曝光光源為紫外光光源。 The method of using the circuit board marking system of claim 7, wherein the exposure light source is an ultraviolet light source. 如申請專利範圍第7項所述之電路板標記系統之使用方法,其中,該二維碼產生單元生成之二維碼為矩陣式二維碼,該矩陣式二 維碼由黑、白畫素之方塊呈矩陣排列形成。 The method for using a circuit board marking system according to claim 7, wherein the two-dimensional code generated by the two-dimensional code generating unit is a matrix two-dimensional code, and the matrix two The dimension code is formed by a matrix of black and white pixels.
TW99129002A 2010-08-30 2010-08-30 Marking system of printed circuit board and method for using the same TWI413872B (en)

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6953733B2 (en) * 2001-04-13 2005-10-11 Oki Electric Industry Co., Ltd. Method of manufacturing alignment mark and aligning method using the same
US20050269934A1 (en) * 2004-06-04 2005-12-08 Asml Netherlands B.V. Protective cover for a lamp, set including a lamp and a protective cover, method of installing a source in a lithographic apparatus, device manufacturing method and device manufactured thereby

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6953733B2 (en) * 2001-04-13 2005-10-11 Oki Electric Industry Co., Ltd. Method of manufacturing alignment mark and aligning method using the same
US20050269934A1 (en) * 2004-06-04 2005-12-08 Asml Netherlands B.V. Protective cover for a lamp, set including a lamp and a protective cover, method of installing a source in a lithographic apparatus, device manufacturing method and device manufactured thereby

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