TWI405519B - A conductive paste composition for hole filling, a printed circuit board using the same, and a method for manufacturing the same - Google Patents

A conductive paste composition for hole filling, a printed circuit board using the same, and a method for manufacturing the same Download PDF

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TWI405519B
TWI405519B TW97114465A TW97114465A TWI405519B TW I405519 B TWI405519 B TW I405519B TW 97114465 A TW97114465 A TW 97114465A TW 97114465 A TW97114465 A TW 97114465A TW I405519 B TWI405519 B TW I405519B
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epoxy
resin
group
paste composition
hole
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TW97114465A
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Chinese (zh)
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TW200908847A (en
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Masaaki Katsumata
Katsunori Hashiguchi
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Panasonic Corp
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/4038Through-connections; Vertical interconnect access [VIA] connections
    • H05K3/4053Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques
    • H05K3/4069Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques for via connections in organic insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092Dispersed materials, e.g. conductive pastes or inks
    • H05K1/095Dispersed materials, e.g. conductive pastes or inks for polymer thick films, i.e. having a permanent organic polymeric binder
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0332Structure of the conductor
    • H05K2201/0335Layered conductors or foils
    • H05K2201/0355Metal foils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10227Other objects, e.g. metallic pieces
    • H05K2201/10378Interposers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/14Related to the order of processing steps
    • H05K2203/1461Applying or finishing the circuit pattern after another process, e.g. after filling of vias with conductive paste, after making printed resistors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards
    • H05K3/4614Manufacturing multilayer circuits by laminating two or more circuit boards the electrical connections between the circuit boards being made during lamination
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4652Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern

Abstract

Disclosed is a conductive paste composition for via hole filling, which contains 30-70% by volume of a conductive particle having an average particle diameter of 0.5-20 µm and a specific surface area of 0.05-1.5 m<SUP>2</SUP>/g, and 70-30% by volume of a resin which contains not less than 10% by weight of an epoxy compound having one or more epoxy groups in a molecule, wherein the total amount of hydroxy groups, amino groups and carboxyl groups is not more than 5% by mole of the epoxy groups and the epoxy equivalent is 100-350 g/eq. This conductive paste composition for via hole filling contains chlorine in an amount of 20-2000 ppm.

Description

通孔充填用導電體糊組成物、使用其之印刷基板及其製造方法Conductive paste composition for through-hole filling, printed substrate using the same, and method of producing the same 技術領域Technical field

本發明係有關於通孔充填用導電體糊組成物、使用其之雙面印刷基板與多層印刷基板、及該等基板之製造方法。The present invention relates to a conductor paste composition for via filling, a double-sided printed board and a multilayer printed board using the same, and a method of manufacturing the same.

背景技術Background technique

近年來,隨著電子機器之高性能化、小型化,正尋求電路基板之高多層、高密度化。於IC間或零件間藉由內通孔連接作為可以最短距離連結之基板之層間連接方式,以謀求高密度化是已知的。於一般之玻璃環氧多層基板中使用之穿通孔連接,因於穿通孔電鍍以進行連接,故不易僅於所需之層間進行連接,且因係於基板最上層具有電極之平台的構造,故未能於基板最上層構成表面封裝零件之電極平台(electrode land),因該等之限制而不易提升封裝密度。雖可進行於基板之一半開孔來取代穿通孔以減少穿通孔之方法、及於穿通孔充填導電體糊並以電鍍程序塞住基板最上層之孔以提升封裝密度之方法等,作為解決該等問題之方法,但製造程序複雜。In recent years, with the increase in performance and miniaturization of electronic equipment, high-density and high-density of circuit boards are being sought. It is known that the interlayer connection method of the substrate which can be connected at the shortest distance is connected between the ICs or between the parts by the through holes, and the density is increased. The through-hole connection used in a general glass epoxy multilayer substrate is difficult to connect only between the required layers because of the connection through the through-hole plating, and the structure having the platform of the electrode on the uppermost layer of the substrate is The electrode land that does not constitute the surface package part on the uppermost layer of the substrate is not easy to increase the package density due to such limitations. Although it is possible to perform a method in which one of the substrate is half-opened to replace the through-hole to reduce the through-hole, and the through-hole is filled with the conductive paste and the uppermost layer of the substrate is plugged by a plating process to increase the package density, etc. The method of the problem, but the manufacturing process is complicated.

相對於此,內通孔連接因可僅於所需之各層間進行連接,且於基板最上層亦無穿通孔,而具有優異之封裝性。將該連接方式應用於樹脂基板(例如,玻璃環氧基板)之例包括,於雙面基板上使用印刷法將低黏度之溶劑型銀糊嵌入穿通孔中,並使其乾燥硬化以得到導通之基板。然而,其 接觸電阻率高達10m Ω.cm左右,且缺乏對熱循環等耐熱衝擊之可靠性。又,可進行使用較少之導電體粒子量、添加低沸點之溶劑或活性稀釋劑等方法,作為導電體糊之低黏度化方法,以提高導電體糊對穿通孔之嵌入性。On the other hand, the inner via connection can be connected only between the required layers, and there is no through hole in the uppermost layer of the substrate, and the package is excellent. An example of applying the connection method to a resin substrate (for example, a glass epoxy substrate) includes embedding a low-viscosity solvent-type silver paste into a through-hole on a double-sided substrate by using a printing method, and drying and hardening it to obtain a conduction. Substrate. However, its Contact resistivity up to 10m Ω. About cm, and lack of reliability against thermal shock such as thermal cycling. Further, a method of using a small amount of a conductor particle, a solvent having a low boiling point, or a reactive diluent can be used as a method of lowering the viscosity of the conductor paste to improve the embedding property of the conductor paste to the through hole.

然而,若減少導電體粒子之添加量,則填料間之接觸點會變少、通孔接觸電阻率變大,且於產生熱循環等熱應力之試驗中未能確保可靠性。又,於添加低沸點之溶劑或活性稀釋劑之方法中,因於熱壓之硬化中該等成分之揮發產生的重量減少量增加,且因該揮發成分而於基材產生膨脹、或降低與配線銅箔之接著力。因此,藉由含有高濃度之導電體粒子並以亞麻油酸雙聚體縮水甘油酯環氧樹脂作為主成分,可實現無溶劑且具低黏度、高導電性、耐熱衝擊導電連接可靠性之導電體糊。However, when the amount of addition of the conductor particles is reduced, the contact point between the fillers is reduced, the contact resistance of the via hole is increased, and reliability is not ensured in the test for generating thermal stress such as thermal cycle. Further, in the method of adding a solvent having a low boiling point or a reactive diluent, the amount of weight loss due to volatilization of the components during hardening is increased, and the substrate is swelled or lowered by the volatile component. The adhesion of the wiring copper foil. Therefore, by containing a high concentration of conductive particles and using linoleic acid dimer glycidyl epoxy resin as a main component, it is possible to realize a solvent-free and low-viscosity, high-conductivity, heat-resistant and impact-resistant conductive connection. Body paste.

另外,與前述申請之發明相關之先前技術文獻資訊,例如專利文獻1是已知的。Further, prior art document information related to the invention of the aforementioned application, for example, Patent Document 1 is known.

然而,前述習知例以亞麻油酸雙聚體縮水甘油酯環氧樹脂作為主成分,雖因樹脂之交聯密度降低而具低黏度且熱衝擊強,但因吸水率高而於高溼度試驗中之導電連接可靠性不足。又,因亞麻油酸雙聚體縮水甘油酯環氧樹脂係屬環氧樹脂中接著強度較低者,故於通孔中使用以其為主成分之導電體糊時,其與配線銅箔之接著力不足。However, the conventional example has a linoleic acid dimer glycidyl ester epoxy resin as a main component, and has a low viscosity and a strong thermal shock due to a decrease in the crosslinking density of the resin, but a high humidity test due to a high water absorption rate. The reliability of the conductive connection is insufficient. In addition, since the linoleic acid dimer glycidyl ester epoxy resin is a lower adhesive strength in the epoxy resin, when a conductive paste containing the main component is used in the through hole, it is bonded to the wiring copper foil. Then the power is insufficient.

一般而言,為降低環氧樹脂之吸水率並提高接著強度,混合可更提高交聯密度且環氧當量低之,例如雙酚型環氧樹脂等之方法是已知的。然而,降低吸水率並提高接 著強度之該等低環氧當量之樹脂,具有較亞麻油酸雙聚體縮水甘油酯環氧樹脂等高之黏度。因此,成為無法充填通孔之導電體糊。In general, in order to lower the water absorption rate of the epoxy resin and increase the bonding strength, the mixing can further increase the crosslinking density and the epoxy equivalent is low, and a method such as a bisphenol type epoxy resin is known. However, reducing the water absorption rate and improving the connection The low epoxy equivalent resins of the strength have a higher viscosity than the linoleic acid dimer glycidyl epoxy resin. Therefore, it becomes a conductor paste which cannot fill a through-hole.

又,只要內通孔內具有導電性之導電體粒子之存在比率大,便可減少導體電阻。因此,使導電性糊盡量含有較多之導電性粒子,即可增強導電性。然而,因混合有固體之導電性粒子與液狀之黏合劑,故可糊化之混合比有限,且若黏度過高,會損害對通孔之充填性。特別是,內通孔之直徑越小,越容易受導電性粒子密度之影響。故,內通孔之導通性受到嚴重影響。Further, as long as the existence ratio of the conductive particles in the inner via hole is large, the conductor resistance can be reduced. Therefore, the conductive paste can be made to contain a large amount of conductive particles as much as possible to enhance conductivity. However, since the solid conductive particles and the liquid binder are mixed, the mixing ratio of the gelatinization is limited, and if the viscosity is too high, the filling property to the through holes is impaired. In particular, the smaller the diameter of the inner via hole, the more susceptible it is to the density of the conductive particles. Therefore, the continuity of the inner through hole is seriously affected.

另一方面,為降低通孔內之導通電阻,可藉於導電體糊中含有氯,以還原含於導電體糊中之導電性粒子之表面,但若氯之含有量過多,則印刷基板之絕緣性降低。特別是,若導電體糊中氯之含有率較預浸體中氯之含有率高,則含於通孔內之導電體糊之氯會侵入預浸體內,故印刷基板之絕緣性將更容易降低。On the other hand, in order to reduce the on-resistance in the via hole, the conductive paste may contain chlorine to reduce the surface of the conductive particles contained in the conductive paste, but if the chlorine content is too large, the printed substrate The insulation is reduced. In particular, if the chlorine content in the conductive paste is higher than the chlorine content in the prepreg, the chlorine in the conductive paste contained in the through holes will intrude into the prepreg, so that the insulating properties of the printed substrate are easier. reduce.

【專利文獻1】特開平7-176846號公報[Patent Document 1] JP-A-7-176466

發明揭示Invention

本發明係製作一種可藉小孔徑之內通孔連接,得到電極層間之電連接、高耐熱衝擊性、高耐濕性、及高連接強度之導電體糊組成物。又,本發明係由含有使用該糊之內通孔連接之雙面印刷基板製作多層印刷基板。The present invention provides a conductive paste composition which can be connected by a through hole in a small aperture to obtain electrical connection between the electrode layers, high thermal shock resistance, high moisture resistance, and high connection strength. Further, in the present invention, a multilayer printed board is produced from a double-sided printed board including the through holes in the paste.

又,本發明之導電體糊組成物係充填於通孔之導電體 糊組成物,並包含有:(a)30~70體積%之導電體粒子,係平均粒徑為0.5~20 μm,且其比表面積為0.05~1.5m2 /g者;(b)70~30體積%之樹脂,係含有10重量%以上之環氧化合物者,該環氧化合物於一分子中具有1個以上之環氧基,且羥基、胺基及羧基之合計量為環氧基之5莫耳%以下,環氧當量為100~350g/eq;及氯20~2000ppm。Further, the conductor paste composition of the present invention is a conductive paste composition filled in a via hole, and comprises: (a) 30 to 70% by volume of conductive particles having an average particle diameter of 0.5 to 20 μm, and The specific surface area is 0.05 to 1.5 m 2 /g; (b) 70 to 30% by volume of the resin is 10% by weight or more of the epoxy compound, and the epoxy compound has one or more rings in one molecule. The oxy group and the total amount of the hydroxyl group, the amine group and the carboxyl group are 5 mol% or less of the epoxy group, the epoxy equivalent is 100 to 350 g/eq, and the chlorine is 20 to 2000 ppm.

依據使用本發明之通孔充填用導電體糊之雙面印刷基板、其形成方法及使用其之多層基板,可實現不需使用穿通孔電鍍技術、即可簡便地具有高可靠性之小孔徑內通孔的雙面印刷基板,亦可輕易地實現其多層化。According to the double-sided printed board using the conductive paste for through-hole filling of the present invention, the method of forming the same, and the multilayer substrate using the same, it is possible to realize a small aperture in which high reliability can be easily achieved without using a through-hole plating technique. The double-sided printed substrate of the through hole can also be easily multi-layered.

圖式簡單說明Simple illustration

第1圖係顯示本發明之一實施形態之雙面印刷基板之構造截面圖。Fig. 1 is a cross-sectional view showing the structure of a double-sided printed board according to an embodiment of the present invention.

第2A圖係相同實施形態之雙面印刷基板之形成方法之工程圖。Fig. 2A is a plan view showing a method of forming a double-sided printed board of the same embodiment.

第2B圖係相同實施形態之雙面印刷基板之形成方法之工程圖。Fig. 2B is a plan view showing a method of forming a double-sided printed circuit board of the same embodiment.

第2C圖係相同實施形態之雙面印刷基板之形成方法之工程圖。Fig. 2C is a plan view showing a method of forming a double-sided printed board of the same embodiment.

第2D圖係相同實施形態之雙面印刷基板之形成方法之工程圖。Fig. 2D is a drawing showing a method of forming a double-sided printed board of the same embodiment.

第3A圖係相同實施形態之多層印刷基板之形成方法之工程圖。Fig. 3A is a plan view showing a method of forming a multilayer printed substrate of the same embodiment.

第3B圖係相同實施形態之多層印刷基板之形成方法之 工程圖。3B is a method of forming a multilayer printed substrate of the same embodiment. Drawings.

第4A圖係相同實施形態之多層印刷基板之其他形成方法之工程圖。Fig. 4A is a plan view showing another method of forming a multilayer printed board of the same embodiment.

第4B圖係相同實施形態之多層印刷基板之其他形成方法之工程圖。Fig. 4B is a plan view showing another method of forming a multilayer printed board of the same embodiment.

第5圖係相同實施形態之印刷基板中使用之導電性粒子之構造圖。Fig. 5 is a structural view showing conductive particles used in a printed circuit board of the same embodiment.

實施發明之最佳形態Best form for implementing the invention (實施形態1)(Embodiment 1)

以下,依據圖式詳細說明使用本發明之通孔充填用導電體糊之雙面印刷基板、其形成方法、及使用其之多層印刷基板。Hereinafter, a double-sided printed board using the via paste for conductive filling of the present invention, a method of forming the same, and a multilayer printed board using the same will be described in detail with reference to the drawings.

第1圖係本發明之雙面印刷基板之一實施形態之構造截面圖。於第1圖中,雙面印刷基板104係由積層基材101、銅箔102(配線圖形之銅箔)、及導電體通孔103構成,且該導電體通孔103係硬化充填有導電體糊之孔徑為150 μm以下之小孔徑。本發明之重點係導電體糊組成物為低黏度故充填容易,且為充滿有高含有量之導電體粒子之連接。也就是說,本發明係低電阻率、低熱膨脹率,且導電體糊組成物中之樹脂係低吸水率、高接著強度、無溶劑具低揮發性,故於所有之環境試驗中,仍可製作出具有高連接可靠性之小孔徑之內通孔基板。另外,內通孔連接,係於任意位置連接雙面、及多層印刷基板之各層間之方法。Fig. 1 is a structural sectional view showing an embodiment of a double-sided printed circuit board of the present invention. In the first embodiment, the double-sided printed circuit board 104 is composed of a laminated base material 101, a copper foil 102 (a copper foil of a wiring pattern), and a conductor through hole 103, and the conductor through hole 103 is hardened and filled with a conductor. The pore size of the paste is a small pore size of 150 μm or less. The focus of the present invention is that the conductor paste composition is low in viscosity and therefore easy to fill, and is filled with a high content of conductive particles. That is to say, the present invention is low resistivity, low coefficient of thermal expansion, and the resin in the electrical conductor paste composition has low water absorption, high adhesion strength, and low volatility without solvent, so that in all environmental tests, A through-hole substrate having a small aperture with high connection reliability is fabricated. In addition, the inner via connection is a method of connecting the double-sided and the layers of the multilayer printed substrate at any position.

形成導電體通孔103之導電體糊組成物中之導電體粒子,需於導電體組成物中含有高濃度。其原因係如前述,藉由提高導電體粒子間之接觸機率使連接通孔低電阻率化、及於因熱或機械應力使基板歪斜增加時,亦需維持連接可靠性。為使導電體粒子高濃度地分散,導電體粒子之平均粒徑係於0.2~20 μm之範圍內,且其比表面積越小越好,又,其值宜為0.05~1.5m2 /g。若平均粒徑小於0.2 μm,比表面積會大於1.5m2 /g,而未能高濃度地分散,若大於20 μm時,充填於1個通孔之導電體糊中之導電體粒子個數會過少,而降低連接可靠性。又,因不易於比表面積小於0.05m2 /g中使平均粒徑為20 μm以下,且若大於1.5m2 /g時導電體粒子未能高濃度地分散故不佳。此外,為提高該導電體糊組成物對通孔之充填性,其黏度與TI值越低越好,且TI值宜為1.0以下。另外,TI值係表示於黏度具有剪切速度相依性之糊中,不同之剪切速度下各黏度之相對比。於本發明中,TI值係於溫度25℃下1[1/sec]之黏度(A)、及於溫度25℃下2[1/sec]之黏度(B)之比(A/B)。又,黏度測定係使用東機產業(股)製,E型黏度計(DVU-E型),於25℃下R=14mm,3°圓錐,0.5rpm(相當於剪切速度1(1/s))之條件下測定。The conductor particles in the conductor paste composition forming the via hole 103 need to have a high concentration in the conductor composition. The reason for this is that, as described above, the connection reliability is improved by increasing the contact probability between the conductor particles, and the connection reliability is increased when the substrate is skewed due to thermal or mechanical stress. In order to disperse the conductor particles at a high concentration, the average particle diameter of the conductor particles is in the range of 0.2 to 20 μm, and the smaller the specific surface area, the better, and the value is preferably 0.05 to 1.5 m 2 /g. If the average particle diameter is less than 0.2 μm, the specific surface area will be greater than 1.5 m 2 /g, but it will not be dispersed at a high concentration. If it is larger than 20 μm, the number of conductive particles filled in the conductive paste of one via hole will be Too little to reduce connection reliability. Further, due to the difficult surface area less than 0.05m 2 / g manipulation average particle diameter of 20 μm or less, and the conductive particles could not be dispersed so that a high concentration of poorly if greater than 1.5m 2 / g. Further, in order to improve the filling property of the conductor paste composition to the via hole, the viscosity and the TI value are preferably as low as possible, and the TI value is preferably 1.0 or less. In addition, the TI value is expressed in the paste having a viscosity dependence on the viscosity, and the relative ratio of each viscosity at different shear rates. In the present invention, the TI value is a ratio (A/B) of a viscosity (A) of 1 [1/sec] at a temperature of 25 ° C and a viscosity (B) of 2 [1/sec] at a temperature of 25 ° C. In addition, the viscosity measurement system was made by Toki Shoji Co., Ltd., E-type viscometer (DVU-E type), R = 14 mm at 25 ° C, 3 ° cone, 0.5 rpm (corresponding to shear rate 1 (1/s) ))).

為確保絕緣性,本發明中氯之含有率需較預浸體中氯之含有率低,宜為20~2000ppm。若大於2000ppm,印刷基板之絕緣性會降低。又,若小於20ppm,因通孔之接觸電阻值會變大,故不佳。In order to ensure insulation, the chlorine content in the present invention needs to be lower than the chlorine content in the prepreg, and is preferably from 20 to 2,000 ppm. If it is more than 2000 ppm, the insulation of the printed substrate is lowered. Further, if it is less than 20 ppm, the contact resistance value of the via hole becomes large, which is not preferable.

更詳細說明大於2000ppm時之情形。此時,因充填於通孔內之導電體糊中氯之含有率較預浸體中氯之含有率高,而有侵入預浸體並提高預浸體中之氯濃度之疑慮,藉此,基板之絕緣性會降低,而容易產生位移。又,於通孔正上方之平台上封裝半導體裝置時,通孔內之氯容易移動至半導體裝置,使對半導體裝置之絕緣性降低。The situation when it is greater than 2000 ppm is explained in more detail. At this time, since the content of chlorine in the conductor paste filled in the through hole is higher than the content of chlorine in the prepreg, there is a concern that the prepreg is invaded and the chlorine concentration in the prepreg is increased. The insulation of the substrate is lowered and displacement is likely to occur. Further, when the semiconductor device is packaged on the platform directly above the via hole, chlorine in the via hole is easily moved to the semiconductor device, and the insulation property to the semiconductor device is lowered.

又,導電體粒子之種類大致可使用金、鉑、銀、鈀等貴金屬、或銅、鎳、錫、鉛、銦等卑金屬,亦可併用該等2種以上。Further, as the type of the conductor particles, a noble metal such as gold, platinum, silver or palladium or a base metal such as copper, nickel, tin, lead or indium may be used, or two or more kinds thereof may be used in combination.

第5圖係本發明之一實施形態之印刷基板中使用之導電性粒子之構造圖。於第5圖中,核501為球狀,導電性材料502具有作為覆蓋核501表面之導電性填料之作用。如此,亦可使用以導電性之材料覆蓋不僅為單一之金屬,亦可為合金、金屬或絕緣性之核者。又,導電體粒子之形狀只要係具有前述平均粒徑、比表面積者的話,並未特別限制。特別是,由位移之抑制、經濟上之供應及價格之穩定性來看,宜使用銅粉末作為導電體粒子。然而,因銅粉末一般係容易氧化,故於作為通孔填充用途使用時,銅粉末之氧化會限礙導電性。因此,銅粉末之氧濃度宜為1.0重量%以下。Fig. 5 is a structural view showing conductive particles used in a printed circuit board according to an embodiment of the present invention. In Fig. 5, the core 501 is spherical, and the conductive material 502 has a function as a conductive filler covering the surface of the core 501. In this way, it is also possible to use a conductive material to cover not only a single metal but also an alloy, a metal or an insulating core. Further, the shape of the conductor particles is not particularly limited as long as it has the above average particle diameter and specific surface area. In particular, copper powder is preferably used as the conductor particles in view of suppression of displacement, economic supply, and stability of price. However, since copper powder is generally easily oxidized, oxidation of copper powder hinders conductivity when used as a through-hole filling application. Therefore, the oxygen concentration of the copper powder is preferably 1.0% by weight or less.

其次,說明形成導電體通孔103之導電體糊203中之樹脂。為形成連接可靠性高之內通孔用導電體組成物,基本上樹脂係需要無溶劑且低黏度、低吸水率、高接著強度之樹脂。為得到該物理性質樹脂之組成係使用含有10重量% 以上之環氧化合物之樹脂,該環氧化合物於一分子中含有1個以上之環氧基,且羥基、胺基及羧基為環氧基之5莫耳%以下,環氧當量為100~350g/eq。以環氧化合物作為必要成分之原因係為得到高接著強度。於該環氧化合物中,羥基、胺基及羧基需為環氧基之5莫耳%以下之低濃度的原因係,因該等具有氫鍵結力高之官能基,故即使樹脂黏度低,導電體糊之黏度仍為高。相反地,只要該等氫鍵結力高之官能基為環氧基之5莫耳以下之低濃度的話,即使樹脂黏度高仍可得低黏度之導電體糊。另外,羥基、胺基及羧基與環氧基之比可以化學定量分析確認,亦可簡單地以紅外分光分析中3500cm-1 附近之吸光度(因羥基、胺基及羧基所產生者)、及910cm-1 附近之吸光度(因環氧基所產者)之比來確認。於該環氧化合物中,以100~350g/eq為環氧當量之原因係,當為350g/eq以上時交聯密度會過低則吸水率增高而成為低接著強度,當小於100g/eq時交聯密度會過高則硬化收縮歪斜增大導致接著強度低下。若於樹脂中含有10重量%以上之環氧化合物,可得低吸水率、高接著強度之導電體糊組成物。環氧化合物以外之樹脂成分,只要為無溶劑的話,並未特別限制。又,亦可視需要混合用以使環氧化合物反應硬化之環氧硬化劑。另外,導電體糊之黏度宜為2000Pa.s以下、TI值為1以下。當黏度為2000Pa.s以上、TI值大於1時,將產生未能進行通孔充填作業之不良情況。又,於本發明中使樹脂為無溶劑之原因係,若含有溶劑時,於通孔中充填該導電體組成物後加熱壓縮時,其中之揮發 成分會揮發散出,於通孔充填組成物中產生空隙、或產生預浸體之剝離等,造成連接不穩定。Next, the resin in the conductor paste 203 in which the conductor via 103 is formed will be described. In order to form a conductor composition for an internal via hole having high connection reliability, a resin which is substantially solvent-free and has low viscosity, low water absorption, and high adhesion strength is required. In order to obtain a composition of the physical property resin, a resin containing 10% by weight or more of an epoxy compound containing one or more epoxy groups in one molecule, and a hydroxyl group, an amine group and a carboxyl group are epoxy groups are used. It is 5 mol% or less, and the epoxy equivalent is 100-350 g/eq. The reason why an epoxy compound is an essential component is to obtain a high adhesion strength. In the epoxy compound, the hydroxyl group, the amine group, and the carboxyl group are required to have a low concentration of 5 mol% or less of the epoxy group. Since these have a functional group having a high hydrogen bonding force, even if the resin has a low viscosity, The viscosity of the conductor paste is still high. On the contrary, as long as the functional group having such a high hydrogen bonding strength is a low concentration of 5 m or less of the epoxy group, a low-viscosity conductor paste can be obtained even if the resin has a high viscosity. In addition, the ratio of a hydroxyl group, an amine group, and a carboxyl group to an epoxy group can be confirmed by chemical quantitative analysis, and the absorbance in the vicinity of 3500 cm -1 (produced by a hydroxyl group, an amine group, and a carboxyl group), and 910 cm can be simply analyzed by infrared spectroscopic analysis. The ratio of the absorbance near -1 (produced by the epoxy group) was confirmed. In the epoxy compound, when the epoxy equivalent is 100 to 350 g/eq, when the crosslinking density is 350 g/eq or more, the water absorption rate is increased to become a low adhesion strength, and when it is less than 100 g/eq. If the crosslink density is too high, the hardening shrinkage will increase and the strength will be low. When 10% by weight or more of the epoxy compound is contained in the resin, an electrode paste composition having low water absorption and high adhesion strength can be obtained. The resin component other than the epoxy compound is not particularly limited as long as it is solvent-free. Further, an epoxy hardener for reacting and curing the epoxy compound may be mixed as needed. In addition, the viscosity of the conductive paste should be 2000Pa. Below s, the TI value is 1 or less. When the viscosity is 2000Pa. When s or more and the TI value is greater than 1, there is a problem that the through hole filling operation cannot be performed. Further, in the present invention, the resin is made solvent-free. When the solvent is contained, when the conductor composition is filled in the through hole and then heated and compressed, the volatile component is volatilized and discharged, and the composition is filled in the through hole. A void is generated in the middle, or peeling of the prepreg or the like occurs, resulting in unstable connection.

適合使用之環氧化合物,可舉例如:縮水甘油醚型環氧樹脂、縮水甘油酯型環氧樹脂、縮水甘油胺型環氧樹脂、及脂環式環氧樹脂等。其中,藉由使用雙酚縮水甘油醚型環氧樹脂,例如:雙酚A型環氧樹脂(化1)、雙酚F型環氧樹脂(化2)、雙酚AD型(化3)、氫化雙酚型環氧樹脂(化4)、環氧烷改質雙酚型環氧樹脂(化5)、烷氧基改質雙酚型環氧樹脂(化6)等,可以低黏度得到低吸水率與高接著強度。該等雙酚縮水甘油醚型環氧樹脂可單獨亦可以任意之組合使用。Examples of the epoxy compound to be used include a glycidyl ether type epoxy resin, a glycidyl ester type epoxy resin, a glycidylamine type epoxy resin, and an alicyclic epoxy resin. Among them, by using a bisphenol glycidyl ether type epoxy resin, for example, a bisphenol A type epoxy resin (chemical 1), a bisphenol F type epoxy resin (chemical 2), a bisphenol AD type (chemical 3), Hydrogenated bisphenol epoxy resin (chemical 4), alkylene oxide modified bisphenol epoxy resin (chemical 5), alkoxy modified bisphenol epoxy resin (chemical 6), etc., can be low in low viscosity Water absorption and high adhesion strength. These bisphenol glycidyl ether type epoxy resins may be used singly or in any combination.

但是,n≧0。However, n≧0.

但是,n≧0。However, n≧0.

但是,n≧0。However, n≧0.

但是,n≧0。However, n≧0.

但是,R=CpH2p+1(p≧1),且m+n≧2。However, R = CpH2p + 1 (p ≧ 1), and m + n ≧ 2.

但是,R=CpH2p+1(p≧1)。However, R = CpH2p + 1 (p ≧ 1).

又,環氧化合物係由90~20重量%之雙酚縮水甘油醚型環氧樹脂(A群)、及10~80重量%之選自於C8以上之長鏈脂肪族醇縮水甘油醚型環氧樹脂與C8以上之長鏈脂肪酸縮水甘油酯型環氧樹脂之至少一種環氧樹脂(B群)所構成之樹脂。可特別地以低黏度得到低吸水率與高接著強度,且其對應力之緩和效果強,故可提高通孔之連接可靠性。Further, the epoxy compound is a 90- to 20% by weight bisphenol glycidyl ether type epoxy resin (Group A), and 10 to 80% by weight of a long-chain aliphatic alcohol glycidyl ether type ring selected from C8 or higher. A resin composed of at least one epoxy resin (Group B) of an oxygen resin and a long-chain fatty acid glycidyl ester type epoxy resin having a C8 or higher. In particular, a low water absorption rate and a high adhesion strength can be obtained with a low viscosity, and the stress relaxation effect is strong, so that the connection reliability of the through holes can be improved.

此處,含於A群之樹脂例,可使用:雙酚A型環氧樹脂 (化1)、雙酚F型環氧樹脂(化2)、雙酚AD型(化3)、氫化雙酚型環氧樹脂(化4)、環氧烷改質雙酚型環氧樹脂(化5)、烷氧基改質雙酚型環氧樹脂(化6)等。又,含於B群之樹脂例,可使用:亞麻油酸雙聚體縮水甘油型環氧樹脂(化7)、異戊二烯己酸二聚物縮水甘油酯型環氧樹脂(化8)、烷烴羧酸(versatic acid)縮水甘油酯型環氧樹脂(化9)、月桂基縮水甘油醚型環氧樹脂(化10)等。該等A群B群之樹脂可單獨亦可以任意之組合使用。Here, for the resin group contained in Group A, bisphenol A type epoxy resin can be used. (Chemical Formula 1), bisphenol F type epoxy resin (chemical 2), bisphenol AD type (chemical 3), hydrogenated bisphenol type epoxy resin (chemical 4), alkylene oxide modified bisphenol type epoxy resin ( 5), alkoxy modified bisphenol type epoxy resin (chemical 6) and the like. Further, examples of the resin contained in the group B include: linoleic acid dimer glycidyl type epoxy resin (chemical 7), isoprene hexanoic acid dimer glycidyl ester type epoxy resin (chemical 8) An alkane carboxylic acid glycidyl ester type epoxy resin (chemical formula 9), a lauryl glycidyl ether type epoxy resin (10). The resins of the Group A Group B may be used singly or in any combination.

但是,R1、R2、R3均為烷基,且其碳數之合計為8。However, R1, R2 and R3 are all alkyl groups, and the total number of carbon atoms thereof is 8.

又,其他適用之環氧化合物可舉平均分子量600~10000之環氧寡聚物為例。環氧寡聚物之羥基、胺基、及羧基量相對於環氧基量非常地少,且於作為導電體糊時,隨著樹脂分子量的增加黏度之剪切速度相依性(TI值)會變小,故具有可得低黏度導電體糊之效果。此外,環氧寡聚物亦有提升剝離接著強度之效果。Further, other suitable epoxy compounds are exemplified by epoxy oligomers having an average molecular weight of 600 to 10,000. The amount of the hydroxyl group, the amine group, and the carboxyl group of the epoxy oligomer is extremely small with respect to the amount of the epoxy group, and when it is used as the conductor paste, the shear rate dependence (TI value) of the viscosity increases as the molecular weight of the resin increases. It becomes smaller, so it has the effect of obtaining a low-viscosity conductor paste. In addition, the epoxy oligomer also has the effect of improving the peeling strength.

又,當環氧化合物係由90~19重量%之雙酚縮水甘油醚型環氧樹脂(A群)、9~80重量%之C8以上之長鏈脂肪族醇縮水甘油醚型環氧樹脂與C8以上之長鏈脂肪酸縮水甘油酯型環氧樹脂(B群)、及1~30重量%之平均分子量600~10000之環氧寡聚物(C群)所構成之樹脂時,可特別地以低黏度得到低吸水率與高接著強度,且其對應力之緩和效果強,故可提高通孔之連接可靠性。Further, the epoxy compound is composed of 90 to 19% by weight of a bisphenol glycidyl ether type epoxy resin (Group A), and 9 to 80% by weight of a C8 or higher long chain aliphatic alcohol glycidyl ether type epoxy resin. When a long-chain fatty acid glycidyl ester epoxy resin (group B) of C8 or higher and a resin composed of 1 to 30% by weight of an epoxy oligomer (group C) having an average molecular weight of 600 to 10,000 are used, The low viscosity gives low water absorption and high adhesion strength, and its effect on stress relaxation is strong, so the connection reliability of the through holes can be improved.

此處,含於A群之樹脂例,可使用:雙酚A型環氧樹脂(化1)、雙酚F型環氧樹脂(化2)、雙酚AD型(化3)、氫化雙酚型環氧樹脂(化4)、環氧烷改質雙酚型環氧樹脂(化5)、烷氧基改質雙酚型環氧樹脂(化6)等。又,含於B群之樹脂例,可使用:亞麻油酸雙聚體縮水甘油型環氧樹脂(化7)、異戊二烯己酸二聚物縮水甘油酯型環氧樹脂(化8)、烷烴羧酸(versatic acid)縮水甘油酯型環氧樹脂(化9)、月桂基縮水甘油醚型環氧樹脂(化10)等。此外,含於C群之樹脂例,可使 用:環氧化不飽和脂肪酸改質物(化11)、環氧化聚丁二烯(化12)、環氧化聚苯乙烯丁二烯共聚物(化13)等。該等A群B群C群之樹脂可單獨亦可以任意之組合使用。Here, examples of the resin contained in Group A can be used: bisphenol A type epoxy resin (chemical 1), bisphenol F type epoxy resin (chemical 2), bisphenol AD type (chemical 3), hydrogenated bisphenol Type epoxy resin (chemical 4), alkylene oxide modified bisphenol type epoxy resin (chemical 5), alkoxy modified bisphenol type epoxy resin (chemical 6), and the like. Further, examples of the resin contained in the group B include: linoleic acid dimer glycidyl type epoxy resin (chemical 7), isoprene hexanoic acid dimer glycidyl ester type epoxy resin (chemical 8) An alkane carboxylic acid glycidyl ester type epoxy resin (chemical formula 9), a lauryl glycidyl ether type epoxy resin (10). In addition, the resin case contained in the C group can be Use: epoxidized unsaturated fatty acid modifier (11), epoxidized polybutadiene (12), epoxidized polystyrene butadiene copolymer (Chemical 13). The resins of the Group A Group B Group C may be used singly or in any combination.

但是,R1、R4均為碳數1~18之烷基,R2、R3均為碳數0~8之亞烷基,且n≧1。However, R1 and R4 are each an alkyl group having 1 to 18 carbon atoms, and R2 and R3 are each an alkylene group having a carbon number of 0 to 8, and n≧1.

但是,R、R’均為碳數0~8之烷基,且q≧1,r≧1,s≧1,t≧1。However, R and R' are each an alkyl group having a carbon number of 0 to 8, and q ≧ 1, r ≧ 1, s ≧ 1, t ≧ 1.

但是,R、R’均為碳數0~8之烷基,且v≧1,w≧1,x≧1,y≧1,z≧1。However, R and R' are each an alkyl group having a carbon number of 0 to 8, and v ≧ 1, w ≧ 1, x ≧ 1, y ≧ 1, z ≧ 1.

又,導電體糊中亦可視需要添加環氧化合物以外之樹脂。適用之樹脂可使用例如:以提升耐熱性為目的之醯亞胺樹脂、酚醛樹脂等;以提升與銅箔之剝離接著強度為目的之聚烯烴等乙烯聚合物、丙烯酸樹脂、聚醚、聚酯、聚 醯胺、聚胺酯等。該等樹脂可單獨亦可以任意之組合使用。Further, a resin other than the epoxy compound may be added to the conductor paste as needed. For the resin to be used, for example, an yttrium imide resin or a phenol resin for the purpose of improving heat resistance, and an ethylene polymer, an acrylic resin, a polyether, and a polyester such as polyolefin for the purpose of improving the peeling strength of the copper foil. Gather Indoleamine, polyurethane, and the like. These resins may be used singly or in any combination.

另外,導電體糊中亦可視需要混合環氧硬化劑。環氧硬化劑可使用一般作為單成分組成物使用之硬化劑。可使用例如:二氰二胺、羧基醯肼等胺系硬化劑、十七基咪唑等咪唑系硬化劑、3-(3,4-三氯苯基)-1、1-二甲基尿素等尿素系硬化劑、甲基六酞酸酐、內亞甲四氫酞酐等酸酐系硬化劑、三苯膦等膦系硬化劑、及六氟銻鹽等路易斯酸(Lewis Acid)等。於該等中,特別地由組成物之穩定性及作業性之觀點來看,以潛在性硬化劑為佳。此處,潛在性硬化劑係,具有於室溫下反應呈停止狀態時,長期特性無改變並可保存,且當加熱於預定溫度以上時,粒子會熔融、分解或溶解,顯現出被封存之活性基,一起使反應開始並快速硬化之機能者。Further, an epoxy hardener may be mixed in the conductor paste as needed. As the epoxy hardener, a hardener which is generally used as a one-component composition can be used. For example, an amine-based curing agent such as dicyandiamide or carboxyhydrazine, an imidazole curing agent such as heptadecyl imidazole, or 3-(3,4-trichlorophenyl)-1,1-dimethylurea, or the like can be used. An acid-based curing agent such as a urea-based curing agent, methyl hexaphthalic anhydride or nematic tetrahydrophthalic anhydride; a phosphine-based curing agent such as triphenylphosphine; and a Lewis acid such as hexafluoroantimony salt. Among these, a latent curing agent is preferred from the viewpoint of stability of the composition and workability. Here, the latent curing agent system has a long-term characteristic that does not change and can be stored when the reaction is stopped at room temperature, and when heated above a predetermined temperature, the particles melt, decompose or dissolve, and appear to be sealed. The active group, together with the function of the start of the reaction and rapid hardening.

又,亦可視需要於導電體糊中混合分散劑。分散劑可使用一般所使用之分散劑,可使用具代表性之第一種,高級脂肪酸之環氧乙烷、環氧丙烷添加酯化物、山梨醇酐與脂肪酸之酯化合物、山梨醇酐等多元醇之環氧乙烷、環氧丙烷添加醚化合物、烷基苯之環氧乙烷、環氧丙烷添加物等非離子性分散劑;第二種,烷基苯磺酸鹼金屬鹽、高級醇硫酸酯鹼金屬鹽、磷酸酯化合物、高級脂肪酸、高級脂肪酸之環氧乙烷、環氧丙烷添加物之硫酸鹼金屬鹽等陰離子系分散劑;第三種,4級銨鹽型之陽離子分散劑。此處所指之分散劑藉於糊中增加與作為與金屬粒子表面之黏合劑所混合之有機樹脂的親和性,具有促進糊之低黏度化及低 TI值化的效果。Further, the dispersant may be mixed in the conductor paste as needed. As the dispersing agent, a dispersing agent which is generally used can be used, and the first one of the representative ones, the ethylene oxide of a higher fatty acid, an esterified product of propylene oxide, an ester compound of sorbitan and a fatty acid, and sorbitan can be used. a nonionic dispersing agent such as an ethylene oxide of an alcohol, an ether compound of a propylene oxide, an ethylene oxide of an alkylbenzene, or a propylene oxide additive; and a second alkali metal salt of an alkylbenzenesulfonate, a higher alcohol An anionic dispersing agent such as an alkali metal salt of a sulfate, a phosphate compound, a higher fatty acid, an ethylene oxide of a higher fatty acid, or an alkali metal sulfate of a propylene oxide additive; and a cationic dispersant of a third-stage ammonium salt type . The dispersant referred to herein has an affinity for increasing the viscosity of the organic resin mixed with the binder on the surface of the metal particles, and promotes low viscosity and low viscosity of the paste. The effect of TI value.

積層基材101只要為擠壓時其厚度較預浸體於硬化後薄者即可,並無限制,可使用目前所知之所有積層基材。可使用例如:玻璃織布、玻璃不織布、醯胺織布、醯胺不織布之任一者與環氧樹脂等熱硬化性樹脂之複合材料、或玻璃織布、玻璃不織布、醯胺織布、醯胺不織布之任一者與玻璃轉移溫度180℃以上之熱可塑性樹脂(例如:全芳香族聚酯樹脂、聚醚碸、聚醚酮、聚醚醚酮等)之複合材料、或者薄膜材料,以形成絕緣材料。The laminated base material 101 is not particularly limited as long as it is thinner than the prepreg after curing, and any laminated substrate which is known at present can be used. For example, a composite material of a glass woven fabric, a glass non-woven fabric, a guanamine woven fabric, a guanamine non-woven fabric, and a thermosetting resin such as an epoxy resin, or a glass woven fabric, a glass non-woven fabric, a amide woven fabric, or a enamel can be used. a composite material of any of the amine non-woven fabrics and a thermoplastic resin (for example, a wholly aromatic polyester resin, a polyether oxime, a polyether ketone, a polyether ether ketone, etc.) having a glass transition temperature of 180 ° C or higher, or a film material, Forming an insulating material.

第2A圖~第2D圖係本發明雙面基板之形成方法之工程圖。於第2A圖中,積層基材201係預浸體,且該預浸體開有孔徑150 μm以下之穿通孔,一般而言常使用鑽孔,但依據材料之不同亦可使用雷射束等其他之加工法。並且,於穿通孔內充填有導電體糊203。第2B圖係顯示以銅箔202夾著第2A圖之狀態。第2C圖係顯示對第2B圖施加加熱加壓後之狀態。又,第2C圖係顯示開於預浸體之穿通孔於加熱加壓後金屬充填量增加之狀態,預浸體受到壓縮厚度變薄,且,樹脂硬化,導電體糊203係呈壓縮狀態,且該呈壓縮狀態之導電體糊係導電體通孔103。導電體通孔103具有電連接上下兩面之作用。第2D圖係顯示加工表面銅箔202(蝕刻等)且形成有配線圖形後之狀態。加工後之銅箔102會成為電路導電體。可供實用之印刷基板於之後有塗布阻焊(solder resist)、印刷文字或記號、開設插入零件用之孔等步驟,此處因非本發明之本質故省略。2A to 2D are drawings showing a method of forming a double-sided substrate of the present invention. In FIG. 2A, the laminated substrate 201 is a prepreg, and the prepreg has a through hole having a hole diameter of 150 μm or less. Generally, a hole is often used, but a laser beam or the like may be used depending on the material. Other processing methods. Further, a conductive paste 203 is filled in the through hole. Fig. 2B shows a state in which the second foil is sandwiched by the copper foil 202. Fig. 2C shows a state after applying heat and pressure to Fig. 2B. Further, in the second embodiment, the state in which the metal filling amount is increased after the heating and pressing of the through-holes in the prepreg, the thickness of the prepreg is reduced, and the resin is cured, and the conductor paste 203 is in a compressed state. And the conductive paste is in a compressed state, and the conductor through hole 103 is formed. The conductor through hole 103 has a function of electrically connecting the upper and lower surfaces. The 2D drawing shows a state in which the surface copper foil 202 (etching or the like) is processed and a wiring pattern is formed. The processed copper foil 102 becomes a circuit conductor. The usable printed substrate may be followed by a step of applying a solder resist, a printed character or a mark, and a hole for inserting the component, which is omitted here because it is not the essence of the present invention.

第3A、B圖係顯示重複使用前述雙面基板之形成方法以製作多層印刷基板之步驟。第3A圖係顯示於芯層雙面印刷基板104之兩側(上下面)配置於第2A圖之穿通孔充填有導電體糊者,並設有銅箔202之狀態。於此狀態下,由上下面加熱加壓的話,可製作第3B圖之多層印刷基板,且已做成內通孔連接。此外,若將上下面之銅箔202加工成圖形狀即可完成4層之多層印刷基板。之後,重複該步驟,可做出層數更多之多層印刷基板。Figs. 3A and 3B show the steps of repeatedly forming the above-described double-sided substrate to form a multilayer printed substrate. Fig. 3A shows a state in which the through-holes of the second layer printed substrate 104 are placed on both sides (upper and lower sides) of the core double-sided printed substrate 104, and the conductive paste is filled, and the copper foil 202 is provided. In this state, when the upper and lower surfaces are heated and pressurized, the multilayer printed board of Fig. 3B can be produced and connected as an inner via. Further, if the upper and lower copper foils 202 are processed into a patterned shape, a four-layer multilayer printed substrate can be completed. Thereafter, this step is repeated to make a multilayer printed circuit board having a larger number of layers.

於第3A、B圖之多層印刷基板之形成方法中,芯層之雙面印刷基板雖使用本發明之雙面基板,但非為必要,可使用習知穿通孔雙面印刷基板。因此,不需重新準備可做成雙面基板之設備,可減少成本。此時,宜預先設有穿通孔(貫通孔)。此處之穿通孔基板係指樹脂基板。另外,穿通孔基板除了樹脂基板之外亦可使用陶瓷基板等。In the method of forming a multilayer printed board according to FIGS. 3A and 3B, the double-sided board of the present invention is used for the double-sided printed board of the core layer, but it is not necessary, and a conventional through-hole double-sided board can be used. Therefore, it is not necessary to newly prepare a device which can be made into a double-sided substrate, and the cost can be reduced. At this time, it is preferable to provide a through hole (through hole) in advance. The through-via substrate herein refers to a resin substrate. Further, a ceramic substrate or the like may be used for the through-hole substrate in addition to the resin substrate.

第4A、B圖係顯示多層印刷基板之其他形成方法。於第4A圖中,以2片雙面印刷基板104夾著充填有導電體糊203之加熱加壓前之積層基材201。於該狀態下加熱加壓,可得到第4B圖之4層多層印刷基板。除了4層之外,若準備複數片之雙面印刷基板,並於各雙面基板間夾著充填有前述導電體粒子之加熱加壓前之積層基材進行加熱加壓的話,可製作更多層之多層印刷基板。4A and B are views showing other methods of forming a multilayer printed substrate. In Fig. 4A, the laminated substrate 201 before the heating and pressurization filled with the conductor paste 203 is sandwiched between the two double-sided printed boards 104. By heating and pressurizing in this state, a four-layer multilayer printed board of Fig. 4B can be obtained. In addition to the four layers, if a plurality of double-sided printed substrates are prepared and the laminated substrate before heating and pressing filled with the conductive particles is sandwiched between the double-sided substrates, more heat can be produced. Multilayer printed substrate of the layer.

於第4A、B圖之多層印刷基板之形成方法中之雙面基板雖使用本發明之雙面基板,但並非為必要,可使用習知穿通孔雙面印刷基板。又,穿通孔基板除了樹脂基板之外 亦可使用陶瓷基板等。Although the double-sided board of the present invention is used for the double-sided board in the method of forming the multilayer printed board of FIGS. 4A and 4B, it is not essential, and a conventional through-hole double-sided board can be used. Moreover, the through-hole substrate is in addition to the resin substrate A ceramic substrate or the like can also be used.

接著,使用圖表說明相對於本發明導電體糊組成物之氯含有量之印刷配線板的特性。Next, the characteristics of the printed wiring board with respect to the chlorine content of the conductor paste composition of the present invention will be described using a graph.

第1表係顯示相對於含於糊中之可水解氯量與通孔直徑之通孔接觸電阻值與絕緣電阻值。The first watch shows the through-hole contact resistance value and the insulation resistance value with respect to the amount of hydrolyzable chlorine contained in the paste and the diameter of the through-hole.

如第1表所示,只要本發明之填充於印刷配線板之通孔之導電體糊組成物之可水解氯量為20ppm以上的話,即使通孔直徑為150 μm以下,接觸電阻值仍為10m Ω/通孔以下, 得到電導通性良好之結果。As shown in the first table, as long as the amount of hydrolyzable chlorine of the conductor paste composition filled in the through hole of the printed wiring board of the present invention is 20 ppm or more, the contact resistance value is 10 m even if the through hole diameter is 150 μm or less. Below Ω/through hole, The result of good electrical conductivity is obtained.

又,當導電體糊組成物之可水解氯量較預浸體中氯之含有率低時,即為2000ppm的話,亦可於絕緣電阻值中得到良好之結果。Further, when the amount of hydrolyzable chlorine in the conductor paste composition is lower than the chlorine content in the prepreg, that is, 2000 ppm, good results can be obtained from the insulation resistance value.

且,可使用玻璃織布、玻璃不織布、醯胺織布、醯胺不織布之任一者與環氧樹脂等熱硬化性樹脂之複合材料、或玻璃織布、玻璃不織布、醯胺織布、醯胺不織布之任一者與玻璃轉移溫度180℃以上之熱可塑性樹脂(例如:全芳香族聚酯樹脂、聚醚碸、聚醚酮、聚醚醚酮等)之複合材料、或者薄膜材料,以形成絕緣材料。Further, a composite material of a glass woven fabric, a glass nonwoven fabric, a guanamine woven fabric, or a guanamine non-woven fabric, and a thermosetting resin such as an epoxy resin, or a glass woven fabric, a glass nonwoven fabric, a amide woven fabric, or a enamel may be used. a composite material of any of the amine non-woven fabrics and a thermoplastic resin (for example, a wholly aromatic polyester resin, a polyether oxime, a polyether ketone, a polyether ether ketone, etc.) having a glass transition temperature of 180 ° C or higher, or a film material, Forming an insulating material.

如以上所述,依據本實施形態1,本發明之導電體糊組成物至少包含有:(a)30~70體積%之導電體粒子,係平均粒徑為0.5~20 μm,且其比表面積為0.05~1.5m2 /g者、(b)70~30體積%之樹脂,係含有10重量%以上之環氧化合物者,該環氧化合物於一分子中具有1個以上之環氧基,且羥基、胺基及羧基之合計量為環氧基之5莫耳%以下,環氧當量為100~350g/eq、及氯20~2000ppm,因此,藉由將該導電體糊組成物充填於孔徑150 μm以下之通孔,可實現具高可靠性內通孔之雙面或多層印刷基板。As described above, according to the first embodiment, the conductor paste composition of the present invention contains at least (a) 30 to 70% by volume of the conductor particles having an average particle diameter of 0.5 to 20 μm and a specific surface area thereof. When the resin is 0.05 to 1.5 m 2 /g, and (b) 70 to 30% by volume of the epoxy resin is contained in an amount of 10% by weight or more, the epoxy compound has one or more epoxy groups in one molecule. Further, the total amount of the hydroxyl group, the amine group and the carboxyl group is 5 mol% or less of the epoxy group, the epoxy equivalent is 100 to 350 g/eq, and the chlorine is 20 to 2000 ppm. Therefore, the conductive paste composition is filled in Through-holes with a hole diameter of 150 μm or less can realize double-sided or multi-layer printed boards with high reliability through-holes.

另外,本發明之實施形態1中,通孔之孔徑雖為150 μm以下,但亦可為較150 μm大之孔徑。Further, in the first embodiment of the present invention, the diameter of the through hole is 150 μm or less, but it may be a hole larger than 150 μm.

產業上利用之可能性Industrial use possibility

本發明之導電體糊組成物可作為高密度配線基板,並具有於可高速傳輸之高頻電路用途、半導體封裝等細微之 配線圖形用途、及需小型、輕量化之可攜式電子機器用途等中所需之高連接可靠性,且有助於低廉印刷配線基板之形成。The conductor paste composition of the present invention can be used as a high-density wiring substrate, and has a high-frequency circuit for high-speed transmission, a semiconductor package, and the like. The high connection reliability required for wiring pattern use and portable electronic equipment applications requiring small size and light weight, and contributes to the formation of a low-cost printed wiring board.

101,201‧‧‧積層基材101,201‧‧‧Layered substrate

102,202‧‧‧銅箔102,202‧‧‧ copper foil

103‧‧‧導電體通孔103‧‧‧Electrical through hole

104‧‧‧雙面印刷基板104‧‧‧Double-sided printed circuit board

203‧‧‧導電體糊203‧‧‧Electrical paste

501‧‧‧核501‧‧‧nuclear

502‧‧‧導電性材料502‧‧‧Electrical materials

第1圖係顯示本發明之一實施形態之雙面印刷基板之構造截面圖。Fig. 1 is a cross-sectional view showing the structure of a double-sided printed board according to an embodiment of the present invention.

第2A圖係相同實施形態之雙面印刷基板之形成方法之工程圖。Fig. 2A is a plan view showing a method of forming a double-sided printed board of the same embodiment.

第2B圖係相同實施形態之雙面印刷基板之形成方法之工程圖。Fig. 2B is a plan view showing a method of forming a double-sided printed circuit board of the same embodiment.

第2C圖係相同實施形態之雙面印刷基板之形成方法之工程圖。Fig. 2C is a plan view showing a method of forming a double-sided printed board of the same embodiment.

第2D圖係相同實施形態之雙面印刷基板之形成方法之工程圖。Fig. 2D is a drawing showing a method of forming a double-sided printed board of the same embodiment.

第3A圖係相同實施形態之多層印刷基板之形成方法之工程圖。Fig. 3A is a plan view showing a method of forming a multilayer printed substrate of the same embodiment.

第3B圖係相同實施形態之多層印刷基板之形成方法之工程圖。Fig. 3B is a plan view showing a method of forming a multilayer printed substrate of the same embodiment.

第4A圖係相同實施形態之多層印刷基板之其他形成方法之工程圖。Fig. 4A is a plan view showing another method of forming a multilayer printed board of the same embodiment.

第4B圖係相同實施形態之多層印刷基板之其他形成方法之工程圖。Fig. 4B is a plan view showing another method of forming a multilayer printed board of the same embodiment.

第5圖係相同實施形態之印刷基板中使用之導電性粒子之構造圖。Fig. 5 is a structural view showing conductive particles used in a printed circuit board of the same embodiment.

101‧‧‧積層基材101‧‧‧Laminated substrate

102‧‧‧銅箔102‧‧‧ copper foil

103‧‧‧導電體通孔103‧‧‧Electrical through hole

104‧‧‧雙面印刷基板104‧‧‧Double-sided printed circuit board

Claims (13)

一種通孔充填用導電體糊組成物,包含有:30~70體積%之平均粒徑為0.5~20μm且比表面積為0.05~1.5m2 /g的導電體粒子;及70~30體積%之含有10重量%以上之環氧化合物的樹脂,該環氧化合物為於一分子中具有1個以上之環氧基,且羥基、胺基及羧基之合計量為環氧基之5莫耳%以下,及環氧當量為100~350g/eq者;且該通孔充填用導電體糊組成物之可水解氯含量為20~2000ppm。The conductive paste composition for through-hole filling comprises: 30 to 70% by volume of conductive particles having an average particle diameter of 0.5 to 20 μm and a specific surface area of 0.05 to 1.5 m 2 /g; and 70 to 30% by volume a resin containing 10% by weight or more of an epoxy compound, wherein the epoxy compound has one or more epoxy groups in one molecule, and the total amount of the hydroxyl group, the amine group, and the carboxyl group is 5 mol% or less of the epoxy group. And the epoxy equivalent is 100-350 g/eq; and the hydrolyzable chlorine content of the conductive paste composition for the through-hole filling is 20 to 2000 ppm. 如申請專利範圍第1項之通孔充填用導電體糊組成物,其中前述導電體粒子係選自於以下(1)至(4)之至少一種粒子:(1)選自於金、鉑、銀、鈀、銅、鎳、錫、鉛、銦之至少一種粒子;(2)選自於金、鉑、銀、鈀、銅、鎳、錫、鉛、銦、鋅、鉻之任意組合之合金粒子;(3)以導電性或非導電性粒子作為核,並以選自於金、鉑、銀、鈀、銅、鎳、錫、鉛、銦之至少一種金屬披覆之粒子;及(4)以導電性或非導電性粒子作為核,並以選自於金、鉑、銀、鈀、銅、鎳、錫、鉛、銦、鋅、鉻之任意組合之合金披覆之粒子。 The conductive paste composition for via filling according to the first aspect of the invention, wherein the conductive particles are selected from the group consisting of at least one of the following (1) to (4): (1) selected from the group consisting of gold and platinum. At least one particle of silver, palladium, copper, nickel, tin, lead, indium; (2) an alloy selected from any combination of gold, platinum, silver, palladium, copper, nickel, tin, lead, indium, zinc, chromium (3) particles having conductive or non-conductive particles as a core and coated with at least one metal selected from the group consisting of gold, platinum, silver, palladium, copper, nickel, tin, lead, and indium; and (4) A particle coated with an electroconductive or non-conductive particle as a core and an alloy selected from any combination of gold, platinum, silver, palladium, copper, nickel, tin, lead, indium, zinc, and chromium. 如申請專利範圍第1項之通孔充填用導電體糊組成物, 其中前述導電體粒子含有表面氧濃度為1.0重量%以下之銅。 For example, the electrical conductor paste composition for through-hole filling according to item 1 of the patent application scope, The conductor particles include copper having a surface oxygen concentration of 1.0% by weight or less. 如申請專利範圍第1項之通孔充填用導電體糊組成物,其中前述環氧化合物係選自於縮水甘油醚型環氧樹脂、縮水甘油酯型環氧樹脂、縮水甘油胺型環氧樹脂及脂環式環氧樹脂之至少一種環氧樹脂。 The conductive paste composition for through-hole filling according to the first aspect of the invention, wherein the epoxy compound is selected from the group consisting of a glycidyl ether type epoxy resin, a glycidyl ester type epoxy resin, and a glycidylamine type epoxy resin. And at least one epoxy resin of the alicyclic epoxy resin. 如申請專利範圍第1項之通孔充填用導電體糊組成物,其中前述環氧化合物係雙酚縮水甘油醚型環氧樹脂。 The conductive paste composition for via filling according to the first aspect of the invention, wherein the epoxy compound is a bisphenol glycidyl ether type epoxy resin. 如申請專利範圍第1項之通孔充填用導電體糊組成物,其中前述環氧化合物係含有重量平均分子量600~10000之環氧寡聚物。 The conductive paste composition for via filling according to the first aspect of the invention, wherein the epoxy compound contains an epoxy oligomer having a weight average molecular weight of 600 to 10,000. 如申請專利範圍第1項之通孔充填用導電體糊組成物,其中前述環氧化合物係由90~20重量%之雙酚縮水甘油醚型環氧樹脂、及10~80重量%之選自於C8以上之長鏈脂肪族醇縮水甘油醚型環氧樹脂與C8以上之長鏈脂肪酸縮水甘油酯型環氧樹脂之至少一種環氧樹脂所構成之樹脂。 The conductive paste composition for through-hole filling according to the first aspect of the invention, wherein the epoxy compound is 90 to 20% by weight of a bisphenol glycidyl ether type epoxy resin, and 10 to 80% by weight of the epoxy resin is selected from the group consisting of A resin composed of a long-chain aliphatic alcohol glycidyl ether type epoxy resin having a C8 or higher and a long-chain fatty acid glycidyl ester type epoxy resin having a C8 or higher. 如申請專利範圍第1項之通孔充填用導電體糊組成物,其中前述環氧化合物係由90~19重量%之雙酚縮水甘油醚型環氧樹脂、9~80重量%之選自於碳數(C)8以上之長鏈脂肪族醇縮水甘油醚型環氧樹脂與碳數(C)8以上之長鏈脂肪酸縮水甘油酯型環氧樹脂之至少一種樹脂、及1~30重量%之重量平均分子量600~10000之環氧寡聚物所構成之樹脂。 The conductive paste composition for through-hole filling according to the first aspect of the invention, wherein the epoxy compound is 90 to 19% by weight of a bisphenol glycidyl ether type epoxy resin, and 9 to 80% by weight of the epoxy resin is selected from the group consisting of a long-chain aliphatic alcohol glycidyl ether type epoxy resin having a carbon number (C) of 8 or more and at least one resin having a carbon number (C) of 8 or more long-chain fatty acid glycidyl ester type epoxy resins, and 1 to 30% by weight A resin composed of an epoxy oligomer having a weight average molecular weight of 600 to 10,000. 如申請專利範圍第1項之通孔充填用導電體糊組成物,其中關於糊組成物之黏度特性,係於溫度25℃下,1[1/sec]之黏度(A)與2[1/sec]之黏度(B)之比(A/B)為1以下。 The conductive paste composition for through-hole filling according to the first aspect of the patent application, wherein the viscosity characteristic of the paste composition is at a temperature of 25 ° C, a viscosity of 1 [1/sec] (A) and 2 [1/ The ratio (A/B) of the viscosity (B) of sec] is 1 or less. 一種印刷基板,係於絕緣基材內所開設之通孔中,充填有導電性樹脂組成物,且電連接前述絕緣基材表面之上下電極層者,前述導電性樹脂組成物,包含有:30~70體積%之平均粒徑為0.5~20μm且比表面積為0.05~1.5m2 /g的導電體粒子;70~30體積%之含有10重量%以上之環氧化合物的樹脂,該環氧化合物為於一分子中具有1個以上之環氧基,且羥基、胺基及羧基之合計量為環氧基之5莫耳%以下,及環氧當量為100~350g/eq者;及20~2000ppm之可水解的氯,且前述導電性樹脂組成物於前述通孔中硬化。A printed circuit board is filled in a through hole formed in an insulating substrate, filled with a conductive resin composition, and electrically connected to a lower electrode layer on a surface of the insulating substrate, wherein the conductive resin composition includes: 30 ~70% by volume of conductive particles having an average particle diameter of 0.5 to 20 μm and a specific surface area of 0.05 to 1.5 m 2 /g; 70 to 30% by volume of a resin containing 10% by weight or more of an epoxy compound, the epoxy compound In order to have one or more epoxy groups in one molecule, and the total amount of the hydroxyl group, the amine group and the carboxyl group is 5 mol% or less of the epoxy group, and the epoxy equivalent is 100 to 350 g/eq; and 20~ 2000 ppm of hydrolyzable chlorine, and the aforementioned conductive resin composition was hardened in the aforementioned through holes. 如申請專利範圍第10項之印刷基板,其中前述通孔之孔徑係150μm以下。 The printed circuit board of claim 10, wherein the through hole has a hole diameter of 150 μm or less. 一種印刷基板之製造方法,包含有以下步驟:於用以製造印刷基板之預浸體預先形成通孔;於前述通孔中充填導電體糊組成物,且前述導電體糊組成物包含有:30~70體積%之平均粒徑為0.5~20μm且比表面積為0.05~1.5m2 /g的導電體粒子;70~30體積%之含有10重量%以上之環氧化合物的 樹脂,該環氧化合物為於一分子中具有1個以上之環氧基,且羥基、胺基及羧基之合計量為環氧基之5莫耳%以下,及環氧當量為100~350g/eq者;及20~2000ppm之可水解的氯;於前述預浸體之上下層夾著銅箔進行加熱加壓;及藉蝕刻前述銅箔而形成電路。A manufacturing method of a printed circuit board comprising the steps of: forming a through hole in a prepreg for manufacturing a printed substrate; filling the through hole with a conductive paste composition, and the conductive paste composition comprises: 30 ~70% by volume of conductive particles having an average particle diameter of 0.5 to 20 μm and a specific surface area of 0.05 to 1.5 m 2 /g; 70 to 30% by volume of a resin containing 10% by weight or more of an epoxy compound, the epoxy compound In order to have one or more epoxy groups in one molecule, and the total amount of the hydroxyl group, the amine group and the carboxyl group is 5 mol% or less of the epoxy group, and the epoxy equivalent is 100 to 350 g/eq; and 20~ 2000 ppm of hydrolyzable chlorine; heating and pressing the copper foil under the lower layer of the prepreg; and etching the copper foil to form an electric circuit. 如申請專利範圍第12項之印刷基板之製造方法,其更具有一將前述通孔之孔徑形成為150μm以下之步驟。 The method for producing a printed circuit board according to claim 12, further comprising the step of forming the aperture of the through hole to be 150 μm or less.
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