TWI403443B - - Google Patents

Info

Publication number
TWI403443B
TWI403443B TW099122160A TW99122160A TWI403443B TW I403443 B TWI403443 B TW I403443B TW 099122160 A TW099122160 A TW 099122160A TW 99122160 A TW99122160 A TW 99122160A TW I403443 B TWI403443 B TW I403443B
Authority
TW
Taiwan
Prior art keywords
photomask
sealed space
pellicle
pellicle frame
receiving space
Prior art date
Application number
TW099122160A
Other languages
English (en)
Chinese (zh)
Other versions
TW201141768A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to TW099122160A priority Critical patent/TW201141768A/zh
Priority to US13/110,474 priority patent/US8597859B2/en
Publication of TW201141768A publication Critical patent/TW201141768A/zh
Application granted granted Critical
Publication of TWI403443B publication Critical patent/TWI403443B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW099122160A 2010-05-19 2010-07-06 Method of reducing photomask pollution and photomask storage device thereof TW201141768A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW099122160A TW201141768A (en) 2010-05-19 2010-07-06 Method of reducing photomask pollution and photomask storage device thereof
US13/110,474 US8597859B2 (en) 2010-05-19 2011-05-18 Method and storage system for reducing contamination of a photomask

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
TW99115945 2010-05-19
TW099122160A TW201141768A (en) 2010-05-19 2010-07-06 Method of reducing photomask pollution and photomask storage device thereof

Publications (2)

Publication Number Publication Date
TW201141768A TW201141768A (en) 2011-12-01
TWI403443B true TWI403443B (https=) 2013-08-01

Family

ID=44971581

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099122160A TW201141768A (en) 2010-05-19 2010-07-06 Method of reducing photomask pollution and photomask storage device thereof

Country Status (2)

Country Link
US (1) US8597859B2 (https=)
TW (1) TW201141768A (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104443848B (zh) * 2014-10-20 2017-02-15 深圳市华星光电技术有限公司 一种液晶玻璃包装箱及防潮包装结构
KR101637498B1 (ko) * 2015-03-24 2016-07-07 피코앤테라(주) 웨이퍼 수납용기
CN111948907B (zh) * 2019-05-16 2022-01-28 上海微电子装备（集团）股份有限公司 掩模板温度控制装置和掩模曝光装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5346518A (en) * 1993-03-23 1994-09-13 International Business Machines Corporation Vapor drain system

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7763395B2 (en) * 2003-06-30 2010-07-27 Intel Corporation Radiation stability of polymer pellicles

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5346518A (en) * 1993-03-23 1994-09-13 International Business Machines Corporation Vapor drain system

Also Published As

Publication number Publication date
US20110284423A1 (en) 2011-11-24
TW201141768A (en) 2011-12-01
US8597859B2 (en) 2013-12-03

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees