TWI388533B - Manufacturing method of ceramic molded body - Google Patents

Manufacturing method of ceramic molded body Download PDF

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TWI388533B
TWI388533B TW97138604A TW97138604A TWI388533B TW I388533 B TWI388533 B TW I388533B TW 97138604 A TW97138604 A TW 97138604A TW 97138604 A TW97138604 A TW 97138604A TW I388533 B TWI388533 B TW I388533B
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layer
ceramic
producing
base material
powder
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TW97138604A
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TW200927701A (en
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Osamu Chikagawa
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Murata Manufacturing Co
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28BSHAPING CLAY OR OTHER CERAMIC COMPOSITIONS; SHAPING SLAG; SHAPING MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
    • B28B11/00Apparatus or processes for treating or working the shaped or preshaped articles
    • B28B11/24Apparatus or processes for treating or working the shaped or preshaped articles for curing, setting or hardening
    • B28B11/243Setting, e.g. drying, dehydrating or firing ceramic articles
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards
    • H05K3/4626Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
    • H05K3/4629Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials laminating inorganic sheets comprising printed circuits, e.g. green ceramic sheets
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0306Inorganic insulating substrates, e.g. ceramic, glass
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1126Firing, i.e. heating a powder or paste above the melting temperature of at least one of its constituents
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/30Details of processes not otherwise provided for in H05K2203/01 - H05K2203/17
    • H05K2203/308Sacrificial means, e.g. for temporarily filling a space for making a via or a cavity or for making rigid-flexible PCBs
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1283After-treatment of the printed patterns, e.g. sintering or curing methods
    • H05K3/1291Firing or sintering at relative high temperatures for patterns on inorganic boards, e.g. co-firing of circuits on green ceramic sheets

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  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Compositions Of Oxide Ceramics (AREA)

Description

陶瓷成形體之製造方法Method for manufacturing ceramic formed body

本發明係關於一種以陶瓷基板為主的陶瓷成形體之製造方法,詳細而言,係關於一種在被燒成體上配設有拘束層,且經過一面抑制被燒成體於平面方向之收縮一面進行煅燒之所謂拘束煅燒之步驟而製造的陶瓷基板等之陶瓷成形體之製造方法。The present invention relates to a method for producing a ceramic formed body mainly composed of a ceramic substrate, and more particularly to a method of disposing a restraint layer on a fired body and suppressing shrinkage of the fired body in a planar direction while passing through one side. A method of producing a ceramic molded body such as a ceramic substrate produced by performing a step of calcination in a so-called restraint calcination process.

於陶瓷電子零件中,對於要求較高的平面尺寸精度之陶瓷基板等,煅燒步驟中的平面方向之煅燒收縮及該收縮之不均一等會對產品之品質造成較大影響。In the ceramic electronic component, for a ceramic substrate or the like which requires high planar dimensional accuracy, the calcination shrinkage in the planar direction in the calcination step and the unevenness of the shrinkage may have a large influence on the quality of the product.

因此,作為一面抑制上述煅燒步驟中之收縮一面煅燒陶瓷成形體之方法,提出有如下的煅燒方法:例如,如圖4所示,在陶瓷成形體51之兩主面上,在形成有以陶瓷成形體51之煅燒溫度下實質上不燒結的氧化鋁等之難燒結性材料為主要成分的層(拘束層)52a、52b之狀態下進行煅燒(拘束煅燒),藉此,實質上能夠以不產生平面方向之煅燒收縮之方式進行煅燒(參照專利文獻1)。Therefore, as a method of calcining the ceramic formed body while suppressing the shrinkage in the calcination step, a calcination method is proposed. For example, as shown in Fig. 4, ceramics are formed on both main faces of the ceramic formed body 51. In the state in which the hardly sinterable material such as alumina which is substantially non-sintered at the calcination temperature of the molded article 51 is calcined (constrained and calcined) in the state of the layers (constrained layers) 52a and 52b which are main components, it is possible to substantially Calcination is carried out in such a manner as to cause calcination shrinkage in the planar direction (see Patent Document 1).

而且,於上述先前之煅燒方法中,為提高拘束層所發揮之拘束力,必須使難燒結性材料之粒徑較小。然而,在使粒徑較小後,由於基材層與拘束層被牢固地黏接,故煅燒後難以去除拘束層,從而具有對基材層表面及電極造成損害之問題。例如,在製造已謀求陶瓷層或電極層之薄層化、多層化之多層陶瓷基板時,於拘束層之去除步驟中,具有於基板上產生破裂或者電極剝離之問題。Further, in the above-described conventional calcination method, in order to enhance the binding force exerted by the restraint layer, it is necessary to make the particle size of the hardly sinterable material small. However, since the base material layer and the restraint layer are firmly adhered after the particle diameter is made small, it is difficult to remove the restraint layer after firing, and there is a problem that the surface of the base material layer and the electrode are damaged. For example, when a multilayer ceramic substrate in which a ceramic layer or an electrode layer is thinned or multilayered is produced, there is a problem that cracks or electrode peeling occur on the substrate in the step of removing the restraint layer.

[專利文獻1]日本專利特開平4-243978號公報[Patent Document 1] Japanese Patent Laid-Open No. 4-243978

本發明係解決上述問題者,其目的在於提供一種陶瓷成形體之製造方法,於煅燒步驟結束後,可容易去除拘束層,因此不會在去除拘束層之步驟中對被燒成體造成損害,可確實且高效地製造尺寸精度高的陶瓷成形體。The present invention has been made in view of the above problems, and an object of the invention is to provide a method for producing a ceramic formed body which can be easily removed after the completion of the calcination step, and thus does not cause damage to the fired body in the step of removing the restraining layer. A ceramic molded body having high dimensional accuracy can be manufactured reliably and efficiently.

為解決上述問題,本申請案請求項1之陶瓷成形體之製造方法的特徵在於包括:積層體製作步驟,其係製作未燒成積層體者,該未燒成積層體具備基材層及拘束層,上述基材層含有陶瓷粉末與玻璃材料,上述拘束層含有:在低氧環境下進行煅燒後不會燒失、但在使氧分壓相較上述低氧環境變高而進行煅燒後會燒失的燒失材料,以及在上述基材層之燒結溫度下不燒結的陶瓷粉末;且該拘束層係配置成與上述基材層之至少一方之主面相接觸;煅燒步驟,將上述未燒成積層體進行煅燒以使上述基材層燒結;以及去除上述拘束層之步驟;上述煅燒步驟包括:第1煅燒步驟,在上述低氧環境下,在具備上述拘束層之狀態下進行煅燒以使上述基材層燒結;及第2煅燒步驟,在使氧分壓比上述第1煅燒步驟高的條件下進行煅燒,以使構成上述拘束層之上述燒失材料燒失。In order to solve the above problem, the method for producing a ceramic formed body according to claim 1 of the present invention, comprising the step of producing a laminated body, wherein the unfired laminated body is provided with a substrate layer and restrained In the layer, the base material layer contains a ceramic powder and a glass material, and the restraining layer contains: after being calcined in a low-oxygen environment, it does not burn out, but after the oxygen partial pressure is higher than the low-oxygen environment, the calcination is performed. a burn-off material that is not burned, and a ceramic powder that is not sintered at a sintering temperature of the base material layer; and the restraining layer is disposed in contact with a main surface of at least one of the base material layers; and the calcining step is performed on the unburned portion a step of calcining the substrate layer to sinter the substrate layer; and removing the restraint layer; the calcining step includes: a first calcination step of calcining in a state of having the restraint layer in the low oxygen atmosphere The base material layer is sintered; and the second calcination step is performed by calcining the oxygen partial pressure higher than the first calcination step to burn out the burn-in material constituting the restraint layer .

又,請求項2之陶瓷成形體之製造方法中,上述陶瓷成形體為陶瓷基板。Further, in the method of producing a ceramic formed body according to claim 2, the ceramic formed body is a ceramic substrate.

又,請求項3之陶瓷成形體之製造方法中,於上述第1煅燒步驟中,以讓上述基材層中所含有之上述玻璃材料浸透到上述拘束層之方式進行煅燒。Further, in the method of producing a ceramic formed body according to claim 3, in the first baking step, the glass material contained in the base material layer is impregnated to the restraint layer.

又,請求項4之陶瓷成形體之製造方法中,上述燒失材料之粒徑比上述拘束層中含有的陶瓷粉末之粒徑大。Further, in the method of producing a ceramic molded body according to claim 4, the particle size of the loss-generating material is larger than the particle diameter of the ceramic powder contained in the restraint layer.

又,請求項5之陶瓷成形體之製造方法中,上述燒失材料為碳粉末。Further, in the method of producing a ceramic formed body according to claim 5, the loss-generating material is carbon powder.

又,請求項6之陶瓷成形體之製造方法中,上述拘束層中所含有之陶瓷粉末係與上述基材層中所含有之陶瓷粉末為相同材質。Further, in the method of producing a ceramic formed body according to claim 6, the ceramic powder contained in the restraint layer is made of the same material as the ceramic powder contained in the base material layer.

又,請求項7之陶瓷成形體之製造方法包括脫黏合劑步驟,其係於上述煅燒步驟中的上述第1煅燒步驟之前,將上述基材層中含有之上述黏合劑去除;上述脫黏合劑步驟係在含氧環境中、且上述燒失材料不會燒失之溫度下實施。Further, the method for producing a ceramic formed body according to claim 7 includes a debonding step of removing the binder contained in the base material layer before the first baking step in the calcining step; the debonding agent The step is carried out in an oxygen-containing environment at a temperature at which the loss-generating material does not burn out.

又,請求項8之陶瓷成形體之製造方法中,於上述積層體製作步驟中,上述拘束層係藉由以成使含有上述燒失材料及上述陶瓷粉末之片材與上述基材層之至少一方之主面相接觸之方式配置而形成。Further, in the method of producing a ceramic formed body according to claim 8, in the step of producing the laminated body, the restraining layer is formed by causing at least the sheet containing the burn-in material and the ceramic powder and the base material layer The main faces of one side are arranged in contact with each other.

又,請求項9之陶瓷成形體之製造方法中,於上述積層體製作步驟中,上述拘束層係藉由將含有上述燒失材料及上述陶瓷粉末之膏塗布於上述基材層之至少一方之主面上而形成。Further, in the method of producing a ceramic formed body according to claim 9, in the step of producing the laminated body, the restraining layer is formed by applying a paste containing the burn-in material and the ceramic powder to at least one of the base material layers. Formed on the main surface.

又,請求項10之陶瓷成形體之製造方法中,上述基材層具有複數層構造,該複數層構造具備複數個含有上述陶瓷粉末與上述玻璃材料之層。Further, in the method of producing a ceramic molded body according to claim 10, the base material layer has a plurality of layers, and the plurality of layers includes a plurality of layers containing the ceramic powder and the glass material.

又,請求項11之陶瓷成形體之製造方法中,上述基材層於至少一方之主面上具備配線圖案。Moreover, in the method of manufacturing a ceramic molded body according to claim 11, the base material layer has a wiring pattern on at least one of the main surfaces.

又,請求項12之陶瓷成形體之製造方法進一步包括於經上述煅燒步驟煅燒後之基材層之外表面上安裝電子零件之步驟。Further, the method of producing a ceramic formed body of claim 12 further comprising the step of mounting an electronic component on the outer surface of the substrate layer after the calcination step.

本申請案請求項1之陶瓷成形體之製造方法中,作為拘束層,使用的是含有以下成分之拘束層,即,在低氧環境下進行煅燒後不會燒失、但在氧分壓相較該低氧環境變高而進行煅燒後會燒失的燒失材料;以及在基材層之燒結溫度下不燒結之陶瓷粉末,故於第1煅燒步驟中,在燒失材料不會燒失之低氧環境下進行拘束煅燒,且在使基材層不會於平面方向收縮而進行燒結後,於第2煅燒步驟中,在氧分壓比第1煅燒步驟高的條件下進行煅燒,使構成拘束層之燒失材料燒失,藉此可在拘束層中之燒失材料已燒失的部分產生微孔,從而成為容易去除拘束層之狀態。其結果為,可使用對被燒成體造成破裂或缺損等損害之虞較少的穩定的方法,來有效地去除拘束層。In the method for producing a ceramic formed article according to claim 1 of the present application, as the restraining layer, a restraining layer containing a component which does not burn out after calcination in a low-oxygen environment, but is in a partial pressure of oxygen is used. a burn-in material that burns out after calcination is higher than the low-oxygen environment; and a ceramic powder that is not sintered at a sintering temperature of the base material layer, so that the burn-in material does not burn out in the first calcination step. In a low-oxygen environment, the calcination is carried out, and after the base material layer is not shrunk in the planar direction and sintered, in the second calcination step, the oxygen partial pressure is higher than the first calcination step, and calcination is performed. When the loss-generating material constituting the restraint layer is burned out, micropores can be generated in the portion where the loss-loss material in the restraint layer has been burnt, and the restraint layer can be easily removed. As a result, it is possible to effectively remove the restraint layer by using a stable method which causes less damage such as cracks or defects in the fired body.

因此,根據本發明,無需複雜的製造步驟即能夠以較佳的良率製造尺寸精度高的陶瓷成形體。Therefore, according to the present invention, it is possible to manufacture a ceramic molded body having high dimensional accuracy with a high yield without a complicated manufacturing step.

再者,於本發明之陶瓷成形體之製造方法中,於第1煅燒步驟(拘束煅燒步驟)中,拘束層對基材層發揮抑制其於平面方向(與主面平行的方向)之收縮之拘束力。而且,於該拘束力之作用下,基材層於平面方向上的燒結收縮受以抑制,被燒成體實質上僅於厚度方向上燒結收縮,從而可確實製造平面方向之尺寸精度高的陶瓷成形體。Further, in the method for producing a ceramic molded body of the present invention, in the first baking step (constrained firing step), the restraining layer exhibits shrinkage of the base layer in the planar direction (direction parallel to the main surface). Binding power. Further, under the action of the restraining force, the sintering shrinkage of the base material layer in the planar direction is suppressed, and the fired body is substantially sintered and shrunk only in the thickness direction, so that the ceramic having high dimensional accuracy in the planar direction can be surely produced. Shaped body.

又,於本發明中,所謂低氧環境,係指與大氣等相比氧分壓相當低的環境,具體而言,例示於常壓下氧分壓為10-2 atm程度以下(即,環境中之氧濃度為1vol%程度以下)之環境。In the present invention, the low-oxygen environment refers to an environment in which the partial pressure of oxygen is relatively low compared with the atmosphere, and specifically, the partial pressure of oxygen at a normal pressure is not more than 10 -2 atm (that is, the environment). The environment in which the oxygen concentration is less than or equal to 1 vol%.

作為該低氧環境之更佳的條件,例示有例如於常壓下氧分壓為10-3 ~10-6 atm(氧濃度為0.1~0.0001vol%)之條件。As a more preferable condition of the low-oxygen environment, for example, a condition that the partial pressure of oxygen at a normal pressure is 10 -3 to 10 -6 atm (oxygen concentration is 0.1 to 0.0001 vol%) is exemplified.

又,第2煅燒步驟中之所謂氧分壓比第1煅燒步驟高的條件,係指可使上述燒失材料燃燒且燒失的氧分壓之環境,具體而言,例示於常壓下氧分壓為10-1 atm以上(即,環境中之氧濃度為10vol%以上)之環境。Further, the condition that the oxygen partial pressure in the second calcination step is higher than the first calcination step refers to an environment in which the partial pressure of oxygen can be burned and burned out, and specifically, oxygen is exemplified at normal pressure. The partial pressure is an environment of 10 -1 atm or more (that is, an oxygen concentration in the environment of 10 vol% or more).

又,如請求項2,本發明在陶瓷成形體中,尤其在應用於期望平面方向之尺寸精度及形狀精度較高的陶瓷基板之製造方法時,為較佳的發明,使用本發明可有效地製造尺寸精度高的陶瓷基板。Further, according to the second aspect of the invention, in the ceramic molded body, particularly when applied to a method for producing a ceramic substrate having a desired dimensional accuracy and shape accuracy in a planar direction, the present invention is effective in the use of the present invention. A ceramic substrate with high dimensional accuracy is produced.

又,對於請求項3之陶瓷成形體之製造方法,於第1煅燒步驟中,基材層中含有之玻璃材料會浸透到拘束層而形成浸透層。然後,經由該浸透層將拘束層與基材層牢固地接合,且於該浸透層之作用下確實抑制、防止第1煅燒步驟中的基材層於平面方向之收縮。Further, in the method of producing a ceramic molded body of claim 3, in the first baking step, the glass material contained in the base material layer penetrates into the restraint layer to form a permeation layer. Then, the restraining layer and the base material layer are firmly joined via the permeation layer, and the shrinkage of the base material layer in the first baking step in the planar direction is surely suppressed and prevented by the permeation layer.

再者,為更確實地獲得拘束力,較理想的是,基材層之玻璃材料確實浸透到拘束層中。並且,因此較理想的是,拘束層以密著於基材層之方式而配設。Further, in order to obtain binding force more reliably, it is preferable that the glass material of the substrate layer is surely impregnated into the restraint layer. Further, it is preferable that the restraining layer is disposed so as to be in close contact with the base material layer.

又,如請求項4之陶瓷成形體之製造方法,使燒失材料之粒徑比拘束層中所含有的陶瓷粉末之粒徑大,藉此,在將拘束層與僅由陶瓷粉末及黏合劑所構成的先前之情況相比,可減少拘束層中含有的有機黏合劑之量,從而容易進行脫黏合劑。Further, in the method for producing a ceramic formed body according to claim 4, the particle size of the loss-generating material is larger than the particle diameter of the ceramic powder contained in the restraining layer, whereby the restraining layer and only the ceramic powder and the binder are used. Compared with the previous case, the amount of the organic binder contained in the restraining layer can be reduced, and the debonding agent can be easily carried out.

又,於請求項5之陶瓷成形體之製造方法中,用作燒失材料之碳粉末在第1煅燒步驟中,於低氧分壓環境下進行煅燒後並不燃燒,且亦不收縮,故充分發揮對基材層之煅燒收縮之抑制功能,又,在第2煅燒步驟中,於氧分壓較高的條件下進行煅燒後,燃燒且燒失,故可在以殘留之陶瓷作為主成分的拘束層中形成微孔,從而使拘束層易崩潰而成為容易去除之狀態。又,藉由適切地選擇碳粉末之粒徑,在使拘束層用陶瓷粉末之粒徑較小時,亦可抑制拘束層之構成材料全體的平均比表面積之增大,從而可減少所使用的有機黏合劑之量。Further, in the method for producing a ceramic formed body according to claim 5, the carbon powder used as the loss-generating material is not burned after being calcined in a low-oxygen partial pressure environment in the first calcination step, and does not shrink. Therefore, the function of suppressing the calcination shrinkage of the base material layer is fully exerted, and in the second calcination step, the calcination is carried out under the condition of high oxygen partial pressure, and then burned and burned out, so that the residual ceramic can be used as the main Micropores are formed in the restraint layer of the component, so that the restraint layer is easily collapsed and becomes easily removed. Further, by appropriately selecting the particle diameter of the carbon powder, when the particle diameter of the ceramic powder for the restraint layer is made small, the increase in the average specific surface area of the entire constituent material of the restraint layer can be suppressed, and the use can be reduced. The amount of organic binder.

再者,作為碳粉末,較理想的是使用粒徑為1~5μm之範圍者。此原因在於,當粒徑超過5μm時,拘束力不充分,即,當粒徑在5μm以下時,可獲得較大之拘束力,又,藉由使粒徑為1μm以上,可防止於第1煅燒步驟中燒失,另一方面,可確保第2煅燒步驟中之燒失容易度。Further, as the carbon powder, it is preferred to use a particle size of 1 to 5 μm. The reason for this is that when the particle diameter exceeds 5 μm, the binding force is insufficient, that is, when the particle diameter is 5 μm or less, a large binding force can be obtained, and by making the particle diameter 1 μm or more, the first constraint can be prevented. The loss of burning in the calcination step, on the other hand, ensures the ease of burning loss in the second calcination step.

又,如請求項6,作為拘束層中含有之陶瓷粉末,使用與基材層中含有之陶瓷粉末為相同材質者,藉此玻璃從基材層向拘束層容易浸透,從而可使拘束力提高。In addition, in the case of the ceramic powder contained in the restraint layer, the ceramic powder contained in the base layer is made of the same material as the ceramic powder contained in the base material layer, whereby the glass is easily penetrated from the base material layer to the restraint layer, and the restraining force can be improved. .

又,於請求項7之陶瓷成形體之製造方法中,於第1煅燒步驟之前的脫黏合劑步驟係在含氧環境中,且上述燒失材料不會燒失之溫度下實施,因此可順利地實施將基材層中所含有之黏合劑確實去除、其後進行拘束煅燒之第1煅燒步驟,以及使構成拘束層之燒失材料燒失之第2煅燒步驟。Further, in the method for producing a ceramic formed body according to claim 7, the debonding step before the first calcination step is carried out in an oxygen-containing atmosphere and the calorie loss material is not burned out, so that the smoothing can be carried out smoothly The first baking step of removing the binder contained in the base material layer and then performing the restraint firing, and the second baking step of burning out the loss-generating material constituting the restraint layer are carried out.

再者,所謂進行脫黏合劑步驟時之含氧環境,例示有大氣環境、於惰性氣體中導入有大氣之環境等。通常,在大氣環境之類的氧分壓高的條件下實施時,可有效地進行脫黏合劑。In addition, the oxygen-containing environment at the time of the debonding step is exemplified by an atmosphere, an atmosphere in which an inert gas is introduced into the atmosphere, and the like. In general, when it is carried out under conditions of a high partial pressure of oxygen such as an atmospheric environment, the debonding agent can be efficiently carried out.

又,於本發明中,作為形成拘束層之方法,列舉如下方法:如請求項8,預先製作含有燒失材料及陶瓷粉末之片材,並以與基材層之至少一方之主面相接觸之方式而配置;如請求項9,將含有燒失材料及陶瓷粉末之膏塗布於基材層之至少一方之主面上等。藉由使用該等方法,可於基材層之至少一方之主面上有效地配設拘束層。Further, in the present invention, as a method of forming the restraint layer, a method of preparing a sheet containing a loss-generating material and a ceramic powder in advance and contacting the main surface of at least one of the base material layers is exemplified. In the case of claim 9, a paste containing a loss-generating material and a ceramic powder is applied to at least one of the main surfaces of the base material layer. By using these methods, the restraining layer can be effectively disposed on at least one of the main surfaces of the base material layer.

再者,為確實獲得拘束力,如上所述較理想的是,以使基材層之玻璃材料確實浸透到拘束層而形成浸透層之方式,將拘束層密著於基材層。並且,因此較理想的是,例如,在將複數片的拘束層用片材積層而形成拘束層時,使複數片的拘束層用片材於基材層上一面壓接一面積層而形成拘束層,或者在塗布拘束層用膏而形成拘束層時,施加固定之壓力以使拘束層用膏一面密著於基材層上一面進行塗布。Further, in order to obtain binding force as desired, it is preferable to adhere the restraint layer to the base material layer so that the glass material of the base material layer is surely impregnated into the restraint layer to form the impregnation layer. In addition, for example, when a plurality of sheets of the restraint layer are laminated to form a restraint layer, the sheet for the restraint layer of the plurality of sheets is pressed against the base layer to form a restraining layer. Or, when a binding layer is formed by applying a paste for a restraint layer, a fixing pressure is applied so that the adhesive layer paste is adhered to the base material layer while being applied.

又,如請求項10之陶瓷成形體之製造方法,將基材層設為複數層構造,藉此可有效地製造以平面形狀精度優異之陶瓷基板為主的各種陶瓷成形體。Further, in the method for producing a ceramic formed body of the claim 10, the base material layer has a plurality of layers, whereby various ceramic molded bodies mainly composed of ceramic substrates having excellent planar shape accuracy can be efficiently produced.

又,於請求項11之陶瓷成形體之製造方法中,於基材層之至少一方之主面上形成有配線圖案,故藉由使用以該方法所製造之陶瓷成形體,如請求項12,可將電子零件安裝於經煅燒步驟煅燒後之基材層上,從而可有效地製造以具有於外表面上搭載有電子零件之構造之陶瓷基板為主的陶瓷成形體。Further, in the method for producing a ceramic formed body according to claim 11, the wiring pattern is formed on at least one of the main surfaces of the base material layer, and therefore, the ceramic molded body produced by the method is used, as in claim 12, The electronic component can be mounted on the base material layer which has been calcined by the calcination step, whereby the ceramic molded body mainly composed of the ceramic substrate having the structure in which the electronic component is mounted on the outer surface can be efficiently produced.

以下,顯示本發明之實施例,對本發明之特徵部分進行更詳細的說明。Hereinafter, the embodiments of the present invention will be described, and the features of the present invention will be described in more detail.

(1)含有陶瓷粉末及玻璃材料之基材層之製作(1) Fabrication of a substrate layer containing ceramic powder and glass material

為形成作為構成陶瓷基板之主要部分的基材層,首先,向由陶瓷粉末及玻璃材料混合後之混合粉末中,分別適量添加黏合劑、分散劑、可塑劑及有機溶劑等,並將該等混合,由此製作陶瓷漿料。In order to form a base material layer which is a main part of the ceramic substrate, first, a binder, a dispersant, a plasticizer, an organic solvent, and the like are added to the mixed powder obtained by mixing the ceramic powder and the glass material, and these are added. Mixing, thereby preparing a ceramic slurry.

作為陶瓷粉末,可使用各種者,但作為較好的材料之一例,列舉氧化鋁(Al2 O3 )粉末。As the ceramic powder, various materials can be used. However, as an example of a preferable material, alumina (Al 2 O 3 ) powder is exemplified.

玻璃材料最初可含有玻璃粉末,亦可係於煅燒步驟中析出玻璃質者。又,上述玻璃材料亦可係於煅燒步驟之至少最終階段使結晶質析出並藉此結晶化者。作為玻璃材料,例如,可用利地使用使得矽酸鎂石、鎂黃長石或透輝石之類的介電損失小的結晶質析出而獲得之硼矽酸玻璃系之玻璃粉末。The glass material may initially contain glass powder or may be attached to the glassy material during the calcination step. Further, the glass material may be formed by crystallizing and crystallizing at least in the final stage of the calcination step. As the glass material, for example, a boric acid glass-based glass powder obtained by precipitating a crystal having a small dielectric loss such as bismuth silicate, magnesite or diopside can be used.

其次,將該陶瓷漿料以刮刀成形法等之方法而成形為薄片狀,製作基材層用之胚片(基板用陶瓷胚片)1a(圖3)。再者,更具體而言,將作為玻璃粉末的以CaO:10~55wt%、SiO2 :45~70wt%、Al2 03 :0~30wt%、雜質:0~10wt%、B2 03 :5~20wt%之比例所含有之組成之玻璃粉末(平均粒徑為1.5μm)50~64wt%,與作為陶瓷粉末的Al2 03 粉末(平均粒徑為1.0μm)35~50wt%進行混合,並使該混合物分散到由有機溶劑、可塑劑等所組成之有機媒劑中,以調製漿料。然後將該漿料以刮刀成形法或澆鑄法而成形為片材狀,由此製作基板用陶瓷胚片。再者,作為陶瓷粉末之Al2 O3 粉末,亦可係含有0~10wt%之雜質者。Then, the ceramic slurry is formed into a sheet shape by a doctor blade method or the like to form a green sheet (a ceramic green sheet for a substrate) 1a (FIG. 3) for a base material layer. Further, more specifically, CaO: 10 to 55 wt%, SiO 2 : 45 to 70 wt%, Al 2 0 3 : 0 to 30 wt%, impurities: 0 to 10 wt%, B 2 0 3 as the glass powder. a glass powder having a composition of 5 to 20% by weight (average particle diameter of 1.5 μm) of 50 to 64% by weight, and 35 to 50% by weight of Al 2 O 3 powder (average particle diameter of 1.0 μm) as a ceramic powder. The mixture is mixed and dispersed in an organic vehicle composed of an organic solvent, a plasticizer or the like to prepare a slurry. Then, the slurry is formed into a sheet shape by a doctor blade molding method or a casting method to prepare a ceramic green sheet for a substrate. Further, the Al 2 O 3 powder as the ceramic powder may be one containing 0 to 10% by weight of impurities.

又,基板(基材層)通常係藉由將複數塊陶瓷胚片積層而形成,但亦可由一塊陶瓷胚片構成。又,基板用陶瓷胚片較好的是以上述片材成形法所形成之陶瓷胚片,但亦可為以厚膜印刷法所形成之未燒結之厚膜印刷層。又,陶瓷粉末中除上述絕緣體材料之外,還可使用鐵氧體等之磁性體材料、鈦酸鋇等之電介質材料。Further, the substrate (base material layer) is usually formed by laminating a plurality of ceramic green sheets, but may be composed of one ceramic green sheet. Further, the ceramic green sheet for a substrate is preferably a ceramic green sheet formed by the above-described sheet forming method, but may be an unsintered thick film printed layer formed by a thick film printing method. Further, in addition to the above insulator material, a ceramic material such as ferrite or a dielectric material such as barium titanate may be used as the ceramic powder.

又,作為基板用陶瓷胚片,較好的是使用以1050℃以下之溫度進行燒結之低溫燒結陶瓷胚片。並且,因此較理想的是,上述玻璃粉末使用具有750℃以下之軟化點者為。Further, as the ceramic green sheet for a substrate, it is preferred to use a low-temperature sintered ceramic green sheet which is sintered at a temperature of 1050 ° C or lower. Further, it is preferable that the above glass powder has a softening point of 750 ° C or lower.

(2)拘束層(2) Constraint

於本發明之陶瓷成形體之製造方法中,拘束層必須具備如下2個性質:In the method for producing a ceramic formed body of the present invention, the restraining layer must have the following two properties:

(a)在直至構成基材層之低溫燒結陶瓷材料燒結為止之期間,即,於低氧環境下進行煅燒之第1煅燒步驟中,發揮對抑制基材層之收縮的拘束層本來之功能;(a) in the first firing step until the low-temperature sintered ceramic material constituting the base material layer is sintered, that is, in the first firing step in which the base layer is fired, the original function of the restraining layer for suppressing shrinkage of the base material layer is exhibited;

(b)於其後之氧分壓比第1煅燒步驟高的條件下進行煅燒之第2煅燒步驟中燒失。(b) The second calcination step in which the oxygen partial pressure is higher than the first calcination step is burned out in the second calcination step.

作為具備上述性質之拘束層,本發明中使用的是含有於低氧環境下進行煅燒後不會燒失、但在使氧分壓相較該低氧環境變高而進行煅燒後會燒失的燒失材料、以及在基材層之燒結溫度下不燒結之陶瓷粉末作為主要成分者。As a restraint layer having the above properties, the present invention is used in a low-oxygen environment, and does not burn out after calcination in a low-oxygen environment, but is burned out after calcination by making the oxygen partial pressure higher than the low-oxygen environment. The loss-in material and the ceramic powder which is not sintered at the sintering temperature of the substrate layer are main components.

作為該拘束層之一較佳例,例示如下:含有碳粉末來作為上述燒失材料、且含有氧化鋁粉末來作為於基材層之燒結溫度下不燒結之陶瓷粉末者。具體而言,使於上述基板用陶瓷胚片之煅燒溫度下實質上不燒結之氧化鋁粉末等之陶瓷粉末及碳粉末之混合粉末,分散到由有機黏合劑、有機溶劑、可塑劑等所組成之有機媒劑中來調製漿料,並將所獲得之漿料成形為片材狀,以製作拘束層用陶瓷胚片,再根據需要將此積層而形成拘束層。As a preferable example of the restraint layer, a carbon powder is contained as the burn-in material, and an alumina powder is contained as a ceramic powder which is not sintered at a sintering temperature of the base material layer. Specifically, the mixed powder of the ceramic powder or the carbon powder such as alumina powder which is substantially not sintered at the firing temperature of the ceramic green sheet for the substrate is dispersed in an organic binder, an organic solvent, a plasticizer or the like. A slurry is prepared from the organic medium of the composition, and the obtained slurry is formed into a sheet shape to prepare a ceramic green sheet for a restraint layer, and if necessary, laminated to form a restraint layer.

氧化鋁粉末係容易獲得性狀及特性穩定之粉末,於基材層之燒結溫度下不燒結,具備作為發揮拘束力之陶瓷粉末之理想的條件。再者,使用有氧化鋁粉末及碳粉末之拘束層用陶瓷胚片之燒結溫度為1400~1600℃,於基板用陶瓷胚片之燒結溫度下實質上不燒結。另外,該拘束層亦可由上述的一塊拘束層用陶瓷胚片而構成,還可藉由將複數塊拘束層用陶瓷胚片積層而構成。The alumina powder is a powder which is easy to obtain a property and a stable property, and is not sintered at the sintering temperature of the base material layer, and is an ideal condition for the ceramic powder to exert a binding force. Further, the sintering temperature of the ceramic green sheets for the restraining layer using the alumina powder and the carbon powder is 1400 to 1600 ° C, and is substantially not sintered at the sintering temperature of the ceramic green sheets for the substrate. Further, the restraining layer may be formed of a ceramic green sheet of the above-mentioned restraint layer, or may be formed by laminating a plurality of restraint layers with ceramic green sheets.

作為陶瓷粉末,較好的是使用平均粒徑為0.1~5.0μm者。若陶瓷粉末之平均粒徑未滿0.1μm,則會與作為基材層之陶瓷層之表層近傍所含有的玻璃在煅燒中進行激烈反應,並在煅燒後陶瓷層與拘束層密著,從而煅燒後無法去除拘束層,或者因為小粒徑而導致片材中之黏合劑等之有機成分於煅燒步驟中難以分解飛散,從而有時會於基材層中產生分層(delamination)。另一方面,若陶瓷粉末之平均粒徑超過5.0μm,則煅燒收縮之抑制力下降,從而基材層容易多餘地進行於平面方向(xy方向)之收縮或者彎曲。As the ceramic powder, it is preferred to use an average particle diameter of 0.1 to 5.0 μm. When the average particle diameter of the ceramic powder is less than 0.1 μm, the glass contained in the surface layer of the ceramic layer as the base material layer is violently reacted in the calcination, and after the calcination, the ceramic layer and the restraint layer are adhered to each other to be calcined. After the restraint layer is not removed, or the organic component such as the binder in the sheet is hardly decomposed and scattered in the calcination step due to the small particle size, delamination may sometimes occur in the substrate layer. On the other hand, when the average particle diameter of the ceramic powder exceeds 5.0 μm, the suppression force of the firing shrinkage decreases, and the base material layer tends to excessively shrink or bend in the plane direction (xy direction).

再者,構成拘束層之陶瓷粉末可為在基材層之煅燒步驟中實質上不燒結之陶瓷粉末,且除氧化鋁以外,亦可使用氧化鋯或氧化鎂等各種陶瓷粉末。其中,因為基材層之表層區域上存在有較多的玻璃,故基材層與拘束層具有某種程度之親和性,在基材層之表層與拘束層相接觸之邊境上,較理想的是基材層表層之玻璃適度地濡濕拘束層。並且,因此較好的是,使用與構成基材層之陶瓷粉末同類之陶瓷粉末來作為構成拘束層之陶瓷粉末。Further, the ceramic powder constituting the restraint layer may be a ceramic powder which is substantially not sintered in the calcination step of the base material layer, and various ceramic powders such as zirconia or magnesia may be used in addition to the alumina. Among them, since there is a large amount of glass on the surface layer region of the substrate layer, the substrate layer and the restraint layer have a certain degree of affinity, and it is ideal on the boundary between the surface layer of the substrate layer and the restraint layer. The glass of the surface layer of the substrate layer is moderately wetted and restrained. Further, it is preferable to use a ceramic powder similar to the ceramic powder constituting the base material layer as the ceramic powder constituting the restraint layer.

又,作為燒失材料之碳粉末即便於大氣中其燃燒速度亦緩慢,且不會在氧分壓之作用下於基材層之煅燒溫度域中消失,故可用作無收縮煅燒用之拘束層材料。因此,碳粉末在煅燒步驟中直至基材層收縮結束之時刻為止(即,直至第1煅燒步驟結束為止)的期間不會燒失,而是維持拘束功能,在收縮結束後可燃燒、消失。而且,藉由使碳粉末燃燒且消失,可在以殘留之陶瓷為主要成分之拘束層中產生微孔,從而使拘束層易崩潰而成為容易去除之狀態。又,藉由適當地選擇碳粉末之粒徑,從而即便使拘束層用之陶瓷粉末之粒徑較小時,亦可抑制平均比表面積之增大,由此可抑制作為拘束層之構成材料全體的平均比表面積之增大。Further, since the carbon powder as the loss-generating material is slow in combustion rate in the atmosphere and does not disappear in the calcination temperature range of the base material layer by the partial pressure of oxygen, it can be used as a non-shrinkage calcination. Constraint material. Therefore, in the calcination step, the carbon powder does not burn out during the period until the shrinkage of the base layer (that is, until the end of the first calcination step), but maintains the restraining function, and can be burned and disappeared after the shrinkage is completed. . Further, by burning and disappearing the carbon powder, micropores can be generated in the restraint layer containing the residual ceramic as a main component, and the restraint layer is liable to collapse and become easily removed. In addition, by appropriately selecting the particle diameter of the carbon powder, even when the particle diameter of the ceramic powder for the restraint layer is small, the increase in the average specific surface area can be suppressed, thereby suppressing the constituent material as the restraint layer. The increase in the average specific surface area of the whole.

並且,因此碳粉末使用相較拘束層中所使用之氧化鋁等之陶瓷粉末之粒徑更大者,且較好的是使用粒徑為2~20μm之範圍者。當碳粉末之粒徑比陶瓷粉末之粒徑小、且在未滿2μm時,與僅由陶瓷粉末及黏合劑而構成拘束層之先前之情況(未含有碳粉末之情況)相比,所使用的有機黏合劑之量變多,脫黏合劑步驟所需之時間變長,且碳粉末之比表面積變大,於基材層收縮結束之前燃燒、消失,由此導致拘束力下降而不佳。又,當碳粉末之粒徑超過20μm時,拘束層之表面平滑性變差,其凹凸被轉印到基材層(基板)之表面,故不佳。又,拘束層中之碳粉末之比例較好的是設為10~50vol%之範圍。此原因在於,若碳粉末之比例少於10vol%,則容易去除拘束層之效果較小,若碳粉末之比例多於50vol%,則煅燒步驟中之拘束力會下降。Further, the carbon powder is used in a larger particle size than the ceramic powder such as alumina used in the restraining layer, and it is preferred to use a particle diameter of 2 to 20 μm. When the particle diameter of the carbon powder is smaller than the particle diameter of the ceramic powder and is less than 2 μm, compared with the previous case where the restraint layer is composed only of the ceramic powder and the binder (in the case where the carbon powder is not contained), The amount of the organic binder used is increased, the time required for the debonding step is lengthened, and the specific surface area of the carbon powder is increased, and the base material layer is burned and disappeared before the end of the shrinkage of the substrate layer, thereby causing the restraining force to decrease without good. In addition, when the particle diameter of the carbon powder exceeds 20 μm, the surface smoothness of the restraint layer is deteriorated, and the unevenness is transferred to the surface of the base material layer (substrate), which is not preferable. Further, the proportion of the carbon powder in the restraining layer is preferably in the range of 10 to 50 vol%. The reason for this is that if the proportion of the carbon powder is less than 10 vol%, the effect of easily removing the restraining layer is small, and if the proportion of the carbon powder is more than 50 vol%, the binding force in the firing step is lowered.

即,拘束層之基本的拘束力係藉由粒徑較小的氧化鋁粉末等之陶瓷粉末而確保,另一方面,碳粉末在直至基材層收縮結束為止之期間係作為無機材料而存在於拘束層中,直至收縮結束時,拘束層被細緻地保持,因而不存在拘束力之下降。而且,藉由收縮結束後使碳燒失,從而於拘束層中產生有微孔,因此在陶瓷粉末使用粒徑較小者之情況下,煅燒後之拘束層亦成為多孔而容易去除。又,藉由使用粒徑比陶瓷粉末大的碳粉末,使得平均比表面積變小,故即便在使用粒徑較小之陶瓷粉末時,亦可減小所使用的有機黏合劑之量,從而使得脫黏合劑步驟快速結束。In other words, the basic binding force of the restraint layer is ensured by ceramic powder such as alumina powder having a small particle size, and the carbon powder is present as an inorganic material until the end of shrinkage of the base material layer. In the restraint layer, until the end of the contraction, the restraint layer is carefully maintained, so there is no decline in restraint. Further, since the carbon is burned out after the shrinkage is completed, micropores are formed in the restraining layer. Therefore, when the ceramic powder has a smaller particle diameter, the restrained layer after firing is also porous and easily removed. Further, by using a carbon powder having a larger particle diameter than the ceramic powder, the average specific surface area is made small, so that even when a ceramic powder having a small particle diameter is used, the amount of the organic binder to be used can be reduced. The debinding step is quickly terminated.

又,拘束層之厚度較好的是25~500μm。此原因在於,若厚度未滿25μm,則煅燒收縮之抑制力變小,基板會於平面方向(xy方向)發生必要以上之收縮或者彎曲,又,若厚度超過500μm,則基板用陶瓷胚片中之黏合劑等之有機成分難以在煅燒中分解、飛散,從而會出現於基板中產生分層等之問題。Moreover, the thickness of the restraining layer is preferably 25 to 500 μm. The reason for this is that if the thickness is less than 25 μm, the suppression force for firing shrinkage is small, and the substrate shrinks or bends more than necessary in the plane direction (xy direction), and if the thickness exceeds 500 μm, the ceramic green sheets for the substrate are used. The organic component such as the binder is difficult to be decomposed and scattered during calcination, which may cause problems such as delamination in the substrate.

(3)關於形成於基材層上之導體及使用於其之導電材料(3) a conductor formed on a substrate layer and a conductive material used therefor

於基材層上,在未燒成之階段形成有通孔導體、通孔導體、作為外部導體及內部導體之導體圖案等,但作為使用於其之導電材料,較好的是使用以低電阻難氧化性材料之金屬材料(例如,Ag)為主成分者。但是,作為導電材料,亦可使用其他材料,例如,亦可使用Ag-Pd、Au、Pt等。On the substrate layer, a via hole conductor, a via hole conductor, a conductor pattern as an outer conductor and an inner conductor, and the like are formed at the unfired stage, but as a conductive material used therefor, it is preferable to use a low resistance. A metal material (for example, Ag) of a hardly oxidizable material is mainly composed. However, as the conductive material, other materials may be used. For example, Ag-Pd, Au, Pt, or the like may also be used.

又,當與陶瓷之接合強度成為必要時,亦可向導電材料中添加Al2 O3 等之添加物1種以上。而且,向上述主成分(導電材料)中,以特定之比例添加有機媒劑,並攪拌、混練,由此製作導體性膏,使用該導體性膏可形成通孔導體、通孔導體、作為外部導體及內部導體之導體圖案等。其中,構成導電性膏之主成分、添加成分、有機媒劑等之種類及調配比例並無特別限制。In addition, when the bonding strength with the ceramic is necessary, one or more kinds of additives such as Al 2 O 3 may be added to the conductive material. Further, an organic medium is added to the main component (conductive material) in a specific ratio, stirred and kneaded to prepare a conductive paste, and a via-hole conductor, a via-hole conductor, and an external portion can be formed using the conductive paste. Conductor patterns of conductors and internal conductors, etc. The type and ratio of the main component, the additive component, and the organic vehicle constituting the conductive paste are not particularly limited.

又,有機媒劑係混合黏合劑樹脂與溶劑者,作為黏合劑樹脂,可使用例如乙基纖維素、丙烯酸樹脂、聚乙烯醇縮丁醛、甲基丙烯酸樹脂等。又,作為溶劑,可使用例如松油醇、二氫松油醇、二氫松油醇醋酸酯(dihydroterpineol acetate)、丁基卡必醇、丁基卡必醇醋酸酯、醇類等。進而,根據需要,亦可添加各種分散劑、可塑劑、活性劑等。Further, the organic vehicle is a mixture of a binder resin and a solvent, and as the binder resin, for example, ethyl cellulose, acrylic resin, polyvinyl butyral, methacrylic resin or the like can be used. Further, as the solvent, for example, terpineol, dihydroterpineol, dihydroterpineol acetate, butyl carbitol, butyl carbitol acetate, alcohol or the like can be used. Further, various dispersants, plasticizers, active agents, and the like may be added as needed.

又,考慮到印刷性,導體性膏之黏度較理想的是設為50~700Pa‧s。進而,於基材層表面之導體圖案上,亦包含用以將上下層間之導體圖案彼此連接之通孔導體及通孔導體等之貫通導體於表面所露出之部分。該等貫通導體可藉由以下方法而形成,即,將上述膏經印刷而埋入到以沖孔加工等方法形成於玻璃陶瓷胚片上之貫通孔中。Further, in consideration of printability, the viscosity of the conductive paste is preferably 50 to 700 Pa‧s. Further, the conductor pattern on the surface of the base material layer also includes a portion of the through-conductor such as a via-hole conductor and a via-hole conductor for connecting the conductor patterns between the upper and lower layers to the surface. The through conductors can be formed by printing the paste into a through hole formed in a glass ceramic green sheet by a punching process or the like.

(4)脫黏合劑步驟(4) Debonding step

脫黏合劑步驟通常係藉由於大氣中從室溫升溫至黏合劑分解或燃燒溫度為止,並保持固定時間而實施。例如,於大氣中,從室溫升溫至400℃,並保持60分鐘,以此可進行脫黏合劑。The debonding step is usually carried out by heating from room temperature to the decomposition or combustion temperature of the binder in the atmosphere for a fixed period of time. For example, in the atmosphere, the temperature is raised from room temperature to 400 ° C and held for 60 minutes, whereby the debonding agent can be carried out.

再者,於本發明之陶瓷成形體之製造方法中,脫黏合劑步驟係在大氣中等之氧分壓高的環境中進行,其在取得高效率方面較理想。但是,亦可在氧分壓比大氣低的條件下進行脫黏合劑,而且根據情況,還可在氧分壓相較大氣非常低的低氧環境下進行。Further, in the method for producing a ceramic formed article of the present invention, the debonding agent step is carried out in an environment having a high oxygen partial pressure in the atmosphere, which is preferable in terms of achieving high efficiency. However, the debonding agent may be carried out under conditions in which the oxygen partial pressure is lower than the atmosphere, and depending on the case, it may be carried out in a low oxygen environment in which the oxygen partial pressure phase is very low.

(5)煅燒條件(5) Calcination conditions

(a)第1煅燒步驟係藉由在脫黏合劑步驟後導入氮,使基材層之燒結溫度例如從400℃升溫至950℃而進行。於本發明中,所謂第1煅燒步驟中的低氧環境,係指氧分壓比大氣低的環境,但特別當使氧分壓為10-3 ~10-6 atm時,拘束層中之碳粉末等之燒失材料不會燒失,可確實拘束基材層,故較佳。(a) The first calcination step is carried out by introducing nitrogen into the debonding step and heating the substrate layer to a temperature of, for example, 400 ° C to 950 ° C. In the present invention, the low-oxygen environment in the first calcination step refers to an environment in which the oxygen partial pressure is lower than the atmosphere, but particularly in the case where the partial pressure of oxygen is 10 -3 to 10 -6 atm, the carbon in the restraint layer It is preferred that the burn-in material such as powder does not lose weight and can reliably bind the substrate layer.

(b)第2煅燒步驟係在氧分壓比第1煅燒步驟高的條件下實施,使拘束層中之燒失材料燒失,從而提高其後的拘束層之去除性。(b) The second calcination step is carried out under conditions in which the oxygen partial pressure is higher than the first calcination step, and the loss-in material in the restraint layer is burned out, thereby improving the removability of the subsequent restraint layer.

例如,在第1煅燒步驟結束後,導入大氣,並於常壓下,在氧分壓為0.21atm、950℃之條件下保持10分鐘,以使拘束層中之碳燒失。For example, after the completion of the first calcination step, the atmosphere is introduced, and under normal pressure, the oxygen partial pressure is maintained at 0.21 atm and 950 ° C for 10 minutes to burn off the carbon in the restraint layer.

再者,第1煅燒步驟與第2煅燒步驟可在如上所述相同之煅燒溫度下實施,但亦可使第1煅燒步驟與第2煅燒步驟中之溫度不同。又,第1煅燒步驟與第2煅燒步驟可連續進行,另外,亦可在第1煅燒步驟進行之後,暫時從爐中取出,然後再次放入爐中並進行第2煅燒步驟。Further, the first calcination step and the second calcination step may be carried out at the same calcination temperature as described above, but the temperatures in the first calcination step and the second calcination step may be different. Further, the first calcination step and the second calcination step may be continuously performed, or may be temporarily taken out from the furnace after the first calcination step, and then placed in the furnace again to carry out the second calcination step.

以下顯示本發明之實施例,對本發明之特徵部分進行更詳細的說明。The embodiments of the present invention are shown below to explain the features of the present invention in more detail.

[實施例1][Example 1]

圖1係表示藉由本發明實施例(實施例1)之陶瓷基板之製造方法所製造的陶瓷基板(多層陶瓷基板)之示圖,圖2係表示於圖1之陶瓷基板上搭載有安裝零件之狀態之示圖,圖3係表示於製造圖1及圖2之陶瓷基板之步驟中所製作的具備拘束層之未燒成積層體之示圖。1 is a view showing a ceramic substrate (multilayer ceramic substrate) produced by a method for producing a ceramic substrate according to an embodiment (Example 1) of the present invention, and FIG. 2 is a view showing a mounting member mounted on the ceramic substrate of FIG. FIG. 3 is a view showing an unfired laminated body having a restraining layer produced in the step of manufacturing the ceramic substrate of FIGS. 1 and 2.

圖1所示之陶瓷基板A具備:將含有陶瓷粉末及玻璃材料之低溫燒結陶瓷原料組合物煅燒而成之絕緣性陶瓷層1、以及配設於該絕緣性陶瓷層1上之導體部2。再者,該實施例1之陶瓷基板A成為具有積層有複數層絕緣性陶瓷層1之複數層構造之多層基板。The ceramic substrate A shown in FIG. 1 includes an insulating ceramic layer 1 obtained by firing a low-temperature sintered ceramic raw material composition containing a ceramic powder and a glass material, and a conductor portion 2 disposed on the insulating ceramic layer 1. In addition, the ceramic substrate A of the first embodiment is a multilayer substrate having a plurality of layers in which a plurality of insulating ceramic layers 1 are laminated.

作為構成絕緣性陶瓷層1之低溫燒結陶瓷組合物,使用的是將氧化鋁系之陶瓷粉末及硼矽酸玻璃系之玻璃粉末調配而成之低溫燒結陶瓷組合物。As the low-temperature sintered ceramic composition constituting the insulating ceramic layer 1, a low-temperature sintered ceramic composition obtained by blending an alumina-based ceramic powder and a borosilicate glass-based glass powder is used.

又,導體部2係由以下部分構成:位於陶瓷基板A之表面上的表面導體(外部導體)21;配設於相互接合之複數個絕緣性陶瓷層1、1之間的層間導體(內部導體)22、以及將層間導體22彼此或者表面導體21與層間導體22加以連接的通孔導體23。Further, the conductor portion 2 is composed of a surface conductor (outer conductor) 21 on the surface of the ceramic substrate A, and an interlayer conductor (internal conductor) disposed between the plurality of insulating ceramic layers 1, 1 joined to each other. 22, and a via conductor 23 connecting the interlayer conductors 22 to each other or the surface conductor 21 and the interlayer conductor 22.

表面導體21、層間導體22係藉由將以印刷的方式形成有導電性膏(例如,銀系導電性膏)之外部導體膜及內部導體膜進行煅燒而形成。又,通孔導體23例如係藉由向貫通孔中填充導電性膏及導體粉末並進行煅燒而形成。The surface conductor 21 and the interlayer conductor 22 are formed by firing an outer conductor film and an inner conductor film in which a conductive paste (for example, a silver-based conductive paste) is formed by printing. Moreover, the via-hole conductor 23 is formed, for example, by filling a through-hole with a conductive paste and a conductor powder, and baking.

又,搭載有圖2之電子零件的陶瓷基板(多層陶瓷基板)B係藉由於圖1之陶瓷基板(多層陶瓷基板)A上配設半導體元件及晶片電容器等之安裝電子零件3a、3b而形成。In addition, the ceramic substrate (multilayer ceramic substrate) B on which the electronic component of FIG. 2 is mounted is formed by mounting the electronic components 3a and 3b such as a semiconductor element and a chip capacitor on the ceramic substrate (multilayer ceramic substrate) A of FIG. .

其次,對該多層陶瓷基板A及B之製造方法加以說明。Next, a method of manufacturing the multilayer ceramic substrates A and B will be described.

以下,一面參照圖1至圖3一面進行說明。Hereinafter, the description will be made with reference to FIGS. 1 to 3.

(1)首先,向由陶瓷粉末及玻璃材料混合後之混合粉末中,分別適量添加黏合劑、分散劑、可塑劑及有機溶劑等,並將該等混合,由此製作陶瓷漿料。(1) First, a binder, a dispersant, a plasticizer, an organic solvent, and the like are added to a mixed powder obtained by mixing ceramic powder and a glass material, and these are mixed to prepare a ceramic slurry.

(2)其次,將該陶瓷漿料以刮刀成形法等之方法成形為片材狀,製作基板用陶瓷胚片1a(圖3)。再者,此處,將(2) Next, the ceramic slurry is formed into a sheet shape by a doctor blade method or the like to prepare a ceramic green sheet 1a for a substrate (Fig. 3). Again, here,

(a)作為玻璃粉末的以CaO:43wt%、SiO2 :44wt%、Al2 03 :7wt%、B2 03 :6wt%之比例所含有之組成之玻璃粉末45wt%,與(a) 45 wt% of a glass powder having a composition of CaO: 43 wt%, SiO 2 : 44 wt%, Al 2 0 3 : 7 wt%, and B 2 0 3 : 6 wt% as a glass powder, and

(b)作為陶瓷粉末的Al2 03 粉末55wt%(b) Al 2 0 3 powder as a ceramic powder 55 wt%

進行混合,並使該混合物分散到由有機溶劑、可塑劑等所組成之有機媒劑中,以調製漿料。然後將該漿料以刮刀成形法或澆鑄法而成形為片材狀,由此製作基板用陶瓷胚片。再者,該基板用陶瓷胚片之燒結溫度為1050℃以下。The mixing is carried out, and the mixture is dispersed in an organic vehicle composed of an organic solvent, a plasticizer or the like to prepare a slurry. Then, the slurry is formed into a sheet shape by a doctor blade molding method or a casting method to prepare a ceramic green sheet for a substrate. Further, the ceramic green sheet for the substrate has a sintering temperature of 1050 ° C or lower.

(3)接著,於所獲得之基板用陶瓷胚片1a上,根據需要,形成用以形成通孔導體之貫通孔12(圖3),並於該貫通孔12中,藉由填充導電性膏或者導體粉末而形成有未燒結之通孔導體23a(圖3)(再者,於該實施例1中,貫通孔12中填充有以Ag作為導電成分之導電性膏)。(3) Next, on the obtained ceramic green sheet 1a for a substrate, a through hole 12 (FIG. 3) for forming a via conductor is formed as needed, and a conductive paste is filled in the through hole 12 Alternatively, the unfired via-hole conductor 23a (FIG. 3) is formed by the conductor powder (further, in the first embodiment, the through-hole 12 is filled with a conductive paste containing Ag as a conductive component).

(4)又,於基板用陶瓷胚片1a上,根據需要,例如藉由印刷銀系導電性膏而形成有未燒結之外部導體21a、內部導體22a(參照圖3)。(4) Further, on the ceramic green sheet 1a for a substrate, an unsintered outer conductor 21a and an inner conductor 22a (see Fig. 3) are formed, for example, by printing a silver-based conductive paste.

(5)又,按照以下順序製作用以形成拘束層之拘束層用陶瓷胚片。(5) Further, ceramic green sheets for the restraint layer for forming the restraint layer were produced in the following order.

首先,使於上述基板用陶瓷胚片之煅燒溫度下實質上不燒結之陶瓷粉末(於該實施例1中為氧化鋁粉末)及碳粉末之混合粉末,分散到由有機黏合劑、有機溶劑、可塑劑等所組成之有機媒劑中,以調製漿料。First, a ceramic powder (aluminum powder in the first embodiment) and a mixed powder of carbon powder which are substantially not sintered at the calcination temperature of the ceramic green sheet for the substrate are dispersed in an organic binder or an organic solvent. An organic vehicle composed of a plasticizer or the like to prepare a slurry.

然後,將所獲得之漿料成形為片材狀,以製作拘束層用陶瓷胚片。Then, the obtained slurry was formed into a sheet shape to prepare a ceramic green sheet for a restraint layer.

再者,於該實施例1中,將漿料中之碳粉末之比例設為20vol%。又,作為陶瓷粉末,使用平均粒徑為1μm之氧化鋁粉末,作為碳粉末,使用平均粒徑為3μm之碳粉末。該拘束層用陶瓷胚片之燒結溫度為1400~1600℃,其係於基板用陶瓷胚片之燒結溫度下實質上不燒結者。再者,於該實施例1中,為可確保充分之拘束力,將拘束層陶瓷胚片之厚度設為300μm。Further, in the first embodiment, the ratio of the carbon powder in the slurry was set to 20 vol%. Further, as the ceramic powder, alumina powder having an average particle diameter of 1 μm was used, and as the carbon powder, carbon powder having an average particle diameter of 3 μm was used. The sintering temperature of the ceramic green sheet for the restraint layer is 1400 to 1600 ° C, which is substantially not sintered at the sintering temperature of the ceramic green sheet for the substrate. Further, in the first embodiment, the thickness of the restraint ceramic green sheet was set to 300 μm in order to ensure sufficient binding force.

(6)其次,如圖3所示,將複數個基板用陶瓷胚片1a以特定之順序積層,且將拘束層31配置並積層於具有將基板用陶瓷胚片1a積層所形成之複數層構造之基材層(未燒成之陶瓷基板)A'之兩主面上,利用靜水壓壓製等方法,例如以5~200MPa之壓力進行擠壓並壓接。藉此,於基材層(未燒成之陶瓷基板)A'之上下兩側,製作出具有配設有拘束層31之構造之未燒成積層體32(參照圖3)。於該實施例1中,使基材層(未燒成之陶瓷基板)A'之厚度為300μm,且拘束層31之厚度為300μm。(6) Next, as shown in FIG. 3, a plurality of substrate ceramic green sheets 1a are laminated in a specific order, and the restraint layer 31 is disposed and laminated to have a plurality of layer structures formed by laminating the ceramic green sheets 1a for the substrate. The two main surfaces of the base material layer (unfired ceramic substrate) A' are pressed and pressure-bonded by a method such as hydrostatic pressing, for example, at a pressure of 5 to 200 MPa. Thereby, an unfired laminated body 32 having a structure in which the restraining layer 31 is disposed is formed on the upper and lower sides of the base material layer (unfired ceramic substrate) A' (see FIG. 3). In the first embodiment, the thickness of the base material layer (unfired ceramic substrate) A' was 300 μm, and the thickness of the restraint layer 31 was 300 μm.

再者,根據需要,亦可將該未燒成積層體32切斷成適當之大小。又,於該實施例1中,將複數個基板用陶瓷胚片1a積層,以製作複數層構造之基材層A',但亦可使基板用陶瓷胚片1a之塊數為一塊,製作單層構造之基材層,並製造單板型之陶瓷基板。Further, the unfired laminated body 32 may be cut into an appropriate size as needed. Further, in the first embodiment, a plurality of substrate ceramic green sheets 1a are laminated to form a base layer A' having a plurality of layers, but the number of the ceramic green sheets 1a for the substrate may be one by one. A base material layer of a layer structure, and a single-plate type ceramic substrate is produced.

又,於該實施例1中,於基材層(未燒成之陶瓷基板)A'之上下兩側配設有拘束層31,但亦可構成為將拘束層31配設於基材層(未燒成之陶瓷基板)A'之僅一方之主面上。Further, in the first embodiment, the restraining layer 31 is disposed on the upper and lower sides of the base material layer (unfired ceramic substrate) A', but the restraining layer 31 may be disposed on the base material layer ( On the main surface of only one of the unfired ceramic substrates) A'.

而且,拘束層31可藉由將複數塊拘束層用陶瓷胚片積層而形成,另外還可藉由一塊拘束層用陶瓷胚片而形成。Further, the restraining layer 31 can be formed by laminating a plurality of restraint layers with a ceramic green sheet, and can also be formed by using a ceramic green sheet with a restraining layer.

(7)其次,將該未燒成積層體32於大氣中以低溫之脫脂溫度(例如,400℃左右之溫度)進行熱處理,去除黏合劑等之有機物。(7) Next, the unfired laminated body 32 is heat-treated at a low temperature degreasing temperature (for example, a temperature of about 400 ° C) in the air to remove an organic substance such as a binder.

其後,基材層(未燒成之陶瓷基板)A'燒結,但構成拘束層31之陶瓷粉末不燒結,且在構成拘束層31之燒失材料不燒失之條件下,即,該實施例1中,在氧濃度為1vol%以下之低氧環境中升溫至850~950℃並進行煅燒,使基材層(未燒成之陶瓷基板)A'燒結(第1煅燒步驟)。Thereafter, the base material layer (unfired ceramic substrate) A' is sintered, but the ceramic powder constituting the restraint layer 31 is not sintered, and the burn-in material constituting the restraint layer 31 is not burned, that is, the implementation In Example 1, the temperature was raised to 850 to 950 ° C in a low-oxygen atmosphere having an oxygen concentration of 1 vol% or less, and calcination was carried out to sinter the base material layer (unfired ceramic substrate) A' (first baking step).

此時,構成拘束層3之陶瓷粉末未燒結,且碳粉末亦未燒失而是殘留,故拘束層31充分發揮抑制基材層A'於平面方向收縮之功能。At this time, the ceramic powder constituting the restraint layer 3 is not sintered, and the carbon powder remains without being burned out. Therefore, the restraint layer 31 sufficiently functions to suppress shrinkage of the base material layer A' in the planar direction.

(8)其後,在氧分壓比第1煅燒步驟高的條件(於該實施例1中,氧濃度為10vol%)下進行煅燒(第2煅燒步驟),使作為構成拘束層31之燒失材料的碳粉末燒失。藉此,於拘束層中之碳粉末燒失之部分形成有微孔,故拘束層成為多孔而容易去除之狀態。(8) Thereafter, the oxygen partial pressure is higher than the first calcination step (in the first embodiment, the oxygen concentration is 10 vol%), and calcination is carried out (second calcination step) to form a constrained layer 31. Loss of material carbon powder burned out. As a result, micropores are formed in the portion where the carbon powder is lost in the restraint layer, so that the restraint layer is porous and easily removed.

(9)然後,藉由去除多孔狀態之拘束層31而獲得具有如圖1所示之構造的陶瓷基板A。(9) Then, the ceramic substrate A having the configuration shown in Fig. 1 is obtained by removing the confinement layer 31 in the porous state.

再者,根據該實施例1之方法,於煅燒後之複合積層體中,拘束層實質上未燒結,且煅燒前含有之碳粉末燒失而成為多孔的狀態,故與先前之使用有由不含有燒失材料(該實施例1中之碳粉末)的陶瓷粉末及黏合劑所組成之拘束層的情況相比,例如,可使得使用噴砂法或濕噴砂法時之吐出壓力變低,且去除拘束層所需之時間變短。其結果可不損及基板表面及電極表面之平滑性而去除拘束層,故能夠以較佳的良率製造尺寸精度高的陶瓷成形體。Further, according to the method of the first embodiment, in the composite laminate after the calcination, the restraint layer is substantially not sintered, and the carbon powder contained before the calcination is burned out to be in a porous state, so that it has been used in the past. The discharge pressure of the ceramic powder and the binder which are not contained in the burn-off material (the carbon powder in the first embodiment) is lower than that in the case of using the blasting method or the wet blasting method, for example, when the blasting method or the wet blasting method is used. And the time required to remove the restraint layer becomes shorter. As a result, the restraint layer can be removed without impairing the smoothness of the substrate surface and the electrode surface, so that a ceramic molded body having high dimensional accuracy can be produced with a good yield.

根據上述實施例1可確認,在使用拘束力高的陶瓷粉末(實施例1中為氧化鋁粉末)而構成收縮抑制用之拘束層時,亦可藉由調配碳粉末來確保拘束力,且確保煅燒後之拘束層去除之容易性。According to the first embodiment, it is confirmed that when the restraint layer for shrinkage suppression is formed by using the ceramic powder having high binding force (the alumina powder in the first embodiment), the binding force can be ensured by blending the carbon powder. Ensure ease of removal of the restraint layer after calcination.

又,作為副效果,可獲得如下效果:藉由將碳粉末混合而使拘束層用胚片著色,從而容易與基板用陶瓷胚片進行區別,可防止將兩者取錯之錯誤,以提高製造步驟之可靠性。再者,通常在對陶瓷胚片著色時,較多情況是使用過渡金屬元素,向基材層側擴散而使基材著色,但根據本發明,基材層並未著色,從而外觀品質未劣化。Further, as a side effect, it is possible to obtain an effect of coloring the green sheets for the restraint layer by mixing the carbon powder, thereby easily distinguishing them from the ceramic green sheets for the substrate, thereby preventing an error in which the two are mistaken, thereby improving Reliability of the manufacturing steps. Further, in general, when the ceramic green sheet is colored, a transition metal element is often used to diffuse the base material layer to color the base material. However, according to the present invention, the base material layer is not colored, so that the appearance quality is not deteriorated. .

再者,於上述實施例1中,以製造陶瓷基板來作為陶瓷成形體之情況為例進行了說明,但本發明並非限於陶瓷基板,亦可應用於以陶瓷線圈零件、陶瓷LC複合零件等之陶瓷電子零件為主的各種陶瓷成形體之製造方法。In the first embodiment, the case where the ceramic substrate is used as the ceramic formed body has been described as an example. However, the present invention is not limited to the ceramic substrate, and may be applied to ceramic coil parts, ceramic LC composite parts, and the like. A method of manufacturing various ceramic molded bodies mainly composed of ceramic electronic components.

進而,於此外其他方面,本發明並非係限定於上述實施例1者,關於構成基材層之陶瓷粉末及玻璃材料之具體的種類及調配比例、構成拘束層之燒失材料及陶瓷粉末之具體的種類、第1及第2煅燒步驟中之具體的條件、脫黏合劑步驟中之處理條件等,可於發明之範圍內進行各種應用、變形。Furthermore, the present invention is not limited to the above-described first embodiment, and the specific types and blending ratios of the ceramic powder and the glass material constituting the base material layer, the burn-in material constituting the restraint layer, and the ceramic powder are specifically The type, the specific conditions in the first and second calcination steps, the treatment conditions in the debonding step, and the like can be variously applied and modified within the scope of the invention.

[產業上之可利用性][Industrial availability]

如上所述,根據本發明,可充分確保煅燒步驟中之收縮抑制效果,且於燒成步驟結束後容易去除拘束層,從而不會在去除拘束層之步驟中對陶瓷成形體造成損害,可確實且高效地製造尺寸精度高的陶瓷成形體。因此,本發明可廣泛利用於經煅燒步驟而製造的陶瓷成形體之製造領域。As described above, according to the present invention, the shrinkage suppressing effect in the calcination step can be sufficiently ensured, and the restraint layer can be easily removed after the completion of the calcination step, so that the ceramic molded body is not damaged in the step of removing the restraint layer, and it is possible to confirm Moreover, a ceramic molded body having high dimensional accuracy is efficiently produced. Therefore, the present invention can be widely utilized in the field of manufacturing ceramic shaped bodies produced by the calcination step.

1...絕緣性陶瓷層1. . . Insulating ceramic layer

1a...基板用陶瓷胚片1a. . . Ceramic tile for substrate

2...導體部2. . . Conductor

3a,3b...安裝電子零件3a, 3b. . . Installing electronic parts

12...貫通孔12. . . Through hole

21...表面導體(外部導體)twenty one. . . Surface conductor (outer conductor)

21a...未燒結之外部導體21a. . . Unsintered outer conductor

22...層間導體(內部導體)twenty two. . . Interlayer conductor (internal conductor)

22a...未燒結之內部導體22a. . . Unsintered internal conductor

23...通孔導體twenty three. . . Through hole conductor

23a...未燒結之通孔導體23a. . . Unsintered via conductor

31...拘束層31. . . Constraint

32...未燒成積層體32. . . Unburned laminate

A...陶瓷基板(多層陶瓷基板)A. . . Ceramic substrate (multilayer ceramic substrate)

A'...基材層(未燒成之陶瓷基板)A'. . . Substrate layer (unfired ceramic substrate)

B...陶瓷基板(多層陶瓷基板)B. . . Ceramic substrate (multilayer ceramic substrate)

圖1係表示藉由本發明實施例(實施例1)的陶瓷成形體(陶瓷基板)之製造方法所製造的陶瓷基板(多層陶瓷基板)之示圖。Fig. 1 is a view showing a ceramic substrate (multilayer ceramic substrate) produced by a method for producing a ceramic formed body (ceramic substrate) according to an embodiment (Example 1) of the present invention.

圖2係表示圖1之陶瓷基板上搭載有安裝零件之狀態之示圖。Fig. 2 is a view showing a state in which mounted components are mounted on the ceramic substrate of Fig. 1;

圖3係表示在製造圖1及圖2之陶瓷基板之步驟中所製作的具備拘束層之未燒成積層體之示圖。Fig. 3 is a view showing an unfired laminated body having a restraining layer produced in the step of manufacturing the ceramic substrate of Figs. 1 and 2;

圖4係表示先前之使用有以難燒結性材料為主要成分的拘束層來對陶瓷成形體進行拘束煅燒之方法之示圖。Fig. 4 is a view showing a method of restraining and calcining a ceramic formed body using a restraint layer containing a hardly sinterable material as a main component.

1a...基板用陶瓷胚片1a. . . Ceramic tile for substrate

12...貫通孔12. . . Through hole

21a...未燒結外部導體21a. . . Unsintered outer conductor

22a...未燒結之內部導體22a. . . Unsintered internal conductor

23a...未燒結之通孔導體23a. . . Unsintered via conductor

31...拘束層31. . . Constraint

32...未燒成積層體32. . . Unburned laminate

A'...基材層(未燒成之陶瓷基板)A'. . . Substrate layer (unfired ceramic substrate)

Claims (13)

一種陶瓷成形體之製造方法,其特徵在於包括:積層體製作步驟,其係製作未燒成積層體者,該未燒成積層體具備基材層及拘束層,上述基材層含有陶瓷粉末與玻璃材料,上述拘束層含有:在低氧環境下進行煅燒後不會燒失、但在使氧分壓相較上述低氧環境變高而進行煅燒後會燒失的燒失材料,以及在上述基材層之燒結溫度下不燒結的陶瓷粉末;且上述拘束層係配置成與上述基材層之至少一方之主面相接觸;煅燒步驟,將上述未燒成積層體進行煅燒以使上述基材層燒結;以及去除上述拘束層之步驟;上述煅燒步驟包括:第1煅燒步驟,在上述低氧環境下,在具備上述拘束層之狀態下進行煅燒以使上述基材層燒結;及第2煅燒步驟,在使氧分壓比上述第1煅燒步驟高的條件下進行煅燒,以使構成上述拘束層之上述燒失材料燒失。 A method for producing a ceramic formed body, comprising: a layered body producing step of producing an unfired laminated body, wherein the unfired laminated body comprises a base material layer and a restraining layer, and the base material layer contains ceramic powder and In the glass material, the restraining layer contains a burn-in material that is not burned out after being calcined in a low-oxygen environment, but is burned out after being calcined by making the oxygen partial pressure higher than the above-described low-oxygen environment, and a ceramic powder which is not sintered at a sintering temperature of the base material layer; and the restraining layer is disposed in contact with at least one of the main surfaces of the base material layer; and in the calcining step, the unfired laminated body is calcined to make the substrate a layer sintering process; and a step of removing the above-mentioned restraint layer; the calcination step includes: a first calcination step of calcining the base material layer in a state of having the restraint layer in the low oxygen atmosphere; and second calcination The step of calcining the oxygen partial pressure is higher than the first calcination step to burn out the burn-in material constituting the restraint layer. 如請求項1之陶瓷成形體之製造方法,其中上述陶瓷成形體為陶瓷基板。 The method of producing a ceramic formed body according to claim 1, wherein the ceramic formed body is a ceramic substrate. 如請求項1之陶瓷成形體之製造方法,其中於上述第1煅燒步驟中,以使上述基材層中所含有之上述玻璃材料浸透到上述拘束層之方式進行煅燒。 The method of producing a ceramic formed body according to claim 1, wherein in the first baking step, the glass material contained in the base material layer is impregnated to the restraint layer. 如請求項2之陶瓷成形體之製造方法,其中於上述第1煅 燒步驟中,以使上述基材層中所含有之上述玻璃材料浸透到上述拘束層之方式進行煅燒。 A method of producing a ceramic formed body according to claim 2, wherein the first calcination is performed In the baking step, the glass material contained in the base material layer is impregnated into the restraint layer to be calcined. 如請求項1~4中任一項之陶瓷成形體之製造方法,其中上述燒失材料之粒徑比上述拘束層中含有的陶瓷粉末之粒徑大。 The method for producing a ceramic formed body according to any one of claims 1 to 4, wherein the particle size of the burn-in material is larger than a particle diameter of the ceramic powder contained in the restraint layer. 如請求項1~4中任一項之陶瓷成形體之製造方法,其中上述燒失材料為碳粉末。 The method for producing a ceramic formed body according to any one of claims 1 to 4, wherein the burn-in material is carbon powder. 如請求項1~4中任一項之陶瓷成形體之製造方法,其中上述拘束層中所含有之陶瓷粉末係與上述基材層中所含有之陶瓷粉末為相同材質。 The method for producing a ceramic molded body according to any one of claims 1 to 4, wherein the ceramic powder contained in the restraining layer is made of the same material as the ceramic powder contained in the base material layer. 如請求項1~4中任一項之陶瓷成形體之製造方法,其中上述基材層含有黏合劑,且包括脫黏合劑步驟,其係於上述煅燒步驟中的上述第1煅燒步驟之前,將上述基材層中含有之上述黏合劑去除;上述脫黏合劑步驟係在含氧環境中、且上述燒失材料不會燒失之溫度下實施。 The method for producing a ceramic formed body according to any one of claims 1 to 4, wherein the base material layer contains a binder, and includes a debonding agent step before the first calcination step in the calcining step, The binder is removed in the base layer; the debonding step is carried out in an oxygen-containing atmosphere and the burn-in material is not burned out. 如請求項1~4中任一項之陶瓷成形體之製造方法,其中於上述積層體製作步驟中,上述拘束層係藉由以使含有上述燒失材料及上述陶瓷粉末之片材與上述基材層之至少一方之主面相接觸之方式配置而形成。 The method for producing a ceramic formed body according to any one of claims 1 to 4, wherein in the step of producing the laminated body, the restraining layer is formed by using a sheet containing the burn-in material and the ceramic powder and the base The main surface of at least one of the material layers is arranged to be in contact with each other. 如請求項1~4中任一項之陶瓷成形體之製造方法,其中於上述積層體製作步驟中,上述拘束層係藉由將含有上述燒失材料及上述陶瓷粉末之膏塗布於上述基材層之至少一方之主面上而形成。 The method for producing a ceramic formed article according to any one of claims 1 to 4, wherein in the step of producing the laminated body, the restraining layer is formed by applying a paste containing the burn-in material and the ceramic powder to the substrate It is formed on the main surface of at least one of the layers. 如請求項1~4中任一項之陶瓷成形體之製造方法,其中上述基材層具有複數層構造,該複數層構造具備複數個含有上述陶瓷粉末與上述玻璃材料之層。 The method for producing a ceramic formed body according to any one of claims 1 to 4, wherein the base material layer has a plurality of layers having a plurality of layers containing the ceramic powder and the glass material. 如請求項1~4中任一項之陶瓷成形體之製造方法,其中上述基材層於至少一方之主面上具備配線圖案。 The method for producing a ceramic molded body according to any one of claims 1 to 4, wherein the base material layer has a wiring pattern on at least one of the main surfaces. 如請求項1~4中任一項之陶瓷成形體之製造方法,其進一步包括於經上述煅燒步驟煅燒後之基材層之外表面上安裝電子零件之步驟。 The method of producing a ceramic formed body according to any one of claims 1 to 4, further comprising the step of mounting an electronic component on a surface of the substrate layer after the calcination step.
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