TWI386763B - Projection exposure device - Google Patents

Description

Projection exposure device

The present invention relates to a projection exposure apparatus for projecting a high-resolution pattern onto a film-shaped workpiece, and more particularly to a projection exposure apparatus that effectively utilizes an installation area in a clean room.

In recent years, there have been more and more products using film-shaped workpieces as substrates for exposure. For example, a thin film circuit board is used for mounting an electronic component of a semiconductor integrated circuit and a TAB (Tape Automated Bonding) method. In the manufacture of the thin film circuit board, a technique of exposure development is used, and the middle process of the exposure development is a process of transferring a circuit pattern. Then, the circuit board to be used is in the form of a film strip having a thickness of 0.05 mm or less and a length of about 200 m. The pattern formed on the film-shaped workpiece is, for example, a technique having a resolution of 10 μm or less and a relatively strict operation operation. Therefore, in the exposure process, it is necessary to carry out the correct alignment and the optical system with high resolution, so it is necessary to perform the exposure process in a clean room environment.

In the film exposure apparatus used in the exposure process, the contact exposure method in which the photomask is in contact with the film-shaped workpiece and exposed, the photomask and the film-like workpiece are in close proximity, the exposure of the agent is exposed, and the high resolution is ensured. There are three types of non-contact projection exposure methods.

Fig. 4 is a view showing an example of an exposure apparatus of a contact exposure method. The exposure apparatus 1 has an exposure unit 2 at the center of the apparatus, and vertically passes through a strip-shaped substrate 3 in a conveyance from the bottom to the center of the exposure unit 2, and the masks 4 and 4 are aligned by X, Y, and θ. The light of the light source 5 is double-sided exposed. The strip substrate 3 is taken out from the take-up reel 7 attached to the right side of the apparatus by the grip roller 6, and wound around the winding reel 8 provided on the left side of the apparatus. (Refer to Patent Document 1)

Further, the projection exposure apparatus is a device that projects a exposure using a projection exposure optical system. In the projection exposure apparatus, the exposed film is placed at a high precision in an exposure position, and the distance between the mask and the film is precisely maintained at a predetermined interval. Further, a method has been proposed in which a film is conveyed in a vertical direction using a telecentric optical system, a mask is projected from a right angle direction (horizontal direction), and an optical system is projected on the image plane side. A wiring pattern is formed. (Refer to Patent Document 2)

Further, if a telecentric projection optical system is used, the price of the device can be high, and therefore a projection exposure apparatus using a non-telecentric optical system has been proposed. Fig. 5 is a schematic view showing a projection exposure apparatus using a non-telecentric projection optical system (see Patent Document 3). As shown in Fig. 5, the projection exposure apparatus 10 includes a light source 11, a mask 12 on the optical axis of the light source 11, a non-telecentric optical system 13 that projects the image of the mask 12 onto a vertical projection surface, and a film. a belt-shaped workpiece 14 is conveyed in a vertical direction in a section so that a portion of the workpiece 14 is located on the vertical projection surface of the transport mechanism 15, and a portion of the workpiece 14 to be conveyed is detected in the horizontal direction from the projection surface by a detecting means 16 and The control device 17 that displaces the lens of the photomask 12 and/or the projection optical system 13 in the optical axis direction in order to correct the change in the projection magnification caused by the detected offset.

In the projection exposure apparatus 10, the non-telecentric projection optical system 13 is set such that the optical axis is horizontal. In the projection exposure apparatus 10 thus constructed, even if the projection optical system 13 is abnormal in positional relationship due to the accuracy of processing and the influence of external air, the projection lens of the projection optical system and the photomask 12 are directed toward the light in order to correct the offset. In the axial direction displacement, there is no exposure failure due to the positional shift of the projection optical system 13.

Thus, a projection exposure apparatus in which the optical axis of the non-telecentric projection optical system is vertically disposed is also known.

[Patent Document 1] JP-A-62-293248 (Patent Document 3) Patent No. 2798158

However, in the conventional projection exposure apparatus, there are the following problems.

In the exposure apparatus 1 of the patent document 1 shown in FIG. 4, the strip substrate 3 is taken out from the take-up reel 7 provided on the right side of the apparatus, and is wound around the winding reel 8 provided on the left side of the apparatus, in the transport mechanism. In the structure, the distance in the horizontal direction is large, and the entire installation must have a large installation area.

Further, in the projection exposure apparatus of Patent Document 3 shown in Fig. 5, since the optical axis of the non-telecentric projection optical system 13 is set horizontally, a large installation area is required. In Fig. 5, the projection optical system 13 is represented by a small square. Although a small installation area is seen in the drawing, in practice, nearly 20 lens combinations are provided to ensure high resolution, so that the total length is 2.5 m or more. The relatively large projection optics of the large set area must have a large set area in the clean room. Further, in the projection exposure apparatus described in Patent Document 2, it is difficult to reduce the size of the apparatus and use the optical system.

Further, in the non-telecentric projection optical system, for example, in the case of a thin film exposure apparatus in which the optical axis is vertically disposed, the transport mechanism of the film-shaped workpiece occupies a large installation area in the horizontal direction, and the non-telecentric projection optical system The projection lens stands tall, and a large step height and an installation area are necessary. The film exposure apparatus has a problem of obstruction of the atmosphere and a problem of shielding the field of view, and the installation environment in the clean room is deteriorated.

In order to solve the above problems, the present invention proposes a projection exposure apparatus which suppresses the horizontal and vertical directions of the apparatus so that the installation volume is smaller than that of the conventional apparatus.

In order to solve the above problem, the projection exposure apparatus of the present invention exposes a pattern of a mask by projection light onto a film-shaped workpiece by using an exposure stage disposed in a vertical direction, and includes a transport mechanism for placing the workpiece thereon. The vertical direction moves toward the exposure stage; and the projection optical mechanism has a Dyson optical system that abuts the exposure stage at a position adjacent to the boundary of the transport mechanism, wherein the Dyson optical system is incident on the Dyson optical system. The optical axis of the light and the optical axis of the illumination light emitted from the Dyson optical system are arranged to be orthogonal to the workpiece on the exposure stage.

In the projection exposure apparatus configured as described above, the film-shaped workpiece is brought close to the vertical surface of the exposure stage by the transport mechanism, and is intermittently conveyed in a vertical direction in a vertical direction. When the workpiece is aligned with the reticle, the light source is irradiated with a predetermined wavelength. The ultraviolet light is irradiated onto the workpiece by the Dyson optical system to form an exposure pattern of the photomask. At this time, the transport mechanism that transports the workpiece in the vertical direction and the projection optical mechanism that has the Dyson optical system are disposed on one side and the other side via the exposure stage, whereby the dimension in the device width direction and the device height direction can be restricted.

Further, the exposure stage can be moved in the optical axis direction of the illumination light emitted from the Dyson optical system.

The focus position of the Dyson optical system is changed corresponding to the thickness of the workpiece. In order to correct the focus shift amount, the exposure of the workpiece is performed in a state where the focus position is aligned by moving the exposure stage in the optical axis direction.

Further, the exposure apparatus further includes: a workpiece surface position setting device configured to be inserted into and exposed from the exposure region between the Dyson optical system and the exposure table, and measuring the surface of the workpiece in the optical axis direction And a mark acquisition device configured to be inserted into an exposure area between the Dyson optical system and the exposure stage, and to be retracted from the exposure area, to obtain an image, and to confirm a positional shift amount of the workpiece in a direction orthogonal to the optical axis direction According to the surface position information measured by the workpiece surface position measuring device, the exposure stage moves in the optical axis direction, and the photomask is moved according to the information of the positional deviation measured by the mark acquiring means.

In the projection exposure apparatus configured as described above, in order to align the focus of the workpiece that can be conveyed and the alignment of the workpiece and the reticle, the workpiece surface position measuring device and the mark acquiring device are inserted between the Dyson optical system and the exposure table. Exposure area. At this time, the position of the workpiece in the direction of the optical axis and in the direction orthogonal to the optical axis direction can be confirmed. Since the exposure stage moves in the optical axis direction while the exposure stage corresponds to this, the correct exposure can be performed.

Further, in the projection exposure apparatus, the transport mechanism includes a supply reel that feeds the workpiece, a supply-side first guide roller that guides the workpiece fed from the supply reel, and a supply-side second guide roller, and the supply side a first tension adjusting device that applies tension between the first guide roller and the workpiece guided by the supply side second guide roller, and conveys the workpiece from the supply side second guide roller along the exposure table a first transport roller and a second transport roller disposed above and below the exposure stage, and a winding side first guide roller and a winding side second for guiding the workpiece from the second transport roller a guide roller, a second tension adjusting device for applying tension to a workpiece guided between the winding side first guide roller and the winding side second guide roller, and winding from winding A winding reel of the workpiece of the side second guide roller.

Further, in the transport mechanism, the supply reel, the supply-side first guide roller, the supply-side second guide roller, the first tension adjusting device, and the first transport roller are disposed on the second transport roller and the winding side. The first guide roller, the winding side second guide roller, the second tension adjusting device, and the winding reel are above.

With such a configuration, when the projection exposure apparatus is disposed on the opposite side of the projection optical mechanism when the exposure stage is held, the distance from the supply reel to the first conveyance roller and the distance from the second conveyance roller to the winding reel become Small, and the distance between the supply reel and the winding reel becomes small.

The projection exposure apparatus according to the present invention has the following excellent effects.

(1) In the projection exposure mechanism, a Dyson optical system having a small number and a small number such as a lens, a cymbal and a mirror, and a transport mechanism for transporting a film-shaped workpiece on the exposure stage side in the vertical direction are used. The height and the width direction are smaller than those of the conventional projection exposure apparatus, and it is possible to suppress the installation space in the clean room from becoming small.

(2) The projection exposure apparatus reduces the installation area by suppressing the height, minimizes the interference of the air in the clean room, and minimizes the problem of shielding the field of view in the work space in the clean room. The setup environment is getting better.

Hereinafter, the best mode for carrying out the invention will be described with reference to the drawings.

<Configuration of Projection Exposure Device 20>

Fig. 1 is a schematic overall perspective view of a projection exposure apparatus.

The projection exposure apparatus 20 includes a light source mechanism 21 (projection optical mechanism), a mask holding frame 22, a Dyson optical system 23 (projection optical mechanism) provided on the optical path from the mask holding frame 22, and an exposure table. 24, and the transport mechanism 25. The mask holding frame 22 holds the mask M disposed on the optical axis of the light source mechanism 21. The exposure stage 24 is disposed on the optical path of the illumination light transmitted from the Dyson optical system 23. The transport mechanism 25 is close to the vertical surface of the exposure stage 24, and intermittently transports the film-shaped workpiece F in stages in the vertical direction. The projection exposure apparatus 20 has a registration control device 26 that aligns the integrated marks of the workpiece F and the mask M prior to exposure.

The projection exposure apparatus 20 is aligned by a registration device (not shown) when the conveyance mechanism 25 intermittently conveys a piece of the workpiece F. Then, the light source mechanism 21 irradiates the light containing the ultraviolet light of a predetermined wavelength for a necessary period of time, and the pattern of the mask M is projected onto the workpiece F on the vertical surface along the exposure stage 24.

The light source mechanism 21 includes an ultraviolet lamp 21a, an elliptical mirror 21b, a mirror 21c, a fly-eye lens 21d, and the like that illuminate ultraviolet light including a predetermined wavelength. The ultraviolet lamp 21a is provided at a focus position of the elliptical mirror 21b, and the elliptical mirror 21b reflects the irradiation light from the ultraviolet lamp 21a. The mirror 21c changes the direction of the illumination light reflected by the elliptical mirror 21b. The fly-eye lens 21d averages the illuminance distribution of the illumination light reflected by the mirror 21c. The irradiation light from the ultraviolet lamp 21a is irradiated to the side of the mask M. Further, the ultraviolet lamp 21a is constantly lit, and the irradiation light is irradiated by opening and closing a shutter mechanism (not shown).

The mask M is held in the vertical direction by the mask holding frame 22, and a circuit pattern of one segment is drawn on the workpiece F, an integrated mark for positioning with the workpiece F, an identification mark for identifying the mask itself, and the like are set at a predetermined position. on. Further, the workpiece F is formed into a film strip shape having a thickness of, for example, 12.5 μm.

The Dyson optical system 23 is provided as an optical axis that enters and exits the illumination light that is parallel to the illumination surface of the device. The Dyson optical system 23 includes an incident side convex lens 23a and an exit side convex lens 23c whose optical axes of the incident and outgoing illumination light coincide with the lens center, and a pupil reflection disposed between the incident side convex lens 23a and the exit side convex lens 23c. The body 23b and the reflection side convex lens 23d and the concave mirror 23e disposed above the flaw reflector 23b.

Therefore, when the irradiation light is incident, the Dyson optical system 23 first penetrates the incident side convex lens 23a, is reflected by the xenon reflector 23b, penetrates the reflective side convex lens 23d, and is reflected by the concave reflecting mirror 23e. The illuminating light passes through the reflecting side convex lens 23d, is reflected by the yttrium reflector 23b, emits the illuminating light from the exit side convex lens 23c, and is then irradiated onto the workpiece F. Since the Dyson optical system 23 has a smaller installation space than other optical systems, the entire apparatus can be reduced.

In the exposure stage 24, the mesa (vertical surface) 24a is arranged in the vertical direction, and is orthogonal to the optical axis of the irradiation light from the Dyson optical system 23, and is perpendicularly provided. The exposure stage 24 moves in the optical axis direction in order to align the focus as shown by the arrow 24b of FIG. Moreover, it is positioned at a predetermined distance from the center of the Dyson optical system 23.

Further, the exposure stage 24 is connected to a pipe of the vacuum pump to form a suction workpiece F and fixed. When a part of the workpiece F in the exposure range is transported to the exposure stage 24, the positional relationship between the positioning mark of the workpiece F and the positioning mark of the mask M is obtained by the mark acquiring devices 26a and 26b which will be described later. Then, the position of the mask M is moved so that the positional deviation of the positioning mark of the workpiece F and the positioning mark of the mask M becomes zero. Exposure is performed after the alignment of the workpiece F and the mask M is completed.

Fig. 2 is a side view showing the arrangement of the transport mechanism 25 of the projection exposure apparatus 20.

The transport mechanism 25 uses the first inflation container 25D and the second inflation container 25J as the first and second tension adjusting devices for adjusting the tension of the workpiece F in the transport path, and simultaneously approaches the mesa 24a of the exposure table 24 to form a film-like workpiece. F is intermittently transported in a section in the vertical direction. The supply side of the transport mechanism 25 has a supply reel 25a that feeds the workpiece F, a first guide roller 25b that guides the workpiece F sent from the supply reel 25a, and a second guide roller 25c. The first inflation container 25D (cassette 25d) that adjusts the tension of the guided workpiece F between the guide roller 25b and the second guide roller 25c. The winding side of the transport mechanism 25 has a third guide roller 25h and a fourth guide roller 25i for guiding the workpiece F, between the third guide roller 25h and the fourth guide roller 25i. The second inflation container 25J (the case 25j) that adjusts the tension of the workpiece F and the winding reel 25m that winds the workpiece F from the fourth guide roller 25i.

Further, on the supply side of the transport mechanism 25, above the exposure stage 24, the workpiece F sent by the second guide roller 25c is transported to the first transport roller 25f on the table surface 24a of the exposure table 24. Further, on the winding side of the conveying mechanism 25, a second conveying roller 25g that conveys the workpiece F from the table surface 24a is disposed below the exposure table 24. Further, the first inflation container 25D and the second inflation container 25J are housed in the cases 25d and 25j in order to prevent the workpiece from being externally affected. Then, the first gas-filled container 25D and the second gas-filled container 25J adjust the tension of the workpiece F, and buffer the temporary forced conveyance of the workpiece F by the vibration-damping action by the weight of the workpiece F itself without affecting the amount of the one-stage conveyance.

a supply reel 25a, a first guide roller 25b, a second guide roller 25c, a first conveyance roller 25f, a second conveyance roller 25g, a third guide roller 25h, a fourth guide roller 25i, and The winding reel 25m is driven by a control motor provided separately. Further, for example, a stepping motor or a servo motor is used as the control motor 25f2 of the first conveyance roller 25f (see FIG. 3) and the control motor 25g2 of the second conveyance roller 25g, and the conveyance amount of the workpiece F is controlled by the apparatus. The device 26d is supplied to the control motor 25f2 and the control motor 25g2 in a section of the conveyance amount which becomes the exposure unit of the workpiece F. Further, in the transport mechanism 25, as shown in Fig. 2, the supply reel 25a, the first guide roller 25b, the second guide roller 25c, and the first transport roller 25f are disposed on the second transport roller 25g. The third guide roller 25h, the fourth guide roller 25i, and the winding reel 25m are also at a high position.

Further, as shown in Fig. 2, in the transport mechanism 25, the winding of the workpiece F from the supply reel 25a to the first guide roller 25b is arranged to have a desired downward inclination (the axial position of the supply reel 25a is higher than the first The guide roller 25b has a high axial position). Further, the second guide rollers 25c are disposed at the same height or a lower height with respect to the first guide roller 25b. Further, the winding F of the workpiece F from the second guide roller 25c to the first conveyance roller 25f is disposed to have a desired downward inclination (the axial position of the second guide roller 25c is larger than that of the first conveyance roller 25f) The axis position is high). Further, in the transport mechanism 25, the winding of the workpiece F from the second transport roller 25g to the third guide roller 25h is arranged to have a desired upward tilt (the axial position of the third guide roller 25h is smaller than the second transport) The roller 25g has a high axial position). Further, the fourth guide roller 25i is disposed at the same height or a higher height with respect to the third guide roller 25h. Further, the winding of the workpiece F from the fourth guide roller 25i to the winding reel 25m is arranged to have a desired upward inclination (the axial position of the winding reel 25m is higher than the axial position of the fourth guide roller 25i).

The conveyance mechanism 25 is disposed from the supply reel 25a to the first conveyance roller 25f, the arrangement from the second conveyance roller 25g to the winding reel 25m, and the first conveyance roller 25f and the second conveyance roller 25g. The workpiece F is appropriately handled without being clamped and conveyed. Further, in the alignment, the second guide roller 25c and the third guide roller 25h are moved in the axial direction to adjust the position of the workpiece F in the oblique direction, and the first conveyance roller 25f and the first Second, the roller 25g is conveyed to adjust the position of the workpiece F in the vertical direction. Then, in the transport mechanism 25, the workpiece F is transported from the supply reel 25a to the first transport roller 25f in the direction (approximately horizontal direction) of the installation surface of the apparatus. Further, between the first conveyance roller 25f and the second conveyance roller 25g, the workpiece is conveyed in the vertical direction, and the direction from the second conveyance roller 25g to the winding reel 25m is along the installation surface of the apparatus (about Carry the workpiece horizontally. Therefore, the setting space becomes delicate.

After the control device 26 conveys the workpiece F for a period of time by the transport mechanism 25, the positioning marks (for example, ○) drawn on each of the workpieces F and the positioning marks (for example, ○) of the mask M are integrated before exposure.

The control device 26 has mark acquisition devices 26a and 26b that acquire a positioning mark of the workpiece F and the mask M, and includes a half mirror (not shown), a CCD camera, and the like, and input image signals from the mark acquisition devices 26a and 26b. The image processing device 26c processes the image and outputs the image signal. The image processing device 26c performs image processing on the positioning marks of the workpiece F and the mask M. As a result of the image processing, the positional deviation amount of the positioning mark is calculated, and the mask M is moved in accordance with the positional deviation amount from the positioning mark, whereby the amount of positional deviation between the estimated F and the mask M is zero. Further, the control device 26 includes a device control device that receives and transmits a control signal between the second guide roller 25c of the transport mechanism 25, the first transport roller 25f, the second transport roller 25g, and the third guide roller 25h. 26d. In the device control device 26d, when the position deviation amount of the positioning mark is larger than the threshold value, the second guide roller 25c and the third guide roller 25h are made to correct the workpiece conveyance amount of the next stage and the selected tilt posture. The amount of conveyance of the first conveyance roller 25f and the second conveyance roller 25g is controlled by moving in the axial direction of the roller.

In order to measure the thickness of the workpiece F, the control device 26 further has a workpiece surface position measuring device 26e composed of a contact or non-contact displacement measuring device. The workpiece surface position measuring device 26e measures whether or not the thickness of the workpiece F varies only at a certain position in the optical axis direction of the Dyson optical system from the reference position of the exposure stage 24 (the focus position of the general workpiece thickness). Then, the exposure stage 24 is moved only with the focus shift amount, thereby completing the focusing of the workpiece F.

Further, the mark acquisition devices 26a and 26b and the workpiece surface position measuring device 26e move to the exposure region before the exposure to photograph the positioning mark, and retreat at the time of exposure to move to a position other than the optical path. Moreover, the control device 26 performs adjustment control of the projection magnification of the mask image of the mask M projected by the Dyson optical system 23, and opening/closing control of a shutter mechanism (not shown), if necessary.

Fig. 3a is a cross-sectional view showing a first conveying roller of the conveying device of the projection exposure apparatus of the present invention, and Fig. 3b is a perspective view showing a part of the first conveying roller omitted.

As shown in Fig. 3, the first transport roller 25f has a plurality of small holes 25F _{1 formed} on the entire circumference. Then, one end of the shaft portion of the first transport roller 25f is coupled to the control motor 25F ₂ , and the other end is connected to the vacuum tube 25F _{3 of} a vacuum pump (not shown) via the rotary coupler 25f4. Accordingly, the first conveying roller 25f to control when to do 25F ₂ intermittently rotating motor, a position corresponding to the work roll angle of the workpiece to be attracted F without slipping, while the period of delivery to a predetermined position. Further, the second transport roller 25g has the same structure as the first transport roller 25f. Further, it is preferable that all of the rollers from the first guide roller 25b to the fourth guide roller 25i have the same structure as the first transport roller 25f.

<Operation of Projection Exposure Device 20>

Next, the operation of the projection exposure apparatus 20 will be described.

In the projection exposure apparatus 20, when a section which is an exposure unit of the workpiece F is fed out at the exposure stage 24, the first conveyance roller 25f, the second conveyance roller 25g, the second guide roller 25c, and the third guide are driven and controlled. Roller 25h. At this time, the workpiece F guided by the first guide roller 25b and the second guide roller 25c is in a state of maintaining tension by the first inflation container 25D, and is also in the first guide roller 25b and the second guide. The state of being rolled out between the rollers 25c. Therefore, the amount of unwinding is often sent to the side of the exposure stage 24 while the tension of the workpiece F is maintained in the adjusted state. Similarly, the workpiece F guided by the third guide roller 25h and the fourth guide roller 25i is in a state of maintaining tension by the second inflation container 25J, and is in the third guide roller 25h and the fourth guide. The state of being rolled out between the rollers 25i. Therefore, the amount of unwinding is often sent to the side of the exposure stage 24 while the tension of the workpiece F is maintained in the adjusted state.

The transport mechanism 25 drives the supply reel 25a and the first guide roller 25b so that the amount of the workpiece F in the first inflation container 25D (between the first guide roller 25b and the second guide roller 25c) is constant. . Further, in order to make the amount of the workpiece F in the second inflation container 25J (between the third guide roller 25h and the fourth guide roller 25i) constant, the fourth guide roller 25i and the winding reel 25m are driven. . In the transport mechanism 25 as described above, the workpiece F supplied from the supply reel 25a, the workpiece F conveyed to the exposure stage, and the workpiece F wound around the winding reel 25m are not interlocked. That is, it is possible to operate at the positions of the first inflation container 25D and the second inflation container 25J, respectively.

In the exposure projection apparatus 20, the workpiece F conveyed by the conveyance mechanism 25 to the exposure stage 24 is vacuum-adsorbed and fixed on the exposure stage 24. Then, the mark acquisition devices 26a and 26b and the workpiece surface position measuring device 26e are inserted between the Dyson optical system 23 and the exposure stage 24. Since the mark acquisition devices 26a and 26b grasp the position of the workpiece that is attracted and fixed by the exposure table 24, the positioning marks of the workpiece F are photographed. Then, the image processing device 26c calculates the positional shift amount of the workpiece F and the reticle M. The device control device 26d moves the mask M based on the position shift amount so that the positional deviation amount between the workpiece F and the mask M is zero. Further, the workpiece surface position measuring device 26e measures the surface position of the workpiece F. Then, with respect to the focus shift amount, the exposure stage 24 is still attracted to the fixed workpiece F, and is moved in the optical axis direction, whereby the focus shift amount is made zero.

The mark acquisition devices 26a and 26b are evacuated from between the Dyson optical system 23 and the exposure stage 24 after the shooting is completed. Then, the ultraviolet light from the light source mechanism 21 is irradiated to the mask M, and the circuit pattern of the mask M is exposed to a workpiece F via the Dyson optical system 23. Then, the workpiece F is released from the vacuum of the exposure stage 24, and a new piece of the workpiece F is sent to the exposure stage 24. Each of these assignments is repeated.

Further, the transport mechanism 25 can appropriately carry the workpiece F and can reduce the installation space. Further, by using the Dyson optical system 23 and the light source mechanism 21 as the projection optical means, the size in the height direction can be suppressed. Therefore, when the projection exposure apparatus 20 is installed in the clean room, the space to be installed is smaller than that of the conventional one.

The embodiments of the exposure apparatus and the exposure method of the present invention are described in detail above with reference to the drawings, and the present invention is not limited to the embodiments, and various modifications can be made without departing from the scope of the invention. For example, the first and second tension adjusting devices may be described as an example in which the tension is adjusted by the weight of the workpiece itself, and the air is blown into the workpiece F to adjust the tension of the workpiece F.

In the above embodiment, the workpiece F which is not perforated is described. However, the perforation f of the hole formed in the longitudinal direction at a predetermined interval on both sides may be used. In the case of using such a workpiece F, the conveyance amount of the workpiece F is measured by counting with a photo interrupter by using a perforation. Further, the edge of the perforation is detected at the time of positioning to detect the position of the workpiece F.

20. . . Projection exposure device

twenty two. . . Mask retaining frame

twenty four. . . Exposure station

F. . . Film strip workpiece

M. . . Mask

25. . . Transport mechanism

25a. . . Supply reel

25d. . . Box (first inflatable container)

25f. . . First carrying roller

25g. . . Second carrying roller

25h. . . Third guide roller

25i. . . Fourth guide roller

25m. . . Winding reel

25j. . . Box (second inflatable container)

26. . . Control device

26a, 26b. . . Mask acquisition device

26c. . . Image processing device

26d. . . Device control device

26e. . . Workpiece surface position measuring device

twenty one. . . Light source mechanism (projection optical mechanism)

twenty three. . . Dyson Optics (Projection Optics)

25J. . . Second inflation container (second tension adjusting device)

25D. . . First inflation container (first tension adjusting device)

25b. . . First guide roller (supply side first guide roller)

25c. . . Second guide roller (feeding side second guide roller)

Fig. 1 is a perspective view of the entire projection exposure apparatus of the present invention.

Fig. 2 is a side view showing the arrangement of a transport mechanism of the projection exposure apparatus of the present invention.

Fig. 3a is a cross-sectional view showing the first conveying roller in the conveying device of the projection exposure apparatus of the present invention.

Figure 3b is a perspective view of a portion of the first carrying roller omitted.

Fig. 4 is a front elevational view of the entire exposure apparatus.

Fig. 5 is a front elevational view showing the entirety of a conventional projection exposure apparatus.

20. . . Projection exposure device

twenty one. . . Light source mechanism (projection optical mechanism)

21a. . . ultra violet light

21b. . . Elliptical mirror

21c. . . Reflector

21d. . . Compound eye lens

twenty two. . . Mask retaining frame

twenty three. . . Dyson Optics (Projection Optics)

23a. . . Incident side convex lens

23b. . . Radon reflector

23c. . . Exit convex lens

23d. . . Reflective convex lens

23e. . . Concave mirror

twenty four. . . Exposure station

24a. . . Countertop (vertical surface)

25. . . Transport mechanism

25D. . . First inflation container (first tension adjusting device)

25J. . . Second inflation container (second tension adjusting device)

25a. . . Supply reel

25b. . . First guide roller (supply side first guide roller)

25c. . . Second guide roller (feeding side second guide roller)

25d. . . Box (first inflatable container)

25f. . . First carrying roller

25g. . . Second carrying roller

25h. . . Third guide roller

25i. . . Fourth guide roller

25j. . . Box (second inflatable container)

25m. . . Winding reel

26. . . Control device

26a, 26b. . . Mask acquisition device

26c. . . Image processing device

26d. . . Device control device

26e. . . Workpiece surface position measuring device

F. . . Film strip workpiece

M. . . Mask

Claims (4)

A projection exposure apparatus that exposes a pattern of a mask by projection light onto a film-shaped workpiece by using an exposure stage disposed in a vertical direction, and includes a transport mechanism that directs the workpiece toward the exposure stage in a vertical direction And a projection optical mechanism having a Dyson optical system, the exposure stage being adjacent to a boundary with the transport mechanism, wherein the Dyson optical system is incident on the illumination light of the Dyson optical system The optical axis and the optical axis of the illumination light emitted from the Dyson optical system are arranged to be orthogonal to the workpiece on the exposure stage; wherein the transport mechanism includes a supply reel that feeds the workpiece, and guides the delivery from the supply reel a supply side first guide roller and a supply side second guide roller of the workpiece, and the workpiece guided between the supply side first guide roller and the supply side second guide roller a first tension adjusting device for tensioning, wherein the workpiece from the supply-side second guide roller is conveyed along the exposure stage and disposed first above and below the exposure stage a conveyance roller and a second conveyance roller, and a winding-side first guide roller and a winding-side second guide roller that guide the workpiece from the second conveyance roller, and from the winding side a second tension adjusting device for applying tension between the guide roller and the winding guide second guide roller, and winding the workpiece from the winding side second guide roller Winding reel; wherein the supply reel, the supply side first guide roller, The supply-side second guide roller, the first tension adjustment device, and the workpiece supply-side conveyance path of the first conveyance roller are disposed on the second conveyance roller and the winding-side first guide roller a winding side second guide roller, the second tension adjusting device, and a workpiece winding side conveyance path of the winding reel; and the supply reel constituting the workpiece supply side conveyance path to the first conveyance The workpiece conveyance direction until the roller is arranged to be inclined downward, and the second conveyance roller constituting the winding side conveyance path is disposed so as to be inclined upward so that the two conveyance paths are parallel, wherein The first tension adjusting device and the second tension adjusting device are disposed in a vertically aligned position. The projection exposure apparatus according to claim 1, wherein the transport mechanism transports the workpiece without holding the workpiece, and the workpiece is carried by the first transport roller and the second transport roller Position adjustment in the vertical direction, and the tilting position adjustment by the movement of the supply side second guide roller and the winding side first guide roller in the direction of the guide roller axis with respect to the conveyance direction of the workpiece It is composed. The projection exposure apparatus according to claim 2, wherein the exposure stage is movable in an optical axis direction of the illumination light emitted from the Dyson optical system. The projection exposure apparatus according to claim 3, further comprising: a workpiece surface position measuring device configured to be inserted into and exposed from the exposure region between the Dyson optical system and the exposure stage a position of the surface of the workpiece in the optical axis direction is measured, and a mark acquisition device is disposed so as to be insertable into an exposure region between the Dyson optical system and the exposure stage, and retracted from the exposure area to acquire an image. Determining a positional shift amount of the workpiece in a direction orthogonal to the optical axis direction, wherein the exposure stage is moved in the optical axis direction and obtained according to the mark according to the surface position information measured by the workpiece surface position measuring device The information of the positional offset measured by the device causes the reticle to move.