TWI384568B - Reticle inspection system and program - Google Patents
Reticle inspection system and program Download PDFInfo
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- TWI384568B TWI384568B TW097131907A TW97131907A TWI384568B TW I384568 B TWI384568 B TW I384568B TW 097131907 A TW097131907 A TW 097131907A TW 97131907 A TW97131907 A TW 97131907A TW I384568 B TWI384568 B TW I384568B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
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Description
本發明係有關於一種為進行所希望的曝光而進行是否製作了光罩資料(reticle data)驗證的光罩驗證系統,特別是有關於一種進行平板顯示器製作用光罩資料驗證的光罩驗證系統。The present invention relates to a reticle verification system for performing reticle data verification for performing a desired exposure, and more particularly to a reticle verification system for verifying reticle data for flat panel display fabrication. .
平板顯示器(FPD)製作用光罩資料在面板佈局資料上規定拍攝框,作為曝光要素(以下也稱為重複要素)剪切製作,包括上述曝光要素的圖形資料及表示面板基板上的曝光位置的座標資訊。利用上述光罩資料轉印到FPD面板基板上時,使用上述光罩資料的配置曝光要素的座標資訊,在曝光裝置中轉印到FPD的面板基板上。The flat panel display (FPD) production reticle data defines a shooting frame on the panel layout data, and is cut as an exposure element (hereinafter also referred to as a repeating element), including the graphic material of the exposure element and the exposure position on the panel substrate. Coordinate information. When the reticle data is transferred onto the FPD panel substrate, the coordinate information of the exposure element disposed using the reticle data is transferred to the panel substrate of the FPD in the exposure device.
此時,當光罩上設置的曝光要素的圖形資料或上述座標資訊中存在錯誤時,不僅浪費光罩,而且浪費面板基板。尤其是在製作平板顯示器用的光罩資料時,需要人力進行曝光區域分割的情況較多,易產生錯誤。At this time, when there is an error in the graphic material of the exposure element or the coordinate information provided on the photomask, not only the photomask but also the panel substrate is wasted. In particular, when producing a mask material for a flat panel display, it is necessary to manually divide the exposure region, and it is easy to cause an error.
為了防止這一點,考慮根據光罩圖像資料和座標資訊模擬曝光裝置並進行驗證的方法。其中,在曝光裝置和模擬的關係中,例如包括實現曝光裝置的成本優化的技術。專利文獻1提供如下方法:使用模擬器,在曝光裝置中降低時間和勞力,優化測量條件的測量條件優化方法。但 是,專利文獻1僅僅公開了想要進行測量條件優化的發明。In order to prevent this, a method of simulating an exposure device based on mask image data and coordinate information and performing verification is considered. Among them, in the relationship between the exposure device and the simulation, for example, a technique for realizing cost optimization of the exposure device is included. Patent Document 1 provides a method of optimizing a measurement condition for optimizing measurement conditions by using a simulator, reducing time and labor in an exposure apparatus. but Yes, Patent Document 1 only discloses an invention that is intended to optimize measurement conditions.
一般情況下,平板顯示器用的面板基板的大小是遠遠超過曝光裝置的曝光範圍的大小。因此,安裝在曝光裝置的光罩小於面板基板,在光罩上將剪切了面板基板上的一部分的要素作為曝光要素配置。In general, the size of the panel substrate for a flat panel display is much larger than the exposure range of the exposure device. Therefore, the reticle attached to the exposure apparatus is smaller than the panel substrate, and an element on the reticle that cuts a part of the panel substrate is disposed as an exposure element.
使用光罩通過曝光裝置曝光時,反復配置光罩上的曝光要素進行曝光,從而製造出平板顯示器用面板基板。When the mask is exposed by the exposure device, the exposure elements on the mask are repeatedly placed and exposed to produce a panel substrate for a flat panel display.
因此,在製作光罩時,進行顯示面板區域的分割和顯示器佈局資料的切斷,製作光罩的曝光要素等,另一方面,製作顯示面板時,通過反復曝光製作面板基板,因此在佈局資料切斷和曝光要素反復配置時,易產生錯誤。Therefore, when the reticle is produced, the division of the display panel area and the cutting of the layout data are performed, and the exposure elements of the reticle are produced. On the other hand, when the display panel is produced, the panel substrate is produced by repeated exposure, so that the layout data is When the cut and exposure elements are repeatedly configured, errors are likely to occur.
並且,即使在不伴隨佈局資料切斷的情況下,也需要顯示面板區域的分割,因此必須實施曝光要素的反復配置的指定。此時,存在產生反復配置的指示錯誤的情況非常多。因此,要求在製造的前工序中預先驗證曝光結果的驗證單元。Further, even when the layout data is not cut, it is necessary to divide the display panel area. Therefore, it is necessary to designate the repeated arrangement of the exposure elements. At this time, there are many cases where an instruction error that causes repeated arrangement occurs. Therefore, it is required to verify the verification unit of the exposure result in advance in the pre-production process.
【特許文獻1】日本特開2006-140204號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2006-140204
本發明的課題在於提供一種可預先驗證設置於光罩上的曝光要素的曝光結果的光罩驗證系統。An object of the present invention is to provide a mask verification system that can preliminarily verify an exposure result of an exposure element provided on a photomask.
並且,本發明的課題在於提供一種藉由模擬曝光裝置的動作,而可預先驗證曝光要素的曝光結果的光罩驗證系統。Further, an object of the present invention is to provide a mask verification system capable of preliminarily verifying an exposure result of an exposure element by the operation of the analog exposure apparatus.
並且,本發明的課題在於提供一種由電腦執行、適於構建上述光罩驗證系統的光罩驗證用程式。Further, an object of the present invention is to provide a mask verification program that is executed by a computer and is suitable for constructing the mask verification system.
根據本發明,提供一種光罩驗證系統,其係包含:一存儲單元,係存儲平板顯示器曝光用光罩中含有的曝光要素之圖形資料、與由網格格子點的座標表現,表示顯示面板上之上的曝光要素的曝光位置的座標資訊;一佈局圖形要素產生單元,係根據存儲單元中存儲的曝光要素的圖形資料與座標資訊,產生和曝光要素對應的顯示面板上的佈局圖形要素;一驗證單元,係根據佈局圖形要素產生單元所產生之顯示面板上的複數佈局圖形要素的位置關係,驗證曝光要素;以及一顯示單元,係顯示驗證單元驗證的結果。According to the present invention, there is provided a reticle verification system, comprising: a storage unit for storing graphic data of an exposure element contained in a reticle for exposure of a flat panel display, and a coordinate representation of a grid dot, indicating on the display panel a coordinate information of an exposure position of the exposure element; a layout graphic element generation unit generates a layout graphic element on the display panel corresponding to the exposure element according to the graphic data and the coordinate information of the exposure element stored in the storage unit; The verification unit verifies the exposure element according to the positional relationship of the plurality of layout graphic elements on the display panel generated by the layout graphic element generation unit; and a display unit displays the result of the verification unit verification.
佈局圖形要素產生單元係根據存儲單元中存儲的曝光要素的圖形資料與座標資訊,產生與曝光要素對應的顯示面板上的佈局圖形要素。檢測單元係根據佈局圖形要素產生單元產生之顯示面板上的複數佈局圖形要素的位置關係,驗證曝光要素。顯示單元係顯示驗證單元驗證的結果。The layout graphic element generation unit generates a layout graphic element on the display panel corresponding to the exposure element according to the graphic data and the coordinate information of the exposure element stored in the storage unit. The detecting unit verifies the exposure element according to the positional relationship of the plurality of layout graphic elements on the display panel generated by the layout graphic element generating unit. The display unit displays the results of the verification unit verification.
其中,顯示單元係至少具有顯示驗證結果的視窗,驗證單元係通過進行與複數佈局圖形要素對應的網格格子之間的計算處理,驗證複數曝光要素,顯示單元將驗證單元的驗證結果所獲得的圖形顯示到視窗上。Wherein, the display unit has at least a window for displaying the verification result, and the verification unit verifies the plurality of exposure elements by performing calculation processing between the grid grids corresponding to the plurality of layout pattern elements, and the display unit obtains the verification result of the verification unit. The graphic is displayed on the window.
並且,光罩的資料係含有定義電晶體圖形的中間層、或作為中間層用之已定義電晶體圖形的外部資料庫,且包 含有一依據指標構造而使定義該電晶體圖形的中間層或外部資料庫因應需要而展開所具有之表格構造的展開單元。Moreover, the data of the reticle contains an intermediate layer defining a transistor pattern, or an external database of defined transistor patterns used as an intermediate layer, and An unfolding unit having a table structure that expands according to the needs of the intermediate layer or the external database defining the transistor pattern according to the index structure.
並且,驗證單元係具有一差異抽取單元,其在進行了二個佈局圖形要素的邏輯OR處理後,進行任意一個佈局圖形要素和與邏輯OR結果所獲得的圖形要素中的該佈局圖形要素所對應的區域的邏輯XOR處理或差分處理,從而抽取二個佈局圖形要素的差異。Further, the verification unit has a difference extraction unit that performs logical OR processing of the two layout graphic elements, and performs any one of the layout graphic elements and the layout graphic elements in the graphic elements obtained by the logical OR result. The logical XOR processing or differential processing of the regions extracts the differences between the two layout graphic elements.
並且,驗證單元係包含有一重疊量檢測單元,其係通過進行二個佈局圖形要素的邏輯AND處理,檢測出二個佈局圖形要素的重疊量。Further, the verification unit includes an overlap amount detecting unit that detects the overlap amount of the two layout pattern elements by performing logical AND processing of the two layout pattern elements.
並且,驗證單元係包含有一偏移驗證單元,其係驗證重疊量檢測單元檢測出的重疊量是否滿足所指示的偏移值。And, the verification unit includes an offset verification unit that verifies whether the amount of overlap detected by the overlap amount detecting unit satisfies the indicated offset value.
並且,驗證單元係包含有一要素判斷單元,其係在重疊量檢測單元檢測出沒有上述二個佈局圖形要素的重疊量後,進行邏輯OR處理,當確認了二個佈局圖形要素形成關閉的一個圖形的結果時,判斷二個佈局圖形要素是連續的圖形要素。Further, the verification unit includes a component determination unit that performs logical OR processing after the overlap amount detecting unit detects that there is no overlap amount of the two layout graphic elements, and confirms that two layout graphic elements form a closed graphic. As a result, it is judged that the two layout graphic elements are continuous graphic elements.
並且,各曝光要素中係含有圖形要素及包圍圖形要素的預定寬的百葉框,驗證單元係包含有一終點驗證單元,其係對於與百葉框內邊緣對應的顯示面板上的網格格子,驗證在規定偏移值的範圍內是否存在圖形要素的佈局圖形要素的終點。Moreover, each exposure element includes a graphic element and a predetermined wide louver frame surrounding the graphic element, and the verification unit includes an end point verification unit for verifying the grid grid on the display panel corresponding to the inner edge of the louver frame. Whether the end point of the layout graphic element of the graphic element exists within the range of the specified offset value.
並且,包含有一指定單元,其係指定含有錯誤的驗證結果的錯誤層,當顯示單元在表示驗證結果的視窗上顯示錯誤圖形資訊時,以層單位在上述視窗上顯示指定單元指定的錯誤層的錯誤圖形資訊。And, a specified unit is included, which specifies an error layer containing an erroneous verification result. When the display unit displays the error graphic information on the window indicating the verification result, the error layer specified by the specified unit is displayed on the window in a layer unit. Error graphic information.
並且,顯示單元係具有與顯示驗證結果的視窗不同的對話方塊,指定單元在對話方塊上指定該錯誤層,顯示單元在對話方塊上顯示錯誤個數,並且回應指定單元對錯誤層的指定,將該層的錯誤圖形資訊顯示到視窗上。And, the display unit has a dialog box different from the window for displaying the verification result, the specifying unit specifies the error layer on the dialog box, the display unit displays the number of errors on the dialog box, and responds to the designation of the error layer by the designated unit, The wrong graphic information of this layer is displayed on the window.
並且,根據本發明,提供一種程式(電腦用程式產品),其係一電腦具有上述任意一項所述之光罩驗證系統之機能。Further, according to the present invention, there is provided a program (computer program product) which is a computer having the function of the photomask verification system according to any one of the above.
電腦通過執行上述程式,以使其具有上述任意一項所述之光罩驗證系統之機能。The computer executes the above program to have the function of the photomask verification system described in any of the above.
依據本發明之光罩驗證系統,其係可預先驗證設置於光罩的曝光要素的曝光結果。According to the reticle verification system of the present invention, it is possible to pre-verify the exposure result of the exposure element provided in the reticle.
並且,經由模擬曝光裝置的動作,而可預先驗證曝光要素的曝光結果。Further, the exposure result of the exposure element can be verified in advance by the operation of the analog exposure device.
並且,依據本發明之程式由電腦執行,從而可構築上述光罩資料曝光驗證系統。Moreover, the program according to the present invention is executed by a computer, so that the above-mentioned reticle data exposure verification system can be constructed.
以下說明本發明的實施方式涉及的光罩驗證系統及光罩驗證用程式。 或多台電腦、及通過上述電腦的執行而構建光罩驗證系統的光罩驗證用程式構成,對此稍後詳述。上述電腦通過執行光罩資料製作用程式,從而作為用於製作光罩資料的光罩資料製作系統而起作用。並且,在各圖中,對同一部分標以同一標號。Hereinafter, a mask verification system and a mask verification program according to an embodiment of the present invention will be described. Or a plurality of computers, and a mask verification program for constructing a mask verification system by execution of the above computer, which will be described later in detail. The above-mentioned computer functions as a reticle data creation system for producing reticle data by executing a reticle data creation program. In the drawings, the same parts are denoted by the same reference numerals.
圖1是表示本實施方式中的平板顯示器(FPD)用面板基板和光罩的關係的圖,圖(a)是平面圖,圖(b)是側面圖。1 is a view showing a relationship between a panel substrate for a flat panel display (FPD) and a photomask according to the embodiment, wherein (a) is a plan view and (b) is a side view.
在圖1中,101是面板基板,102是保證了特性的曝光裝置(未圖示)的曝光區域,103是曝光裝置的可曝光區域,104是光源系統機構,105是遮光系統機構,106是光罩,107是曝光面。其中,面板基板101的材質可使用玻璃、塑膠膜等。In Fig. 1, 101 is a panel substrate, 102 is an exposure area of an exposure device (not shown) that ensures characteristics, 103 is an exposure area of the exposure device, 104 is a light source system mechanism, 105 is a light shielding system mechanism, and 106 is The mask, 107 is the exposure surface. Among them, glass, a plastic film, or the like can be used as the material of the panel substrate 101.
近些年的平板顯示器,像液晶顯示器、等離子體顯示器這樣變得大型化,曝光裝置無法統一曝光面板基板101(參照圖1 (a)的平面圖)。因此,需要以某種形式來分割曝光區域,進行反復曝光。曝光裝置和面板基板101的位置關係從光源一側來看,是光源系統機構104、遮光系統機構105、光罩106、曝光面107、面板基板101,在圖1中雖然未記載,但還在其中添加有透鏡系統機構(參照圖1 (b)的側面圖)。In recent years, flat panel displays have been enlarged in size such as liquid crystal displays and plasma displays, and the exposure apparatus cannot collectively expose the panel substrate 101 (see the plan view of Fig. 1(a)). Therefore, it is necessary to divide the exposure area in some form and perform repeated exposure. The positional relationship between the exposure device and the panel substrate 101 is the light source system mechanism 104, the light shielding system mechanism 105, the mask 106, the exposure surface 107, and the panel substrate 101 as seen from the light source side. Although not shown in FIG. 1, it is still A lens system mechanism is added thereto (see the side view of Fig. 1 (b)).
此外,遮光系統機構105是指可將來自光源的光機械性遮蔽的長方形的機械機構。Further, the light shielding system mechanism 105 refers to a rectangular mechanical mechanism that can mechanically shield light from a light source.
圖2是表示本發明的實施方式中的面板基板上的面板 佈局資料和光罩上的光罩佈局資料的關係的圖。2 is a view showing a panel on a panel substrate in an embodiment of the present invention. A diagram of the relationship between the layout data and the reticle layout material on the reticle.
在圖2中,液晶面板201係在面板基板210上存在一作為面板佈局資料211的一種大型面板佈局資料A1的例子。在液晶面板201的情況下,係分割面板佈局資料A1,以將具有重複構造的資料群對應拍攝框213抽取,並將其配置在光罩205上,而作為光罩佈局資料206。In FIG. 2, the liquid crystal panel 201 has an example of a large panel layout material A1 as the panel layout material 211 on the panel substrate 210. In the case of the liquid crystal panel 201, the panel layout material A1 is divided to extract the data group corresponding shooting frame 213 having a repeating structure, and is placed on the mask 205 as the mask layout material 206.
通常這種情況下,伴隨著面板佈局資料A1的切斷而進行曝光區域的分割。在本實施方式中,將面板佈局資料的各個被分割的要素(面板佈局要素)所對應的光罩佈局資料的各要素稱為曝光要素或重複要素。光罩佈局資料由複數曝光要素構成。並且,212係為保證了特性的曝光區域。Usually, in this case, the division of the exposure region is performed along with the cutting of the panel layout material A1. In the present embodiment, each element of the mask layout material corresponding to each divided element (panel layout element) of the panel layout material is referred to as an exposure element or a repeating element. The mask layout data consists of multiple exposure elements. Further, 212 is an exposure area in which characteristics are ensured.
液晶面板202係表示存在作為面板佈局資料之中型面板佈局資料A2和A3的情況。這種情況下,也對面板佈局資料A2和A3進行伴隨著面板佈局資料的切斷的曝光區域分割,通常將具有重複構造的資料群與拍攝框213對應製作。The liquid crystal panel 202 indicates that there is a case where the pattern layout materials A2 and A3 are among the panel layout materials. In this case as well, the panel layout data A2 and A3 are divided into exposure areas along with the cutting of the panel layout data, and a data group having a repeating structure is usually produced in association with the imaging frame 213.
液晶面板203係表示作為面板佈局資料的複數小型面板佈局資料A4和A5排列在面板基板上的情況。這種情況下,使複數面板佈局資料A4和複數面板佈局資料A5與各拍攝框213對應產生,需要將該產生的光罩佈局資料206配置在光罩205上以減少曝光次數的操作。因此,通常這種情況下,需要曝光區域的分割,但不進行面板佈局資料的切斷。The liquid crystal panel 203 indicates a case where a plurality of small panel layout materials A4 and A5 as panel layout materials are arranged on a panel substrate. In this case, the plurality of panel layout data A4 and the plurality of panel layout materials A5 are generated corresponding to the respective shooting frames 213, and it is necessary to arrange the generated mask layout data 206 on the mask 205 to reduce the number of exposures. Therefore, in this case, generally, the division of the exposure area is required, but the panel layout data is not cut.
液晶面板204是中型面板佈局資料A2和小型面板佈局資料A4、A5三種面板佈局資料存在於面板基板上的情況。這種情況下,中型面板佈局資料A2進行伴隨著面板佈局資料切斷的曝光區域分割,與拍攝框213對應產生,小型佈局資料A4、A5進行不伴隨面板佈局資料切斷的曝光區域分割,與拍攝框213對應產生,作為光罩佈局資料206。The liquid crystal panel 204 is a case where the medium panel layout material A2 and the small panel layout materials A4 and A5 are present on the panel substrate. In this case, the medium-sized panel layout data A2 is divided by the exposure area that is cut along with the panel layout data, and is generated corresponding to the imaging frame 213, and the small layout materials A4 and A5 are divided into exposure areas that are not cut off with the panel layout data, and The shooting frame 213 is correspondingly generated as the mask layout material 206.
因此,製作光罩時,從面板基板210的面板佈局資料211等中抽取具有重複構造的資料群,將其作為複數拍攝框213配置在光罩205上,製作光罩佈局資料。此時,通用性較強,抽取出較大的拍攝框區域。Therefore, when the reticle is produced, the data group having the repetitive structure is extracted from the panel layout material 211 of the panel substrate 210, and the photographic frame 213 is placed on the reticle 205 to create the reticle layout data. At this time, the versatility is strong, and a large frame area is extracted.
在任意一種情況下,通過進行曝光裝置模擬來確認沒有錯誤資料這一點是很重要的。這是因為,即使在不伴隨面板佈局資料的切斷的情況下,進行重複配置的曝光區域的分割也是必須的,指定該重複配置時,易產生錯誤。此外,光罩資料中的拍攝框資料成為設定了百葉框的圖形要素,將其稱為曝光要素或重複要素。In either case, it is important to confirm that there is no erroneous data by performing an exposure device simulation. This is because even if the panel layout data is not cut off, the division of the exposure area in which the arrangement is repeatedly performed is also necessary, and when the repeated arrangement is designated, an error is likely to occur. In addition, the frame data in the mask data is a graphic element in which the louver frame is set, and is referred to as an exposure element or a repeating element.
在說明本發明的實施方式涉及的光罩驗證系統前,首先簡要說明光罩資料的製作順序。Before explaining the reticle verification system according to the embodiment of the present invention, first, the production sequence of the reticle data will be briefly described.
圖3及圖4是表示由面板佈局資料製作光罩資料時的一般的處理順序的圖,圖3是表示光罩驗證系統(製作光罩時,作為光罩製作系統起作用)的顯示部1的顯示內容的圖,圖4是表示構成光罩製作系統的CPU(未圖示)的處理步驟的流程圖。3 and FIG. 4 are views showing a general processing procedure when the mask data is created from the panel layout data, and FIG. 3 is a display unit 1 showing the mask verification system (when the mask is used, it functions as a mask manufacturing system) FIG. 4 is a flowchart showing a processing procedure of a CPU (not shown) constituting the mask manufacturing system.
圖3 (a)表示面板基板210上的面板佈局資料211,圖3 (b)表示對面板基板210上的拍攝框213的設定、及對光罩205上的拍攝框213的配置,圖3 (c)表示通過進行面板基板210上的面板佈局資料211的切斷(例如沿著拍攝框213的切斷)而產生的抽取、進行校正圖案(未圖示)產生及百葉框(未圖示)產生時的處理。3(a) shows the panel layout data 211 on the panel substrate 210, and FIG. 3(b) shows the setting of the imaging frame 213 on the panel substrate 210 and the arrangement of the imaging frame 213 on the mask 205, FIG. 3 ( c) shows the extraction by the panel layout material 211 on the panel substrate 210 (for example, cutting along the imaging frame 213), the generation of a correction pattern (not shown), and the louver frame (not shown). Processing at the time of production.
並且,圖3 (d)表示從光罩設計系統輸出的光罩的座標資訊。上述座標資訊包括:作為曝光要素資料的與各拍攝框對應的光罩佈局資料(在本實施方式中也稱為曝光要素或重複要素)的寬和高的資訊、重複配置重複要素的位置的資訊(重複配置資訊)。Further, Fig. 3(d) shows the coordinate information of the reticle output from the reticle design system. The coordinate information includes information on the width and height of the mask layout data (also referred to as an exposure element or a repeating element in the present embodiment) as the exposure element data, and information on the position of the repeated arrangement of the repeated elements. (Repeat configuration information).
使用圖3及圖4概要說明光罩資料的製作處理,製作光罩資料時,首先CPU讀入面板佈局資料211(步驟S401),在面板基板210上對面板佈局資料211設定複數拍攝框213,將拍攝框213配置在光罩205上,製作光罩佈局資料206(步驟S402)。The fabrication process of the mask data will be briefly described with reference to FIGS. 3 and 4. When the mask data is created, the CPU first reads the panel layout data 211 (step S401), and sets a plurality of frame 213 for the panel layout data 211 on the panel substrate 210. The imaging frame 213 is placed on the mask 205, and the mask layout data 206 is created (step S402).
接著,根據拍攝框213進行曝光區域的分割。此時,通常在指定的拍攝框213的正下方存在佈線資料,因此必須將其切斷。其中包括在資料切斷部分產生比上述切斷部分寬的圖案(校正圖案)的情況(步驟S403、S404)及不產生的情況(步驟S405)。Next, the segmentation of the exposure region is performed in accordance with the imaging frame 213. At this time, the wiring material is usually present immediately below the designated shooting frame 213, so it must be cut. This includes a case where a pattern (correction pattern) wider than the cut portion is generated in the data cutting portion (steps S403, S404) and a case where it is not generated (step S405).
不產生校正圖案時,使拍攝框213重疊並定義後,前進到處理步驟S406(步驟S405)。通過這一構成,在曝光時,通過使曝光資料本身多重曝光,可防止微小偏差引起 的資料的誤切斷。When the correction pattern is not generated, the shooting frame 213 is superimposed and defined, and then the process proceeds to process step S406 (step S405). With this configuration, small exposure can be prevented by multiple exposure of the exposure data itself during exposure. The information was cut off by mistake.
產生校正圖案時,在校正圖案產生後,前進到處理步驟S406(步驟S403、S404)。產生校正圖案時,校正圖案本身一般被多重曝光,結果防止了微小偏差引起的誤切斷。When the correction pattern is generated, after the correction pattern is generated, the process proceeds to process step S406 (steps S403, S404). When the correction pattern is generated, the correction pattern itself is generally subjected to multiple exposures, with the result that false cuts caused by minute deviations are prevented.
在處理步驟S402中,不伴隨資料切斷的曝光區域的分割中,直接移動到包圍曝光區域的規定寬的框(百葉框)的產生處理(步驟S406)。In the processing step S402, in the division of the exposure region without the data cut, the processing for generating a predetermined wide frame (louver frame) surrounding the exposure region is directly performed (step S406).
在處理步驟S406的百葉框產生處理中,以指定的寬產生百葉框。校正圖案由比佈線圖案寬的圖案構成,並且百葉框的內邊緣與上述校正圖案的外邊緣對應構成。In the louver frame generation processing of the processing step S406, the louver frame is generated with the specified width. The correction pattern is composed of a pattern wider than the wiring pattern, and the inner edge of the louver frame is configured corresponding to the outer edge of the correction pattern described above.
由此能夠製作由曝光區域的資料和百葉框構成的曝光要素(重疊要素)。並且,製作與上述曝光要素建立了對應的座標資訊。Thereby, it is possible to produce an exposure element (overlapping element) composed of the material of the exposure region and the louver frame. Further, coordinate information corresponding to the exposure element is created.
最後,輸出光罩佈局資料及與上述佈局資料對應的座標資訊,結束處理(步驟S407)。上述佈局資料是光罩佈局資料、及追加了拍攝框213的資料的面板佈局資料。Finally, the mask layout data and the coordinate information corresponding to the layout data are output, and the processing is terminated (step S407). The layout data described above is the mask layout data and the panel layout data to which the data of the shooting frame 213 is added.
其中,光罩佈局資料是定義曝光要素的圖形的資訊,是作為圖形資料由長方形圖形、一筆成形圖形、中心線上定義了寬的圖形、及構成這些圖形資料的中間模組構成的資料檔案。The reticle layout data is information for defining a graphic of the exposure element, and is a data file composed of a rectangular graphic, a formed graphic, a wide graphic defined on the center line, and an intermediate module constituting the graphic data.
座標資訊如上所述,是定義光罩佈局資料中含有的曝光要素的曝光位置的資訊,是記載了曝光要素的名稱、高、寬、重複配置資訊(重複次數和配置座標的資訊)的 文字檔案。As described above, the coordinate information is information for defining the exposure position of the exposure element included in the mask layout data, and is a description of the name, height, width, and repeated arrangement information (repetition times and information of the configuration coordinates) of the exposure element. Text file.
並且,光罩資料是指由上述光罩佈局資料及座標資訊構成的資訊。Moreover, the reticle data refers to information composed of the reticle layout information and coordinate information.
圖5是表示面板基板上形成的面板佈局資料的構造的圖。將最上位的模組稱為頂級模組511,存在一個。其他模組均隸屬於該頂級模組511。它們是佈局資料下位模組512~515,也可使其分層。模組具有的佈局資料例如在液晶面板中的情況下包括薄膜電晶體、液晶驅動部的各電晶體的配置資料516、佈線資料517、通孔配置資料518。Fig. 5 is a view showing a structure of panel layout data formed on a panel substrate. The top module is called the top module 511, and there is one. Other modules are affiliated with the top level module 511. They are layout data lower modules 512~515, which can also be layered. The layout data of the module includes, for example, a thin film transistor, a configuration data 516 of each transistor of the liquid crystal driving portion, wiring information 517, and via configuration data 518 in the case of a liquid crystal panel.
這些電晶體、佈線、通孔具有名稱(配置資料為資料庫名,佈線資料為佈線類型名,通孔資料為通孔名),其內容收容在資料庫檔案(配置模組資料庫、佈線類型資料庫、通孔資料庫)519,通過與資料庫名稱一致而得到確認。These transistors, wirings, and vias have names (the configuration data is the database name, the wiring data is the wiring type name, and the through-hole data is the through-hole name), and its contents are stored in the database file (configuration module database, wiring type) The database and through-hole database 519 are confirmed by the same name as the database.
並且,電晶體資料應用較多,因此也存在以資料庫形式獨立於面板佈局資料而被管理的情況。Moreover, since there are many applications of the transistor data, there are cases in which the database is managed independently of the panel layout data.
圖6是表示光罩資料構造的圖。基本上是和面板佈局資料相同的構造。頂級模組521同樣存在一個。頂級模組521下,複數重複要素522、523作為下位模組存在,成為光罩資料的基本單位。Fig. 6 is a view showing a structure of a mask material. Basically the same structure as the panel layout data. The top module 521 also has one. Under the top module 521, the plurality of repeating elements 522 and 523 exist as lower modules, and become the basic unit of the mask data.
作為構成作為曝光要素的重複要素的資料,首先,作為曝光物件資料包括百葉框資料524、校正圖案資料525、切斷的資料及未成為切斷物件的資料526、拍攝框資料527。此外,包括重複要素的寬和高資料528、重複要素配 置資料529、切斷後的拍攝框內佈局的下位模組資料530、配置資料535、通孔資料536。As the material constituting the repeating element as the exposure element, first, the exposed object data includes the louver frame material 524, the correction pattern data 525, the cut data, the data 526 which is not the cut object, and the photographic frame material 527. In addition, including the width and height of the repeating elements 528, repeating elements The data 529, the lower module data 530, the configuration data 535, and the through hole data 536 laid out in the frame after the cutting are set.
模組具有的佈局資料和面板佈局資料一樣,例如在液晶面板的情況下,包括薄膜電晶體或液晶驅動部的各電晶體的配置資料531、佈線資料532、通孔資料533。這些電晶體等的配置資料531、佈線資料532、通孔資料533具有名稱,其內容收容在資料庫檔案(配置模組資料庫、佈線類型資料庫、通孔資料庫、對準標記資料庫)534中,通過與資料庫名稱一致而被確認。The layout data of the module is the same as the panel layout data. For example, in the case of a liquid crystal panel, the configuration data 531 of each transistor including the thin film transistor or the liquid crystal driving portion, the wiring material 532, and the via information 533 are included. The configuration data 531, the wiring data 532, and the through-hole data 533 of these transistors have names, and the contents thereof are stored in the database file (configuration module database, wiring type database, through-hole database, alignment mark database) In 534, it is confirmed by being consistent with the database name.
在面板的情況下,同樣是與所有資料庫檔案名稱一致地確定的資料構造。並且,曝光時不使用,但也保持拍攝框資料。In the case of a panel, it is also a data structure that is consistent with all database file names. Also, it is not used during exposure, but the frame data is also kept.
並且,電晶體資料應用較多,因此也存在以資料庫形式獨立於光罩資料而被管理的情況。Moreover, there are many applications of the transistor data, and therefore there are cases in which the database is managed independently of the mask data.
圖7是對光罩佈局資料的物理層、各資料級及層代碼的例子在金屬一層和二層的情況下表示的表格。Fig. 7 is a table showing an example of a physical layer, each data level, and a layer code of the mask layout data in the case of the metal layer and the second layer.
例如,金屬一層(鋁第1層)時,拍攝框資料為層代碼101,百葉框資料為層代碼102,圖案資料為層代碼104,校正圖案為層代碼105,對金屬二層(鋁第2層)也同樣來規定,使各層代碼獨立,可獨立地處理。這些層代碼在各重複要素中通用。即,只要物理層和資料級相同,在各重複要素之間,層代碼通用。For example, when the metal layer (aluminum layer 1), the frame data is layer code 101, the louver frame data is layer code 102, the pattern data is layer code 104, the correction pattern is layer code 105, and the metal layer 2 (aluminum second layer) Layers) are also specified so that the layers are code independent and can be processed independently. These layer codes are common to each repeating element. That is, as long as the physical layer and the data level are the same, the layer code is common between the repeated elements.
圖6及圖7所示的光罩的資料係最終以檔案輸出,其內容係由長方形圖形、一筆成形圖形、以中心線定義了寬 的圖形、及將集中了這些圖形資料的模組作為中間層模組或資料庫模組之模組所構成。作為中間層模組或資料庫模組使用的是電晶體模組。The data of the reticle shown in Fig. 6 and Fig. 7 is finally output as a file, and the content thereof is a rectangular figure, a shape of a figure, and a width defined by a center line. The graphics, and the modules that concentrate the graphics data are composed of modules of the intermediate layer module or the database module. As a middle layer module or a database module, a transistor module is used.
電晶體模組的數量多,展開並持有時,資料量龐大,因此通常在作為資料庫模組定義了中間層的形式下輸出。The number of transistor modules is large, and when the data is expanded and held, the amount of data is large, so it is usually output in the form of an intermediate layer defined as a database module.
其中,圖形資料與在本實施方式相關的領域中作為事實標準使用的GDS格式相比,長方形圖形為矩形(Rectangle),一筆成形圖形為邊界(Boundary),中心線上定義了寬的圖形為路徑(path),集中了這些圖形資料的模組稱為單元。Among them, the graphic data is a rectangular shape (Rectangle) compared to the GDS format used as a de facto standard in the field related to the present embodiment, a rectangular shaped figure is a boundary (Boundary), and a wide graphic is defined as a path on the center line ( Path), the module that concentrates these graphic data is called a unit.
圖8是表示光罩製作系統執行座標資訊輸出程式而進行的座標資訊輸出處理的圖,表示對於面板基板及光罩的重複要素的數值表現和配置規定(包括對準標記)。8 is a view showing a coordinate information output process performed by the mask manufacturing system executing a coordinate information output program, and shows numerical expressions and arrangement specifications (including alignment marks) of the repeating elements of the panel substrate and the photomask.
在圖8中,801是面板基板,802是面板佈局資料,803是面板基板的XY中心座標(在本例中與四個拍攝框A的中心座標一致)(0,0),804是對準標記(其座標是以面板基板801的中心座標(0,0)為基準的座標(X0,Y0))。In FIG. 8, 801 is a panel substrate, 802 is a panel layout material, and 803 is an XY center coordinate of the panel substrate (in this example, coincident with the center coordinates of the four shot frames A) (0, 0), 804 is alignment The mark (the coordinate is a coordinate (X0, Y0) based on the center coordinate (0, 0) of the panel substrate 801).
805、808、811是光罩,807是保證了特性的曝光區域。並且,806、809、810、812、813分別是和拍攝框A、B1、C1、B2、C2對應的重複要素。805, 808, and 811 are photomasks, and 807 is an exposure area that ensures characteristics. Further, 806, 809, 810, 812, and 813 are repeating elements corresponding to the shooting frames A, B1, C1, B2, and C2, respectively.
在圖8的例子中,一個重複要素806形成在光罩805上,二個重複要素809、810形成在光罩808上,二個重複要素812、813形成在光罩811上。In the example of FIG. 8, one repeating element 806 is formed on the reticle 805, two repeating elements 809, 810 are formed on the reticle 808, and two repeating elements 812, 813 are formed on the reticle 811.
包含了百葉框的曝光資料作為重複要素806、809、 810、812、813製作在各光罩805、808、811上。即,重複要素是通過由百葉框、切斷的資料、校正圖案及未成為切斷物件的資料構成的曝光資料而構成的。這是拍攝資訊的基礎。The exposure data including the louver frame is used as the repeating elements 806, 809, 810, 812, and 813 are formed on the respective masks 805, 808, and 811. That is, the repeating element is constituted by exposure data composed of a louver frame, cut data, a correction pattern, and data that is not a cut object. This is the basis for shooting information.
在本實施方式中,即使沒有重複也稱為重複要素。沒有重複時的重複數為0。在圖8的例子中,和拍攝框A對應的重複要素806的個數為2×2(=4)(重複次數2×2-1)(由此形成作為重複要素A的集合的重複集合814),與拍攝框B1、C1、B2、C2對應的重複要素809、810、812、813的重複次數是0。In the present embodiment, even if there is no repetition, it is called a repeating element. The number of repetitions without repetition is 0. In the example of FIG. 8, the number of repeating elements 806 corresponding to the shooting frame A is 2 × 2 (= 4) (the number of repetitions 2 × 2-1) (thereby forming a repeated set 814 as a set of the repeating elements A) The number of repetitions of the repeating elements 809, 810, 812, and 813 corresponding to the shooting frames B1, C1, B2, and C2 is 0.
各重複要素具有名稱。各重複要素相對於各重複要素自身的座標中心具有寬(W)和高(H)。各重複要素以由其重複要素構成的重複集合的中心座標為基準而配置。在圖示例子中,面板基板801的中心座標(0,0)相當於此,配置在以中心座標(0,0)為基準的位置上。Each repeating feature has a name. Each of the repeating elements has a width (W) and a height (H) with respect to the coordinate center of each of the repeating elements themselves. Each of the repeating elements is arranged based on the center coordinates of the repeated set of the repeated elements. In the illustrated example, the center coordinate (0, 0) of the panel substrate 801 corresponds to this, and is disposed at a position based on the center coordinate (0, 0).
另一方面,作為光罩的佈局資料,各重複要素配置在其中心位置以光罩的中心座標位置為基準座標上。On the other hand, as the layout material of the reticle, each of the repeating elements is disposed at its center position with the center coordinate position of the reticle as a reference coordinate.
關於對準標記,對於面板基板801,配置在以面板基板801的中心座標(0,0)為基準的位置,對於光罩,配置在以光罩的中心座標為基準的位置。對準標記在資料庫檔中存儲並定義。Regarding the alignment mark, the panel substrate 801 is placed at a position based on the center coordinate (0, 0) of the panel substrate 801, and the photomask is placed at a position based on the center coordinates of the mask. Alignment marks are stored and defined in the repository file.
圖9和上述同樣,是表示光罩製作系統執行座標資訊輸出程式從而進行的座標資訊輸出處理的圖,表示座標資訊輸出的例子。如圖9所示,表示由面板基板801上的面板佈局資料802產生配置有重複要素的三個光罩805、808、811時的輸出結果。9 is a view showing coordinate coordinate output processing performed by the mask manufacturing system executing the coordinate information output program, and shows an example of coordinate information output. As shown in FIG. 9, the output result when the three masks 805, 808, and 811 in which the repeating elements are arranged is generated by the panel layout material 802 on the panel substrate 801.
其中表示以下例子:作為曝光拍攝資訊,作為面板基板上的拍攝資訊排列指定了重複要素的名稱和重複次數及高與寬的配置位置、及作為光罩上的拍攝資訊排列指定了同一重複要素名稱和寬及高的配置位置,作為座標資訊提供給用戶。The following example is shown: as the exposure shooting information, the name of the repeating element, the number of repetitions, the arrangement position of the height and the width, and the same repeating element name are specified as the shooting information arrangement on the mask as the shooting information arrangement on the panel substrate. The width and height of the configuration location are provided to the user as coordinate information.
圖10~圖12是表示曝光區域的分割處理方法的圖,表示二個分割方式,圖11是分割圖10的面板佈局資料1003並切斷時產生校正圖案1004的例子,圖12是分割圖10的面板佈局資料1003並切斷時未產生校正圖案的例子。10 to 12 are views showing a method of dividing the exposure area, showing two division methods, and FIG. 11 is an example in which the correction pattern 1004 is generated when the panel layout data 1003 of FIG. 10 is divided and cut, and FIG. 12 is a division diagram 10. An example in which the panel layout data 1003 is cut and no correction pattern is generated.
即,產生校正圖案1004時,在圖10及圖11中,在拍攝框1002正下方切斷資料(例如佈線資料)1003,在切斷部位連續產生以規定長度△伸長的校正圖案1004、1004。此時,校正圖案1004也可以構成為從比上述切斷部位靠近規定長度內側的位置開始,比上述切斷部位寬規定長度。這樣一來,在進行雙重曝光的部位1007上形成校正圖案1004。In other words, when the correction pattern 1004 is generated, in FIG. 10 and FIG. 11, the material (for example, wiring material) 1003 is cut immediately below the imaging frame 1002, and the correction patterns 1004 and 1004 which are elongated by the predetermined length Δ are continuously generated at the cutting portion. At this time, the correction pattern 1004 may be configured to be wider than the cut portion by a predetermined length from a position closer to the inside of the predetermined length than the cut portion. In this way, the correction pattern 1004 is formed on the portion 1007 where the double exposure is performed.
形成規定寬的百葉框1005,使得校正圖案1004的外側位置和百葉框1005的內側位置具有規定量的偏差,並以規定量重疊,這樣一來,製作具有校正圖案的曝光要素資料。百葉框1005的內邊緣1006是比拍攝框1002以規定△伸長的部位。百葉框1005的內邊緣成為曝光區域的外邊緣。The louver frame 1005 having a predetermined width is formed such that the outer position of the correction pattern 1004 and the inner position of the louver frame 1005 have a predetermined amount of deviation, and are overlapped by a predetermined amount, thereby producing exposure element data having a correction pattern. The inner edge 1006 of the louver frame 1005 is a portion that is elongated by a predetermined Δ than the imaging frame 1002. The inner edge of the louver frame 1005 becomes the outer edge of the exposed area.
因此,產生校正圖案1004並切斷時,資料1003的切斷在拍攝框1002正下方進行,校正圖案1004成為相鄰的曝光要素兩者曝光的雙重曝光區域,通過相鄰的曝光要素形成的面板佈局資料通過校正圖案1004確保了連接。Therefore, when the correction pattern 1004 is generated and cut, the cutting of the material 1003 is performed directly below the shooting frame 1002, and the correction pattern 1004 becomes a double exposure region in which both exposure elements are exposed, and the panel formed by the adjacent exposure elements The layout data ensures the connection by the correction pattern 1004.
另一方面,不產生校正圖案而切斷時,使佈局資料重疊。重疊時,如圖12所示,通過比拍攝框1002以規定長度△伸長的部分進行切斷。對於相鄰的拍攝框1001,同樣也通過以規定長度△伸長的部分進行切斷來形成光罩。這樣一來,進行雙重曝光的部位1007上形成重疊部1008。On the other hand, when the correction pattern is not generated and the cutting is performed, the layout data is superimposed. When overlapping, as shown in FIG. 12, the cutting is performed by a portion that is elongated by a predetermined length Δ than the imaging frame 1002. In the adjacent imaging frame 1001, the mask is also formed by cutting at a portion elongated by a predetermined length Δ. In this way, the overlapping portion 1008 is formed on the portion 1007 where the double exposure is performed.
形成規定寬的百葉框1005,使得重疊部1008的外側位置和百葉框1005的內側位置具有規定量的偏差,並以規定量重疊。這樣一來,製作具有重疊部1008的曝光要素資料。百葉框1005的內邊緣1006成為比拍攝框1002伸長△的部位。百葉框1005的內邊緣成為曝光區域的外邊緣。The louver frame 1005 having a predetermined width is formed such that the outer position of the overlapping portion 1008 and the inner position of the louver frame 1005 have a predetermined amount of deviation and overlap by a predetermined amount. In this way, the exposure element data having the overlapping portion 1008 is created. The inner edge 1006 of the louver frame 1005 is a portion that is extended by Δ from the imaging frame 1002. The inner edge of the louver frame 1005 becomes the outer edge of the exposed area.
圖13是表示在具有斜線部1301的拍攝框1002中切斷的曝光要素的圖,是形成了校正圖案1004的曝光要素的例子。FIG. 13 is a view showing an exposure element cut in the imaging frame 1002 having the oblique line portion 1301, and is an example of an exposure element in which the correction pattern 1004 is formed.
在圖13中,可以設定具有斜線部1301的拍攝框1002時,有時容易抽取重複構造,是有效的。In FIG. 13, when the imaging frame 1002 having the oblique line portion 1301 can be set, it is effective to easily extract the repetitive structure.
校正圖案1004、1004沿著切斷的佈線資料1003的長度方向,在內側方向和外側方向上設定為規定的校正值。 並且,對夾持佈線資料1003的寬度方向的兩側,分別設定規定的校正值。百葉框1005的寬可在水準方向Wh和垂 直方向Wv中指定。The correction patterns 1004 and 1004 are set to predetermined correction values in the inner direction and the outer direction along the longitudinal direction of the cut wiring data 1003. Further, predetermined correction values are set on both sides in the width direction of the clamp wiring data 1003. The width of the louver frame 1005 can be in the horizontal direction Wh and vertical Directly specified in Wv.
和水準切斷的端部對應的校正圖案1004是矩形,和斜線部1301對應的校正圖案1004是平行四邊形。The correction pattern 1004 corresponding to the level cut end is a rectangle, and the correction pattern 1004 corresponding to the hatched portion 1301 is a parallelogram.
如圖13所示,在具有內邊緣1006含有斜線部1301的百葉框1005時,資料切斷部位需要校正圖案1004、1004的雙重曝光。As shown in FIG. 13, when the louver frame 1005 having the inner edge 1006 including the oblique line portion 1301, the data cutting portion requires double exposure of the correction patterns 1004, 1004.
以上,圖1~圖13說明了如何製作光罩佈局資料和座標資訊。本實施方式進行由這樣製作的光罩佈局資料和座標資訊所合成的面板佈局資料的驗證,作為結果,進行光罩資料曝光驗證。Above, Figures 1 to 13 illustrate how to make mask layout data and coordinate information. In the present embodiment, the verification of the panel layout data synthesized by the mask layout data and the coordinate information thus produced is performed, and as a result, the mask data exposure verification is performed.
圖14是表示本實施方式涉及的光罩驗證系統構造的框圖,是由電腦及上述電腦執行的程式構成的例子。本實施方式涉及的光罩驗證系統具有:中央處理裝置(CPU)、在上述CPU上運行的複數程式群、存儲程式群及資料的存儲裝置、由鍵盤及滑鼠構成的輸入裝置、以及顯示裝置。FIG. 14 is a block diagram showing the structure of a reticle verification system according to the present embodiment, and is an example of a program executed by a computer and the above computer. The mask verification system according to the present embodiment includes a central processing unit (CPU), a plurality of program groups running on the CPU, a storage unit for storing program groups and data, an input device including a keyboard and a mouse, and a display device. .
如果說明本實施方式涉及的光罩驗證系統的概要,則本實施方式涉及的光罩驗證系統作為曝光裝置模擬器起作用,因此使光罩視窗上顯示的光罩佈局資料根據座標資訊顯示到面板基板視窗上。對其進行圖形計算處理並進行驗證,且如果加入顯示錯誤圖形的功能,則構成光罩驗證系統。其中,顯示錯誤圖形的視窗例如是面板基板視窗。When the outline of the reticle verification system according to the present embodiment is described, the reticle verification system according to the present embodiment functions as an exposure device simulator, so that the reticle layout data displayed on the reticle window is displayed on the panel based on the coordinate information. On the substrate window. The graphics calculation process is performed and verified, and if a function of displaying an error graphic is added, a mask verification system is constructed. Among them, the window displaying the error pattern is, for example, a panel substrate window.
作為程式構造分為以下三個階段:作為初始設定,光罩佈局資料和座標資訊的讀入及內部表格的製作;圖形和圖形的網格格子之間的計算處理及伴隨它們的驗證處 理;驗證結果圖形的顯示。這些程式功能均可通過操作顯示在功能表視窗上的命令來進行。As a program structure, it is divided into the following three stages: as the initial setting, the reading of the mask layout data and coordinate information, and the creation of the internal table; the calculation processing between the grids of graphics and graphics and the verification where they are accompanied Rational; verification of the display of the resulting graph. These program functions can be performed by operating the commands displayed on the menu window.
作為圖形的顯示視窗,至少需要作為驗證結果圖形的顯示的面板基板視窗,輸入部分和計算部分不一定需要圖形顯示功能,但從操作確認的角度而言,具有圖形顯示功能較為方便。As the display window of the graphic, at least the panel substrate window for displaying the verification result graphic is required, and the input portion and the calculation portion do not necessarily require the graphic display function, but it is convenient to have the graphic display function from the viewpoint of operation confirmation.
在圖14中,光罩驗證系統具有:由液晶顯示面板等構成的顯示部1;由鍵盤2或滑鼠3構成的操作部16;中央處理裝置(CPU)7;由磁片裝置、半導體記憶體等構成的存儲部8。In Fig. 14, the mask verification system has a display unit 1 composed of a liquid crystal display panel or the like, an operation unit 16 composed of a keyboard 2 or a mouse 3, a central processing unit (CPU) 7, and a magnetic disk device and a semiconductor memory. A storage unit 8 composed of a body or the like.
顯示部1上至少可顯示下述三個視窗:操作面板基板12上的面板佈局資料的面板基板視窗9、操作光罩13上的光罩佈局資料的光罩視窗10、指示操作部16的操作的功能表視窗11。面板基板視窗9上設定的拍攝框在光罩視窗10上作為拍攝框設定的操作在視窗之間進行。At least three windows can be displayed on the display unit 1 : a panel substrate window 9 for operating panel layout data on the panel substrate 12 , a mask window 10 for operating the mask layout material on the mask 13 , and an operation of the operation portion 16 Menu window 11. The shooting frame set on the panel substrate window 9 is operated between the windows as an operation of setting the shooting frame on the reticle window 10.
光罩資料的驗證結果顯示到顯示部1,也可顯示到面板基板視窗9、光罩視窗10、功能表視窗11的任意一個上。並且,顯示光罩資料的驗證結果時,也可去掉上述各窗口9~11,在上述各視窗9~11存在的區域中僅顯示驗證結果。The verification result of the mask data is displayed on the display unit 1, and may be displayed on any one of the panel substrate window 9, the mask window 10, and the menu window 11. Further, when the verification result of the mask data is displayed, the above-described windows 9 to 11 can be removed, and only the verification result is displayed in the area where the respective windows 9 to 11 exist.
光罩的製作作業、驗證作業通過操作部16選擇功能表視窗11上顯示的命令,使操作部16具有該命令的功能,操作操作部16進行在面板基板視窗9上拍攝框的設定、面板基板9和光罩視窗10之間的移動、和光罩視窗 10上對應的拍攝框的設定等各種作業。The operation of the mask and the verification operation are selected by the operation unit 16 to select the command displayed on the function table window 11, and the operation unit 16 has the function of the command, and the operation unit 16 performs the setting of the imaging frame on the panel substrate window 9, and the panel substrate. 9 and movement between the reticle window 10, and the reticle window Various operations such as setting of the corresponding shooting frame on the 10th.
存儲部8具有:程式存儲部4,存儲CPU7執行的光罩資料產生用程式、光罩驗證用程式;資料檔案存儲部5,存儲輸入輸出資料、處理中的中間資料等資料檔案;以及檔案存儲部6,存儲規則檔、資料庫檔這樣的參照檔。The storage unit 8 includes a program storage unit 4 that stores a mask data generation program executed by the CPU 7 and a mask verification program, and a data file storage unit 5 that stores data files such as input/output data and intermediate data during processing; and file storage. The part 6 stores a reference file such as a rule file and a database file.
作為上述程式的構成,作為光罩製作用的程式,由以下程式構成:拍攝框設定程式、重複構造驗證程式、百葉框間最小間隔驗證程式、資料切斷程式、校正圖案產生程式、百葉框產生程式、座標資訊清單輸出程式、各種資料的輸入輸出程式。As a configuration of the above-mentioned program, the program for mask production is composed of a shooting frame setting program, a repeating structure verification program, a minimum interval verification program between louvers, a data cutting program, a correction pattern generation program, and a louver frame generation. Program, coordinate information list output program, input and output programs for various data.
這些拍攝框設定、重複構造驗證、百葉框間最小間隔驗證、資料切斷、校正圖案產生、百葉框產生、座標資訊清單輸出的功能均通過操作部16選擇功能表視窗上顯示的命令來進行。The functions of the shooting frame setting, the repeating structure verification, the minimum interval verification between the louver frames, the data cutting, the correction pattern generation, the louver frame generation, and the coordinate information list output are all performed by the operation unit 16 selecting a command displayed on the function table window.
並且,作為光罩資料驗證用的程式包括輸入處理部用程式、圖形計算處理的驗證處理部用程式、驗證結果顯示部用程式。Further, the program for verifying the mask data includes a program for inputting the processing unit, a program for the verification processing unit for the graphic calculation processing, and a program for the verification result display unit.
作為檔案構成,作為光罩製作用的檔案構成,由以下構成:除了作為輸入檔的面板佈局資料檔案和作為輸出檔的光罩佈局資料檔案及座標資訊清單檔外,作為參照檔的資料庫檔和規則檔。並且,作為資料檔案的面板佈局資料檔案、光罩佈局資料檔案及座標資訊清單檔案存儲到資料檔案存儲部5。作為參照檔的資料庫檔及規則檔存儲到參照檔案存儲部6。As a file configuration, the file configuration for the mask production is composed of a file layout file file as an input file, a mask layout data file as an output file, and a coordinate information list file, and a database file as a reference file. And rules file. Further, the panel layout data file, the mask layout data file, and the coordinate information list file as the data files are stored in the material file storage unit 5. The database file and the rule file as the reference files are stored in the reference file storage unit 6.
並且,作為光罩驗證用的檔案構成,由以下構成:除了作為輸入檔的光罩佈局資料和座標資訊檔、作為輸出檔的光罩資料檔案和座標資訊清單檔外,作為參照檔的資料庫檔和規則檔。Further, the file configuration for mask verification is composed of a database as a reference file in addition to the mask layout data and the coordinate information file as the input file, the mask data file as the output file, and the coordinate information list file. File and rule files.
這樣一來,構成執行光罩佈局的光罩設計系統或進行光罩資料的驗證的光罩資料驗證系統。In this way, a reticle design system that performs the reticle layout or a reticle data verification system that performs verification of the reticle data is constructed.
其中,顯示部1、操作部16、存儲部8分別構成顯示單元、操作單元、存儲單元。The display unit 1, the operation unit 16, and the storage unit 8 constitute a display unit, an operation unit, and a storage unit, respectively.
上述顯示單元、操作單元、存儲單元作為光罩製作系統起作用時,可起到如下作用。When the display unit, the operation unit, and the storage unit function as a mask manufacturing system, the following functions can be achieved.
例如,顯示單元至少可顯示:顯示面板基板的面板佈局資料的面板基板視窗、顯示光罩佈局資料的光罩視窗、及顯示上述操作單元的命令的功能表視窗。For example, the display unit may display at least: a panel substrate window displaying panel layout data of the panel substrate, a mask window displaying the mask layout data, and a function table window displaying commands of the operation unit.
操作單元選擇功能表視窗上顯示的命令並輸入。這樣一來,可對於面板基板的面板佈局資料上設定的拍攝框,進行指定重複排列等操作。The operating unit selects the command displayed on the menu window and enters it. In this way, the shooting frame set on the panel layout data of the panel substrate can be subjected to operations such as designating repeated arrangement.
存儲單元可作為主存儲裝置及外部存儲裝置起作用。存儲單元中可存儲:可切斷面板佈局資料的條件、含有校正圖案的寬及百葉框間的最小距離的產生條件。並且,存儲單元中可存儲通過操作單元設定的產生條件。The storage unit can function as a primary storage device and an external storage device. The storage unit can store conditions for cutting the panel layout data, conditions for including the width of the correction pattern, and the minimum distance between the louver frames. And, the generation condition set by the operation unit can be stored in the storage unit.
並且,CPU17在光罩製作系統中,構成光罩資料產生單元、重複驗證單元、百葉框間隔驗證單元。光罩資料產生單元通過上述操作單元切取與上述面板基板視窗上設定的拍攝框對應的面板佈局資料,作為部分面板佈局資料 抽取,上述部分面板佈局資料中含有切斷資料時,在該切斷資料的端部形成校正圖案,並且通過形成內邊緣和上述校正圖案的外邊緣對應的百葉框,可將與上述部分面板佈局資料對應的曝光要素資料產生在上述光罩視窗上。並且,光罩資料產生單元可產生上述曝光要素資料,以滿足上述產生條件。Further, the CPU 17 constitutes a reticle data generating unit, a repeating verification unit, and a louver frame interval verifying unit in the reticle producing system. The mask data generating unit cuts out the panel layout data corresponding to the shooting frame set on the panel substrate window by using the operation unit, as part of the panel layout data. Extracting, when the part of the panel layout data includes the cutting data, forming a correction pattern at the end of the cutting data, and forming the panel layout by forming the inner edge and the louver frame corresponding to the outer edge of the correction pattern The exposure element data corresponding to the data is generated on the reticle window. Further, the reticle data generating unit may generate the above-described exposure element data to satisfy the above-described generation condition.
上述光罩資料產生單元具有以下單元:切取通過上述操作單元在上述面板基板視窗上設定的拍攝框所對應的面板佈局資料,作為部分面板佈局資料抽取的抽取單元;上述部分面板佈局資料中含有切斷資料時,在該切斷資料的端部形成校正圖案的校正圖案產生單元;及形成內邊緣和上述校正圖案的外邊緣對應的百葉框的百葉框產生單元。可將與上述部分面板佈局資料對應的曝光要素資料產生在上述光罩視窗上。The reticle data generating unit has the following unit: cutting out the panel layout data corresponding to the shooting frame set on the panel substrate window by the operating unit, and extracting the panel layout data as part of the panel layout data; the partial panel layout data includes the cut When the data is broken, a correction pattern generating unit that forms a correction pattern at an end portion of the cutting data; and a louver frame generating unit that forms an inner edge and a louver frame corresponding to an outer edge of the correction pattern. The exposure element data corresponding to the partial panel layout data described above may be generated on the reticle window.
並且,重複驗證單元可比較對照拍攝框和指定了重複排列的區域所對應的面板佈局資料是否一致。Moreover, the duplicate verification unit can compare whether the panel layout data corresponding to the comparison shooting frame and the area designated by the repeated arrangement are consistent.
並且,百葉框間隔驗證單元在存在複數上述百葉框時,可驗證百葉框之間是否隔開規定的最小間隔以上。Moreover, when the louver frame interval verification unit has a plurality of the louver frames, it is possible to verify whether the louver frames are separated by a predetermined minimum interval or more.
另一方面,上述顯示單元、操作單元、存儲單元作為光罩驗證系統其作用時,可起到如下作用。On the other hand, when the display unit, the operation unit, and the storage unit function as a mask verification system, the following functions can be achieved.
例如,顯示單元可顯示驗證單元驗證的結果。並且,顯示單元可至少具有顯示驗證結果的視窗。並且,顯示單元可將驗證單元的驗證結果所獲得的圖形顯示到上述視窗上。For example, the display unit can display the results of the verification unit verification. And, the display unit may have at least a window displaying the verification result. And, the display unit can display the graphic obtained by the verification result of the verification unit to the above window.
並且,顯示單元在顯示驗證結果的視窗上顯示錯誤圖形資訊時,可將指定單元指定的錯誤層的驗證結果圖形資訊以層單位顯示在視窗上。並且,顯示單元具有與顯示驗證結果的視窗不同的對話方塊,在上述對話方塊上顯示錯誤個數,並回應指定單元對錯誤層的指定,將該層的驗證結果圖形資訊顯示到上述視窗上。Further, when the display unit displays the error graphic information on the window displaying the verification result, the verification result graphic information of the error layer specified by the specifying unit may be displayed on the window in a layer unit. Moreover, the display unit has a dialog box different from the window for displaying the verification result, displays the number of errors on the dialog box, and responds to the designation of the error layer by the designated unit, and displays the verification result graphic information of the layer on the window.
操作單元可作為指定單元起作用。指定單元可指定錯誤的驗證結果含有的錯誤層。並且,指定單元可以在與視窗不同的對話方塊上指定錯誤層。The operating unit can function as a designated unit. The specified unit can specify the error layer contained in the incorrect verification result. And, the specifying unit can specify an error layer on a dialog box different from the window.
存儲單元可存儲:平板顯示器曝光用光罩中含有的曝光要素的圖形資料;由網格格子點的座標表現、表示顯示面板上的上述曝光要素的曝光位置的座標資訊。The storage unit can store: graphic data of the exposure element contained in the exposure cover of the flat panel display; coordinate information represented by the coordinates of the grid lattice point, and coordinate information indicating the exposure position of the exposure element on the display panel.
並且,CPU7可作為佈局圖形要素產生單元、驗證單元、展開單元起作用。Further, the CPU 7 functions as a layout graphic element generation unit, a verification unit, and an expansion unit.
佈局圖形要素產生單元可根據存儲單元中存儲的曝光要素的圖形資料及座標資訊,產生與曝光要素對應的顯示面板上的佈局圖形要素。The layout graphic element generating unit may generate a layout graphic element on the display panel corresponding to the exposure element according to the graphic data and the coordinate information of the exposure element stored in the storage unit.
驗證單元可根據佈局圖形要素產生單元產生的顯示面板上的複數佈局圖形要素的位置關係,驗證曝光要素。 並且,曝光要素的圖形資料至少由線資訊中定義了寬的線資料、長方形資料、描述各頂點的多角形資料這三種構成,驗證單元可通過進行上述該等佈局圖形要素所對應的網格格子之間的計算處理,驗證上述複數曝光要素。The verification unit can verify the exposure element according to the positional relationship of the plurality of layout graphic elements on the display panel generated by the layout graphic element generation unit. Moreover, the graphic data of the exposure element is defined by at least three types of line data, rectangular data, and polygonal data describing each vertex, and the verification unit can perform the grid grid corresponding to the layout graphic elements. The calculation process between the verifications verifies the above multiple exposure elements.
驗證單元可具有差異抽取單元,其在進行二個佈局圖 形要素的邏輯OR處理後,進行上述任意一個佈局圖形要素與上述邏輯OR的結果可獲得的圖形要素的邏輯XOR處理或差分處理,從而抽取上述二個佈局圖形要素的差異。The verification unit may have a difference extraction unit that performs two layout diagrams After the logical OR processing of the shape element, logical XOR processing or difference processing of the pattern element obtainable by the result of the above-described one of the layout pattern elements and the logical OR is performed, thereby extracting the difference between the two layout pattern elements.
驗證單元可具有重疊量檢測單元,通過進行二個佈局圖形要素的邏輯AND處理,檢測出上述二個佈局圖形要素的重疊量。The verification unit may have an overlap amount detecting unit that detects the overlap amount of the two layout pattern elements by performing logical AND processing of the two layout pattern elements.
驗證單元可具有偏差驗證單元,驗證重疊量檢測單元檢測出的重疊量是否滿足指示的偏差值。The verification unit may have a deviation verification unit that verifies whether the amount of overlap detected by the overlap amount detection unit satisfies the indicated deviation value.
驗證單元可具有要素判斷單元,在重疊量檢測單元檢測出沒有二個佈局圖形要素的重疊量後,進行邏輯OR處理,當確認了二個佈局圖形要素形成關閉的一個圖形的結果時,判斷上述二個佈局圖形要素是連續的圖形要素。The verification unit may have an element determination unit that performs logical OR processing after the overlap amount detection unit detects that there is no overlap amount of the two layout pattern elements, and determines that the result is that when the two layout pattern elements form a closed pattern. The two layout graphic elements are continuous graphic elements.
並且,光罩的資料係可具有定義電晶體圖形的中間層、或已定義電晶體圖形的外部資料庫作為中間層來構成,這種情況下,展開單元可具有將定義上述電晶體圖形的中間層或外部資料庫通過指標構造根據需要展開的表格構造。Moreover, the data of the reticle may be constituted by an intermediate layer defining a transistor pattern or an external database having a defined transistor pattern as an intermediate layer. In this case, the expansion unit may have an intermediate portion defining the above transistor pattern. The layer or external database constructs a table structure that is expanded as needed through the indicator.
並且,各曝光要素中含有圖形要素及包圍上述圖形要素的預定寬的百葉框,驗證單元可具有終點驗證單元,其對和上述百葉框內邊緣對應的上述顯示面板上的網格格子,驗證在規定偏移值的範圍內是否存在上述圖形要素的佈局圖形要素的終點。And each of the exposure elements includes a graphic element and a predetermined wide louver frame surrounding the graphic element, and the verification unit may have an end point verification unit that verifies the grid grid on the display panel corresponding to the inner edge of the louver frame. Whether or not the end point of the layout graphic element of the above graphic element exists within the range of the specified offset value.
並且,存儲單元中存儲的程式可使具有顯示單元、操作單元、存儲單元及CPU的電腦作為具有上述功能的光罩 驗證系統起作用。Moreover, the program stored in the storage unit can use a computer having a display unit, an operation unit, a storage unit, and a CPU as a mask having the above functions. Verify that the system is working.
圖15是表示本發明的實施方式涉及的光罩驗證系統的處理的流程圖。Fig. 15 is a flowchart showing the processing of the reticle verification system according to the embodiment of the present invention.
在圖15中,輸入的光罩佈局資料是所謂GDS格式下的表現形式的資料,是由作為座標值已知的點的複數網格格子點表現的形式的資料,是允許中間層構造的形式的資料。上述光罩資料檔案中含有平板顯示器曝光用光罩中含有的曝光要素的圖形資料。In Fig. 15, the input mask layout data is a data in the form of a representation in the so-called GDS format, which is a form expressed by a complex grid lattice point as a point whose coordinate value is known, and is a form allowing the intermediate layer to be constructed. data of. The reticle data file contains graphic data of exposure elements contained in the reticle for exposure of the flat panel display.
通常情況下,作為中間層採用電晶體層。根據情況不同,也存在電晶體層作為外部資料庫與光罩佈局資料檔案獨立安裝的情況。但是,即使獨立安裝,實際上是和中間層同等的。Usually, a transistor layer is used as the intermediate layer. Depending on the situation, there is also a case where the transistor layer is installed independently as an external database and a mask layout data file. However, even if it is installed independently, it is actually equivalent to the middle layer.
描述光罩佈局資料檔案中記載的重複要素的重複配置位置等的座標資訊通常是文字檔案。上述座標資訊中含有由網格格子點座標表示、表示顯示面板上的曝光要素的曝光位置的資訊。The coordinate information describing the repeated arrangement position of the repeated elements described in the mask layout data file is usually a text file. The coordinate information includes information indicating an exposure position of an exposure element on the display panel, which is represented by a grid lattice point coordinate.
處理由以下三個階段構成:輸入處理階段(步驟S151),執行程式存儲部4中存儲的輸入處理程式;驗證處理階段(步驟S152、S153),執行圖形計算處理的驗證處理程式,進行圖形和圖形的網格格子點之間的計算處理;以及顯示階段(步驟S154),執行驗證結果顯示程式,顯示驗證結果。The processing is composed of the following three stages: an input processing stage (step S151), an input processing program stored in the execution program storage unit 4, a verification processing stage (steps S152 and S153), a verification processing program for executing the graphic calculation processing, and graphics and The calculation processing between the grid grid points of the graphic; and the display phase (step S154), executing the verification result display program, and displaying the verification result.
在輸入處理階段(步驟S151)中,CPU7進行從資料檔案存儲部5讀入光罩佈局資料檔案及座標資訊檔的輸入 處理,由基於上述座標資訊的重複要素的配置資訊,製作面板基板上的曝光要素資料構造。In the input processing stage (step S151), the CPU 7 performs an input of reading the mask layout data file and the coordinate information file from the material file storage unit 5. The processing creates an exposure element data structure on the panel substrate based on the arrangement information of the repeated elements based on the coordinate information.
其中,在具有與一個重複要素空間上連接的其他重複要素可以輕易地拾取的表格構造(下述圖17的表格構造1)的方式下進行製作。並且,光罩資料具有中間層時,由於資料量的減少,在具有維持中間層的同時易於拾取到最下層的表格構造(下述表格構造2)的方式下進行製作。Here, it is produced in such a manner that a table structure (see Table Structure 1 of FIG. 17 below) which can be easily picked up by another repeating element connected to one repeating element space is formed. Further, when the reticle data has the intermediate layer, the amount of data is reduced, and the reticle data is produced in such a manner that the intermediate layer is easily picked up to the lowermost table structure (the following table structure 2).
之後,CPU7進入到圖形的計算處理的驗證處理(步驟S152、S153)。計算包括邏輯計算和差分計算。稍後詳述,應驗證的物件從大的方面分為:雙重曝光區域的驗證、連接曝光1的驗證、連接曝光2的驗證、非曝光區域的驗證。After that, the CPU 7 proceeds to the verification processing of the calculation processing of the graphics (steps S152, S153). Calculations include logical calculations and differential calculations. As will be detailed later, the items to be verified are divided into a large aspect: verification of the double exposure area, verification of the connection exposure 1, verification of the connection exposure 2, and verification of the non-exposed area.
進行這些驗證所需的邏輯計算是AND、OR及XOR。也可用差分計算替代XOR。該邏輯處理或差分處理全部是網格格子點之間的計算處理。這些計算處理結果作為圖形資料存儲。CPU7對所有層進行處理步驟S153的處理(步驟S153)。The logical calculations required to perform these verifications are AND, OR, and XOR. A differential calculation can also be used instead of XOR. This logical processing or differential processing is all computational processing between grid grid points. These calculation processing results are stored as graphic data. The CPU 7 performs processing of the processing of step S153 on all the layers (step S153).
最後,CPU7進行將計算處理的結果的圖形顯示在顯示部1的顯示處理(步驟S154)。應驗證的物件是雙重曝光區域的驗證、連接曝光1的驗證、連接曝光2的驗證、非曝光區域的驗證,因此根據由操作部16設定的判斷基準(參數),以圖形資料形式表示與其中之一對應的驗證。 該圖形資料是表示錯誤的資料。Finally, the CPU 7 performs a display process of displaying the result of the calculation process on the display unit 1 (step S154). The object to be verified is the verification of the double exposure area, the verification of the connection exposure 1, the verification of the connection exposure 2, and the verification of the non-exposure area, and therefore, in accordance with the judgment reference (parameter) set by the operation unit 16, it is represented in the form of graphic data. One of the corresponding verifications. This graphic material is information indicating an error.
其中重要的是,邏輯處理或差分處理的計算處理以層單位進行,製作的曝光錯誤資料也以層單位存儲到資料檔 案存儲部5中。這是因為,曝光以層單位進行,因此必須以層單位進行驗證。還因為,由於顯示部1顯示時也變為層單位,因此以層單位存儲錯誤資料時,存取時間較快。It is important that the calculation processing of the logic processing or the differential processing is performed in layer units, and the created exposure error data is also stored in the data unit in the layer unit. In the file storage unit 5. This is because the exposure is performed in layer units, so verification must be performed in layer units. Further, since the display unit 1 also changes to a layer unit when displayed, the access time is faster when the error data is stored in the layer unit.
並且,CPU7將處理結果顯示到顯示部1時,也可以構成為,當設定了是否是錯誤資料的判斷基準時,僅顯示錯誤資料,當未設定是否是錯誤資料的判斷基準時,僅顯示處理結果。並且,CPU7將處理結果顯示到顯示部1時,不一定顯示圖形,也可通過文字等顯示錯誤內容,或者在不進行是否是錯誤的判斷時僅顯示處理結果。Further, when the CPU 7 displays the processing result on the display unit 1, the error data may be displayed only when the determination criterion of the error data is set, and when only the determination criterion of the error data is not set, only the processing is displayed. result. Further, when the CPU 7 displays the processing result on the display unit 1, the graphic is not necessarily displayed, and the error content may be displayed by a character or the like, or only the processing result may be displayed when the determination as to whether or not the error is not made.
圖16是說明光罩13上的光罩佈局資料162、光罩佈局資料162中的重複要素163、座標資訊、面板基板12上的面板佈局資料161的關係的說明圖。FIG. 16 is an explanatory view for explaining the relationship between the mask layout material 162 on the mask 13, the repeating element 163 in the mask layout data 162, the coordinate information, and the panel layout data 161 on the panel substrate 12.
並且,圖17是表示在圖16所示的重複要素163中可能是多重曝光、連接曝光1、連接曝光2的重複要素163的表格構造1,存儲在存儲部8的資料檔案存儲部5。Further, FIG. 17 is a table structure 1 showing the repeating elements 163 which may be multiple exposure, connection exposure 1, and connection exposure 2 in the repeating element 163 shown in FIG. 16, and is stored in the material file storage unit 5 of the storage unit 8.
上述表格含有位址、實例名、重複要素名、雙重曝光或連接曝光1或連接曝光2的指標個數及指標資訊。The above table contains the address, instance name, duplicate feature name, double exposure or connection exposure 1 or the number of indicators connected to exposure 2 and indicator information.
其中,位址是表示配置的重複要素資料的順序的位址,實例名是配置的重複要素的固有名,重複要素名是光罩資料中記載的重複要素的資料庫名。並且,實例是由單一或複數圖形要素(例如單元、設備等)構成的一個集中的單位的圖形要素。The address is an address indicating the order of the duplicate element data to be arranged, the instance name is a unique name of the duplicate element to be placed, and the duplicate element name is the database name of the duplicate element described in the mask data. Also, an instance is a graphical element of a centralized unit consisting of a single or complex graphical element (eg, unit, device, etc.).
配置在光罩13上的光罩佈局資料162中含有的各重複要素163根據座標資訊在面板基板12上的規定位置曝 光,在面板基板上形成對應的面板佈局要素。如重複要素A1_1所示,在重複曝光的重複要素163的情況下,在由座標資訊確定的位置上進行規定次數的曝光。這樣一來,面板基板12上形成由複數面板佈局要素構成的面板佈局資料。Each of the repeating elements 163 included in the mask layout data 162 disposed on the reticle 13 is exposed to a predetermined position on the panel substrate 12 according to the coordinate information. Light, forming corresponding panel layout elements on the panel substrate. As shown in the repeating element A1_1, in the case of repeating the repeated elements 163 of exposure, a predetermined number of exposures are performed at the position determined by the coordinate information. In this way, panel layout data composed of a plurality of panel layout elements is formed on the panel substrate 12.
面板基板12上配置的重複要素163之間的邏輯處理或差分處理是主要處理,因此優選是如下構造:從某個給予的重複要素163易於拾取相鄰的重複要素163。The logical processing or the differential processing between the repeating elements 163 disposed on the panel substrate 12 is the main processing, and therefore it is preferable to easily pick up the adjacent repeating elements 163 from a given repeating element 163.
其中,利用光罩佈局資料162中的重複要素163具有的寬W和高H的資料。寬W和高H表示超過它資料就不存在的最小區域,在表格構造1中,各重複要素163的寬W和高H保持向相鄰的重複要素163的指標。上述指標是位址指標,賦予相關的重複要素163的位址作為指標使用。Among them, the data of the width W and the height H of the repeating element 163 in the mask layout material 162 is utilized. The width W and the height H indicate the smallest area beyond which the data does not exist. In the table structure 1, the width W and the height H of each of the repeating elements 163 maintain the index to the adjacent repeating element 163. The above indicator is an address indicator, and the address of the relevant duplicate element 163 is given as an indicator.
其中,相鄰包括以下三種方式:寬W方向區域及高H方向區域的至少一個重疊;連接;隔1網格格子間隔相鄰存在。由於外部輪廓形狀的寬W和高H相鄰,它們相鄰時實際的曝光資料是否相鄰是另一個問題,但只要寬W和高H不相鄰,實際的曝光資料就不相鄰。簡單來說,製作出易於對可疑處進行檢索的表格構造,採用每次不以全部物件物為驗證物件的結構。從而縮短處理時間。The adjacent ones include the following three modes: at least one overlap of the wide W direction area and the high H direction area; connection; the grid grid spacing is adjacent to each other. Since the width W and height H of the outer contour shape are adjacent, whether the actual exposure data is adjacent when they are adjacent is another problem, but as long as the width W and the height H are not adjacent, the actual exposure data are not adjacent. In short, a table structure that is easy to search for suspicious places is created, and a structure in which not all objects are used as verification objects is used. Thereby shortening the processing time.
圖18是表示由光罩佈局資料和座標資訊製作的面板基板上的資料構造的圖,圖19是表示與圖18的資料構造對應的表格構造2的圖,表示維持了階層化構造的表格構造。18 is a view showing a structure of a material on a panel substrate produced by mask layout data and coordinate information, and FIG. 19 is a view showing a table structure 2 corresponding to the material structure of FIG. 18, showing a table structure in which a hierarchical structure is maintained. .
在圖18中,唯一位於階層構造最上位的頂級模組的下層中,設有配置的重複要素182、188。配置的重複要素182、188例如是電晶體層。In Fig. 18, the only repeating elements 182, 188 are disposed in the lower layer of the top-level module located at the top of the hierarchical structure. The configured repeating elements 182, 188 are, for example, a transistor layer.
在配置的重複要素182的下層並列設置:由圖形資料183、電晶體(TR1)184及圖形資料185構成的串聯層構造,及由電晶體(TR2)186及圖形資料187構成的串聯層構造。The lower layer of the arranged repeating elements 182 is arranged side by side: a series layer structure composed of a pattern data 183, a transistor (TR1) 184, and a pattern data 185, and a series layer structure composed of a transistor (TR2) 186 and a pattern data 187.
在配置的重複要素188的下層並列設置:由圖形資料189、電晶體(TR1)190及圖形資料191構成的串聯層構造,及由電晶體(TR2)192及圖形資料193構成的串聯層構造。The lower layer of the arranged repeating elements 188 is arranged side by side: a series layer structure composed of a pattern data 189, a transistor (TR1) 190, and a pattern data 191, and a series layer structure composed of a transistor (TR2) 192 and a pattern material 193.
並且,在圖19中,上述表格具有位址、實例名、重複要素名或資料庫名、到圖形資料的指標、中間層模組實例名、中間層模組資料庫名、及到中間層模組資料庫的指標。Moreover, in FIG. 19, the above table has an address, an instance name, a duplicate element name or a database name, an indicator to a graphic data, an intermediate layer module instance name, an intermediate layer module database name, and an intermediate layer module. Indicators for the group database.
重複要素存在具有中間層的情況,大多情況下是電晶體層。該電晶體層展開時,資料量龐大,因此在本實施方式中,不預先展開中間層,而在中間層的狀態下,以指標構造將資料作為資料庫保持,進行根據需要而展開的動態處理。The repeating element exists in the case of having an intermediate layer, and in many cases, it is a transistor layer. When the crystal layer is unfolded, the amount of data is large. Therefore, in the present embodiment, the intermediate layer is not developed in advance, and in the state of the intermediate layer, the data is held as a database by the index structure, and dynamic processing is performed as needed. .
採用即使在二個不同的中間層中出現相同的更下位的中間層時,也不使其通用的方法。這是因為,即使重視的重複要素中出現的電晶體出現在其他重複要素,也可僅在重視的要素中完全展開。在圖19中是以下示例:電晶 體TR1和TR2出現在不同的重複要素中,但獨立地註冊表格。The use of an intermediate layer that exhibits the same lower position even in two different intermediate layers does not make it a common method. This is because even if the crystals appearing in the repeating elements of importance appear in other repeating elements, they can be completely expanded only in the important elements. In Figure 19 is the following example: electro-crystal The bodies TR1 and TR2 appear in different repeating elements, but the forms are registered independently.
圖20、圖21是說明圖形的邏輯處理或差分處理和驗證處理的圖,表示用於單側曝光區域檢測的圖形邏輯處理或圖形差分處理。其中,單側曝光是指,比較相鄰的重複要素時,在相鄰的部分中,具有僅單側的重複要素曝光的要素的情況。20 and 21 are diagrams for explaining logical processing or differential processing and verification processing of graphics, showing graphics logic processing or graphics difference processing for single-sided exposure area detection. Here, the one-sided exposure refers to a case where an adjacent element is compared with an element having only one side of the repeated element exposure in the adjacent portion.
例如在圖20中,光罩的重複要素A和光罩的重複要素B配置在面板基板上的指定的座標上時,與重複要素A和重複要素B對應的面板佈局要素重疊,作為區域A'、B'配置在面板基板上。For example, in FIG. 20, when the repeating element A of the reticle and the repeating element B of the reticle are placed on a designated coordinate on the panel substrate, the panel layout elements corresponding to the repeating element A and the repeating element B are overlapped as the area A', B' is disposed on the panel substrate.
區域A'是與重複要素A對應的面板基板上的區域時,在該區域中,與重複要素B對應的面板基板上的區域B'的一部分投影。即,區域A'是在面板基板上的區域中,相當於重複要素A的區域和重疊部2001的邏輯和區域,與重複要素B對應的面板佈局要素B'的一部分的投影到其中。When the area A' is a region on the panel substrate corresponding to the repeating element A, a portion of the region B' on the panel substrate corresponding to the repeating element B is projected in this region. That is, the region A' is a region on the panel substrate, and corresponds to the region of the repeating element A and the logical portion of the overlapping portion 2001, and a part of the panel layout element B' corresponding to the repeating element B is projected therein.
同樣地,區域B'是在面板基板上的區域中,相當於重複要素B的區域和重疊部2001的邏輯和區域,與重複要素A對應的面板佈局要素A'的一部分投影到其中。Similarly, the region B' is a region on the panel substrate, corresponding to the region of the repeating element B and the logical portion of the overlapping portion 2001, and a part of the panel layout element A' corresponding to the repeating element A is projected therein.
因此,如圖21所示,對與重複要素A對應的面板基板上的面板佈局要素A和區域A'的面板佈局要素取XOR時,抽取出了存在於一側而不存在於另一側的區域(單側曝光區域)2101的資料。Therefore, as shown in FIG. 21, when the panel layout elements of the panel layout element A and the area A' on the panel substrate corresponding to the repeating element A are XORed, the presence is present on one side and not on the other side. Area (unilateral exposure area) 2101 data.
這通常是重疊指定錯誤。該錯誤是光罩資料製作時的拍攝框指定錯誤、或製作光罩資料時的百葉框指定錯誤、或配置座標的指定錯誤等。通常,重疊部位的曝光資料必須被兩者完全重疊。This is usually an overlap specified error. This error is a frame frame designation error when the mask data is created, or a louver frame designation error when the mask material is created, or a designation coordinate error. Usually, the exposure data of the overlapping parts must be completely overlapped by both.
此外,在取XOR差分的表現也是同樣的。該情況下,取差分(A-A'),結果為正時,使存在於重複要素A而不存在於重複要素B的資料重疊,結果為負時,相反使不存在於重複要素A而存在於重複要素B的資料重疊。In addition, the performance of taking the XOR difference is the same. In this case, the difference (A-A') is taken. When the result is positive, the data existing in the repeating element A and not in the repeating element B is superimposed. When the result is negative, the opposite is present in the repeating element A. The data of the repeating element B overlaps.
在本例中為後者。如要根據XOR結果獲得同一資訊,則取XOR結果和重複要素A、XOR結果和重複要素B的各AND,前者的結果為邏輯1時,使存在於重複要素A而不存在於重複要素B的資料重疊,後者結果為邏輯1時,使不存在於重複要素A而存在於重複要素B的資料重疊。In this case it is the latter. If the same information is to be obtained from the XOR result, the XOR result and the repeated elements A, XOR results, and the AND of the repeating element B are taken. When the result of the former is logic 1, the present is present in the repeating element A and not in the repeating element B. The data overlaps, and when the latter result is logic 1, the data existing in the repeating element B does not overlap with the repeating element A.
差分結果具有標記,和單一的邏輯處理相比信息量大,在XOR結果中如果要獲得與差分處理完全同等的資訊,則需要追加的AND處理。總之,如是邏輯處理,則用OR和XOR及AND,如是差分處理則是OR和差分處理,從而作為資訊獲得完全等價的驗證結果。The difference result has a flag, and the amount of information is larger than that of a single logic process. If the XOR result is to obtain exactly the same information as the difference process, an additional AND process is required. In short, if it is logical processing, OR and XOR and AND, if it is differential processing, it is OR and differential processing, so as to obtain the full equivalent verification result as information.
圖22~圖24是使用網格格子說明單側曝光區域檢測的OR處理的圖。22 to 24 are diagrams for explaining OR processing of single-sided exposure region detection using a grid lattice.
邏輯處理及差分處理全部通過網格格子之間來進行。其中,OR的定義表示,結果為邏輯1時,該網格格子曝光,邏輯0時,該網格不曝光。Both the logic processing and the differential processing are performed between the grid grids. Wherein, the definition of OR indicates that when the result is logic 1, the grid lattice is exposed, and when logic 0, the grid is not exposed.
在圖22中,進行與重複要素A對應的面板基板上的 面板佈局要素A和與重複要素B對應的面板基板上的面板佈局要素B的邏輯OR處理,結果是,重複要素A、B的面板佈局要素A、B通過重疊部2001獲得重疊狀態的結果。在圖22中,重疊部2001的中心線2201顯示在網格上。In FIG. 22, on the panel substrate corresponding to the repeating element A The logical layout processing of the panel layout element A and the panel layout element B on the panel substrate corresponding to the repeating element B results in the overlapping state of the panel layout elements A and B of the overlapping elements A and B by the overlapping unit 2001. In Fig. 22, the center line 2201 of the overlapping portion 2001 is displayed on the grid.
圖23將圖22對應的顯示用網格格子點來表示,為了易於理解附圖,記載了對應的重疊部的中心線2201。即,表示取重複要素A的曝光資料L、重複要素B的曝光要素R、及它們的邏輯OR的處理結果。Fig. 23 shows the grid points for display corresponding to Fig. 22, and the center line 2201 of the corresponding overlapping portion is described for easy understanding of the drawings. That is, the processing results of the exposure data L of the repeating element A, the exposure element R of the repeating element B, and their logical ORs are shown.
圖24是表示對圖23所示的各網格格子點的邏輯和(OR)的定義的邏輯值表。○的邏輯值是0,是未曝光的網格格子點。●的邏輯值是1,是曝光的網格格子點。●包圍的區域成為曝光的區域。Fig. 24 is a table showing logical values for defining the logical sum (OR) of each grid grid point shown in Fig. 23. The logical value of ○ is 0, which is an unexposed grid grid point. The logical value of ● is 1, which is the grid point of the exposure grid. ● The enclosed area becomes the exposed area.
圖23所示的邏輯OR處理結果的圖顯示在顯示部1中。顯示部位可以是面板基板視窗9、光罩視窗10中任意一個。並且,也可去掉面板基板視窗9、光罩視窗10及功能表視窗11,在顯示部1的全部區域中顯示圖23的處理結果。並且,也可由文字顯示,這種情況下,可顯示在面板基板視窗9、光罩視窗10及功能表視窗11的任意一個中,或者去掉這些視窗,在顯示部1的整個區域中用文字顯示處理結果。A diagram of the result of the logical OR processing shown in FIG. 23 is displayed on the display unit 1. The display portion may be any one of the panel substrate window 9 and the mask window 10. Further, the panel substrate window 9, the mask window 10, and the function table window 11 may be removed, and the processing result of FIG. 23 may be displayed in all areas of the display unit 1. Further, it may be displayed by a character. In this case, it may be displayed in any one of the panel substrate window 9, the mask window 10, and the function table window 11, or these windows may be removed, and displayed in the entire area of the display unit 1 by text. process result.
圖25、圖26是使用網格格子點進行圖21的排他邏輯和(XOR)處理或差分處理時的說明圖。25 and FIG. 26 are explanatory diagrams when the exclusive logic and (XOR) processing or the difference processing of FIG. 21 are performed using the grid lattice points.
圖25中,光罩上的重複要素A的曝光資料(面板佈局要素)為L,面板基板上的區域A'的曝光資料(面板 佈局要素)為R,表示這些邏輯XOR或差分的處理結果。In Fig. 25, the exposure data (panel layout element) of the repeating element A on the mask is L, and the exposure data of the area A' on the panel substrate (panel) The layout element is R, indicating the processing result of these logical XOR or difference.
圖26是表示對圖25所示的曝光資料L、R的各網格點的排他邏輯和(XOR)、使用了曝光資料L、R的各網格格子點的(L-R)差分處理的定義的邏輯值表。Fig. 26 is a view showing the definition of the exclusive logic sum (XOR) of each grid point of the exposure data L, R shown in Fig. 25, and the (LR) difference processing of each grid grid point using the exposure data L, R. Logical value table.
○的邏輯值是0,表示曝光資料L、R兩者中存在曝光資料、或曝光資料L、R兩者中不存在曝光資料的網格。 並且,●的邏輯值是1,表示曝光資料L、R的任意一個單側中存在曝光資料的網格。並且,正●表示曝光資料L中存在曝光資料的情況,負●表示曝光資料R中存在曝光資料的情況。The logical value of ○ is 0, indicating that there is an exposure data in both of the exposure data L and R, or a mesh in which no exposure data exists in both of the exposure data L and R. Further, the logical value of ● is 1, indicating that there is a grid of exposure data on one side of the exposure data L, R. Further, positive ● indicates that there is exposure data in the exposure data L, and negative ● indicates that exposure data exists in the exposure data R.
這樣一來,檢測出僅在單側區域中存在的曝光的格子點。差分處理時,通過正負標記附加曝光的格子點存在於哪一側的資訊。因此,在XOR時,僅可判斷出結果有差異,而在差分時,通過正負標記,可附加哪個區域中單側存在曝光資料的資訊,較便利。In this way, the grid points of the exposure that are only present in the one-sided area are detected. In the differential processing, the information on which side the exposed grid point is added by the positive and negative marks. Therefore, in the XOR, only the results can be judged to be different, and in the case of the difference, it is convenient to attach the information of the exposure data on one side in which region by the positive or negative flag.
進行XOR或差分處理的結果是,在邏輯1的情況下,其網格表示曝光資料僅存在于單側的圖形資料,邏輯0的情況下,表示曝光資料存在或不存在於兩側的網格。As a result of performing XOR or differential processing, in the case of logic 1, the grid indicates that the exposure data exists only on one side of the graphic material, and in the case of logic 0, the grid indicating that the exposure data exists or does not exist on both sides .
圖27、圖28是表示最一般的面板佈局要素的重疊的說明圖。27 and 28 are explanatory views showing the superposition of the most general panel layout elements.
圖27是將光罩的想要曝光數據2707用未曝光的網格格子點2704和曝光的網格格子點2705表示的圖。FIG. 27 is a diagram showing the desired exposure data 2707 of the reticle with the unexposed grid grid dots 2704 and the exposed grid grid dots 2705.
並且,圖28是表示將分割的光罩的重複要素根據座標資訊進行曝光,從而根據獲得的曝光資料A、B重現資 料2707的形態的圖。Further, FIG. 28 is a view showing that the repeated elements of the divided mask are exposed based on the coordinate information, thereby reproducing the materials according to the obtained exposure data A and B. A diagram of the morphology of material 2707.
對於分割區域和位於其正下方的要切斷的曝光資料2707,指定重疊區域2703的重疊量,製作光罩佈局資料,因此需要驗證其是否正確的進行了復原。With respect to the divided area and the exposure data 2707 to be cut immediately below, the overlapping amount of the overlapping area 2703 is specified, and the mask layout data is created. Therefore, it is necessary to verify whether or not the restoration is correctly performed.
重疊量作為偏差值由操作部16指定時,存儲到存儲部8,CPU7當其在該範圍內時判斷其不是錯誤。在圖27、圖28中為了便於理解,記載了重疊部2703的中心線2706。在該例中,中心線2706是基於網格的,但根據重疊方法不同,也存在不基於網格的情況。When the amount of overlap is specified by the operation unit 16 as the deviation value, it is stored in the storage unit 8, and the CPU 7 judges that it is not an error when it is within the range. In FIG. 27 and FIG. 28, the center line 2706 of the overlapping portion 2703 is described for the sake of easy understanding. In this example, the centerline 2706 is grid-based, but depending on the method of overlap, there are also cases where the grid is not based.
圖29是表示配置在面板基板上的重複要素(面板佈局要素)A (L)的圖,圖30是表示配置在面板基板上的重複要素B (R)的圖,圖31是表示配置在面板基板上的重複要素A、B的邏輯積(AND)的說明圖。並且,圖32是配置在面板基板上的重複要素A、B的AND的邏輯值表,表示對於各網格格子點的AND的定義。29 is a view showing a repeating element (panel layout element) A (L) disposed on a panel substrate, FIG. 30 is a view showing a repeating element B (R) disposed on a panel substrate, and FIG. 31 is a view showing a panel disposed on a panel; An explanatory diagram of the logical product (AND) of the repeating elements A and B on the substrate. 32 is a logical value table of AND of the repetition elements A and B arranged on the panel substrate, and shows the definition of AND for each grid lattice point.
在圖29~圖32中,配置的重複要素A、B通過以○表示的未曝光的網格格子點2901和以●表示的曝光的網格格子點2902來表示非曝光區域和曝光區域。In FIGS. 29 to 32, the arranged repeating elements A and B indicate the non-exposed area and the exposed area by the unexposed mesh grid point 2901 indicated by ○ and the exposed grid grid point 2902 indicated by ●.
並且,在圖31中,配置的重複要素A、B通過重疊部2703重疊。這是產生重疊的雙重曝光的最一般的例子。檢測出的重疊部2703不是指定的寬正負內的規定的偏差值時,則不是錯誤。Further, in FIG. 31, the arranged repeating elements A and B are overlapped by the overlapping unit 2703. This is the most common example of double exposure that produces overlap. When the detected overlapping portion 2703 is not a predetermined deviation value within the specified width plus or minus, it is not an error.
圖33~圖36是表示通過AND處理抽取的雙重曝光區域的示例圖。並且,通過以○表示的未曝光的網格格子 點、及以●表示的曝光的網格格子點,表示非曝光區域和曝光區域。33 to 36 are diagrams showing an example of a double exposure region extracted by an AND process. And, by the unexposed grid lattice indicated by ○ The dots and the grid points of the exposure indicated by ● indicate the non-exposed area and the exposed area.
圖33與圖29~圖32所示的例相同,是配置在面板基板上的二個重複要素A、B以重疊部2703的重疊量配置的例子。通過配置的重複要素A、B的AND處理,重疊量(偏差值)為3網格格子,通常判斷為正常。33 is an example in which the two overlapping elements A and B arranged on the panel substrate are arranged with the overlapping amount of the overlapping portion 2703, similarly to the example shown in FIGS. 29 to 32. By the AND processing of the arranged repeating elements A and B, the amount of overlap (deviation value) is a three-grid grid, and it is normally judged to be normal.
圖34是配置在面板基板上的二個重複要素A、B作為重疊部2703僅共用一個網格格子,未進入指定的寬正負的規定的偏差值的範圍,通常判斷為錯誤的例子。在本實施方式中,如圖34所示,重疊區域為1網格格子時稱為連接曝光1。FIG. 34 shows an example in which the two overlapping elements A and B arranged on the panel substrate have only one grid grid shared by the overlapping unit 2703, and have not entered a predetermined width value of a predetermined width plus or minus, and are generally judged to be erroneous. In the present embodiment, as shown in FIG. 34, when the overlap region is a grid grid, it is referred to as connection exposure 1.
圖35的例子是配置在面板基板上的二個重複要素A、B隔一個網格格子的間隔而相鄰的資料配置。在本實施方式中,將該例稱為連接曝光2,通常判斷為錯誤。在本例中,AND處理結果的區域不被抽取,但通過進行OR處理抽取了一個關閉的圖形時,可判斷是連接曝光2的類型。The example of Fig. 35 is a data arrangement in which two repeating elements A and B arranged on a panel substrate are spaced apart by one grid grid. In the present embodiment, this example is referred to as connection exposure 2, and it is generally determined to be an error. In this example, the area of the AND processing result is not extracted, but when a closed pattern is extracted by performing the OR processing, it can be judged that the type of the exposure 2 is connected.
圖36的例子是配置在面板基板上的二個重複要素A、B隔開2個網格格子以上的間隔的資料配置。在本例中,AND處理結果的區域不被抽取,並且面板基板上配置的二個重複要素A、B在2網格格子之間,存在一個以上的非曝光區域網格格子點3601。其通過下述非曝光區域3601的抽取來檢測。The example of FIG. 36 is a data arrangement in which two repeating elements A and B arranged on a panel substrate are spaced apart from each other by two or more grids. In this example, the area of the AND processing result is not extracted, and the two repeating elements A, B disposed on the panel substrate are between the two grids, and there is one or more non-exposed area grid grid points 3601. It is detected by the extraction of the non-exposed area 3601 described below.
圖37及圖38是對具有附加了校正圖案的重複要素的光罩資料進行雙重曝光時的說明圖。37 and 38 are explanatory views of the case where the mask material having the repeating element to which the correction pattern is added is double-exposed.
在圖37中,通過設定的拍攝框1002,剪切面板佈局資料中的第1層金屬佈線3702及第2層金屬佈線3703。In FIG. 37, the first layer metal wiring 3702 and the second layer metal wiring 3703 in the panel layout data are cut by the set imaging frame 1002.
設置校正圖案時,如圖38所示,在第1層金屬佈線3702及第2層金屬佈線3703的各端部分別以比第1層金屬佈線3702、第2層金屬佈線3703的寬大規定長度的大小,在其長度方向上連續一體形成具有規定長度的校正圖案1004。When the correction pattern is provided, as shown in FIG. 38, each end portion of the first layer metal wiring 3702 and the second layer metal wiring 3703 has a predetermined length wider than the first layer metal wiring 3702 and the second layer metal wiring 3703. The size is continuously formed integrally in the longitudinal direction thereof to form a correction pattern 1004 having a predetermined length.
形成規定寬的百葉框1005,使其內邊緣1006與校正圖案1004的外邊緣側重疊預定長度(例如1個網格格子)。The louver frame 1005 having a predetermined width is formed such that the inner edge 1006 overlaps the outer edge side of the correction pattern 1004 by a predetermined length (for example, one grid lattice).
形成規定寬的百葉框1005,使百葉框1005的內邊緣1006和校正圖案1004的外邊緣重疊預定長度(例如1網格格子)。A predetermined wide louver frame 1005 is formed such that the inner edge 1006 of the louver frame 1005 and the outer edge of the correction pattern 1004 are overlapped by a predetermined length (for example, a 1 grid).
並且,也可使百葉框1005和校正圖案1004不重疊、百葉框1005內邊緣和校正圖案1004連接地形成。Further, the louver frame 1005 and the correction pattern 1004 may not be overlapped, and the inner edge of the louver frame 1005 and the correction pattern 1004 may be formed in a connected manner.
其中,產生的校正圖案1004變為區域1007,該區域是雙重曝光的物件。Among them, the generated correction pattern 1004 becomes the area 1007, which is a double-exposed object.
因此,如圖39、圖40所示,還使用AND處理的結果來驗證校正圖案1004是否正確地成為雙重曝光區域。Therefore, as shown in FIGS. 39 and 40, the result of the AND processing is also used to verify whether or not the correction pattern 1004 is correctly double-exposed.
即,在圖39中,配置在面板基板上的重複要素A、B配置成與拍攝框1002中指定的拍攝框區域3903、3904重疊。這樣一來,重複要素A的校正圖案1004與重複要素B的校正圖案1004重疊,並雙重曝光,在面板基板上,重複要素A的金屬佈線3901和重複要素B的金屬佈線3902連續形成。That is, in FIG. 39, the repeating elements A and B arranged on the panel substrate are arranged to overlap the photographing frame areas 3903 and 3904 specified in the shooting frame 1002. In this way, the correction pattern 1004 of the repeating element A overlaps with the correction pattern 1004 of the repeating element B, and is double-exposed, and the metal wiring 3901 of the repeating element A and the metal wiring 3902 of the repeating element B are continuously formed on the panel substrate.
圖40是用網格格子點表示其形態的說明圖。在圖40中,重疊重複要素A的拍攝框區域3903和重複要素B的拍攝框區域3904,在重複要素A、B的網格格子點之間進行AND邏輯處理的結果,形成了連續的區域A'、B'。此外,●是邏輯1,表示曝光的網格格子點,○是邏輯0,表示未曝光的網格格子點。Fig. 40 is an explanatory diagram showing the form of a grid dot. In FIG. 40, the shot frame area 3903 overlapping the repeating element A and the shot frame area 3904 of the repeating element B are subjected to AND logic processing between the grid grid points of the repeating elements A and B, and a continuous area A is formed. ', B'. In addition, ● is a logic 1, indicating the grid point of the exposure, and ○ is a logic 0, indicating the grid point of the unexposed grid.
並且,圖38也說明了百葉框內邊緣1006和圖形資料的雙重曝光驗證。即,驗證圖形資料(圖38的情況下為校正圖案1004)以什麼程度進入到百葉框1005內部,此時通常是作為連接曝光1(參照圖34)的"1",即以1個網格格子重疊連接。即,通常情況下,作為重疊量的偏差值以1個網格格子的情況作為正常。Also, Figure 38 illustrates dual exposure verification of the inner edge 1006 of the louver frame and the graphic material. That is, to what extent the verification pattern data (the correction pattern 1004 in the case of FIG. 38) enters into the inside of the louver frame 1005, and at this time, it is usually "1" as the connection exposure 1 (refer to FIG. 34), that is, one grid Sub-overlapping connections. In other words, in the normal case, the case where the deviation value of the overlap amount is one grid grid is normal.
但此時,適用了AND處理,雙重曝光區域比上述指定的偏差值大或小時,為錯誤。However, at this time, the AND processing is applied, and the double exposure area is larger or smaller than the above-specified deviation value, which is an error.
並且,圖38的百葉框內邊緣1006和圖形資料的雙重曝光驗證在此次的驗證中多少不同。即,僅有光罩佈局資料時,可進行驗證,因此無需座標資訊。但如圖15所示,進行一系列的處理時,當然可對根據座標資訊展開配置的結果一併進行驗證處理。Moreover, the double exposure verification of the inner edge edge 1006 of the louver frame of FIG. 38 and the graphic material is somewhat different in this verification. That is, only the mask layout data can be verified, so coordinate information is not required. However, as shown in FIG. 15, when a series of processing is performed, it is of course possible to perform verification processing on the result of the configuration based on the coordinate information.
圖41及圖42是說明非曝光區域的有無的驗證處理、即面板基板所有區域是否被光罩佈局資料162覆蓋的驗證處理的說明圖。FIG. 41 and FIG. 42 are explanatory diagrams for explaining the verification processing of the presence or absence of the non-exposed area, that is, whether or not all areas of the panel substrate are covered by the mask layout material 162.
如圖41所示,使光罩13上設置的光罩佈局資料162內的重複要素163根據座標資訊模擬地在面板基板12上 進行曝光處理,在面板基板12上模擬地形成配置面板佈局資料161。As shown in FIG. 41, the repeating element 163 in the mask layout material 162 provided on the mask 13 is simulated on the panel substrate 12 based on the coordinate information. The exposure processing is performed, and the layout panel layout material 161 is formed analogly on the panel substrate 12.
使光罩佈局資料162內的重複要素163根據座標資訊配置在面板基板12上時,如圖42所示,取在重複要素163的百葉框的內邊緣中包含的曝光物件區域、及與該曝光物件區域對應的面板基板12的區域的邏輯OR。其對所有重複要素163進行,如果面板基板12上存在變為邏輯0的網格格子,則其區域是未成為曝光物件的區域,是錯誤。When the repeating element 163 in the mask layout material 162 is placed on the panel substrate 12 based on the coordinate information, as shown in FIG. 42, the exposed object region included in the inner edge of the louver frame of the repeating element 163, and the exposure are taken The logical OR of the area of the panel substrate 12 corresponding to the object area. It is performed on all of the repeating elements 163. If there is a grid of lattices that becomes a logical zero on the panel substrate 12, the area is an area that is not an exposed object, and is an error.
圖41表示以下例子:缺少重複要素R1,因此在面板基板12上,產生未被光罩資料覆蓋(未形成面板佈局資料)的區域4101,此時CPU7識別為錯誤。Fig. 41 shows an example in which the repeating element R1 is absent, so that on the panel substrate 12, an area 4101 which is not covered by the mask material (the panel layout data is not formed) is generated, at which time the CPU 7 recognizes that it is an error.
對以上說明的光罩資料的邏輯處理和驗證專案的關係進行如下整理。The relationship between the logical processing of the mask material described above and the verification project is organized as follows.
單側曝光驗證時,邏輯處理或差分處理對圖形A和圖形B取A和B的邏輯和(A OR B),取含有其結果的圖形A的區域A'和圖形A的排他邏輯和(A' XOR A)。或者取含有上述邏輯和的結果的圖形A的區域A'和圖形A的差分。作為檢測專案,檢測出僅存在於含有圖形A的區域、存在於圖形B的區域的資料(參照圖20~圖26)。For single-sided exposure verification, logic processing or differential processing takes the logical sum (A OR B) of A and B for graph A and graph B, and takes the exclusive logical sum of area A' of graph A and graph A with its result (A ' XOR A). Or take the difference between the area A' of the graph A and the graph A containing the result of the above logical sum. As the detection project, data existing only in the region including the pattern A and the region existing in the pattern B is detected (see FIGS. 20 to 26).
在雙重曝光驗證(含有連接曝光1)時,邏輯處理或差分處理對圖形A和圖形B取A和B的邏輯積(A AND B)。 作為檢測專案,進行雙重曝光區域檢測,根據設定的參數判斷是否是錯誤,當判斷為錯誤時,將該判斷結果作為錯誤報告輸出(參照圖27~圖36、圖39、圖40)。In double exposure verification (with connection exposure 1), logic processing or differential processing takes the logical product (A AND B) of A and B for graph A and graph B. As the detection project, the double exposure area detection is performed, and it is determined whether or not it is an error based on the set parameters. When it is determined to be an error, the determination result is output as an error report (see FIGS. 27 to 36, 39, and 40).
連接曝光2的情況下,邏輯處理或差分處理對圖形A和圖形B取A和B的邏輯積(A AND B)。其結果為邏輯0(無圖形)、且A和B的邏輯和(A OR B)的結果形成一個圖形時,作為檢測專案,進行連接曝光2區域的檢測,根據設定的參數判斷是否錯誤,當判斷是錯誤時,將該判斷結果作為錯誤報告輸出(參照圖39、圖40)。In the case where the exposure 2 is connected, the logical processing or the differential processing takes the logical product (A AND B) of A and B for the graph A and the graph B. When the result is logic 0 (no graphics), and the result of logical sum (A OR B) of A and B forms a pattern, as the detection project, the detection of the connection exposure 2 area is performed, and whether the error is determined according to the set parameter is When it is determined that the error is an error, the result of the determination is output as an error report (see FIGS. 39 and 40).
非曝光驗證時,邏輯處理或差分處理將全部光罩佈局資料配置展開在面板基板上,進行邏輯和(OR)處理。作為檢測專案,將OR的位不成立(OR處理的結果為邏輯0)的網格格子點作為非曝光區域檢測(參照圖41、圖42)。For non-exposure verification, logic processing or differential processing deploys all mask layout data on the panel substrate for logical AND (OR) processing. As the detection project, the grid grid points where the OR bit is not satisfied (the result of the OR processing is logic 0) are detected as non-exposure regions (see FIGS. 41 and 42).
圖43及圖44是說明驗證結果的圖表表示的說明圖,圖43是表示顯示部1中顯示的對話方塊431的圖,圖44是表示顯示部1的面板基板視窗12中顯示的圖表資料形式的錯誤顯示的圖。43 and 44 are explanatory diagrams for explaining a graph of the verification result, FIG. 43 is a view showing a dialog box 431 displayed on the display unit 1, and FIG. 44 is a diagram showing a form of graph data displayed on the panel substrate window 12 of the display unit 1. The error shows the graph.
驗證條件等的設定通過操作部16操作對話方塊431內的操作按鈕來設定。例如,驗證全部以層單位來進行,因此操作部16進行在對話方塊431中要顯示的層的指定,接著指定要顯示的錯誤類型,來指示檢索。The setting of the verification condition or the like is set by the operation unit 16 operating the operation button in the dialog box 431. For example, the verification is all performed in the layer unit, so the operation unit 16 performs designation of the layer to be displayed in the dialog box 431, and then specifies the type of error to be displayed to indicate the retrieval.
其中,要顯示的錯誤類型包括單側曝光、雙重曝光、連接曝光1、連接曝光2、非曝光五種。各錯誤類型可指定顯示的顏色。在圖44中,●表示具有上述五種錯誤中的任意一個錯誤的網格格子點(錯誤網格格子點),○表示不具有上述錯誤的網格格子點。Among them, the types of errors to be displayed include one-sided exposure, double exposure, connection exposure 1, connection exposure 2, and non-exposure. Each error type specifies the color of the display. In Fig. 44, ● indicates a grid lattice point (error grid lattice point) having any one of the above five errors, and ○ indicates a grid lattice point having no such error.
CPU7根據設定的條件向用戶顯示錯誤有幾處。The CPU 7 displays the error to the user in accordance with the set conditions.
接著,用戶通過操作部16操作顯示操作區域432內的各操作按鈕,對錯誤地點指示下一個、前、最初、最後,則此時對於面板基板視窗12上顯示的錯誤區域顯示所指示的內容。Next, the user operates the operation buttons in the display operation area 432 by the operation unit 16, and indicates the next, the front, the first, and the last of the error location. At this time, the instructed content is displayed on the error area displayed on the panel substrate window 12.
通常錯誤地點顯示複數,例如,如指定下一個,則在所顯示的分辨度下,以上方左側為起點,向右側移動,如右側無區域,則跳到下方左側進行顯示。並且當指示放大、縮小時,則對此時顯示的中心座標顯示放大或縮小的圖表資料。Usually, the wrong location displays a complex number. For example, if the next one is specified, the displayed resolution is shifted to the right from the upper left side. If there is no area on the right side, jump to the lower left side to display. And when the indication is enlarged or reduced, the center coordinates displayed at this time display enlarged or reduced chart data.
圖45是表示檢測出的錯誤圖形的資料構造的圖。錯誤資料在頂級模組451中,自動產生錯誤模組452、454、456、458的模組名,並進行鏈結。錯誤的圖形資料453、455、457、459鏈結在各錯誤模組452、454、456、458的正下方。錯誤模組452、454、456、458的實例名、資料庫名均相同,因此即使是同樣形狀的錯誤資料也不會共用。這是因為,錯誤在面板基板上基本獨立產生。45 is a view showing a data structure of a detected error pattern. In the top module 451, the error data automatically generates the module names of the error modules 452, 454, 456, and 458, and performs chaining. The erroneous graphical data 453, 455, 457, 459 is chained directly below each of the error modules 452, 454, 456, 458. The instance names and database names of the error modules 452, 454, 456, and 458 are the same, so even error data of the same shape is not shared. This is because the errors are generated substantially independently on the panel substrate.
如上所述,在本發明的實施方式涉及的光罩驗證系統中,CPU7參照存儲部8的資料檔案存儲部5中存儲的曝光要素的圖形資料及座標資訊,產生與上述曝光要素對應的顯示面板上的面板佈局要素(佈局圖形要素),將基於複數面板佈局要素的位置關係的驗證結果顯示到顯示部1。 並且,當設定了是否是錯誤的判斷基準時,通過判斷複數上述面板佈局要素的位置關係,驗證上述曝光要素是否錯誤,將驗證結果顯示在顯示部1。在顯示部1中,面板基 板視窗9或光罩視窗10內,或與這些視窗無關的顯示區域中,顯示上述驗證結果。As described above, in the reticle verification system according to the embodiment of the present invention, the CPU 7 refers to the graphic data and the coordinate information of the exposure element stored in the material file storage unit 5 of the storage unit 8 to generate a display panel corresponding to the exposure element. The panel layout element (layout graphic element) on the upper panel displays the verification result based on the positional relationship of the plurality of panel layout elements to the display unit 1. Further, when it is determined whether or not it is an erroneous criterion, the positional relationship of the plurality of panel layout elements is determined to verify whether or not the exposure element is erroneous, and the verification result is displayed on the display unit 1. In the display unit 1, the panel base The above verification result is displayed in the panel window 9 or the mask window 10, or in a display area unrelated to these windows.
因此,本實施方式涉及的光罩驗證系統輸入光罩佈局資料和曝光要素(重複要素)的配置資訊,模擬曝光裝置的動作,且進行圖形計算處理,從而模擬進行曝光處理,進行是否通過光罩在面板基板上形成了適當的面板佈局資料的驗證,換言之,進行光罩是否適當的驗證。Therefore, the mask verification system according to the present embodiment inputs the arrangement information of the mask layout data and the exposure elements (repeating elements), simulates the operation of the exposure apparatus, and performs pattern calculation processing to simulate exposure processing and whether or not to pass the mask. Verification of appropriate panel layout data is formed on the panel substrate, in other words, whether the mask is properly verified.
即,製作的光罩資料是否正確,通過模擬曝光裝置及進行圖形計算處理,可驗證光罩資料。尤其在製造平板顯示器時,對使用的光罩資料的驗證可發揮威力,根據本實施方式,可對由光罩佈局資料和座標資訊製作的面板基板資料是否是應正確曝光的資料進行驗證。That is, whether the reticle data produced is correct, the reticle data can be verified by the analog exposure device and the graphic calculation process. Especially in the manufacture of a flat panel display, the verification of the reticle data used can exert its power. According to the embodiment, whether the panel substrate material produced by the reticle layout data and the coordinate information is correctly exposed data can be verified.
並且,可加入基於曝光裝置的動作模擬和圖形計算處理的驗證功能,因此在進入製造工序前就可驗證。Further, a verification function based on the motion simulation and the graphic calculation processing of the exposure device can be added, so that it can be verified before entering the manufacturing process.
其結果是,在平板顯示器的製造中,在包括作業時間的費用方面具有很大的效果。即,通過在製造前實施本發明的實施方式涉及的光罩驗證系統,確認光罩是否是正確的資料,則可對多餘的費用負擔的產生防患於未然。As a result, in the manufacture of a flat panel display, there is a great effect in terms of the cost including the work time. In other words, by performing the mask verification system according to the embodiment of the present invention before manufacture, it is possible to prevent the occurrence of an unnecessary cost burden by confirming whether or not the mask is correct.
其原因是,這是光罩製作費用、面板基板製作費用、包括錯誤製造時的勞務費在內的製造時間和解析時間的費用等,不用多出這些多餘的費用即可。該效果在僅需要區域分割的單純的重複配置指定的情況下也完全一樣。這是因為,重複指定中人為指示錯誤的情況較多。The reason for this is that the manufacturing cost of the mask, the manufacturing cost of the panel substrate, and the manufacturing time and the analysis time including the labor cost at the time of erroneous manufacturing are not required to be excessive. This effect is also the same in the case of a simple repeat configuration design requiring only region division. This is because there are many cases where the person specified in the designation error is repeated.
並且,根據本實施方式,可提供一種通過由具有顯示 部1、操作部16、CPU7及存儲部8的電腦執行來構建上述光罩驗證系統的光罩驗證用程式。並且提供一種起到上述效果的光罩驗證方法。And, according to the present embodiment, a pass can be provided by having a display The computer of the unit 1, the operation unit 16, the CPU 7, and the storage unit 8 executes a mask verification program for constructing the mask verification system. A reticle verification method that achieves the above effects is also provided.
此外,在上述實施方式中,使用一台電腦構建光罩驗證系統,也可使用多台電腦來構建。此時,上述各程式可根據系統構成來適當地分割。Further, in the above embodiment, the reticle verification system is constructed using one computer, and it is also possible to construct using a plurality of computers. In this case, each of the above programs can be appropriately divided according to the system configuration.
本發明可應用於進行液晶顯示器等各種顯示器製造用光罩的驗證的光罩驗證系統。並且,也可應用于作為進行各種顯示器製造用光罩的驗證的光罩驗證系統而起作用的程式。The present invention can be applied to a mask verification system that performs verification of various types of display manufacturing masks such as liquid crystal displays. Further, the present invention is also applicable to a program that functions as a mask verification system that performs verification of various types of display manufacturing masks.
1‧‧‧顯示部1‧‧‧Display Department
2‧‧‧鍵盤2‧‧‧ keyboard
3‧‧‧滑鼠3‧‧‧ Mouse
4‧‧‧程式存儲部4‧‧‧Program Storage
5‧‧‧資料檔案存儲部5‧‧‧Data Archives Storage Department
6‧‧‧檔案存儲部6‧‧‧Archives Storage Department
7‧‧‧CPU7‧‧‧CPU
8‧‧‧存儲部8‧‧‧Storage Department
9‧‧‧面板基板視窗9‧‧‧ Panel substrate window
10‧‧‧光罩視窗10‧‧‧mask window
11‧‧‧功能表視窗11‧‧‧Menu window
12、101、210、801‧‧‧面板基板12, 101, 210, 801‧‧‧ panel substrate
13、205、805、808、811‧‧‧光罩13, 205, 805, 808, 811 ‧ ‧ masks
16‧‧‧操作部16‧‧‧Operation Department
102、212‧‧‧曝光區域102, 212‧‧‧Exposure areas
103‧‧‧可曝光區域103‧‧‧Exposureable area
104‧‧‧光源系統機構104‧‧‧Light source system
105‧‧‧遮光系統機構105‧‧‧Lighting system
107‧‧‧曝光面107‧‧‧Exposure surface
162‧‧‧光罩佈局資料162‧‧‧Photomask layout information
163‧‧‧曝光要素(重複要素)163‧‧‧Exposure elements (repeated elements)
201~204‧‧‧液晶面板201~204‧‧‧LCD panel
206‧‧‧光罩佈局資料206‧‧‧Photomask layout information
161、211、802、1003‧‧‧面板佈局資料161, 211, 802, 1003‧‧‧ panel layout information
213、1002‧‧‧拍攝框213, 1002‧‧‧ shooting frame
431‧‧‧對話方塊431‧‧‧Dialog Box
432‧‧‧顯示操作區域432‧‧‧Display operating area
804‧‧‧對準標記804‧‧‧ alignment mark
806、809、810、812、813‧‧‧重複要素806, 809, 810, 812, 813‧‧ ‧ repeating elements
1004‧‧‧校正圖案1004‧‧‧correction pattern
1005‧‧‧百葉框1005‧‧‧ louver frame
1006‧‧‧內邊緣1006‧‧‧ inner edge
1007‧‧‧進行雙重曝光的部位1007‧‧‧Double exposure
1008、2001、2703‧‧‧重疊部1008, 2001, 2703‧‧‧ overlap
1301‧‧‧斜線部1301‧‧‧Slash Department
2101‧‧‧單側曝光區域2101‧‧‧One-sided exposure area
2201、2706‧‧‧中心線2201, 2706‧‧‧ center line
2707‧‧‧曝光數據2707‧‧‧Exposure data
2704、2705、2901、2902‧‧‧網格格子點2704, 2705, 2901, 2902‧‧‧ grid grid points
3601‧‧‧非曝光區域網格格子點3601‧‧‧Unexposure area grid grid points
3702、3703、3901、3902‧‧‧金屬佈線3702, 3703, 3901, 3902‧‧‧ metal wiring
3903、3904‧‧‧拍攝框區域3903, 3904‧‧‧ Frame area
圖1是表示本發明的實施方式中的平板顯示器用面板基板和光罩的關係的圖;圖2是表示本發明的實施方式中的面板基板上的面板佈局資料和光罩上的光罩佈局資料的關係的圖;圖3是表示在本發明的實施方式中產生光罩資料時的整體的顯示內容的圖;圖4是表示在本發明的實施方式中產生光罩資料時的整體處理的流程圖;圖5是表示本發明的實施方式中的面板佈局資料的構造的圖;圖6是表示本發明的實施方式中的光罩資料的構造的圖; 圖7是本發明的實施方式中的光罩資料的表格;圖8是表示本發明的實施方式中的座標資訊輸出處理的圖;圖9是表示本發明的實施方式中的座標資訊輸出處理的圖;圖10是表示本發明的實施方式中的曝光區域的分割處理方法的說明圖;圖11是表示本發明的實施方式中的曝光區域的分割處理方法的說明圖;圖12是表示本發明的實施方式中的曝光區域的分割處理方法的說明圖;圖13是表示本發明的實施方式中的曝光要素的圖;圖14是本發明的實施方式涉及的光罩驗證系統的框圖;圖15是表示本發明的實施方式涉及的光罩驗證系統的處理的流程圖;圖16是表示本發明的實施方式中的各種資料的關係的圖;圖17是本發明的實施方式中的資料的表格;圖18是表示本發明的實施方式中的面板基板上的資料構造的圖;圖19是表示本發明的實施方式中的面板基板上的資料構造所對應的表格構造的圖;圖20是表示本發明的實施方式中的圖形的各種處理 的說明圖;圖21是表示本發明的實施方式中的圖形的各種處理的說明圖;圖22是表示本發明的實施方式中的單側曝光區域檢測的OR處理的說明圖;圖23是表示本發明的實施方式中的單側曝光區域檢測的OR處理的說明圖;圖24是表示本發明的實施方式中的單側曝光區域檢測的OR處理的說明圖;圖25是表示本發明的實施方式中的排他邏輯和處理或差分處理的說明圖;圖26是表示本發明的實施方式中的排他邏輯和處理或差分處理的說明圖;圖27是表示本發明的實施方式中的曝光資料的重疊的說明圖;圖28是表示本發明的實施方式中的曝光資料的重疊的說明圖;圖29是表示本發明的實施方式中的配置在面板基板上的重複要素的圖;圖30是表示本發明的實施方式中的配置在面板基板上的重複要素的圖;圖31是表示本發明的實施方式中的配置在面板基板上的重複要素的邏輯積的說明圖;圖32是表示本發明的實施方式中的配置在面板基板 上的重複要素的邏輯值表;圖33是表示本發明的實施方式中的雙重曝光區域的例子的圖;圖34是表示本發明的實施方式中的雙重曝光區域的例子的圖;圖35是表示本發明的實施方式中的雙重曝光區域的例子的圖;圖36是表示本發明的實施方式中的雙重曝光區域的例子的圖;圖37是本發明的實施方式中的雙重曝光處理的說明圖;圖38是本發明的實施方式中的雙重曝光處理的說明圖;圖39是本發明的實施方式中的雙重曝光驗證處理的說明圖;圖40是本發明的實施方式中的雙重曝光驗證處理的說明圖;圖41是本發明的實施方式中的非曝光區域驗證處理的說明圖;圖42是本發明的實施方式中的非曝光區域驗證處理的說明圖;圖43是本發明的實施方式中的驗證結果的說明圖;圖44是本發明的實施方式中的驗證結果的說明圖;圖45是表示在本發明的實施方式中檢測出的錯誤圖 形的資料構造的圖;1 is a view showing a relationship between a panel substrate for a flat panel display and a photomask according to an embodiment of the present invention; and FIG. 2 is a view showing panel layout data on a panel substrate and mask layout information on a photomask according to an embodiment of the present invention; FIG. 3 is a view showing the overall display content when the mask data is generated in the embodiment of the present invention; and FIG. 4 is a flowchart showing the overall processing when the mask data is generated in the embodiment of the present invention. FIG. 5 is a view showing a structure of panel layout data in an embodiment of the present invention; and FIG. 6 is a view showing a structure of a mask material in an embodiment of the present invention; 7 is a table showing mask data in the embodiment of the present invention; FIG. 8 is a view showing coordinate information output processing in the embodiment of the present invention; and FIG. 9 is a graph showing coordinate information output processing in the embodiment of the present invention. FIG. 10 is an explanatory view showing a method of dividing the exposure region in the embodiment of the present invention; FIG. 11 is an explanatory view showing a method of dividing the exposure region in the embodiment of the present invention; FIG. 13 is a view showing an exposure element in an embodiment of the present invention; FIG. 14 is a block diagram showing a mask verification system according to an embodiment of the present invention; 15 is a flowchart showing the processing of the mask verification system according to the embodiment of the present invention; FIG. 16 is a diagram showing the relationship between various materials in the embodiment of the present invention; and FIG. 17 is the data in the embodiment of the present invention. FIG. 18 is a view showing a material structure on a panel substrate in an embodiment of the present invention; and FIG. 19 is a view showing a data structure on a panel substrate in an embodiment of the present invention; FIG configuration corresponding to the table; FIG. 20 is a graph showing the various process embodiments of the present invention in FIG. 21 is an explanatory view showing various processes of the pattern in the embodiment of the present invention. FIG. 22 is an explanatory view showing an OR process of the one-side exposure area detection in the embodiment of the present invention; FIG. 24 is an explanatory view showing an OR process of single-side exposure region detection in the embodiment of the present invention; FIG. 25 is an explanatory view showing an OR process of the present invention. FIG. 26 is an explanatory diagram showing exclusive logic and processing or difference processing in the embodiment of the present invention; FIG. 27 is an explanatory diagram showing exposure data in the embodiment of the present invention. FIG. 28 is an explanatory view showing overlapping of exposure data in the embodiment of the present invention; FIG. 29 is a view showing a repeating element disposed on the panel substrate in the embodiment of the present invention; A diagram of a repeating element disposed on a panel substrate in an embodiment of the present invention; and FIG. 31 is a diagram showing a logic of a repeating element disposed on a panel substrate in an embodiment of the present invention; An illustration of the accumulation; FIG. 32 is a diagram showing the arrangement of the panel substrate in the embodiment of the present invention. FIG. 33 is a view showing an example of a double exposure region in the embodiment of the present invention; FIG. 34 is a view showing an example of a double exposure region in the embodiment of the present invention; FIG. 36 is a view showing an example of a double exposure region in the embodiment of the present invention; FIG. 37 is a view showing a double exposure process in the embodiment of the present invention; FIG. 38 is an explanatory diagram of double exposure processing in the embodiment of the present invention; FIG. 39 is an explanatory diagram of double exposure verification processing in the embodiment of the present invention; and FIG. 40 is double exposure verification in the embodiment of the present invention. FIG. 41 is an explanatory diagram of a non-exposure area verification process in the embodiment of the present invention; FIG. 42 is an explanatory diagram of a non-exposure area verification process in the embodiment of the present invention; and FIG. 43 is an implementation of the present invention. FIG. 44 is an explanatory diagram of a verification result in the embodiment of the present invention; FIG. 45 is an explanatory diagram of the verification result in the embodiment of the present invention; Figure mistake a map of the shape of the data;
1‧‧‧顯示部1‧‧‧Display Department
2‧‧‧鍵盤2‧‧‧ keyboard
3‧‧‧滑鼠3‧‧‧ Mouse
4‧‧‧程式存儲部4‧‧‧Program Storage
5‧‧‧資料檔案存儲部5‧‧‧Data Archives Storage Department
6‧‧‧檔案存儲部6‧‧‧Archives Storage Department
7‧‧‧CPU7‧‧‧CPU
8‧‧‧存儲部8‧‧‧Storage Department
9‧‧‧面板基板視窗9‧‧‧ Panel substrate window
10‧‧‧光罩視窗10‧‧‧mask window
11‧‧‧功能表視窗11‧‧‧Menu window
12‧‧‧面板基板12‧‧‧ Panel substrate
13‧‧‧光罩13‧‧‧Photomask
16‧‧‧操作部16‧‧‧Operation Department
102‧‧‧曝光區域102‧‧‧Exposure area
Claims (133)
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JP2007229215A JP5020003B2 (en) | 2007-09-04 | 2007-09-04 | Reticle verification system and program |
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TW200915462A TW200915462A (en) | 2009-04-01 |
TWI384568B true TWI384568B (en) | 2013-02-01 |
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KR (1) | KR101041263B1 (en) |
CN (1) | CN101382736B (en) |
TW (1) | TWI384568B (en) |
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CN102981356A (en) * | 2012-12-14 | 2013-03-20 | 京东方科技集团股份有限公司 | Method for reducing mask board splicing errors |
JP6598421B2 (en) | 2013-02-22 | 2019-10-30 | キヤノン株式会社 | Mask pattern determination method, program, and information processing apparatus |
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JPH10214770A (en) * | 1997-01-30 | 1998-08-11 | Sony Corp | Method and equipment for verifying joint at the time of pattern transfer in split exposure |
JPH10339942A (en) * | 1997-06-09 | 1998-12-22 | Mitsubishi Electric Corp | Layout pattern verification device |
JPH11119410A (en) * | 1997-10-14 | 1999-04-30 | Fujitsu Ltd | Pattern designing method and pattern designing device |
JP2000089448A (en) * | 1998-09-11 | 2000-03-31 | Fujitsu Ltd | Method for displaying, inspecting and modifying pattern for exposure |
JP2000267254A (en) * | 1999-03-17 | 2000-09-29 | Fujitsu Ltd | Pattern data verifying method and storage medium therefor |
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JP2004265386A (en) * | 2003-02-10 | 2004-09-24 | Toshiba Matsushita Display Technology Co Ltd | Pattern simulation method, its program, medium storing program, and device for pattern simulation |
JP2005005520A (en) * | 2003-06-12 | 2005-01-06 | Renesas Technology Corp | Method of manufacturing photomask for evaluating aligner, same photomask, and method of evaluating aberration |
KR100911595B1 (en) * | 2004-03-09 | 2009-08-07 | 호야 가부시키가이샤 | Method and system for obtaining mask blank information, method for providing mask blank information, method for supporting transfer mask manufacture and manufacturing transfer mask, and method for manufacturing and providing mask blank |
JP2008304716A (en) * | 2007-06-07 | 2008-12-18 | Jedat Inc | System and program for designing reticle |
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- 2007-09-04 JP JP2007229215A patent/JP5020003B2/en not_active Expired - Fee Related
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2008
- 2008-08-06 KR KR1020080076841A patent/KR101041263B1/en not_active IP Right Cessation
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US5594258A (en) * | 1993-07-15 | 1997-01-14 | Texas Instruments Incorporated | Semiconductor device with reticle specific implant verification indicator |
US6784446B1 (en) * | 2002-08-29 | 2004-08-31 | Advanced Micro Devices, Inc. | Reticle defect printability verification by resist latent image comparison |
TW200501294A (en) * | 2003-06-18 | 2005-01-01 | Macronix Int Co Ltd | MROM mask verification method |
TW200525302A (en) * | 2004-01-27 | 2005-08-01 | Taiwan Semiconductor Mfg | System and method for processing masks with oblique features |
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CN101382736B (en) | 2011-10-05 |
KR101041263B1 (en) | 2011-06-14 |
JP5020003B2 (en) | 2012-09-05 |
TW200915462A (en) | 2009-04-01 |
KR20090024616A (en) | 2009-03-09 |
CN101382736A (en) | 2009-03-11 |
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