JP5061422B2 - Pattern correction method and pattern correction apparatus - Google Patents

Description

  The present invention relates to a pattern correction method and a pattern correction apparatus related to device layout design, a photomask created by using a mask pattern corrected thereby, and a device.

  In the device design stage, layout design is performed so as not to generate minute figures in the mask pattern. However, with the recent miniaturization of semiconductor technology, it has become difficult to form the pattern shape of the mask in accordance with the planned shape and dimensions on the wafer. For this reason, in a miniaturized mask pattern, a figure is added to the mask pattern in advance, or optical proximity effect correction (OPC: Optical Proximity Effect Correction) is performed to correct the size according to the density. The minute step generated at the edge of the mask pattern due to the optical proximity effect correction leads to the generation of a large number of minute figures and the increase in the data volume due to the increase in the number of figures after the figure division.

For this reason, various mask pattern correction methods after optical proximity effect correction for the purpose of reducing minute figures have been proposed (see, for example, Patent Document 1). The correction method disclosed in Patent Document 1 performs edge correction in units of one side in order to eliminate a minute step generated at the edge of the mask pattern.
JP 2003-195473 A

  Due to the optical proximity effect correction, the difference in the positions of the minute steps on the opposing edges of the mask pattern is a major factor that hinders the generation of a large number of minute figures and the reduction of the data volume after figure division. However, since the correction method disclosed in Patent Document 1 performs edge correction in units of one side, it is a countermeasure against the number of minute figures generated in large quantities due to the difference in the positions of minute steps on opposite edges of the mask pattern. No effective measures have been taken to reduce the data volume after figure division.

  Accordingly, the present invention provides a pattern correction method and a pattern correction apparatus that can reduce the number of minute figures generated in large quantities due to the difference in position of minute steps on opposite edges of a mask pattern and reduce the data volume after figure division. An object of the present invention is to provide a photomask and a device which are created by using a mask pattern corrected by them.

  According to the pattern correction method of the present invention, the first edge and the second edge that are opposed in parallel at an edge having a length longer than 0 constituting the outline of the mask pattern stored in the storage means, A detection step of detecting a third edge that makes a point contact perpendicularly and detecting a fourth edge that makes a point contact perpendicular to the second edge; a position of the third edge in a direction parallel to the first edge; and the fourth edge A determination step for determining whether a deviation amount from an edge position is equal to or less than a predetermined amount; and if the deviation amount is equal to or less than the predetermined amount, the third edge and the fourth edge are perpendicular to the first edge. And a correction step of correcting the position of at least one of the third edge and the fourth edge so as to be on the same perpendicular line that intersects.

  In the pattern correction method, in the correction step, the position of the fourth edge is corrected so that the fourth edge is positioned on a perpendicular line where the third edge is perpendicular to the first edge.

  According to the pattern correction method of the present invention, the first edge and the second edge that are parallelly opposed to each other at the edge having a length longer than 0 constituting the outline of the mask pattern after the optical proximity effect correction stored in the first storage means. A detection step of detecting a third edge that makes point contact perpendicularly to the first edge, and detects a fourth edge that makes point contact perpendicular to the second edge; and the first edge in a direction parallel to the first edge. A determination step of determining whether a deviation amount between the position of the three edges and the position of the fourth edge is equal to or less than a predetermined amount; and if the deviation amount is equal to or less than the predetermined amount, the third edge is defined as the first edge. A correction step for correcting the position of the fourth edge so that the fourth edge is positioned on a perpendicular line that makes a point contact vertically; and after wafer transfer based on a mask pattern obtained by the correction step A comparison is made between the image pattern and the mask pattern before optical proximity effect correction stored in the second storage means, and based on the result of this comparison, the position of the edge of the outline forming the image pattern and the optical proximity A verification step of verifying whether the difference between the position of the edge of the contour line constituting the mask pattern before effect correction is within the allowable range, and if the difference is not within the allowable range, after the correction in the correction step And a re-correction step of translating a predetermined amount of the position of the edge that makes point contact with the fourth edge vertically while making point contact with the straight line where the fourth edge is located.

  In the pattern correction apparatus of the present invention, the first storage means for storing the mask pattern to be corrected and the edge constituting the outline of the mask pattern stored in the first storage means are parallel at an edge longer than zero. Detecting means for detecting a third edge point-contacting perpendicularly to the first edge and detecting a fourth edge point-contacting perpendicularly to the second edge with respect to the first edge and the second edge opposite to each other; Determining means for determining whether a deviation amount between the position of the third edge and the position of the fourth edge in a direction parallel to the first edge is a predetermined amount or less; and if the deviation amount is the predetermined amount or less, Correction means for correcting the position of the fourth edge so that the fourth edge is positioned on a perpendicular line where the third edge is perpendicular to the first edge, and the mask pattern corrected by the correction means A second storage means for storing, and further comprising a.

The photomask of the present invention is drawn based on the mask pattern corrected by any one of the above pattern correction methods.
The device of the present invention is manufactured based on the mask pattern corrected by any one of the above pattern correction methods.
The device of the present invention is manufactured using a photomask drawn based on the mask pattern corrected by any one of the pattern correction methods.

  According to the present invention, it is possible to reduce the number of drawn figures and prevent an increase in data volume by aligning the positions of edges that are vertically point-contacted with both opposing edges of the mask pattern. Further, by preventing the increase in the data volume, the data transfer time of the mask pattern can be shortened. In addition, according to the photomask and device of the present invention, the mask is produced using a mask pattern with a small number of drawing figures, so that the manufacturing time can be shortened.

<< First Embodiment >>
A functional configuration of the pattern correction apparatus according to the first embodiment of the present invention will be described with reference to FIGS. FIG. 1 is a functional block diagram of the pattern correction apparatus according to the present embodiment. FIG. 2 is a supplementary diagram for explaining the function of the pattern correction apparatus of FIG.
The pattern correction apparatus 1 shown in FIG. 1 has each unit that functions as an input data storage unit 2, a detection unit 3, a determination unit 4, a correction unit 5, and an output data storage unit 6.

The input data storage unit 2 is a storage device that stores a mask pattern corrected by optical proximity effect correction (OPC). The mask pattern stored in the input data storage unit 2 may be a mask pattern corrected by a method other than optical proximity correction (OPC).
The detection unit 3 is configured to detect each position coordinate (input data storage unit) of an edge having a length longer than 0 (hereinafter, referred to as an outline configuration edge as appropriate) constituting the outline of the mask pattern stored in the input data storage unit 2. 2), the edges (hereinafter referred to as “vertical crossing edges”) that are vertically point-contacted with respect to both of the parallel opposing edges (hereinafter referred to as “opposing edges”), respectively. To detect. In the example of FIG. 2, the detection unit 3 detects an edge 13 that makes point contact perpendicular to the edge 11 and detects an edge 14 that makes point contact perpendicular to the edge 12, for the edge 11 and edge 12 that face each other in parallel in the mask pattern. To detect.

The determination unit 4 uses the position coordinates of the vertical crossing edges detected by the detection unit 3 to determine whether or not the deviation amount of the positions of the two vertical crossing edges in the direction parallel to the opposite edges is equal to or less than a predetermined amount. To do. In the example of FIG. 2, the determination unit 4 determines whether a deviation amount 15 between the position of the edge 13 and the position of the edge 14 in the direction parallel to the edge 11 is equal to or less than a predetermined amount.
The correction unit 5 corrects the positions of the two vertical intersection edges so that the positions of the two vertical intersection edges are on the same perpendicular line perpendicular to the opposite edge if the deviation amount is equal to or less than the predetermined amount. In the example of FIG. 2, the correction unit 5 determines that the edge 13 and the edge 14 are on the perpendicular 16 with respect to the edge 12 at a position where the edge 13 and the edge 14 are in point contact with the edge 12 of the edge 14 if the deviation amount is equal to or less than a predetermined amount. Is corrected to a position on the vertical line 16 to correct the mask pattern.
The output data storage unit 6 stores a mask pattern obtained by correcting the mask pattern stored in the input data storage unit 2.

Next, a pattern correction method performed in the pattern correction apparatus of FIG. 1 will be described with reference to FIG. FIG. 3 is a flowchart showing the flow of processing of the pattern correction method executed by the pattern correction apparatus of FIG.
The detection unit 3 detects a vertical crossing edge that vertically makes point contact with each of the opposing edges that are parallel to each other in the contour edge of the mask pattern stored in the input data storage unit 2 (step S1). The determination unit 4 determines whether or not the deviation amount of the positions of the two vertical intersecting edges detected in step S1 in the direction parallel to the opposite edges is equal to or less than a predetermined amount (step S2). The correction unit 5 determines whether the vertical crossing edge is perpendicular to the opposing edge with respect to the vertical crossing edges whose deviation amount is determined to be equal to or less than the predetermined amount in step S2 (for example, one vertical crossing edge is the opposing edge). The position of both vertical intersecting edges is corrected so as to be on the vertical line at the point contact position and stored in the output data storage unit 6 (step S3).

  If the mask pattern is corrected as described above, as shown in FIG. 2, four divisions are required before correction, but two divisions are necessary after correction, and the number of minute figures generated in large quantities. Thus, the data volume after figure division can be reduced.

<< Second Embodiment >>
A functional configuration of the pattern correction apparatus according to the second embodiment of the present invention will be described with reference to FIGS. FIG. 4 is a functional block diagram of the pattern correction apparatus according to the present embodiment. 5 to 18 are supplementary diagrams for explaining the function of the pattern correction apparatus of FIG.
The pattern correction apparatus 100 shown in FIG. 4 includes an input data storage unit 101, an edge detection unit 102, an outward graphic generation unit 103, an inward graphic generation unit 104, a non-contact edge detection unit 105, a predetermined angle edge detection unit 106, a contact Edge detection unit 107, opposed graphic generation unit 108, in-pattern graphic selection unit 109, selected graphic synthesis unit 110, 6 vertex graphic selection unit 111, 4 vertex graphic generation unit 112, external graphic generation unit 113, contact graphic selection unit 114, Each unit functions as a non-contact graphic selection unit 115, a graphic addition unit 116, and an output data storage unit 117.

The input data storage unit 101 is a storage device that stores a mask pattern corrected by optical proximity effect correction (OPC). The mask pattern stored in the input data storage unit 2 may be a mask pattern corrected by a method other than optical proximity correction (OPC).
The edge detection unit 102 uses each position coordinate of the external configuration edge of the mask pattern stored in the input data storage unit 101 and has a length equal to or longer than a predetermined amount (11th specified amount) of the mask pattern. An edge having a length equal to or shorter than a predetermined amount (a twelfth specified amount) of a mask pattern sandwiched between the edges and vertically making point contact with them is detected.
In the example of FIG. 5, the edges 151 to 154 are edges having a length equal to or greater than the eleventh specified amount, the edges 155 and 156 are edges having a length equal to or less than the twelfth specified amount, and the edge 155 is adjacent to the edge 152. Between the vertices in which the matching relationship is point contact with the angle (outer angle) where the mask pattern does not exist 90 degrees, and the adjacent relationship with the edge 151 is the point where the angle (inner angle) where the mask pattern exists is point contact with 90 degrees If the edge 156 is point-contacted with the edge 154 adjacent to the edge 154 at an outer angle of 90 degrees, and the edge 153 is pointed between the vertices adjacent to the edge 153 with the inner angle 90 degrees point-contacted, the edge detector 102 detects edges 155 and 156 from the edges 151 to 156.

The outward graphic generation unit 103 moves, for each edge detected by the edge detection unit 102, a predetermined amount (a thirteenth predetermined amount) in parallel to the edge and in the outward direction of the mask pattern. A figure composed of a region through which the edge passes is created.
Referring to FIG. 6, the outward graphic generation unit 103 passes the edge 155 while moving the edge 155 detected by the edge detection unit 102 in parallel with the edge 155 and in the outward direction of the mask pattern. A figure 157 composed of a region to be created is created. The outward graphic generation unit 103 includes a region through which the edge 156 passes while moving the edge 156 detected by the edge detection unit 102 in parallel with the edge 156 and in the outward direction of the mask pattern. A figure 158 is created.

While the inward-figure generating unit 104 moves each of the edges detected by the edge detecting unit 102 in a predetermined amount (a thirteenth predetermined amount) in parallel to the edge and inward of the mask pattern. A figure composed of a region through which the edge passes is created.
Referring to FIG. 7, the inward-figure generating unit 104 passes the edge 155 while moving the edge 155 detected by the edge detection unit 102 in parallel with the edge 155 and in the inner direction of the mask pattern by the thirteenth predetermined amount. A figure 159 made up of the area to be created is created. The inward graphic generation unit 104 includes a region through which the edge 156 passes while moving the edge 156 detected by the edge detection unit 102 in parallel with the edge 156 and in the inner direction of the mask pattern. A figure 160 is created.

The non-contact edge detection unit 105 includes edges that are not in line contact with edges forming a graphic created by the inward graphic generation unit 104 among edges constituting the graphic created by the outward graphic generation unit 103 (non-contact). (Contact edge) is detected.
6 to 8, the non-contact edge detection unit 105 uses the graphics 159 and 160 created by the inward graphics generation unit 104 among the edges constituting the graphic 157 created by the outward graphics generation unit 103. Edges (non-contact edges) 161 to 163 that are not in line contact with the constituent edges are detected. Further, the non-contact edge detection unit 105 makes line contact with the edges constituting the graphics 159 and 160 created by the inward graphics generation unit 104 among the edges constituting the graphic 158 created by the outward graphics generation unit 103. Undetected edges (non-contact edges) 164 to 166 are detected.

The predetermined angle edge detection unit 106 detects an edge (predetermined angle edge) extending in a predetermined direction from the edges (non-contact edge) detected by the non-contact edge detection unit 105.
Referring to FIGS. 8 and 9, if the predetermined direction is the direction in which the edges 151 to 154 extend, the predetermined angle edge detection unit 106 includes the edges (non-contact edges) 161 detected by the non-contact edge detection unit 105. Edges (predetermined angle edges) 161, 163, 164, and 166 parallel to the edges 151 to 154 are detected from 166.

The contact edge detection unit 107 is an edge that is in line contact with an external configuration edge of the mask pattern stored in the input data storage unit 101 among the edges (predetermined angle edges) detected by the predetermined angle edge detection unit 106. Line contact edge) is detected.
Referring to FIGS. 9 and 10, the contact edge detection unit 107 includes the edges and lines of the mask pattern outline among the edges (predetermined angle edges) 161, 163, 164, and 166 detected by the predetermined angle edge detection unit 106. Edges (line contact edges) 163 and 164 that are in contact are detected.

The opposing figure generation unit 108 determines, for each of the edges (line contact edges) detected by the contact edge detection unit 107, a predetermined amount (first number) of the distance from the line contact edge to the outline component edge existing in the perpendicular direction. 14 prescribed amount) or less, and if it is less, create a figure consisting of the area through which the line contact edge passes while moving the line contact edge in parallel to the contour edge that exists in the perpendicular direction To do.
Referring to FIG. 11, assuming that the distance between the edge 163 and the edge 153 and the distance between the edge 164 and the edge 152 are equal to or less than the fourteenth predetermined amount, the opposing figure generation unit 108 is detected by the contact edge detection unit 107. Then, a figure 167 including a region through which the edge 163 passes is created while the edge (line contact edge) 163 is moved in parallel to the edge (outline configuration edge) 153 existing in the perpendicular direction, and the edge (line contact edge) is created. While moving 164 in parallel to the edge (outline configuration edge) 152 existing in the perpendicular direction, a figure 168 composed of a region through which the edge 164 passes is created.

The in-pattern graphic selection unit 109 selects a graphic that is completely included in the mask pattern stored in the input data storage unit 101 from among the graphics created by the counter graphic generation unit 108.
The selected figure combining unit 110 combines the figures selected by the in-pattern figure selecting unit 109 to create a new figure.
Referring to FIG. 12, since the figure 167 and figure 168 created by the opposed figure generation unit 108 are completely included in the mask pattern, the figure 167 and figure 168 are selected by the figure selection unit 109 and selected. The figure composition unit 110 composes the selected figure 167 and figure 168 to create a figure 169.
A plurality of directions can be arbitrarily set as the predetermined direction. When a plurality of directions are set, the predetermined angle edge detection unit 106, the contact edge detection unit 107, the opposing graphic generation unit 108, the in-pattern graphic selection unit 109, the selected graphic synthesis The unit 110 performs processing for each predetermined direction.

The six-vertex graphic selection unit 111 selects a graphic having six vertices from the graphic synthesized by the selected graphic synthesis unit 110.
Referring to FIG. 13, since the figure 169 created by the selected figure composition unit 110 has six vertices 170 to 175, the six-vertex figure selection unit 111 has six vertices (six-vertex figure). ) To select the figure 169.

The four-vertex graphic generation unit 112 has three vertices of the six-vertex graphic as vertices for each of the graphic (six-vertex graphic) selected by the six-vertex graphic selection unit 111, and includes all of the area of the six-vertex graphic A figure (rectangle) having four numbers is created.
Referring to FIG. 14, the four-vertex graphic generation unit 112 has the vertices 170, 171, and 175 as vertices for the graphic 169 selected by the six-vertex graphic selection unit 111, and includes a graphic 176 that includes the entire area of the graphic 169. Create

For each of the four-vertex graphics created by the four-vertex graphics generation unit 112, the external figure generation unit 113 removes the figure of the four-vertex figure from which the six-vertex figure area that is the basis of creation is removed. create.
Referring to FIGS. 13 to 15, the external graphic generation unit 113 removes the area of the 6-vertex graphic 169 that is the basis of the generation from the area of the 4-vertex graphic 176 generated by the 4-vertex graphic generation unit 112. The figure 177 is created.

The contact graphic selection unit 114 selects a graphic that makes line contact with any of the graphics selected by the six-vertex graphic selection unit 111 (six-vertex graphic) from among the graphics created by the outward graphic generation unit 103.
Referring to FIGS. 6, 13, and 16, since the figures 157 and 158 are in line contact with the figure 169, the contact figure selection unit 114 includes the inside of the figures 157 and 158 created by the outward figure generation unit 103. Then, the figures 157 and 158 in line contact with the figure (six-vertex figure) 169 selected by the six-vertex figure selection unit 111 are selected.

The non-contact graphic selection unit 115 selects a graphic that does not overlap the graphic created by the external graphic generation unit 113 from the graphic selected by the contact graphic selection unit 114.
15 to 17, the graphic 157 and the graphic 177 do not overlap with each other, but the graphic 158 and the graphic 177 overlap with each other. Therefore, the non-contact graphic selecting unit 115 selects the graphic 157 and 158 selected by the contact graphic selecting unit 114. A graphic 157 that does not overlap with the graphic 177 created by the external graphic generation unit 113 is selected from the above.

The figure adding unit 116 corrects the mask pattern by adding the figure selected by the non-contact figure selecting unit 115 to the mask pattern stored in the input data storage unit 101.
Referring to FIG. 18, the graphic adding unit 116 adds the graphic 157 selected by the non-contact graphic selecting unit 115 to the mask pattern stored in the input data storage unit 101, and newly adds the shape obtained by the addition. Mask pattern.

  The output data storage unit 117 is a storage device that stores a mask pattern after a figure is added by the figure addition unit 116 to the mask pattern stored in the input data storage unit 101.

Next, a pattern correction method performed in the pattern correction apparatus of FIG. 4 will be described with reference to FIG. FIG. 19 is a flowchart showing the flow of processing of the pattern correction method executed by the pattern correction apparatus of FIG.
The edge detection unit 102 uses each position coordinate of the external configuration edge of the mask pattern stored in the input data storage unit 101 and has a length equal to or longer than a predetermined amount (11th specified amount) of the mask pattern. Edges having a length equal to or shorter than a predetermined amount (a twelfth specified amount) of the mask pattern sandwiched between the edges and vertically making point contact with the edges are detected (step S101).

  For each of the edges detected in step S101, the outward graphic generation unit 103 moves the edges in parallel with the edges and a predetermined amount (a thirteenth specified amount) in the outward direction of the mask pattern. A graphic consisting of a region through which the symbol passes is created (step S102). For each of the edges detected in step S101, the inward-facing graphic generation unit 104 moves the edge in parallel with the edge and a predetermined amount (13th specified amount) in the inner direction of the mask pattern. A figure composed of a region through which the character passes is created (step S103). The non-contact edge detection unit 105 detects an edge (non-contact edge) that is not in line contact with the edge constituting the graphic created in step S103 among the edges constituting the graphic created in step S102 (step non-contact). S104).

  The predetermined angle edge detection unit 106 detects an edge (predetermined angle edge) extending in a predetermined direction from the edges (non-contact edge) detected in step S104 (step S105). The contact edge detection unit 107 is an edge (line contact edge) that is in line contact with the contour edge of the mask pattern stored in the input data storage unit 101 among the edges (predetermined angle edges) detected in step S105. Is detected (step S106). For each of the edges (line contact edges) detected in step S106, the opposing figure generation unit 108 determines a predetermined amount (14th specified amount) from the line contact edge to the outer shape constituent edge existing in the perpendicular direction. ) If it is equal to or less, if it is equal to or less, create a figure consisting of a region through which the line contact edge passes while moving in parallel to the contour edge existing in the perpendicular direction (step) S107). Note that the opposed graphic generation unit 108 does not create a graphic for a line contact edge that is not less than or equal to the fourteenth specified amount.

  The in-pattern graphic selection unit 109 selects a graphic that is completely included in the mask pattern stored in the input data storage unit 101 from among the graphics created in step S107 (step S108). The selected figure composition unit 110 composes the figure selected in step S108 and creates a new figure (step S109). The six-vertex graphic selection unit 111 selects a graphic having six vertices from the graphic newly synthesized in step S109 (step S110). The four-vertex graphic generation unit 112 uses three vertices of the six-vertex graphic as vertices for each graphic (six-vertex graphic) selected in step S109, and the number of vertices including all the areas of the six-vertex graphic is four. Two figures (rectangles) are created (step S111).

  The external figure generation unit 113 creates a figure for each of the four-vertex figures created in step S111 by excluding the 6-vertex figure area that is the basis of the creation from the 4-vertex figure area (step S111). S112). The contact figure selection unit 114 selects a figure that makes line contact with any of the figures (six-vertex figures) selected in step S110 from the figures created in step S102 (step S113). The non-contact graphic selection unit 115 selects a graphic that does not overlap the graphic created in step S112 from the graphic selected in step S113 (step S114). The graphic adding unit 116 corrects the mask pattern by adding the graphic selected in step S114 to the mask pattern stored in the input data storage unit 101, and stores the corrected mask pattern in the output data storage unit 117. (Step S115).

Note that the contact graphic selection unit 114, the non-contact graphic selection unit 115, and the graphic addition unit 116 may be replaced with first and second processing units having the following functions.
The first processing unit selects a graphic that makes line contact with the graphic created by the external graphic generating unit 113 from the graphic created by the inward graphic generating unit 104.
Referring to FIG. 20, the first processing unit selects a figure 160 that makes line contact with the figure 177 created by the external figure generation unit 113 from the figures 159 and 160 created by the inward-facing figure generation unit 104. .

The second processing unit corrects the mask pattern by deleting the graphic selected by the first processing unit from the mask pattern stored in the input data storage unit 101.
Referring to FIG. 21, the second processing unit deletes the figure 160 selected by the first processing unit from the mask pattern stored in the input data storage unit 101, and sets the shape obtained by the deletion to a new mask. A pattern.

<< Third Embodiment >>
The functional configuration of the pattern correction apparatus according to the third embodiment of the present invention will be described with reference to FIGS. FIG. 22 is a functional block diagram of the pattern correction apparatus in the present embodiment. 23 to 46 are supplementary diagrams for explaining the function of the pattern correction apparatus of FIG.
The pattern correction apparatus 200 shown in FIG. 22 includes an input data storage unit 201, an edge detection unit 202, an outward graphic generation unit 203, an inward graphic generation unit 204, an edge generation unit 205, a first contact edge detection unit 206, and a length. Edge detection unit 207, second contact edge detection unit 208, graphic generation unit 209, graphic selection unit 210, corner edge detection unit 211, opposing graphic generation unit 212, in-pattern graphic selection unit 213, non-contact edge detection unit 214, edge Contact part detection part 215, outer figure generation part 216, 6 vertex figure selection part 217, 4 vertex figure selection part 218, intersection edge detection part 219, external figure generation part 220, contact figure selection part 221, first contact figure extraction part 222, the second contact graphic extraction unit 223, the graphic addition unit 224, the graphic deletion unit 225, and each unit that functions as the output data storage unit 226. To.

The input data storage unit 201 is a storage device that stores a mask pattern corrected by optical proximity correction (OPC). The mask pattern stored in the input data storage unit 201 may be a mask pattern corrected by a method other than optical proximity correction (OPC).
The edge detection unit 202 uses each position coordinate of the external configuration edge of the mask pattern stored in the input data storage unit 201 and has a length equal to or longer than a predetermined amount (21st specified amount) of the mask pattern. An edge having a length equal to or shorter than a predetermined amount (22nd specified amount) of the mask pattern sandwiched between the edges and vertically making point contact with the edges is detected.
In the example of FIG. 23, the edges 251 to 258 are edges having a length equal to or greater than the 21st specified amount, the edges 259 to 262 are edges having a length equal to or less than the 22nd specified amount, and the edge 259 is adjacent to the edge 251. The matching relationship is point-contacted at 90 ° where the mask pattern does not exist (outside angle), and the relationship adjacent to the edge 252 is sandwiched between vertices that are point-contacted at 90 ° where the mask pattern exists (inner angle). The edge 260 is sandwiched between vertices adjacent to the edge 254 at a 90 ° outer angle, and adjacent to the edge 253 at a 90 ° inner angle. The edge 261 is adjacent to the edge 256. Is point-contacted at an outer angle of 90 degrees, and the relationship adjacent to the edge 255 is sandwiched between vertices point-contacted at the inner angle of 90 degrees, and the edge 262 is point-contacted at an outer angle of 90 degrees. When the relationship adjacent to the edge 258 and is sandwiched between the vertex point contact at 90 ° internal angle, the edge detecting unit 202 detects the edge 259-262 from the edge 251-262.

The outward graphic generation unit 203 moves, for each of the edges detected by the edge detection unit 202, a predetermined amount (a 23th predetermined amount) in parallel to the edge and in the outward direction of the mask pattern. A figure composed of a region through which the edge passes is created.
Referring to FIG. 24, the outward graphic generation unit 203 passes the edge 259 while moving the edge 259 detected by the edge detection unit 202 in parallel to the edge 259 and in the outer direction of the mask pattern by the 23rd specified amount. A figure 263 composed of regions is created. Further, the outward graphic generation unit 203 is a graphic composed of a region through which the edge 260 passes while moving the edge 260 detected by the edge detection unit 202 in parallel with the edge 260 and in the outer direction of the mask pattern by the 23rd specified amount. H.264 is created. Further, the outward graphic generation unit 203 is a graphic composed of a region through which the edge 261 passes while moving the edge 261 detected by the edge detection unit 202 in parallel with the edge 261 and in the outward direction of the mask pattern. 265 is created. Further, the outward graphic generation unit 203 is a graphic composed of a region through which the edge 262 passes while moving the edge 262 detected by the edge detection unit 202 in parallel to the edge 262 and in the outward direction of the mask pattern. 266 is created.

While the inward-figure generating unit 204 moves each of the edges detected by the edge detecting unit 202 in a predetermined amount (23rd specified amount) in parallel to the edge and inward of the mask pattern. A figure composed of a region through which the edge passes is created.
Referring to FIG. 25, the inward-figure generating unit 204 passes the edge 259 while moving the edge 259 detected by the edge detection unit 202 in parallel with the edge 259 and in the inner direction of the mask pattern. A figure 267 composed of regions is created. Further, the inward graphic generation unit 204 is a graphic composed of a region through which the edge 260 passes while moving the edge 260 detected by the edge detection unit 202 in parallel to the edge 260 and in the inner direction of the mask pattern by the 23rd specified amount. 268 is created. Further, the inward graphic generation unit 204 is a graphic composed of a region through which the edge 261 passes while moving the edge 261 detected by the edge detection unit 202 in parallel with the edge 261 and in the inner direction of the mask pattern. 269 is created. Further, the inward graphic generation unit 204 is a graphic composed of a region through which the edge 262 passes while moving the edge 262 detected by the edge detection unit 202 in parallel with the edge 262 and in the inner direction of the mask pattern. 270 is created.

The edge generation unit 205 detects, from the edges of the mask pattern (outline configuration edges), an edge that is point-contacted at an angle (outside angle) of 90 degrees where the adjacent relationship does not exist, and Edges equal to or less than a predetermined amount (24th specified amount) are created on the edges from the contact points.
Referring to FIG. 26, the edge generation unit 205 includes edges 251 and 259, edges 253 and 260, as edges in which the adjacent relationship is point-contacted at an external angle of 90 degrees from the edges (outline constituent edges) of the mask pattern. , Edges 255 and 261, edges 254 and 257, and edges 257 and 262 are detected. Then, the edge generation unit 205 creates edges 271 and 272 that are equal to or less than the 24th predetermined amount located on the edges 251 and 259 from the contact points thereof. The edge generation unit 205 creates the edges 273 and 274 of the edges 253 and 260 that are not more than the 24th specified amount and located on the edges from the contact points. The edge generation unit 205 creates the edges 275 and 276 of the edges 255 and 261 that are equal to or less than the 24th predetermined amount located on the edges from the contact points. The edge generation unit 205 creates edges 277 and 278 that are equal to or less than the 24th predetermined amount located on the edges 254 and 257 on the edges from the contact points. The edge generation unit 205 creates the edges 279 and 280 of the edges 257 and 262 that are not more than the 24th specified amount and are located above them from their intersections.

The first contact edge detection unit 206 makes line contact with at least one of the edges generated by the edge generation unit 205 among the respective edges (outline configuration edges) of the mask pattern stored in the input data storage unit 201. Edge is detected.
Referring to FIG. 26 and FIG. 27, the first contact edge detection unit 206 includes an edge 251 that makes line contact with the edge 271, an edge 259 that makes line contact with the edge 272, and an edge that makes line contact with the edge 273 among the edges 251 to 262. 260, edge 254 in line contact with edges 274, 277, edge 261 in line contact with edge 275, edge 256 in line contact with edge 276, edge 257 in line contact with edges 278, 279, and edge in line contact with edge 280 262 is detected.

The length edge detection unit 207 detects an edge of a predetermined amount (25th specified amount) or more from the edges detected by the first contact edge detection unit 206.
27 and 28, if the edges 251 to 258 are edges having a length equal to or greater than the 25th specified amount, and the edges 259 to 262 are edges having a length less than the 25th specified amount, the length edge detecting unit 207 Detects the edges 251, 254, 256, and 257 from the edges 251, 254, 256, 257, 259, 260, 261, and 262 detected by the first contact edge detection unit 206.

The second contact edge detection unit 208 detects an edge that is in line contact with one of the edges detected by the length edge detection unit 207 from among the edges created by the edge generation unit 205.
Referring to FIGS. 26, 28, and 29, the second contact edge detection unit 208 includes edges 251 and 254 detected by the length edge detection unit 207 among the edges 271 to 280 created by the edge generation unit 205. Edges 271, 274, 276, 277, 278, and 279 that are in line contact with any of 256, 257 are detected.

The graphic generation unit 209 determines the edge for each of the edges detected by the second contact edge detection unit 208 that are not in point contact with the other edges detected by the second contact edge detection unit 208. A figure composed of a region through which the edge passes while being moved in parallel with the edge and in the inner direction of the mask pattern while moving the minimum amount (hereinafter referred to as the minimum grid length as appropriate) is created. In addition, the graphic generation unit 209 applies one of the edges detected by the second contact edge detection unit 208 to point-contact with other edges detected by the second contact edge detection unit 208. The area where the edge passes and the other edge and the contact point are parallel to the edge while the edge and the contact point in contact with each other are moved by the minimum grid length parallel to the edge and inward of the mask pattern. In addition, create a figure consisting of a region where the edge passes while moving by the minimum grid length in the inner direction of the mask pattern, and a square region with two lines passing through while the contact point moves in two directions To do.
Referring to FIG. 30, the graphic generation unit 209 creates graphics 281, 282, 283, and 284 for the edges 271, 274, 276, and 279 that are not in point contact with other detected edges. Further, the graphic generation unit 209 creates the graphic 285 so as to fill the corner using the edge 277 and the edge 278 that are in point contact with each other.

The figure selection unit 210 selects a figure having six vertices from among the figures created by the figure generation unit 209.
Referring to FIG. 30 and FIG. 31, the figures 281 to 284 are figures having four vertices, and the figure 285 is a figure having six vertices. A figure 285 is selected from the created figures 281 to 285.

The corner edge detection unit 211 is an edge that makes line contact with the edge (outline configuration edge) of the mask pattern stored in the input data storage unit 201 among the edges of the graphic (six-vertex graphic) selected by the graphic selection unit 210 (Corner edge) is detected.
Referring to FIGS. 31 and 32, the corner edge detection unit 211 makes line contact with the mask pattern edge (outline configuration edge) among the edges of the graphic (six-vertex graphic) 285 selected by the graphic selection unit 209. The detected edges 277 and 278 are detected.

The opposing graphic generation unit 212 has a predetermined amount of distance from the edge (corner edge) to the outline component edge existing in the perpendicular direction for each edge (corner edge) detected by the corner edge detection unit 209 ( If it is equal to or less than that, a figure consisting of a region that passes while the edge (corner edge) is moved in parallel to the outline constituent edge existing in the perpendicular direction is created.
Referring to FIG. 33, assuming that the distance between the edge 277 and the edge 251 and the distance between the edge 278 and the edge 255 are equal to or less than the 26th specified amount, the opposing graphic generation unit 212 is detected by the corner edge detection unit 209. The figure 286 is formed of the region through which the edge 277 passes while the edge 277 is moved in parallel to the outline constituent edge 251 existing in the perpendicular direction, and the edge 278 is extended to the outline constituent edge edge 255 existing in the perpendicular direction. A graphic 287 consisting of the region through which the edge 278 passes while moving in parallel is created.

The in-pattern graphic selection unit 213 selects a graphic that is completely included in the mask pattern stored in the input data storage unit 201 from among the graphics created by the counter graphic generation unit 212.
Referring to FIG. 34, since the figure 286 and the figure 287 created by the opposing figure generating unit 212 are completely included in the mask pattern, the in-pattern figure selecting unit 213 uses the figure created by the opposing figure generating unit 212. Of 286 and 287, the figures 286 and 287 are selected.

The non-contact edge detection unit 214 is an edge that is not in line contact with any of the edges detected by the corner edge detection unit 209 from among the edges of each graphic selected by the in-pattern graphic selection unit 213 (non-contact edge). Is detected.
34 and 35, the non-contact edge detection unit 214 detects edges 277 and 278 detected by the corner edge detection unit 209 from the edges of the graphics 286 and 287 selected by the in-pattern graphic selection unit 213. Edges 288 to 293 that are not in line contact with any of the above are detected.

The edge contact part detection unit 215 performs a line contact (line contact part) for each edge detected by the non-contact edge detection part 214 with the edge of the mask pattern stored in the input data storage unit 201. To detect.
Referring to FIG. 36, the edge contact portion detection unit 215 makes line contact with the edge of the mask pattern stored in the input data storage unit 201 for each of the edges detected by the non-contact edge detection unit 214. Edges 294 to 296 constituting the contact portion are detected.

The outer graphic generation unit 216 makes the edge parallel to the edge of each of the edges detected by the edge contact detection unit 215 that is not in contact with other edges detected by the edge contact detection unit 215. In addition, a figure composed of a region through which the edge passes is created while moving by the minimum grid length in the outward direction of the mask pattern. In addition, the outer figure generation unit 216 uses one edge and the contact point in contact with each other as the edge for each of the edges in point contact with the other edges detected by the edge contact detection unit 215. While moving in parallel and outside the mask pattern by the minimum grid length, the region through which the edge passes, the other edge and its contact point are moved parallel to the edge and outside the mask pattern by the minimum grid length. A figure is formed which includes a region through which the edge passes in between and a square region with two lines passing through the contact point while moving in two directions.
Referring to FIG. 37, the outer figure generation unit 216 creates a figure 297 outside the mask pattern using the edge 294 that is not in line contact with other edges detected by the edge contact part detection unit 215. The outer figure generation unit 216 uses the edges 295 and 296 that are in line contact with each other detected by the edge contact part detection unit 215 to create the figure 298 so that the corner is filled outside the mask pattern.

The six-vertex graphic selection unit 217 selects a graphic having six vertices (six-vertex graphic) from the graphics created by the outer graphic generation unit 216.
37 and 38, the figure 297 is a figure with four vertices, and the figure 298 is a figure with six vertices. Therefore, the six-vertex figure selection unit 217 is operated by the outer figure generation unit 216. A figure 298 is selected from the created figures 297 and 298.

The four-vertex graphic selection unit 218 selects a graphic having four vertices (four-vertex graphic) from the graphics created by the outer graphic generation unit 216.
Referring to FIGS. 37 and 39, the figure 297 is a figure having four vertices, and the figure 298 is a figure having six vertices. Therefore, the four-vertex figure selecting unit 218 is operated by the outer figure generating unit 216. A figure 297 is selected from the created figures 297 and 298.

In the graphic selected by the in-pattern graphic selecting unit 213, the intersecting edge detecting unit 219 has an outside angle between the edge of the selected graphic and the edge of the other selected graphic (the corner where the selected graphic does not exist). A set of edges that make point contact with each other at 90 degrees is detected.
34 and 40, the edge 299 of the graphic 286 and the edge 300 of the graphic 287 intersect with each other at an outer angle of 90 degrees, and the edge 301 of the graphic 286 and the edge 302 of the graphic 287 intersect with each other at an outer angle of 90 degrees. Therefore, the intersecting edge detection unit 219 includes a pair of the edge 299 and the edge 300 that make point contact with each other at an external angle of 90 degrees, and the edge 301 and the edge 302 in the graphic 286 and 287 selected by the in-pattern graphic selection unit 213. And a pair is detected.

The external graphic generation unit 220 moves, for each set of edges detected by the intersecting edge detection unit 219, a 24 prescribed amount in parallel to the outside direction of the original graphic of the edge for each of the edges constituting the set. Create a figure consisting of the region through which both edges constitute.
Referring to FIGS. 40 and 41, the external graphic generation unit 220 sets the edges 299 and 300 detected by the intersecting edge detection unit 219 to the 24th specified amount in parallel with the outer direction of the original graphic 286 and 287 of the edge. The figure 303 which consists of the area | region which the edge 299,300 passes is created. Further, the external graphic generation unit 220 moves the edges 301 and 302 detected by the intersecting edge detection unit 219 in the 24th predetermined amount in parallel to the outside direction of the original graphic 286 and 287 of the edges, and the edges 301 and 302 are moved. A figure 304 made up of the area through which is passed is created.

The contact figure selection unit 221 selects a figure that makes line contact with any of the figures created by the external figure generation unit 220 among the figures created by the outward figure generation unit 203.
Referring to FIGS. 24 and 42, the contact graphic selection unit 221 is connected to one of the graphics 303 and 304 created by the external graphic generation unit 218 among the graphics 263 to 266 created by the outward graphic generation unit 203. The touching figure 263 is selected.

The first contact figure extraction unit 222 extracts a figure that makes line contact with any of the figures (four vertex figures) selected by the four vertex figure selection part 218 from among the figures selected by the contact figure selection unit 221.
39, FIG. 42, and FIG. 43, since the figure 263 and the figure 297 are in line contact, the first contact figure extracting unit 222 selects 4 from the figures 263 selected by the contact figure selecting unit 221. A figure 263 that is in line contact with the figure 297 selected by the vertex figure selection unit 218 is extracted.

The second contact graphic extraction unit 223 extracts a graphic that makes line contact with any of the graphics (six vertex graphics) selected by the six vertex graphic selection unit 217 from the graphics created by the inward graphic generation unit 204. .
Referring to FIGS. 25, 38, and 44, since the graphic 269 and the graphic 298 are in line contact with each other, the second contact graphic extraction unit 223 includes the graphic 267 to 270 created by the inward graphic generation unit 204. Then, the graphic 269 that is in line contact with the graphic (six-vertex graphic) 298 selected by the six-vertex graphic selection unit 217 is extracted.

The figure adding unit 224 adds the figure extracted by the first contact figure extracting unit 222 to the mask pattern stored in the input data storage unit 201 and corrects the mask pattern.
Referring to FIG. 45, the figure adding unit 224 adds the figure 263 extracted by the first contact figure extracting unit 222 to the mask pattern stored in the input data storage unit 201, and obtains the shape obtained by the addition. A new mask pattern is used.

The graphic deletion unit 225 corrects the mask pattern by deleting the graphic extracted by the second contact graphic extraction unit 223 from the mask pattern newly created by the graphic addition unit 224.
Referring to FIG. 46, the graphic deletion unit 225 corrects the mask pattern by deleting the graphic 269 extracted by the second contact graphic extraction unit 223 from the mask pattern newly created by the graphic addition unit 222.

  The output data storage unit 226 is a storage device that stores a mask pattern newly created by the figure deletion unit 225.

Next, a pattern correction method performed in the pattern correction apparatus of FIG. 22 will be described with reference to FIG. FIG. 47 is a flowchart showing the flow of processing of the pattern correction method executed by the pattern correction apparatus of FIG.
The edge detection unit 202 uses each position coordinate of the external configuration edge of the mask pattern stored in the input data storage unit 201 and has a length equal to or longer than a predetermined amount (21st specified amount) of the mask pattern. An edge having a length equal to or less than a predetermined amount (a 22th specified amount) of the outer edge of the mask pattern that is sandwiched between the edges and makes point contact perpendicularly to the edges is detected (step S201). For each of the edges detected in step S201, the outward graphic generation unit 203 moves the edges in parallel with the edges and a predetermined amount (the 23rd specified amount) in the outward direction of the mask pattern. The figure which consists of the area | region which passes is created (step S202). For each of the edges detected in step S201, the inward-facing graphic generation unit 204 moves the edges in parallel with the edges and a predetermined amount (the 23rd specified amount) in the inner direction of the mask pattern. The figure which consists of the area | region which passes is created (step S203).

  The edge generation unit 205 detects edges in which adjacent edges make point contact with each other at an outer angle of 90 degrees from edges constituting the mask pattern, and predetermined on the edges from the contact points of the adjacent edges. Edges of the amount (24th specified amount) are created (step S204). The first contact edge detection unit 206 detects an edge that is in line contact with at least one of the edges created in step S <b> 204 out of the mask pattern edges (outline configuration edges) stored in the input data storage unit 201. Detection is performed (step S205). The length edge detection unit 207 detects an edge equal to or larger than a predetermined amount (25th predetermined amount) from the edges detected in step S204 (step S206). The second contact edge detection unit 208 detects an edge in line contact with any of the edges detected in step S206 from the edges created in step S204 (step S207).

  The graphic generation unit 209 creates a graphic in the mask pattern by the above-described processing using the edge detected in step S207 (step S208). The figure selection unit 210 selects a figure having six vertices from the figures created in step S208 (step S209). The corner edge detection unit 211 makes an edge (corner edge) in line contact with the mask pattern edge (outline configuration edge) stored in the input data storage unit 201 among the edges of the graphic (six-vertex graphic) selected in step S209. Edge) is detected (step S210). The opposing graphic generation unit 212 has, for each edge (corner edge) detected in step S210, a predetermined amount (a 26th rule) from the edge (corner edge) to the contour component edge existing in the perpendicular direction. If it is equal to or smaller than that, a figure including a region that passes while the edge (corner edge) is moved in parallel to the outline constituent edge existing in the perpendicular direction is created (step S211). . Note that the counter graphic generation unit 212 does not create a graphic for a corner edge that is not less than the 26th specified amount. The in-pattern graphic selection unit 213 selects a graphic that is completely included in the mask pattern stored in the input data storage unit 201 from among the graphics created in step S211 (step S212).

  The non-contact edge detection unit 214 detects an edge (non-contact edge) that is not in line contact with any of the edges (corner edges) detected in step S210 from among the edges of each figure selected in step S212. (Step S213). The edge contact portion detection unit 215 detects, for each of the edges detected in step S213, an edge that constitutes a contact portion that is in line contact with the external configuration edge of the mask pattern stored in the input data storage unit 201. (Step S214). The outer figure generation unit 216 creates a figure outside the mask pattern by the above-described processing using the edge detected in step S214 (step S215). The six-vertex graphic selection unit 217 selects a graphic having six vertices (six-vertex graphic) from the graphics created in step S215 (step S216). The four-vertex graphic selection unit 218 selects a graphic having four vertices (four-vertex graphic) from the graphics created in step S215 (step S217).

  The intersection edge detection unit 219 extracts a set of edges in which the edge of the selected figure and the edge of the other selected figure are in point contact with each other at an outer angle of 90 degrees in the figure selected in step S212 (step S218). ). For each set of edges detected in step S218, the external graphic generation unit 220 moves each of the edges constituting the set by a 24th prescribed amount parallel to the outer direction of the original graphic of the edge, thereby forming a set. A figure composed of a region through which both edges pass is created (step S219).

  The contact figure selection unit 221 selects a figure that makes line contact with any of the figures created in step S219 among the figures created in step S202 (step S220). The first contact figure extraction unit 222 extracts a figure that makes line contact with any of the figures (four vertex figures) selected in step S217 from the figures selected in step S220 (step S221). The second contact figure extraction unit 223 extracts a figure that makes line contact with any of the figures (six vertex figures) selected in step S216 from the figures created in step S202 (step S222).

  The figure adding unit 224 corrects the mask pattern by adding the figure extracted in step S221 to the mask pattern stored in the input data storage unit 201 (step S223). The graphic deletion unit 225 deletes the graphic extracted in step S221 from the mask pattern corrected in step S223, corrects the mask pattern, and stores the corrected mask pattern in the output data storage unit 226 ( Step S224).

<< Fourth Embodiment >>
The functional configuration of the pattern correction apparatus according to the fourth embodiment of the present invention will be described with reference to FIGS. FIG. 48 is a functional block diagram of the pattern correction apparatus in the present embodiment. 49 to 54 are supplementary diagrams for explaining the function of the pattern correction apparatus of FIG.
48 includes a correction mask pattern data storage unit 501, a model storage unit 502, a target data storage unit 503, a transfer image creation unit 504, an inspection point creation unit 505, an in-standard determination unit 506, and a pattern correction unit. 507, and each unit functioning as a photomask creation data storage unit 508.

  The correction mask pattern data storage unit 501 stores a mask pattern corrected by the pattern correction method described in the first to third embodiments with respect to the mask pattern corrected by optical proximity correction (OPC). Device. FIG. 49 shows a mask pattern 530 in which a figure 551 is added to the mask pattern corrected by the optical proximity effect correction (OPC) by the pattern correction method described in the third embodiment and the figure 552 is deleted. The correction mask pattern data storage unit 501 stores a mask pattern as shown in FIG.

The model storage unit 502 is a storage device that stores a function for obtaining a pattern of a transfer image after transfer from a mask pattern to a wafer (hereinafter referred to as a transfer image pattern as appropriate).
The target data storage unit 503 is a storage device that stores a mask pattern before being corrected by optical proximity correction (OPC). FIG. 50 shows a mask pattern 540 before correction by optical proximity effect correction (OPC), and the target data storage unit 503 stores a mask pattern as shown in FIG.

The transfer image creation unit 504 stores in the model storage unit 502 the mask pattern stored in the correction mask pattern data storage unit 501 or the mask pattern corrected by the pattern correction unit 507 described later. Using the stored model function, an outline of a transfer image pattern (transfer image pattern) after transfer onto the wafer is created. It should be noted that creating a contour line of a transfer image pattern after wafer transfer with respect to a mask pattern using a model function is performed by using a conventionally known technique such as optical simulation. Details of creating the outline of the pattern of the transferred image after transferring the wafer using the same are omitted.
For the mask pattern 530 of FIG. 49, contour lines 561 and 562 of the pattern at the time of transfer as shown in FIG. 51 are created.

  The inspection point creation unit 505 is a point (inspection point) for inspecting the difference in edge position from the transfer image pattern and the direction of deviation at a plurality of positions on the mask pattern stored in the target data storage unit 503. ). Inspection points 571 to 579 as shown in FIG. 52 are created for the mask pattern 540 of FIG.

  The intra-standard determination unit 506 superimposes the outline of the transfer image pattern created by the transfer image creation unit 504 on the mask pattern stored in the target data storage unit 503. The intra-standard judgment unit 506 then applies the mask pattern edge stored in the target data storage unit 503 and the outline of the transfer image created by the transfer image creation unit 504 for each inspection point created by the inspection point creation unit 505. The difference in the vertical direction with respect to the edge of the mask pattern stored in the target storage unit 503 from the line and the direction in which the edge position is shifted (the outer line is the outer direction of the mask pattern stored in the target storage unit 503, the inner Direction) and determine whether or not the difference is equal to or less than a predetermined amount. As shown in FIG. 53, the in-standard determination unit 506 superimposes the contour lines 561 and 562 of the transfer image created by the transfer image creation unit 504 on the mask pattern 540 stored in the target data storage unit 503. Then, if the difference at the inspection points 573 and 574 exceeds a predetermined amount (outside the allowable range), the in-standard determination unit 506 has a difference between the difference between the inspection points 571 to 579 and the edge position. The direction is detected, and inspection points 573 and 574 in which the difference exceeds a predetermined amount are detected.

The pattern correction unit 507 corrects the detection points determined by the in-standard determination unit 506 that the difference exceeds a predetermined amount by the mask pattern stored in the correction mask pattern data storage unit 501 or the pattern correction unit 507. After the correction, the edge including the inspection point in the corrected mask pattern is moved in parallel with a predetermined amount in a direction opposite to the direction in which the outline is shifted from the mask pattern stored in the target data storage unit 503. And correct the mask pattern. Note that the pattern correcting unit 507 determines the position of the edge that makes a point contact perpendicularly with the edge corrected by the pattern correction methods of the first to third embodiments when the difference is outside the allowable range. Is moved in parallel by a predetermined amount while making point contact perpendicular to the straight line where is located.
As shown in FIG. 54, the pattern correction unit 507 moves the edges 580 and 581 including the inspection points 573 and 574 in parallel to the inner side of the mask pattern to form new edges 582 and 583, thereby using the mask pattern 530 as the mask pattern. It is corrected to 541.

  The photomask creation data storage unit 508 stores the mask pattern (corrected mask pattern data storage unit 501) when the in-standard determination unit 506 determines that the difference is equal to or less than a predetermined amount at all detection points. Or a mask pattern after being corrected by the pattern correction unit 507).

Next, a pattern correction method performed in the pattern correction apparatus of FIG. 48 will be described with reference to FIG. FIG. 55 is a flowchart showing the flow of processing of the pattern correction method executed by the pattern correction apparatus of FIG.
The inspection point creation unit 505 creates an inspection point by inspecting the difference between the edge positions of the transfer image and the shifted direction at a plurality of positions on the mask pattern stored in the target data storage unit 503. (Step S501).

  The transfer image creation unit 504 uses the model function stored in the model storage unit 502 for the mask pattern stored in the correction mask pattern data storage unit 501 to transfer the transfer image after transfer to the wafer. A pattern outline is created (step S502). The intra-standard determination unit 506 superimposes the outline of the transferred transfer image pattern created by the transfer image creation unit 504 on the mask pattern stored in the target data storage unit 503. Then, the intra-standard determination unit 506 applies the edge of the mask pattern stored in the target data storage unit 503 and the transfer image pattern created by the transfer image creation unit 504 for each inspection point created by the inspection point creation unit 505. A difference in the vertical direction with respect to the edge of the mask pattern stored in the target data storage unit 503 with respect to the outline and a direction of deviation are detected (step S503). If the difference exceeds the predetermined amount at any of the inspection points (S503: NO), the process proceeds to step S504, and if the difference is equal to or less than the predetermined amount at all the inspection points (S503: YES), the process proceeds to step S506.

  The pattern correction unit 507 corrects the mask pattern by the above-described processing for the detection point where the difference is determined to exceed the predetermined amount by the in-standard determination unit 506 (step S504), and the transfer image creation unit 504. Creates an outline of the transferred image pattern after the transfer to the wafer with respect to the corrected mask pattern (step S505), and returns to the process of step S503.

  The intra-standard determination unit 505 stores a mask pattern in the storage unit 508 when the outline is generated by the transfer image generation unit 504 and the difference is determined to be equal to or less than a predetermined amount (step S506), and processing is performed. finish.

  To provide a photomask on which the mask pattern corrected in the first to fourth embodiments or the mask pattern corrected in the fourth embodiment is used and the mask pattern is drawn. it can. Drawing on the photomask can be performed by a conventional method, and detailed description thereof is omitted. For example, exposure light (ultraviolet rays, X-rays, electron beams, etc.) is irradiated in the form of a mask pattern from the side where the photosensitive member is formed on the transparent substrate on which the photosensitive member is formed, and development is performed after irradiation.

A device can be manufactured using the mask pattern corrected in the first to fourth embodiments or the mask pattern corrected in the fourth embodiment.
A device manufactured using the mask pattern corrected in the first to fourth embodiments or a photomask created using the mask pattern corrected in the fourth embodiment. Can be provided. Manufacturing of a device using a photomask can be performed by a commonly performed technique, and detailed description thereof is omitted. For example, an exposure device, a photomask, and a target (substrate, layer to be processed formed on the substrate, and resist formed on the layer to be processed) are arranged in this order, and the target is exposed to light through the photomask by the exposure device. Light (ultraviolet rays, X-rays, electron beams, etc.) is irradiated, and thereafter, development, etching, and resist removal are performed.

  According to each of the embodiments described above, at the opposing edges of the mask pattern, the position of the edge perpendicular to one of the opposing edges in the direction parallel to the opposing edge and the point perpendicular to the other edge. When the positions of the contacting edges are deviated from each other, the positions are corrected so that the vertically point-contacting edges are on the same perpendicular to the facing edges. As a result, it is possible to prevent an increase in the data volume due to the generation of a large number of minute figures and the increase in the number of figures after figure division.

  The preferred embodiments of the present invention have been described above. However, the present invention is not limited to the above-described embodiments, and various design changes can be made as long as they are described in the claims.

The functional block diagram of the pattern correction apparatus in 1st Embodiment. FIG. 2 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 1. The flowchart which shows the flow of a process of the pattern correction method which the pattern correction apparatus of FIG. 1 performs. The functional block diagram of the pattern correction apparatus in 2nd Embodiment. FIG. 5 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 4. FIG. 5 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 4. FIG. 5 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 4. FIG. 5 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 4. FIG. 5 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 4. FIG. 5 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 4. FIG. 5 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 4. FIG. 5 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 4. FIG. 5 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 4. FIG. 5 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 4. FIG. 5 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 4. FIG. 5 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 4. FIG. 5 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 4. FIG. 5 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 4. The flowchart which shows the flow of a process of the pattern correction method which the pattern correction apparatus of FIG. 4 performs. FIG. 6 is a supplementary diagram for explaining functions of a modification of the pattern correction apparatus of FIG. 4. FIG. 6 is a supplementary diagram for explaining functions of a modification of the pattern correction apparatus of FIG. 4. The functional block diagram of the pattern correction apparatus in 3rd Embodiment. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. FIG. 23 is a supplementary diagram for explaining functions of the pattern correction apparatus of FIG. 22. The flowchart which shows the flow of a process of the pattern correction method which the pattern correction apparatus of FIG. 22 performs. The functional block diagram of the pattern correction apparatus in 3rd Embodiment. The supplementary figure for demonstrating the function of the pattern correction apparatus of FIG. The supplementary figure for demonstrating the function of the pattern correction apparatus of FIG. The supplementary figure for demonstrating the function of the pattern correction apparatus of FIG. The supplementary figure for demonstrating the function of the pattern correction apparatus of FIG. The supplementary figure for demonstrating the function of the pattern correction apparatus of FIG. The supplementary figure for demonstrating the function of the pattern correction apparatus of FIG. The flowchart which shows the flow of a process of the pattern correction method which the pattern correction apparatus of FIG. 48 performs.

Explanation of symbols

1 Pattern Correction Device 2 Input Data Storage Unit 3 Detection Unit 4 Judgment Unit 5 Correction Unit 6 Output Data Storage Unit

Claims (2)

Corrected mask pattern data storage means for storing corrected mask pattern data; model storage means for storing a model function for obtaining an outline of a transferred image pattern after transfer to the wafer from the mask pattern data; and optical proximity A pattern correction method in a pattern correction apparatus comprising target data storage means in which mask pattern data before effect correction is stored,
A third edge that is point-contacted perpendicularly to the first edge of the first edge and the second edge that are parallel to each other at an edge having a length longer than 0 that constitutes the outline of the mask pattern after the optical proximity correction. A detection step of detecting and detecting a fourth edge that makes point contact perpendicularly to the second edge;
A determination step of determining whether a deviation amount between the position of the third edge and the position of the fourth edge in a direction parallel to the first edge is equal to or less than a predetermined amount;
If the amount of deviation is less than or equal to the predetermined amount, the position of the fourth edge is corrected so that the fourth edge is positioned on a perpendicular line where the third edge is perpendicular to the first edge. A correction step of storing the mask pattern data performed in the correction mask pattern data storage means;
An inspection point creation step of creating an inspection point for inspecting a difference in edge position with the transfer image pattern and a direction of deviation at a plurality of positions on the mask pattern stored in the target data storage means; ,
Transfer using the model function stored in the model storage means to create a contour line of the pattern of the transferred image after transfer to the wafer from the mask pattern data stored in the correction mask pattern data storage means An image creation step;
The outline of the transfer image pattern created by the transfer image creation step is overlaid on the mask pattern before optical proximity effect correction stored in the target data storage means, and the optical proximity for each of the created inspection points. A difference between a mask pattern edge before effect correction and a contour line of the transfer image pattern in a vertical direction with respect to an edge of the mask pattern before optical proximity correction, and a direction in which the edge position is shifted, and An intra-standard determination step for determining whether the difference is equal to or less than a predetermined amount;
A direction in which an outline of the transfer image pattern deviates from the mask pattern, including an edge of the mask pattern that includes the inspection point, in which the difference is determined to exceed a predetermined amount by the in-standard determination step. determining that the difference of the operation for correcting the mask pattern data by moving a predetermined amount parallel to the opposite directions have repeated rows until no more than a predefined amount, no more than the amount that the difference is defined previously and And a pattern correction step of storing the mask pattern data at the time of being stored in the correction mask pattern data storage unit . Corrected mask pattern data storage means for storing corrected mask pattern data;
Model storage means for storing a model function for obtaining an outline of a transferred image pattern after being transferred to the wafer from the mask pattern data;
Target data storage means in which mask pattern data before optical proximity effect correction is stored;
A third edge that is point-contacted perpendicularly to the first edge of the first edge and the second edge that are parallel to each other at an edge having a length longer than 0 that constitutes the outline of the mask pattern after the optical proximity correction. Detecting means for detecting and detecting a fourth edge point-contacting perpendicularly to the second edge;
Determining means for determining whether a deviation amount between the position of the third edge and the position of the fourth edge in a direction parallel to the first edge is a predetermined amount or less;
If the amount of deviation is less than or equal to the predetermined amount, the position of the fourth edge is corrected so that the fourth edge is positioned on a perpendicular line where the third edge is perpendicular to the first edge. Correction means for storing the mask pattern data performed in the correction mask pattern data storage means;
An inspection point creating means for creating an inspection point for inspecting a difference in edge position from the transfer image pattern and a direction of deviation at a plurality of positions on the mask pattern stored in the target data storage means; ,
Transfer using the model function stored in the model storage means to create a contour line of the pattern of the transferred image after transfer to the wafer from the mask pattern data stored in the correction mask pattern data storage means Image creation means;
The outline of the transfer image pattern created by the transfer image creation means is overlaid on the mask pattern before optical proximity effect correction stored in the target data storage means, and the optical proximity for each of the created inspection points. A difference between a mask pattern edge before effect correction and a contour line of the transfer image pattern in a vertical direction with respect to an edge of the mask pattern before optical proximity correction, and a direction in which the edge position is shifted, and In-standard judgment means for judging whether or not the difference is equal to or less than a predetermined amount;
A direction in which an outline of the mask pattern including the inspection point at which the difference exceeds a predetermined amount by the determination unit within the standard is shifted with respect to the mask pattern. determining that the difference of the operation for correcting the mask pattern data by moving a predetermined amount parallel to the opposite directions have repeated rows until no more than a predefined amount, no more than the amount that the difference is defined previously and And a pattern correction means for storing the mask pattern data at the time of being stored in the correction mask pattern data storage unit .

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