CN101382736A - Photo mask verification system and program - Google Patents

Abstract

The invention provides a photomask verification system and program capable of previously verifying the exposure result of the exposure factor provided on the photomask; wherein, the CPU (7) generates the panel layout factor on the display panel corresponding to the exposure factor according to the graphic data and coordinate information of the exposure factor stored in the data file storing portion (5) of the storing portion (8), and verifies whether the exposure factor is wrong by judging the postion relationship of the plurality of panel layout factors on the display panel; the display portion (1) displays the verifying result in the panel substrate window (9) or the photomask window (10).

Description

Photo mask verification system and program

Technical field

The present invention relates to a kind of photo mask verification system of whether having made the checking of light shield data (reticle data) in order to carry out desirable exposure, refer more particularly to a kind of photo mask verification system that flat-panel monitor is made the checking of using the light shield data that carries out.

Background technology

Flat-panel monitor (FPD) is made of the light shield data and stipulate to take frame on the panel layout data, shear as exposure key element (below be also referred to as the repetition key element) and to make, comprise the graph data of above-mentioned exposure key element and the coordinate information of the exposure position on the presentation surface base board.

When utilizing above-mentioned light shield data to be transferred on the FPD display panel substrate, use the coordinate information of the configuration exposure key element of above-mentioned light shield data, in exposure device, be transferred on the display panel substrate of FPD.

At this moment,, not only waste light shield when existing in the graph data of the exposure key element that is provided with on the light shield or the above-mentioned coordinate information when wrong, and the waste display panel substrate.Especially when making the light shield data that flat-panel monitor uses, it is more to need manpower to carry out situation about cutting apart the exposure area, easily produces mistake.

In order to prevent this point, consider according to reticle image data and coordinate information analogue exposure device and the method verified.Wherein, in the relation of exposure device and simulation, for example comprise the technology of the cost optimization of realizing exposure device.Patent documentation 1 provides following method: use simulator, reduce time and labor in exposure device, optimize the measuring condition optimization method of measuring condition.But patent documentation 1 only discloses wants to carry out the invention that measuring condition is optimized.

Generally speaking, the size of the display panel substrate used of flat-panel monitor is the size considerably beyond the exposure range of exposure device.Therefore, the light shield that is installed in exposure device disposes as the exposure key element in the key element that will shear the part on the display panel substrate on the light shield less than display panel substrate.

When using light shield to expose by exposure device, the exposure key element that disposes repeatedly on the light shield is exposed, thereby produces the flat-panel monitor display panel substrate.

Therefore, when making light shield, carry out the cut-out with the display topology data cut apart of display panel areas, make the exposure key element of light shield etc., on the other hand, when making display panel, make display panel substrate by exposing repeatedly, therefore cut off and exposure key element when disposing repeatedly at topology data, easily produce mistake.

And,, therefore must implement the appointment of configuration repeatedly of exposure key element even under the situation of not following topology data to cut off, also need cutting apart of display panel areas.At this moment, exist the situation that produces repeatedly the misdirection of configuration very many.Therefore, require the authentication unit of the result of checking exposure in advance in the preceding operation of making.

Patent documentation 1: TOHKEMY 2006-140204 communique

Summary of the invention

Problem of the present invention is to provide a kind of photo mask verification system that can verify the exposure result of the exposure key element that is provided with on the light shield in advance.

And problem of the present invention is to provide a kind of action by the analogue exposure device can verify the exposure result's of exposure key element photo mask verification system in advance.

And problem of the present invention is to provide a kind of photo mask verification program of being carried out, be suitable for making up above-mentioned photo mask verification system by computing machine.

According to the present invention, a kind of photo mask verification system is provided, it is characterized in that having: storage unit, storage: the graph data of the exposure key element that contains in the flat-panel monitor exposure light cover; And by the performance of the coordinate of grid cell point, the coordinate information of the exposure position of the above-mentioned exposure key element on the expression display panel; Layout graphical element generation unit, according to the graph data and the coordinate information of the exposure key element of storing in the said memory cells, the layout graphical element on the above-mentioned display panel of generation and above-mentioned exposure key element correspondence; Authentication unit according to the position relation of a plurality of layout graphical elements on the above-mentioned display panel of above-mentioned layout graphical element generation unit generation, is verified above-mentioned exposure key element; And display unit, show the result that above-mentioned authentication unit is verified.

Layout graphical element generation unit generates the layout graphical element on the above-mentioned display panel corresponding with above-mentioned exposure key element according to the graph data and the coordinate information of the exposure key element of storing in the storage unit.Detecting unit is verified above-mentioned exposure key element according to the position relation of a plurality of layout graphical elements on the above-mentioned display panel of above-mentioned layout graphical element generation unit generation.Display unit shows the result of above-mentioned authentication unit checking.

Wherein, above-mentioned display unit has the window that shows the checking result at least, above-mentioned authentication unit is by carrying out the computing between the grid cell corresponding with above-mentioned a plurality of layout graphical elements, verify above-mentioned a plurality of exposure key element, the graphic presentation that above-mentioned display unit is obtained the checking result of above-mentioned authentication unit is to above-mentioned window.

And, the external program storehouse that the data of above-mentioned light shield will define the middle layer of transistor figure or define the transistor figure is held as the middle layer, and have that launch as required by the pointer structure in the middle layer that makes the above-mentioned transistor figure of definition or external program storehouse, have an expansion unit that form is constructed.

And, above-mentioned authentication unit has the difference extracting unit, it is after the logic OR that has carried out two layout graphical elements handles, the logic XOR of this layout graphical element The corresponding area in the graphical element that carries out above-mentioned any one layout graphical element and obtained with above-mentioned logic OR result handles or difference processing, thereby extracts the difference of above-mentioned two layout graphical elements.

And above-mentioned authentication unit has the lap detecting unit, handles by the logic AND that carries out two layout graphical elements, detects the lap of above-mentioned two layout graphical elements.

And above-mentioned authentication unit has the skew authentication unit, verifies whether the detected lap of above-mentioned lap detecting unit satisfies indicated off-set value.

And, above-mentioned authentication unit has the key element judging unit, after above-mentioned lap detecting unit detects the lap that does not have above-mentioned two layout graphical elements, carrying out logic OR handles, when confirmed two layout graphical elements form the figure of closing as a result the time, judge that above-mentioned two layout graphical elements are continuous graphical elements.

And, contain graphical element and surround the shutter frame of the pre-Fixed width of above-mentioned graphical element in the above-mentioned key element of respectively exposing, above-mentioned authentication unit has the terminal point authentication unit, for the grid cell on the above-mentioned display panel corresponding with above-mentioned shutter frame inward flange, whether checking exists the terminal point of the layout graphical element of above-mentioned graphical element in the scope of regulation off-set value.

And, has designating unit, appointment contains wrong checking result's wrong layer, when above-mentioned display unit shows wrong graphical information on the above-mentioned checking result's of expression window, shows the wrong graphical information of the wrong layer of above-mentioned designating unit appointment with layer unit on above-mentioned window.

And, above-mentioned display unit has and the different dialog box of window that shows above-mentioned checking result, above-mentioned designating unit is specified above-mentioned wrong layer on above-mentioned dialog box, above-mentioned display unit shows number of errors on above-mentioned dialog box, and respond of the appointment of above-mentioned designating unit, the wrong graphical information of this layer is shown on the above-mentioned window wrong layer.

And, according to the present invention, provide a kind of program, make computing machine play the effect of above-mentioned any described photo mask verification system.

Computing machine works as above-mentioned any described photo mask verification system by carrying out said procedure.

Photo mask verification system of the present invention can be verified the exposure result of the exposure key element that is provided with on the light shield in advance.

And, by the action of analogue exposure device can verify in advance the exposure key element the exposure result.

And program of the present invention is carried out by computing machine, thereby can construct above-mentioned light shield data exposure verification system.

Description of drawings

Fig. 1 is the figure that the flat-panel monitor in the expression embodiments of the present invention is used the relation of display panel substrate and light shield.

Fig. 2 is the figure of the relation of panel layout data on the display panel substrate of expression in the embodiments of the present invention and the light shield layout data on the light shield.

Fig. 3 is the figure of the displaying contents of the integral body when representing to generate the light shield data in embodiments of the present invention.

Fig. 4 is the process flow diagram of the bulk treatment when representing to generate the light shield data in embodiments of the present invention.

Fig. 5 is the figure of the structure of the panel layout data in the expression embodiments of the present invention.

Fig. 6 is the figure of the structure of the light shield data in the expression embodiments of the present invention.

Fig. 7 is the form of the light shield data in the embodiments of the present invention.

Fig. 8 is the figure that the coordinate information output in the expression embodiments of the present invention is handled.

Fig. 9 is the figure that the coordinate information output in the expression embodiments of the present invention is handled.

Figure 10 is the key diagram of the division processing method of the exposure area in the expression embodiments of the present invention.

Figure 11 is the key diagram of the division processing method of the exposure area in the expression embodiments of the present invention.

Figure 12 is the key diagram of the division processing method of the exposure area in the expression embodiments of the present invention.

Figure 13 is the figure of the exposure key element in the expression embodiments of the present invention.

Figure 14 is the block diagram of the photo mask verification system that relates to of embodiments of the present invention.

Figure 15 is the process flow diagram of the processing of the photo mask verification system that relates to of expression embodiments of the present invention.

Figure 16 is the figure of the relation of the various data in the expression embodiments of the present invention.

Figure 17 is the form of the data in the embodiments of the present invention.

Figure 18 is the figure of the data configuration on the display panel substrate of representing in the embodiments of the present invention.

Figure 19 is the figure of the pairing form structure of the data configuration on the display panel substrate of representing in the embodiments of the present invention.

Figure 20 is the key diagram of the various processing of the figure in the expression embodiments of the present invention.

Figure 21 is the key diagram of the various processing of the figure in the expression embodiments of the present invention.

Figure 22 is the key diagram that the OR of the one-sided exposure area detection in the expression embodiments of the present invention handles.

Figure 23 is the key diagram that the OR of the one-sided exposure area detection in the expression embodiments of the present invention handles.

Figure 24 is the key diagram that the OR of the one-sided exposure area detection in the expression embodiments of the present invention handles.

Figure 25 be expression in the embodiments of the present invention exclusive logic and the key diagram of processing or difference processing.

Figure 26 be expression in the embodiments of the present invention exclusive logic and the key diagram of processing or difference processing.

Figure 27 is the overlapping key diagram of the exposure data in the expression embodiments of the present invention.

Figure 28 is the overlapping key diagram of the exposure data in the expression embodiments of the present invention.

Figure 29 is the figure that is configured in the repetition key element on the display panel substrate in the expression embodiments of the present invention.

Figure 30 is the figure that is configured in the repetition key element on the display panel substrate in the expression embodiments of the present invention.

Figure 31 is the key diagram of the logic product that is configured in the repetition key element on the display panel substrate in the expression embodiments of the present invention.

Figure 32 is the logical value table that is configured in the repetition key element on the display panel substrate in the expression embodiments of the present invention.

Figure 33 is the figure of the example in the double exposure zone in the expression embodiments of the present invention.

Figure 34 is the figure of the example in the double exposure zone in the expression embodiments of the present invention.

Figure 35 is the figure of the example in the double exposure zone in the expression embodiments of the present invention.

Figure 36 is the figure of the example in the double exposure zone in the expression embodiments of the present invention.

Figure 37 is the key diagram that the double exposure in the embodiments of the present invention is handled.

Figure 38 is the key diagram that the double exposure in the embodiments of the present invention is handled.

Figure 39 is the key diagram that the double exposure checking in the embodiments of the present invention is handled.

Figure 40 is the key diagram that the double exposure checking in the embodiments of the present invention is handled.

Figure 41 is the key diagram that territory, the non-exposed area checking in the embodiments of the present invention is handled.

Figure 42 is the key diagram that territory, the non-exposed area checking in the embodiments of the present invention is handled.

Figure 43 is the key diagram of the checking result in the embodiments of the present invention.

Figure 44 is the key diagram of the checking result in the embodiments of the present invention.

Figure 45 represents the figure of the data configuration of detected error figure in embodiments of the present invention.

Embodiment

Photo mask verification system and the photo mask verification program that embodiments of the present invention relate to below is described.

And, the photo mask verification system that embodiments of the present invention relate to by one or more computing machine, and execution by the aforementioned calculation machine photo mask verification that makes up photo mask verification system constitute with program, this is described in detail after a while.The aforementioned calculation machine is by execution light shield data creating program, thereby conduct is used to make the light shield data creating system of light shield data and works.And, in each figure, to be marked with same label with a part.

Fig. 1 is the figure that the flat-panel monitor (FPD) in the expression present embodiment is used the relation of display panel substrate and light shield, and figure (a) is a planimetric map, and figure (b) is an outboard profile.

In Fig. 1, the 101st, display panel substrate, the 102nd, guaranteed the exposure area of the exposure device (not shown) of characteristic, the 103rd, but the exposure area of exposure device, the 104th, light-source system mechanism, the 105th, diaphragm system mechanism, the 106th, light shield, the 107th, plane of exposure.Wherein, the material of display panel substrate 101 can be used glass, plastic foil etc.

Flat-panel monitor in recent years, the maximization that as LCD, plasma scope, becomes, exposure device can't be unified plane of exposure base board 101 (with reference to the planimetric map of Fig. 1 (a)).Therefore, need cut apart the exposure area, expose repeatedly with certain form.The position relation of exposure device and display panel substrate 101 is from light source one side, be light-source system mechanism 104, diaphragm system mechanism 105, light shield 106, plane of exposure 107, display panel substrate 101, though not record also is added with lens combination mechanism (with reference to the outboard profile of Fig. 1 (b)) therein in Fig. 1.

In addition, diaphragm system mechanism 105 is meant the rectangular mechanical mechanism of mechanicalness shielding from the light of light source.

Fig. 2 is the figure of the relation of panel layout data on the display panel substrate of expression in the embodiments of the present invention and the light shield layout data on the light shield.

In Fig. 2, liquid crystal panel 201 is the examples that have a kind of large-scale panel layout data A1 as panel layout data 211 on display panel substrate 210.Under the situation of liquid crystal panel 201, cut apart panel topology data A1, the corresponding frame 213 of taking of the data group that will have repetitive construct extracts, and it is configured on the light shield 205, as light shield layout data 206.

Usually in this case, be accompanied by the cutting apart of exposure area of the cut-out of panel layout data A1.In the present embodiment, each key element with the pairing light shield layout data of each divided key element (panel layout key element) of panel layout data is called the exposure key element or repeats key element.The light shield layout data are made of a plurality of exposure key elements.And, the 212nd, guaranteed the exposure area of characteristic.

Liquid crystal panel 202 is the situations that have medium-sized panel layout data A2 and A3 as the panel layout data.In this case, also counter plate topology data A2 and the A3 exposure area that is accompanied by the cut-out of panel layout data is cut apart, the data group that will have repetitive construct usually with take frame 213 respective production.

Liquid crystal panel 203 is as the panel layout data, and a plurality of small panel topology data A4 and A5 are arranged in the situation on the display panel substrate.In this case, make a plurality of panel layout data A4 and a plurality of panel layout data A5 take frame 213 corresponding generations, the light shield layout data 206 that need to generate are configured on the light shield 205 to reduce the operation of exposure frequency with each.Therefore, usually in this case, need cutting apart of exposure area, but do not carry out the cut-out of panel layout data.

Liquid crystal panel 204 is that medium-sized panel layout data A2 and three kinds of panel layout data of small panel topology data A4, A5 are present in the situation on the display panel substrate.In this case, medium-sized panel layout data A2 is accompanied by the exposure area that the panel layout data cut off and cuts apart, with the 213 corresponding generations of shooting frame, the exposure area that small-sized topology data A4, A5 do not follow the panel layout data to cut off is cut apart, with the 213 corresponding generations of shooting frame, as light shield layout data 206.

Therefore, when making light shield, from panel layout data 211 grades of display panel substrate 210, extract data group, it is configured on the light shield 205 as a plurality of shooting frames 213, make the light shield layout data with repetitive construct.At this moment, versatility is stronger, extracts bigger shooting frame zone.

In either event, simulate by carrying out exposure device that to confirm not have the misdata this point be very important.This is because even under the situation of the cut-out of not following the panel layout data, also be necessary the cutting apart of exposure area of carrying out repeated configuration, when specifying this repeated configuration, easily produces mistake.In addition, the shooting frame data in the light shield data becomes the graphical element of having set shutter frame, is referred to as the exposure key element or repeats key element.

Before the photo mask verification system that relates to of explanation embodiments of the present invention, the production order of brief description light shield data at first.

Fig. 3 and Fig. 4 are the figure of the general processing sequence when representing by panel layout data creating light shield data, Fig. 3 is that the expression photo mask verification system is (when making light shield, system works as light shield manufacture) the figure of displaying contents of display part 1, Fig. 4 is the process flow diagram of the treatment step of the expression CPU (not shown) that constitutes the light shield manufacture system.

Panel layout data 211 on Fig. 3 (a) presentation surface base board 210, the setting of the shooting frame 213 on figure (b) the expression counter plate substrate 210, and to the configuration of the shooting frame 213 on the light shield 205, the extraction that figure (c) expression produces by the cut-out (for example along the cut-out of taking frame 213) of carrying out the panel layout data 211 on the display panel substrate 210, carry out that correcting pattern (not shown) generates and the processing during shutter frame (not shown) generation.

And figure (d) expression is from the coordinate information of the light shield of light shield design system output.Above-mentioned coordinate information comprises: take the information (repeated configuration information) of position of wide and high information, repeated configuration repetition key element of the corresponding light shield layout data of frame (be also referred to as the exposure key element in the present embodiment or repeat key element) as the exposure factor data with each.

Use the making of Fig. 3 and Fig. 4 summary description light shield data to handle, when making the light shield data, at first CPU reads in panel layout data 211 (step S401), counter plate topology data 211 is set a plurality of shooting frames 213 on display panel substrate 210, to take frame 213 and be configured on the light shield 205, make light shield layout data 206 (step S402).

Then, carry out cutting apart of exposure area according to taking frame 213.At this moment, usually under the shooting frame 213 of appointment, there is wiring data, therefore it must be cut off.Comprising produce the situation (step S403, S404) of the pattern (correcting pattern) wideer and the situation (step S405) that does not produce in the data cut-off parts than above-mentioned cut-off parts.

When not producing correcting pattern, make take the overlapping and definition of frame 213 after, advance to treatment step S406 (step S405).By this formation, when exposure,, can prevent that the mistake of the data that little deviation causes from cutting off by making the multiple-exposure of exposure data own.

When generating correcting pattern, after correcting pattern generates, advance to treatment step S406 (step S403, S404).When generating correcting pattern, correcting pattern itself is generally by multiple-exposure, and the result has prevented the mistake cut-out that little deviation causes.

In treatment step S402, not in the cutting apart of the exposure area that cuts off of companion data, (step S406) handled in the generation that directly moves to the wide frame (shutter frame) of the regulation of surrounding the exposure area.

Shutter frame at treatment step S406 generates in the processing, with the wide generation shutter frame of appointment.Correcting pattern is made of the pattern wideer than wiring pattern, and the corresponding formation of outward flange of the inward flange of shutter frame and above-mentioned correcting pattern.

Can make the exposure key element (overlapping key element) that data and shutter frame by the exposure area constitute thus.And, make and set up corresponding coordinate information with above-mentioned exposure key element.

At last, output light shield layout data and the coordinate information corresponding, end process (step S407) with above-mentioned topology data.Above-mentioned topology data is the light shield layout data and has appended the panel layout data of taking the data of frame 213.

Wherein, the light shield layout data are the information of the figure of definition exposure key element, are by having defined wide figure on rectangular pattern, shaping figure, the center line and having constituted the data file that the intermediate module of these graph datas constitutes as graph data.

Coordinate information is the information of the exposure position of the exposure key element that contains in the definition light shield layout data as mentioned above, is the text of the title of having put down in writing the exposure key element, height, wide, repeated configuration information (information of multiplicity and configuration coordinate).

And the light shield data are meant the information that is made of above-mentioned light shield layout data and coordinate information.

Fig. 5 is the figure of the structure of the panel layout data that form on the presentation surface base board.The module of upper is called top module 511, has one.Other modules all are under the jurisdiction of this top module 511.They are the next modules 512～515 of topology data, also can make its layering.The topology data that module has for example comprises each transistorized configuration data 516, wiring data 517, the through hole configuration data 518 of thin film transistor (TFT), liquid crystal drive portion under the situation in liquid crystal panel.

These transistors, wiring, through hole have title, and (configuration data is the program library name, wiring data is the type of wiring name, the through hole data are the through hole name), its content is housed in program library file (configuration module routine library, type of wiring routine library, through hole routine library) 519, confirms by obtain consistent with the routine library title.

And number of transistors is more according to using, and therefore also exists with the routine library form to be independent of the panel layout data and the situation of being managed.

Fig. 6 is the figure of expression light shield data configuration.Basically be and panel layout data identical construction.One of top module 521 same existence.Top module 521 times, a plurality of repetition key elements 522,523 exist as the next module, become the base unit of light shield data.

As the data of the repetition key element that constitutes conduct exposure key element, at first, comprise shutter frame data 524, correcting pattern data 525, the data of cutting off and do not become data 526, the shooting frame data 527 that cuts off object as the exposure object data.In addition, comprise the repetition key element wide and high data 528, repeat key element configuration data 529, the next module data 530, configuration data 535, the through hole data 536 of layout in the shooting frame after cutting off.

The topology data that module has is the same with the panel layout data, for example under the situation of liquid crystal panel, comprises each transistorized configuration data 531, wiring data 532, the through hole data 533 of thin film transistor (TFT) or liquid crystal drive portion.Configuration data 531, wiring data 532, the through hole data 533 of these transistors etc. have title, its content is housed in the program library file (configuration module routine library, type of wiring routine library, through hole routine library, alignment mark routine library) 534, by being identified with the routine library title is consistent.

Under the situation of panel, be equally and all program library file titles established data structure as one man.And, do not use during exposure, but keep taking frame data yet.

And number of transistors is more according to using, and therefore also exists with the routine library form to be independent of the light shield data and the situation of being managed.

Fig. 7 is the form that the example of the Physical layer of light shield layout data, each data level and layer identification code is represented under the situation of metal one deck and two layers.

For example, during metal one deck (the 1st layer in aluminium), taking frame data is layer identification code 101, the shutter frame data are layer identification code 102, and pattern data is a layer identification code 104, and correcting pattern is a layer identification code 105, two layers on metal (the 2nd layer in aluminium) is stipulated too, made each layer identification code independent, can handle independently.These layer identification codes repeat in the key element general at each.That is, as long as Physical layer is identical with data level, repeat between the key element, layer identification code is general at each.

The data of the light shield of Figure 6 and Figure 7 are finally exported by file, and the module that its content is held as middle layer module or routine library module by the module that has defined wide figure on rectangular pattern, shaping figure, the center line and will concentrate these graph datas constitutes.As middle layer module or the use of routine library module is transistor modular.

The quantity of transistor modular is many, launch and when holding, data volume is huge, therefore usually as the routine library module definition export under the form in middle layer.

Wherein, graph data is compared with the GDS form that uses as de facto standard in the relevant field of present embodiment, rectangular pattern is rectangle (RectAngle), a shaping figure is border (Boundary), having defined wide figure on the center line is path (path), has concentrated the module of these graph datas to be called the unit.

Fig. 8 is that expression light shield manufacture system carries out the coordinate information written-out program and figure that the coordinate information output carried out is handled, and expression is for the numerical value performance and the configuration regulation (comprising alignment mark) of the repetition key element of display panel substrate and light shield.

In Fig. 8, the 801st, display panel substrate, the 802nd, the panel layout data, the 803rd, the XY centre coordinate of display panel substrate (consistent with four centre coordinates of taking frame A in this example) (0,0), the 804th, (its coordinate is to be the coordinate (X0, Y0)) of benchmark with the centre coordinate of display panel substrate 801 (0,0) to alignment mark.

805, the 808, the 811st, light shield, the 807th, guaranteed the exposure area of characteristic.And 806,809,810,812,813 are respectively and the repetition key element of taking frame A, B1, C1, B2, C2 correspondence.

In the example of Fig. 8, a repetition key element 806 is formed on the light shield 805, and two repetition key elements 809,810 are formed on the light shield 808, and two are repeated key elements 812,813 and are formed on the light shield 811.

The exposure data that has comprised shutter frame is produced on each light shield 805,808,811 as repeating key element 806,809,810,812,813.That is, repeating key element is by by data, the correcting pattern of shutter frame, cut-out and do not become the exposure data that the data of cutting off object constitute and constitute.This is the basis of photographing information.

In the present embodiment, even without repeating to be also referred to as the repetition key element.Repeat number when not repeating is 0.In the example of Fig. 8, with the number of the repetition key element 806 of taking frame A correspondence be 2 * 2 (=4) (multiplicity 2 * 2-1) (form thus as the set that repeats key element A repeat to gather 814), be 0 with the multiplicity of taking frame B1, C1, B2, repetition key element 809,810,812,813 that C2 is corresponding.

Each repeats key element and has title.Each repeats key element and has wide (W) and high (H) with respect to the coordinate center that each repeats key element self.Each repeats key element is that benchmark disposes with the centre coordinate that repeats to gather that is made of its repetition key element.In illustrative example, the centre coordinate of display panel substrate 801 (0,0) is equivalent to this, and being configured in centre coordinate (0,0) is on the position of benchmark.

On the other hand, as the topology data of light shield, each repeats key element, and to be configured in its center be on the reference coordinate with the centre coordinate position of light shield.

About alignment mark, for display panel substrate 801, the centre coordinate (0,0) that is configured in display panel substrate 801 is the position of benchmark, and for light shield, the centre coordinate that is configured in light shield is the position of benchmark.Alignment mark is stored in program library file and is defined.

Fig. 9 and above-mentioned same, thus be that the coordinate information that expression light shield manufacture system execution coordinate information written-out program carries out is exported the figure that handles, the example of denotation coordination information output.As shown in Figure 9, expression generates 805,808,811 o'clock the output result of three light shields who disposes the repetition key element by the panel layout data on the display panel substrate 801 802.

Wherein represent following example: as the exposure photographing information, arrange the allocation position specified the title that repeats key element and multiplicity and Gao Yukuan, and arrange as the photographing information on the light shield and to have specified same repetition key element title and wide and high allocation position as the photographing information on the display panel substrate, offer the user as coordinate information.

Figure 10～Figure 12 is the figure of the division processing method of expression exposure area, represent two partitioning schemes, Figure 11 is the example of cutting apart the panel layout data 1003 of Figure 10 and generating correcting pattern 1004 when cutting off, and Figure 12 is the example of cutting apart the panel layout data 1003 of Figure 10 and not generating correcting pattern when cutting off.

That is, when generating correcting pattern 1004, in Figure 10 and Figure 11, under taking frame 1002, cut off data (for example wiring data) 1003, generate the correcting pattern 1004,1004 that extends with specified length △ continuously at place of incision.At this moment, correcting pattern 1004 also can constitute from the position than the close specified length inboard of above-mentioned place of incision, than the wide specified length of above-mentioned place of incision.So, on the position 1007 of carrying out double exposure, form correcting pattern 1004.

Form the wide shutter frame 1005 of regulation, make the outer fix of correcting pattern 1004 and the inner side of shutter frame 1005 have the deviation of ormal weight, and overlapping with ormal weight, so, make exposure factor data with correcting pattern.The inward flange 1006 of shutter frame 1005 is than taking the position of frame 1002 with regulation △ elongation.The inward flange of shutter frame 1005 becomes the outward flange of exposure area.

Therefore, generate correcting pattern 1004 and when cutting off, being breaking at of data 1003 carried out under taking frame 1002, correcting pattern 1004 becomes the double exposure zone of both exposures of adjacent exposure key element, has guaranteed connection by the panel layout data that adjacent exposure key element forms by correcting pattern 1004.

On the other hand, do not generate correcting pattern and when cutting off, make topology data overlapping.When overlapping, as shown in figure 12, by cutting off with the part of specified length △ elongation than taking frame 1002.For adjacent shooting frame 1001, equally also form light shield by cutting off with the part of specified length △ elongation.So, carry out forming overlapping 1008 on the position 1007 of double exposure.

Form the wide shutter frame 1005 of regulation, make overlapping 1008 the outer fix and the inner side of shutter frame 1005 have the deviation of ormal weight, and overlapping with ormal weight.So, make the exposure factor data that has overlapping 1008.The inward flange 1006 of shutter frame 1005 becomes than the position of taking frame 1002 elongation △.The inward flange of shutter frame 1005 becomes the outward flange of exposure area.

Figure 13 is the figure that is illustrated in the exposure key element of cutting off in the shooting frame 1002 with oblique line portion 1301, is the example that has formed the exposure key element of correcting pattern 1004.

In Figure 13, in the time of can setting shooting frame 1002, extract repetitive construct sometimes easily with oblique line portion 1301, be effective.

Correcting pattern 1004,1004 is set at the corrected value of regulation along the length direction of the wiring data 1003 that cuts off on interior side direction and lateral direction.And,, set the corrected value of regulation respectively to the both sides of the Width of clamping wiring data 1003.Specify among the wide Wh in the horizontal direction of shutter frame 1005 and the vertical direction Wv.

The correcting pattern 1004 of the end correspondence of cutting off with level is that the correcting pattern 1004 of rectangle and oblique line portion 1301 correspondences is parallelogram.

As shown in figure 13, have inward flange 1006 when containing the shutter frame 1005 of oblique line portion 1301, the data place of incision needs the double exposure of correcting pattern 1004,1004.

More than, Fig. 1～Figure 13 has illustrated how to make light shield layout data and coordinate information.Present embodiment is carried out the checking of the panel layout data that light shield layout data and coordinate information by such making synthesized, and as a result of, carries out light shield data exposure checking.

Figure 14 is the block diagram of the photo mask verification system structure that relates to of expression present embodiment, is the example that is made of the program that computing machine and aforementioned calculation machine are carried out.The photo mask verification system that present embodiment relates to has: the memory storage of central processing unit (CPU), a plurality of program groups that move on above-mentioned CPU, stored programme group and data, the input media and the display device that are made of keyboard and mouse.

If the summary of the photo mask verification system that present embodiment relates to is described, then the photo mask verification system that relates to of present embodiment works as the exposure device simulator, therefore the data based coordinate information of the light shield layout that shows on the light shield window is shown on the display panel substrate window.It is carried out graphics calculations handle and verify, and if add the function that shows wrong figure, then constitute photo mask verification system.Wherein, the window that shows wrong figure for example is the display panel substrate window.

Be divided into following three phases as program structure: as initial setting, the reading in and the making of inner form of light shield layout data and coordinate information; Computing between the grid cell of figure and figure and follow their checking to handle; The checking demonstration of figure as a result.These program functions all can be undertaken by the order that operation is presented on the menu window.

As the display window of figure, need at least as the checking display panel substrate window of the demonstration of figure as a result, importation and calculating section not necessarily need graphical display function, but from the angle of operation acknowledgement, it is comparatively convenient to have graphical display function.

In Figure 14, photo mask verification system has: the display part 1 that is made of display panels etc.; The operating portion 16 that constitutes by keyboard 2 or mouse 3; Central processing unit (CPU) 7; The storage part 8 that constitutes by disk set, semiconductor memory etc.

At least can show following three windows on the display part 1: the menu window 11 of the light shield window 10 of the light shield layout data on the display panel substrate window 9 of the panel layout data on the guidance panel substrate 12, the operation light shield 13, the operation of indication operating portion 16.The shooting frame of setting on the display panel substrate window 9 carries out as taking operating between the window of frame setting on light shield window 10.

The checking result of light shield data is shown to display part 1, also can be shown on any one of display panel substrate window 9, light shield window 10, menu window 11.And the checking that shows the light shield data also can be removed above-mentioned each window 9～11 as a result the time, only shows the checking result in the zone that above-mentioned each window 9～11 exists.

The making operation of light shield, the order of checking operation by showing on the operating portion 16 choice menus windows 11, make operating portion 16 have the function of this order, operating operation portion 16 carry out between setting, display panel substrate 9 and the light shield window 10 at display panel substrate window 9 photographs frames move and light shield window 10 on the various operations such as setting of corresponding shooting frame.

Storage part 8 has: program storage part 4, the light shield data that storage CPU7 carries out generate with program, photo mask verification program; Data file storage part 5, the data files such as intermediate data in storage inputoutput data, the processing; And file storage part 6, storage rule file, program library file such with reference to file.

Formation as said procedure, program as light shield manufacture is used is made of following program: the input/output routine of taking minimum interval proving program between frame setting program, repetitive construct proving program, shutter frame, data cut-out program, correcting pattern generator program, shutter frame generator program, coordinate information inventory written-out program, various data.

These are taken, and minimum interval checking, data are cut off between frame setting, repetitive construct checking, shutter frame, correcting pattern generates, shutter frame generates, the function of coordinate information inventory output is all undertaken by the order that shows on the operating portion 16 choice menus windows.

And, the program that data verification is used as light shield comprise checking handling part that input reason portion handles with program, graphics calculations with program, verify display part program as a result.

Constitute as file, the file of using as light shield manufacture constitutes, constitute by following: except panel layout data file and light shield layout data file and coordinate information inventory file, as the program library file and the rule file of reference file as output file as input file.And, store data file storage part 5 into as panel layout data file, light shield layout data file and the coordinate information inventory file of data file.Program library file and rule file as the reference file store into reference to file storage part 6.

And, the file of using as photo mask verification constitutes, constitute by following: except as the light shield layout data of input file and coordinate information file, the light shield data file and coordinate information inventory file, as the program library file and the rule file of reference file as output file.

So, constitute the light shield design system of carrying out light shield layout or the light shield data verification system that carries out the checking of light shield data.

Wherein, display part 1, operating portion 16, storage part 8 constitute display unit, operating unit, storage unit respectively.

When above-mentioned display unit, operating unit, storage unit work as the light shield manufacture system, can function as follows.

For example, display unit can show at least: the light shield window of the display panel substrate window of the panel layout data of panel substrate, display light cover office data, and show the menu window of the order of aforesaid operations unit.

The order and the input that show on the operating unit choice menus window.So, the shooting frame of setting on can the panel layout data for display panel substrate is specified operations such as repeated arrangement.

Storage unit can be used as main storage means and external memory works.Can store in the storage unit: can cut off the panel topology data condition, contain the formation condition of the minor increment between the wide and shutter frame of correcting pattern.And, can store the formation condition of setting by operating unit in the storage unit.

And CPU17 constitutes light shield data generating unit, repeated authentication unit, shutter frame authentication unit at interval in the light shield manufacture system.The light shield data generating unit by the aforesaid operations unit cut with above-mentioned display panel substrate window on the shooting frame corresponding panel topology data set, as part panel layout data pick-up, contain in the above-mentioned part panel layout data when cutting off data, form correcting pattern in this end that cuts off data, and pass through the shutter frame of the outward flange correspondence of formation inward flange and above-mentioned correcting pattern, the exposure factor data corresponding with above-mentioned part panel layout data can be created on the above-mentioned light shield window.And the light shield data generating unit can generate above-mentioned exposure factor data, to satisfy above-mentioned formation condition.

Above-mentioned light shield data generating unit has with lower unit: cut the pairing panel layout data of the shooting frame of setting by the aforesaid operations unit on above-mentioned display panel substrate window, as the extracting unit of part panel layout data pick-up; Contain in the above-mentioned part panel layout data when cutting off data, form the correcting pattern generation unit of correcting pattern in this end that cuts off data; And the shutter frame generation unit of the shutter frame of the outward flange correspondence of formation inward flange and above-mentioned correcting pattern.The exposure factor data corresponding with above-mentioned part panel layout data can be created on the above-mentioned light shield window.

And whether the repeated authentication unit can relatively contrast the shooting frame consistent with the area relative panel layout data of having specified repeated arrangement.

And shutter frame at interval authentication unit can be verified more than the minimum interval that whether separates regulation between the shutter frame when having a plurality of above-mentioned shutter frame.

On the other hand, it does the time spent as photo mask verification system for above-mentioned display unit, operating unit, storage unit, can function as follows.

For example, display unit can show the result of authentication unit checking.And display unit can have the window that shows the checking result at least.And the graphic presentation that display unit can be obtained the checking result of authentication unit is to above-mentioned window.

And, when display unit shows wrong graphical information on the window that shows the checking result, can with the checking of the wrong layer of designating unit appointment as a result graphical information be presented on the window with layer unit.And display unit has and shows checking result's the different dialog box of window, shows number of errors on above-mentioned dialog box, and the response designating unit is to the appointment of wrong layer, with the checking of this layer as a result graphical information be shown on the above-mentioned window.

Operating unit can be used as designating unit and works.But the wrong layer that the checking result of designating unit specify error contains.And, designating unit can be on the dialog box different with window the specify error layer.

Storage unit can be stored: the graph data of the exposure key element that contains in the flat-panel monitor exposure light cover; Coordinate by grid cell point shows, represents the coordinate information of the exposure position of the above-mentioned exposure key element on the display panel.

And CPU7 can be used as layout graphical element generation unit, authentication unit, expansion unit and works.

Layout graphical element generation unit can be according to the graph data and the coordinate information of the exposure key element of storing in the storage unit, the layout graphical element on generation and the exposure key element corresponding display panel.

Authentication unit can be according to the position relation of a plurality of layout graphical elements on the display panel of layout graphical element generation unit generation, checking exposure key element.And, the graph data of exposure key element is made of according to these three kinds the polygonal number that has defined wide line data, rectangle data in the line information, described each summit at least, authentication unit can be verified above-mentioned a plurality of exposure key element by carrying out the computing between the pairing grid cell of above-mentioned a plurality of layout graphical elements.

Authentication unit can have the difference extracting unit, it is after the logic OR that carries out two layout graphical elements handles, the logic XOR that carries out the obtainable graphical element of result of above-mentioned any one layout graphical element and above-mentioned logic OR handles or difference processing, thereby extracts the difference of above-mentioned two layout graphical elements.

Authentication unit can have the lap detecting unit, handles by the logic AND that carries out two layout graphical elements, detects the lap of above-mentioned two layout graphical elements.

Authentication unit can have the deviation authentication unit, and whether the detected lap of checking lap detecting unit satisfies the deviate of indication.

Authentication unit can have the key element judging unit, after detecting the lap that does not have two layout graphical elements at the lap detecting unit, carrying out logic OR handles, when confirmed two layout graphical elements form the figure of closing as a result the time, judge that above-mentioned two layout graphical elements are continuous graphical elements.

And, the data of light shield can have the middle layer of definition transistor figure or the external program storehouse that has defined the transistor figure as the middle layer, in this case, launch the unit and can have the form structure that the middle layer or the external program storehouse of the above-mentioned transistor figure of definition are launched as required by the pointer structure.

And, contain graphical element and surround the shutter frame of the pre-Fixed width of above-mentioned graphical element in each key element of exposing, authentication unit can have the terminal point authentication unit, its to the above-mentioned display panel of above-mentioned shutter frame inward flange correspondence on grid cell, whether checking exists the terminal point of the layout graphical element of above-mentioned graphical element in the scope of regulation off-set value.

And program stored can make the computing machine with display unit, operating unit, storage unit and CPU work as the photo mask verification system with above-mentioned functions in the storage unit.

Figure 15 is the process flow diagram of the processing of the photo mask verification system that relates to of expression embodiments of the present invention.

In Figure 15, the light shield layout data of input are the data of the form of expression under the so-called GDS form, are by the data as the form of a plurality of grid cell points performance of the known point of coordinate figure, are the data that allow the form of middle layer structure.The graph data that contains the exposure key element that contains in the flat-panel monitor exposure light cover in the above-mentioned light shield data file.

Generally, adopt transistor layer as the middle layer.According to circumstances different, as also to exist transistor layer independently to install situations as external program storehouse and light shield layout data file.But, even independent the installation is actually equal with the middle layer.

The coordinate information of the repeated configuration position of the repetition key element of putting down in writing in the description light shield layout data file etc. is text normally.Contain the information of representing, represent the exposure position of the exposure key element on the display panel by the grid cell point coordinate in the above-mentioned coordinate information.

Processing is made of following three phases: the processing stage of input (step S151), and the input processing program of storage in the executive routine storage part 4; The processing stage of checking (step S152, S153), carry out the checking handling procedure of figure computing, carry out the computing between the grid cell point of figure and figure; And the demonstration stage (step S154), carry out checking display routine as a result, show the checking result.

In input processing stage (step S151), CPU7 carries out reading in from data file storage part 5 the input processing of light shield layout data file and coordinate information file, by configuration information, make the exposure factor data structure on the display panel substrate based on the repetition key element of above-mentioned coordinate information.

Wherein, under mode, make with the form structure (the form structure 1 of following Figure 17) that can pick up easily with other repetition key elements that repeat to be connected on the essential factors space.And, when the light shield data have the middle layer, because the minimizing of data volume, under having the mode that is easy to pick up undermost form structure (following table structure 2) when keeping the middle layer, make.

Afterwards, CPU7 enters into the checking processing (step S152, S153) of the computing of figure.Calculating comprises logical calculated and Difference Calculation.Describe in detail after a while, the object that should verify is divided into from big aspect: the checking in double exposure zone, the checking that connects exposure 1, the checking that connects exposure 2, the checking in territory, non-exposed area.

Carrying out the required logical calculated of these checkings is AND, OR and XOR.Also available Difference Calculation substitutes XOR.This logical process or difference processing all are the computings between the grid cell point.These computings are the result store as graph data.CPU7 carries out the processing (step S153) of treatment step S153 to all layers.

At last, CPU7 carries out the result's of computing the graphic presentation display process (step S154) at display part 1.Should verify to as if the checking in double exposure zone, the checking that connects exposure 1, the checking that connects exposure 2, the checking in territory, non-exposed area, therefore according to the judgment standard of setting by operating portion 16 (parameter), represent the checking corresponding with one of them with the graph data form.This graph data is the wrong data of expression.

Wherein importantly, the computing of logical process or difference processing is carried out with layer unit, and the exposure error data of making also store in the data file storage part 5 with layer unit.This is because exposure is carried out with layer unit, therefore must verify with layer unit.Also because because display part 1 also becomes a layer unit when showing, during therefore with layer unit's storage errors data, the access time is very fast.

And, when CPU7 is shown to display part 1 with result, also can constitute, when having set when whether being the judgment standard of misdata, only show misdata, when not setting when whether being the judgment standard of misdata, display process result only.And when CPU7 was shown to display part 1 with result, display graphics not necessarily also can show wrong content by literal etc., perhaps display process result only when whether not being wrong judgement.

Figure 16 is the key diagram of the relation of the panel layout data 161 on the light shield layout data 162 of explanation on the light shield 13, the repetition key element 163 in the light shield layout data 162, coordinate information, the display panel substrate 12.

And Figure 17 is the form structure 1 that is illustrated in the repetition key element 163 shown in Figure 16 the repetition key element 163 that may be multiple-exposure, connection exposure 1, connection exposure 2, is stored in the data file storage part 5 of storage part 8.

Above table contains address, Instance Name, repetition key element name, double exposure or connects exposure 1 or the pointer number and the pointer information of connection exposure 2.

Wherein, the address is the address of order of the repetition factor data of expression configuration, and Instance Name is the proper name of the repetition key element of configuration, repeats the key element name and be the program library name of the repetition key element put down in writing in the light shield data.And example is the graphical element by a concentrated unit of single or multiple graphical element (for example unit, equipment etc.) formation.

Be configured in the key element 163 that respectively repeats that contains in the light shield layout data 162 on the light shield 13 and expose, on display panel substrate, form corresponding panel layout key element according to the assigned position of coordinate information on display panel substrate 12.As repeat shown in the key element A1_1, under the situation of the repetition key element 163 of repeated exposure, decide the exposure of number of times in the enterprising professional etiquette of determining by coordinate information in position.So, form the panel layout data that constitute by a plurality of panel layout key elements on the display panel substrate 12.

Logical process or difference processing on the display panel substrate 12 between the repetition key element 163 of configuration are main processing, therefore preferably following structure: be easy to pick up adjacent repetition key element 163 from certain repetition key element 163 that gives.

Wherein, utilize wide W that the repetition key element 163 in the light shield layout data 162 has and the data of high H.Wide W and high H represent to surpass its data with regard to non-existent Minimum Area, and in form structure 1, each repeats the wide W of key element 163 and high H and keeps pointer to adjacent repetition key element 163.Above-mentioned pointer is an address pointer, gives the address of relevant repetition key element 163 and uses as pointer.

Wherein, adjacently comprise following three kinds of modes: at least one of wide W direction zone and high H direction zone is overlapping; Connect; Every the adjacent existence at interval of 1 grid cell.Because the wide W of outer contoured shape is adjacent with high H, when they are adjacent the exposure data of reality whether adjacent be another problem, but as long as wide W and high H are non-conterminous, actual exposure data is just non-conterminous.In simple terms, produce the form that is easy to suspicious place is retrieved and construct, adopting at every turn is not the structure of identifying object with whole objects.Thereby shorten the processing time.

Figure 18 is the figure of expression by the data configuration on the display panel substrate of light shield layout data and coordinate information making, and Figure 19 is the figure of the expression form structure 2 corresponding with the data configuration of Figure 18, and expression has been kept the form of form a social stratum structure and constructed.

In Figure 18, unique lower floor that is arranged in the top module of stratum structure upper is provided with the repetition key element 182,188 of configuration.The repetition key element 182,188 of configuration for example is a transistor layer.

Lower floor in the repetition key element 182 that disposes is set up in parallel: by the series connection layer structure that graph data 183, transistor (TR1) 184 and graph data 185 constitute, reach the series connection layer that is made of transistor (TR2) 186 and graph data 187 and construct.

Lower floor in the repetition key element 188 that disposes is set up in parallel: by the series connection layer structure that graph data 189, transistor (TR1) 190 and graph data 191 constitute, reach the series connection layer that is made of transistor (TR2) 192 and graph data 193 and construct.

And in Figure 19, above table has address, Instance Name, repetition key element name or program library name, the pointer to graph data, middle layer module Instance Name, middle layer module program library name, reaches the pointer of middle layer module routine library.

Repeating the key element existence and have the situation in middle layer, is transistor layer under the situation mostly.When this transistor layer launched, data volume was huge, therefore in the present embodiment, did not launch the middle layer in advance, and under the state in middle layer, with the pointer structure data was kept as routine library, carried out as required and the dynamic process launched.

Even adopt when identical more the next middle layer in two different middle layers, occurring, also do not make its method in common.This is because even the transistor that occurs in the repetition key element of paying attention to appears at other repetition key elements, also can only launch fully in the key element of paying attention to.Be following example in Figure 19: transistor T R1 appears in the different repetition key elements with TR2, but Registration Forms independently.

Figure 20, Figure 21 are the logical process of explanation figure or the figure of difference processing and checking processing, and the graphics logic that expression is used for detecting one-sided exposure area is handled or the figure difference processing.Wherein, one-sided exposure is meant, during more adjacent repetition key element, in adjacent part, has the situation of the key element of only one-sided repetition key element exposure.

For example in Figure 20, when the repetition key element B of the repetition key element A of light shield and light shield is configured on the specified coordinate on the display panel substrate, and repeat key element A and repeat key element B corresponding panel layout key element overlapping, be configured on the display panel substrate as regional A ', B '.

Zone A ' is when repeating regional on the key element A corresponding panel substrate, in this zone, with the area B that repeats on the key element B corresponding panel substrate ' a part of projection.That is, regional A ' in the zone on display panel substrate, is equivalent to the zone of repetition key element A and overlapping 2001 logic and zone, with projecting to wherein of a part that repeats key element B corresponding panel layout key element B '.

Similarly, area B ' be in the zone on display panel substrate, be equivalent to the zone of repetition key element B and overlapping 2001 logic and zone, project to wherein with a part that repeats key element A corresponding panel layout key element A '.

Therefore, as shown in figure 21, when getting XOR, the data that are present in a side and are not present in the zone (one-sided exposure area) 2101 of opposite side have been extracted with the panel layout key element that repeats panel layout key element A on the key element A corresponding panel substrate and regional A '.

This normally overlapping specify error.Shutter frame specify error when shooting frame specify error when this mistake is the light shield data creating or making light shield data or the specify error of configuration coordinate etc.Usually, the exposure data of overlapping part must be overlapping fully by both.

In addition, also be same in the performance of getting the XOR difference.Under this situation, get difference (A-A '), the result is timing, makes to be present in repetition key element A and not to be present in the data of repetition key element B overlapping, and the result makes not to be present in repetition key element A and to be present in the data of repetition key element B overlapping when negative on the contrary.

Be the latter in this example.As obtaining same information according to XOR result, then get each AND of XOR result and repetition key element A, XOR result and repetition key element B, when the former result is logical one, make and be present in repetition key element A and not to be present in the data of repetition key element B overlapping, when latter result is logical one, make not to be present in repetition key element A and to be present in the data of repetition key element B overlapping.

Difference result has mark, compares with single logical process to contain much information, if obtain and difference processing equal information fully, then needs the AND that appends to handle in XOR result.In a word, logical process is then used OR and XOR and AND in this way, and difference processing then is OR and difference processing in this way, thereby as information acquisition checking result of equal value fully.

Figure 22～Figure 24 is to use grid cell that the figure that the OR of one-sided exposure area detection handles is described.

Logical process and difference processing are all by carrying out between the grid cell.Wherein, the definition of OR represents that when the result was logical one, this grid cell was exposed, and during logical zero, this grid does not expose.

In Figure 22, carry out and repeat the panel layout key element A on the key element A corresponding panel substrate and handle with the logic OR that repeats the panel layout key element B on the key element B corresponding panel substrate, the result is that the panel layout key element A, the B that repeat key element A, B are by overlapping 2001 result who obtains overlap condition.In Figure 22, overlapping 2001 center line 2201 is presented on the grid.

Figure 23 represents the demonstration of Figure 22 correspondence with the grid cell point, for the easy to understand accompanying drawing, put down in writing the center line 2201 of corresponding overlapping portion.That is, the exposure data L of repetition key element A, the exposure key element R that repeats key element B, and their result of logic OR are got in expression.

Figure 24 is the logical value table of expression to the logic of each grid cell point shown in Figure 23 and definition (OR).Zero logical value is 0, is unexposed grid cell point.● logical value be 1, be the exposure the grid cell point.● area surrounded becomes exposed areas.

The figure of logic OR result shown in Figure 23 is presented in the display part 1.The display area can be in display panel substrate window 9, the light shield window 10 any one.And, also can remove display panel substrate window 9, light shield window 10 and menu window 11, in the Zone Full of display part 1, show the result of Figure 23.And, also can show by literal, in this case, can be presented in any one of display panel substrate window 9, light shield window 10 and menu window 11, perhaps remove these windows, in the whole zone of display part 1, use literal display process result.

Figure 25, Figure 26 are to use the grid cell point to carry out the exclusive logic of Figure 21 and (XOR) handle or the key diagram during difference processing.

Among Figure 25, the exposure data (panel layout key element) of the repetition key element A on the light shield is L, and the exposure data of the regional A ' on the display panel substrate (panel layout key element) is R, represents the result of these logics XOR or difference.

Figure 26 be expression to the exclusive logic of each net point of exposure data L, R shown in Figure 25 and (XOR), used (the logical value table of the definition of difference processing of L-R) of each grid cell point of exposure data L, R.

Zero logical value is 0, and expression exposure data L, R exist among both exposure data or exposure data L, R not have the grid of exposure data among both.And, ● logical value be 1, have the grid of exposure data during any one of expression exposure data L, R is one-sided.And, just ● have the situation of exposure data among the expression exposure data L, negative ● as to have the situation of exposure data among the expression exposure data R.

So, detect the grid point of the exposure that only in one-sided zone, exists.During difference processing, be present in the information of which side by the grid point of positive negative flag supplenmentary exposure.Therefore, when XOR, it is variant only can to judge the result, and when difference, by positive negative flag, can add the one-sided information that has exposure data in which zone, convenient.

The result who carries out XOR or difference processing is that under the situation of logical one, its grid representation exposure data exists only in one-sided graph data, under the situation of logical zero, represents that there is or is not present in the grid of both sides in exposure data.

Figure 27, Figure 28 are the overlapping key diagrams of representing the most general panel layout key element.

Figure 27 is the figure that the grid cell point 2705 of wanting unexposed grid cell point 2704 of exposure data 2707 usefulness and exposure of light shield is represented.

And Figure 28 is that the repetition key element of the light shield that will cut apart of expression is exposed according to coordinate information, thereby according to the figure of the form of the exposure data A that obtains, B playing data for broadcasting 2707.

For cut zone be positioned at the exposure data that will cut off 2707 under it, specify the lap of overlapping region 2703, make the light shield layout data, therefore need its whether correct restoring of checking.

When lap is specified by operating portion 16 as deviate, store storage part 8 into, CPU7 judges that it is not a mistake when it in this scope the time.In Figure 27, Figure 28,, put down in writing overlapping 2703 center line 2706 for the ease of understanding.In this embodiment, center line 2706 is based on grid, but according to the method for superposition difference, also has not the situation based on grid.

Figure 29 is the figure that expression is configured in repetition key element (panel layout key element) A (L) on the display panel substrate, Figure 30 is the figure that expression is configured in the repetition key element B (R) on the display panel substrate, and Figure 31 is the key diagram that expression is configured in the logic product (AND) of repetition key element A, B on the display panel substrate.And Figure 32 is the logical value table that is configured in the AND of repetition key element A, B on the display panel substrate, and expression is for the definition of the AND of each grid cell point.

In Figure 29～Figure 32, repetition key element A, the B of configuration by with zero the expression unexposed grid cell point 2901 and with ● the grid cell point 2902 of the exposure of expression is represented territory, non-exposed area and exposure area.

And in Figure 31, repetition key element A, the B of configuration is overlapping by overlapping 2703.This is the most general example that generates the double exposure of overlapping generation.Detected overlapping 2703 when not being the deviate of the regulation in appointment wide positive and negative then is not mistake.

Figure 33～Figure 36 is the double exposure zone of extracting is handled in expression by AND a exemplary plot.And, by with the unexposed grid cell point of zero expression, and with ● the grid cell point of the exposure of expression, expression territory, non-exposed area and exposure area.

Figure 33 and Figure 29's～shown in Figure 32 is routine identical, is to be configured in two on the display panel substrate examples that repeat key element A, B with overlapping 2703 lap configuration.The AND of repetition key element A, B by configuration handles, and lap (deviate) is 3 grid cell, is judged as normal usually.

Figure 34 is configured on the display panel substrate two to repeat key element A, B and only share a grid cell as overlapping 2703, does not enter the scope of deviate of the wide positive and negative regulation of appointment, is judged as wrong example usually.In the present embodiment, as shown in figure 34, the overlapping region is called when being 1 grid cell and connects exposure 1.

The example of Figure 35 is to be configured on the display panel substrate two to repeat key element A, B every the interval of a grid cell and adjacent data configuration.In the present embodiment, this example is called connection exposure 2, is judged as mistake usually.In this example, the zone of AND result is not extracted, but handles when having extracted a figure of closing by carrying out OR, can judge it is the type that connects exposure 2.

The example of Figure 36 is to be configured on the display panel substrate two to repeat the data configuration that key element A, B separate the above interval of 2 grid cell.In this example, the zone of AND result is not extracted, and there are territory, more than one non-exposed area grid cell point 3601 in two repetition key element A, B disposing on the display panel substrate between 2 grid cell.Its extraction by territory, following non-exposed area 3601 detects.

Figure 37 and Figure 38 are the key diagrams when the light shield data with the repetition key element of having added correcting pattern are carried out double exposure.

In Figure 37,, shear the 1st layer of metal line 3702 and the 2nd layer of metal line 3703 in the panel topology data by the shooting frame of setting 1002.

When correcting pattern is set, as shown in figure 38, in each end of the 1st layer of metal line 3702 and the 2nd layer of metal line 3703 respectively with size than the roomy specified length of the 1st layer of metal line 3702, the 2nd layer of metal line 3703, integrally formed correcting pattern 1004 continuously on its length direction with specified length.

Form the wide shutter frame 1005 of regulation, make the inner edges 1006 and the outward flange of correcting pattern 1004 stress folded predetermined length (for example 1 grid cell).

Form the wide shutter frame 1005 of regulation, make the inward flange 1006 of shutter frame 1005 and the overlapping predetermined length of outward flange of correcting pattern 1004 (for example 1 grid cell).

And, can make also that shutter frame 1005 is not overlapping with correcting pattern 1004, shutter frame 1005 inward flanges form with correcting pattern 1004 with being connected.

Wherein, the correcting pattern 1004 of generation becomes zone 1007, and this zone is the object of double exposure.

Therefore, as Figure 39, shown in Figure 40, the result who also uses AND to handle verifies whether correcting pattern 1004 correctly becomes the double exposure zone.

That is, in Figure 39, be configured in repetition key element A on the display panel substrate, B is configured to and take the shooting frame zone 3903,3904 of appointment in the frame 1002 overlapping.So, the correcting pattern 1004 that repeats key element A is overlapping with the correcting pattern 1004 that repeats key element B, and double exposure, and on display panel substrate, the metal line 3901 that repeats key element A forms continuously with the metal line 3902 that repeats key element B.

Figure 40 is a key diagram of representing its form with the grid cell point.In Figure 40, the result of AND logical process is carried out in the shooting frame of overlapping repetition key element A zone 3903 and the shooting frame zone 3904 of repeating key element B between the grid cell point that repeats key element A, B, formed continuous regional A ', B '.In addition, ● be logical one, the grid cell point of expression exposure, the 0th, logical zero is represented unexposed grid cell point.

And Figure 38 has also illustrated the double exposure checking of shutter frame inward flange 1006 and graph data.That is, verification pattern data (being correcting pattern 1004 under the situation of Figure 38) enter into shutter frame 1005 inside with what degree, and this moment is normally as " 1 " that connects exposure 1 (with reference to Figure 34), promptly with 1 overlapping connection of grid cell.That is, generally, as the deviate of lap with the situation of 1 grid cell as normal.

But be suitable for the AND processing this moment, the double exposure zone than the deviate of above-mentioned appointment big or hour, be mistake.

And how much different the shutter frame inward flange 1006 of Figure 38 and the checking of the double exposure of graph data be in this checking.That is, when the light shield layout data are only arranged, can verify, therefore need not coordinate information.But as shown in figure 15, when carrying out a series of processing, can verify processing in the lump to the result who launches configuration according to coordinate information certainly.

Figure 41 and Figure 42 are that the checking that has or not in explanation territory, non-exposed area is handled, is whether the display panel substrate All Ranges is by the key diagram of the checking processing of light shield layout data 162 coverings.

As shown in figure 41, make the repetition key element 163 in the light shield layout data 162 that are provided with on the light shield 13 carry out exposure-processed according to coordinate information simulation ground on display panel substrate 12, artificially generated terrain becomes configured board topology data 161 on display panel substrate 12.

When making light shield layout data 162 interior repetition key elements 163 be configured on the display panel substrate 12 according to coordinate information, as shown in figure 42, be taken at the exposure object zone that comprises in the inward flange of shutter frame of repetition key element 163, and with the logic OR in the zone of the regional corresponding panel substrate 12 of this exposure object.It carries out all repetition key elements 163, if there is the grid cell that becomes logical zero on the display panel substrate 12, then its zone is the zone that does not become exposure object, is mistake.

Figure 41 represents following example: lack repetition key element R1, therefore on display panel substrate 12, produce the zone 4101 that is not covered (not forming the panel layout data) by the light shield data, this moment, CPU7 was identified as mistake.

The logical process of the light shield data of above explanation and the relation of checking project are carried out following arrangement.

During one-sided exposure checking, logical process or difference processing are got logic and (the A OR B) of A and B to figure A and figure B, the exclusive logic of getting the regional A ' of the figure A that contains its result and figure A and (A ' XOR A).Perhaps get contain above-mentioned logic and result's the regional A ' of figure A and the difference of figure A.As test item, detect the data that exist only in the zone of containing figure A, be present in the zone of figure B (with reference to Figure 20～Figure 26).

When (contain and connect exposure 1), logical process or difference processing are got the logic product (A AND B) of A and B to figure A and figure B in the double exposure checking.As test item, carry out the double exposure zone and detect, judge whether it is mistake according to the parameter of setting, when being judged as mistake, this judged result is exported (with reference to Figure 27～Figure 36, Figure 39, Figure 40) as error reporting.

Connect under the situation of exposure 2, logical process or difference processing are got the logic product (A AND B) of A and B to figure A and figure B.Its result is that the result of the logic of logical zero (no figure) and A and B and (A OR B) is when forming a figure, as test item, connect the detection in 2 zones of exposing, judge whether mistake according to the parameter of setting, when judgement is mistake, this judged result is exported (with reference to Figure 39, Figure 40) as error reporting.

When non-exposure was verified, logical process or difference processing were deployed in whole light shield layout data configurations on the display panel substrate, carried out logic and (OR) processing.As test item, the grid cell point of be false in the position of OR (result that OR handles is logical zero) detects (with reference to Figure 41, Figure 42) as the territory, non-exposed area.

Figure 43 and Figure 44 are the key diagrams of explanation checking result's graphical presentation, and Figure 43 is the figure of the dialog box 431 that shows in the expression display part 1, and Figure 44 is the figure that the mistake of the chart data form that shows in the display panel substrate window 12 of expression display part 1 shows.

The setting of verification condition etc. is set by the action button in the operating portion 16 operation dialog boxes 431.For example, checking is all carried out with layer unit, so the appointment of operating portion 16 layer that carries out will showing in dialog box 431, then specifies the type of error that will show, indicates retrieval.

Wherein, the type of error that show comprises one-sided exposure, double exposure, connection exposure 1, connects five kinds of exposure 2, non-exposures.Each type of error can be specified the color of demonstration.In Figure 44, ● expression has any one the wrong grid cell point (mistake grid cell point) in above-mentioned five kinds of mistakes, the grid cell point that zero expression does not have above-mentioned mistake.

CPU7 shows that to the user mistake has several places according to the condition of setting.

Then, the user is by each action button in the operating portion 16 operation display operation zones 432, and is next, preceding, initial, last to the indication of wrong place, then shows indicated content for the zone errors that show on the display panel substrate window 12 this moment.

Common wrong place shows a plurality of, for example, as specifies the next one, under shown resolution, is starting point with the left side, top then, moves to the right, does not have the zone as the right side, then jumps to the left side, below and shows.And when indication is amplified, when dwindling, then the centre coordinate that shows this moment shown the chart data that amplifies or dwindle.

Figure 45 is the figure of the data configuration of expression detected error figure.Misdata in top module 451, the automatic module name of generation error module 452,454,456,458, and linking.The graph data 453,455,457,459 of mistake be linked at each error module 452,454,456,458 under.The Instance Name of error module 452,454,456,458, program library name homogeneous phase with, even the misdata of therefore same shape can not shared yet.This is because mistake is basic independent the generation on display panel substrate.

As mentioned above, in the photo mask verification system that embodiments of the present invention relate to, CPU7 is with reference to the graph data and the coordinate information of the exposure key element of storage in the data file storage part 5 of storage part 8, panel layout key element (layout graphical element) on generation and the above-mentioned exposure key element corresponding display panel, the checking result that will concern based on the position of a plurality of above-mentioned panel layout key elements is shown to display part 1.And, when having set when whether being wrong judgment standard,, verify whether mistake of above-mentioned exposure key element by judging the position relation of a plurality of above-mentioned panel layout key elements, will verify that the result is presented at display part 1.In display part 1, in display panel substrate window 9 or the light shield window 10, or with the irrelevant viewing area of these windows in, show above-mentioned checking result.

Therefore, the photo mask verification system input light shield layout data that present embodiment relates to and the configuration information of exposure key element (repetition key element), the action of analogue exposure device, and carrying out graphics calculations handles, thereby exposure-processed is carried out in simulation, carry out whether on display panel substrate, having formed the checking of suitable panel layout data, in other words, carry out the whether suitable checking of light shield by light shield.

That is, whether the light shield data of making are correct, by the analogue exposure device and carry out graphics calculations and handle, can verify the light shield data.Especially when making flat-panel monitor, can exploit one's power to the checking of the light shield data used, according to present embodiment, can whether be to answer the data of correct exposure to verify to the display panel substrate data of making by light shield layout data and coordinate information.

And, can add the authentication function of handling based on the action simulation and the graphics calculations of exposure device, therefore before entering manufacturing process, just can verify.

Consequently, in the manufacturing of flat-panel monitor, comprising having very big effect aspect the expense of activity duration.That is,, confirm whether light shield is correct data, then can the generation of unnecessary cost burden be prevented trouble before it happens by before manufacturing, implementing the photo mask verification system that embodiments of the present invention relate to.

Its reason is, this is light shield manufacture expense, display panel substrate manufacturing cost, comprise the manufacturing time of the service charge when mistake is made and the expense of the time of parsing etc., need not have more these unnecessary expenses and get final product.This effect is also just the same under the situation of the simple repeated configuration appointment that only needs Region Segmentation.This is because the situation of artificial misdirection is more in repeating to specify.

And,, can provide a kind of by carry out the photo mask verification program that makes up above-mentioned photo mask verification system by computing machine with display part 1, operating portion 16, CPU7 and storage part 8 according to present embodiment.And provide a kind of photo mask verification method that plays above-mentioned effect.

In addition, in the above-described embodiment, use a computing machine to make up photo mask verification system, also can use many computing machines to make up.At this moment, above-mentioned each program can constitute suitably according to system and cuts apart.

The present invention can be applicable to carry out the photo mask verification system of various display manufacturings such as LCD with the checking of light shields.And, also can be applicable to as carrying out the program that various display manufacturings are worked with the photo mask verification system of the checking of light shield.

Claims (11)

1. photo mask verification system is characterized in that having:

Storage unit, storage: the graph data of the exposure key element that contains in the flat-panel monitor exposure light cover; And by the performance of the coordinate of grid cell point, the coordinate information of the exposure position of the above-mentioned exposure key element on the expression display panel;

Layout graphical element generation unit, according to the graph data and the coordinate information of the exposure key element of storing in the said memory cells, the layout graphical element on the above-mentioned display panel of generation and above-mentioned exposure key element correspondence;

Authentication unit according to the position relation of a plurality of layout graphical elements on the above-mentioned display panel of above-mentioned layout graphical element generation unit generation, is verified above-mentioned exposure key element; And

Display unit shows the result that above-mentioned authentication unit is verified.

2. photo mask verification system according to claim 1 is characterized in that,

Above-mentioned display unit has the window that shows the checking result at least,

Above-mentioned authentication unit is verified above-mentioned a plurality of exposure key element by carrying out the computing between the grid cell corresponding with above-mentioned a plurality of layout graphical elements,

The graphic presentation that above-mentioned display unit is obtained the checking result of above-mentioned authentication unit is to above-mentioned window.

3. photo mask verification system according to claim 1 and 2 is characterized in that, the external program storehouse that the data of above-mentioned light shield will define the middle layer of transistor figure or define the transistor figure is held as the middle layer,

And have the middle layer or the external program storehouse that make the above-mentioned transistor figure of definition and construct the expansion unit that launches as required, have the form structure by pointer.

4. according to each described photo mask verification system in the claim 1 to 3, it is characterized in that, above-mentioned authentication unit has the difference extracting unit, it is after the logic OR that has carried out two layout graphical elements handles, the logic XOR that carries out this layout graphical element The corresponding area in the graphical element that above-mentioned any one layout graphical element and above-mentioned logic OR result obtained handles or difference processing, thereby extracts the difference of above-mentioned two layout graphical elements.

5. according to each described photo mask verification system in the claim 1 to 4, it is characterized in that, above-mentioned authentication unit has the lap detecting unit, handles by the logic AND that carries out two layout graphical elements, detects the lap of above-mentioned two layout graphical elements.

6. photo mask verification system according to claim 5 is characterized in that above-mentioned authentication unit has the skew authentication unit, verifies whether the detected lap of above-mentioned lap detecting unit satisfies indicated off-set value.

7. according to claim 5 or 6 described photo mask verification systems, it is characterized in that, above-mentioned authentication unit has the key element judging unit, after above-mentioned lap detecting unit detects the lap that does not have above-mentioned two layout graphical elements, carrying out logic OR handles, when confirmed two layout graphical elements form the figure of closing as a result the time, judge that above-mentioned two layout graphical elements are continuous graphical elements.

8. according to each described photo mask verification system in the claim 1 to 7, it is characterized in that,

Contain graphical element and surround the shutter frame of the pre-Fixed width of above-mentioned graphical element in the above-mentioned key element of respectively exposing,

Above-mentioned authentication unit has the terminal point authentication unit, and for the grid cell on the above-mentioned display panel corresponding with above-mentioned shutter frame inward flange, whether checking exists the terminal point of the layout graphical element of above-mentioned graphical element in the scope of regulation off-set value.

9. according to each described photo mask verification system in the claim 1 to 8, it is characterized in that,

Have designating unit, specify the wrong layer that contains wrong checking result,

When above-mentioned display unit shows wrong graphical information on the above-mentioned checking result's of expression window, on above-mentioned window, show the wrong graphical information of the wrong layer of above-mentioned designating unit appointment with layer unit.

10. photo mask verification system according to claim 9 is characterized in that,

Above-mentioned display unit has and the different dialog box of window that shows above-mentioned checking result,

Above-mentioned designating unit is specified above-mentioned wrong layer on above-mentioned dialog box,

Above-mentioned display unit shows number of errors on above-mentioned dialog box, and responds the appointment of above-mentioned designating unit to wrong layer, and the wrong graphical information of this layer is shown on the above-mentioned window.

11. a program makes computing machine play the effect of each described photo mask verification system in the claim 1 to 10.

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