TWI384085B - Reciprocating two-section atmospheric pressure plasma coating system - Google Patents

Reciprocating two-section atmospheric pressure plasma coating system Download PDF

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TWI384085B
TWI384085B TW98115175A TW98115175A TWI384085B TW I384085 B TWI384085 B TW I384085B TW 98115175 A TW98115175 A TW 98115175A TW 98115175 A TW98115175 A TW 98115175A TW I384085 B TWI384085 B TW I384085B
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workpiece
piezoelectric slurry
normal piezoelectric
reciprocating
coating system
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TW98115175A
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TW201040293A (en
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hao long Chen
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Univ Kao Yuan
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往復式雙段噴射常壓電漿鍍膜系統Reciprocating double-stage jet normal piezoelectric slurry coating system

本發明係關於一種鍍膜系統,特別是指一種往復式提供清潔活化及披覆鍍膜的往復式雙段噴射常壓電漿鍍膜系統。The present invention relates to a coating system, and more particularly to a reciprocating reciprocating two-stage jet normal piezoelectric slurry coating system that provides cleaning activation and coating.

常壓電漿技術已經被廣泛使用於清潔基板上,在各種不同鍍膜技術中,噴射常壓電漿鍍膜技術最大的優點為不需要高真空設備,生產成本可以降低,適用於各項不同材質的基板(如金屬、玻璃、塑膠、木材、紡織品及陶瓷)。The constant piezoelectric slurry technology has been widely used on clean substrates. Among various coating technologies, the biggest advantage of the sprayed normal piezoelectric slurry coating technology is that high vacuum equipment is not required, and the production cost can be reduced, which is suitable for various materials. Substrates (such as metal, glass, plastic, wood, textiles and ceramics).

中華民國專利公告號557560揭露一種「製備銅金屬化晶片以供打線之方法」、中華民國專利公告號I230967揭露一種「在常壓下游電漿噴射系統中去除含有金屬之高分子材料與離子植入之光阻殘餘物的方法」以上皆是單獨運用電漿對材料表面進行清潔;對於單獨將常壓電漿應用於材料表面進行鍍膜,中華民國公告號I293338揭露一種「大氣電漿噴流鍍膜裝置」,但此項專利以大氣電漿噴流鍍膜噴頭為主,以上皆未揭露電漿同時對表面往復進行清潔活化及披覆鍍膜。The Republic of China Patent Publication No. 557560 discloses a "method for preparing a copper metallized wafer for wire bonding", and the Republic of China Patent Publication No. I230967 discloses a "removal of a metal-containing polymer material and ion implantation in a normal pressure downstream plasma spraying system. The method of photoresist residue is to clean the surface of the material by using plasma alone. For the application of the common piezoelectric slurry to the surface of the material, the Republic of China Bulletin No. I293338 discloses an "atmospheric plasma jet coating device". However, this patent mainly uses atmospheric plasma jet coating nozzles, and none of the above discloses the cleaning and activation of the surface and the coating coating.

而為了能夠有效解決前述相關議題,本發明創作人基於過去在鍍膜系統領域所累積的研發技術與經驗,而發展出一種往復式雙段噴射常壓電漿鍍膜系統。In order to effectively solve the aforementioned related issues, the creator of the present invention developed a reciprocating two-stage jet normal piezoelectric slurry coating system based on the research and development technology and experience accumulated in the field of coating systems in the past.

本發明係一種往復式雙段噴射常壓電漿鍍膜系統,其目的在於提供工件往復式清潔活化及披覆薄膜。The invention relates to a reciprocating two-stage jet normal piezoelectric pulp coating system, and the object thereof is to provide a reciprocating cleaning activation and coating film of a workpiece.

為達成上述目的,本發明包含一殼體及至少二電漿噴射裝置,其中,該殼體於內部可活動的組裝一載送一工件的移動載台,該殼體內部設有一供該移動載台通過的氣流隔板;該二電漿噴射裝置分別組裝於該殼體內的氣流隔板二側,該二電漿噴射裝置分別設有一導氣管、一個連接該導氣管的常壓電漿產生器及一個連接該常壓電漿產生器的噴嘴,該常壓電漿產生器透過該導氣管導入的反應氣體形成電漿,該工件隨該移動載台相對該二電漿噴射裝置往復位移。In order to achieve the above object, the present invention comprises a casing and at least two plasma spraying devices, wherein the casing is movably assembled internally with a moving carrier carrying a workpiece, and the casing is internally provided with a movable load. a gas flow separator passing through the stage; the two plasma spraying devices are respectively assembled on two sides of the air flow partition in the casing, and the two plasma spraying devices are respectively provided with an air guiding pipe and a normal piezoelectric slurry generator connected to the air guiding pipe And a nozzle connected to the normal piezoelectric slurry generator, the normal piezoelectric slurry generator forms a plasma through the reaction gas introduced by the air guiding tube, and the workpiece is reciprocally displaced with the moving stage relative to the two plasma spraying devices.

藉由前述進一步分析將可獲得下述功效:本發明該第一電漿噴射裝置用於清潔工件、活化工件表面、維持鍍膜表面活性及使鍍膜結構緻密的功用,該第二電漿噴射裝置用於將鍍膜披覆於工件,該工件藉著移動載台反復動作,一方面披覆薄膜,一方面將鬆散的沈積原子脫附,並且維持薄膜表面活性,以增加薄膜晶粒間吸附及反應,改善薄膜吸附性及微結構性質。By the foregoing further analysis, the following effects can be obtained: the first plasma spraying device of the present invention is used for cleaning a workpiece, activating a surface of the workpiece, maintaining the surface activity of the coating, and densifying the coating structure, the second plasma spraying device It is used to coat the coating on the workpiece. The workpiece is repeatedly moved by the moving stage. On the one hand, the film is coated, on the one hand, the loose deposited atoms are desorbed, and the surface activity of the film is maintained to increase the adsorption and reaction between the grains of the film. Improve film adsorption and microstructure properties.

有關本發明為達成上述目的,所採用之技術、手段及其他功效,茲列舉實施例並配合圖式詳細說明如後,相信本發明之目的、特徵及其他優點,當可由之得一深入而具 體之解。The present invention has been described with reference to the embodiments and the detailed description of the embodiments of the present invention. Body solution.

本發明實施例請參閱第1圖及第2圖所示:本發明包含一殼體10、一第一電漿噴射裝置20及一第二電漿噴射裝置30;該殼體10左右側各設有一通孔11,該殼體10內部可活動的組裝一對應該二通孔11的移動載台A,該殼體10之其一通孔11透過該移動載台A導引該工件B進入該殼體10,該殼體10之另一通孔11透過該移動載台A導引該工件B離開該殼體10,該殼體10內部於該移動載台A下方設有一具有多孔排氣隔板121的排出孔12,該殼體10內部於該移動載台A上方設有一氣流隔板13,該殼體10透過該氣流隔板13分隔第一空間14及第二空間15,該氣流隔板13下方設有一供該移動載台A通過的穿孔131。Please refer to FIG. 1 and FIG. 2 for the embodiment of the present invention. The present invention includes a casing 10, a first plasma spraying device 20 and a second plasma spraying device 30; There is a through hole 11 in which a pair of moving stages A corresponding to the two through holes 11 are movably assembled, and a through hole 11 of the case 10 guides the workpiece B into the case through the moving stage A. The other through hole 11 of the casing 10 guides the workpiece B away from the casing 10 through the moving stage A. The casing 10 is internally provided with a porous exhaust partition 121 below the moving stage A. A discharge hole 12 is disposed inside the casing 10, and an air flow partition 13 is disposed above the moving stage A. The casing 10 partitions the first space 14 and the second space 15 through the air flow partition 13, the air flow partition 13 A perforation 131 through which the moving stage A passes is provided below.

該第一電漿噴射裝置20及該第二電漿噴射裝置30分別可活動的組裝於該殼體10的第一空間14與第二空間14中,使該第一電漿噴射裝置20及該第二電漿噴射裝置30分別位於該氣流隔板13二側隔絕氣流,該第一電漿噴射裝置20與該第二電漿噴設裝置30依序分別設有一個與外部連通導入反應氣體的導氣管21、31、一個連接該導氣管21、31的常壓電漿產生器22、32及一個連接該常壓電漿產生器22、32的噴嘴23、33,該導氣管21、31與該常壓電漿 產生器22、32之間更設有一個調整機構24、34。The first plasma spraying device 20 and the second plasma spraying device 30 are respectively movably assembled in the first space 14 and the second space 14 of the casing 10, so that the first plasma spraying device 20 and the first plasma spraying device 20 The second plasma spraying device 30 is respectively located on the two sides of the air flow partition 13 to block the air flow. The first plasma spraying device 20 and the second plasma spraying device 30 are respectively provided with a communication medium for introducing the reaction gas. Air guiding tubes 21, 31, a normal piezoelectric slurry generator 22, 32 connecting the air guiding tubes 21, 31, and a nozzle 23, 33 connecting the normal piezoelectric slurry generators 22, 32, the air guiding tubes 21, 31 and Normal piezoelectric slurry An adjustment mechanism 24, 34 is further provided between the generators 22, 32.

該常壓電漿產生器22、32提供能量將該導氣管21、31所導入的反應氣體在常壓下解離為電漿,該噴嘴23、33用於將該常壓電漿產生器22、32產生的電漿噴出,該工件B隨該移動載台A於該殼體10內相對該第一電漿噴射裝置20及該第二電漿噴射裝置30往復位移,使電漿由該噴嘴23、33向該工件B噴出,便能以電漿對該工件B清潔活化及以電漿對該工件B披覆鍍膜,該各電漿噴射裝置20、30的調整機構24、34還能藉由調整該導氣管21、31與該常壓電漿產生器22、32之間的角度與距離,進而改變該噴嘴23、33對該工件B噴出電漿的角度與距離,該噴嘴23視不同需求而改變形狀(如圓形或扁形)。The normal piezoelectric slurry generators 22, 32 provide energy to dissociate the reaction gas introduced by the air guiding tubes 21, 31 into a plasma under normal pressure, and the nozzles 23, 33 are used for the normal piezoelectric slurry generator 22, The generated plasma is ejected, and the workpiece B is reciprocally displaced with the moving stage A in the casing 10 relative to the first plasma spraying device 20 and the second plasma spraying device 30, so that the plasma is passed from the nozzle 23. And 33 is ejected to the workpiece B, the workpiece B can be cleaned and activated by plasma, and the workpiece B is coated with plasma. The adjusting mechanisms 24 and 34 of the plasma spraying devices 20 and 30 can also be Adjusting the angle and distance between the air guiding tubes 21, 31 and the normal piezoelectric slurry generators 22, 32, thereby changing the angle and distance of the nozzles 23, 33 for discharging the plasma to the workpiece B, the nozzle 23 depending on different needs Change the shape (such as round or flat).

電漿於使用過後將回復為氣體,且氣體與清潔過程產生的粉塵,會經由該殼體10的排出孔13向外排出,該排出孔13透過抽氣機構或集塵機構獲取吸力提升氣體與粉塵排出的效果,薄膜的沈積是一連串涉及原子的吸附,吸附原子在表面的擴散,且於適當的階梯或頸結位置進行聚結形成薄膜,該第一電漿噴射裝置20利用電漿中的離子轟擊該工件B表面及該鍍膜表面,使該工件B表面及鍍膜表面鬆散的原子利用離子的轟擊效果,讓鬆散的原子脫附達到緻密的結構,該工件B表面的活性及清潔度將影響到鍍膜附著性,該工件B表面的清潔度及活性越高,則沈積的原子 更容易與該工件B表面反應結合,使得薄膜附著性越好。The plasma will return to the gas after use, and the dust generated by the gas and the cleaning process will be discharged outward through the discharge hole 13 of the casing 10, and the discharge hole 13 can be used to obtain the suction lifting gas and the dust through the air suction mechanism or the dust collecting mechanism. The effect of the discharge, the deposition of the film is a series of adsorption involving atoms, the diffusion of adsorbed atoms on the surface, and coalescing at a suitable step or neck junction to form a film. The first plasma spraying device 20 utilizes ions in the plasma. Bombard the surface of the workpiece B and the surface of the coating, so that the loose surface of the surface of the workpiece B and the surface of the coating utilizes the bombardment effect of ions, so that the loose atoms are desorbed to a dense structure, and the activity and cleanliness of the surface of the workpiece B will be affected. Coating adhesion, the higher the cleanliness and activity of the surface of the workpiece B, the deposited atoms It is easier to combine with the surface reaction of the workpiece B, so that the adhesion of the film is better.

由上得知,使用電漿進行清潔不僅不需要化學清潔劑及水,不會對環境造成污染,也不會有機械式的強力削磨避免該工件B過度削磨,且還能適用不同材質的工件B(如鐵、銅、鋁、高分子聚合等材質)及不同形狀的工件B(如圓形、板狀等形狀),且該二電漿噴射裝置20、30的數量並不限定於前述二個視需求增加。It is known that the use of plasma for cleaning not only does not require chemical cleaners and water, does not pollute the environment, does not have mechanical strong grinding to avoid excessive grinding of the workpiece B, and can also be applied to different materials. The workpiece B (such as iron, copper, aluminum, polymer polymerization, etc.) and the workpiece B of different shapes (such as a circular shape, a plate shape, etc.), and the number of the two plasma injection devices 20, 30 is not limited to The aforementioned two increase in demand.

當該工件B為板狀(請參閱第1圖所示),該移動載台A採直線移動作往復位移,此時該氣流隔板13的穿孔131係設於下方供該移動載台A及該工件B通過;當該工件B為圓柱(請參閱第2圖所示),該移動載台A採旋轉移動作往復位移,此時該氣流隔板13的穿孔131係設於中段供該移動載台A及該工件B通過;前述該工件B皆是透過該移動載台A由該殼體10的其一通孔11導入及由該殼體10的另一通孔12導出。When the workpiece B is in the shape of a plate (refer to FIG. 1), the moving stage A is linearly moved for reciprocating displacement, and the perforation 131 of the air flow partition 13 is provided below for the moving stage A and The workpiece B passes; when the workpiece B is a cylinder (see FIG. 2), the moving stage A is rotated and reciprocated, and the perforation 131 of the air flow partition 13 is disposed in the middle for the movement. The stage A and the workpiece B pass; the workpiece B is introduced through the through hole 11 of the casing 10 through the moving stage A and is led out from the other through hole 12 of the casing 10.

綜上所述,本發明『產業之可利用性』已顯而易見,且本案實施例所揭露出的特徵技術,並未見於各刊物及傳媒,亦未曾被公開使用,更具有不可輕忽的附加功效,故本發明的『新穎性』以及『進步性』都已符合專利法規,爰依法提出發明專利之申請,祈請惠予審查並早日賜准專利,實感德便。In summary, the "industry availability" of the present invention is obvious, and the feature technology disclosed in the embodiments of the present invention has not been seen in various publications and media, and has not been publicly used, and has an additional effect that cannot be neglected. Therefore, the "novelty" and "progressiveness" of the present invention have been in compliance with patent laws and regulations, and applications for invention patents have been filed according to law, and it is prayed for review and early grant of patents.

惟以上所述,僅為本發明之可行實施例,該實施例主 要僅在於用以舉例說明本發明為達到目的所運用之技術手段,因此並不能以之限定本發明之保護範園,舉凡依本發明說明書及申請專利範圍所為之等效變化或修飾,皆應仍屬本發明所涵蓋之保護範圍。However, as described above, it is only a possible embodiment of the present invention, and the embodiment is mainly The present invention is not intended to limit the scope of the invention, and is not intended to limit the scope of the present invention. It is still within the scope of protection covered by the present invention.

10‧‧‧殼體10‧‧‧shell

11‧‧‧通孔11‧‧‧through hole

12‧‧‧排出孔12‧‧‧Exhaust hole

121‧‧‧多孔排氣隔板121‧‧‧Multiple exhaust diaphragm

13‧‧‧氣流隔板13‧‧‧Air baffle

131‧‧‧穿孔131‧‧‧Perforation

14‧‧‧第一空間14‧‧‧First space

15‧‧‧第二空間15‧‧‧Second space

20、30‧‧‧電漿噴射裝置20, 30‧‧‧ Plasma jetting device

21、31‧‧‧導氣管21, 31‧‧‧ air duct

22、32‧‧‧常壓電漿產生器22, 32‧‧‧Normal piezoelectric pulp generator

23、33‧‧‧噴嘴23, 33‧‧‧ nozzle

24、34‧‧‧調整機構24, 34‧‧ ‧ adjustment agency

A‧‧‧移動載台A‧‧‧Mobile stage

B‧‧‧工件B‧‧‧Workpiece

第1圖 本發明之平面示意圖一。Figure 1 is a schematic plan view of the present invention.

第2圖 本發明之平面示意圖二。Fig. 2 is a plan view 2 of the present invention.

10...殼體10. . . case

11...通孔11. . . Through hole

12...排出孔12. . . Drain hole

121...多孔排氣隔板121. . . Porous exhaust separator

13...氣流隔板13. . . Air flow partition

131...穿孔131. . . perforation

14...第一空間14. . . First space

15...第二空間15. . . Second space

20、30...電漿噴射裝置20, 30. . . Plasma spray device

21、31...導氣管21, 31. . . Air duct

22、32...常壓電漿產生器22, 32. . . Normal piezoelectric generator

23、33...噴嘴23, 33. . . nozzle

24、34...調整機構24, 34. . . Adjustment mechanism

A...移動載台A. . . Mobile stage

B...工件B. . . Workpiece

Claims (5)

一種往復式雙段噴射常壓電漿鍍膜系統,包含:一殼體,係於內部可活動的組裝一載送一工件的移動載台,該殼體內部設有一供該移動載台通過的氣流隔板;以及二電漿噴射裝置,係組裝於該殼體內,且該二電漿噴射裝置分別位於該氣流隔板二側,該二電漿噴射裝置分別設有一個與外部連通導入反應氣體的導氣管、一個連接該導氣管的常壓電漿產生器及一個連接該常壓電漿產生器的噴嘴,該常壓電漿產生器透過該導氣管導入的反應氣體形成電漿,該工件隨該移動載台相對該二電漿噴射裝置往復位移,該噴嘴用於將該常壓電漿產生器產生的電漿對該殼體的工件噴出,以電漿對該工件重複進行潔活化及披覆鍍膜。 A reciprocating two-stage jet normal piezoelectric slurry coating system comprising: a casing for internally movably assembling a moving stage carrying a workpiece, the casing being internally provided with an air flow for the moving stage a separator; and two plasma spraying devices are assembled in the casing, and the two plasma spraying devices are respectively located on two sides of the air flow partition, and the two plasma spraying devices are respectively provided with a communication gas introduced into the outside to introduce a reaction gas. An air guiding tube, a normal piezoelectric slurry generator connected to the air guiding tube, and a nozzle connected to the normal piezoelectric slurry generator, the normal piezoelectric slurry generator forms a plasma through a reaction gas introduced by the air guiding tube, and the workpiece The moving stage is reciprocally displaced relative to the two plasma spraying devices, and the nozzle is used for ejecting the plasma generated by the normal piezoelectric slurry generator to the workpiece of the housing to repeatedly clean and activate the workpiece Coating. 如申請專利範圍第1項所述往復式雙段噴射常壓電漿鍍膜系統,其中,該二電漿噴射裝置的導氣管與常壓電漿產生器之間更設有一個調整機構。 The reciprocating two-stage jet normal piezoelectric slurry coating system according to claim 1, wherein an adjustment mechanism is further disposed between the air guiding tube of the two plasma spraying device and the normal piezoelectric slurry generator. 如申請專利範圍第1項所述往復式雙段噴射常壓電漿鍍膜系統,其中,該殼體更設有至少一通孔,該殼體的至少一通孔提供該移動載台導入該工件或導出該工件。 The reciprocating two-stage jet normal piezoelectric slurry coating system according to claim 1, wherein the housing is further provided with at least one through hole, and at least one through hole of the housing provides the moving stage to the workpiece or is exported. The workpiece. 如申請專利範圍第1項所述往復式雙段噴射常壓電漿鍍膜系統,其中,該殼體更設有一具有多孔排氣隔板的排出孔。The reciprocating two-stage jet normal piezoelectric slurry coating system according to claim 1, wherein the housing is further provided with a discharge hole having a porous exhaust separator. 如申請專利範圍第4項所述往復式雙段噴射常壓電漿鍍膜系統,其中,該殼體的排出孔更連接抽氣機構或集塵機構。The reciprocating double-stage jet normal piezoelectric slurry coating system according to claim 4, wherein the discharge hole of the casing is further connected to a suction mechanism or a dust collecting mechanism.
TW98115175A 2009-05-07 2009-05-07 Reciprocating two-section atmospheric pressure plasma coating system TWI384085B (en)

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Publication number Priority date Publication date Assignee Title
EP0165565B1 (en) * 1984-06-19 1988-12-07 Plasmainvent Ag Vacuum plasma coating machine
US20040115364A1 (en) * 2001-02-02 2004-06-17 Stefan Grosse Method for the production of a functional coating by means of high-frequency plasma beam source
US6800336B1 (en) * 1999-10-30 2004-10-05 Foernsel Peter Method and device for plasma coating surfaces
TW200725126A (en) * 2005-12-23 2007-07-01 Ind Tech Res Inst Method for fabricating orientation film
TW200734474A (en) * 2006-03-08 2007-09-16 Univ Chienkuo Technology Film-coating device with replaceable coating chamber
TWI293338B (en) * 2005-12-29 2008-02-11 Metal Ind Res & Dev Ct
TW200808985A (en) * 2006-08-07 2008-02-16 Ind Tech Res Inst Plasma deposition apparatus and depositing method thereof
US20080160205A1 (en) * 2006-12-28 2008-07-03 Gasworth Steven M Apparatus and method for plasma arc coating
TW200912032A (en) * 2007-09-10 2009-03-16 Ind Tech Res Inst Film coating system and isolating device

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0165565B1 (en) * 1984-06-19 1988-12-07 Plasmainvent Ag Vacuum plasma coating machine
US6800336B1 (en) * 1999-10-30 2004-10-05 Foernsel Peter Method and device for plasma coating surfaces
EP1230414B1 (en) * 1999-10-30 2004-10-06 PlasmaTreat GmbH Method and device for plasma coating surfaces
US20040115364A1 (en) * 2001-02-02 2004-06-17 Stefan Grosse Method for the production of a functional coating by means of high-frequency plasma beam source
TW200725126A (en) * 2005-12-23 2007-07-01 Ind Tech Res Inst Method for fabricating orientation film
TWI293338B (en) * 2005-12-29 2008-02-11 Metal Ind Res & Dev Ct
TW200734474A (en) * 2006-03-08 2007-09-16 Univ Chienkuo Technology Film-coating device with replaceable coating chamber
TW200808985A (en) * 2006-08-07 2008-02-16 Ind Tech Res Inst Plasma deposition apparatus and depositing method thereof
US20080160205A1 (en) * 2006-12-28 2008-07-03 Gasworth Steven M Apparatus and method for plasma arc coating
TW200912032A (en) * 2007-09-10 2009-03-16 Ind Tech Res Inst Film coating system and isolating device

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