TWI383152B - Detection device - Google Patents

Description

Detection device

The invention relates to a detecting device, in particular to a detecting device for a semiconductor and a light emitting diode.

Semiconductor and LED manufacturing can be divided into main processes such as 1C Design, Wafer Fabrication, Wafer Probe and Packaging. Multiple tests, such as circuit conduction, aging, high temperature, etc., can ensure their quality. The detecting device is used to detect the wafer.

Referring to the structure of the conventional detecting device shown in FIG. 1 , the wafer detecting device 10 has a support frame 11 , and a probe card 12 is disposed on the top of the support frame 11 , and the probe card 12 is disposed at the bottom of the probe card 12 . A plurality of probes 121 are disposed in the wafer detecting device 10, and a loading platform 13 is disposed on the loading platform 13. The loading platform 13 can be moved in three axes of X, Y, and Z to adjust the wafer. At the 15 position, the wafer 15 is driven to rise in contact with the probe 121.

Ideally, when the carrier 13 drives the wafer 15 to rise, the plurality of probes 121 should be in contact with the contact pads (not shown) on the corresponding wafer 15 to test the wafer 15 . In order to adjust the parallelism between the carrier 13 and the probe 121, the carrier 13 is generally disposed on the plurality of lead screws 131, and the carrier 13 and the lead screw 131 are integrally formed by castings for smooth support. The loading platform 13 must have at least four lead screws 131, so that it is bulky and takes up space, and the lead screw 131 is adjusted. The whole method is complicated, difficult and time consuming. In addition, the lead screw 131 is usually driven by a motor and a belt, and the belt has a problem of flexibility. When the belt is subjected to a high load, the accuracy of the actual height adjustment is affected. Further, if the support strength of the lead screw 131 itself is insufficient, the lead screw 131 is deformed to affect the flatness of the stage 13. Finally, the reliability of the lead screw 131 is not good, and the accuracy of the flatness of the stage 13 is likely to be lowered.

As far as patents are concerned, the Republic of China Invention Patent Application No. 91133971 is known as a device and method for ensuring the consistency of a probe card to a wafer in a semiconductor automated wafer test, a probe card measurement system, and a probe card. Manufactured, the method discloses a technique for detecting the parallelism of a probe and a wafer by using an optical target, but the method and the system are extremely expensive.

In view of the lack of the prior art, the present invention provides a detecting device which can improve the load capacity of the loading platform, avoid deformation, and is advantageous for adjusting the parallelism of the loading platform.

In order to achieve the above object, the present invention provides a detecting device, which is mainly composed of a base, a wedge block, a limiting structure, a carrying platform, a sliding rail group and a driving device, and the wedge block is disposed on the base. The limiting structure is disposed on one side of the base, and the loading platform has a bearing support, and the bearing support is disposed on the limiting structure to limit vertical displacement of the bearing support, the sliding rail The assembly is disposed between the bearing support and the wedge block, and the driving device is configured to drive the wedge block horizontal displacement, and the vertical displacement of the bearing support is driven by the sliding rail group.

In order for your review board to have more structural purpose and efficacy for the present invention Further understanding and approval, as detailed with the illustrations as follows.

The technical means and efficacy of the present invention for achieving the object will be described below with reference to the accompanying drawings, and the embodiments listed in the following drawings are only for the purpose of explanation, and are to be understood by the reviewing committee, but the technical means of the present invention are not Limited to the listed figures.

Referring to the second to fourth embodiments, the structure of the detecting device 20 of the present invention comprises a base 21, a wedge block 22, a limiting structure 23, a carrying platform 24 and a sliding rail set. 25.

A wedge block 22 is provided on the base 21 for horizontal displacement of the wedge block 22 at the base 21. The limiting structure 23 is disposed on one side of the base 21 and is fixed to the base 21. The carrier 24 includes a carrier 241 and a carrier 242. The carrier 241 is fixedly disposed on the top of the carrier 242. One side of the carrier 242 is disposed on the limiting structure 23. The rail set 25 is disposed between the wedge block 22 and the carrier mount 242.

A slide rail group 26 is disposed on the base 21 for the wedge block 22 to be disposed on the base 21. The slide rail group 26 is composed of a first rail 26a and a second rail 26b that can cooperate with each other and slide relative to each other, wherein the first rail The 26a is disposed on the base 21, and the second guide rail 26b is disposed at the bottom of the wedge block 22. Through the arrangement of the slide rail group 26, the wedge block 22 can be horizontally displaced, that is, displaced in the direction of the parallel base 21. The number of the slide rails 26 is not limited, but it is preferably a pair. For example, the two sets of slide rails 26 are disposed in the embodiment, and the two sets of the slide rails 26 are symmetrically disposed on both sides of the limit structure 23 (eg, The fourth picture shows). The type or type of the slide rail group 26 is not limited, and the load capacity, A Roller Linear Slide with high precision and stability, or a 鸠-shaped rail formed with a 鸠-shaped groove.

Since the side of the bearing support 242 is disposed on the limiting structure 23, that is, the limiting structure 23 is disposed outside the bearing support 242, the vertical displacement of the bearing support 242 can be restricted from causing horizontal displacement, so the carrying platform 24 can only Perform vertical displacement. The type or setting of the limiting structure 23 is not limited. The limiting structure 23 can be a fixed block, or a sliding rail can be arranged between the limiting structure 23 and the corresponding surface of the bearing support 242. Moreover, the moving direction of the sliding rail is perpendicular to the bearing base 241 of the carrying platform 24, for example, a ball bearing rail with high load capacity, high precision and stability, or a sinuous rail can be formed with a sinuous groove.

The limiting structure 23 does not move along with the wedge block 22 and the carrying platform 24. By the setting of the limiting structure 23, the horizontal displacement of the bearing support 242 can be restricted, that is, the carrying platform 24 can only be adjusted vertically. That is, the direction C shown in the third figure; it must be emphasized that the height adjustment range of the carrying platform 24 is extremely small, so that the deformation of the limiting structure 23 due to the excessive horizontal displacement distance of the bearing support 242 is not generated.

The carrier 241 of the carrier 24 is used to carry the object to be detected. When the carrier 24 is applied to the wafer, the wafer is placed on the carrier 241, and the carrier 242 is vertically displaced to the detecting device. A probe card (not shown) disposed at the top of the 20 contacts the wafer for probing. The invention is applicable to various probe device carriers with high load and strict horizontality, and is not limited to the wafer detecting device.

The bearing support 242 has a wedge shape with an upper width and a lower width, and the wedge block 22 has a wedge shape with a narrow upper and a lower width. The bearing support 242 has a first inclined surface 281 and a wedge shape. The block 22 has a second inclined surface 282. The first inclined surface 281 abuts against the second inclined surface 282, that is, the first inclined surface 281 and the second inclined surface 282 abut each other. The wedge block 22 is connected to a driving device 27. The driving device 27 can drive the wedge block 22 to reciprocate by the arrangement of the slide rail group 26. The driving device 27 can be a motor, a lead screw or a belt, a chain or the like, but is not limited thereto.

The rail group 25 is composed of a first rail 25a and a second rail 25b which are slidably coupled to each other. The rail group 25 is disposed between the bearing bracket 242 and the wedge block 22, wherein the first rail 25a is disposed on the rail The second rail 25b is disposed on the bottom of the support block 242, and the second rail 25b is disposed on the top of the wedge block 22. Through the arrangement of the slide rail group 25, the bearing support 242 and the wedge block 22 can be moved relative to each other, and the movement direction is substantially parallel to the first The slope of the slope 281 or the second slope 282 (that is, the direction B as shown in the third figure); the number of the slide rails 25 is not limited, but is preferably referred to as a pair, for example, two sets of slips are provided in this embodiment. The rail set 25, and the two sets of the slide rails 25 are symmetrically disposed on both sides of the limiting structure 23 (as shown in the fourth figure). As shown in the third figure, when the driving device 27 drives the wedge block 22 to move in the direction A, the carrier holder 242 can be driven to move in the direction B, and the direction B has a slope, thereby causing the carrier holder 242 to move. The horizontal and vertical displacements are simultaneously generated in the process. Since the limiting structure 23 is disposed between the corresponding surface of the bearing support 242, the bearing support 242 moves the bearing base 241 in the direction C during the moving process, and the types of the sliding rail group 25 are moved. There is no limitation on the type or the shape, the ball slide rail with high load capacity, precision and stability, or a 鸠-shaped rail can be formed with a 鸠-shaped groove.

Secondly, in summary, the detecting device provided by the present invention can improve the load capacity of the loading platform, avoid deformation, and facilitate the adjustment of the parallelism of the loading platform due to the design of the bearing support and the wedge block and the combination of the sliding rail group.

However, the above description is only for the embodiments of the present invention, and the scope of the invention is not limited thereto. That is to say, the equivalent changes and modifications made by the applicant in accordance with the scope of the patent application of the present invention should still fall within the scope of the patent of the present invention. I would like to ask your review committee to give a clear explanation and pray for it.

10‧‧‧Wafer detector

11‧‧‧Support frame

12‧‧‧ Probe Card

121‧‧‧Probe

13‧‧‧Loading station

131‧‧‧ lead screw

15‧‧‧ wafer

20‧‧‧Detector

21‧‧‧Base

22‧‧‧ wedge block

23‧‧‧Limited structure

24‧‧‧Loading station

241‧‧‧ bearing seat

242‧‧‧ bearing bearing

25‧‧‧Slide group

25a‧‧‧First Steering

25b‧‧‧Second rail

26‧‧‧Slide group

26a‧‧‧First rail

26b‧‧‧Second rail

27‧‧‧ drive

281‧‧‧ first slope

282‧‧‧second bevel

A, B, C‧‧‧ directions

The first figure is a schematic structural view of a conventional detecting device.

The second drawing is a perspective structural view of an embodiment of the present invention.

The third figure is the front view of the second figure.

The fourth figure is the right side view of the second figure.

20‧‧‧Detector

21‧‧‧Base

22‧‧‧ wedge block

23‧‧‧Limited structure

24‧‧‧Loading station

241‧‧‧ bearing seat

242‧‧‧ bearing bearing

25‧‧‧Slide group

25a‧‧‧First rail

25b‧‧‧Second rail

26‧‧‧Slide group

26a‧‧‧First rail

26b‧‧‧Second rail

27‧‧‧ drive

281‧‧‧ first slope

282‧‧‧second bevel

Claims (10)

A detecting device comprises: a base; a wedge block disposed on the base; a limiting structure disposed on one side of the base; a carrying platform having a bearing support, the bearing support being disposed at the limit The positioning structure is configured to limit the vertical displacement of the bearing support, the bearing support has a first inclined surface, the wedge shaped block has a second inclined surface, and the first inclined surface and the second inclined surface abut each other; a rail assembly is disposed between the bearing bracket and the wedge block; a driving device is configured to drive the wedge block horizontal displacement, and the vertical displacement of the bearing bracket is driven by the rail group. The detecting device of claim 1, wherein the bearing support is a wedge-shaped support. The detecting device of claim 1, wherein the sliding rail group is a ball bearing rail. The detecting device of claim 1, wherein the sliding rail group is formed by a 鸠-shaped rail and a 鸠-shaped groove. The detecting device of claim 1, wherein the base has a second set of slides for the wedge block to be disposed on the second set of slides. The detecting device of claim 5, wherein the second sliding rail group is a ball bearing rail. The detecting device of claim 5, wherein the second sliding rail group is formed by a 鸠-shaped rail and a 鸠-shaped groove. The detecting device according to claim 1, wherein the limiting knot The structure is disposed outside the bearing support. The detecting device of claim 2, wherein the wedge-shaped support has a wedge shape with an upper width and a lower width, and the wedge block has a wedge shape with a narrow upper and a lower width. The detecting device of claim 1, wherein the limiting structure is a sliding rail.