TWI360373B - - Google Patents
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- TWI360373B TWI360373B TW94109133A TW94109133A TWI360373B TW I360373 B TWI360373 B TW I360373B TW 94109133 A TW94109133 A TW 94109133A TW 94109133 A TW94109133 A TW 94109133A TW I360373 B TWI360373 B TW I360373B
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- resin
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- printed wiring
- wiring board
- flexible printed
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Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0154—Polyimide
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0756—Uses of liquids, e.g. rinsing, coating, dissolving
- H05K2203/0759—Forming a polymer layer by liquid coating, e.g. a non-metallic protective coating or an organic bonding layer
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1105—Heating or thermal processing not related to soldering, firing, curing or laminating, e.g. for shaping the substrate or during finish plating
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Laminated Bodies (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Description
1360373 九、發明說明 【發明所屬之技術領域】 本發明係有關適用於作爲對應電子機器類的小型化、 輕量化的要求之配線材料的撓性印刷配線板用基板等之撓 性印刷配線板用基板製造方法,特別是有關導體與絕緣層 的接著力優、撓曲或無尺寸變化之信賴性優的撓性印刷配 線板用基板。 【先前技術】 近年,伴隨著高功能化之行動電話或數位相機、導覽 器、其他的各種電子機器類的小型化,輕量化的進展,作 爲此等所使用之電子配線材料的撓性印刷基板(配線基板 )的小型高密度化、多層化、緻密化、低介電化等的要求 變高。有關該撓性印刷配線板用基板,以前係將聚醯亞胺 薄膜與金屬箔以可低溫硬化之接著劑貼合所製造,但接著 劑層會降低作爲配線基板的特性,特別是,有損聚醯亞胺 薄膜的優良耐熱性、耐燃性等。又,具有接著劑層之其他 問題爲會使配線的回路加工性變差。 具體而言,可舉出因貫通孔加工時的鑽孔產生樹脂殘 渣,或導體貫通孔(through-hole)加工時尺寸變化率大等的 問題。特別是兩面貫通孔構造時,在以絕緣體層之基層薄 膜爲中心並於其兩面藉由接著劑與導體的銅箔等貼合所形 成者’與單面構造的撓性印刷基板比較一般其柔軟性低。 另一方面,伴隨IC .的高密度化、印刷配線的微細化或高 -5- 1360373 密度化,因發熱變大而變得有必要與良導熱體貼合。又’ 由於更精緻化,有將外殼與配線一體化的方法’又’由於 必要有電容量不同的配線’材料必要更耐高熱。所以’提 案種種不使用接著劑直接於銅箔等的導體塗敷硬化前的聚 醯胺酸溶液,經由加熱硬化之撓性印刷配線板用基板的製 造方法。 例如,可列舉如將硬化物的線膨脹係數爲3.0 X 1 0_5 以下的二胺與四羧酸酐所合成的聚醯胺酸塗敷於金屬箔後 經加熱硬化者(例如參閱專利文獻1 ),或將含有具有特定 構造單元之聚醯亞胺先驅物化合物樹脂溶液塗敷於導體上 者進行醯亞胺化者(例如參閱專利文獻2),將具有含二胺 基苯甲醯苯胺或其衍生物之二胺類與芳香族四羧酸的反應 所得之構造單元之絕緣林料的先驅物溶液直接塗敷於導體 上經硬化者(例如參閱專利文獻3)等。又,爲提高與金 屬箔的密接性提案於導體上使用複數的聚醯亞胺先驅物樹 脂溶液’藉由複數次塗敷與乾燥製造具有複數聚醯亞胺樹 脂層撓性印刷配線板用基板的方法(例如參閱專利文獻4) 导刊乂獻1 曰本特 專利文獻2 曰本特 專利文獻3 日本特 專利文獻4 曰本特 開昭62-2 1 2 1 40號公報 開昭63-84 1 88號公報 開昭63-24598 8號公報 公平6-49 1 8 5號公報 【發明內容】 -6- 1360373 【發明所欲解決之課題】 於導體上塗敷聚醯亞胺先驅物樹脂溶液之方法,係廣 泛使用於導體與身爲絕緣層之聚醯亞胺樹脂層之間可得到 高接著力,要求高功能性之先端電子零件領域。但是,該 方法係將聚醯亞胺先驅物質經由加熱而醯亞胺化,但加熱 處理後導體層與絕緣層間有接著力不充分、長型基板熱處 理時接著力不均等,不容易得到均勻品質之撓性印刷配線 板用基板的製品,不能提供滿足市場要求的製品。本發明 的目的爲提供改善聚醯亞胺先驅物樹脂的加熱處理後導體 層與絕緣層間之接著力,長型基板熱處理時接著力不均之 撓性印刷配線板用基板的製造方法爲目的。 【課題解決手段】 本發明者等,經深入硏究上述課題的結果,將聚醯亞 胺先驅物樹脂經由於特定最高溫度範圍下保持一定的時間 加熱醯亞胺化時,發現接著力提高的現象完成本發明。 即本發明,係於導體的一面直接塗敷聚醯亞胺先驅物 樹脂溶液、再乾燥處理後,具有加熱硬化之單面絕緣層之 撓性印刷配線板用基板之製造方法,其特徵爲加熱硬化時 的最高溫度爲300〜400 °C的範圍,於該溫度下保持20〜 60分鐘之撓性印刷配線板用基板之製造方法。 有關上述本發明的加熱硬化,係於經乾燥處理之薄片 狀基板之至少樹脂層側,使具有通氣性之薄片狀材料接觸 後一起捲取於圓筒體上,以通氣性的多層圓筒體之狀態下 -7- 1360373 移至加熱硬化爐內進行靜置爲理想。 又於加熱硬化爐之硬化處理係於減壓或惰性氣體的環 境下進行者。又加熱硬化爐之硬化處理,以倂用輻射加熱 手段與於多層圓筒體之導體上流通電流由導體的電阻之感 應加熱手段者爲理想的實施型態。 【發明之效果】 依據本發明,可更具生產性的製造提高導體與絕緣層 的接著力,且對長型基板的接著力亦無不均勻的高品質基 板。 【用以實施發明之最佳型態】 以下詳細說明本發明。首先,使用於本發明的導體, 可列舉厚度爲5〜15〇em之銅、鋁、鐵、銀、鈀、鎳、 鉻、鉬、鎢、鋅及該等之合金等之金屬箔,理想爲銅箔。 銅箔可使用壓延銅箔或電解銅箔之任一者。又以提高接著 力爲目的,亦可於其表面施以由加側線、鏟鎳、鍍-銅鋅 合金、或烷氧基鋁、鋁螯合物、矽烷耦合劑等化學性或機 械性表面處理。 聚醯亞胺先驅物樹脂係指藉由加熱硬化產生醯亞胺結 合而形成具有醯亞胺環構造之聚醯亞胺系樹脂層的絕緣層 者’其代表爲聚醯胺酸。成爲絕緣層的聚醯亞胺系樹脂, 可舉例如聚醯亞胺、聚醯胺醯亞胺' 聚酯醯亞胺等。因此 ’聚醯亞胺樹脂層可利用上述專利文獻1 ~ 4所記載之低 -8- 1360373 熱膨脹性者,加熱時熔融或軟化之熱可塑性聚醯亞胺系樹 脂,並無特別的限定。特別理想的絕緣層爲於由3 0 X 1 0_6 (1 / Κ)以下之低熱膨脹性樹脂所成之主樹脂層的上下配 置由熱可塑性聚醯亞胺系樹脂所成之二層而成之由至少三 層聚醯亞胺系樹脂所成者爲理想。1360373 IX. EMBODIMENT OF THE INVENTION [Technical Fields of the Invention] The present invention relates to a flexible printed wiring board for use in a flexible printed wiring board substrate or the like which is used as a wiring material for miniaturization and weight reduction of electronic equipment. The substrate manufacturing method is particularly a substrate for a flexible printed wiring board which is excellent in adhesion strength, flexibility, or dimensional change of a conductor and an insulating layer. [Prior Art] In recent years, the miniaturization of mobile phones, digital cameras, navigation devices, and other various electronic devices, which are highly functional, and the development of lightweight, are used as flexible printing of electronic wiring materials used in these applications. The requirements for miniaturization, multilayering, densification, and low dielectricization of the substrate (wiring substrate) are high. In the prior art, the substrate for a flexible printed wiring board is produced by laminating a polyimide film and a metal foil with a low-temperature-curable adhesive. However, the adhesive layer lowers the characteristics of the wiring substrate, and is particularly detrimental. The polyimide film has excellent heat resistance, flame resistance and the like. Further, another problem with the adhesive layer is that the circuit workability of the wiring is deteriorated. Specifically, there are problems in that resin residue is generated by drilling in the through hole processing, or the dimensional change rate is large when the through-hole is processed. In particular, in the case of a double-sided through-hole structure, it is generally softer than a flexible printed circuit board having a single-sided structure, which is formed by bonding a copper foil or the like on the both surfaces of the insulating layer to the base film by an adhesive. Low sex. On the other hand, with the increase in density of ICs, the miniaturization of printed wiring, and the high density of -5 to 1360373, it is necessary to bond with a good heat conductor due to heat generation. Further, since it is more refined, there is a method of integrating the outer casing and the wiring. Further, it is necessary to have a wiring having a different capacitance. Therefore, a method for producing a substrate for a flexible printed wiring board which is cured by heating without applying an adhesive directly to a conductor such as a copper foil and applying a polyamic acid solution before curing. For example, a polyamine containing a diamine and a tetracarboxylic anhydride having a linear expansion coefficient of a cured product of 3.0 X 1 0_5 or less is applied to a metal foil and then cured by heating (for example, see Patent Document 1). Or a solution containing a polyimine precursor compound compound resin having a specific structural unit coated on a conductor for oxime imidation (for example, refer to Patent Document 2), which will have a diamino benzanilide or a derivative thereof. The precursor solution of the insulating forest material of the structural unit obtained by the reaction of the diamine and the aromatic tetracarboxylic acid is directly applied to a conductor and cured (for example, refer to Patent Document 3). Further, in order to improve the adhesion to the metal foil, it is proposed to use a plurality of polyimine precursor resin solutions for the conductors to produce a substrate for a flexible printed wiring board having a plurality of polyimine resin layers by coating and drying a plurality of times. (For example, refer to Patent Document 4) Guide 乂 乂 1 曰 特 专利 专利 专利 专利 专利 专利 专利 专利 专利 日本 62 62 62 62 62 62 62 62 62 62 62 62 -2 -2 -2 62-84 Japanese Unexamined Patent Publication No. Hei. No. Hei. No. Hei. The method is widely used in the field of advanced electronic parts which can obtain high adhesion between a conductor and a polyimide layer which is an insulating layer and which requires high functionality. However, in this method, the polyimine precursor material is imidized by heating, but after the heat treatment, there is insufficient adhesion between the conductor layer and the insulating layer, and the adhesion force is uneven during heat treatment of the long substrate, and uniform quality is not easily obtained. A product of a substrate for a flexible printed wiring board cannot provide a product that satisfies market requirements. It is an object of the present invention to provide a method for producing a substrate for a flexible printed wiring board which has improved adhesion between a conductor layer and an insulating layer after heat treatment of a polyimide substrate resin. [Means for Solving the Problem] The inventors of the present invention have found that the adhesion of the polyimine precursor resin to the imidimination is maintained for a certain period of time in a specific maximum temperature range, and the adhesion is improved. The phenomenon completes the invention. In other words, the present invention is a method for producing a substrate for a flexible printed wiring board having a heat-cured single-sided insulating layer, which is coated with a polyimide film on one side of a conductor and then dried, and then dried. The method for producing a substrate for a flexible printed wiring board in which the maximum temperature during curing is in the range of 300 to 400 ° C and maintained at this temperature for 20 to 60 minutes. The heat curing according to the present invention is applied to the at least one resin layer side of the dried sheet-like substrate, and the air-permeable sheet-like material is brought into contact with the sheet-like material and then wound up on the cylindrical body to form a gas-permeable multilayer cylindrical body. In the state of -7- 1360373, it is ideal to move to the heating and hardening furnace for standing. Further, the hardening treatment in the heat-hardening furnace is carried out under the conditions of a reduced pressure or an inert gas. Further, in the hardening treatment of the heat-hardening furnace, it is an ideal embodiment to use a radiant heating means and a current flowing through the conductor of the multilayer cylindrical body to induce heating by the resistance of the conductor. [Effects of the Invention] According to the present invention, it is possible to produce a high-quality substrate in which the adhesion between the conductor and the insulating layer is improved and the adhesion to the long substrate is not uneven. [Best Mode for Carrying Out the Invention] The present invention will be described in detail below. First, the conductor used in the present invention may, for example, be a metal foil having a thickness of 5 to 15 〇em of copper, aluminum, iron, silver, palladium, nickel, chromium, molybdenum, tungsten, zinc, or the like, and is preferably Copper foil. As the copper foil, either rolled copper foil or electrolytic copper foil can be used. For the purpose of improving the adhesion, the surface may be treated with a chemical or mechanical surface such as a side wire, a shovel nickel, a copper-zinc-zinc alloy, or an alkoxy aluminum, an aluminum chelate or a decane coupling agent. . The term "polyimine precursor resin" refers to an insulating layer which is formed by heat-hardening to produce a quinone imine bond to form a polyimine-based resin layer having a quinone ring structure, which is represented by poly-proline. The polyimine-based resin to be an insulating layer may, for example, be a polyimide or a polyamidimide, a polyesterimide or the like. Therefore, the poly-imine resin layer is not particularly limited as long as it is a heat-expandable polyamidene resin which is melted or softened during heating by the heat-expansion of the low--8-36037 described in the above Patent Documents 1 to 4. A particularly preferable insulating layer is a two-layered thermoplastic resin polyimide resin layer formed of a low thermal expansion resin of 30 X 1 0_6 (1 / Κ) or less. It is preferably composed of at least three layers of a polyimide resin.
於此形成該主樹脂層之低熱膨脹聚醯亞胺系樹脂,其 線膨脹係以30 X 10_6 (1 / Κ)以下爲理想,薄膜具有優良 性能之耐熱性、可撓性者爲理想。該線膨脹係數,係使用 充分醯亞胺化反應後之試料,使用熱機構分析器 (ΤΜΑ) 昇溫至2 5 0 °C後,以1(TC /分的速度冷卻,求得於240〜 1 0 0 °C範圍中之平均線膨脹係數者。具有此性質之低熱膨 脹聚醯亞胺系樹脂的具體例,以具有下述一般式 (I)所 示之單元構造之聚醯亞胺系樹脂爲理想。The low thermal expansion polyimine-based resin in which the main resin layer is formed is preferably 30 X 10-6 (1 / Κ) or less, and the film is excellent in heat resistance and flexibility. The coefficient of linear expansion is obtained by using a sample having sufficient hydrazine imidization reaction, and is heated to 250 ° C using a thermal mechanism analyzer (ΤΜΑ), and then cooled at a rate of 1 (TC / min, and obtained at 240 to 1). The average linear expansion coefficient in the range of 0 ° C. A specific example of the low thermal expansion polyimine resin having this property is a polyimide resin having a unit structure represented by the following general formula (I). Ideal.
(但,式中R!〜R4爲低級烷基、低級烷氧基、鹵基或氫) 又,於主樹脂層上下所使用之熱可塑性聚醯亞胺系樹 脂,其玻璃轉移溫度爲3 5 0 °C以下者其爲任何單元構造物 均可,理想爲加熱加壓下壓鑄時其界面接著強度充分者即 可。在此該熱可塑性聚醯亞胺系樹脂係指在玻璃轉移點以 上的通常狀態不一定要顯示流動性,亦包含經由加熱而可 -9- 1360373 接著者。具有此性質之熱膨脹聚醯亞胺系樹脂的具體例, 以具有下述一般式(Π)或一般式(III)所示之單元構造 者。 ,co、 (I) το. (但,式中An爲2價的芳香族基且其碳數爲12以上者) X0, C0, C0 一 (I) (但,式中Ar2爲2價的芳香族基且其碳數爲12以上者) 此處2價的芳香族基An或Ar2的具體例,可舉例如 下。 -00-0- v > -〇-c〇-0- -^-CO-NH-0- v -0-O-0SO2-0O-0- s -0-O-0-O-0- CH3(However, in the formula, R! to R4 are a lower alkyl group, a lower alkoxy group, a halogen group or a hydrogen). Further, the thermoplastic polyimine resin used in the upper and lower sides of the main resin layer has a glass transition temperature of 3 5 Any one of the unit structures may be used below 0 ° C, and it is desirable that the interface strength is sufficient when die-casting under heat and pressure. Here, the thermoplastic polyimine-based resin means that the fluidity does not necessarily have to be exhibited in a normal state above the glass transition point, and it is also possible to include -9 to 1360373 by heating. Specific examples of the thermally expandable polyimine-based resin having such a property include a unit structure represented by the following general formula (Π) or general formula (III). , co, (I) το. (However, in the formula, An is a divalent aromatic group and its carbon number is 12 or more) X0, C0, C0 - (I) (However, in the formula, Ar2 is a divalent aromatic The group of the group having a carbon number of 12 or more. Specific examples of the divalent aromatic group An or Ar2 herein are as follows. -00-0- v > -〇-c〇-0- -^-CO-NH-0- v -0-O-0SO2-0O-0- s -0-O-0-O-0- CH3
ch3 -10- 1360373 於本發明使用之導體上塗敷之聚醯亞胺先驅物溶液, 基本上爲可變換成上述之聚醯亞胺系樹脂者,亦可添加公 知的酸酐系或胺系硬化劑等的硬化劑、矽烷耦合劑、鈦酸 酯耦合劑、環氧化合物等的接著性賦與劑、橡膠等的可撓 性賦與劑等的各種添加劑或觸媒。特別是於導體上依熱可 塑性聚醯亞胺系樹脂層、中央的主層之低熱膨脹性聚醯亞 胺系樹脂層、又於最外層的熱可塑性聚醯亞胺系樹脂層的 順序層合三層者爲理想。 此處,中央的主層必須爲比其上下之熱可塑性聚醯亞 胺系樹脂層低熱膨脹係數之熱可塑性聚醯亞胺系樹脂層。 主層具有作爲抑制所製造之撓性印刷配線板用之發生基板 的撓曲或彎曲的作用,與導體接觸之熱可塑性聚醯亞胺層 具有確保與導體之接著性的作用,最外層的熱可塑性聚醯 亞胺層係期待可抑制薄膜單體的撓曲之作用而使用者。 此時,相對於主層之低熱膨脹性聚醯亞胺系樹脂層的 厚度^與其上下的熱可塑性聚醯亞胺系樹脂層的合計厚度 t2的比(ti / t2)爲2 ~ 100的範圍,理想爲5 ~ 2 0的範圍 爲佳,該厚度比/ t2)小於2時,聚醯亞胺系樹脂層 全體的熱膨脹係數變得遠高於導體,所得之撓性印刷配線 板用基板的反撓或彎曲變大,回路加工時的作業性顯著變 低。又,熱可塑性聚醯亞胺層的厚度t2過小,厚度之比 (t· / t2)變得超過100時,則會產生變得不能充分發揮與 導體的接著力之情況。 如上述專利文獻4所記載,於導體上以塗敷此等複數 -11 - 1360373 聚醯亞胺系樹脂的先驅物溶液的形態,將複數的先驅物溶 液總括或逐次塗敷或於醯胺閉環溫度以下進行脫溶劑處理 後,將先驅物聚醯亞胺加熱變換以一次總括進行爲理想。 於完全變換爲聚醯亞胺層之上塗敷另外的聚醯亞胺系先驅 物溶液,熱處理進行醯亞胺閉環時,各聚醯亞胺系樹脂層 間之接著力有不能充分發揮的情形成爲製品品質下降之原 因。 於導體上塗敷聚醯系溶液(聚醯胺酸溶液)的方法, 可使用括刀塗敷器、模頭塗敷器、輥輪塗敷器、簾式塗敷 器等以公知的方法進行,特別是塗敷厚塗敷時以模頭塗敷 器或括刀塗敷器爲合適。又,塗敷所使用的聚醯亞胺系先 驅物溶液的聚合物濃度,雖依聚合物之聚合度而相異,但 通常爲5〜30重量%,理想爲10〜20重量%。聚合物的 濃度低於5重量%時,一次的塗敷不能得到充分的膜厚, 又,高於30重量%時溶液的黏度變得過高而變得難以塗敷 〇 乾燥所使用的裝置亦可使用任一型態。理想爲上述專 利文獻4所記載之已塗敷之導體,以使用不與裝置接觸之 漂浮形式者爲理想。漂浮形式係將已塗敷之導體於熱風氣 流中以連續漂浮狀態行走而乾燥者。乾燥通常係爲了將溶 劑等之揮發分去除而在150°C以下,理想爲在90〜130t 進行,聚醯亞胺系先驅物中的溶劑,將塗敷時樹脂所使用 的溶劑至少乾燥除去至5 0重量%以下,理想爲3 0重量% 以下,更理想爲1 0重量%以下爲理想。溶劑殘留超過50 -12- 1360373 重量%時樹脂表面殘留黏性,後續的硬化處理時捲取成圓 筒狀時與隔離層產生黏結,加熱硬化後的樹脂特性惡化。 於導體上塗敷均勻厚度之聚醯胺酸溶液,藉由乾燥處理將 溶劑去除至一半以下後,進行其次的加熱硬化。Ch3 -10- 1360373 The polyimine precursor solution coated on the conductor used in the present invention is substantially converted into the above-mentioned polyamidene-based resin, and a known acid anhydride-based or amine-based hardener may be added. Various additives or catalysts such as a curing agent such as a curing agent, a decane coupling agent, a titanate coupling agent, an epoxy compound, or the like, and a flexible bonding agent such as rubber. In particular, the conductor is laminated on the basis of the thermoplastic polyimine resin layer, the low thermal expansion polyimine resin layer of the central main layer, and the thermoplastic polyimide polyimide resin layer of the outermost layer. The third floor is ideal. Here, the central main layer must be a thermoplastic polyimine-based resin layer having a lower coefficient of thermal expansion than the thermoplastic polyimine-based resin layer above and below it. The main layer has a function of suppressing deflection or bending of the substrate for the manufactured flexible printed wiring board, and the thermoplastic polyimide layer in contact with the conductor has an effect of ensuring adhesion to the conductor, and the heat of the outermost layer The plastic polyimide layer is expected to be effective for suppressing the deflection of the film monomer. In this case, the ratio (ti / t2) of the thickness of the low thermal expansion polyimine resin layer of the main layer to the total thickness t2 of the thermoplastic polyimine resin layer on the upper and lower sides is in the range of 2 to 100. It is preferable that the range of 5 to 20 is preferable, and when the thickness ratio / t2) is less than 2, the thermal expansion coefficient of the entire polyimide layer is much higher than that of the conductor, and the obtained substrate for a flexible printed wiring board is obtained. The deflection or bending becomes large, and the workability at the time of loop processing is remarkably low. Further, when the thickness t2 of the thermoplastic polyimide layer is too small and the thickness ratio (t· / t2) exceeds 100, the adhesion to the conductor may not be sufficiently exhibited. As described in the above Patent Document 4, a plurality of precursor solutions are collectively or sequentially coated or ruthenium ring-opened in a form of a precursor solution of the plurality of -11 - 1360373 polyimine-based resins coated on the conductor. After the desolvation treatment is carried out below the temperature, it is preferred to carry out the heating conversion of the precursor polyimine in a single pass. When a polyimide-imide-based precursor solution is applied to the polyimine layer completely, and the heat treatment is carried out to carry out the ring closure of the quinone imine, the adhesion between the layers of the polyimide-based resin layers may not be sufficiently exhibited. The reason for the decline in quality. The method of applying a polyfluorene-based solution (poly-proline solution) to a conductor can be carried out by a known method using a knife applicator, a die applicator, a roller applicator, a curtain applicator, or the like. In particular, a die coater or a knife applicator is suitable when applying a thick coating. Further, the polymer concentration of the polyimide-based precursor solution used for coating differs depending on the degree of polymerization of the polymer, but is usually 5 to 30% by weight, preferably 10 to 20% by weight. When the concentration of the polymer is less than 5% by weight, a sufficient film thickness cannot be obtained by one application, and when the viscosity is more than 30% by weight, the viscosity of the solution becomes too high and it becomes difficult to apply the device used for drying. Any type can be used. It is preferable that the coated conductor described in the above Patent Document 4 is preferably a floating form that is not in contact with the device. The floating form is a method in which the coated conductor is dried in a continuous floating state in a hot air stream. The drying is usually carried out at 150 ° C or lower, preferably at 90 to 130 t, in a solvent of a polyimine-based precursor, and the solvent used for the resin at the time of coating is at least dried to remove the volatile matter such as a solvent. It is preferably 50% by weight or less, preferably 30% by weight or less, more preferably 10% by weight or less. When the solvent residue exceeds 50 -12 to 1360373% by weight, the surface of the resin remains viscous, and when it is wound into a cylindrical shape in the subsequent hardening treatment, it is bonded to the separator, and the resin property after heat curing is deteriorated. A polyamic acid solution having a uniform thickness is applied to the conductor, and the solvent is removed to half or less by a drying treatment, followed by heat hardening.
本發明的加熱硬化,由生產性的觀點,以於輥輪上的 導體連續地塗敷聚醯亞胺先驅物樹脂溶液,於上述漂浮形 式的熱風氣流中連續漂浮行走狀態乾燥處理後捲裝成圓筒 狀,以捲軸至捲軸(roll to roll)的方式進行爲理想。理想 爲在捲裝時爲了使經乾燥處理之薄片狀基板之至少樹脂層 側有良好的通氣性,而將不織布或不鏽鋼網等之通氣性薄 片狀材料與其接觸一起捲取成圓筒體,使其形成通氣性的 多重層圓筒體。將該多層圓筒體移至合適的加熱硬化爐, 於此靜置並使聚醯亞胺系先驅物樹脂層加熱硬化。此時特 別是,爲緩和昇溫時聚醯亞胺樹脂層的殘留應力,以導體 部爲內側,樹脂面向外側一起捲取爲理想。 加熱爐內爲避免因氧而劣化,導電性金屬箔或聚醯亞 胺樹脂以於惰性氣體的氣體環境或減壓至1 00 Torr以下進 行爲理想,連續於5 Torr以下的減壓下進行爲更理想。此 係可圓滑完全的將由塗敷之樹脂中所產生的殘留有機溶劑 及醯亞胺化閉環反應中產生之水分或未反應單體等除去。 特別是有水分於氣體環境中殘留時引起樹脂的水解,樹脂 的聚合度變低,結果招致聚醯亞胺層物性的下降之憂慮β 又’同樣地於氧的存在下進行加熱硬化時引起導體的氧化 亦係成爲品質下降的原因。 -13- 1360373 有關加硬化步驟加熱爐內的昇溫手段,大略,以分爲 充分進行脫氣、脫溶劑的階段與完成硬化反應的階段的二 階段進行爲佳,即,首先昇溫至150 °C左右,理想爲緩緩 或階段式昇溫至有機溶劑的沸點附近,充分的將樹脂中的 殘留溶劑揮發後,緩緩或階段的昇溫至300 °C以上爲理想 。更理想爲,以0.75 ~ 12 °C/ min範圍的昇溫速度進行爲 佳。昇溫速度超過12°C / min時由於溶劑被急速去除,樹 脂中引起發泡而不理想。又低於0.7 5 t時達到最高溫的時 間過長,樹脂長時間曝露於高溫而成爲樹脂劣化之原因。 又,對靜置於加熱硬化爐內之多重層圓筒體的導體, 與輻射加熱手段之同時於導體連接電源配線通電由導體的 電阻加熱將多層圓筒體的內部全體均勻補助加熱爲理想。 又,加熱硬化後冷卻至室溫時,以於惰性氣體環境或1 0 0 Torr以下的真空下進行爲理想,更理想爲在10 Torr以下 的真空下冷卻爲佳。冷卻的手段,僅放置亦可,考慮生產 性以使用流通冷卻水等的強制冷卻手段爲理想。 塗敷均勻厚度於導電性金屬箔之聚醯胺酸溶液,由加 熱硬化處理完全除去溶劑更加醯亞胺閉環。此時,於急速 高溫處理時,樹脂表面形成皮膜層溶劑不能蒸發,引起發 泡,以邊由低溫緩緩上昇至高溫邊熱處理爲理想。此時的 最終熱處理溫度以300 ~ 400°C爲理想,400°C以上P始引 起聚醯亞胺緩緩的熱分解,又,低於300°C聚醯亞胺的皮 膜不能於導電金屬箔上充分配向,而不能得到平面性良好 、密接性優的單面導體層合物。 -14- 1360373 又,於最終的熱處理溫度保持的時間以20〜60分鐘 爲理想。保持於此時間,接觸導體的聚醯亞胺樹脂適度熔 融與導體表面密接良好,同時推測因加熱氣體環境中僅少 許存在的氧或含於聚醯亞胺樹脂之氧原子等與導體反應於 聚醯亞胺樹脂與導體表面產生化學的結合提高接著力。保 持時間低於20分鐘時聚醯亞胺樹脂與導電性金屬箔的接 觸面不能產生充分的熔融流動,又,醯亞胺化的反應不能 充分進行不能得到期望的接著強度而不理想。 又保持超過60分鐘亦不能期望提高因醯亞胺化或於 界面的熔融現象之密接效果,反而,有聚醯亞胺樹脂進行 分解之慮,樹脂特性顯著下降而不理想。如此所形成之的 捲軸,於冷卻後捲裝成加熱前同樣的捲軸,將上述薄片狀 材料分離狀態成爲製品化之捲軸。所形成的絕緣層之聚醯 亞胺系樹脂層的全體厚度通常爲10〜150 μ m。In the heat hardening of the present invention, the polyimine precursor resin solution is continuously applied to the conductor on the roller from the viewpoint of productivity, and is continuously floated in a floating air flow in the above-mentioned floating form, and then packaged into a package. It is preferably cylindrical, and it is preferably rolled to roll. In order to provide a good air permeability to at least the resin layer side of the dried sheet-like substrate at the time of package, a permeable sheet-like material such as a nonwoven fabric or a stainless steel mesh is preferably wound into a cylindrical body together with the air-permeable sheet-like material. It forms a permeable multi-layered cylinder. The multilayered cylinder is transferred to a suitable heat-hardening furnace, and is allowed to stand still and heat-harden the polyimide-based precursor resin layer. In this case, in order to alleviate the residual stress of the polyimide film layer at the time of temperature rise, it is preferable that the resin portion is wound inside and the resin is wound outward. In order to avoid deterioration by oxygen in the heating furnace, the conductive metal foil or the polyimide resin is preferably used in a gas atmosphere of an inert gas or a pressure reduction to 100 Torr or less, and is continuously performed under a reduced pressure of 5 Torr or less. More ideal. This is a smooth and complete removal of residual organic solvent generated in the coated resin and moisture or unreacted monomers generated in the ring-opening reaction of hydrazine imidization. In particular, when water remains in a gas atmosphere, hydrolysis of the resin is caused, and the degree of polymerization of the resin is lowered. As a result, there is a concern that the physical properties of the polyimide layer are lowered, and the conductor is caused by heat curing in the presence of oxygen. The oxidation is also the cause of the decline in quality. -13- 1360373 The heating means in the heating furnace for the hardening step is roughly divided into two stages: a stage in which degassing and desolvation are sufficiently performed, and a stage in which the hardening reaction is completed, that is, the temperature is first raised to 150 °C. On the left and right sides, it is preferable to gradually or gradually increase the temperature to the vicinity of the boiling point of the organic solvent, and it is preferable to sufficiently volatilize the residual solvent in the resin and gradually or gradually increase the temperature to 300 ° C or higher. More preferably, it is preferably carried out at a temperature elevation rate in the range of 0.75 to 12 °C/min. When the heating rate exceeds 12 ° C / min, the solvent is rapidly removed, and foaming in the resin is not preferable. When the temperature is lower than 0.7 5 t, the time until the highest temperature is too long, and the resin is exposed to a high temperature for a long period of time, which causes deterioration of the resin. Further, it is preferable that the conductors of the plurality of layers of the cylindrical body that are placed in the heat-hardening furnace are electrically connected to the conductor-connected power supply wiring and the electric resistance of the conductor is heated by the electric resistance of the conductor. Further, it is preferably carried out under vacuum in an inert gas atmosphere or at a temperature of 100 Torr or less, preferably after cooling and cooling to room temperature, more preferably under a vacuum of 10 Torr or less. The means for cooling may be placed only, and it is preferable to use a forced cooling means such as circulating cooling water in consideration of productivity. A polyamic acid solution having a uniform thickness on the conductive metal foil is applied, and the solvent is completely removed by a heat hardening treatment to further reduce the ring of the imide. At this time, in the case of rapid high-temperature treatment, it is preferable that the surface of the resin is formed into a film layer solvent which does not evaporate, causing foaming, and is preferably heat-treated while rising from a low temperature to a high temperature. The final heat treatment temperature at this time is preferably 300 to 400 ° C. At 400 ° C or higher, P starts to cause slow thermal decomposition of polyimine. Moreover, the film of polyimide at less than 300 ° C cannot be used for conductive metal foil. The alignment is sufficiently sufficient to obtain a single-sided conductor laminate having good planarity and excellent adhesion. -14- 1360373 Also, the time required for the final heat treatment temperature is preferably 20 to 60 minutes. At this time, the polyimide of the contact conductor is moderately melted and adhered well to the surface of the conductor, and it is presumed that the oxygen present in the heated gas atmosphere or the oxygen atom contained in the polyimide resin reacts with the conductor. The chemical combination of the quinone imine resin with the conductor surface enhances the adhesion. When the holding time is less than 20 minutes, the contact surface of the polyimide resin with the conductive metal foil does not cause sufficient melt flow, and the reaction of the oxime imidization cannot be sufficiently performed, and the desired bonding strength cannot be obtained. Further, for more than 60 minutes, it is not expected to improve the adhesion effect due to the imidization or the melting phenomenon at the interface. On the contrary, the polyamidene resin is decomposed, and the resin characteristics are remarkably lowered. The reel thus formed is wound up and wound up into the same reel before heating, and the flaky material is separated into a reel of product. The thickness of the polyiridide-based resin layer of the formed insulating layer is usually 10 to 150 μm.
【實施方式】 以下以實施例與比較例具體的說明本發明的實施型態 。又,於以下實施例及比較例,其尺寸變化率、單面銅貼 銅品的撓曲及接著力,以及薄膜的撓曲依以下方法測定。 尺寸變化率係將250 mm的方型試料於距各邊25 mm 的線之4處交叉點及各邊之中點對邊的中點之25 mm處各 1處於樹脂面計記8處,由實測除去銅箔前後尺寸變化率 算出。 單面貼銅品的接著力,依據JIS C 5016: 7.1項爲準 -15- 1360373 ,使用導體寬3 mm的模型,將銅箔以180°的方向於50 mm /分拉伸求出剝離時的値》 薄膜的撓曲係將50 mm方型的單面貼銅品於氯化水溶 液除去銅箔,將薄膜洗淨、乾燥,於23°C,濕度50%的環 境放置24小時後,將原本爲銅箔側朝下於置於水平面時 以測微器測定於四周的反彎曲或中央鼓起量。 又,實施例及比較例中使用的略號如下。 PDMA:無水均苯四甲酸 BTDA: 3,3’4,4’-二苯甲酮四竣酸酑 DDE: 4,4 -二胺基二苯醚 MABA: 2’-甲氧基-4,4’-二胺基苯醯苯胺 (合成例1) 於玻璃製反應器邊通氮氣邊投入2532 g Ν,Ν·二甲基 乙醯胺’接著於攪拌下投入0.5莫耳的DDE與0.5莫耳的 MABA,將其完全溶解。將該溶液冷卻至1〇。(:,反應液保 持於30 °C以下的溫度以每次少量添加1莫耳的PMda,添 加結速後接著於室溫進行2小時攪拌,完成聚合。反應所 得的聚醯亞胺先驅物溶液以15重量%聚合物濃度及使用b 型黏度計其於25°C的表觀黏度爲1〇〇〇 mPa。p (合成例2) 除使用1莫耳DDE爲二胺成分,1莫耳BTDA爲酸酐 以外,與合成例1同樣調整成聚醯亞胺先驅物溶液。所得 -16- 1360373 的聚醯亞胺先驅物溶液以15重量%聚合物濃度及使用b 型黏度計其於25°C的表觀黏度爲300 mPa。s。 實施例1 於35#m持粗化面及光澤面的導體(電解銅箔)的粗 化面將合成例2所調整的聚醯亞胺先驅物溶液塗敷成均勻 的15//m厚度後’於130 °C乾燥12分鐘。更將合成例1 所調整的聚醯亞胺先驅物溶液均勻的塗敷成200 於 1 3 0 °C乾燥後’更以合成例2所調整的聚醯亞胺先驅物溶 液塗敷成2 0 a m於1 3 0 °C乾燥經揮發溶劑得到由聚醯亞胺 系樹脂與銅箔所捲軸的貼銅品之撓性薄片狀基板。此時樹 脂中的溶劑殘留量爲〇 · 7 8重量%,樹脂已乾固,確認無黏 性。 將Ra=1.5//m厚度40"m芳香族聚醯亞胺系不織布[Embodiment] Hereinafter, embodiments of the present invention will be specifically described by way of examples and comparative examples. Further, in the following examples and comparative examples, the dimensional change ratio, the deflection and the adhesion of the single-sided copper-attached copper product, and the deflection of the film were measured by the following methods. The dimensional change rate is that the 250 mm square sample is placed at 4 intersections of the line 25 mm from each side and 25 mm at the midpoint of the opposite side of each side at the resin surface count 8 The dimensional change rate before and after removal of the copper foil was measured. The adhesion of the single-sided copper product is based on JIS C 5016: 7.1, -15-1360373. Using a model with a conductor width of 3 mm, the copper foil is stretched at a direction of 180° at 50 mm/min to determine the peeling time. The flexure of the film is to remove the copper foil from the 50 mm square single-sided copper paste in a chlorinated aqueous solution, wash and dry the film, and leave it at 23 ° C, humidity 50% for 24 hours. Originally, the copper foil was turned downside down on the horizontal plane and the amount of reverse bending or central bulging measured by the micrometer was measured. Further, the abbreviations used in the examples and comparative examples are as follows. PDMA: anhydrous pyromellitic acid BTDA: 3,3'4,4'-benzophenone tetradecanoate DDE: 4,4-diaminodiphenyl ether MABA: 2'-methoxy-4,4 '-Diaminobenzidine aniline (Synthesis Example 1) Into a glass reactor, 2532 g of hydrazine was introduced while passing nitrogen gas, and dimethyl dimethyl acetamide was placed under stirring to introduce 0.5 mol of DDE and 0.5 mol. The MABA is completely dissolved. The solution was cooled to 1 Torr. (: The reaction solution was kept at a temperature of 30 ° C or less to add 1 mol of PMda per little amount, and the junction rate was added, followed by stirring at room temperature for 2 hours to complete the polymerization. The polyimine precursor solution obtained by the reaction was obtained. The apparent viscosity at 25 ° C is 1 〇〇〇 mPa at a concentration of 15% by weight of the polymer and using a b-type viscosity. (Synthesis Example 2) Except that 1 mol of DDE is used as the diamine component, 1 mol of BTDA In the same manner as in the synthesis example 1, the polyiminoimine precursor solution was adjusted in the same manner as in the synthesis example 1. The obtained polyfluorene imine precursor solution of 160-1360373 was used at a concentration of 15% by weight of the polymer and at a temperature of 25 ° C using a b-type viscosity meter. The apparent viscosity was 300 mPa·s. Example 1 The roughened surface of the conductor (electrolytic copper foil) having a roughened surface and a glossy surface was coated with a solution of the polyimide precursor solution adjusted in Synthesis Example 2. After being applied to a uniform thickness of 15/m, it was dried at 130 ° C for 12 minutes. The polyimine precursor solution adjusted in Synthesis Example 1 was uniformly coated into 200 at 130 ° C to dry. The polyimine precursor solution adjusted in Synthesis Example 2 was coated into 20 ° at 130 ° C to dry the volatile solvent to obtain a polyfluorene. A flexible sheet-like substrate of a copper-coated product of an imide resin and a copper foil. At this time, the residual amount of the solvent in the resin was 〇·78% by weight, and the resin was dried and confirmed to have no stickiness. Ra=1.5 //m thickness 40"m aromatic polyamidene non-woven fabric
與其樹脂面重疊,以銅箔爲內側樹脂面爲外側一起捲裝成 圓筒體得到通氣性多層圓筒體。將上述一起捲裝之多重多 重層圓筒體橫置於圓筒型真空乾燥爐內,爐內壓減壓至 1CT1 Torr,倂用輻射加熱手段與通電流於多層圓筒體的導 體由導體的電阻感應加熱手段緩緩昇溫至多層圓筒體的溫 度爲均勻的15 〇 °C,於此狀態保持2小時,充分地進行脫 溶劑,再以2小時調整至3 3 0〜340°C,於該溫度保持30 分鐘。其次,爐內於減壓下,將爐壁通冷卻水降溫後’由 爐內將多層捲軸取出,進行鬆捲得到分離上述芳香族聚醯 亞胺系不織布之捲軸的撓性印刷配線板用基板。如此所得 -17- 1360373 之撓性印刷配線板用基板,導體面當然無擦傷或凹 傷,亦無撓曲外觀的優良物品。其接著力爲2.0 kg 加熱收縮率爲0.05%,線膨脹係數爲1 1 X 1〇·6 (1 / 焊耐熱試驗無任何的異相。又,銅箔的光澤面皆無 可容易進行形成期望的圖型。 凸等的 / cm, K)。錫 氧化, 比較例1 於實施例1,除最終保持溫度爲260°C以外進 相同的試驗,所得之撓性印刷配線板用基板的接 0.5 kg / cm,熱收縮率爲0.03%,線膨脹係數爲45 (1/ K),錫焊耐熱試驗銅箔與樹脂的界面有多處產 行完全 著力爲 X 10^ 生剝離 比較例2 於實施例1,除最終保持溫度爲4 5 0 °C以外進 相同的試驗,所得之撓性印刷配線板用基板的接 0.5 kg / cm,熱收縮率爲0.03%,線膨脹係數爲45 (1/ K),錫焊耐熱試驗銅箔與樹脂的界面有多處產 行完全 著力爲 xlO·6 生剝離 比較例3 於實施例1,除最終保持時間爲1 〇分鐘,最終 度爲260°c以外進行完全相同的試驗,所得之撓性 線板用基板的接著力爲0.4 kg / cm,熱收縮率爲〇 保持溫 印刷配 .05% > -18- 1360373 線膨脹係數爲36 X l〇·6 (1/ K),錫焊耐熱試驗銅箔與樹脂 的界面有多處產生剝離。 【產業上之利用領域】 依本發明的撓性印刷配線板用基板的製造方法,可得 到聚醯亞胺先驅物樹脂的加熱處理後改善導體層與,絕緣層 間的接著力,及改善長狀基板熱處理時的不均,於商業上 利用可能性高的基板。The air-permeable multilayer cylindrical body was obtained by laminating a copper foil with the inner side of the resin surface as a cylindrical body. The multiple multi-layer cylinders which are packaged together are placed in a cylindrical vacuum drying furnace, and the pressure in the furnace is reduced to 1 CT1 Torr, and the radiant heating means and the current flowing through the conductors of the multilayer cylinder are conductors. The resistance induction heating means gradually raises the temperature to a uniform temperature of 15 〇 ° C in the multilayer cylinder, and maintains the state for 2 hours, sufficiently desolvation, and then adjusts to 3 3 0 to 340 ° C for 2 hours. This temperature is maintained for 30 minutes. Then, after the furnace wall is cooled by the cooling water under the reduced pressure, the multi-layered reel is taken out from the furnace, and the substrate for the flexible printed wiring board in which the reel of the aromatic polyimine-based nonwoven fabric is separated is obtained by loosening the reel. . In the substrate for a flexible printed wiring board of -17 to 1360373, the conductor surface is of course free from scratches or dents, and there is no excellent article having a curved appearance. The subsequent force is 2.0 kg, the heating shrinkage is 0.05%, and the coefficient of linear expansion is 1 1 X 1 〇·6 (1 / welding heat resistance test does not have any heterogeneous phase. Moreover, the shiny side of the copper foil is not easy to form the desired pattern. Type. Convex / cm, K). Tin oxidation, Comparative Example 1 In Example 1, except for the final holding temperature of 260 ° C, the same test was carried out, and the obtained flexible printed wiring board substrate was connected to 0.5 kg / cm, the heat shrinkage rate was 0.03%, and the linear expansion was performed. The coefficient is 45 (1/K), the soldering heat test copper foil and the resin interface have multiple production lines. The full force is X 10^ raw peeling. Comparative Example 2 is in Example 1, except that the final holding temperature is 4500 °C. The same test was carried out, and the obtained flexible printed wiring board substrate was connected to 0.5 kg / cm, the heat shrinkage rate was 0.03%, the coefficient of linear expansion was 45 (1/K), and the interface between the solder heat-resistance test copper foil and the resin was obtained. There are a number of production lines that fully focus on xlO·6 peeling. Comparative Example 3 In Example 1, except for the final holding time of 1 〇 minutes, and the final degree is 260 ° C, the same test is performed, and the obtained flexible wire board is used. The substrate has an adhesion of 0.4 kg / cm, and the thermal shrinkage is 〇. The temperature is maintained. 05% > -18- 1360373 The coefficient of linear expansion is 36 X l〇·6 (1/K), the solder heat-resistance test copper foil There are many places where the interface with the resin is peeled off. [Industrial Applicability] According to the method for producing a substrate for a flexible printed wiring board of the present invention, it is possible to improve the adhesion between the conductor layer and the insulating layer after the heat treatment of the polyimide film of the polyimide, and to improve the long shape. The substrate is unevenly used for heat treatment, and is commercially available.
-19--19-
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JP4790582B2 (en) * | 2006-12-12 | 2011-10-12 | 新日鐵化学株式会社 | Method for producing highly flexible flexible copper clad laminate |
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JPH0753801B2 (en) * | 1986-12-25 | 1995-06-07 | 住友ベークライト株式会社 | Method for manufacturing flexible printed circuit board |
JP2893432B2 (en) * | 1991-12-11 | 1999-05-24 | 新日鐵化学株式会社 | Method for manufacturing flexible printed wiring board |
JPH10138318A (en) * | 1996-09-13 | 1998-05-26 | Ube Ind Ltd | Production of multilayered extrusion polyimide film |
JP2002240195A (en) * | 2001-02-19 | 2002-08-28 | Ube Ind Ltd | Polyimide/copper-clad panel |
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