TWI356915B - - Google Patents

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TWI356915B
TWI356915B TW096116997A TW96116997A TWI356915B TW I356915 B TWI356915 B TW I356915B TW 096116997 A TW096116997 A TW 096116997A TW 96116997 A TW96116997 A TW 96116997A TW I356915 B TWI356915 B TW I356915B
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optical system
reflective optical
reflective
light
focus
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TW096116997A
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TW200809259A (en
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Armin Schwerdtner
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Seereal Technologies Sa
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/22—Processes or apparatus for obtaining an optical image from holograms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/32—Holograms used as optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/135—Liquid crystal cells structurally associated with a photoconducting or a ferro-electric layer, the properties of which can be optically or electrically varied
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/135—Liquid crystal cells structurally associated with a photoconducting or a ferro-electric layer, the properties of which can be optically or electrically varied
    • G02F1/1354—Liquid crystal cells structurally associated with a photoconducting or a ferro-electric layer, the properties of which can be optically or electrically varied having a particular photoconducting structure or material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/22—Processes or apparatus for obtaining an optical image from holograms
    • G03H1/2202—Reconstruction geometries or arrangements
    • G03H1/2205—Reconstruction geometries or arrangements using downstream optical component
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • G02B27/4211—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant correcting chromatic aberrations
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4294—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect in multispectral systems, e.g. UV and visible
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/01—Function characteristic transmissive
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/12—Function characteristic spatial light modulator
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/50—Phase-only modulation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/22—Processes or apparatus for obtaining an optical image from holograms
    • G03H1/2294—Addressing the hologram to an active spatial light modulator

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Holo Graphy (AREA)
  • Lenses (AREA)
  • Liquid Crystal (AREA)

Description

1356915 TPPO/PUK206-015.doc 【圖式之簡單說明】 圖la、lb為本案第一及第二較佳實施例之反射光學系統中偏 向元件之設計及反射元件之設計的上視圖。 圖2為本案第一較佳實施例之反射光學系統中展示其幾何關 係之偏向元件和反射元件的上視圖。 圖3a、3b為本案第二較佳實施例之偏向控制裝置的不同排列 狀況下具有反射光學系統的追蹤系統的上視圖。 圖4a-d為本案第二較佳實施例之不同眼睛位置下具有反射光 學系統的追縱系統之簡化的上視圖。 【元件編 號之說明】 10 反射光學系統 11 反射光學系統 12 偏向元件 OASLM 13 偏向元件 14 反射元件 基本鏡 15 反射元件 16 , 第一玻璃板 17 玻璃板 18 液晶層 19 液晶層 25 1356915 TPP07PUK206-015.doc 20 透明感光半導體層 21 感光半導體層 22 第二玻璃板 23 玻璃板 ' 24 可見區域 一 26 出射邊焦點 28 入射邊焦點 • 30光瞳 32 光轴 34 半短軸 36 入射邊焦點與出射邊焦點至半短軸的距離 38 空間光調變器 40 角度 42 偏向控制裝置 • 43偏向控制裝置 26

Claims (1)

  1. 书年ί〇月ι牛曰修正替換頁 1356915 ΤΡΡΟ/ΡΙ4104-ΡϋΚ206·015·4104 一修改後 十、申請專利範園： 1. 一種反射光學系統(10,11)，包含·· 一反射元件(14,15)，用於反射複數個重建光波； 一入射邊焦點（28)，當該複數個重建光波碰到該反射元件 (14,15)時該複數個重建光波來自該入射邊焦點(28); 一出射邊焦點（26)，該反射元件（14,15)反射的該複數個重建 • 光波傳播至該出射邊焦點（26); 一偏向元件(12,13)，具有複數個光控制偏向性質；以及 一偏向控制裝置’用於以光學方式控制該偏向元件（12,13)的 該複數個偏向性質以控制至少該出射邊焦點（26)的位置。 2. 如申請專利範圍第1項所述之反射光學系統，其中該偏向控制 裝置用於以光學方式控制該偏向元件（12,13)的該複數個偏向性 •質以控制該入射邊焦點（28)的位置。 3. 如申請專利範圍第1項所述之反射光學系統，其中該偏向控制 裝置用於以光學方式控制該偏向元件（12,13)的該複數個偏向性 質以校正像差。 4. 如申請專利範圍第1項所述之反射光學系統，其中至少該反射 元件（14,15)具有一反射表面的效果，該反射表面實質上為摘圓曲 27 1356915 A年丨明斗曰修正替換頁 TPPO/PI4104-PUK206-015*41 〇4_修改後 線狀的。 5. 如申請專利範圍第1項所述之反射光學系統，其中該反射元件 (14,15)至少為部分透明的。 ’ 6. 如申請專利範圍第1項所述之反射光學系統，其中該反射元件 (15)是整合入該偏向元件（13)。 7. 如申請專利範圍第1項所述之反射光學系統，其中該偏向元件 (12.13) 具有一光控制繞射結構及/或折射結構。 8·如申請專利範圍第1項所述之反射光學系統，其中該偏向元件 (12.13) 是以一光尋址空間光調變器的形式設計。 9.如申請專利範圍第8項所述之反射光學系統，其中該光尋址空 間光調變器（12,13)包含： 一第一玻璃板(16,17)，具有一透明電極； 一 LC層（18,19) ’其包含LC (液晶）分子，該LC分子的方向 可經由光控制改變； 一感光半導體層（20, 21);以及 一第二玻璃板（22，23)。 28 1356915 听年吻吻修正替換頁 ΤΡΡ0^1〇4·ρ!]Κ2〇6·〇154ιΊ 10. 如申請專利範圍第9項所述之反射光學系統，其中 導㈣⑽至少為部分透明的。 11. 如申請專利範圍第9或1〇項所述之反射光學系統，其中該感 光半導體層⑽，21)具有可被該偏向控織置f彡響的-能帶結構。 12. 如申請專利範圍第彳項所述之反射光學織，其中來自該入 射邊焦點(28)的該重建光波碰到該反射元件（14，15)並從該反射 元件反射’在該出射邊焦點(26)前方全像地重建一景象。 13. 如申請專利範圍第1項所述之反射光學系統，其中用以控制 該偏向元件（12,13)的該複數個偏向性質之該偏向控制裝置位於 遠離該入射邊焦點（28)和該出射邊焦點(26)的一方向。 14. 如申請專利範圍第1項所述之反射光學系統，其中該偏向控 制裝置包含兩干涉同調光源，該兩干涉同調光源分別位於該入射 邊焦點(28)和該出射邊焦點（26)，且其干涉圖形適用於控制該偏 向元件（12,13)的該複數個偏向性質。 15. 如申請專利範圍第1項所述之反射光學系統，其中該偏向控 29 1356915 . A年(Μ丨4曰修正替換頁 ΤΡΡ0/ΡΙ4104-PUK206-015*4104_修改後 制裝置是以-料址空間光靖㈣形式設計 ，以投射一寫入光 至該偏向元件（12,13)上。 16..如申請專利範圍第1項所述之反射光學系統，其中該偏向控 ---是以強度制的彡曹^Γ~ 該偏向元件（12,13)。 ® 17·如申請專利範圍第1項所述之反射光學系統，其中該反射光 學系統(10,11)包含一分色層且/或其中該反射元件（丨4,15)具有 刀色性質，且其令由該偏向控制襄置提供之該複數個重建光波和 該寫入光有不同的波長。 18. 如申請專利範圍第1項所述之反射光學系統，其中該反射光 學系統(10,11)包含一反射偏光過濾器且/或其中該反射元件 (14,15)具有一偏光過濾器的性質，且其中由該偏向控制裝置提供 之該重建光波和該寫入光有不同的偏光。 19. 如申請專利範圍第1項所述之反射光學系統，其中控制該偏 向元件（12,13 )的該複數個偏向性質之該偏向控制裝置提供人眼 可視的一波長範圍内的一寫入光。 30 1356915 100年10月20日修正替換頁 20.—種追蹤系統，具有前述申請專利範圍任一項所述之一反射光 學糸統（10,11)，並具有： 一光瞳(30),用以過濾朝向該反射光學系統(10，11)的該反射元 件(14，15)之複數個重建光波;以及 一眼睛位置偵測裝置，用以偵測一觀察者眼睛位置； 其中該偏向控制裝置控制該偏向元件(12，13)的該複數個偏向 f·生質以將該出射邊焦點(2 6)的位置控制在由該眼睛位置偵測裝置 偵測到的該觀察者眼睛位置。 21. 如申請專利範圍第2〇項所述之追蹤系統，其更包含一位置控 制裴置以控制該光瞳(3〇)或該光瞳(3〇)之一同一影像的位置至該反 射光學系統(10，11)的該入射邊焦點(28)。 22. —種用於投射一全像景象的全像投射系統，具有如申請專利範 圍第20或21項所述追蹤系統，且具有： 一重建光源裝置’用以產生複數個重建光波;以及 至少一空間光調變器(38)，用以調變由該重建光源裝置產生的 該複數個重建光波並用以發射該複數個調變的重建光波朝向位於 該空間光調變器(38)的一傅利葉平面中的該光瞳(3〇)。 23·—種全像投射方法，用於投射全像重建景象，包含： 31 1356915 ---- ·: 100年10月20日修正替換頁 產生複數個調變的重建光波； • 藉由一光瞳(30)過濾朝向一反射光學系統(10，丨i)之該複數個 調變的重建光波； 反射該反射光學系統(i〇，u)上的該過濾的調變重建光波並在 該反射光學系統(1〇，11)之一出射邊焦點(26)前方產生一景象的一 全像重建； 偵測一觀察者眼睛位置;以及 控制該反射光學系統(10,11)的一偏向元件(12,13)之複數個偏 向性質，以控制該反射光學系統(l〇，n)的一出射邊焦點(26)至由該 眼睛位置偵測裝置偵測到的該觀察者眼睛位置。 24·如申晴專利範圍第23項所述之全像投射方法，更包含將該光 瞳(30)置於該反射光學系統的一入射邊焦點(28)上。 32 1356915 p伸(〇月_修正替換頁 TPP0/PI4104-PUK206-015·4104_修改後 七、指定代表圖·· (一） 本案指定代表圖為：圖2 (二) 本代表圖之元件符號簡單說明: 11 反射光學系統 26 出射邊焦點 28 入射邊焦點 32 光轴 34 半短軸 36 入射邊焦點與出射邊焦點至半短軸的距離 八、本案若有化學式時，請揭示最能顯示發明特徵的化學式： 無 5
TW096116997A 2006-05-12 2007-05-11 Reflective optical system, tracking system and holographic projection system and method TW200809259A (en)

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DE102006024092 2006-05-12

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TW200809259A TW200809259A (en) 2008-02-16
TWI356915B true TWI356915B (zh) 2012-01-21

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CN101490598B (zh) 2010-12-15
US8120828B2 (en) 2012-02-21
WO2007131810A1 (de) 2007-11-22
WO2007131817A1 (de) 2007-11-22
CN101490598A (zh) 2009-07-22
JP2009537028A (ja) 2009-10-22
DE112007001142A5 (de) 2009-04-23
JP5128582B2 (ja) 2013-01-23
KR20090025234A (ko) 2009-03-10
TW200809259A (en) 2008-02-16

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