TWI354314B - - Google Patents
Download PDFInfo
- Publication number
- TWI354314B TWI354314B TW094127208A TW94127208A TWI354314B TW I354314 B TWI354314 B TW I354314B TW 094127208 A TW094127208 A TW 094127208A TW 94127208 A TW94127208 A TW 94127208A TW I354314 B TWI354314 B TW I354314B
- Authority
- TW
- Taiwan
- Prior art keywords
- excimer lamp
- lighting
- excimer
- power
- discharge
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
- H05B41/14—Circuit arrangements
- H05B41/24—Circuit arrangements in which the lamp is fed by high frequency ac, or with separate oscillator frequency
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
- H05B41/02—Details
- H05B41/04—Starting switches
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21K—NON-ELECTRIC LIGHT SOURCES USING LUMINESCENCE; LIGHT SOURCES USING ELECTROCHEMILUMINESCENCE; LIGHT SOURCES USING CHARGES OF COMBUSTIBLE MATERIAL; LIGHT SOURCES USING SEMICONDUCTOR DEVICES AS LIGHT-GENERATING ELEMENTS; LIGHT SOURCES NOT OTHERWISE PROVIDED FOR
- F21K2/00—Non-electric light sources using luminescence; Light sources using electrochemiluminescence
- F21K2/06—Non-electric light sources using luminescence; Light sources using electrochemiluminescence using chemiluminescence
- F21K2/08—Non-electric light sources using luminescence; Light sources using electrochemiluminescence using chemiluminescence activated by an electric field, i.e. electrochemiluminescence
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Circuit Arrangements For Discharge Lamps (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004305440A JP4586488B2 (ja) | 2004-10-20 | 2004-10-20 | エキシマランプ点灯装置及びエキシマランプ点灯方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200614316A TW200614316A (en) | 2006-05-01 |
TWI354314B true TWI354314B (ko) | 2011-12-11 |
Family
ID=36538102
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094127208A TW200614316A (en) | 2004-10-20 | 2005-08-10 | Excimer lamp lighting device and excimer lamp lighting method |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4586488B2 (ko) |
KR (1) | KR100911601B1 (ko) |
CN (1) | CN1763905B (ko) |
TW (1) | TW200614316A (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5071289B2 (ja) * | 2008-07-23 | 2012-11-14 | ウシオ電機株式会社 | 紫外線照射装置及び紫外線照射装置の点灯制御方法 |
CN102473585B (zh) * | 2009-07-17 | 2016-05-18 | 优志旺电机株式会社 | 照射装置 |
JP5795233B2 (ja) * | 2011-10-14 | 2015-10-14 | 新電元工業株式会社 | 放電ランプ点灯装置 |
KR102657557B1 (ko) * | 2021-09-23 | 2024-04-15 | (주)선재하이테크 | 엑시머 램프를 이용한 정전기 제거장치 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3326968B2 (ja) * | 1994-06-27 | 2002-09-24 | 松下電工株式会社 | 放電灯点灯装置 |
JPH10223385A (ja) * | 1997-02-07 | 1998-08-21 | Toshiba Lighting & Technol Corp | 外部電極形放電ランプ点灯装置および照明装置 |
WO2001011927A1 (fr) * | 1998-02-13 | 2001-02-15 | Ushio Denki Kabushiki Kaisya | Dispositif a lampes de decharge avec barriere dielectrique |
JP3521731B2 (ja) * | 1998-02-13 | 2004-04-19 | ウシオ電機株式会社 | 誘電体バリア放電ランプ光源装置 |
JP2001185089A (ja) * | 1999-12-28 | 2001-07-06 | Quark Systems Co Ltd | エキシマ照射装置 |
KR100857848B1 (ko) * | 2002-05-17 | 2008-09-10 | 삼성전자주식회사 | 백라이트 어셈블리와 이의 구동 방법과 이를 갖는 액정 표시 장치 |
JP2004087270A (ja) * | 2002-08-26 | 2004-03-18 | Orc Mfg Co Ltd | エキシマランプおよびエキシマランプ装置 |
JP4196649B2 (ja) * | 2002-11-19 | 2008-12-17 | ウシオ電機株式会社 | エキシマ光源装置 |
JP4093065B2 (ja) * | 2003-01-17 | 2008-05-28 | ウシオ電機株式会社 | エキシマランプ発光装置 |
-
2004
- 2004-10-20 JP JP2004305440A patent/JP4586488B2/ja not_active Expired - Lifetime
-
2005
- 2005-08-10 TW TW094127208A patent/TW200614316A/zh unknown
- 2005-09-27 KR KR1020050089593A patent/KR100911601B1/ko active IP Right Grant
- 2005-10-20 CN CN2005101181081A patent/CN1763905B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
JP4586488B2 (ja) | 2010-11-24 |
TW200614316A (en) | 2006-05-01 |
CN1763905A (zh) | 2006-04-26 |
JP2006120392A (ja) | 2006-05-11 |
CN1763905B (zh) | 2010-05-05 |
KR20060051653A (ko) | 2006-05-19 |
KR100911601B1 (ko) | 2009-08-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101046014B1 (ko) | Uv 보조 열 처리 장치 및 방법 | |
US8582962B2 (en) | Substrate processing chamber with dielectric barrier discharge lamp assembly | |
US20110056513A1 (en) | Method for treating surfaces, lamp for said method, and irradiation system having said lamp | |
TWI354314B (ko) | ||
US20070116891A1 (en) | Plasma brush apparatus and method | |
JP6096118B2 (ja) | エキシマ光源 | |
CN1518051A (zh) | 受激准分子灯发光装置 | |
JP4608511B2 (ja) | 表面処理装置 | |
KR100539359B1 (ko) | 엑시머 조사 장치 | |
KR20100052782A (ko) | 오존발생관 및 오존발생장치 | |
JP3085128B2 (ja) | 光洗浄方法 | |
JP2001079387A (ja) | 紫外光照射装置及び方法 | |
JP3230315B2 (ja) | 誘電体バリヤ放電ランプを使用した処理方法 | |
JP2004171889A (ja) | エキシマ光源装置 | |
JP3282804B2 (ja) | エキシマ照射装置 | |
JP2004154654A (ja) | プラズマ反応装置および方法 | |
JP3702852B2 (ja) | 誘電体バリヤ放電ランプを使用した処理方法 | |
JP3815503B2 (ja) | 誘電体バリヤ放電ランプを使用した処理方法 | |
JPH06231735A (ja) | 誘電体バリヤ放電ランプを使用した灰化装置 | |
JP2008084568A (ja) | 紫外線照射装置 | |
Oh et al. | A study of the space sterilization device using atmospheric-pressure DBDs plasma | |
RU2324255C2 (ru) | Универсальный дуговой источник вуф-фотонов и химически активных частиц | |
KR200288954Y1 (ko) | 오존발생장치 | |
KR100575368B1 (ko) | 광가열 열플라즈마 소오스 | |
Samokhvalov et al. | Compact soft X-ray source for transmission cell microscopy |