TWI345300B - Electrostatic discharge protection device - Google Patents
Electrostatic discharge protection device Download PDFInfo
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- TWI345300B TWI345300B TW96110714A TW96110714A TWI345300B TW I345300 B TWI345300 B TW I345300B TW 96110714 A TW96110714 A TW 96110714A TW 96110714 A TW96110714 A TW 96110714A TW I345300 B TWI345300 B TW I345300B
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1345300 096001 235〇8twf.doc/n 九、發明說明: 【發明所屬之技術領域】 本發明是關於一種靜電放電防護裝置,且特別是關於 一種在非靜電放電模式下避免漏電流發生之靜電放電防1 裝置。 嗅 【先前技術】 電子產品於實際使用環境中可能會遭受靜電敌電 (electrostatic discharge,ESD)的影響而導致損壞。由於^ 電放電電壓較一般所提供的電源電壓大出甚多,而當靜略 放電發生時,此靜電放電電流便很有可能將元件燒毁。因 此必須在電路中作一些靜電放電防護措施以有效隔離靜電 放電電流’以避免元件損毁。 習知之靜電放電保護電路多為利用閘極接型金氧 半(gate-groun(ied n-ch謹el metalocide-semiconductor, GGNM0S)電晶體所實施之。圖1繪示為以問極接地n型 金氧半電晶體所實施的靜電放電保護襞置。請參照圖1>N 型金氧半電晶體103為使用厚氧化層(thick似记幻之金氧半 電晶體,且N型金氧半電晶體103的觸通電壓(trigger_〇n voltage)Vt 介於 6〜10 伏特(V),例如:vt=8V。 倘若核u電路1〇2之工作電壓(pr〇gram仰他弘)%小 於N型金氧半電晶體103的觸通電壓,例如:, 則當靜電放電發生時,靜電放電之高電壓自焊塾谢進入 便有可能在N型金氧半電晶體⑽未導通前使核心電路 102運作。因此,靜電放電電流無法經N型金氧半電晶艘 1345300 096001 23SQ8twf.doc/n =1=接地電壓執線vss’而通入核心電請使 盘電為外部電路、所有電源供應、電性接地 1子㈣對核心電路102的連接,因此核心電路搬以 工作電壓正常運作下’靜電放電防護電路 法 通過自己㈣引至接 嫌“肌 電放電發生時,靜電放電二塾4 ’而且在靜 放亦魏及時地導引靜電 科广。, 種解決上述問題之方法為利用表面觸 術來降低金氧半電晶體的觸通電壓, 此金氧半电日日體的觸通電壓約為lv。 置。用表面觸發技術之靜電放電防護裝 ^例如ΐ^核心電路202正常運作時,提供工作 Vp(例如· Vp=7.5V)至焊墊201,雷阳魏η 所構成之RC電路提供高準位紐=金== 208a及N型金軋半電晶體·b所構成之反㈣2〇1345300 096001 235〇8twf.doc/n IX. Description of the Invention: [Technical Field] The present invention relates to an electrostatic discharge protection device, and more particularly to an electrostatic discharge prevention for avoiding leakage current in a non-electrostatic discharge mode 1 device. Sniffing [Prior Art] Electronic products may be damaged by electrostatic discharge (ESD) in actual use environments. Since the electric discharge voltage is much larger than the power supply voltage generally provided, when the static discharge occurs, the electrostatic discharge current is likely to burn the components. Therefore, some electrostatic discharge protection measures must be taken in the circuit to effectively isolate the electrostatic discharge current to avoid component damage. Conventional electrostatic discharge protection circuits are mostly implemented by gate-groun (gate-groun) (eg n-ch-el metalocide-semiconductor (GGNM0S) transistors. Figure 1 shows the grounding n-type Electrostatic discharge protection device implemented by gold oxide semi-transistor. Please refer to Fig. 1> N-type gold oxide semi-transistor 103 is a thick oxide layer (thick-like gold oxide semi-transistor, and N-type gold oxide half) The contact voltage (trigger_〇n voltage) Vt of the transistor 103 is between 6 and 10 volts (V), for example, vt = 8 V. If the operating voltage of the nuclear u circuit 1 〇 2 (pr〇gram 仰他弘)% Less than the contact voltage of the N-type MOS transistor 103, for example, when the electrostatic discharge occurs, the high voltage of the electrostatic discharge may be made before the N-type MOS transistor (10) is turned on. The core circuit 102 operates. Therefore, the electrostatic discharge current cannot pass through the N-type MOS semi-electric crystal boat 1345300 096001 23SQ8twf.doc/n =1=the ground voltage line vss' and the core power is turned into the external circuit, all Power supply, electrical grounding 1 (four) connection to the core circuit 102, so the core circuit is moved Under normal operating voltage, the 'electrostatic discharge protection circuit method is introduced by itself (4) to the "electrostatic discharge occurs, the electrostatic discharge is 2塾4' and the static electricity is widely guided in the static release. The method is to use surface touch to reduce the contact voltage of the gold-oxygen semi-transistor, and the contact voltage of the gold-oxygen semi-electrical solar body is about lv. The electrostatic discharge protection device using surface triggering technology is, for example, ΐ^ When the core circuit 202 is in normal operation, the working Vp (for example, Vp=7.5V) is supplied to the pad 201, and the RC circuit formed by the Leiyang Wei η provides a high level of gold == 208a and N type gold rolled semi-transistor. · b constitutes the opposite (four) 2〇
=二8=型金氧半電晶體2_導通,因此N 不導二】餘低至接地電壓娜而 不¥通猎以阻擒電流通過_金氧半電晶體 至接地,且使核心電路能正常運作。 導引 另外,§靜電放電發生時,靜電放電 2〇1 :透過P型金氧半電晶體施a將高=== 至N型金氧半電晶體203之閑極, 203導通,·將靜電放電電流導引至接地VSt 然而’提供穩定的工作電壓%以使核心電路观正 1345300 096001 23 508twf.doc/n 常運作須經過一段時間。在工作電壓Vp提升的這段時間, 例如:工作電壓Vp由〇V提升至3.3V,很有可能會造成反 相器208内部的p型金氧半電晶體208a導通,進而使^^ 型金氧半電晶體203導通,造成部分電流通過N型金氧半 電晶體203而導引至接地VSS。因此靜電放電防護電路之 设計亦須能防止漏電流之發生,以避免影響核心電路之運 作0 • 值得一提的是,^^型金氧半電晶體203之汲極耦接一 電性連接電源電壓之焊墊201,在此焊墊2〇1不允許電性 ,接至擺動電壓(swing voltage),以確保核心電路2〇2正 常操作下,N型金氧半電晶體2〇3為不導通,也 加亦不能為浮接狀態、輸入焊墊或者輸出焊塾。卜塾 圖2B纟會示為圖2A之靜電放電防護裝置 方式。請參照圖2B,焊塾201電性遠接 種轉接 7 3:3V),而焊塾2。9為輸入焊塾或輸墊 • == 209進入時,焊塾201可視為;= 過p型電晶體208a將高準位俨铼鉍入S、τ勹子接,透 體加使其導通,以料Ν型金氧半電晶 日^會使反相請内部的p型^路2f正, ^生進而使N型金氧半電晶體加導通, 【發明内容】 本發明提供-種靜電放 电防漫裝置,用以在非靜電放 °96〇〇1 23508twf.doc/n 電模式下,栓制具有輕+ λ 極電壓,使此金氧丰放電防護功能之金氧半晶體之閉 本發明提出-種^^不^通’以防止漏電流之發生。 裝置包括第-金A放電防護裝置。此靜電放電防護 組。第-全氡丰f曰包昍體、債測模組、以及栓制電壓模 耗接第-二ί;第體之ί 一源級極及第二祕分別 模式下傳導靜電流於第以,電放電防護 偵測模組耗接於第4;=與第二導電路徑之間。 在靜電放電防護模式弟;導電路徑之間’藉以 電放】晶體導通。栓制電壓模组用以在非靜 第―:氧;:ί下栓制第-金氧半電晶體之閘極電壓,使 弟金乳丰電晶體不導通。 包括望上^之靜電放電防護裝置,在-實施例中偵測模組 第—電容、以及反相器。第-電阻之第- dt,!。第—電容之第一端及第二端分別耦 於屮迪t《―端及第二導電路徑。反相器之輸入端及 難接第-電阻之第二端及第—金氧半電晶體之 厂甲]極0 上4之靜電放電防護裝置,在—實施例中制模組包 ifr電容、第—電阻、以及反相器。第—電容之第-端 導Ϊ路徑。第1阻之第—端及第二端分別搞接 电备之第二端及第二導電路徑。反相器之輸入端及輸 端分別耗接第—電容之第二端及第—金氧半電晶體之閘 096001 23508twf.doc/n 二ίί靜:敌電防亀,在〜實施例中栓制電壓模 、、且耗接至弟:金氣半電晶體之間極。 上'述之靜電故雷Ρ方蹲获要, 括第-電容、以及在1施例中偵測模組包 分別耦接第一暮年第电阻。苐一電容之第一端及第二端 電阻之第-端及m第^氧半電晶體之閘極。第-導電路徑。卑—鳊刀別耦接第一電容之第二端及第二 括故電防護裝置’在—實施例中偵測模組包 分別說垃穿以及第一電容。第一電阻之第一端及第二端 電容導電路徑及第—金氧半電晶體之閘極。第-二ί電=端及第二端分_接該第—電阻之第二端及第 之靜電放電防護裝置,在—實施财栓制電麵 二:括弟一金氧半電晶體。第二金氧半電晶體之第一、第 ^,極及閉極分_接第—金氧半電晶體之 導電路徑及第三導電路徑。 靜電放電防護裝置,在—實施例中栓制電壓才 二、ΐ弟二金氧半電晶體。第二金氧半電晶體之第一、 =没極及閘極分別_第—金氧半電晶體之 導電路徑及第三導電路徑。 麵:勹靜電放電防護裝置,在一實施例中栓制電壓? 金^主第:金氧半電晶體、以及第三金氧半電晶體。第. 晶辦體,―、第二源/汲極分別耗接第一金氧半‘ ~甲極及第一導電路徑。第三金氧半電晶體之第一 1345300 096001 23508twf.doc/n 第二源級極及_分別输第三導電路徑、第二金 晶體之閘極及弟一導電路經。 述之靜電放電卩方邊裝置’在—實施例中栓制電 組,括第二金氧半電晶體、以及第三金氧半電晶體。第二 金乳半電晶體之第-、第二源/汲極分_接第—金= 2 8 = type gold oxide semi-transistor 2_ conduction, so N does not conduct two] the rest is low to the ground voltage, but not to pass the current to pass the current through the _ gold oxide semi-transistor to the ground, and enable the core circuit working normally. In addition, when the electrostatic discharge occurs, the electrostatic discharge 2〇1: through the P-type MOS transistor, a high === to the idle pole of the N-type MOS transistor 203, 203 is turned on, · static electricity The discharge current is directed to ground VSt. However, 'providing a stable operating voltage % makes the core circuit view 1345300 096001 23 508twf.doc/n to operate normally for a period of time. During the period when the operating voltage Vp is increased, for example, the operating voltage Vp is increased from 〇V to 3.3V, which is likely to cause the p-type MOS transistor 208a inside the inverter 208 to be turned on, thereby making the ^^ type gold The oxygen semiconductor 203 is turned on, causing a portion of the current to be conducted to the ground VSS through the N-type MOS transistor 203. Therefore, the design of the ESD protection circuit must also prevent the occurrence of leakage current to avoid affecting the operation of the core circuit. 0. It is worth mentioning that the gate of the MOS-type MOS transistor 203 is coupled to an electrical connection. The pad of the power supply voltage 201, where the pad 2〇1 is not allowed to be electrically connected to the swing voltage to ensure that the core circuit 2〇2 is operated normally, and the N-type MOS transistor 2〇3 is It is not conductive, and it cannot be floated, input pads or output soldering.塾 Figure 2B纟 shows the electrostatic discharge protection device of Figure 2A. Referring to FIG. 2B, the welding bead 201 is electrically inoculated to transfer 7 3:3 V), and the welding bead 2.9 is the input welding pad or the infusion pad. • == 209 is entered, the welding bead 201 can be regarded as; The transistor 208a is connected to the S and τ 高 高 , , , , , , , , , , , , , , , , , 勹 勹 勹 勹 勹 勹 勹 勹 勹 勹 勹 勹 勹 勹 勹 勹 勹 勹 勹 勹 勹 勹The invention provides an electrostatic discharge anti-diffuse device for electrostatic discharge anti-diffuse device, which is used for plugging in a non-electrostatic discharge mode of 96 〇〇 1 23508 twf.doc/n. The invention has a light + λ pole voltage, so that the gold oxide half-crystal of the gold oxide discharge protection function is closed. The invention proposes to prevent leakage current from occurring. The device includes a first-gold A discharge protection device. This electrostatic discharge protection group. The first-total 氡 曰 曰 曰 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 The electric discharge protection detection module is consumed between the fourth; = and the second conductive path. In the electrostatic discharge protection mode; the conductive path between the 'by the electric discharge' crystal conduction. The plug-in voltage module is used to plug the gate voltage of the first-gold oxide semi-transistor under the non-static first:: oxygen;: ί, so that the younger crystal is not conductive. Including the electrostatic discharge protection device of the top, in the embodiment, the module-capacitance, and the inverter are detected. The first - the first of the resistance - dt, !. The first end and the second end of the first capacitor are respectively coupled to the "end" and the second conductive path. The input end of the inverter and the second end of the refractory first-resistance and the first-stage of the galvanic-oxygen semi-transistor, the electrostatic discharge protection device of the upper 4, the module package ifr capacitor in the embodiment The first - the resistor, and the inverter. The first-end of the capacitor - the leading path. The first end and the second end of the first resistor respectively connect the second end of the electric device and the second conductive path. The input end and the output end of the inverter respectively consume the second end of the first capacitor and the first gate of the golden oxygen semi-transistor 096001 23508twf.doc/n two ίί static: the enemy electric tamper, in the embodiment The voltage mode is made, and it is consumed by the younger brother: the pole between the gold gas and the semi-transistor. The above description of the static electricity, the Thunder, and the first capacitor are coupled to the first module. The first end of the capacitor and the first end of the second end of the resistor and the gate of the m-oxygen semiconductor. First-conducting path. The smear-saw is coupled to the second end of the first capacitor and the second electrical protection device. In the embodiment, the detection module package is said to be worn and the first capacitor. The first end and the second end of the first resistor are a capacitor conductive path and a gate of the first metal oxide half transistor. The second-electrode=end and the second end are connected to the second end of the first-resistance and the first electrostatic discharge protection device, and the implementation of the financial plug-in surface is as follows: a brother-and-gold-oxide semi-transistor. The first, the second, the pole and the closed pole of the second oxy-halide transistor are connected to the conductive path and the third conductive path of the MOS transistor. In the case of the electrostatic discharge protection device, in the embodiment, the voltage is tied, and the second generation of the metal oxide semiconductor is used. The first, =, and the gate of the second MOS transistor are the conductive path and the third conductive path of the _th-thoxy-oxygen semiconductor. Face: 勹 Electrostatic discharge protection device, in one embodiment, the voltage is tied? Gold ^ main: gold oxide semi-transistor, and third gold oxide semi-transistor. The crystal body, ―, the second source/dip pole respectively consumes the first gold oxide half ‘the first pole and the first conductive path. The first of the third gold-oxide semi-transistor 1345300 096001 23508twf.doc/n the second source-level pole and the _ respectively output the third conductive path, the gate of the second gold crystal and the second-conductor circuit. The electrostatic discharge crucible device described in the embodiment is a plug-in electric group including a second gold-oxygen semi-transistor and a third gold-oxygen semi-electrode. The second - second source / bungee of the second golden milk semi-transistor
體之閘極及第二導電路經。第三金氧半電晶體之第一電 弟-源从極及_分別純第三導電路徑、第二 晶體之閘極及第二導電路徑。 上^之靜電放電防護装置,在—實施例中栓制電壓模 組Ο括第二金氧半電晶體、以及第二電阻。第二金氧半電 ί體源/汲極_第—金氧半電晶體之間極及 、首+電佐。弟—電阻之第一端及第二端分別輕接第三 V电路徑及第二金氧半電晶體之閘極。 上述之靜電放電防魏置,在—實關中栓 =㈣二金氧半電晶體、以及第二電阻。第二』ΐΐThe gate of the body and the second conductive circuit. The first electrified source of the third MOS transistor is a pure third conductive path, a gate of the second crystal, and a second conductive path. The electrostatic discharge protection device of the above embodiment, in the embodiment, the voltage mode group includes a second gold oxide semi-transistor and a second resistor. The second gold-oxygen semi-electrode 体 body source / bungee _ first - gold oxygen semi-transistor between the pole and the first + electric. The first end and the second end of the resistor are respectively connected to the third V electrical path and the second gold oxide half transistor gate. The above-mentioned electrostatic discharge anti-Wei, in the - - - - - - - - - - - - - - - - - - - - - - Second ΐΐ
:曰體2-、第二源級_接第—金氧半電晶體之間極及 導電路徑及第二金氧半電晶體之閘極。接第一 本發明因採錄制電壓模組之結構,從而栓制具有靜 电電防護功能之金氧半電晶體之閘極電壓。因此本發明 =电放妨魏魏在祕钱錄式下使此金 導通麟止漏電流之發生,以及在靜電放電模式下 及引靜電放電電流以避免元件之損壞。 為讓本發明之上述和其他目的、特徵和優點能更明顯 1345300 096001 23508twf.doc/n 易懂’下讀舉本發日狀雛實補,知 作詳細說明如下。 口八 【實施方式】: 曰 body 2, the second source level _ connected to the first and the gold-oxide half-electrode between the pole and the conductive path and the gate of the second MOS transistor. In connection with the first invention, the structure of the recording voltage module is used to plug the gate voltage of the gold-oxygen semiconductor transistor having the electrostatic protection function. Therefore, the present invention = electric arranging Wei Wei in the secret money recording mode to make the gold lead through the leakage current, and in the electrostatic discharge mode and the electrostatic discharge current to avoid component damage. The above and other objects, features and advantages of the present invention will become more apparent. 1345300 096001 23508 twf.doc/n is easy to understand, and the following is a detailed description of the present invention.口八 [Implementation]
二般而言,靜電放電防護裝置有兩種操作模式 式(即正常操作模式)及靜 路4操作時,靜電放電防護裝流 自己’因此此時靜電放電防護裝置對於核心 L 二^靜電放電發生時,靜電敌電防護裝置必須 ^ 又X、兒路之功能,將靜電放電電啻 壓軌線、接地電難線或者其他焊墊。i崎引至糸統電 定電2:;之=靜:核心電路的工作電壓提升至穩 可能會導通,A成;放電防護功能之金氧半電晶體 氧半電通常為大尺寸(相對於核心電路)之金 千日體此漏電流為相當可觀的。田、 發生之靜電故電 匕月匕防止漏電流 圖3A纷濩衣置為目前所迫切需要的。 置。請參照® 3T為本5明之—實施例的靜電放電防護裝 鳥、偵顺㉟3Gf靜電放電防護裝置包括金氧半電晶體 要用以導引靜奸電^及栓 =壓模組3G5。在此假設主 型金氧半電晶雜如电仙'之靜屯放電防護單元3〇4包含n 應用於其他實施例不侷限於此範圍,仍可 電放電防護單&3()=凡之设计。如圖3b所示,靜 為由N型金氧半電晶體3〇4b與N塑 1345300 096001 23508twf.doc/n 金氧半電晶體304C所構成之。 氧丰^ 曰’ _内部的N型金 304 Π刪&疋具有厚氧化層之金氧半電晶體。電晶體 二“二:、弟汲極分別耦接第一導電路徑301及第 二第3G2,用以在靜電放電防護模式下傳導靜電流 與第二導電路徑地之間。侦測模組 ==弟-導電路徑301與第二導電路徑3Q2之間,而 =模組306包括電阻306a、電容_,以及p型金氧半 。 &金乳+電晶體娜d所構成之反相器 ^制^模組305包括N型金氧半電晶體施,其中 型全氧:電?ί:3〇5&之第一、第二源/汲極分別耗接N 羞之閘極及第二導電路徑,且N型金 虱+電明體305a之閘極耦接第三導電路徑3〇3。 ^ ^電放電之高電㈣烊墊3G7(例如:輸人 輸出知墊)進入時,透過反相^〇9内部的p型 = 2 3 高準位信號耗合至N型金氧半電晶體取曰; ’使N型金氧半電晶體綱a導通。因此 / 導引至第H f"及㈣靜電放電電流 電放電Γ 2(例如:接地電㈣線),以避免靜 敌電電流彳貝毁核心電路308。 在本實施例中,第三導電路徑303可以為一第一 執線(例如系統電㈣線VDD),用以提供第—1 型金氧半電晶體獅之閉極。在正常操作模式下$系、= 12 1345300 09600】 23508twfdoc/n 壓軌線VDD會使N型金氧半電晶體% =電防護裝置正常操作時(即非靜電放電^;槿口^靜 ^之閑罐’使N型金氧半電晶體304二 猎以防止漏電流之發生。 3不¥通’ 即使在非靜電放電防護模式下 ^Ws,ing voltage),„„„ 3〇6 ^組料制N型金氧半電晶體綱; mr,不導通’以避免漏電流之發生。 時,富靜電放電之高電壓自焊墊307進入 導電路徑303可視為浮接,因此能在不受ν = =:=3心之影響下,透過反相器3〇9内部的ρ型金 兒日日體3〇6c將南準位信號耦合至Ν型金氧半電曰俨 304a之閘極使其導通。 虱牛包日日體 料目器内糾P型金氧半電晶體3_韩 拾制i^ft3G6d—般為厚氧化層之金氧半電晶體,而 拉組305内部的N型金氧半電晶體305a可依製 ^氧使用者需求設計為薄氧化層之金氧半電晶體或者 厗乳化層之金氧半電晶體。 ―座3施例可以利用G.18㈣(1剔.3V)製程實施之。 = 轨從3〇3電性連接之第一電壓相同於焊塾307 接之電壓,則_金氧半電晶體306d之寬長比(W/L) 〇 '· 4#m /〇.44#m,P型金氧半電晶體306c之寬長比 13 (S ) 1345300 096001 23508hvf.doc/n (W/L)可以為 長比(W/L)可以為】.㈣^型金氧半電晶體305a之寬 yjM曷 j“m/〇44 。 〈見 面積較P型金氧半電曰 孓金乳半電晶體305a 小的多,使N型tilt 型金氧半電晶體 至於干擾N縣氧半 &錄較電過程t不 此外,若第:^:r 之閉極電遂。 弟—*導電路徑303電性谨垃々结 墊307電性連接之電 =接之弟—電壓與浮 僅需小於焊墊307 ^ 只苑例中,第一電壓 晶體30知之門搞币厂連接之電塵即可检職型金氧半電 之閘極以防止漏電流之發生。 置。本發㈣—實_之靜電放電防護裝 了二拾=壓r'ΛΓ圖3C與圖3Α不同之處在於多 弘坚杈、、且1拴制金氧半電晶體304a之 閘極電壓。拴制電壓模組311包括 之 3山’其中?型金氧半電晶體311a之第―、第二源= =耦ί系統電壓軌線VDD及反相器309之輸入端,而P 垔金乳半電晶體311a之閘極耦接第四導電路徑3ι〇。 在本實施例中第四導電路徑M0可以為一第二電壓 線’用以提供第二電壓至P型金氧半電晶體仙之問極, 使P型金氧半電晶體311a導通。因此在非靜電放電防護楔 式下’透過導通之p型金氧半電晶體311a提供高準位信鱿 至反相斋309的輸入端’進而拴制n型金氧半電晶體3〇耗 之閘極電壓。在本發明另一實施例中,可以僅使用一組拎 制電壓模組311來拴制N型金氧半電晶體3〇4a之閘極 壓。 免 1345300 096001 23508twf.doc/n 例圖3A中偵測模組娜的另 偵測模組306包括電容401與電阻4〇2,盆中 第一端及第二端分_接第—導電路巧3〇1谷賴之 第-端,電阻402之第二端耦接第哪:4〇2之 模組撕内的節點Α耗接至靜電 如上述實施例圖3A之說明 、二304。 施=3,電壓模組〜-種; 照圖5A,技制電壓触地包括N型 路 以及Ρ型金氧半電晶體观,其中牛=體5 01、 之第一、第二源/汲極分聰接靜電放電防晶體501 二導電路徑302。Ρ型金氧半電晶體5G2 及第 没極及閘極分別輪接第三導徑3〇3、 :第二源/ 體501之閘極及第二導電路徑3〇2。 1金氧半電晶 如上述實施例圖3A之說明,圖5B给_ 例圖3A中拴制電壓模組3〇5的另—,’、’發明實施 圖=,掩制電_組305包括N型金體°^參照 及電阻5〇4。N型金氧半電晶體5〇3之第—~一 以 分別耦接靜電放電防護單元綱、弟—源/及核 電阻5〇4之第一端與第二端分且 N型金氧半電晶體503之閘極。 仫303及 值得-提的是,上述實施财靜電 常為==二, 疋J使用p金乳+電晶體實施之,接 15 1345300 096001 23508twf.doc/n I=:種實施例以便本領域具有通常知識者能輕 =6A料為本發明另—實施例之靜電 置。晴參照圖6A’此靜電放電防護裝置包 =604a、偵測模組606、以及拾制電壓模組6仍。p :In general, the ESD protection device has two modes of operation (ie, normal operation mode) and when the static circuit 4 is operated, the ESD protection is installed by itself. Therefore, the ESD protection device occurs for the core L 2 electrostatic discharge. At the time, the electrostatic enemy protection device must have the function of X and the children's road, and the electrostatic discharge electric pressure is pressed, the grounding electric hard line or other welding pads. i 崎 引 糸 糸 糸 电 2 2 : : 静 静 静 : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : The leakage current of the core circuit) is quite considerable. The field, the static electricity that occurred, and the prevention of leakage current in Figure A Figure 3A is the urgent need for clothing. Set. Please refer to the ® 3T for the 5th - the electrostatic discharge protection of the embodiment, the 353Gf electrostatic discharge protection device including the MOS semi-transistor to guide the smuggling electricity and the plug = 3G5. It is assumed here that the main type of gold oxide semi-electric crystals such as electric fairy's static discharge protection unit 3〇4 contains n applied to other embodiments is not limited to this range, still can be electric discharge protection single & 3 () = where The design. As shown in Fig. 3b, static is composed of N-type oxy-oxygen semiconductor 3〇4b and N-plastic 1345300 096001 23508 twf.doc/n MOS transistor 304C. Oxygen ^ _ Internal N-type gold 304 & amp amp amp 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋 疋The transistor 2 is coupled to the first conductive path 301 and the second 3G2, respectively, for conducting between the electrostatic current and the second conductive path in the electrostatic discharge protection mode. - between the conductive path 301 and the second conductive path 3Q2, and the = module 306 includes a resistor 306a, a capacitor _, and a p-type MOS half. & ^ Module 305 includes an N-type MOS transistor, wherein the first and second source/drain electrodes of the type 全: ?:3〇5& respectively consume the N-shade gate and the second conductive path And the gate of the N-type metal 虱 + electric body 305a is coupled to the third conductive path 3〇3. ^ ^ The high electric power of the electric discharge (4) 烊 pad 3G7 (for example: input output pad) enters, through the reverse phase ^〇9 Internal p-type = 2 3 High-level signal is drawn to the N-type MOS transistor; 'Met N-type MOS semi-transistor a. Therefore / lead to H f" (4) Electrostatic discharge current electric discharge Γ 2 (for example, grounding electric (four) line) to avoid the static enemy electric current dam destroying the core circuit 308. In this embodiment, the third conductive path 303 may be a first The line (such as the system power (four) line VDD) is used to provide the closed-end of the 1:1 type MOS transistor. In normal operation mode, $ system, = 12 1345300 09600] 23508twfdoc / n the rail line VDD will N-type gold-oxygen semi-transistor% = When the electric protection device is in normal operation (ie, non-electrostatic discharge ^; 槿口^静^的闲罐') N-type MOS semi-transistor 304 is hunted to prevent leakage current. Not to pass 'even if in non-electrostatic discharge protection mode ^Ws, ing voltage), „„„ 3〇6 ^ component N-type MOS semi-transistor; mr, non-conducting 'to avoid leakage current. At this time, the high voltage of the electrostatic discharge from the solder pad 307 into the conductive path 303 can be regarded as floating, so that the p-type gold can be transmitted through the inside of the inverter 3〇9 without being affected by the heart of ν ==:=3 The Japanese body 3〇6c couples the south level signal to the gate of the Ν-type MOS transistor 304a to turn it on.虱 包 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日 日The transistor 305a can be designed as a gold oxide semi-transistor of a thin oxide layer or a gold-oxygen semi-electrode of a ruthenium emulsion layer according to the requirements of the oxygen user. The "Seat 3" example can be implemented using the G.18 (4) (1 t.3V) process. = The first voltage of the rail from the 3〇3 electrical connection is the same as the voltage connected to the soldering 307, then the width-to-length ratio (W/L) of the _ gold-oxide semi-transistor 306d 〇'· 4#m /〇.44# m, P type MOS transistor 306c width to length ratio 13 (S) 1345300 096001 23508hvf.doc / n (W / L) can be a long ratio (W / L) can be. (4) ^ type gold oxygen semi-electric The width of the crystal 305a is yjM曷j "m/〇44. <The area is much smaller than that of the P-type gold-oxygen semi-electrode gold-milk semi-transistor 305a, so that the N-type tilt-type gold-oxygen semi-transistor is interfering with N-counter oxygen. The semi- & recording process is not in addition, if the first: ^: r of the closed pole electric 遂. Brother - * conductive path 303 electrical 々 々 々 垫 307 307 electrically connected to the electricity = the younger brother - voltage and float It only needs to be smaller than the solder pad 307 ^ In the case of the court, the first voltage crystal 30 knows that the electric dust connected to the coin factory can be used to prevent the leakage current from being generated by the gate of the metal oxide half-electricity. - Real_Electrical discharge protection installed two pickups = pressure r' ΛΓ Figure 3C differs from Figure 3 在于 in the multi-Hong Kong, and 1 拴 gold oxide semi-transistor 304a gate voltage. Group 311 includes 3 mountains' of which type of gold oxide and semi-electricity The first and second sources of the crystal 311a are coupled to the input terminals of the system voltage rail VDD and the inverter 309, and the gate of the P 垔 gold-milk semiconductor 311a is coupled to the fourth conductive path 3ι. In the embodiment, the fourth conductive path M0 may be a second voltage line 'to provide a second voltage to the P-type MOS transistor, so that the P-type MOS transistor 311a is turned on. Therefore, in the non-electrostatic Under the discharge protection wedge type, the p-type MOS transistor 311a is turned on to provide a high-level signal to the input terminal of the reverse 303, and the gate voltage of the n-type MOS transistor is reduced. In another embodiment of the present invention, only one set of clamp voltage modules 311 can be used to clamp the gate voltage of the N-type MOS transistors 3 〇 4a. Free 1345300 096001 23508 twf.doc/n Example 3A The detection module 306 of the detection module includes a capacitor 401 and a resistor 4〇2, and the first end and the second end of the basin are connected to the first end of the first and second terminals, and the resistor 402 The second end is coupled to the first: the node in the module tear of 4〇2 is connected to the static electricity as described in the above embodiment FIG. 3A, two 304. Shi = 3, voltage mode ~- Kind; According to Figure 5A, the technical voltage touchdown includes N-type road and Ρ-type MOS semi-transistor view, wherein the cow = body 5 01, the first and second source / 汲 pole are connected to the electrostatic discharge prevention The crystal 501 has two conductive paths 302. The Ρ-type MOS transistor 5G2 and the immersion pole and the gate are respectively connected to the third guide hole 3〇3, the gate of the second source/body 501 and the second conductive path 3〇 2. 1 MOS semi-electrode crystal as described in the above embodiment FIG. 3A, FIG. 5B gives _ example of the voltage module 3 〇 5 of FIG. 3A, ', ' invention implementation map =, mask power _ group 305 includes N-type gold body ° ^ reference and resistance 5 〇 4. The first and the second ends of the N-type gold-oxygen semi-transistor 5〇3 are respectively coupled to the electrostatic discharge protection unit, the brother-source and the nuclear resistor 5〇4, and the N-type gold oxide half The gate of the transistor 503.仫 303 and worth mentioning that the above implementation of the static electricity is often == two, 疋J using p gold milk + transistor implementation, followed by 15 1345300 096001 23508twf.doc / n I =: an embodiment to have Usually, the knowledgeer can lightly calculate the electrostatic setting of the other embodiment of the invention. Referring to Figure 6A', the ESD protection device package = 604a, the detection module 606, and the pickup voltage module 6 remain. p :
=體,之第一、第二源級極分別轉接 J 路後601及第二導電路徑6〇2,用以 導電 下傳導靜電流於第-導電路經6()1盘第=防護模式 間。侧莫組606纖一導電路徑6〇1與㈡ ^0^.1 ^ ^t^ 606a;t ~6ν〇Γ: 及反相器606c。。 电阻606b,以 p型包括㈡金氧半電晶體咖,其中 型金氧半電二二分爾: 半電,605a之閘極轉接第三導電路徑二。且P型金乳 r出電放電之高電壓自焊墊607(例如:輸入焊墊咬者 入時’偵測模組_提供偏壓 = 曰曰體604a之閘極,使!>型 王虱午兒 =引靜電放電電流至第—導電路^日謝n充3 執線V=’㈣免”放電紋㈣核心電路奴 執後ί貫Ϊ例中,第三導電路徑_可以為—第—電壓 ^^第—電壓至Ρ型金氧半電晶體孤之問 護模式下,t電晶體6G5a導通。因此在非靜電放電防 、工 過‘通之P型金氧半電晶體 605a來拉高p 096001 23508twf.doc/i ,金氧半電晶體6〇4a之閘極電壓,藉以避免漏電流之= body, the first and second source-level poles are respectively transferred to the J-channel 601 and the second conductive path 6〇2, for conducting the static electricity under the conduction of the first-conductor circuit via the 6 () 1 disk = protection mode between. The side group 606 has a conductive path 6〇1 and (2) ^0^.1 ^ ^t^ 606a; t ~6ν〇Γ: and an inverter 606c. . The resistor 606b, in the p-type includes (2) a gold-oxygen semi-transistor coffee, wherein the type of gold-oxygen semi-electricity is two-half: semi-electric, and the gate of 605a is switched to the third conductive path two. And the P-type gold milk r discharges the high voltage self-welding pad 607 (for example: when the input pad bite into the 'detection module _ provides bias = the gate of the body 604a, so!> type Wang Haowu Children = lead electrostatic discharge current to the first - guide circuit ^ Xie n charge 3 line V = ' (four) free "discharge pattern (four) core circuit slave after the example, the third conductive path _ can be - the first voltage ^^第—voltage to Ρ-type MOS semi-transistor isolated mode, t transistor 6G5a is turned on. Therefore, in the non-electrostatic discharge prevention, work through the P-type MOS 605a to pull up p 096001 23508twf.doc/i, the gate voltage of the gold oxide semi-transistor 6〇4a, to avoid leakage current
生0 X 圖όΒ繪示為本發明之一實施例的靜電放電防護裝 。凊參照圖6A與圖6B,圖6B與圖6A*同之處在於多 =拴制電壓模組611拴制P型金氧半電晶體60知之閘 =電壓。栓制電壓模組611包括N型金氧半電晶體6仏, 二中N型金氧半電晶體611&之第一、第二源/汲極及閑極 =別輕接減贿VSS、反相^驗之輸人端及第四 V電路徑610。 在本實施例中,第四導電路徑610可以為一第二電壓 ,線’用以提供第二電壓至N型金氧半電晶體6Ua之間 =’使N型金氧半電晶體611a導通。因此在非靜電放電 方;蔓模式下’透過導通之N型金氧半電日日日體61U來提供 =準位信號至反相器606c之輸入端,進而拉高p型金氧半 =晶體604a之閘極電壓,使P型金氧半電晶體6〇知不導 、,以防止漏電流之發生。在本發明另一實施例中,可以 僅使用一組拴制電壓模組611來栓 60耗之閘極電壓。 、軋午L曰體 如上述實施例圖6A之說明,圖7繪示為本發明實施 J圖6A中偵測电壓模組606的另一種實施電路。靖參照 圖7,偵測模組包括電阻7〇1與電容7〇2,其中電阻 7〇1之第一端及第二端分別耦接第—導電路徑601及電容 702之第一端,電容702之第二端輛接第二導電路徑。 偵測模組606内的節點B耦接至靜電放電防護單元6〇4。 17 1345300 096001 23508twf. d〇c/n 如上迷貝施例圖6A之說明,圖 施例圖6A中检制電愿模組6〇 ='·、曰示為本發明實 照圖8A ’拾制電壓模組6〇5包 種實施電路。請參 以及N型金氧半電晶體驗二”電晶體801、 之、第二源/汲極分職接靜電放電防二半電晶體8〇1 -導電路# 6〇2。N型金氧半電 ^ 604及第 没極及閘極分別輕接第三導電路握 之苐-、第二源/ 體綱之閉極及第一導電路經6〇2工。、P型金氧半電晶 上述λ施例圖6A之說明,圖8B給 圖6A中拴制電壓模組605的另—錄:為本發明實施例 8B ’检制電壓模組6〇5包括八/知兒路。請參照圖 電阻804。p型金氧丰4日至虱半電晶體803、以及 隹乳牛電晶體8〇3之 ^ 別輕接靜電放電防護單元6〇4 〃 —、弟一源/沒極分Figure 0 shows an electrostatic discharge protection device according to an embodiment of the present invention. Referring to Fig. 6A and Fig. 6B, Fig. 6B is the same as Fig. 6A* in that the voltage of the P-type MOS transistor 611 is known to be the voltage of the P-type MOS transistor. The plug-in voltage module 611 includes an N-type MOS transistor 6 仏, a second N-type MOS transistor 611 & the first and second source / drain and idle pole = do not lightly accept bribes VSS, reverse The input end of the phase and the fourth V electrical path 610. In this embodiment, the fourth conductive path 610 may be a second voltage, and the line ' is used to provide a second voltage between the N-type MOS transistors 6Ua =' to turn on the N-type MOS transistor 611a. Therefore, in the non-electrostatic discharge mode; in the vine mode, 'passing through the N-type MOS half-day solar body 61U to provide the = level signal to the input end of the inverter 606c, and then pull up the p-type MOS half = crystal The gate voltage of 604a makes the P-type MOS transistor 6 unknown, so as to prevent leakage current. In another embodiment of the invention, only one set of clamp voltage modules 611 can be used to latch 60 gate voltages. As shown in FIG. 6A of the above embodiment, FIG. 7 illustrates another implementation circuit of the detection voltage module 606 of FIG. 6A. Referring to FIG. 7, the detecting module includes a resistor 7〇1 and a capacitor 7〇2, wherein the first end and the second end of the resistor 7〇1 are respectively coupled to the first conductive path 601 and the first end of the capacitor 702, and the capacitor The second end of the 702 is connected to the second conductive path. The node B in the detection module 606 is coupled to the electrostatic discharge protection unit 6〇4. 17 1345300 096001 23508twf. d〇c/n As shown in Fig. 6A, the example of Fig. 6A is used to detect the power module 6〇='·, which is shown in Fig. 8A. The voltage module 6〇5 is packaged to implement the circuit. Please refer to the N-type gold-oxygen semi-electron crystal experience two" transistor 801, the second source / bungee sub-electrostatic discharge anti-two-half transistor 8〇1-conductor circuit #6〇2. N-type gold oxygen The semi-electric ^ 604 and the first pole and the gate are respectively connected to the third-conductor circuit, the second source/body is closed, and the first-conductor circuit is 6-inch. P-type gold-oxygen semi-electric The above-mentioned λ embodiment is illustrated in FIG. 6A, and FIG. 8B is the other recording of the clamping voltage module 605 in FIG. 6A: in the embodiment 8B of the present invention, the detection voltage module 6〇5 includes an eight/chiel road. Refer to the diagram resistor 804. p-type gold oxide 4th to 虱 semi-transistor 803, and 隹 隹 电 电 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8 8
阻_之第-端與第二端分別麵接帛導=徑額,且電 型金氧半電晶體803之閘極。 —導笔路徑603及P 综上所述,本發明實施例之 栓制電壓模組來栓制具有靜電放電方護褒置為利用 體之閘極電壓,使具有靜電放電防護2能之金氧半電晶 不導通,以避免漏電流之發生。 月:之金氧半電晶體 下,亦能具有靜電放電防護功能之八斤靜電放電防護模式 靜電放電電流。 刀此之主氧半電晶體及時導引 雖然本發明已以較佳實施例揭露 限定本發明,任何所屬技術領域中 ^、、、、其並非用以 脫離本發明之精神和範圍内,當可作此^吊知識者,在不 田下二許之更動與潤飾, 18 1345300 096001 23508twfdoc/n ,此本發明之保護範圍當視後附 為準。 无了<甲印專利範圍所界定者 【圖式簡單說明】 敌電為以酿接地^金氧半電晶體所實施的靜電 表面觸發技術之靜電放電防護裝置。 方式不為圖2A之靜電放電防護裝置的另一種柄接 置。Θ A、e示為本發明之一貫施例的靜電放電防護裝 之另圖示為本發明實施例®3A巾靜電放電防護單元 種貫施電路。 置。 圖3C繪示為本發明之一實施例之靜電放電防護裝 麻圖4繪示為本發明實施例圖3A中偵測模組 戰Μ電路。 j" 但 圖5Α繪示為本發明實施例圖3Α中拴制電壓模组的 乃〜種實施電路。 、’、 圖繪示為本發明實施例圖3入中拴制電壓模袓 〜種實施電路。 、、、 置 置 固6Α纟會示為本發明之一實施例之靜電放電防護裝 圖6Β繪示為本發明之一實施例之靜電放電防護裝 1345300 096001 23508twf.doc/n 圖7繪示為本發明實施例圖6A中偵測模組的另一種 實施電路》 ’ 圖8A繪示為本發明實施例圖6A中栓制電壓模組的 • 另一種實施電路。 - 圖8B繪示為本發明實施例圖6A中栓制電壓模組的另 _ 一種實施電路。 【主要元件符號說明】 φ VDD:系統電壓軌線 VSS :接地電壓軌線 101、 201、209、307、607 :焊墊 102、 202 ' 308、608 :核心電路 103、 203、208b、304a、304b、304c、305a、306d、 501、503、611a、802 : N型金氧半電晶體The first end and the second end of the resistor _ are respectively connected to the = conduction = diameter, and the gate of the electric MOS transistor 803. - stylus path 603 and P. In summary, the voltage module of the embodiment of the present invention is used to bolt the electrostatic discharge protection device to the gate voltage of the utilization body, so as to have the electrostatic discharge protection The semi-electrode is not conducting to avoid leakage current. Month: Under the gold-oxygen semi-transistor, it can also have an electrostatic discharge protection function of eight kilograms of electrostatic discharge protection mode. The present invention has been described in terms of a preferred embodiment of the present invention. It is to be understood that the present invention is not limited to the spirit and scope of the present invention. For those who are interested in this work, there are two changes and retouchings in the field, 18 1345300 096001 23508twfdoc/n, the scope of protection of this invention is subject to the latter. Nothing is defined by the scope of the patent of A-print. [Simple description of the diagram] The enemy's electricity is an electrostatic discharge protection device based on the electrostatic surface triggering technology of the grounding metal oxide semiconductor. The mode is not another handle connection of the ESD protection device of Figure 2A. Θ A, e show another embodiment of the electrostatic discharge protection device of the present invention, which is an embodiment of the invention, the 3A towel electrostatic discharge protection unit. Set. FIG. 3C illustrates an electrostatic discharge protection device according to an embodiment of the present invention. FIG. 4 is a schematic diagram of the detection module of FIG. 3A according to an embodiment of the present invention. j" However, Fig. 5A shows an implementation circuit of the voltage module of Fig. 3 in the embodiment of the present invention. The figure is shown in FIG. 3 as an embodiment of the present invention. An electrostatic discharge protection device according to an embodiment of the present invention is shown in FIG. 6A, which is an electrostatic discharge protection device according to an embodiment of the present invention. 1345300 096001 23508 twf.doc/n FIG. EMBODIMENT OF THE INVENTION Another implementation circuit of the detection module of FIG. 6A is shown in FIG. 6A. FIG. 8A illustrates another embodiment of the embedding voltage module of FIG. 6A according to an embodiment of the present invention. - Figure 8B illustrates another embodiment of the embedding voltage module of Figure 6A in accordance with an embodiment of the present invention. [Description of main component symbols] φ VDD: system voltage rail VSS: ground voltage rail 101, 201, 209, 307, 607: pads 102, 202' 308, 608: core circuits 103, 203, 208b, 304a, 304b , 304c, 305a, 306d, 501, 503, 611a, 802: N-type gold oxide semi-transistor
208a、306c、311a、502、604a、605a、801、803 : P 型金氧半電晶體 206、306a、402、504、606b、701、804 ·•電阻 # 207、306b、401、606a、702 :電容 301、 601 :第一導電路徑 302、 602 :第二導電路徑 303、 603 :第三導電路徑 3〇4、6〇4 :靜電放電防護單元 305、 31卜605 ' 611 :栓制電壓模組 306、 606 :彳貞測模組 309、 606c :反相器 310、 610 :第四導電路徑 20208a, 306c, 311a, 502, 604a, 605a, 801, 803: P-type MOS transistors 206, 306a, 402, 504, 606b, 701, 804 · Resistors # 207, 306b, 401, 606a, 702: Capacitors 301, 601: first conductive paths 302, 602: second conductive paths 303, 603: third conductive paths 3〇4, 6〇4: electrostatic discharge protection units 305, 31 605 '611: plug voltage module 306, 606: detection module 309, 606c: inverter 310, 610: fourth conductive path 20
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