TWI344478B - - Google Patents
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- Publication number
- TWI344478B TWI344478B TW96101921A TW96101921A TWI344478B TW I344478 B TWI344478 B TW I344478B TW 96101921 A TW96101921 A TW 96101921A TW 96101921 A TW96101921 A TW 96101921A TW I344478 B TWI344478 B TW I344478B
- Authority
- TW
- Taiwan
- Prior art keywords
- resin solution
- cyclic cyclic
- weight
- novel resin
- monomer
- Prior art date
Links
- 239000010410 layer Substances 0.000 claims description 63
- 229920002120 photoresistant polymer Polymers 0.000 claims description 46
- 229920005989 resin Polymers 0.000 claims description 40
- 239000011347 resin Substances 0.000 claims description 40
- 239000011241 protective layer Substances 0.000 claims description 31
- 239000000758 substrate Substances 0.000 claims description 25
- 239000000203 mixture Substances 0.000 claims description 22
- 239000000178 monomer Substances 0.000 claims description 22
- 239000002904 solvent Substances 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 18
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 16
- 238000005530 etching Methods 0.000 claims description 15
- 238000001459 lithography Methods 0.000 claims description 14
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 13
- 229920000642 polymer Polymers 0.000 claims description 13
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 12
- 229920001568 phenolic resin Polymers 0.000 claims description 12
- 239000005011 phenolic resin Substances 0.000 claims description 12
- 239000000654 additive Substances 0.000 claims description 11
- 239000004094 surface-active agent Substances 0.000 claims description 11
- 230000000996 additive effect Effects 0.000 claims description 10
- HECLRDQVFMWTQS-UHFFFAOYSA-N Dicyclopentadiene Chemical compound C1C2C3CC=CC3C1C=C2 HECLRDQVFMWTQS-UHFFFAOYSA-N 0.000 claims description 7
- 230000001681 protective effect Effects 0.000 claims description 6
- 150000001925 cycloalkenes Chemical class 0.000 claims description 5
- -1 dicyclopentadienyl phenol Chemical compound 0.000 claims description 5
- 125000004122 cyclic group Chemical group 0.000 claims description 4
- 239000010680 novolac-type phenolic resin Substances 0.000 claims description 4
- 238000009835 boiling Methods 0.000 claims description 3
- 229920001577 copolymer Polymers 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 229920001296 polysiloxane Polymers 0.000 claims description 3
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 claims description 2
- 150000001336 alkenes Chemical class 0.000 claims description 2
- 125000002619 bicyclic group Chemical group 0.000 claims description 2
- 125000000392 cycloalkenyl group Chemical group 0.000 claims description 2
- 125000002950 monocyclic group Chemical group 0.000 claims description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims description 2
- 125000003367 polycyclic group Chemical group 0.000 claims description 2
- 229920003986 novolac Polymers 0.000 claims 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 2
- GNIJLZHYBVVHMA-UHFFFAOYSA-N 1-decoxypropan-2-ol Chemical compound CCCCCCCCCCOCC(C)O GNIJLZHYBVVHMA-UHFFFAOYSA-N 0.000 claims 1
- 239000013543 active substance Substances 0.000 claims 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 claims 1
- 230000005611 electricity Effects 0.000 claims 1
- 235000021419 vinegar Nutrition 0.000 claims 1
- 239000000052 vinegar Substances 0.000 claims 1
- 239000010408 film Substances 0.000 description 13
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 10
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 9
- 238000009472 formulation Methods 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- 239000000126 substance Substances 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000000354 decomposition reaction Methods 0.000 description 6
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 4
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 4
- 239000011265 semifinished product Substances 0.000 description 4
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 3
- 241000238631 Hexapoda Species 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- IXQBMTJJADIMOS-UHFFFAOYSA-N C(C)(=O)OC(COCCCCCCCCCC)C Chemical compound C(C)(=O)OC(COCCCCCCCCCC)C IXQBMTJJADIMOS-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000005266 side chain polymer Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- REMWXNDENMKZDS-UHFFFAOYSA-N 2-(2-hydroxypropoxy)propan-1-ol;propanoic acid Chemical compound CCC(O)=O.CC(O)COC(C)CO REMWXNDENMKZDS-UHFFFAOYSA-N 0.000 description 1
- UWSLPNWPRYFAMX-UHFFFAOYSA-N 9h-fluoren-9-yl acetate Chemical compound C1=CC=C2C(OC(=O)C)C3=CC=CC=C3C2=C1 UWSLPNWPRYFAMX-UHFFFAOYSA-N 0.000 description 1
- URTBROMWXOAVJQ-UHFFFAOYSA-N C(C)(=O)O.CNN.C(C(C)O)O Chemical compound C(C)(=O)O.CNN.C(C(C)O)O URTBROMWXOAVJQ-UHFFFAOYSA-N 0.000 description 1
- YWKSYOCTPDEBEM-UHFFFAOYSA-N C(C)(=O)OCC(OCC(C)OCCCCCCCCCC)C Chemical compound C(C)(=O)OCC(OCC(C)OCCCCCCCCCC)C YWKSYOCTPDEBEM-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 241000270708 Testudinidae Species 0.000 description 1
- DWYNIAJTSDVSMS-UHFFFAOYSA-N [Ru].[Bi] Chemical compound [Ru].[Bi] DWYNIAJTSDVSMS-UHFFFAOYSA-N 0.000 description 1
- TUVYSBJZBYRDHP-UHFFFAOYSA-N acetic acid;methoxymethane Chemical compound COC.CC(O)=O TUVYSBJZBYRDHP-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 210000004185 liver Anatomy 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical group CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000005289 physical deposition Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Landscapes
- Materials For Photolithography (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW96101921A TW200804499A (en) | 2007-01-18 | 2007-01-18 | A novel manufacturing process of two-sided lithography/etching and the composition of protection layer thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW96101921A TW200804499A (en) | 2007-01-18 | 2007-01-18 | A novel manufacturing process of two-sided lithography/etching and the composition of protection layer thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200804499A TW200804499A (en) | 2008-01-16 |
| TWI344478B true TWI344478B (cg-RX-API-DMAC7.html) | 2011-07-01 |
Family
ID=44765850
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW96101921A TW200804499A (en) | 2007-01-18 | 2007-01-18 | A novel manufacturing process of two-sided lithography/etching and the composition of protection layer thereof |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TW200804499A (cg-RX-API-DMAC7.html) |
-
2007
- 2007-01-18 TW TW96101921A patent/TW200804499A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW200804499A (en) | 2008-01-16 |
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