TWI333431B - Liquid material applying apparatus - Google Patents

Liquid material applying apparatus Download PDF

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Publication number
TWI333431B
TWI333431B TW096139447A TW96139447A TWI333431B TW I333431 B TWI333431 B TW I333431B TW 096139447 A TW096139447 A TW 096139447A TW 96139447 A TW96139447 A TW 96139447A TW I333431 B TWI333431 B TW I333431B
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Taiwan
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nozzle
nozzles
substrate
sub
movable
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TW096139447A
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Chinese (zh)
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TW200831194A (en
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Oze Hirokazu
Ueno Masatoshi
Yamamoto Satoshi
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Dainippon Screen Mfg
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges

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  • Engineering & Computer Science (AREA)
  • Coating Apparatus (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Signal Processing (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Electroluminescent Light Sources (AREA)

Description

1333431 九、發明說明: 【發明所屬之技術領域】 本發明係關於在基板塗佈流動性材料的塗佈裝置。 【先前技術】 習知,開發有利用有機EL(Electro Luminescence)材 料的有機EL顯示裝置,例如在製造使用高分子有機el材 料的主^矩陣驅動方式有機EL顯示裝置時’對玻璃基板 (以下簡稱「基板」),依序^成TFT(Thin Film 電路、形成作為陽極的iT0(Indiura Tin 〇xide)電極形 f隔間壁、塗佈含有正孔輸送材料的流動性材料(以下稱 「正孔輸送液」)、利用加熱處理形成正孔輸送層、塗佈 含有機EL材料的流動性材料(以下稱「有機乩液」)、利 用加熱處理形成有機以層、形成陰極、並且形成絕緣膜 而密封。 在製造有機EL顯示裝置時,將正孔輸送液或有機孔液 塗佈於基板上的裝置之一,已知有如日本專利特開 2002-75640號公報(文獻丨)及日本專利特開2〇〇3_ι〇755 號公報(文獻2)所揭示,藉由使連續喷出流動性材料的複 數喷嘴,相對於基板而朝主掃描方向與副掃描方向相對移 動,以在基板上的塗佈區域中將流動性材料塗佈為條紋狀 的裝置。 文獻1與文獻2的裝置,將分別含有紅色(R)、綠色(G)、 藍色(B)等互異顏色之3種有機EL材料的3種有機乩液, 從3支喷嘴中吐出,並塗佈於在基板上的塗佈适域中預先 3 UXP/發明說明書(補件)/97-01/96139447 6 丄功431 ,成之隔間壁間的3個溝渠中。該裝置中,3支噴嘴 構件而—體地保持,並在基板上以垂直支稽軸為中心 ^保持構件’而縮小3支喷嘴在副掃描方向上的間 ’藉此可縮小有機EL液的塗佈間距。 的㈣置’通常均由作業員的手動操作進行噴嘴 佈結果的確認亦是由作業員直接目視塗 ‘丁,因為頗難高精度地調整間距,因而在調整 ;必需耗費大量的作業時間及勞力。此外’當因喷嘴對伴 ==裝誤差與喷嘴製造誤差等因素,導致喷嘴間距 4㈣,便必須調整間距使其均勻,但是在 【、=,並未揭示任何使間距均勻化的調整機構。 本發明針對在基板上塗佈流動性 心高精度地㈣塗佈裝複財嘴的間㈣ ==具備有:基板保持部,其保持基板,·複 其朝上述基板連續吐出流動性 钹数賀f, 上述複數喷嘴,·主掃描:= 主掃描方向上,將上述複數嘴嘴與上的 對上述基板相對移動;副掃描機構,i在平n ’ -起 的上述主面且垂直於上述主掃播方向的副掃:二:基板 上述複數喷嘴與上述噴嘴安 輙描方向上,將 以及間距調整機構,其將上“时,· 外的其餘所有複數可動喷嘴,在上 =或除】個以 動,藉此調整在上述副掃描方;::向上個別移 鄰接之2個噴嘴間的 312XP/發明說明書(補件)/97-01/96139447 7 各距離;其中’上述間 其從上述副掃描方 ::二備有.噴嘴抵接部, 彈力機構,其從上、pH側抵接於各可動喷嘴;噴嘴 具從上述田彳知描方向之另一侧,f+ μ、+、々 喷嘴賦予朝上述喷嘴抿接部二 W對上述各可動 構,装丨 嘴抵接邛的彈力;以及抵接部移動機 噴嘴,㈣機構而賦予彈力的上述各可動 的位/:述噴嘴抵接部在上述副掃描方向上 H據本發明,可高精度地調整複數噴嘴的間距t 較佳實施形態中,利用上述噴嘴彈力機 ===嘴所施加的彈性力均呈1,與上述副掃描方 β的4各可動喷嘴之位置無關此 調整複數喷嘴的間距。 文-搰度地 -、本發明另—較佳實施形態中制上述主掃描機構與上 、述副掃描機構’使上述複數喷嘴與上述喷嘴安裝部獨立於 上述間距調整機構而移動。藉此,可將藉由主掃描機構盘 副掃描機構而移動的部位小型化。 /、 鲁t發明再另一實施形態中,上述間距調整機構更具備有 固定上述喷嘴安裝部的安裝部固定機構。藉此,可更高精 度地調整複數喷嘴的間距。 上述目的與其他目的、特徵、態樣及優點,參照所附圖 式’經由下述的本發明詳細說明便可清楚明瞭。 【實施方式】 圖1所示係本發明第1實施形態的塗佈裝置1之構造俯 視圖’圖2所示係塗佈裝置1的正視圖。塗佈裝置1係在 平面顯示裝置用玻璃基板(以下簡稱「基板」)9上,塗佈 312XP/發明說明書(補件)/97·01/96139447 8 丄 丄 素形成材料之流動性材料的裝置。本實施形態十, u 、置1在主動矩陣驅動式有機EL(Electr〇 ::一)顯示裝置用基板9上,塗佈含有像素形成 (以下稱「機右1L材料及溶劑(例如均三甲苯)的流動性材料 、乂下稱「有機EL液」)。 持ST,’塗佈裝置1具備有:保持基板9的基板保 機構(未板保持部11之内部具有使用加熱器的加熱 :構^圖不)。又,塗佈裝置1如圖1與圖2所示,且備 主面機構12,其將基板保持部11相對於基板9 掃既定方向(即圖1中的Y方向,以下稱「副 軸 」)上水千移動’且以朝垂直方向(即Ζ方向)的 軸為中心旋轉;對準標記檢測部13,其拍攝並檢判在美 板9上所形成的對準標 、j攝並檢測在基 其柘保i主对η 7半铩。己(未圖不),塗佈頭14,其係朝 Ε土L πΛ上的基板9,從4支喷嘴17連續吐出有機 飞、β出機構;塗佈頭移動機 9主面且垂直於s,丨搞> +丄 丹在十订於基板1333431 IX. Description of the Invention: TECHNICAL FIELD OF THE INVENTION The present invention relates to a coating apparatus for applying a fluid material to a substrate. [Prior Art] It is known to develop an organic EL display device using an organic EL (Electro Luminescence) material, for example, when manufacturing a main-matrix driving type organic EL display device using a polymer organic EL material. "Substrate"), in order to form a TFT (Thin Film circuit, iT0 (Indiura Tin idexide) electrode-shaped b partition wall as an anode, and a fluid material containing a positive hole transport material (hereinafter referred to as "a positive hole") The transport liquid ") is formed by a heat treatment to form a positive hole transport layer, a fluid material containing an organic EL material (hereinafter referred to as "organic liquid sputum"), an organic layer by heat treatment, a cathode, and an insulating film. In the case of manufacturing an organic EL display device, one of the devices for applying a positive hole transport liquid or an organic liquid liquid to a substrate is known, for example, in Japanese Patent Laid-Open Publication No. 2002-75640 (Document No.) and Japanese Patent Laid-Open 2 〇〇 3_ι〇755 (Document 2) discloses that a plurality of nozzles continuously ejecting a fluid material are directed toward a main scanning direction and a sub-scanning direction with respect to a substrate For moving, the fluid material is applied as a stripe device in the coating area on the substrate. The devices of Documents 1 and 2 will contain red (R), green (G), and blue (B), respectively. Three kinds of organic sputum of three kinds of organic EL materials, which are mutually different colors, are discharged from three nozzles and applied to the coating field on the substrate. 3 UXP/Invention Manual (Supplement)/97- 01/96139447 6 丄 431, which is formed in three ditches between the partition walls. In this device, three nozzle members are held in a body-like manner, and the member is held on the substrate with a vertical axis. The gap between the three nozzles in the sub-scanning direction is reduced, thereby reducing the coating pitch of the organic EL liquid. (4) "The confirmation of the nozzle cloth result by the manual operation of the operator is also directly visually applied by the operator. 'Ding, because it is difficult to adjust the pitch with high precision, it is adjusted; it takes a lot of work time and labor. In addition, when the nozzle spacing is 4 (four) due to factors such as nozzle pairing == loading error and nozzle manufacturing error, it is necessary to Adjust the spacing to make it even, but in [, =, and The present invention relates to an adjustment mechanism for uniformizing the pitch. The present invention is directed to coating a fluid core on a substrate with high precision (IV) between the coating and the filling chamber. (4) == provided with a substrate holding portion for holding the substrate, and The fluidity is continuously discharged toward the substrate, and the plurality of nozzles are scanned in the main scanning direction. The plurality of nozzles are moved relative to the substrate, and the sub-scanning mechanism is i-flat. The primary surface of the main surface and perpendicular to the main sweeping direction: two: the plurality of nozzles of the substrate and the nozzle in the direction of the scanning, and the spacing adjustment mechanism, which will be all the other plurals The movable nozzle is adjusted on the above-mentioned sub-scanning side by the upper or the second movement;:: 312XP/invention specification (supplement)/97-01/96139447 7 between the two adjacent nozzles The distance between the above-mentioned sub-scanning side:: two nozzles; the nozzle abutting portion, the elastic mechanism, which abuts the movable nozzles from the upper side and the pH side; the nozzle has the other direction from the above-mentioned field One side, f+ μ, +, 々 The nozzles are provided with the elastic force of the nozzle splicing portion W to the respective movable structures, and the nozzles are abutted against the cymbal; and the abutting portion moves the nozzle, and the fourth movable position that imparts an elastic force to the nozzle is: In the sub-scanning direction, according to the present invention, the pitch t of the plurality of nozzles can be adjusted with high precision. In the preferred embodiment, the elastic force applied by the nozzle elastic machine === is 1 and the sub-scanning The position of each of the four movable nozzles of the square β is independent of the pitch of the plurality of nozzles. In the preferred embodiment of the present invention, the main scanning mechanism and the sub-scanning mechanism are configured to move the plurality of nozzles and the nozzle mounting portion independently of the pitch adjusting mechanism. Thereby, the portion moved by the main scanning mechanism disk sub-scanning mechanism can be miniaturized. Further, in another embodiment of the invention, the pitch adjusting mechanism further includes a mounting portion fixing mechanism that fixes the nozzle mounting portion. Thereby, the pitch of the plurality of nozzles can be adjusted with higher precision. The above and other objects, features, aspects and advantages of the invention will be apparent from [Embodiment] Fig. 1 is a plan view showing a structure of a coating apparatus 1 according to a first embodiment of the present invention. The coating apparatus 1 is a device for coating a fluid material of a halogen-forming material on a glass substrate for a flat display device (hereinafter referred to as "substrate") 9 and a coating material of 312XP/invention specification (supplement)/97·01/96139447 8 . In the tenth embodiment, u and the first substrate are formed on the substrate 9 of the active matrix-driven organic EL (Electr®: Display) display device (hereinafter referred to as "the right 1 L material and the solvent (for example, mesitylene). The liquid material is called "organic EL liquid". ST is applied, and the coating apparatus 1 is provided with a substrate holding mechanism for holding the substrate 9 (heating using a heater inside the non-plate holding portion 11 is not shown). Further, as shown in FIGS. 1 and 2, the coating apparatus 1 has a main surface mechanism 12 that sweeps the substrate holding portion 11 in a predetermined direction with respect to the substrate 9 (that is, the Y direction in FIG. 1, hereinafter referred to as "sub-axis". The upper water moves 'and rotates centering on the axis in the vertical direction (ie, the Ζ direction); the alignment mark detecting portion 13 photographs and detects the alignment mark formed on the US board 9, and detects and detects In the base of the 柘 柘 i i main η 铩 7 half 铩. The coating head 14 is attached to the substrate 9 on the alumina L π ,, and the organic flying and β-out mechanism are continuously discharged from the four nozzles 17; the main surface of the coating head moving machine 9 is perpendicular to s , 丨 & > + 丄 在 in ten on the substrate

方向的X方向:,方「向主的播:向(即圖1中,垂直於Y 個受液部16’其相對於主掃描方向而設置 ;土板保持邛Η之二側,接受來自争 液。塗佈裝晋〗击目 筏又來自塗佈頭14的有機乩 頭“的4支嘴嘴更;;=门流^材料供應部,其對塗佈 其控制該等構造/應同一種有機^液,·以及控制部, 控制部與通常的電腦相同,由執行各種運算處 CPlU’lt所執行之程式並成為運算處理之作業區域的 312XP/發明說明書(補件)/97_〇1/96U9447 9 RAM、§己憶有基本程式p 對作業者顯示各種資 =㈣各種資訊的固定式磁碟、 等相連接而構成。圖3所的顯:器、及鍵盤、滑鼠等輪入部 程式執行運曾卢 藉由控制部2的CPU等依照 m s 3 ψ 处理而實現之功能以及其他構造的方塊 =P等::檢測部 =:4所實現的功能。另外,該等功能亦可由複數 二=:頭:4:直 ^ ,φή, v )略呈直線狀隔開排列,且些微偏移圖 鄭的2去哈^即副Γ描方向)而配置。本實施形態中,相 . 嘴17間在副掃描方向上的距離,調整為等於 的塗佈區域91(圖1中由虛線所圍繞的 ^ ,且朝主掃描方向延伸的隔間壁間之間距(以下稱 隔間壁間距」)的3倍距離。關於喷嘴17間的距 方法,請容後述。 $ 圖4與圖5分別為塗佈頭14的正視圖與俯視圖。如圖 4與圖5所示’塗佈頭14具備有:4支喷嘴,其朝基板 9(參照圖1)連續吐出有機此液(以下當分別說明*支噴 嘴時,從(-X)侧起依序稱「第丨噴嘴17a」、「第2喷嘴 !7b」、「第3喷嘴17c」、「第4喷嘴17d」);以及喷嘴安 裝部14卜用以安裝該4支喷嘴。噴嘴安裝部141具備有·· 略垂直於γ方向的背板部1411與固定於背板部1411下端 處(即(-Z)側的端部)且略垂直於z方向的水平部1412。 在喷嘴安裝部141的水平部1412上,形成有從(_γ)侧 312ΧΡ/發明說明書(補件)/97-01/96139447 丄 的邊緣朝(+Y)方向(即副掃插方向)延伸的 142,在該3個導引溝142中,分別安裝有第^喷嘴^ 第2喷嘴17b、及第4喷嘴nd。第ι喷嘴17&、 嘴m、及第4喷嘴17d分別具備有:從前端吐出噴 液的略圓柱狀噴嘴本體m、及垂直安裝於喷嘴本體 上的板狀滑件172。該滑件172料於設置在嘴嘴安 141之導引溝142内的滑件保持部143上,且可沿該導。 溝142移動。依此,塗佈頭14中,第i喷嘴⑺ 喷f 17b及第4喷嘴17d形成為可在副掃描方向上 移動的可動嘴嘴。 』 在第1喷嘴17a的(-X)側,設置有鎖定第1噴嘴17 滑件172相對於噴嘴安裝部141之位置的噴嘴鎖定部 173a ’並在第1喷嘴17a的㈠)侧,設置防止第工噴嘴 17a之滑件172從導引溝142中彈起的導板144。喷嘴鎖 定部173a具備有:固定構件簡,當滑件m的位置鎖 定時,抵接於滑件172之上面(即(+z)側的主面);以及按 押部1732,藉由將固定構件1731朝滑件172按押,而對 滑件172賦予朝喷嘴安裝部141的滑件保持部143之彈 力。 圖6所示係喷嘴鎖定部17 3 a附近的放大左侧視圖。圖 6中’為求圖式易於理解,省略位於噴嘴鎖定部i73a深 度側的第1喷嘴17a。如圖5與圖6所示,在喷嘴安裝部 141的背板部1411上’固定有從該背板部1411朝(_¥)方 向突出的柱塞1413 ’而柱塞1413靠(-Y)側的前端處抵接 312XP/發明說明書(補件)/97-Gl觸139447 11 於固定構件1731。 •广圖6所示,®定構件mi具備有:靠⑼侧之側面 、 j接有柱塞1413的略長方體狀固定構件本體1733、以 •=固疋構件本體1733靠(_γ)側之側面朝㈠)側突出的 17f屋筹部1734 °此外’固定構件mi在固定構件本體 3的下面(即Λ (_z)侧之—面),具備有分別^置於柱 土 1413附近、及遠離柱塞1413之部位(即(+γ)側盥(?) 鲁侧)的第1突起部1735與第2突起部1736。第2突起部 1736如圖4至圖6所不’為在第j喷嘴17a的滑件172(參 …、圖4)上方朝導引溝142(參照圖5)略平行延伸的線狀突 起部,而第i突起部1735則為在固定構件本體1733下面 於^方向上在遠離第!喷嘴17a之部位(即(_χ)側)角落處 .所叹置的點狀突起部。第j突起部Π35下端部僅些微離 開該噴嘴安裝部141的水平部1412上面。 ^押部1732具備有:2個螺栓1737,其朝2方向貫通 鲁,定構件1731的固定構件本體1733,且固定於喷嘴安裝 部141的水平部1412;以及2個彈性構件1 738(本實施形 態中為線圈彈簧),分別設置於2個螺栓1737的各個頭部 與固定構件本體1 733上面之間。螺栓1737插入於固定構 件本體1733中所形成的貫通孔中,且螺栓丨737的外侧面 離開該貫通孔的内侧面。 於噴嘴鎖定部173a,利用壓縮狀態的彈性構件1738, 將固定構件1731朝第1喷嘴i7a的滑件172(參照圖4) 按押。藉此,固定構件1731的第2突起部1 736 ,在z方 312XP/發明說明書(補件)/97-01/96139447 12 1333431 2上抵接在位於與噴嘴安裝部141的水平部1412上面相 4位置處的滑件172上面,藉由對該滑件m賦予朝滑件 保持部143(參照圖4)的彈力,鎖定滑件172對喷嘴安裝 P 141的位置(即第!喷嘴17a相對於嘴嘴安裝部 固定)。 喷嘴敍部173a中,藉由固㈣件1731的屋筹部1734 被朝⑽方向上舉,而如圖6中的二點鏈線所示,固定構 件1731以與柱塞1413前端部的接觸部為支點 :上如的彈性構鑛而呈些微傾斜。依此,藉由以: 喷嘴安裝部141(的柱塞1413)接觸的支點為中心,固定構 件1731朝遠離滑件172的方向傾斜’固定 2突起部⑽離開滑件⑺,而解除滑件172的位= 定。喷嘴較部ma中,μ構件1731在_滑件172 的狀態下可能些微朝(-Χ)側傾斜,但藉由第丨突起部 抵接於喷嘴安裝部141的水平部1412,可防止固定 1731出現過度傾斜的情形。 如圖4與圖5所示,塗佈頭14中,在第2喷嘴爪盥 第4喷嘴i7d靠⑼側,分別設置有與上述噴嘴鎖定部 173a相同構造的嘴嘴鎖定部173b、173d,且在第嘴 17b與第4喷嘴17(1之#㈤侧分別設置導板丨仏塗 頭14中,藉由解除由喷嘴鎖定部173a、17扑、17%八 對第1喷嘴i7a、第2喷嘴17b及第4噴嘴m之各^ 件Π2的較狀態,該等3支可動嘴嘴可分別朝副掃描^ 向各自移動。 312XP/發明說明書(補件)/97_〇 1/96】39447 13 1333431 141从方面第3喷嘴】7c不可移動地固定於嘴嘴容# •=:=。換言之,…將 .17a、第2 W 7所有喷嘴,即可動嘴嘴(第1噴嘴 嘴安麥部⑷1ΓΓ第4喷嘴17d) ’安裝為可相對於嗔 miM41而個別朝副掃財向移動 、贺 …如後述在調整噴嘴位置時,以第3噴二塗佈裝置 基準’調整其他3支可動喷嘴的位置。 C立置為 塗佈裝置丨t,4支喷嘴17在固 二:照圖4與圖5)的狀態下, 移:: =於塗佈頭14連續吐出有機EL液的情況下移= 知描方向移動’ f㈣頭14朝主掃描 :利用基板移動機構12將基板9朝副掃描方 =然後,藉由喷嘴17重複對基板9朝 = =::T在基板9上卿塗佈有二: =2 “ 移動機構15與基板移動機構12分 別成為將4支喷嘴17與喷嘴安裝部141,一起 向與副掃描方向相對移動的主掃描朗與副 如圖1與圖2所示,塗佈*置i更具備有:間距調整機 構3’其藉由將複數可動喷嘴(即第1噴嘴17a、第2噴嘴 Hb、及第4喷嘴17d)朝副掃描方向分別移動,而調整在 副掃描方向上相鄰接之2個噴嘴間的各距離(以下稱「喷 嘴間距離」);噴嘴位置檢測部4,其檢測噴嘴17在副掃 描方向上的位置;以及鎖定部操作機構5,其#由操縱嘴 312XP/發明說明書(補件)/97·〇ι/96139447 14 1333431 ’而執行可動噴嘴的滑件⑺ 部2而鎖疋之解除;該等構造亦藉由圖3所示控制 塗佈裝置1中’間距調整機構 鎖定部操作機構5與塗佈頭14 ^置才欢測。134及 之靠另 而6又置在塗佈頭14 “ 5) 支喷嘴17與噴嘴安裝部141(參照圖4 =),藉由塗佈頭移動機構15與基板移動機㈣,獨 構5 2調整機構3、喷嘴位置檢測部4及鎖定部操作機 構5而移動。換言之,間距調整機構3、喷嘴位置 4及鎖定部操作機構5,配置為獨立於塗佈頭14藉由㈣ 1移動機構15與基板移動機構12而相對於基板9的相對 移動。 -噴嘴位置檢測部4如圖2所示,具備有:光學系統41, 其配置於較複數喷嘴17更靠(+ζ)侧,並用於觀察該複數 噴嘴17;以及攝像部42[本實施形態中為CCD(Char找 癱Coupled Device)照相機],其藉由光學系統41依序取得 複數喷嘴17的影像。本實施形態中,以攝像部42在i支 可動喷嘴(即第1喷嘴17a、第2喷嘴17b及第4喷嘴I7d 中之任一喷嘴)之滑件172上面、及喷嘴安裝部141之水 平部1412(參照圖4與圖5)上面,拍攝該滑件172附近的 部位。 然後’利用控制部2的間距檢測部21 (參照圖3),從由 攝像部4 2所取得的3支可動喷嘴之影像中,根據在滑件 1 72與水平部1412雙方所設置之記號的位置關係,求取3 312XP/發明說明書(補件)/97-01/96139447 15 1333431 支可動嘴嘴相對於喷嘴安裝部141的相對位 各喷嘴間之距離。另外,塗佈裝置j中 二測出 172與水平部1412上$ w 並未必要在滑件 ^ u 置5己旒,亦可從滑件Π2之輪患 或水平部1412的導引溝142之輪廓 位的位置關係而檢測可動噴嘴的位^之中’根據特徵部 干鎖定:操作機構5的左側視圖。圖7並且圖 =頭二时嘴安裝部141其中一部分、及噴嘴鎖 3a。如圖7所示,鎖定部操作機構5具備有:使 干朝圖7中大概γ方向進退的氣壓紅52,以及其 二=安裝於連桿51 #⑻側之前端處的旋轉臂…旋 轉# 53在與連桿51相對向侧之端部,以在支柱Η 設置的旋轉軸55為中心’可旋轉地安裝於該支柱54上。 鎖定部操作機構5中,藉由氣壓紅52的連桿51朝 侧移動,旋轉臂53隨之以旋轉軸55為中心,朝圖7中的 :時針方向旋轉既定角度,而移動至二點鏈線所示位置 爽。藉此,在旋轉臂53靠支柱54側的端部處所設置的解 除部56’從(-Z)側抵接於噴嘴鎖定部n3a的固定構件 Π31之屋詹部1734上,而將屋詹部η%朝⑷)方向按 押’”。果固疋構件1731如圖7中的二點鏈線所示,以 與柱塞1413前端部相接觸部為支點產生傾斜,固定構件 Π31離開第!噴嘴17a的滑件172(參照圖4與圖5),而 解除滑件172的鎖定狀態。 再者,鎖疋部操作機構5中,藉由氣壓缸52的連桿Η 朝(-Υ)侧移動,旋轉臂53隨之離開喷嘴鎖定部17%的固 312XP/發明說明書(補件)/97·01/96139447 16 1333431 定構件173卜並返回原本的位置。藉此,該固定構件i73i 藉由按押部1732朝(-2)方向按押,而滑件172被賦予朝 '噴嘴安裝部141之水平部1412的彈力。結果,第i喷嘴 ,Ha的滑件172相對於噴嘴安裝部141的位置再度被鎖定。 塗佈裝置1中,藉由圖i與圖2所示的塗佈頭移動機構 15將塗佈頭14朝主掃描方向移動,使i支可動喷嘴(即 '圖4與圖5所示的第!喷嘴17a、第2喷嘴m及第*喷 鲁嘴17d中之任一喷嘴)位於鎖定部操作機構5的解除部 56(參照圖7)之靠(+Y)側,並在該狀態下,如上述般萨 由驅動鎖定部操作機構5,解除鎖定、或鎖定該丨: 喷嘴。 』動 •圖8與圖9所示分別為間距調整機構3與塗佈頭14 •俯視圖及左侧視圖。圖8中僅顯示塗佈頭丨4之其中—部 分’為求圖式易於理解’省略在圖4與圖5中所示的噴: 鎖疋部173a及導板144。圖9中,為求圖式易於理 •將喷嘴安裝部141與第1喷嘴17a的其中一部分:以包丄 第1喷嘴17a中心軸的截面表示,而圖8所示第!固=苦3 3Π之靠(-X)侧的第1抵接部3111,在圖9中省略之疋 如圖8與圖9所示,間距調整機構3具備有··安裴部古 定機構3卜其從(+γ)側與(_γ)側(即副掃描方向二1/固 接於喷嘴安裝部141的水平部1412,而固定噴嘴安⑨f 141,噴嘴抵接部3 2,其從(_ γ)侧(即副掃描方向其 Ρ 側)抵接於第1喷嘴17a ;喷嘴彈力機構33,其從嘴 接部32之相對向側(即第!喷嘴17a靠(+1〇側,亦即 312XP/發明說明書(補件)/97-01/96139447 \η 1333431 的另-側),對第,喷嘴17a賦予朝喷嘴抵接部32 .賦予彈力的第丨喷嘴17a所抵接之:嘴:接=機 在副掃描方向上調整其位置。 安裝部固錢構31中,在塗佈頭14靠(])侧具備有: 141 1412 ^ ^ ^ 將楚裝第固定部311的第1支樓部312、以及 撐部犯朝副掃描方向移動的第丨 固定部311具備有排列在主掃描方向上的2個 ==部3⑴,並在主掃描方向上該2個第丨抵接部 胃’將㈣抵接部32與抵接部移動機構3 於第1支撐部312上。 女裝 又’安裝部固定機構31中,在塗佈頭 有··由⑼側抵接於喷嘴安裝部141 = 3H^2;42315 固定部314具備有排列在主掃描方向上的2個毒 第2抵接部3⑷,並在主掃描方向上該2個第2抵接 314!之間,將後述喷嘴彈力機構33的連桿331及二 332安裝於第2支撐部315上。 虹 =部移動機構34具備有:測微儀34卜其抵接 喷嘴17a的滑件172上靠(-Υ)側之側面,且 接部32;以及步進馬達343,其隔著耗合器犯而盘= 儀341相連接。喷嘴彈力機構33具備有:連桿33; 312XP/發明說明書(補件)/97-01/96139447 18 1333431The X direction of the direction: the square "to the main broadcast: the direction (ie, in Figure 1, perpendicular to the Y liquid receiving portions 16' is set relative to the main scanning direction; the soil plate remains on the two sides of the raft, accepting the dispute The coating is loaded with the 〗 击 筏 and the organic hoe from the coating head 14 "4 nozzles more;; = door flow ^ material supply, which controls the construction of the same The control unit and the control unit are the same as the normal computer, and are executed by the program executed by the various calculation units CP1U'lt and become the operation area of the arithmetic processing 312XP/invention specification (supplement)/97_〇1 /96U9447 9 RAM, § Reminiscent of the basic program p for the operator to display a variety of resources = (four) various information on the fixed disk, isophase connection. Figure 3 shows: and the keyboard, mouse and other rounds The program executes the functions realized by the CPU of the control unit 2 in accordance with the processing of ms 3 以及 and the functions of the block = P, etc. of other structures: detection unit =: 4. In addition, the functions can also be The number two =: head: 4: straight ^, φ ή, v) are arranged in a straight line, and some micro-offset maps Zheng 2 go to the ha ^ Configured in the secondary scanning direction). In the present embodiment, the distance between the nozzles 17 in the sub-scanning direction is adjusted to be equal to the coating area 91 (the distance between the partition walls extending in the main scanning direction by the dotted line in Fig. 1) (3 times the distance between the partition walls). The distance between the nozzles 17 will be described later. Fig. 4 and Fig. 5 are front and top views, respectively, of the coating head 14. Fig. 4 and Fig. 5 The coating head 14 is provided with four nozzles that continuously discharge the organic liquid toward the substrate 9 (see FIG. 1) (hereinafter, when the * nozzles are respectively described, the "-X" side is sequentially referred to as "the first The nozzles 17a", "second nozzles! 7b", "third nozzles 17c", and "fourth nozzles 17d") and the nozzle mounting portion 14 are used to mount the four nozzles. The nozzle mounting portion 141 is provided with The back plate portion 1411 slightly perpendicular to the γ direction and the horizontal portion 1412 fixed at the lower end of the back plate portion 1411 (ie, the end on the (-Z) side) and slightly perpendicular to the z direction. At the horizontal portion 1412 of the nozzle mounting portion 141 Upper side is formed from (_γ) side 312ΧΡ/invention specification (supplement)/97-01/96139447 丄 edge toward (+Y) direction (ie, sub-sweeping side In the extended guide 142, the second nozzle 17b and the fourth nozzle nd are respectively attached to the three guide grooves 142. The first nozzle 17&, the nozzle m, and the fourth nozzle 17d are respectively provided with a slightly cylindrical nozzle body m for discharging a liquid discharge from the front end, and a plate-shaped slider 172 vertically mounted on the nozzle body. The slider 172 is intended to be held by a slider provided in the guide groove 142 of the nozzle 141. The portion 143 is movable along the guide groove 142. Accordingly, in the coating head 14, the i-th nozzle (7) spray f 17b and the fourth nozzle 17d are formed as movable nozzles that are movable in the sub-scanning direction. On the (-X) side of the first nozzle 17a, a nozzle lock portion 173a' that locks the position of the first nozzle 17 of the slider 172 with respect to the nozzle attachment portion 141 is provided, and is provided on the (one) side of the first nozzle 17a. The slider 172 of the nozzle 17a is guided from the guide groove 142. The nozzle lock portion 173a is provided with a fixing member which is abutted on the upper surface of the slider 172 (i.e., the main surface on the (+z) side) when the position of the slider m is locked, and the pressing portion 1732 by being fixed The member 1731 is pressed toward the slider 172, and the slider 172 is biased toward the slider holding portion 143 of the nozzle mounting portion 141. Fig. 6 is an enlarged left side view showing the vicinity of the nozzle lock portion 17 3 a. In Fig. 6, 'the drawing is easy to understand, and the first nozzle 17a located on the depth side of the nozzle locking portion i73a is omitted. As shown in FIG. 5 and FIG. 6, the plunger 1413' protruding from the back plate portion 1411 toward the (_¥) direction is fixed to the back plate portion 1411 of the nozzle mounting portion 141, and the plunger 1413 is closed (-Y). The front end of the side abuts the 312XP/invention specification (supplement)/97-Gl touch 139447 11 on the fixing member 1731. In the wide view 6, the fixed member mi is provided with a side surface on the (9) side, a substantially rectangular parallelepiped fixing member body 1733 to which the plunger 1413 is attached, and a side on the (_γ) side of the solid body member 1733. The 17f housing part protruding toward the (1) side is 1734 °. In addition, the 'fixing member mi is located below the fixed member body 3 (ie, the side of the Λ (_z) side), and is disposed adjacent to the column soil 1413 and away from the column. The first protrusion 1735 and the second protrusion 1736 of the portion of the plug 1413 (that is, the (+γ) side 盥 (?) Lu side). As shown in FIGS. 4 to 6 , the second projection 1736 is a linear projection that extends slightly parallel to the guide groove 142 (see FIG. 5 ) above the slider 172 (see FIG. 4 ) of the j-th nozzle 17 a. The i-th protrusion 1735 is located away from the first in the ^ direction under the fixing member body 1733! The point where the nozzle 17a is located (ie, the side of the (_χ) side) is a point-like protrusion that is slanted. The lower end portion of the j-th projection portion 35 is slightly separated from the upper surface of the horizontal portion 1412 of the nozzle mounting portion 141. The holding portion 1732 is provided with two bolts 1737 that penetrate the fixing member main body 1733 of the fixed member 1731 in two directions, and are fixed to the horizontal portion 1412 of the nozzle mounting portion 141; and two elastic members 1 738 (this embodiment) In the form of a coil spring, they are respectively disposed between the respective heads of the two bolts 1737 and the upper surface of the fixed member body 1 733. The bolt 1737 is inserted into the through hole formed in the fixed member body 1733, and the outer side surface of the bolt 丨 737 is separated from the inner side surface of the through hole. In the nozzle lock portion 173a, the fixing member 1731 is pressed toward the slider 172 (see FIG. 4) of the first nozzle i7a by the elastic member 1738 in a compressed state. Thereby, the second protrusion 1 736 of the fixing member 1731 abuts on the upper side of the horizontal portion 1412 of the nozzle mounting portion 141 on the z-side 312XP/invention specification (supplement)/97-01/96139447 12 1333431 2 At the position of the slider 172 at the four positions, by the elastic force acting on the slider holding portion 143 (refer to FIG. 4) on the slider m, the position of the slider 172 to the nozzle mounting P 141 is locked (ie, the first nozzle 17a is opposed to The nozzle mouth is fixed.) In the nozzle description portion 173a, the housing portion 1734 of the solid member (4) is lifted in the (10) direction, and the fixing member 1731 is in contact with the front end portion of the plunger 1413 as indicated by the two-dot chain line in FIG. For the fulcrum: the slight elastic slope of the upper elastic ore. Accordingly, the fixing member 1731 is inclined toward the direction away from the slider 172 by the fulcrum which is in contact with the nozzle mounting portion 141 (the plunger 1413). The fixing 2 projection (10) is separated from the slider (7), and the slider 172 is released. Bit = fixed. In the nozzle portion ma, the μ member 1731 may be slightly inclined toward the (-Χ) side in the state of the slider 172, but the first projection portion abuts against the horizontal portion 1412 of the nozzle mounting portion 141 to prevent the fixing 1731. Excessive tilting. As shown in FIG. 4 and FIG. 5, in the coating head 14, the nozzle locking portions 173b and 173d having the same structure as the nozzle locking portion 173a are provided on the (9) side of the fourth nozzle claw 盥 fourth nozzle i7d, respectively, and In the first nozzle 17b and the fourth nozzle 17 (the #5 side of the first nozzle 17), a guide squeegee 14 is provided, and the nozzle lock portions 173a and 17 are released, and 17% of the first nozzles i7a and the second nozzle are released. The relative state of each of the 17b and the fourth nozzles m, the three movable nozzles are respectively movable toward the sub-scanning direction. 312XP/Invention Manual (supplement)/97_〇1/96] 39447 13 1333431 141 From the third nozzle] 7c is immovably fixed to the mouth and mouth #•=:=. In other words, ....17a, 2 W 7 all nozzles, that is, the mouthpiece (the first nozzle mouth Anmai (4) 1ΓΓ The fourth nozzle 17d)' is attached so as to be movable toward the sub-sweeping direction with respect to the 嗔miM41. When the nozzle position is adjusted as described later, the position of the other three movable nozzles is adjusted by the third spray coating device reference. C is set as the coating device 丨t, and the four nozzles 17 are in the state of solid two: according to FIG. 4 and FIG. 5), and are moved:: = continuously discharged in the coating head 14 In the case of the EL liquid, the movement is shifted to the direction of the drawing. The f (four) head 14 is directed toward the main scanning: the substrate 9 is moved toward the sub-scanning side by the substrate moving mechanism 12. Then, the substrate 9 is repeated by the nozzle 17 toward ==::T. The substrate 9 is coated with two: = 2 "The moving mechanism 15 and the substrate moving mechanism 12 respectively become the main scanning ridges and the sub-movements that move the four nozzles 17 and the nozzle mounting portion 141 in the sub-scanning direction, respectively. As shown in Fig. 2, the coating * is further provided with a pitch adjusting mechanism 3' for respectively moving the plurality of movable nozzles (i.e., the first nozzle 17a, the second nozzle Hb, and the fourth nozzle 17d) in the sub-scanning direction Moving, adjusting the distance between two nozzles adjacent to each other in the sub-scanning direction (hereinafter referred to as "inter-nozzle distance"); the nozzle position detecting portion 4 detecting the position of the nozzle 17 in the sub-scanning direction; and locking The operating mechanism 5, which is operated by the operating nozzle 312XP/invention specification (supplement)/97·〇ι/96139447 14 1333431', performs the release of the slider (7) portion 2 of the movable nozzle; FIG. 3 shows the control mechanism of the "pitch adjustment mechanism locking portion" in the control coating device 1. 5 and the coating head 14 ^ is set to be happy. 134 and the other 6 are placed on the coating head 14 "5) the nozzle nozzle 17 and the nozzle mounting portion 141 (refer to FIG. 4 =), by the coating head moving mechanism 15 and the substrate moving machine (four), the unique structure 5 2 The adjustment mechanism 3, the nozzle position detecting unit 4, and the locking portion operating mechanism 5 are moved. In other words, the pitch adjusting mechanism 3, the nozzle position 4, and the locking portion operating mechanism 5 are disposed independently of the coating head 14 by the (four) 1 moving mechanism 15 The relative movement of the substrate moving mechanism 12 with respect to the substrate 9. The nozzle position detecting unit 4 is provided with an optical system 41 disposed on the (+ζ) side of the plurality of nozzles 17 as shown in Fig. 2, and is used for The plurality of nozzles 17 and the imaging unit 42 (in the present embodiment, a CCD (Char Located Device) camera) are observed, and the image of the plurality of nozzles 17 is sequentially acquired by the optical system 41. In the present embodiment, the imaging unit is used. 42 is on the upper surface of the slider 172 of the i-movable nozzle (that is, one of the first nozzle 17a, the second nozzle 17b, and the fourth nozzle I7d) and the horizontal portion 1412 of the nozzle mounting portion 141 (refer to FIGS. 4 and 5). Above, the portion near the slider 172 is photographed. Then, the control unit 2 is utilized. The pitch detecting unit 21 (see FIG. 3) obtains the positional relationship between the three sets of movable nozzles acquired by the imaging unit 42 based on the positional relationship between the sliders 72 and the horizontal portion 1412. 312XP/Invention Manual (Supplement)/97-01/96139447 15 1333431 The distance between the nozzles of the movable nozzles relative to the nozzle mounting portion 141. In addition, the coating device j detects 172 and the horizontal portion 1412. It is not necessary to set the movable nozzle to the position of the movable nozzle from the positional relationship of the contour of the guide groove 142 of the slider Π2 or the guide groove 142 of the horizontal portion 1412. According to the characteristic dry lock: the left side view of the operating mechanism 5. Fig. 7 and Fig. = a part of the mouth mounting portion 141 of the first two, and the nozzle lock 3a. As shown in Fig. 7, the locking portion operating mechanism 5 is provided with: In Fig. 7, the air pressure red 52 which advances and retreats in the γ direction, and the second = the rotary arm which is attached to the front end of the link 51 #(8) side, the rotation #53 is at the end opposite to the link 51, to be in the pillar Η The rotating shaft 55 is centrally rotatably mounted on the post 54. The locking portion operating machine 5, the link 51 of the air pressure red 52 is moved to the side, and the rotary arm 53 is rotated about the rotation axis 55, and is rotated to a predetermined angle in the hour hand direction in FIG. 7, and moved to the position shown by the two-dot chain line. In this way, the releasing portion 56' provided at the end portion of the rotating arm 53 on the side of the stay 54 abuts on the (-Z) side of the fixing member Π 31 of the nozzle locking portion n3a, and the house is fixed. Zhan's η% is in the direction of (4)). As shown by the two-dot chain line in Fig. 7, the female solid member 1731 is inclined at a contact point with the tip end portion of the plunger 1413, and the fixing member Π 31 is separated from the first! The slider 172 of the nozzle 17a (see Figs. 4 and 5) releases the locked state of the slider 172. Further, in the lock portion operation mechanism 5, the link Η of the pneumatic cylinder 52 is moved toward the (-Υ) side, and the rotary arm 53 is separated from the nozzle lock portion by 17% of the solid 312XP/invention specification (supplement)/ 97·01/96139447 16 1333431 Set the member 173 and return to the original position. Thereby, the fixing member i73i is pushed in the (-2) direction by the pressing portion 1732, and the slider 172 is given an elastic force toward the horizontal portion 1412 of the "nozzle mounting portion 141". As a result, the position of the slider 172 of the i-th nozzle, Ha is locked again with respect to the position of the nozzle mounting portion 141. In the coating device 1, the coating head 14 is moved in the main scanning direction by the coating head moving mechanism 15 shown in FIGS. i and 2, so that the i-movable nozzle (ie, the first shown in FIG. 4 and FIG. 5) The nozzle 17a, the second nozzle m, and the nozzle No. 17d are located on the (+Y) side of the releasing portion 56 (see FIG. 7) of the lock portion operating mechanism 5, and in this state, As described above, the lock mechanism operating mechanism 5 is driven to unlock or lock the nozzle: the nozzle. 』Actions Fig. 8 and Fig. 9 show the pitch adjustment mechanism 3 and the coating head 14 respectively: a plan view and a left side view. Only the portion - of the coating head 4 is shown in Fig. 8 as being easy to understand for the drawing. The spraying shown in Figs. 4 and 5 is omitted: the locking portion 173a and the guide 144. In Fig. 9, in order to facilitate the drawing, the nozzle mounting portion 141 and a part of the first nozzle 17a are represented by a cross section of the central axis of the first nozzle 17a, and the figure shown in Fig. 8 is shown! The first abutting portion 3111 on the side of the solid (=X) is omitted, as shown in Fig. 8 and Fig. 9, and the pitch adjusting mechanism 3 is provided with an ancient body of the ampoule 3, from the (+γ) side and the (_γ) side (that is, the sub-scanning direction 1/2 is fixed to the horizontal portion 1412 of the nozzle mounting portion 141, and the nozzle abutting portion 9f 141, the nozzle abutting portion 3 2 is removed from The (_γ) side (i.e., the side in the sub-scanning direction) abuts against the first nozzle 17a, and the nozzle elastic mechanism 33 is located from the opposite side of the nozzle portion 32 (i.e., the first nozzle 17a (+1〇 side, That is, the 312XP/invention specification (supplement)/97-01/96139447 \n 1333431 on the other side), the nozzle 17a is given to the nozzle abutting portion 32. The elastic nozzle 11a is abutted: Mouth: The machine adjusts its position in the sub-scanning direction. The mounting portion of the solid structure 31 is provided on the (]) side of the coating head 14: 141 1412 ^ ^ ^ The first of the first fixing portion 311 The branch portion 312 and the second fixed portion 311 that moves in the sub-scanning direction are provided with two == portions 3 (1) arranged in the main scanning direction, and the two second abutting portions in the main scanning direction Stomach 'will (four) arrived The portion 32 and the abutting portion moving mechanism 3 are on the first supporting portion 312. In the women's clothing, the mounting portion fixing mechanism 31 has a coating head that is abutted against the nozzle mounting portion 141 = 3H^2 by the (9) side; 42315 The fixing portion 314 includes two poisonous second abutting portions 3 (4) arranged in the main scanning direction, and between the two second abutting portions 314 in the main scanning direction, a connecting rod of the nozzle elastic mechanism 33 to be described later is provided. The 331 and the second 332 are attached to the second support portion 315. The rainbow/portion moving mechanism 34 is provided with a side surface on the (-Υ) side of the slider 172 of the micrometer 34 that abuts the nozzle 17a, and the joint portion 32 And a stepping motor 343 connected to the disc = meter 341 via a consumable. The nozzle elastic mechanism 33 is provided with: a link 33; 312XP / invention manual (supplement) / 97-01/96139447 18 1333431

隔著形成在喷嘴安裝部141的背板部1411中的貫通孔, 抵接於第1噴嘴17a的滑件172上靠(+γ)侧之側面;氣壓 缸332 ’其將連桿331朝滑件172按押;以及調節器犯3, 其連接於氣壓缸332並控制氣壓缸332内的壓力。 間距調整機構3中,控制部2的調整機構控制部22(參 ”、、圖3)驅動安裝部固定機構31的第1移動機構gig及第 2移動機構316’藉此將第1支撐部312朝(+γ)方向移動, 並將第2支樓部315朝(—γ)方向移動。藉此,第1固定部 3—11與第2固定部314分別從(_γ)側與(+γ)側抵接於喷嘴 安裝部141的水平部1412,而喷嘴安裝部141由第丨、固 定部311與第2固定部314包夾並固定。 間距調整機構3中,在喷嘴安裝部141呈固定的狀態 下,藉由調整機構控制部22驅動抵接部移動機構34的^ 進馬達343及喷嘴彈力機構33的氣壓缸332,而噴嘴抵 接部32與喷嘴彈力機構33的連桿331分別從(_γ)側與 (+Υ)侧抵接於第i噴嘴17a。然後’以抵接部移動機構3: 將喷嘴抵接部32朝(+γ)方向移動,藉此第丨喷嘴17&在 藉由噴嘴彈力機構33而對喷嘴抵接部32賦予彈力之 下’朝(+Y)方向移動。 “ :寺1嘴彈力機構—.〜一__力 與連桿331對氣壓缸332的相對位置無關,均利用調節器 333維持為-定,因而藉由喷嘴彈力機構33對第}喷嘴 17a所施加的彈性力,亦與副掃描方向上第丨喷嘴1。的 位置無關,而呈—定之狀態。另外,移動第1㈣17a之 3發明說明書(補件)/97-01/96139447 13J3431 際,預先解除第 定。 喷嘴鎖定部173a(參照圖4至圖6)的鎖 僅=二」將嘴嘴抵接部32從既定移動開始位置 置。萬-第1噴二7方=動’而調整第1噴嘴173的位 赁觜17a移動至較所需位置更靠 ==抵接部32重返移動開始位置靠= =32返二調整第丨嘴㈣的位置巧嗔嘴抵 彈力機Μ Μ動開始位置時,第1喷嘴❿亦藉由噴嘴 彈力機:3賦予喷嘴抵接部32的彈力,而 : 起相⑼方向移動。依此,藉由僅將第丨嘴嘴Η: 背二==:可防止因間距調整機構3的 -0〆、圖2所示塗佈裝置i中,藉由塗佈頭移動機構 使塗佈頭14朝主掃描方向移動,使】支可動喷嘴(即 圖4與圖5所示的第i喷嘴m、第2喷嘴nb及第4喷 _嘴17d中之任一喷嘴)位於噴嘴抵接部犯與喷嘴彈力機構 33之間,並在此狀態下,如上所述,藉由驅動安裝部固 定機構31、噴嘴彈力機構33及抵接部移動機構34,而調 整該1支可動喷嘴在副掃描方向上的位置。 3支可動噴嘴的位置調整(即各喷嘴間之距離的調整), 基於從噴嘴位置檢測部4利用攝像部42所獲得的影像, 根據由控制部2之間距檢測部21所檢測到的各噴嘴間之 距離(即根據間距檢測部21的檢測結果),由調整機構控 制部22控制間距調整機構3之抵接部移動機構,而依 312XP/發明說明書(補件)/97-01/96139447 序實施。 其次,說明塗佈裝置1之適叙疮办+ 距(以彳掃财向上的間 你㈣,喷 」)調整流程,然後,再說明藉由塗 佈褒置1塗佈有機el液的、、*妒 _ 先,利用泠欲-sβI 的机私。凋整噴嘴間距之際,首 。,佈頭移動機構15’將塗伟頭14移動至们盘 圖2中罪⑽側的二點鏈線所示位置處使第 嘴 =(參照圖4與圖5)位於喷嘴位置檢測心下方,且位 於噴嘴抵接部32與噴嘴彈力機槿 「镅敕μ…: 機構3之間的位置(以下稱 第二^ 支可動嘴嘴❻第丨喷嘴17^ 173b、173d(參照圖4盥圖〇,品油上 定狀熊。 一圖5),而對喷嘴安裝部141呈固 接著,制㈣部2㈣噴嘴位 42,拍攝第1喷嘴仏舆噴_部⑷的水平部 且將所取得的影像傳送給控制部2的間距檢測部川參照 圖3)。塗佈裝置!藉由塗佈頭移動機構15 ^第4喷嘴17d依序移往調整位置,並依序拍攝各噴嘴 π且取得影像。將所取得的影像傳送給間距檢測部21。 間距檢測部21根據3支可㈣嘴的影像,檢測各可動 喷嘴相對於喷嘴安裝部141的相對位置,並根據該相對位 置’求取第i喷嘴心第2嘴嘴爪及第4喷嘴i?d分 別與第3噴嘴He(參照圖4與圖5)之間在副掃描方向上 的距離。控制部2根據預定的嘴嘴間距(如上述,本實施 形態中設定為等於隔間壁間距之3倍的距離,以下稱「目 312XP/發明說明書(補件)/97-01/96139447 1333431 “=嘴間距」),確認是否必須調整喷嘴之位置。 田第1喷嘴17a與第3喷嘴17c間的距離等於目標喷嘴 =距的2倍’而第2喷嘴m及第4喷嘴17d分別與第3 =間的距離等於目標喷嘴間距時,判斷為不須要調 噴鳴位置,並結束喷嘴間距的調整作業。 反之’若判斷為須要調整喷嘴位置時,則根據如上述所 求得的各噴嘴間距離,以第3喷嘴17c為基準 =部21求取第!喷嘴17a、第2喷嘴17b及第4噴嘴^ 在副f描方向上所應移動之量(以下簡稱「移動量」)。具 體而《,第1喷嘴17a的移動量以使第!噴嘴17 喷=17c間之距離等於目標喷嘴間距之2倍而求取,而第 背17b與第4喷嘴I7d的移動量則以使第2嘴嘴爪 4喷嘴⑺分別與第3喷嘴17^間之距離等於目 =距而求取。以下,說明3支可動喷嘴(即第i喷嘴二: ^ 2喷嘴17b及第4噴嘴17d)全部 嘴位置的情況。 ,勹乂肩調整賀 求得3支可動喷嘴的移動量後,藉由塗佈 15將第1噴嘴17a移往調整位置。接著,利用控制, ==?(參照圖3),在間距調整機構3的安 裝和疋機構31(參照圖8與圖9)t,控制第 =與第2移動機構316,藉由帛1固定部3U鱼第2固 定部314從(-Y)侧與( + γ)側抵接於喷嘴 第2固 部1412,而固定喷嘴安裝部141。、 的水平 其次,藉由控制部2驅動鎖定部操作機構5(參照圖7), 312ΧΡ/發明說明書(補件)/97·〇ι/96ΐ39447 22 ^33431 :=喷嘴鎖定部對第^噴嘴% ,:: 掃描方向上移動。然後,藉由調整機構控 ^ 22控制抵接部移動機構34之步進馬達如 嘴17a在藉由喷嘴彈力機槎喷 肤能丁# 賦予喷嘴抵接部32彈力的 ^下’依照由間距檢測部21所求得的移動量,朝 向移動。4 1喷嘴Ha朝副掃財 -部操作機構5再度被驅動,而 =麦: 定第1喷嘴17a的位置。 1货鎖疋部173a鎖 ,後’利用調整機構控制部22再度 構⑴的第!移動機構313與第2移動機機 __與第㈣部314離卩 邛1412,而解除喷嘴安裝部l4i的固定。、 " 第1喷嘴17a的位置調整結束後,如 17 a時’將第2噴嘴17 b移動至調整位置/並二:嘴 固定機構31再度固定嘴嘴安裝部⑷。接著 :操作機構5,解除嘴嘴鎖定部 噴:=二 鎖定,且藉由噴嘴抿桩部^ 笫2嘴嘴17b的 移動機構34,將第:接噴;==機構33及抵接部 得的移動量,在(+Y)方Y依照由間距檢測部21所求 作機構5,而藉由噴嘴鎖ΐ:動’然而再度驅動鎖定部操 位置。此外,在安噴裝:二=鎖广喷嘴m* 部141的固^。 ^機構31中,亦解除噴嘴安裝 第2噴嘴17b的仿番,# 與第2喷嘴17b時置:第整調整第… 令將弟4喷嘴17d移動至調整位置、 312XP/發明說明書(補件)/97-01/96139447 23 1333431 f定喷嘴安裝部⑷、解除第4噴幻 噴嘴17d朝(+Y)方向的移動 負疋將第4 喷嘴安裝部⑷的固定鎖疋第4喷嘴⑺、並解除 依此,塗佈裝置1 t,依照由間距檢测 移動量,藉由除第3喷嘴17c以外的所 ^的 二動喷嘴),分別在副掃描方向上依序移動,而調 距。本實施形態中,在12〇…叫 喷 間距。塗佈頭14中’因為第丨噴嘴17a、d: =4嗔嘴17d設定為可個別移動,因而 喷嘴广、第2喷嘴17b及第4嘴嘴⑺分別與第3二 c間之距離。另外,塗佈裝置i中,3支可動 掃描方向的㈣,亦可由任—可動噴詞始1外對= =調整喷嘴間距的可動嘴嘴’便不進行朝副掃描方向的 3支可動喷嘴在副掃描方向上的移動結束後,利用攝像 。“ 2依序拍攝該3支固定喷嘴,並利用間距檢測部21求 取各噴嘴間之距離,且確認喷嘴位置是否必須再調整。缺 後,當判斷為喷嘴位置已不必再調整時,便結束噴嘴心 的調整作業。此外,當判斷喷嘴位置必須再調整時^重 嘴間距的調整作業,直到判斷喷嘴位置已不必調 喷嘴間距的調整作業結束後’餘9载置且保持於基板 保持部11上,並利用對準標記檢測部13拍攝對準標^己。 然後’根據對準標記檢測部13的輸出,驅動基板移動機 3職發明說明書(補件)/97彻6139447 24 1333431 ::而Λ基板9位於圖1中的實線所示塗佈開始位置 佈頭14藉由塗佈頭移動機構15,The through hole formed in the back plate portion 1411 of the nozzle mounting portion 141 abuts against the side surface of the first nozzle 17a on the (+γ) side of the slider 172; the pneumatic cylinder 332' slides the link 331 The member 172 is pressed; and the regulator 3 is connected to the pneumatic cylinder 332 and controls the pressure in the pneumatic cylinder 332. In the pitch adjustment mechanism 3, the adjustment mechanism control unit 22 (see FIG. 3, FIG. 3) of the control unit 2 drives the first movement mechanism gig and the second movement mechanism 316' of the attachment portion fixing mechanism 31 to thereby the first support portion 312. Moving in the (+γ) direction, the second branch portion 315 is moved in the (-γ) direction. Thereby, the first fixing portion 3-11 and the second fixing portion 314 are respectively from the (_γ) side and (+γ). The side abuts against the horizontal portion 1412 of the nozzle attachment portion 141, and the nozzle attachment portion 141 is sandwiched and fixed by the second, fixed portion 311 and the second fixed portion 314. The pitch adjustment mechanism 3 is fixed at the nozzle attachment portion 141. In the state, the adjustment mechanism control unit 22 drives the motor 343 of the abutting portion moving mechanism 34 and the pneumatic cylinder 332 of the nozzle elastic mechanism 33, and the nozzle abutting portion 32 and the link 331 of the nozzle elastic mechanism 33 are respectively The (_γ) side and the (+Υ) side are in contact with the i-th nozzle 17a. Then, the abutting portion moving mechanism 3: moves the nozzle abutting portion 32 in the (+γ) direction, whereby the second nozzle 17& By the nozzle elastic mechanism 33, the nozzle abutting portion 32 is given an elastic force to move in the '+Y direction'. ": Temple 1 mouth elastic mechanism - The force of the ___ force and the link 331 are maintained by the adjuster 333 regardless of the relative position of the pneumatic cylinder 332, so that the elastic force applied to the first nozzle 17a by the nozzle elastic mechanism 33 is also The first nozzle 1 in the scanning direction. The position is irrelevant, and the status is determined. In addition, the first (fourth) 17a 3 invention manual (supplement)/97-01/96139447 13J3431 is moved, and the first predetermined condition is released. The lock of the nozzle lock portion 173a (see Figs. 4 to 6) is set to "2" to position the nozzle abutting portion 32 from the predetermined movement start position. 10,000 - 1st spray 2 7 = move ', adjust the position of the first nozzle 173 觜 17a to move to a more desired position == abutment portion 32 to return to the movement start position = = 32 back to the second adjustment The position of the mouth (4) is close to the elastic machine. When the starting position is raised, the first nozzle ❿ is also biased by the nozzle elastic machine 3 to the nozzle abutting portion 32, and moves in the phase (9) direction. Accordingly, it is possible to prevent the application of the coating device i shown in FIG. 2 by the application of the coating head moving mechanism by only the second nozzle Η: 背二==: The head 14 moves in the main scanning direction, so that the movable nozzle (that is, any one of the i-th nozzle m, the second nozzle nb, and the fourth nozzle_head 17d shown in FIG. 4 and FIG. 5) is located at the nozzle abutting portion. Between the nozzle and the nozzle elastic mechanism 33, and in this state, as described above, the one movable nozzle is adjusted in the sub-scan by driving the mounting portion fixing mechanism 31, the nozzle elastic mechanism 33, and the abutting portion moving mechanism 34. The position in the direction. The positional adjustment of the three movable nozzles (that is, the adjustment of the distance between the nozzles) is based on the images detected by the nozzle unit position detecting unit 4 by the imaging unit 42, and the nozzles detected by the distance detecting unit 21 between the control units 2 The distance between the two (i.e., based on the detection result of the pitch detecting unit 21), the adjustment mechanism control unit 22 controls the abutting portion moving mechanism of the pitch adjusting mechanism 3, and the 312XP/invention specification (supplement)/97-01/96139447 Implementation. Next, the adjustment process of the coating device 1 will be described. *妒_ First, use the singularity of sβI. When the nozzle spacing is withered, the first. , the cloth head moving mechanism 15' moves the Tuwei head 14 to the position indicated by the two-point chain line on the sin (10) side of the disk diagram 2, so that the first nozzle = (refer to FIG. 4 and FIG. 5) is located below the nozzle position detecting core, and The position between the nozzle abutting portion 32 and the nozzle elastic machine 槿 "镅敕μ:: mechanism 3 (hereinafter referred to as the second movable nozzle ❻ nozzle 17^ 173b, 173d (refer to Fig. 4 盥, 〇, The oil is fixed on the bear. As shown in Fig. 5), the nozzle attachment portion 141 is fixed, and the (four) portion 2 (four) nozzle position 42 is prepared, and the horizontal portion of the first nozzle jet portion (4) is imaged and the acquired image is transmitted. The pitch detecting unit of the control unit 2 refers to FIG. 3). The coating device is sequentially moved to the adjustment position by the coating head moving mechanism 15^the fourth nozzle 17d, and each nozzle π is sequentially photographed to acquire an image. The acquired image is transmitted to the pitch detecting unit 21. The pitch detecting unit 21 detects the relative position of each movable nozzle with respect to the nozzle mounting portion 141 based on the images of the three (four) nozzles, and obtains the i-th nozzle core based on the relative position ' The second nozzle claw and the fourth nozzle i?d are respectively associated with the third nozzle He (refer to Figs. 4 and 5) in the secondary sweep The distance between the drawing directions and the control unit 2 is set to be equal to three times the distance between the partition walls in the present embodiment, as described above, hereinafter referred to as "head 312XP / invention manual (supplement) / 97 -01/96139447 1333431 “=mouth spacing”), confirm whether the position of the nozzle must be adjusted. When the distance between the first nozzle 17a and the third nozzle 17c is equal to twice the target nozzle = distance ', and the distance between the second nozzle m and the fourth nozzle 17d and the third = 3 is equal to the target nozzle pitch, it is determined that it is unnecessary. Adjust the position of the squealing and end the adjustment of the nozzle spacing. On the other hand, if it is determined that the nozzle position needs to be adjusted, the third nozzle 17c is used as the reference = the portion 21 is determined based on the distance between the nozzles as described above. The amount by which the nozzle 17a, the second nozzle 17b, and the fourth nozzle ^ are moved in the sub-f drawing direction (hereinafter referred to as "movement amount"). Specifically, "the amount of movement of the first nozzle 17a is such that the first! The distance between the nozzles 17 and 17c is equal to twice the target nozzle pitch, and the amount of movement of the first nozzles 17b and the fourth nozzles I7d is such that the nozzles (7) of the second nozzles 4 and the third nozzles are respectively The distance is equal to the target = distance. Hereinafter, the positions of all the nozzles of the three movable nozzles (i.e., the i-th nozzle 2: ^ 2 nozzle 17b and the fourth nozzle 17d) will be described. After the shoulder movement adjustment is performed, the movement amount of the three movable nozzles is obtained, and the first nozzle 17a is moved to the adjustment position by the coating 15. Next, by the control, ==? (refer to Fig. 3), the second and second moving mechanisms 316 are controlled by the mounting and twisting mechanism 31 (see Figs. 8 and 9) t of the pitch adjusting mechanism 3, and fixed by 帛1. The 3U fish second fixing portion 314 abuts against the nozzle second fixing portion 1412 from the (-Y) side and the (+ γ) side, and fixes the nozzle mounting portion 141. Second, the control unit 2 drives the lock operation mechanism 5 (refer to FIG. 7), 312ΧΡ/invention specification (supplement)/97·〇ι/96ΐ39447 22^33431:=nozzle lock portion to the second nozzle% , ::: Moves in the scan direction. Then, the stepping motor of the abutting portion moving mechanism 34, such as the nozzle 17a, is controlled by the adjusting mechanism 22 to impart a spring force to the nozzle abutting portion 32 by the nozzle elastic device. The amount of movement obtained by the portion 21 is shifted toward the movement. 4 1 nozzle Ha is facing the sub-sweeping - the part operating mechanism 5 is driven again, and = wheat: the position of the first nozzle 17a is fixed. 1 The lock 173a locks the lock, and the rear adjusts the mechanism (22) by the adjustment mechanism control unit 22! The moving mechanism 313 and the second moving machine __ and the fourth portion 314 are separated from the 邛 1412 to release the fixing of the nozzle mounting portion 14i. " After the position adjustment of the first nozzle 17a is completed, the second nozzle 17b is moved to the adjustment position at 17 a', and the nozzle fixing mechanism 31 fixes the nozzle attachment portion (4) again. Next: the operating mechanism 5, the mouth nozzle locking portion is sprayed: = two locks, and by the nozzle 抿 pile portion 笫 2 nozzle 17b moving mechanism 34, the first: spray; = = mechanism 33 and the abutment The amount of movement is in the (+Y) square Y in accordance with the mechanism 5 as determined by the pitch detecting unit 21, and is locked by the nozzle: however, the locking portion is again driven. In addition, in the spray installation: two = lock wide nozzle m * portion 141 solid ^. ^ In the mechanism 31, the second nozzle 17b of the nozzle is also released, # and the second nozzle 17b are placed: the second adjustment is made... The fourth nozzle 17d is moved to the adjustment position, 312XP/invention manual (supplement) /97-01/96139447 23 1333431 The fixed nozzle mounting portion (4) is released, and the fourth nozzle nozzle 17d is released from the movement in the (+Y) direction. The fourth nozzle mounting portion (4) is fixedly locked to the fourth nozzle (7) and released. As a result, the coating device 1 t moves in the sub-scanning direction in order to adjust the movement amount by the pitch detection movement by the two-way nozzles other than the third nozzle 17c. In the present embodiment, the pitch is 12 〇. In the coating head 14, since the second nozzles 17a and d: = 4 nozzles 17d are set to be movable individually, the nozzles are wide, and the distance between the second nozzles 17b and the fourth nozzles (7) and the third and second c are respectively. In addition, in the coating device i, (four) of the three movable scanning directions, or the movable nozzles that adjust the nozzle pitch by any one of the movable nozzles may not perform three movable nozzles in the sub-scanning direction. After the movement in the sub-scanning direction is completed, imaging is performed. "2" The three fixed nozzles are sequentially photographed, and the distance between the nozzles is determined by the distance detecting portion 21, and it is confirmed whether the nozzle position has to be adjusted again. When it is determined, when it is determined that the nozzle position does not have to be adjusted again, the process ends. In addition, when it is judged that the nozzle position must be adjusted again, the adjustment of the pitch of the nozzle is performed until the nozzle position is determined that the adjustment of the nozzle pitch has not been adjusted, and the remaining portion is placed and held in the substrate holding portion 11 Then, the alignment mark detecting portion 13 is used to photograph the alignment mark. Then, based on the output of the alignment mark detecting portion 13, the substrate moving machine 3 is driven to the manual (supplement) / 97 to 6139447 24 1333431: The crucible substrate 9 is located at the coating start position shown by the solid line in FIG. 1 , and the cloth head 14 is moved by the coating head moving mechanism 15 .

接著,控制流動性材料供應部並從嘴 r液’同時驅動塗佈頭移動機構15開始=塗土= 。本貫施形態中’將塗佈頭14的移動速度設定為約 塗佈m t ’在從4支喷嘴17朝基板9連續 °出同-種有機EL液的情況下,藉由將噴嘴17從圖i令 的⑼側朝(-X)方向(即主掃描方向)移動,而在基板9的 塗佈區域91上預先形成的㈣·之4條溝渠中塗佈有 機EL液、。塗佈裝置!巾’在4條溝渠中所塗佈的條紋狀 有機EL液,在副掃描方向上以等於隔間壁間距之3倍的 間距而排列。換言之,經塗佈有機EL液而相靠近的2°條 溝渠之間,包夾有預定塗佈(或已塗佈)其他種有機EL液 的2條溝渠。 塗佈頭14移動至基板9靠(-X)侧的受液部16上方(圖 1與圖2中靠(-X)侧依二點鏈線所示)後,驅動基板移動 機構12,將基板9與基板保持部11 一起朝圖1中的(+γ) 方向移動隔間壁間距的12倍距離。此時,塗佈頭14中, 噴嘴17朝受液部16連續吐出有機EL液。副掃描方向上 的基板9移動結束後,塗佈頭14在從喷嘴17吐出有機 EL液的狀態下’從基板9的(-X)側移往(+χ)側。 塗佈裝置1中,藉由高速重複4支喷嘴17對基板9的 312XP/發明說明書(補件)/97-01/96139447 25 1333431 主掃播與副掃描,在基柘 然後,在基板9移動至目1中_以條紋狀塗佈有機乩液。 時,停止從嘴嘴17 t吐=線所不塗佈結束位置 行的有機EL液塗佈。 機EL液’而結束對基板9進 二二將”在㈣安 於噴嘴安裝部141移動的支,投定為可相對 I 在,“二=:可:::間::::: 可:二二描方t上的間距(即喷嘴間距)。在移動各 描方向的B距調整機構3 ’,喷嘴抵接部32從副掃 #由喰^ (即側)抵接於該等各可動喷嘴,並 ^等各可2機構33從副掃描方向另一侧(即⑼側)對 此狀離:賦予朝喷嘴抵接部32的彈力。然後,在 ·、' ,猎由抵接部移動機構34將喷嘴抵接部32朝(+γ) °移動,藉此在副掃描方向移動各可動噴嘴。 ::裝置i t ’如上所述’藉由喷嘴抵接部犯與噴嘴 彈力機構33的連桿33卜從移動方向(即副掃描方向)二 =包夾各可動噴嘴,並在朝喷嘴抵接部32施加彈力的狀 態:移動,可精度佳地控制各可動喷嘴的移動量。結果, 可兩精度地調整複數喷嘴17的間距。 但是,有機EL顯示裝置中,因為基板上所形成的隔間 壁間之間距非常小,因而當在該隔間壁間的複數溝部中塗 佈有機EL液時’必須高位置精度地求取從複數噴嘴吐出 的有機EL液塗佈位置。如上所述,因為在塗佈裝置^中, 312XP/mmmmm/97-0U96139447 26 可高精度地調整複數喷嘴17的間距,因而可 •於對有機EL顯示裝置用基板塗佈有機EL液。…適用 氣上的間距調整機構3中’噴嘴彈力機構33的 對位f I μ之愿力,與連桿咖相對於氣屢缸332的相 均利用調節器333維持呈一定狀態二相 構33對二副择描方向上的位置無關,由喷嘴彈力機 、μ各可動喷嘴所施加的彈性力均呈一定,故移 =㈣等各可動喷嘴上的喷嘴抵接部32時所需要的 34 去結果,因為可安定地驅動抵接部移動機構 動旦'"、、343’而可精度更佳地控制各可動噴嘴的移 里,可更尚精度地調整複數喷嘴17的間距。 藓雄”周整各可動噴嘴在副掃描方向上的位置之際, =由女裝部固定機構31固定喷嘴安裝部141,藉此可防 因例如在移動可動喷嘴時’來自抵接部移動機構^經 可動喷嘴而傳遞至喷嘴安裝部141的力 部操作機構5鎖定或解除鎖定可動喷嘴時,對喷嘴安裝 ^ ⑷所施加的力等外力,而造成喷嘴安裝二 的清况。結果’可更高精度地調整複數喷嘴17的間距。 尤^ ’利用安裝部固定機構31的第i固定部311與第2 固定4 314,從可動喷嘴的移動方向(即副掃描方向)之二 侧包夾喷嘴安裝部141並固定嘴嘴安裝部141,藉此可更 確實地防止因在可動噴嘴移動時等,主要施加在噴嘴安裝 部141的副掃描方向力’造成喷嘴安裝部141發生歪斜的 情況。結果,可更高精度地調整複數喷嘴17的間距。 312XP/發明說明書(補件)/97^01/96139447 2η 在間距調整機構3 t,噴 .f I與安裝部固 、-接部犯與抵接部移動機 婦播方向上移動,而喷嘴^她的第1固定部311 -起在副 一起在副掃描方向上移動 構=則與第2固定部314 固定喷嘴安裝部141θ 1,备藉由安裝部固定機構 機構33可自動姑斜不,噴嘴抵接部%與喷嘴彈力 處。所以,可省略噴嘴抵^對各可動噴嘴的既定相對位置 於調整對象的可動喷嘴之與喷嘴彈力機構33相對 噴嘴Π的間距。此外,驟’而可輕易地調整複數 機構之數量,可達穿置二減〉、塗佈裝置1令各種移動 ^ J違裝置構造的簡單化。 塗佈頭14中,藉由各可動 部⑷之導引溝冑 喷嘴安裝 上移動各易且正確地在副掃描方向 嘴17的門距. 可各易且高精度地調整複數喷 出有機EL液的嗔嘴本體171 ^喷嘴具備有.從别端吐 T的滑件m,因而在維修塗佈裝置i之時,僅= 動噴嘴的喷嘴本體171從、 易地清洗。 货奪文裝。上拆除,便可輕 在塗佈裝置1中,根據利用嘴嘴位置檢測部4的光學系 統41高精度觀察複數喷嘴17位置之結果,可更高精度地 調整複數喷嘴17的間距。此外,由控制部2的間距檢測 部2卜根據由攝像冑42所取得的複數喷冑17之影像, 檢測在副掃描方向上相鄰接之2個喷嘴間的各距離,可在 喷嘴間距的調整作業中,縮短檢測複數喷嘴17的間距所 312XP/發明說明書(補件)/97-01/96139447 28 1333431 需之時間。且,根據間距檢測部21的檢 =制部22控制間距調整機構3的抵接 34 ’可自動地調整複數喷嘴17的間距。 移動機構 在塗佈裝置1中,藉由鎖定部摔作 部藉此在 =輕易地鎖定與解除鎖定可動噴嘴的位置。此外,:= 鎖定部中,利用按押部1732對固定構件i73 f紫 動赁霄的以牛172之弹力’可鎖定可動喷 =Π31以柱塞1413為支點而些微地傾斜,可解除可= =嘴的鎖定。依此,將各喷嘴鎖定部形成簡單 可動噴嘴的位置。更迅連且以地鎖定與解除鎖定 依如上所述,塗佈頭14與基板保持部u可獨立於間距 構3、喷嘴位置檢測部4及鎖定部操作機構5而單 蜀移動了以,在塗佈有機EL液時,當塗佈頭14對基板 進:騎描與副掃描時,便不必—起移動間距調整機構 喷嘴位置檢測部4及鎖定部操作機構5。依此,塗佈 裝置_ 1中,藉由主掃描機構與副掃描機構而移動的部位 (即藉由塗佈頭移動機構15與基板移動機構12而移動的 塗佈頭14與基板保持部u)即可小型化與輕量化,結果, 可實現塗佈裝置!的小型化。因為塗佈裝h可高速進行 塗饰頭14〜的主掃描,因而特別適於塗佈頭14的小型化。 一/、人**兒月本發明第2實施形態的塗佈裝置。圖1 〇所 不係第2實她形態的塗佈裝置〗a構造正視圖。如圖丨〇所 312XP/發明說明書(補件)/97_〇丨/96139447 29 1333431 不,塗佈裝置la中,喷嘴位置檢測部4配置於基板保持 邛11的上方。其餘的構造均如同圖1與圖2所示的^佈 裝置1 ’在以下的說明中賦予相同的元件符號。塗佈裝置 la的噴嘴間距調整方法,除噴嘴間距的檢測方法不同之 外’其餘均大致如同第1實施形態。 塗佈裝置la中,當調整噴嘴間距之時,在基板保持部 11上所保持的試驗塗佈用基板9a上,試驗性地塗佈有機 EL液。對基板9a施行的有機EL液塗佈,如同上述對基 板9(參照圖!與圖2)施行的有機EL液塗佈,在從4支噴 嘴17吐出有機EL液之情況下,藉由在主掃描方向上移動 塗佈碩14而實施。另外,在基板9a上並未形成第丨實施 形態中所言及的隔間壁。 接著,從4支喷嘴17中吐出並塗佈於基板化上的有機 EL液之圖案(即條紋狀排列的4支有機el液線條), 2 f位置檢測部4的光學系統41觀察,並由攝像部“取 得該有機EL液的圖案之影像。接著,藉由控制部2 =檢測部21(參照圖3) ’從該影像中,將相鄰接之2條有 液線條的中心線間之各距離,視為在副掃描方向上 、目。、接的2個喷嘴間之各距離(即各喷嘴間距離)而檢 祕々’、、後’如同第1實施形態,藉由間距調整機構3,根 噴嘴間之距離’在副掃描方向上移動 :圖:圖5所示的第丨喷嘴17a、第2嗦嘴l7b及喷第嘴4 1萬17d),而調整喷嘴間距。 另卜因為在基板9a上並未設置隔間壁,因此所塗佈 312XP/發明說明書(_97侧麵 30 1333431 的有機EL液線條可能隨時間的經過,而在副掃描方向上 呈不規則擴散。因而,利用攝像部42所進行的有機EL液 圖案之拍攝,最好在剛塗佈有機EL液後(例如塗佈後的數 10msec以内)實施。 塗佈裝置la中,如同第1實施形態,在移動各可動喷 嘴時,在間距調整機構3中,噴嘴抵接部32(參照圖8盥 圖9)從副掃描方向其中一側(即(_¥)側)抵接於該等各可 動喷嘴,並利用噴嘴彈力機構33(參照圖8與圖9),從副 掃描方向另一側(即⑽側),對該等各可動喷嘴賦予朝喷 嘴抵接部32的彈力。然後,在此狀態下,利用抵接部移 動機構34(參照圖8與圖9)朝⑼方向移動喷嘴抵接部 %’猎此,各可動喷嘴在副掃描方向上移動。結果,可精 度佳地控制各可動喷嘴的移動量,可高精度地調整複數喷 嘴1 7的間距。 疋攸敎1 與,者’塗佈裝置1a中’根據由喷嘴位置檢測部4之光 :二:、;1 數高二度觀察有機EL液圖案的結果,可更高精度 數喷嘴17的間距,,利用控制部?的間距 2卜根據由攝像部42所取得的有機此液圖案之 '5V像,檢測在副掃描方向上相鄰Next, the fluid material supply portion is controlled and the coating head moving mechanism 15 is simultaneously driven from the mouth r liquid ' = soiling = . In the present embodiment, the moving speed of the coating head 14 is set to about mt', and when the same type of organic EL liquid is continuously discharged from the four nozzles 17 toward the substrate 9, the nozzle 17 is taken from the figure. The (9) side of the i is moved in the (-X) direction (i.e., the main scanning direction), and the organic EL liquid is applied to the four (four) trenches formed in advance on the coating region 91 of the substrate 9. Coating device! The stripe-shaped organic EL liquid applied to the four grooves is arranged in the sub-scanning direction at a pitch equal to three times the pitch of the partition walls. In other words, between the 2° trenches which are adjacent to each other by the application of the organic EL liquid, two trenches which are intended to be coated (or coated) with other kinds of organic EL liquid are sandwiched. The coating head 14 is moved to the upper side of the liquid receiving portion 16 on the (-X) side of the substrate 9 (shown by the two-dot chain line on the (-X) side in FIGS. 1 and 2), and then the substrate moving mechanism 12 is driven. The substrate 9 and the substrate holding portion 11 are moved by a distance of 12 times the pitch of the partition walls in the (+γ) direction in Fig. 1 . At this time, in the coating head 14, the nozzle 17 continuously discharges the organic EL liquid toward the liquid receiving portion 16. After the movement of the substrate 9 in the sub-scanning direction is completed, the coating head 14 is moved from the (-X) side of the substrate 9 to the (+χ) side in a state where the organic EL liquid is discharged from the nozzle 17. In the coating apparatus 1, the main scanning and sub-scanning of the substrate 9 by the high-speed repeating of the four nozzles 17 to the 312XP/invention manual (supplement)/97-01/96139447 25 1333431 of the substrate 9 are then carried out on the substrate 9 In the first item, the organic mash was applied in a stripe shape. At this time, the application of the organic EL liquid from the end of the nozzle 17 t spout = line is not stopped. The machine EL liquid 'ends the base plate 9 into two, and the branch that moves in the nozzle mounting portion 141 is determined to be relative to I. "Two =: can be ::::::::: The spacing on the square t (ie the nozzle spacing). In the B-distance adjusting mechanism 3' for moving the respective drawing directions, the nozzle abutting portion 32 abuts against the movable nozzles from the sub-sweep #喰^ (that is, the side), and the respective two mechanisms 33 are from the sub-scanning direction. The other side (i.e., the (9) side) is separated from this: an elastic force is applied to the nozzle abutting portion 32. Then, in the ",", the nozzle abutting portion 32 is moved toward (+?) by the abutting portion moving mechanism 34, thereby moving the movable nozzles in the sub-scanning direction. The device "is described above" by the nozzle abutting portion and the link 33 of the nozzle elastic mechanism 33 from the moving direction (i.e., the sub-scanning direction) = the movable nozzles are clamped, and the nozzle abutting portions are formed. 32 State in which the elastic force is applied: movement, the amount of movement of each movable nozzle can be controlled with high precision. As a result, the pitch of the plurality of nozzles 17 can be adjusted with both precisions. However, in the organic EL display device, since the distance between the partition walls formed on the substrate is extremely small, when the organic EL liquid is applied to the plurality of groove portions between the partition walls, it is necessary to obtain high positional accuracy. The position of the organic EL liquid to be discharged by the plurality of nozzles. As described above, in the coating apparatus, 312XP/mmmmm/97-0U96139447 26 can adjust the pitch of the plurality of nozzles 17 with high precision, so that the organic EL liquid can be applied to the substrate for the organic EL display device. The force of the alignment f I μ of the nozzle elastic mechanism 33 in the gap adjusting mechanism 3 on the gas is maintained in a state of two phases with the phase of the link coffee 332 with respect to the gas cylinder 332. Regardless of the position in the second pair of drawing directions, the elastic force applied by the nozzle elastic machine and the μ movable nozzles is constant, so that it is necessary to shift the nozzle abutting portion 32 on each movable nozzle such as (4). As a result, since the abutting portion moving mechanism "", 343' can be stably driven, the movement of each movable nozzle can be controlled with higher precision, and the pitch of the plurality of nozzles 17 can be more accurately adjusted. When the position of each movable nozzle in the sub-scanning direction is fixed, the nozzle mounting portion 141 is fixed by the wearing portion fixing mechanism 31, thereby preventing the movement from the abutting portion due to, for example, moving the movable nozzle ^ When the force operating mechanism 5 that is transmitted to the nozzle mounting portion 141 via the movable nozzle locks or unlocks the movable nozzle, an external force such as a force applied to the nozzle is mounted on the nozzle, causing the nozzle to be cleaned. The pitch of the plurality of nozzles 17 is adjusted with high precision. In particular, the i-th fixing portion 311 and the second fixing 4 314 of the mounting portion fixing mechanism 31 are used to sandwich the nozzle from the moving direction of the movable nozzle (i.e., the sub-scanning direction). By attaching the nozzle attachment portion 141 to the attachment portion 141, it is possible to more reliably prevent the nozzle attachment portion 141 from being skewed due to the force applied in the sub-scanning direction of the nozzle attachment portion 141 when the movable nozzle moves. The pitch of the plurality of nozzles 17 can be adjusted with higher precision. 312XP/Invention Manual (Supplement)/97^01/96139447 2η In the pitch adjustment mechanism 3 t, the spray.f I and the mounting portion are solid and the joint is broken. Connect The moving portion of the moving machine moves in the direction of the female machine, and the first fixed portion 311 of the nozzle is moved in the sub-scanning direction, and the nozzle mounting portion 141θ1 is fixed to the second fixing portion 314. The portion fixing mechanism 33 can automatically slant, the nozzle abutting portion % and the nozzle elastic force. Therefore, the nozzle can be omitted from the predetermined relative position of each movable nozzle to the movable nozzle of the adjustment target and the nozzle elastic mechanism 33 opposite to the nozzle In addition, the number of the plurality of mechanisms can be easily adjusted, and the number of the plurality of mechanisms can be easily adjusted, and the coating device 1 simplifies the structure of the various moving devices. The guide groove of each movable portion (4) is mounted on the nozzle and the gate distance of the nozzle 17 in the sub-scanning direction is easily and accurately adjusted. The nozzle body 171 that discharges the plurality of organic EL liquids can be easily and accurately adjusted. There is a slider m that spits T from the other end. Therefore, when the coating device i is being repaired, only the nozzle body 171 of the nozzle is cleaned and easily cleaned. In the device 1, according to the mouth position detection As a result of observing the position of the plurality of nozzles 17 with high precision, the optical system 41 of the unit 4 can adjust the pitch of the plurality of nozzles 17 with higher precision. Further, the pitch detecting unit 2 of the control unit 2 is based on the plurality of jets obtained by the imaging cassette 42. In the image of 胄17, the distance between two nozzles adjacent to each other in the sub-scanning direction is detected, and the pitch of detecting the plurality of nozzles 17 can be shortened in the adjustment operation of the nozzle pitch. 312XP/Invention Manual (Supplement)/97 -01/96139447 28 1333431 The time required. Further, the pitch of the plurality of nozzles 17 can be automatically adjusted by controlling the abutment 34' of the pitch adjusting mechanism 3 by the detecting portion 22 of the pitch detecting portion 21. Moving mechanism In the coating device 1, the position of the movable nozzle is easily locked and unlocked by the locking portion. Further, in the == lock portion, the elastic force of the cow 172 by the pressing portion 1732 to the fixing member i73 f is locked, and the movable jet = Π 31 is slightly tilted with the plunger 1413 as a fulcrum, and can be released. = The lock of the mouth. Accordingly, each nozzle lock portion is formed as a position of a simple movable nozzle. Further, the locking head 14 and the substrate holding portion u can be moved independently of the pitch structure 3, the nozzle position detecting portion 4, and the locking portion operating mechanism 5, as described above. When the organic EL liquid is applied, when the coating head 14 advances to the substrate: riding and sub-scanning, it is not necessary to move the pitch adjusting mechanism nozzle position detecting portion 4 and the locking portion operating mechanism 5. Accordingly, in the coating apparatus_1, a portion that is moved by the main scanning mechanism and the sub-scanning mechanism (that is, the coating head 14 and the substrate holding portion u that are moved by the coating head moving mechanism 15 and the substrate moving mechanism 12) ) It can be miniaturized and lightened, and as a result, a coating device can be realized! Miniaturization. Since the coating h can perform the main scanning of the coating head 14 to be performed at a high speed, it is particularly suitable for downsizing of the coating head 14. A coating device according to a second embodiment of the present invention. Fig. 1 is a front view of a coating device of the second embodiment. As shown in Fig. 312, the invention manual (supplement)/97_〇丨/96139447 29 1333431. In the coating device 1a, the nozzle position detecting unit 4 is disposed above the substrate holding cassette 11. The rest of the configuration is the same as that of the device 1' shown in Figs. 1 and 2 in the following description. The method of adjusting the nozzle pitch of the coating device la is different from the first embodiment except that the method of detecting the nozzle pitch is different. In the coating apparatus 1a, when the nozzle pitch is adjusted, the organic EL liquid is experimentally applied to the test coating substrate 9a held on the substrate holding portion 11. The organic EL liquid application applied to the substrate 9a is applied to the organic EL liquid applied to the substrate 9 (see FIG. 2 and FIG. 2), and when the organic EL liquid is discharged from the four nozzles 17, the main EL liquid is discharged. It is implemented by moving the coating master 14 in the scanning direction. Further, the partition wall described in the second embodiment is not formed on the substrate 9a. Next, the pattern of the organic EL liquid (that is, the four organic liquid liquid lines arranged in a stripe pattern) discharged from the four nozzles 17 and applied to the substrate is observed, and the optical system 41 of the 2 f position detecting unit 4 observes and The imaging unit "acquires an image of the pattern of the organic EL liquid. Then, the control unit 2 = detection unit 21 (see FIG. 3) 'from the image, the center line between the two adjacent liquid lines Each distance is regarded as the distance between the two nozzles in the sub-scanning direction, the distance between the two nozzles (that is, the distance between the nozzles), and the detection is the same as in the first embodiment, and the pitch adjustment mechanism is used. 3. The distance between the root nozzles 'moves in the sub-scanning direction: Fig. 5: the second nozzle 17a, the second nozzle l7b, and the nozzle nozzle 4 1700d), and adjusts the nozzle pitch. The partition wall is not provided on the substrate 9a, so the organic EL liquid line coated with the 312XP/invention specification (_97 side 30 1333431 may be irregularly spread in the sub-scanning direction with time. Therefore, utilization The imaging of the organic EL liquid pattern by the imaging unit 42 is preferably applied to the organic E just after application. After the liquid L (for example, within 10 msec after coating), the coating device 1a, as in the first embodiment, moves the nozzles abutting portion 32 in the pitch adjusting mechanism 3 (see FIG. 8). 9)) One of the sub-scanning directions (ie, the (_¥) side) abuts against the movable nozzles, and the nozzle elastic mechanism 33 (refer to FIGS. 8 and 9) is used from the other side of the sub-scanning direction. (the side of (10)), the respective movable nozzles are biased toward the nozzle abutting portion 32. Then, in this state, the nozzle moving mechanism 34 (see Figs. 8 and 9) moves the nozzle in the (9) direction. In the joint portion %', the movable nozzles are moved in the sub-scanning direction. As a result, the amount of movement of each movable nozzle can be accurately controlled, and the pitch of the plurality of nozzles 17 can be adjusted with high precision. 疋攸敎1 and In the 'coating apparatus 1a', the result of observing the organic EL liquid pattern by the light of the nozzle position detecting unit 4 is two degrees, and the pitch of the nozzles 17 can be more accurately measured, and the pitch of the control unit can be utilized. 2 based on the '5V image of the organic liquid pattern obtained by the imaging unit 42, Measured adjacent in the subscanning direction

離,可在個喷嘴間的各距 觜日1巨的調整作業中,縮短檢 之間距所需要的時間。 炎双贾賈U 其次,說明本發明第3實 彔伤筮qΑ π J主神衷置。圖11所 不係第3只她形態的塗佈 示,塗佈步晋卟由A 構&正視圖。如圖11所 " ,噴嘴位置檢測部4在圖11中靠(+X) 312XP/發明說明書(補件)/97_〇1/96丨39447 ^ == 且與間距調整機構3之間,配置於㈣嘴 餘的Si: 妨礙塗佈頭14之移動的位置處。其 餘的構每均如同圖i與圖2所示的塗 說明中賦予相同的元件符號。塗佈裝置lb的喷 整方法,除噴嘴間距的檢測方法不同 盆餘錢如 同第1實施形態。 /、餘均大致如 塗佈裝置lb令,當調整喷嘴間距之際,塗佈頭14移往 = 側的受液部16上方。接著,從4支喷嘴17所吐出 EL液之4支液柱’藉由喷嘴位置檢測部4的光學 統^觀察’並由攝像部42取得該有機EL液的4支液 柱之影像。另外,藉由檢測對準各液柱焦距的塗佈頭14 位置’而取得各液柱與噴嘴17間之對應關係。其次,利 用控制部2的間距檢測部21(參照圖3),從該影像中,將 :目:接之2支有機EL液的液柱中心線間之各距離,視為 4掃描方向上相鄰接之2個喷嘴間的各距離(即各噴嘴間 ^距離)而檢測。然後’如同第1實施形態,利用間距調 整機構3,根據各噴嘴間的距離,藉由在副掃描方向上移 動3支可動噴嘴(即圖4與圖5中所示的第i噴嘴17a、 第2喷嘴17b、及第4噴嘴17d),而調整喷嘴間距。 塗佈裝置lb中,如同第1與第2實施形態,在藉由嘴 嘴彈力機構33(參照圖8與圖9)賦予喷嘴抵接部32(參照 圖8與® 9)彈力&狀態下,各可動喷嘴於副掃描方向上 移動’可精度佳地控Μ各可動喷嘴的移動量,彳高精 調整複數噴嘴17的間距。 地 312ΧΡ/發明說明書(補件)/97·〇1/96139447 32 再者,在塗佈裴置lb 光學系統41高精度觀察 嘴嘴位置檢測部4的 精度地調整複數脅嘴】7的 ’之之液柱的結果,可更高 .間距檢測部21,根據*二距。此外,利用控制部2的 液柱影像,而檢測各噴 42所取得的有機EL液之 作業中,縮短檢測複數、巨離可在噴嘴間距的調整 在塗佈裝置” 的間距時所需要的時間。 僳而調整喷嘴間距,么嘴17所喷出的液柱影 液之情況下,調整噴嘴:未藉 整用基板等,所需要的相關作業時間π,: 置處猎由在相當於實際塗佈時的基板9主面位 EL液Η柱,可根據㈣於實際塗佈在基板上的有機 EL液間距之距離,調整噴嘴間距。 另二方面,圖10所示第2實施形態的塗佈裝置la中, 根據只際塗佈的有機EL液圖案’調整噴嘴間距’藉此可 直接控制在製品所使用基板上,所塗佈之有機el液圖 的間距。 再者’圖1與圖2所示第1實施形態的塗佈裝置1中, 根據喷嘴17的影像而調整喷嘴間距,藉此可在未實際對 基板塗佈有機EL液的情況下,調整噴嘴間距。此外,相 較於取得從噴嘴17所噴出液柱影像,可較容易取得供檢 測喷嘴間距離之用的影像。 以上,說明本發明的實施形態,惟本發明並不僅侷限於 上述實施形態,可為各種變化。 312XP/發明說明書(補件)/97.〇1/96139447 33 1333431 置施形態的塗佈裝置1中’亦可利用嘴嘴位 土檢貝U 4的攝像部42,依序(或同時)拍攝4支嘴嘴p 罪(一+Z)側的頂部,而求取各喷嘴間距離。此外,喷 在副掃描方向上的位置,亦可利用朝向 置的雷射令伤徭rL (側面所配 測Μ # ^ ί 湖抑峨)、或非接觸雷射 掃二=測!儀器求取。此情況下’亦可在可動噴 =二=移動之中,連續測量可動喷嘴的位置,並根據 則1、纟°果’控制可動喷嘴的移動。 檢:用2=:態:塗佈裝置1a中’已塗佈有噴嘴間距離 . L液之圖案的基板,未必僅限於試驗塗佈用 土板9a。例如對於製品所使用的基板,亦可拍攝在盆 :成=1壁的非塗佈區域令試驗性塗佈的有機乩液:圖 茶’並求取噴嘴間距離。 整機構”’安裝部固定機構31亦可為獨立於 的:Γ::2、喷嘴彈力機構33及抵接部移動機構34 =機構。此情況下,安裝部固定機構31的第!固定 播,2固定部314,亦可設置為抵接於嘴嘴安裝部⑷主 ft:上之整個寬度的構造’並且設置在主掃描方向上 動噴嘴抵接部32、噴嘴彈力機構33及抵接部移 =構,並在將喷嘴安裝部141利用安裝部固定機構 持々固定的狀態下,將喷嘴抵接部32、噴嘴彈 Z及抵接部移動機構34移往各可動喷嘴所對應的位置 慝,並依序調整3支可動喷嘴的位置。 再者’塗佈裝置i中,亦可設置3組安裝部固定機構 312XP/發明說明書(補件)/97-01/96139447 34 3二It抵接部32、噴嘴彈力機構33、抵接部移動機構 ,疋邛操作機構5,藉由在主掃描方向上排列而配置 ·.=機構’可同時調整3支可動喷嘴的位置。此情況下, * = I取代3組*裝部gj定機構31,改為^置丨個在主掃 ^機^整個寬度上抵接於喷嘴安裝部141的安裝部固 了嘴彈广33未必要設定為具備有連桿咖、氣壓 鲁 2及凋節态333的構造,亦可例如在喷嘴安裝部1 μ 背板部1411為支點,將各可動喷嘴朝(_γ)方 β按押之彈*構件的喷嘴彈力機構。但,就塗佈頭 量化之觀點’喷嘴彈力機構最好獨立於塗佈頭“而另^ 別设置。且’藉由喷嘴彈力機構個別設置在塗佈頭14 .^外,除喷嘴間距調整以外,均不會對可動喷嘴施加按押 力,因而可提升有關鎖定可動噴嘴的可靠度。 喷嘴鎖定部令,亦可取代按押部1732的線圈彈箸,改 »為利用諸如盤型彈簧等其他的彈簧構件、或諸如橡膠等彈 性構件’將固定構件1731朝可動喷嘴的滑件172按押。 此外,亦可在可動喷嘴與喷嘴安裝部141中設置磁石,並 利用該等磁石的磁力’將固定構件1731朝滑件172按押。 塗佈頭中,除第3喷嘴⑺以外的其餘喷嘴中之任 -支,亦可固定於噴嘴絲部141並設定為調整喷嘴間距 的基準。此外,4支喷嘴17亦可全部安震成可在副掃描 方向上個別移動。此情況下,藉由在副掃福方向上移動任 意、3支喷嘴、或4支喷嘴之全部,可高精度地調整喷嘴間 312XP/發明說明書(補件)/97-01/96139447 1333431 距 喰:^加形態的塗佈裝置中,在塗佈頭14中所設置的 f支數並不僅餘於4支,亦可為3支或5支以上。例 將分別含有紅色⑻、綠&⑹、藍色⑻等互显顏色 機EL材料的3種有機⑶液,從“中 的支喷嘴同時喷出,而對基板9塗佈。此情況/ ’、2支喷嘴間在副掃描方向上 隔間壁間距之狀態。 ^整為專於 成上述塗佈裝置中’亦可對基板9塗佈含有像素形 =材枓之正孔輸送材料的流動性材料(以下稱「正孔輸送 ^置^。此處所謂「正孔輸送材料」,指形成有機EL顯示 Ϊ =孔輸送層的材料’而所謂「正孔輸送層」並非僅 由有機EL材料所形成之有機EL層輸送正孔的正 孔輸送層’而是亦涵蓋注人正孔的正孔注入層。 =塗佈裝置並不僅侷限於有機豇顯示裝置 此 輸送液的塗佈,亦可使用於例如··對液晶顯示裝 ^電聚顯示裝置等平面顯示裝置用基板,塗佈含有著色 =料或螢光材料其他種類之像素形成材料的流動性材 對此種有機EL顯示裝置用其把糸7士 τ 對其他平面_置用基= = = =’; =材料時,對流動性㈣的㈣位置要求高位= =上所述,因為塗佈裝置中,可高精度地調整複數嘴嘴 17的間距,因而特別適用於例如對有機EL顯示震置Π 312XP/發明說明書(補件)/97-01/96139447 36 板塗佈正孔輸送液,以及對其他平 佈含有像素形成材料之流動性材料 面顯示裝置用基板,塗 再者’上述塗佈裝置除平面顯示裝置用基板以外,尚可 :用於對例如磁碟(或光碟)用破璃基板或陶兗基板、或半 —體基板等各種基板,塗佈各種流動性材料。 以上就本發明詳細描述,惟上述說明僅止於例示。所 以,可理解在不脫逸本發明範圍的前提下,可有多數種變 形與態樣。 【圖式簡單說明】 圖1為第1實施形態的塗佈裝置俯視圖。 圖2為塗佈裝置的正視圖。 圖3為控制部的功能方塊圖。 - 圖4為塗佈頭的正視圖。 圖5為塗佈頭的俯視圖》 圖6為喷嘴鎖定部附近的放大左侧視圖。 • 圖7為鎖定部操作機構的左側視圖。 圖8為間距調整機構與塗佈頭的俯視圖。 圖9為間距調整機構與塗佈頭的左側視圖。 圖1 〇為第2實施形態的塗佈裝置正視圖。 圖11為第3實施形態的塗佈裝置正視圖。 【主要元件符號說明】 1 ' la、lb 塗佈裝置 2 控制部 3 間距調整機構 312XP/發明說明書(補件)/97〇1/96139447 37 1333431In addition, it is possible to shorten the time required for the detection of the distance between the nozzles and the adjustment of the distance between the nozzles. Yan Shuang Jia Jia U Next, the third actual 彔 彔 Α Α Α 主 主 本 本 本 。 。 。 。 。 。 。 。 。 。 。 。 Fig. 11 is not the coating of the third form of her, and the coating step is made up of the A structure & front view. As shown in Fig. 11, the nozzle position detecting portion 4 is between (+X) 312XP/invention specification (supplement)/97_〇1/96丨39447^== and with the pitch adjusting mechanism 3 in Fig. 11 . The Si disposed in the (four) mouth is at a position that hinders the movement of the coating head 14. The rest of the configuration is the same as that given in the coating instructions shown in Fig. i and Fig. 2. The spraying method of the coating device 1b differs from the first embodiment in that the method of detecting the nozzle pitch is different. The remainder is substantially as in the coating device lb. When the nozzle pitch is adjusted, the coating head 14 is moved over the liquid receiving portion 16 on the = side. Then, the four liquid columns of the EL liquid discharged from the four nozzles 17 are viewed by the optical system of the nozzle position detecting unit 4, and the image of the four liquid columns of the organic EL liquid is obtained by the imaging unit 42. Further, the correspondence between the respective liquid columns and the nozzles 17 is obtained by detecting the position of the coating head 14 which is aligned with the focal length of each liquid column. Next, by using the pitch detecting unit 21 (see FIG. 3) of the control unit 2, the distance between the center lines of the liquid columns of the two organic EL liquids that are connected to each other is regarded as the phase in the four scanning directions. The distance between the two nozzles adjacent to each other (that is, the distance between the nozzles) is detected. Then, as in the first embodiment, the pitch adjustment mechanism 3 moves three movable nozzles in the sub-scanning direction by the distance between the nozzles (i.e., the i-th nozzle 17a shown in Figs. 4 and 5). The nozzle 17b and the fourth nozzle 17d) adjust the nozzle pitch. In the coating device 1b, as in the first and second embodiments, the nozzle abutting portion 32 (see FIGS. 8 and 9) is given the elastic force & state by the nozzle elastic mechanism 33 (see FIGS. 8 and 9). The movable nozzles are moved in the sub-scanning direction. The movement amount of each movable nozzle can be accurately controlled, and the pitch of the plurality of nozzles 17 can be adjusted. 312 ΧΡ 发明 发明 发明 发明 发明 97 96 96 96 96 96 96 96 96 96 lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb lb The result of the liquid column can be higher. The pitch detecting portion 21 is based on * two distances. Further, in the operation of detecting the organic EL liquid obtained by each of the jets 42 by the liquid column image of the control unit 2, the time required for detecting the complex number and the large distance can be adjusted at the pitch of the coating device at the nozzle pitch can be shortened.调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整 调整The main liquid level EL liquid column of the substrate 9 at the time of cloth can adjust the nozzle pitch according to (4) the distance between the organic EL liquids actually applied to the substrate. On the other hand, the coating of the second embodiment shown in Fig. 10 In the device la, the nozzle pitch can be adjusted according to the organic EL liquid pattern applied only to thereby directly control the pitch of the applied organic EL liquid pattern on the substrate used for the product. Further, 'Fig. 1 and Fig. 2 In the coating device 1 of the first embodiment, the nozzle pitch is adjusted in accordance with the image of the nozzle 17, whereby the nozzle pitch can be adjusted without actually applying the organic EL liquid to the substrate. Liquid column image ejected from nozzle 17 The image for detecting the distance between the nozzles can be easily obtained. The embodiments of the present invention have been described above, but the present invention is not limited to the above embodiments, and various modifications are possible. 312XP/Invention Manual (Supplement)/97. 〇 1/96139447 33 1333431 In the coating device 1 of the application form, it is also possible to use the imaging unit 42 of the mouth and mouth detection U 4 to sequentially and (or simultaneously) shoot four nozzles p (one + Z) At the top of the side, the distance between the nozzles is obtained. In addition, the position of the spray in the sub-scanning direction can also be made by using the facing laser to cause the scar rL (the side is equipped with the test Μ # ^ 湖 lake suppression), or Non-contact laser sweep 2 = measurement! The instrument can be found. In this case, 'the position of the movable nozzle can be continuously measured in the movable spray = two = movement, and the movement of the movable nozzle can be controlled according to the condition In the 2:: state: the substrate in which the pattern of the nozzles is applied with the pattern of the nozzles in the coating device 1a is not limited to the test coating soil plate 9a. For example, the substrate used for the product may be Photographed in a non-coated area of the pot: =1 wall to test the coated organic sputum: 'Obtains the distance between the nozzle and the whole mechanism. "' Mounting portion fixing means 31 may also be independent of: Γ :: 2, the nozzle 33 and the elastic force of the contact mechanism portion moving mechanism 34 = mechanism. In this case, the first part of the mounting portion fixing mechanism 31! The fixed broadcast, 2 fixing portion 314 may be provided to abut against the entire width of the nozzle mounting portion (4) main ft: and the moving nozzle abutting portion 32, the nozzle elastic mechanism 33 and the damper are provided in the main scanning direction. In the state in which the nozzle attachment portion 141 is held by the attachment portion fixing mechanism, the nozzle abutting portion 32, the nozzle cartridge Z, and the abutting portion moving mechanism 34 are moved to the corresponding movable nozzles. Position 慝 and adjust the position of the 3 movable nozzles in sequence. Furthermore, in the coating device i, three sets of mounting portion fixing mechanisms 312XP/invention manual (supplement)/97-01/96139447 34 3 two It abutting portions 32, the nozzle elastic mechanism 33, and the abutting portion movement may be provided. The mechanism, the cymbal operating mechanism 5, is arranged by arranging in the main scanning direction, and the position of the three movable nozzles can be simultaneously adjusted. In this case, * = I replaces the three sets of * mounting parts gj fixed mechanism 31, and the mounting portion of the nozzle mounting portion 141 is fixed over the entire width of the main sweeping machine ^. It is necessary to have a structure including a link coffee, a gas pressure 2, and a dead state 333. For example, the nozzle mounting portion 1 μ back plate portion 1411 may be used as a fulcrum, and each movable nozzle may be pressed toward the (_γ) square β. * The nozzle elastic mechanism of the component. However, as far as the coating head is quantified, the nozzle elastic mechanism is preferably disposed independently of the coating head, and is disposed separately from the coating head by the nozzle elastic mechanism, except for the nozzle pitch adjustment. The pressing force is not applied to the movable nozzle, so that the reliability of locking the movable nozzle can be improved. The nozzle locking portion can also replace the coil magazine of the pressing portion 1732, and the like is to use other components such as a disk spring. a spring member, or an elastic member such as rubber, presses the fixing member 1731 toward the slider 172 of the movable nozzle. Further, a magnet may be disposed in the movable nozzle and the nozzle mounting portion 141, and the magnetic force of the magnets may be utilized The fixing member 1731 is pressed toward the slider 172. Among the coating heads, any of the remaining nozzles other than the third nozzle (7) may be fixed to the nozzle wire portion 141 and set as a reference for adjusting the nozzle pitch. The branch nozzles 17 can also be oscillated to be individually movable in the sub-scanning direction. In this case, the nozzles can be adjusted with high precision by moving any of the three nozzles or four nozzles in the sub-sweep direction. 312XP/Invention Manual (Supplement)/97-01/96139447 1333431 In the coating device of the 加: 加 addition form, the number of f-distributed in the coating head 14 is not limited to four, but also 3 or more. For example, three kinds of organic (3) liquids each containing red (8), green & (6), blue (8) and other interactive color machine EL materials are simultaneously ejected from the "middle nozzles, and the substrate 9 is simultaneously sprinkled. Coating. In this case /', the state of the partition wall spacing between the two nozzles in the sub-scanning direction. ^ It is a fluid material that can be used to apply the positive hole transporting material containing the pixel shape = material 对 to the substrate 9 in the above-mentioned coating device (hereinafter referred to as "perforated hole transport ^ set ^. Here" The hole transporting material refers to a material that forms an organic EL display Ϊ = hole transport layer, and the so-called "perforated transport layer" is not a positive hole transport layer that transports a positive hole only by an organic EL layer formed of an organic EL material. The positive hole injection layer covering the positive hole is included. The coating device is not limited to the application of the transport liquid of the organic germanium display device, and can be used, for example, in a flat display device such as a liquid crystal display device. Using a substrate, a flow material containing a coloring material or a fluorescent material other type of pixel forming material is applied to the organic EL display device, and the organic EL display device is used to set the substrate to the other planes ===='; = material, the position of the (4) position of the fluidity (4) is required to be high = = above, because the pitch of the plurality of nozzles 17 can be adjusted with high precision in the coating device, and thus is particularly suitable for, for example, the display of the organic EL display Π 312XP /Invention Manual (supplement)/97-01/96139447 36 plate-coated positive hole transport liquid, and a substrate for a fluid material surface display device containing other pixel-forming materials, and the above-mentioned coating device can be used for a flat surface display device. For example, the magnetic disk (or optical disk) is coated with various fluid materials by various substrates such as a glass substrate, a ceramic substrate, or a semi-substrate substrate. The above description has been made in detail, but the above description is merely illustrative. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view of a coating apparatus according to a first embodiment of the present invention. Fig. 2 is a front view of a coating apparatus. Fig. 3 is a functional block diagram of the control unit. Fig. 4 is a front view of the coating head. Fig. 5 is a plan view of the coating head. Fig. 6 is an enlarged left side view of the vicinity of the nozzle locking portion. Fig. 8 is a plan view of the pitch adjusting mechanism and the coating head. Fig. 9 is a left side view of the pitch adjusting mechanism and the coating head. Fig. 1 is a front view of the coating device of the second embodiment. Third real Aspect of a front view of the coating apparatus. The main element SIGNS LIST 1 'la, lb coating apparatus 2 pitch adjustment mechanism control unit 3 312XP / specification (s) / the 97〇1 / 96,139,447 371,333,431 invention

4 喷嘴位置檢測部 5 鎖定部操作機構 9、9a 基板 11 基板保持部 12 基板移動機構 13 對準標記檢測部 14 塗佈頭 15 塗佈頭移動機構 16 受液部 17 喷嘴 17a 第1喷嘴 17b 第2喷嘴 17c 第3喷嘴 17d 第4喷嘴 21 間距檢測部 22 調整機構控制部 31 安裝部固定機構 32 喷嘴抵接部 33 喷嘴彈力機構 34 抵接部移動機構 41 光學系統 42 攝像部 51 ' 331 連桿 52 氣壓缸 312XP/發明說明書(補件)/97-01/96139447 38 1333431 53 旋轉臂 54 支柱 55 旋轉軸 • 56 解除部 91 塗佈區域 141 喷嘴安裝部 142 導引溝 . 143 滑件保持部 • 144 導板 171 喷嘴本體 172 滑件 .173a、 173b、173d 喷嘴鎖 311 第1固定部 312 第1支撐部 313 第1移動機構 ^ 314 第2固定部 315 第2支撐部 316 第2移動機構 332 氣壓缸 333 調節器 341 測微儀 342 耦合器 343 步進馬達 1411 背板部 312XP/發明說明書(補件)/97-01/96139447 39 1333431 1412 水平部 1413 柱塞 1731 固定構件 1732 按押部 1733 固定構件本體 1734 屋簷部 1735 第1突起部 . 1736 第2突起部 • 1737 螺栓 1738 彈性構件 3111 第1抵接部 .3141 第2抵接部 312XP/發明說明書(補件)/97-01/961394474 nozzle position detecting unit 5 locking portion operating mechanism 9, 9a substrate 11 substrate holding portion 12 substrate moving mechanism 13 alignment mark detecting portion 14 coating head 15 coating head moving mechanism 16 liquid receiving portion 17 nozzle 17a first nozzle 17b 2 nozzle 17c third nozzle 17d fourth nozzle 21 pitch detecting unit 22 adjustment mechanism control unit 31 mounting portion fixing mechanism 32 nozzle abutting portion 33 nozzle elastic mechanism 34 abutting portion moving mechanism 41 optical system 42 imaging portion 51 '331 connecting rod 52 Pneumatic cylinder 312XP/Invention manual (supplement)/97-01/96139447 38 1333431 53 Rotating arm 54 Pillar 55 Rotary shaft • 56 Release part 91 Coating area 141 Nozzle mounting part 142 Guide groove. 143 Slide holder ● 144 guide plate 171 nozzle body 172 sliders 173a, 173b, 173d nozzle lock 311 first fixing portion 312 first support portion 313 first moving mechanism ^ 314 second fixing portion 315 second supporting portion 316 second moving mechanism 332 air pressure Cylinder 333 Regulator 341 Micrometer 342 Coupler 343 Stepper motor 1411 Back plate part 312XP / invention manual (supplement) / 97-01/96139447 39 13334 31 1412 Horizontal portion 1413 Plunger 1731 Fixing member 1732 Pressing portion 1733 Fixing member body 1734 Eave portion 1735 First projection. 1736 Second projection • 1737 Bolt 1738 Elastic member 3111 First abutment part 3141 2nd abutment Department 312XP/Invention Manual (supplement)/97-01/96139447

Claims (1)

十、申請專利範菌·· 置裝置,係在基板上塗佈流動性材料的綱 基板保持部,其保持基板; 二其f上述基板連續吐出流動性材料; 賀烏文裝部,其安裝有上述複數喷嘴,· 上主:二’:在平行於上述基板之主面的主掃描方向 對移動,· 上述嘴嘴安衰部一起對上述基板相 ,掃猫機構’其在平行於上述基板的 2主掃描方向的副掃描方向上,將上述複數 嘴嘴安裝部,對上述基板相對移動;以及複數喷紫與上述 外=調整機構’其將上述複數喷嘴之全部、或除1個之 卜的其餘所有複數可動喷嘴 ” 動,_此㈣h、+ 相掃描方向上個別移 各二;S 描方向上相鄰接之2個喷嘴間的 其中,上述間距調整機構具備有: 可動3接°Ρ Λ從上述副掃描方向之其中一侧抵接於各 各力機構,其從上述副掃描方向之另一側,對上述 可動嘴嘴賦予朝上述噴嘴抵接部的彈力;以及 =接。Ρ移動機構’其對利用上述喷嘴彈力機構而賦予彈 、,各可動噴嘴’調整所抵接之上述喷嘴抵接部在上 迦副掃描方向上的位置。 312ΧΡ/發明說明書(補件)/97-01/96丨39447 1333431 噴專利範圍第1項之塗佈裝置’其中’藉由上述 二嘴彈力機構對上述各可動喷嘴所施加的彈性力均為一 疋,與上述各可動喷嘴在上述副掃描方向上的位置益關。 請專利範圍第2項之塗佈裝置,其中,藉由上述 構與上述副掃描機構’使上述複數噴嘴與上述喷 背女裝部獨立於上述間距調整機構而移動。 、 2如申請專利範圍第1項之塗佈裝置,其中,藉由上述 知描機構與上述副掃描機構,使上述複 嘴安裝部獨立於上述間距調整機構而移動。I、上这喷 5如申請專利範圍第…項中任一項之塗佈裝置,其 述間距⑽機構更具備有固定上述 裝部固定機構。 双丨〜文 6.如申請專利範圍第5項之塗佈裝置,其中,上述安裝 部固定機構具備有: Τ上述女裝 第1固疋和其從上述副掃描方向的上 於上述噴嘴安裝部; 側抵接 部其^上述第1固定部、上述喷嘴抵接 4及上述抵接部移動機構; 第2固定部,其從上述副掃描方向的上述另一側,抵接 於上述喷嘴安裝部; 力1則抵接 第2支撐部,其安裝有卜+ # 機構; 这苐2固定部與上述喷嘴彈力 第1移動機構,其在上述副择 據部;以及 W田方向上移動上述第i支 312XP/發明說明書(補件)/97·〇1/96139447 42 撐部。移動機構,其在上述副掃描方向上移動上述第2支 中,上專利範圍第1至4項中任一項之塗佈裝置,其 上述各可動噴嘴具備有: 噴觜本體’其從前端吐出流動性材料;以及 滑件,其安裝有上述喷嘴太舻,; 嘴安 31嗔窝本體’並保持於形成在上述噴 、朝上述副掃描方向延伸的導引溝中,可、t 述導弓I溝移動。 Τ/σ± &如申請專利範圍第7項之塗佈裝置,其中,更且 位^嘴^部’其相對於上述嘴嘴安裝部鎖定上述滑件的 上操作機構’其藉由操縱上述喷嘴鎖定部,而鎖定 上述α件的位置,與解除上述鎖定。 9·如申請專利範圍第8項之塗佈 鎖定部具财: 裝置,其巾’上述噴嘴 固定構件,其在鎖定上述滑件的位置時,抵接於上述滑 什,以及 ^押部’其藉由將上述固定構件朝上述滑件按押,對上 述滑件賦予朝上述噴嘴安裝部的彈力; 而當上述滑件的位置較被解除時,上述岐構件以盘 上逑嘴嘴安裝部相接觸的支點為中心,朝遠離上述^ 方向傾斜。 的 其Γ如//Λ利範圍第1至4項*任_項之塗佈裝置, 其中’更具備有·· 312χΡ/發明說明書(補件)/97-01/96139447 43 1333431 噴日複數可動喷嘴'從上述複數 、 出塗佈於基板上的流動性材料之圖案、戋從上 述複數喷嘴所吐出之流動性材料的複數液柱。 有11.如申請專利範圍第1G項之塗佈裝置,其中,更具備 嘴、工由上述光學系統’取得上述複數可動喷 >述複數液柱之影像;以及 何种的上 \ f,檢測部’其從上述影像中,檢測在上述副掃描方向 上相部接之2個噴嘴間的各距離。 1.2.如申請專利範圍第u項之塗佈裝置,其中,更具備 有: 八 調整機構控制部,其根據上述間距檢測部的檢測結果, 工制上述間距調整機構的上述抵接部移動機構。 13. 如申睛專利範圍第1至4項中任—項之塗佈装置, Μ,上述流動性材料含有平面顯示裝置用的像素形成材 科。 14. 如申請專利範圍第13項之塗佈裝置,其中,上述像 素形成材料係有機EL顯示裝置用的有機乩材料或正孔 送材料。 15. 如申請專利範圍第5項之塗佈裝置,其中,更具備 有: 八 光學系統,其用於觀察上述複數可動喷嘴、從上述複數 喷嘴所吐出且塗佈於基板上的流動性材料之圖案、或從上 312XP/^Hg^Hg^(^)/97-〇l/96139447 44 1333431 述複數喷嘴所吐出之流純材料的複數液柱。 16.如申請專利範圍第15項之塗佈裝置,其中,更具備 攝像部,其經由上述光學系統 ,取仟上述複數可動哨 嘴、上述流動性材料的上述圖案、或上述流動性材料的上 述複數液柱之影像;以及 間距檢測部,其從上述影像中,檢測在上述副掃描方向 上相鄰接之2個噴嘴間的各距離。 有17.如申請專利範圍第16項之塗佈裝置,其中,更具備 調整機構控制部,其根據上述間距檢測部的檢測結果, 控制上述間距調整機構的上述抵接部移動機構。 18·如申請專利範圍第7項之塗佈裝置,其中,更具備 有: 八 光學系統,其用於觀察上述複數可動喷嘴、從上述複數 喷嘴所吐出且塗伟於基板上的流動性材料之圖案、或從上 述複數嘴嘴所吐出之流動性材料的複數液柱。 19.如申請專利範圍第18項之塗佈裝置,其中,更具備 有: 八 攝像部,其經由上述光學系統,取得上述複數可動喷 嘴上述机動f生材料的上述圖案、或上述流動性材料的上 述複數液柱之影像;以及 間距檢測部’其從上述影像巾,制在上述副掃描方 上相鄰接之2個噴嘴間的各距離。 ° 312XP/發明說明書(補件)/97〇1/96139447 45 1333431 20.如申請專利範圍第19項之塗佈裝置,其中,更具備 有: 調整機構控制部,其根據上述間距檢測部的檢測結果, 控制上述間距調整機構的上述抵接部移動機構。X. Application for a patented bacteria device, which is a substrate holding portion for applying a fluid material on a substrate, which holds the substrate; 2. The substrate is continuously discharged with a fluid material; The plurality of nozzles, the upper main: two': moving in a direction parallel to the main scanning direction of the main surface of the substrate, the nozzle anemming portion together with the substrate phase, the squeezing mechanism 'being parallel to the substrate 2 in the sub-scanning direction of the main scanning direction, the plurality of nozzle mounting portions are relatively moved to the substrate; and the plurality of spray purple and the outer=adjusting mechanism' are all or all of the plurality of nozzles All the other movable nozzles are moved, _ this (four) h, + phase shifting in the direction of each of the two; in the S drawing direction between the two adjacent nozzles, the pitch adjustment mechanism is provided with: movable 3 connection ° Ρ Λ Abutting each of the force mechanisms from one of the sub-scanning directions, and applying an elastic force to the nozzle abutting portion to the movable nozzle from the other side of the sub-scanning direction; and Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ Ρ 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明/97-01/96丨39447 1333431 The coating device of the first aspect of the patent scope of the invention, wherein the elastic force applied to each of the movable nozzles by the two-nozzle elastic mechanism is one turn, and the movable nozzles described above are The coating device of the second aspect of the invention, wherein the plurality of nozzles and the spray-back dressing portion are independent of the pitch adjusting mechanism by the sub-scanning mechanism 2. The coating device according to claim 1, wherein the plurality of nozzle attachment portions are moved independently of the pitch adjustment mechanism by the scanning mechanism and the sub-scanning mechanism. [5] The coating device according to any one of the preceding claims, wherein the spacing (10) mechanism further has a fixing mechanism for fixing the above-mentioned mounting portion. Double 丨~文6. The coating apparatus according to the fifth aspect, wherein the attachment portion fixing mechanism includes: the first female shackle and the nozzle attachment portion from the sub-scanning direction; and the side abutting portion a fixing portion, the nozzle contact 4, and the abutting portion moving mechanism; the second fixing portion abuts against the nozzle mounting portion from the other side in the sub-scanning direction; and the force 1 abuts the second supporting portion The +2 fixed portion and the nozzle elastic first moving mechanism are moved in the sub-selection portion and the W field direction to move the i-th branch 312XP/invention specification (supplement)/97 The apparatus of any one of the above-mentioned 1st to 4th, wherein the movable nozzles are provided in the above-mentioned second branch. a sneezing body 'which discharges a fluid material from the front end; and a slider which is mounted with the above-mentioned nozzle too sturdy; the mouth amp 31 a sling body 'and is held in a guide formed in the above-described sub-scanning direction In the ditch, can be described I bow ditch move.涂布/σ± & the coating device of claim 7, wherein the upper portion of the nozzle is locked with respect to The nozzle locking portion locks the position of the alpha member and releases the lock. 9. The coating lock portion of claim 8 is characterized in that: the device, the towel 'the above-mentioned nozzle fixing member abuts against the above-mentioned slip when the position of the slider is locked, and the handle portion' The sliding member is biased toward the nozzle mounting portion by pressing the fixing member toward the slider; and when the position of the slider is relatively released, the jaw member is mounted on the disk. The fulcrum of the contact is centered and inclined toward the direction away from the above ^. For example, the coating device of the first to fourth items of the profit range, including the item _ _ 312 χΡ / invention manual (supplement) / 97-01/96139447 43 1333431 The nozzle 'plinds a pattern of a fluid material applied to the substrate from the plurality, and a plurality of liquid columns of the fluid material discharged from the plurality of nozzles. 11. The coating device according to claim 1G, wherein the image is further provided by the optical system to obtain the image of the plurality of movable jets; and the above-mentioned plurality of liquid columns; and The portion 'detects, from the image, the distance between the two nozzles that are in the sub-scanning direction. 1.2. The coating apparatus according to claim 5, further comprising: eight adjustment mechanism control unit that manufactures the abutting portion moving mechanism of the pitch adjustment mechanism based on a detection result of the pitch detecting unit. 13. The coating device according to any one of claims 1 to 4, wherein the fluid material comprises a pixel forming material for a flat display device. 14. The coating apparatus according to claim 13, wherein the pixel forming material is an organic tantalum material or a positive hole feeding material for an organic EL display device. 15. The coating apparatus according to claim 5, further comprising: an eight-optical system for observing the plurality of movable nozzles, the fluid material discharged from the plurality of nozzles and coated on the substrate The pattern, or a plurality of liquid columns of the pure material discharged from the plurality of nozzles from the above 312XP/^Hg^Hg^(^)/97-〇l/96139447 44 1333431. [16] The coating device of claim 15, further comprising an imaging unit that reads the plurality of movable whistle, the pattern of the fluid material, or the fluid material by the optical system An image of the plurality of liquid columns; and a pitch detecting unit that detects the distance between the two nozzles adjacent to each other in the sub-scanning direction from the image. The coating apparatus of claim 16, further comprising an adjustment mechanism control unit that controls the abutting portion moving mechanism of the pitch adjustment mechanism based on a detection result of the pitch detecting unit. 18. The coating device of claim 7, further comprising: an eight-optical system for observing the plurality of movable nozzles, the fluid material ejected from the plurality of nozzles and coated on the substrate A pattern, or a plurality of liquid columns of fluid material ejected from the plurality of nozzles. The coating apparatus of claim 18, further comprising: an eight imaging unit that acquires the pattern of the movable material of the plurality of movable nozzles or the fluid material via the optical system The image of the plurality of liquid columns; and the distance detecting portion 'the distance between the two nozzles adjacent to each other on the sub-scanning side from the image mask. The 312XP/invention specification (supplied)/97〇1/96139447 45 1333431. The coating device according to claim 19, further comprising: an adjustment mechanism control unit, which is detected according to the above-described pitch detecting unit As a result, the abutting portion moving mechanism of the above-described pitch adjusting mechanism is controlled. 312XP/發明說明書(補件)/97-01/96139447 46312XP/Invention Manual (supplement)/97-01/96139447 46
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