TWI320619B - Multi-chamber gas discharge laser bandwidth control through discharge timing - Google Patents

Multi-chamber gas discharge laser bandwidth control through discharge timing

Info

Publication number
TWI320619B
TWI320619B TW95126520A TW95126520A TWI320619B TW I320619 B TWI320619 B TW I320619B TW 95126520 A TW95126520 A TW 95126520A TW 95126520 A TW95126520 A TW 95126520A TW I320619 B TWI320619 B TW I320619B
Authority
TW
Taiwan
Prior art keywords
bandwidth control
chamber gas
laser bandwidth
gas discharge
discharge
Prior art date
Application number
TW95126520A
Other languages
English (en)
Chinese (zh)
Other versions
TW200715674A (en
Inventor
Robert N Jacques
William N Partlo
Daniel J W Brown
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/199,691 external-priority patent/US7061961B2/en
Priority claimed from US11/323,604 external-priority patent/US7830934B2/en
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of TW200715674A publication Critical patent/TW200715674A/zh
Application granted granted Critical
Publication of TWI320619B publication Critical patent/TWI320619B/zh

Links

TW95126520A 2005-08-09 2006-07-20 Multi-chamber gas discharge laser bandwidth control through discharge timing TWI320619B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/199,691 US7061961B2 (en) 1999-12-10 2005-08-09 Very narrow band, two chamber, high rep-rate gas discharge laser system
US11/323,604 US7830934B2 (en) 2001-08-29 2005-12-29 Multi-chamber gas discharge laser bandwidth control through discharge timing

Publications (2)

Publication Number Publication Date
TW200715674A TW200715674A (en) 2007-04-16
TWI320619B true TWI320619B (en) 2010-02-11

Family

ID=40403966

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95126520A TWI320619B (en) 2005-08-09 2006-07-20 Multi-chamber gas discharge laser bandwidth control through discharge timing

Country Status (2)

Country Link
JP (1) JP5202315B2 (ja)
TW (1) TWI320619B (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010047771A1 (en) * 2008-10-21 2010-04-29 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US9098274B2 (en) * 2009-12-03 2015-08-04 Intel Corporation Methods and apparatuses to improve turbo performance for events handling
US10833471B2 (en) * 2017-11-17 2020-11-10 Cymer, Llc Lithography system bandwidth control
CN115210970A (zh) * 2020-03-03 2022-10-18 西默有限公司 用于光源的控制系统

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5898725A (en) * 1997-01-21 1999-04-27 Cymer, Inc. Excimer laser with greater spectral bandwidth and beam stability
US6567450B2 (en) * 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6625191B2 (en) * 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6590922B2 (en) * 1999-09-27 2003-07-08 Cymer, Inc. Injection seeded F2 laser with line selection and discrimination
US7039086B2 (en) * 2001-04-09 2006-05-02 Cymer, Inc. Control system for a two chamber gas discharge laser
JP4169187B2 (ja) * 2002-05-17 2008-10-22 株式会社小松製作所 ２ステージレーザシステム
AU2003261337A1 (en) * 2002-07-31 2004-02-16 Cymer, Inc. Control system for a two chamber gas discharge laser
US7741639B2 (en) * 2003-01-31 2010-06-22 Cymer, Inc. Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control
JP2004335782A (ja) * 2003-05-08 2004-11-25 Komatsu Ltd 注入同期式レーザ装置

Also Published As

Publication number Publication date
JP2009505396A (ja) 2009-02-05
JP5202315B2 (ja) 2013-06-05
TW200715674A (en) 2007-04-16

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