TWI318416B - Electron beam treatment apparatus - Google Patents

Electron beam treatment apparatus Download PDF

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Publication number
TWI318416B
TWI318416B TW093133114A TW93133114A TWI318416B TW I318416 B TWI318416 B TW I318416B TW 093133114 A TW093133114 A TW 093133114A TW 93133114 A TW93133114 A TW 93133114A TW I318416 B TWI318416 B TW I318416B
Authority
TW
Taiwan
Prior art keywords
cathode
anode
gas
potential
chamber
Prior art date
Application number
TW093133114A
Other languages
English (en)
Chinese (zh)
Other versions
TW200515461A (en
Inventor
Alexander T Demos
Hari K Ponnekanti
Jun Zhao
Helen R Armer
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of TW200515461A publication Critical patent/TW200515461A/zh
Application granted granted Critical
Publication of TWI318416B publication Critical patent/TWI318416B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/025—Electron guns using a discharge in a gas or a vapour as electron source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/067—Replacing parts of guns; Mutual adjustment of electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/077—Electron guns using discharge in gases or vapours as electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/248—Components associated with the control of the tube

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Electron Beam Exposure (AREA)
  • Physical Vapour Deposition (AREA)
TW093133114A 2003-10-30 2004-10-29 Electron beam treatment apparatus TWI318416B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/698,726 US7049606B2 (en) 2003-10-30 2003-10-30 Electron beam treatment apparatus

Publications (2)

Publication Number Publication Date
TW200515461A TW200515461A (en) 2005-05-01
TWI318416B true TWI318416B (en) 2009-12-11

Family

ID=34550733

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093133114A TWI318416B (en) 2003-10-30 2004-10-29 Electron beam treatment apparatus

Country Status (6)

Country Link
US (1) US7049606B2 (enExample)
JP (1) JP5242055B2 (enExample)
KR (1) KR101068790B1 (enExample)
CN (1) CN1875452B (enExample)
TW (1) TWI318416B (enExample)
WO (1) WO2005043599A2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10320597A1 (de) * 2003-04-30 2004-12-02 Aixtron Ag Verfahren und Vorrichtung zum Abscheiden von Halbleiterschichten mit zwei Prozessgasen, von denen das eine vorkonditioniert ist
WO2008050321A2 (en) * 2006-10-24 2008-05-02 B-Nano Ltd. An interface, a methof for observing an object within a non-vacuum environment and a scanning electron microscope
KR100895630B1 (ko) * 2007-10-01 2009-05-06 박흥균 전자빔 방출장치
US8981294B2 (en) 2008-07-03 2015-03-17 B-Nano Ltd. Scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment
US10658161B2 (en) * 2010-10-15 2020-05-19 Applied Materials, Inc. Method and apparatus for reducing particle defects in plasma etch chambers
CN105143866A (zh) 2013-02-20 2015-12-09 B-纳米股份有限公司 扫描电子显微镜
KR102118604B1 (ko) * 2018-12-14 2020-06-03 박흥균 라인 형태의 이온빔 방출 장치

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4581118A (en) * 1983-01-26 1986-04-08 Materials Research Corporation Shaped field magnetron electrode
JPS6212059A (ja) * 1985-07-10 1987-01-21 Matsushita Electric Works Ltd 光放射電子管
US4721885A (en) * 1987-02-11 1988-01-26 Sri International Very high speed integrated microelectronic tubes
US5003178A (en) 1988-11-14 1991-03-26 Electron Vision Corporation Large-area uniform electron source
US5094885A (en) * 1990-10-12 1992-03-10 Genus, Inc. Differential pressure cvd chuck
US5421888A (en) * 1992-05-12 1995-06-06 Sony Corporation Low pressure CVD apparatus comprising gas distribution collimator
US5302238A (en) * 1992-05-15 1994-04-12 Micron Technology, Inc. Plasma dry etch to produce atomically sharp asperities useful as cold cathodes
US5350480A (en) * 1993-07-23 1994-09-27 Aspect International, Inc. Surface cleaning and conditioning using hot neutral gas beam array
US6607991B1 (en) * 1995-05-08 2003-08-19 Electron Vision Corporation Method for curing spin-on dielectric films utilizing electron beam radiation
JPH11176765A (ja) * 1997-12-05 1999-07-02 Samsung Electron Co Ltd イオン注入損傷を抑制した浅接合形成方法
US6037717A (en) * 1999-01-04 2000-03-14 Advanced Ion Technology, Inc. Cold-cathode ion source with a controlled position of ion beam
US6214183B1 (en) * 1999-01-30 2001-04-10 Advanced Ion Technology, Inc. Combined ion-source and target-sputtering magnetron and a method for sputtering conductive and nonconductive materials
JP2001023959A (ja) * 1999-07-05 2001-01-26 Mitsubishi Electric Corp プラズマ処理装置
KR100301066B1 (ko) * 1999-08-16 2001-11-01 윤종용 비금속 도전물질로 구성된 음극판을 갖는 전자빔 조사장비
US6407399B1 (en) * 1999-09-30 2002-06-18 Electron Vision Corporation Uniformity correction for large area electron source
JP2002190260A (ja) * 2000-10-13 2002-07-05 Toshiba Corp 陰極線管装置
US20040089535A1 (en) * 2002-08-16 2004-05-13 The Regents Of The University Of California. Process and apparatus for pulsed dc magnetron reactive sputtering of thin film coatings on large substrates using smaller sputter cathodes
US6831284B2 (en) * 2002-11-21 2004-12-14 Applied Materials, Inc. Large area source for uniform electron beam generation
WO2004094494A2 (en) * 2003-04-21 2004-11-04 Rynel, Inc. Apparatus and methods for the attachment of materials to polyurethane foam, and articles made using them

Also Published As

Publication number Publication date
US20050092935A1 (en) 2005-05-05
JP2007510311A (ja) 2007-04-19
JP5242055B2 (ja) 2013-07-24
WO2005043599A2 (en) 2005-05-12
KR20060122875A (ko) 2006-11-30
CN1875452A (zh) 2006-12-06
US7049606B2 (en) 2006-05-23
WO2005043599A3 (en) 2005-07-14
KR101068790B1 (ko) 2011-09-30
CN1875452B (zh) 2010-06-16
TW200515461A (en) 2005-05-01

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MM4A Annulment or lapse of patent due to non-payment of fees