TWI318333B - Photosensitive composition, photosensitive transfer material, light shielding layer for display device, color filter, liquid crystal display element, substrate having light shielding layer and process for producing the same - Google Patents

Photosensitive composition, photosensitive transfer material, light shielding layer for display device, color filter, liquid crystal display element, substrate having light shielding layer and process for producing the same

Info

Publication number
TWI318333B
TWI318333B TW094109234A TW94109234A TWI318333B TW I318333 B TWI318333 B TW I318333B TW 094109234 A TW094109234 A TW 094109234A TW 94109234 A TW94109234 A TW 94109234A TW I318333 B TWI318333 B TW I318333B
Authority
TW
Taiwan
Prior art keywords
light shielding
shielding layer
liquid crystal
producing
substrate
Prior art date
Application number
TW094109234A
Other languages
English (en)
Other versions
TW200540557A (en
Inventor
Hidenori Gotou
Akira Hatakeyama
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200540557A publication Critical patent/TW200540557A/zh
Application granted granted Critical
Publication of TWI318333B publication Critical patent/TWI318333B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Materials For Photolithography (AREA)
TW094109234A 2004-03-26 2005-03-25 Photosensitive composition, photosensitive transfer material, light shielding layer for display device, color filter, liquid crystal display element, substrate having light shielding layer and process for producing the same TWI318333B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004093598 2004-03-26

Publications (2)

Publication Number Publication Date
TW200540557A TW200540557A (en) 2005-12-16
TWI318333B true TWI318333B (en) 2009-12-11

Family

ID=34989366

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094109234A TWI318333B (en) 2004-03-26 2005-03-25 Photosensitive composition, photosensitive transfer material, light shielding layer for display device, color filter, liquid crystal display element, substrate having light shielding layer and process for producing the same

Country Status (3)

Country Link
US (1) US7586564B2 (zh)
CN (1) CN1673781A (zh)
TW (1) TWI318333B (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006228469A (ja) * 2005-02-15 2006-08-31 Fuji Photo Film Co Ltd 導電性膜形成用感光材料、導電性膜、透光性電磁波シールド膜、及びそれらの製造方法
JP4808567B2 (ja) * 2006-08-23 2011-11-02 富士フイルム株式会社 感光性組成物及びそれを用いた感光性転写材料、表示装置用遮光膜及びその形成方法、ブラックマトリクス、遮光膜付基板、カラーフィルタ並びに表示装置
CN101836162B (zh) * 2007-10-25 2012-11-14 可隆工业株式会社 薄膜型转印材料
JP2009288372A (ja) * 2008-05-28 2009-12-10 Seiko Epson Corp 液晶装置、および電子機器
JP2009288373A (ja) * 2008-05-28 2009-12-10 Seiko Epson Corp 液晶装置、および電子機器
US20100110242A1 (en) * 2008-11-04 2010-05-06 Shahrokh Motallebi Anthraquinone dye containing material, composition including the same, camera including the same, and associated methods
KR101394936B1 (ko) * 2009-11-06 2014-05-14 엘지디스플레이 주식회사 광차단층을 갖는 평판 표시 장치
TW201232766A (en) * 2011-01-28 2012-08-01 Morrison Opto Electronics Ltd Manufacturing method of wafer grade image module
KR20140072681A (ko) * 2012-12-05 2014-06-13 제일모직주식회사 흑색 감광성 수지 조성물 및 이를 이용한 차광층
US11619604B2 (en) * 2021-05-14 2023-04-04 Sandisk Technologies Llc Bipolar electrode bubble detection method and apparatus

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS521661B2 (zh) * 1972-05-11 1977-01-17
DE2327963A1 (de) * 1973-06-01 1974-12-19 Agfa Gevaert Ag Photographisches farbstoffdiffusionsuebertragungsverfahren
JPS61167949A (ja) * 1985-01-22 1986-07-29 Fuji Photo Film Co Ltd 銀塩拡散転写法写真要素
JPS629301A (ja) 1985-07-05 1987-01-17 Kyodo Printing Co Ltd カラ−フイルタの製造方法
JPH08271727A (ja) * 1995-04-04 1996-10-18 Fuji Photo Film Co Ltd ブラックマトリックス及びその形成方法
KR101030718B1 (ko) * 2003-04-18 2011-04-26 후지필름 가부시키가이샤 표시장치용 차광막

Also Published As

Publication number Publication date
CN1673781A (zh) 2005-09-28
TW200540557A (en) 2005-12-16
US20050212997A1 (en) 2005-09-29
US7586564B2 (en) 2009-09-08

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees