TWI315965B - Plasma processor with electrode responsive to plural frequencies - Google Patents

Plasma processor with electrode responsive to plural frequencies

Info

Publication number
TWI315965B
TWI315965B TW092117472A TW92117472A TWI315965B TW I315965 B TWI315965 B TW I315965B TW 092117472 A TW092117472 A TW 092117472A TW 92117472 A TW92117472 A TW 92117472A TW I315965 B TWI315965 B TW I315965B
Authority
TW
Taiwan
Prior art keywords
plasma processor
plural frequencies
electrode responsive
responsive
electrode
Prior art date
Application number
TW092117472A
Other languages
English (en)
Other versions
TW200402251A (en
Inventor
Vahedi Vahid
Loewenhardt Peter
Ellingboe Bert
Fischer Andreas
Kuthi Andy
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of TW200402251A publication Critical patent/TW200402251A/zh
Application granted granted Critical
Publication of TWI315965B publication Critical patent/TWI315965B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
TW092117472A 2002-06-27 2003-06-26 Plasma processor with electrode responsive to plural frequencies TWI315965B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/180,978 US6841943B2 (en) 2002-06-27 2002-06-27 Plasma processor with electrode simultaneously responsive to plural frequencies

Publications (2)

Publication Number Publication Date
TW200402251A TW200402251A (en) 2004-02-01
TWI315965B true TWI315965B (en) 2009-10-11

Family

ID=29779024

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092117472A TWI315965B (en) 2002-06-27 2003-06-26 Plasma processor with electrode responsive to plural frequencies

Country Status (9)

Country Link
US (1) US6841943B2 (zh)
EP (1) EP1516350B1 (zh)
JP (2) JP4589722B2 (zh)
KR (1) KR100908588B1 (zh)
CN (2) CN100442430C (zh)
AU (1) AU2003245583A1 (zh)
IL (1) IL165956A (zh)
TW (1) TWI315965B (zh)
WO (1) WO2004003963A2 (zh)

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US7838430B2 (en) * 2003-10-28 2010-11-23 Applied Materials, Inc. Plasma control using dual cathode frequency mixing
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JP4885586B2 (ja) * 2006-03-23 2012-02-29 東京エレクトロン株式会社 プラズマ処理装置
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US20160181116A1 (en) 2014-12-18 2016-06-23 Lam Research Corporation Selective nitride etch
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CN106548914B (zh) * 2015-09-17 2018-10-30 中微半导体设备(上海)有限公司 一种等离子体处理设备及其清洗系统和方法
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US10699878B2 (en) 2016-02-12 2020-06-30 Lam Research Corporation Chamber member of a plasma source and pedestal with radially outward positioned lift pins for translation of a substrate c-ring
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US10763083B2 (en) 2017-10-06 2020-09-01 Lam Research Corporation High energy atomic layer etching
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Also Published As

Publication number Publication date
JP4589722B2 (ja) 2010-12-01
IL165956A0 (en) 2006-01-15
CN100442430C (zh) 2008-12-10
KR20050013253A (ko) 2005-02-03
EP1516350B1 (en) 2012-06-13
CN101039544B (zh) 2011-05-04
US20040000875A1 (en) 2004-01-01
AU2003245583A8 (en) 2004-01-19
KR100908588B1 (ko) 2009-07-22
JP2010282970A (ja) 2010-12-16
EP1516350A2 (en) 2005-03-23
JP2005536834A (ja) 2005-12-02
TW200402251A (en) 2004-02-01
JP5116806B2 (ja) 2013-01-09
US6841943B2 (en) 2005-01-11
CN1675737A (zh) 2005-09-28
WO2004003963A3 (en) 2004-07-22
IL165956A (en) 2010-05-17
WO2004003963A2 (en) 2004-01-08
CN101039544A (zh) 2007-09-19
AU2003245583A1 (en) 2004-01-19

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