1314642 九、發明說明： .【發明所屬之技術領域】 本發明係有關一種基板檢查用照明裳置，係在從照射 非散射光線的光源裝置到檢查基板的照明光軸上配置有菲 涅耳透鏡（Fresnel lens)，用以將光線收斂化或平行化， 俾將照明光線照射至檢查基板全體。 【先前技術】 於液晶顯示器面板或大型印刷電路板等製造生產線 鲁中，係於任意個步驟結束後設置檢查步驟，切換點光源照 明或面光源照明並照射至基板，藉由目視其反射光線或者 將其影像予以攝像並進行晝像處理，來施行製品檢查。 此時，點光源照明係照射至檢查基板，檢查有無灰塵 與其他微粒等異物的附著、針孔（pinh〇le)、保護膜下層 的不均勻性、形成於下層的IT0 (indiunl tin oxide;銦 錫氧化物）（透明電極）有無不良等。 Φ 此外，藉由點光源光線於檢查基板表面產生繞射亮 線 邊改變對檢查基板光轴的傾斜一邊使繞射亮線移 動，於其亮線上，檢查電路圖案的斷線、有無短路、光阻 膜的剝落或有無去除不良等。 再者，藉由面光源照明，檢查形成於檢查基板表面的 光阻膜膜厚的不均勻、或形成於表層的IT0有無不良等。 然而，習知的基板檢查用照明裝置係如第4圖所示， 使仗光源51照射的光線收斂，並使其透過放置於其焦點位 置的散射板52後，藉由反射鏡53使其反射並藉由平行化 318565 5 1314642 菲涅耳透鏡使其平行化後，再藉由收斂化用菲涅耳透鏡5 5 使其收斂化，並藉由將配置於其菲涅耳透鏡55的射出面側 的液晶散射板56切換成透明/不透明，而選擇性地照射點 光源照明光線/面光源照明光線至檢查基板5 7。 (專利文獻1)日本特開第2002-71571號公報 為了容易發現有無缺陷，以使用強光為宜，因此，使 照射至檢查基板5 7的照明光線不發散而藉由收斂化用菲 涅耳透鏡55使其收斂，但由於該透鏡55必然為比檢查基 板57大相當程度者，故液晶散射板56也必須大型化^ 然而，液晶散射板56越大型化則成本越高，此外，由 於為f璃製，故有容易破裂的問題，當破裂時，便有其碎 片掉落到檢查基板57上，使欲成為製品的基板57受到損 傷而必須廢棄的問題產生。 、 並且’如第5圖所示’可嘗試將菲涅耳透鏡61配置於 反射鏡53的近旁’於藉由該菲科透鏡61所收斂化之照 籲明光線的光軸上將液晶散射板56配置成與菲涅耳透鏡Η 隔有距離，從而將液晶散射板予以小型化。 (專利文獻2)日本特開第2〇〇2 —7157〗號公報 然而’如同上述，於檢查基板時，由於必須一 板57的光軸之傾斜—邊使繞射亮線移動，故為確 U曰1 ’必須將液晶散射板配置於第4 涅耳透鏡54的位置。 徵化用非 因此，當將照明光線照射至與第4圖相 檢查基板27時，不僅需要盥m 又大小的 不僅而要與弟4圖㈣程度大小的液晶散 318565 6 1314642 射板56,反射鏡53及菲淫耳透鏡61會比使用帛4圖所干 光學系的透鏡更加大型化，結果不僅無法將液晶散射板^ 小型化，亦無法解決液晶散射板56破裂時的問題。 而且，在習知技術中，為了將點光源照明照射至檢查 基板57全體時的配储性（光線分布）平均化，而將 散射板52配置於光源51的焦點位置，但散射板52雖將配 光特性平均化，卻有使全體光線強度降低的問題。 而且’為了抑制光線強度的降低，而加大菲涅耳透鏡 55或61的收斂角度時，各透鏡55及61係大型化，當使 用大光量的物品作為光源51時，設備f、運轉費用便田提 高，且因光源51的熱影響致使散射板52的壽命縮短。 此外，由於使用散射板52,會有龍光源照明照射至 檢查基板57相繞射亮線不顯著，而模糊難以辨識的問 當不使用散射板52時，照明光線的配光特性峰值變的 陡峭’在將液晶散射板56切換成透明並使點光源昭明發散 而照射至檢查基板57全體時，由於在檢查基板”上，光 線強度會隨著遠離光軸而跟著顯著降低，故會產生檢杳某 板57的周緣部變暗而檢查精密度降低的問題曰。欢一土 【發明内容】 (發明所欲解決的課題） 課題，第一技 即使破損時也 明亮的繞射亮 因此，本發明的目的係欲解決兩個技術 術課7ξ|係將液晶散射板予以小型化，同時， 不使其碎片掉落到檢查基板上，並且能獲得 318565 7 1314642 亦會映射入檢查基板全體，故不會產生因液晶散射板的影 像僅映射入檢查基板的一部分而導致照明光線不均勻的情 形。 月 此外，由於將液晶散射板配置在比菲涅耳透鏡更靠近 光源裝置側，故能將液晶散射板設計於菲涅耳透鏡的上 方，因此，即使液晶散射板破裂時，由於碎片會掉落到比 液晶散射板更大的菲涅耳透鏡上，故能防止碎片直接掉落 到檢查基板。 而且，當來自光源裝置所照射的非散射光線係射入至 液晶散射板，且將液晶散射板切換成透明以作為點光源照 明時’由於其非散射光線直接照射至檢查基板，故於檢查 基板產生鮮㈣虹彩色繞射亮線，故容f察覺附著於表^ 的篡物。 昭 化〇 此外，即使將液晶散射板切換成不透明以作為面光源 明時’由於原本的光線強度很高，故不會降低光量，因 ί射員：大菲涅耳透鏡的收斂角度’故只要將照明光線 …㈣尺寸的檢查基板，亦能將菲料透鏡予以小型 =情形中’係於光源裝置的光射出部，將照明光束整 >成檢查練的形狀，同時安裝使光線分 化整形透鏡裝置，由於使非散射光線照射時之檢杳』= =光線強度分布係變為平均，故亦有遠離光軸的周㈣之 ,¾射度不會降低’而不會難以辨識的效果。 、、 並且，只要於均勾化整形透鏡裝置備置照射角度可變 318565 9 1314642 •的變焦（zoom)機構，於組裝照明裝置時，由於可根據菲 .退耳透鏡的大小自由地調整照射角度，故只要有一個種類 的均勻化整形透鏡裝置即可，而無須根據菲淫耳透鏡等的 ，格來變更設計，亦無輕更到達菲料透鏡的照射距離。 【實施方式】 士在本實施例中，4了達成將液晶散射板予以小型化， ^吩，即使破損時其碎片也不會掉落到檢查基板上，並且 能獲得明亮的繞射亮線之㈣，而將液晶散射板配置於比 菲&耳透鏡更罪近光源裝置側、且使照明光束的剖面形狀 相等於檢查基板或比檢查基板更大的位置，藉由使來自光 源裳置照射的非散射光線射入至液晶散射板，而選擇性地 照射成為點光源照明的非散射光線或成為面光源照明的散 射光線。 第1圖係顯示本發明基板檢查用照明裝置的一例之說 明圖。第2圖係顯示均勻化整形透鏡之說明圖，第3圖係 鲁擴大照射角度時的光線圖。 (實施例1) 第1圖所示的基板檢查用照明裝置丨係使用於一邊為 lm左右或lm以上的混合式（hybrid)液晶顯示面板或大 型印刷電路板等大型基板的檢查者，其在從發散照射非散 射光線的光源裝置2至檢查基板的照明光軸X上具備有： 菲涅耳透鏡3，係將照明光線予以收斂化或平行化；以及 液晶散射板4，其用以將照射至檢查基板κ的照明光線切 換成點光源照明或面光源照明。 318565 10 1314642 光源裝置2係如第2圖所示，具備有：光源5，其使 用用以發射非散射光線之鶴絲鹵素燈（ha 1 〇gen 1 amp )、金 '屬鹵素燈（metal halide lamp)等高壓放電燈；橢圓反射 鏡6，用以使其光源聚光；光引導管7，用以引導被聚光的 光線；以及均勻化整形透鏡裝置8，其配置在光射出端並 連接光導引管7。 均勻化整形透鏡裝置8係具備有/:角柱狀的矩型柱光 學積分器（ rod integrator) 9，其具有縱橫比與檢查基板 # κ相等的方型剖面；以及可變焦距透鏡（variable f〇cal lens) 10，其可調整從矩型柱光學積分器9射出的照明光 線的照射角度。 當光線射入至矩型柱光學積分器9時，於内部反覆進 行全反射，使光線分布在射出端變得均勾。本實施形態的 矩型柱光學積分器9係以非散射光線在檢查基板κ上的均 勻性（uniformity)為70至loo%的方式來設計。 • 均勻性U係由照射照明光線時的最大光量pmax與最小 光量Pmin以下式來定義。 U= { 1- (Pmax-Pmin) / (Pmax+Pmin) } Xl〇〇(〇/0) 當最大光量Pmax與最小光量Pmin相等時，可說是均 勻性係蓮的理想光源，但實際上無法避免光線分布的強 弱。 然❿，若均勾性降低至未滿7〇%，則使非散射光線照 射至檢查基板K時，光軸上的明亮度與周緣部的明亮度差 異過大’以目視時和以晝像處理時的檢查精確度都會降 318565 11 1314642 ；低，相對地，只要均勻性u為7⑽以上則不會產生該問題， 故使均勻性Ug 70%。 此外’可變焦距透鏡！ 〇係將2個透鏡i 〇a及⑽同轴 配置成複口式透鏡，藉由各自使透鏡1〇A及⑽移動而能 調整照射角度，故即使檢查基板κ的大小、菲淫耳透鏡3 和液晶散射板4的規格不同時，亦能使用原有的物品而無 須依照其規格重新設計光源裝置2。 例如，在第1圖的基板檢查用照明裝置1中，照射角 •度為約25的情形中，在第3圖所示之用以檢查一邊的長度 =1.8倍的檢查基板基板檢查用照明裝置丨丨中，由於 菲涅耳透鏡12和液晶散射板13係對應檢查基板1[的大小 而也使用大尺寸者，故在相同的照射角度中無法使光線照 射至檢查基板Κ全體。 _該情形中’由於在習知的光源裝置中不得不拉長到達 非涅耳透鏡3的距離，故光線強度的衰減很顯著，但在本 籲實施形態中，能藉由可變焦距透鏡丨〇將照射角度從約2 5。 擴展成約45。，以設定成最適當的照射角度。 ^藉此，能將到達菲涅耳透鏡3的距離維持在一定的狀 ，下調整照射角度，故光線強度的衰減便減少，也不須於 每次設計不同規格的照明裝置丨、n時重新設計光源裝置 2 ° / —而且，如第1圖所示，從光源裝置2射出的照明光線 係藉由反射鏡14被反射並沿著照明光軸χ行邋，藉由配置 於其光軸X上的菲涅耳透鏡3將其收斂化或平行化並照射 318565 12 1314642 因此，即使液晶散射板4破裂時，亦可藉由比液 :散射板4更大的菲科透鏡3接住碎片，故碎片不 洛到檢查基板K，因此幾乎不會造成損傷。 曰 以上係本發明的一例之構成，接著說明其作用。 士當檢查基板K被搬送至基板檢查用照明裝置〗的下方 時’因應其檢查目的，藉由照明光線切換手段15來選 光源照明及面光源照明。 ”’ 施行點光源照明的檢查時，在使光縣置2點亮的狀 也下將液晶散射板4切換成透明，則來自光源裝置2的非 散射光線係藉由反射鏡14反射並直接透過液晶散射板4 而發散行進職菲料透鏡3，藉由菲料魏3使其收 敛化並照射至檢查基板K。 此時，作為點光源照明的非散射光線從光引導管了射 2藉由㈣化整形透縣置8的矩脉光學積分器9及 變焦距透鏡10以預定的照射角度發散，並照射至檢查基 板K全體’藉此，能檢查檢查基板κ上有無附著灰塵或其 他微粒等異物、有無針孔、保護膜的下層的不均勾性以及 形成在下層的ΙΤΟ (透明電極）有無不良等。 而且，使非散射的點光源照明發散照射時，由於不項 將照明光束的周緣部予以遮光，而储由矩型柱光學料 器9整形成檢查基板Κ的形狀，故不會浪費光源。、 此外，藉由矩型柱光學積分器9使光線分布均句化並 ，檢查基板Κ上的光線強度分布變為平均，故有遠離光抽 X的周緣部之照明度不會降低而不會變得難以辨識的效 318565 14 1314642 果。 此外，由於從光源裝置2所照射的非散射光線直接照 射至檢查基板K，故於檢查基板κ產生鮮明的虹彩色繞射 亮線，而在其亮線上變的容易識別，且藉由一邊改變對檢 查基板Κ的照明光軸X的傾斜一邊使繞射亮線移動，故於 檢查基板Κ的全體，能高精密度檢查例如有無電路圖案的 斷線、短路、光阻膜的剝落或有無去除不良等異常。 於施行以面光源照明進行的檢查情形中，在使光源裝 置2點冗的狀悲下將液晶散射板4切換成不透明（乳白色） 時’來自光源裝置2的非散射光線藉由反射鏡14反射並藉 由液晶散射板散射，該光線成為散射光線並射入至菲涅耳 透鏡3且均勻地照射至檢查基板κ，藉此，檢查形成於檢 查基板κ表面的光阻膜膜厚的不均勾，和形成於表層的ιτ〇 有無不良等。 此時，由於液晶散射板4配置於菲涅耳透鏡3的光源 .裝置2側，故越遠離菲涅耳透鏡3越能予以小型化。 此外，由於將液晶散射板4配置於使照明光束的剖面 形狀相等於檢查基板κ或比檢查基板κ更大的位置，故能 予以小型化成相等於檢查基板κ的大小。 亦即’液晶散射板4係確保有檢查基板κ的大小，即 使將液晶散射板4切換成不透明以作為面光源照明時，液 晶散射板4的成像亦會均句地映射人檢查基板κ的全體， 故液晶散射板4不會僅映射入檢查基板㈣一部分，因此， 在檢查基板Κ上也不會產生照明光線的不均勻。 318565 15 1314642 此外，即使將液晶散射板切換成不透明以作為面光源 照明時，由於原本的光線強度很高，故不會降低光量，因 匕無須加大菲》圼耳透鏡的收敛角度，故照射照明光線至 相同尺寸的檢查基板時，也能將菲涅耳透鏡予以小型化。 再者，藉由點光源照明、面光源照明之任一方的照明 來松查時，液晶散射板4係配置於比菲涅耳透鏡3更靠近 “原裳置2側，故此將液晶散射板4配置於菲淫耳透鏡3 ，上方，因此，即使液晶散射板4破裂時，由於碎片會掉 落到比液晶散射板4更大的菲涅耳透鏡3上，故能防止直 接掉落到檢查基板K的損害。 、 #者，只要於均勾化整形透鏡裝置8具備照射角度可 • ^的可變焦距透鏡，則於設相縣置丨時，由於能依據 =耳透鏡3的大小自由調整照射角度，故無須根據菲淫 =鏡3等的規格而重新設収㈣置2，亦無須變更到 色涅耳透鏡3為止的照射距離。 # f上述的說明中’係說明了關於使驗型柱光學積分 =為均W整形透鏡裝置δ的情形，但使用複眼透鏡 (iy-eye lens)時亦同樣可行。 (利用於產業上的可行性） 型印::::等係能適用於檢查液晶顯示面板和大 作為, 昭射至的.，切換點光源照明或面光源照明以 射至其基板的照明光線之用途。 【圖式簡單說明】 第1圖係顯示本發明的基板檢查用照明裝置的-例之 318565 16 1314642 說明圖。 '第2圖係顯示光源裝置的說明圖。 •第3圖係顯示適用了不同規格的基板檢查用照明裝置 的例子之說明圖。 第4圖係顯示習知裝置的說明圖。 第5圖係顯示習知裝置的說明圖。 【主要元件符號說明】 1 ' 11 基板檢查用照明裝置 2 光源裝置 3 、 12 、 54 、55、61菲涅耳透鏡 4 ' 13 、 56 液晶散射板 5 ^ 51 光源 6 橢圓反射鏡 7 光引導管 8 均勻化整形透鏡裝置 9 矩型柱光學積分器 10 可變焦距透鏡 10A、10B 透鏡 14、53 反射鏡 15 照明光線切換手段 52 散射板 X 照明光軸 K、57 檢查基板 17 318565[Technical Field] The present invention relates to an illumination device for substrate inspection, in which a Fresnel lens is disposed on an illumination optical axis from a light source device that irradiates non-scattered light to an inspection substrate. (Fresnel lens), used to converge or parallelize the light, and illuminate the illumination to the entire inspection substrate. [Prior Art] In a manufacturing line such as a liquid crystal display panel or a large printed circuit board, an inspection step is set after any step is completed, and the point source illumination or the surface light source illumination is switched and irradiated to the substrate, by visually reflecting the reflected light or The image is imaged and subjected to keying processing to perform product inspection. At this time, the point light source illumination is irradiated onto the inspection substrate, and the presence or absence of adhesion of foreign matter such as dust and other fine particles, pinholes, unevenness of the lower layer of the protective film, and IT0 (indiunl tin oxide; indium) formed in the lower layer are inspected. Tin oxide) (transparent electrode) with or without defects. Φ In addition, by diffracting the light source on the surface of the inspection substrate to produce a diffractive bright line while changing the inclination of the optical axis of the inspection substrate, the diffraction bright line is moved, and on the bright line, the circuit pattern is checked for disconnection, short circuit, and light. Peeling of the resist film or the presence or absence of removal. Further, by the surface light source illumination, the unevenness of the thickness of the photoresist film formed on the surface of the inspection substrate or the presence or absence of the IT0 formed on the surface layer is checked. However, as shown in Fig. 4, the conventional illumination device for substrate inspection converges the light irradiated by the xenon light source 51, transmits it to the scattering plate 52 placed at the focus position, and reflects it by the mirror 53. And parallelizing the Fresnel lens by parallelizing 318565 5 1314642, and then converging it by the Fresnel lens 5 5 by convergence, and by arranging the exit surface of the Fresnel lens 55 The side liquid crystal scattering plate 56 is switched to be transparent/opaque, and selectively illuminates the point source illumination/surface source illumination light to the inspection substrate 57. In order to easily detect the presence or absence of defects, it is preferable to use strong light. Therefore, the illumination light that is irradiated onto the inspection substrate 57 is not diverged, and the Fresnel is used for convergence. The lens 55 is converged. However, since the lens 55 is necessarily larger than the inspection substrate 57, the liquid crystal diffusion plate 56 must be enlarged. However, the larger the liquid crystal diffusion plate 56 is, the higher the cost is. Since the glass is made of glass, there is a problem that it is easily broken. When it is broken, the chip is dropped on the inspection substrate 57, and the substrate 57 to be a product is damaged and must be discarded. And 'as shown in Fig. 5', it is attempted to arrange the Fresnel lens 61 in the vicinity of the mirror 53. The liquid crystal scattering plate is placed on the optical axis of the bright light condensed by the Ficoll lens 61. The 56 is disposed at a distance from the Fresnel lens to reduce the size of the liquid crystal scattering plate. (Patent Document 2) Japanese Laid-Open Patent Publication No. 2-77-1, however, as in the above, when the substrate is inspected, since the optical axis of one plate 57 is required to be tilted, the diffraction bright line is moved. U曰1 'The liquid crystal scattering plate must be placed at the position of the 4th inner lens 54. Therefore, when the illumination light is irradiated to the substrate 27 inspected with the fourth image, not only the size of the 盥m but also the size of the liquid crystal 318565 6 1314642 is required to be reflected. The mirror 53 and the spectacles 61 are larger than the lenses of the dry optical system of the Fig. 4, and as a result, the liquid crystal scattering plate cannot be miniaturized, and the problem that the liquid crystal scattering plate 56 is broken cannot be solved. Further, in the prior art, in order to average the storage property (light distribution) when the point source illumination is irradiated to the entire inspection substrate 57, the scattering plate 52 is disposed at the focus position of the light source 51, but the diffusion plate 52 will The light distribution characteristics are averaged, but there is a problem that the overall light intensity is lowered. Further, when the convergence angle of the Fresnel lens 55 or 61 is increased in order to suppress the decrease in the light intensity, the lenses 55 and 61 are enlarged, and when a large amount of light is used as the light source 51, the equipment f and the running cost are increased. The field is increased, and the life of the diffusing plate 52 is shortened due to the thermal influence of the light source 51. In addition, since the scattering plate 52 is used, there is a fact that the light source of the dragon light source is irradiated to the inspection substrate 57, and the diffracted bright line is not conspicuous, and the blur is difficult to recognize. When the scattering plate 52 is not used, the peak of the light distribution characteristic of the illumination light becomes steep. 'When the liquid crystal scattering plate 56 is switched to be transparent and the point light source is diverged and emitted to the entire inspection substrate 57, since the intensity of the light is significantly lowered as it moves away from the optical axis on the inspection substrate, inspection will occur. The peripheral portion of a certain plate 57 is darkened, and the problem of the precision is lowered. 欢 土 土 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 【 The purpose is to solve the two technical courses 7ξ|The liquid crystal scattering plate is miniaturized, and at the same time, the debris is not dropped on the inspection substrate, and the 318565 7 1314642 can be mapped into the inspection substrate as a whole, so There is a case where the image of the liquid crystal scattering plate is only mapped to a part of the inspection substrate, resulting in uneven illumination light. In addition, since the liquid crystal scattering plate is disposed in a ratio The Neel lens is closer to the side of the light source device, so the liquid crystal scattering plate can be designed above the Fresnel lens. Therefore, even if the liquid crystal scattering plate is broken, the debris will fall to a larger Fresnel lens than the liquid crystal scattering plate. Up, it is possible to prevent the debris from falling directly onto the inspection substrate. Moreover, when the non-scattered light from the light source device is incident on the liquid crystal scattering plate, and the liquid crystal scattering plate is switched to be transparent to be illuminated as a point light source, The non-scattered light is directly irradiated onto the inspection substrate, so that a fresh (four) rainbow-colored diffractive bright line is generated on the inspection substrate, so that the object is attached to the object attached to the surface. In addition, even if the liquid crystal scattering plate is switched to be opaque, When the surface light source is bright, 'because the original light intensity is very high, it will not reduce the amount of light. Because of the convergence angle of the large Fresnel lens, it is only necessary to illuminate the light... (4) The size of the inspection substrate can also be used. The lens is small: in the case of 'light-emitting portion of the light source device, the illumination beam is rounded into a shape to be inspected, and the light is differentiated and shaped. Since the detection of non-scattered light is 杳 = = the intensity distribution of the light is averaged, there is also a week (4) away from the optical axis, and the 3⁄4 radiance does not decrease 'and the effect is not difficult to recognize. In addition, as long as the zoom lens device is provided with a zoom mechanism with an irradiation angle of 318565 9 1314642, the illumination angle can be freely adjusted according to the size of the Philippine ear lens when assembling the illumination device. As long as there is one type of uniform shaping lens device, it is not necessary to change the design according to the Philippine lens or the like, and there is no light reaching the irradiation distance of the Philippine lens. [Embodiment] In this embodiment, 4, to achieve the miniaturization of the liquid crystal scattering plate, ^ Illustrated, even if the damage will not fall on the inspection substrate, and can obtain a bright diffractive bright line (4), and the liquid crystal scattering plate is placed in the ratio The phenanthrene & ear lens is more sinful to the light source device side, and the cross-sectional shape of the illumination beam is equal to the inspection substrate or a larger position than the inspection substrate, by causing the non-scattered light to be irradiated from the light source Incident on the diffusion plate to the liquid crystal, and selectively irradiating light scattered in a non-point source of illumination or light scattering becomes a surface light source illumination. Fig. 1 is an explanatory view showing an example of the illumination device for substrate inspection of the present invention. Fig. 2 is an explanatory view showing a uniformizing lens, and Fig. 3 is a ray diagram when the angle of illumination is enlarged. (Example 1) The illuminating device for substrate inspection shown in Fig. 1 is used for an examiner of a large substrate such as a hybrid liquid crystal display panel or a large printed circuit board having a size of about 1 m or more. From the light source device 2 that diverges the non-scattered light to the illumination optical axis X of the inspection substrate, the Fresnel lens 3 is used to converge or parallelize the illumination light, and the liquid crystal diffusion plate 4 is used to illuminate The illumination light to the inspection substrate κ is switched to point source illumination or surface source illumination. 318565 10 1314642 The light source device 2, as shown in Fig. 2, is provided with a light source 5 using a crane halogen lamp (ha 1 〇gen 1 amp ) for emitting non-scattered light, and a metal halide lamp (metal halide). a high-pressure discharge lamp; an elliptical mirror 6 for concentrating the light source; a light guiding tube 7 for guiding the collected light; and a homogenizing shaping lens device 8 disposed at the light emitting end and connected Light guiding tube 7. The homogenizing and shaping lens device 8 is provided with a rectangular rod optical integrator having a /: a columnar shape, a square cross section having an aspect ratio equal to the inspection substrate # κ, and a variable focal length lens (variable f〇) Cal lens 10, which adjusts the illumination angle of the illumination light emitted from the rectangular column optical integrator 9. When the light is incident on the rectangular column optical integrator 9, the total reflection is internally repeated, so that the light distribution becomes uniform at the exit end. The rectangular column optical integrator 9 of the present embodiment is designed such that the uniformity of the non-scattered light on the inspection substrate κ is 70 to loo%. • The uniformity U is defined by the maximum amount of light pmax and the minimum amount of light Pmin when the illumination light is irradiated. U= { 1- (Pmax-Pmin) / (Pmax+Pmin) } Xl〇〇(〇/0) When the maximum amount of light Pmax is equal to the minimum amount of light Pmin, it is an ideal source of uniformity, but in fact The strength of the light distribution cannot be avoided. Then, if the hooking property is reduced to less than 7〇%, when the non-scattering light is irradiated onto the inspection substrate K, the brightness on the optical axis and the brightness of the peripheral portion are too large to be 'visually and imaged. The inspection accuracy will drop 318565 11 1314642; low, relatively, as long as the uniformity u is 7 (10) or more, this problem will not occur, so the uniformity Ug is 70%. In addition' zoom lens! The two lenses i 〇 a and (10) are coaxially arranged as a double-lens lens, and the irradiation angle can be adjusted by moving the lenses 1A and (10), so that even if the size of the substrate κ is examined, the Philippine lens 3 is examined. When the specifications of the liquid crystal diffusing plate 4 are different, the original article can be used without redesigning the light source device 2 in accordance with the specifications. For example, in the illumination device 1 for substrate inspection according to Fig. 1, in the case where the irradiation angle is about 25, the inspection substrate substrate inspection illumination device having the length of the inspection side shown in Fig. 3 = 1.8 times In the crucible, since the Fresnel lens 12 and the liquid crystal scattering plate 13 are also large in size in accordance with the size of the inspection substrate 1, the light cannot be irradiated onto the entire inspection substrate at the same irradiation angle. In this case, since the distance to the non-Neer lens 3 has to be elongated in the conventional light source device, the attenuation of the light intensity is remarkable, but in the present embodiment, the variable focal length lens can be used. 〇 The angle of illumination is from about 2 5 . Expanded to approximately 45. To set the most appropriate illumination angle. ^ Thereby, the distance to the Fresnel lens 3 can be maintained in a certain shape, and the illumination angle can be adjusted downward, so that the attenuation of the light intensity is reduced, and it is not necessary to redesign each time the lighting device of different specifications is designed. The light source device is designed to be 2 ° / - and as shown in Fig. 1, the illumination light emitted from the light source device 2 is reflected by the mirror 14 and is entangled along the illumination axis, and is disposed on the optical axis X thereof. The Fresnel lens 3 on the upper side attenuates or parallelizes and irradiates 318565 12 1314642. Therefore, even if the liquid crystal scattering plate 4 is broken, the Fico lens 3 which is larger than the liquid: scattering plate 4 can catch the fragments, so The debris does not go to the inspection substrate K, so there is almost no damage.曰 The above configuration of an example of the present invention will be described next. When the inspection substrate K is transported to the lower side of the substrate inspection illumination device, the light source illumination and the surface light source illumination are selected by the illumination light switching means 15 for the purpose of inspection. When performing the inspection of the point source illumination, the liquid crystal scattering plate 4 is switched to be transparent in the case where the light source is turned on, and the non-scattered light from the light source device 2 is reflected by the mirror 14 and directly transmitted. The liquid crystal diffusing plate 4 diverges and travels to the inspection lens 3, and is condensed by the fluorescene material 3 to illuminate the inspection substrate K. At this time, the non-scattered light that is illuminated as a point source is emitted from the light guiding tube 2 (4) The optical optical integrator 9 and the varifocal lens 10 of the grading and setting 8 are diverged at a predetermined irradiation angle, and are irradiated to the entire inspection substrate K. Thus, it is possible to check whether or not the inspection substrate κ is attached with dust or other particles. Foreign matter, presence or absence of pinholes, unevenness of the lower layer of the protective film, and presence or absence of defects in the lower layer of ΙΤΟ (transparent electrode). Moreover, when the non-scattering point source is illuminated and diverged, the periphery of the illumination beam is not affected. The portion is shielded from light, and the shape of the inspection substrate is formed by the rectangular column optical material 9 so that the light source is not wasted. Further, the light distribution is uniformed by the rectangular column optical integrator 9 Since the light intensity distribution on the substrate 变为 is averaged, the illuminance of the peripheral portion away from the light extraction X does not decrease and does not become difficult to recognize. 318565 14 1314642. Further, due to the illumination from the light source device 2 The non-scattered light is directly irradiated onto the inspection substrate K, so that the inspection substrate κ produces a sharp rainbow-colored diffractive bright line, which is easily recognized on its bright line, and by changing the illumination optical axis X of the inspection substrate 一边By tilting and moving the diffraction bright line, it is possible to inspect the entire substrate ,, and to check for high-precision, for example, whether or not the circuit pattern is broken, short-circuited, peeling of the photoresist film, or presence or absence of removal failure. In the inspection case performed, when the liquid crystal device 4 is switched to opaque (milky white) under the sorrow of the light source device 2, the non-scattered light from the light source device 2 is reflected by the mirror 14 and is passed through the liquid crystal scattering plate. Scattering, the light becomes scattered light and is incident on the Fresnel lens 3 and uniformly irradiated to the inspection substrate κ, thereby inspecting the photoresist film formed on the surface of the inspection substrate κ The unevenness of the hook and the presence or absence of defects formed on the surface layer. In this case, since the liquid crystal scattering plate 4 is disposed on the side of the light source and the device 2 of the Fresnel lens 3, the smaller the distance from the Fresnel lens 3, the smaller the size. Further, since the liquid crystal scattering plate 4 is disposed such that the cross-sectional shape of the illumination light beam is equal to or larger than the inspection substrate κ, it can be downsized to be equal to the size of the inspection substrate κ. The scattering plate 4 ensures the size of the inspection substrate κ. Even when the liquid crystal scattering plate 4 is switched to be opaque to be illuminated as a surface light source, the imaging of the liquid crystal scattering plate 4 uniformly maps the entire substrate κ, so the liquid crystal scattering The plate 4 is not only mapped into a part of the inspection substrate (4), and therefore, unevenness of illumination light is not generated on the inspection substrate 。. 318565 15 1314642 Further, even if the liquid crystal diffusion plate is switched to be opaque to be used as a surface light source, The original light intensity is very high, so it does not reduce the amount of light, because it does not need to increase the convergence angle of the Philippine lens, so the illumination light is illuminated to the same size. When the check substrate, miniaturization can also be a Fresnel lens. Further, when the light source illumination or the surface light source illumination is used for illumination, the liquid crystal diffusion plate 4 is disposed closer to the "spot" side than the Fresnel lens 3, so that the liquid crystal diffusion plate 4 is used. It is disposed on the upper side of the Philippine lens 3, and therefore, even if the liquid crystal scatter plate 4 is broken, since the shards may fall onto the Fresnel lens 3 larger than the liquid crystal scatter plate 4, it is possible to prevent direct drop to the inspection substrate. K damage, #, as long as the uniform lens device 8 has a zoom lens with an illumination angle of ^ ^, when the phase is set, the radiation can be adjusted according to the size of the ear lens 3 Since it is angled, it is not necessary to re-set according to the specifications of Philippine Mirror = Mirror 3 (4), and there is no need to change the irradiation distance to the lens lens 3. #f In the above description, the description is about making the inspection column. Optical integration = the case of a uniform W-shaping lens device δ, but it is also possible to use an iy-eye lens. (Using industrial feasibility) Printing:::: Can be used to check liquid crystals Display panel and big as, 昭射到., switching point The light source illumination or the surface light source illumination is applied to the illumination light of the substrate. [Description of the drawings] Fig. 1 is an explanatory view showing an example of the illumination device for substrate inspection of the present invention, 318565 16 1314642. FIG. 3 is an explanatory view showing an example of a lighting device for substrate inspection to which different specifications are applied. Fig. 4 is an explanatory view showing a conventional device. Fig. 5 is a view showing a conventional device Description of the main components [1] 11 Illumination device for substrate inspection 2 Light source device 3, 12, 54 , 55, 61 Fresnel lens 4 ' 13 , 56 Liquid crystal scattering plate 5 ^ 51 Light source 6 Elliptical mirror 7 Light guide tube 8 Homogenization lens unit 9 Rectangular column optical integrator 10 Variable focal length lens 10A, 10B Lens 14, 53 Mirror 15 Illumination light switching means 52 Scattering plate X Illumination optical axis K, 57 Inspection substrate 17 318565