TWI312812B - - Google Patents

Download PDF

Info

Publication number
TWI312812B
TWI312812B TW95107803A TW95107803A TWI312812B TW I312812 B TWI312812 B TW I312812B TW 95107803 A TW95107803 A TW 95107803A TW 95107803 A TW95107803 A TW 95107803A TW I312812 B TWI312812 B TW I312812B
Authority
TW
Taiwan
Prior art keywords
coating
film
coating chamber
line
replaceable
Prior art date
Application number
TW95107803A
Other languages
English (en)
Chinese (zh)
Other versions
TW200734474A (en
Inventor
Chia Ming Hsu
Original Assignee
Chienkuo Technology Universit
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chienkuo Technology Universit filed Critical Chienkuo Technology Universit
Priority to TW095107803A priority Critical patent/TW200734474A/zh
Publication of TW200734474A publication Critical patent/TW200734474A/zh
Application granted granted Critical
Publication of TWI312812B publication Critical patent/TWI312812B/zh

Links

Landscapes

  • Physical Vapour Deposition (AREA)
TW095107803A 2006-03-08 2006-03-08 Film-coating device with replaceable coating chamber TW200734474A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW095107803A TW200734474A (en) 2006-03-08 2006-03-08 Film-coating device with replaceable coating chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW095107803A TW200734474A (en) 2006-03-08 2006-03-08 Film-coating device with replaceable coating chamber

Publications (2)

Publication Number Publication Date
TW200734474A TW200734474A (en) 2007-09-16
TWI312812B true TWI312812B (ja) 2009-08-01

Family

ID=45072654

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095107803A TW200734474A (en) 2006-03-08 2006-03-08 Film-coating device with replaceable coating chamber

Country Status (1)

Country Link
TW (1) TW200734474A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI486469B (zh) * 2010-04-22 2015-06-01 Hon Hai Prec Ind Co Ltd 鍍膜系統

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI396760B (zh) * 2008-06-13 2013-05-21 Hon Hai Prec Ind Co Ltd 自動鍍膜裝置
TWI415967B (zh) * 2008-11-28 2013-11-21 Hon Hai Prec Ind Co Ltd 鍍膜工件承載裝置及鍍膜方法
TWI384085B (zh) * 2009-05-07 2013-02-01 Univ Kao Yuan 往復式雙段噴射常壓電漿鍍膜系統
TWI452168B (zh) * 2010-06-21 2014-09-11 Hon Hai Prec Ind Co Ltd 電漿式鍍膜裝置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI486469B (zh) * 2010-04-22 2015-06-01 Hon Hai Prec Ind Co Ltd 鍍膜系統

Also Published As

Publication number Publication date
TW200734474A (en) 2007-09-16

Similar Documents

Publication Publication Date Title
TWI312812B (ja)
US7874262B2 (en) Masking system for the masking of a crank chamber of an internal combustion engine
JP5363910B2 (ja) 真空ポンプ
JP2009534574A5 (ja)
JP5010875B2 (ja) 洗浄装置及び洗浄方法
TWI647331B (zh) 成膜裝置及排氣裝置以及排氣方法
US9580805B2 (en) Vapor deposition system and method
JPWO2010038271A1 (ja) スパッタリング装置および薄膜形成方法
JP6322508B2 (ja) 真空処理装置
TW201116720A (en) Gas discharge structure, and device and method for plasma processing
CN107413715A (zh) 靶材的清洁方法
TWI757969B (zh) 用於晶圓釋氣的電漿增強式退火腔室
US20210079514A1 (en) Sputtering Method and Sputtering Apparatus
JP4816616B2 (ja) ガスシャワーヘッド、処理装置、処理方法及び処理装置のメンテナンス方法
KR20210026366A (ko) 그래핀 전사를 위한 진공 합착장치
CN111621769A (zh) 半导体制造装置的排气管道
CN101360844A (zh) 溅射靶、溅射靶材及其制造方法
TWI311590B (ja)
TWI447249B (zh) 混合氣體供給系統、濺鍍裝置及濺鍍方法
JP6316759B2 (ja) ガス供給系清浄化方法および基板処理装置
JP2004218648A (ja) 真空装置
US20120196148A1 (en) Coated article and method of making the same
JP2008181799A (ja) プラズマ加工装置およびプラズマ加工方法
CN108917448B (zh) 一种高均匀性超薄热交换管
JP6422074B2 (ja) 真空処理装置