TWI312812B - - Google Patents
Download PDFInfo
- Publication number
- TWI312812B TWI312812B TW95107803A TW95107803A TWI312812B TW I312812 B TWI312812 B TW I312812B TW 95107803 A TW95107803 A TW 95107803A TW 95107803 A TW95107803 A TW 95107803A TW I312812 B TWI312812 B TW I312812B
- Authority
- TW
- Taiwan
- Prior art keywords
- coating
- film
- coating chamber
- line
- replaceable
- Prior art date
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW095107803A TW200734474A (en) | 2006-03-08 | 2006-03-08 | Film-coating device with replaceable coating chamber |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW095107803A TW200734474A (en) | 2006-03-08 | 2006-03-08 | Film-coating device with replaceable coating chamber |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200734474A TW200734474A (en) | 2007-09-16 |
TWI312812B true TWI312812B (ja) | 2009-08-01 |
Family
ID=45072654
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095107803A TW200734474A (en) | 2006-03-08 | 2006-03-08 | Film-coating device with replaceable coating chamber |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW200734474A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI486469B (zh) * | 2010-04-22 | 2015-06-01 | Hon Hai Prec Ind Co Ltd | 鍍膜系統 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI396760B (zh) * | 2008-06-13 | 2013-05-21 | Hon Hai Prec Ind Co Ltd | 自動鍍膜裝置 |
TWI415967B (zh) * | 2008-11-28 | 2013-11-21 | Hon Hai Prec Ind Co Ltd | 鍍膜工件承載裝置及鍍膜方法 |
TWI384085B (zh) * | 2009-05-07 | 2013-02-01 | Univ Kao Yuan | 往復式雙段噴射常壓電漿鍍膜系統 |
TWI452168B (zh) * | 2010-06-21 | 2014-09-11 | Hon Hai Prec Ind Co Ltd | 電漿式鍍膜裝置 |
-
2006
- 2006-03-08 TW TW095107803A patent/TW200734474A/zh unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI486469B (zh) * | 2010-04-22 | 2015-06-01 | Hon Hai Prec Ind Co Ltd | 鍍膜系統 |
Also Published As
Publication number | Publication date |
---|---|
TW200734474A (en) | 2007-09-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI312812B (ja) | ||
US7874262B2 (en) | Masking system for the masking of a crank chamber of an internal combustion engine | |
JP5363910B2 (ja) | 真空ポンプ | |
JP2009534574A5 (ja) | ||
JP5010875B2 (ja) | 洗浄装置及び洗浄方法 | |
TWI647331B (zh) | 成膜裝置及排氣裝置以及排氣方法 | |
US9580805B2 (en) | Vapor deposition system and method | |
JPWO2010038271A1 (ja) | スパッタリング装置および薄膜形成方法 | |
JP6322508B2 (ja) | 真空処理装置 | |
TW201116720A (en) | Gas discharge structure, and device and method for plasma processing | |
CN107413715A (zh) | 靶材的清洁方法 | |
TWI757969B (zh) | 用於晶圓釋氣的電漿增強式退火腔室 | |
US20210079514A1 (en) | Sputtering Method and Sputtering Apparatus | |
JP4816616B2 (ja) | ガスシャワーヘッド、処理装置、処理方法及び処理装置のメンテナンス方法 | |
KR20210026366A (ko) | 그래핀 전사를 위한 진공 합착장치 | |
CN111621769A (zh) | 半导体制造装置的排气管道 | |
CN101360844A (zh) | 溅射靶、溅射靶材及其制造方法 | |
TWI311590B (ja) | ||
TWI447249B (zh) | 混合氣體供給系統、濺鍍裝置及濺鍍方法 | |
JP6316759B2 (ja) | ガス供給系清浄化方法および基板処理装置 | |
JP2004218648A (ja) | 真空装置 | |
US20120196148A1 (en) | Coated article and method of making the same | |
JP2008181799A (ja) | プラズマ加工装置およびプラズマ加工方法 | |
CN108917448B (zh) | 一种高均匀性超薄热交换管 | |
JP6422074B2 (ja) | 真空処理装置 |