TWI311590B - - Google Patents
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- Publication number
- TWI311590B TWI311590B TW95111036A TW95111036A TWI311590B TW I311590 B TWI311590 B TW I311590B TW 95111036 A TW95111036 A TW 95111036A TW 95111036 A TW95111036 A TW 95111036A TW I311590 B TWI311590 B TW I311590B
- Authority
- TW
- Taiwan
- Prior art keywords
- vacuum
- gas
- substances
- patent application
- coating system
- Prior art date
Links
- 239000007789 gas Substances 0.000 claims description 44
- 238000000576 coating method Methods 0.000 claims description 31
- 239000011248 coating agent Substances 0.000 claims description 30
- 238000004064 recycling Methods 0.000 claims description 13
- 238000011084 recovery Methods 0.000 claims description 12
- 239000000126 substance Substances 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 8
- 239000000919 ceramic Substances 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 8
- 238000001816 cooling Methods 0.000 claims description 3
- 238000005086 pumping Methods 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000013078 crystal Substances 0.000 claims 1
- 108010066057 cabin-1 Proteins 0.000 description 7
- 238000000034 method Methods 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000005611 electricity Effects 0.000 description 3
- 239000012495 reaction gas Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000000112 cooling gas Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW095111036A TW200736408A (en) | 2006-03-29 | 2006-03-29 | Coating system for multi-stage recycle and reuse of the coating substance and gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW095111036A TW200736408A (en) | 2006-03-29 | 2006-03-29 | Coating system for multi-stage recycle and reuse of the coating substance and gas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200736408A TW200736408A (en) | 2007-10-01 |
| TWI311590B true TWI311590B (enrdf_load_stackoverflow) | 2009-07-01 |
Family
ID=45072454
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW095111036A TW200736408A (en) | 2006-03-29 | 2006-03-29 | Coating system for multi-stage recycle and reuse of the coating substance and gas |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TW200736408A (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110508333A (zh) * | 2019-09-04 | 2019-11-29 | 北京国科环宇科技股份有限公司 | 一种真空实验系统及实现方法 |
| CN112438727B (zh) * | 2020-12-08 | 2024-05-17 | 北京海洋海泰科技有限公司 | 真空金属镀膜手印显现系统 |
| CN113830049B (zh) * | 2021-09-26 | 2022-07-15 | 浙江吉利控股集团有限公司 | 真空气压复合补偿系统及车辆 |
-
2006
- 2006-03-29 TW TW095111036A patent/TW200736408A/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| TW200736408A (en) | 2007-10-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |