TWI311590B - - Google Patents
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- TWI311590B TWI311590B TW95111036A TW95111036A TWI311590B TW I311590 B TWI311590 B TW I311590B TW 95111036 A TW95111036 A TW 95111036A TW 95111036 A TW95111036 A TW 95111036A TW I311590 B TWI311590 B TW I311590B
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1311590 九、發明說明: . 【發明所屬之技術領域】 本發明係有關一種鍍膜物質與氣體多級回收再利用之 鍍膜系統,尤指一種可回收輸入之冷卻氣體與靶材之鍍膜 系統。 【先前技術】 目前應用於電子、光電以及機械產業研究或生產的真 空鍍膜系統大致上包括了蒸鍍(CVD,PVD)、濺鍍 ^ (Spattering)以及電聚氮化(Plasma nitrogenizing)等均 有製造速率慢(製程時間幾小時至幾十小時)、耗材料(耗 用氣體及鍍膜材料),及污染環境(直接排放有毒氣體及靶 材微粒至大氣)等缺點。 習用真空濺鍍鍍膜系統包括一鍍膜艙體,該鍍膜艙體 並連通一機械真空幫浦(低真空用),及一擴散真空幫浦(高 真空用);利用此類系統之鍍膜程序簡略而言包括:將被鍍 物放入艙體内部後,需以機械幫浦將艙體内部抽至1(Γ2 φ 〜10_3Torr(粗真空)左右,之後再以擴散幫浦對艙體抽氣而 抽至1(Γ6〜1(T Torr(高真空)左右,並以保護氣體供應源 通入氬氣或其他保護(惰性)氣體,再進行蒸鍍或濺鍍, 待鍍膜完畢之後對艙體輸入反應氣體(如氧氣、二氧化氮 • 等)及(或)保護氣體(惰性氣體如氬氣、氦氣)破真空, ’ 將艙體的壓力提昇至約略等於外界氣壓(760Torr)以冷卻 被鍍物,之後開艙門取出被鍍物(元件),並將下一批被鍍 物放置入艙體内,再重覆前述的抽真空步驟,將艙體抽至 51311590 IX. Description of the invention: 1. Field of the Invention The present invention relates to a coating system for multi-stage recycling and reuse of a coating material and a gas, and more particularly to a coating system for recovering input cooling gas and a target. [Prior Art] Vacuum coating systems currently used in the research or production of the electronics, optoelectronics, and mechanical industries generally include vapor deposition (CVD, PVD), sputtering (Spattering), and plasma nitrogenizing (Plasma nitrogenizing). The manufacturing rate is slow (process time is several hours to tens of hours), material consumption (gas and coating materials), and environmental pollution (direct discharge of toxic gases and target particles to the atmosphere). The conventional vacuum sputtering coating system includes a coating chamber which is connected to a mechanical vacuum pump (for low vacuum) and a diffusion vacuum pump (for high vacuum); the coating procedure using such a system is simplified. The words include: after the object to be plated is placed inside the cabin, the inside of the cabin should be pumped to 1 (Γ2 φ ~ 10_3 Torr (rough vacuum) with a mechanical pump, and then pumped to the cabin with a diffusion pump. To 1 (Γ6~1 (T Torr), and argon gas or other protective (inert) gas is supplied to the shielding gas supply source, and then vapor deposition or sputtering is performed, and the reaction is input to the cabin after the coating is completed. Gas (such as oxygen, nitrogen dioxide, etc.) and/or protective gas (inert gas such as argon, helium) break the vacuum, 'raise the pressure of the chamber to approximately equal to the outside air pressure (760 Torr) to cool the object to be plated Then, the door is opened to take out the object (component), and the next batch of the object to be plated is placed in the cabin, and then the vacuuming step is repeated to pump the cabin to 5
1311590 高真空以進行蒸鍍或濺錢'r」 • 目前各類鍍膜系統均有共同的缺點,如: (一) 欲將擒體内部抽至高真空必需以機械式幫浦及擴 散幫浦分階段進行;而依照此種抽真空的方式極為耗時, 使系統生產效率低。 (二) 各類鍍膜系統價格高昂主因之/在於真空幫浦, 尤其是擴散幫浦,且為達較快速抽真空,真空幫浦多為使 用電力大之大型機種,因電子廠鍍膜系統數量甚多,致需 φ 向電力公司申請較大的契約用電量,要付較高的電費;另 外,因每一鍍膜艙配置一真空幫浦,故在鍍膜階段真空幫 浦為閒置狀態’並不能支援其他鍍膜系統。 (三) 通入艙體的保護氣體以及在鑛嫉的過程中所通入 的反應性氣體,最終是被排放到外界,而無法有效地被利 用,因而可能對於環境以及人體造成極大的傷害,且艙體 内的靶材微粒極可能隨保護氣體及反應性氣體排至外界’ 同樣是對環境以及人體極為不利的作法。 • 【發明内容】 本發明之主要目的,在於解決上述的問題而提供一種 靶材物質與氣體多級回收再利用之鍵膜系統’藉由預先抽 成高度真空的數個真空筒以多級方式快速地將艙體抽成真 • 空,節省艙體抽真空的時間,而由艙體抽出的氣體並以回 收裝置過濾後加以儲存,以在鍍模時達到縮短製造時間、 提高生產力與產品良率,同時使用電力少、需要的(契約) 電力裝置容量小、真空系統小、耗用氣體少,而又可回收 6 13115901311590 High vacuum for evaporation or splashing 'r' • At present, all kinds of coating systems have common shortcomings, such as: (1) In order to pump the inside of the carcass to high vacuum, it is necessary to stage the mechanical pump and the diffusion pump in stages. It is carried out; and the method of vacuuming is extremely time consuming, making the system inefficient. (2) The main reason for the high price of various coating systems is the vacuum pump, especially the diffusion pump, and for the quick vacuuming, the vacuum pump is mostly a large-scale machine that uses electricity, because the number of coating systems in the electronics factory is very high. More, the need for φ to the power company to apply for a larger contract electricity consumption, to pay a higher electricity bill; in addition, because each coating chamber is equipped with a vacuum pump, so the vacuum pump in the coating stage is idle state 'can not Support other coating systems. (3) The protective gas introduced into the tank and the reactive gas introduced in the process of the mine are eventually discharged to the outside world and cannot be effectively utilized, which may cause great harm to the environment and the human body. And the target particles in the cabin are likely to be discharged to the outside world with protective gas and reactive gases', which is also extremely unfavorable to the environment and the human body. • SUMMARY OF THE INVENTION The main object of the present invention is to solve the above problems and to provide a multi-stage recycling and reuse of a target material and a gas-collecting system of a gas in a multi-stage manner by pre-extracting a plurality of vacuum cylinders of high vacuum. Quickly pumping the cabin into true air, saving the time for the cabin to be vacuumed, and the gas extracted from the cabin is filtered by the recovery device and stored to reduce manufacturing time, productivity and product quality during plating. Rate, use less power at the same time, need (contract) Power device capacity is small, vacuum system is small, consume less gas, and can be recycled 6 1311590
耗材、可達到不污染環境綠色製造的效果。 為達前述之目的,本發明係提供一種物質與氣體多級 回收再利用之鍍膜系統,包括: 一艙體,該艙體連接有氣體輸入管路以及抽氣管路。 一鍍膜裝置,設於該艙體内部,係用以將欲鍍之靶材 游離並沉積於被鍍物形成薄膜。 至少一真空筒連接至該抽氣管路,並在該艙體與該真 空筒間之抽氣管路上設有一閥門。 一真空幫浦以連接管連通至真空筒用以將該真空筒抽 至高度真空,並在該真空幫浦與該真空筒間之連接管上設 有另一閥門。 一回收裝置,設置於該抽氣管路,以分類過濾由該艙 體抽出之氣體及靶材微粒。 一氣體回送管,連接於真空幫浦輸出側及艙體之間。 本發明之上述及其他目的與優點,不難從下述所選用 實施例之詳細說明與附圖中,獲得深入了解。 當然,本發明在某些另件上,或另件之安排上容許有 所不同,但所選用之實施例,則於本說明書中,予以詳細 說明,並於附圖中展示其構造。 【實施方式】 請參閱第1圖,圖中所示者為本發明所選用之實施例 結構,此僅供說明之用,在專利申請上並不受此種結構之 限制。 本實施例之物質與氣體多級回收再利用之鍍膜系統系 7Consumables can achieve the effect of not polluting the environment and green manufacturing. To achieve the foregoing objects, the present invention provides a coating system for multi-stage recycling of a substance and a gas, comprising: a tank connected to a gas input line and an exhaust line. A coating device is disposed inside the chamber for separating and depositing a target to be plated to form a film. At least one vacuum cylinder is connected to the suction line, and a valve is provided on the suction line between the chamber and the vacuum cylinder. A vacuum pump is connected to the vacuum cylinder by a connecting tube for drawing the vacuum cylinder to a high vacuum, and another valve is disposed on the connecting pipe between the vacuum pump and the vacuum cylinder. A recovery device is disposed in the suction line to sort and filter the gas and target particles extracted from the chamber. A gas return pipe is connected between the vacuum pump output side and the cabin. The above and other objects and advantages of the present invention will be readily understood from Of course, the invention may be varied on certain components, or in the arrangement of the components, but the selected embodiments are described in detail in the specification and their construction is shown in the drawings. [Embodiment] Please refer to Fig. 1, which shows the structure of the embodiment selected for the present invention, which is for illustrative purposes only and is not limited by this structure in the patent application. The coating system for multi-stage recycling and reuse of substances and gases in this embodiment 7
1311590 包括有 一艙體1,該艙體1至少連接有一氣體輸入管路22 可將保護或反應氣體23通入艙體1,艘體1並連接抽氣 管路2 1,設置數致冷(致熱)晶片或冷卻水管分佈於艙 體1的表面,藉以控制搶體1内部環境達到預定溫度。 一設於該艙體1内部之鍍膜裝置丄2,用以將欲鍍之 靶材游離並沉積於被鍍物形成薄膜。1311590 comprises a cabin 1 which is connected at least with a gas input line 22 for passing a protective or reactive gas 23 into the tank body 1, the vessel body 1 is connected to the pumping line 2 1, and is provided with a number of refrigeration (heating) The wafer or the cooling water pipe is distributed on the surface of the cabin 1 to control the internal environment of the body 1 to reach a predetermined temperature. A coating device 丄2 disposed inside the chamber 1 is used to release the deposited material and deposit it on the object to be formed to form a film.
一個或多個大容積之真空筒3連接至該抽氣管路2 1,並在該艙體1與該真空筒3間之抽氣管路2上設有一 閥門3 1,並以該閥門3 1控制與艙體1之連通狀態。 一真空幫浦4,係以連接管24連通至真空筒3,並 用以將該真空筒3抽至高於艙體1工作真空度,其中,並 在該真空幫浦4與該真空筒3間之連接管2 4上設有另一 閥門3 2,以控制兩者間之連通狀態。 連接於該抽氣管路2 1之回收裝置5,用以依序過濾 由*玄艙體1抽出之氣體及靶材微粒,在本實施例中該回收 裝置5包括了數個成串列之陶質多孔體單元5丄a、5 1 b三5 1 c及一活性碳過濾單元5 2,其中每一陶質多孔 體單π並分別予以控制既定溫度及真空度環境條件,依物 質在不同真空度下有不同冷凝溫度之特性,以使氣體夾帶 之物質(崎微粒)冷凝於多孔體單元之多孔表面藉以 逐級分別濾除單一物質於多孔體單元。 本發明之物質與氣體多級回收再利用之鍍膜系統其 合鍍膜製程時具有功能包括: 、 8 1311590One or more large-volume vacuum tubes 3 are connected to the suction line 2 1, and a valve 3 1 is disposed on the suction line 2 between the chamber 1 and the vacuum tube 3 and is controlled by the valve 3 1 It is connected to the cabin 1. a vacuum pump 4 is connected to the vacuum cylinder 3 by a connecting pipe 24, and is used to pump the vacuum cylinder 3 to a working vacuum higher than the cabin 1, wherein between the vacuum pump 4 and the vacuum cylinder 3 Another valve 3 2 is provided on the connecting pipe 24 to control the communication state between the two. The recovery device 5 connected to the suction line 21 for sequentially filtering the gas and the target particles extracted by the *Xuan cabin 1 , and in the embodiment, the recovery device 5 includes a plurality of ceramics in series The porous body unit 5丄a, 5 1 b 3 5 1 c and an activated carbon filter unit 52, wherein each ceramic porous body is π and separately controlled to a predetermined temperature and vacuum environment conditions, depending on the material in different vacuum The characteristics of different condensation temperatures are such that the gas-entrained substance (slag particles) is condensed on the porous surface of the porous body unit to filter out the single substance in the porous body unit step by step. The coating system of the multi-stage recycling and recycling of the material and the gas of the present invention has the functions of the coating process including: , 8 1311590
a·真空筒於鍍膜前事先被真空幫浦4抽至低於艙體 1工作真空度’故當被鍛物及乾材放至該艙體内,連通臉 體與真空筒3即可平衡搶體内負壓,以迅速達到艙體所需 真空度’另使回收裝置5中之真空度能快速產生及維持, 真空筒3可以設置多個,並均連接於真空幫浦4,故實際 所需之真空幫浦4可應用較小效能規格,因而可節省系統 造價。 b 當設置多個真空筒3時,真空幫浦4可分工進行a. The vacuum tube is pumped by the vacuum pump 4 before the coating is applied to the working vacuum below the cabin 1. Therefore, when the forged and dry materials are placed in the cabin, the connected body and the vacuum tube 3 can be balanced. Negative pressure in the body to quickly reach the required vacuum of the cabin', and the vacuum in the recovery device 5 can be quickly generated and maintained. The vacuum cylinder 3 can be arranged in plurality and connected to the vacuum pump 4, so the actual The vacuum pump 4 required can be applied with smaller performance specifications, thus saving system cost. b When multiple vacuum tubes 3 are set, vacuum pump 4 can be divided
各真空筒抽氣,在適當的規劃下這些真空筒可被應用於其 他鍵膜系統,如第2圖所示,如此可更加節省系統造價。 C•於破真空階段利用對輸入槍體中之反應氣體23 及(或)保護氣體施以半強制對流及控制其壓力、流量與 流向方式控制賴物之冷卻速度,以確保品質及縮短冷卻 時間’利用真空筒吸出輸人艙體丄内部之氣體,除可促進 對抓並可經由回收裝置5之遽除(分離)淨化後分級加壓Each vacuum tube is pumped, and these vacuum tubes can be applied to other key film systems with proper planning, as shown in Figure 2, which saves system cost. C• Control the cooling rate of the material by applying semi-forced convection and controlling the pressure, flow and flow direction of the reaction gas 23 and/or the shielding gas in the input gun body during the vacuum breaking process to ensure the quality and shorten the cooling time. 'Using the vacuum cylinder to suck out the gas inside the body of the human body, in addition to promoting the catching and can be removed (separated) and purified by the recovery device 5
送至=氣筒6,供再輸人驗體使用,由此循環利用可大量 減:1乳’以降低氣體成本’同時避免有毒、有害氣體及 輕材微粒排至外界。 1於開啟臉體前仍可再次利用真空筒吸出輸入臉體 ]_内之隋f生氣體、反應氣體、微量鏟膜材料蒸氣或微粒, 嫁由回置5之$、除(分離)淨化後分級域送至儲氣 筒中後’再輸人空氣於純破真空而以便開搶門取出被鍵 物。 又 f回收裝置5之陶質多孔體單元5 1 a、5 1 b、 9 1311590 Γ 故_4:[_.轉 5 1 c及活性碳k薄土 [ 吸卿,愿早tg5 2並為一可卸離型式,而可在 吸附之物質或氣賴和時拆下予以加㈣發_物質及氣 體以便再利用。 綜上所述’本發明不但職、抽真空效率高且鐘膜成 本低,對於產業上的助益實嘉惠良多。 以上所述實施例之揭示係用以說明本發明,並非用以 限制本發明,故舉凡數值之變更或等效元件之置換仍應隸 屬本發明之範疇。It is sent to the air cylinder 6 for reintroduction, so that the recycling can be greatly reduced: 1 milk' to reduce the cost of gas' while avoiding the release of toxic, harmful gases and light particles to the outside world. 1 Before opening the face, you can still use the vacuum tube to suck out the input face] _ inside the gas, reaction gas, trace shovel material vapor or particles, marry back to the $ of 5, after (separation) purification After the grading field is sent to the air reservoir, the air is again input to the pure vacuum to open the door to remove the key. Moreover, the ceramic porous body unit of the recovery device 5 is 5 1 a, 5 1 b, 9 1311590 Γ _4: [_. 5 1 c and activated carbon k thin soil [sucking, wishing early tg5 2 is one It can be detached and can be removed by adding (4) _ substances and gases for reuse in the case of adsorbed substances or gas. In summary, the present invention has a high degree of efficiency, a high vacuuming efficiency, and a low cost of the clock film, and is beneficial to the industry. The above description of the embodiments is intended to be illustrative of the invention, and is not intended to limit the scope of the invention.
由以上詳細說明,可使熟知本項技藝者明瞭本發明的 確可達成前述目的,實已符合專利法之規定,爰提出專利 申請。 【圖式簡單說明】 第1圖係本發明應用於鍍膜系統配置示意圖 第2圖為本發明應用於多鍍膜系統配置示意圖 【主要元件符號說明】 艙體1From the above detailed description, it will be apparent to those skilled in the art that the present invention can achieve the above-mentioned objects, and is in accordance with the provisions of the Patent Law. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing the configuration of the present invention applied to a coating system. Fig. 2 is a schematic view showing the configuration of a multi-coating system according to the present invention. [Main component symbol description] Cabin 1
鍍膜裝置12 氣體輸入管路2 2 連接管2 4 閥門3 1 真空幫浦4 抽氣管路2 1 反應氣體2 3 真空筒3 閥門3 2 回收裝置5 陶質多孔體單元5 1 a、5 1 b、5 1 c 活性碳過濾單元52 儲氣筒6Coating device 12 Gas input line 2 2 Connection tube 2 4 Valve 3 1 Vacuum pump 4 Extraction line 2 1 Reaction gas 2 3 Vacuum tube 3 Valve 3 2 Recovery unit 5 Ceramic porous unit 5 1 a, 5 1 b , 5 1 c activated carbon filter unit 52 air reservoir 6
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