CN109913823B - Light water reactor zirconium pipe coating - Google Patents
Light water reactor zirconium pipe coating Download PDFInfo
- Publication number
- CN109913823B CN109913823B CN201910269731.9A CN201910269731A CN109913823B CN 109913823 B CN109913823 B CN 109913823B CN 201910269731 A CN201910269731 A CN 201910269731A CN 109913823 B CN109913823 B CN 109913823B
- Authority
- CN
- China
- Prior art keywords
- coating
- magnetic
- power pulse
- technology
- zirconium tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The invention provides a method for coating a zirconium tube of a light water reactor, which mainly comprises the following steps: alternately depositing CrAlSi and MoNbZr circulating nano coatings by using a high-power pulse technology and a magnetic filtration deposition technology, wherein the thicknesses of CrAlSi and MoNbZr nano coatings in a unit period are 0-15nm, and the total thickness of the coatings is 0-15 mu m. After the nano-alternating coating is deposited, the oxidation resistance of the zirconium tube in a high-temperature and high-pressure autoclave is obviously enhanced, and by implementing the method, an alternating nano-circulating composite structure (particularly the addition of Al, Cr and Si elements) is deposited on the zirconium tube, so that the inward diffusion of oxygen elements at high temperature is well protected, and due to the mutual synergistic effect of various elements, the falling, cracking and oxygen atom diffusion behaviors of a film layer at high temperature and high pressure can be effectively prevented, and the safety and reliability of the fault-tolerant fuel are improved.
Description
Technical Field
The invention aims at the zirconium water reaction when the core accident of the light water reactor occurs. The invention improves the safety characteristic of a nuclear reactor, and provides a method for carrying out surface modification coating on a zirconium tube in a high-temperature and high-pressure environment to prevent the zirconium tube from reacting with water in the high-temperature and high-pressure environment. The invention relates to a composite coating and a preparation method thereof. The specific technology is a magnetic filtration deposition system and a high-power pulse magnetic control technology.
Technical Field
The nuclear energy is regarded as a recognized clean energy in the world, has the characteristics of high efficiency, safety and economy, and is an important resource for relieving the shortage of current water resources and coal and electricity. The zirconium alloy is used as a cladding material of a reactor element of a nuclear power station and other in-reactor materials due to the small thermal neutron absorption cross section and excellent mechanical property and corrosion resistance. After a nuclear accident of the Japanese Fushima, the safety of nuclear power is put in front of all nuclear workers again, and how to further improve the safety and the reliability of the light water reactor nuclear fuel element under the accident condition becomes a problem to be solved urgently. Coating zirconium cladding is one of the effective ways to do this. The primary benefit of the application of the coated zirconium cladding is economy, since the production capacity of existing equipment is sustainable and it is easy to implement the commercial application of zirconium-based coated claddings. The technical challenge faced by coated zirconium cladding is to meet various performance requirements for fuel cladding and components without the coated cladding changing the dimensions of the fuel cladding, which is critical to in-stack performance, particularly under normal operating conditions. The coating should have some stability under corrosive, creep and abrasive conditions during long term operation. Therefore, the preparation technology of the zirconium alloy surface coating needs to be continuously explored and optimized. The new technique should allow easier control of the coating quality, particularly the coating thickness, and the zirconium cladding surface coating should be stable over long periods of time in an in-reactor environment. At present, the research on the surface coating of the zirconium alloy cladding is still in an early exploration stage internationally, a series of screening works of coating candidate materials and coating processes are already carried out, and the performance characterization of the coating is also carried out, so that some achievements are obtained. The united states is primarily concerned with MAX phase and ceramic coating materials and korea and france are primarily concerned with metallic Cr coating materials, but there are no reliable and efficient technological processes and routes including both domestic and foreign ATF coating because the environments involved in coating are extremely high temperature, high pressure environments.
Disclosure of Invention
In view of the above, the present invention is based on ion beam technology and utilizes magnetic filtration deposition (FCVA) and a high power pulsed magnetron system to prepare a multi-cycle unit nanocomposite coating. By combining the advantages of the deposition technology, the deposited film layer has high compactness, has strong anti-oxygen diffusion and oxidation resistance at high temperature and high pressure, and has great advantages when being used as a safe coating of ATF fuel.
Further, the method for coating the light water reactor zirconium comprises the following steps:
1. the surface of the zirconium tube is cleaned by metal ions by adopting a high-power pulse magnetron deposition technology, wherein the total beam current is 2-6A, the negative pressure is 500-1000V, the high-power pulse power is 0-1MW, the temperature is 300-550 ℃, and the air pressure is 1 × 10-210Pa, introducing Ar gas, and rotating in a revolution and rotation mode at a revolution speed of 0-5 r/min;
2. performing metal film deposition on the surface of the zirconium tube by adopting a magnetic filtration technology and a high-power pulse magnetron deposition technology, wherein the total deposition beam current is 2-4A, the negative pressure is 200-500V, the temperature is 300-550 ℃, and the air pressure is 1 × 10-3-1×10-1Pa, the rotation mode is revolution and autorotation, and the revolution speed is 10 r/min;
3. preparing a zirconium tube coating, wherein a cathode target material in a magnetic filtration technology is CrAlSi, the arcing current is 50-120A, and the beam current is 100-; the cathode target material of the high-power pulse technology is MoNbZr, the pulse power is 0-1MW, the pulse width is 0-30ms, and the beam intensity is 0-3A; the zirconium tube coating is of an alternate nano-cycle composite structure, the number of periodic units is 0-500, and the thickness of the whole film layer is 0-10 mu m.
In some embodiments, the substrate surface cleaning process comprises: and (2) carrying out metal ion bombardment on the zirconium tube substrate by using a high-power pulse magnetic control system, wherein Ar is adopted as gas, the working negative pressure is 500-550V, the beam intensity is 2-6A, the bombardment environment temperature is 300-550 ℃, and the bombardment time is 30-120 min.
The high-power pulse magnetron technology is a leading-edge deposition technology at present, the ionization rate of metal ions of the technology is more than 96%, large particles are basically not present, and the peak power of the technology can reach 1 MW. When the zirconium pipe base material is cleaned, the artificial defects left on the surface of the zirconium pipe due to machining can be greatly reduced, and the high quality of a subsequent metal film layer is greatly improved and ensured. In the cleaning process, not only the heavy metal ions participate in the collision cleaning, but also the inert gas ions perform the collision cleaning. The invention has better cleaning effect than the traditional method which utilizes a single gas ion source.
In some embodiments, performing a cyclic nanocomposite alloy film layer deposition on the cleaned zirconium tube comprises: magnetically filtering and depositing an alloy thin film layer on the zirconium tube by utilizing the magnetic filtration vacuum arc deposition (FCVA) system and the high-power pulse magnetic control system; wherein the alloy elements are Cr, Al, Si, Mo, Nb and Zr, and the thickness is 0-15 μm.
The magnetic filtration deposition technology and the high-power pulse magnetic control technology are two technologies with the highest ionization rate and the best film forming compactness in the existing PVD technology. The advantages of the two technologies are complementary through the combination of the two technologies, and meanwhile, the two technologies work simultaneously in the deposition process, wherein a MoNbZr film layer, a CrAlSi film layer and a CrAlSiMoNbZr high-entropy alloy film layer can be formed respectively; the overlapping and fusion of films with different scales can be realized by controlling revolution and rotation speeds, and the variability of the structure and the availability of equipment are greatly improved. The catalyst can have good anti-oxygen diffusion and oxidation capacity in the high-temperature and high-pressure environment of a light water reactor, and the main reasons are as follows: cr and Al form a compact oxide layer to prevent oxygen from being transmitted to a matrix, and Mo and Nb elements have a stable structure effect to promote the film layer not to form cracks and wrinkles; the high-entropy alloy layer mainly plays a role in improving the bonding strength and further resisting oxygen in a high-temperature environment; si atoms are small-radius atoms which are diffused inwards and outwards in a high-temperature environment, and block a diffusion channel in the diffusion process to prevent oxygen from further diffusing. It should be noted that although there are many kinds of elements, many nano grain boundaries are formed, but these grain boundaries play a good role in isolating oxygen in a high temperature environment, which is exactly opposite to the theory that the traditional polycrystalline boundaries are easy to diffuse oxygen, the whole coating layer does not fall off, crack, peel off and the like in pure water of 18.7Mpa and 360 degrees for 0-60 days, and the diffusion depth of oxygen does not exceed 6 μm.
Compared with the prior art, the embodiments of the invention have the following advantages:
1. the embodiment of the invention provides a zirconium tube coating, which has the effects of a plurality of aspects by carrying out high-power pulse magnetron sputtering bombardment on a substrate: 1) the surface density is improved, and burrs are removed; 2) the surface of the base material can be activated to remove adsorbed gas; 3) the metal enters the subsurface to form chemical bonds to improve surface strength. The binding force of the structural coating deposited by subsequent magnetic filtration and high-power pulse magnetron deposition is very good, and the high peel strength can be kept at high temperature and high pressure;
2. compared with PVD (physical vapor deposition) deposition methods such as magnetron sputtering and electron beam evaporation, the magnetic filtration arc deposition technology and the high-power pulse magnetron technology have very high atomic ionization rate, which is about more than 90%. Thus, the plasma density can be increased due to high atom ionization rate, large particles are reduced during film forming, and the hardness, wear resistance, compactness, film-substrate binding force and the like of the film are improved;
3. the high ionization rate of the magnetic filtration and high-power pulse magnetic control equipment is very beneficial to the formation and regulation of the nanocrystalline, which is the bottleneck of other known technologies such as direct current magnetron sputtering, radio frequency magnetron sputtering and chemical vapor deposition;
4. because the transition metals Cr, Al and Si are simultaneously used as the target materials: 1) si and Al can greatly reduce the internal stress formed by film forming and improve the binding force between the coating and the substrate; 2) during film formation, the compactness of the coating is further improved, and the ionization degree of gas in plasma can be promoted to increase the film formation rate; 3) the formation of nano crystals can be further promoted, and the nucleation efficiency of the nano crystals is improved;
5. the known theory knows that the more the grain boundaries of the film layer are, the more the corrosion of the grain boundaries is easy to occur in a high-temperature and high-pressure water environment, and a large number of nanometer grain boundaries inevitably exist in the film forming process due to the existence of a plurality of elements, so that the film layer does not crack or fall off in the high-temperature environment due to the existence of the grain boundaries.
It should be noted that the foregoing method embodiments are described as a series of acts or combinations for simplicity in explanation, but it should be understood by those skilled in the art that the present invention is not limited by the order of acts or acts described, as some steps may occur in other orders or concurrently in accordance with the invention. Further, those skilled in the art will appreciate that the embodiments described in the specification are presently preferred and that no particular act is required to implement the invention.
The above description is only exemplary of the present invention and should not be taken as limiting the invention, as any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Further features and advantages of embodiments of the present invention will be described in the detailed description which follows.
Drawings
The accompanying drawings, which are included to provide a further understanding of embodiments of the invention, are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the invention and not to limit the invention. In the drawings:
FIG. 1 is a schematic diagram of an apparatus according to an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a zirconium tube coating provided by an embodiment of the present invention;
FIG. 3 is a power spectrum of a high power pulse and a common magnetic control power supply of the present invention;
FIG. 4 is a graph showing the mass gain of the unmodified matrix zirconium tubes of examples 1 to 5 according to the present invention at 360 ℃ under pure water at 18.6MPa for 60 days.
FIG. 5 is a SEM image of a cross section of a zirconium tube coating provided in example 5 of the present invention;
FIG. 6 shows coating adhesion test scratches according to example 5 of the present invention;
FIG. 7 is the optical profile of the ball milled edge of the coating of example 5 of the present invention;
FIG. 8 is a surface view of a coating of example 5 of the present invention after 60 days at 360 ℃ under pure water of 18.6MPa
FIG. 9 is a cross-sectional view of example 5 of the present invention after coating at 360 ℃ for 60 days under pure water at 18.6 MPa;
description of the reference numerals
101 magnetic filtration system group 2
102 vacuum pumping system
103 vacuum chamber door
104 observation window
105 magnetic filtration system group 1
106 high power pulse system group 1
107 magnetic filtration system group 3 (top view)
108 vacuum pumping system (Top view)
109 observation window (Top view)
110 magnetic filtration system group 1 (top view)
111 high power pulse system group 1 (top view)
112 magnetic filtration system group 2 (top view)
113 high power pulse system set 2 (top view)
114 high power pulse system set 3 (top view)
115 heating system (Top view)
Method embodiment
In this embodiment, an alternating nano-cycle composite coating is prepared on a substrate layer of a zirconium tube of a light reactor, and referring to fig. 1 and 2, a structure and a method of a zirconium tube coating of this embodiment are shown, and the preparation method specifically includes the following steps:
A. the surface of the zirconium tube is cleaned by metal ions by adopting a high-power pulse magnetron deposition technology, wherein the total beam current is 2-6A, the negative pressure is 500-1000V, the high-power pulse power is 0-1MW, the temperature is 300-550 ℃, and the air pressure is 1 × 10-210Pa below, Ar gas is introduced, and the bombardment time is 30-120 min.
The high power and high negative pressure during deposition have significant advantages over conventional process routes: the expression is as follows: 1) bombarding the zirconium tube by large beam current, and rapidly increasing the temperature of the matrix; 2) removing gas adsorbed by the matrix; 3) removing organic matters and burrs; 3) and sputtering off the metal oxide film layer on the surface to expose the pollution-free atomic layer. The rotation mode is revolution and rotation, the revolution speed is 0-5r/min, the rotation speed is 1-10 times of the revolution speed, the high speed greatly improves the uniformity of the deposited film layer, and simultaneously, the revolution and rotation bearings are all ceramic temperature-resistant bearings, can keep high reliability and stability in high temperature environment, and have two higher than the common magnetic control and arc uniformity and reliability
B. Performing metal film deposition on the surface of the zirconium tube by adopting a magnetic filtration technology and a high-power pulse magnetron deposition technology, wherein the total deposition beam current is 2-4A, the negative pressure is 200-500V, the temperature is 300-550 ℃, and the air pressure is 1 × 10-3-1×10-1Pa, the rotation mode is revolution and autorotation, and the revolution speed is 10 r/min; the cathode target material of the magnetic filtration technology is CrAlSi, the arcing current is 50-120A, and the beam current is 100-; the cathode target material of the high-power pulse technology is MoNbZr, the pulse power is 0-1MW, the pulse width is 0-30ms, and the beam intensity is 0-3A; the zirconium tube coating is of an alternate nano-cycle composite structure, the number of periodic units is 0-500, and the thickness of the whole film layer is 0-15 mu m.
The high-power magnetic control and magnetic filtration deposition technology is combined, and meanwhile, coupling cross design is carried out on the space structure of the equipment, so that coupling deposition of a thick high-entropy alloy thin film layer in a unit can be conveniently realized in the deposition process. The invention can conveniently realize the deposition of different unit periods and different sub-layer thicknesses in the unit period through the design of macroscopic parameters such as the rotating speed, the deposition beam current and the like.
Example 1
1. Starting a high-power pulse magnetron deposition system to clean metal ions on the surface of the zirconium tube, wherein the total beam current is 2-6A, the negative pressure is 500-550V, the high-power pulse power is 30KW, the temperature is 300-550 ℃, and the air pressure is 1 × 10-1Under-1 Pa, introducing Ar gas, and bombarding for 30-120 min.
2. Starting magnetic filtration technology and high-power pulse magnetic control deposition technology to perform gold on surface of zirconium tubeBelongs to film layer deposition, the total deposition beam current is 2-4A, the negative pressure is 200-500V, the temperature is 300-550 ℃, and the air pressure is 1 × 10-3-1×10-1Pa, the rotation mode is revolution and autorotation, and the revolution speed is 10 r/min; the cathode target material of the magnetic filtration technology is CrAlSi, the arcing current is 80A, and the beam current is 800 mA; the cathode target material of the high-power pulse technology is MoNbZr, the pulse power is 30KW, the pulse width is 0-30ms, and the beam intensity is 0-3A; the zirconium tube coating is of an alternate nano-cycle composite structure, the number of periodic units is 0-500, and the thickness of the whole film layer is 12 mu m.
Example 2
1. Starting a high-power pulse magnetron deposition system to clean metal ions on the surface of the zirconium tube, wherein the total beam current is 2-6A, the negative pressure is 500-550V, the high-power pulse power is 100KW, the temperature is 300-550 ℃, and the air pressure is 1 × 10-1Under-1 Pa, introducing Ar gas, and bombarding for 30-120 min.
2. Starting a magnetic filtration technology and a high-power pulse magnetron deposition technology to deposit a metal film layer on the surface of the zirconium tube, wherein the total deposition beam current is 2-4A, the negative pressure is 200-500V, the temperature is 300-550 ℃, and the air pressure is 1 × 10-3-1×10-1Pa, the rotation mode is revolution and autorotation, and the revolution speed is 10 r/min; the cathode target material of the magnetic filtration technology is CrAlSi, the arcing current is 75A, and the beam current is 750 mA; the cathode target material of the high-power pulse technology is MoNbZr, the pulse power is 100KW, the pulse width is 0-30ms, and the beam intensity is 0-3A; the zirconium tube coating is of an alternate nano-cycle composite structure, the number of periodic units is 0-500, and the thickness of the whole film layer is 12 mu m.
Example 3
1. Starting a high-power pulse magnetron deposition system to clean metal ions on the surface of the zirconium tube, wherein the total beam current is 2-6A, the negative pressure is 500-550V, the high-power pulse power is 300KW, the temperature is 300-550 ℃, and the air pressure is 1 × 10-1Under-1 Pa, introducing Ar gas, and bombarding for 30-120 min.
2. Starting a magnetic filtration technology and a high-power pulse magnetron deposition technology to deposit a metal film layer on the surface of the zirconium tube, wherein the total deposition beam current is 2-4A, the negative pressure is 200-500V, the temperature is 300-550 ℃, and the air pressure is 1 × 10-3-1×10-1Pa, the rotation mode is revolution and autorotation, and the revolution speed is 10 r/min; the cathode target material of the magnetic filtration technology is CrAlSi, and arc striking is carried outThe flow is 70A, and the beam current is 700 mA; the cathode target material of the high-power pulse technology is MoNbZr, the pulse power is 300KW, the pulse width is 0-30ms, and the beam intensity is 0-3A; the zirconium tube coating is of an alternate nano-cycle composite structure, the number of periodic units is 0-500, and the thickness of the whole film layer is 12 mu m.
Example 4
1. Starting a high-power pulse magnetron deposition system to clean metal ions on the surface of the zirconium tube, wherein the total beam current is 2-6A, the negative pressure is 500-550V, the high-power pulse power is 800KW, the temperature is 300-550 ℃, and the air pressure is 1 × 10-1Under-1 Pa, introducing Ar gas, and bombarding for 30-120 min.
2. Starting a magnetic filtration technology and a high-power pulse magnetron deposition technology to deposit a metal film layer on the surface of the zirconium tube, wherein the total deposition beam current is 2-4A, the negative pressure is 200-500V, the temperature is 300-550 ℃, and the air pressure is 1 × 10-3-1×10-1Pa, the rotation mode is revolution and autorotation, and the revolution speed is 10 r/min; the cathode target material of the magnetic filtration technology is CrAlSi, the arcing current is 65A, and the beam current is 650 mA; the cathode target material of the high-power pulse technology is MoNbZr, the pulse power is 800KW, the pulse width is 0-30ms, and the beam intensity is 0-3A; the zirconium tube coating is of an alternate nano-cycle composite structure, the number of periodic units is 0-500, and the thickness of the whole film layer is 12 mu m.
Example 5
1. Starting a high-power pulse magnetron deposition system to clean metal ions on the surface of the zirconium tube, wherein the total beam current is 2-6A, the negative pressure is 500-550V, the high-power pulse power is 1000KW, the temperature is 300-550 ℃, and the air pressure is 1 × 10-1Under-1 Pa, introducing Ar gas, and bombarding for 30-120 min.
2. Starting a magnetic filtration technology and a high-power pulse magnetron deposition technology to deposit a metal film layer on the surface of the zirconium tube, wherein the total deposition beam current is 2-4A, the negative pressure is 200-500V, the temperature is 300-550 ℃, and the air pressure is 1 × 10-3-1×10-1Pa, the rotation mode is revolution and autorotation, and the revolution speed is 10 r/min; the cathode target material of the magnetic filtration technology is CrAlSi, the arcing current is 50A, and the beam current is 500 mA; the cathode target material of the high-power pulse technology is MoNbZr, the pulse power is 1000KW, the pulse width is 0-30ms, and the beam intensity is 0-3A; the zirconium tube coating is of an alternate nano-cycle composite structure, the number of periodic units is 0-500, and the thickness of the whole film layerDegree 12 μm.
In the attached drawing, FIG. 1 is a schematic structural diagram of a large-batch zirconium pipe surface treatment device. Fig. 2 is a schematic structural diagram of a zirconium tube coating, which is a cleaning layer, a MoNbZr layer (bonding layer), a High entropy alloy layer (HEA), and a CrAlSi layer, respectively, wherein the MoNbZr layer (bonding layer), the High entropy alloy layer (HEA), and the CrAlSi layer are periodic units. Fig. 3 is a power supply power comparison graph of the high power pulse technology, the common pulse technology and the common magnetic control technology, and the fact that the peak power of the high power pulse can reach 1MW can be found to be very small, so that the method is very suitable for preparing high bonding strength, low internal stress and high-density coatings. FIG. 4 is a graph of the weight gain curves of five examples and unmodified zirconium tubes in pure water at 18.7MPa and 360 ℃ for 60 days; 1 represents the weight gain curve of an unmodified zirconium tube, 2 to 6 represent the weight gain curves of examples 1 to 5, respectively; it can be clearly seen that, with a constant total film thickness, the weight gain decreases significantly with increasing peak power of the high-power pulse, during which the magnetic filter deposition only changes the magnitude of the arcing current. In example 5, the weight gain of the coated zirconium tube at a peak pulse power of 1MW was unmodified 1/10, greatly improving the oxidation resistance and stability of the film at high temperature and high pressure. FIG. 5 is an SEM image of the cross section of the coating of the zirconium tube in example 5, and it can be clearly found that the compactness of the deposited film in example 5 is good, and the thickness of the film is about 12 microns. Fig. 6 is a scratch pattern of the bonding force test of example 5, and it can be clearly seen that at the bonding force LC2, the film layer still has no peeling and peeling, and the bonding strength is excellent. FIG. 7 is an optical topography of the coating after ball milling of example 5, which shows clearly that the interfaces between the layers are clear, no significant peeling and peeling occurs, and the bonding strength between the layers is high. FIG. 8 is a surface topography of example 5 in pure water at 18.7MPa and 360 ° for 60 days, which clearly shows that the film has no peeling and cracks, the film still maintains good integrity, and the size of the nanocrystal slightly grows at high temperature; FIG. 9 is a cross-sectional view of example 5 in pure water at 18.7MPa and 360 deg.C for 60 days, where it is clearly seen that there is no peeling and no cracks between the inner layers in the coating, and the interface of the nanocomposite coating can still be seen. Therefore, the coating deposited on the surface of the zirconium tube by combining the high-power pulse technology and the magnetic filtration deposition technology has good oxidation resistance and high-temperature resistance, and has good application prospect in ATF.
Claims (6)
1. A light water reactor zirconium tube coating, comprising:
the preparation technology is the coupling of the magnetic filtration technology and the high-power pulse magnetic control technology;
the cathode target material of the magnetic filtration technology is CrAISi, the arcing current is 50-120A, and the beam current is 100-;
the cathode target material of the high-power pulse magnetic control technology is MoNbZr, the pulse power is 0-1MW, the pulse width is 0-30ms, and the beam intensity is 0-6A;
the zirconium tube coating is of an alternate nano-cycle composite structure, and the unit period internal coating sequentially comprises the following layers from the bottom layer: the thickness of the MoNbZr thick layer is 5-10nm, the thickness of the CrAISiMoNbZr high-entropy alloy thick layer is 5-12nm, the thickness of the CrAISI thin layer is 5-10nm, the thickness of the CrAISiMoNbZr high-entropy alloy thin layer is 0-6nm, the thickness of the CrAISI thick layer is 5-10nm, the number of periodic units is 0-500, and the thickness of the whole film layer is 0-15 mu m.
2. The light water reactor zirconium tube coating of claim 1, comprising:
the magnetic filtration system used in the magnetic filtration technology is a 90-degree filtration system, three groups of magnetic filtration systems are arranged in the vacuum chamber, and the included angle of the geometric center of each group is 70 degrees, 110 degrees and 180 degrees; each group consists of three sets of magnetic filtering systems, wherein the magnetic filtering system at the uppermost layer in each group is vertically arranged, and the magnetic filtering systems at the middle and lower sets are horizontally arranged;
the high-power pulse system used in the high-power pulse magnetic control technology is a long-strip plane target type, the length is 100-500mm, and the width is 50-100 mm; the high-power pulse systems are divided into two groups, each group is a set of high-power pulse system, and the included angles of the geometric centers of each group are respectively 30 degrees, 90 degrees and 120 degrees;
the equipment under the structural layout of three groups of magnetic filters and two groups of high-power pulses can realize the treatment of a large batch of zirconium tubes, and the treatment capacity is 0-200 zirconium tubes per furnace.
3. The coating of the light water reactor zirconium tube as defined in claim 1, wherein the cathode target material of the magnetic filtration technique comprises Cr 10-30%, Al 30-70%, and Si 0-10%, wherein the total mass percentage of Cr, Si, and Al is one hundred%, and the atomic ratio of Al to Cr in the deposited film is not less than 1.5.
4. The coating of the light water reactor zirconium tube as defined in claim 1, wherein the high power pulse magnetron cathode target comprises Mo 10-30%, Nb 10-30%, and Zr 40-60%, wherein the total mass percentage of Mo, Nb, and Zr is one hundred%, and the atomic ratio of Zr to Mo + Nb in the deposited film is not less than 1.
5. The coating of claim 2, wherein the high power pulse system and the magnetic filter system are operated simultaneously with each other in an interdigitation and cooperation mode, and the gas pressure is 1 × 10 during operation-3-10Pa, introducing Ar gas, wherein the flow rate is 0-500sccm, the rotation mode is revolution and rotation, the revolution speed is 10r/min, and the ratio of revolution to rotation is 1-10.
6. The light water reactor zirconium tube coating of claim 1, wherein: the film layer does not fall off, crack or peel off in pure water with the pressure of 18.7MPa and the temperature of 360 ℃ for 0-60 days, and the oxygen diffusion depth does not exceed 6 mu m.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910269731.9A CN109913823B (en) | 2019-04-04 | 2019-04-04 | Light water reactor zirconium pipe coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910269731.9A CN109913823B (en) | 2019-04-04 | 2019-04-04 | Light water reactor zirconium pipe coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109913823A CN109913823A (en) | 2019-06-21 |
| CN109913823B true CN109913823B (en) | 2020-06-30 |
Family
ID=66968620
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910269731.9A Expired - Fee Related CN109913823B (en) | 2019-04-04 | 2019-04-04 | Light water reactor zirconium pipe coating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109913823B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113293354B (en) * | 2021-05-27 | 2022-11-25 | 重庆文理学院 | High-temperature oxidation resistant coating for cladding substrate and preparation process |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1206386C (en) * | 2003-06-26 | 2005-06-15 | 上海交通大学 | Ion implanted composite coating film apparatus |
| DE102005003445B4 (en) * | 2005-01-21 | 2009-06-04 | H.C. Starck Hermsdorf Gmbh | Metal substrate material for the anode plates of rotary anode X-ray tubes, method for producing such a material and method for producing an anode plate using such a material |
| CN107130223B (en) * | 2017-05-08 | 2019-07-09 | 北京师范大学 | A kind of super lubricating solid coating production |
| CN108441832B (en) * | 2018-03-28 | 2020-07-10 | 北京师范大学 | Centrifugal pump impeller surface treatment method and equipment |
| CN109402563B (en) * | 2018-10-29 | 2020-09-15 | 北京机械工业自动化研究所 | Anti-icing composite coating and preparation method and application thereof |
| CN109234694B (en) * | 2018-10-29 | 2020-12-11 | 中国科学院宁波材料技术与工程研究所 | High-temperature steam corrosion resistant nano gradient composite multilayer coating and preparation method and application thereof |
-
2019
- 2019-04-04 CN CN201910269731.9A patent/CN109913823B/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN109913823A (en) | 2019-06-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2022062102A1 (en) | Diffusion-resistant high-entropy alloy coating material, heat resistant coating material, preparation method therefor, and application thereof | |
| Ko et al. | Review of manufacturing technologies for coated accident tolerant fuel cladding | |
| CN109972098A (en) | A kind of preparation method of cladding materials surface C rN thick coating | |
| US9421740B2 (en) | Zirconium alloy for improving resistance to oxidation at very high temperature and fabrication method thereof | |
| CN108796454A (en) | A kind of used by nuclear reactor zirconium cladding surface metal coating PVD preparation processes | |
| CN101792895A (en) | Cathodic vacuum arc source film depositing device and method for depositing film | |
| CN104561891B (en) | Double component gradient hydrogen permeation preventing coatings and preparation method thereof | |
| WO2023284596A1 (en) | High-conductivity, corrosion-resistant and long-lifetime max phase solid solution composite coating, and preparation method therefor and use thereof | |
| CN109355611A (en) | A kind of preparation method for composite ceramic coat for zirconium alloy cladding | |
| CN109913823B (en) | Light water reactor zirconium pipe coating | |
| CN108624882B (en) | Zirconium oxide/chromium nitride composite film on surface of zirconium alloy and preparation method and application thereof | |
| CN111945111A (en) | Composite coating deposited on surface of cubic boron nitride cutter and deposition method | |
| RU2495154C2 (en) | Application method onto metal part of complex coating for protection of part against hydrogen corrosion, which consists of many microlayers | |
| CN101566077B (en) | Last stage vane of steam turbine and preparation method thereof | |
| CN115341186A (en) | Preparation process of high-temperature irradiation resistant yttrium oxide doped TaTiNbZr multi-principal-element alloy coating | |
| CN112795875A (en) | Nuclear fuel zirconium alloy cladding element | |
| CN116926489A (en) | Preparation method of zirconium alloy surface gradient composite coating for cores | |
| CN115142018B (en) | High-entropy alloy coating resistant to high-temperature liquid lead/lead bismuth alloy corrosion and preparation method thereof | |
| CN110629176A (en) | Cr-Al alloy film with Zr as substrate and preparation method thereof | |
| CN116372344A (en) | Hot isostatic pressure diffusion connection preparation method of Mg-Ta layered composite metal plate | |
| CN115786852A (en) | Preparation method of high-temperature corrosion resistant chromium coating on surface of ceramic-based nuclear fuel cladding tube | |
| CN115976473A (en) | Zirconium-based AlCrNbSiTi high-entropy alloy coating and preparation method thereof | |
| CN113652635A (en) | Preparation method of CrN-Cr-CrN composite protective coating on surface of Zr-4 cladding | |
| CN113774347A (en) | Superhard and tough nano composite coating, preparation method and use equipment | |
| CN113430488B (en) | Nano composite coating for nuclear reactor fuel cladding and preparation method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20200630 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |