CN110629176A - Cr-Al alloy film with Zr as substrate and preparation method thereof - Google Patents
Cr-Al alloy film with Zr as substrate and preparation method thereof Download PDFInfo
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- CN110629176A CN110629176A CN201910838364.XA CN201910838364A CN110629176A CN 110629176 A CN110629176 A CN 110629176A CN 201910838364 A CN201910838364 A CN 201910838364A CN 110629176 A CN110629176 A CN 110629176A
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- 229910000838 Al alloy Inorganic materials 0.000 title claims abstract description 44
- 239000000758 substrate Substances 0.000 title claims abstract description 43
- 238000002360 preparation method Methods 0.000 title claims abstract description 12
- 229910001093 Zr alloy Inorganic materials 0.000 claims abstract description 25
- 238000000034 method Methods 0.000 claims abstract description 16
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 11
- 239000000956 alloy Substances 0.000 claims abstract description 11
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 11
- 238000007747 plating Methods 0.000 claims abstract description 10
- 238000004544 sputter deposition Methods 0.000 claims abstract description 10
- 238000000227 grinding Methods 0.000 claims abstract description 6
- 238000005498 polishing Methods 0.000 claims abstract description 6
- 238000004140 cleaning Methods 0.000 claims abstract description 5
- 238000001035 drying Methods 0.000 claims abstract description 4
- 238000000151 deposition Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 239000013077 target material Substances 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 230000007704 transition Effects 0.000 claims description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 239000011159 matrix material Substances 0.000 claims description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 4
- 239000008367 deionised water Substances 0.000 claims description 3
- 229910021641 deionized water Inorganic materials 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 239000007789 gas Substances 0.000 claims 1
- 230000007797 corrosion Effects 0.000 abstract description 12
- 238000005260 corrosion Methods 0.000 abstract description 12
- 230000003647 oxidation Effects 0.000 abstract description 7
- 238000007254 oxidation reaction Methods 0.000 abstract description 7
- 230000008901 benefit Effects 0.000 abstract description 5
- 238000005516 engineering process Methods 0.000 abstract description 5
- 229910001325 element alloy Inorganic materials 0.000 abstract description 2
- 239000003758 nuclear fuel Substances 0.000 abstract description 2
- 238000005240 physical vapour deposition Methods 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 11
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 6
- 229910052726 zirconium Inorganic materials 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 238000005253 cladding Methods 0.000 description 4
- 238000007733 ion plating Methods 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000000861 blow drying Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 230000004584 weight gain Effects 0.000 description 1
- 235000019786 weight gain Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/028—Physical treatment to alter the texture of the substrate surface, e.g. grinding, polishing
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a Cr-Al alloy film taking Zr as a substrate and a preparation method thereof, which is to plate a multi-element alloy film on the surface of the Zr by using a physical vapor deposition method and belongs to the field of sputtering plating. The final film thickness of the plated alloy film was about 10 μm, and the present invention is exemplified by a Cr-Al alloy film of 500nm, and the substrate used was Zr-4 alloy (Sn: 1.20-1.70, Fe: 0.18-0.24, Cr: 0.07-0.13, Ni: 0.03-0.08). The preparation method comprises the following steps: grinding and polishing the zirconium alloy substrate; then cleaning and drying; and plating a Cr-Al alloy film on the surface of the zirconium alloy by adopting a direct-current magnetron sputtering technology. The method for sputtering the Cr-Al alloy film on the Zr-4 alloy substrate further improves the corrosion resistance and the high-temperature oxidation resistance of the Zr alloy for nuclear fuel. The invention effectively prolongs the service life of the zirconium alloy pressure pipe, reduces nuclear leakage accidents, and further improves the economic benefit and the safety guarantee of the nuclear industry.
Description
Technical Field
The invention belongs to the field of plating by a sputtering method, and particularly relates to a Cr-Al alloy film taking Zr as a substrate and a preparation method thereof.
Background
The demand for clean energy in the world is increasing at present, and nuclear power has the advantages of environmental protection and huge capacity, and simultaneously, as the industry of high radiation, the safety problem is not looked at. The high-temperature water vapor driving the generator is discharged through a pressure pipe made of zirconium alloy as a main material. The neutron absorption cross section of pure zirconium is very low, but because the strength and the corrosion resistance of the pure zirconium cannot meet the requirements of manufacturing pressure pipes, some alloy elements are often added into zirconium, the mechanical property and the corrosion resistance of the zirconium are improved, and the neutron absorption cross section of the zirconium is not greatly increased. The zirconium alloy has good corrosion resistance, moderate mechanical property, lower atomic thermal neutron absorption cross section (zirconium is 0.18 target) in high-temperature and high-pressure steam at 300-400 ℃, and has good compatibility with nuclear fuel, so that the zirconium alloy can be used as a reactor core structural material (a fuel cladding, a pressure pipe, a support and a pore pipe) of a water-cooled nuclear reactor. The metal coating material can form a compact oxidation film in a high-temperature water vapor and water corrosion environment, so that the oxidation rate can be effectively reduced and a substrate can be protected; meanwhile, the metal coating and the substrate interface have good bonding state, and the method becomes one of the key directions of research on zirconium alloy film materials.
The high-purity metal Cr has the advantages of high temperature resistance, oxidation resistance and the like, and can be widely applied to engineering as a coating material, Cr and Al elements are plated on the surface of the zirconium alloy, and the Cr and Al can refine grains, so that the oxidation resistance is improved, and the coating is more compact.
In the prior art, the thickness, the bonding rate and the porosity of a coating prepared by adopting a multi-arc ion plating mode can not meet the requirements of a nuclear reactor cladding coating, and the surface of a film layer has a large particle phenomenon by adopting the multi-arc ion plating technology.
Disclosure of Invention
The invention provides a Cr-Al alloy film with Zr as a substrate and a preparation method thereof, aiming at the conditions of a pressure pipe in harsh environments such as high temperature and high pressure, strong neutron radiation, high temperature water impact, boric acid corrosion and the like.
The invention is realized by adopting the following technical scheme:
a preparation method of Cr-Al alloy film with Zr as a substrate adopts a metal target material to form the Cr-Al alloy film on a zirconium alloy matrix, and specifically comprises the following steps:
step 1: grinding and polishing the zirconium alloy substrate;
step 2: cleaning the zirconium alloy substrate after grinding and polishing treatment, and then drying the zirconium alloy substrate;
and step 3: plating a Cr-Al alloy film on the surface of the cleaned zirconium alloy counter substrate by a magnetron sputtering method to finally obtain the Zr substrate on which the Cr-Al alloy film grows.
The further improvement of the method is that in the step 2, the zirconium alloy after being polished and polished is subjected to ultrasonic cleaning on the substrate for 10-15 min by using absolute ethyl alcohol and deionized water, and then is dried by using high-purity nitrogen with the purity of 99.99%.
The further improvement of the invention is that in the step 3, a direct current magnetron sputtering method is adopted to sputter the metal target material, and the sputtering power is 100W.
The invention is further improved in that in step 3, the pressure of the cavity for performing the direct current magnetron sputtering is 10-3Pa～10-2Pa is between Pa.
In the step 3, the pre-sputtering is adopted to remove the surface material of the target.
The invention has the further improvement that in the step 3, a Cr target and an Al target are placed on a rotary substrate frame, so that the target uniformly rotates to prevent the target from being damaged, wherein the rotating speed omega is in the range of 10 r/min-12 r/min, and the plating thickness of the alloy film is controlled by adjusting the switching time of a target baffle; opening a baffle in front of a Cr target and an Al target at the same time, bombarding the Cr target and the Al target by adopting plasma for 20-30 min and depositing on a Zr substrate to form a deposited layer of 40-50 nm serving as a transition layer between a film and the substrate, and plating a Cr-Al alloy film on the transition layer; and finally, simultaneously opening a baffle in front of the Cr target and the Al target, bombarding the target material for 100-110 min by adopting plasma, and depositing the target material on the Zr matrix to form a deposition layer with the thickness of 450-500 nm.
The Cr-Al alloy film taking Zr as a substrate is prepared by the preparation method of the Cr-Al alloy film taking Zr as a substrate, and the thickness of the Cr-Al alloy film is 9-10 mu m.
The invention has the following beneficial technical effects:
the invention provides a preparation method of a Cr-Al alloy film with Zr as a substrate, aiming at the conditions of a pressure pipe in harsh environments such as high temperature and high pressure, strong neutron radiation, high temperature water impact, boric acid corrosion and the like. In the prior art, the thickness, the bonding rate and the porosity of a coating prepared by adopting a multi-arc ion plating mode can not meet the requirements of a nuclear reactor cladding coating, and the surface of a film layer has a large particle phenomenon by adopting the multi-arc ion plating technology. Therefore, the direct current magnetron sputtering technology adopted by the invention has great advantages.
The Cr-Al alloy film taking Zr as a substrate provided by the invention has the total thickness of 500 nm. By the method provided by the invention, the Cr-Al alloy film is sputtered on the surface of the Zr alloy, so that the high-temperature corrosion resistance of the Zr alloy can be further improved, and the service life of the pressure pipe can be further prolonged when the Zr alloy is applied to the protection of the inner side of the pressure pipe, thereby increasing the economic benefit and the safety of nuclear power.
Drawings
FIG. 1 is a scanned view of a Cr-Al alloy film plated;
FIG. 2 is a cross-sectional view of a Cr-Al alloy film being plated;
FIG. 3 is a graph showing a corrosion test of the plated Cr-Al alloy.
Detailed Description
The invention is further described below with reference to the following figures and examples.
The present invention provides a Cr-Al alloy film with Zr as base (the thermal neutron cross section of selected Cr and Al elements is shown in Table 1), said film uses Zr-4 alloy (Sn: 1.20-1.70, Fe: 0.18-0.24, Cr: 0.07-0.13, Ni: 0.03-0.08) as base. The final thickness of the plated Cr-Al alloy film is 9 μm to 10 μm, and the embodiment of the present invention is exemplified by an alloy film having a thickness of 500 nm.
TABLE 1
The invention also provides a preparation method of the film material, which comprises the following steps:
1) and cleaning and drying the Zr-4 alloy substrate, and cleaning equipment.
2) And sputtering a Cr-Al alloy film on the surface of the Zr-4 alloy by a magnetron sputtering method to finally obtain the Zr substrate on which the Cr-Al alloy film grows.
Specifically, in the step 1), the substrate is subjected to ultrasonic cleaning for 10min by using absolute ethyl alcohol and deionized water in sequence, then high-purity nitrogen with the purity of 99.99% is used for blow-drying, dust in a cavity is removed by using a dust collection device for JPG-450a type double-chamber magnetron sputtering equipment, and then the inner wall of the cavity is scrubbed by using the absolute ethyl alcohol.
In the step 2), a JPG-450a type double-chamber magnetron sputtering device is adopted to sputter a Cr-Al alloy film. Two targets were placed on a rotating substrate holder with a rotation speed ω 11 r/min. The target material is a pure Cr target (99.95 percent), a pure aluminum target (99.99 percent), and argon with the purity of 99.99 percent is introduced; the sputtering power is 100W, the bias voltage is-70V, the argon flow is 30sccm, and the working pressure is 1.0 multiplied by 10-4Pa; (ii) a The pre-sputtering time is 15min to remove the surface material of the target.
A transition layer was first plated on the Zr substrate. The method comprises the following specific steps:
simultaneously opening a baffle in front of the Cr target and the Al target, bombarding the Cr target and the Al target for 30min by adopting plasma, and depositing the Cr target and the Al target on the Zr substrate to form a deposition layer with the thickness of about 50nm as a transition layer between the film and the substrate;
the transition layer is plated with a Cr-Al alloy film. The method comprises the following specific steps:
and simultaneously opening a baffle in front of the Cr target and the Al target, bombarding the target material for 100min by adopting plasma, and depositing the target material on the Zr matrix to form a deposition layer with the thickness of about 500 nm. The scanning pattern of the obtained Cr-Al alloy film is shown in FIG. 1, and the sectional pattern of the Cr-Al alloy film is shown in FIG. 2. As can be seen from FIG. 1, the obtained Cr-Al alloy has uniform and compact structure, fine particles and good performance; it can be seen from FIG. 2 that the Cr-Al alloy layer grows in columnar crystal growth in cross section and has a thickness of approximately 500 nm.
When the Cr-Al alloy plating technology taking Zr as the substrate provided by the invention is applied to the surface of a pressure pipe, excellent high-temperature water vapor corrosion resistance can be obtained, and as can be seen from figure 3, after the alloy film is plated, the corrosion weight gain is reduced, which shows that the high-temperature corrosion resistance is enhanced. The multi-element alloy film can be applied to zirconium alloy cladding, effectively solves the problem of mismatching of the coating and the matrix in thermal expansion, reduces the thermal stress, further improves the hardness and the wear resistance of the conventional Cr coating, strengthens the oxidation resistance through the regulation and control of multiple elements, and realizes the oxidation resistance protection effect of the coating in a high-temperature steam environment of 1200 ℃.
Claims (7)
1. A preparation method of a Cr-Al alloy film taking Zr as a substrate is characterized in that a metal target is adopted to form the Cr-Al alloy film on a zirconium alloy substrate, and the preparation method specifically comprises the following steps:
step 1: grinding and polishing the zirconium alloy substrate;
step 2: cleaning the zirconium alloy substrate after grinding and polishing treatment, and then drying the zirconium alloy substrate;
and step 3: plating a Cr-Al alloy film on the surface of the cleaned zirconium alloy counter substrate by a magnetron sputtering method to finally obtain the Zr substrate on which the Cr-Al alloy film grows.
2. The method for preparing a Cr-Al alloy film based on Zr according to claim 1, wherein in step 2, the zirconium alloy after grinding and polishing is ultrasonically cleaned on the substrate by absolute ethyl alcohol and deionized water for 10-15 min, and then is blown dry by high purity nitrogen with a purity of 99.99%.
3. The method for preparing a Cr-Al alloy film based on Zr according to claim 1, wherein in step 3, a metal target is sputtered by a DC magnetron sputtering method with a sputtering power of 100W.
4. The method for producing a Zr-based Cr-Al alloy film according to claim 1, wherein in step 3, the chamber gas pressure for the DC magnetron sputtering is 10-3Pa～10-2Pa is between Pa.
5. The method of claim 1, wherein in step 3, pre-sputtering is used to remove surface material from the target.
6. The method of claim 1, wherein in step 3, the Cr target and the Al target are placed on a rotating substrate holder, the Cr target and the Al target are rotated uniformly to prevent the target from being damaged, wherein the rotation speed ω is in the range of 10r/min to 12r/min, and the plating thickness of the alloy film is controlled by adjusting the on/off time of the target shutter; opening a baffle in front of a Cr target and an Al target at the same time, bombarding the Cr target and the Al target by adopting plasma for 20-30 min and depositing on a Zr substrate to form a deposited layer of 40-50 nm serving as a transition layer between a film and the substrate, and plating a Cr-Al alloy film on the transition layer; and finally, simultaneously opening a baffle in front of the Cr target and the Al target, bombarding the target material for 100-110 min by adopting plasma, and depositing the target material on the Zr matrix to form a deposition layer with the thickness of 450-500 nm.
7. A Zr-based Cr-Al alloy film, characterized by being produced by the method for producing a Zr-based Cr-Al alloy film according to any one of claims 1 to 6, wherein the Cr-Al alloy film has a thickness of 9 to 10 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910838364.XA CN110629176A (en) | 2019-09-05 | 2019-09-05 | Cr-Al alloy film with Zr as substrate and preparation method thereof |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910838364.XA CN110629176A (en) | 2019-09-05 | 2019-09-05 | Cr-Al alloy film with Zr as substrate and preparation method thereof |
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| CN110629176A true CN110629176A (en) | 2019-12-31 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112921299A (en) * | 2021-01-20 | 2021-06-08 | 哈尔滨工业大学 | Preparation method of composite film on surface of zirconium cladding |
| CN114672777A (en) * | 2022-03-30 | 2022-06-28 | 西安交通大学 | Antioxidant Cr/CrAl nano multilayer coating and preparation method thereof |
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| CN106119801A (en) * | 2016-09-20 | 2016-11-16 | 重庆师范大学 | A kind of Cr Al binary alloy material and preparation method thereof |
| WO2019098665A1 (en) * | 2017-11-14 | 2019-05-23 | 한국원자력연구원 | Zirconium alloy cladding with improved oxidation resistance at high temperature and method for manufacturing same |
| CN110055496A (en) * | 2019-04-04 | 2019-07-26 | 中国核动力研究设计院 | A kind of preparation process preparing Cr coating in nuclear-used zirconium alloy substrate surface |
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2019
- 2019-09-05 CN CN201910838364.XA patent/CN110629176A/en active Pending
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| CN106119801A (en) * | 2016-09-20 | 2016-11-16 | 重庆师范大学 | A kind of Cr Al binary alloy material and preparation method thereof |
| WO2019098665A1 (en) * | 2017-11-14 | 2019-05-23 | 한국원자력연구원 | Zirconium alloy cladding with improved oxidation resistance at high temperature and method for manufacturing same |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112921299A (en) * | 2021-01-20 | 2021-06-08 | 哈尔滨工业大学 | Preparation method of composite film on surface of zirconium cladding |
| CN114672777A (en) * | 2022-03-30 | 2022-06-28 | 西安交通大学 | Antioxidant Cr/CrAl nano multilayer coating and preparation method thereof |
| CN114672777B (en) * | 2022-03-30 | 2023-12-19 | 西安交通大学 | Antioxidant Cr/CrAl nano multilayer coating and preparation method thereof |
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Application publication date: 20191231 |
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| RJ01 | Rejection of invention patent application after publication |