TWI307123B - - Google Patents
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- Publication number
- TWI307123B TWI307123B TW95130074A TW95130074A TWI307123B TW I307123 B TWI307123 B TW I307123B TW 95130074 A TW95130074 A TW 95130074A TW 95130074 A TW95130074 A TW 95130074A TW I307123 B TWI307123 B TW I307123B
- Authority
- TW
- Taiwan
- Prior art keywords
- gas
- disposed
- processing chamber
- sample
- inlet
- Prior art date
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- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW95130074A TW200811945A (en) | 2006-08-16 | 2006-08-16 | Plasma process apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW95130074A TW200811945A (en) | 2006-08-16 | 2006-08-16 | Plasma process apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200811945A TW200811945A (en) | 2008-03-01 |
TWI307123B true TWI307123B (ja) | 2009-03-01 |
Family
ID=44767894
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW95130074A TW200811945A (en) | 2006-08-16 | 2006-08-16 | Plasma process apparatus |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW200811945A (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112563106B (zh) * | 2019-09-10 | 2023-10-31 | 中微半导体设备(上海)股份有限公司 | 一种半导体处理设备及其排气系统 |
-
2006
- 2006-08-16 TW TW95130074A patent/TW200811945A/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW200811945A (en) | 2008-03-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |