TWI307123B - - Google Patents

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Publication number
TWI307123B
TWI307123B TW95130074A TW95130074A TWI307123B TW I307123 B TWI307123 B TW I307123B TW 95130074 A TW95130074 A TW 95130074A TW 95130074 A TW95130074 A TW 95130074A TW I307123 B TWI307123 B TW I307123B
Authority
TW
Taiwan
Prior art keywords
gas
disposed
processing chamber
sample
inlet
Prior art date
Application number
TW95130074A
Other languages
English (en)
Chinese (zh)
Other versions
TW200811945A (en
Inventor
Michiaki Kobayashi
Tsutomu Nakamura
Akitaka Makino
Original Assignee
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Tech Corp filed Critical Hitachi High Tech Corp
Priority to TW95130074A priority Critical patent/TW200811945A/zh
Publication of TW200811945A publication Critical patent/TW200811945A/zh
Application granted granted Critical
Publication of TWI307123B publication Critical patent/TWI307123B/zh

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  • Drying Of Semiconductors (AREA)
TW95130074A 2006-08-16 2006-08-16 Plasma process apparatus TW200811945A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW95130074A TW200811945A (en) 2006-08-16 2006-08-16 Plasma process apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW95130074A TW200811945A (en) 2006-08-16 2006-08-16 Plasma process apparatus

Publications (2)

Publication Number Publication Date
TW200811945A TW200811945A (en) 2008-03-01
TWI307123B true TWI307123B (ja) 2009-03-01

Family

ID=44767894

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95130074A TW200811945A (en) 2006-08-16 2006-08-16 Plasma process apparatus

Country Status (1)

Country Link
TW (1) TW200811945A (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112563106B (zh) * 2019-09-10 2023-10-31 中微半导体设备(上海)股份有限公司 一种半导体处理设备及其排气系统

Also Published As

Publication number Publication date
TW200811945A (en) 2008-03-01

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees