TWI303477B - - Google Patents

Download PDF

Info

Publication number
TWI303477B
TWI303477B TW95126341A TW95126341A TWI303477B TW I303477 B TWI303477 B TW I303477B TW 95126341 A TW95126341 A TW 95126341A TW 95126341 A TW95126341 A TW 95126341A TW I303477 B TWI303477 B TW I303477B
Authority
TW
Taiwan
Prior art keywords
layer
electrode
type air
air discharge
discharge protection
Prior art date
Application number
TW95126341A
Other languages
English (en)
Chinese (zh)
Other versions
TW200807673A (en
Inventor
He-Jie Yu
jun-you Lin
hong-yi Zhuang
cai-bao Jiang
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to TW95126341A priority Critical patent/TW200807673A/zh
Publication of TW200807673A publication Critical patent/TW200807673A/zh
Application granted granted Critical
Publication of TWI303477B publication Critical patent/TWI303477B/zh

Links

Landscapes

  • Thermistors And Varistors (AREA)
  • Elimination Of Static Electricity (AREA)
TW95126341A 2006-07-19 2006-07-19 Chip typed air-discharge protecting element and preparation method thereof TW200807673A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW95126341A TW200807673A (en) 2006-07-19 2006-07-19 Chip typed air-discharge protecting element and preparation method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW95126341A TW200807673A (en) 2006-07-19 2006-07-19 Chip typed air-discharge protecting element and preparation method thereof

Publications (2)

Publication Number Publication Date
TW200807673A TW200807673A (en) 2008-02-01
TWI303477B true TWI303477B (enExample) 2008-11-21

Family

ID=44766710

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95126341A TW200807673A (en) 2006-07-19 2006-07-19 Chip typed air-discharge protecting element and preparation method thereof

Country Status (1)

Country Link
TW (1) TW200807673A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8089741B2 (en) 2008-11-28 2012-01-03 Cyntec Co., Ltd. Over-voltage protection device and method for manufacturing thereof
TWI748921B (zh) * 2021-05-07 2021-12-01 旭積科技股份有限公司 電子裝置及其電容器組件封裝結構

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8089741B2 (en) 2008-11-28 2012-01-03 Cyntec Co., Ltd. Over-voltage protection device and method for manufacturing thereof
TWI748921B (zh) * 2021-05-07 2021-12-01 旭積科技股份有限公司 電子裝置及其電容器組件封裝結構

Also Published As

Publication number Publication date
TW200807673A (en) 2008-02-01

Similar Documents

Publication Publication Date Title
CN100561860C (zh) 结构高度低的封装元器件及制造方法
US6160695A (en) Transient voltage protection device with ceramic substrate
KR101254212B1 (ko) Esd 보호 디바이스
KR101049022B1 (ko) 정전기 대책 부품과 그 제조 방법
TW200411853A (en) Semiconductor device manufacturing method
US20080239610A1 (en) Chip scale gas discharge protective device and fabrication method of the same
WO1998023018A1 (en) A transient voltage protection device and method of making same
US20130224910A1 (en) Method for chip package
WO2008069190A1 (ja) 静電気対策部品およびその製造方法
TWI377755B (en) Over-voltage protecting device and method for making thereof
TW200807673A (en) Chip typed air-discharge protecting element and preparation method thereof
US20250253075A1 (en) Thin film resistor and method of fabricating the same
CN102792534B (zh) 静电保护部件及其制造方法
CN101202422A (zh) 芯片型空气放电保护组件及其制备方法
KR101323145B1 (ko) 정전기 보호용 반도체 소자의 제조방법
JP3877700B2 (ja) 半導体装置及びその製造方法
JP7446950B2 (ja) 配線基板
JP5648696B2 (ja) Esd保護装置及びその製造方法
KR100781487B1 (ko) 높은 써지 내량 과 빠른 반응 속도를 갖는 과전압 보호 칩
TW201246516A (en) Chip type tandem electrostatic suppression protection element and manufacturing method thereof
TWI253881B (en) Chip-type micro air-gap discharge protection device and manufacturing method thereof
JP7720408B2 (ja) 金属化半導体ダイ及びその製造方法
US20250266191A1 (en) Thin film resistor and method of fabricating the same
CN112992444B (zh) 电阻器组件
TW460983B (en) A device for passivating semiconductor and a method for making the same