TWI295281B - - Google Patents

Download PDF

Info

Publication number
TWI295281B
TWI295281B TW89103737A TW89103737A TWI295281B TW I295281 B TWI295281 B TW I295281B TW 89103737 A TW89103737 A TW 89103737A TW 89103737 A TW89103737 A TW 89103737A TW I295281 B TWI295281 B TW I295281B
Authority
TW
Taiwan
Prior art keywords
acid
phenyl
group
alkyl
cns
Prior art date
Application number
TW89103737A
Other languages
English (en)
Chinese (zh)
Inventor
Asakura Toshikage
Yamato Hitoshi
Masaki Ohwa
Birbaum Jean-Luc
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Priority to TW89103737A priority Critical patent/TWI295281B/zh
Application granted granted Critical
Publication of TWI295281B publication Critical patent/TWI295281B/zh

Links

Landscapes

  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
TW89103737A 2000-02-29 2000-02-29 TWI295281B (cg-RX-API-DMAC7.html)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW89103737A TWI295281B (cg-RX-API-DMAC7.html) 2000-02-29 2000-02-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW89103737A TWI295281B (cg-RX-API-DMAC7.html) 2000-02-29 2000-02-29

Publications (1)

Publication Number Publication Date
TWI295281B true TWI295281B (cg-RX-API-DMAC7.html) 2008-04-01

Family

ID=45068388

Family Applications (1)

Application Number Title Priority Date Filing Date
TW89103737A TWI295281B (cg-RX-API-DMAC7.html) 2000-02-29 2000-02-29

Country Status (1)

Country Link
TW (1) TWI295281B (cg-RX-API-DMAC7.html)

Similar Documents

Publication Publication Date Title
AT410262B (de) Oximderivate und ihre verwendung als latente säuren
DE10015255B4 (de) Verfahren zur Herstellung von Oximderivaten und ihre Verwendung als latente Säuren in chemisch verstärkten Photoresistzusammensetzungen, sowie Verfahren zur Herstellung eines Photoresists
TWI393999B (zh) 肟衍生物及其作為潛酸之作用
TWI272451B (en) Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition
KR101043905B1 (ko) 할로겐화 옥심 유도체 및 잠산으로서의 이의 용도
CN102781911B (zh) 潜酸及其用途
JP4294317B2 (ja) オニウム塩及びその潜在的酸としての使用
JP2002523398A (ja) 新規な不飽和オキシム誘導体及び潜在的な酸としてのその用途
JP4408220B2 (ja) 置換オキシム誘導体及びその潜在酸としての使用
KR20040089607A (ko) 설포네이트 유도체 및 잠산으로서의 이의 용도
TWI295281B (cg-RX-API-DMAC7.html)
TWI303243B (en) Onium salts and the use therof as latent acids
TWI312346B (en) Oxime derivatives and the use thereof as latent acids
CZ20001117A3 (cs) Oximové deriváty a jejich použití jako latentních kyselin

Legal Events

Date Code Title Description
MK4A Expiration of patent term of an invention patent