TWI286268B - Polycarboxylic acid resin and photosensitive resin composition containing the same - Google Patents

Polycarboxylic acid resin and photosensitive resin composition containing the same Download PDF

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Publication number
TWI286268B
TWI286268B TW092118151A TW92118151A TWI286268B TW I286268 B TWI286268 B TW I286268B TW 092118151 A TW092118151 A TW 092118151A TW 92118151 A TW92118151 A TW 92118151A TW I286268 B TWI286268 B TW I286268B
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acid
pigment
compound
red
group
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TW092118151A
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Chinese (zh)
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TW200403526A (en
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Hideyuki Nakai
Masato Inoue
Seiji Muro
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Sumitomo Chemical Co
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

A sensitive resin composition and a cured product containing the same are provided. The sensitive resin composition includes a polycarboxylic acid resin, [A] at least one of the above resin composition and [B] an addition polymerization compound having one and more ethylene unsaturated bonds, [C] a photopolymerization initiator, and [D] a solvent, wherein the polycarboxylic acid resin is obtained by reacting (a) a reactant obtained by reacting a compound (a1) with a compound (a2) under the condition of formula (P), with (b) a monocarboxylic acid containing unsaturated groups to obtain (c) the reactant, and further reacting (c) the reactant with (d) an acid anhydride. (a1) an epoxy compound having at least two or more epoxy groups in the molecule. (a2) a multi-valence carboxylic acid. Formula (P): (the epoxy equivalent of the epoxy compound) > (the carboxylic acid equivalent of the multi-valence carboxylic acid).

Description

1286268 玖、發明說明 【發明所屬之技術領域】 本發明係有關含有聚羧酸樹脂、作為黏合聚合物之聚 叛酸樹脂之感光性樹脂組成物及其硬化物。尤其是有關適 a使用於濾色用者色感光性樹脂組成物、濾色用保護膜、 濾色用調距器、濾色用層間絶緣膜等之感光性樹脂組成 物。 【先前技術】 含有鹼性可溶性樹脂、顏料及光聚合引發劑之著色感 光性樹脂組成物廣泛使用於製造構成彩色液晶顯示裝置、 先色固體攝影裝置等元件之渡色板。使用該等著色感光性 樹脂組成物製造濾色板之方法已知有例如在基板(2)之表 面形成由著色感光性樹脂組成物組成之層(1)(第1圖0))、 在上述之層(1)藉由光罩(3)將光線(4)照射,曝光後(第i圖 (b))顯像之方法。著色感光性樹脂組成物層中於曝光, 光線(4)未照射之光線未照射領域(11}經由顯像去除,經光 線照射之光線照射領域(丨2)由於未去除而殘留,形成黑色 基材或晝素(5)(第1圖(c))。為了提昇所形成黑色基材或畫 素之機械性強度,顯像後通常進行加熱處理。經由一邊更 換著色感光性樹脂組成物所含之顏料顏色,一邊反覆進行 上述之操作,可依次形成黑色基材(5BM)、與三原色對應 之彩色畫素(5R、5G、5B),可獲得目的之濾色板(6)(第之 圖)。 於該等製造方法,為了形成更微細之黑色基材或形成 5 314839 !286268[Technical Field] The present invention relates to a photosensitive resin composition containing a polycarboxylic acid resin, a polyphenolic resin as a binder polymer, and a cured product thereof. In particular, it is a photosensitive resin composition which is used for a color filter resin composition for a color filter, a protective film for color filter, a distance meter for color filter, and an interlayer insulating film for color filter. [Prior Art] A color-sensitive photosensitive resin composition containing an alkali-soluble resin, a pigment, and a photopolymerization initiator is widely used for producing a color filter plate which constitutes a component such as a color liquid crystal display device or a color solid-state imaging device. A method of producing a color filter using the colored photosensitive resin composition is known, for example, by forming a layer (1) (Fig. 1) composed of a colored photosensitive resin composition on the surface of a substrate (2), The layer (1) is a method of irradiating the light (4) by the mask (3) and developing the image after exposure (Fig. i(b)). In the colored photosensitive resin composition layer, the light is not irradiated, and the light (4) is not irradiated, and the light is irradiated, and the light irradiation field (丨2) remains as it is not removed, and a black base is formed. Material or halogen (5) (Fig. 1 (c)). In order to improve the mechanical strength of the formed black substrate or pixel, heat treatment is usually performed after development, and the coloring photosensitive resin composition is replaced by one side. The color of the pigment is reversed, and the black substrate (5BM) and the color pixels (5R, 5G, and 5B) corresponding to the three primary colors can be sequentially formed, and the desired color filter (6) can be obtained (Fig. In these manufacturing methods, in order to form a finer black substrate or form 5 314839 !286268

α-ΐ) ο ^ (1-3) >-3(Μ) h3^CH3(i_5) CH2 (1-6) HaC\ yCH3 〆、 (I·7) ㈣ 又,環氧化合物⑴可經由公知之方 !將對應之二醇成分與適當量之環氧氣丙二,例如可經 得。 衣乳虱丙烷進行反應獲 環氧化合物(1)中,R1 乙基、正丙A Μ 之烷基可列舉例如甲基、 :基、正丁基、第三丁 至5之烧基。齒素原子可列舉氧原子、=子數 R3之伸烧基可列舉例如甲撐基、、:甲::。 =基等碳原子數約…。之⑽有 之列舉例如經基;_素原子,·可具有經基 數…。之院基;碳原子數…。之烧氧基; 石反原子數6至15之芳基·护庙工奴1 方暴’奴原子數7至15之芳烷基;碳 原子數2至!〇之鏈稀基;碳原子數2至1()之醯氧基等。 此處’函素原子可列舉例如氯原子、溴原子等。碳原 子數1至丨0之烷基可列舉例如甲基、乙基、丙基等。經羥 基取代時之烷基可列舉例如羥乙基、經丙基等。 碳原子數1至10之烷氧基可列舉例如甲氧基、乙氧 基、丙氧基、丁氧基等。 碳原子數6至1 5之芳基可列舉例如苯基、萘基等。碳 314839 8 1286268 原子數7至1 5之芳 碳原子數2至 等。 烧基可列舉例如苄基、苯基乙基等。 10之鏈烯基可列舉例如乙烯基、丙烯基 it /、數2至10之酸氧基可列舉例如乙醯氧基、节 氧基等。 將上述壞氧化合物衍生之二醇 雙酚化合物。 為通式(m)所示 之 (HI) [式中^2及以自與上述者同意義] 此處,X i xrn 如w雙齡、tr雙之/等齡化合物,具體而言,可列舉例 又(羥基苯基)苟、9,9-雙(4-羥基-3-甲基 氧基苯㈣:二二基·'氟苯基)努、9,9·雙㈣基-3·甲 經基'5-二氣笨二基_3,5-二甲基苯細、9,9_雙(4· 等。 土)勿、9,9-雙(4_羥基-3,5-二溴苯基)芴 可列= Π·2)所示2價殘基之雙酚化合物,具體而言, 牛σ又(4-羥基笨基)酮、 _ — ^ ^ ^ _、雙跑則。U·3,5·—甲基本基) X為式(1-3)所示之雙酚化合物,具體而言,可列舉例 314839 9 1286268 如雙(4-羥基苯基)亞楓、雙(4-羥基-3,5-二甲基苯基)亞楓、 雙(4-羥基-3,5-二氯苯基)亞碾等。 X為式(1-4)所示2價殘基之雙紛化合物,具體而言, 可列舉例如雙(4-羥基苯基)六氟丙烷、雙(4_羥基3,5-二甲 基苯基)六氟丙烷、雙(4-羥基-3,5-二氯苯基)六氟丙烷等。 X為式(1-5)所示2價殘基之雙酚化合物,具體而言, 可列舉例如雙(4-羥基苯基)二甲基石夕烧、雙(4_羥基_3,5_二 甲基苯基)二甲基矽烷、雙(4_羥基-3,5-二氣苯基)二甲基矽 烷等。 X為式(1-6)所示2價殘基之雙酚化合物,具體而言, 可列舉例如雙(4-.基苯基)甲烧、雙(心經基3,5_二氣苯基: 甲烷又(4-羥基_3,5-二溴苯基)甲烷、苯酚酚醛清漆、甲 酚酚醛清漆等。Α-ΐ) ο ^ (1-3) >-3(Μ) h3^CH3(i_5) CH2 (1-6) HaC\ yCH3 〆, (I·7) (4) Further, the epoxy compound (1) is known The diol component corresponding to the appropriate amount of epoxide gas, for example, can be obtained. In the epoxy compound (1), the alkyl group of R1 ethyl or n-propyl A oxime may, for example, be a methyl group, a group, a n-butyl group or a third to 5 group. Examples of the dentate atom include an oxygen atom and a sub-number of R3. Examples of the stretching group include a methyl group and a: a::. = The number of carbon atoms such as the base is about... (10) may be exemplified by, for example, a meridine; a prime atom, which may have a base number. The base of the hospital; the number of carbon atoms... Alkoxy group; stone anti-atomic number 6 to 15 aryl · protector temple slave 1 square storm 'slaves atom number 7 to 15 aralkyl; carbon atomic number 2 to! A chain of hydrazine; a fluorenyl group having 2 to 1 () carbon atoms. Here, the functional atom may, for example, be a chlorine atom or a bromine atom. Examples of the alkyl group having a carbon number of 1 to 丨0 include a methyl group, an ethyl group, a propyl group and the like. The alkyl group when substituted with a hydroxyl group may, for example, be a hydroxyethyl group, a propyl group or the like. Examples of the alkoxy group having 1 to 10 carbon atoms include a methoxy group, an ethoxy group, a propoxy group, a butoxy group and the like. Examples of the aryl group having 6 to 15 carbon atoms include a phenyl group, a naphthyl group and the like. Carbon 314839 8 1286268 Aromatic number 7 to 15 aryl Carbon number 2 to equal. Examples of the alkyl group include a benzyl group, a phenylethyl group and the like. The alkenyl group of 10 may, for example, be a vinyl group, an acryl-based it / or an acid group having a number of 2 to 10, and examples thereof include an ethyl oxy group and a hydroxyl group. A diol bisphenol compound derived from the above-mentioned bad oxygen compound. (HI) as shown in the general formula (m) [wherein ^2 and in the same meaning as above] Here, X i xrn such as w double age, tr double / equivalent compound, specifically, Examples are (hydroxyphenyl)anthracene, 9,9-bis(4-hydroxy-3-methyloxybenzene(tetra):didiyl-'fluorophenyl)nu, 9,9.bis(tetra)yl-3. A, ketone, '5-diqi, studyldiyl, _3,5-dimethylphenyl fine, 9,9 bis (4·etc. earth), 9,9-bis (4-hydroxy-3,5- Dibromophenyl) fluorene = )·2) a bisphenol compound of a divalent residue, specifically, bovine σ (4-hydroxyphenyl) ketone, _ — ^ ^ ^ _, double run . U·3,5·-methyl group) X is a bisphenol compound represented by formula (1-3), and specifically, exemplified by 314839 9 1286268 such as bis(4-hydroxyphenyl) yafeng, bis ( 4-hydroxy-3,5-dimethylphenyl) flavonoid, bis(4-hydroxy-3,5-dichlorophenyl) sub-grinding, and the like. X is a compound of a divalent residue represented by the formula (1-4), and specific examples thereof include bis(4-hydroxyphenyl)hexafluoropropane and bis(4-hydroxy 3,5-dimethyl group). Phenyl) hexafluoropropane, bis(4-hydroxy-3,5-dichlorophenyl)hexafluoropropane, and the like. X is a bisphenol compound of a divalent residue represented by the formula (1-5), and specific examples thereof include bis(4-hydroxyphenyl)dimethylcarbazide and bis(4-hydroxy-3,5). _Dimethylphenyl)dimethyl decane, bis(4-hydroxy-3,5-diphenyl)dimethyl decane, and the like. X is a bisphenol compound of a divalent residue represented by the formula (1-6), and specific examples thereof include bis(4-.phenylphenyl)methane and bis(neurocarbyl 3,5-diphenylphenyl). : Methane (4-hydroxy-3,5-dibromophenyl)methane, phenol novolac, cresol novolac, etc.

為式(I 7)所示2價殘基之雙酚化合物,具體而言, 可列舉例如2,2-雙羥基苯基)丙烷、2,2-雙(‘羥基Μ 甲土苯基)丙燒、2,2-雙(4_經基·3,5_二氣苯基)丙烧、U 々 本基)丙烷、2,2_雙(4-羥基-3-氯苯基)丙烧 等。 X為式(1-8)所示2價殘基之雙酚化合物,具體而言, 可列舉例如雙輛 + 二基本基)醚、雙(4~羥基3,5-二甲基苯基 醚、雙(4-經基-3,5_二氣苯基)峻等。 該等雙齡化合物 使用。 了各自早獨使用,亦可2種以上組< 環氧化合物(]1 + 、 、 )中,以X為式(1-1)所示之2價殘基者車 314839 10 1286268 佳0 於该寺環氧化合物⑴中,亦以R1、 m=0、x於對於經〜取代之…:為風原子、 位之式(1-1)所_ 0伸. 本衣上之氧原子為第4 不2彳貝殘基之化合物;Rl $ 為氫原子H γ认 物,R為甲基、m r4 m〜Ο、X於對於妙R丨 2 原子a楚/1 、、工 R取代之苯環上之ft '、子為弟4位之式乳 R4為氫原子^ 貝殘基之化合物;Rl、R2及 原子、R3為乙擇基、X於對於經 %上之氧原子為笼 本 (1_1)所示2價殘基之化合物; X 於二、r= 所示2價殘基之化人物本=之乳原子為第4位之式(Μ) R3為乙Μ γ R為甲基,R2及R4為氫原子、 二乙撐基、X於對於經⑽取代之苯環上之氧原子為 ^式(M)所示2價殘基. 接著,對於與(al)化合物 緩酸加以說明。 4勿進仃反應之㈣化合物之多價 夕"ί貝緩酸為一分子中$,卜g 士 V具有2個羧酸基之化合物, 刀子中具有不飽和鍵者較佳。多價羧酸可列舉 馱、丙二酸、琥珀酸、戊二酸、 — $ 己一酉夂、頻果酸、馬來酸、 广、衣康酸、苯二甲酸、四氫苯二甲酸、六氫 :、甲基甲橋四氯苯二甲酸、氣橋酸、甲基四氯苯二甲酸、 笨三酸、均苯四甲酸、二苯甲酮二«、二苯甲酮四緩 酸、聯苯四叛酸、聯苯二缓酸、聯苯喊四叛酸等,較理相 :可列舉馬來酸、富馬酸、衣康酸、四氯笨二甲酸、氣橋 ”該等可各自單獨使用,亦可2種以上組合使用。 314839 11 1286268 於㈣與(a2)之反應,作為稀釋劑以使用例如3_乙氧 基,酸甲S旨、3_乙氧基丙酸乙醋、乙基溶纖劑乙酸醋、3- 甲氧基丁基乙酸酯、乳酸乙酯、_ 7 _ —乙一醇二甲醚、乙酸丁 _、3 -甲氧基丙酸甲酯、2-庚顯j、乙其 G暴曱基曱酮、環己酮、 乙基卡必醇乙酸酯、丁基卡必醇乙醅 ^ 吁G a夂酯、丙二醇甲醚乙酸 酯等溶劑較佳。 尤其,於(al)化合物與(a2)化合物之反應,為了促進反 應以使用觸媒為宜。觸媒可列舉例如二 — 一乙胺、卞基二甲胺、 甲基三乙基氣減、〒基三甲基漠化錢、节基三甲基蛾化 銨、三笨基碟化氫、三苯基娣化氫、辛酸絡、辛酸夢等。 上述觸媒之使用量對於反應原料混合物較好為〇丨至 量%。Specific examples of the bisphenol compound of the divalent residue represented by the formula (I7) include 2,2-bishydroxyphenyl)propane and 2,2-bis('hydroxyindole). Burning, 2,2-bis(4_carbyl·3,5_diphenyl)propane, U 々benyl)propane, 2,2-bis(4-hydroxy-3-chlorophenyl)propane Wait. X is a bisphenol compound of a divalent residue represented by the formula (1-8), and specific examples thereof include, for example, a double + dibasic ether, bis (4 hydroxy 3,5-dimethylphenyl ether) , bis(4-carbyl-3,5-di-phenylene), etc. These two-aged compounds are used. Each of them may be used alone or in combination of two or more groups; epoxy compound (]1 + , , In the case of X, the divalent residue represented by formula (1-1) is 314839 10 1286268. In the epoxy compound (1) of the temple, R1, m=0, x are also substituted for ...: for the wind atom, the position of the formula (1-1) _ 0 extension. The oxygen atom on the coat is the compound of the 4th non-2 mussel residue; Rl $ is the hydrogen atom H γ recognition, R is A The base, m r4 m~Ο, X is the same as the ft R 丨 2 atom a Chu /1, the ft ring on the benzene ring substituted by the work R, the sub-four-position milk R4 is a hydrogen atom ^ shell residue a compound; R1, R2 and an atom, R3 is a thiol group, X is a compound having a divalent residue represented by a cage (1_1) for an oxygen atom on the %; X is a divalent residue represented by a second, r= The character of the person = the milk atom is the fourth place (Μ) R3 is Μ Μ γ R is a methyl group, and R2 and R4 are hydrogen atoms. The diethylene group and X are the divalent residues represented by the formula (M) for the oxygen atom on the benzene ring substituted by the (10). Next, the acidification of the (al) compound will be described. (4) The multivalent valence of the compound is a compound of two carboxylic acid groups in the molecule, and the unsaturated bond in the knives is preferred. The polyvalent carboxylic acid may be exemplified by Malonic acid, succinic acid, glutaric acid, — $ hexamidine, frequency acid, maleic acid, broad, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrogen: methyl bridge Tetrachlorophthalic acid, gas bridge acid, methyl tetrachlorophthalic acid, stearic acid, pyromellitic acid, benzophenone II, benzophenone tetrazoic acid, biphenyl tetracarboxylic acid, biphenyl Two slow acid, biphenyl, four rebel acid, etc., more reasonable: can be listed as maleic acid, fumaric acid, itaconic acid, tetrachloro phthalic acid, gas bridge", these can be used alone, or two The above combination is used. 314839 11 1286268 In the reaction of (d) and (a2), as a diluent, for example, 3-ethoxylated, acid-methyl, ethyl 3-ethoxypropyl propionate, ethyl cellosolve acetate , 3-methoxybutyl acetate, ethyl lactate, _ 7 _ - ethoxylated dimethyl ether, methyl butyl acetate, methyl 3-methoxypropionate, 2-g-hungj, gamma Preferably, a solvent such as decyl ketone, cyclohexanone, ethyl carbitol acetate, butyl carbitol oxime, glycerin, propylene glycol methyl ether acetate or the like is used. In order to promote the reaction with a compound (a2), it is preferred to use a catalyst. Examples of the catalyst include di-ethylamine, mercaptodimethylamine, methyltriethyl gas reduction, and mercaptotrimethylation. Money, thalamic trimethyl moth molybdenum, tribasic hydrogenated hydrogen, triphenylphosphonium hydrogen, octanoic acid, caprylic acid dream. The amount of the above catalyst used is preferably 〇丨% by weight based on the reaction raw material mixture.

(a2)化合物具有不飽和雙鍵時,為了防止反應中之聚 合,較好使用抗聚合劑。抗聚合劑可列舉例如對苯二I 甲基對苯二酚、對苯二酚單甲 卞τ i 兄余酚、焦梧酚等。其 使用量對於反應原料混合物較好A /、 平乂灯馮υ·01至1質量%。反應 溫度較好為60至150。〇。又,反庫w 久應日寻間較好為5至6〇 +When the compound (a2) has an unsaturated double bond, it is preferred to use an anti-polymerization agent in order to prevent polymerization in the reaction. Examples of the anti-polymerization agent include p-phenylene dimethyl hydroquinone, hydroquinone monomethyl hydrazone, and pyrogallol. The amount of the mixture used is preferably A /, a flat lamp, from 01 to 1% by mass. The reaction temperature is preferably from 60 to 150. Hey. Also, anti-library w long-term search between 5 to 6 〇 +

時。 J 本發明中(al)化合物盘卜人从 奶H (a2)化合物之反應在[(環 量數)>(羧酸當量數)]之條件下進行’通常當量數二 氧):(緩酸卜100:u 100:99。較好為1〇〇:2〇至⑽衣 95,更好為1〇〇: 50至ι〇η· on …丄、, 100 · 90。上述當量比若為100 : i 至10 0 : 9 9,則於最終所嫌值人女士 取、所獲侍含有本聚羧酸樹脂之感 樹脂組成物有容易取得咸厣 " J %行琢度、頭像性、解像性平衡之傾 314839 12 1286268 向,較佳。 接著,對於(b)含有不飽和基之單魏酸(成分(b))加以說 明。本發明之成分(b)可列舉例如丙烯酸、丙烯酸之二聚 物、甲基丙烯酸、/?-苯乙烯基丙烯酸、;3 -糠基丙烯酸、 丁烯酸、α -氰基桂皮酸、桂皮酸;飽和或不飽和二鹼酸酐 與1分子中具有1個羥基之(甲基)丙烯酸酯衍生物之反應 物之半醋類,飽和或不飽和二驗酸與含有不飽和基之單縮 水甘油化合物之反應物之半酯類等。半酯類可列舉例如將 琥珀酸酐、馬來酸酐、苯二甲酸酐、四氫苯二甲酸酐、六 氫苯二甲酸酐、甲基六氫苯二甲酸酐、甲基四氫苯二甲酸 酐、衣康酸酐、甲基甲橋四氫苯二甲酸酐等飽和及不飽和 二鹼酸酐與(甲基)丙烯酸羥乙酯、(甲基)丙烯酸羥基丙 _、(甲基)丙烯酸羥丁酯、(甲基)丙烯酸聚乙二醇單酯、 (曱基)丙烯酸甘油二酯、(曱基)丙烯酸三羥甲基丙烷二 醋、(曱基)丙烯酸季戊四醇三酯、(曱基)丙烯酸二季戊 四醇五酯、苯基縮水甘油醚之(甲基)丙烯酸酯等1分子中 具有1個羥基之(甲基)丙烯酸酯衍生物類以等莫耳進行反 應所獲得之半酯類或是將飽和或不飽和二驗酸(例如琥珀 酉文、馬來酸、己二酸、苯二甲酸、四氫苯二甲酸、六氫笨 二甲酸、衣康酸、富馬酸等)與含有不飽和基之單縮水甘油 化合物 (例如(甲基)丙烯酸縮水甘油醋、 314839 13 1286268 ΟTime. J In the present invention, the (al) compound is prepared from the reaction of the milk H (a2) compound under the conditions of [(cycloamene) > (carboxylic acid equivalent number)]. Acid buck 100: u 100: 99. Preferably, 1 〇〇: 2 〇 to (10) 衣 95, more preferably 1 〇〇: 50 to ι〇η· on ... 丄,, 100 · 90. The above equivalent ratio is 100 : i to 10 0 : 9 9, the result is that the resin composition containing the polycarboxylic acid resin obtained by the woman who is the last value is easy to obtain salty " J % line degree, avatar, The resolution of the resolution balance is 314839 12 1286268. Preferably, (b) the mono-weilic acid (component (b)) containing an unsaturated group is described. The component (b) of the present invention may, for example, be acrylic acid or acrylic acid. Dimer, methacrylic acid, /?-styrylacrylic acid, 3-mercaptoacrylic acid, crotonic acid, α-cyano cinnamic acid, cinnamic acid; saturated or unsaturated dibasic anhydride and having 1 molecule a half vinegar of a reactant of a hydroxy (meth) acrylate derivative, a saturated or unsaturated diacid and a monoglycidyl compound containing an unsaturated group The half ester of the reactants, etc. Examples of the half ester include succinic anhydride, maleic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, and methyl hexahydrophthalic anhydride. , saturated and unsaturated dibasic anhydrides such as methyltetrahydrophthalic anhydride, itaconic anhydride, methylmethicic acid anhydride, and hydroxyethyl (meth)acrylate, hydroxypropyl (meth)acrylate , hydroxybutyl (meth) acrylate, polyethylene glycol mono(meth) acrylate, (meth) acrylate diglyceride, (mercapto) acrylic acid trimethylol propane diacetate, (mercapto) acrylic acid pentaerythritol a (meth) acrylate derivative having one hydroxyl group in one molecule such as a triester, a dipentaerythritol pentaerythritol (meth) acrylate or a (meth) acrylate such as a phenyl glycidyl ether, which is reacted in a molar ratio The obtained half esters may be saturated or unsaturated with acid (for example, amber, maleic acid, adipic acid, phthalic acid, tetrahydrophthalic acid, hexahydropicolinic acid, itaconic acid, rich Horse acid, etc.) and monoglycidyl compounds containing unsaturated groups (eg (meth)acrylic acid glycine vinegar, 314839 13 1286268 Ο

(6) 等)以等莫耳比進行反應所獲得之半酯類等之含有不飽和 基之單繞酸等。 成分(b)可單獨使用,亦可2種以上組合使用。 有關成分(a)與成分(b)之配合比例,成分(a)中之殘留 環氧基與成分(b)之竣酸之當量比通常為1 : 〇·5至丨:2, 較好為1: 0.8至1: i.25,更好為1: i。成分⑷中之殘留 環氧基與成分(b)之羧酸之當量比若為1 ·· 〇·5至丨·· 2,將 最終所獲得本聚羧酸樹脂作為黏合樹脂使用,作成感光随 樹脂組成物時,其感光度有變高之傾向而為佳。 於成分(a)與成分(b)之反應中,作為稀釋 3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙^冰用例如 酯、3-甲氧基丁基乙酸酯、乳酸乙酯、二乙二二纖劑乙酸 乙酸丁酯、3-甲氧基丙酸甲酯、2-庚顯J、乙義醇甲麵、 環己酮、乙基卡必醇乙酸酯、丁基卡必 甲基甲鲷、 甲醚乙酸酯等溶劑。 θ 6二醇 314839 14 1286268 又,於成分(a)與成分(b)之反應中, 為了促達反應,宜 使用觸媒。觸媒可列舉例如三乙胺、亨1 一 〜 一 下丞二f胺、f基三 乙基氯化叙、卞基三〒基漠化敍、节基三〒基蛾化鐘、三 苯基鱗化氫、二苯基録化氫、辛酸鉻、辛酸錯等,較好可 列舉T基三甲基溴化銨等。上述觸媒 、1更用里對於反應原 料混合物之合計量之質量份傘捕堂焱Λ, 貝里切羊通吊為0·1至10質量%,較 佳為0.2至5質量%。 於成分(a)與成分(b)之反庫中,盘 ;汉應T為了防止反應中之聚 合’宜使用抗聚合劑。抗聚合劑可列舉例如對苯二酴、甲 基對苯二紛、對苯二紛單甲鱗、兒茶紛、焦梧紛等。其使 用量對於反應原料混合物之合計量之質量份率較佳為〇別 至1¾篁%。反應溫度較好為6〇至bo ^ 王u ϋ C。又,反應時間 較佳為5至60小時。 經由將成分(c)與成分(d)進行反庫 ’ 4丁久應可獲得本聚羧酸樹 脂。 成分⑷可列舉具有2個以上叛基之緩酸肝等。具有2 個以上叛基之m酸st可列舉例如草酸、丙二酸、琥站酸、 戊一、己一酸、頻果酸、馬來酸、舍1_ ^ 1木a夂 田馬酸、衣康酸、檸 檬酸、酒石酸、苯二曱酸、四氫苯二甲酸、六氫苯二甲酸、 甲基甲橋四氫苯二甲酸、氣橋酸、甲基四氫苯二甲酸'甲 基六氫苯二甲酸、偏苯三酸、约 文g本四甲酸、二苯甲酮二羧 酸、二苯甲酮四羧酸、聯苯四鉍醅 — ’P +四緩^、聯笨二羧酸及聯苯醚 四羧酸等之羧酸酐,較好可列舉四氫笨二甲酸酐、二苯曱 酉同四羧酸二酐、聯笨四羧酸二酐。 314839 15 1286268 广、成刀(d)之使用量比為 (d)之酸酐單位之~坎刀(c)之經基與成分 平位之晏夏比,通常為! ·· 1 0.8 至 1 : 〇·2。士 γ 至 1 · 〇·1,較好為 1 ·· 成为(c)與成分(d)之使用旦 若為1 ··〗至】· Λ , 、)炙使用里比於上述之基準 1 · 〇·〗,則在顯像液之溶解性 傾向而為佳。 鮮注有,交為適度之 反應可經由在無溶劑或、 行反應之方生a , ^甲將成分(c)與成分(d)進 心 法進仃,而以在溶劑中進行者較佳。 溶劑可使用例如3_乙氧基丙酸甲醋、 酯、乙基溶纖劑乙酸酯、3 虱基丙酸乙 二乙1 一田 3甲乳基丁基乙酸醋、乳酸乙醋、 一醇一甲_、乙酸丁旨 璟己酮r且上 j甲虱基丙酸甲酯、2-庚酮、 衣己酮、乙基卡必醇乙酸酯、 Ψ mr ^ ^ ^ 土卡必酵乙酸酯、丙二醇 =乙:广該等溶劑可各自單獨使用或2種 H其使用量對於成分⑷】質量份較好在 上20質量份以下。 貝里伤以 將成分與成分(d)進行反應時 、日人》 文可要在溶劑中 心3即可,反應溫度通常在2(Γ(:以上2〇〇^以下。 所獲得本聚魏酸樹脂從反應混合物中離析,可用於 ^明之著色感光性樹脂組成物,亦可於離析後再精 用,亦可不將反應混合物進行離析,以原狀使用。 本聚叛酸樹脂其聚苯乙烯換算重量平均分子旦雨# 1000以上50,000以下,較好在L500以上2〇,〇〇〇以下。 上述之重量平均分子量若在L000以上 。 以下,則作 為黏合樹脂使用,作成感光性樹脂組成物時有解像性、暴 像邊緣及場所污染之各性能變良好之傾向,較佳。 314839 16 1286268 烯酸季戊四醇_、㈣浠酸季戊四醇自旨、二㈣酸二季戍 四醇醋' a丙稀酸二季戊四醇醋、三丙烯酸山梨糖醇醋、 四丙烯酸山梨糖醇醋、i丙烯酸山梨糖醇醋、六丙烯酸山 梨糖醇酯、三(丙烯醯氧基乙基)聚異氰酸醋、聚醋丙浠酸 酯低聚物等。 甲基丙稀酸西旨可列舉例如四甲二醇二甲基丙稀酸g旨、 乙二醇二甲基丙烯酸醋、新戊二醇二甲基丙烯酸醋、三 f 以烯酸s甲醇乙院三甲基丙稀酸醋、 乙二醇二甲基丙烯酸酯、Μ —丁二醇二甲基丙烯酸酯、己 H基丙烯酸酷、季戊四醇:f基丙烯酸§旨、季戊四 醇三甲基丙烯酸酯、季戊四醇四甲基丙烯酸酯、二季戊四 醇二甲基丙烯酸醋、二季戊四醇六甲基丙稀酸醋、山梨糖 醇三甲基丙烯酸酯、山梨糖醇四甲基丙烯酸酯、雙[對·〇_ 甲基丙烯氧基-2-羥基丙氧基)苯基]二甲基甲烷、雙[對·(甲 基丙稀氧基乙氧基)苯基]二甲基甲烧等。 衣康酸酯可列舉例如乙二醇二衣康酸酯、丙二醇二衣 康酸s旨、μ·丁二醇:衣康酸醋' Μ_τ二醇二衣康酸醋、 四甲一醇二衣康酸酯、季戊四醇二衣康酸酯、山梨糖醇四 衣康酸酯等。 丁烯酸酯可列舉例如乙二醇二丁烯酸酯、四甲二醇二 丁烯酸酯、季戊四醇二丁烯酸酯、山梨糖醇四_二丁 等。 兴丁烯酸酯可列舉例如乙二醇二異丁烯酸酯、季戊四 醇一異丁稀酸酯、山梨糖醇四異丁稀酸酯等。 19 314839 I286268 馬來酸醋可列舉例如乙二醇二馬來酸醋、彡乙二醇二 、、、來酸S旨、季戊四醇二黾氺 ^ ^ 一馬來駄S日、山梨糖醇四馬來酸酯等。 亦可列舉該等醋單體之混合物。 脂肪族多價胺化合物盥 物〇不飽和羧酸之醯胺單體之具體 列可列舉例如甲樓W胺、f撐雙_f基丙稀酿胺、 二六甲樓雙-丙稀酿胺、丨,6_六甲撑雙-甲基丙稀酿胺、二 :二胺三丙稀醯胺、苯二甲基雙丙稀酿胺、苯二 T基丙烯醯胺等。 :烯性不飽和化合物亦可為在分子中具有2個以上異 基之聚異氰酸酷化合物中,對通式⑺所示之乙稀單 成所得之乙烯尿燒化合物(特公昭你4㈣號公報) H2C L Γ°’Τι’(2) (式中,汉丨。及R"各自獨立為氫原子或甲基) 又,亦可為尿烷丙烯酸酯類(特開昭5 1-37193號公 報)、聚酿丙烯酸醋類(特開昭48_6號公報、特公昭 49_43 191 號公報、特公昭 JU490唬公報)、光硬化性單 體[日本黏著協會雜誌、第2 〇 | 弟20卷第7號第3〇〇頁至第3〇8 頁(1984年)]等。 έ 24乙稀性不飽和化合物之使用㈣於本&光性樹脂 組成物之固體成分之質量百分率通常纟5%以上5〇%以 下,較好在10%以上40% u 丁 7 π u 下。乙稀性不飽和化合物之使 用里在上述基準中’若在5%以上5〇%以下 得感度、顯像性、解像性平 十衡之傾向而佳。又,本感光性 314839 20 1286268 樹脂組成物之固體成分為去除溶劑成分的總合。 接著,對於[c]光聚合引發劑加以說明。光聚合引發劑 可使用乙醯苯系光聚合引發劑、苯偶因系光聚合引發劑、 二苯甲酮系光聚合引發劑、噻噸酮系光聚合引發劑、三嗓 系光聚合引發劑、噁二唾系光聚合引發劑等。 乙醯苯系光聚合引發劑可列舉例如二乙氧基乙醯苯、 2-羥基-2-甲基-1-苯基丙烧-1-酮、苄基二甲基酮縮醇、2_ 羥基-2-曱基-卜[4-(2-羥基乙氧基)苯基]丙烷_卜酮、丨_羥基 環己基苯基甲酮、2-甲基-2-嗎啉基曱基硫苯基)丙烷 -1-酮、2_苄基-2-二曱胺基-1-(4-嗎啉基苯基)丁烷酮、2_ 羥基-2-曱基-1-[4-(1-曱基乙烯基)苯基]丙烷_丨_酮之低聚物 等。 苯偶因糸光χΚ合引發劑可列舉例如苯偶因、苯偶因甲 _、苯偶因乙醚、苯偶因異丙醚、苯偶因異丁醚等。 二苯曱酮系光聚合引發劑可列舉例如二苯甲酮、鄰一 苯酿基苯甲酸甲酿、4-苯基二苯甲酮、‘苯醯基_4,_甲基二 苯硫、3,3’,4,4’-四(第三-丁基過氧羰基)二苯甲酮、2,4,6_ 三曱基二苯甲酮等。 噻噸酮系光聚合引發劑可列舉例如2_異丙基噻噸酮、 4-異丙基嚷”頓闕、2,4-二乙基噻噸蜩、2,心二氯噻噸酮、卜 氯-4-丙氧基噻噸_等。 三嗪系光聚合引發劑可列舉例如2,4_雙(三氯甲基)_6_ 甲氧基苯基)-1,3,5-三嗪、2,4-雙(三氯甲基)冬(4_甲氧基 奈基)-1,3,5-三嗪、2,4-雙(三氯甲基卜6_胡椒基],3,5-三 314839 21 1286268 嗪、2,4-雙(三氯曱基)_6-(4-甲氧基苯乙烯基)-;1,3,5_三嗪、 2,4-雙(三氣甲基)-6_[2_(5_甲基呋喃基)乙烯基]4,),^三 嗪 2,4-雙(二氣甲基)_6_[2-(呋喃-2-基)乙稀基]_i,3,5 -三 嗪、2,4-雙(三氯曱基)-6_[2_(4_二乙胺基_2_甲基苯基)乙烯 基]-I,3,5-三嗪、2,4_雙(三氣甲基)_6·[2-(3,4_二甲氧基苯基) 乙烯基]-1,3,5-三嗪等。 惡一唾糸光聚合引發劑可列舉例如5 -(對-甲氧基苯 基)-2-三氯甲基噁二唑、5_(對-丁氧基苯乙烯基)_2_三氯甲 基噁二唑等。 其他之光聚合引發劑亦可使用2,4,6-三甲基苯醯基二 苯膦氧化物、2,2、雙(鄰_氯苯基 二咪唑、10-丁基-2-氣吖啶酮、2_乙基蒽醌、聯苯醯、9,1〇_ 雙戊二烯基鈦-二(五氟苯 非醌、樟腦酉昆、苯酸甲酸甲g旨、 基)寺欽細化合物等。 其中’以二嗪系光聚合引發劑及σ惡二唾系光聚合引發 劑較佳。 該等光聚合引發劑可各自單獨使用,亦可2種以上組 合使用。 光聚合引發劑之使用量對於本聚羧酸樹脂及必要時 所添加之其他黏合聚合物合計1〇〇質量份通常在3質量份 以上60質量份以下, 更好在1 0質詈份以 以下,較好在5質量份以上4〇質量份以下,(6) A mono-acid or the like containing an unsaturated group such as a half ester obtained by a reaction at a molar ratio. The component (b) may be used singly or in combination of two or more. The ratio of the ratio of the component (a) to the component (b), the equivalent ratio of the residual epoxy group in the component (a) to the ceric acid of the component (b) is usually 1: 〇·5 to 丨: 2, preferably 1: 0.8 to 1: i.25, more preferably 1: i. The equivalent ratio of the residual epoxy group in the component (4) to the carboxylic acid of the component (b) is 1 ····5 to 丨·· 2, and the finally obtained polycarboxylic acid resin is used as a binder resin to prepare a photosensitive film. In the case of a resin composition, the sensitivity tends to be high. In the reaction of the component (a) with the component (b), as a dilution of methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl acetate such as ester, 3-methoxybutyl Acetate, ethyl lactate, diethyldiamine, butyl acetate, methyl 3-methoxypropionate, 2-glysen J, ethyl ketone, cyclohexanone, ethyl carbitol Solvents such as acetate, butyl carbitol, and methyl ether acetate. θ 6 diol 314839 14 1286268 Further, in the reaction between the component (a) and the component (b), a catalyst is preferably used in order to promote the reaction. The catalyst may, for example, be triethylamine, hen 1 ~ 丞 丞 f f 、, f-group triethyl chlorinated sulphate, fluorenyl sulphide sulphate, sulphate triterpene moth clock, triphenyl scale Hydrogen, diphenyl-recording hydrogen, chromium octoate, octanoic acid, etc., preferably T-based trimethylammonium bromide. The above catalyst, 1 is more than the total mass of the reaction raw material mixture, and the Belize sheep suspension is from 0.1 to 10% by mass, preferably from 0.2 to 5% by mass. In the anti-reservoir of the component (a) and the component (b), a disk; Han Ying T is preferably used in order to prevent polymerization in the reaction. Examples of the anti-polymerization agent include, for example, p-benzoquinone, methyl-p-benzoquinone, p-benzoquinone-containing squama, catechu, and coke. The mass fraction of the total amount of the reaction raw material mixture is preferably from 1 to 13% by weight. The reaction temperature is preferably from 6 〇 to bo ^ wang u ϋ C. Further, the reaction time is preferably from 5 to 60 hours. The present polycarboxylic acid resin should be obtained by subjecting the component (c) to the component (d). The component (4) includes a solubilized liver having two or more rebel groups. The m acid st having two or more rebellious groups may, for example, be oxalic acid, malonic acid, succinic acid, pentacene, hexanoic acid, frequency acid, maleic acid, 1_^1 wood a 夂田马酸, clothing Kang acid, citric acid, tartaric acid, benzoic acid, tetrahydrophthalic acid, hexahydrophthalic acid, methylmethic acid tetrahydrophthalic acid, gas bridge acid, methyl tetrahydrophthalic acid 'methyl six Hydrogen phthalic acid, trimellitic acid, hexan methic acid, benzoic acid, benzophenone dicarboxylic acid, benzophenone tetracarboxylic acid, biphenyl tetraruthenium - 'P + tetrasole, biphenyl dicarboxylate Examples of the carboxylic acid anhydride such as an acid or a diphenyl ether tetracarboxylic acid include tetrahydrophthalic anhydride, diphenylphosphonium tetracarboxylic dianhydride, and biphenyltetracarboxylic dianhydride. 314839 15 1286268 The ratio of the amount of the knives to the knives (d) is the unit of the anhydride of (d). The basis and composition of the knives (c). ·· 1 0.8 to 1 : 〇·2.士至1 · 〇·1, preferably 1 ·· (c) and the use of component (d) if it is 1 ··〗 to 】· Λ , , ) 炙 Use the above benchmark 1 〇·〗, it is better in the solubility of the developer liquid. In the case of a fresh injection, the reaction may be carried out in a solvent-free or reaction-free manner, and the component (c) and the component (d) may be introduced into the solvent in a solvent-free manner. . As the solvent, for example, methyl 3-acetoxypropionate, ethyl ester, ethyl cellosolve acetate, ethyl thioglycolate, ethylene glycol acetoacetate, lactic acid, vinegar, and Alcohol-methyl ketone, butyl ketone ketone ketone ketone and methyl methionyl propionate, 2-heptanone, ketone, ethyl carbitol acetate, Ψ mr ^ ^ ^ Acetate, propylene glycol = B: These solvents may be used singly or in combination of two kinds of H, and the amount thereof is preferably at least 20 parts by mass or less based on the component (4). When the Berry injury reacts with the component (d), the Japanese may be in the solvent center 3, and the reaction temperature is usually 2 (Γ(: above 2〇〇^). The obtained polyweilic acid The resin is isolated from the reaction mixture and can be used for the coloring photosensitive resin composition, or can be used after isolation, or can be used as it is without separating the reaction mixture. The average molecular weight rain #1000 or more is 50,000 or less, preferably L500 or more and 2 Å or less. The above-mentioned weight average molecular weight is at least L000. Hereinafter, it is used as a binder resin to provide a photosensitive resin composition. The tendency of the image, the edge of the image and the pollution of the site to become good is better. 314839 16 1286268 Pentaerythritol enoate _, (4) pentaerythritol citrate, diquaternic acid diquaternary vinegar vinegar ' a propylene dipentaerythritol Vinegar, sorbitan triacetate, sorbitol tetraacrylate, i sorbitol sorbitol, sorbitol hexaacrylate, tris(propylene oxyethyl) polyisocyanate, poly acetonitrile An acid ester oligomer or the like. Examples of the methyl methacrylate acid include tetramethyl diol dimethyl acrylate acid glycol, ethylene glycol dimethacrylate vinegar, neopentyl glycol dimethacrylate vinegar, and the like. f with olefinic acid s methanol, ternary trimethyl acrylate vinegar, ethylene glycol dimethacrylate, Μ-butylene glycol dimethacrylate, hexyl methacrylate, pentaerythritol: f-based acrylic acid § Pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol dimethacrylate vinegar, dipentaerythritol hexamethyl acrylate vinegar, sorbitol trimethacrylate, sorbitol tetramethacrylate, Bis[p-·〇_methacryloxy-2-hydroxypropoxy)phenyl]dimethylmethane, bis[p-(methylpropoxyethoxy)phenyl]dimethyl ketone Examples of the itaconate include, for example, ethylene glycol pentoxide, propylene glycol, itaconic acid, μ·butanediol: itaconic acid vinegar, Μττdiol, diaconic acid vinegar, tetramethyl alcohol II itaconate, pentaerythritol diitaconate, sorbitol tetraconate, etc. The butenoate can be exemplified by, for example, ethylene glycol Butenoate, tetramethyl diol methacrylate, pentaerythritol methacrylate, sorbitol tetra-dibutyl, etc. Examples of the butyl crotonate include ethylene glycol dimethacrylate and pentaerythritol. Butyric acid ester, sorbitol tetraisobutyl acrylate, etc. 19 314839 I286268 Maleic acid vinegar can be exemplified by, for example, ethylene glycol dimaleic acid vinegar, hydrazine ethylene glycol dihydrate, acid acid S, pentaerythritol II黾氺^ ^ A malay 駄S day, sorbitol tetramaleate, etc. A mixture of such acetal monomers can also be cited. Aliphatic polyvalent amine compounds 盥 〇 醯 单体 单体 monomer of unsaturated carboxylic acid Specific examples thereof include, for example, A-line W amine, F-supported bis-f-propyl acrylamide, hexa-Apricot bis-acrylamide, hydrazine, 6-hexamethylene bis-methyl propyl amide, and two: Diamine tripropylene amide, benzodimethyl propylene amine, benzene diphenyl amide, and the like. The ethylenically unsaturated compound may be an ethylene urethane compound obtained by the simple form of ethylene represented by the formula (7) in a polyisocyanate compound having two or more different groups in the molecule (Special Gong Zhao 4 (4) Bulletin) H2C L Γ°'Τι'(2) (In the formula, 丨 丨 and R" each independently is a hydrogen atom or a methyl group) Also, it may be a urethane acrylate (Japanese Unexamined Patent Publication No. Hei No. Hei No. Hei No. 5-37193)公报 ) 、 、 、 、 丙烯酸 丙烯酸 丙烯酸 丙烯酸 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 48 No. 3 to page 3 (8) (1984)]. έ 24 Use of ethylenically unsaturated compound (IV) The mass percentage of the solid component of the present & optical resin composition is usually 5% or more and 5% or less, preferably 10% or more and 40% under the condition of 7 π u . In the above-mentioned standard, the use of the ethylenically unsaturated compound is preferably in the range of 5% or more and 5% by weight or less in terms of sensitivity, development, and resolution. Further, the photosensitive material 314839 20 1286268 The solid content of the resin composition is the total of the solvent-removing components. Next, the [c] photopolymerization initiator will be described. As the photopolymerization initiator, an acetonyl photopolymerization initiator, a benzoin photopolymerization initiator, a benzophenone photopolymerization initiator, a thioxanthone photopolymerization initiator, or a triterpene photopolymerization initiator can be used. , a dimorphic photopolymerization initiator, and the like. Examples of the ethyl benzene-based photopolymerization initiator include diethoxyethyl benzene, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyl dimethyl ketal, and 2-hydroxyl group. -2-mercapto-bu [4-(2-hydroxyethoxy)phenyl]propane- ketone, hydrazine-hydroxycyclohexyl phenyl ketone, 2-methyl-2-morpholinyl fluorenyl thiobenzene Propane-1-one, 2-benzyl-2-didecylamino-1-(4-morpholinylphenyl)butanone, 2-hydroxy-2-indenyl-1-[4-(1 - anthracene vinyl) phenyl] propane _ ketone ketone oligomer and the like. Examples of the benzoin photoinitiator include benzoin, benzoin A, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether and the like. The benzophenone-based photopolymerization initiator may, for example, be benzophenone, o-phenyl-bromide-benzoic acid, 4-phenylbenzophenone, 'benzoyl- 4,-methyldiphenylsulfide, 3,3',4,4'-tetrakis(t-butylperoxycarbonyl)benzophenone, 2,4,6-tridecylbenzophenone, and the like. Examples of the thioxanthone-based photopolymerization initiator include 2-isopropyl thioxanthone, 4-isopropyl hydrazine, 2,4-diethyl thioxanthene, and 2, dichlorothioxanthone. Chloro-4-propoxythioxan et al. Triazine-based photopolymerization initiator may, for example, be 2,4-bis(trichloromethyl)-6-methoxyphenyl)-1,3,5-triazine , 2,4-bis(trichloromethyl) winter (4-methoxymethyl)-1,3,5-triazine, 2,4-bis(trichloromethylbu 6_piperidinyl), 3 ,5-三314839 21 1286268 azine, 2,4-bis(trichloroindenyl)_6-(4-methoxystyryl)-; 1,3,5-triazine, 2,4-double (three Gas methyl)-6_[2_(5-methylfuranyl)vinyl]4,), triazine 2,4-bis(dimethyl)_6_[2-(furan-2-yl)ethylene Base]_i,3,5-triazine, 2,4-bis(trichloroindolyl)-6_[2_(4-diethylamino-2-methylphenyl)vinyl]-I,3,5 - triazine, 2,4_bis(trimethylmethyl)_6·[2-(3,4-dimethoxyphenyl)vinyl]-1,3,5-triazine, etc. The photopolymerization initiator may, for example, be 5-(p-methoxyphenyl)-2-trichloromethyloxadiazole or 5-(p-butoxystyryl)_2-trichloromethyloxadiazole. Other photopolymerization initiators may also use 2,4,6-trimethylphenylnonyldiphenylphosphine oxide, 2,2, bis(o-chlorophenyldiimidazole, 10-butyl-2-indole) Pyridone, 2_ethyl hydrazine, biphenyl hydrazine, 9,1 〇 _ dipentadienyl titanium-di (pentafluorobenzene non-fluorene, camphorquinone, benzoic acid formic acid, base) A compound such as a diazine-based photopolymerization initiator and a sigma-bis-salt photopolymerization initiator are preferred. The photopolymerization initiators may be used singly or in combination of two or more kinds thereof. The amount of use of the polycarboxylic acid resin and other binder polymers added as necessary is usually 3 parts by mass or more and 60 parts by mass or less, more preferably 10 parts by mass or less, more preferably 5 parts by mass or less. Above 4 parts by mass,

314839 22 1286268 層之強度亦有不易降低之傾向,較佳。 本感光性樹脂組成物亦可含有光聚合引發助劑。 合引發助劑係用於促進光聚合反應。 來 光聚合引發助劑可列舉例如三乙醇胺、 ^ τ卷—乙醇 胺、三/、丙醇胺、4_二甲胺基苯甲酸曱酯、4_二甲胺美— 曱酸乙醋、4_二甲胺基苯甲酸:本 〇 r A P ^ ^ « 一 τ月女基苯甲酸 2_乙基己6曰、本甲酸2-二甲胺基乙醋、N,N_二甲基對甲茨 胺、4,4 -雙(二甲胺基)二苯甲_(通稱為米希勒 η 雙(二胺基)二苯甲酮、9,10_二曱氧基μ、2_ \。: 二甲乳基恩、9,1〇-二乙氧基葱、2_乙基_9,1〇_二乙氧美菌 等。該等光聚合引發助劑可各自單獨使用,亦可 ^ 組合使用。使用該等光繁人 上 聚合引發劑!莫耳通常在〇 便用里對於先 , υΐ萬耳以上10莫耳以下。 接著’對於[D]溶劑加以 月。本感效性樹脂组成物可 使用之溶劑可列舉乙酸乙 f月曰,,且成物了 乙酉夂正丁酯、乙酸異丁酯、 甲酸戊S曰、乙酸異戊酯、乙 匕、丁舻r狀 ,、丁酉日、丙酸丁酯、丁酸異 丙g曰、丁馱乙S曰、丁酸丁酷、 坑S曰類、乳酸甲酯、乳酸乙 g旨、^基乙酸甲g旨、麵其 .w 土 次乙酯、羥基乙酸丁酯、甲氧 基乙酸甲酯、甲氧基乙酸 虱 ,^ Ψ ^ ^ -曰、甲氧基乙酸丁酯、乙氧基 乙&L甲-乙虱基乙酸乙酯、〜 分r妒、3田#甘 里基丙酸甲酯、3-羥基丙 酸乙i曰3 **甲乳基丙酸甲西 滅田狀, -曰、3 ·甲氧基丙酸乙酯、3 -乙氧 基丙I甲-曰、3 -乙氧基丙酸 S曰、2-羥基丙酸甲酯、2-羥 基丙I乙S曰、2-羥基丙酸丙 分 ·曰、2-甲氧基丙酸甲酯、2-甲 氧基丙I乙酯、2 -甲氧美兩 基丙I丙酯、2-乙氧基丙酸甲酯、 314839 23 1286268 2 -乙氧基丙酸乙酯、2 -經基-2-甲基丙酸曱酯、2 -經基甲 基丙酸乙酯、2-曱氧基-2-甲基丙酸甲酯、2-乙氧基-2-甲基 丙酸乙酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸丙酯、乙驢 乙酸甲酯、乙醯乙酸乙酯、2-羰基丁酸甲酯、2-羰基丁峻 乙酯、2-甲氧基丁基乙酸酯、3-曱氧基丁基乙酸酯、4-曱 氧基丁基乙酸酯、2-甲基-3-甲氧基丁基乙酸酯、3-甲基、 甲氧基丁基乙酸酯、3 -乙基-3-甲氧基丁基乙酸酯、2 -乙氣 基丁基乙酸_、4 -乙氧基丁基乙酸g旨、4 -丙氧基丁基乙駿 酷、2-甲氧基戊基乙酸酯、3 -甲氧基戊基乙酸酯、4-甲氣 基戊基乙酸酯、2-甲基-3-曱氧基戊基乙酸酯、3-曱基 曱氧基戊基乙酸酯、3 -曱基-4-曱氧基戊基乙酸酯、4-甲基 -4 -曱氧基戊基乙酸酯等酯類;二乙二醇二甲醚、四氫〇夫 喃、乙二醇單甲醚、乙二醇單乙醚、曱基溶纖素乙酸酯、 乙基溶纖素乙酸酯、二乙二醇單甲醚、二乙二醇單乙_、 一乙二醇單丁醚、丙二醇甲醚乙酸酯、丙二醇乙醚乙酸 _、丙二醇丙醚乙酸酯等醚類;曱基乙基甲酮、環己g同、 2-庚酮、3·庚酮等酮類;甲苯、二甲苯、三甲苯等芳族蛵 類等。 二 較好可列舉3-乙氧基丙酸曱酯、乙氧基丙酸乙_、 乙基溶纖素乙酸酯、3-甲氧基丁基乙酸酯、乳酸乙_、一 一 · 乙二醇二曱醚、乙酸丁酯、3_甲氧基丙酸曱酯、2_庚鲷、 環己酮、乙基卡必醇乙酸酯、丁基卡必醇乙酸酯、丙二醇 甲醚乙酸酯等。 該等溶劑可各自單獨使用,亦可2種以混合使用。溶 314839 24 1286268 背丨之使用塁對於本感光性樹脂組成物全體固體成分濃 度’於質量百分率通常成為2%以上50%以下,較好在5 %以上曰5〇%以下,更好在1〇%以上45%以下之量。溶劑 之使用1於固體成分之濃度若在2%以上5〇%以下,則有 塗膜膜厚面内均一性變好之傾向而為佳。 士本感光性樹脂組成物作為著色感光性樹脂組成物使 用時,本感光性樹脂組成物更可含有[E]顏料。顏料可為無 機顏料,亦可為有機顏料。 Μ 無機顏料可列舉例如金屬氧化物、金屬配位化合物等 金屬化合物。金屬可列舉鐵、鈷、鋁、鎘、鉛、鋼、鈦、 鎂、鉻、鋅、銻等。金屬氧化物、金屬配位化合物可為該 等之金屬單獨氧化物、配位化合物,亦可為由2種以上該 等金屬組成之複合氧化物、配位化合物。 有機顏料可列舉根據顏色指標(Colour Index)[染料及 顏色協 έ (The Society of Dyers and Colourists)出版]顏料 (Pigment)所分類之化合物。 ' 該等有機顏料可列舉例如C.I·顏料·黃色-i、Cj顏 料·更色-3、C.I·顏料·黃色_12、c.i.顏料·黃色_13、c j 顏料·黃色-I4、c.i.顏料·黃色_丨5、c丄顏料·黃色·16、 C.I·顏料·黃色_17、c丄顏料·黃色-2〇、c.i·顏料·黃色_ 么4、C.I·顏料·黃色·31、^•顏料·黃色_55、αι·顏料· 頁色·60、C.I.顏料·黃色_61、c j顏料·黃色-65、c」顏 料戸、色_71、C.I·顏料·黃色-73、C.I.顏料·黃色-74、c I 顏料·黃色-81、C.I·顏料·黃色_83、•顏料·黃色%、 25 334839 1286268 C.I·顏料·黃色-95、CJ.顏料·黃色-97、C.I.顏料·黃色-98、C.I.顏料·黃色-100、C.I.顏料·黃色-101、C.I.顏料· 黃色-104、C.I·顏料·黃色-106、C.I·顏料·黃色-108、C.I. 顏料·黃色-l〇9、C.I.顏料·黃色-110、C.I.顏料·黃色-113、 C.I·顏料·黃色-114、C.I·顏料·黃色·116、C.I.顏料·黃 色-117、C.I.顏料·黃色-119、C.I·顏料·黃色-120、C.I· 顏料·黃色-126、C.I·顏料·黃色-127、C.I.顏料·黃色-128、 C.I·顏料·黃色-129、C.I.顏料·黃色-138、C.I.顏料·黃 色-139、C.I·顏料·黃色-150、C.I.顏料·黃色-151、C.I· 顏料·黃色-152、C.I.顏料·黃色-153、C.I.顏料·黃色-154、 C.I.顏料·黃色-155、C丄顏料·黃色-156、C.I.顏料·黃 色-166、C.I.顏料·黃色-168、C.I·顏料·黃色-175等黃色 有機顏料, C.I.顏料·橙色1、C.I.顏料·橙色5、C.I.顏料·橙色13、 C.I·顏料·橙色14、C.I.顏料·橙色16、C.I.顏料·橙色17、 C.I.顏料·橙色24、C.I.顏料·橙色34、C.I.顏料·橙色36、 C.I.顏料·橙色38、C.I.顏料·橙色40、C.I.顏料·橙色43、 C.I.顏料·橙色46、C.I·顏料·橙色49、C.I.顏料·橙色51、 C.I·顏料·橙色6卜C.I.顏料·橙色63、C.I.顏料·橙色64、 C.I.顏料·橙色71、C.I.顏料·橙色73等橙色有機顏料, C.I.顏料·紫色1、C.I.顏料·紫色19、C.I.顏料·紫色23、 C.I·顏料·紫色29、C.I.顏料·紫色32、C.I.顏料·紫色36、 C.I.顏料·紫色38等紫色有機顏料, C.I·顏料·紅色1、C.I.顏料·紅色2、C.I.顏料·紅色3、 26 314839 1286268 C.I·顏料·紅色4、C.I·顏料·紅色5、C.I.顏料·紅色6、 C.I.顏料·紅色7、C.I.顏料·紅色8、C.I.顏料·紅色9、 C.I·顏料·紅色10、C.I.顏料·紅色H、C.I.顏料·紅色12、 C.I.顏料·紅色14、C.I.顏料·紅色15、C.I.顏料·紅色16、 C.I.顏料·紅色17、C.I.顏料·紅色18、C.I.顏料·紅色19、 C.I.顏料·紅色21、C.I.顏料·紅色22、C.I.顏料·紅色23、 C.I.顏料·紅色30、C.I.顏料·紅色3卜C丄顏料·紅色32、 C.I.顏料·紅色37、C.I.顏料·紅色38、C.I.顏料·紅色40、 C.I·顏料·紅色41、C.I.顏料·紅色42、C.I·顏料·紅色48 : 1、C.I·顏料·紅色48 : 2、C.I.顏料·紅色48 : 3、C.I.顏 料·紅色48 : 4、C.I·顏料·紅色49 : 1、C.I.顏料·紅色 49 : 2、C.I·顏料·紅色 50 : 1、C.I·顏料.紅色 52 : 1、C.I· 顏料·紅色53 : 1、C.I·顏料·紅色57、C.I.顏料·紅色57 ·· 1、C.I.顏料·紅色58 : 2、C.I.顏料·紅色58 : 4、C.I.顏 料·紅色6 0 : 1、C · I ·顏料·紅色6 3 : 1、C · I.顏料·紅色 63 ·· 2、C.I·顏料·紅色 64 ·· 1、C.I·顏料·紅色 81 : 1、C.I. 顏料·紅色83、C.I.顏料·紅色88、C.I.顏料·紅色90 : 1、 C.I.顏料·紅色97、C.I.顏料·紅色101、C.I.顏料·紅色 102、C.I·顏料·紅色104、C.I.顏料·紅色105、C.I.顏料· 紅色106、C.I.顏料·紅色108、C.I.顏料·紅色1 12、C.I· 顏料·紅色113、C.I.顏料·紅色114、C.I.顏料·紅色122、 C.I·顏料·紅色123、C.I.顏料·紅色144、C.I.顏料·紅色 146、C.I.顏料·紅色149、C.I.顏料·紅色150、C.I.顏料· 紅色1 5 1、C. I ·顏料·紅色1 6 6、C · I ·顏料·紅色1 6 8、C. I. 27 314839 1286268 顏料.紅色17〇、c.i·顏料.紅色 C · I ·顏料· έ色 、、 、C · I ·顏料·紅色1 7 2、314839 22 1286268 The strength of the layer also tends to be less likely to decrease, preferably. The photosensitive resin composition may further contain a photopolymerization initiation aid. The initiator is used to promote photopolymerization. The photopolymerization initiation aid may, for example, be triethanolamine, ^τ roll-ethanolamine, tris, propanolamine, 4-dimethylaminobenzoate, 4-dimethylamine-acetic acid ethyl acetate, 4_ Dimethylaminobenzoic acid: Ben 〇r AP ^ ^ « A tidal benzoic acid 2-ethylhexyl hydrazine, 2-dimethylaminoethyl acetate, N,N-dimethyl-p-methyl Amine, 4,4-bis(dimethylamino)benzhydryl- (commonly known as Michelle η bis(diamino)benzophenone, 9,10-dimethoxyl μ, 2_ \.: two A milk base, 9,1 〇-diethoxy onion, 2_ethyl _9, 1 〇 _ diethoxy saccharide, etc. These photopolymerization initiation auxiliaries can be used individually or in combination Use these kinds of photopolymerization initiators! Moore is usually used in sputum for the first time, more than 10 mils per 10,000 ounces. Then 'for the [D] solvent for months. The sensible resin composition can be The solvent to be used may be exemplified by ethyl acetate, and the product is butyl butyl acrylate, isobutyl acetate, pentane sulphate, isoamyl acetate, acetamidine, butyl sulfonium, butyl sulfonium, and c. Butyrate, isopropyl gluene butyrate S曰, Butyric acid butyrate, pit S曰, methyl lactate, lactic acid, g, ethyl acetate, g., ethyl, butyl hydroxyacetate, methyl methoxyacetate, Barium methoxyacetate, ^ Ψ ^ ^ - 曰, butyl methoxyacetate, ethyl ethoxy b & L-ethyl acetoxyacetate, ~ 妒 r妒, 3 field # 甘里基丙甲甲Ester, 3-hydroxypropionic acid, ethyl i 曰 3 ** methyluryl propionate, methane chloride, - 曰, 3 · methoxy propionate ethyl ester, 3-ethoxypropyl I methyl hydrazine, 3-B Sodium oxypropionate, methyl 2-hydroxypropionate, 2-hydroxypropane I oxime, 2-hydroxypropionic acid propylene hydride, methyl 2-methoxypropionate, 2-methoxy propyl I ethyl ester, 2-methoxymethanil propanyl ester, methyl 2-ethoxypropionate, 314839 23 1286268 2-ethyl ethoxypropionate, 2-hydroxy-2-methylpropionic acid Anthracene ester, ethyl 2-methoxymethylpropionate, methyl 2-methoxy-2-methylpropionate, ethyl 2-ethoxy-2-methylpropionate, methyl pyruvate, acetone Ethyl acetate, propyl pyruvate, methyl acetate, ethyl acetate, methyl 2-carbonylbutanoate, 2-carbonylbutyl chloride, 2-methoxybutyl acetate, 3-decyloxybutyl acetate, 4-decyloxybutyl acetate, 2-methyl-3-methoxybutyl acetate, 3-methyl, methoxybutylacetic acid Ester, 3-ethyl-3-methoxybutyl acetate, 2-ethane butyl acetate, 4-ethoxybutyl acetate, 4-propoxy butyl thiopurine 2-methoxypentyl acetate, 3-methoxypentyl acetate, 4-methylpentyl acetate, 2-methyl-3-decyloxypentyl acetate, 3 - an ester such as mercaptomethoxy pentyl acetate, 3-mercapto-4-indolyl pentyl acetate, 4-methyl-4-decyloxypentyl acetate; Alcohol dimethyl ether, tetrahydrofurfuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, decyl fibrin acetate, ethyl fibrin acetate, diethylene glycol monomethyl ether, Ethers such as diethylene glycol monoethyl _, monoethylene glycol monobutyl ether, propylene glycol methyl ether acetate, propylene glycol diethyl ether acetate _, propylene glycol propyl ether acetate; mercapto ethyl ketone, cyclohexyl g, Ketones such as 2-heptanone and 3·heptanone; aromatic anthracenes such as toluene, xylene and trimethylbenzene. 2. Preferably, decyl 3-ethoxypropionate, ethyl ethoxypropionate, ethyl cellosolve acetate, 3-methoxybutyl acetate, lactate B, and one-fif. Ethylene glycol dioxime ether, butyl acetate, decyl 3-methoxypropionate, 2_g, Cyclohexanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol Ether acetate and the like. These solvents may be used singly or in combination of two or more. 314 314839 24 1286268 The use of the backing 塁 The total solid content concentration of the photosensitive resin composition is usually 2% or more and 50% or less, preferably 5% or more 曰 5〇% or less, more preferably 1 质量. % or more and 45% or less. When the concentration of the solid component is 2% or more and 5% or less, the uniformity of the thickness of the coating film is preferably improved. When the composition of the photosensitive resin is used as a coloring photosensitive resin composition, the photosensitive resin composition may further contain an [E] pigment. The pigment may be an inorganic pigment or an organic pigment. Μ The inorganic pigment may, for example, be a metal compound such as a metal oxide or a metal complex. Examples of the metal include iron, cobalt, aluminum, cadmium, lead, steel, titanium, magnesium, chromium, zinc, antimony, and the like. The metal oxide or the metal complex may be a metal oxide or a complex compound of these metals, or may be a composite oxide or a complex compound composed of two or more of these metals. The organic pigment may be exemplified by a pigment classified according to the Colour Index [published by The Society of Dyers and Colourists] Pigment. The organic pigments include, for example, CI·pigment·yellow-i, Cj pigment·small color-3, CI·pigment·yellow_12, ci pigment·yellow_13, cj pigment·yellow-I4, ci pigment·yellow _丨5, c丄 pigment·yellow·16, CI·pigment·yellow _17, c丄 pigment·yellow-2〇, ci·pigment·yellow _ 4, CI·pigment·yellow·31,^•pigment· Yellow_55, αι·pigment·page color·60, CI pigment·yellow_61, cj pigment·yellow-65, c” pigment 戸, color _71, CI·pigment·yellow-73, CI pigment·yellow-74 , c I pigment · yellow - 81, CI · pigment · yellow _83, • pigment · yellow %, 25 334839 1286268 CI · pigment · yellow - 95, CJ. pigment · yellow - 97, CI pigment · yellow - 98, CI Pigment · Yellow - 100, CI Pigment · Yellow - 101, CI Pigment · Yellow - 104, CI · Pigment · Yellow - 106, CI · Pigment · Yellow - 108, CI Pigment · Yellow - l〇9, CI Pigment · Yellow - 110, CI Pigment·Yellow-113, CI·Pigment·Yellow-114, CI·Pigment·Yellow·116, CI Pigment·Yellow-117, CI Pigment·Yellow-119, CI·Pigment·Yellow-120, CI·Pigment · Color-126, CI·Pigment·Yellow-127, CI Pigment·Yellow-128, CI·Pigment·Yellow-129, CI Pigment·Yellow-138, CI Pigment·Yellow-139, CI·Pigment·Yellow-150, CI Pigment·Yellow-151, CI·Pigment·Yellow-152, CI Pigment·Yellow-153, CI Pigment·Yellow-154, CI Pigment·Yellow-155, C丄 Pigment·Yellow-156, CI Pigment·Yellow-166, CI pigment, yellow-168, CI, pigment, yellow-175 and other yellow organic pigments, CI pigment, orange 1, CI pigment, orange 5, CI pigment, orange 13, CI, pigment, orange 14, CI pigment, orange 16, CI Pigment · Orange 17, CI Pigment · Orange 24, CI Pigment · Orange 34, CI Pigment · Orange 36, CI Pigment · Orange 38, CI Pigment · Orange 40, CI Pigment · Orange 43, CI Pigment · Orange 46, CI· Pigment · Orange 49, CI Pigment · Orange 51, CI · Pigment · Orange 6 Bu CI Pigment · Orange 63, CI Pigment · Orange 64, CI Pigment · Orange 71, CI Pigment · Orange 73 and other orange organic pigments, CI Pigment · Purple 1. CI Pigment·Purple 19, CI Pigment·Purple 23, CI·Pigment·Purple 29 CI pigment·purple 32, CI pigment·purple 36, CI pigment·purple 38 and other purple organic pigments, CI·pigment·red1, CI pigment·red 2, CI pigment·red 3, 26 314839 1286268 CI·pigment·red 4 , CI·Pigment·Red 5, CI Pigment·Red 6, CI Pigment·Red 7, CI Pigment·Red 8, CI Pigment·Red 9, CI·Pigment·Red 10, CI Pigment·Red H, CI Pigment·Red 12 , CI Pigment · Red 14, CI Pigment · Red 15, CI Pigment · Red 16, CI Pigment · Red 17, CI Pigment · Red 18, CI Pigment · Red 19, CI Pigment · Red 21, CI Pigment · Red 22, CI Pigment·Red 23, CI Pigment·Red 30, CI Pigment·Red 3 Bu C丄Pigment·Red 32, CI Pigment·Red 37, CI Pigment·Red 38, CI Pigment·Red 40, CI·Pigment·Red 41, CI Pigment · Red 42, CI · Pigment · Red 48 : 1, CI · Pigment · Red 48 : 2, CI Pigment · Red 48 : 3, CI Pigment · Red 48 : 4, CI · Pigment · Red 49 : 1, CI Pigment · Red 49 : 2, CI · Pigment · Red 50 : 1, CI · Pigment. Red 52 : 1. CI·Pigment·Red 53 : 1. CI·Pigment·Red 57, CI Pigment·Red 57 ·· 1. CI Pigment·Red 58: 2. CI Pigment·Red 58: 4. CI Pigment·Red 6 0 : 1, C · I · Pigment · Red 6 3 : 1, C · I. Pigment · Red 63 · · 2, CI · Pigment · Red 64 · · 1, CI · Pigment · Red 81 : 1, CI Pigment · Red 83 , CI Pigment · Red 88, CI Pigment · Red 90 : 1, CI Pigment · Red 97, CI Pigment · Red 101, CI Pigment · Red 102, CI · Pigment · Red 104, CI Pigment · Red 105, CI Pigment · Red 106, CI Pigment·Red 108, CI Pigment·Red 1 12, CI·Pigment·Red 113, CI Pigment·Red 114, CI Pigment·Red 122, CI·Pigment·Red 123, CI Pigment·Red 144, CI Pigment· Red 146, CI Pigment · Red 149, CI Pigment · Red 150, CI Pigment · Red 1 5 1 , C. I · Pigment · Red 1 6 6 , C · I · Pigment · Red 1 6 8 , CI 27 314839 1286268 Pigment .Red 17〇, ci·pigment. Red C · I · Pigment · Twilight, , , C · I · Pigment · Red 1 7 2.

紅色179、C丄顏料.CJ.顏料·紅色178、C丄顏料. 顏料.紅色187、Ci 18〇、C.1·顏料·紅色185、CU C.I.顏料.红色 、" 色1 8 8、C. I.顏料.紅色丨9 〇 一.^ 紅色2〇8、d•顏料.C.1·顏料.紅色2〇7、C.I.顏料. 顏料.紅色216、C.L|^ 2〇9、αΐ.顏料.紅色 C.I.顏料.紅色226、c 紅色220、C.I.顏料.紅色224、 243、C.1·顴料.紅色二1·顏料·紅色242、C.1.顏料.紅色 紅色255、c丄顏料.紅声C.1.顏料.紅色254、C丄顏料. 色有機顏科、 264、C.I·顏料·紅色265等紅 :1.顏料.藍色15、C.I·顏料.,色15」 色15 : 4、d•顏料.藍色i .滅色15 . 3、C.I.顏料.藍 色有機顏料、 5 6、C.I·顏料·藍色6〇等藍 C.I·顏料·綠色7、& C.I·顏料·棕色23、c / 1 ·綠色%等綠色有機顏料、 c.i·顏料·黑色丨、c 1居料铩色25等棕色有機顏料、 該等有機顏料對應3之=7等黑色有機顏料。 亦可2種以上組合使用。之旦素顏色可各自單獨使用, 該等有機顏料中理想之有 舉例如C丄顏料.黃色_117、 4料,黃色有機顏料可列 料.黃色-129、C.I.顏料.黃色顏科.頁色-128、C.1.顏 8、C.I·顏料·黃色_150、 314S39 28 1286268Red 179, C 丄 pigment. CJ. Pigment · Red 178, C 丄 pigment. Pigment. Red 187, Ci 18 〇, C.1 · Pigment · Red 185, CU CI pigment. Red, " Color 1 8 8, CI Pigment. Red 丨9 〇一.^ Red 2〇8, d•Pigment.C.1·Pigment. Red 2〇7, CI Pigment. Pigment. Red 216, CL|^ 2〇9, αΐ. Pigment. Red CI Pigment. Red 226, c Red 220, CI pigment. Red 224, 243, C.1·颧. Red 2·1·Pigment·Red 242, C.1. Pigment. Red red 255, c丄 pigment. Red sound C .1. Pigment. Red 254, C丄 pigment. Color organic Yankee, 264, CI·Pigment·Red 265, etc. Red: 1. Pigment. Blue 15, CI·Pigment., Color 15” Color 15 : 4, d • Pigment. Blue i. Extinction 15. 3, CI pigment, blue organic pigment, 5 6. CI·Pigment·Blue 6〇, etc. Blue CI·Pigment·Green 7, & CI·Pigment·Brown 23 c / 1 · Green organic pigment such as green %, ci·pigment·black 丨, c 1 铩 铩 25 25 25 brown organic pigment, such organic pigment corresponding to 3 = 7 black organic pigment. It is also possible to use two or more types in combination. The color of the pigment can be used alone, and among these organic pigments, for example, C 丄 pigment, yellow _117, 4 materials, yellow organic pigment can be listed. Yellow-129, CI pigment, yellow nectar, page color -128, C.1. Yan 8, CI·Pigment·Yellow_150, 314S39 28 1286268

C.I.顏料.黃色_155、CI 红态女 >、料 育色-185等、 、、、色有機顏料可列舉C J •顏 178、C j ~料 …、、工色166、C.I·顏料·紅色 l丄顏枓·紅色209、cj 巴 紅色254等、 ·頦枓·紅色242、C.I·顏料·CI pigments. Yellow _155, CI red female>, material coloring-185, etc., and, color organic pigments can be cited CJ • Yan 178, C j ~ material..., work color 166, CI · pigment · red l丄颜枓·Red 209, cj Bar Red 254, etc. ·颏枓·Red 242, CI·Pigment·

黑色有機顏料可列舉C I 箄,承τ田士 ’、; 黑色1、C.I•顏料·里色7 寻更理想之有機顏料可列兴〇 謂’,,、色7Black organic pigments can be listed as C I 箄, 承田士士',; black 1, C.I• pigment· 里色 7 Finding more ideal organic pigments can be listed as ',,, color 7

顏斜 λ ^ 歹舉Cj·顏料·黃色-150、C I 顏科·紅色254、αΐ•顏料· CJ* Α τ制、生w么 …、色1、C丄顏料·黑色7等。 馮了製造黑色基材所使 于 所使用之愛色賴#1 μ I 者色感光性樹脂組成物中 號公報、特::如;:黑、石墨 開平—號公報 色Μ.顏料.黑色7等之:色可使用上述C.1·顏料.黑 寺之"、、色有機顏料等。 "亥寺黑色顏料亦可偉用 特開平9 _… 特開平9_95625號公報、 ]十9-124969號公差g、4主问丁 樹月匕勹嚐 ,汗平2001_ 106938號所揭示之 树月日包覆之碳黑。亦可佶 所揭- 〇 4寸開2〇〇1-1 15043號公報 所揭不之無機物包覆之黑色顏料。 所使用顏料之平均粒徑i ^ 以下h ^ L通吊在0.〇〇5心以上〇.2//m斜 oblique λ ^ 歹 C Cj·Pigment·Yellow-150, C I Yanke·Red 254, αΐ•Pigment·CJ* Α τ system, raw w..., color 1, C 丄 pigment, black 7, etc. Feng made a black substrate to make use of the love color Lai #1 μ I color photosensitive resin composition material bulletin, special:: such as: black, graphite Kaiping - No. bullet color. Pigment. Black 7 Etc.: The color can be used in the above C.1·Pigment. Black Temple", color organic pigments, and the like. "Hai Temple black pigment can also be used by special Kaiping 9 _... Special Kaiping 9_95625 bulletin,] No. 9-124969 tolerance g, 4 main question Ding Shuyue tasting, Khan Ping 2001_ 106938 revealed the tree month package Covered with carbon black. It can also be revealed - 〇 4 inch open 2〇〇1-1 15043 bulletin Uncovered inorganic pigment coated black pigment. The average particle size of the pigment used is below i ^ h ^ L is suspended above 0. 〇〇 5 hearts 〇. 2 / / m

,車父好在〇.〇l“ m以上Q 徑若# η υ·1//ιη以下。顏料之平均粒 右在O.Olvm以上〇 柄日士古一 # m以下之範圍,則於形成濾色 寸有可3又知兩透過率之傾向, ^ . , . Μ 、 又,在著色感光性樹脂組 成物中有顏料粒子蠻忐交 ^ 又成合易刀散之傾向而為佳。 該等粒徑之顏料可經由例如捏 $ ^、m ^ 々忐、硫酸法、鹼退原 解法寺通吊之方法微粒化獲得。 月匕笪許从^ 顯枓之表面亦可經由樹 月曰寺改性(特開平8_259876號 314839 29 口86268 感光丨生树脂組成物為著色感光性樹脂組成物時,顏 科之使用量對於著色感光性樹脂組成物之固體成分(去除 滲劑之成分合計)之質量百分率,通常在20質量%以上60 質量%以下,較好在25質量%以上55議以下,更好 在30貝;5;%以上$質 貝1 ^以下。顏料之使用量於上述之 基準若在20質晉〇/、; μ &lt; 、里^以上00貝1 %以下,則可形成目的之 黑色基材或畫素而為佳。 :本^明,上述黏合樹脂/乙烯性不飽和化合物之質量 比以在1 ·5以上、5以下較佳。更好之質量比在2以上、4 以下。 卜於衣造或保存感光性樹脂組成物時,為了阻止 IS不飽和化合物不需要之熱聚合,可添加少量之抗熱 聚合劑。it當之抗熱聚合劑可列舉_代醌、對_甲氡基笨 鉍、一-昂三-丁基_對_甲酚、焦掊酚、第三-丁基鄰苯二酚、 ^苯醒、4,4、硫代雙(3-甲基|第三_丁基苯酉分)、2,2、甲撐 =(4-曱基-6-第三-丁基苯酚)、沭亞硝羥胺亞鈽鹽等。熱聚 〇防止劑之添加量對於全組成物之質量以約0.01至5質旦 %較佳。 貝里 土本感光性樹脂組成物必要時可配合各種添加物,例如 ί 2剎、上述以外之高分子化合物、界面活性劑、促進黏 者劑、抗氧化劑、紫外線吸收劑、抗凝聚劑等。 * ^该等添加物之具體例可列舉破璃、氧化鋁等填充劑; :$烯乙醇、聚丙烯酸、聚乙二醇單烷醚、聚氯烷基丙烯 酸酯等黏合聚合物(Α)以外之高分子化合物; 314839 30 1286268 非離子系、陽離子系、陰離子系等界面活性 m A ^ …,乙烯基三 二虱基矽烷、乙烯基三乙氧基矽烷、乙烯基三(2_甲氧 氧基)矽烷、N-(2-胺基乙基)_3_胺基丙基 :土乙 沪、Μ β Τ悬—甲氣基矽 兀 _(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、3 其二牧基丙 二一^虱基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、弘巧 乳丙乳基丙基甲基二甲氧基石夕烧、2·(3,4•環氧基環已基 乙基二甲氧基矽烷、3-氯丙基甲基二甲氧基矽烷、3•氯土丙 =三甲氧基石夕烧、3-甲^烯氧*丙基三甲氧基石夕燒= 巯基丙基三甲氧基矽烷等促進黏著劑;2,2_硫代雙(2甲基 •6·第二-丁基苯酚)、2,6-二叔丁基苯酚等氧化防止劑; ’ 丁基5曱基羥基苯基)-5-氣苯并三唑、烷氧基二苯曱 _等紫外線吸收劑··聚丙烯酸鈉等抗凝聚劑。 本感光性樹脂組成物亦可含有羧酸,較好為分子量在 1000以下之低分子量羧酸或分子中具有1個以上胺基之分 子量在1000以下之有機胺化合物。 刀 羧酸具體而言可列舉例如甲酸、乙酸、丙酸、丁酸、 戊酸、三甲基乙酸、己酸、二乙基乙酸、庚酸、辛酸等脂 肪私單羧酸’ ¥酸、丙二酸、琥珀酸、戊二酸、己二酸、 庚一酸、辛一酸、壬二酸、癸二酸、十一烷二羧酸、甲基 丙_酸、乙基丙二酸、-甲其石 田:a: I占μ私 义 一丙二酸、甲基琥珀酸、四曱 基琥ίέ酸、棒康酸等脂肪佐—, _ ^ , t細W 3矢_竣酸;丙二竣酸、烏頭酸、 才早腦三酸等脂肪族三羧酸;笨甲酸、甲苯酸、枯茗酸、二 曱基苯基酸、一曱基苯曱酸等芳族單羧酸;苯二曱酸、異 笨—曱酸、對苯二甲酸、偏笨三甲酸、均苯三曱酸、偏笨 31 314839 1286268 四曱酸、均苯四甲酸等芳族聚羧酸;苯基乙酸、氫化阿托 酸、氫化肉桂酸、苦杏仁酸、苯基琥珀酸、阿托酸、肉桂 酸、肉桂酸曱酯、肉桂酸苄酯、肉桂叉乙酸、香豆酸、二 經基肉桂酸等其他羧酸。 有機胺化合物可列舉例如正丙胺、異丙胺、正丁胺、 異丁胺、第二-丁胺、第三-丁胺、正戊胺、正己胺、正庚 ,、正辛胺、正壬胺、正癸胺、正十一烷胺、正十二烷胺 等單烷基胺類;環己胺、2-甲基環己胺、3_甲基環己胺、 4-曱基環己胺、2-乙基環己胺、3_乙基環己胺、4_乙基環己 胺等單環烷基胺類;甲基乙胺、二乙胺、甲基正丙胺、乙 基正丙胺、二正丙胺、二異丙胺、二正丁胺、二異丁胺、 二第二-丁胺、二第三_丁胺、二正戊胺、二正己胺等二烧 基!類;甲基環己胺、乙基環己胺等單烷基單環烷基胺類; 二環己胺等二環烷基胺類;二甲基乙胺、甲基二乙胺、二 乙胺、二甲基正丙胺、c乙基正丙胺、甲基二正丙胺、乙 基二正丙胺、三正丙胺、三異丙胺、三正丁胺、三異丁胺、 二弟二-丁胺、三第三·丁胺、三正戊胺、三正己胺等三烷 基胺類甲基環己胺、二乙基環己胺等二烷基單環烷: 胺類;甲基二環己胺、乙基二環己胺等單烷基二環烷二 類,三環己胺等三環烷基胺類;2-胺基乙醇、3 ^ 妝暴丙 醇、1-胺基丙醇、4-胺基_卜丁醇、5-胺基、二 土 /3^ 、6 · 胺基_1_己醇等單烷醇胺類;心胺基環己醇 - 4CS . ^ ^ ^ 平壤燒醇胺 颏,一乙醇胺、二正丙醇胺、二異丙醇胺、二 ^ 一 丄 一止丁醇胺、 一異丁醇胺、二正戊醇胺、二正己醇 文寻一玟醇胺類;二 314839 32 1286268 (4-環己醇)胺等二環烷醇胺類;三乙醇胺、三正丙醇胺、 三異丙醇胺、三正丁醇胺、三異丁醇胺、三正戊醇胺、二 正己醇胺等二烷醇胺類;三環己醇)胺等三環烷醇胺 類;3-胺基-1,2-丙二醇、胺基丙二醇、仁胺基“ 2 丁二醇、4·胺基-:1.3_丁二醇、3_二甲胺基4,2_丙二醇、弘 二乙胺基_1,2-丙二醇、2_二甲胺基“,^丙二醇、 ^ G 胺 基],3-丙二醇等胺基鏈烷二醇類;4-胺基],2_環己燒二 醇、4-胺基-1,3-環己烷二醇等胺基環鏈烷二醇類;^胺基 環戊烧甲醇、4-胺基環戊烷甲醇等含有胺基之環鏈烷甲醇 類;卜胺基環己烷甲醇、4-胺基環己烷甲醇、扣二曱胺基 環戊烷甲醇、4-二乙胺基環戊烷甲醇、4-二甲胺基環己烧 甲醇、4-二乙胺基環己烷甲醇等含有胺基之環鏈烷甲醇 類;Θ -丙胺酸、2-胺基丁酸、3-胺基丁酸、4-胺基丁酸、 2-胺基異乙酸、3-胺基異乙酸、2-胺基戊酸、5-胺基戊酸、 6-胺基己酸、1-胺基環丙烧魏酸、卜胺基環己烧羧酸、4-胺基環己烷羧酸等胺基羧酸類;苯胺、鄰-甲基苯胺、間_ 曱基苯胺、對-甲基苯胺、對-乙基苯胺、對-正丙基苯胺、 對-異丙基苯胺、對-正丁基苯胺、對-第三-丁基苯胺、1-萘胺、2-萘胺、n,N-二甲基苯胺、N,N-二乙基笨胺、對-曱基-N,N-二甲基苯胺等芳族胺類;鄰-胺基苄醇、間-胺基 苄醇、對-胺基苄醇、對-二曱胺基苄醇、對-二乙胺基苄醇 等胺基苄醇類;鄰-胺基苯酚、間-胺基苯酚、對-胺基苯酚、 對-二甲胺基笨酚、對-二乙胺基苯酚等胺基苯酚類;間-胺 基苯甲酸、對-胺基苯甲酸、對-二甲胺基苯甲酸、對-二乙 Λ Λ 314839 1286268 胺基本甲酸等胺基苯甲酸類等。 、於本發明’羧酸、有機胺化合物可單獨使用,亦可2 種以上混合使用。於本感光性樹脂組成物,緩酸、有機胺 ,合物之使用量各自通常對於組成物全體為g顧至Η質 量%,較好為組成物全體之〇 〇1至1()質量%。 、 將本感光性樹脂組成物經由旋轉塗抹、流塑塗抹、滾 筒塗抹等塗抹方法塗抹於基板,經由乾燥形成源^感純 樹脂組成物之層,藉由所定之遮罩模型曝光,用顯像液顯 像,形成模型。本感光性樹脂組成物含有顏料時成為著色 感光性樹脂組成物,形成著色模型m色板 使用之放射線較好使用g線、h線、i線等紫外線。塗抹之 厚度為乾燥後之膜厚通常為o.mo心,較好為〇.2至 5.〇//m,更好為 〇.2 至 3 〇#m。 本感光性樹脂組成物為著色感光性樹脂組成物時,在 形錢色板時所使用之基板可列舉例如玻璃、二氧化石夕、 聚碳酸酯、聚S旨、芳族聚醯胺、聚醯胺亞胺、聚醯亞胺等。 該等基板根據所期望,亦可預先實施經有機石夕院偶合劑等 ㈣處理、離子摩擦、㈣、氣相反應法、 蒸錢荨適當之前處理。 择員像液只要可溶解本感光性樹脂組成物,不會溶解曝 光部之液體即可使用。具體而言可使用各種有機溶劑之組 合或鹼性水溶液。有機溶劑可列舉於調製本感光性樹脂組 成物時所使用之上述溶劑。 ϋ j牛例如將氫氧化鈉、氫氧化鉀、碳酸鈉、矽酸鈉、 314839 34 1286268 甲基矽酸鈉、氨水、乙胺、二乙胺一 Q妝、一甲基乙醇胺、羥化 四甲敍、經化四乙胺、贍鹼、吡咯、六氫卩比咬、以-二氮 雜二環·[5,4,0]_7•十一碳稀等鹼性化合物溶解成濃度二 0.001至10質量%,較好為〇.〇1至i 王1貝Ϊ %之鹼性水溶液。 上述鹼性水溶液亦可適量添加例如甲醇、乙醇等水溶性有 機溶劑或界面活性劑等。 顯像條件可適用各種條件。例如顯像處理法可使用喷 淋顯像法、噴霧顯像法、浸潰顯像法、㈣顯像法等。顯 像溫度一般可設定在1(rc至4〇t:之範圍。顯像時間一般嗖 定在10秒至300秒。使用由該等鹼性水溶液組成之顯像液 時,一般於顯像後用水洗淨。 以上雖然對本發明之實施形態加以說明,但是以上所 揭示之本發明實施形態僅為例示,本發明之範圍並不只限 於該等實施形態。本發明之範圍包含根據申請專利範圍所 示,更包含與申請專利範圍所揭示均等意義及範圍内之所 有之變更。以下,根據實施例對本發明作更詳細之說明, 但是本發明並不只限於該等實施例。 實施例1 於容量300ml之四口燒杯中放入雙酚芴二縮水甘油醚 46.3g、衣康酸8.7g、苄基三乙基氯化銨〇〇9g、四乙基溴 化叙0.18g、甲氧酉昆〇.〇2g及丙二醇單甲_乙酸酯55g,於 加;^祝拌下在1 2 0 C進行反應4小時,獲得透明淡黃色之 黏調液體。於所獲得之黏調液體中再加入4 8g之丙二醇單 甲醚乙酸酯及4.8g之丙烯酸,於12〇。(:進行反應8小時。 35 314839 1286268 作為化合物A。 接著,放入化合物A55g、四氫苯二甲酸酐i〇.2g、丙 二醇單甲醚乙酸酯10.2g,在12(TC加熱攪拌下進行反應2 小時,獲得淡黃色透明之樹脂溶液A1。所獲得樹脂之重量 平均分子量(Mw)為8200,酸價為1〇〇。 實施例2 [著色感光性樹脂組成物之製造] 將[E]平均粒徑為〇.03//m之黑色顏料(c〗顏料黑色7)4〇 質篁份及分散劑1 2質量份之混合物[顏料]52質量份、 [A] 合成例所獲得之樹脂溶液A1 [黏合聚合物]33質量份(固 體成分換算)、 [B] 二季戊四醇六丙烯酸酯[具有乙烯性不飽和鍵之可聚合 加成之化合物]1 0質量份、 [C] 2,4-雙(二氣甲基)_6-糊椒基_1,3,5_三嗪[光聚合引發 劑]5·0質量份及 [D] 丙二醇單甲醚乙酸酯[溶劑]374質量份混合,獲得著色 感光性樹脂組成物(黑色)。 [者色感光性樹脂組成物層之形成] 將上述所獲得之著色感光性樹脂組成物用旋轉塗抹法 塗抹於玻璃基板[「#7059」蔻尼格公司製造]之表面,於i〇q C加熱3分鐘使乾燥,於基板上形成源自著色感光性樹脂 組成物之層。該源自乾燥後之著色感光性樹脂組成物之層 厚度為1.2 // m。 [著色模型之形成(解像度之評定)] 36 314839 1286268 於形成源自上述著色感光性樹脂組成物之層之基板藉 由具有5 // m之L/S(線及間line and space)模型之光遮罩, 用超高壓汞燈照射紫外線(照射量200mJ/cm2)使曝光。將曝 光後之著色感光性樹脂組成物層浸潰於顯像液[含有質量 份率為0 · 0 1 %之氫氧化舒、含有非離子系界面活性劑之水 溶液]至未曝光部溶出為止,顯像5 0秒。 顯像後水洗,於230°C加熱20分鐘,於基板(2)上形成 黑色之著色模型(黑色基材)。用光學顯微鏡觀察該黑色基 材時,於5 # m之L/S模型形成良好之再現性,模型之線 性亦良好。 [顯像界限(margin)之評定] 除了顯像液之浸潰時間(顯像時間)為7〇秒之外,與上 述同樣刼作,形成黑色基材。用與上述相同之光學顯微鏡 觀察時,於5 // m之L/S模型形成良好之再現性 [感度之評定] 除了使用遮光層之光線透過率呈階段性變化之遮罩模 型作為遮罩模型’進行曝光之外,與上述同樣操作,尋求 為了形成杈型所必需之最小光線照射量(感度)。 所獲传之感度為l00mJ/cm2,為非常高之感度。 比較例_^ 除了以甲基丙烯酸苄醋與甲基丙烯酸之 丙烯酸苄酯單位令八t 4 人旦 ^ 里之莫耳刀率為65%、甲基丙烯酸單位 广置之莫耳分率為35%、聚苯乙烯換算重量平均分子量為 ,_]30質量份取代實施例2所使用之黏合聚合物及二 314839 37 1286268 季戊四醇六丙烯酸酯之使用量為13質 2 n ill· ^ a/c 、 卜’與貫施例 樣%作,&amp;得著色感光性樹脂組成物(黑色),形成源自 著色感光性樹脂組成物之層(厚度為i 2 “瓜)。 [評定] 除了以形成源自上述所獲得之著色感光性樹脂組成物 之層之基板取代形成源自實施例2所獲得著色感光性樹脂 組成物之層之基板使用之外,與實施例2同樣操作進行評 定時,於50秒之顯像應溶出之未曝光部完全未溶出。又, T像時間同樣為70秒時,雖然應溶出之未曝光部溶出,但 是5&quot;m之著色模型完全消失,完全不能形成。 與實施例2同樣操作所尋求之感度為3〇〇mj/cm2。 本發明之聚羧酸樹脂可適合作為感光性樹脂組成物之 ,合聚合物使用’尤其是若使用含有顏料之著色感光性樹 月曰、.且成物則可以獲得尚感度之咼解像性,顯像之界限亦 廣且佳。粒子徑小之顏料以高濃度使用時亦相同,可獲得 高感度、高解像性及廣大顯像界限,較為理想。 本發明之感光性樹脂組成物,特別適用於濾色板用著 色感光性樹脂組成物、濾色板用保護膜、濾色板用調距板、 濾色板用層間絕緣膜。 【圖式簡單說明】 第1圖(a)至(c) 係為使著色感光性樹脂組成物在基板上形成畫素、黑 色基材之過程之模式圖。 第2圖 314839 38,Car father is good at 〇.〇l “m above Q diameter if # η υ·1//ιη below. The average grain right of the pigment is above O.Olvm. The color filter has a tendency to know the two transmittances, and it is preferable that the pigment particles are colored in the coloring photosensitive resin composition, and the tendency is to be easy to disperse. The pigment of the particle size can be obtained by micronization by, for example, pinching $^, m ^ 々忐, sulfuric acid method, or alkali retreat method. The surface of the moon can be changed from the tree to the temple. Sex (Special opening) No. 8_259876 No. 314839 29 Port 86268 When the photosensitive resin composition is a coloring photosensitive resin composition, the amount of Yankee used is the mass of the solid component (the total composition of the removing agent) of the colored photosensitive resin composition. The percentage is usually 20% by mass or more and 60% by mass or less, preferably 25% by mass or more and 55% or less, more preferably 30% or more; 5% or more and 1% or less of the mass of the shell. The amount of the pigment used is the above-mentioned standard. In the case of 20 quality 〇 /,; μ &lt;, 里 ^ above 00 shell 1% or less, can form a mesh Preferably, the mass ratio of the above-mentioned binder resin/ethylenically unsaturated compound is preferably 1.5 or more and 5 or less. More preferably, the mass ratio is 2 or more, 4 In the following, when a photosensitive resin composition is formed or preserved, a small amount of a heat-resistant polymerization agent may be added in order to prevent the IS unsaturated compound from being thermally polymerized, and the heat-resistant polymerization agent may be listed as a heat-resistant polymerization agent. _甲氡基铋,一-昂三-butyl_p-cresol, pyrogallol, tri-butyl catechol, benzene ketone, 4,4, thiobis(3-methyl |Third-butyl benzoquinone), 2,2,methylene = (4-mercapto-6-tertiary-butylphenol), hydrazine hydroxylamine sulfonium salt, etc. Addition of thermal polymerization inhibitor The amount is preferably from about 0.01 to about 5 mass% for the mass of the entire composition. The composition of the photosensitive resin of the berylate can be blended with various additives as necessary, for example, a polymer compound or a surfactant other than the above. And promote adhesives, antioxidants, ultraviolet absorbers, anti-agglomerating agents, etc. * ^ Specific examples of such additives may include fillers such as glass, alumina, etc.; a polymer compound other than a binder polymer such as ethanol, polyacrylic acid, polyethylene glycol monoalkyl ether or polychloroalkyl acrylate; 314839 30 1286268 Interface activity of nonionic, cationic or anionic groups m A ^ ..., vinyl tridecyl decane, vinyl triethoxy decane, vinyl tris(2-methoxy) decane, N-(2-aminoethyl)-3-aminopropyl: earth b Μ, Μ Τ — - 甲 矽兀 矽兀 ( ( ( ( ( ( ( ( ( ( ( 2- 2- 2- 2- 2- ( 2- 2- 2- 2- 2- ( 2- 2- 2- 2- 2- 2- 2- 2- 2- 2- 2- 2- 2- 2- 2- Propyloxypropyltrimethoxydecane, Hongzhi Milkylacylpropylmethyldimethoxyxanthine, 2·(3,4•epoxycyclohexylethyldimethoxydecane, 3- Promoting adhesives such as chloropropylmethyldimethoxydecane, 3•chloropropane-propane=trimethoxy-xanthine, 3-methyl-2-oxo-propyltrimethoxy-xanthine=mercaptopropyltrimethoxydecane; 2,2_thiobis(2methyl•6·second-butylphenol), 2,6-di-tert-butylphenol and other oxidation inhibitors; 'butyl 5-mercaptohydroxyphenyl)-5-gas Benzotriazole, alkoxydiphenyl hydrazine, etc. External line absorber · Anti-agglomerating agent such as sodium polyacrylate. The photosensitive resin composition may contain a carboxylic acid, and is preferably an organic amine compound having a molecular weight of 1,000 or less and a molecular weight of one or more amine groups having a molecular weight of 1,000 or less. Specific examples of the carboxylic acid of the knives include fatty acid monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, trimethylacetic acid, caproic acid, diethyl acetic acid, heptanoic acid, and octanoic acid. Diacid, succinic acid, glutaric acid, adipic acid, heptanoic acid, octanoic acid, azelaic acid, sebacic acid, undecanedicarboxylic acid, methylpropionic acid, ethylmalonic acid, Jiaqi Ishida: a: I account for μ-single malonic acid, methyl succinic acid, tetradecyl succinic acid, barconic acid and other fats, _ ^, t fine W 3 竣 竣 acid; An aliphatic tricarboxylic acid such as citric acid, aconitic acid, or early brain tricarboxylic acid; an aromatic monocarboxylic acid such as benzic acid, toluic acid, cumanoic acid, dinonyl phenyl acid or monodecyl benzoic acid; Tannic acid, stupid-capric acid, terephthalic acid, stupid tricarboxylic acid, trimesic acid, stupid 31 314839 1286268 tetracarboxylic acid, pyromellitic acid and other aromatic polycarboxylic acids; phenylacetic acid, hydrogenation Atoric acid, hydrogenated cinnamic acid, bitter almond acid, phenyl succinic acid, atropic acid, cinnamic acid, decyl cinnamate, benzyl cinnamate, cinnamulinic acid, coumaric acid, diacetyl cinnamic acid, etc. He carboxylic acid. The organic amine compound may, for example, be n-propylamine, isopropylamine, n-butylamine, isobutylamine, second-butylamine, tert-butylamine, n-pentylamine, n-hexylamine, n-heptane, n-octylamine, n-decylamine. Monoalkylamines such as n-decylamine, n-undecylamine, n-dodecylamine; cyclohexylamine, 2-methylcyclohexylamine, 3-methylcyclohexylamine, 4-nonylcyclohexylamine Monocyclic alkylamines such as 2-ethylcyclohexylamine, 3-ethylcyclohexylamine, 4-ethylcyclohexylamine; methylethylamine, diethylamine, methyl-n-propylamine, ethyl-n-propylamine , di-n-propylamine, diisopropylamine, di-n-butylamine, diisobutylamine, di-second-butylamine, di-third-butylamine, di-n-pentylamine, di-n-hexylamine, etc. a monoalkylmonocycloalkylamine such as methylcyclohexylamine or ethylcyclohexylamine; a dicycloalkylamine such as dicyclohexylamine; dimethylethylamine, methyldiethylamine, and diethyl Amine, dimethyl-n-propylamine, c-ethyl-n-propylamine, methyldi-n-propylamine, ethyldi-n-propylamine, tri-n-propylamine, triisopropylamine, tri-n-butylamine, triisobutylamine, di-di-butylamine a trialkylmonocycloalkane such as a trialkylamine methylcyclohexylamine or a diethylcyclohexylamine such as tris-butylamine, tri-n-pentylamine or tri-n-hexylamine: an amine; methyl dicyclohexyl a monoalkyl dicycloalkane such as an amine or ethyl dicyclohexylamine; a tricycloalkylamine such as tricyclohexylamine; 2-aminoethanol, 3 ^ acetophenone, 1-aminopropanol, Monoalkanolamines such as 4-amino-butanol, 5-amino, di-/3^, 6-amino-1-hexanol; heart amine cyclohexanol-4CS. ^ ^ ^ Pyongyang Alcoholamine, monoethanolamine, di-n-propanolamine, diisopropanolamine, bis-butanolamine, isobutanolamine, di-n-pentanolamine, di-n-hexanol Class; two 314839 32 1286268 (4-cyclohexanol) amine and other dicycloalkanolamines; triethanolamine, three a dialkanolamine such as a propanolamine, a triisopropanolamine, a tri-n-butanolamine, a triisobutanolamine, a tri-n-pentanolamine or a di-n-hexanolamine; a tricycloalkanol such as a tricyclohexanol)amine Amines; 3-amino-1,2-propanediol, alanine propylene glycol, arylamino "2 butanediol, 4:amino-: 1.3-butanediol, 3-dimethylamino 4,2-propylene glycol , amine aminoethylamine 1,2-propanediol, 2-dimethylamino ", propylene glycol, ^ G amine], 3-propanediol and other amino alkanediols; 4-amino], 2 ring Aminocycloalkanediol such as hexane diol or 4-amino-1,3-cyclohexane diol; amine-containing cyclopental hexane, 4-aminocyclopentane methanol, etc. containing an amine group Cycloalkane methanol; acenamyl cyclohexane methanol, 4-aminocyclohexane methanol, decansylcyclopentane methanol, 4-diethylaminocyclopentane methanol, 4-dimethylamino a cycloalkane methanol containing an amine group such as cyclohexane or methanol, 4-diethylaminocyclohexane methanol; Θ-alanine, 2-aminobutyric acid, 3-aminobutyric acid, 4-aminobutyl Acid, 2-aminoisoacetic acid, 3-aminoisoacetic acid, 2-aminopentanoic acid, 5-aminopentanoic acid, 6-aminocaproic acid, 1-aminocyclopropanone An amine carboxylic acid such as an acid, a chlorocyclohexane carboxylic acid or a 4-aminocyclohexane carboxylic acid; aniline, o-methylaniline, m-nonylaniline, p-methylaniline, p-ethyl Aniline, p-n-propylaniline, p-isopropylaniline, p-n-butylaniline, p-t-butylaniline, 1-naphthylamine, 2-naphthylamine, n,N-dimethylaniline An aromatic amine such as N,N-diethylaminol, p-nonyl-N,N-dimethylaniline; o-aminobenzyl alcohol, m-aminobenzyl alcohol, p-aminobenzyl alcohol , amino-benzyl alcohol such as p-diaminobenzyl benzyl alcohol or p-diethylamino benzyl alcohol; o-amino phenol, m-amino phenol, p-amino phenol, p-dimethyl amide Aminophenols such as phenol and p-diethylaminophenol; m-aminobenzoic acid, p-aminobenzoic acid, p-dimethylaminobenzoic acid, p-diethylhydrazine 314839 1286268 amine basic formic acid, etc. Aminobenzoic acid and the like. In the present invention, the carboxylic acid or the organic amine compound may be used singly or in combination of two or more kinds. In the photosensitive resin composition, the amount of the acid and the organic amine compound to be used is usually 5% by mass of the total amount of the composition, and preferably 〇1 to 1% by mass of the entire composition. The photosensitive resin composition is applied to the substrate by a smear method such as spin coating, flow coating, or roller coating, and the layer of the pure resin composition is formed by drying, and the exposure is performed by a predetermined mask model. Liquid imaging, forming a model. When the photosensitive resin composition contains a pigment, it becomes a coloring photosensitive resin composition, and it is preferable to use ultraviolet rays such as a g-line, an h-line, or an i-ray to form a colored pattern m-plate. The thickness of the applied film after drying is usually o.mo heart, preferably 〇.2 to 5.〇//m, more preferably 〇.2 to 3 〇#m. When the photosensitive resin composition is a colored photosensitive resin composition, the substrate used in the form of a color swatch may, for example, be glass, silica dioxide, polycarbonate, polystyrene, aromatic polyamine, or poly. Amidinomine, polyimine, and the like. These substrates may be preliminarily subjected to (IV) treatment, ionic friction, (4), gas phase reaction method, and steaming, as appropriate before the treatment. The member liquid can be used as long as it dissolves the photosensitive resin composition and does not dissolve the liquid in the exposed portion. Specifically, a combination of various organic solvents or an aqueous alkaline solution can be used. The organic solvent can be exemplified by the above solvent used in the preparation of the photosensitive resin composition. ϋ j cattle such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium citrate, 314839 34 1286268 sodium methyl citrate, ammonia, ethylamine, diethylamine, Q makeup, monomethylethanolamine, hydroxylated tetramethyl The tetraethylamine, decylamine, pyrrole, hexahydropyrene is bitten, and the basic compound such as diazabicyclo[5,4,0]_7•undecene is dissolved to a concentration of 0.001 to 10% by mass, preferably 〇.〇1 to i Wang 1 Ϊ Ϊ % of an alkaline aqueous solution. A water-soluble organic solvent such as methanol or ethanol or a surfactant may be added to the alkaline aqueous solution in an appropriate amount. The development conditions can be applied to various conditions. For example, a development method such as a shower development method, a spray development method, a dipping development method, or a (four) development method can be used. The development temperature can generally be set in the range of 1 (rc to 4 〇 t:. The development time is generally set at 10 seconds to 300 seconds. When using a developing solution composed of such an alkaline aqueous solution, generally after development The embodiments of the present invention are described above, but the scope of the present invention is not limited to the embodiments. The scope of the present invention is as shown in the claims. The present invention is further described in terms of the meaning and scope of the invention, and the present invention will be described in more detail below, but the present invention is not limited to the embodiments. Example 1 is in a capacity of 300 ml. In a four-beaker, 46.3 g of bisphenol hydrazine diglycidyl ether, 8.7 g of itaconic acid, 9 g of benzyltriethylammonium chloride, 0.18 g of tetraethyl bromide, and methoxyxanthine were added. 2g and propylene glycol monomethyl-acetate 55g, in addition; ^ mixed with the reaction at 1 2 0 C for 4 hours, to obtain a transparent pale yellow sticky liquid. Add 4 8g to the obtained sticky liquid Propylene glycol monomethyl ether acetate and 4.8 g of acrylic acid at 12 Torr. (: The reaction was carried out for 8 hours. 35 314839 1286268 was designated as Compound A. Next, Compound A 55 g, tetrahydrophthalic anhydride i〇. 2 g, and propylene glycol monomethyl ether acetate 10.2 g were placed. The reaction was carried out for 2 hours under heating with stirring at 12 (TC) to obtain a pale yellow transparent resin solution A1. The obtained resin had a weight average molecular weight (Mw) of 8200 and an acid value of 1 Å. Example 2 [Coloring photosensitive resin Manufacture of the composition] [E] a black pigment having an average particle diameter of 〇.03//m (c) pigment black 7) and a mixture of 12 parts by mass of a dispersing agent [pigment] 52 parts by mass, [A] Resin solution A1 [Binder polymer] obtained by the synthesis example 33 parts by mass (in terms of solid content), [B] Dipentaerythritol hexaacrylate [Polymerizable addition compound having ethylenic unsaturated bond] 1 0 Parts by mass, [C] 2,4-bis(dimethyl)_6-saponin-1,3,5-triazine [photopolymerization initiator] 5.0 parts by mass and [D] propylene glycol monomethyl ether 374 parts by mass of an acetate [solvent] was mixed to obtain a colored photosensitive resin composition (black). [Photochromic Resin Composition Layer The colored photosensitive resin composition obtained above was applied by spin coating to the surface of a glass substrate ["#7059" manufactured by 蔻nig Co., Ltd.], heated at i〇q C for 3 minutes, dried, and formed on a substrate. A layer derived from a coloring photosensitive resin composition. The layer thickness of the colored photosensitive resin composition derived from the drying is 1.2 // m. [Formation of a coloring model (evaluation of resolution)] 36 314839 1286268 The substrate of the layer of the colored photosensitive resin composition is irradiated with ultraviolet light by an ultrahigh pressure mercury lamp (irradiation amount: 200 mJ/cm 2 ) by a light mask having a L/S (line and space) model of 5 // m. Make exposure. The colored photosensitive resin composition layer after the exposure is immersed in a developing solution [aqueous solution containing a mass fraction of 0·0 1% and an aqueous solution containing a nonionic surfactant] until the unexposed portion is eluted. Imaging 50 seconds. The image was washed with water and heated at 230 ° C for 20 minutes to form a black colored model (black substrate) on the substrate (2). When the black substrate was observed with an optical microscope, the L/S model of 5 # m formed good reproducibility, and the linearity of the model was also good. [Evaluation of development limit] A black substrate was formed in the same manner as described above except that the immersion time (development time) of the developing liquid was 7 sec. When observed by the same optical microscope as described above, the L/S model at 5 // m forms good reproducibility [assessment of sensitivity] except for the mask model in which the light transmittance of the light-shielding layer is changed stepwise as a mask model. 'In addition to the exposure, the same operation as above was performed, and the minimum amount of light irradiation (sensitivity) necessary for forming a flaw type was sought. The obtained sensitivity is l00mJ/cm2, which is a very high sensitivity. Comparative Example_^ In addition to the benzyl acrylate methacrylate and methacrylic acid benzyl acrylate unit, the Moth knife rate of the 8 t 4 4 denier is 65%, and the molar fraction of the methacrylic unit is 35. %, polystyrene-equivalent weight average molecular weight, _] 30 parts by mass of the binder polymer used in Substituting Example 2 and two 314839 37 1286268 pentaerythritol hexaacrylate used in an amount of 13 mass 2 n ill · ^ a/c </ br><br><br><br><br><br><br><br><br><br><br><br><br><br><br><br><br><br><br><br><br><br><br><br><br><br><br><br><br><br><br><br><br> The substrate of the layer of the colored photosensitive resin composition obtained above was used in the same manner as in Example 2 except that the substrate from which the layer of the colored photosensitive resin composition obtained in Example 2 was formed was used. In the second image, the unexposed portion is completely undissolved. When the T image time is also 70 seconds, the unexposed portion to be eluted is eluted, but the color pattern of 5&quot;m completely disappears and cannot be formed at all. Example 2 is the same operation The sensitivity sought is 3〇〇mj/cm2. The polycarboxylic acid resin of the present invention can be suitably used as a photosensitive resin composition, and the polymer is used, especially if a coloring photosensitive tree containing a pigment is used. And the object can obtain the resolution of the sensitivity, and the boundary of the image is also wide and good. The pigment with small particle diameter is also used at the same time in high concentration, and high sensitivity, high resolution and broad imaging limit can be obtained. The photosensitive resin composition of the present invention is particularly suitable for a coloring photosensitive resin composition for a color filter, a protective film for a color filter, a distance regulating plate for a color filter, and an interlayer insulating film for a color filter. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 (a) to (c) are schematic diagrams showing a process of forming a pixel and a black substrate on a substrate by coloring a photosensitive resin composition. Fig. 2 314839 38

Claims (1)

1286268 拾、申請專利範圍: 1. 一種聚羧酸樹脂,其特徵為: (a)將(al)化合物與(a2)化合物在式(p)條件下進行 反應所獲得之反應物與(b)含有不飽和基之置获缺、# 签&amp;早竣酸進行 反應,而獲得(c)反應物’且 將(c)反應物與(d)酸酐進行反應而獲得者, (al)化合物··下述式(I)所示之化合物, L 1¾ n R2 只2 ν [式中,R1及R2各自獨立表示氫原子、烷基或齒素原子, X為單鍵或下述式(1-1)至式(1-8)中任何一式所示之2價 殘基,R3為伸烧基’ R為氫原子、:):完基或縮水甘油基, m為〇至5之整數,η為〇至1 〇之整數,限制條件為^ 為2至1〇之整數時,不同之反覆單位中之反1至114可 相同,亦可不同]1286268 Pickup, Patent Application Range: 1. A polycarboxylic acid resin characterized by: (a) a reactant obtained by reacting an (al) compound with a compound (a2) under the formula (p) and (b) (a) a compound containing an unsaturated group, a #-label &amp; early acid, and obtaining (c) a reactant and obtaining a reaction of (c) a reactant with (d) an acid anhydride. - a compound represented by the following formula (I), L 13⁄4 n R2 is only 2 ν [wherein, R1 and R2 each independently represent a hydrogen atom, an alkyl group or a dentate atom, and X is a single bond or a formula (1) 1) To a divalent residue represented by any one of formula (1-8), R3 is a stretching group 'R is a hydrogen atom, :): a complete or glycidyl group, m is an integer from 〇 to 5, η For an integer of 1 ,, when the constraint is ^ to an integer of 2 to 1 ,, the inverse 1 to 114 of the different repetitive units may be the same or different] ①6) X 屮7) . /、Μ 、 (a2)化合物:多價緩酸、 式(P): (環氧化合物之環氧當量數)&gt;(多價羧酸之綾酸當量 40 (修正本)3】4839 第92118151號專利申請案 (96年6月I 5日、 1286268 數)。 2·如申請專利範圍第1項之聚幾酸樹腊,其中,該⑽化 合物係為具有不飽和雙鍵之多價羧酸。 3.如申請專利範圍第】項或第2項之聚羧酸樹脂,盆,, _化合物係選自馬來酸、富馬酸、衣康酸、四氫對 苯二甲酸及氯橋酸所成紐群之至少丨種化合物。 4·如申請專利範圍第1項或第2項之聚羧酸樹脂,其中, ,亥(b)含有不飽和基之單幾酸係選自丙婦酸、甲基㈣ 酸及丁烯酸所成組群之至少丨種。 5.如申請專利範圍第i項或笫 X昂2項之聚羧酸樹脂,其中, 該(d)酸酐係為選自四氫笨— + 一 f酸酐、二苯甲酮四羧酸 二野及聯苯四羧酸二酐所成紐群之至少&quot;重。 6 · —種感光性樹脂組成物,A ,、4寸徵為:由含有[A]如申請 專利範圍第1項至第5項中佐一 r任一項之聚羧酸樹脂、[B] 具有至少1個乙稀性不餘》 不飽和鍵之可聚合加成之化合物、 [C]光聚合引發劑及[D]溶劑所組成。 7.如申請專利範圍第6項之减弁也 A九性樹脂組成物,其中,該 組成物復含有[E]顏料者。 8·如申請專利範圍第7項之感 U 1王W脂組成物,其中,該 闻顏料係由含有碳黑所成之黑色顏料者。 9· 一種硬化物’其特徵為如申請 、 Τ月寻利乾圍第6項至第8項 中任一項之感光性樹脂組成物所形成者。 (修正本)314839 4116) X 屮7) . /, Μ , (a2) Compound: polyvalent acid retardation, formula (P): (epoxy equivalent number of epoxy compound) &gt; (capric acid equivalent of polyvalent carboxylic acid 40 (corrected (3) 4839 Patent Application No. 92118151 (June, I-96, 1286268). 2. The poly-acid tree wax as claimed in claim 1, wherein the compound (10) is unsaturated. A polyvalent carboxylic acid having a double bond. 3. A polycarboxylic acid resin according to the scope of claim 2 or 2, a pot, a compound selected from the group consisting of maleic acid, fumaric acid, itaconic acid, and tetrahydrogen. At least a compound of phthalic acid and chlorhexidine is a compound of the group. 4. The polycarboxylic acid resin of claim 1 or 2, wherein, (b) contains a single number of unsaturated groups. The acid is selected from the group consisting of propylene glycol, methyl (tetra) acid and crotonic acid. 5. The polycarboxylic acid resin according to the scope of claim i or the 昂X ang 2, wherein d) The acid anhydride is at least selected from the group consisting of tetrahydrobenzene-+-f anhydride, benzophenone tetracarboxylic acid di-field and biphenyltetracarboxylic dianhydride. The resin composition, A, and 4 inch is: a polycarboxylic acid resin containing [A] as in any one of the first to fifth items of the patent application scope, [B] having at least one ethylene. The composition of the polymerizable addition compound of the unsaturated bond, the [C] photopolymerization initiator and the [D] solvent. 7. The ninth resin composition of the ninth resin of the sixth aspect of the patent application, wherein The composition is a compound containing [E] pigment. 8. The U 1 king W fat composition of claim 7 of the patent application scope, wherein the smell pigment is a black pigment made of carbon black. A cured product which is characterized by the formation of a photosensitive resin composition according to any one of items 6 to 8 of the application, Τ月寻利干围. (Revised) 314839 41
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