TWI278722B - Exposing method, exposing device and manufacturing method for device - Google Patents
Exposing method, exposing device and manufacturing method for device Download PDFInfo
- Publication number
- TWI278722B TWI278722B TW092108905A TW92108905A TWI278722B TW I278722 B TWI278722 B TW I278722B TW 092108905 A TW092108905 A TW 092108905A TW 92108905 A TW92108905 A TW 92108905A TW I278722 B TWI278722 B TW I278722B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- exposure
- alignment
- pattern
- mask
- Prior art date
Links
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54426—Marks applied to semiconductor devices or parts for alignment
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002148309A JP4172204B2 (ja) | 2002-05-22 | 2002-05-22 | 露光方法及び露光装置、デバイス製造方法 |
| JP2002148301A JP4168665B2 (ja) | 2002-05-22 | 2002-05-22 | 露光方法及び露光装置、デバイス製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200307182A TW200307182A (en) | 2003-12-01 |
| TWI278722B true TWI278722B (en) | 2007-04-11 |
Family
ID=29552354
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW092108905A TWI278722B (en) | 2002-05-22 | 2003-04-17 | Exposing method, exposing device and manufacturing method for device |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR100979454B1 (ko) |
| CN (1) | CN100524024C (ko) |
| TW (1) | TWI278722B (ko) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7388663B2 (en) * | 2004-10-28 | 2008-06-17 | Asml Netherlands B.V. | Optical position assessment apparatus and method |
| JP5182558B2 (ja) * | 2005-12-28 | 2013-04-17 | 株式会社ニコン | パターン形成方法及びパターン形成装置、露光方法及び露光装置、並びにデバイス製造方法 |
| TWI452437B (zh) * | 2006-11-27 | 2014-09-11 | 尼康股份有限公司 | An exposure method, a pattern forming method, and an exposure apparatus, and an element manufacturing method |
| US20080187871A1 (en) * | 2007-02-02 | 2008-08-07 | Fujifilm Corporation | Pattern forming apparatus and method |
| US8139199B2 (en) * | 2007-04-02 | 2012-03-20 | Nikon Corporation | Exposure method, exposure apparatus, light converging pattern formation member, mask, and device manufacturing method |
| KR101769091B1 (ko) * | 2009-08-26 | 2017-08-30 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법 및 디바이스 제조 방법 |
| CN101718956B (zh) * | 2009-08-31 | 2013-06-05 | 四川虹欧显示器件有限公司 | 用于基板制造的曝光方法及其对位装置 |
| CN103969958B (zh) * | 2013-01-25 | 2016-03-30 | 上海微电子装备有限公司 | 一种多曝光视场拼接系统和方法 |
| CN103543615A (zh) * | 2013-10-29 | 2014-01-29 | 苏州德龙激光股份有限公司 | 激光成像加工装置 |
| CN105527795B (zh) * | 2014-09-28 | 2018-09-18 | 上海微电子装备（集团）股份有限公司 | 曝光装置及离焦倾斜误差补偿方法 |
| CN106154760B (zh) * | 2015-04-15 | 2019-01-29 | 上海微电子装备（集团）股份有限公司 | 一种曝光装置及曝光方法 |
| WO2017151291A1 (en) * | 2016-03-04 | 2017-09-08 | Applied Materials, Inc. | Wire grid polarizer manufacturing method |
| CN107290937B (zh) * | 2016-03-31 | 2018-10-16 | 上海微电子装备（集团）股份有限公司 | 一种投影曝光装置及方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4211150B2 (ja) * | 1998-08-20 | 2009-01-21 | 株式会社ニコン | レーザ干渉計及び露光装置 |
| JP2001023891A (ja) * | 1999-07-09 | 2001-01-26 | Canon Inc | ステージ装置、露光装置およびデバイス製造方法 |
| JP2002099097A (ja) * | 2000-09-25 | 2002-04-05 | Nikon Corp | 走査露光方法および走査型露光装置 |
| JP2002134392A (ja) * | 2000-10-23 | 2002-05-10 | Nikon Corp | 位置計測装置及び方法、露光装置、並びにデバイス製造方法 |
-
2003
- 2003-04-17 TW TW092108905A patent/TWI278722B/zh not_active IP Right Cessation
- 2003-05-19 KR KR1020030031518A patent/KR100979454B1/ko active IP Right Grant
- 2003-05-20 CN CNB031367305A patent/CN100524024C/zh not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| CN1459671A (zh) | 2003-12-03 |
| KR20030091055A (ko) | 2003-12-01 |
| CN100524024C (zh) | 2009-08-05 |
| TW200307182A (en) | 2003-12-01 |
| KR100979454B1 (ko) | 2010-09-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |