TWI265338B - Electro-optical device, method of manufacturing the electro-optical device and electrooptical device - Google Patents

Electro-optical device, method of manufacturing the electro-optical device and electrooptical device

Info

Publication number
TWI265338B
TWI265338B TW093125008A TW93125008A TWI265338B TW I265338 B TWI265338 B TW I265338B TW 093125008 A TW093125008 A TW 093125008A TW 93125008 A TW93125008 A TW 93125008A TW I265338 B TWI265338 B TW I265338B
Authority
TW
Taiwan
Prior art keywords
electro
optical device
base layer
reflection film
substrate
Prior art date
Application number
TW093125008A
Other languages
English (en)
Other versions
TW200515046A (en
Inventor
Toshihiro Otake
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Publication of TW200515046A publication Critical patent/TW200515046A/zh
Application granted granted Critical
Publication of TWI265338B publication Critical patent/TWI265338B/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133553—Reflecting elements
    • G02F1/133555—Transflectors

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
TW093125008A 2003-08-25 2004-08-19 Electro-optical device, method of manufacturing the electro-optical device and electrooptical device TWI265338B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003300037A JP4241265B2 (ja) 2003-08-25 2003-08-25 電気光学装置用基板、電気光学装置用基板の製造方法、電気光学装置、電気光学装置の製造方法及び電子機器

Publications (2)

Publication Number Publication Date
TW200515046A TW200515046A (en) 2005-05-01
TWI265338B true TWI265338B (en) 2006-11-01

Family

ID=34308381

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093125008A TWI265338B (en) 2003-08-25 2004-08-19 Electro-optical device, method of manufacturing the electro-optical device and electrooptical device

Country Status (5)

Country Link
US (1) US7123327B2 (zh)
JP (1) JP4241265B2 (zh)
KR (1) KR100636462B1 (zh)
CN (1) CN1591112B (zh)
TW (1) TWI265338B (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4111180B2 (ja) * 2004-09-02 2008-07-02 セイコーエプソン株式会社 液晶表示装置、及び電子機器
JP2006091059A (ja) * 2004-09-21 2006-04-06 Seiko Epson Corp 電気光学装置、電気光学装置の製造方法、及び電子機器
JP2006276831A (ja) * 2005-03-03 2006-10-12 Sanyo Epson Imaging Devices Corp カラーフィルタ基板、液晶装置、及び電子機器
JP2006284611A (ja) * 2005-03-31 2006-10-19 Alps Electric Co Ltd 半透過型液晶表示パネル及びカラー液晶表示装置
JP4337794B2 (ja) * 2005-09-16 2009-09-30 エプソンイメージングデバイス株式会社 液晶装置および電子機器
KR20080070419A (ko) * 2007-01-26 2008-07-30 삼성전자주식회사 반투과형 액정 표시 장치 및 그 제조 방법
JP2010032748A (ja) * 2008-07-29 2010-02-12 Seiko Epson Corp 電気光学装置および電気光学装置の製造方法
JP2015069888A (ja) * 2013-09-30 2015-04-13 株式会社Ｇｓユアサ 放電ランプ
CN104090361B (zh) * 2014-06-24 2017-02-15 京东方科技集团股份有限公司 有源基板及显示装置
KR102604993B1 (ko) * 2016-05-17 2023-11-27 삼성디스플레이 주식회사 유기 발광 표시 장치
TWI718772B (zh) 2019-11-20 2021-02-11 元太科技工業股份有限公司 顯示裝置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6195140B1 (en) * 1997-07-28 2001-02-27 Sharp Kabushiki Kaisha Liquid crystal display in which at least one pixel includes both a transmissive region and a reflective region
JP3394926B2 (ja) 1998-09-28 2003-04-07 シャープ株式会社 液晶表示装置の製造方法
JP2002098955A (ja) 2000-07-19 2002-04-05 Seiko Epson Corp 液晶表示装置及びその製造方法
KR20020010747A (ko) 2000-07-31 2002-02-06 구본준, 론 위라하디락사 반투과 액정표시장치
JP2003302742A (ja) 2002-04-10 2003-10-24 Seiko Epson Corp マスク、光反射膜付き基板、光反射膜の製造方法、および液晶表示装置、並びに電子機器
JP2003302740A (ja) 2002-04-10 2003-10-24 Seiko Epson Corp マスク、光反射膜付基板、光反射膜の形成方法、電気光学装置の製造方法、及び電気光学装置、並びに電子機器
JP3733923B2 (ja) 2002-04-10 2006-01-11 セイコーエプソン株式会社 マスク及び表示装置の製造方法
KR100936954B1 (ko) * 2002-12-31 2010-01-14 엘지디스플레이 주식회사 반사투과형 액정표시장치와 그 제조방법

Also Published As

Publication number Publication date
US20050062912A1 (en) 2005-03-24
CN1591112A (zh) 2005-03-09
KR20050022350A (ko) 2005-03-07
JP4241265B2 (ja) 2009-03-18
KR100636462B1 (ko) 2006-10-18
US7123327B2 (en) 2006-10-17
JP2005070428A (ja) 2005-03-17
CN1591112B (zh) 2010-05-12
TW200515046A (en) 2005-05-01

Similar Documents

Publication Publication Date Title
TWI266939B (en) Liquid crystal display apparatus
TWI265338B (en) Electro-optical device, method of manufacturing the electro-optical device and electrooptical device
CN106684243A (zh) 一种柔性显示面板及显示装置
TW200700839A (en) Planar light source device and fabricating method thereof and liquid crystal display with the same
TWI256500B (en) Liquid crystal display apparatus
EP2245498A4 (en) PRINTED ARTICLE FOR DISPLAYING IMAGES HAVING AN IMPROVED DEFINITION AND DEPTH
WO2009008111A1 (ja) 表示パネルの製造装置及び製造方法
FR2838865B1 (fr) Procede de fabrication d'un substrat avec couche utile sur support de resistivite elevee
WO2008099879A1 (ja) リターデイション基板、その製造方法及び液晶表示装置
EP1814180A3 (en) Organic light emitting display device and method of fabricating the same
EP1906442A3 (en) Fabrication of a wiring pattern and of an active matrix substrate
TW200608418A (en) Thin-film material and the production process thereof
TW200604670A (en) Dual-side display panel
KR20200034805A (ko) 플렉시블 디스플레이 패널의 제조 방법 및 플렉시블 디스플레이 패널
TW200706924A (en) Color element-equipped substrate, film formation method, electro-optical apparatus and electronic equipment
TWI379119B (en) Display device and control method thereof
TW200622364A (en) Electro-optical device and electronic apparatus
TW200712614A (en) Liquid crystal display panel and manufacturing method of substrate thereof
WO2003069029A8 (en) A susceptor provided with indentations and an epitaxial reactor which uses the same
ATE360672T1 (de) Klebstoff- und trennschichten mit pyramidalen strukturen
WO2008093467A1 (ja) 液晶表示装置
TW200616190A (en) The fabrication method of the wafer and the structure thereof
CN110197845A (zh) 显示面板及其制备方法
TW200606527A (en) Liquid crystal display, and projection display employing liquid crystal display layer
TW200511566A (en) Image sensor production method and image sensor