TWI252353B - Substrate for liquid crystal device and method for fabricating he same, liquid crystal device and method for fabricating the same - Google Patents

Abstract

The back substrate opposite the front substrate, of a pair of substrates holding a liquid crystal layer between them, has one surface that includes a flat, smooth area and a roughened area having minute projections. The highest of the projections in the roughened area is below the level of the flat, smooth area.

Description

1252353 INTELLIGENT INTELLECTUAL PROPERTY SECTOR INDIVIDUAL COMPANIES CO., LTD. PRODUCTION A7 B7 V. Technical Field of the Invention (1) The present invention relates to a substrate for a liquid crystal device, a method for producing the same, a liquid crystal device, a method for producing the same, and an electronic device. [Prior Art] Conventionally, a liquid crystal display device having a reflective display has been widely used. In such a liquid crystal device, the reflective display used is a natural light or an indoor illumination light, etc. from the front (observation) The incident type is reflected by the reflective film to reflect the light. According to such a configuration, since backlighting is not required, there is an advantage that power consumption can be reduced. Here, when the surface of the reflecting film is mirror-shaped, there is a problem that the image to be recognized by the observer is reflected by the background or the indoor illumination light, and the display image is inconspicuous. Therefore, it is a general practice to roughen the surface of the above-mentioned reflective film to moderately scatter the reflected light. It is known that such a scattering structure is constructed by honing a surface of a substrate such as glass with a honing agent to form a plurality of fine mountains and valleys on the surface of the substrate. Next, the above-mentioned reflective film is formed on the roughened surface. Thereby, the surface of the reflective film is a rough surface reflected by the surface of the glass substrate. Therefore, the reflected light of the reflective film can be appropriately scattered. However, according to the above method, the surface of the glass substrate must be completely roughened. Therefore, there is a problem that a correction mark or a conversion element which should originally be formed on a flat surface is formed on a roughened surface. In addition, in order to obtain good random radiation characteristics, the paper scale is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) on the rough surface. -^1 ϋ ·1 al· ϋ ϋ 一·^ II 1 ·ϋ 1« ϋ II (Please read the note on the back 3 to fill out this page) Secret · 1252353 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing 5, invention description (), although I hope the mountain and valley can be irregular It is formed in the ground, but in the method of honing the substrate with a honing agent, the mountains and valleys form regularity in accordance with the particle size of the honing agent or the direction of honing. Therefore, in the above method, it is difficult to obtain good scattering characteristics. Thus, when a scattering structure is to be produced according to a conventional method, various problems arise. [Invention] The present invention has been made in view of the above circumstances, and an object thereof is to provide a substrate for a crystal device which can reduce the influence of roughening of a substrate on a liquid crystal device, a method for producing the same, a liquid crystal device, a method for producing the same, and an electronic device. In order to achieve the above object, the present invention is a substrate for a liquid crystal device which is located on the opposite side of the observation side of the pair of substrates which hold the liquid crystal layer, and is characterized in that the surface of the substrate for liquid crystal device has a flat flat region and is A rough surface region of the mountain portion and the valley portion is formed, and the mountain portion of the rough surface region has a height equal to or lower than a plane including the flat region. According to such a substrate for a liquid crystal device, in addition to the formation of a selective rough surface region and a flat region, in addition to forming a reflective film having good scattering characteristics in the rough surface region, for example, it can be formed into a planar shape. The feature lines are formed on a flat field. Further, when considering the crystal gap of the liquid crystal device, the height difference between the flat region and the rough surface region is preferably 5 or less. Also, in order to obtain good random shooting characteristics, in general, it is best to rough surface - (please read the note on the back - write this page) -I §§ I ϋ -ϋ ·1_— 1 I ϋ ϋ 1 · ϋ % This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1252353 Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed A7 B7 V. Invention Description (3) Regional Mountain and Valley Irregularity Ground formation. Specifically, it is preferable that the rough seam surface region is formed as follows: the height of each mountain portion or the depth of the valley portion is different, and the distance between the top end of one mountain portion and the top end of the mountain portion adjacent thereto, It will vary depending on the mountain. When the mountain portion and the valley portion are formed in a regular manner, the dyeing of the reflected light occurs due to the optical path difference of the reflection angle, which causes deterioration in display characteristics. Here, the designated mark may be formed on the flat area described above. For example, a correction mark or a production control mark or the like can be used as the specified mark. When compared with the case where it is formed on a rough surface area, the mark can be surely recognized by the composition of the marks formed on the flat area. Further, as the correction mark, for example, when the substrate for a liquid crystal device is bonded to another substrate, there is a correction mark for matching the relative positions of the two substrates. In the formation of the conversion element or the pixel electrode, etc., when the color filter or the light shielding layer is formed, when the alignment film is applied, when the sealing material is printed, the panel is cut or the liquid crystal device is driven. A correction mark used in actual mounting of the semiconductor integrated circuit is formed on a flat region. On the other hand, as the production control standard E, for example, there are a lot number or a model number, or a mark indicating the processing conditions of various manufacturing processes and the like by symbols. Others, as production control markers, also have various information dataifiers or bar coders, or two-dimensional bar code modelers represented by code definitions. Here, wiring may be formed on the flat region of the present invention. Here, the so-called wiring includes the following commemoration, for example, the active matrix type liquid crystal paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) - -1 ϋ ^ l· κ ϋ ϋ ϋ ϋ ϋ -I ^ ϋ · (Please read the note on the back first. Fill in this page) 1252353 A7 B7 V. INSTRUCTIONS (4) Wiring of the scan line or data line of the device, or TFT (

A conversion element represented by Thin Film Traansistor) or TFD (Thin Film Diode), and a terminal of a semiconductor integrated circuit for liquid crystal driving. When the composition of these wirings is formed on the flat region as compared with the case where it is formed on the rough surface region, there is an advantage that variation in characteristics of the respective elements can be suppressed. Further, a sealing material may be formed on the flat region of the present invention. In the sealing material, generally, a gap between the substrates is maintained, and a spherical or bat-shaped spacer having a certain diameter is contained. However, if the sealing material is formed on a rough surface, the function of the spacer cannot be performed normally. Further, the flat region may be formed such that each of the above-described elements or a plurality of types of the other elements is different. In the above invention, the maximum height Ry of the rough surface region, the arithmetic mean roughness R a Preferably, the ten point average roughness RZ 値 and the average wavelength Sm 値 are preferably within a specified range. Specifically, the combination of the maximum height Ry 粗 of the rough surface area, the arithmetic mean roughness R a 値 , the ten point average roughness R z 値 and the average wavelength S m , is preferably as follows. First, it is preferable to set the maximum height Ry to 0. 2~3 //m, and the arithmetic mean roughness R a 値 is 0 02~0 . 3 //m, the ten-point average roughness R z値 is 〇 1~2 . 5 //m, the aforementioned average wavelength Sm値 is 4~6 0 //m. Or, the maximum height Ry 値 is 1.5 to 2.0 / / m, the arithmetic average roughness Ra 値 is 0. 1 5~ 〇. 3 / m, the aforementioned ten point average roughness Rz 値 is 1. 3~ 1. 8 //m, the aforementioned average wavelength Sm 値 is 1 5~2 5 //m is also feasible. This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) (please read the note on the back first) <^fill this page) Order -------- Ministry of Economic Affairs Intellectual Property Bureau staff consumption Cooperative printing 1252353 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing 5, invention description (5) Further, the maximum height Ry 値 is 0 · 7~1. 2 //m, the arithmetic average roughness Ra値〇. 1~0.2//m, the ten-point average roughness R z値 is 〇·5~1 · 0 //m, and the average wavelength Sm値 is 3 5~5 0, or the maximum height is Ry値 is 0.6 to 1.2/zm, the arithmetic mean roughness Ra値 is 0.05 to 0.1, the ten-point average roughness Rz値 is 0.5 to 1.0/m, and the average wavelength Sm値 is 1 5~ 2 5 // m is also possible. Further, the maximum height R y 値 is 0. 4~1 . 0 // m, the arithmetic average roughness Ra 値 is 〇. 〇 4~0. 1 Ovm, the ten-point average roughness Rz 値 is 0.3 to 0.8 / / 5, the average wavelength Sm 値 is 8 ~ 1 5 / / m is also feasible, consider the maximum height Ry 値 8. 8~ 1 · 5 / m, the arithmetic mean roughness R a 値 is 0. 0 5~ 0.15 / / m, ten point average roughness Rz 値 is 0.7 ~ 1.3 / m, the average wavelength Sm 値 is 8 ~ 1 5 / / m also. Here, in general, in a liquid crystal device using the S T N (super-twisted filament) liquid crystal mode, a viewing angle at which the contrast ratio is high and good display characteristics can be obtained, and is limited to a relatively narrow angle. In other words, it is not necessary to scatter the reflected light to a wide angle region with poor visibility. Therefore, in the liquid crystal device using the S T N liquid crystal mode, it is preferable that the reflective film used has a reflection characteristic in which the reflected light is twisted in a relatively narrow range. Therefore, when a liquid crystal device of a liquid crystal device according to the present invention is used as a liquid crystal device of a S T N liquid crystal mode, it is preferable that the reflection property of the reflective film formed on the substrate has the above-described reflection characteristics, and the surface shape of the substrate is determined. Specifically, the Chinese National Standard (CNS) A4 specification (210 X 297 mm) is applied to this paper scale. (Please read the notes on the back first. 11 _Fill this page) -n ϋ 1 l·· ϋ ϋ ·ϋ · ϋ ϋ ϋ ϋ ϋ ·1 ϋ % 1252353 A7 B7 V. Description of invention (6) In the STN liquid crystal mode where the thickness of the liquid crystal layer is slightly inaccurate, the maximum height R y is preferably The tenth point average roughness R z 値 is controlled to be as small as possible while making the average wavelength S m 値 small. Thereby, the desired scattering characteristics can be obtained while controlling the thickness of the liquid crystal layer due to the mountain portions and the valley portions of the rough surface region. In addition, by reducing the arithmetic mean roughness R a , , it is possible to control the unevenness which should be caused by the thickness of the liquid crystal layer and the in-plane undulation. On the other hand, in a liquid crystal device using a TN mode or a SH (electrode surface vertical uniform) liquid crystal mode using a TN (twisted filament) liquid crystal mode or a λ/4 plate, a contrast with high contrast characteristics and high display characteristics can be obtained. The angle is a wide angle. Therefore, in the liquid crystal device using these liquid crystal modes, it is preferable that the reflective film used has a reflection characteristic in which the reflected light is twisted over a relatively wide range. Specifically, in the substrate for a liquid crystal device according to the present invention, at least one of the increase in the ten-point average roughness R 及 and the decrease in the average wavelength S m値 can be performed on the substrate. The upper reflective film has the above-described reflective properties. In the liquid crystal device using these liquid crystal modes, compared with the S T N liquid crystal mode, since the unevenness of the thickness of the liquid crystal layer has less influence on the display characteristics, the average wavelength of the bird is small. In order to solve the above problems, the liquid crystal device according to the present invention is characterized in that a liquid crystal layer is sandwiched between the substrate for liquid crystal device and the opposite substrate. According to the liquid crystal device described above, for example, by the correction mark formed on the flat region of the substrate for the liquid crystal device, the position of the liquid crystal device can be matched with the position of the opposite substrate to be highly accurate, so that the liquid crystal device should be used. Read the note on the back I - II Fill in this page) Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed This paper scale applies China National Standard (CNS) A4 specification (210 297 297 mm) 1252353 A7 B7 V. Invention Description (7 The liquid crystal mode can be used to arbitrarily select the shape of the rough surface area to obtain good display characteristics. Further, the present invention can also be implemented in accordance with the form of an electronic apparatus including the above liquid crystal device. Further, in order to solve the above problems, a method of manufacturing a liquid crystal device according to the present invention is characterized in that a portion of a surface of a liquid crystal layer of a substrate on the opposite side of the observation side is sandwiched by one of the liquid crystal layers. Covering the material, a region other than the region covered by the masking material is roughened into a rough surface region having fine mountain portions and valley portions, and the top portion of the mountain portion is included by the foregoing The rough surface area having a height below the plane of the area covered by the mask material is joined to the pair of substrates so that the rough surface area faces the other substrate. According to the substrate for a liquid crystal device obtained by such a production method, the same effects as described above can be obtained. Further, as the above-mentioned masking material, a resin-based adhesive such as photo-resistant uranium or a resorptive resin, a paint, or the like can be used. When the material having high adhesion to the substrate is used as a cover material, the boundary between the area covered by the cover material and the area other than the cover material can be clarified. In particular, when the region corresponding to the display region of the liquid crystal device is used as the opening portion of the masking material, the space between the flat region and the rough surface region is made clear, and the space between the display region and the sealing material forming region can be narrowed. And the display area accounts for the overall ratio of the liquid crystal device becomes large. Further, the above-mentioned photoresist, resin-based adhesive, paint, and the like can be easily removed by an alkaline solution or organic dissolved coal. Further, when the above material is used as a masking material, it is preferable to print the above-mentioned masking material on a substrate by using a printing plate of an aniline plate or a mesh plate. Thus, the paper size applies to the Chinese National Standard (CNS) A4 specification (210 x 297 mm) (please read the note on the back 3 to fill out this page) Write Taiyi 1_1 i·—1 mmml· emmm amm—一01, I 1_1 ·_ emme Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1252353 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 5, Invention Description (8) The mask material can be formed with high precision in the desired area . Alternatively, a masking material such as a dispenser or an ink nozzle may be used to form the mask material. Thus, it is not necessary to produce a printing plate because the models of the liquid crystal device are different, so that the manufacturing cost can be reduced. Further, since it is easy to draw an arbitrary shape, it is a particularly suitable method when forming a flat field of a special shape. Further, the material of the masking material is not limited to the above-mentioned resin material or the like. For example, it is also possible to use the film of a fusible film or an additional adhesive cut according to a predetermined shape as the above-mentioned mask by transfer-adhesive of the films. Thus, the mask material can be formed by using a very inexpensive material such as a composite film and an easy step. Further, in the above manufacturing method, it is preferable that the one substrate includes a first composition having a mesh shape and a second composition existing between the first composition nets, and when the roughening is performed, By using the treatment liquid having the difference in the dissolution rate of the first composition and the second composition, the one of the substrates is etched, and the shape of the first composition is formed in a region other than the area covered by the mask. The aforementioned mountain and valley. As described above, when roughening is performed in a region other than the above-mentioned mask covering region, it is possible to form a roughened region without requiring a vacuum-based device or an expensive device such as an exposure device. Further, as the treatment liquid, for example, any treatment liquid such as nitric acid, sulfuric acid, hydrochloric acid, hydrogen peroxide, hydrogen fluoride difluoride, fluorination atmosphere, ammonia nitrate, ammonium sulfate, hydrochloric acid ammonia or the like may be used or may be compounded. The treatment liquid is used in combination at a ratio specified to be suitable as a raw material of the substrate for a liquid crystal device to be treated. As a substrate for a liquid crystal device, for example, you can use Su (please read the note on the back -___ fill this page) > I ϋ ϋ el· i i_i -ϋ ϋ ϋ ϋ 1 ^1 ^1 1· Gift · Paper The scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1252353 A7 B7 V. Description of invention (9) Lime glass, borosilicate glass, phthalic acid glass, yttrium aluminum silicate glass, aluminum citrate Glass, etc. In general, when the substrate for a liquid crystal device is treated only with an aqueous solution of hydrofluoric acid (hydrogen fluoride), the entire surface of the substrate is uniformly etched, so that a rough surface region cannot be formed. However, by appropriately adding an auxiliary medicine which can selectively dissolve the constituents contained in the substrate for a liquid crystal device, a rough surface region having a plurality of fine mountain portions and valley portions can be formed. Further, the auxiliary medicine mixed in the treatment liquid is not limited to the above. In addition, it is preferable that the type of the treatment liquid, the mixing ratio, and the like are appropriately selected in accordance with the material of the substrate for the liquid crystal device to be treated. Here, when roughening is performed in the above-described manufacturing method, the granular member is caused to collide with the surface of the one substrate via the mask member, and is formed in a region covered by the mask member. The aforementioned mountain and valley. That is, a so-called sand blasting treatment is applied to the surface of one of the substrates. Here, as the masking material, for example, a metal plate such as stainless steel may be used as the opening. Such a masking material is generally inexpensive and has high durability, and has the advantage of greatly reducing the manufacturing cost. In addition, since the mask material can be easily removed after blasting, no additional steps are required for removing the mask material. Further, in each of the above-described manufacturing methods, it is preferable that the masking material is removed after the roughening, and the region covered by the concealing material and the rough surface region are etched. By such uranium engraving, the shape of the rough surface area can be adjusted to the desired shape. Here, when etching such as before the mask material is removed, there is a problem that the height difference between the rough surface area and the flat area is enlarged. As a result, when the above-described height difference becomes larger than the crystal gap of the liquid crystal device, the liquid crystal device substrate cannot be used in the liquid crystal device. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm). (Please read the note on the back first----write this page)

Al· in ϋ σν, I ϋ I ϋ ϋ I ·1 I Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing 1252353 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing 5, invention description (10). In response to this, by removing the mask material and applying uniform etching to both the rough surface region and the flat region, it is possible to suppress the difference in height difference between the two. Further, the present invention is a method for manufacturing a substrate for a liquid crystal device which is located on a side opposite to the observation side of a pair of substrates which hold the liquid crystal layer, and is characterized in that a part of the side surface of the liquid crystal layer is covered by the mask material And a region other than the region covered by the mask material is roughened into a rough surface region having a fine mountain portion and a valley portion, and the top portion of the mountain portion includes the mask material The rough surface area of the height below the area of the covered area. According to this manufacturing method, the same effects as those of the above-described liquid crystal device manufacturing method can be obtained. Further, in the method for producing a substrate for a liquid crystal device, the substrate for a liquid crystal device may include a first composition having a mesh shape and a second composition existing between the first composition nets. When the roughening is performed, the processing liquid having a different elution speed from the first composition and the second composition is used to etch the one of the substrates, thereby forming an area in a region other than the covering area of the mask. The mountain portion and the valley portion of the shape of the first composition. Further, when the roughening of the group is performed, the granular member may be interposed by interposing the mask on the surface of the substrate for liquid crystal device, and the region covered by the mask may be The area forms the aforementioned hills and valleys. In the method for manufacturing a substrate for a liquid crystal device, it is preferable that the mask member is removed after the roughening, and the region covered by the mask member and the rough surface region are etched. (Please read the note on the back first? Write this page) Order --------- The paper size of the book applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1252353 A7 B7 Ministry of Economics Printed by the Bureau of the Employees of the Property Bureau. V. Illustrated (11) [Simplified description of the drawings] Fig. 1A is a view showing the photoresist on the glass substrate in the manufacturing process of the liquid crystal display device according to the first embodiment of the present invention. The resulting plan view. Fig. 1B is a cross-sectional view taken along line A - A' in Fig. 1A. Fig. 1C is a cross-sectional view showing the surface of the glass substrate roughened in the manufacturing process of the liquid crystal display device according to the first embodiment of the present invention. Fig. 1D is a cross-sectional view showing the state in which the glass substrate is removed by photoresist in the manufacturing process of the liquid crystal display device according to the first embodiment of the present invention. Fig. 1E is a cross-sectional view showing a state in which a metal film is formed on a glass substrate in the manufacturing process of the liquid crystal display device according to the first embodiment of the present invention. Fig. 1F is a cross-sectional view showing a state in which a reflective film and a correction mark are formed on a glass substrate in the manufacturing process of the liquid crystal display device according to the first embodiment of the present invention. Fig. 2 is a photograph of a correction mark formed on a flat region on a glass substrate photographed by an optical microscope. Fig. 3A is a plan view showing a state in which a photoresist is formed on a glass substrate in the manufacturing process of the liquid crystal display device according to the second embodiment of the present invention. Fig. 3B is a cross-sectional view taken along line B - B' in Fig. 3A. Fig. 3C is a view showing the liquid crystal display according to the second embodiment of the present invention. [Please read the back of the first thing I - I I write this page)

--H ϋ ϋ Ml· ϋ 1 β I ϋ I 1 ϋ I 着 · This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1252353 A7 B7 V. Invention description (12) Device manufacturing In the step, a cross-sectional view of the surface of the glass substrate is roughened. Fig. 3D is a cross-sectional view showing the state after the photoresist removal on the glass substrate in the manufacturing process of the liquid crystal display device according to the second embodiment of the present invention. Fig. 3E is a cross-sectional view showing how the metal film on the glass substrate is formed in the manufacturing process of the liquid crystal display device according to the second embodiment of the present invention. Fig. 3F is a cross-sectional view showing the state in which the reflective film on the glass substrate and the correction mark are formed in the manufacturing process of the liquid crystal display device according to the second embodiment of the present invention. Fig. 4A is a plan view showing a state in which photoresist is formed on a glass substrate in the manufacturing process of the liquid crystal display device according to the third embodiment of the present invention. Figure 4B is a cross-sectional view taken along line C - C ' in Figure 4A. Fig. 4C is a cross-sectional view showing the surface of the glass substrate roughened in the manufacturing process of the liquid crystal display device according to the third embodiment of the present invention. Fig. 4D is a cross-sectional view showing the state in which the glass substrate is removed by photoresist in the manufacturing process of the liquid crystal display device according to the third embodiment of the present invention. Fig. 4E is a cross-sectional view showing a state in which a metal film is formed on a glass substrate in the manufacturing process of the liquid crystal display device according to the third embodiment of the present invention. This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) (please read the note on the back---write this page) Order--------- Ministry of Economic Affairs Intellectual Property Office staff Consumer Cooperatives Printed 1252353 A7 B7 Ministry of Economic Affairs Intellectual Property Office Employees Consumer Cooperatives Printed V. Illustrated (13) Figure 4F shows the reflection on the glass substrate in the manufacturing process of the liquid crystal display device according to the third embodiment of the present invention. A cross-sectional view of the film and the calibration mark. Fig. 5A is a cross-sectional view showing the composition of the glass substrate. Fig. 5B is a cross-sectional view showing a state in which a mask material is formed in the first manufacturing method of the substrate for a liquid crystal device according to the present invention. Fig. 5C is a cross-sectional view showing the glass substrate in a first hungry manner in the first manufacturing method described above. Fig. 5D is a cross-sectional view showing the state in which the mask material on the glass substrate is removed in the first manufacturing method described above. Fig. 5E is a cross-sectional view showing a state in which the glass substrate is subjected to the second etching in the first manufacturing method described above. Fig. 6A is a photograph of the surface of the glass substrate after the first etching in the first manufacturing method described above, which was photographed by an optical microscope. Fig. 6B is a photograph taken by an optical microscope on the surface of the glass substrate after the second etching in the first manufacturing method described above. Fig. 7 is a photograph of a lack of photographs taken by an optical microscope in the form of a rough surface region and a flat region formed by the above-described first manufacturing method. Fig. 8 is a graph showing the results of height measurement of the rough surface region and the flat region formed by the first manufacturing method described above. Fig. 9A is a cross-sectional view showing the composition of the glass substrate. Fig. 9B is a cross-sectional view showing the state in which the mask material is formed in the second manufacturing method of the substrate for a liquid crystal device according to the present invention. Figure 9C shows the etching process in the second manufacturing method described above (please read the notes on the back first. I l_iv i I Write this page)

-ϋ n ϋ IK ϋ If )αιν · in ϋ II ϋ ϋ an I «r· This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1252353 A7 B7 Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed five, invention description (14) look at the cross-sectional view. Fig. 9D is a cross-sectional view showing the state after the uranium engraving in the second manufacturing method described above. Fig. 9E is a cross-sectional view showing the state in which the mask material on the glass substrate is removed in the second manufacturing method described above. Fig. 1A is a plan view showing a state in which stainless steel is placed on a glass substrate in the third manufacturing method of the substrate for a liquid crystal device according to the present invention. Fig. 10B is a cross-sectional view taken along the line D - D' in Fig. 10A. Fig. 10C is a cross-sectional view showing a state in which the surface of the glass substrate is sprayed with the honing powder in the third manufacturing method described above. Fig. 10D is a cross-sectional view showing a rough surface region and a flat region formed on the glass substrate in the third manufacturing method described above. Fig. 1E is a cross-sectional view showing a state in which a metal film is formed on a glass substrate in the third manufacturing method described above. Fig. 10F is a cross-sectional view showing a state in which a reflective film and a correction mark are formed on a glass substrate in the above-described third manufacturing method. Fig. 1 is an enlarged cross-sectional view showing a rough surface of a substrate for a conventional liquid crystal device. Fig. 1 is a view showing an example of a configuration of a measuring device for measuring the reflection characteristics of the substrate for a liquid crystal device according to the present invention. Fig. 1 is a graph showing the reflection characteristics of the substrate for a liquid crystal device according to the present invention. Fig. 14 is a cross-sectional view showing the configuration of a liquid crystal device using a substrate for a liquid crystal device according to the present invention. (Please read the note on the back first) ^^: Fill in this page)

-I ·ϋ ϋ ai-1 ϋ emmm 一· ϋ 1 ϋ eamm I ·ϋ 1« I 谵 This paper scale applies to China National Standard (CNS) A4 specification (210 297 297 mm) 1252353 A7 B7 V. Description of invention ( 15) Fig. 15 is a cross-sectional view showing another example of a configuration of a liquid crystal device using a substrate for a liquid crystal device according to the present invention. Fig. 16A is a perspective view showing an example of a notebook computer using the liquid crystal device of the present invention. Fig. 16B is a perspective view showing an example of a mobile phone using the liquid crystal device of the present invention. Fig. 6C is a perspective view showing a wristwatch example using the liquid crystal device of the present invention. Main component comparison table (please read the note on the back of the page) Write the Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Print 1 Glass substrate 13a Photoresist 14 Flat area 11 Rough surface area 12a Metal film 15 Correction mark 12 Reflective film 13b Composite film 2 Mesh structure 3 Mesh modification 13 Mask material 10 Network structure 11a Valley 17 Stainless steel This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm)

-ϋ ϋ hl· I ·1-^°4· ϋ n I ϋ ϋ ^ ϋ I 1252353 A7 B7 V. Description of invention (16) Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 18 硏粉粉6 光倍计8 Liquid crystal layer 19 to 23 Reflection characteristics 101 Light shielding layer 102 Colored layer 103 Protective layer 104 Tightness enhancing layer 105 Transparent electrode 106 Orientation film 107 Phase shifting (medium) plate 108 Polarizing plate 100 Front substrate 200 Back substrate 201 Rough surface area 202 Flat area 203 Reflecting electrode 204 Orientation film 300 Sealing material 400 Liquid crystal 205 Reflecting film 206 Colored layer 207 Light-shielding layer 205a > Opening (Please read the back of the note first) - Install this page - -1 n el· ϋ ϋ I Playing 04···1 ϋ 1 ϋ II ϋ . Secret · This paper scale applies to China National Standard (CNS) A4 specification (210 297 297 mm) -19- 1252353 A7 B7 V. Invention description (17) 208 Protective layer 209 Tightening layer 210 Transparent electrode 211 Phase shifting (medium) board 212 Polarizing plate 500 Backlight 501 Fluorescent tube 502 Light guide plate 121 Liquid crystal device 122 Laptop 123 Input portion 124 Liquid crystal device 125 Mobile phone 126 Liquid crystal device 127 Watch ^1 1 ϋ al· ϋ ammmm ϋ-^-reJ ϋ ϋ ϋ ϋ I 1 ϋ I (Please read the note on the back ^^ fill out this page) Ministry of Economic Affairs Intellectual Property Office Staff Cooperatives Printing [Best Mode for Carrying Out the Invention] The following is a description of an embodiment of the present invention with reference to the drawings. A: A substrate for a liquid crystal device In the substrate for a liquid crystal device of the present invention, a rough surface region and a flat region are formed on the surface side in the direction opposite to the liquid crystal layer. Here, the rough surface area refers to a region having many fine protrusions and depressions on the surface. In addition, the fine protrusions in the rough surface area are hereinafter referred to as the mountain part, and the rough surface area is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm). 1252353 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative System 5, each of the fine recesses of the invention (18) is hereinafter referred to as a valley portion. On the other hand, a flat region refers to a region where the surface is flat. As will be described in detail later, in the substrate for a liquid crystal device according to the present invention, a correction mark or a conversion element or the like is formed in a flat region among one surface. In the following, first, the shape of the flat region in which these elements are to be formed and the method of manufacturing the same are shown by way of example. In the following, it is assumed that four liquid crystal device substrates are taken from a plurality of sides of one glass substrate. A - 1 : First Embodiment First, a method of manufacturing a substrate for a liquid crystal device according to a first embodiment of the present invention will be described with reference to FIGS. 1A to 1F. Further, in each of the drawings shown below, in order to make the size of each layer or each member recognizable on the drawing surface, the respective layers or members are respectively used in different scale sizes. First, the glass substrate 1 is prepared. In the glass substrate 1, a photoresist 13a as a mask is formed on the surface to be opposed to the liquid crystal direction. Specifically, in the present embodiment, as shown in FIGS. 1A and 1B, the surface of the glass substrate 1 is covered with a region other than the region corresponding to the display region of the liquid crystal device. Photoresist 1 3 a. Alternatively, for the formation of the photo-induced uranium 1 3 a ', for example, flexographic printing can be used. As will be described later, the region covered by the photoreceptor 13 3 a will become the flat region described above. Next, as shown in Fig. 1C, the region of the surface of the glass substrate 1 which is not covered by the photo-resistance 饨1 3 a is roughened. Further, the roughening treatment of the surface of the glass substrate 1 will be described later. (Please read the note on the back i I write this page) -κι ϋ ϋ ϋ · 1 ϋ 1 1 1_1 Β— 1 Secret · This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) ^h=· 1252353 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau Employees Consumption Cooperative Printed V. Inventive Note (19) Then, as shown in Fig. 1D, the photoresist 13a is removed. As a result, among the one surface of the glass substrate 1, the region where the photoresist 13 3 a is formed is the flat region 14 , and the other region is the rough region 1 1 〇 Next, as shown in FIG. A reflective metal film 12a is formed on the entire surface of the glass substrate 1 having the flat region 14 and the rough surface region 11. The metal film 12a is formed, for example, of a single metal such as aluminum or silver, or an alloy containing aluminum, silver or chromium as a main component. Then, as shown in Fig. 1F, the metal film 1 2 a is removed by leaving the area corresponding to the display area (i.e., the rough area) and the flat area. The pattern of the metal film 12 a is formed, for example, a photo-etching method can be used. The metal film on the rough surface region 1 1 among the metal films 1 2 a formed in the pattern becomes the reflection film 12. On the surface of the reflecting film 12, mountains and valleys which are reflected in the fine mountain portions and valley portions of the rough surface region 11 are formed. Namely, a scattering structure for reflecting the light reaching the reflection film 12 in a moderate scattering state is formed. On the other hand, the metal film on the flat region 14 is patterned to have a shape as shown in Fig. 2, and is used as the correction mark 15 for use. Further, Fig. 2 forms a photograph of the correction mark 15 on the flat region 14 taken by an optical microscope. The correction mark 15 is a mark used to match the position of each glass substrate to a desired position when bonding the glass substrate 1 and other substrates of the present invention. After the above-described processing, on the surface of the glass substrate 1 on which the reflective film 1 2 and the correction mark 15 are formed, an electrode or an alignment film which is electrically connected to the liquid crystal is formed. After that, the liquid is formed on the glass substrate 1. (Please read the back of the note first. M loading i I write this page) -i_i i_i el· ϋ ϋ ·_1^rej 1 ϋ 1 1 ϋ ϋ 1 «r This paper size applies to the Chinese National Standard (CNS) A4 specification (210 x 297 mm). 1252353 A7 B7 V. INSTRUCTIONS (20) The frame-like sealing material surrounding the display area of the crystal device. The sealing material is then interposed to bond the glass substrate 1 to other glass substrates. The liquid crystal is sealed between the glass substrates by the sealing material in the surrounding area, and then the liquid crystal devices are separately divided. Here, in the step of bonding a pair of glass substrates, the above-described correction mark 15 can be used. Specifically, as described below. On the other glass substrate in the opposite direction of the glass substrate 1, a correction mark to be applied to the correction mark 15 formed on the glass substrate 1 is formed. Next, the relative positions of the two glass substrates can be matched by adhering the alignment marks on the glass substrates of both sides in an anastomosis state. Here, in the bonding step, the correction mark is generally recognized by the reflected light from the correction mark. When this method is used, if the surface of the glass substrate formed by the correction mark is rough, the reflected light is diffused in a direction other than the identification direction, and the identification of the correction mark becomes difficult. In the case of the substrate for a liquid crystal device according to the present invention, since the correction mark 15 is formed in a flat region, such a problem does not occur. A-2: Second Embodiment Next, a method of manufacturing a substrate for a liquid crystal device according to a second embodiment of the present invention will be described with reference to FIGS. 3A to 3F. In the present embodiment, as shown in Figs. 3A and 3B, a circular photoresist 1 3 a as a mask is formed on two surfaces of the glass substrate 1. Then, as in the first embodiment, as shown in Fig. 3C, the region other than the region covered by the photoresist 1 3 a is roughened, and then the photoresist 13a is removed. As a result, the paper size of Figure 3D applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (please read the note on the back---write this page) --- Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1252353 A7 B7 V. Invention Description (21) shows that the two circular areas covered by the photoresist 1 3 a in the surface of the glass substrate 1 are The flat region 14 is on the other hand, except for the region being the rough surface region 1 1 . Next, as in the first embodiment, as shown in Fig. 3E, the metal film 12a is formed over the entire glass substrate 1. Then, as shown in Fig. 3F, the area corresponding to the display area and the minute portion in the flat area 14 are retained, and the metal film 1 2 a is removed. Among the metal films 1 2 a thus patterned, the metal film 1 2 a on the region corresponding to the display region becomes the reflective film 12, and on the other hand, the metal film 1 2 a on the flat region 14 is patterned. For example, the shape shown in FIG. 2 is formed to become the correction mark 15 . The subsequent manufacturing steps are the same as those of the above-described first embodiment, and the description thereof will be omitted. Further, in the present embodiment and the first embodiment, although photoresist is used as the mask material, for example, a resin such as an epoxy resin may be used as the mask material. A - 3: Third Embodiment Next, a method of manufacturing a substrate for a liquid crystal device according to a third embodiment of the present invention will be described with reference to FIGS. 4A to 4F. In the present embodiment, as shown in Figs. 4A and 4B, a composite film 13b as a mask is adhered to the central portion of each side of the glass substrate 1. Further, here, a composite film 1 3 b which is cut into a rectangular shape of 8 mm x 45 mm is used as an example. Next, as shown in Fig. 4C, the same as the above-described first embodiment. 'This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm). (Please read the back note first. )

-I- ·1 1^^OJ Μϋ ϋ ϋ ·ϋ ϋ ^1 _1 I Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1252353 A7 B7 V. Invention Description (22) Area covered by the composite film 1 3 b The composite film 13b (Fig. 4D) is removed while the other regions are roughened. As a result, the four rectangular regions covered by the composite film 1 3 b on the surface of the glass substrate 1 are the flat regions 14 and on the other hand, the other regions are the rough regions 11 . Then, similarly to the above-described first embodiment, a region corresponding to the display region among the rough surface regions 1 1 is formed as the reflection film 12, and on the other hand, a portion of the flat region 14 is formed as the correction mark 15 ( Figure 4E and Figure 4F). The subsequent manufacturing steps are the same as those in the first embodiment described above, and the description thereof will be omitted. B: Method of Forming Flat Area and Rough Surface Area Next, a specific method of forming the flat area 14 and the rough surface area 1 1 described above will be exemplified. B-1: First Manufacturing Method First, a first manufacturing method for forming the flat region 14 and the rough surface region 1 1 on the glass substrate 1 will be described with reference to FIGS. 5A to 5E. In the following, an example in which an aluminosilicate glass substrate is used as the glass substrate 1 is used. Here, Fig. 5A is a schematic cross-sectional structural view showing the glass substrate 1. As shown in the figure, the glass substrate 1 has a mesh-like structure 2 and a mesh-formed body 3 in which the mesh of the mesh-like structure 2 is filled. Here, the mesh-like structure 2, for example, by the copolymerization of tannic acid and alumina, is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (please read the note on the back first) ) Loading Tailei · Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1252353 A7 B7 V. Invention Description (23) Formed by the body, the mesh modification 3 is formed, for example, by magnesium oxide. First, before the formation of the mask material (the photoresist 13 a or the composite film 13 b in each of the above embodiments), the glass substrate 1 is washed. Net etching. Specifically, the glass substrate 1 is, for example, placed in an aqueous solution of hydrofluoric acid (hydrogen fluoride) of about 5 w % and immersed at a temperature of 25 ° C for about 5 seconds. Next, as shown in Fig. 5B, a mask member 13 is formed at a predetermined position on the surface of the glass substrate 1 which has been uniformly etched. Next, the glass substrate 1 is immersed in a supersaturated solution of alumina and magnesium oxide in a 30 wt% aqueous solution of hydrofluoric acid (hydrogen fluoride) at a temperature of 25 ° C for 30 seconds (hereinafter, this treatment is called "First etching"). In this treatment, a portion of the alumina in the mesh-like structure 2 is locally present, and the alumina in the super-saturated solution is precipitated, and the localized portion of the alumina in the mesh-modified body 3 is partially saturated. Magnesium oxide in the solution also precipitated. Then, as a result of the precipitation, as shown in Fig. 5C, a fine network structure 10 is formed. On the other hand, among the mesh-like structure 2 and the mesh-formed body 3, a component which is not saturated with the treatment liquid (that is, a component other than alumina and magnesium oxide) is formed, and hydrogen fluoride is formed. Oxygen attack. As a result, among the surfaces of the glass substrate 1, a valley portion 11a is formed in a region other than the region where the network structure 10 is formed. Here, Fig. 6A is a photograph taken by an optical microscope with the surface of the glass substrate 1 outside the region covered with the mask material 13 in this stage. In the same figure, the part with a thick color corresponds to the network structure 10, and the portion with a light color corresponds to the valley portion 1 1 a. This paper scale is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) (please read the note on the back page first). Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1252353 A7 B7 V. Invention Description (24) Next, as shown in Fig. 5D, the mask material 13 is removed. In the region where the mask member 13 is formed, since the first etching described above is not applied, it is a flat surface. Next, uniform etching is applied to the entire surface of the glass substrate 1 (hereinafter, this process is referred to as "second etching"). For example, preparing a 50 wt% aqueous solution of hydrofluoric acid (hydrogen fluoride) and a solution of 4 Ow % of an aqueous solution of ammonium fluoride in a specific gravity of 1:3, and placing the glass substrate 1 in the solution at 25 ° C. Immerse at a temperature of 20 seconds. By such processing, the fine protrusions formed in the network structure 10 and the valley portion 1 1 a are removed. Then, as shown in Fig. 5E, the mask material 13 in the glass substrate 1 is not formed, and is a rough surface region 1 1 having smooth mountains and valleys. Fig. 6B is a photograph taken by a light microscope in the surface of the glass substrate 1 at this stage. It can also be judged from the same figure that the second etching is performed on the glass substrate 1 after the first etching, and the surface is smoothed as compared with the surface after the first etching as shown in FIG. 6A. Rough surface. Further, Fig. 7 is a photograph taken by an optical microscope after the surface of the glass substrate 1 after the second etching is applied. In the same figure, it is confirmed that the region A formed by the mask member 13 is a flat flat region 14, and the region B is a rough surface region 11 having a fine mountain portion and a valley portion. However, the method of applying the second uranium engraving to the glass substrate 1 before the removal of the mask material 13 is also generally considered. However, in such a case, the area formed by the mask member 13 cannot be subjected to the second etching, and the area to be etched is a region other than the other. Then, as a result, the flat area 14 and the rough surface paper size apply to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (please read the note on the back - write this page) _ _ '·^-^ -·1 «ϋ I ϋ 1_§ J in 1_1 1_1 n Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1252353 A7 B7 V. Invention Description (2δ) Area 1 1 height difference, accompanied by 2nd etching And expand. When the height difference Δ between the flat region 14 and the rough surface region 1 1 of the glass substrate 1 is larger than the desired crystal gap of the liquid crystal device, the desired crystal gap cannot be obtained by using the glass substrate 1. In view of this, in the present embodiment, since the second uranium engraving is performed on the entire surface of the glass substrate 1 after the mask member 13 is removed, the difference between the flat region 14 and the rough surface region 1 1 can be avoided. expand. Fig. 8 is a graph showing the results of the surface shape (height) measurement of the surface of the glass substrate 1 shown in Fig. 7. As shown in Fig. 8, according to the above steps, the height difference between the flat region 14 and the rough surface region among the surfaces of the glass substrate 1 can be controlled to about 1 // m. Here, since the crystal gap of the liquid crystal device is about 5 // m, the glass substrate 1 obtained by the above steps can be used as a substrate of a general liquid crystal device without any problem. B - 2 : Second Manufacturing Method Next, a second manufacturing method for forming the flat region 14 and the rough surface region 1 1 on the glass substrate 1 will be described with reference to Figs. 9A to 9E. In addition, the following is an example when a soda lime glass substrate is used as the glass substrate 1. The glass substrate 1 is as shown in Fig. 9A, from the viewpoint of having the mesh-like structure 2 and the mesh-modified body 3 in which the mesh of the mesh-like structure 2 is filled. Although the glass substrate 1 is the same as the glass substrate 1 in the first manufacturing method described above, the mesh structure 2 is formed of tannic acid, and the mesh modified body 3 is formed of an alkali metal or an alkaline earth metal. The paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (please read the note on the back first) Fill in the page. Order-------- Ministry of Economic Affairs Intellectual Property Office staff consumption Cooperatives Printed 1252353 A7 B7 V. Inventive Note (26) The point is different from the glass substrate 1 in the above first manufacturing method. (Please read the cautions on the back side first. First, before the mask material 13 is formed in the flat region 14 to be formed, the glass substrate 1 is subjected to both etching. Specifically, the glass substrate 1 is It is placed in an aqueous solution of hydrofluoric acid (hydrogen fluoride) at a concentration of 5 wt%, and immersed at a temperature of 25 ° C for 5 seconds. Then, as shown in Fig. 9B, the glass substrate 1 should be flat. In the region of the region 14 4, a mask material 13 (photoresist 1 3 a or a composite film 1 3 b, etc.) is formed. Next, the glass substrate 1 contains hydrofluoric acid (hydrogen fluoride) at 3 Owt%. In an aqueous solution of 45 wt% of ammonia oxide, it is immersed at a temperature of 25 ° C for about 15 seconds. Here, as shown in Fig. 9 C, the constituents of the glass substrate 1 are formed, and the mesh modified body 3 is dissolved. The speed of the treatment liquid is faster than the speed at which the mesh structure 2 is dissolved in the treatment liquid. Therefore, when the glass substrate 1 is immersed in the treatment liquid described above, the etched area is applied as shown in Fig. 9D. (ie, the area covered by the non-masking material)' is a mountain formed by the mesh-like structure 2 And the rough surface area of the valley. After that, as shown in Fig. 9E, the mask material 1 3 ' is removed to obtain the glass substrate 1 having the flat area 14 and the rough area 1 1. Cooperative Printing B-3: Third Manufacturing Method Next, a third manufacturing method for forming the flat region 14 and the rough surface region 11 on the glass substrate 1 will be described with reference to FIGS. 1A to 10F. In addition, the following is an example when using a soda lime glass substrate as the glass substrate 1. This paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1252353 A7 B7 V. Invention Description (27) First, in On one side of the glass substrate 1, a stainless steel plate 17 having an opening is disposed. The stainless steel plate 17 has a function as a mask material, as shown in Figs. 10A and 1B, which should be The region in which the rough surface region 11 is formed has an opening portion. Next, as shown in Fig. 10C, a plurality of honing powders 18 are sprayed on the surface of the glass substrate 1 via the stainless steel plate 71. In this step, the glass substrate 1 is coated. Among the surface, in response to stainless steel plate 1 7 open In the area of the part, a large number of depressions are formed by the collision of the honing powder 18. On the other hand, in the area covered by the stainless steel plate 17, there is no conflict of the honing powder 18, so it becomes the original flat surface. Next, the glass substrate 1 is washed, that is, the glass powder sprayed on the glass substrate 1 or the glass powder generated by the collision of the honing powder 18 is removed. Then, the glass substrate 1 is immersed in the designation. In the treatment liquid, the glass substrate 1 is uniformly etched uniformly. As the above specified treatment liquid, for example, hydrofluoric acid (hydrogen fluoride) (50 wt%) and aqueous ammonia solution (40 wt%) are used. The treatment liquid having a specific gravity of 1:3 is subjected to the above treatment, and as shown in Fig. 1D, a glass substrate 1 in which the flat region 14 and the rough surface region 1 1 are selectively formed can be obtained. Thereafter, as in the first manufacturing method described above, a metal film 1 2 a is formed on the glass substrate 1 as shown in Fig. 1E. Then, the metal film 1 2 a is formed by a pattern, and as shown in Fig. 10F, a reflection film 12 and a correction mark 15 are formed. As described above, in the first to third manufacturing methods, the Chinese National Standard (CNS) A4 specification (210 X 297 mm) is applied by removing the size of the glass paper. "丨# (Please read the note on the back first) ^ Fill in this page) _装-----^ — 1— 订------- % Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1252353 A7 B7 V. Invention Description (2δ) Glass substrate 1 surface Most of the fine areas form the valleys of the rough surface area 11. As a result, in the glass substrate 1 obtained in each of the above-described manufacturing methods, the height of the top portion in the rough surface region 1 1 does not exceed the plane having the flat region. However, a conventional glass substrate used as a substrate for a liquid crystal device has a rough surface region of a mountain portion and a valley portion which are regularly formed. That is, as shown in Fig. 1, a mountain portion (or a valley portion of the same depth) having substantially the same height is formed on a rough surface of a conventional glass substrate, and each of the mountain portions is formed at substantially the same interval. Therefore, when the mutually parallel rays and the rays are incident on the rough surface at an angle, the reflected optical path of the light A reflected in the mountain is only shorter than the reflected optical path of the light B reflected by the valleys ( i + j). Then, due to the interference of the light generated by the optical path difference, there is a problem that the displayed image is not discolored. In view of this, in the substrate for a liquid crystal device according to the present invention, such a problem does not occur. In other words, in the first and second manufacturing methods, the irregular surface is formed on the glass substrate 1 in accordance with the shape of the mesh structure 2, and in the third manufacturing method, the honing powder 1 is used. The conflicting shape of 8 has an irregular rough surface formed on the glass substrate 1. Therefore, in any of the first, second, and third manufacturing methods, the height of each mountain portion and the depth of each valley portion are also different, and the distance between the top of one mountain portion and the top portion of the mountain portion adjacent thereto is also A rough surface area 1 1 will be formed differently for each mountain. As a result, the reflective film 12 formed on the rough surface region 1 1 can have good scattering characteristics. Furthermore, it is not limited to such a rough surface area 1 1 formed on the glass basic paper scale applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (please read the note on the back first - I Write this page) amme 1 I 08.* · _1 I ·ϋ ϋ ϋ ϋ Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed 1252353 A7 B7 V. Invention description (29) Surface of board 1, flat area 1 4 glass The surface of the substrate 1 is still flat. Therefore, an element which is desired to be formed on the surface, such as the correction mark 15 or the like, can be formed on the flat region 14. C: Reflection characteristics of the reflective film The reflection characteristics of the glass substrate 1 formed by the reflective film produced in the rough surface region by the above respective production methods will be described. Fig. 12 is a view showing a device for measuring reflection characteristics. As shown in the figure, in the measuring apparatus, the light 5 is irradiated onto the glass substrate 1 from an angle of 2 5 ° to the normal direction of the glass substrate 1. Next, the intensity of the light reflected by the reflection film 12 on the glass substrate 1 was measured using a light multiplier 6. Here, the measurement of the reflected light is performed while changing the normal direction of the light double meter 6 and the glass substrate 1 to the Θ angle. In addition, in this measurement, as the liquid crystal device is used, as shown in FIG. 2, the glass of the same material as the substrate is disposed on the surface side of the reflective film formed on the glass substrate 1. The substrate 2 (having a thickness of about 0. 7 mm) was measured in a state in which the liquid crystal layer was sandwiched between the substrates. Here, in the above-described first or second inspection method, the above-described measurement is performed on a plurality of glass substrates 1 having different conditions such as the type of etching treatment liquid and the etching time. Similarly, in the third manufacturing method, the glass substrate 1 having a plurality of conditions such as the particle size and the number of the honing agent is subjected to the above measurement. As a result, the representative reflection characteristics of the glass substrate 1 obtained by the above respective production methods are the reflection characteristics shown in Fig. 3 . Figure 1 3 shows the application of the Chinese National Standard (CNS) A4 specification (210 X 297 mm) for each of the above-mentioned glass substrates 1 with the light multiplier angle <9 and the use of the light paper size (please read the back of the note first)事--- Write this page) -I ϋ i_i l·» ϋ 1 1 1 H ϋ mm— ϋ , Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed 1252353 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing 5 OBJECT OF THE INVENTION (30) A graph showing the relationship between the intensity of reflected light measured by the multiplier. Further, the symbols 1 7 and 18 in Fig. 1 show the reflection characteristics of the commercially available reflectors which have been conventionally compared. However, such a reflector is a method in which a liquid crystal is sealed between a pair of substrates, and the substrate is attached in a subsequent manner. That is, it is not provided on the liquid crystal layer side as in the embodiment, but on the opposite side, and it is expected that attention can be paid to this point. As shown in the figure, according to the glass substrate 1 obtained by the above-described production method, it is judged by a simple manufacturing step that good reflection characteristics which are the same as or higher than those of the conventional reflecting plate can be obtained. Specifically, the following. First, when viewed from the reflection characteristic 1 shown in Fig. 3, most of the angles of the angle of view of the viewing angle when actually used as a liquid crystal device appear, and the intensity of the reflected light observed is higher than that of the market. The board is still strong. Therefore, according to the liquid crystal device using the substrate for a liquid crystal device obtained from the glass substrate 1 having the reflection property 19, good display characteristics can be obtained. Next, when viewed from the reflection characteristics 20 and 2 shown in Fig. 3, it is observed that reflected light having a strong intensity can be observed in a relatively narrow range. Thus, in a liquid crystal device employing a S T N (super-twisted filament) liquid crystal mode, a viewing angle of good display quality is obtained by high contrast, which is limited in principle to a relatively narrow range. In other words, the stronger light is not required to be reflected to an angular area wider than the viewing angle at which good display quality can be obtained. Therefore, the glass substrate 1 having the reflection characteristics 20 or 23 of Fig. 3 can be suitably used as the substrate of the liquid crystal device using the STN liquid crystal mode, and the reflection characteristics 2 1 and 2 2 in Fig. 3 are And other counters (please read the note on the back - write this page) -MM MB II * I ΜΙΜ Μ· I MM MM I The standard paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ) -33 - 1252353 A7 B7 Ministry of Economic Affairs, Intellectual Property Bureau, Staff Consumer Cooperatives, Printing 5, Inventions (31) Comparison of the characteristics of the radiation, showing a certain degree of intensity of reflected light in a relatively wide range. Here, in a liquid crystal device using a T N (twisted filament) liquid crystal mode or an S Η (electrode surface perpendicularly uniform) liquid crystal mode, a wider viewing angle can be obtained. Therefore, the glass substrate 1 having the reflection characteristics 2 1 or 2 2 of Fig. 3 can be used as a substrate of a liquid crystal device using a liquid crystal mode or an S Η liquid crystal mode. Further, the reflection characteristics of these glass substrates 1 can be regarded as the same as or lower than those of the conventional liquid crystal device substrate having the reflection characteristics 17 or 18 of Fig. 3. However, the conventional reflecting plate used as a comparison object in Fig. 3 is as described above, and is positioned on the opposite side to the liquid crystal. When such a reflecting plate is used, the optical path difference between the light reflected on the surface of the liquid crystal device substrate and the light reflected to the reflecting film through the liquid crystal layer is caused, so that there is a problem that the display image is double-imaged. In this case, in the substrate for a liquid crystal device according to the present invention, since a reflective film is formed on the liquid crystal side, such a problem does not occur. Therefore, in general, the glass substrate having the reflection characteristics 2 1 or 2 2 of Fig. 3 is suitably used as a substrate for a liquid crystal device. Then, the inventors of the present invention measured the respective characteristic amounts indicating the surface shape of the rough region using the surface roughness meter for each of the glass substrates 1 having the above-described respective reflection characteristics (symbols 19 to 2 3 ). The following description is made as the content of each feature amount of the measurement target. (1) Maximum height R y The maximum height R y represents a feature amount from the top of the highest mountain portion of the rough surface region to the height difference of the valley bottom of the deepest valley portion of the same region. This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (please read the note on the back first _____LI-write this page) Order --------- Secret 1252353 A7 ____B7 Five (Invention) (32) (2) Arithmetic mean roughness R a The arithmetic mean roughness R a is obtained by summing the absolute deviations from the specified average line to the measurement curve indicating the surface shape of the rough seam surface area. The average number. (3) Ten-point average roughness R z The ten-point average roughness Rz is the height average of the tops of the five tops of the mountain that are selected in order from the specified average line, and the depth is selected in order. The average depth of the depths of the valleys of the five valleys. (4) The average wavelength S m is a characteristic amount indicating a period average wavelength exceeding a mountain portion or a valley portion of a designated non-inductive zone centered on the average line. Further, in the present embodiment, the strip-shaped region having the width of 1% of the maximum height Ry is set to the non-inductive zone as the center line as the center line, and the average wavelength is measured. In addition, for each of these feature quantities, in JISY Japanese Industrial Standards) B0601 - 19 9 4, ISO (International Organization for Standardization) 4 6 8 - 1 9 8 2, IS 0 3274-1975, IS 0 4287/1 - 1984, Details are given in IS 0 4287/2 — 1984, IS 04288-1985. For the glass substrate 1 having the reflection characteristic of the above-mentioned Figure 3, the paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (please read the note on the back page first) Property Bureau employee consumption cooperative printing 1252353 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing 5, invention description (33), the measurement results of the above characteristics, the maximum height Ry = 0. 7 5 // m, arithmetic The average roughness R a = 0 . 0 9 # m, the ten-point average rough degree Rz = 0.7 //m, and the average wavelength Sm=l 7 //m. Further, each feature quantity of the glass substrate 1 having the reflection characteristic 20, the maximum height Ry = 0. 6 0 // m, arithmetic mean roughness R a = 〇.〇8//m, ten point average roughness Rz = 〇.45//m, average wavelength Sm = 1 1 //m. As described above, the glass substrate 1 having the reflection characteristics 20 is a suitable substrate for a liquid crystal device employing the S T N liquid crystal mode. From this, it is understood that the rough surface area of the substrate used in the liquid crystal device of the S T N liquid crystal mode is preferably such that the maximum heights Ry and R z are as small as possible. Further, by making the arithmetic mean roughness R a small, it is possible to suppress the unevenness caused by the inner surface undulation of the thickness of the liquid crystal layer. Next, each feature amount of the glass substrate 1 having the reflection property 21, the maximum height Ry = 1.75//m, the arithmetic mean roughness Ra = 0.24//m, the ten-point average roughness Rz = 1.57em, and the average wavelength Sm = 22//m. The characteristic quantity of the glass substrate 1 having the reflection characteristic 2 2, the maximum height Ry = 0.9 5 / / m, the arithmetic mean roughness · Ra = 〇. 1 2 / m, ten point average roughness Rz = O.85 / /m, average wavelength Sm As described above, the glass substrate 1 having the reflection characteristics 22 is a good substrate for a liquid crystal device using a TN type or S Η type liquid crystal mode. Therefore, it is understood that the rough surface area of the substrate used in the liquid crystal device of the Τ-type or S-type liquid crystal mode is preferably a shape in which the ten-point average roughness R ζ is relatively large, or the average wavelength S m is Become a comparison (please read the note on the back first - I write this page)

A— Mmmmm —Hi ϋ · i·— I § ϋ ϋ I The secret paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -30 - 1252353 A7 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative print _________Β7_____ V. Description of invention (34) Small shape. Further, each feature quantity of the glass substrate 1 having the reflection characteristic 23, the maximum height Ry = 0. 9 8 // πί, arithmetic mean roughness R a = 〇 · 1 3 / / m, ten point average roughness Rz = 0.80 / / m, the average wavelength Sm = 42 / / m. Thus, in response to the shape of the rough surface region of the substrate (glass substrate 1) of the liquid crystal device, the reflection characteristics of the reflective film formed in the region are determined. Therefore, it is preferable to determine the surface shape of the rough surface region in accordance with the liquid crystal mode to be used, and then select various conditions of the above respective manufacturing methods. D: Modifications The above embodiments of the present invention have been described. However, the above embodiments are merely examples, and the above embodiments may be modified without departing from the spirit and scope of the invention. As a modification, the following may be considered. (1) In the above embodiment, the correction mark used to match the position of the glass substrate and the other substrate is formed in the flat region of the glass substrate 1, but may be used for other corrections as follows. mark. In other words, the correction mark used for the following application may be formed on a flat region, for example, for forming a conversion element or the like, or for forming a pixel electrode or the like; forming a color layer, a protective layer, or a light shielding layer of the color filter; Oriented film coating; sealing material printing; cutting board; driving excitation for actual installation. Further, the formation on the flat area is not limited to the correction mark. That is (please read the note on the back to fill out this page). Binding--------- ^ This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1252353 A7 B7 V. Invention Note (35), it is also possible to form other elements which should be formed on a flat surface on a flat area. For example, it is also possible to form a production control mark or the like on a flat area. The production control mark refers to a mark used for controlling the production and production of the liquid crystal device, such as a batch number, a model number, or a mark which marks the processing conditions of various manufacturing processes. Furthermore, these production control flags may be either digitizers or bar coders, or 2-dimensional bar code avatars representing code definitions and the like. Furthermore, the formation on the flat area is not limited to being a mark. For example, when it is used for a substrate of an active matrix type liquid crystal device, wiring such as a scanning line or a data line or a conversion element representing a TFT or a TFD may be formed in a flat region. Further, the terminal of the semiconductor integrated circuit for liquid crystal driving can be formed in a flat region or as a sealing material. Further, the shape of the flat region is not limited to the shapes described in the first to third embodiments, and the shape of the flat region is preferably a shape of an element formed on the surface thereof. (2) In the above embodiment, the correction mark 15 is formed by forming the metal film a of the reflective film 12, but may be formed of other layers or members formed on the glass substrate 1. , to form a correction mark 15 . Namely, for example, a chrome or a color filter for forming a light shielding plate is used, and further, a correction mark 15 is formed by forming a metal such as molybdenum as a main component of the conversion element. Lit is also applicable to the above-mentioned production control mark, etc., in accordance with the Chinese National Standard (CNS) A4 specification (210 X 297 mm). (Please read the back of the note first.) -I ·ϋ 1· n I iai^WJ· mmmmm I ϋ _1 1 ϋ Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed 1252353 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing 5, invention description (36). E: Composition of liquid crystal device Next, an example in which a liquid crystal device is constituted by the substrate for a liquid crystal device according to each of the above embodiments will be described. In addition, the following is an example of the composition of a passive matrix type liquid crystal device. (1) Reflective liquid crystal device Fig. 14 is a cross-sectional view showing a configuration of a reflective liquid crystal device using a substrate for a liquid crystal device according to the present invention. As shown in the figure, the liquid crystal device is formed by bonding the front substrate 1 〇 and the rear substrate 200 to each other via a sealing material 300, and sealing the liquid crystal 40 〇 between the substrates. Liquid crystal 4 0 0 ^ is, for example, a filamentous liquid crystal having a specified twist angle. Here, in Fig. 14, the substrate for a liquid crystal device according to the present invention uses the back substrate 200. On the inner side of the front substrate 100 (the side of the liquid crystal 40 side), a light shielding layer 110, a colored layer 1 0 2, and a protective layer 1 〇 3 are formed. The colored layer 102 is a structure in which a resin material colored with any of R (red), G (green), and B (blue) is arranged in a predetermined pattern. The light-shielding layer 1 0 1 is a layer covering the light from the gap between the colored layers of the colored layer 1 0 2 . Further, the protective layer 103 not only protects the colored layer 102 but also plays a role of flattening the level difference between the respective colored patterns of the colored layer. Further, the adhesion promoting layer 1 〇 4 covering the surface of the protective layer 110 is used as a underpad to form a plurality of transparent electrodes 105. The transparent electrode 1 0 5 This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) · (Please read the back of the note first) Write this page ill·! II--- Etiquette 1252353 A7 B7 V. Inventive Note (37) is to form a strip-shaped electrode in a specified direction, formed by a transparent conductive material such as I τ〇. The surface of the adhesion promoting layer 10 4 on which the transparent electrodes 1 0 5 are formed is covered by the alignment film 106. The alignment film 106 is an organic film having a polyimine or the like and is subjected to a rubbing treatment in a liquid crystal orientation direction which is not required when a voltage is applied. On the other hand, a phase shifting (medium) plate 107 and a polarizing plate 108 are disposed on the outer surface of the front substrate 100. On the other hand, the back substrate 2 〇 基板 of the substrate for a liquid crystal device according to the present invention has a rough surface region 20 1 and a flat region 2 0 2 on the inner surface thereof. Next, a plurality of reflective electrodes 203 are formed in the rough surface region 2 0 1 . Specifically, each of the reflective electrodes 203 is a strip-shaped electrode that extends in a direction intersecting the direction in which the transparent electrode 105 extends. The surface of the rear substrate 200 on which the reflective electrode 203 is formed is covered with the alignment film 204 similar to the above-described alignment film 106. In such a composition, the light from the side of the front substrate 100 side is in the order of the polarizing plate 108, the phase shifting (medium) plate 107, the front substrate 100, the colored layer 1 0 2, and the liquid crystal 4500. After passing, the light is emitted from the front substrate 100 along the opposite path as reflected by the reflective electrode 302. Then, a reflective display is performed thereby. At this time, the orientation state of the liquid crystal 400 is controlled in accordance with the voltage applied between the transparent electrode 105 and the reflective electrode 2 0 3, so that the bright state and the dark state of the display image can be controlled. In addition, although the passive matrix type liquid crystal device is taken as an example in FIG. 14, the present invention can also be applied to the Chinese National Standard (CNS) A4 specification (210) which is provided with the representative TFT, TFD, and the like. χ 297 mm) (Please read the note on the back first---fill this page) Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed 1252353 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing 5, invention description (3δ An active matrix type liquid crystal device that converts components. At this time, the reflective electrode 203 in Fig. 14 is formed, for example, in a rectangular shape, and the switching element is connected to the wiring. Further, in the liquid crystal device provided with T F 做 as the conversion element, image formation of the transparent electrode 1 0 5 formed on the front substrate 1000 is not required. In this case, it is preferable that the wiring or the switching element as described above is formed in the flat region 202 in the back substrate 200 which is the substrate for a liquid crystal device according to the present invention. Further, the term "wiring" as used herein refers to a terminal including a semiconductor integrated circuit for driving a liquid crystal, in addition to a scanning line or an information line. Further, these elements to be formed on the flat region 220 are formed by the same steps as the formation of the correction mark 15 by the pattern of the metal film 1 2 a in the first and first F patterns. . That is, after the specified film (for example, a film of a transparent conductive material) is formed on the back substrate 200 including the flat region 220, the pattern is formed by etching or photo-etching the film. The wiring of the desired shape is formed on the flat region 2 0 2 and the element formed on the back substrate 200 is not limited thereto. For example, the sealing material '300' shown in Fig. 14 may also be formed on the flat region 202 of the rear substrate 200. (2) The transflective liquid crystal device has the advantage of being driven by low power in the reflective liquid crystal device shown in Fig. 4, but is generated when the external light is insufficient (please read first) Note on the back --- write this page)

-ϋ 1· al· ϋ ϋ H ϋ I ϋ 1 ϋ ϋ I This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) ττΤΤτ 1252353 A7 B7 V. Description of invention (39) Display will be dimmed The problem. In the transflective liquid crystal device shown below, the reflective display is performed when the external light is sufficient, and the transflective display is performed when the external light is not sufficient. Fig. 15 is a cross-sectional view showing a configuration of a reflective liquid crystal device using a substrate for liquid crystal mounting according to the present invention. In the liquid crystal device shown in Fig. 15, the same portions as those of the liquid crystal device shown in Fig. 4 are denoted by the same reference numerals, and their description will be omitted. A reflective film 205 having an opening portion 2 0 5 a is formed in the rough surface region 20 1 on the inner surface of the rear substrate 200 (the liquid crystal side 40). Next, a colored layer 205 and a light-shielding layer 207 are formed on the surface of the back substrate 200 formed by the reflective film 205. In Fig. 15, as the light shielding layer 207, although the color layer of the R, G, and B colors is overlapped by the color layer 206, in addition, it may be provided by a resin black pigment or a plurality of layers of chromium. Shading layer 2 0 7. Moreover, the protective layer 208 covering the colored layer 060 and the light-shielding layer 207 is a mountain portion formed on the colored layer 205 in response to the rough surface region 20 1 on the back substrate 2000. The valley is flattened. Further, a tightness enhancing layer 2 0 9 covering the protective layer 202 is used as a bottom pad to form a plurality of transparent electrodes 2 1 0. Each of the transparent electrodes 2 10 is extended in a direction intersecting with the transparent electrodes 1 0 5 on the front substrate 100, for example, by I TO or the like. On the other hand, a phase shifting (medium) plate 2 1 1 and a polarizing plate 2 1 2 are adhered to the outer surface of the rear substrate 200. Next, on the outer side of the polarizing plate 2 1 2, backlight 0 0 0 is disposed. The backlight 5 0 0 ' has a fluorescent tube 50 1 as a light source and the paper size from the fluorescent tube 5 0 1 is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (please Read the back of the note first 3 fill this page) Binding --------- Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing 1252353 A7 B7 V. Invention description (40) Light guide to the back substrate 2 0 0 The comprehensive light guide plate 5 0 2 . In addition to this, LED (Light Emitting Diode) or EL (Electro Luminescence) can also be used as backlight 50. In such a composition, the light incident from the side of the front substrate 1000 passes through the polarizing plate 108, the phase shifting (medium) plate 107, the transparent electrode 210, the coloring layer 206, and the like to reach the reflective film 205. After the reflection film 205 is reflected, light is emitted from the front substrate 100 in accordance with the path opposite thereto. On the other hand, the light emitted from the backlight 105 is passed through the polarizing plate 2 1 2, the phase shifting (medium) plate 2 1 1 to become a designated polarized light, and then passed through the opening portion of the reflecting film 250. 2 0 5 a, colored layer 206, liquid crystal 400, front substrate 100, phase shifting (medium) plate 10 7 and polarizing plate 1 〇8. Next, a penetrating display is performed thereby. Further, in Fig. 15, the transmissive display is realized by providing the opening portion 2 0 5 a of each pixel to the reflective film 2 0 5 , but it may be as follows. That is, instead of providing the opening portion 205a, the thickness of the reflective film 2 0 5 may be 15 to 20 nm, so that the function is as before and after the reflectance of 85%, and the transmittance is 1% or so. Reflect the reflector. Further, although the passive matrix type liquid crystal device is taken as an example in Fig. 15, the present invention is also applicable to an active matrix type liquid crystal device including conversion elements such as T F T and T F D . At this time, the transparent electrode 1 〇 5 in Fig. 15 is formed, for example, in a rectangular shape, and is connected to the wiring via a conversion element. Further, in the liquid crystal device having the TFT as the conversion element, it is not necessary to form the transparent electrode 1 〇 5 of the front substrate 1000. The paper size of the paper is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297).公) (Please read the note on the back to fill out this page) 丨_装% Ministry of Economic Affairs Intellectual Property Bureau Employees Consumption Cooperative Printed 1252353 Ministry of Economic Affairs Intellectual Property Bureau Employees Consumption Cooperative Printed A7 B7 V. Invention Description (41) Image form. Further, in this case, various wirings and the like are preferably formed on the flat region 2 0 2 among the back substrate 200. In the liquid crystal device shown in the above (1) and (2), when the front substrate 100 and the rear substrate 200 are joined, a correction mark formed on the back substrate 200 can be used. Since the correction mark is formed in the flat region 2 0 2 of the back substrate 200, the position of the back substrate 20 〇 and the front substrate 100 can be accurately matched. As a result, double shadow or display blur can be reduced, and display with high contrast ratio can be realized. F: Electronic machine Next, an electronic machine to which the liquid crystal device shown in the above example is applied will be described. Such liquid crystal devices as described above are used in various environments and are suitable for portable machines requiring low power consumption. First, Fig. 16A is a perspective view showing the composition of a portable computer of an example of an electronic apparatus. As shown in the figure, a liquid crystal device 1 2 1 according to the present invention is provided on the upper side of the main body of the portable computer 1 2 2, and an input unit 1 2 3 is provided on the lower side. In general, most of the touch panels are placed in front of the display portion of the laptop. Therefore, in the past, as long as it is a portable type, a transmissive liquid crystal device is used in most of the display unit. However, since the transmissive liquid crystal device often uses backlighting, the power consumption is large, and the battery life is shortened. In view of this, the liquid crystal device according to the present invention is also of a reflective type and a transflective type, and is suitable for a portable computer because the display is bright and vivid. Secondly, Figure 16B shows the paper size of the mobile phone that shows an example of an electronic device. The Chinese National Standard (CNS) A4 specification (210 X 297 mm) - ϋ · ϋ 1 ml · ϋ 1 ϋ ^ OJ Bi I A.— 1 ϋ ϋ I (Please read the note on the back ^ fill this page) Gift 1252353 A7 ____ B7 V. Invention Description (42) Compose the perspective. As shown in the figure, a liquid crystal device 1 2 4 according to the present invention is provided above the front surface of the main body of the mobile telephone 1 2 5 . The use of mobile phones is whether indoors or outdoors, but in all environments. Especially in cars, it is very dark, but the car at night is very dark. Therefore, as the display device for the display device, it is preferable to use a transflective type liquid crystal device which mainly uses a reflective type display having a low power consumption and then can use a transmissive display of auxiliary light as needed, that is, The liquid crystal device shown in Fig. 15. In the liquid crystal device 1 24, both the reflective display and the transmissive display are brighter than the conventional liquid crystal device, and the contrast display can be made high. The first picture shows the electronic device. The watches of the examples form a perspective view. As shown in the figure, a liquid crystal device 1 2 6 according to the present invention is provided at the center of the main body of the wristwatch 1 27 . An important point of view for the use of watches is a sense of quality. It is a matter of course that the liquid crystal device 126 is bright and has a high contrast, and the change in characteristics due to the wavelength of the light is small and the discoloration is small. Therefore, compared with the conventional liquid crystal device, it is possible to obtain a super-high-level display. (Please read the note on the back first.) Printed by the Intellectual Property Office of the Ministry of Economic Affairs, the Consumers' Cooperatives. This paper scale applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm).

Claims (1)

1252353 %年工月ti:丨修(愁)本本8 9 1 1 23 1 4 Patent Application Revision of Chinese Patent Application Revision of the Republic of China on February 5, 1949 1 · A substrate for a liquid crystal device, which is on the substrate The surface is provided with: a flat region formed by a flat region, and a rough region formed with a fine mountain portion and a valley portion, wherein the mountain portion in the rough surface region has a flat portion A substrate for a liquid crystal device having a height below the plane, wherein a metal film having the same material is formed in a portion of the flat region and the substrate surface of the rough surface region, and the metal film is formed in the rough surface region. A reflective film for a reflective display in which a specified mark is formed in the flat region. 2. The substrate for a liquid crystal device according to the first aspect of the patent application, wherein the designated mark is a correction mark. 3. The substrate for a liquid crystal device according to claim 1, wherein the designated mark is an engineering management mark. 4. The substrate for a liquid crystal device according to claim 1, wherein the wiring is formed in the flat region. 5. The substrate for a liquid crystal device according to claim 1, wherein a sealing material is formed in the flat region. 6. The substrate for a liquid crystal device according to claim 1, 2, 3, 4 or 5, wherein the maximum height Ry of the rough surface region is 0.2 to 3/m, and the arithmetic mean roughness Ra is 〇 0 2 to 0 · 3 " m, the aforementioned ten-point average roughness R z is 0 · 1 to 2. 5 // m, 2 1252353 The aforementioned average wavelength S m is 4 to 6 Ο // m. In the liquid crystal device substrate of the first, second, third, fourth or fifth aspect of the patent range, the maximum locality Ry of the rough surface region is 1 · 5 to 2.0 mm, and the arithmetic mean roughness R a is 〇. 5 to 0 · 3 μ m, the aforementioned ten-point average roughness R z is 1.3 to 1 · 8 μ m, and the aforementioned average wavelength S m is from 1 5 to 2 5 // m. 8 · As claimed in the patent range The substrate for liquid crystal device of item 2, 3, 4 or 5, wherein the maximum height Ry of the rough surface region is 0 · 7 to 1 · 2 // m, and the arithmetic mean roughness R a is 〇. 1 to 〇· 2 / / m, the aforementioned ten point average roughness Rz is 0 · 5 to 1 · 〇 M m, the aforementioned average wavelength S m is 3 5 to 5 0 / m m. 9 · Patent Application Nos. 1, 2, 3 , 4 or 5 items of liquid crystal device substrate 'where bu The maximum locality Ry of the rough surface region is 0.6 to 1.2./m, the arithmetic mean roughness Ra is 〇. 05 to 1.1 5//m, and the above ten-point average roughness Rz is 〇·5 The above-mentioned average wavelength S m is from 1 5 to 2 5 // m. 1〇. The substrate for a liquid crystal device according to claim 1, 2, 3, 4 or 5, wherein the aforementioned coarse The maximum height of the surface area R y is 〇.4 to 1 · 0 // m, the arithmetic mean roughness R a is 〇.04 to 0. 1 0//m, and the above ten-point average roughness Rz is 〇·3 To 0·8//m, the average wavelength Sm is 8 to 15/m 〇1 1 . The substrate for liquid crystal device of the first, second, third, fourth or fifth aspect of the patent application' The maximum degree of the region R y is -2- 3 1252353 〇 · 8 to 1 · 5 // m, the arithmetic mean roughness R a is 〇 · 05 to 0 · 15 / / m, the above ten point average roughness Rz 〇·7 to 1 · 3 // m, the above-mentioned average wavelength S m is 8 to 15 〇 1 2 · a liquid crystal device characterized by: holding a liquid crystal layer to constitute a substrate of a pair of substrates of the liquid crystal device 'is one of the scope of patent application Nos. 1 to 1 The liquid crystal substrate of the above-mentioned liquid crystal device substrate is formed on the liquid crystal layer side by the surface of the substrate on which the rough region is formed in the flat region. A method for producing a liquid crystal device according to the present invention is a method for producing a liquid crystal device in which a liquid crystal layer is held on a pair of substrates, and is characterized in that: one of the pair of substrates is located on the opposite side of the observation side a portion of the surface of the board on the side of the liquid crystal layer is covered by a masking material; and among the aforementioned surfaces, the area covered by the masking material has a mountainous portion and a valley portion having a fine shape, a process of removing the region other than the region covered by the masking material, and removing the height of the top portion of the mountain portion from the plane of the region covered by the masking material to remove the masking material; a process of forming a metal film on the surface of the substrate; and removing the metal film to leave the metal film in the region after the region and the region covered by the mask member, while being In the area covered by the masking material, a package of one crystal and a front cover of the square base are formed; and the thick portion is indicated by the finger -3- 4 41252353, and the roughening is performed in the foregoing Forming a reflective film for reflective display of the mining project in the region; and as to the roughened surface of the substrate region and the other of the opposite directions, the pre-engagement of said pair of substrates engineering. The method of manufacturing a liquid crystal device according to claim 13 wherein the one substrate comprises a first composition having a mesh shape and a second composition existing between the nets of the first composition. The roughening process is a treatment liquid for forming a different elution rate between the first composition and the second composition, and etching the one substrate to cover the mask material. In the region other than the region, the mountain portion and the valley portion corresponding to the shape of the first composition are formed. The method of manufacturing a liquid crystal device according to claim 13 wherein the roughening process is performed by impinging the granular member against the surface of the one of the substrates via the mask member. The area other than the area covered by the cover material forms the aforementioned mountain portion and valley portion. The method of manufacturing a liquid crystal device according to claim 13, wherein after the removal of the mask material, the area covered by the mask material and the rough surface The area is etched. A method of manufacturing a substrate for a liquid crystal device, comprising: a part of covering a surface of a substrate with a mask; and a surface of the surface covered by the mask material The region has a fine mountain portion and a valley portion, and a region other than the -4- 5 1252353 region covered by the mask material is roughened, and the top portion of the mountain portion is covered by the mask material. a process of removing the height of the region below the plane of the region; and a process of forming a metal film on the surface of the substrate; and removing the metal film to leave the metal film in the rough region and A partial region in the region covered by the mask member is simultaneously designated in the region covered by the mask material, and a project for forming a film for the reflective display in the roughened region. The method of manufacturing a liquid crystal device according to claim 17, wherein the substrate comprises: a first object having a mesh shape and a second composition existing between the nets of the first composition; In the above-described roughening process, a treatment liquid having a different elution rate is formed in the first composition and the second composition, and the base is etched to be outside the region covered by the mask member. The mountain portion and the valley portion corresponding to the shape of the first composition are formed. The method for manufacturing a liquid crystal device according to claim 17, wherein the roughening process is performed by the surface of the substrate by the grain member interposed therebetween. The area other than the area forms the aforementioned mountain and valley parts. The manufacturing method of the substrate for a device according to claim 17, wherein after the removal of the mask material, the area covered by the mask material and the rough The surface is etched. In the package, the post-integration field, the set of the counter-plates of the mark, the cover of the aforementioned plate-applying plate covers the area of the liquid crystal process -5-