CN1315011A - Substrate of liquid crystal display, method for manufacture thereof, liquid crystal display, method of manufacture thereof, and electronic device - Google Patents

Substrate of liquid crystal display, method for manufacture thereof, liquid crystal display, method of manufacture thereof, and electronic device Download PDF

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Publication number
CN1315011A
CN1315011A CN00801179A CN00801179A CN1315011A CN 1315011 A CN1315011 A CN 1315011A CN 00801179 A CN00801179 A CN 00801179A CN 00801179 A CN00801179 A CN 00801179A CN 1315011 A CN1315011 A CN 1315011A
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China
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mentioned
liquid
substrate
crystal apparatus
zone
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CN00801179A
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CN1183406C (en
Inventor
冈本英司
关琢巳
泷泽圭二
直野秀昭
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Seiko Epson Corp
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Seiko Epson Corp
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133553—Reflecting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13356—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements
    • G02F1/133565—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements inside the LC elements, i.e. between the cell substrates

Abstract

The back substrate opposite the front substrate, of a pair of substrates holding a liquid crystal layer between them, has one surface that includes a flat, smooth area and a roughened area having minute projections. The highest of the projections in the roughened area is below the level of the flat, smooth area.

Description

Liquid-crystal apparatus substrate, its manufacture method, liquid-crystal apparatus, its manufacture method and electronic installation
Technical field
The present invention relates to liquid-crystal apparatus substrate, its manufacture method, liquid-crystal apparatus, its manufacture method and electronic installation.
Technical background
Up to now, the liquid crystal indicator that can carry out the reflection-type demonstration is popularized.In such liquid-crystal apparatus, the exterior light of natural light or room lighting light etc. utilizes reflectance coating to make this light reflection from a positive side (observer's one side) incident, carries out reflection-type and shows.According to such structure,, can seek advantage of low power consumption so have owing to do not need to carry on the back the irradiation source.
At this, if the surface of above-mentioned reflectance coating is mirror-like, then background or room lighting etc. are mirrored in the image that the observer recognizes, can produce the problem that is difficult to see display image.Therefore, generally make the surface roughening that makes above-mentioned reflectance coating and make the moderately structure of scattering of reflected light.
Up to now, make such diffusing structure as described below.That is, at first, utilize the surface of the substrate of lapping compound abrading glass etc., on the surface of this substrate, form a plurality of fine mountain portions and paddy portion.Then, form above-mentioned reflectance coating on the face of roughening at this.Thus, the surface of reflectance coating becomes the uneven surface on the surface of having reflected glass substrate.Thereby, by the moderately scattering of reflected light quilt of reflectance coating generation.
But according to the method described above, the whole face of glass substrate has been roughened.Thereby, there is the problem have on the surface of roughening, form the alignment mark that should on smooth plane, form originally or on-off element etc.
In addition, in order to obtain good scattering properties, wish on the surface of roughening, to be irregularly formed Shan Hegu, but utilizing lapping compound to grind in the method for substrate, according to the particle diameter of lapping compound or grind direction etc., formed Shan Hegu regularly.Therefore, in said method, be difficult to obtain good scattering properties.
Like this, utilizing existing method to make under the situation of diffusing structure, can produce variety of issue.
Disclosure of an invention
The present invention In view of the foregoing carries out, its purpose be to provide can reduce result from substrate surface roughening to the dysgenic liquid-crystal apparatus of liquid-crystal apparatus with substrate, its manufacture method, liquid-crystal apparatus, its manufacture method and electronic installation.
In order to achieve the above object, the present invention is a kind of liquid-crystal apparatus substrate, be arranged in the clamping liquid crystal layer a pair of substrate with observe the opposite side of side, it is characterized in that: the rough surface zone that the surface of above-mentioned liquid crystal layer side has smooth flat site and formed fine mountain portion and paddy portion, the height at the top of the above-mentioned mountain portion in the above-mentioned rough surface zone is in below the plane that comprises above-mentioned flat site.
According to such liquid-crystal apparatus substrate, owing to formed the smooth zone of rough surface regional peace selectively, so on the rough surface zone, form reflectance coating, on the other hand, can on flat site, form and wish for example to form plane key element with good scattering properties.
Have, if the cell gap of consideration liquid-crystal apparatus etc., the difference of height of then wishing flat site and rough surface zone is below the 5 μ m again.
In addition, in order to obtain good reflection characteristic, in general, wish to be irregularly formed the mountain portion and the paddy portion in rough surface zone.Specifically, wish to form the rough surface zone like this, make the height of each mountain portion or the degree of depth difference of paddy portion, and the distance at the top of 1 mountain portion and the top of the mountain portion that is adjacent is different in each mountain portion.This be because, under the situation that has formed well-regulated mountain portion and paddy portion, because of the cause of reflection angle, take place because of path difference cause catoptrical painted, cause the deterioration of display characteristic.
At this, also can on the flat site of foregoing invention, form the mark of regulation.As the mark of this regulation, can consider for example alignment mark or process management mark etc.By making the structure that on flat site, forms these marks, compare with situation about on the rough surface zone, forming, have the advantage that can discern this mark reliably.
Have again,, for example can enumerate the alignment mark that the relative position consistency of two substrates is used at this liquid-crystal apparatus of fitting as alignment mark.In addition, also can on flat site, form the severing or the employed alignment mark when driving the installation of the SIC (semiconductor integrated circuit) that liquid-crystal apparatus uses of printing, the panel of coating, the encapsulant of formation, the alignment films of formation, color filter or the light shield layer of on-off element or pixel electrode etc.
On the other hand, as the process management mark, for example can enumerate the mark that the mark of the treatment conditions that show in expression batch number sign indicating number or machine number, the various manufacturing process etc. is used.In addition, as the process management mark, can enumerate various information value changes or the bar code change mark, or be the mark etc. of 2 dimension bar code figureizations of representative with identifying code etc.
At this, can on flat site of the present invention, form wiring.At this, so-called wiring is to comprise the wiring of sweep trace in the liquid-crystal apparatus of active matrix mode for example or data line etc. or be the notion of the on-off element of representative, the terminal of SIC (semiconductor integrated circuit) that liquid crystal drive is used etc. with TFT (thin film transistor (TFT)) or TFD (thin film diode) etc.If make the structure that on flat site, forms these wirings, then compare with situation about on the rough surface zone, forming, have the advantage of the discreteness of the characteristic that can suppress each key element.
Moreover, can on flat site of the present invention, form encapsulant.In encapsulant, contain spherical or bar-shaped liner in order to keep the gap between substrate usually with certain diameter, if but on rough surface, form encapsulant, then can not normally bring into play the function of liner.Have again, also can make on flat site each key element that illustrates more than forming or the multiple structure in the key element in addition.
In addition, in foregoing invention, wish that maximum height Ry, the arithmetic average roughness Ra in the rough surface zone, 10 mean roughness Rz and mean wavelength Sm are the values in the scope of regulation.That is, the surface configuration of wishing the rough surface zone becomes the shape that can utilize the reflectance coating that forms to obtain desirable reflection characteristic on this rough surface zone.Specifically, wish maximum height Ry, the arithmetic average roughness Ra in the rough surface zone, 10 mean roughness Rz and mean wavelength Sm value be combined as following combination.
At first, wish that maximum height Ry is 0.2 to 3 μ m, arithmetic average roughness Ra is 0.02 to 0.3 μ m, and 10 mean roughness Rz are 0.1 to 2.5 μ m, and mean wavelength Sm is 4 to 60 μ m.In addition, also can be, maximum height Ry be 1.5 to 2.0 μ m, and arithmetic average roughness Ra is 0.15 to 0.3 μ m, and 10 mean roughness Rz are 1.3 to 1.8 μ m, and mean wavelength Sm is 15 to 25 μ m.
Moreover, also can be, maximum height Ry is 0.7 to 1.2 μ m, and arithmetic average roughness Ra is 0.1 to 0.2 μ m, and 10 mean roughness Rz are 0.5 to 1.0 μ m, mean wavelength Sm is 35 to 50 μ m, perhaps, maximum height Ry is 0.6 to 1.2 μ m, and arithmetic average roughness Ra is 0.05 to 0.15 μ m, 10 mean roughness Rz are 0.5 to 1.0 μ m, and mean wavelength Sm is 15 to 25 μ m.
In addition, also can be, maximum height Ry is 0.4 to 1.0 μ m, and arithmetic average roughness Ra is 0.04 to 0.10 μ m, and 10 mean roughness Rz are 0.3 to 0.8 μ m, mean wavelength Sm is 8 to 15 μ m, can consider that also maximum height Ry is 0.8 to 1.5 μ m, arithmetic average roughness Ra is 0.05 to 0.15 μ m, 10 mean roughness Rz are 0.7 to 1.3 μ m, and mean wavelength Sm is 8 to 15 μ m.
At this, in general, in the liquid-crystal apparatus that has used STN (supertwist is to row) liquid crystal mode, the angle of visibility that can obtain high, the good display characteristic of contrast is defined in narrow angle.In other words, in principle, there is no need to make reflection light diffusing in the wide angular regions of identification difference.Thereby, in the liquid-crystal apparatus that has used the stn liquid crystal pattern, wish to make reflected light to narrow down to the reflectance coating of the reflection characteristic in the narrow scope.Thereby, in the liquid-crystal apparatus that has adopted the stn liquid crystal pattern, use liquid-crystal apparatus of the present invention with under the situation of substrate, wish to decide like this surface configuration of this substrate, make the reflection characteristic of the reflectance coating that on this substrate, forms become reflection characteristic as described above.Specifically, can produce display quality in the stn liquid crystal pattern of remarkable influence, wish to suppress maximum height Ry and 10 mean roughness Rz less as far as possible, simultaneously, reduce mean wavelength Sm in the very little skew of thickness of liquid crystal layer.By doing like this, can suppress to result from thickness irregular of the liquid crystal layer of the mountain portion in rough surface zone and paddy portion, can obtain desirable scattering properties simultaneously.Moreover, by reducing arithmetic average roughness Ra, can suppress corresponding irregular of the fluctuating with in the face of thickness of liquid crystal layer.
On the other hand, using TN (twisted-nematic) liquid crystal mode or merging to use in the liquid-crystal apparatus of the TN pattern of λ/4 slice, SH (super reverse in the same way) liquid crystal mode, the angle of visibility that can obtain high, the good display characteristic of contrast is present in the angle than broad.Thereby, in the liquid-crystal apparatus that has used these liquid crystal modes, wish to make strong reflection light diffusing to arrive the reflectance coating of reflection characteristic such in the scope than broad.Specifically, with in the substrate, at least one side in the increase by realizing 10 mean roughness Rz, the minimizing of mean wavelength Sm can make the reflectance coating that forms on this substrate have reflection characteristic as described above at liquid-crystal apparatus of the present invention.In the liquid-crystal apparatus that has used these liquid crystal modes, compare with the stn liquid crystal pattern, though the irregular influence to display characteristic of the thickness of liquid crystal layer is little, wish that above-mentioned mean wavelength is as far as possible little.
Moreover in order to solve above-mentioned problem, liquid-crystal apparatus of the present invention is characterised in that: at above-mentioned arbitrary liquid-crystal apparatus with clamping liquid crystal layer between substrate and the relative substrate and constitute.According to such liquid-crystal apparatus, for example utilize the alignment mark that forms on the flat site in the substrate at liquid-crystal apparatus, can carry out accurately overlapping with the position of above-mentioned counter substrate, simultaneously, the shape in rough surface zone can be easily selected according to the liquid crystal mode that adopts in this liquid-crystal apparatus, good display characteristic can be obtained.Have, the present invention also can utilize the such form of electronic installation that has possessed above-mentioned liquid-crystal apparatus to implement again.
In addition, in order to solve above-mentioned problem, in the manufacture method of liquid-crystal apparatus of the present invention, it is characterized in that: the part on surface of above-mentioned liquid crystal layer side of a substrate of a side opposite of utilizing masking material to cover to be arranged in a pair of substrate of clamping liquid crystal layer with observing side, roughened is carried out in the zone by beyond the covered zone of above-mentioned masking material in the above-mentioned surface, make it become rough surface zone with fine mountain portion and paddy portion, in this rough surface zone, the top of above-mentioned mountain portion is in the height that comprises by below the plane in the covered zone of above-mentioned masking material, above-mentioned a pair of substrate is engaged, make that an above-mentioned side's the face with above-mentioned rough surface zone of substrate is relative with another substrate.According to the liquid-crystal apparatus substrate that utilizes such manufacture method to obtain, can obtain and above-mentioned same effect.
Have again,, can use the resin series bonding agent of photoresist, epoxy resin etc. or coating etc. as above-mentioned masking material.Under the situation that the material that these and connecting airtight property of substrate is high uses as masking material, can make the zone that masked material covers and the border in addition zone become clear and definite.Particularly under the situation of zone that will be corresponding as the peristome of masking material with the viewing area of liquid-crystal apparatus, become clear and definite by the border that makes flat site and rough surface zone, the liner that viewing area and encapsulant are formed between the zone narrows down, so can increase viewing area shared ratio on whole of liquid-crystal apparatus.In addition, photoresist, resin series bonding agent or the coating etc. that disclose in above-mentioned also have the advantage that can easily utilize alkaline solution or organic solvent etc. to be removed.
Have again, under the situation that above-mentioned material is used as masking material, wish to utilize the galley of flexography version, grid version etc. on substrate, to print above-mentioned masking material.If do like this, can on desirable zone, form masking material accurately.Have again, in addition, also can use the direct describing device of dispenser, inkjet nozzle etc. to form masking material.If do like this, then owing to there is no need to be formed in different galley in each model of liquid-crystal apparatus, so can suppress manufacturing cost lower.In addition, owing to can easily carry out drawing of shape arbitrarily, under the situation of the flat site that forms special shape, be specially suitable method.
In addition, the material of masking material is not limited to resin material as described above etc.For example also can use by severing for the clinkering film of the shape of regulation or have bonding agent film, make above-mentioned masking material by shift pasting these films.If do like this, then can use the very cheap material of stacked film etc. and can utilize easy operation to form masking material.
Have again, in above-mentioned manufacture method, wish that an above-mentioned substrate comprises the 1st constituent with mesh shape and the 2nd constituent that exists between the net of the 1st constituent, when above-mentioned surface roughening, use is the different treating fluid of fusing speed in above-mentioned the 1st constituent and above-mentioned the 2nd constituent, by an above-mentioned substrate is carried out etching, in by the zone beyond the covered zone of above-mentioned masking material, form above-mentioned mountain portion and the paddy portion corresponding with the shape of above-mentioned the 1st constituent.If do like this, then when roughening is carried out in the zone that does not have masked material to cover, can form the rough surface zone and do not need to possess the device of the high price of the device of vacuum system or exposure device etc.Have again, as above-mentioned treating fluid, can be according to the raw material of the liquid-crystal apparatus that becomes process object with substrate, use ratio with suitable regulation to make up a certain or multiple liquid in for example nitric acid, sulfuric acid, hydrochloric acid, hydrogen peroxide, two ammonium hydrogen difluorides, ammonium fluoride, ammonium nitrate, ammonium sulfate, the hydrochloric acid ammonium etc.As the liquid-crystal apparatus substrate, can use for example soda-lime glass, pyrex, barium silicate glasses, barium aluminium oxide silicic acid glass, aluminium oxide silicic acid glass etc.In general, when only handling liquid-crystal apparatus and use substrate, owing to whole quilt of this substrate etching equably, so can not form the rough surface zone with hydrofluoric acid aqueous solution.But, make liquid-crystal apparatus fuse out such paramedicines selectively by suitably adding with the constituent that comprises in the substrate, can form and have a plurality of small mountain portions and the rough surface zone of paddy portion.Have, the paramedicines that is mixed in the treating fluid is not limited to above-mentioned medicine again.In addition, wish according to the material of the liquid-crystal apparatus that becomes process object with substrate, the suitably kind of selected each treating fluid or blending ratio etc.
At this, during surface roughening in above-mentioned manufacture method, also can consider in by the zone beyond the covered zone of this masking material, to form above-mentioned mountain portion and paddy portion by make the surface collision of a granular member and an above-mentioned substrate through above-mentioned masking material.That is, so-called blasting treatment is carried out on the surface of a substrate.At this,, for example can use the material that in the sheet metal of stainless steel etc., is provided with peristome as this masking material.Because in general such masking material is cheap, in addition, permanance is also high, so have the advantage that can reduce manufacturing cost significantly.Moreover, owing to masking material can easily take out after blasting treatment, so there is no need to remove in addition the operation that masking material is used.
Have again, in each above-mentioned manufacture method, wish behind above-mentioned surface roughening, to remove above-mentioned masking material, being carried out etching by covered zone of this masking material and above-mentioned rough surface zone.Utilize such etching, the shape adjustment in rough surface zone can be become desirable shape.At this, before removing masking material, carried out under the situation of such etching the problem that exists the difference of height between rough surface zone and the flat site to enlarge.Its result if above-mentioned difference of height is bigger than the desirable cell gap of liquid-crystal apparatus, then can not be used for this liquid-crystal apparatus with substrate with this liquid-crystal apparatus.Different therewith, after having removed masking material,, have the advantage of the expansion of the difference of height that can suppress both by the two carries out etching equably to the smooth zone of rough surface regional peace.
In addition, the present invention is the manufacture method of a kind of liquid-crystal apparatus with substrate, this liquid-crystal apparatus be arranged in substrate the clamping liquid crystal layer a pair of substrate with observe the opposite side of side, it is characterized in that: utilize masking material to cover the part on the surface of above-mentioned liquid crystal layer side, roughened is carried out in the zone by beyond the covered zone of above-mentioned masking material in this surface, make it become rough surface zone with fine mountain portion and paddy portion, in this rough surface zone, the top of above-mentioned mountain portion is in the height that comprises by below the plane in the covered zone of above-mentioned masking material.Utilize this manufacture method, also can obtain the effect same with the manufacture method of above-mentioned liquid-crystal apparatus.
In addition, use in the manufacture method of substrate at this liquid-crystal apparatus, also can make this liquid-crystal apparatus comprise the 1st constituent with mesh shape and the 2nd constituent that between the net of the 1st constituent, exists with substrate, when above-mentioned surface roughening, use is the different treating fluid of fusing speed in above-mentioned the 1st constituent and above-mentioned the 2nd constituent, by an above-mentioned substrate is carried out etching, in by the zone beyond the covered zone of above-mentioned masking material, form above-mentioned mountain portion and the paddy portion corresponding with the shape of above-mentioned the 1st constituent.In addition, when above-mentioned surface roughening, also can in by the zone beyond the covered zone of this masking material, form above-mentioned mountain portion and paddy portion by make the surface collision of a granular member and an above-mentioned substrate through above-mentioned masking material.
At this, with in the manufacture method of substrate, also wish behind above-mentioned surface roughening, to remove above-mentioned masking material, to being carried out etching by covered zone of this masking material and above-mentioned rough surface zone at above-mentioned liquid-crystal apparatus.
The simple declaration of accompanying drawing
Figure 1A is illustrated in the planimetric map that has formed the situation of photoresist in the manufacturing process of liquid crystal indicator of the 1st example of the present invention on glass substrate.
Figure 1B is A-A ' the line cut-open view among Figure 1A.
Fig. 1 C is illustrated in the sectional view that in the manufacturing process of liquid crystal indicator of the 1st example of the present invention the surface of glass substrate has been carried out the situation of roughening.
Fig. 1 D is illustrated in the sectional view of having removed the situation of photoresist in the manufacturing process of liquid crystal indicator of the 1st example of the present invention.
Fig. 1 E is illustrated in the sectional view that has formed the situation of metal film in the manufacturing process of liquid crystal indicator of the 1st example of the present invention on glass substrate.
Fig. 1 F is illustrated in the sectional view that has formed the situation of reflectance coating and alignment mark in the manufacturing process of liquid crystal indicator of the 1st example of the present invention on glass substrate.
Fig. 2 has carried out the optical microscope photograph of taking to the alignment mark that forms on the flat site on the glass substrate.
Fig. 3 A is illustrated in the planimetric map that has formed the situation of photoresist in the manufacturing process of liquid crystal indicator of the 2nd example of the present invention on glass substrate.
Fig. 3 B is B-B ' the line cut-open view among Fig. 3 A.
Fig. 3 C is illustrated in the sectional view that in the manufacturing process of liquid crystal indicator of the 2nd example of the present invention the surface of glass substrate has been carried out the situation of roughening.
Fig. 3 D is illustrated in the sectional view of having removed the situation of photoresist in the manufacturing process of liquid crystal indicator of the 2nd example of the present invention.
Fig. 3 E is illustrated in the sectional view that has formed the situation of metal film in the manufacturing process of liquid crystal indicator of the 2nd example of the present invention on glass substrate.
Fig. 3 F is illustrated in the sectional view that has formed the situation of reflectance coating and alignment mark in the manufacturing process of liquid crystal indicator of the 2nd example of the present invention on glass substrate.
Fig. 4 A is illustrated in the planimetric map that has formed the situation of stacked film in the manufacturing process of liquid crystal indicator of the 3rd example of the present invention on glass substrate.
Fig. 4 B is C-C ' the line cut-open view among Fig. 4 A.
Fig. 4 C is illustrated in the sectional view that in the manufacturing process of liquid crystal indicator of the 3rd example of the present invention the surface of glass substrate has been carried out the situation of roughening.
Fig. 4 D is illustrated in the sectional view of having removed the situation of stacked film in the manufacturing process of liquid crystal indicator of the 3rd example of the present invention.
Fig. 4 E is illustrated in the sectional view that has formed the situation of metal film in the manufacturing process of liquid crystal indicator of the 3rd example of the present invention on glass substrate.
Fig. 4 F is illustrated in the sectional view that has formed the situation of reflectance coating and alignment mark in the manufacturing process of liquid crystal indicator of the 3rd example of the present invention on glass substrate.
Fig. 5 A is the sectional view that schematically shows the structure of glass substrate.
Fig. 5 B is illustrated in the sectional view that has formed the situation of masking material in the 1st manufacture method of liquid-crystal apparatus of the present invention with substrate.
Fig. 5 C is illustrated in the sectional view that in above-mentioned the 1st manufacture method glass substrate has been carried out the situation of the 1st etching.
Fig. 5 D is illustrated in the sectional view of having removed the situation of the masking material on the glass substrate in above-mentioned the 1st manufacture method.
Fig. 5 E is illustrated in the sectional view that in above-mentioned the 1st manufacture method glass substrate has been carried out the situation of the 2nd etching.
Fig. 6 A has carried out the optical microscope photograph of taking to the surface of the glass substrate after the 1st etching in above-mentioned the 1st manufacture method.
Fig. 6 B has carried out the optical microscope photograph of taking to the surface of the glass substrate after the 2nd etching in above-mentioned the 1st manufacture method.
Fig. 7 has carried out the optical microscope photograph of taking to the situation in the smooth zone of rough surface regional peace that utilizes above-mentioned the 1st manufacture method formation.
Fig. 8 is the curve map that expression utilizes the measurement result of the height in the smooth zone of rough surface regional peace that above-mentioned the 1st manufacture method forms.
Fig. 9 A is the sectional view that schematically shows the structure of glass substrate.
Fig. 9 B is illustrated in the sectional view that has formed the situation of masking material in the 2nd manufacture method of liquid-crystal apparatus of the present invention with substrate on glass substrate.
Fig. 9 C is the sectional view of situation that is illustrated in the process of the etching in above-mentioned the 2nd manufacture method.
Fig. 9 D is the sectional view of the situation after the etching end that is illustrated in above-mentioned the 2nd manufacture method.
Fig. 9 E is illustrated in the sectional view of having removed the situation of the masking material on the glass substrate in above-mentioned the 2nd manufacture method.
Figure 10 A is illustrated in the planimetric map that has disposed the situation of corrosion resistant plate in the 3rd manufacture method of liquid-crystal apparatus of the present invention with substrate on glass substrate.
Figure 10 B is D-D ' the line cut-open view among Figure 10 A.
Figure 10 C is illustrated in the sectional view of in above-mentioned the 3rd manufacture method surface of glass substrate having been sprayed the situation of lapping powder.
Figure 10 D is illustrated in the sectional view that has formed the situation in flat site and rough surface zone in above-mentioned the 3rd manufacture method on glass substrate.
Figure 10 E is illustrated in the sectional view that has formed the situation of metal film in above-mentioned the 3rd manufacture method on glass substrate.
Figure 10 F is illustrated in the sectional view that has formed the situation of reflectance coating and alignment mark in above-mentioned the 3rd manufacture method on glass substrate.
Figure 11 is the sectional view that illustrates after the uneven surface amplification of existing liquid-crystal apparatus with substrate.
Figure 12 is the figure that illustration is measured the structure of the determinator that liquid-crystal apparatus of the present invention uses with the reflection characteristic of substrate.
Figure 13 is the curve map of expression liquid-crystal apparatus of the present invention with the reflection characteristic of substrate.
Figure 14 is that illustration has been used the sectional view of liquid-crystal apparatus of the present invention with the structure of the liquid-crystal apparatus of substrate.
Figure 15 is that illustration has been used the sectional view of liquid-crystal apparatus of the present invention with another structure of the liquid-crystal apparatus of substrate.
Figure 16 A is the oblique view that illustration has been used the notebook personal computer of liquid-crystal apparatus of the present invention.
Figure 16 B is the oblique view that carries communication terminal that illustration has been used liquid-crystal apparatus of the present invention.
Figure 16 C is the oblique view that illustration has been used the wrist-watch of liquid-crystal apparatus of the present invention.
The optimal morphology that is used to carry out an invention
Below, with reference to description of drawings example of the present invention.
A: liquid-crystal apparatus substrate
Liquid-crystal apparatus of the present invention with substrate on, forming the smooth zone of rough surface regional peace with the opposed surperficial side of liquid crystal layer.At this, so-called rough surface zone is to have a plurality of fine projections and the zone of depression from the teeth outwards.Have, each of fine projection that below will be on the rough surface zone is called mountain portion again, and each of the fine depression on the rough surface zone is called paddy portion.On the other hand, so-called flat site is that the surface is smooth zone.Details is narrated in the back, but uses in the substrate at liquid-crystal apparatus of the present invention, forms alignment mark or on-off element etc. on the flat site in a surface.Below, at first form the shape of the flat site that these each key elements use with the summary illustration of this manufacture method.Have again, below, imagination is made the situation of 4 liquid-crystal apparatus with substrate by 1 sheet glass substrate in the multiaspect mode.
A-1: the 1st example
At first, with reference to Figure 1A to Fig. 1 F, the manufacture method of the liquid-crystal apparatus of the 1st example of the present invention with substrate is described.Have again, in following each figure that illustrates, because each layer or each member are made the size of discernible degree on drawing, so make every layer or each member engineer's scale difference.
At first, prepare glass substrate 1.This glass substrate 1 should with the opposed surface of liquid crystal on form photoresist 13a as masking material.Specifically, in this example, as shown in Figure 1A and Figure 1B, photoresist 13a is formed the shape in the surface of cover glass substrate 1 except the extra-regional zone suitable with the viewing area of liquid-crystal apparatus.Have again, in the formation of this photoresist 13a, can use for example flexography method.As described later, the zone that is covered by this photoresist 13a becomes above-mentioned flat site.
Then, as shown in Fig. 1 C, roughening is carried out in the zone that is not covered by photoresist 13a in the surface of glass substrate 1.Have again, about the roughened on the surface of glass substrate 1, narration in the back.
Secondly, as shown in Fig. 1 D, remove photoresist 13a.Its result, the formation in the surface of glass substrate 1 zone of photoresist 13a become flat site 14, zone in addition becomes rough surface zone 11.
Then, as shown in Fig. 1 E, formation has reflexive metal film 12a on whole of the glass substrate 1 with flat site 14 and rough surface zone 11.Alloy that this metal film 12a for example is principal ingredient by elemental metals or aluminium, silver or the chromium etc. of aluminium or silver etc. etc. forms.
Secondly, as shown in Fig. 1 F, stay the zone of the part in zone suitable (that is, rough surface zone 11) and the flat site 14, remove metal film 12a with the viewing area.For the composition of this metal film 12a, for example can use photoetching process.The metal film that is present on the rough surface zone 11 among the patterned by this way metal film 12a becomes reflectance coating 12.On the surface of this reflectance coating 12, form and reflected the fine mountain portion in rough surface zone 11 and the Shan Hegu of paddy portion.That is, formation makes the light that arrives this reflectance coating 12 reflect the diffusing structure of usefulness under the state of moderately scattering.On the other hand, the metal film on the flat site 14 is patterned into example shape as shown in Figure 2, is used as alignment mark 15.Have, Fig. 2 has carried out the optical microscope photograph of taking to the alignment mark 15 that forms on flat site 14 again.When the glass substrate 1 of this example is fitted with another glass substrate, this alignment mark 15 is used for the position of each glass substrate is overlapped desirable position.
After the above processing that illustrates, on the surface of the glass substrate 1 that has formed reflectance coating 12 and alignment mark 15, form liquid crystal is applied electrode that electric field uses or alignment films etc., on this glass substrate 1 form the encapsulant of frame shape, make the suitable zone, viewing area of its encirclement and each liquid-crystal apparatus thereafter.Then, through sealing material fit this glass substrate 1 and another glass substrate.Between a pair of glass substrate of having fitted by this way and in sealed material area surrounded, enclose liquid crystal, thereafter, be divided into each liquid-crystal apparatus.
At this, in the operation of a pair of glass substrate of fitting, use above-mentioned alignment mark 15.Specifically, as described below.With glass substrate 1 opposed another glass substrate on form the alignment mark corresponding with the alignment mark 15 of formation on glass substrate 1.Then, by under the state that makes the alignment mark unanimity on both sides' the glass substrate, fitting, the relative position of two glass substrates is overlapped.At this, in this bonding process, general using is discerned this alignment mark from the reflected light of alignment mark.Under the situation of having used this method, if roughening is carried out on the surface of the glass substrate that formed alignment mark, then reflected light diffuses to the direction beyond the identification direction, the identification of the alignment mark difficulty that becomes.Different therewith, according to liquid-crystal apparatus substrate of the present invention, owing on flat site 14, form alignment mark 15, so do not produce such problem.
A-2: the 2nd example
Secondly, with reference to Fig. 3 A to Fig. 3 F, the manufacture method of the liquid-crystal apparatus of the 2nd example of the present invention with substrate is described.
In this example, as shown in Fig. 3 A and Fig. 3 B, on lip-deep 2 positions of glass substrate 1, form circular photoresist 13a as masking material.Then, identical with above-mentioned the 1st example, as shown in Fig. 3 C, surface roughening is carried out in the zone beyond the zone that is covered by photoresist 13a, remove this photoresist 13a.Its result, as shown in Fig. 3 D, 2 border circular areas that covered by photoresist 13a in glass substrate 1 surface become flat site 14, and on the other hand, zone in addition becomes rough surface zone 11.
Secondly, identical with above-mentioned the 1st example, as shown in Fig. 3 E, on whole of glass substrate 1, form metal film 12a.Then, as shown in Fig. 3 F, stay the small part in the regional peace suitable smooth regional 14, remove this metal film 12a with the viewing area.Metal film on the zone suitable with the viewing area among the patterned by this way metal film 12a becomes reflectance coating 12, and on the other hand, the metal film 12a on the flat site 14 for example is patterned to the shape shown in Fig. 2, becomes alignment mark 15.Because later manufacturing process is identical with above-mentioned the 1st example, its explanation of Therefore, omited.
Have, used photoresist as masking material in this example and above-mentioned the 1st example, but in addition, the resin material that also can use epoxy resin etc. for example is as masking material.
A-3: the 3rd example
Secondly, with reference to Fig. 4 A to Fig. 4 F, the manufacture method of the liquid-crystal apparatus of the 3rd example of the present invention with substrate is described.
In this example, as shown in Fig. 4 A and Fig. 4 B, patch laminate film 13b is as masking material on the central portion on the individual limit of glass substrate 1.Have again, at this, illustration use the situation of severing as the rectangular stacked film 13b of 8mm * 45mm.
Then, identical with above-mentioned the 1st example as shown in Fig. 4 C, surface roughening is carried out in the zone beyond the zone that is covered by this stacked film 13b, simultaneously, remove this stacked film 13b (Fig. 4 D).Its result, 4 rectangular areas that the stacked film 13b in glass substrate 1 surface covers become flat site 14, and on the other hand, zone in addition becomes rough surface zone 11.
Secondly, identical with above-mentioned the 1st example, form reflectance coating 12 in the zone suitable in rough surface zone 11 with the viewing area, on the other hand, on the part of flat site 14, form alignment mark 15 (Fig. 4 E and Fig. 4 F).Later manufacturing process is identical with above-mentioned the 1st example, its explanation of Therefore, omited.
B: the formation method in flat site and rough surface zone
Secondly, the concrete formation method in flat site 14 that illustration is above-mentioned and rough surface zone 11.
B-1: the 1st manufacture method
At first, with reference to Fig. 5 A to Fig. 5 E, the 1st manufacture method that forms flat site 14 and rough surface zone 11 usefulness on glass substrate 1 is described.Have, following, illustration has been used the situation of aluminium oxide silicic acid glass substrate as glass substrate 1 again.
At this, Fig. 5 A schematically shows the cross-section structure of glass substrate 1.As shown in this Fig, this glass substrate 1 has fenestral fabric body 2 and modifies body 3 with the grid that the mode between the grid that is embedded in this fenestral fabric body 2 exists.Wherein, fenestral fabric body 2 is for example formed by the interpolymer of silicic acid and aluminium oxide, and grid is modified body 3 and formed by for example magnesium oxide etc.
At first, forming the masking material (photoresist 13a in above-mentioned each example or stacked film 13b etc.) shown in above-mentioned each example before, glass substrate 1 is being carried out the etching that double as cleans.Specifically, glass substrate 1 be impregnated in about 5 seconds in the hydrofluoric acid aqueous solution of for example about 5wt% (percentage by weight) under 25 ℃.
Secondly, as shown in Fig. 5 B, on the position of the lip-deep regulation of the glass substrate 1 that has carried out uniform etching, form masking material 13.
Then, this glass substrate 1 be impregnated in about 30 seconds in the aluminium oxide of for example about 30wt% hydrofluoric acid aqueous solution and the magnesian supersaturated solution (below, this processing is called " the 1st etching ") under 25 ℃.In this is handled, separate out in the local part that exists of the aluminium oxide of the aluminium oxide in the supersaturated solution in fenestral fabric body 2, simultaneously, separate out in the local part that exists of magnesium oxide of the magnesium oxide in the supersaturated solution in grid modification body 3.Then, as shown in Fig. 5 C, because this result who separates out forms fine network 10.On the other hand, the part that is formed by the composition that is not dissolved by supersaturation in treating fluid (that is the composition beyond aluminium oxide and the magnesium oxide) in fenestral fabric body 2 and the grid modification body 3 is corroded by hydrofluorite.Then because this result, the formation in the surface of glass substrate 1 form the paddy 11a of portion in the zone beyond the above-mentioned network 10.At this, Fig. 6 A has carried out the optical microscope photograph of taking to the situation on the surface of the glass substrate 1 beyond the masked material 13 covered zones in this stage.In the figure, dark part is equivalent to network 10, and light part is equivalent to the 11a of paddy portion.
Then, as shown in Fig. 5 D, remove masking material 13.Owing in the zone that has formed masking material 13, do not carry out above-mentioned the 1st etching, so become smooth surface.
Secondly, the whole face of glass substrate 1 is carried out uniform etching (below, this processing is called " the 2nd etching ").For example, prepare to have mixed at 1: 3 the solution of the ammonium fluoride aqueous solution of the hydrofluoric acid aqueous solution of 50wt% and 40wt%, under 25 ℃, glass substrate 1 be impregnated in about 20 seconds in this solution with weight ratio.Utilize such processing, the fine jut of removing above-mentioned network 10 and in the 11a of paddy portion, forming.Then, its result is as shown in Fig. 5 E, and the zone that does not form masking material 13 in the glass substrate 1 becomes the rough surface zone 11 with level and smooth mountain portion and paddy portion.Fig. 6 B has carried out the optical microscope photograph of taking to the situation on the surface of the glass substrate in this stage 1.As interpretable from this figure, by the glass substrate after the 1st etching 1 is carried out the 2nd etching again, with surface ratio after the 1st etching shown in Fig. 6 A, form level and smooth uneven surface.
In addition, Fig. 7 has carried out the optical microscope photograph of taking to the situation on the surface of having carried out the glass substrate 1 after the 2nd etching.Can confirm that in the figure the regional A that has formed masking material 13 becomes smooth flat site 14, area B in addition becomes the rough surface zone 11 with fine mountain portion and paddy portion.
But, also can consider before the removing of masking material 13 glass substrate 1 is carried out the 2nd etching.But under these circumstances, just in the zone that has formed masking material 13, do not carry out the 2nd etching, in zone in addition, carry out etching.Then, because this result, flat site 14 is followed the 2nd etching with the difference of height in rough surface zone 11 and is enlarged.At this,, then in the device that has used this glass substrate 1, can not obtain desirable cell gap if the flat site 14 in glass substrate 1 is bigger than the desirable cell gap of liquid-crystal apparatus with the difference of height in rough surface zone 11.
Different therewith, in this example,, enlarge so can avoid the difference of height in flat site 14 and rough surface zone 11 because the whole face to glass substrate 1 carries out the 2nd etching after having removed masking material 13.Fig. 8 is the curve map of measurement result of surface configuration (highly) on the surface of the glass substrate 1 shown in the presentation graphs 7.As shown in Figure 8, according to above-mentioned operation, the difference of height in flat site in glass substrate 1 surface 14 and rough surface zone 11 can be suppressed be about 1 μ m.At this, because the cell gap of general liquid-crystal apparatus is about 5 μ m, so the glass substrate 1 that utilizes above-mentioned operation to obtain can be used as the substrate of general liquid-crystal apparatus no problemly.
B-2: the 2nd manufacture method
Secondly, with reference to Fig. 9 A to Fig. 9 E, the 2nd manufacture method that forms flat site 14 and rough surface zone 11 usefulness on glass substrate 1 is described.Have, following, illustration has been used the situation of soda-lime glass substrate as glass substrate 1 again.
As shown in Fig. 9 A, this glass substrate 1 has fenestral fabric body 2 and modifies body 3 with the grid that the mode between the grid that is embedded in this fenestral fabric body 2 exists, identical with glass substrate 1 in above-mentioned the 1st manufacture method in this, but fenestral fabric body 2 is formed by silicic acid, on the other hand, grid is modified body 3 and formed by alkaline metal or alkaline-earth metal, and is different with the glass substrate 1 in above-mentioned the 1st manufacture method in this.
At first, in the zone that should form flat site 14, form before the masking material 13, glass substrate 1 is carried out the etching that double as cleans.Specifically, glass substrate 1 be impregnated in about 5 seconds in the hydrofluoric acid aqueous solution of about 5wt% for example under 25 ℃.Then, as shown in Fig. 9 B, form masking material 13 (photoresist or stacked film etc.) in the zone that should form flat site 14 in the surface of glass substrate 1.
Secondly, about 15 seconds in the treating fluid of 25 ℃ of two ammonium hydrogen difluorides that down this glass substrate 1 be impregnated in the hydrofluoric acid aqueous solution that comprises 30wt%, 45wt%.At this, as shown in Fig. 9 C, constitute in the composition of glass substrate 1, the speed that grid modification body 3 dissolves in above-mentioned treating fluid is faster than the speed that fenestral fabric body 2 dissolves in above-mentioned treating fluid.Thereby, if glass substrate 1 be impregnated in the above-mentioned treating fluid, then as shown in Fig. 9 D, the zone (that is the zone that does not have masked material to cover) that has been carried out etching becomes and has the mountain portion corresponding with the shape of fenestral fabric body 2 and the rough surface zone of paddy portion., as Fig. 9 E as shown in, remove masking material 13, can obtain having the glass substrate 1 in flat site 14 and rough surface zone 11 thereafter.
B-3: the 3rd manufacture method
At first, with reference to Figure 10 A to Figure 10 E, the 3rd manufacture method that forms flat site 14 and rough surface zone 11 usefulness on glass substrate 1 is described.Have, following, illustration has been used the situation of soda-lime glass substrate as glass substrate 1 again.
At first, the corrosion resistant plate 17 that has peristome in the one side configuration of a side's of glass substrate 1 surface.This corrosion resistant plate 17 has the function as masking material, and as shown in Figure 10 A and Figure 10 B, rough surface zone 11 has peristome in the zone that should form.
Secondly, as shown in Figure 10 C, a lot of lapping powder 18 are sprayed onto on the surface of glass substrate 1 through above-mentioned corrosion resistant plate 17.In this operation, form a plurality of depressions that the collision because of lapping powder 18 causes on the corresponding zone of the peristome in the surface of glass substrate 1 with corrosion resistant plate 17.On the other hand, owing to lapping powder is not collided with the zone that is covered by corrosion resistant plate 17, so in statu quo become smooth surface.
Then, glass substrate 1 is cleaned.That is the glass dust of removing the lapping powder 18 that is sprayed onto on this glass substrate 1 and producing because of the collision of lapping powder 18.Then, by this glass substrate 1 be impregnated in the predetermined process liquid, carry out uniform etching for the whole face of this glass substrate 1.As the treating fluid of afore mentioned rules, for example use with weight ratio and mixed the treating fluid of hydrofluoric acid aqueous solution (50wt%) at 1: 3 with ammonium fluoride aqueous solution (40wt%).
Utilize above processing, as shown in Figure 10 D, can have been formed the glass substrate 1 in flat site 14 and rough surface zone 11 selectively.Thereafter, identical with above-mentioned the 1st manufacture method, as shown in Figure 10 E, on glass substrate 1, form metal film 12a.Then, 12a carries out composition to this metal film, as shown in Figure 10 F, forms reflectance coating 12 and alignment mark 15.
As described above, in the 1st to the 3rd manufacture method, a plurality of fine zone on the surface by removing glass substrate 1 forms the paddy portion in rough surface zone 11.Its result, in the glass substrate 1 that utilizes above-mentioned each manufacture method to obtain, the height at the top of the mountain portion in the rough surface zone 11 is no more than the plane that comprises flat site 14.
But, have the rough surface zone that has formed mountain portion and paddy portion regularly with the existing glass substrate that substrate uses as liquid-crystal apparatus.That is, as shown in Figure 11, on the uneven surface of existing glass substrate, form the roughly mountain portion of sustained height (or paddy portion of the same degree of depth), and, separate roughly the same interval and formed each mountain portion.Thereby, when light A parallel to each other and B incide on this uneven surface with having certain angle, at the reflected light path of the light A of mountain portion reflection with respect to reflected light short out (i+j) at the light B of paddy portion reflection.And, owing to, produce unwanted painted problem in the image that is shown so exist in because of interference of light takes place such path difference.
Different therewith, with in the substrate, do not produce such problem at liquid-crystal apparatus of the present invention.Promptly, in the above-mentioned the 1st and the 2nd manufacture method, on glass substrate 1, form the irregular uneven surface corresponding, in addition with the shape of fenestral fabric body 2, in above-mentioned the 3rd manufacture method, on glass substrate 1, form the irregular uneven surface corresponding with the collision of lapping powder 18.Thereby, in any method of above-mentioned the 1st, the 2nd and the 3rd manufacture method, the height of each mountain portion is different with the degree of depth of paddy portion, and the top of a mountain portion of formation and the distance at the top of the mountain portion that is adjacent are because of the different and different rough surface zone 11 of each mountain portion.Its result can make the reflectance coating 12 that forms on this rough surface zone 11 have good scattering properties.
Moreover although formed such rough surface zone 11 on the surface of glass substrate 1, the surface of the glass substrate 1 in the flat site 14 is smooth.Thereby, can on this flat site 14, form the key element of wishing to form in the plane, for example alignment mark 15 etc.
C: the reflection characteristic of reflectance coating
Illustrate and utilize reflection characteristic above-mentioned each manufacture method manufacturing, that on the rough surface zone, formed the glass substrate 1 of reflectance coating.
Figure 12 represents to measure the device that reflection characteristic is used.As shown in this Fig, in this determinator, the angle that from the normal direction for glass substrate 1 is 25 ° is to this glass substrate 1 irradiates light 5.Then, utilize optical universal meter 6 to measure by 12 intensity of light reflected of the reflectance coating on the glass substrate 1.At this, the angle θ that the normal direction of optical universal meter 6 change on one side and glass substrate 1 constitutes is Yi Bian carry out the mensuration of catoptrical intensity.Have again, in this is measured, for the situation that approaches to use as liquid-crystal apparatus, as shown in Figure 12, make with this matrix material be same material glass substrate 2 (thickness is about 0.7mm) and glass substrate 1 formation surface one side of reflectance coating opposed, in clamping between two substrates measure under the state of liquid crystal layer 8.
At this, in the 1st or the 2nd above-mentioned manufacture method, the different a plurality of glass substrates 1 of condition for the kind of the treating fluid that makes etching, the time of etching etc. have carried out above-mentioned mensuration.Equally, in the 3rd manufacture method,, carried out above-mentioned mensuration for the different a plurality of glass substrates 1 of condition of the particle diameter that makes lapping compound with number etc.Its result, the representational reflection characteristic as utilizing the available glass substrate 1 of above-mentioned each manufacture method can obtain the reflection characteristic shown in Figure 13.Figure 13 is for the angle θ of above-mentioned each glass substrate 1 expression optical universal meter and the curve map of the relation of the catoptrical intensity of using the light multitester measuring.Have, the symbol 17 and 18 among Figure 13 is symbols of representing the reflection characteristic of the reflecting plate sold on the market up to now for the purpose of comparison again.But this reflecting plate is after having sealed liquid crystal between a pair of substrate, pastes in accompanying mode for substrate.That is, what be careful is following this point: such as implementing shown in the form, and be not arranged on liquid crystal layer one side, and be arranged on a side opposite with it.
As shown in this Fig, decidable according to the glass substrate 1 that obtains with above-mentioned manufacture method, utilizes easy manufacturing process can obtain good reflection characteristic equal with existing reflecting plate or more than it.Specifically, as described below.
At first, according to the reflection characteristic shown in Figure 13 19, demonstrate the strong reflected light of intensity of in the major part of the suitable angle of the angle of visibility when in fact using, observing the reflecting plate of selling on the strength ratio market as liquid-crystal apparatus.Thereby, according to having used the liquid-crystal apparatus that obtains by glass substrate 1 liquid-crystal apparatus of substrate, can obtain good display characteristic with this reflection characteristic 19.
Secondly, according to the reflection characteristic among Figure 13 20 and 23,, then demonstrate the reflected light of in narrow scope, observing strong intensity if compare with other reflection characteristic.At this, in the liquid-crystal apparatus that has adopted STN (supertwist is to row) liquid crystal mode, can obtain the angle of visibility of the good display quality that causes by high contrast, in principle, be defined in the narrow scope.In other words, there is no need to make the strong light of intensity to reflex in the angular regions than the visual field angular width that can obtain good display quality.Thereby, we can say that the reflection characteristic 20 or 23 the glass substrate 1 that have among Figure 13 are suitable for as the substrate that has used the liquid-crystal apparatus of stn liquid crystal pattern.
In addition, if with the reflection characteristic among Figure 13 21 and 22 and other reflection characteristic relatively, then demonstrate the reflected light of in scope, observing intensity to a certain degree than broad.At this, in having adopted the liquid-crystal apparatus of TN (twisted-nematic) liquid crystal mode or SH (super reverse in the same way) liquid crystal mode etc., can obtain angle of visibility than broad.Thereby, we can say that the reflection characteristic 21 and 22 the glass substrate 1 that have among Figure 13 are suitable for as the substrate that has used the liquid-crystal apparatus of TN liquid crystal mode or SH liquid crystal mode etc.Have again, also can see, the reflection characteristic of these glass substrates 1 with have reflection characteristic 17 among Figure 13 or 18 existing liquid-crystal apparatus substrate on an equal basis or under it.But the existing reflecting plate that as a comparison object uses in Figure 13 as mentioned above, is positioned at a side opposite with liquid crystal.Under the situation of the such reflecting plate that uses, exist result from by liquid crystal layer this liquid-crystal apparatus with the light of the surface reflection of substrate and the path difference that arrives the light that reflectance coating reflects, on display image the problem of generation ghost image.Different therewith, use in the substrate at liquid-crystal apparatus of the present invention, owing to form reflectance coating at liquid crystal side, so do not produce such problem.Thereby, synthetically see to have reflection characteristic 21 among Figure 13 or 22 glass substrate and be suitable for as the liquid-crystal apparatus substrate.
Secondly, the present inventor is for each glass substrate 1 with each above-mentioned reflection characteristic (symbol 19 to 23), each characteristic quantity of surface configuration in expression rough surface zone that used surfaceness instrumentation amount.Below, the content as each characteristic quantity of determination object is described.
(1) maximum height Ry
This maximum height Ry is the characteristic quantity of difference of height of the lowest point of the darkest paddy portion of top in this zone of the highest mountain portion of expression from the rough surface zone.
(2) arithmetic average roughness Ra
This arithmetic average roughness Ra is that expression adds up to the absolute value from the average line of regulation to the deviation of the mensuration curve of the shape of expression rough surface region surface and carried out average value.
(3) ten mean roughness Rz
These 10 mean roughness Rz be from the average line of regulation, by the average height at the top 5 mountain portions of high select progressively with by the mean value of the degree of depth of the lowest point in 5 paddy portions of dark select progressively and.
(4) mean wavelength Sm
It is the characteristic quantity of mean wavelength that expression surpasses with the average line cycle that is the mountain portion of inert zone of regulation of center line or paddy portion.Have again, in this example, will have above-mentioned maximum height Ry 1% width band shape the zone and be that the zone of center line is set as above-mentioned inert zone with the average line, measured mean wavelength.
Have again, about these each characteristic quantities, at JIS (Japanese Industrial Standards) B0601-1994, ISO (ISO (International Standards Organization)) 468-1982, ISO 3274-1975 has done to be described in detail among ISO 4287/1-1984, ISO 4287/2-1984, the ISO 4288-1985.
About having the glass substrate 1 of the reflection characteristic 19 shown in above-mentioned Figure 13, when having measured above-mentioned each characteristic quantity, maximum height Ry=0.75 μ m, arithmetic average roughness Ra=0.09 μ m, 10 mean roughness Rz=0.7 μ m, mean wavelength Sm=17 μ m.
In addition, each characteristic quantity with glass substrate 1 of reflection characteristic 20 is maximum height Ry=0.60 μ m, arithmetic average roughness Ra=0.08 μ m, 10 mean roughness Rz=0.45 μ m, mean wavelength Sm=11 μ m.As mentioned above, the glass substrate 1 with this reflection characteristic 20 has been suitable for adopting the liquid-crystal apparatus of stn liquid crystal pattern.By these situations, we can say that hope will adopt the rough surface zone of the substrate that uses in the liquid-crystal apparatus of stn liquid crystal pattern to make the shape that reduces maximum height Ry and Rz as far as possible.Moreover, by reducing arithmetic average roughness Ra, can suppress corresponding irregular of fluctuating in the face with the thickness of liquid crystal layer.
Secondly, each characteristic quantity with glass substrate 1 of reflection characteristic 21 is maximum height Ry=1.75 μ m, arithmetic average roughness Ra=0.24 μ m, 10 mean roughness Rz=1.57 μ m, mean wavelength Sm=22 μ m.
Each characteristic quantity with glass substrate 1 of reflection characteristic 22 is maximum height Ry=0.95 μ m, arithmetic average roughness Ra=0.12 μ m, 10 mean roughness Rz=0.85 μ m, mean wavelength Sm=11 μ m.As mentioned above, the glass substrate 1 with this reflection characteristic 22 has been suitable for adopting the liquid-crystal apparatus of the liquid crystal mode of TN type or SH type.By these situations, hope will adopt the rough surface zone of the substrate that uses in the liquid-crystal apparatus of TN liquid crystal mode or SH liquid crystal mode to make 10 shapes that mean roughness Rz is bigger, or the smaller shape of mean wavelength Sm.
In addition, each characteristic quantity with glass substrate 1 of reflection characteristic 23 is maximum height Ry=0.98 μ m, arithmetic average roughness Ra=0.13 μ m, 10 mean roughness Rz=0.80 μ m, mean wavelength Sm=42 μ m.
Like this, according to go up the shape in the rough surface zone that forms at the substrate (glass substrate 1) of liquid-crystal apparatus, the reflection characteristic of the reflectance coating that decision forms on this zone.Thereby hope should decide the surface configuration in rough surface zone according to the pattern of the liquid crystal that is adopted, with the various conditions in selected above-mentioned each manufacture method.
D: variation
Example of the present invention more than has been described, but above-mentioned each example is illustration after all, can in the scope that does not break away from main idea of the present invention, increases various distortion for above-mentioned example.As variation, can consider following such example.
(1) in above-mentioned example, on the flat site of glass substrate 1, is formed for the alignment mark that this glass substrate overlaps with the position of another substrate, but in addition, also can be formed for the alignment mark of following purposes.That is, also can for example be formed on flat site: the formation operation of on-off element etc. is used; The formation of pixel electrode etc. is used; The dyed layer of color filter; The formation of protective seam or light shield layer etc. is used; Oriented film coating is used; The encapsulant printing is used; The panel severing is used; And driving element is installed the alignment mark of the purposes use etc.
What form on flat site in addition, is not limited to alignment mark.That is, in addition, also the various key elements that should form can formed on the flat site on smooth surface.For example, also can on flat site, form the process management mark.So-called process management mark is the mark that the manufacturing process of management liquid-crystal apparatus uses, for example the signifying words such as treatment conditions in batch number or machine number or the various manufacturing process mark.Moreover, also these process management marks can be made quantized or the bar code change mark, or be the mark of 2 dimension bar code figureizations of representative with identifying code etc.
Moreover what form on flat site is not limited to mark.For example, also can be at the substrate of the liquid-crystal apparatus that is used for the active matrix mode, on flat site, form the wiring of sweep trace or data line etc. or be the on-off element etc. of representative with TFT, TFD.Moreover, also can on flat site, form the terminal of the SIC (semiconductor integrated circuit) that liquid crystal drive uses, also can form encapsulant.Have, the shape of flat site is not limited to the shape shown in above-mentioned the 1st to the 3rd example again, and hope makes the corresponding shape such as shape with the key element that forms on this surface.
(2) in above-mentioned example, the metal film 12a that utilize to form reflectance coating 12 usefulness forms alignment mark 15, is formed on the material that other layer of forming on the glass substrate 1 or member use and forms alignment mark 15 but also can utilize.That is, for example can utilize the formation that is used for light shield layer chromium, be used for color filter formation the pigment resist moreover, be that the metal of principal ingredient waits and forms alignment mark with the tantalum of the formation that is used for on-off element.About above-mentioned process management mark etc., also be same.
E: the structure of liquid-crystal apparatus
Secondly, the liquid-crystal apparatus that has utilized each the above-mentioned example liquid-crystal apparatus structure example of substrate is described.Have again, following, the structure of the liquid-crystal apparatus of illustration passive matrix mode.
(1) reflective liquid crystal device
Figure 14 is that schematically illustration has been used the sectional view of liquid-crystal apparatus of the present invention with the structure of the reflective liquid crystal device of substrate.As shown in this Fig, the structure of this liquid-crystal apparatus for engaging front substrate 100 and back substrate 200 through encapsulant 300, between two substrates, having enclosed liquid crystal.Liquid crystal 400 for example is the nematic liquid crystal with twist angle of regulation.At this, in Figure 14, liquid-crystal apparatus of the present invention is used as back substrate 200 with substrate.
On surface, the inboard of front substrate 100 (liquid crystal 400 sides), form light shield layer 101, dyed layer 102 and protective seam 103.Dyed layer 102 be with the regulation pattern arrangement be colored as R (redness), G (green) and B (blueness) any color resin material layer.Light shield layer 101 is that the layer that shading is used is carried out in the gap between the painted figure of dyed layer 102.In addition, protective seam 103 is not only protected dyed layer 102, and plays the effect of the step difference planarization between each the painted figure that makes dyed layer.Moreover, be substrate with the connecting airtight property raising layer 104 on the surface of protective mulch 103, form a plurality of transparency electrodes 105.This transparency electrode 105 is to extend on the direction of regulation and the electrode of the band shape that forms, waits with transparent conductive material, for example ITO to form.The surface of the connecting airtight property raising layer 104 that utilizes alignment films 106 to cover to form these transparency electrodes 105.This alignment films 106 is organic films of polyimide etc., the milled processed that the direction of orientation of the liquid crystal when it is stipulated not apply voltage is used.On the other hand, configuration phase difference sheet 107 and polaroid 108 on the outer surface of front substrate 100.
On the other hand, on as the inner surface of liquid-crystal apparatus of the present invention, have rough surface zone 201 and flat site 202 with the back substrate 200 of substrate.Then, on rough surface zone 201, form a plurality of reflecting electrodes 203.Specifically, each reflecting electrode 203 is electrodes of the upwardly extending band shape in side of intersecting in the direction of extending with above-mentioned transparency electrode 105.Utilize alignment films 204 coverings identical to form the surface of the back substrate 200 of this reflecting electrode 203 with above-mentioned alignment films 106.
In such structure, after having passed through polaroid 108, phase difference film 107, front substrate 100, dyed layer 102 and liquid crystal 400 etc. from the exterior light of front substrate 100 sides by following order, the electrode 203 that is reflected reflects, by penetrating by back, front substrate 100 sides with above-mentioned opposite path.Then, carrying out reflection-type thus shows.At this moment, control the state of orientation of liquid crystal 400, the bright state of may command display image and dark state according to being applied in voltage between transparency electrode 105 and the reflecting electrode 203.
Have again, in Figure 14 illustration the liquid-crystal apparatus of passive matrix mode, but the present invention also to can be applicable to possess with TFT or TFD etc. be the liquid-crystal apparatus of active matrix mode of the on-off element of representative.At this moment, the reflecting electrode among Figure 14 203 is formed for example rectangle, be connected with wiring through on-off element.Have again, in being provided with the liquid-crystal apparatus of TFT, do not need to carry out the composition of the transparency electrode 105 of formation on front substrate 100 as on-off element.
In addition, at this moment, wish on the flat site of using as liquid-crystal apparatus of the present invention in the back substrate 200 of substrate 202, to form various wirings, on-off element as described above etc.Have, said here wiring except that sweep trace or data line, also comprises the notion of terminal that SIC (semiconductor integrated circuit) that liquid crystal drive uses possesses etc. again.
Have again, utilize and in Fig. 1 E and Fig. 1 F, utilize the same operation of the composition formation alignment mark 15 of metal film 12a to form these key elements that should on flat site 202, form.That is, behind the film (for example film of transparent conductive material) that has formed regulation on the back substrate 200 that comprises flat site 202, by this film is carried out etching or photoetching etc., formation is patterned to the wiring of desirable shape etc. on flat site 202.
In addition, the key element that forms on the substrate 200 overleaf is not limited to these key elements.For example also form the encapsulant 300 shown in Figure 14 on the flat site 202 of substrate 200 overleaf.
(2) Transflective liquid-crystal apparatus
In Figure 14, in the illustrative reflective liquid crystal device, can externally also produce the problem that shows deepening under the situation that light exists deficiently to hang down the advantage that electric power drives though have.In the following Transflective liquid-crystal apparatus that illustrates, carry out reflection-type under the situation of sufficient exterior light and show existing, on the other hand, externally under the inadequate situation of light, carry out transmission-type and show.
Figure 15 is that schematically illustration has been used the sectional view of liquid-crystal apparatus of the present invention with the structure of the reflective liquid crystal device of substrate.Have again, attached with identical symbol in the liquid-crystal apparatus shown in Figure 15 about the part common with the liquid-crystal apparatus shown in Figure 14, omit its explanation.
Form reflectance coating 205 overleaf on the rough surface zone 201 in the surface, the inboard of substrate 200 (liquid crystal 400 sides) with peristome 205a.And, on the surface of the back substrate 200 that has formed this reflectance coating 205, form dyed layer 206 and light shield layer 207.In Figure 15, as light shield layer 207, used the dyed layer 206 of stacked R, G, this 3 look of B, but in addition, also can utilize resin black or multilayer chromium that photomask 207 is set in addition.In addition, the protective seam 208 that is covered with chromatograph 206 and light shield layer 207 be used to make with back substrate 200 on the dyed layer 206 that forms accordingly of rough surface zone 201 on mountain portion and paddy portion flatteningization.Moreover, be substrate with the connecting airtight property raising layer 209 of protective mulch 208, form a plurality of transparency electrodes 210.Each transparency electrode 210 be with front substrate 100 on the upwardly extending electroplax in side that intersects of transparency electrode 105, for example wait to form with ITO.
On the other hand, paste phase difference film 211 and polaroid 212 on the outer surface of substrate 200 overleaf.And, in the outside of polaroid 212 configuration back of the body irradiation source 500.This back of the body irradiation source 500 has as the fluorescent tube 501 of light source and makes light from fluorescent tube 501 be directed to light guide plate 502 on whole of back substrate 200.In addition, as back of the body irradiation source 500, also can use LED (light emitting diode) or EL (electroluminescent device) etc.
In such structure, polaroid 108, phase difference film 107, liquid crystal 400, transparency electrode 210 and dyed layer 206 have been passed through from the light of positive substrate-side incident by following order, arrive reflectance coating 205 and by after these reflectance coating 205 reflections, by with above-mentioned opposite path by the back, penetrate from front substrate 100 sides.Carrying out reflection-type thus shows.
On the other hand, the light that penetrates from back of the body irradiation source 500 becomes the polarized light of regulation by polaroid 212, phase difference film 211, by peristome 205a, dyed layer 206, liquid crystal 400, front substrate 100, phase difference film 107 and the polaroid 108 that is provided with in reflectance coating 205.Carrying out transmission-type thus shows.
Have again, in Figure 15, realize that by the peristome 205a that each pixel is set transmission-type shows in reflectance coating 205, but also can be as described below.That is, also can be 15 to 20nm by the thickness that makes reflectance coating 205, the function that make that it plays that reflectivity is about 85%, transmissivity is about 10% Transflective sheet replaces peristome 205a.
In addition, in Figure 15 illustration the liquid-crystal apparatus of passive matrix mode, but the present invention also to can be applicable to possess with TFT or TFD etc. be the liquid-crystal apparatus of active matrix mode of the on-off element of representative.At this moment, the transparency electrode among Figure 15 105 is formed for example rectangle, be connected with wiring through on-off element.Have again, in being provided with the liquid-crystal apparatus of TFT, do not need the composition of transparency electrode 210 as on-off element.Have, this moment is also with above-mentioned same again, wishes to form various wirings etc. on the flat site 202 of substrate 200 overleaf.
In the liquid-crystal apparatus shown in above-mentioned (1) and (2), during the engaging of substrate 200 and front substrate 100, use the alignment mark that on this back substrate 200, forms overleaf.Because this alignment mark forms on the flat site 202 in the substrate 200 overleaf, overlaps so can make back substrate 200 carry out the position with front substrate 100 accurately.Its result can realize ghost image or show hangover demonstration few, that contrast is high.
F: electronic installation
Secondly, the electronic installation of having used above illustrative liquid-crystal apparatus is described.As mentioned above, these liquid-crystal apparatus are suitable for the carrying device that uses and need low-power consumption under various environment.
At first, Figure 16 A is the oblique view that illustrates as the structure of carrying massaging device of an example of electronic installation.As shown in this Fig, at the upside of the body that carries massaging device 122 liquid-crystal apparatus 121 of the present invention is set, in addition, input part 123 is set at downside.In general, in this front of carrying the display part of massaging device touch panel is set mostly.Therefore, up to now,, also utilize the transmission-type liquid crystal device mostly, but in the transmission-type liquid crystal device, owing to often utilize back of the body irradiation source, so power consumption is big, battery life is short as display part even in portable devices.Different therewith and since liquid-crystal apparatus of the present invention to reflection-type might as well, Transflective might as well, show it all is that become clear, distinct, carries massaging device so be suitable for conduct.
Secondly, Figure 16 B is the oblique view that illustrates as the structure of the portable telephone of an example of electronic installation.As shown in this Fig, on the positive upper portion of the body of portable telephone 125, liquid-crystal apparatus 124 of the present invention is set.No matter portable telephone can be utilized in all environment in the indoor and outdoor.Particularly in automobile, be utilized mostly, but very dark in the car at night.Therefore, as display device, wish to use with reflection-type low in energy consumption be shown as main, can utilize Transflective liquid-crystal apparatus that the transmission-type of fill-in light shows, promptly, the liquid-crystal apparatus shown in Figure 15 as required.In this liquid-crystal apparatus 124, reflection-type show might as well, transmission-type show might as well, all can carry out than the high-grade demonstration bright, that contrast is high of existing liquid-crystal apparatus.
Then, Figure 16 C is the oblique view that illustrates as the structure of the wrist-watch of an example of electronic installation.As shown in this Fig,, liquid-crystal apparatus 126 of the present invention is set in the central authorities of wrist-watch 127 bodies.Important viewpoint in the wrist-watch purposes is a feeling of high class.That yes is bright for this liquid-crystal apparatus 126, contrast is high, because the characteristic variations that causes because of light wavelength is few, so it is painted also little.Thereby, compare with existing liquid-crystal apparatus, can obtain having the very strong demonstration of feeling of high class.

Claims (23)

1. liquid-crystal apparatus substrate, be arranged in the clamping liquid crystal layer a pair of substrate with observe the opposite side of side, it is characterized in that:
The rough surface zone that the surface of above-mentioned liquid crystal layer side has smooth flat site and formed fine mountain portion and paddy portion,
The height at the top of the above-mentioned mountain portion in the above-mentioned rough surface zone is in below the plane that comprises above-mentioned flat site.
2. the liquid-crystal apparatus substrate described in claim 1 is characterized in that:
On above-mentioned flat site, formed the mark of regulation.
3. the liquid-crystal apparatus substrate described in claim 2 is characterized in that:
The mark of afore mentioned rules is an alignment mark.
4. the liquid-crystal apparatus substrate described in claim 2 is characterized in that:
The mark of afore mentioned rules is the process management mark.
5. the liquid-crystal apparatus substrate described in claim 1 is characterized in that:
On above-mentioned flat site, formed wiring.
6. the liquid-crystal apparatus substrate described in claim 1 is characterized in that:
On above-mentioned flat site, formed encapsulant.
7. the liquid-crystal apparatus substrate described in each of claim 1 to 6 is characterized in that:
Maximum height Ry in the above-mentioned rough surface zone, arithmetic average roughness Ra, 10 mean roughness Rz and mean wavelength Sm are the values in the scope of regulation.
8. the liquid-crystal apparatus substrate described in claim 7 is characterized in that:
Above-mentioned maximum height Ry is 0.2 to 3 μ m, and above-mentioned arithmetic average roughness Ra is 0.02 to 0.3 μ m, and above-mentioned 10 mean roughness Rz are 0.1 to 2.5 μ m, and above-mentioned mean wavelength Sm is 4 to 60 μ m.
9. the liquid-crystal apparatus substrate described in claim 7 is characterized in that:
Above-mentioned maximum height Ry is 1.5 to 2.0 μ m, and above-mentioned arithmetic average roughness Ra is 0.15 to 0.3 μ m, and above-mentioned 10 mean roughness Rz are 1.3 to 1. μ m, and above-mentioned mean wavelength Sm is 15 to 25 μ m.
10. the liquid-crystal apparatus substrate described in claim 7 is characterized in that:
Above-mentioned maximum height Ry is 0.7 to 1.2 μ m, and above-mentioned arithmetic average roughness Ra is 0.1 to 0.2 μ m, and above-mentioned 10 mean roughness Rz are 0.5 to 1.0 μ m, and above-mentioned mean wavelength Sm is 35 to 50 μ m.
11. the liquid-crystal apparatus substrate described in claim 7 is characterized in that:
Above-mentioned maximum height Ry is 0.6 to 1.2 μ m, and above-mentioned arithmetic average roughness Ra is 0.05 to 0.15 μ m, and above-mentioned 10 mean roughness Rz are 0.5 to 1.0 μ m, and above-mentioned mean wavelength Sm is 15 to 25 μ m.
12. the liquid-crystal apparatus substrate described in claim 7 is characterized in that:
Above-mentioned maximum height Ry is 0.4 to 1.0 μ m, and above-mentioned arithmetic average roughness Ra is 0.04 to 0.10 μ m, and above-mentioned 10 mean roughness Rz are 0.3 to 0.8 μ m, and above-mentioned mean wavelength Sm is 8 to 15 μ m.
13. the liquid-crystal apparatus substrate described in claim 7 is characterized in that:
Above-mentioned maximum height Ry is 0.8 to 1.5 μ m, and above-mentioned arithmetic average roughness Ra is 0.05 to 0.15 μ m, and above-mentioned 10 mean roughness Rz are 0.7 to 1.3 μ m, and above-mentioned mean wavelength Sm is 8 to 15 μ m.
14. a liquid-crystal apparatus is characterized in that:
Clamping liquid crystal layer between the liquid-crystal apparatus described in each of claim 1 to 13 is with substrate and another substrate and constituting.
15. an electronic installation is characterized in that:
Possesses the liquid-crystal apparatus described in the claim 14.
16. the manufacture method of a liquid-crystal apparatus, this liquid-crystal apparatus clamping liquid crystal layer and constituting between a pair of substrate is characterized in that:
Utilize masking material to cover to be arranged in the part on surface of above-mentioned liquid crystal layer side of a substrate of a side opposite of above-mentioned a pair of substrate with observing side,
Roughened is carried out in the zone by beyond the covered zone of above-mentioned masking material in the above-mentioned surface, make it become rough surface zone with fine mountain portion and paddy portion, in this rough surface zone, the top of above-mentioned mountain portion is in the height that comprises by below the plane in the covered zone of above-mentioned masking material
Above-mentioned a pair of substrate is engaged, make that this rough surface zone is relative with another substrate.
17. the manufacture method of the liquid-crystal apparatus described in claim 16 is characterized in that:
An above-mentioned substrate comprises the 1st constituent with mesh shape and the 2nd constituent that exists between the net of the 1st constituent,
When above-mentioned surface roughening, use is the different treating fluid of fusing speed in above-mentioned the 1st constituent and above-mentioned the 2nd constituent, by an above-mentioned substrate is carried out etching, in by the zone beyond the covered zone of above-mentioned masking material, form above-mentioned mountain portion and the paddy portion corresponding with the shape of above-mentioned the 1st constituent.
18. the manufacture method of the liquid-crystal apparatus described in claim 16 is characterized in that:
When above-mentioned surface roughening,, in by the zone beyond the covered zone of this masking material, form above-mentioned mountain portion and paddy portion by make the surface collision of a granular member and an above-mentioned substrate through above-mentioned masking material.
19. the manufacture method of the liquid-crystal apparatus described in each of claim 16 to 18 is characterized in that:
Behind above-mentioned surface roughening, remove above-mentioned masking material,
To being carried out etching by covered zone of this masking material and above-mentioned rough surface zone.
20. a liquid-crystal apparatus is with the manufacture method of substrate, this liquid-crystal apparatus be arranged in substrate the clamping liquid crystal layer a pair of substrate with observe the opposite side of side, it is characterized in that:
Utilize masking material to cover the part on the surface of above-mentioned liquid crystal layer side,
Roughened is carried out in the zone by beyond the covered zone of above-mentioned masking material in the above-mentioned surface, make it become rough surface zone with fine mountain portion and paddy portion, in this rough surface zone, the top of above-mentioned mountain portion is in the height that comprises by below the plane in the covered zone of above-mentioned masking material.
21. the manufacture method of substrate of the liquid-crystal apparatus described in claim 20 is characterized in that:
An above-mentioned substrate comprises the 1st constituent with mesh shape and the 2nd constituent that exists between the net of the 1st constituent,
When above-mentioned surface roughening, use is the different treating fluid of fusing speed in above-mentioned the 1st constituent and above-mentioned the 2nd constituent, by an above-mentioned substrate is carried out etching, in by the zone beyond the covered zone of above-mentioned masking material, form above-mentioned mountain portion and the paddy portion corresponding with the shape of above-mentioned the 1st constituent.
22. the manufacture method of substrate of the liquid-crystal apparatus described in claim 20 is characterized in that:
When above-mentioned surface roughening,, in by the zone beyond the covered zone of this masking material, form above-mentioned mountain portion and paddy portion by make the surface collision of a granular member and an above-mentioned substrate through above-mentioned masking material.
23. the liquid-crystal apparatus described in each of claim 20 to 22 with the manufacture method of substrate, is characterized in that:
Behind above-mentioned surface roughening, remove above-mentioned masking material,
To being carried out etching by covered zone of this masking material and above-mentioned rough surface zone.
CNB008011796A 1999-06-24 2000-06-21 Substrate of liquid crystal display, method for manufacture thereof, liquid crystal display, method of manufacture thereof, and electronic device Expired - Fee Related CN1183406C (en)

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CN1183406C (en) 2005-01-05
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TWI252353B (en) 2006-04-01
KR100426884B1 (en) 2004-04-14

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