CN107089789B - The manufacturing method of glass plate and glass plate - Google Patents
The manufacturing method of glass plate and glass plate Download PDFInfo
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- CN107089789B CN107089789B CN201710078275.0A CN201710078275A CN107089789B CN 107089789 B CN107089789 B CN 107089789B CN 201710078275 A CN201710078275 A CN 201710078275A CN 107089789 B CN107089789 B CN 107089789B
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- glass plate
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- 239000011521 glass Substances 0.000 title claims abstract description 220
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 30
- 238000000227 grinding Methods 0.000 claims description 76
- 238000000034 method Methods 0.000 claims description 27
- 230000008569 process Effects 0.000 claims description 21
- 230000000630 rising effect Effects 0.000 claims description 6
- 239000002002 slurry Substances 0.000 claims description 5
- 238000000137 annealing Methods 0.000 description 27
- 238000009740 moulding (composite fabrication) Methods 0.000 description 19
- 238000002844 melting Methods 0.000 description 18
- 230000008018 melting Effects 0.000 description 18
- 238000003801 milling Methods 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 239000004973 liquid crystal related substance Substances 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- 238000009826 distribution Methods 0.000 description 6
- 230000001788 irregular Effects 0.000 description 6
- 230000032258 transport Effects 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 238000010309 melting process Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000005329 float glass Substances 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 229910052593 corundum Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000009991 scouring Methods 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229910001845 yogo sapphire Inorganic materials 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 229910001260 Pt alloy Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 229910001315 Tool steel Inorganic materials 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 235000013339 cereals Nutrition 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum oxide Inorganic materials [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B18/00—Shaping glass in contact with the surface of a liquid
- C03B18/02—Forming sheets
- C03B18/14—Changing the surface of the glass ribbon, e.g. roughening
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
- B24B7/242—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass for plate glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30625—With simultaneous mechanical treatment, e.g. mechanico-chemical polishing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/10—Melting processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Glass Compositions (AREA)
- Liquid Crystal (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The present invention relates to the manufacturing methods of glass plate and glass plate.The present invention provides a kind of glass plate that abrasiveness can be dramatically improved.A kind of glass plate, its thickness is 0.75mm or less, it is characterized in that, 10 average heights of the oscillating curves of at least one of the first interarea or the second interarea are 0.2 μm hereinafter, and the Fluctuation Strength of the wavelength 10mm that rises and falls relative to the ratio between the Fluctuation Strength of fluctuating wavelength 20mm is 0.20 or more.
Description
Technical field
The present invention relates to the manufacturing methods of glass plate and glass plate.
Background technology
There is the small bumps such as deformation, corrugation, fluctuating on the surface of the glass plate obtained from float forming.With
In the case of the glass plate for making automobile, for building etc., such small bumps, rise and fall not become problem, but as
In the case of the glass substrate of various displays, such small bumps, fluctuating can lead to the figure of manufactured display
As be deformed, irregular colour.Therefore, it in the case where glass plate is used as liquid crystal display glass substrate, needs to glass
Thus the surface of glass plate, which is ground, to be removed small bumps, rises and falls.The remained on surface of glass plate after grinding has small
Concave-convex, fluctuating, wherein the relief height of 20mm spacing can bring very big shadow to the abrasiveness of glass plate, the quality of liquid crystal display
It rings.
For example, Patent Document 1 discloses a kind of manufacturing method of glass substrate, for the purpose for improving abrasiveness
Select the relief height of 20mm spacing for 0.3 μm of float glass below.
Existing technical literature
Patent document
Patent document 1：Japanese Unexamined Patent Publication 3-65529 bulletins
Invention content
Problem to be solved by the invention
But for existing glass plate, in order to reduce the irregular colour of liquid crystal display, needs to increase and grind
Amount, milling time is elongated, the problem of reduction accordingly, there exist production efficiency.
The purpose of one embodiment of the present invention is to solve the above problems, and provides one kind and abrasiveness can be dramatically improved
Glass plate.
The means used to solve the problem
It can be solved the above problems by glass plate as described below,
It is that thickness is 0.75mm glass plates below, which is characterized in that
10 average heights of the oscillating curves of at least one of the first interarea or the second interarea be 0.2 μm hereinafter, and
The ratio between the Fluctuation Strength of the Fluctuation Strength of fluctuating wavelength 10mm relative to fluctuating wavelength 20mm is 0.20 or more.
Invention effect
Glass plate according to one method of the present invention can be such that abrasiveness improves tremendously, and can shorten and grind
Time consuming is to improve production efficiency.
Description of the drawings
Fig. 1 is the sectional view of the manufacturing device for the glass plate for showing present embodiment.
Fig. 2 is the flow chart of the manufacturing method for the glass plate for showing present embodiment.
Fig. 3 is the schematic diagram for showing fluctuating spacing and the relationship of relief height.
Fig. 4 is the figure illustrated to 10 average heights of oscillating curves.
Fig. 5 is the figure for showing embodiment and the relationship of comparative example, wherein (A) is that the thickness of glass plate is the reality of 0.70mm
Apply example and comparative example, (B) be glass plate thickness be 0.50mm embodiment and comparative example, (C) be that the thickness of glass plate is
The embodiment and comparative example of 0.40mm.
Fig. 6 is the figure for showing the ratio between Fluctuation Strength before grinding with the relationship of milling time index.
Reference numeral
10 melting appartus
20 melten glass conveyers
30 building mortions
40 attachment devices
50 annealing devices
G1 glass raw materials
G2 melten glass
G3 glass tapes
M molten metals
Specific implementation mode
Mode for carrying out the present invention is illustrated referring to the drawings.In the drawings, for identical or corresponding
Composition, assign identical or corresponding symbol and omit the description.In the present specification, indicate that "~" of numberical range refers to including
The range of numerical value before and after it.
[glass plate]
The glass plate of present embodiment is the first interarea of glass plate in the case that thickness is 0.75mm glass plates below
Or second interarea the oscillating curves of at least one 10 average heights be 0.2 μm hereinafter, and the wavelength 10mm that rises and falls rise
It is 0.20 or more to lie prostrate the ratio between the Fluctuation Strength of intensity relative to fluctuating wavelength 20mm.The ratio between Fluctuation Strength before grinding is preferably
0.30 or more, it is more preferably 0.40 or more.In addition, the ratio between the Fluctuation Strength before grinding is preferably 1.0 or less, more preferably 0.90
Below.
In addition, for thickness is 0.45mm glass plates below, the first interarea or the second interarea of glass plate are extremely
10 average heights of the oscillating curves of few one be 0.2 μm hereinafter, and the wavelength 10mm that rises and falls Fluctuation Strength relative to rising
It is 0.20 or more to lie prostrate the ratio between Fluctuation Strength of wavelength 20mm.The ratio between Fluctuation Strength before grinding be preferably 0.30 or more, more preferably
It is 0.35 or more.In addition, the ratio between the Fluctuation Strength before grinding is preferably 0.80 or less, more preferably 0.70 or less.
The inventors discovered that：Not only the relief height of 20mm spacing can affect the irregular colour of liquid crystal display,
And the relief height of 10mm~20mm spacing can also affect the irregular colour of liquid crystal display.In addition, the present inventor
It was found that：Even if 10 average heights of oscillating curves are identical, fluctuating spacing (fluctuating wavelength) is short, includes a large amount of fluctuating components
Glass plate, it is easier to be ground.Here, 10 average heights of oscillating curves refer to from the oscillating curves in measurement compared with
High peak is extracted 10 points out and taken to be worth obtained from its average value.
Fig. 3 is the schematic diagram for showing fluctuating spacing and the relationship of relief height.The fluctuating wavelength of present embodiment rises and falls by force
Degree is fluctuating spacing, the Fourier transform value of relief height respectively.
The fluctuating generally measured is the composite wave F (ω) of the wave f (x) of multiple wavelength Xs.
Frequency is set as ω, the Fluctuation Strength A (λ) in present embodiment can be calculated by following formula.
A (λ)=| F (λ) |
The ω of λ=1/
Fig. 4 is the figure illustrated to 10 average heights of oscillating curves.10 points of the oscillating curves of present embodiment
Average height is the value obtained as follows：It is drawn up datum length in its average line side from oscillating curves, is found out from the extraction
Partial average line rise measured on longitudinal multiplying power direction, from highest summit to the exhausted of the absolute altitude (Yp) of the 5th high summit
To the sum of the average value of absolute value of the average value and the absolute altitude (Yv) from minimum the lowest point to the 5th low the lowest point of value, and with micro-
Rice (μm) indicates the value.
When the ratio between Fluctuation Strength before the grinding of the glass plate of present embodiment is 0.20 or more, including a large amount of be easy grinding
10mm spacing fluctuating component, therefore, it is possible to reduce the milling time of aftermentioned grinding process S70.In addition, rising before grinding
Lie prostrate intensity ratio be 1.0 or less when, in aftermentioned melting process S10~forming process S30, be easy to control grinding before fluctuating
Intensity ratio.
The glass plate of present embodiment is in liquid crystal display with it is preferable to use the nothings for being substantially free of alkali metal component on the way
Alkali glass.Here, the total amount for being substantially free of the content that alkali metal component refers to alkali metal oxide is 0.1 mass % or less.
Alkali-free glass for example contains SiO in terms of the quality % of oxide benchmark2：50%~73% (preferably 50%~
66%), Al2O3：10.5%~24%, B2O3：0~12%, MgO：0~8%, CaO：0~14.5%, SrO：0~24%,
BaO：0~13.5%, ZrO2：0~5%, MgO+CaO+SrO+BaO：8%~29.5% (preferably 9%~29.5%).
In the case where taking into account high strain-point and high melting, alkali-free glass is preferably contained in terms of the quality % of oxide benchmark
There is SiO2：58%~66%, Al2O3：15%~22%, B2O3：5%~12%, MgO：0~8%, CaO：0~9%, SrO：3%
~12.5%, BaO：0~2%, MgO+CaO+SrO+BaO：9%~18%.
In particular, in the case where wanting to obtain high strain-point, alkali-free glass is preferably in terms of the quality % of oxide benchmark
Contain SiO2：54%~73%, Al2O3：10.5%~22.5%, B2O3：0~5.5%, MgO：0~8%, CaO：0~9%,
SrO：0~16%, BaO：0~2.5%, MgO+CaO+SrO+BaO：8%~26%.
[manufacturing device of glass plate]
The manufacturing device of glass plate about present embodiment, illustrates by taking float glass manufacturing device as an example.
Fig. 1 is the sectional view for the manufacturing device for showing glass plate.As shown in Figure 1, float glass manufacturing device 1 has fusing
Device 10, melten glass conveyer 20, building mortion 30, attachment device 40 and annealing device 50.
Melting appartus 10 makes melten glass G2 by melting glass raw material G1.Melting appartus 10, which has, for example to be melted
Stove 11 and burner 12.
Melting furnace 11 is formed with the melting chamber 11a for melting glass raw material G1.Melten glass is accommodated in melting chamber 11a
G2。
Upper space of the burner 12 in melting chamber 11a forms flame.Using the flame radiation heat, glass raw material G1 by
Gradually it is fused into melten glass G2.
It is blown into gas it should be noted that melting appartus 10 can have to melten glass G2 and melten glass is made to recycle
Bubbler (not shown).
Melten glass conveyer 20 transports melten glass G2 from melting appartus 10 to building mortion 30, will melt glass
Glass G2 is supplied to building mortion 30.Melten glass transporting tube 21 is provided in melten glass conveyer 20 and to melten glass G2
The blender 22 being stirred.
There is melten glass transporting tube 21 hollow tube of platinum system or platinum alloy and the electrode in length direction end (not to scheme
Show), melten glass G2 is heated by being powered to hollow tube via electrode.
Blender 22 is platinum system or platinum alloy system, has rotary shaft 22a and stirring blade 22b, stirring blade 22b is orthogonally
Configuration is on rotary shaft 22a.Blender 22 is stirred melten glass G2 and homogenizes.
Bubble contained in melten glass G2 is taken off it should be noted that melten glass conveyer 20 can have
The clarifier of bubble.
The melten glass G2 supplied from melten glass conveyer 20 is configured to the glass tape of band plate-like by building mortion 30
G3.Building mortion 30 has such as forming furnace 31 and forming heater 32.
Forming furnace 31 is formed with the working chamber 31a for shaping melten glass G2.It is more directed towards into from the entrance of forming furnace 31
The temperature of the outlet of shape stove 31, working chamber 31a is lower.Forming furnace 31 has float tank 311 and is set to the upper of float tank 311
The ceiling 312 of side.
Float tank 311 accommodates molten metal M.As molten metal M, such as use molten tin.Other than molten tin, also
Molten tin alloy etc. can be used.In order to inhibit the oxidation of molten metal M, the upper space of working chamber 31a to be full of reproducibility gas
Body.Reducibility gas is for example made of the mixed gas of hydrogen and nitrogen.
Float tank 311 will be continuously supplied into the melten glass on the surface of molten metal M using the liquid level of molten metal M
G2 is configured to the glass tape G3 of band plate-like.Glass tape G3 is utilized while downstream being flowed from the upstream side of float tank 311
Upper roller 33 stretches and gradually cures in the width direction, float tank 311 downstream area from molten metal M pull-ups.Upper roller 33 is set
The viscosity for being placed in glass tape G3 reaches 103.8~107.65Shaped region.Here, the surface about glass tape G3, it will be with melting
The face of the opposite side in the face of metal M contacts is known as top surface, and the face contacted with molten metal M is known as bottom surface.
It is suspended from ceiling 312 to shape heater 32.Heater 32 is shaped along the flow direction compartment of terrain of glass tape G3
It is provided with multiple, the Temperature Distribution on the flow direction of glass tape G3 is adjusted.In addition, forming heater 32 is along glass tape
The width direction of G3 has been positioned apart from multiple, and the Temperature Distribution in the width direction of glass tape G3 is adjusted.
40 joint forming device 30 of attachment device and annealing device 50.Can attachment device 40 and annealing device 50 it
Between minim gap in fill up heat-insulating material.Attachment device 40 has connection stove 41, intermediate heater 42 and runner 43.
Connection stove 41 is set between forming furnace 31 and aftermentioned annealing furnace 51, and transported glass tape is limited by being formed
The junction chamber 41a of the thermal losses (desuperheating) of G3 prevents the quenching of glass tape G3.
Intermediate heater 42 is arranged in junction chamber 41a.Intermediate heater 42 is along the carriage direction compartment of terrain of glass tape G3
It is provided with multiple, the Temperature Distribution on the carriage direction of glass tape G3 is adjusted.Intermediate heater 42 can be along glass tape
The width direction of G3 is provided separately, and the Temperature Distribution in the width direction of glass tape G3 is adjusted.
Runner 43 is arranged in junction chamber 41a.Runner 43 is driven by rotations such as motor, by glass tape G3 from melting
Metal M pull-ups, and it is transported to annealing furnace 51 from forming furnace 31.Runner 43 has been positioned apart from along the carriage direction of glass tape G3
It is multiple.
Annealing device 50 anneals to glass tape G3 obtained from being shaped using building mortion 30.Annealing device 50 has
Annealing furnace 51, annealing heater 52 and lehr rollers 53.
Annealing furnace 51 is formed with the annealing chamber 51a to anneal to glass tape G3.It is more directed towards from the entrance of annealing furnace 51
The temperature of the outlet of annealing furnace 51, annealing chamber 51a is lower.
Annealing heater 52 is arranged in annealing chamber 51a.Annealing heater 52 is along the carriage direction compartment of terrain of glass tape G3
It is provided with multiple, the Temperature Distribution on the carriage direction of glass tape G3 is adjusted.Annealing heater 52 can be along glass tape
The width direction of G3 is provided separately, and the Temperature Distribution in the width direction of glass tape G3 is adjusted.
Lehr rollers 53 are arranged in annealing chamber 51a.Lehr rollers 53 are driven by rotations such as motor, by glass tape G3 from annealing
The entrance of stove 51 is transported to the outlet of annealing furnace 51.Lehr rollers 53 have been positioned apart from multiple along the carriage direction of glass tape G3.
Glass tape G3 after annealing in annealing device 50 is cut into defined size using cutting machine.Here, about
Face corresponding with the bottom surface of glass tape G3 is known as the first interarea by the interarea of the glass plate obtained after cutting, will be with glass tape G3
The corresponding face in top surface be known as the second interarea.
Single or double is ground by grinding device after glass plate with the ratio between above-mentioned Fluctuation Strength.
[manufacturing method of glass plate]
Then, with reference to Fig. 2, the manufacturing method of the glass plate of the float glass manufacturing device 1 to having used above-mentioned composition into
Row explanation.Fig. 2 is the flow chart for the manufacturing method for showing glass plate.As shown in Fig. 2, the manufacturing method of glass plate has smelter
Sequence S10, melten glass transport process S20, forming process S30, annealing operation S50, cutting action S60 and grinding process S70.
In melting process S10, melten glass G2 is made by melting glass raw material G1.
In melten glass transports process S20, melten glass G2 is transported to building mortion 30 from melting appartus 10.Separately
Outside, in melten glass transports process S20, there can be the clarification work that deaeration is carried out to bubble contained in melten glass G2
Sequence.
In forming process S30, the melten glass G2 made by melting process S10 is configured to the glass tape of band plate-like
G3.For example, in forming process S30, melten glass G2 is continuously fed on the surface of molten metal M, utilizes molten metal M
Liquid level melten glass G2 is configured to the glass tape G3 of band plate-like.Glass tape G3 from the upstream side of float tank 311 downstream
Side gradually cures while flowing.
In annealing operation S50, anneal to the glass tape G3 as obtained from forming process S30 formings.
In cutting action S60, the glass tape G3 after annealing is cut into defined size using cutting machine, to obtain
Glass plate.
The ratio between Fluctuation Strength of glass plate of present embodiment can transport process S20 in melting process S10, melten glass
Or it is controlled in forming process 30.
In melting process S10, adjusted as follows：Reduce the grain size of glass raw material G1, improve the burning of burner 12
Power is to improve the temperature of melting chamber 11a, improve the gas flow etc. of bubbler.
In melten glass transports process S20, adjusted as follows：Increase the turn on angle of melten glass transporting tube 21 to
The temperature for improving the melten glass G2 near blender 22, reduces blender 22 at the mixing speed (rotating speed) for improving blender 22
Height etc. relative to melten glass G2.
In the case of alkali-free glass, the temperature of the melten glass G2 near blender 22 is preferably 1300 DEG C~1500
DEG C, more preferably 1350 DEG C~1500 DEG C.In addition, the rotating speed of blender 22 is preferably 5rpm~30rpm, more preferably 10rpm
~30rpm.
In forming process S30, adjusted as follows：It improves the rotary speed of multipair upper roller 33, increase making for upper roller 33
With radical, in the excellent upper roller (the high property held upper roller) of the downstream area use property held (グ リ ッ プ) of shaped region, raising
The power etc. of the forming heater 32 of the downstream area of shaped region.Here, the downstream area of shaped region refers to glass tape G3
Viscosity reach 106.5~107.65Region.
Upper roller 33 is preferably 10 pairs~30 pairs, more preferably 15 pairs~30 pairs using radical.In addition, the high property held upper roller
The use of radical is preferably 0~6 pair, more preferably 1 pair~6 pairs.Here, the high property held upper roller refers to being contacted with glass tape G3
Upper roller that rotating member is formed by the upper roller that is formed of ceramics, rotating member by tool steel, the heat-insulating property for improving rotating member
Upper roller etc..
In grinding process S70, the interarea of the glass plate with the ratio between above-mentioned Fluctuation Strength is carried out using grinding slurry
Grinding.Grinding slurry includes as the cerium oxide of grinding abrasive grain, zirconium oxide, manganese oxide, lanthanum or iron oxide red.To the of glass plate
Any one of one interarea or the second interarea are ground to be finish-machined to the high glass plate of flatness.It can certainly be to glass
Both first interarea and the second interarea of glass plate are ground.From the perspective of improving productivity, amount of grinding is preferably 3.5 μm
Below, 2 μm or less, further preferably 1.5 μm or less, particularly preferably 1.0 μm or less are more preferably.
In grinding process S70, it is that 0.75mm is below in thickness, the first interarea of glass plate or second is led
At least one of face is ground so that 10 average heights of oscillating curves are 0.07 μm or less and rise and fall wavelength 10mm's
The ratio between the Fluctuation Strength of Fluctuation Strength relative to fluctuating wavelength 20mm is 0.03~0.30.The ratio between Fluctuation Strength after grinding is excellent
It is selected as 0.04~0.28, more preferably 0.05~0.26.
In the present embodiment, only the first interarea can be ground.In this case, the second interarea keeps grinding
The ratio between preceding Fluctuation Strength.The ratio between Fluctuation Strength after grinding means the fluctuating component with 20mm spacing for 0.03~0.30
Fluctuating component compared to 10mm spacing is fully ground.In addition, it is meant that the fluctuating component of 20mm spacing is also as in the past
It is ground and removes.
In grinding process S70, it is that 0.45mm is below in thickness, the first interarea of glass plate or second is led
At least one of face is ground so that 10 average heights of oscillating curves are 0.07 μm or less and rise and fall wavelength 10mm's
The ratio between the Fluctuation Strength of Fluctuation Strength relative to fluctuating wavelength 20mm is 0.03~0.25.The ratio between Fluctuation Strength after grinding is excellent
It is selected as 0.04~0.23, more preferably 0.04~0.21.
The ratio between Fluctuation Strength after grinding means compared with the fluctuating component of 20mm spacing for 0.03~0.25 between 10mm
Away from fluctuating component fully ground.In addition, it is meant that the fluctuating component of 20mm spacing is also ground and removes as in the past
It goes.
The manufacturing method of glass plate according to the present embodiment makes abrasiveness carry due to the fluctuating component of 10mm spacing
Height can manufacture the glass plate of the high-quality for the irregular colour for reducing liquid crystal display.
Embodiment
It is exemplified below embodiment and comparative example is further illustrated the present invention, but the present invention is not by its any limit
System.Fig. 5 is the figure for showing embodiment and the relationship of comparative example, wherein (A) is that the thickness of glass plate is the embodiment of 0.70mm
The embodiment and comparative example, (C) for being 0.50mm with thickness that comparative example, (B) are glass plates are that the thickness of glass plate is 0.40mm
Embodiment and comparative example.Fig. 6 is the figure for showing the ratio between Fluctuation Strength before grinding with the relationship of milling time index.
(example 1~18)
Example 1~12 is embodiment, and example 13~18 is comparative example.
Under the manufacturing condition of example 1~18 shown in Fig. 5 (A), by the glass raw material G1 of alkali-free glass composition in melting chamber
It is melted in 11a, thus produces melten glass G2, melten glass G2 is configured to the glass tape G3 of band plate-like by float glass process, it is right
Glass tape G3 anneals, and is then cut, and is 0.70mm, width 300mm × length 300mm to obtain totally 18 thickness
Glass plate.Here, the high property held upper roller shown in Fig. 5 (A) is the upper roller that rotating member is formed by ceramics.For Fig. 5 (B),
Fig. 5 (C) is also the same.
The fluctuating spacing of each glass plate, relief height can utilize surface roughness meter (manufacture of Tokyo Micronics Inc.,
SURFCOM it) is measured along the direction orthogonal with the brush line of each glass plate.Oscillating curves in JIS standards by applying in wave
Amplitude transmittance exports for 50% bandpass filter under long 0.8mm and wavelength 8mm.The fluctuating wavelength of each glass plate rises and falls
Intensity is calculated by above-mentioned Fourier transform.It should be noted that brush line is the plate in width direction by glass tape G3
Thick variation and fluctuating causes and the striped that is generated on the flow direction of glass tape G3.
As shown in Fig. 5 (A), for the glass plate before the grinding of example 1~12, the fluctuating of the first interarea of glass plate is bent
10 average heights of line are 0.05 μm, and fluctuating of the Fluctuation Strength for the wavelength 10mm that rises and falls relative to fluctuating wavelength 20mm
Intensity ratio is 0.23~0.93.On the other hand, for the glass plate before the grinding of example 13~18, the first master of glass plate
10 average heights of the oscillating curves in face are 0.05 μm, and the Fluctuation Strength for the wavelength 10mm that rises and falls is relative to fluctuating wavelength
The ratio between Fluctuation Strength of 20mm is 0.12~0.19.
Then, using the grinding slurry containing cerium oxide by the first interarea of each glass plate with separation 4.5mm, slot
It is ground on the pad of the slot of width 1.5mm, groove depth 1mm~1.5mm.The amount of grinding of first interarea of each glass plate is 0.9 μ
m。
Moreover, after carrying out above-mentioned grinding, pure water cleaning showers are carried out successively, utilize PVA sponges (ベ Le Network リ Application) and water
Scouring, the scouring using PVA sponges and alkaline detergent, the scouring using PVA sponges and water, pure water cleaning showers, go forward side by side
Row is blown.
The fluctuating spacing of each glass plate after grinding, relief height using surface roughness meter (manufacture of Tokyo Micronics Inc.,
SURFCOM it) is measured along the direction orthogonal with the brush line of each glass plate.Oscillating curves in JIS standards by applying in wave
Amplitude transmittance exports for 50% bandpass filter under long 0.8mm and wavelength 8mm.The fluctuating wavelength of each glass plate rises and falls
Intensity is calculated by above-mentioned Fourier transform.
Fig. 5 (A)~(C), milling time index shown in fig. 6 the rising using the glass plate after grinding by Fourier transform
It lies prostrate wavelength cut-off obtained from the fluctuating wavelength spectrum of the glass plate before wavelength spectrum divided by grinding and calculates.Wavelength cut-off according to
The thickness of glass plate and change.Milling time index utilizes in such a way that the glass plate after grinding reaches desired fluctuating wavelength spectrum
Wavelength cut-off calculates.The value of milling time index means that more greatly milling time is longer, and the value of milling time index is smaller
Mean that milling time is shorter.
As shown in Fig. 5 (A), the milling time index of example 1~12 is 0.8~1.2.On the other hand, the grinding of example 13~18
Time index is 1.3~1.5.
In addition, for the glass plate after the grinding of example 1~12,10 points of the oscillating curves of the first interarea of glass plate
Average height is 0.01 μm, and the Fluctuation Strength for the wavelength 10mm that rises and falls is relative to the ratio between the Fluctuation Strength of fluctuating wavelength 20mm
0.05~0.26.
(example 21~37)
Example 21~31 is embodiment, and example 32~37 is comparative example.
In the same manner as example 1~18, totally 17 thickness have been obtained under the manufacturing condition of example 21~37 shown in Fig. 5 (B) is
The glass plate of 0.50mm, width 300mm × length 300mm.By method same as example 1~18, each glass plate is calculated
Fluctuating wavelength, Fluctuation Strength.
As shown in Fig. 5 (B), for the glass plate before the grinding of example 21~31, the fluctuating of the first interarea of glass plate
10 average heights of curve are 0.05 μm, and the Fluctuation Strength for the wavelength 10mm that rises and falls rising relative to fluctuating wavelength 20mm
It is 0.25~0.56 to lie prostrate intensity ratio.On the other hand, for the glass plate before the grinding of example 32~37, the first of glass plate
10 average heights of the oscillating curves of interarea are 0.05 μm, and the Fluctuation Strength for the wavelength 10mm that rises and falls is relative to fluctuating wavelength
The ratio between Fluctuation Strength of 20mm is 0.07~0.19.
In example 21~37, the amount of grinding of the first interarea of each glass plate is adjusted to 2.3 μm, in addition to this, with example 1~
18 it is same under the conditions of carry out grinding, the cleaning of each glass plate.Amount of grinding is adjusted to 2.3 μm so that the glass plate after grinding reaches
To the fluctuating with 1~18 same degree of example.In example 21~37, by method same as example 1~18, calculate each after grinding
Fluctuating wavelength, the Fluctuation Strength of glass plate.
As shown in Fig. 5 (B), the milling time index of example 21~31 is 1.9~2.6.On the other hand, the grinding of example 32~37
Time index is 2.8~4.0.
In addition, for the glass plate after the grinding of example 21~31, the ten of the oscillating curves of the first interarea of glass plate
Point average height is 0.01 μm, and Fluctuation Strength the ratio between of the Fluctuation Strength for the wavelength 10mm that rises and falls relative to fluctuating wavelength 20mm
It is 0.05~0.08.
(example 41~60)
Example 41~52 is embodiment, and example 53~60 is comparative example.
In the same manner as example 1~18, totally 20 thickness are obtained under the manufacturing condition of example 41~60 shown in Fig. 5 (C) is
The glass plate of 0.40mm, width 300mm × length 300mm.By method same as example 1~18, each glass plate is calculated
Fluctuating wavelength, Fluctuation Strength.
As shown in Fig. 5 (C), for the glass plate before the grinding of example 41~52, the fluctuating of the first interarea of glass plate
10 average heights of curve are 0.05 μm, and the Fluctuation Strength for the wavelength 10mm that rises and falls rising relative to fluctuating wavelength 20mm
It is 0.24~0.70 to lie prostrate intensity ratio.On the other hand, for the glass plate before the grinding of example 53~60, the first of glass plate
10 average heights of the oscillating curves of interarea are 0.05 μm, and the Fluctuation Strength for the wavelength 10mm that rises and falls is relative to fluctuating wavelength
The ratio between Fluctuation Strength of 20mm is 0.09~0.19.
In example 41~60, the amount of grinding of the first interarea of each glass plate is adjusted to 3.4 μm, in addition to this, with example 1~
18 it is same under the conditions of carry out grinding, the cleaning of each glass plate.Amount of grinding is adjusted to 3.4 μm so that the glass plate after grinding reaches
To the fluctuating with 1~18 same degree of example.In example 41~60, by method same as example 1~18, calculate each after grinding
Fluctuating wavelength, the Fluctuation Strength of glass plate.
As shown in Fig. 5 (C), the milling time index of example 41~52 is 3.3~5.3.On the other hand, the grinding of example 53~60
Time index is 5.5~7.9.
In addition, for the glass plate after the grinding of example 41~52, the ten of the oscillating curves of the first interarea of glass plate
Point average height is 0.01 μm, and Fluctuation Strength the ratio between of the Fluctuation Strength for the wavelength 10mm that rises and falls relative to fluctuating wavelength 20mm
It is 0.04~0.11.
(example 61~72)
In example 61~72, under manufacturing condition same as example 41~52 respectively, having obtained totally 12 thickness is
The glass plate of 0.40mm, width 300mm × length 300mm.
The ratio between Fluctuation Strength of each glass plate before the grinding of example 61~72 is identical as example 41~52 respectively.
In example 61~72, the amount of grinding of the first interarea of each glass plate is adjusted to 1.8 μm, in addition to this, with example 41
~52 it is same under the conditions of carry out grinding, the cleaning of each glass plate.Amount of grinding be adjusted to 1.8 μm so that grinding after glass plate
Fluctuating be more than example 41~52.In example 61~72, by method same as example 41~52, each glass after grinding is calculated
Fluctuating wavelength, the Fluctuation Strength of plate.
As shown in table 1, for the glass plate after the grinding of example 61~72, the oscillating curves of the first interarea of glass plate
10 average heights be 0.02 μm, and Fluctuation Strength of the Fluctuation Strength for the wavelength 10mm that rises and falls relative to fluctuating wavelength 20mm
The ratio between be 0.06~0.21.
[table 1]
According to the result of Fig. 5 (A)~(C), Fig. 6：10 average heights in oscillating curves are identical, increase
When the ratio between the Fluctuation Strength of glass plate before big grinding, milling time index reduces.In particular, by using the ratio between Fluctuation Strength
For 0.20 or more glass plate, be easy grinding 10mm spacing can differential grinding, therefore, it is possible to shorten milling time to carry
High efficiency.
As indicated above, it is known that：After grinding, compared with the fluctuating component of fluctuating wavelength 20mm, the fluctuating of fluctuating wavelength 10mm
Ingredient is greatly decreased.Therefore, the fluctuating component of (grinding) previous 20mm spacing can not only be removed, and can remove and (grind
Mill) 10mm spacing fluctuating component, therefore the few high-quality plate of glass of irregular colour can be manufactured.
Embodiment, the embodiment etc. of glass plate and its manufacturing method are illustrated above, but the present invention is not
It is defined in the above embodiment, embodiment etc., the gist of the invention recorded in claims in the range of can carry out
Various modifications, improvement.
Claims (6)
1. a kind of glass plate, thickness is 0.75mm or less, which is characterized in that
10 average heights of the oscillating curves of at least one of the first interarea or the second interarea are 0.2 μm hereinafter, and rising and falling
The ratio between the Fluctuation Strength of the Fluctuation Strength of wavelength 10mm relative to fluctuating wavelength 20mm is 0.20 or more.
2. glass plate as described in claim 1, wherein the Fluctuation Strength of the fluctuating wavelength 10mm is relative to the fluctuating wave
The ratio between Fluctuation Strength of long 20mm is 0.30 or more and 1.0 or less.
3. glass plate as described in claim 1, wherein the thickness of the glass plate is 0.45mm or less.
4. glass plate as claimed in claim 3, wherein the Fluctuation Strength of the fluctuating wavelength 10mm is relative to the fluctuating wave
The ratio between Fluctuation Strength of long 20mm is 0.30 or more and 0.80 or less.
5. a kind of manufacturing method of glass plate comprising using grinding slurry to described in glass plate as claimed in claim 1 or 2
At least one grinding process being ground of first interarea or second interarea, wherein
In the grinding process, at least one of grinding first interarea or second interarea make the oscillating curves
10 average heights be 0.07 μm hereinafter, and the fluctuating wavelength 10mm Fluctuation Strength relative to the fluctuating wavelength
The ratio between Fluctuation Strength of 20mm is 0.03~0.30.
6. a kind of manufacturing method of glass plate comprising using grinding slurry to described in the glass plate described in claim 3 or 4
At least one grinding process being ground of first interarea or second interarea, wherein
In the grinding process, at least one of grinding first interarea or second interarea make the oscillating curves
10 average heights be 0.07 μm hereinafter, and the fluctuating wavelength 10mm Fluctuation Strength relative to the fluctuating wavelength
The ratio between Fluctuation Strength of 20mm is 0.03~0.25.
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| JP2016028392A JP6299784B2 (en) | 2016-02-17 | 2016-02-17 | Glass plate and method for producing glass plate |
| JP2016-028392 | 2016-02-17 |
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| DE102017124625A1 (en) * | 2016-12-22 | 2018-06-28 | Schott Ag | Thin glass substrate, method and apparatus for its manufacture |
| EP4424870A1 (en) * | 2021-10-28 | 2024-09-04 | Tokai Carbon Co., Ltd. | Polycrystalline sic molded body and method for manufacturing same |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1315011A (en) * | 1999-06-24 | 2001-09-26 | 精工爱普生株式会社 | Substrate of liquid crystal display, method for manufacture thereof, liquid crystal display, method of manufacture thereof, and electronic device |
| CN103492122A (en) * | 2012-01-18 | 2014-01-01 | 安瀚视特控股株式会社 | Production method for glass plate, production method for glass substrate for display, and glass plate |
| CN104364217A (en) * | 2012-06-05 | 2015-02-18 | 旭硝子株式会社 | Glass substrate finish-polishing method, and alkali-free glass substrate finish-polished according to said method |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0365529A (en) | 1989-08-02 | 1991-03-20 | Sharp Corp | Production of glass substrate for liquid crystal display element |
| JP2012179680A (en) * | 2011-03-01 | 2012-09-20 | Asahi Glass Co Ltd | Method for polishing glass plate |
| KR101300858B1 (en) * | 2011-03-30 | 2013-08-27 | 아반스트레이트코리아 주식회사 | Method and apparatus for making glass sheet |
| KR101522452B1 (en) * | 2012-04-17 | 2015-05-21 | 아반스트레이트 가부시키가이샤 | Method for making glass substrate for display, glass substrate and display panel |
| JP2017030976A (en) * | 2013-12-04 | 2017-02-09 | 旭硝子株式会社 | Finish polishing method of glass substrate and non-alkali glass substrate finish polished by such method |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1315011A (en) * | 1999-06-24 | 2001-09-26 | 精工爱普生株式会社 | Substrate of liquid crystal display, method for manufacture thereof, liquid crystal display, method of manufacture thereof, and electronic device |
| CN103492122A (en) * | 2012-01-18 | 2014-01-01 | 安瀚视特控股株式会社 | Production method for glass plate, production method for glass substrate for display, and glass plate |
| CN104364217A (en) * | 2012-06-05 | 2015-02-18 | 旭硝子株式会社 | Glass substrate finish-polishing method, and alkali-free glass substrate finish-polished according to said method |
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| JP6299784B2 (en) | 2018-03-28 |
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| TW201730128A (en) | 2017-09-01 |
| KR102574158B1 (en) | 2023-09-05 |
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| KR20170096944A (en) | 2017-08-25 |
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