TWI246636B - Double-sided exposure system - Google Patents

Abstract

A double-sided exposure system (1) has a first work holding device (21L) for holding a substrate (P) opposite to an exposure mask (55) to expose a first surface of the substrate (P) through the exposure mask (55) to light, and a second work holding device (21R) for holding the substrate (P) opposite to another exposure mask (55) to exposure a second surface of the substrate (P) through the exposure mask (55) to light. Phases of operations for receiving, transferring and pretreating an unexposed substrate, and those of operations for transferring, exposing and pretreating the substrate having one surface processed by an exposure operation can be staggered to prevent time loss due to waiting during an exposure operation can be prevented even if the double-sided exposure system is provided with a single light source.

Description

1246636

Ministry of Economic Affairs, Intellectual Property Bureau, employee consumption cooperative, printing

The present invention is directed to a double sided exposure system. More particularly, the present invention relates to a double-sided exposure system that can successively expose a first side and a second side of a sheet through a mask "providing a predetermined exposure pattern, such as as a printed wiring board. The substrate or the lead frame sheet; and, in particular, only a single exposure source is provided. Generally, an exposure system for use in, for example, manufacturing a high-density printed wiring board is provided with an ultrahigh pressure mercury lamp as an exposure light source for high resolution. This type of mercury lamp is very expensive and costs about 500,000 yen. The process requires the mercury lamp to remain lit, and the mercury lamp has a service life of only about 500 hours. Therefore, if possible, the exposure system must be provided with a single light source, and the light source must be used as much as possible with the highest economic efficiency. That is, it is necessary to reduce the exposure cost of the substrate of each printed circuit board. Operating cost) to the lowest possible range of use of the light source, it is possible to operate as many exposure cycles as possible in its use. In order to improve the economical efficiency of the light source, it is very important to increase the operating speed of the mechanical unit, including a transport mechanism for transporting the substrate, a calibration adjustment mechanism for the calibratable substrate and the reticle, etc., and further reducing, for example, the exposure waiting time to Approaching zero is also very important. Referring to Fig. 13, there is shown a double-sided exposure system, which is disclosed in the patent application Ν〇 343971/1997 (JP-A Ν〇. 333337/8) having a workpiece holder 1 〇 1 is provided with a vacuum 塾 〇 3 on the opposite sides thereof to releasably hold a substrate Ρ, and the workpiece holding seat 1 会 1 repeatedly moves between an original position and an exposure position, The former is the position between the workpiece receiving unit 1〇5 and the workpiece transfer unit 1〇7 in the imaginary line (please read the note on the back side and then fill in the page) --------Book --- ------Line - This paper scale applies to the National Standard (CNS) A4 specification (2) G χ 297 public

Printed by the Ministry of Economic Affairs, Intellectual Property Bureau, Staff Consumer Cooperatives 1246636 — A7 , ^ B7 V. Inventive Note (2) The latter is shown by the solid line between the reticle holding mechanisms 109L and 109R which respectively hold the reticle 113. The light emitted by a mercury short arc lamp 111, that is, the light source, passes through a left optical path and shines on the back of the reticle 113 held by the left reticle holding mechanism 109L or the light passes through a right optical path. The back surface of the reticle 113 held by the right reticle holding mechanism 109R. An optical path selecting unit, not shown, selectively connects the mercury short arc lamp to the left or right optical path. The workpiece receiving unit 105 adjusts the position of the unexposed substrate p to be pre-clamped and shifts the substrate P to the left side of the workpiece holder 101 at the original position shown in FIG. Vacuum pad 103. When the workpiece holder 101 holding the unexposed substrate P on the left side reaches the exposure position, the left mask holding mechanism 109L advances to bring the mask 113 into contact with the substrate P' to make the mask 113 and Substrate P calibration. After the reticle 113 has been properly aligned with the substrate P, the reticle 113 will fixedly contact the substrate p. An exposure cycle is then performed to expose a first side through which the surface of the substrate P is exposed. After the exposure cycle is completed, the left reticle holding mechanism 10 is detached from the substrate P; after the left reticle holding mechanism 109L is retracted, a left shifting arm 115L holds the substrate p and moves it. Go to a right shift arm 11 . At the same time, the workpiece holder 101 will return to the original position and be moved to the exposure device again. Then, the right shift arm 115R moves the substrate P to the right vacuum 103, and the right mask holding mechanism 1 911 advances to come into contact with the substrate p to align the mask 113 with the substrate P. After the reticle 113 has been properly calibrated to the substrate P, the reticle 113 will fixedly contact the substrate p.嗣会-------------^--------^---------^ (Please read the notes on the back and fill out this page)

----------------- (Please read the notes on the back and fill out this page) Printed by the Intellectual Property Office of the Ministry of Economic Affairs

1246636 A7 I ____ V. INSTRUCTION DESCRIPTION (3) An exposure cycle is performed to expose a second side through which the other side of the substrate p is exposed. Thus, the I exposure of both sides of the substrate p can be completed. When the exposure cycle is completed, the right mask holding mechanism 1〇9R is removed by the I substrate P. The right mask holding mechanism 109R is retracted, and the workpiece holder 101 is returned to the original position. Then, the left vacuum pad 103 receives an unexposed substrate P from the workpiece receiving unit 105, and the workpiece transfer unit 107 receives the exposed substrates on both sides by the right vacuum pad 103 and feeds them away. Fig. 14A is a time chart showing the conventional double-sided exposure system 1 "operation sequence. In Fig. 14A, the time is calculated in seconds on the horizontal axis, and the exposure time is about 3 seconds or less. In this time table, the exposure time is 3 seconds, and the cycle time, that is, the time from the start of receiving an unexposed substrate P to the start of accepting the next unexposed substrate p: It is 22 seconds. As can be seen from Fig. 14A, when the exposure time of the double-sided exposure system 100 is limited to 3 seconds, the first light of the substrate p is completed and the substrate is exposed to be exposed. Between the second side, there is no waiting time A ^ Some photoresist applied to the substrate P requires a longer exposure time. When the field requires a long exposure time, the exposure operation of the second side of the substrate p will not start before the completion of the exposure operation of the first side of the substrate P. Even if the exposure preparation operation of the mechanical unit is completed. Already completed; this will result in a loss of time. Figure 14B shows the Japanese temple schedule, which does not show the conventional double-sided exposure system (10) This paper scale applies to public meals. 6 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative print

Γ 246636 V. Inventive Note (4) #作序' wherein the exposure time of both sides of the substrate P is 8 seconds each. In this example, there is a waiting time of -5·5 seconds between the completion of the preparation of the second side of the substrate p and the start of the second surface; and the substrate p is held by the workpiece holder 1G1. The left side shift to the right side is completed, and the workpiece holding seat 1〇1 is moved back to the original position, that is, after the operation and operation of exposing the second side of the substrate p, there is also a waiting time of 5. 5 seconds. . Therefore, the operation cycle time is as long as 32 seconds, which is about 1.5 times of the time required for the operation shown in Fig. 14, so the operation cost of the lamp u is significantly improved to the operation shown in Fig. 14A. The operating cost required is nearly 15 times. It is a matter of the foregoing that the present invention has been accomplished, that is, the object of the present invention is to provide a double-sided exposure system which, while increasing the exposure time, can also suppress a large increase in time loss. In view of the above, the present invention provides a double-sided exposure system that can illuminate opposite sides of a panel by a reticle having a desired exposure pattern, respectively, including - the first reticle holding mechanism can be held a first light army for exposing the first side of the sheet; a first workpiece holder movable to - a first exposure position in front of the first mask holding mechanism, and an unexposed portion at the front of the first mask holding mechanism Between the first original positions of the slab; _ second reticle holding mechanism can be held - the second reticle is used to expose the second side of the slab; - the second workpiece holder can be moved - in the second a second exposure position 'before the reticle holding mechanism' and a second original position from which the two exposed sheets can be removed; - a single light source; - an optical path selection optical system, optionally The light source is connected to the _th optical path to the first exposure position, or a second optical path to the second exposure position; and a workpiece 1246636 A7 B7 5. The invention (5) the transfer mechanism can be The first workpiece holder receives the first exposure position The sheet of the first side is exposed and the sheet is transferred to the second workpiece holder, and the second side of the sheet is exposed. According to the present invention, the double-sided exposure apparatus is provided with two workpiece holders, that is, the first workpiece holding seat is specifically for exposing the first surface of the sheet, and the first workpiece holding seat is specifically for exposing the sheet. The second side. Therefore, receiving and transmitting the unexposed sheet, the side of exposing the sheet, and the operation period of the previous processing, etc., can be used to transfer the substrate that has been exposed, expose the other side of the substrate, and previously process, etc. The operation period is relatively adjusted and transformed. Therefore, each operation period of the first processing unit (the first mask holding mechanism and the first workpiece holder), and the operation period of the second processing unit (the second mask holding mechanism and the second workpiece holder), and the like, The second processing unit can perform the exposure operation when the first processing unit performs other operations that are not exposed. Therefore, even if only a single light source is used, it can be reliably prevented due to the time loss caused by waiting for the exposure operation. The time loss caused by the period of moving the workpiece holding seat and the time loss of waiting for the exposure can be avoided by adjusting the operating time points of the components, so the workpiece transfer mechanism can be in the first processing unit. After the exposure operation is completed, a sheet that has been exposed is mounted on the second workpiece holder before the second workpiece holder reaches the second exposure position. In the double-sided exposure system of the present invention, preferably, the first workpiece holder can hold the sheet in a vertical position at least when one side of the sheet is exposed, and the second workpiece holder is at least On the other side of the plate (please read the note on the back and then fill out this page). One--------^--------- Ministry of Economic Affairs, Intellectual Property Bureau, Staff and Consumer Cooperatives system

This paper scale 剌t customs standard (CNS) 乂 4 specifications (210 X 297 public) 1246636 A7

Printed by the Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative. V. Invention description (6) When the exposure operation is performed, the plate can be held in a vertical position. When the first and second workpiece holders can hold the sheet in the vertical position, the exposure can be performed by the two masks and the vertically held sheets. This can effectively prevent adhesion by dust. Poor exposure caused by the surface of the sheet. In the double-sided exposure system of the present invention, preferably, the first and second reticle holding mechanisms are opposite to each other, and the workpiece transfer mechanism can move the sheet from the first workpiece transfer device to a space to a second workpiece transfer device, the space being located between the first and second reticle holding mechanisms, and at least one of the first and second workpiece holders is located at its original position The special space for the transfer of the plate is required, so that the double-sided exposure system can be made into a compact structure. BRIEF DESCRIPTION OF THE DRAWINGS The foregoing and other objects, features and advantages of the present invention will become more apparent from Front view of the exposure system, wherein the box system is partially cut off; Figure 2 is a top view of the main part of the double-sided exposure system shown in Figure 1; Figure 3 is the double side shown in Figure 1. A perspective view of the main part of the exposure system; Figure 4 is a front view diagram to assist in the unexposed substrate receiving operation of the left workpiece lifter of the double-sided exposure system shown in Figure ;; China National Standard (CNS) A4 specification (21G X 297 public Chu) "--------- I ^-------I ^---------^ (please first Read the notes on the back and fill out this page.) 1246636 Ministry of Economic Affairs, Intellectual Property Bureau, Staff and Consumer Cooperatives, Printed A7 B7 V. Description of the Invention (The intention of the double is to help explain the first treatment of the first treatment as shown in Figure 1 Exposure operation; 雔 Γ 图 系 — 前 前 前 前 前 前 前 前 前 前 前 前 前 前 前The substrate receiving operation of the transfer arm; Fig. 7, the figure is a front view, which is used to assist in explaining the exposure of the first face "moving between the left and right transfer arms" - the workpiece transfer operation of the substrate Figure 8 is a front view to assist in the description of the exposure operation of the first processing unit and the substrate mounting operation of the right workpiece lifter in the double-sided exposure system shown in Figure 第; It is a front view schematic diagram for assisting in explaining the substrate receiving operation of the left shifting arm and the exposure operation of the second processing unit in the two-sided exposure system shown in FIG. 1; FIG. 10 is a front view To assist in explaining the double-sided exposure system shown in FIG. 1, the exposure operation of the second processing unit, and the simultaneous transfer operation between the left and right transfer arms; FIG. 11 is a front view Schematic diagram for assisting in explaining the exposure operation of the first processing unit and the removal operation of a double-sided exposed substrate in the double-sided exposure system shown in FIG. 1; FIG. 12 is a first diagram Time schedule of continuous operation performed by the double-sided exposure system shown; Figure 13 It is a front view of a main part of a conventional double-sided exposure system; and the 14th and 14th drawings show that the conventional double-sided exposure shown in Fig. 13 applies the Chinese National Standard (CNS) A4 specification (210). X 297 mm) _ 1〇

^--------- (Please read the notes on the back and fill out this page) 1246636 V

Ministry of Economic Affairs, Intellectual Property Office, Staff and Consumers Cooperatives, Printing and Printing Clothing A7 B7, Invention Description (8) The schedule of continuous operation. The construction of a double-sided exposure system 1 in accordance with a preferred embodiment of the present invention will be described with reference to Figures 1 through 3, which are capable of processing substrates for use in forming printed wiring boards. In Fig. 1, the face of the paper sheet is set to the front side, and the other side of the paper sheet is the back side, the left side of the drawing is the left side, and the right side of the drawing is the right side. Referring to Figures 1 to 3, a seat panel 5 having a wall similarly is disposed vertically in the middle of a casing 3, and an optical system chamber 7 is formed behind the seat plate 5. A horizontal partition 9 is provided in a space in front of the seat plate 5 and at an intermediate level of the height of the space. The space under the partition 9 forms a receiving/transporting chamber 11, and the space above the partition 9 forms an exposure chamber 13. An opening 9a is provided in a central portion of the partition 9. The receiving/transporting chamber 11 and the exposing chamber 13 are connected to each other by the opening %. A workpiece inlet 15 and a workpiece outlet 17 are respectively disposed on the left and right side walls of the casing 3. A left workpiece lifter (first workpiece retaining means) 21L and a right workpiece lifter (second workpiece retaining means) 21R are disposed in the casing 3 and are vertically movable through the opening %. A left photomask holding mechanism 23L and a right photomask holding mechanism 23R are provided in the exposure chamber 13, and are located outside the paths of the left and right workpiece lifters 21L and 21R, respectively. The left workpiece lifter 21L and the left shutter holding mechanism 23L constitute a first processing unit 25L. The right workpiece lifter 21R and the right shutter retaining mechanism 23R constitute a second processing unit 25R. The first processing unit 25; L is mainly used to expose a first surface of a substrate P to manufacture a printed wiring board, and the second processing unit 25R is mainly used to expose a second surface of the substrate p. Applicable to China National Standard (CNS) A4 specification (210 X 297 public) Μ--------^---------^ (Please read the notes on the back and fill out this page) 11 1246636 Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Print A7 _____________ V. Description of the Invention (9) A loading device 27 is disposed on the left side of the receiving/transporting chamber η' on the left side of the workpiece lifter 21L. A receiving conveyor belt 29 has a left end facing the workpiece inlet 15. A substrate ρ is fed by a feed conveyor which is not shown and extends to the left of the casing 3, and is fed through the workpiece inlet to the receiving conveyor 29. The substrate has opposite opposite sides coated with a UV-resistant resist film. The substrate ρ is conveyed by a drive roller, not shown, which is incorporated in the receiving conveyor 29 from which the substrate 送 is fed to the loading device 27. The loading device 27 has a holding function for holding the substrate Ρ on the loading table for holding, and a calibration function can adjust the leading edge position of the substrate 对齐 to a pre-calibration sensor 31 (Fig. 1). . The loading device 27 is rotated a 90 after the substrate ρ has been pre-calibrated and is readable to be positioned on the loading device 27. The corner to one position is shown horizontally as shown by the imaginary line in Fig. 1. The loading device 27 is supported on a shaft 33 which is extended forward by the seat plate 5. The shaft 33 is framed on a moving mechanism provided on the back surface of the seat plate 5 but not shown, and is movable laterally. A discharge device 35 is provided on the right side of the path of the workpiece lifter 21R, and a transfer wheel feed belt 37 is provided on the right side of the discharge device 35. The unloading device 35 has an upper surface that can be vacuumed when necessary by a vacuum device not shown. The unloading device 35 can be placed in a horizontal position, as shown by the solid line in Fig. 1, and can be rotated by a horizontal position by this. Angle to a vertical position with its upper surface facing left. The unloading device 35 is supported by a shaft 33 projecting forward from the seat plate 5, and is pivotally mounted on the back of the seat plate 5 but is not shown to be of the Chinese National Standard (CNS) A4 specification ( 210 χ 297 mm) -------- Order --------- Line · (Please read the notes on the back and fill out this page) 12 1246636 Zambia Intellectual Property Office Staff Consumer Cooperative Printed Α7 Β7 5. The moving mechanism of the invention (10) can be moved laterally. The transfer conveyor belt 37 has a right end opposite the workpiece exit 17. When the right workpiece lifter 21R holds the substrate p down to the bottom position, the vertical position removing device 35 will receive the substrate P from the right workpiece lifter 2 ir, and the unloading device 35 will Go to the horizontal position. The substrate p is transferred from the unloading device 35 to the transfer conveyor 37 by means of a drive roller which is included in the unloading device 35 but not shown. The transfer conveyor belt 37 transfers the substrate p through a workpiece exit 17 to a conveyor belt, not shown, and feeds the substrate p to the next process, such as a development process. As shown in Fig. 2, there are a pair of parallel right vertical guide rails %, and a pair of parallel left vertical guide rails 36 which are laterally corresponding to the intermediate portion fixed to the back surface of the seat plate 5. The slider 39 and the like slide along the left and right hanging guides 36, respectively. The horizontal arms 41 and the like are protruded from the sliders 39 through the slots provided in the seat plate 5, respectively. The workpiece lifters 21L and 21R are fixed to the front ends of the horizontal arms 41, respectively. The workpiece lifters 21L and 21R are capable of holding the substrate p in a vertical position by suction and are vertically movable. Although the workpiece lifters 21L and 2ir are shown as a simple rectangular plate in the drawings, in fact, each of them has a movable seat in the shape of a vertical wall, and a vacuum pad is provided with a plurality of suction holes and attached thereto. On one side, that is, on the left side of the left workpiece lifter 211, or on the right side of the right workpiece lifter 2 1R, the movable seat, and a vacuum system are connected to the vacuum pad. A substrate p can be removably held on the vacuum crucible. The slides 39 are respectively applied to the standard of the Chinese National Standard (CNS) A4 (21G 297 297 public meals) by a servo paper driven by a servo motor-------- ^- -------^---------$ (Please read the notes on the back and fill out this page) Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed 1246636 _ A7 V, send ~ -- I move the workpiece lifter 2 vertically and through the partition 9 m hole 9a. The workpiece lifter jaws and (4) are respectively moved between their & original position and the exposure position, the original position is like the first! The figure and the line are shown between the loading device 27 and the unloading device %, and the imaginary line of the exposure position 卩Μ 1@ is shown between the photomask holding mechanisms 2 and 23R. As shown in Fig. 2, the horizontal guide 45 or the like is fixed to the left side of the seat plate 5, and the left and right side portions of the V6 are extended to extend laterally. The slide ο or the like can slide the horizontal guide rails 45. The arms 49 and the like respectively pass through the slots 56 provided in the seat plate 5, and the sliders 47 project horizontally forward. Each of the sliders ... has a ball screw, that is, a nut not shown, and a screw 53 is sleeved with a spherical bearing. The screw 53 is driven by a servo motor 5A. . The snail 53 will rotate to move the carriage 47 laterally. The reticle holding mechanism L (23R) is moved between a retracted position and a forward position, the retracted position being a path away from the workpiece lifter 2il (21R), and the advanced position causes the light to be One of the masks held by the cover holding mechanism 23L (23R) contacts the substrate p held by the workpiece lifter 21L (21R). Although the reticle holding mechanisms 23L and 23R are only shown as simple rectangular plates in the drawings, they actually have a rectangular seat, and a calibration unit is fixed on one side, that is, a is in the left mask. The right side of the holding mechanism 2 3 L, or the left side of the right mask holding mechanism 23R, on the rectangular seat, an exposure cover 55 is shown in point in FIG. 3, and a camera can detect and calibrate error. The position of the calibration unit on a vertical plane is adjusted so that the exposure cover 55 can be properly positioned and calibrated. This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 14 Order---------Line - (Please read the note on the back and fill in this page) Bureau employee consumption cooperative printing 1246636 A7 L B7, invention description (l2) The exposure cover 55 is provided with a predetermined light transmission pattern, and the mask symbol, although not shown, is set at a predetermined position. The degree of alignment of the mask marks with the reference holes provided in the substrate P will be measured by the camera, and the exposure cover 55 and the substrate P can be aligned. A single lamp 61 is provided in the central portion of the bottom of the optical system chamber 7 of the casing 3. The lamp 61 is a mercury short arc lamp. The lamp 61 emits a straight upward light. A half-transparent rotatable mirror 63 is disposed above the lamp 61. The rotatable mirror 63 can be disposed at a first position as shown by the broken line in FIG. 1 , and reflects the light emitted by the lamp 6 向 to the left, and a second position as the double-point chain of FIG. 1 . As indicated by the line, the light emitted by the lamp 61 is reflected to the right, or an intermediate position, i.e., a horizontal position. An illumination mirror 65L is disposed on the left side of the left mask holding mechanism 23L, and an illumination mirror 65R is disposed on the right side of the right mask holding mechanism 23R. A mirror 67 or the like is provided at the left end and the right end of the optical system chamber 7. A compound eye (fly eye) lens 69 or the like is provided between the rotatable mirror 63 and the second mirror 67, respectively. When the rotatable mirror 63 is set in the first position, the light emitted by the lamp 61 is reflected by the left mirror 67 and the left illumination mirror 65L, and the left mask retaining mechanism is directed toward the left mirror. The exposure cover 55 held by 23L. When the rotatable mirror 63 is disposed at the second position, the light emitted by the lamp 61 is reflected by the right mirror 67 and the right illumination mirror 65R, and is directed toward the exposure cover held by the right mask holding mechanism 23r. 55. When the left workpiece lifter 21L holding a substrate P is in the exposure position, and the rotatable mirror 63 is set to the first position, the left exposure cover 55 will be brought to contact the first side of the substrate P. The first side of the substrate p will pass the Chinese National Standard (CNS) A4 specification (210 X 297 mm) through the paper scale -------I----I · ^ HI —--- ^* — — — — — 1 — (Please read the notes on the back and fill out this page) 15 1246636 Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed A7 ____B7____ V. Invention Description (l3) The left exposure cover 55 The light emitted by the lamp 61 is exposed, and a latent image of the exposure pattern of the left exposure cover 55 is formed on the first surface of the substrate P. When the right workpiece lifter 21R holding the substrate P is in the exposure position, and the rotatable mirror 63 is set to the second position, the right mask 55 is brought to contact the second side of the substrate P, The second side of the substrate P is exposed to the light emitted by the lamp 61 through the right mask 55, and a latent image of the exposure pattern of the right mask 55 is formed on the second side of the substrate p. Referring to Fig. 3, the transfer mechanisms 75L and 75R have transfer arms 77L and 77R, a slider 79, and the like, respectively. A seat plate 71 is provided on the seat plate 5, and the guide 73 and the like extend laterally on the top plate 71. The carriages 79 are in the form of elongated flat plates and extend horizontally forward and the rear end portions are slidably pivotally mounted on the guides 73. The left slider 79 is laterally moved by a gas actuator 81 (i-th) through a relatively short distance, and the right slider 79 is laterally moved by a ball screw 85 driven by a servo motor 83. Relatively long distance. The shift arm driving unit 87 and the like are respectively attached to the front end portions of the sliders 79, and the parallel link 89 and the like are provided, respectively. The shifting arms 77L and 77R are respectively fixed to the operation end/transition #77L (77R) of the parallel link (4) as a hollow member, and the opposite side members are provided with suction protrusions. The hollow spaces of the transfer arms 77L and 77R are connected to a suction device, not shown. When the hollow spaces are evacuated, a suction action is generated at the end faces of the suction projections. The parallel link 89 can be rotated about one turn between a horizontal position extending horizontally forward and a vertical position extending downwardly. angle. When the flat cups 89 are broken, the transfer arm that was originally held in the horizontal position is the paper ruler----------------------- - (Please read the notes on the back and fill out this page) 1246636

The 77L and 77R printed by the Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs will be vertically moved away. _ The waiting position is between the bottom position and the bottom position. The waiting position is at a level higher than the level of the mask holding mechanisms 23L and 23r. As shown in Fig. 3, the bottom position is at a slightly higher level than the middle portion of the reticle holding mechanisms 23L and 23R, as shown in the figure. The operation of the double-sided exposure system 1 will be explained with reference to Figs. 4 to 12. The fourth to eleventh drawings are used to assist in explaining the series of time-point operations of the double-sided exposure system, and the twelfth figure shows the operation sequence of the double-sided exposure system (6). In the initial stage of operation, only the first processing unit is operating, and the one marked (*) asterisk in Fig. 12 will not proceed until the first processing unit 25L completes the first exposure cycle. The interval between the vertical dotted lines in Fig. 12 is equivalent to 1 second. In the initial state, the workpiece lifters 2111 and 211 are respectively located at the original positions, the shutter holding mechanisms 23L and 23R are respectively fixed to the retracted position, and the loading device 27 and the unloading device 35 are disposed at the horizontal position to make them With the upper surface facing up, the transfer arms 77L and 77R are respectively in their waiting positions. The rotatable mirror 63 is set at an intermediate position. When the double exposure system is activated, the high beam 61 will be illuminated until the system is stopped. That is, a substrate p will be fed into the receiving conveyor 29, which will be "shifted" by the receiving conveyor to the loading device 27, the position of the substrate p on the loading device 27 will be adjusted in advance Then, as shown in Fig. 4, the loading device 27 is placed in a vertical position and moved toward the workpiece lifter 21L so that the workpiece lifter 21L sucks the substrate p ("12" Accepting "). The left workpiece lifter 21L holding the substrate P is raised to the exposure position as shown by the imaginary line in Fig. 4 ("up," in Fig. 12). Oh, that

This paper scale depends on the _ home fresh (CNS) A4 specifications (2: 10x297 public love Μ--------1---------^ (please read the back of the note before you fill out this Page) 1246636 A7 B7 V. INSTRUCTION DESCRIPTION (l5) The loading device 27 will return to its original position, perform the procedure of accepting the next substrate p, and wait for the left workpiece lifter 21L to be lowered to the waiting position. When the lifter 21L is in the exposure position, the first face of the substrate p is placed opposite the left mask retaining mechanism 23L. The left mask retaining mechanism 23L is moved to the advanced position (Fig. 12' 'Advance,," such that the exposure cover 55 can be in optical contact with the substrate p and calibrated with the substrate p ("calibration" in Fig. 12). The mask 55 is set to The substrate P is closely contacted ("contact" in Fig. 12). Then, the rotatable mirror 63 is rotated to be set at the first position ("first position," in Fig. 12). The ultraviolet radiation emitted by the lamp 61 passes through the mask 55' held by the mask holding mechanism 23L and shines on the first surface of the substrate p, as shown in Fig. 5 (12th) "Exposure" in the figure. After the first face of the substrate P is irradiated with ultraviolet radiation for a desired exposure time, for example, 8 seconds, the rotatable mirror 63 is rotated to be placed at an intermediate position, the mask 55 will be removed by the substrate p (released in Fig. 12) 'Then then the left-most reticle holding mechanism 2 3 L will return to the retracted position ("return" in Fig. 12). Then 'the left shift The arm 77L moves to the right via the bottom position, sucks the substrate P and moves to the bottom position as shown in Fig. 6 ("transfer" in Fig. 12). That is, the first side has been exposed. The substrate P will be moved by the left workpiece lifter 21L to the left shift arm 77L. The left workpiece lifter 2il will be lowered to the original position, as shown by the imaginary line in Fig. 6 (Fig. 12) ''Down,') The left workpiece lifter 21L will re-take the next substrate P by the loading device 27 in the home position. At the same time, after the left workpiece lifter 21L reaches the home position, the right shift paper The scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (please read the notes on the back and fill out this page) • See ------- —订--------- Line · Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing 18

— — — — — — — — — — — — — 11 (Please read the notes on the back and fill out this page) t Line · Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative print

The paper size is in accordance with China National Standard (CNS) A4 specification (210 X 297 public). 1246636 The arm 77R will move to the left at the horizontal position of the waiting position and descend to the bottom position and face the right side of the left shift arm 77L. The substrate p held. That is, the substrate P is moved from the left shift arm 77L to the right shift arm 77R (transfer in Fig. 12). Then, the right shift arm 77R holding the substrate P is horizontally moved to the position shown by the imaginary line of Fig. 7, that is, between the path of the left workpiece lifter 21 l and the right workpiece lifter 21R. The right shift arm 77R will wait at this position. (‘‘Accept and Wait,” in Figure 12). The first processing unit 25L· repeats the rising operation, the forward operation, the calibration operation, and the exposure operation in sequence. At the same time, the right shifting arm 77R will immediately move to a position between the right workpiece lifter 21R and the reticle holding mechanism 23R after the first processing unit 25L starts the aligning operation ("moving to the right" in Fig. 12 "). In the second and subsequent exposure cycles, the timing at which the calibration is initiated corresponds to the time at which the right workpiece lifter 21R completes the movement from the exposure position to the home position. Then, the right workpiece lifter 21 r will rise to the exposure position ("rise," in Fig. 12). Then, the right shift arm 77R will move to the left, and the substrate whose first side has been exposed will be exposed. P is moved to the right workpiece lifter 21R, so that the right workpiece lifter 21R sucks the substrate p as shown in Fig. 8 ('''''''''''''' The device 21R is sucked with its second side facing the right; that is, the substrate P has been reversed in a program shifted from the left workpiece lifter 21L to the right workpiece lift H21R. Then, the right shift is performed. The arm sign will return to the waiting position. When the first processing unit 25L is in the exposure operation, the right mask holding mechanism 23R of the second processing unit 25R moves to the forward position ("19 1246636 A7 B7 Ministry of Economy" The Intellectual Property Office employee consumption cooperative prints five, the invention description (17) advances), and causes the photomask 55 to be in contact with the second side of the substrate P, and the mask 55 is aligned with the substrate P (Fig. 12) "Calibration,". The first processing unit 25L will complete its exposure operation just before the calibration operation is completed. And the rotatable mirror 63 is rotated to be set at the intermediate position. In the second processing unit 25R, the photomask 55 held by the right mask holding mechanism 23R is set to be in close contact with the photomask 55 after the calibration operation is completed. The substrate P ("close contact," in Fig. 12). 可, the rotatable mirror 63 is rotated to be set at the second position ("second position," in Fig. 12), for example, ninth As shown in the figure, the ultraviolet radiation emitted from the lamp 61 is transmitted through the mask 55 held by the right mask holding mechanism 23R to illuminate the second surface of the substrate p ("exposure" in Fig. 12). In the first processing unit 25L, the substrate P whose first surface has been processed by the exposure operation is transferred to the transfer arm 77L by the left workpiece lifter 2il, and the workpiece lifter 21L is lowered again to the original The bit is to receive the next workpiece P. When the second processing unit 25R is in the exposure operation, the right shift arm receives the substrate P' whose first surface has been processed by the exposure operation by the left shift arm 77L. As shown in the figure, the workpiece lifter 21L· of the first processing unit 25L is raised and raised, the mask The holding mechanism 23L will be operated to "advance, and" calibrate, the second processing unit 25R will complete the exposure operation, the reticle holding mechanism 23R will retreat and "retract", and the workpiece lifter 21R will move to the original position. And the removing device 35 receives the workpiece P which has been processed by the exposure operation on both sides by the workpiece lifter 21R, as shown in Fig. u. The processed substrate P is sent out of the box by the conveying conveyor 37. Body 3. After that, in the 8th paper ruler money standard (CNS) A4 specification (210 X 297 public) _ --------^---------^ (Please read the notes on the back and then fill out this page) 20 Γ246636 一Α7,^ ------——-5Ζ____ V. Description of the invention (is), 9, 10, 11 as described above Will repeat again and again. As can be seen from the time schedule shown in Fig. 12, there is no neutral time in which no operation is being performed. The cycle time of the exposure operation shown in Fig. 12 is 26·5 seconds, which is a conventional exposure 8 of 8 seconds as shown in Fig. 14 and the exposure time of the first 100 exposure operation is 32 seconds. The shorter one is about 7%. In other words, the exposure time of one side is increased by 5 seconds by 5 seconds, and the Φ (four) time of both sides is increased by 10 seconds, but the time increased by the two sides can be limited to 4.5 seconds (time loss in Fig. 14 〇 5 Second is absorbed). Although the present invention is illustrated by a double-sided exposure system capable of exposing a substrate having a photoresist film on both sides, the present invention is not limited to this practical application, and can be applied to various types of double-sided exposure systems. The two sides of the plate-shaped workpiece are exposed through a photomask provided with a predetermined exposure pattern. Although the double-sided exposure system of the present invention is provided with a workpiece lifter that moves vertically, the present invention is also applicable to a double-sided exposure system that is provided with a workpiece holder corresponding to the workpiece lifters, and is Designed to move in a horizontal direction. While the invention has been described with respect to the preferred embodiments of the invention, Therefore, it is to be understood that the invention may be practiced otherwise than as specifically described, without departing from the scope and spirit. This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -------------- Installation — (Please read the back note and then fill out this page) --Line · , Ministry of Economic Affairs, Intellectual Property Bureau, Staff Consumption Cooperative, Printing 21 1246636

Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing 5, invention description (19) component label comparison 1 ··· double-sided exposure system 33, 33'···axis 3...box 35...removal device 5...seat plate 36 ...left and right vertical guide 5a, 5b··· slot 37...transport conveyor 7···optical system room 39...slide 9...separator 41...horizontal arm 9a...opening 45...horizontal guide 11 ...receiving/transporting chamber 47...sliding 13...exposure chamber 49...arm 15...workpiece inlet 51...servo motor 17...workpiece outlet 53...screw 21L...left workpiece lifter (first 55...exposure cover workpiece holding) 61... Lamp 21R... Right workpiece lifter (second 63... Rotatable workpiece holder) 65L, 65R... Illumination mirror 23L·· Left mask retaining mechanism 67...Mirror 23R... Right mask retaining mechanism 69... The fly-eye lens 25L···the first processing unit 71...the top seat plate 25R...the second processing unit 7 3...the guide rail 27...the loading device 75L, 75R...the transfer mechanism 29...the receiving conveyor belt 77L, 77R...the transfer arm 31... Pre-calibration sensor 79...slider (please read the back of the river and then fill in the matter) This page) --------^--------- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1246636 A7 B7 V. Description of invention (2〇 81...Gas actuator 8 3...Servo motor 85...Ball screw 87...Toggle arm drive unit 89...Link 100···About exposure system 101···Workpiece holder 103···Vacuum pad 105·· · workpiece receiving unit 107 ··· workpiece transfer unit 109L, 109R... reticle holding mechanism 1U··· mercury short arc lamp 113... reticle 115L... left shift arm 115R... right shift arm ------- ------^--------^---------^ (Please read the notes on the back and fill out this page), Ministry of Economic Affairs, Intellectual Property Bureau, Staff and Consumers Co., Ltd. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 23

Claims (1)

124663^®^fi Patent Application No. 89104621 Claims Patent Application Scope 1. A double-sided exposure system, 苴可妳&quot;^ * 92.12.12. For the exposure cover with the desired exposure pattern respectively Exposing a pair of opposite faces of the H-plate, the double-sided exposure system comprising: a first reticle holding mechanism, which can hold a first exposure cover for exposing the younger side of the plate a first workpiece holding device that holds the plate and is movable between a first exposure position in front of the first light holding mechanism and a first original position on which the exposure plate is placed; a second reticle holding mechanism </ RTI> holding a second exposure cover for exposing the second side of the plate; a second workpiece holding device holding the plate and movable in a second light a second exposure position in front of the cover holding mechanism and a second original position from which the exposed sheets are removed; a single light source; an optical system that selectively emits light from the light source Transfer to a guide to the first exposure position a first optical path, or a second optical path leading to the second exposure position; and a Ministry of Economic Affairs Intellectual Property Office employee consumption cooperative printing a workpiece transfer mechanism, the first workpiece holding device can receive the first surface a sheet exposed at a first exposure position and transferring the sheet to the second workpiece holding device such that the second side of the sheet is exposed; wherein the first mask holding mechanism and the second mask The holding mechanisms are opposite to each other, and the workpiece transfer mechanism includes a first workpiece transfer device and a second workpiece transfer device. 2. If the double-sided exposure system of the scope of the patent application is applied, the first paper size is applicable to China iii^75Ts)A4ϋ(210·χ 297 public hair)- 1246636 The Office of the Intellectual Property of the Ministry of Economic Affairs, the Consumers' Cooperatives, prints the paper size scale (CNS) A4 specification (27〇Ti^7?i~ pieces holding device, ν δ' plate on the first side of the exposure operation, The plate is held in a vertical position. 3. The double-sided exposure system of the first application of the patent scope, the &quot;the first workpiece holding the 罟/, Ding Chengle a work ^ / in the second side of the 玄板In the exposure operation, the plate can be held in a vertical position. 4. If the patent application scope is the same, the workpiece will be moved between the army holding mechanism and the second mask holding mechanism. At the same time, the sheet is transferred from the first workpiece transfer device to the second = transfer farm, and at least one of the first and second reticle holding mechanisms, at least one of them is in its original position. 5. For example, the double-sided exposure system of the first aspect of the patent, wherein the opposite side of the plate 2 is coated with a photoresist film for the manufacture of the substrate of the printed wiring board 6. 6: Patent application No. Double-sided exposure system, in which the first brother-in-law holds the workpiece in their respective exposures The position and the respective positions can be moved independently of each other. 7. The double-sided exposure system of claim 2, wherein the first and second workpiece holding devices are sequentially operated to make the first of the plates The second surface system is continuously exposed. [8] The double-sided exposure system of claim 2, wherein each surface of the plate is exposed on the entire surface of the reticle via the respective reticle ^25&quot;