TWD230582S - Shunts for semiconductor manufacturing equipment - Google Patents

Shunts for semiconductor manufacturing equipment Download PDF

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Publication number
TWD230582S
TWD230582S TW111301062F TW111301062F TWD230582S TW D230582 S TWD230582 S TW D230582S TW 111301062 F TW111301062 F TW 111301062F TW 111301062 F TW111301062 F TW 111301062F TW D230582 S TWD230582 S TW D230582S
Authority
TW
Taiwan
Prior art keywords
semiconductor manufacturing
manufacturing equipment
shunts
article
flow divider
Prior art date
Application number
TW111301062F
Other languages
Chinese (zh)
Inventor
岡嶋優作
Original Assignee
日商國際電氣股份有限公司 (日本)
日商國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商國際電氣股份有限公司 (日本), 日商國際電氣股份有限公司 filed Critical 日商國際電氣股份有限公司 (日本)
Publication of TWD230582S publication Critical patent/TWD230582S/en

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Abstract

【物品用途】;本設計的物品是半導體製造裝置用分流器,為一種在處理複數個晶圓之基板處理裝置中,被設置在處理室內,用以在複數個晶圓間分開氣流的分流器。;【設計說明】;(無)[Purpose of the article]; The article of this design is a flow divider for semiconductor manufacturing equipment, which is a flow divider installed in a processing chamber in a substrate processing device that processes multiple wafers and is used to separate the airflow between multiple wafers. ;[Design description];(None)

Description

半導體製造裝置用分流器Shunt for semiconductor manufacturing equipment

本設計的物品是半導體製造裝置用分流器,為一種在處理複數個晶圓之基板處理裝置中,被設置在處理室內,用以在複數個晶圓間分開氣流的分流器。The article of this design is a flow divider for semiconductor manufacturing equipment, which is a flow divider installed in a processing chamber in a substrate processing device for processing multiple wafers to divide the airflow between multiple wafers.

(無)(without)

TW111301062F 2021-10-01 2022-03-04 Shunts for semiconductor manufacturing equipment TWD230582S (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-021414 2021-10-01
JP2021021414F JP1713190S (en) 2021-10-01 2021-10-01

Publications (1)

Publication Number Publication Date
TWD230582S true TWD230582S (en) 2024-04-01

Family

ID=81209963

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111301062F TWD230582S (en) 2021-10-01 2022-03-04 Shunts for semiconductor manufacturing equipment

Country Status (3)

Country Link
US (1) USD1086086S1 (en)
JP (1) JP1713190S (en)
TW (1) TWD230582S (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD209793S (en) 2019-02-20 2021-02-11 美商維高儀器股份有限公司 Transportable semiconductor wafer rack

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8028978B2 (en) * 1996-07-15 2011-10-04 Semitool, Inc. Wafer handling system
EP1006562A3 (en) * 1998-12-01 2005-01-19 Greene, Tweed Of Delaware, Inc. Two-piece clamp ring for holding semiconductor wafer or other workpiece
JP4506125B2 (en) * 2003-07-16 2010-07-21 信越半導体株式会社 Vertical boat for heat treatment and manufacturing method thereof
US20090197424A1 (en) * 2008-01-31 2009-08-06 Hitachi Kokusai Electric Inc. Substrate processing apparatus and method for manufacturing semiconductor device
USD616392S1 (en) * 2009-03-06 2010-05-25 Tokyo Electron Limited Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers
USD734730S1 (en) * 2012-12-27 2015-07-21 Hitachi Kokusai Electric Inc. Boat of substrate processing apparatus
TWD163542S (en) * 2013-03-22 2014-10-11 日立國際電氣股份有限公司 Wafer boat for substrate processing equipment
TWD166332S (en) * 2013-03-22 2015-03-01 日立國際電氣股份有限公司 Part of the wafer boat for substrate processing equipment
KR101760316B1 (en) * 2015-09-11 2017-07-21 주식회사 유진테크 Substrate Processing Apparatus
KR101731488B1 (en) * 2015-10-27 2017-05-02 주식회사 유진테크 Substrate Processing Apparatus and Assembling Method for Tube Assembly
JP1568553S (en) * 2016-02-12 2017-02-06
JP1563649S (en) * 2016-02-12 2016-11-21
JP6664487B2 (en) * 2016-07-26 2020-03-13 株式会社Kokusai Electric Heating element, substrate processing apparatus, semiconductor device manufacturing method and program
USD846514S1 (en) * 2018-05-03 2019-04-23 Kokusai Electric Corporation Boat of substrate processing apparatus
CN112740373B (en) * 2018-09-20 2024-09-10 株式会社国际电气 Substrate processing apparatus, method for manufacturing semiconductor device, and storage medium
JP1700776S (en) * 2021-03-04 2021-11-29 Substrate placement plate for substrate processing apparatus
JP1700778S (en) * 2021-03-15 2021-11-29 Shielding device for substrate processing equipment
USD1023959S1 (en) * 2021-05-11 2024-04-23 Asm Ip Holding B.V. Electrode for substrate processing apparatus
JP1731671S (en) * 2022-03-15 2022-12-08

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD209793S (en) 2019-02-20 2021-02-11 美商維高儀器股份有限公司 Transportable semiconductor wafer rack

Also Published As

Publication number Publication date
USD1086086S1 (en) 2025-07-29
JP1713190S (en) 2022-04-21

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