TWD221941S - Reflector - Google Patents
Reflector Download PDFInfo
- Publication number
- TWD221941S TWD221941S TW110304817D01F TW110304817D01F TWD221941S TW D221941 S TWD221941 S TW D221941S TW 110304817D01 F TW110304817D01 F TW 110304817D01F TW 110304817D01 F TW110304817D01 F TW 110304817D01F TW D221941 S TWD221941 S TW D221941S
- Authority
- TW
- Taiwan
- Prior art keywords
- reflector
- design
- inner edge
- article
- edge reflector
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
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Abstract
【物品用途】;本設計物品是一種應用於在晶圓表面上塗布上磊晶膜的半導體製造設備中的反射器。本設計物品用以反射加熱器的熱。本設計物品的加熱器包括碟狀的內緣反射器以及由兩個半環形構件組成的外緣反射器,外緣反射器內側的內周與內緣反射器的外周分別形成有兩個凹陷部,且這些凹陷部排列在彼此分開的位置。;【設計說明】;仰視圖與俯視圖相對稱,故省略仰視圖。【Use of article】;This design article is a reflector used in semiconductor manufacturing equipment where an epitaxial film is coated on the surface of the wafer. This design object is used to reflect the heat from the heater. The heater of this design article includes a dish-shaped inner edge reflector and an outer edge reflector composed of two semi-annular members. Two depressions are formed on the inner circumference of the inner edge of the outer edge reflector and the outer circumference of the inner edge reflector. , and these recessed portions are arranged at positions separated from each other. ;[Design Description];The bottom view is symmetrical to the top view, so the bottom view is omitted.
Description
本設計物品是一種應用於在晶圓表面上塗布上磊晶膜的半導體製造設備中的反射器。本設計物品用以反射加熱器的熱。本設計物品的加熱器包括碟狀的內緣反射器以及由兩個半環形構件組成的外緣反射器,外緣反射器內側的內周與內緣反射器的外周分別形成有兩個凹陷部,且這些凹陷部排列在彼此分開的位置。The design article is a reflector used in semiconductor manufacturing equipment coated with an epitaxial film on the surface of a wafer. This design item is used to reflect the heat of the heater. The heater of this design article includes a dish-shaped inner edge reflector and an outer edge reflector composed of two semi-annular members, and the inner circumference of the outer edge reflector and the outer circumference of the inner edge reflector are respectively formed with two depressions , and these depressions are arranged at positions separated from each other.
仰視圖與俯視圖相對稱,故省略仰視圖。The bottom view is symmetrical to the top view, so the bottom view is omitted.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021017778F JP1704966S (en) | 2021-08-18 | 2021-08-18 | Reflector |
JP2021-017778 | 2021-08-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD221941S true TWD221941S (en) | 2022-11-11 |
Family
ID=80217242
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW110304817D01F TWD221941S (en) | 2021-08-18 | 2021-10-26 | Reflector |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP1704966S (en) |
TW (1) | TWD221941S (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWD208205S (en) | 2019-05-24 | 2020-11-11 | 荷蘭商Asm Ip私人控股有限公司 | Gas channel plate |
-
2021
- 2021-08-18 JP JP2021017778F patent/JP1704966S/en active Active
- 2021-10-26 TW TW110304817D01F patent/TWD221941S/en unknown
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWD208205S (en) | 2019-05-24 | 2020-11-11 | 荷蘭商Asm Ip私人控股有限公司 | Gas channel plate |
Also Published As
Publication number | Publication date |
---|---|
JP1704966S (en) | 2022-01-14 |
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