JP1704966S - Reflector - Google Patents
ReflectorInfo
- Publication number
- JP1704966S JP1704966S JP2021017778F JP2021017778F JP1704966S JP 1704966 S JP1704966 S JP 1704966S JP 2021017778 F JP2021017778 F JP 2021017778F JP 2021017778 F JP2021017778 F JP 2021017778F JP 1704966 S JP1704966 S JP 1704966S
- Authority
- JP
- Japan
- Prior art keywords
- reflector
- peripheral reflector
- outer peripheral
- inner peripheral
- reflecting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000002093 peripheral effect Effects 0.000 abstract 4
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Abstract
本物品は、ウェーハの表面にエピタキシャル膜を被覆する半導体製造装置において、加熱手段として用いられるヒータの熱を反射するためのリフレクタ（反射部材）である。当該リフレクタは、円盤状の内周リフレクタと、半環状の二つの部材からなる外周リフレクタにより構成され、外周リフレクタの内周および内周リフレクタの外周にそれぞれ２箇所の凹み部分が形成されていて、これらの凹みは互いに離れた位置に配置されている。This article is a reflector (reflecting member) for reflecting the heat of a heater used as a heating means in a semiconductor manufacturing apparatus in which the surface of a wafer is coated with an epitaxial film. The reflector is composed of a disk-shaped inner peripheral reflector and an outer peripheral reflector composed of two semi-annular members, and two recessed portions are formed on the inner circumference of the outer peripheral reflector and the outer circumference of the inner peripheral reflector, respectively. These recesses are located apart from each other.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021017778F JP1704966S (en) | 2021-08-18 | 2021-08-18 | Reflector |
| TW110304817D01F TWD221941S (en) | 2021-08-18 | 2021-10-26 | Reflector |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021017778F JP1704966S (en) | 2021-08-18 | 2021-08-18 | Reflector |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP1704966S true JP1704966S (en) | 2022-01-14 |
Family
ID=80217242
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021017778F Active JP1704966S (en) | 2021-08-18 | 2021-08-18 | Reflector |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP1704966S (en) |
| TW (1) | TWD221941S (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD935572S1 (en) | 2019-05-24 | 2021-11-09 | Asm Ip Holding B.V. | Gas channel plate |
-
2021
- 2021-08-18 JP JP2021017778F patent/JP1704966S/en active Active
- 2021-10-26 TW TW110304817D01F patent/TWD221941S/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TWD221941S (en) | 2022-11-11 |
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