TWD220657S - Reflector - Google Patents
Reflector Download PDFInfo
- Publication number
- TWD220657S TWD220657S TW110304817F TW110304817F TWD220657S TW D220657 S TWD220657 S TW D220657S TW 110304817 F TW110304817 F TW 110304817F TW 110304817 F TW110304817 F TW 110304817F TW D220657 S TWD220657 S TW D220657S
- Authority
- TW
- Taiwan
- Prior art keywords
- reflector
- design
- edge reflector
- article
- heater
- Prior art date
Links
- 210000000078 claw Anatomy 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
Images
Abstract
【物品用途】;本設計物品是一種應用於在晶圓表面上塗布上磊晶膜的半導體製造設備中的反射器。本設計物品用以反射加熱器的熱。本設計物品的加熱器包括碟狀的內緣反射器以及由兩個半環形構件組成的外緣反射器，且內緣反射器的凹陷部放置於外緣反射器內側的相同形狀的爪上。;【設計說明】;仰視圖與俯視圖相對稱，故省略仰視圖。【Use of article】;This design article is a reflector used in semiconductor manufacturing equipment where an epitaxial film is coated on the surface of the wafer. This design object is used to reflect the heat from the heater. The heater of this design article includes a dish-shaped inner edge reflector and an outer edge reflector composed of two semi-annular members, and the recessed part of the inner edge reflector is placed on the same-shaped claw on the inside of the outer edge reflector. ;[Design Description];The bottom view is symmetrical to the top view, so the bottom view is omitted.
Description
本設計物品是一種應用於在晶圓表面上塗布上磊晶膜的半導體製造設備中的反射器。本設計物品用以反射加熱器的熱。本設計物品的加熱器包括碟狀的內緣反射器以及由兩個半環形構件組成的外緣反射器，且內緣反射器的凹陷部放置於外緣反射器內側的相同形狀的爪上。This design article is a reflector used in semiconductor manufacturing equipment coated with epitaxial film on the wafer surface. This design item is used to reflect the heat of the heater. The heater of the designed article includes a dish-shaped inner edge reflector and an outer edge reflector composed of two semi-ring members, and the recessed part of the inner edge reflector is placed on a claw of the same shape inside the outer edge reflector.
仰視圖與俯視圖相對稱，故省略仰視圖。The bottom view is symmetrical with the top view, so the bottom view is omitted.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021-005051 | 2021-03-12 | ||
| JPD2021-5051F JP1699087S (en) | 2021-03-12 | 2021-03-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD220657S true TWD220657S (en) | 2022-08-21 |
Family
ID=78410084
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW110304817F TWD220657S (en) | 2021-03-12 | 2021-09-09 | Reflector |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP1699087S (en) |
| TW (1) | TWD220657S (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD208205S (en) | 2019-05-24 | 2020-11-11 | 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 | Gas channel plate |
-
2021
- 2021-03-12 JP JPD2021-5051F patent/JP1699087S/ja active Active
- 2021-09-09 TW TW110304817F patent/TWD220657S/en unknown
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD208205S (en) | 2019-05-24 | 2020-11-11 | 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 | Gas channel plate |
Also Published As
| Publication number | Publication date |
|---|---|
| JP1699087S (en) | 2021-11-08 |
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